Film-coated article, housing, and electronic device

Abstract

A film-coated article, a housing, and an electronic device. The film-coated article comprises a substrate, a buffer layer, and an optical layer. The buffer layer is located on at least part of the surface of one side of the substrate. The optical layer is located on the surface of the side of the buffer layer away from the substrate. The optical layer comprises at least one first sub-layer and at least one second sub-layer, and the first sub-layers and the second sub-layers are alternately stacked. The refractive index of the first sub-layer is greater than the refractive index of the second sub-layer. The thickness of the buffer layer is positively correlated with the sum of a first preset thickness and a second preset thickness. The first preset thickness is the thickness of the buffer layer required by all first sub-layers comprised in the optical layer, and is obtained at least on the basis of the thickness of the first sub-layers. The second preset thickness is the thickness of the buffer layer required by all second sub-layers comprised in the optical layer, and is obtained at least on the basis of the thickness of the second sub-layers.

Description

Covered product, shell and electronic device

[0001] This application claims priority to Chinese Patent Application No. 202410893401.8, filed on July 3, 2024, the entire contents of which are incorporated herein by reference. TECHNICAL FIELD

[0002] The present disclosure relates to the technical field of material processing, and in particular to a covered product, a shell and an electronic device. BACKGROUND

[0003] The shell of an electronic device includes a covered product. The material of the covered product usually includes at least one of glass, plastic and metal. SUMMARY

[0004] The present disclosure provides a covered product, a shell and an electronic device, aiming to improve the impact resistance of the covered product and improve the strength of the covered product.

[0005] In one aspect, a covered product is provided. The covered product includes a substrate, a buffer layer and an optical layer. The buffer layer is located on at least part of the surface of one side of the substrate. The optical layer is located on the surface of one side of the buffer layer away from the substrate. The optical layer includes at least one first sub-layer and at least one second sub-layer, and the first sub-layer and the second sub-layer are alternately stacked. The refractive index of the first sub-layer is greater than the refractive index of the second sub-layer.

[0006] The thickness of the buffer layer is positively correlated with the sum of a first preset thickness and a second preset thickness. The first preset thickness is the thickness of the buffer layer required by all the first sub-layers included in the optical layer. The first preset thickness is obtained at least according to the thickness of the first sub-layer. The second preset thickness is the thickness of the buffer layer required by all the second sub-layers included in the optical layer. The second preset thickness is obtained at least according to the thickness of the second sub-layer.

[0007] By arranging the buffer layer in the covered product, and locating the buffer layer on at least part of the surface of one side of the substrate and the optical layer on the surface of one side of the buffer layer away from the substrate, the buffer layer can play a buffering role between the substrate and the optical layer, effectively alleviate the influence of the stress of the optical layer itself on the substrate, improve the impact resistance of the substrate, and further improve the impact resistance of the covered product and the strength of the covered product.

[0008] By positively correlating the thickness of the buffer layer with the sum of the first preset thickness and the second preset thickness, and the first preset thickness being the thickness of the buffer layer required by all the first sub-layers contained in the optical layer, the first preset thickness being obtained at least according to the thickness of the first sub-layer, and the second preset thickness being the thickness of the buffer layer required by all the second sub-layers contained in the optical layer, the second preset thickness being obtained at least according to the thickness of the second sub-layer, the stress buffering effect of the buffer layer on the substrate and the optical layer can be ensured, while the influence of the buffer layer on the bonding strength between the substrate and the optical layer is avoided, and the service life of the film-coated product is improved.

[0009] In another aspect, a housing is provided. The housing includes the film-coated product as described above.

[0010] In yet another aspect, an electronic device is provided. The electronic device includes a display panel, and the housing as described above, the display panel and the housing being stacked.

[0011] It can be understood that the housing and the electronic device provided by the above embodiments of the present disclosure can achieve the beneficial effects as described above for the film-coated product, which will not be repeated here. BRIEF DESCRIPTION OF DRAWINGS

[0012] In order to more clearly illustrate the technical solutions of the embodiments of the present disclosure, the drawings needed in the embodiment description will be briefly introduced below. However, the drawings in the following description are only some embodiments of the present disclosure, and other drawings can also be obtained according to these drawings without creative labor for those skilled in the art.

[0013] FIG. 1 is a structural diagram of an electronic device according to some embodiments;

[0014] FIG. 2A is another structural diagram of an electronic device according to some embodiments;

[0015] FIG. 2B is yet another structural diagram of an electronic device according to some embodiments;

[0016] FIG. 2C is yet another structural diagram of an electronic device according to some embodiments;

[0017] FIG. 3A is a cross-sectional view of a housing according to some embodiments;

[0018] FIG. 3B is another cross-sectional view of a housing according to some embodiments;

[0019] FIG. 4 is a structural diagram of a substrate in a film-coated product according to some embodiments;

[0020] FIG. 5 is a force diagram of a substrate in a film-coated product according to some embodiments;

[0021] Figure 6A is a cross-sectional view of a film-covered article, according to some embodiments;

[0022] Figure 6B is another cross-sectional view of a film-covered article, according to some embodiments;

[0023] Figure 7 is a wavelength-reflectance plot of the substrate in Comparative Example D0;

[0024] Figure 8 is a wavelength-reflectance plot of the film-covered article in Comparative Example D1 ;

[0025] Figure 9 is a wavelength-reflectance plot of the film-covered article in Example S1 ;

[0026] Figure 10 is a wavelength-reflectance plot of the film-covered article in Comparative Example D2;

[0027] Figure 11 is a wavelength-reflectance plot of the film-covered article in Example S2;

[0028] Figure 12 is a wavelength-reflectance plot of the film-covered article in Comparative Example D3;

[0029] Figure 13 is a wavelength-reflectance plot of the film-covered article in Example S3;

[0030] Figure 14 is a wavelength-reflectance plot of the film-covered article in Comparative Example D4;

[0031] Figure 15 is a wavelength-reflectance plot of the film-covered article in Example S4;

[0032] Figure 16 is a wavelength-reflectance plot of the film-covered article in Comparative Example D5;

[0033] Figure 17 is a wavelength-reflectance plot of the film-covered article in Example S5;

[0034] Figure 18 is a wavelength-reflectance plot of the film-covered article in Comparative Example D6;

[0035] Figure 19 is a wavelength-reflectance plot of the film-covered article in Example S6;

[0036] Figure 20 is a wavelength-reflectance plot of the film-covered article in Comparative Example D7;

[0037] Figure 21 is a wavelength-reflectance plot of the film-covered article in Example S7;

[0038] Figure 22 is a wavelength-reflectance plot of the film-covered article in Comparative Example D8;

[0039] Figure 23 is a wavelength-reflectance plot of the film-covered article in Example S8;

[0040] Figure 24 is a wavelength-reflectance plot for the coated article in Comparative Example D9;

[0041] Figure 25 is a wavelength-reflectance plot for the coated article in Example S9;

[0042] Figure 26 is a wavelength-reflectance plot for the coated article in Comparative Example D10;

[0043] Figure 27 is a wavelength-reflectance plot for the coated article in Example S10;

[0044] Figure 28 is a wavelength-transmittance plot for the coated article in Comparative Example D11;

[0045] Figure 29 is a wavelength-transmittance plot for the coated article in Example S11;

[0046] Figure 30 is a wavelength-transmittance plot for the coated article in Comparative Example D12;

[0047] Figure 31 is a wavelength-transmittance plot for the coated article in Example S12;

[0048] Figure 32 is a wavelength-transmittance plot for the coated article in Comparative Example D13;

[0049] Figure 33 is a wavelength-transmittance plot for the coated article in Example S13;

[0050] Figure 34 is a wavelength-transmittance plot for the coated article in Comparative Example D14;

[0051] Figure 35 is a wavelength-transmittance plot for the coated article in Example S14;

[0052] Figure 36A is yet another cross-sectional view of a coated article according to some embodiments;

[0053] Figure 36B is yet another cross-sectional view of a coated article according to some embodiments. DETAILED DESCRIPTION

[0054] The technical solutions in some embodiments of the present disclosure will be described clearly and completely below with reference to the drawings, however, the described embodiments are only some of the embodiments of the present disclosure, rather than all the embodiments. Based on the embodiments provided in the present disclosure, all other embodiments obtained by those of ordinary skill in the art belong to the scope of protection of the present disclosure.

[0055] In the description of the disclosure, it needs to be understood that the terms "center", "upper", "lower", "front", "back", "left", "right", "vertical", "horizontal", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation on the disclosure.

[0056] Unless the context clearly requires otherwise, throughout the description and the claims, the term "comprise", "comprising", and the like are to be construed in an open, inclusive sense, as "including, but not limited to". In the description of the specification, the terms "one embodiment", "some embodiments", "exemplary embodiment", "exemplarily" or "some examples" and the like are intended to mean that a particular feature, structure, material, or characteristic included in the embodiment or example is included in at least one embodiment or example of the disclosure. The illustrative representation of the above terms does not necessarily refer to the same embodiment or example. In addition, the specific features, structures, materials or characteristics described can be included in any one or more embodiments or examples in any appropriate manner.

[0057] Hereinafter, the terms "first", "second" are only for descriptive purposes, and cannot be understood as indicating or implying relative importance or implicitly indicating the number of technical features indicated. Therefore, the features defined with "first", "second" can explicitly or implicitly include one or more features. In the description of the embodiments of the disclosure, unless otherwise stated, the meaning of "a plurality of" is two or more.

[0058] In describing some embodiments, "coupled" and "connected", and their derivatives, can be used. For example, the term "connected" can be used to describe some embodiments to indicate that two or more components have direct physical or electrical contact with each other. For another example, the term "coupled" can be used to describe some embodiments to indicate that two or more components have direct physical or electrical contact. However, the term "coupled" can also mean that two or more components have no direct contact with each other, but still cooperate or interact with each other. The embodiments disclosed herein are not necessarily limited by the content herein.

[0059] In the context of the disclosure, the meanings of "on", "above", and "over" should be interpreted in the broadest way, so that "on" not only means "directly on", but also includes the meaning of "on" with intermediate features or layers therebetween, and "above" or "over" not only means "above" or "over", but also includes the meaning of "above" or "over" without intermediate features or layers therebetween (i.e., directly on something).

[0060] In the present disclosure, the term "layer" refers to a portion of material that includes a region having a thickness. A layer can extend over an entire underlying or overlying structure, or can have a scope that is less than the underlying or overlying structure. Further, a layer can be a region of a continuous structure that is homogenous or non-homogenous, having a thickness that is less than the thickness of the continuous structure. For example, a layer can be between any pair of horizontal planes that are between a top surface and a bottom surface of a continuous structure, or at the top and bottom surfaces of the continuous structure. Layers can extend horizontally, vertically, and / or along a tapered surface. A substrate can be a layer, can include one or more layers therein, and / or can have one or more layers thereon, thereabove, and / or therebelow. A layer can include multiple layers. For example, an interconnect layer can include one or more conductor and contact layers (in which interconnect lines and / or vertical interconnect via (PIV) contacts are formed) and one or more dielectric layers.

[0061] Exemplary embodiments are described herein with reference to cross-sectional and / or plan view illustrations that are idealized examples. In the drawings, the thickness of layers and regions are exaggerated for clarity. Accordingly, variations from the shapes of the illustrations as a result, for example, of manufacturing techniques and / or tolerances, are to be expected. Thus, the exemplary embodiments should not be construed as limited to the particular shapes of regions as illustrated herein but are to include deviations in shapes that result, for example, from manufacturing. For example, an etched region illustrated as a rectangle will typically have rounded or curved features. Thus, the regions illustrated in the figures are schematic in nature and their shapes are not intended to illustrate the actual shape of a region of a device and are not intended to limit the scope of the exemplary embodiments.

[0062] To facilitate the following description, an XYZ coordinate system is established. A third direction Z is a thickness direction of the electronic device, an XY plane is perpendicular to the third direction Z, a first direction X and a second direction Y intersect with each other. For example, the first direction X and the second direction Y are perpendicular to each other.

[0063] As shown in FIG. 1, some embodiments of the present disclosure provide an electronic device 1000.

[0064] For example, the electronic device 1000 described above can be at least one of a mobile phone, a tablet computer, a desktop computer, a laptop computer, a handheld computer, a notebook computer, an Ultra-mobile Personal Computer (UMPC), a netbook, a cellular phone, a Personal Digital Assistant (PDA), an Augmented Reality (AR) device, a Virtual Reality (VR) device, an Artificial Intelligence (AI) device, a wearable device, an in-vehicle device, a smart home device, or a smart city device, etc. The present disclosure does not specially limit the form of the electronic device 1000 described above. In FIG. 1, the electronic device 1000 is taken as an example of a mobile phone.

[0065] In some embodiments, as shown in FIGS. 2A, 2B, and 2C, each of FIGS. 2A, 2B, and 2C is a structural diagram of an electronic device 1000 according to some embodiments. The electronic device 1000 includes a housing 100 and a display panel 200. The housing 100 and the display panel 200 are arranged in a stack.

