Curable composition, cured film produced using composition, and color filter and display device comrising cured film

Abstract

Provided are a curable composition including (A) quantum dots, (B) a photopolymerization initiator, (C) a binder resin including a specific structural unit, (D) a photopolymerizable monomer, and (E) a solvent, and a cured film and a color filter produced using the composition.

Description

Curable composition, cured film manufactured using the composition, and color filter and display device including the cured film

[0001] The present invention relates to a curable composition, a cured film manufactured using the composition, and a color filter including the cured film.

[0002]

[0003] In the case of general quantum dots, the solvents in which they can be dispersed are limited due to their hydrophobic surface properties, and as a result, there are many difficulties in introducing them into polar systems such as binders or curable monomers.

[0004] For example, even in the case of quantum dot ink compositions that are being actively researched, in the initial stages, they were relatively low in polarity and could only be dispersed in solvents used in highly hydrophobic curable compositions. For this reason, it was difficult to include quantum dots in an amount exceeding 20 wt% of the total composition, making it impossible to increase the ink's luminous efficiency beyond a certain level. In addition, even if quantum dots were added and dispersed to increase luminous efficiency, the viscosity exceeded the range for ink-jetting, making it impossible to satisfy the processability.

[0005] In addition, in order to implement a viscosity range that allows ink-jetting, a method of lowering the ink solids content by including a solvent of 50 wt% or more relative to the total composition has been used. This method also provides somewhat satisfactory results in terms of viscosity, but it has the disadvantage of being difficult to apply to actual processes due to problems such as nozzle drying due to solvent volatilization during ink-jetting, nozzle clogging, and a decrease in film thickness over time after ink-jetting, as well as a severe thickness deviation after curing.

[0006] Accordingly, a solvent-free curable composition (quantum dot ink composition) that does not use a solvent has been developed. However, in this case, due to the characteristic of containing an excessive amount of a polymerizable compound, problems arise such as clogging and poor ejection due to nozzle drying caused by volatility, and a decrease in single-film thickness due to volatilization of the ink composition jetted within the pattern partition pixel. Above all, the biggest problem is that it is difficult to improve the optical properties of the solvent-free curable composition.

[0007] That is, the reality is that neither solvent-curable nor solvent-free curable compositions have yet demonstrated a satisfactory level of light resistance reliability.

[0008]

[0009] One embodiment is to provide a curable composition having improved light resistance reliability through structural modification of a binder resin.

[0010] Another embodiment is to provide a cured film manufactured using the curable composition.

[0011] Another embodiment is to provide a color filter comprising the above cured film.

[0012]

[0013] One embodiment provides a curable composition comprising: (A) a quantum dot; (B) a photopolymerization initiator; (C) a binder resin comprising a structural unit of the following chemical formula 1; (D) a photopolymerizable monomer; and (E) a solvent.

[0014] [Chemical Formula 1]

[0015]

[0016] In the above chemical formula 1,

[0017] L 1 Inland L 7are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group,

[0018] R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0019] X 1 is a substituted or unsubstituted C1 to C20 alkylene group or a substituted or unsubstituted divalent fluorenylidene group,

[0020] Y 1 is a residue derived from an acid anhydride.

[0021] The above binder resin may include a group represented by the following chemical formula 2 at at least one of both terminals.

[0022] [Chemical Formula 2]

[0023]

[0024] In the above chemical formula 2,

[0025] L 1 Inland L 6 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group,

[0026] R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0027] X 2 is a substituted or unsubstituted C1 to C20 alkylene group,

[0028] Y 2is a residue derived from an acid anhydride.

[0029] The above binder resin may include a first binder resin containing a structural unit represented by the following chemical formula 1-1, a second binder resin containing a structural unit represented by the following chemical formula 1-2, or a combination thereof.

[0030] [Chemical Formula 1-1]

[0031]

[0032] [Chemical Formula 1-2]

[0033]

[0034] In the above chemical formula 1,

[0035] L 3 Inland L 7 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group,

[0036] L 8 and L 9 are each independently a substituted or unsubstituted C3 to C20 cycloalkylene group,

[0037] L 10 and L 11 are each independently a substituted or unsubstituted C6 to C20 arylene group,

[0038] R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0039] X 3 is a substituted or unsubstituted C1 to C20 alkylene group,

[0040] X 4 is a substituted or unsubstituted divalent fluorenylidene group,

[0041] Y 1is a residue derived from an acid anhydride.

[0042] The above two fluorenylidene groups can be represented by the following chemical formula X.

[0043] [chemical formula X]

[0044]

[0045] Above Y 1 can be represented by any one of the following chemical formulas Y-1 to Y-8.

[0046] [Chemical formula Y-1]

[0047]

[0048] [Chemical formula Y-2]

[0049]

[0050] [Chemical formula Y-3]

[0051]

[0052] [Chemical formula Y-4]

[0053]

[0054] [Chemical formula Y-5]

[0055]

[0056] (In the above chemical formula Y-5, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 allylamine group)

[0057] [Chemical formula Y-6]

[0058]

[0059] [Chemical formula Y-7]

[0060]

[0061] [Chemical formula Y-8]

[0062]

[0063] Above Y2 can be represented by any one of the following chemical formulas Y-9 to Y-15.

[0064] [Chemical formula Y-9]

[0065]

[0066] (In the above chemical formula Y-9, R b and R c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group)

[0067] [Chemical formula Y-10]

[0068]

[0069] [Chemical formula Y-11]

[0070]

[0071] [Chemical formula Y-12]

[0072]

[0073] [Chemical formula Y-13]

[0074]

[0075] (In the above chemical formula Y-13, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 allylamine group)

[0076] [Chemical formula Y-14]

[0077]

[0078] [Chemical formula Y-15]

[0079]

[0080] The above quantum dots may have a maximum fluorescence emission wavelength of 500 nm to 680 nm.

[0081] The above quantum dot can be surface-modified with a compound represented by the following chemical formula 3 and / or a compound represented by the following chemical formula 4.

[0082] [Chemical Formula 3]

[0083]

[0084] [Chemical Formula 4]

[0085]

[0086] In the above chemical formulas 3 and 4,

[0087] R a is a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0088] R x is a monovalent functional group containing a reactive group and a C3 to C20 cycloalkane ring,

[0089] L a , L b , L x and L y are each independently a substituted or unsubstituted C1 to C20 alkylene group,

[0090] X is a sulfur atom or an oxygen atom,

[0091] n is an integer from 0 to 10,

[0092] m is an integer between 2 and 10.

[0093] The photopolymerizable monomer may have a molecular weight of 220 g / mol to 1,000 g / mol.

[0094] The above photopolymerizable monomer can be represented by the following chemical formula 5.

[0095] [Chemical Formula 5]

[0096]

[0097] In the above chemical formula 5,

[0098] R 3 and R 4are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

[0099] L 12 and L 14 are each independently a substituted or unsubstituted C1 to C10 alkylene group,

[0100] L 13 is a substituted or unsubstituted C1 to C10 alkylene group or ether group (*-O-*).

[0101] The curable composition may include, based on the total amount of the curable composition, 10 to 30 wt% of the quantum dot (A); 0.1 to 1 wt% of the photopolymerization initiator (B); 1 to 10 wt% of the binder resin (C); 1 to 10 wt% of the photopolymerizable monomer (D); and the remainder of the solvent (E).

[0102] The above curable composition may further include a light diffusing agent.

[0103] The light diffusing agent may include barium sulfate, calcium carbonate, titanium dioxide, zirconia, or a combination thereof.

[0104] The above curable composition may further include a polymerization inhibitor; malonic acid; 3-amino-1,2-propanediol; a silane coupling agent; a leveling agent; a fluorinated surfactant; or a combination thereof.

[0105] Another embodiment provides a cured film manufactured using the curable composition.

[0106] Another embodiment provides a color filter including the cured film.

[0107] Another embodiment provides a display device including the color filter.

[0108] Specific details of other aspects of the present invention are included in the detailed description below.

[0109]

[0110] One embodiment can provide a curable composition with improved light resistance reliability by replacing a linking group and a functional group that are vulnerable to light resistance in a conventional binder resin structure with a linking group and a functional group that are highly resistant to light resistance.

[0111]

[0112] Hereinafter, embodiments of the present invention will be described in detail. However, these are presented as examples and are not intended to limit the present invention. The present invention is defined solely by the scope of the claims set forth below.

[0113] Unless otherwise specified herein, “alkyl group” means a C1 to C20 alkyl group, “alkenyl group” means a C2 to C20 alkenyl group, “cycloalkenyl group” means a C3 to C20 cycloalkenyl group, “heterocycloalkenyl group” means a C3 to C20 heterocycloalkenyl group, “aryl group” means a C6 to C20 aryl group, “arylalkyl group” means a C6 to C20 arylalkyl group, “alkylene group” means a C1 to C20 alkylene group, “arylene group” means a C6 to C20 arylene group, “alkylarylene group” means a C6 to C20 alkylarylene group, “heteroarylene group” means a C3 to C20 heteroarylene group, and “alkoxylene group” means a C1 to C20 It refers to an alkoxylene group.