[0066] For example, referring to FIG. 2A, the housing 100 can be arranged in a stack on a display side 200a of the display panel 200.

[0067] Alternatively, referring to FIG. 2B, the housing 100 can be arranged in a stack on a non-display side 200b of the display panel 200.

[0068] Alternatively, referring to FIG. 2C, the housing 100 can be arranged in a stack on the display side 200a and the non-display side 200b of the display panel 200. That is, the display side 200a and the non-display side 200b of the display panel 200 are respectively provided with the housing 100.

[0069] It should be noted that the "display side 200a of the display panel 200" refers to a side of the display panel 200 that can display a picture. The "non-display side 200b of the display panel 200" refers to a side opposite to the display side 200a of the display panel 200.

[0070] In some embodiments, as shown in FIGS. 3A and 3B, each of FIGS. 3A and 3B is a cross-sectional view of a housing 100 according to some embodiments. The housing 100 includes a film product 10.

[0071] The film product 10 described above is described in detail below.

[0072] In some embodiments, as shown in FIGS. 3A and 3B, the film product 10 includes the substrate 1 and the optical layer 3. The optical layer 3 is located on at least part of the surface of one side of the substrate 1.

[0073] For example, the material of the substrate 1 can include glass. For example, the material of the substrate 1 can include any one of raw sheet glass, soda-lime glass, high-alumina glass, fully tempered glass, semi-tempered glass, and heat-strengthened glass.

[0074] For example, the optical layer 3 can be a decorative film layer.

[0075] For example, the optical layer 3 can be a brightness enhancement film layer that presents multiple color effects.

[0076] In the case where the optical layer 3 in the film product 10 is a brightness enhancement film layer, the average reflectivity of the film product 10 in the full waveband (380 nm-780 nm) of visible light is higher than 8%. Alternatively, the average reflectivity of the film product 10 in one or more sub-range wavelengths of the full waveband of visible light is higher than 8%, and the sub-range wavelength is greater than 12 nm.

[0077] The optical layer 3 can also be a functional film layer.

[0078] For example, the optical layer 3 can be an anti-reflection film layer that increases the light transmittance of the substrate 1.

[0079] In the case where the optical layer 3 in the film product 10 is an anti-reflection film layer, the average transmittance of the film product 10 in the full waveband of visible light is higher than 90%. Alternatively, the average transmittance of the film product 10 in one or more sub-range wavelengths of the full waveband of visible light is higher than 90%, and the sub-range wavelength is greater than 12 nm.

[0080] For another example, the optical layer 3 can be an atomic mirror film layer that has a single-sided see-through function.

[0081] In some embodiments, as shown in FIGS. 3A and 3B, the thickness (i.e., the dimension of the optical layer 3 along the third direction Z) h3 of the optical layer 3 in the film product 10 is uniform.

[0082] It should be noted that the “the thickness (i.e., the dimension of the optical layer 3 along the third direction Z) h3 of the optical layer 3 is uniform” means that the difference between the thickness (i.e., the dimension of the optical layer 3 along the third direction Z) h3 at multiple positions of the optical layer 3 is within a preset threshold range. The threshold range is a relatively small numerical range, for example, the threshold range can be the process precision range when forming the optical layer 3 with uniform thickness.

[0083] In the case where the thickness h3 of the optical layer 3 is uniform, the threshold range of the difference between the thickness h3 at a plurality of positions of the optical layer 3 can be 0-10 nm. For example, the difference between the thickness h3 at a plurality of positions of the optical layer 3 is 0 nm, 2 nm, 4 nm, 5 nm, 6 nm, 8 nm, or 10 nm.

[0084] For example, as shown in FIGS. 3A and 3B, the thickness h3 of the optical layer 3 is greater than 0 nm and less than or equal to 3000 nm.

[0085] For example, the thickness h3 of the optical layer 3 can be 159 nm, 187 nm, 193 nm, 195 nm, 210 nm, 227 nm, 275 nm, 302 nm, 336 nm, 451 nm, 515 nm, 656 nm, 706 nm, 831 nm, 1140 nm, or 1208 nm, etc.

[0086] The structure of the optical layer 3 in the above film product 10 is described in detail below.

[0087] In some embodiments, as shown in FIG. 3A, the optical layer 3 in the film product 10 includes at least one first sub-layer 31 and at least one second sub-layer 32. The first sub-layer 31 and the second sub-layer 32 are alternately stacked on one side of the substrate 1 along the third direction Z.

[0088] The refractive index of the first sub-layer 31 is greater than the refractive index of the second sub-layer 32.

[0089] It should be noted that the number of the first sub-layer 31 and the second sub-layer 32 in the optical layer 3 shown in FIG. 3A is only illustrative, and the number of the first sub-layer 31 and the second sub-layer 32 in the optical layer 3 can be set based on actual needs, and each embodiment of the present disclosure does not make any limitation on this.

[0090] For example, the refractive index of the first sub-layer 31 is greater than 1.9. The refractive index of the second sub-layer 32 is 1-1.8. For example, the refractive index of the first sub-layer 31 is 2.0, 2.1, 2.2, 2.3, 2.5, 2.7, 2.9, or 3.1, etc. The refractive index of the second sub-layer 32 is 1, 1.1, 1.2, 1.3, 1.4, 1.5, 1.6, 1.7, or 1.8, etc.

[0091] For example, the material of the first sub-layer 31 can include at least one of titanium oxide, zirconium oxide, tantalum oxide, niobium oxide, antimony oxide, hafnium oxide, zinc oxide, cerium oxide, lanthanum titanate, and silicon nitride.

[0092] The material of the second sub-layer 32 can include at least one of silicon oxide, aluminum oxide, and magnesium fluoride.

[0093] In some embodiments, as shown in FIG. 3A, in the case that the optical layer 3 in the film product 10 includes at least one first sub-layer 31 and at least one second sub-layer 32, the optical layer 3 can be designed as a brightness enhancement film layer or a anti-reflection film layer by matching the different refractive indexes of the first sub-layer 31 and the second sub-layer 32, and the thickness (i.e. the size of the first sub-layer 31 along the third direction Z) h 31 of the first sub-layer 31 and the thickness (i.e. the size of the second sub-layer 32 along the third direction Z) h 32 of the second sub-layer 32.

[0094] In other embodiments, as shown in FIG. 3B, the optical layer 3 in the film product 10 includes at least one light-absorbing layer 33. The light-absorbing layer 33 is provided with at least one first sub-layer 31 and at least one second sub-layer 32 on the side close to the substrate 1 and the side away from the substrate 1, respectively.

[0095] It should be noted that the number of the first sub-layer 31, the second sub-layer 32 and the light-absorbing layer 33 in the optical layer 3 shown in FIG. 3B is only illustrative, and the number of the first sub-layer 31, the second sub-layer 32 and the light-absorbing layer 33 in the optical layer 3 can be set based on actual needs, and the embodiments of the present disclosure do not make any limitation on this.

[0096] For example, the material of the light-absorbing layer 33 can include one or more of silicon, indium, niobium, titanium and chromium.

[0097] In some embodiments, as shown in FIG. 3B, in the case that the optical layer 3 in the film product 10 includes at least one light-absorbing layer 33, and the light-absorbing layer 33 is provided with at least one first sub-layer 31 and at least one second sub-layer 32 on the side close to the substrate 1 and the side away from the substrate 1, respectively, the optical layer 3 can be designed as an atomic mirror film layer with single-side perspective function by designing the thickness (i.e. the size of the light-absorbing layer 33 along the third direction Z) h 33 of the at least one light-absorbing layer 33, the material of the at least one light-absorbing layer 33, the thickness h 31 of the first sub-layer 31 and the thickness h 32 of the second sub-layer 32, and by matching the different refractive indexes of the first sub-layer 31 and the second sub-layer 32 on the side close to the substrate 1 and the side away from the substrate 1 of the light-absorbing layer 33.

[0098] In some embodiments, as shown in FIG. 4, which is a structural diagram of the substrate 1 in the film product 10 according to some embodiments. Taking the material of the substrate 1 including glass as an example, the glass has a typical brittle failure characteristic, i.e. the glass occurs brittle fracture and damage under impact or concentrated force.

[0099] The essence of glass brittle fracture is crack propagation. For example, there are many tiny micro-cracks (Griffith cracks) on the surface of the glass. Once the tangential tension on the periphery of the crack reaches the tensile strength of the material, the micro-crack begins to expand, and when the expansion reaches a certain extent, the whole glass structure will be broken.

[0100] As shown in FIG. 5, which is a schematic diagram of the stress on the substrate 1 in the coated article 10 according to some embodiments. When the glass (i.e., the substrate 1) is impacted by a rigid ball, corresponding deformation occurs. The impact surface of the glass (i.e., the substrate 1) is under pressure, and the back impact surface of the glass is under tension. The micro-cracks on the back impact surface of the glass are under tangential tension, which reaches the tensile strength value, causing the micro-cracks to expand until the whole glass is broken.

[0101] It should be noted that, in order to clearly show the process of the expansion of the micro-cracks on the surface of the glass to the breaking of the glass, the micro-cracks on the surface of the glass are enlarged in FIGS. 4 and 5.

[0102] As shown in FIGS. 3A and 3B, the optical layer 3 is arranged on one side of the substrate 1 (e.g., glass), and the optical layer 3 is located on at least part of the surface of the substrate 1 on one side. Due to the internal stress of the optical layer 3 itself and the interaction with the micro-cracks on the substrate 1 itself, the substrate 1 is warped or twisted and deformed, making the micro-cracks on the surface of the substrate 1 more easily expand and cause the substrate 1 to break, thereby reducing the impact resistance of the substrate 1, and further reducing the impact resistance of the coated article 10.

[0103] Based on this, in some embodiments, as shown in FIGS. 6A and 6B, which are both sectional views of the coated article 10 according to some embodiments. The coated article 10 further comprises a buffer layer 2. The buffer layer 2 is located between the substrate 1 and the optical layer 3. The buffer layer 2 is located on at least part of the surface of the substrate 1 on one side, and the optical layer 3 is located on the surface 2a of the buffer layer 2 away from the substrate 1.

[0104] As can be understood, as shown in FIGS. 6A and 6B, in the case where the coated article 10 comprises the buffer layer 2, the first sub-layer 31 and the second sub-layer 32 in the optical layer 3 are alternately stacked on the side of the buffer layer 2 away from the substrate 1.

[0105] By arranging the buffer layer 2 in the coated article 10, and making the buffer layer 2 located on at least part of the surface of the substrate 1 on one side, and the optical layer 3 located on the surface 2a of the buffer layer 2 away from the substrate 1, the buffer layer 2 can play a buffering role between the substrate 1 and the optical layer 3, effectively alleviating the influence of the stress of the optical layer 3 itself on the substrate 1, improving the impact resistance of the substrate 1, and further improving the impact resistance of the coated article 10, and improving the strength of the coated article 10.

[0106] In some embodiments, the material of the buffer layer 2 comprises a silicon-containing organic substance. For example, the material of the buffer layer 2 can comprise a small molecule siloxane. The small molecule siloxane has an organic group that is not hydrolyzed in a hydrolysis reaction, which can generate a steric hindrance effect when the Si-OH groups between adjacent small molecule siloxanes are dehydrated and condensed, and finally form a network structure with a certain degree of cross-linking. The network structure is accompanied by hydroxyl groups and unhydrolyzed organic groups on the surface, and the accompanying hydroxyl groups can be dehydrated and condensed with the hydroxyl groups (-OH) on the microcrack surface of the substrate 1 to form a connection, which can blunt the tip of the microcrack of the substrate 1. And because the unhydrolyzed organic group generates a steric hindrance effect when the Si-OH groups between adjacent small molecule siloxanes are dehydrated and condensed, the degree of cross-linking of the network structure can be reduced, i.e., the particle size of the formed particles is smaller, which is beneficial to filling the tip of the microcrack of the substrate 1. The unhydrolyzed organic group can also impart a certain degree of flexibility to the buffer layer 2. The flexible buffer layer 2 can act as a buffer between the substrate 1 and the optical layer 3, effectively relieving the influence of the stress of the optical layer 3 on the substrate 1, improving the impact resistance of the substrate 1, and thus improving the impact resistance of the film-coated product 10, and improving the strength of the film-coated product 10.

[0107] In some embodiments, the elastic modulus of the buffer layer 2 is 1 Gpa to 30 Gpa.

[0108] For example, the elastic modulus of the buffer layer 2 can be 1 Gpa, 3 Gpa, 5 Gpa, 8 Gpa, 9 Gpa, 10 Gpa, 12 Gpa, 16 Gpa, 18 Gpa, 23 Gpa, 26 Gpa, 28 Gpa or 30 Gpa, etc.

[0109] By setting the elastic modulus of the buffer layer 2 to 1 Gpa to 30 Gpa, the buffer layer 2 can resist greater deformation, and the film-coated product 10 including the buffer layer 2 can improve the ability to resist external loads, which is beneficial to improving the strength of the film-coated product 10.