[0114] Unless otherwise specified herein, "substitution" means that at least one hydrogen atom is substituted with a halogen atom (F, Cl, Br, I), a hydroxy group, a C1 to C20 alkoxy group, a nitro group, a cyano group, an amine group, an imino group, an azido group, an amidino group, a hydrazino group, a hydrazono group, a carbonyl group, a carbamyl group, a thiol group, an ester group, an ether group, a carboxyl group or a salt thereof, a sulfonic acid group or a salt thereof, a phosphoric acid or a salt thereof, a C1 to C20 alkyl group, a C2 to C20 alkenyl group, a C2 to C20 alkynyl group, a C6 to C20 aryl group, a C3 to C20 cycloalkyl group, a C3 to C20 cycloalkenyl group, a C3 to C20 cycloalkynyl group, a C2 to C20 heterocycloalkyl group, a C2 to C20 heterocycloalkenyl group, a C2 to C20 It means substituted with a C20 heterocycloalkynyl group, a C3 to C20 heteroaryl group, or a combination thereof.

[0115] Additionally, unless otherwise specified herein, “hetero” means that the chemical formula contains at least one heteroatom of at least one of N, O, S, and P.

[0116] Additionally, unless otherwise specified herein, “(meth)acrylate” means both “acrylate” and “methacrylate”, and “(meth)acrylic acid” means both “acrylic acid” and “methacrylic acid”.

[0117] Unless otherwise specified herein, “combination” means mixing or copolymerization.

[0118] Unless otherwise defined in the chemical formulas in this specification, if a chemical bond is not drawn at a position where a chemical bond should be drawn, it means that a hydrogen atom is bonded at that position.

[0119] Additionally, unless otherwise specified herein, “*” means a portion connected to the same or different atoms or chemical formulas.

[0120]

[0121] The biggest advantage of quantum dot display products currently under active development is not only their wide viewing angles, but also their ability to achieve a high color reproducibility (high color reproducibility) of nearly 100%. To achieve this, improved light resistance reliability is essential. In the case of existing quantum dot-containing curable compositions, reliability has been improved through methods such as protecting the quantum dots through ligand exchange on the quantum dot surface to improve light and heat resistance, adding inorganic substances to supplement defect sites on the quantum dot surface, or forming an organic matrix on the quantum dot surface to block moisture and oxygen.

[0122] However, among the quantum dot-containing curable compositions, solvent-based curable compositions, unlike solvent-free curable compositions, had a problem in that even when the aforementioned conventional method was applied, the improvement in light resistance reliability was very minimal. After extensive research, the inventors of the present invention confirmed that the binder resin, which is required to maintain pattern processability and optical properties, was detrimental to the light resistance of the solvent-based curable composition, and improved the light resistance of the binder resin, thereby completing the present invention.

[0123] The current display market is moving toward technologies like μ-LEDs and nano-LEDs that emit bright light from smaller pixels. This is the current trend in display panel technology. Therefore, the development of a quantum dot-containing curable composition that ensures light-resistant reliability—the ability to withstand strong light—is essential.

[0124] The present invention aims to improve the light resistance of a quantum dot-containing solvent-based curable composition that can withstand strong light-emitting backlights such as μ-LEDs and nano-LEDs.

[0125] In the case of the cardo-based binder resin used in the conventional quantum dot-containing solvent-type curable composition, it has the advantage of having a main chain of a fluorene structure and a thiophenol side chain group, which can increase light efficiency with high refractive index characteristics, and excellent quantum dot dispersibility and pattern developability. However, this structure, that is, the combination of a fluorene structure and a thiophenol structure, has the disadvantage of very weak light resistance in μ-LED compared to the existing blue OLED.

[0126] The present inventors have discovered a structure in a conventional cardo-based binder resin that has poor light resistance, and have removed it, and have newly introduced a structure that can improve light resistance without reducing light efficiency, thereby inventing a solvent-based curable composition containing quantum dots that has improved light resistance reliability without reducing light efficiency. Specifically, the binder resin in the solvent-based curable composition according to one embodiment necessarily includes an alicyclic linking group in the binder main chain or terminal, and introduces a (meth)acrylate group, thereby minimizing a decrease in light retention even under high light resistance conditions while simultaneously improving reliability.

[0127] Below, each component constituting the solvent-type curable composition is described in detail.

[0128]

[0129] (C) Binder resin

[0130] A curable composition according to one embodiment comprises a binder resin comprising a structural unit of the following chemical formula 1.

[0131] [Chemical Formula 1]

[0132]

[0133] In the above chemical formula 1,

[0134] L 1 Inland L 7are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group,

[0135] R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0136] X 1 is a substituted or unsubstituted C1 to C20 alkylene group or a substituted or unsubstituted divalent fluorenylidene group,

[0137] Y 1 is a residue derived from an acid anhydride.

[0138] The structural unit of the above chemical formula 1 may be a thioaryl group free structural unit that does not contain any light-sensitive structure such as a thiophenyl group.

[0139] More specifically, the binder resin may include a group represented by the following chemical formula 2 at at least one of both terminals.

[0140] [Chemical Formula 2]

[0141]

[0142] In the above chemical formula 2,

[0143] L 1 Inland L 6 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group,

[0144] R 1 and R 2are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0145] X 2 is a substituted or unsubstituted C1 to C20 alkylene group,

[0146] Y 2 is a residue derived from an acid anhydride.

[0147] A binder resin comprising a structural unit of the above chemical formula 1 as a main chain and a group represented by the above chemical formula 2 at at least one of both terminals (or both terminals) can significantly improve light resistance reliability while minimizing a decrease in light efficiency even under high light resistance conditions.

[0148] For example, the binder resin may include a first binder resin containing a structural unit represented by the following chemical formula 1-1, a second binder resin containing a structural unit represented by the following chemical formula 1-2, or a combination thereof.

[0149] [Chemical Formula 1-1]

[0150]

[0151] [Chemical Formula 1-2]

[0152]

[0153] In the above chemical formula 1,

[0154] L 3 Inland L 7 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group,

[0155] L 8 and L 9 are each independently a substituted or unsubstituted C3 to C20 cycloalkylene group,

[0156] L 10 and L 11are each independently a substituted or unsubstituted C6 to C20 arylene group,

[0157] R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0158] X 3 is a substituted or unsubstituted C1 to C20 alkylene group,

[0159] X 4 is a substituted or unsubstituted divalent fluorenylidene group,

[0160] Y 1 is a residue derived from an acid anhydride.

[0161] For example, the above divalent fluorenylidene group can be represented by the following chemical formula X.

[0162] [chemical formula X]

[0163]

[0164] For example, the above Y 1 may be represented by any one of the following chemical formulas Y-1 to Y-8, wherein Y 2 may be represented by any one of the following chemical formulas Y-9 to Y-15, but is not necessarily limited thereto.

[0165] [Chemical formula Y-1]

[0166]

[0167] [Chemical formula Y-2]

[0168]

[0169] [Chemical formula Y-3]

[0170]

[0171] [Chemical formula Y-4]

[0172]

[0173] [Chemical formula Y-5]

[0174]

[0175] (In the above chemical formula Y-5, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 allylamine group)

[0176] [Chemical formula Y-6]

[0177]

[0178] [Chemical formula Y-7]

[0179]

[0180] [Chemical formula Y-8]

[0181]

[0182] [Chemical formula Y-9]

[0183]

[0184] (In the above chemical formula Y-9, R b and R c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group)

[0185] [Chemical formula Y-10]

[0186]

[0187] [Chemical formula Y-11]

[0188]

[0189] [Chemical formula Y-12]

[0190]

[0191] [Chemical formula Y-13]

[0192]

[0193] (In the above chemical formula Y-13, R dis O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 allylamine group)

[0194] [Chemical formula Y-14]

[0195]

[0196] [Chemical formula Y-15]

[0197]

[0198] The weight average molecular weight of the binder resin containing the structural unit represented by the above chemical formula 1 may be 2,000 g / mol to 50,000 g / mol. When the weight average molecular weight of the binder resin is within the above range, the compatibility with other components in the solvent-borne curable composition is excellent, thereby maximizing light resistance reliability.

[0199] A curable composition according to one embodiment may further include, in addition to the binder resin containing the structural unit represented by the above chemical formula 1, an acrylic resin, a cardo resin, an epoxy resin, or a combination thereof having another structure.

[0200] The above acrylic resin may be a copolymer of a first ethylenically unsaturated monomer and a second ethylenically unsaturated monomer copolymerizable therewith, and may be a resin including one or more acrylic repeating units.

[0201] Specific examples of the above acrylic resin include, but are not limited to, polybenzyl methacrylate, (meth)acrylic acid / benzyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene copolymer, (meth)acrylic acid / benzyl methacrylate / 2-hydroxyethyl methacrylate copolymer, (meth)acrylic acid / benzyl methacrylate / styrene / 2-hydroxyethyl methacrylate copolymer, and the like. These may be used singly or in combination of two or more.

[0202] The weight average molecular weight of the above acrylic resin may be 5,000 g / mol to 15,000 g / mol. When the weight average molecular weight of the above acrylic resin is within the above range, the acrylic resin has excellent adhesion to the substrate, good physical and chemical properties, and appropriate viscosity.

[0203] The acid value of the above acrylic resin may be 80 mgKOH / g to 130 mgKOH / g. When the acid value of the above acrylic resin is within the above range, the resolution of the pixel pattern is excellent.

[0204] The above-mentioned cardo resin may be one used in a conventional curable resin (or photosensitive resin) composition, and may be, for example, one presented in Korean Patent Publication No. 10-2018-0067243, but is not limited thereto.

[0205] The above cardo resin may be, for example, a fluorene-containing compound such as 9,9-bis(4-oxiranylmethoxyphenyl)fluorene; anhydride compounds such as benzenetetracarboxylic acid dianhydride, naphthalenetetracarboxylic acid dianhydride, biphenyltetracarboxylic acid dianhydride, benzophenonetetracarboxylic acid dianhydride, pyromellitic dianhydride, cyclobutanetetracarboxylic acid dianhydride, perylenetetracarboxylic acid dianhydride, tetrahydrofurantetracarboxylic acid dianhydride, and tetrahydrophthalic acid anhydride; a glycol compound such as ethylene glycol, propylene glycol, and polyethylene glycol; an alcohol compound such as methanol, ethanol, propanol, n-butanol, cyclohexanol, and benzyl alcohol; a solvent compound such as propylene glycol methyl ethyl acetate, and N-methylpyrrolidone; a phosphorus compound such as triphenylphosphine; And it can be prepared by mixing two or more of amine or ammonium salt compounds such as tetramethylammonium chloride, tetraethylammonium bromide, benzyldiethylamine, triethylamine, tributylamine, and benzyltriethylammonium chloride.

[0206] The weight average molecular weight of the above cardo resin may be 500 g / mol to 50,000 g / mol, for example, 1,000 g / mol to 30,000 g / mol. When the weight average molecular weight of the above cardo resin is within the above range, pattern formation is good without residue when producing a cured film, and there is no loss of film thickness when developing a solvent-based curable composition, and a good pattern can be obtained.

[0207] In particular, when the binder resin including the structural unit represented by the above chemical formula 1 is used in combination with the cardo-based resin, it is possible to improve the developability of the quantum dot-containing curable composition while maintaining excellent light efficiency and light resistance reliability, and to have excellent sensitivity during photocuring and excellent fine pattern formation ability. However, in this case, the binder resin including the structural unit represented by the above chemical formula 1 may be included in a larger amount than the cardo-based resin, for example, at least twice, for example, at least 2.5 times, for example, at least 3 times the weight of the cardo-based resin, and it may be easy to achieve the above-described effect by controlling the content range between the binder resins as described above.

[0208] The above epoxy resin is a monomer or oligomer that can be polymerized by heat, and may include compounds having carbon-carbon unsaturated bonds and carbon-carbon cyclic bonds.

[0209] The above epoxy resin may include, but is not necessarily limited to, bisphenol A type epoxy resin, bisphenol F type epoxy resin, phenol novolac type epoxy resin, cyclic aliphatic epoxy resin, and aliphatic polyglycidyl ether.

[0210] Commercially available products of these compounds include bisphenyl epoxy resins, YX4000, YX4000H, YL6121H, YL6640, YL6677 from Yukashell Epoxy Co., Ltd.; cresol novolac type epoxy resins, EOCN-102, EOCN-103S, EOCN-104S, EOCN-1020, EOCN-1025, EOCN-1027 from Nippon Kayaku Co., Ltd. and Epicoat 180S75 from Yukashell Epoxy Co., Ltd.; bisphenol A type epoxy resins, Epicoat 1001, 1002, 1003, 1004, 1007, 1009, 1010, and 828 from Yukashell Epoxy Co., Ltd.; Bisphenol F type epoxy resins include Epicoat 807 and 834 from Yukashell Epoxy Co., Ltd.; Phenol novolak type epoxy resins include Epicoat 152, 154, 157H65 from Yukashell Epoxy Co., Ltd. and EPPN 201, 202 from Nippon Kayaku Co., Ltd.; Other cyclic aliphatic epoxy resins include CY175, CY177 and CY179 from CIBA-GEIGY AG, ERL-4234, ERL-4299, ERL-4221 and ERL-4206 from UCC, Shodyne 509 from Showa Denko Co., Ltd., Araldite CY-182, CY-192 and CY-184 from CIBA-GEIGY AG, Epichron 200 and 400 from Dainippon Ink & Kogyo Co., Ltd., Epicoat 871, 872 and EP1032H60 from Yukashell Epoxy Co., Ltd., and ED-5661 and ED-5662 from Celanese Coating Co., Ltd.; Examples of aliphatic polyglycidyl ethers include Epicoat 190P and 191P from Yukashell Epoxy Co., Ltd., Epolite 100MF from Kyoeisha Yushi Chemical Co., Ltd., and Epiol TMP from Nippon Yushi Co., Ltd.

[0211] For example, the binder resin may be included in an amount of 1 wt% to 10 wt%, for example, 3 wt% to 7 wt%, based on the total amount of the curable composition. In this case, the pattern characteristics, heat resistance, and chemical resistance of the solvent-based curable composition can be improved, and the storage stability of the composition can also be improved.

[0212]

[0213] (A) Quantum dots

[0214] The quantum dots included in the above curable composition may be quantum dots surface-modified with a compound represented by the following chemical formula 3 and / or a compound represented by the following chemical formula 4.

[0215] [Chemical Formula 3]

[0216]

[0217] [Chemical Formula 4]

[0218]

[0219] In the above chemical formulas 3 and 4,

[0220] R a is a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0221] R x is a monovalent functional group containing a reactive group and a C3 to C20 cycloalkane ring,

[0222] L a , L b , L x and L y are each independently a substituted or unsubstituted C1 to C20 alkylene group,

[0223] X is a sulfur atom or an oxygen atom,

[0224] n is an integer from 0 to 10,

[0225] m is an integer between 2 and 10.

[0226] For example, in the above chemical formula 3, n may be an integer from 1 to 10. In this case, the light resistance reliability of the solvent-based curable composition including the binder resin containing the structural unit represented by the above chemical formula 1 can be maximized.

[0227] For example, the quantum dot may include a functional group represented by the following chemical formula 3A and a functional group represented by the following chemical formula 4A.

[0228] [Chemical Formula 3A]

[0229]

[0230] [Chemical Formula 4A]

[0231]

[0232] In the above chemical formulas 3A and 4A,

[0233] R a is a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group,

[0234] R x is a monovalent functional group containing a reactive group and a C3 to C20 cycloalkane ring,

[0235] L a , L b , L x and L y are each independently a substituted or unsubstituted C1 to C20 alkylene group,

[0236] X is a sulfur atom or an oxygen atom,

[0237] n is an integer from 0 to 10, for example, an integer from 1 to 10,

[0238] m is an integer from 2 to 10, for example, an integer from 2 to 8.

[0239] For example, the reactive group may include a carbon-carbon double bond, an epoxy group, or a combination thereof.

[0240] For example, in the above chemical formula 4, R xcan be represented by the following chemical formula R-1 or R-2.

[0241] [Chemical formula R-1]

[0242]

[0243] [Chemical formula R-2]

[0244]

[0245] In the above chemical formulas R-1 and R-2,

[0246] R 21 is a 'substituted or unsubstituted vinyl group', a 'substituted or unsubstituted epoxy group', or a 'C1 to C20 alkyl group substituted with an epoxy group and / or a vinyl group',

[0247] L 23 and L 24 are each independently a substituted or unsubstituted C1 to C10 alkylene group,

[0248] m1 is an integer of 0 or 1.

[0249] The above R x The bulkier the cycloalkane ring of the R, the better it can protect the quantum dots from external light. x It is advantageous that it is a fused ring form containing a cycloalkane ring, and therefore, in the chemical formulas R-1 and R-2, m1 may be an integer of 1. In this case, it may also be advantageous in terms of improving reliability.

[0250] For example, the compound represented by the above chemical formula 4 may be represented by any one of the following chemical formulas 4-1 to 4-4, but is not necessarily limited thereto.

[0251] [Chemical Formula 2-1]

[0252]

[0253] [Chemical Formula 2-2]

[0254]

[0255] [Chemical Formula 2-3]

[0256]

[0257] [Chemical Formula 2-4]

[0258]

[0259] In the above chemical formulas 4-1 to 4-4,

[0260] m is an integer from 2 to 10, for example, an integer from 2 to 8.

[0261] For example, the quantum dot may absorb light in a wavelength range of 360 nm to 780 nm, for example, a wavelength range of 400 nm to 780 nm, and emit fluorescence in a wavelength range of 500 nm to 700 nm, for example, 500 nm to 580 nm, or emit fluorescence in a wavelength range of 600 nm to 680 nm. That is, the quantum dot may have a maximum fluorescence emission wavelength (fluorescence λ) in a wavelength range of 500 nm to 680 nm. em ) can have.