[0110] In some embodiments, the buffer layer 2 is colorless and transparent.

[0111] By making the buffer layer 2 colorless and transparent, the influence of the buffer layer 2 on the average reflectance or average transmittance of the film-coated product 10 can be reduced, and the adverse effects of setting the buffer layer 2 on the optical performance of the film-coated product 10 can be avoided.

[0112] In some embodiments, the difference between the refractive index of the buffer layer 2 and the refractive index of the substrate 1 is less than or equal to 0.1. That is, the refractive index of the buffer layer 2 is close to the refractive index of the substrate 1.

[0113] By making the difference between the refractive index of the buffer layer 2 and the refractive index of the substrate 1 less than or equal to 0.1, the refractive index of the buffer layer 2 and the refractive index of the substrate 1 are close to each other, which can reduce the influence of the buffer layer 2 on the light propagation path in the film product 10, and further reduce the influence of the buffer layer 2 on the average reflectivity or average transmittance of the film product 10, thereby avoiding the adverse effects on the optical performance of the film product 10 due to the setting of the buffer layer 2.

[0114] In some embodiments, as shown in FIGS. 6A and 6B, the thickness (i.e., the dimension of the buffer layer 2 along the third direction Z) h2 of the buffer layer 2 in the film product 10 is uniform.

[0115] It should be noted that the above-mentioned "the thickness (i.e., the dimension of the buffer layer 2 along the third direction Z) h2 of the buffer layer 2 is uniform" means that the difference between the thickness (i.e., the dimension of the buffer layer 2 along the third direction Z) h2 of the buffer layer 2 at multiple positions is within a preset threshold range. The threshold range is a relatively small numerical range, for example, the threshold range can be the process accuracy range when forming the thickness-uniform buffer layer 2.

[0116] In the case where the thickness h2 of the buffer layer 2 is uniform, the threshold range of the difference between the thickness h2 of the buffer layer 2 at multiple positions can be 0-10 nm. For example, the difference between the thickness h2 of the buffer layer 2 at multiple positions is 0 nm, 2 nm, 4 nm, 5 nm, 6 nm, 8 nm, or 10 nm.

[0117] In some embodiments, as shown in FIGS. 6A and 6B, the thickness h2 of the buffer layer 2 is less than or equal to 1000 nm.

[0118] For example, the thickness h2 of the buffer layer 2 can be 50 nm, 70 nm, 80 nm, 100 nm, 120 nm, 150 nm, 200 nm, 300 nm, 500 nm, 550 nm, 600 nm, 650 nm, 700 nm, 750 nm, 800 nm, 850 nm, 900 nm, 950 nm, or 1000 nm, etc.

[0119] As shown in FIGS. 6A and 6B, when the thickness h2 of the buffer layer 2 in the film product 10 is too small, the buffer layer 2 in the film product 10 cannot form an effective continuous film layer, which is easy to cause insufficient stress buffering effect of the buffer layer 2 between the substrate 1 and the optical layer 3.

[0120] When the thickness h2 of the buffer layer 2 in the film product 10 is too large, it will affect the bonding strength between the substrate 1 and the optical layer 3, which is easy to reduce the service life of the film product 10.

[0121] Therefore, the setting mode of the thickness h2 of the buffer layer 2 in the film product 10 is described in detail below.

[0122] As shown in Figure 6A, the following will first describe the setting method of the thickness h2 of the buffer layer 2 when the optical layer 3 in the coated product 10 includes at least one first sub-layer 31 and at least one second sub-layer 32.

[0123] In some embodiments, the thickness h2 of the buffer layer 2 in the coated article 10 is different from the first preset thickness h. 21 and the second preset thickness h 22 The sum is positively correlated.

[0124] First preset thickness h 21 The thickness of the buffer layer 2 required for all the first sub-layers 31 contained in the optical layer 3. First preset thickness h 21 At least based on the thickness h of the first sublayer 31 31 get.

[0125] Second preset thickness h 22 The thickness of the buffer layer 2 required for all the second sublayers 32 contained in the optical layer 3. Second preset thickness h 22 At least based on the thickness h of the second sublayer 32 32 get.

[0126] For example, the optical layer 3 in the coated article 10 includes a first sublayer 31 of at least one material. First predetermined thickness h 21 and the thickness h of all first sublayers 31 of each material 31 The sum is positively correlated. That is, the first preset thickness h 21 With the thickness h of the entire first sublayer 31 of each material 31 It increases as the sum of its components increases.

[0127] For example, the optical layer 3 in the coated article 10 includes a second sublayer 32 of at least one material. Second predetermined thickness h 22 and the thickness h of all second sublayers 32 of each material 32 The sum is positively correlated. That is, the second preset thickness h 22 With the thickness h of the entire second sublayer 32 of each material 32 It increases as the sum of its components increases.

[0128] In some embodiments, the first preset thickness h 21 Also based on the elastic modulus E of buffer layer 2 OBF The elastic modulus E of substrate 1 and the elastic modulus E of the first sublayer 31 H get.

[0129] Second preset thickness h 22 Also based on the elastic modulus E of buffer layer 2 OBFThe elastic modulus E of substrate 1 and the elastic modulus E of the second sublayer 32 L get.

[0130] It is understandable that the elastic modulus represents the stiffness of a material and is an indicator of the material's ability to resist elastic deformation. The smaller the elastic modulus, the easier it is to deform under external force.

[0131] For example, the first preset thickness h 21 Second preset thickness h 22 All are negatively correlated with the elastic modulus E of substrate 1. That is, the first preset thickness h 21 Second preset thickness h 22 Both decrease as the elastic modulus E of substrate 1 increases.

[0132] First preset thickness h 21 Second preset thickness h 22 Both are related to the elastic modulus E of buffer layer 2 OBF Positive correlation. That is, the first preset thickness h. 21 Second preset thickness h 22 All change with the elastic modulus E of buffer layer 2 OBF It increases as it increases.

[0133] First preset thickness h 21 And the elastic modulus E of the first sublayer 31 H Positive correlation. That is, the first preset thickness h. 21 With the elastic modulus E of the first sublayer 31 H It increases as it increases.

[0134] Second preset thickness h 22 The elastic modulus E of the second sublayer 32 L Positive correlation. That is, the second preset thickness h. 22 With the elastic modulus E of the second sublayer 32 L It increases as it increases.

[0135] In some embodiments, the first preset thickness h 21 Also based on the Poisson's ratio υ of buffer layer 2 OBF The Poisson's ratio υ of substrate 1 and the Poisson's ratio υ of the first sublayer 31 H Obtained. Second preset thickness h 22 Also based on the Poisson's ratio υ of buffer layer 2 OBF The Poisson's ratio υ of substrate 1 and the Poisson's ratio υ of the second sublayer 32 L get.

[0136] As can be understood, Poisson's ratio refers to the ratio of the absolute values ​​of the transverse normal strain to the axial normal strain when a material is subjected to uniaxial tension or compression; it is also known as the transverse deformation coefficient.

[0137] For example, the first preset thickness h 21 and the second preset thickness h 22 are negatively correlated with the Poisson's ratio υ of the substrate 1. That is, the first preset thickness h 21 and the second preset thickness h 22 decrease as the Poisson's ratio υ of the substrate 1 increases.

[0138] The first preset thickness h 21 and the second preset thickness h 22 are positively correlated with the Poisson's ratio υ OBF of the buffer layer 2. That is, the first preset thickness h 21 and the second preset thickness h 22 increase as the Poisson's ratio υ OBF of the buffer layer 2 increases.

[0139] The first preset thickness h 21 is positively correlated with the Poisson's ratio υ H of the first sub-layer 31. That is, the first preset thickness h 21 increases as the Poisson's ratio υ H of the first sub-layer 31 increases.

[0140] The second preset thickness h 22 is positively correlated with the Poisson's ratio υ L of the second sub-layer 32. That is, the second preset thickness h 22 increases as the Poisson's ratio υ L of the second sub-layer 32 increases.

[0141] In summary, by positively correlating the thickness h2 of the buffer layer 2 with the sum of the first preset thickness h21 and the second preset thickness h22, the first preset thickness h21 being the thickness of the buffer layer 2 required by all the first sub-layers 31 contained in the optical layer 3, the second preset thickness h 22 being the thickness of the buffer layer 2 required by all the second sub-layers 32 contained in the optical layer 3, and the first preset thickness h21 being obtained according to at least one of the thickness h31 of the first sub-layer 31, the elastic modulus of the buffer layer 2, the substrate 1 and the first sub-layer 31, and the Poisson's ratio of the buffer layer 2, the substrate 1 and the first sub-layer 31, and the second preset thickness h 22 being obtained according to at least one of the thickness h 32 of the second sub-layer 32, the elastic modulus of the buffer layer 2, the substrate 1 and the second sub-layer 32, and the Poisson's ratio of the buffer layer 2, the substrate 1 and the second sub-layer 32, the thickness h2 of the buffer layer 2 can be designed, the stress buffering effect of the buffer layer 2 on the substrate 1 and the optical layer 3 can be ensured, the influence of the buffer layer 2 on the bonding strength between the substrate 1 and the optical layer 3 can be avoided, and the service life of the film product 10 can be improved.

[0142] In some embodiments, the thickness h2 of the buffer layer 2 in the coated article 10 is positively correlated with the sum of the first preset thickness h 21 and the second preset thickness h 22 , and the first preset thickness h 21 is obtained according to the thickness h 31 of the first sub-layer 31, the elastic modulus E OBF of the buffer layer 2, the elastic modulus E of the substrate 1, the elastic modulus E H of the first sub-layer 31, the Poisson's ratio υ OBF of the buffer layer 2, the Poisson's ratio υ of the substrate 1, and the Poisson's ratio υ of the first sub-layer 31. H The second preset thickness h 22 is obtained according to the thickness h 32 of the second sub-layer 32, the elastic modulus E OBF of the buffer layer 2, the elastic modulus E of the substrate 1, the elastic modulus E L of the second sub-layer 32, the Poisson's ratio υ OBF of the buffer layer 2, the Poisson's ratio υ of the substrate 1, and the Poisson's ratio υ of the second sub-layer 32. L In the case where the thickness h2 of the buffer layer 2 in the coated article 10 can be calculated by the following formula: h2=k1(h 21 +h 22 )

[0143] wherein h2 represents the thickness of the buffer layer 2 in the coated article 10. h 21 represents the first preset thickness, i.e. the thickness of the buffer layer 2 required by all the first sub-layers 31 contained in the optical layer 3. h 22 represents the second preset thickness, i.e. the thickness of the buffer layer 2 required by all the second sub-layers 32 contained in the optical layer 3. k1 represents the interaction coefficient between at least one first sub-layer 31 and at least one second sub-layer 32 in the optical layer 3.

[0144] For example, the value range of k1 can be 0.5-1.5. For example, k1 can be 0.5, 0.8, 1, 1.2, 1.3 or 1.5, etc.

[0145] The calculation formula of the above-mentioned first preset thickness h 21 is described below.

[0146] In the case where the optical layer 3 in the coated article 10 contains first sub-layers 31 of one material, the first preset thickness h 21 can be calculated by the following formula:

[0147] wherein h 21 represents the first preset thickness, i.e. the thickness of the buffer layer 2 required by all the first sub-layers 31 contained in the optical layer 3. EOBF E represents the elastic modulus of buffer layer 2. E represents the elastic modulus of substrate 1. H This represents the elastic modulus of the first sublayer 31. OBF υ represents the Poisson's ratio of buffer layer 2. υ represents the Poisson's ratio of substrate 1. H t represents the Poisson's ratio of the first sublayer 31. H The thickness h represents the total thickness of all the first sublayers 31 contained in the optical layer 3. 31 sum.

[0148] In the case where the optical layer 3 in the coated article 10 comprises a first sublayer 31 of multiple materials, the first preset thickness h 21 The following formula can be used for calculation:

[0149] Among them, h 21 E represents the first preset thickness, which is the thickness of the buffer layer 2 required for all the first sub-layers 31 contained in the optical layer 3. OBF This represents the elastic modulus of buffer layer 2. E represents the elastic modulus of substrate 1. OBF υ represents the Poisson's ratio of buffer layer 2. υ represents the Poisson's ratio of substrate 1.

[0150] In the case where the optical layer 3 in the coated article 10 comprises a first sublayer 31 of multiple materials, in order to facilitate the differentiation of the elastic modulus of the first sublayer 31 of different materials in the optical layer 3, E is used. H1 ~E Hn (n>1) represent the elastic modulus of the first sublayer 31 of different materials in optical layer 3.

[0151] To facilitate the differentiation of the Poisson's ratio of the first sublayer 31 of different materials in optical layer 3, υ is used. H1 ~υ Hn (n>1) represent the Poisson's ratios of the first sublayer 31 of different materials in optical layer 3.

[0152] To facilitate the measurement of the thickness h of all first sublayers 31 for each material in optical layer 3 31 To distinguish between the sums, use t. H1 ~t Hn (n>1) represent the thickness h of all the first sub-layers 31 of each material in the first sub-layer 31 of the optical layer 3. 31 sum.

[0153] The following describes the second preset thickness h. 22 The calculation formula will be explained.

[0154] In the case where the optical layer 3 in the coated article 10 includes a second sublayer 32 of a material, the second predetermined thickness h22 The second predetermined thickness h

[0155] where h 22 represents the second predetermined thickness, i.e., the thickness of the buffer layer 2 required for all the second sub-layers 32 included in the optical layer 3. E OBF represents the elastic modulus of the buffer layer 2. E represents the elastic modulus of the substrate 1. υ L represents the elastic modulus of the second sub-layer 32. υ OBF represents the Poisson's ratio of the buffer layer 2. υ represents the Poisson's ratio of the substrate 1. L represents the Poisson's ratio of the second sub-layer 32. t L represents the thickness h 32 of all the second sub-layers 32 of each material included in the optical layer 3.

[0156] In the case where the optical layer 3 in the film product 10 includes second sub-layers 32 of a plurality of materials, the second predetermined thickness h 22 may be calculated using the following equation:

[0157] where h 22 represents the second predetermined thickness, i.e., the thickness of the buffer layer 2 required for all the second sub-layers 32 included in the optical layer 3. E OBF represents the elastic modulus of the buffer layer 2. E represents the elastic modulus of the substrate 1. υ OBF represents the Poisson's ratio of the buffer layer 2. υ represents the Poisson's ratio of the substrate 1.

[0158] In the case where the optical layer 3 in the film product 10 includes second sub-layers 32 of a plurality of materials, in order to facilitate the distinction of the elastic modulus of the second sub-layers 32 of different materials in the optical layer 3, E L1 ~ E Ln (n > 1) represent the elastic modulus of the second sub-layers 32 of different materials in the optical layer 3, respectively.

[0159] In order to facilitate the distinction of the Poisson's ratio of the second sub-layers 32 of different materials in the optical layer 3, υ L1 ~ υ Ln (n > 1) represent the Poisson's ratio of the second sub-layers 32 of different materials in the optical layer 3, respectively.

[0160] In order to facilitate the distinction of the thickness h 32 of all the second sub-layers 32 of each material included in the optical layer 3, t L1 ~ t Ln (n > 1) represent the thickness h 32 of all the second sub-layers 32 of each material included in the optical layer 3, respectively.

[0161] For example, the optical layer 3 in the coated article 10 comprises a first sub-layer 31 of one material and a second sub-layer 32 of another material, the first sub-layer 31 in the optical layer 3 is a titanium oxide layer, the second sub-layer 32 in the optical layer 3 is a silicon oxide layer, and the thickness h3 of the optical layer 3 in the coated article 10 is 159 nm, the optical layer 3 comprises three first sub-layers 31 (i.e. titanium oxide layers) and two second sub-layers 32 (i.e. silicon oxide layers), the thickness h 31 of the three first sub-layers 31 in the optical layer 3 is 6 nm, 17 nm and 63 nm respectively, and the thickness h 32 of the two second sub-layers 32 in the optical layer 3 is 46 nm and 27 nm respectively, the thickness h2 of the buffer layer 2 in the coated article 10 is calculated as follows:

[0162] First, the first preset thickness h 21 is calculated. The elastic modulus E OBF of the buffer layer 2 is 9 Gpa. The elastic modulus E of the substrate 1 is 73 Gpa. The elastic modulus E H of the first sub-layer 31 is 150 Gpa. The Poisson’s ratio υ OBF of the buffer layer 2 is 0.32. The Poisson’s ratio υ of the substrate 1 is 0.21. The Poisson’s ratio υ H of the first sub-layer 31 is 0.2. The sum t 31 of the thickness h H of all the first sub-layers 31 contained in the optical layer 3 is 86 nm.

[0163] The first preset thickness h 21 is:

[0164] Second, the second preset thickness h 22 is calculated. The elastic modulus E OBF of the buffer layer 2 is 9 Gpa. The elastic modulus E of the substrate 1 is 73 Gpa. The elastic modulus E L of the second sub-layer 32 is 61 Gpa. The Poisson’s ratio υ OBF of the buffer layer 2 is 0.32. The Poisson’s ratio υ of the substrate 1 is 0.21. The Poisson’s ratio υ L of the second sub-layer 32 is 0.2. The sum t 32 of the thickness h L of all the second sub-layers 32 contained in the optical layer 3 is 73 nm.

[0165] The first preset thickness h 21 is:

[0166] Finally, the thickness h2 of the buffer layer 2 in the coated article 10 is calculated. h2=k1(h 21 +h 22) = 0.5 * (26 + 47) ~ 1.5 * (26 + 37) = 36.5 nm ~ 109.5 nm

[0167] In summary, the first sub-layer 31 in the optical layer 3 is a titanium oxide layer, the second sub-layer 32 in the optical layer 3 is a silicon oxide layer, and the thickness h3 of the optical layer 3 in the film product 10 is 159 nm. The optical layer 3 includes three first sub-layers 31 and two second sub-layers 32. The thickness h 31 of the three first sub-layers 31 in the optical layer 3 is 6 nm, 17 nm and 63 nm respectively, and the thickness h 32 of the two second sub-layers 32 in the optical layer 3 is 46 nm and 27 nm respectively.

[0168] As shown in FIG. 6B, the following describes the setting method of the thickness h2 of the buffer layer 2 in the film product 10, in which the optical layer 3 includes at least one light-absorbing layer 33, and at least one first sub-layer 31 and at least one second sub-layer 32 are arranged on the side close to the substrate 1 and the side away from the substrate 1 of the light-absorbing layer 33 respectively.

[0169] In some embodiments, in the case where the optical layer 3 in the film product 10 includes at least one light-absorbing layer 33, the thickness h2 of the buffer layer 2 in the film product 10 is positively correlated with the sum of the first preset thickness h 21 and the second preset thickness h 22 . 23 In addition, the thickness h2 of the buffer layer 2 in the film product 10 is also positively correlated with the third preset thickness h

[0170] The third preset thickness h 23 is the thickness of the buffer layer 2 required by all the light-absorbing layers 33 contained in the optical layer 3. The third preset thickness h 23 is obtained according to at least the thickness h 33 of all the light-absorbing layers 33 of each material.

[0171] For example, the optical layer 3 in the film product 10 contains at least one light-absorbing layer 33 of a material. The third preset thickness h 23 is obtained according to at least the sum of the thickness h 33 of all the light-absorbing layers 33 of each material.

[0172] The third preset thickness h 23 is positively correlated with the sum of the thickness h 33 of all the light-absorbing layers 33 of each material. That is, the third preset thickness h 23 increases with the thickness h 33It increases as the sum of its components increases.

[0173] In some embodiments, the third preset thickness h 23 Also based on the elastic modulus E of buffer layer 2 OBF The elastic modulus E of substrate 1 and the elastic modulus E of light-absorbing layer 33 absorb get.

[0174] For example, the third preset thickness h 23 It is negatively correlated with the elastic modulus of substrate 1. That is, the third preset thickness h 23 It decreases as the elastic modulus E of substrate 1 increases.

[0175] Third preset thickness h 23 And the elastic modulus E of buffer layer 2 OBF Positive correlation. That is, the third preset thickness h. 23 With the elastic modulus E of buffer layer 2 OBF It increases as it increases.

[0176] Third preset thickness h 23 The elastic modulus E of the light absorption layer 33 absorb Positive correlation. That is, the third preset thickness h. 23 With the elastic modulus E of the light absorption layer 33 absorb It increases as it increases.

[0177] In some embodiments, the third preset thickness h 23 Also based on the Poisson's ratio υ of buffer layer 2 OBF The Poisson's ratio υ of substrate 1 and the Poisson's ratio υ of light absorption layer 33 absorb get.

[0178] For example, the third preset thickness h 23 It is negatively correlated with the Poisson's ratio υ of substrate 1. That is, the third preset thickness h 23 It decreases as the Poisson's ratio υ of substrate 1 increases.

[0179] Third preset thickness h 23 Poisson's ratio υ of buffer layer 2 OBF Positive correlation. That is, the third preset thickness h. 23 With the Poisson's ratio υ of buffer layer 2 OBF It increases as it increases.

[0180] Third preset thickness h 23 Poisson's ratio υ of light absorption layer 33 absorb Positive correlation. That is, the third preset thickness h. 23 With the Poisson's ratio υ of the light absorption layer 33 absorb It increases as it increases.

[0181] In summary, when the optical layer 3 in the coated product 10 includes at least one light-absorbing layer 33, by making the thickness h2 of the buffer layer 2 in the coated product 10 positively correlated with the sum of the first preset thickness h21 and the second preset thickness h22, it is also positively correlated with the third preset thickness h23. 23 The thickness of the buffer layer 2 required for all the light absorption layers 33 contained in the optical layer 3, and the third preset thickness h 23 Based on the thickness h of the light absorption layer 33 33 The thickness h2 of the buffer layer 2 can be designed when the optical layer 3 in the coated product 10 includes at least one light absorption layer 33. This design can ensure the stress buffering effect of the buffer layer 2 on the substrate 1 and the optical layer 3, while avoiding the buffer layer 2 affecting the bonding strength between the substrate 1 and the optical layer 3, which is beneficial to improving the service life of the coated product 10.

[0182] In some embodiments, at the third preset thickness h 23 Based on the thickness h of the light absorption layer 33 33 The elastic modulus E of buffer layer 2 OBF The elastic modulus E of substrate 1 and the elastic modulus E of light-absorbing layer 33 absorb The Poisson's ratio υ of buffer layer 2 OBF The Poisson's ratio υ of substrate 1 and the Poisson's ratio υ of light absorption layer 33 absorb Given the given conditions, the third preset thickness h 23 The calculation method is as follows.

[0183] In the case where the optical layer 3 in the coated product 10 includes a light-absorbing layer 33 of a certain material, the third predetermined thickness h 23 The following formula can be used for calculation:

[0184] Among them, h 23 E represents the third preset thickness, which is the thickness of the buffer layer 2 required for all the light-absorbing layers 33 contained in the optical layer 3. OBF E represents the elastic modulus of buffer layer 2. E represents the elastic modulus of substrate 1. absorb This represents the elastic modulus of the light-absorbing layer 33. OBF υ represents the Poisson's ratio of buffer layer 2. υ represents the Poisson's ratio of substrate 1. absorb t represents the Poisson's ratio of the light-absorbing layer 33. H The thickness h represents the total thickness of all light-absorbing layers 33 contained in the optical layer 3. 33 sum.

[0185] In the case where the optical layer 3 in the film product 10 contains the light absorbing layer 33 of multiple materials, the third preset thickness h 23 may be calculated by the following formula:

[0186] wherein h 23 represents the third preset thickness, i.e. the thickness of the buffer layer 2 required by all the light absorbing layers 33 contained in the optical layer 3. OBF represents the elastic modulus of the buffer layer 2. E represents the elastic modulus of the substrate 1. OBF represents the Poisson's ratio of the buffer layer 2. υ represents the Poisson's ratio of the substrate 1.

[0187] In the case where the optical layer 3 in the film product 10 contains the light absorbing layer 33 of multiple materials, in order to distinguish the elastic modulus of the light absorbing layers 33 of different materials in the optical layer 3, E absorb1 ~ E absorbn (n>1) represent the elastic modulus of the light absorbing layers 33 of different materials in the optical layer 3, respectively.

[0188] In order to distinguish the Poisson's ratio of the light absorbing layers 33 of different materials in the optical layer 3, υ absorb1 ~ υ absorbn (n>1) represent the Poisson's ratio of the light absorbing layers 33 of different materials in the optical layer 3, respectively.

[0189] In order to distinguish the sum of the thickness h 33 of all the light absorbing layers 33 of each material in the optical layer 3, t absorb1 ~ t absorbn (n>1) represent the sum of the thickness h 33 of all the light absorbing layers 33 of each material in the light absorbing layers 33 of multiple materials in the optical layer 3, respectively.

[0190] In some embodiments, in the case where the thickness h2 of the buffer layer 2 in the film product 10 is positively correlated with the sum of the first preset thickness h 21 and the second preset thickness h 22 , and is positively correlated with the third preset thickness h 23 , the thickness h2 of the buffer layer 2 in the film product 10 can be calculated by the following formula: h2=k1(h 21 +h 22 )+k2h 23

[0191] wherein h2 represents the thickness of the buffer layer 2 in the film product 10. h 21 represents the first preset thickness, i.e. the thickness of the buffer layer 2 required by all the first sub-layers 31 contained in the optical layer 3. 22represents a second preset thickness, i.e. the thickness of the buffer layer 2 required by all the second sub-layers 32 contained in the optical layer 3. 23 represents a third preset thickness, i.e. the thickness of the buffer layer 2 required by all the light-absorbing layers 33 contained in the optical layer 3. k1represents the interaction coefficient between at least one first sub-layer 31 and at least one second sub-layer 32 in the optical layer 3. k2represents the interaction coefficient between at least two light-absorbing layers 33 in the optical layer 3.