[0262] The above quantum dots may each independently have a full width at half maximum (FWHM) of 20 nm to 100 nm, for example, 20 nm to 50 nm. When the quantum dots have a full width at half maximum (FWHM) within the above range, the color purity is high, thereby increasing the color reproducibility when used as a color material in a color filter.

[0263] The above quantum dots may each independently be organic, inorganic, or a hybrid (hybrid) of organic and inorganic materials.

[0264] The above quantum dots can each independently be composed of a core and a shell surrounding the core, and the core and shell can each independently have a structure such as a core, core / shell, core / first shell / second shell, alloy, alloy / shell, etc., made of group II-IV, group III-V, etc., but are not limited thereto.

[0265] For example, the core may include at least one material selected from the group consisting of CdS, CdSe, CdTe, ZnS, ZnSe, ZnTe, HgS, HgSe, HgTe, GaN, GaP, GaAs, InP, InAs, and alloys thereof, but is not necessarily limited thereto. The shell surrounding the core may include at least one material selected from the group consisting of CdSe, ZnSe, ZnS, ZnTe, CdTe, PbS, TiO, SrSe, HgSe, and alloys thereof, but is not necessarily limited thereto.

[0266] In one implementation example, since environmental concerns have been increasing significantly worldwide and regulations on toxic substances have been strengthened, environmentally friendly non-cadmium-based luminescent materials (such as InP / ZnS, InP / ZnSe / ZnS) with somewhat lower quantum yields were used instead of luminescent materials having cadmium-based cores, but the present invention is not limited thereto.

[0267] In the case of the quantum dot of the above core / shell structure, the size (average particle diameter) of each quantum dot including the shell may be 1 nm to 15 nm, for example, 5 nm to 15 nm.

[0268] For example, the quantum dots may each independently include red quantum dots, green quantum dots, or a combination thereof. The red quantum dots may each independently have an average particle diameter of 10 nm to 15 nm. The green quantum dots may each independently have an average particle diameter of 5 nm to 8 nm.

[0269] Meanwhile, in order to ensure dispersion stability of the quantum dots, the solvent-based curable composition according to one embodiment may further include a dispersant. The dispersant helps the photoconversion material, such as quantum dots, to be uniformly dispersed within the solvent-based curable composition, and any nonionic, anionic, or cationic dispersant may be used. Specifically, polyalkylene glycol or its esters, polyoxyalkylene, polyhydric alcohol ester alkylene oxide adducts, alcohol alkylene oxide adducts, sulfonic acid esters, sulfonic acid salts, carboxylic acid esters, carboxylic acid salts, alkyl amide alkylene oxide adducts, alkyl amines, and the like may be used alone or in combination of two or more. The dispersant may be used in an amount of 0.1 wt% to 100 wt%, for example, 10 wt% to 20 wt%, relative to the solid content of the photoconversion material, such as quantum dots.

[0270] The quantum dots may be included in an amount of 10 wt% to 30 wt%, for example, 10 wt% to 20 wt%, based on the total amount of the solvent-based curable composition. When the surface-modified quantum dots are included within the above range, the photoconversion rate is excellent and the pattern characteristics and development characteristics are not impaired, thereby enabling excellent processability.

[0271]

[0272] (D) Photopolymerizable monomer

[0273] A curable composition according to one embodiment comprises a photopolymerizable monomer, wherein the polymerizable compound may have a carbon-carbon double bond at a terminal.

[0274] For example, the photopolymerizable monomer having a carbon-carbon double bond at the terminal may have a molecular weight of 170 g / mol to 1,000 g / mol. When the molecular weight of the photopolymerizable monomer having a carbon-carbon double bond at the terminal is within the above range, the composition's viscosity may not be increased without impairing the optical properties of the quantum dot, which may be advantageous for ink-jetting.

[0275] For example, a photopolymerizable monomer having a carbon-carbon double bond at the terminal may be represented by the following chemical formula 5, but is not necessarily limited thereto.

[0276] [Chemical Formula 5]

[0277]

[0278] In the above chemical formula 5,

[0279] R 3 and R 4 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group,

[0280] L 12 and L 14 are each independently a substituted or unsubstituted C1 to C10 alkylene group,

[0281] L 13 is a substituted or unsubstituted C1 to C10 alkylene group or ether group (*-O-*).

[0282] For example, the photopolymerizable monomer having a carbon-carbon double bond at the terminal may be represented by the following chemical formula 5-1, chemical formula 5-2 or 5-3, but is not necessarily limited thereto.

[0283] [Chemical Formula 5-1]

[0284]

[0285] [Chemical Formula 5-2]

[0286]

[0287] [Chemical Formula 5-3]

[0288]

[0289] For example, the polymerizable compound having a carbon-carbon double bond at the terminal may, in addition to the compound represented by the chemical formula 5-1, chemical formula 5-2 or chemical formula 5-3, include ethylene glycol diacrylate, triethylene glycol diacrylate, 1,4-butanediol diacrylate, neopentyl glycol diacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, dipentaerythritol diacrylate, dipentaerythritol triacrylate, dipentaerythritol pentaacrylate, pentaerythritol hexaacrylate, bisphenol A diacrylate, trimethylolpropane triacrylate, novolac epoxy acrylate, ethylene glycol dimethacrylate, triethylene glycol dimethacrylate, propylene glycol dimethacrylate, 1,4-butanediol dimethacrylate, 1,6-hexanedioldimethacrylate or a combination thereof may be further included.

[0290] In addition, the photopolymerizable monomer having a carbon-carbon double bond at the terminal may further include a monomer generally used in a conventional thermosetting or photocurable composition, and for example, the monomer may further include an oxetane-based compound such as bis[1-ethyl(3-oxetanyl)]methyl ether.

[0291] Meanwhile, a monofunctional or polyfunctional ester of (meth)acrylic acid having at least one ethylenically unsaturated double bond may be used as the photopolymerizable monomer.

[0292] Since the above photopolymerizable monomer has the above ethylenically unsaturated double bond, sufficient polymerization occurs upon exposure to light in the pattern forming process, thereby forming a pattern with excellent heat resistance, light resistance, and chemical resistance.

[0293] Specific examples of the above photopolymerizable monomers include ethylene glycol di(meth)acrylate, diethylene glycol di(meth)acrylate, triethylene glycol di(meth)acrylate, propylene glycol di(meth)acrylate, neopentyl glycol di(meth)acrylate, 1,4-butanediol di(meth)acrylate, 1,6-hexanediol di(meth)acrylate, bisphenol A di(meth)acrylate, pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, pentaerythritol hexa(meth)acrylate, dipentaerythritol di(meth)acrylate, dipentaerythritol tri(meth)acrylate, dipentaerythritol Examples thereof include penta(meth)acrylate, dipentaerythritol hexa(meth)acrylate, bisphenol A epoxy(meth)acrylate, ethylene glycol monomethyl ether (meth)acrylate, trimethylol propane tri(meth)acrylate, tris(meth)acryloyloxyethyl phosphate, and novolac epoxy (meth)acrylate.

[0294] Examples of commercially available products of the above photopolymerizable monomers are as follows. An example of the monofunctional ester of (meth)acrylic acid is Aronix M-101 from Toagosei Chemical Industry Co., Ltd. ® , East M-111 ® , East M-114 ® KAYARAD TC-110S from Nihon Kayaku Co., Ltd. ® , Dong TC-120S ® Back; V-158 of Osaka Yuki Kagaku Kogyo Co., Ltd. ® , V-2311 ® Examples of the bifunctional ester of the above (meth)acrylic acid include Aronix M-210 from Toagosei Kagaku Kogyo Co., Ltd. ® , East M-240 ® , East M-6200 ® KAYARAD HDDA of Nihon Kayaku Co., Ltd. ® , Dong HX-220 ® , East R-604® Back; V-260 from Osaka Yuki Kagaku Kogyo Co., Ltd. ® , V-312 ® , V-335 HP ® Examples of the trifunctional ester of the above (meth)acrylic acid include Aronix M-309 from Toagosei Chemical Co., Ltd. ® , East M-400 ® , East M-405 ® , East M-450 ® , East M-7100 ® , East M-8030 ® , East M-8060 ® KAYARAD TMPTA from Nihon Kayaku Co., Ltd. ® , East DPCA-20 ® , East-30 ® , East-60 ® , East-120 ® Back; V-295 of Osaka Yuki Kayaku High School Co., Ltd. ® , East-300 ® , East-360 ® , Dong-GPT ® , Dong-3PA ® , East-400 ® The above products can be used alone or in combination of two or more.

[0295] The above photopolymerizable monomer may be used after being treated with an acid anhydride to provide better developing properties.