[0192] For example, k1may have a value in the range of 0.5-1.5. For example, k1may be 0.5, 0.8, 1, 1.2, 1.3 or 1.5, etc.

[0193] For example, k2may have a value in the range of 0.3-1. For example, k2may be 0.3, 0.5, 0.6, 0.8, 0.9 or 1, etc.

[0194] The technical solutions of the film-coated article 10 comprising the buffer layer 2 in the present disclosure are described in detail below in combination with embodiments. In order to verify the beneficial effects produced by the buffer layer 2 provided in the film-coated article 10 in the present disclosure, comparative examples are also provided for the embodiments in which the film-coated article 10 comprises the buffer layer 2.

[0195] It should be noted that in the following embodiments, the buffer layer 2 is provided in the film-coated article 10, and the calculation method of the thickness (i.e. the size of the buffer layer 2 along the third direction Z) h2of the buffer layer 2 is described above and will not be repeated here.

[0196] Comparative Example D0: The thickness h1of the substrate 1 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0197] Comparative Example D1: The film-coated article 10 comprises the substrate 1 and the optical layer 3 which are stacked along the third direction Z.

[0198] The thickness h1of the substrate 1 in the film-coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0199] The thickness h3of the optical layer 3 in the film-coated article 10 is 159 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the thickness h 31 of the plurality of first sub-layers 31 in the optical layer 3 can be 6 nm, 17 nm and 63 nm respectively, and the thickness h 32 of the plurality of second sub-layers 32 in the optical layer 3 can be 46 nm and 27 nm respectively.

[0200] Example S1: The film-coated article 10 comprises the substrate 1, the buffer layer 2 and the optical layer 3 which are stacked along the third direction Z.

[0201] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0202] The thickness h3 of the optical layer 3 in the laminated article 10 is 159 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include three layers of the first sub-layer 31 and two layers of the second sub-layer 32 in a direction away from the substrate 1. The thickness h 31 may be 6 nm, 17 nm and 63 nm, respectively, and the thickness h 32 may be 46 nm and 27 nm, respectively.

[0203] The thickness h2 of the buffer layer 2 in the laminated article 10 is 50 nm.

[0204] Comparative Example D2: The laminated article 10 includes the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0205] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0206] The thickness h3 of the optical layer 3 in the laminated article 10 is 275 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include four layers of the first sub-layer 31 (i.e., the niobium oxide layer) and three layers of the second sub-layer 32 (i.e., the silicon oxide layer) in a direction away from the substrate 1. The thickness h 31 may be 29 nm, 15 nm, 19 nm and 79 nm, respectively, and the thickness h 32 may be 48 nm, 7 nm and 78 nm, respectively.

[0207] Example S2: The laminated article 10 includes the substrate 1, the buffer layer 2 and the optical layer 3 stacked along the third direction Z.

[0208] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0209] The thickness h3 of the optical layer 3 in the laminated article 10 is 275 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include four layers of the first sub-layer 31 (i.e., the niobium oxide layer) and three layers of the second sub-layer 32 (i.e., the silicon oxide layer) in a direction away from the substrate 1. The thickness h 31The thickness h of the three second sub-layers 32 in the optical layer 3 can be 29 nm, 15 nm, 19 nm and 79 nm, respectively. 32 The thickness h of the three second sub-layers 32 in the optical layer 3 can be 48 nm, 7 nm and 78 nm, respectively.

[0210] The thickness h2 of the buffer layer 2 in the coated article 10 can be 80 nm.

[0211] Comparative Example D3: The coated article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0212] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0213] The thickness h3 of the optical layer 3 in the coated article 10 is 515 nm. The first sub-layers 31 in the optical layer 3 can be antimony oxide layers, and the second sub-layers 32 in the optical layer 3 can be silicon oxide layers. For example, the optical layer 3 can comprise five first sub-layers 31 (i.e. antimony oxide layers) and five second sub-layers 32 (i.e. silicon oxide layers) in a direction away from the substrate 1. The thickness h of the five first sub-layers 31 in the optical layer 3 can be 13 nm, 34 nm, 120 nm, 67 nm and 7 nm, respectively. 31 The thickness h of the five second sub-layers 32 in the optical layer 3 can be 42 nm, 26.1 nm, 96 nm, 18.9 nm and 91 nm, respectively. 32 The thickness h of the five second sub-layers 32 in the optical layer 3 can be 42 nm, 26.1 nm, 96 nm, 18.9 nm and 91 nm, respectively.

[0214] Example S3: The coated article 10 comprises the substrate 1, the buffer layer 2 and the optical layer 3 stacked along the third direction Z.

[0215] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0216] The thickness h3 of the optical layer 3 in the coated article 10 is 515 nm. The first sub-layers 31 in the optical layer 3 can be antimony oxide layers, and the second sub-layers 32 in the optical layer 3 can be silicon oxide layers. For example, the optical layer 3 can comprise five first sub-layers 31 (i.e. antimony oxide layers) and five second sub-layers 32 (i.e. silicon oxide layers) in a direction away from the substrate 1. The thickness h of the five first sub-layers 31 in the optical layer 3 can be 13 nm, 34 nm, 120 nm, 67 nm and 7 nm, respectively. 31 The thickness h of the five second sub-layers 32 in the optical layer 3 can be 42 nm, 26.1 nm, 96 nm, 18.9 nm and 91 nm, respectively. 32 The thickness h of the five second sub-layers 32 in the optical layer 3 can be 42 nm, 26.1 nm, 96 nm, 18.9 nm and 91 nm, respectively.

[0217] The thickness h2 of the buffer layer 2 in the coated article 10 can be 150 nm.

[0218] Comparative Example D4: The film-covered article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0219] The thickness h1 of the substrate 1 in the film-covered article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0220] The thickness h3 of the optical layer 3 in the film-covered article 10 is 831 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can comprise five first sub-layers 31 (i.e. niobium oxide layers) and six second sub-layers 32 (i.e. magnesium fluoride layers). The thickness h 31 may be 21 nm, 31 nm, 78 nm, 185 nm and 23 nm, respectively, and the thickness h 32 may be 139 nm, 63 nm, 51 nm, 114 nm, 27 nm and 99 nm, respectively.

[0221] Example S4: The film-covered article 10 comprises the substrate 1, the buffer layer 2 and the optical layer 3 stacked along the third direction Z.

[0222] The thickness h1 of the substrate 1 in the film-covered article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0223] The thickness h3 of the optical layer 3 in the film-covered article 10 is 831 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can comprise five first sub-layers 31 (i.e. niobium oxide layers) and six second sub-layers 32 (i.e. magnesium fluoride layers). The thickness h 31 may be 21 nm, 31 nm, 78 nm, 185 nm and 23 nm, respectively, and the thickness h 32 may be 139 nm, 63 nm, 51 nm, 114 nm, 27 nm and 99 nm, respectively.

[0224] The thickness h2 of the buffer layer 2 in the film-covered article 10 can be 200 nm.

[0225] Comparative Example D5: The film-covered article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0226] The thickness h1 of the substrate 1 in the film-covered article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0227] The thickness h3 of the optical layer 3 in the laminated article 10 is 210 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include one first sub-layer 31 (i.e., a titanium oxide layer) and two second sub-layers 32 (i.e., silicon oxide layers). The thickness h 31 of the one first sub-layer 31 in the optical layer 3 can be 110 nm, and the thickness h 32 of the two second sub-layers 32 in the optical layer 3 can be 50 nm, respectively.

[0228] Example S5: The laminated article 10 includes the substrate 1, the buffer layer 2, and the optical layer 3 stacked along the third direction Z.

[0229] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0230] The thickness h3 of the optical layer 3 in the laminated article 10 is 210 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include one first sub-layer 31 (i.e., a titanium oxide layer) and two second sub-layers 32 (i.e., silicon oxide layers). The thickness h 31 of the one first sub-layer 31 in the optical layer 3 can be 110 nm, and the thickness h 32 of the two second sub-layers 32 in the optical layer 3 can be 50 nm, respectively.

[0231] The thickness h2 of the buffer layer 2 in the laminated article 10 can be 70 nm.

[0232] Comparative Example D6: The laminated article 10 includes the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0233] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0234] The thickness h3 of the optical layer 3 in the laminated article 10 is 451 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can include two first sub-layers 31 (i.e., titanium oxide layers) and three second sub-layers 32 (i.e., magnesium fluoride layers). The thickness h 31 of the two first sub-layers 31 in the optical layer 3 can be 20 nm and 10 nm, respectively, and the thickness h 32 of the three second sub-layers 32 in the optical layer 3 can be 91 nm, 200 nm, and 130 nm, respectively.

[0235] Example S6: The film-covered article 10 comprises a substrate 1, a buffer layer 2 and an optical layer 3 stacked along the third direction Z.

[0236] The thickness h1 of the substrate 1 in the film-covered article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0237] The thickness h3 of the optical layer 3 in the film-covered article 10 is 451 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can comprise two layers of the first sub-layer 31 (i.e. titanium oxide layers) and three layers of the second sub-layer 32 (i.e. magnesium fluoride layers). The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 20 nm and 10 nm, respectively, and the thickness h32 of the three layers of the second sub-layer 32 in the optical layer 3 can be 91 nm, 200 nm and 130 nm, respectively, along the direction away from the substrate 1. 31 The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 20 nm and 10 nm, respectively, and the thickness h32 of the three layers of the second sub-layer 32 in the optical layer 3 can be 91 nm, 200 nm and 130 nm, respectively, along the direction away from the substrate 1. 32 The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 20 nm and 10 nm, respectively, and the thickness h32 of the three layers of the second sub-layer 32 in the optical layer 3 can be 91 nm, 200 nm and 130 nm, respectively, along the direction away from the substrate 1.

[0238] The thickness h2 of the buffer layer 2 in the film-covered article 10 can be 150 nm.

[0239] Comparative Example D7: The film-covered article 10 comprises a substrate 1 and an optical layer 3 stacked along the third direction Z.

[0240] The thickness h1 of the substrate 1 in the film-covered article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0241] The thickness h3 of the optical layer 3 in the film-covered article 10 is 706 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can comprise three layers of the first sub-layer 31 (i.e. niobium oxide layers) and three layers of the second sub-layer 32 (i.e. silicon oxide layers). The thickness h31 of the three layers of the first sub-layer 31 in the optical layer 3 can be 103 nm, 41 nm and 10 nm, respectively, and the thickness h32 of the three layers of the second sub-layer 32 in the optical layer 3 can be 218 nm, 199 nm and 135 nm, respectively, along the direction away from the substrate 1. 31 The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 20 nm and 10 nm, respectively, and the thickness h32 of the three layers of the second sub-layer 32 in the optical layer 3 can be 91 nm, 200 nm and 130 nm, respectively, along the direction away from the substrate 1. 32 The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 20 nm and 10 nm, respectively, and the thickness h32 of the three layers of the second sub-layer 32 in the optical layer 3 can be 91 nm, 200 nm and 130 nm, respectively, along the direction away from the substrate 1.

[0242] Example S7: The film-covered article 10 comprises a substrate 1, a buffer layer 2 and an optical layer 3 stacked along the third direction Z.

[0243] The thickness h1 of the substrate 1 in the film-covered article 10 is 0.55 mm. The material of the substrate 1 is a chemically strengthened glass.

[0244] The thickness h3 of the optical layer 3 in the coated article 10 is 706 nm. The first sub-layers 31 in the optical layer 3 can be niobium oxide layers, and the second sub-layers 32 in the optical layer 3 can be silicon oxide layers. For example, the optical layer 3 can include three first sub-layers 31 (i.e., niobium oxide layers) and three second sub-layers 32 (i.e., silicon oxide layers). The thickness h 31 may be 103 nm, 41 nm, and 10 nm, respectively, and the thickness h 32 may be 218 nm, 199 nm, and 135 nm, respectively.

[0245] The thickness h2 of the buffer layer 2 in the coated article 10 can be 300 nm.

[0246] Comparative Example D8: The coated article 10 includes the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0247] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0248] The thickness h3 of the optical layer 3 in the coated article 10 is 1208 nm. The first sub-layers 31 in the optical layer 3 can be niobium oxide layers, and the second sub-layers 32 in the optical layer 3 can be magnesium fluoride layers. For example, the optical layer 3 can include two first sub-layers 31 (i.e., niobium oxide layers) and three second sub-layers 32 (i.e., magnesium fluoride layers). The thickness h 31 may be 60 nm and 120 nm, respectively, and the thickness h 32 may be 540 nm, 378 nm, and 110 nm, respectively.

[0249] Example S8: The coated article 10 includes the substrate 1, the buffer layer 2, and the optical layer 3 stacked along the third direction Z.

[0250] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0251] The thickness h3 of the optical layer 3 in the coated article 10 is 1208 nm. The first sub-layers 31 in the optical layer 3 can be niobium oxide layers, and the second sub-layers 32 in the optical layer 3 can be magnesium fluoride layers. For example, the optical layer 3 can include two first sub-layers 31 (i.e., niobium oxide layers) and three second sub-layers 32 (i.e., magnesium fluoride layers). The thickness h 31 may be 60 nm and 120 nm, respectively, and the thickness h 32may be 60 nm and 60 nm, respectively, and the thickness h

[0252] The thickness h2 of the buffer layer 2 in the laminated article 10 can be 500 nm.

[0253] Comparative Example D9: The laminated article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0254] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0255] The thickness h3 of the optical layer 3 in the laminated article 10 is 1140 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can comprise two layers of the first sub-layer 31 (i.e., the niobium oxide layer) and three layers of the second sub-layer 32 (i.e., the magnesium fluoride layer). The thickness h 31 may be 60 nm and 60 nm, respectively, and the thickness h 32 may be 530 nm, 320 nm and 170 nm, respectively.

[0256] Example S9: The laminated article 10 comprises the substrate 1, the buffer layer 2 and the optical layer 3 stacked along the third direction Z.

[0257] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0258] The thickness h3 of the optical layer 3 in the laminated article 10 is 1140 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can comprise two layers of the first sub-layer 31 (i.e., the niobium oxide layer) and three layers of the second sub-layer 32 (i.e., the magnesium fluoride layer). The thickness h 31 may be 60 nm and 60 nm, respectively, and the thickness h 32 may be 530 nm, 320 nm and 170 nm, respectively.

[0259] The thickness h2 of the buffer layer 2 in the laminated article 10 can be 300 nm.

[0260] Comparative Example D10: The laminated article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0261] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0262] The thickness h3 of the optical layer 3 in the coated article 10 is 656 nm. The first sublayer 31 in the optical layer 3 can be a niobium oxide layer, and the second sublayer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include three layers of the first sublayer 31 (i.e., niobium oxide layers) and three layers of the second sublayer 32 (i.e., silicon oxide layers). The thickness h 31 The thickness h 32 may be 143 nm, 41 nm, and 10 nm, respectively, and the thickness h 31 may be 168 nm, 159 nm, and 135 nm, respectively.

[0263] Example S10: The coated article 10 includes the substrate 1, the buffer layer 2, and the optical layer 3 stacked along the third direction Z.

[0264] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0265] The thickness h3 of the optical layer 3 in the coated article 10 is 656 nm. The first sublayer 31 in the optical layer 3 can be a niobium oxide layer, and the second sublayer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include three layers of the first sublayer 31 (i.e., niobium oxide layers) and three layers of the second sublayer 32 (i.e., silicon oxide layers). The thickness h 31 The thickness h 32 may be 143 nm, 41 nm, and 10 nm, respectively, and the thickness h 31 may be 168 nm, 159 nm, and 135 nm, respectively.

[0266] The thickness h2 of the buffer layer 2 in the coated article 10 can be 300 nm.

[0267] Comparative Example D11: The coated article 10 includes the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0268] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0269] The thickness h3 of the optical layer 3 in the coated article 10 is 227 nm. The first sublayer 31 in the optical layer 3 can be a niobium oxide layer, and the second sublayer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can include three layers of the first sublayer 31 (i.e., niobium oxide layers) and three layers of the second sublayer 32 (i.e., silicon oxide layers). The thickness h 31The thickness h of the three second sub-layers 32 in the optical layer 3 can be 12 nm, 71 nm and 23 nm, respectively. 32 The thickness h of the two second sub-layers 32 in the optical layer 3 can be 7 nm and 11 nm, respectively.

[0270] Example S11 : The film product 10 comprises a substrate 1, a buffer layer 2 and an optical layer 3 stacked along the third direction Z.

[0271] The thickness h1 of the substrate 1 in the film product 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0272] The thickness h3 of the optical layer 3 in the film product 10 is 227 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can comprise three first sub-layers 31 (i.e. niobium oxide layers) and three second sub-layers 32 (i.e. silicon oxide layers). The thickness h of the three first sub-layers 31 in the optical layer 3 can be 12 nm, 71 nm and 23 nm, respectively, along the direction away from the substrate 1. 31 The thickness h of the three second sub-layers 32 in the optical layer 3 can be 12 nm, 71 nm and 23 nm, respectively. 32 The thickness h of the two second sub-layers 32 in the optical layer 3 can be 7 nm and 11 nm, respectively.

[0273] The thickness h2 of the buffer layer 2 in the film product 10 can be 50 nm.

[0274] Comparative Example D12: The film product 10 comprises a substrate 1 and an optical layer 3 stacked along the third direction Z.

[0275] The thickness h1 of the substrate 1 in the film product 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0276] The thickness h3 of the optical layer 3 in the film product 10 is 193 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can comprise two first sub-layers 31 (i.e. titanium oxide layers) and two second sub-layers 32 (i.e. magnesium fluoride layers). The thickness h of the two first sub-layers 31 in the optical layer 3 can be 56 nm and 119 nm, respectively, along the direction away from the substrate 1. 31 The thickness h of the two second sub-layers 32 in the optical layer 3 can be 7 nm and 11 nm, respectively. 32 The thickness h of the two second sub-layers 32 in the optical layer 3 can be 7 nm and 11 nm, respectively.

[0277] Example S12: The film product 10 comprises a substrate 1, a buffer layer 2 and an optical layer 3 stacked along the third direction Z.

[0278] The thickness h1 of the substrate 1 in the film product 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0279] The thickness h3 of the optical layer 3 in the coated article 10 is 193 nm. The first sublayer 31 in the optical layer 3 can be a titanium oxide layer, and the second sublayer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can include two layers of the first sublayer 31 (i.e., titanium oxide layers) and two layers of the second sublayer 32 (i.e., magnesium fluoride layers). The thickness h 31 may be 7 nm and 11 nm, respectively, and the thickness h 32 may be 56 nm and 119 nm, respectively.

[0280] The thickness h2 of the buffer layer 2 in the coated article 10 can be 100 nm.

[0281] Comparative Example D13: The coated article 10 includes the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0282] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0283] The thickness h3 of the optical layer 3 in the coated article 10 is 195 nm. The first sublayer 31 in the optical layer 3 can be a niobium oxide layer, and the second sublayer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can include two layers of the first sublayer 31 (i.e., niobium oxide layers) and two layers of the second sublayer 32 (i.e., magnesium fluoride layers). The thickness h 31 may be 8 nm and 11 nm, respectively, and the thickness h 32 may be 56 nm and 120 nm, respectively.

[0284] Example S13: The coated article 10 includes the substrate 1, the buffer layer 2, and the optical layer 3 stacked along the third direction Z.

[0285] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0286] The thickness h3 of the optical layer 3 in the coated article 10 is 195 nm. The first sublayer 31 in the optical layer 3 can be a niobium oxide layer, and the second sublayer 32 in the optical layer 3 can be a magnesium fluoride layer. For example, the optical layer 3 can include two layers of the first sublayer 31 (i.e., niobium oxide layers) and two layers of the second sublayer 32 (i.e., magnesium fluoride layers). The thickness h 31 may be 8 nm and 11 nm, respectively, and the thickness h 32 may be 56 nm and 120 nm, respectively.

[0287] The thickness h2 of the buffer layer 2 in the laminated article 10 can be 120 nm.

[0288] Comparative Example D14: The laminated article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0289] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0290] The thickness h3 of the optical layer 3 in the laminated article 10 is 187 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can comprise two layers of the first sub-layer 31 (i.e. titanium oxide layers) and two layers of the second sub-layer 32 (i.e. silicon oxide layers). The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 6 nm and 11 nm, respectively, and the thickness h32 of the two layers of the second sub-layer 32 in the optical layer 3 can be 58 nm and 120 nm, respectively, along the direction away from the substrate 1. 31 32

[0291] Example S14: The laminated article 10 comprises the substrate 1, the buffer layer 2 and the optical layer 3 stacked along the third direction Z.

[0292] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0293] The thickness h3 of the optical layer 3 in the laminated article 10 is 187 nm. The first sub-layer 31 in the optical layer 3 can be a titanium oxide layer, and the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer. For example, the optical layer 3 can comprise two layers of the first sub-layer 31 (i.e. titanium oxide layers) and two layers of the second sub-layer 32 (i.e. silicon oxide layers). The thickness h31 of the two layers of the first sub-layer 31 in the optical layer 3 can be 6 nm and 11 nm, respectively, and the thickness h32 of the two layers of the second sub-layer 32 in the optical layer 3 can be 58 nm and 120 nm, respectively, along the direction away from the substrate 1. 31 32

[0294] The thickness h2 of the buffer layer 2 in the laminated article 10 can be 50 nm.

[0295] Comparative Example D15: The laminated article 10 comprises the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0296] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0297] ​​​​The thickness h3 of the optical layer 3 in the laminated article 10 is 336 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer, and the material of the light-absorbing layer 33 in the optical layer 3 can include titanium. For example, the optical layer 3 can include two layers of the first sub-layer 31 (i.e., niobium oxide layers), two layers of the second sub-layer 32 (i.e., silicon oxide layers), and one layer of the light-absorbing layer 33. The thickness h 31 may be 56 nm and 102 nm, respectively, the thickness h 32 may be 105 nm and 55 nm, respectively, and the thickness h 33 may be 18 nm.

[0298] Example S15: The laminated article 10 includes the substrate 1, the buffer layer 2, and the optical layer 3 stacked along the third direction Z.

[0299] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0300] The thickness h3 of the optical layer 3 in the laminated article 10 is 336 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer, and the material of the light-absorbing layer 33 in the optical layer 3 can include titanium. For example, the optical layer 3 can include two layers of the first sub-layer 31 (i.e., niobium oxide layers), two layers of the second sub-layer 32 (i.e., silicon oxide layers), and one layer of the light-absorbing layer 33. The thickness h 31 may be 56 nm and 102 nm, respectively, the thickness h 32 may be 105 nm and 55 nm, respectively, and the thickness h 33 may be 18 nm.

[0301] The thickness h2 of the buffer layer 2 in the laminated article 10 can be 150 nm.

[0302] Comparative Example D16: The laminated article 10 includes the substrate 1 and the optical layer 3 stacked along the third direction Z.

[0303] The thickness h1 of the substrate 1 in the laminated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0304] The thickness h3 of the optical layer 3 in the coated article 10 is 302 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer, and the material of the light-absorbing layer 33 in the optical layer 3 can include niobium. For example, the optical layer 3 can include two layers of the first sub-layer 31 (i.e., niobium oxide layers), two layers of the second sub-layer 32 (i.e., silicon oxide layers), and one layer of the light-absorbing layer 33. The thickness h 31 may be 42 nm and 70 nm, respectively, the thickness h 32 may be 102 nm and 70 nm, respectively, and the thickness h 33 may be 18 nm.

[0305] Example S16: The coated article 10 includes the substrate 1, the buffer layer 2, and the optical layer 3 stacked along the third direction Z.

[0306] The thickness h1 of the substrate 1 in the coated article 10 is 0.55 mm. The material of the substrate 1 is chemically strengthened glass.

[0307] The thickness h3 of the optical layer 3 in the coated article 10 is 302 nm. The first sub-layer 31 in the optical layer 3 can be a niobium oxide layer, the second sub-layer 32 in the optical layer 3 can be a silicon oxide layer, and the material of the light-absorbing layer 33 in the optical layer 3 can include niobium. For example, the optical layer 3 can include two layers of the first sub-layer 31 (i.e., niobium oxide layers), two layers of the second sub-layer 32 (i.e., silicon oxide layers), and one layer of the light-absorbing layer 33. The thickness h 31 may be 42 nm and 70 nm, respectively, the thickness h 32 may be 102 nm and 70 nm, respectively, and the thickness h 33 may be 18 nm.

[0308] The thickness h2 of the buffer layer 2 in the coated article 10 can be 100 nm.

[0309] The performance test results of the coated article 10 in the above Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0 are described in detail as follows.

[0310] Elastic modulus and hardness tests of the buffer layer 2 and the optical layer 3 (e.g., the first sub-layer 31, the second sub-layer 32, and the light-absorbing layer 33 in the optical layer 3) in the coated article 10.

[0311] In some embodiments, when the elastic modulus and hardness tests are performed on the buffer layer 2 and the optical layer 3 (e.g., the first sub-layer 31, the second sub-layer 32, and the light-absorbing layer 33 in the optical layer 3) in the coated article 10, a nanoindenter can be used to test the nanomechanical properties of the buffer layer 2 and the optical layer 3 in the coated article 10.

[0312] For example, the nanoindenter can use a diamond-tipped three-sided pyramid Berkovich indenter when performing the indentation tests, and the tip radius of curvature of the indenter is less than 20 nanometers.

[0313] Each coated article 10 is subjected to effective indentation tests at at least four different locations, and the spacing between the indentations is kept at least 30 times the maximum indentation depth to prevent mutual influence of the indentation stress fields.