[0296] The photopolymerizable monomer may be included in an amount of 1 wt% to 10 wt%, 1 wt% to 8 wt%, for example, 2 wt% to 5 wt%, based on the total amount of the curable composition. When the photopolymerizable monomer is included within the above range, the optical properties of the quantum dot can be improved, and sufficient curing occurs upon exposure in the pattern forming process, resulting in excellent reliability. In addition, the heat resistance, light resistance, chemical resistance, resolution, and adhesion of the pattern are also excellent.

[0297]

[0298] (B) Photopolymerization initiator

[0299] The solvent-based curable composition according to one embodiment may further comprise a photopolymerization initiator.

[0300] The above photopolymerization initiator is an initiator generally used in a photosensitive resin composition, and examples thereof include, but are not limited to, acetophenone-based compounds, benzophenone-based compounds, thioxanthone-based compounds, benzoin-based compounds, triazine-based compounds, oxime-based compounds, and aminoketone-based compounds.

[0301] Examples of the above acetophenone compounds include 2,2'-diethoxy acetophenone, 2,2'-dibutoxy acetophenone, 2-hydroxy-2-methylpropiophenone, pt-butyltrichloro acetophenone, pt-butyldichloro acetophenone, 4-chloro acetophenone, 2,2'-dichloro-4-phenoxy acetophenone, 2-methyl-1-(4-(methylthio)phenyl)-2-morpholinopropan-1-one, 2-benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butan-1-one, etc.

[0302] Examples of the above benzophenone compounds include benzophenone, benzoyl benzoate, methyl benzoyl benzoate, 4-phenyl benzophenone, hydroxybenzophenone, acrylated benzophenone, 4,4'-bis(dimethylamino)benzophenone, 4,4'-bis(diethylamino)benzophenone, 4,4'-dimethylaminobenzophenone, 4,4'-dichlorobenzophenone, 3,3'-dimethyl-2-methoxybenzophenone, etc.

[0303] Examples of the above thioxanthone compounds include thioxanthone, 2-methylthioxanthone, isopropyl thioxanthone, 2,4-diethyl thioxanthone, 2,4-diisopropyl thioxanthone, 2-chlorothioxanthone, etc.

[0304] Examples of the above benzoin compounds include benzoin, benzoin methyl ether, benzoin ethyl ether, benzoin isopropyl ether, benzoin isobutyl ether, benzyldimethyl ketal, etc.

[0305] Examples of the above triazine compounds include 2,4,6-trichloro-s-triazine, 2-phenyl-4,6-bis(trichloromethyl)-s-triazine, 2-(3',4'-dimethoxystyryl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4'-methoxynaphthyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-triazine, 2-(p-tolyl)-4,6-bis(trichloromethyl)-s-triazine, 2-biphenyl-4,6-bis(trichloromethyl)-s-triazine, bis(trichloromethyl)-6-styryl-s-triazine, Examples thereof include 2-(naphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-(4-methoxynaphtho-1-yl)-4,6-bis(trichloromethyl)-s-triazine, 2-4-bis(trichloromethyl)-6-piperonyl-s-triazine, and 2-4-bis(trichloromethyl)-6-(4-methoxystyryl)-s-triazine.

[0306] Examples of the above oxime compounds include O-acyloxime compounds, 2-(O-benzoyloxime)-1-[4-(phenylthio)phenyl]-1,2-octanedione, 1-(O-acetyloxime)-1-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]ethanone, O-ethoxycarbonyl-α-oxyamino-1-phenylpropan-1-one, etc. Specific examples of the O-acyl oxime compounds include 1,2-octanedione, 2-dimethylamino-2-(4-methylbenzyl)-1-(4-morpholin-4-yl-phenyl)-butan-1-one, 1-(4-phenylsulfanylphenyl)-butane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1,2-dione-2-oxime-O-benzoate, 1-(4-phenylsulfanylphenyl)-octane-1-oneoxime-O-acetate, and 1-(4-phenylsulfanylphenyl)-butan-1-oneoxime-O-acetate.

[0307] Examples of the above aminoketone compounds include 2-Benzyl-2-dimethylamino-1-(4-morpholinophenyl)-butanone-1.

[0308] In addition to the above compound, the photopolymerization initiator may also include a carbazole compound, a diketone compound, a sulfonium borate compound, a diazo compound, an imidazole compound, a biimidazole compound, etc.

[0309] The above photopolymerization initiator may also be used together with a photosensitizer that causes a chemical reaction by absorbing light, becoming excited, and then transferring the energy.

[0310] Examples of the above photosensitizer include tetraethylene glycol bis-3-mercapto propionate, pentaerythritol tetrakis-3-mercapto propionate, dipentaerythritol tetrakis-3-mercapto propionate, and the like.

[0311] The solvent-based curable composition according to one embodiment may further include a thermal polymerization initiator together with the photopolymerization initiator.

[0312] Examples of the above thermal polymerization initiator include peroxides, specifically benzoyl peroxide, dibenzoyl peroxide, lauryl peroxide, dilauryl peroxide, di-tert-butyl peroxide, cyclohexane peroxide, methyl ethyl ketone peroxide, hydroperoxides (e.g., tert-butyl hydroperoxide, cumene hydroperoxide), dicyclohexyl peroxydicarbonate, 2,2-azo-bis(isobutyronitrile), t-butyl perbenzoate, etc., and 2,2'-azobis-2-methylpropionitrile, etc., but are not necessarily limited thereto, and any one widely known in the art can be used.

[0313] The photopolymerization initiator may be included in an amount of 0.1 wt% to 1 wt%, for example, 0.3 wt% to 0.7 wt%, based on the total amount of the solvent-borne curable composition. When the photopolymerization initiator is included within the above range, sufficient curing can occur upon exposure to light or thermal curing, thereby obtaining excellent reliability, and a decrease in transmittance due to unreacted initiator can be prevented, thereby preventing a decrease in the optical properties of the quantum dots.

[0314]

[0315] (E) solvent

[0316] The solvent may be, for example, alcohols such as methanol and ethanol; glycol ethers such as ethylene glycol methyl ether, ethylene glycol ethyl ether, and propylene glycol methyl ether; cellosolve acetates such as methyl cellosolve acetate, ethyl cellosolve acetate, and diethyl cellosolve acetate; carbitols such as methylethyl carbitol, diethyl carbitol, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol dimethyl ether, diethylene glycol methylethyl ether, and diethylene glycol diethyl ether; propylene glycol alkyl ether acetates such as propylene glycol monomethyl ether acetate and propylene glycol propyl ether acetate; Ketones such as methyl ethyl ketone, cyclohexanone, 4-hydroxy-4-methyl-2-pentanone, methyl-n-propyl ketone, methyl-n-butyl ketone, methyl-n-amyl ketone, and 2-heptanone; saturated aliphatic monocarboxylic acid alkyl esters such as ethyl acetate, n-butyl acetate, and isobutyl acetate; lactic acid alkyl esters such as methyl lactate and ethyl lactate; hydroxyacetic acid alkyl esters such as methyl hydroxyacetate, ethyl hydroxyacetate, and butyl hydroxyacetate; acetic acid alkoxyalkyl esters such as methoxymethyl acetate, methoxyethyl acetate, methoxybutyl acetate, ethoxymethyl acetate, and ethoxyethyl acetate; 3-Hydroxypropionic acid alkyl esters such as methyl 3-hydroxypropionate and ethyl 3-hydroxypropionate; 3-alkoxypropionic acid alkyl esters such as methyl 3-methoxypropionate, ethyl 3-methoxypropionate, ethyl 3-ethoxypropionate and methyl 3-ethoxypropionate; 2-hydroxypropionic acid alkyl esters such as methyl 2-hydroxypropionate, ethyl 2-hydroxypropionate and propyl 2-hydroxypropionate; 2-alkoxypropionic acid alkyl esters such as methyl 2-methoxypropionate, ethyl 2-methoxypropionate, ethyl 2-ethoxypropionate and methyl 2-ethoxypropionate;2-Hydroxy-2-methylpropionic acid alkyl esters such as methyl 2-hydroxy-2-methylpropionate and ethyl 2-hydroxy-2-methylpropionate; 2-alkoxy-2-methylpropionic acid alkyl esters such as methyl 2-methoxy-2-methylpropionate and ethyl 2-ethoxy-2-methylpropionate; esters such as 2-hydroxyethyl propionate, 2-hydroxy-2-methylethyl propionate, hydroxyethyl acetate and methyl 2-hydroxy-3-methylbutanoate; Or there are compounds of ketone esters such as ethyl pyruvate, and also N-methylformamide, N,N-dimethylformamide, N-methylformanilide, N-methylacetamide, N,N-dimethylacetamide, N-methylpyrrolidone, dimethyl sulfoxide, benzyl ethyl ether, dihexyl ether, acetylacetone, isophorone, caproic acid, caprylic acid, 1-octanol, 1-nonanol, benzyl alcohol, benzyl acetate, ethyl benzoate, diethyl oxalate, diethyl maleate, γ-butyrolactone, ethylene carbonate, propylene carbonate, phenyl cellosolve acetate, etc., but are not limited thereto.;

[0317] For example, it is preferable to use a solvent such as a glycol ether such as ethylene glycol monoethyl ether or ethylene diglycol methyl ethyl ether; an ethylene glycol alkyl ether acetate such as ethyl cellosolve acetate; an ester such as 2-hydroxypropionate ethyl; a carbitol such as diethylene glycol monomethyl ether; a propylene glycol alkyl ether acetate such as propylene glycol monomethyl ether acetate or propylene glycol propyl ether acetate; an alcohol such as ethanol; or a combination thereof.

[0318] For example, the solvent may be a high boiling point solvent including propylene glycol monomethyl ether acetate, dipropylene glycol methyl ether acetate, ethanol, ethylene glycol dimethyl ether, ethylene diglycol methyl ethyl ether, diethylene glycol dimethyl ether, 2-butoxyethanol, N-methylpyrrolidine, N-ethylpyrrolidine, propylene carbonate, γ-butyrolactone, cyclohexyl acetate, or a combination thereof.

[0319] The solvent may be included as a remainder, for example, 50 wt% to 85 wt%, for example, 60 wt% to 80 wt%, based on the total amount of the solvent-based curable composition. When the solvent is included within the above range, the solvent-based curable composition has an appropriate viscosity, and thus can have excellent coatability when spin-coating and slit-based coating are performed on a large area.

[0320]

[0321] light diffuser (or light diffuser dispersion)

[0322] The solvent-based curable composition according to one embodiment may further include a light diffusing agent.

[0323] For example, the light diffusing agent may include barium sulfate (BaSO4), calcium carbonate (CaCO3), titanium dioxide (TiO2), zirconia (ZrO2), or a combination thereof.

[0324] The above-described light diffusing agent reflects light not absorbed by the aforementioned quantum dots and allows the reflected light to be reabsorbed by the quantum dots. In other words, the above-described light diffusing agent can increase the amount of light absorbed by the quantum dots, thereby increasing the photoconversion efficiency of the curable composition.

[0325] The above light diffusing agent has an average particle diameter (D 50 ) may be 150 nm to 250 nm, and specifically, 180 nm to 230 nm. When the average particle diameter of the light diffusing agent is within the above range, it may have a better light diffusing effect and increase the light conversion efficiency.

[0326] The above-mentioned light diffusing agent may be included in an amount of at least six times the weight of the photopolymerization initiator. When the weight of the light diffusing agent is controlled within the above-mentioned weight range compared to the weight of the photopolymerization initiator in the solvent-borne curable composition, the effect of improving the light conversion efficiency by using the light diffusing agent can be maximized, and it can help prevent aggregation between quantum dots.

[0327] The above effect according to the weight control of the light diffusing agent relative to the weight of the photopolymerization initiator can be achieved when having a solvent-based composition composition as in the present disclosure, but may be difficult to achieve in a solvent-free composition composition. That is, in the solvent-based curable composition according to one embodiment, controlling the weight of the light diffusing agent relative to the weight of the photopolymerization initiator may be one of the very important components, along with controlling the structure of the binder resin and the structure of the quantum dot surface modifying material.

[0328]

[0329] Other additives

[0330] To improve the stability and dispersibility of the quantum dots, the solvent-based curable composition according to one embodiment may further include a polymerization inhibitor.

[0331] The above polymerization inhibitor may include, but is not necessarily limited to, a hydroquinone-based compound, a catechol-based compound, or a combination thereof. Since the solvent-based curable composition according to one embodiment further includes the hydroquinone-based compound, the catechol-based compound, or a combination thereof, crosslinking at room temperature can be prevented during exposure after printing (coating) the solvent-based curable composition.

[0332] For example, the hydroquinone-based compound, catechol-based compound, or combinations thereof may include, but are not necessarily limited to, hydroquinone, methyl hydroquinone, methoxyhydroquinone, t-butyl hydroquinone, 2,5-di-t-butyl hydroquinone, 2,5-bis(1,1-dimethylbutyl) hydroquinone, 2,5-bis(1,1,3,3-tetramethylbutyl) hydroquinone, catechol, t-butyl catechol, 4-methoxyphenol, pyrogallol, 2,6-di-t-butyl-4-methylphenol, 2-naphthol, tris(N-hydroxy-N-nitrosophenylaminato-O,O')aluminium, or combinations thereof.

[0333] The above hydroquinone-based compound, catechol-based compound, or a combination thereof may be used in the form of a dispersion, and the polymerization inhibitor in the form of the dispersion may be included in an amount of 0.001 wt% to 3 wt%, for example, 0.1 wt% to 2 wt%, based on the total amount of the solvent-based curable composition. When the polymerization inhibitor is included within the above range, the problem of aging at room temperature can be solved, while at the same time preventing sensitivity degradation and surface peeling.

[0334] In addition, the solvent-based curable composition according to one embodiment may further include malonic acid; 3-amino-1,2-propanediol; a silane coupling agent; a leveling agent; a fluorinated surfactant; or a combination thereof to improve heat resistance and reliability.

[0335] For example, a solvent-based curable composition according to one embodiment may further include a silane coupling agent having a reactive substituent such as a vinyl group, a carboxyl group, a methacryloxy group, an isocyanate group, or an epoxy group to improve adhesion to a substrate, etc.

[0336] Examples of the above silane coupling agent include trimethoxysilyl benzoic acid, γ-methacryl oxypropyl trimethoxysilane, vinyl triacetoxysilane, vinyl trimethoxysilane, γ-isocyanate propyl triethoxysilane, γ-glycidoxy propyl trimethoxysilane, β-(3,4-epoxycyclohexyl)ethyltrimethoxysilane, etc., and these may be used alone or in combination of two or more.

[0337] The above silane coupling agent may be included in an amount of 0.01 to 10 parts by weight based on 100 parts by weight of the solvent-based curable composition. When the silane coupling agent is included within the above range, adhesion, storability, etc. are excellent.

[0338] In addition, the solvent-based curable composition may further include a surfactant, such as a fluorinated surfactant, to improve coating properties and prevent defects, i.e., to improve leveling performance, as needed.

[0339] The above fluorinated surfactant may have a low weight average molecular weight of 4,000 g / mol to 10,000 g / mol, specifically, may have a weight average molecular weight of 6,000 g / mol to 10,000 g / mol. In addition, the fluorinated surfactant may have a surface tension of 18 mN / m to 23 mN / m (measured in a 0.1% propylene glycol monomethyl ether acetate (PGMEA) solution). When the weight average molecular weight and surface tension of the fluorinated surfactant are within the above ranges, the leveling performance can be further improved, and the occurrence of spots can be prevented during high-speed coating, and since the occurrence of bubbles is small and the film defects are small, it provides excellent properties to slit coating, which is a high-speed coating method.

[0340] As the above fluorinated surfactant, BM Chemie's BM-1000 ® , BM-1100 ®Mecha Pack F 142D by Dai Nippon Inki Kagaku Kogyo Co., Ltd. ® , East F 172 ® , East F 173 ® , East F 183 ® Back; Prorad FC-135 from Sumitomo 3M Co., Ltd. ® , East FC-170C ® , East FC-430 ® , East FC-431 ® Saffron S-112 from Asahi Glass Co., Ltd. ® , East S-113 ® , East S-131 ® , East S-141 ® , East S-145 ® SH-28PA from Toray Silicone Co., Ltd. ® , East-190 ® , East-193 ® , SZ-6032 ® , SF-8428 ® Fluorine-based surfactants sold under the names F-482, F-484, F-478, F-554, etc. by DIC Co., Ltd. can be used.

[0341] Additionally, the solvent-based curable composition according to one embodiment may use a silicone-based surfactant together with the aforementioned fluorinated surfactant. Specific examples of the silicone-based surfactant include, but are not limited to, TSF400, TSF401, TSF410, and TSF4440 from Toshiba Silicone Co., Ltd.

[0342] The surfactant, including the fluorinated surfactant, may be included in an amount of 0.01 to 5 parts by weight, for example, 0.1 to 2 parts by weight, based on 100 parts by weight of the solvent-based curable composition. When the surfactant is included within the above range, the phenomenon of foreign substances occurring in the sprayed composition is reduced.

[0343] In addition, the solvent-based curable composition according to one embodiment may further include a certain amount of other additives, such as an antioxidant, within a range that does not impair physical properties.

[0344] Another embodiment provides a cured film manufactured using the solvent-based curable composition described above.

[0345] Since the above cured film is manufactured by curing a solvent-based curable composition according to one embodiment, the difference between the emission wavelength during exposure curing and the emission wavelength during thermal curing after exposure can be controlled to 1 nm or less, thereby ultimately realizing high color reproducibility while also maintaining excellent physical properties such as light efficiency, heat resistance, and light resistance.

[0346] One of the methods for manufacturing the above-mentioned cured film is to manufacture the cured film using a lithography method using the above-mentioned solvent-type curable composition, and the manufacturing method is as follows.