[0314] The test results of the elastic modulus E of the buffer layer 2 in the coated article 10 in Examples S1-S16 and Comparative Examples D1-D16 OBF , the Poisson's ratio υ of the buffer layer 2 OBF , the elastic modulus E of the first sub-layer 31 H , the Poisson's ratio υ of the first sub-layer 31 H , the elastic modulus E of the second sub-layer 32 L , the Poisson's ratio υ of the second sub-layer 32 L , the elastic modulus E of the light-absorbing layer 33 absorb , and the Poisson's ratio υ of the light-absorbing layer 33 absorb are shown in the following table.

[0315] Film thickness test of the buffer layer 2 in the coated article 10.

[0316] In some embodiments, when the film thickness test is performed on the buffer layer 2 in the coated article 10 in Examples S1-S16 and Comparative Examples D1-D16, a scanning electron microscope-focused ion beam (SEM-FIB) technique can be used. The SEM-FIB technique is an advanced electron microscope technique that combines ion beam machining and scanning electron microscope imaging functions, which is beneficial to improve the test efficiency of the film thickness test of the buffer layer 2 in the coated article 10.

[0317] In some embodiments, the film thickness test of the buffer layer 2 is performed at multiple locations for each coated article 10, and the average value is taken.

[0318] For example, the film thickness test of the buffer layer 2 can be performed at three locations for each coated article 10, and the average value is taken.

[0319] For example, in order to prevent the buffer layer 2 in the film product 10 from being damaged during FIB cutting, and to make it easier to observe the thickness h2 of the buffer layer 2 in the film product 10, a layer of polyethylene glycol terephthalate (PET) can be provided on the surface of the film product 10 before FIB cutting.

[0320] The thickness h2 of the buffer layer 2 in the film product 10 in Examples S1-S16 and Comparative Examples D1-D16 and the actual thickness h2 of the buffer layer 2 are shown in the following table. In the table, the thickness h of the sum of all first sub-layers 31, the thickness h of the sum of all second sub-layers 32, and the thickness h of the sum of all light-absorbing layers 33 in the optical layer 3 of the film product 10 in Examples S1-S16 and Comparative Examples D1-D16 are also shown. 31 H 32 L 32 absorb .

[0321] Reflectivity and transmittance test of the film product 10.

[0322] In some embodiments, when performing the reflectivity or transmittance test on the film product 10 in Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0, an ultraviolet-visible near-infrared spectrophotometer can be used to perform the reflectivity or transmittance test on the film product 10 or the substrate 1. The film product 10 or the substrate 1 is fixed in the test position, the test angle is set to 25°, the visible light spectrum curve is collected, and the visible light reflectivity or transmittance of the film product 10 or the substrate 1 to standard light source A is calculated.

[0323] The reflectivity and transmittance test results of the film product 10 in Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0 are as follows.

[0324] As shown in FIG. 7, FIG. 7 is a wavelength-reflectivity curve of the substrate 1 in Comparative Example D0. The average reflectivity of the film product 10 in Comparative Example D0 in the entire visible light band (380-780 nm) is higher than 8%, which is 8.18%.

[0325] As shown in FIG. 8, FIG. 8 is a wavelength-reflectivity curve of the film product 10 in Comparative Example D1. The average reflectivity of the film product 10 in Comparative Example D1 in the entire visible light band is higher than 8%, which is 24.81%. ​​​​​

[0326] As shown in FIG. 9, FIG. 9 is a wavelength-reflectance curve of the film-coated article 10 in Example S1. The average reflectance of the film-coated article 10 in Example S1 over the entire visible light band was higher than 8%, and was 24.38%.

[0327] As shown in FIG. 10, FIG. 10 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D2. The average reflectance of the film-coated article 10 in Comparative Example D2 over the entire visible light band was higher than 8%, and was 36.98%.

[0328] As shown in FIG. 11, FIG. 11 is a wavelength-reflectance curve of the film-coated article 10 in Example S2. The average reflectance of the film-coated article 10 in Example S2 over the entire visible light band was higher than 8%, and was 36.72%.

[0329] As shown in FIG. 12, FIG. 12 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D3. The average reflectance of the film-coated article 10 in Comparative Example D3 over the entire visible light band was higher than 8%, and was 16.10%.

[0330] As shown in FIG. 13, FIG. 13 is a wavelength-reflectance curve of the film-coated article 10 in Example S3. The average reflectance of the film-coated article 10 in Example S3 over the entire visible light band was higher than 8%, and was 15.95%.

[0331] As shown in FIG. 14, FIG. 14 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D4. The average reflectance of the film-coated article 10 in Comparative Example D4 over the entire visible light band was higher than 8%, and was 39.98%.

[0332] As shown in FIG. 15, FIG. 15 is a wavelength-reflectance curve of the film-coated article 10 in Example S4. The average reflectance of the film-coated article 10 in Example S4 over the entire visible light band was higher than 8%, and was 39.57%.

[0333] As shown in FIG. 16, FIG. 16 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D5. The average reflectance of the film-coated article 10 in Comparative Example D5 over the entire visible light band was higher than 8%, and was 24.31%.

[0334] As shown in FIG. 17, FIG. 17 is a wavelength-reflectance curve of the film-coated article 10 in Example S5. The average reflectance of the film-coated article 10 in Example S5 over the entire visible light band was higher than 8%, and was 24.02%.

[0335] As shown in FIG. 18, FIG. 18 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D6. The average reflectance of the film-coated article 10 in Comparative Example D6 over the entire visible light band was higher than 8%, and was 27.93%.

[0336] As shown in FIG. 19, FIG. 19 is a wavelength-reflectance curve of the film-coated article 10 in Example S6. The average reflectance of the film-coated article 10 in Example S6 over the entire visible light wavelength band was higher than 8%, and was 27.57%.

[0337] As shown in FIG. 20, FIG. 20 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D7. The average reflectance of the film-coated article 10 in Comparative Example D7 over the entire visible light wavelength band was higher than 8%, and was 46.82%.

[0338] As shown in FIG. 21, FIG. 21 is a wavelength-reflectance curve of the film-coated article 10 in Example S7. The average reflectance of the film-coated article 10 in Example S7 over the entire visible light wavelength band was higher than 8%, and was 46.75%.

[0339] As shown in FIG. 22, FIG. 22 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D8. The average reflectance of the film-coated article 10 in Comparative Example D8 over the entire visible light wavelength band was higher than 8%, and was 39.28%.

[0340] As shown in FIG. 23, FIG. 23 is a wavelength-reflectance curve of the film-coated article 10 in Example S8. The average reflectance of the film-coated article 10 in Example S8 over the entire visible light wavelength band was higher than 8%, and was 39.17%.

[0341] As shown in FIG. 24, FIG. 24 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D9. The average reflectance of the film-coated article 10 in Comparative Example D9 over the entire visible light wavelength band was higher than 8%. The average reflectance of the film-coated article 10 in Comparative Example D9 over the wavelength band of 380 nm to 470 nm was 38.32%, and over the wavelength band of 470 nm to 700 nm was 51.76%.

[0342] As shown in FIG. 25, FIG. 25 is a wavelength-reflectance curve of the film-coated article 10 in Example S9. The average reflectance of the film-coated article 10 in Example S9 over the entire visible light wavelength band (380 nm to 780 nm) was higher than 8%. The average reflectance of the film-coated article 10 in Example S9 over the wavelength band of 380 nm to 470 nm was 38.17%, and over the wavelength band of 470 nm to 700 nm was 51.54%.

[0343] As shown in FIG. 26, FIG. 26 is a wavelength-reflectance curve of the film-coated article 10 in Comparative Example D10. The average reflectance of the film-coated article 10 in Comparative Example D10 over the entire visible light wavelength band was higher than 8%. The average reflectance of the film-coated article 10 in Comparative Example D10 over the wavelength band of 380 nm to 470 nm was 42.35%, and over the wavelength band of 460 nm to 650 nm was 41.44%.

[0344] As shown in FIG. 27, FIG. 27 is a wavelength-reflectance curve of the film-coated article 10 in Example S10. The average reflectance of the film-coated article 10 in Example S10 in the entire visible light band is higher than 8%. The average reflectance of the film-coated article 10 in Example S10 in the band of 380 nm to 470 nm is 42.07%, and the average reflectance in the band of 460 nm to 650 nm is 41.35%.

[0345] As shown in FIG. 28, FIG. 28 is a wavelength-transmittance curve of the film-coated article 10 in Comparative Example D11. The average transmittance of the film-coated article 10 in Comparative Example D11 in the entire visible light band is higher than 90%, and is 94.83%.

[0346] As shown in FIG. 29, FIG. 29 is a wavelength-transmittance curve of the film-coated article 10 in Example S11. The average transmittance of the film-coated article 10 in Example S11 in the entire visible light band is higher than 90%, and is 94.79%.

[0347] As shown in FIG. 30, FIG. 30 is a wavelength-transmittance curve of the film-coated article 10 in Comparative Example D12. The average transmittance of the film-coated article 10 in Comparative Example D12 in the entire visible light band is higher than 90%, and is 94.86%.

[0348] As shown in FIG. 31, FIG. 31 is a wavelength-transmittance curve of the film-coated article 10 in Example S12. The average transmittance of the film-coated article 10 in Example S12 in the entire visible light band is higher than 90%, and is 94.81%.

[0349] As shown in FIG. 32, FIG. 32 is a wavelength-transmittance curve of the film-coated article 10 in Comparative Example D13. The average transmittance of the film-coated article 10 in Comparative Example D13 in the entire visible light band is higher than 90%, and is 94.87%.

[0350] As shown in FIG. 33, FIG. 33 is a wavelength-transmittance curve of the film-coated article 10 in Example S13. The average transmittance of the film-coated article 10 in Example S13 in the entire visible light band is higher than 90%, and is 94.84%.

[0351] As shown in FIG. 34, FIG. 34 is a wavelength-transmittance curve of the film-coated article 10 in Comparative Example D14. The average transmittance of the film-coated article 10 in Comparative Example D14 in the entire visible light band is higher than 90%, and is 94.08%.

[0352] As shown in FIG. 35, FIG. 35 is a wavelength-transmittance curve of the film-coated article 10 in Example S14. The average transmittance of the film-coated article 10 in Example S14 in the entire visible light band is higher than 90%, and is 94.83%.

[0353] The average transmittance of the film-coated article 10 in Comparative Example D15 in the entire waveband of visible light was 15%, the average reflectance of one of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 43%, the average reflectance of the other of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 22%, and the difference between the average reflectances of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 21%.

[0354] The average transmittance of the film-coated article 10 in Example S15 in the entire waveband of visible light was 14.86%, the average reflectance of one of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 42.86%, the average reflectance of the other of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 21.91%, and the difference between the average reflectances of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 20.95%.

[0355] The average transmittance of the film-coated article 10 in Comparative Example D16 in the entire waveband of visible light was 19.5%, the average reflectance of one of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 53.5%, the average reflectance of the other of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 13.5%, and the difference between the average reflectances of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 40%.

[0356] The average transmittance of the film-coated article 10 in Example S16 in the entire waveband of visible light was 19.48%, the average reflectance of one of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 53.48%, the average reflectance of the other of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 13.49%, and the difference between the average reflectances of the light-in side and the light-out side of the film-coated article 10 in the entire waveband of visible light was 30.99%.

[0357] In summary, the difference between the average reflectance or the average transmittance of the film-coated article 10 in the examples in which the buffer layer 2 is arranged in the film-coated article 10 and the comparative examples in which the film-coated article 10 does not have the buffer layer 2 is small, and therefore the buffer layer 2 in the film-coated article 10 can effectively alleviate the influence of the stress of the optical layer 3 on the substrate 1, improve the impact resistance of the substrate 1, further improve the impact resistance of the film-coated article 10, and improve the strength of the film-coated article 10 while having a small influence on the average reflectance or the average transmittance of the film-coated article 10, and can avoid adverse effects on the optical performance of the film-coated article 10 caused by the arrangement of the buffer layer 2.

[0358] Ring-on-ring test of the film-coated article 10.

[0359] In some embodiments, when the film-coated article 10 in Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0 are subjected to the ring-on-ring test, a material testing machine can be used to perform the ring-on-ring test on the film-coated article 10 in Examples S1-S16 and Comparative Examples D0-D16.

[0360] For example, the upper ring with a diameter of 15 mm is the loading ring, the lower ring with a diameter of 30 mm is the support ring, the circular arc has a diameter of 4 mm, the loading surface of the film-coated article 10 is attached with a 3M 810 tape, the loading surface faces upward and is fixed to the test fixture, the test is performed at a loading speed of 10 mm / s, and the maximum load is recorded until the film-coated article 10 is broken.

[0361] The results of the ring-on-ring test of the film-coated article 10 in Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0 are shown in the following table.

[0362] As can be seen from the test results in the above table, the load of the film-coated article 10 in Examples S1-S16 is greater than 1000 N when subjected to the ring-on-ring test. It should be noted that, since the test results of Examples S11-S16 are similar to those of Examples S1-S10, the data of Examples S1-S10 are shown in the above table to avoid repetition.