[0347] (1) Application and film formation stage

[0348] The above-described curable composition is applied to a substrate that has undergone a predetermined pretreatment using a spin or slit coating method, a roll coating method, a screen printing method, an applicator method, or the like, to a desired thickness, for example, 2 μm to 10 μm, and then heated at a temperature of 70°C to 90°C for 1 to 10 minutes to remove the solvent, thereby forming a coating film.

[0349] (2) Exposure stage

[0350] In order to form a necessary pattern on the obtained film, a mask of a predetermined shape is interposed, and then an active ray such as UV light of 190 nm to 450 nm, for example, 200 nm to 500 nm, is irradiated. Light sources used for irradiation include low-pressure mercury lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halide lamps, argon gas lasers, etc., and in some cases, X-rays, electron beams, etc. can also be used.

[0351] The exposure dose varies depending on the type, mixing amount, and dry film thickness of each component of the above-mentioned curable composition, but for example, when using a high-pressure mercury lamp, it is 500 mJ / cm 2 Below (based on 365 nm sensor).

[0352] (3) Phenomenon stage

[0353] Following the above exposure step, an alkaline aqueous solution is used as a developer to dissolve and remove unnecessary portions, thereby leaving only the exposed portions to form an image pattern. That is, when developing with an alkaline developer, the unexposed portions are dissolved, and an image color filter pattern is formed.

[0354] (4) Post-processing stage

[0355] The image pattern obtained by the above phenomenon can be cured by reheating or irradiating with active rays, etc., to obtain a pattern superior in terms of heat resistance, light resistance, adhesion, crack resistance, chemical resistance, high strength, storage stability, etc.

[0356] Another embodiment provides a color filter including the cured film and a display device including the color filter.

[0357]

[0358] Hereinafter, preferred embodiments of the present invention are described. However, the following examples are only preferred embodiments of the present invention, and the present invention is not limited to the following examples.

[0359]

[0360] (Synthesis of ligand compounds)

[0361] Synthesis Example 1

[0362] 150.22 g of hydroxydicyclopentadiene and 0.1 g of KOH are placed in a high-pressure reactor and the internal temperature is raised to 80°C. While controlling the internal pressure, 176 g of ethylene oxide is slowly added to synthesize HDCP-4. 326.22 g of HDCP-4 is placed in a two-necked round-bottom flask and sufficiently dissolved in 800 mL of THF. 44 g of NaOH and 100 mL of water are then added at 0°C and sufficiently dissolved until a clear solution is obtained. A solution of 210 g of para-toluene sulfonyl chloride in 300 mL of THF is slowly injected at 0°C. The injection is carried out for 2 hours, and the reactor is stirred at room temperature for 12 hours. After the reaction is complete, an excess of methylene chloride is added, stirred, and a saturated NaHCO3 solution is added to perform extraction, titration, and moisture removal. After removing the solvent, the reactor is dried in a dry oven for 24 hours. The obtained dried product (481.2 g) is placed in a two-neck round bottom flask and stirred thoroughly in 500 mL of ethanol. Then, 91.2 g of Thiourea is added, dispersed, and refluxed at 80°C for 12 hours. Afterwards, an aqueous solution of 60 g of NaOH dissolved in 200 mL of water is injected, stirred for 5 hours more, an excess of methylene chloride is added, stirred, and then an aqueous hydrochloric acid solution is added, and extraction, titration, moisture removal, and solvent removal are sequentially performed. After drying in a vacuum oven for 24 hours, a compound represented by the following chemical formula E-1 is obtained.

[0363] [Chemical Formula E-1]

[0364]

[0365] Synthesis Example 2

[0366] 100g of PH-4 (Hanong Chemical) and 22g of NaOH are sufficiently dispersed in 500mL of THF and 100mL of H2O under a nitrogen atmosphere. Cool the dispersion to 0℃ and add dropwise a THF solution containing p-toluenesulfonic acid (15g). After the addition, stir at room temperature for 15 hours. Stop the reaction by adding excess water, add ethyl acetate (EA), and perform extraction, neutralization, concentration, purification, and drying in a vacuum. Dissolve 50g of the obtained product in 300mL of ethyl alcohol, add 12.5g of thiourea, and stir under reflux for 15 hours. Add NaOH solution and stir for an additional 5 hours. After the reaction is complete, purification is performed through extraction, neutralization, and concentration. Dry in a vacuum oven for 24 hours to obtain a compound represented by the following chemical formula C-1.

[0367] [Chemical Formula C-1]

[0368]

[0369] Synthesis Example 3

[0370] A compound represented by the following chemical formula C-2 is obtained by performing the same procedure as in Synthesis Example 2 except that 16-mercapto-1-hexanol is used instead of 6-mercapto-1-hexanol.

[0371] [Chemical Formula C-2]

[0372]

[0373]

[0374] (Synthesis of binder resin)

[0375] Synthesis Example 4

[0376] To a mixture of hydrogenated bisphenol-A glycidyl ether (3.3 g) and toluene (18 g), methacrylic acid (1.8 g), tetrabutylammonium bromide (0.1 g), and butylated hydroxytoluene (0.01 g) were added, and the mixture was stirred at 90°C for 12 hours. The reaction mixture was sequentially extracted with 5% HCl aqueous solution (19 mL) and water (19 mL), and the separated organic layer was concentrated to remove the organic solvent.

[0377] Bicyclo[2.2.2]oct-7-ene-2,3,5,6-tetracarboxylic Dianhydride (1.6 g), 1-Cyclohexene-1,2-dicarboxylic Anhydride (0.4 g), Tetrabutylammonium bromide and PGMEA (5.2 g) solvent were added to the above mixture, and the mixture was reacted for 20 hours while maintaining the temperature at 100°C and cooled to synthesize a binder resin (weight average molecular weight: 8700 g / mol) having a structure represented by the following chemical formula E-2.

[0378] [Chemical Formula E-2]

[0379]

[0380] Synthesis Example 5

[0381] To a mixture of 9,9-Bis(4-glycidyloxyphenyl)fluorene (2.2 g), hydrogenated bisphenol-A glycidyl ether (1.6 g), and toluene (20 g), methacrylic acid (1.9 g), tetrabutylammonium bromide (0.1 g), and butylated hydroxytoluene (0.01 g) were added, and the mixture was stirred at 90°C for 12 hours. The reaction mixture was sequentially extracted with 5% HCl aqueous solution (20 mL) and water (20 mL), and the separated organic layer was concentrated to remove the organic solvent.

[0382] 1,2,3,4-Cyclobutanetetracarboxylic Dianhydride (2.3 g), 1-Cyclohexene-1,2-dicarboxylic Anhydride (0.7 g), Tetrabutylammonium bromide and PGMEA (9 g) solvent were added to the above mixture, and the mixture was reacted for 20 hours while maintaining the temperature at 100°C and cooled to synthesize a binder resin (weight average molecular weight: 9300 g / mol) having a structure represented by the following chemical formula E-3.

[0383] [Chemical Formula E-3]

[0384]

[0385]

[0386] (Manufacture of quantum dot dispersions surface-modified with ligands)

[0387] Manufacturing Example 1

[0388] Place a magnetic bar in a three-necked round-bottomed flask, and measure out a green quantum dot-CHA (cyclohexyl acetate) solution (solid content 26 wt%). Add the compound of Synthesis Example 1 and 2-Carboxyethyl acrylate (Sigma-Aldrich) to it.

[0389] Mix well for about 1 minute, then stir at 80°C in a nitrogen atmosphere. After the reaction is complete, cool to room temperature and add the quantum dot reaction solution to cyclohexane to precipitate. Centrifuge to separate the precipitated quantum dot powder from the solvent. Pour off the solvent and discard it, and dry the precipitate thoroughly in a vacuum oven for one day to obtain surface-modified quantum dots.

[0390] 40 g of the above surface-modified quantum dots were stirred with 52.999 g of a monomer (1,6-hexanediol diacrylate; Miwon Corporation) represented by the following chemical formula 5-2 for 12 hours to obtain a surface-modified quantum dot dispersion.

[0391] [Chemical Formula 5-2]

[0392]

[0393] Manufacturing Example 2

[0394] The same procedure as in Manufacturing Example 1 was followed, except that Mono(2-acryloyloxyethyl) Succinate (TCI) was used instead of the above 2-Carboxyethyl acrylate (Sigma-Aldrich).

[0395] Manufacturing Example 3

[0396] The same procedure as in Preparation Example 1 was followed, except that the compound of Synthesis Example 2 was used instead of the compound of Synthesis Example 1.

[0397] Manufacturing Example 4

[0398] The same procedure as in Preparation Example 1 was followed, except that the compound of Synthesis Example 3 was used instead of the compound of Synthesis Example 1.

[0399]

[0400] (Preparation of solvent-based curable composition)

[0401] Using the components mentioned below, curable compositions according to Examples 1 to 6 and Comparative Examples 1 and 2 were prepared with the compositions shown in Table 1 below (unit: weight %).

[0402]

[0403] (A) Quantum dots

[0404] (A-1) Quantum dot dispersion solution of manufacturing example 1

[0405] (A-2) Quantum dot dispersion solution of manufacturing example 2

[0406] (A-3) Quantum dot dispersion solution of manufacturing example 3

[0407] (A-4) Quantum dot dispersion solution of manufacturing example 4

[0408] (B) Photopolymerization initiator

[0409] TPO-L (Polynetron)

[0410] (C) Binder resin

[0411] (C-1) Binder resin of Synthesis Example 4

[0412] (C-2) Binder resin of Synthesis Example 5

[0413] (C-3) Acrylic binder resin (RY67-1, Showa Denko)

[0414] (C-4) Cardo-based binder resin (TA01, Takoma)

[0415] (D) Photopolymerizable monomer

[0416] Dipentaerythritol hexaacrylate (DPHA, Nippon Kayaku)

[0417] (E) solvent

[0418] Propylene glycol monomethyl ether acetate (PGMEA, Sigma-Aldrich)

[0419] (F) Light diffuser

[0420] Titanium dioxide dispersion (TiO2 solid content 20 wt%, average particle size: 200 nm, Dito Technology Co., Ltd.)

[0421] (G) Other additives

[0422] Leveling agent (F-554, DIC)

[0423]

[0424] Example 1 Example 2 Example 3 Example 4 Example 5 Example 6 Comparative Example 1 Comparative Example 2 Quantum dot (A-1) 15 15 15 (A-2) 15 15 15 (A-3) 15 (A-4) 15 Photopolymerization initiator 0.5 0.5 0.5 0.5 0.5 0.5 0.5 0.5 Binder resin (C-1) 4.5 4.5 4.5 4.5 4.5 (C-2) 4.5 4.5 (C-3) 4.5 4.5 (C-4) 1.5 1.5 1.5 1.5 1.5 1.5 1.5 1.5 1.5 Photopolymerizable monomer 3.5 3.5 3.5 3.5 3.5 3.5 3.5 Solvent 7 0 7 0 7 0 7 0 7 0 7 0 7 0 Light diffusing agent 3 3 3 3 3 3 Other Additive22222222

[0425] Evaluation: Evaluation of light efficiency and light resistance reliability of curable compositions The light resistance reliability of each of the curable compositions according to Examples 1 to 6 and Comparative Examples 1 and 2 was evaluated, and the results are shown in Table 2 below (unit: %).

[0426]

[0427] (Evaluation method)

[0428] The curable composition manufactured above was used to make a 2 cm x 2 cm single-film specimen, and the change in luminous efficiency over time was measured under blue 100,000 nit light source conditions using a self-made blue LED surface light source.

[0429] The single-film specimens were measured for luminous efficacy and temporal luminance using an integrating sphere device (QE-2100, otsuka electronics) and an in-line luminance meter (M7000, Mcscience).

[0430] The luminous efficiency was measured after exposure and then after curing, and compared and evaluated based on the maintenance rate (%) of the luminous efficiency.

[0431] The luminous reliability was evaluated by comparing the luminance retention rate (%) after 500 hours based on the initial measurement value of 100%.

[0432]

[0433] Light Efficiency Light Resistance Reliability Example 19480 Example 29376 Example 39481 Example 49378 Example 59344 Example 69345 Comparative Example 19329 Comparative Example 29428

[0434] From the above Table 2, it can be confirmed that the solvent-type curable composition according to one embodiment can significantly improve only the light resistance reliability without reducing the light efficiency compared to the conventional solvent-type curable composition.

[0435] The present invention is not limited to the above-described embodiments, but can be manufactured in a variety of different forms. Those skilled in the art will appreciate that the present invention can be implemented in other specific forms without altering the technical spirit or essential characteristics of the present invention. Therefore, the embodiments described above should be understood as illustrative in all respects and not restrictive.

Claims

(A) Quantum dots; (B) Photopolymerization initiator; (C) A binder resin comprising a structural unit of the following chemical formula 1; (D) a photopolymerizable monomer; and (E) solvent A curable composition comprising: [Chemical Formula 1] In the above chemical formula 1, L 1 Inland L 7 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group, R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group, X 1 is a substituted or unsubstituted C1 to C20 alkylene group or a substituted or unsubstituted divalent fluorenylidene group, Y 1 is a residue derived from an acid anhydride. In the first paragraph, The above binder resin is a curable composition comprising a group represented by the following chemical formula 2 at at least one of both terminals: [Chemical Formula 2] In the above chemical formula 2, L 1 Inland L 6 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group, R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group, X 2 is a substituted or unsubstituted C1 to C20 alkylene group, Y 2 is a residue derived from an acid anhydride. In the first paragraph, The above binder resin is a curable composition comprising a first binder resin containing a structural unit represented by the following chemical formula 1-1, a second binder resin containing a structural unit represented by the following chemical formula 1-2, or a combination thereof: [Chemical Formula 1-1] [Chemical Formula 1-2] In the above chemical formula 1, L 3 Inland L 7 are each independently a single bond, a substituted or unsubstituted C1 to C20 alkylene group, a substituted or unsubstituted C3 to C20 cycloalkylene group, a substituted or unsubstituted C6 to C20 arylene group, or a substituted or unsubstituted C2 to C20 heteroarylene group, L 8 and L 9 are each independently a substituted or unsubstituted C3 to C20 cycloalkylene group, L 10 and L 11 are each independently a substituted or unsubstituted C6 to C20 arylene group, R 1 and R 2 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group, X 3 is a substituted or unsubstituted C1 to C20 alkylene group, X 4 is a substituted or unsubstituted divalent fluorenylidene group, Y 1 is a residue derived from an acid anhydride. In the first paragraph, The above two fluorenylidene groups are curable compositions represented by the following chemical formula X. [chemical formula X] In the first paragraph, Above Y 1 A curable composition represented by any one of the following chemical formulas Y-1 to Y-8. [Chemical formula Y-1] [Chemical formula Y-2] [Chemical formula Y-3] [Chemical formula Y-4] [Chemical formula Y-5] (In the above chemical formula Y-5, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 allylamine group) [Chemical formula Y-6] [Chemical formula Y-7] [Chemical formula Y-8] In the second paragraph, Above Y 2 A curable composition represented by any one of the following chemical formulas Y-9 to Y-15. [Chemical formula Y-9] (In the above chemical formula Y-9, R b and R c are each independently a hydrogen atom, a substituted or unsubstituted C1 to C20 alkyl group, an ester group or an ether group) [Chemical formula Y-10] [Chemical formula Y-11] [Chemical formula Y-12] [Chemical formula Y-13] (In the above chemical formula Y-13, R d is O, S, NH, a substituted or unsubstituted C1 to C20 alkylene group, a C1 to C20 alkylamine group, or a C2 to C20 allylamine group) [Chemical formula Y-14] [Chemical formula Y-15] In the first paragraph, The above quantum dot is a curable composition having a maximum fluorescence emission wavelength of 500 nm to 680 nm. In the first paragraph, The above quantum dot is a curable composition surface-modified with a compound represented by the following chemical formula 3 and / or a compound represented by the following chemical formula 4: [Chemical Formula 3] [Chemical Formula 4] In the above chemical formulas 3 and 4, R a is a hydrogen atom or a substituted or unsubstituted C1 to C20 alkyl group, R x is a monovalent functional group containing a reactive group and a C3 to C20 cycloalkane ring, L a , L b , L x and L y are each independently a substituted or unsubstituted C1 to C20 alkylene group, X is a sulfur atom or an oxygen atom, n is an integer from 0 to 10, m is an integer between 2 and 10. In the first paragraph, A curable composition wherein the photopolymerizable monomer has a molecular weight of 220 g / mol to 1,000 g / mol. In the first paragraph, The above photopolymerizable monomer is a curable composition represented by the following chemical formula 5: [Chemical Formula 5] In the above chemical formula 5, R 3 and R 4 are each independently a hydrogen atom or a substituted or unsubstituted C1 to C10 alkyl group, L 12 and L 14 are each independently a substituted or unsubstituted C1 to C10 alkylene group, L 13 is a substituted or unsubstituted C1 to C10 alkylene group or ether group (*-O-*) am. In the first paragraph, The above curable composition, with respect to the total amount of the above curable composition 10 wt% to 30 wt% of the above (A) quantum dots; 0.1 wt% to 1 wt% of the above (B) photopolymerization initiator; 1 to 10 wt% of the above (C) binder resin; 1 to 10 wt% of the above (D) photopolymerizable monomer; and Above (E) solvent residue A curable composition comprising: In the first paragraph, The above curable composition further comprises a light diffusing agent. In paragraph 12, The above light diffusing agent is a curable composition comprising barium sulfate, calcium carbonate, titanium dioxide, zirconia or a combination thereof. In the first paragraph, The curable composition further comprises a polymerization inhibitor; malonic acid; 3-amino-1,2-propanediol; a silane coupling agent; a leveling agent; a fluorinated surfactant; or a combination thereof. A cured film manufactured using a composition according to any one of claims 1 to 14. A color filter comprising a cured film of Article 15.

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