[0363] Compared with the substrate 1 alone in Comparative Example D0, the film-coated article 10 obtained by directly disposing the optical layer 3 on one side of the substrate 1 without the buffer layer 2 in Comparative Examples D1-D16 can deteriorate the strength of the substrate 1, and thus the strength of the film-coated article 10 is small. However, by disposing the buffer layer 2 in the film-coated article 10 in Examples S1-S16, the strength deterioration of the substrate 1 caused by the optical layer 3 can be effectively alleviated, which is beneficial to eliminate or weaken the influence of the stress of the optical layer 3 on the substrate 1, and is beneficial to improve the strength of the film-coated article 10.

[0364] Drop ball test of the film-coated article 10.

[0365] In some embodiments, when the film-coated article 10 in Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0 are subjected to the drop ball test, the side surface on which the optical layer 3 of the film-coated article 10 is located faces downward, and is fixed to the drop ball test fixture. A steel ball with a mass of 32 g±1 g and a diameter of 20 mm is used to perform the free-fall impact test, and 4 fixed points of each film-coated article 10 are tested.

[0366] Select different heights to test the surface of the film-coated product 10. The initial test height can be 10 cm, and each time the height is increased by 5 cm. The test is performed from low to high, and when cracks appear on the surface of the film-coated product 10, the test is stopped, and the height of the steel ball when the film-coated product 10 cracks is recorded.

[0367] The results of the drop ball test of the film-coated product 10 in Examples S1-S16 and Comparative Examples D1-D16, and the substrate 1 in Comparative Example D0 are shown in the following table.

[0368] As can be seen from the test results in the above table, when the film-coated product 10 in Examples S1-S16 is subjected to a drop ball test using a steel ball with a diameter of 20 mm and a mass of 32 g ± 1 g, the height at which the film-coated product 10 in Examples S1-S16 breaks is greater than 50 cm. It should be noted that since the test results of Examples S1-S10 are similar to those of Examples S11-S16, to avoid repetition, only the data of Examples S11-S16 are shown in the above table.

[0369] Compared with the substrate 1 alone in Comparative Example D0, the film-coated product 10 obtained by directly disposing the optical layer 3 on one side of the substrate 1 without disposing the buffer layer 2 in Comparative Examples D1-D16 can deteriorate the impact resistance of the substrate 1, and thus the impact resistance of the film-coated product 10 is poor. However, by disposing the buffer layer 2 in the film-coated product 10 in Examples S1-S16, the impact resistance of the substrate 1 can be effectively alleviated, which is beneficial to eliminate or weaken the influence of the stress of the optical layer 3 on the substrate 1, and is beneficial to improve the impact resistance of the film-coated product 10.

[0370] In some embodiments, as shown in FIGS. 36A and 36B, both FIGS. 36A and 36B are a cross-sectional view of a film-coated product 10 according to some embodiments. The film-coated product 10 further comprises a transition layer 4. The transition layer 4 is located between the buffer layer 2 and the substrate 1.

[0371] The transition layer 4 material contains silicon elements, and the content of silicon elements in the transition layer 4 is higher than that in the substrate 1.

[0372] By disposing the transition layer 4, and the content of silicon elements in the transition layer 4 is higher than that in the substrate 1, the number of Si-O-Si bonds between the buffer layer 2 and the substrate 1 can be increased, and thus the bonding force between the buffer layer 2 and the substrate 1 can be improved.

[0373] In some embodiments, the difference between the content of silicon elements in the transition layer 4 and the content of silicon elements in the substrate 1 is greater than or equal to 10%.

[0374] For example, the difference between the silicon element content in the transition layer 4 and the silicon element content in the substrate 1 can be 10%, 12%, 15%, 18%, 20%, 23%, 25%, 28%, 30%, or 33%, etc.

[0375] In some embodiments, the transition layer 4 material can include silicon (Si) or silicon dioxide (SiO2). Si or SiO2 is a porous columnar crystal structure, which is beneficial to increase the contact area between the buffer layer 2 and the substrate 1, and further improve the bonding force between the buffer layer 2 and the substrate 1.

[0376] In some embodiments, the thickness (i.e., the size of the transition layer 4 along the third direction Z) h4 of the transition layer 4 is less than 50 nm.

[0377] For example, the thickness h4 of the transition layer 4 can be 5 nm, 10 nm, 15 nm, 20 nm, 25 nm, 30 nm, 35 nm, 40 nm, 45 nm, or 50 nm, etc.

[0378] The preparation method of the above film-coated product 10 is described in detail below.

[0379] In some embodiments, the preparation method of the film-coated product 10 includes the following steps:

[0380] A1: providing a substrate 1.

[0381] A2: forming a buffer layer 2 on at least part of the surface of the substrate 1.

[0382] A3: forming an optical layer 3 on the side surface of the buffer layer 2 away from the substrate 1.

[0383] In some embodiments, before forming the buffer layer 2 on at least part of the surface of the substrate 1, the substrate 1 can be cleaned. For example, the substrate 1 is placed on the conveying rollers of a horizontal cleaning line to pass through a neutral cleaning agent brushing tank (e.g., the tank liquid temperature is 50°C), a weak alkali cleaning agent brushing tank (e.g., the pH value is 12), and at least one pure water brushing tank at a predetermined speed (e.g., 60 mm / min) to achieve preliminary cleaning of the substrate 1.

[0384] The substrate 1 is placed on the jig of the vacuum coating machine and placed in the designated position of the coating machine, the cabin door is closed, and the vacuum pump is turned on. When the vacuum degree of the coating chamber is reduced to 3x10 -3 Pa, 50 sccm of argon gas is filled into the machine, and the rotating shaft is opened. After the gas stabilizes, the ion source (average energy 800 eV) is turned on to perform ion cleaning on the surface of the substrate 1 for a predetermined time (e.g., 180 s).

[0385] In some embodiments, the buffer layer 2 can be deposited on at least part of the surface of the substrate 1 by a physical vapor deposition (PVD) process. For example, the vacuum degree in the reaction chamber is brought to 5x10 -3 Pa, the electron beam is aimed at the crucible containing the buffer layer film material, the electron beam power is turned on at 3%, and the buffer layer 2 is formed at a preset evaporation speed and film deposition time. The buffer layer 2 is grown by molecular deposition, has better uniformity, better film quality, real-time monitoring of film thickness, and high precision.

[0386] In some embodiments, the optical layer 3 can be deposited on the surface of the side of the buffer layer 2 away from the substrate 1 by a physical vapor deposition (PVD) process. The optical layer 3 can be completed in the same device as the buffer layer 2, which can reduce the loss during material transfer, thereby improving the yield of the film-coated product 10 and reducing the cost of the production equipment.

[0387] The above is only a specific embodiment of the present disclosure, but the protection scope of the present disclosure is not limited thereto. Any person skilled in the art can easily think of changes or replacements within the technical scope disclosed by the present disclosure, which should be covered within the protection scope of the present disclosure. Therefore, the protection scope of the present disclosure should be subject to the protection scope of the claims.

Claims

1. A film-coated article, comprising: a substrate (1) ; a buffer layer (2) on at least part of a surface of a side of the substrate (1) ; and an optical layer (3) on a surface of a side of the buffer layer (2) away from the substrate (1), the optical layer (3) comprising at least one first sub-layer (31) and at least one second sub-layer (32), the first sub-layer (31) and the second sub-layer (32) being alternately stacked, the first sub-layer (31) having a refractive index greater than that of the second sub-layer (32) ; wherein a thickness of the buffer layer (2) is positively correlated with a sum of a first preset thickness and a second preset thickness; the first preset thickness being a thickness of the buffer layer (2) required by all the first sub-layers (31) contained in the optical layer (3), the first preset thickness being obtained at least according to thicknesses of the first sub-layers (31) ; the second preset thickness being a thickness of the buffer layer (2) required by all the second sub-layers (32) contained in the optical layer (3), the second preset thickness being obtained at least according to thicknesses of the second sub-layers (32). The film-coated article satisfies at least one of the following:

2. The coated article of claim 1, wherein, the optical layer (3) comprises the first sub-layers (31) of at least one material, the first preset thickness is positively correlated with a sum of thicknesses of all the first sub-layers (31) of each of the at least one material, or the optical layer (3) comprises the second sub-layers (32) of at least one material, the second preset thickness is positively correlated with a sum of thicknesses of all the second sub-layers (32) of each of the at least one material. The first preset thickness is further obtained according to an elastic modulus of the buffer layer (2), an elastic modulus of the substrate (1) and an elastic modulus of the first sub-layer (31) ; 3. The coated article of claim 1, wherein, The second preset thickness is further obtained according to an elastic modulus of the buffer layer (2), an elastic modulus of the substrate (1) and an elastic modulus of the second sub-layer (32) ; The first preset thickness and the second preset thickness are both negatively correlated with the elastic modulus of the substrate (1) ; The first preset thickness and the second preset thickness are both positively correlated with the elastic modulus of the buffer layer (2) ; The first preset thickness is positively correlated with the elastic modulus of the first sub-layer (31), and the second preset thickness is positively correlated with the elastic modulus of the second sub-layer (32). The first preset thickness is further obtained according to a Poisson's ratio of the buffer layer (2), a Poisson's ratio of the substrate (1) and a Poisson's ratio of the first sub-layer (31) ; 4. The coated article of claim 1, wherein, The second preset thickness is further obtained according to a Poisson's ratio of the buffer layer (2), a Poisson's ratio of the substrate (1) and a Poisson's ratio of the second sub-layer (32) ; The first preset thickness and the second preset thickness are both negatively correlated with the Poisson's ratio of the substrate (1) ; The first preset thickness and the second preset thickness are both positively correlated with the Poisson's ratio of the buffer layer (2) ; The first preset thickness is positively correlated with the Poisson's ratio of the first sub-layer (31), and the second preset thickness is positively correlated with the Poisson's ratio of the second sub-layer (32). ​ 5. The coated article of claim 1, wherein, The optical layer (3) further comprises at least one light-absorbing layer (33), and the at least one light-absorbing layer (33) is provided with the at least one first sub-layer (31) and the at least one second sub-layer (32) on the side close to the buffer layer (2) and the side away from the buffer layer (2) respectively; The thickness of the buffer layer (2) is also positively correlated with a third preset thickness. The third preset thickness is the thickness of the buffer layer (2) required by all the light-absorbing layers (33) contained in the optical layer (3); and the third preset thickness is obtained at least according to the thickness of the light-absorbing layer (33).

6. The coated article of claim 5, wherein, The optical layer (3) comprises the light-absorbing layer (33) of at least one material; and the third preset thickness is positively correlated with the sum of the thicknesses of all the light-absorbing layers (33) of each of the at least one material.

7. The coated article of claim 5, wherein, The third preset thickness is also obtained according to the elastic modulus of the buffer layer (2), the elastic modulus of the substrate (1) and the elastic modulus of the light-absorbing layer (33); The third preset thickness is negatively correlated with the elastic modulus of the substrate (1); The third preset thickness is positively correlated with the elastic modulus of the buffer layer (2); The third preset thickness is positively correlated with the elastic modulus of the light-absorbing layer (33).

8. The coated article of claim 5, wherein, The third preset thickness is also obtained according to the Poisson's ratio of the buffer layer (2), the Poisson's ratio of the substrate (1) and the Poisson's ratio of the light-absorbing layer (33); The third preset thickness is negatively correlated with the Poisson's ratio of the substrate (1); The third preset thickness is positively correlated with the Poisson's ratio of the buffer layer (2); The third preset thickness is positively correlated with the Poisson's ratio of the light-absorbing layer (33).

9. The coated article of any of claims 1-8, wherein, The thickness of the optical layer (3) is uniform; and the thickness of the buffer layer (2) is uniform.

10. The coated article of any of claims 1-9, wherein, The thickness of the buffer layer (2) is less than or equal to 1000 nm.

11. The coated article of any of claims 1-10, wherein, The elastic modulus of the buffer layer (2) is 1 Gpa-30 Gpa.

12. The coated article of any of claims 1-11, wherein, The buffer layer (2) is provided in a colorless and transparent manner.

13. The coated article of any of claims 1-12, wherein, The difference between the refractive index of the buffer layer (2) and the refractive index of the substrate (1) is less than or equal to 0.

1.

14. The coated article of any of claims 1-13, wherein, The material of the buffer layer (2) comprises silicon-containing organic matter; the film-coated product (10) further comprises a transition layer (4) located between the substrate (1) and the buffer layer (2); and the material of the transition layer (4) contains silicon elements. The content of silicon elements in the transition layer (4) is higher than the content of silicon elements in the substrate (1).

15. The coated article of claim 14, wherein, The difference between the content of silicon elements in the transition layer (4) and the content of silicon elements in the substrate (1) is greater than or equal to 10%.

16. The coated article of any of claims 1-15, wherein, The load capacity of the film-coated product (10) is greater than 1000 N when the ring-on-ring test is performed.

17. The coated article of any of claims 1-16, wherein, When a steel ball with a diameter of 20 mm and a mass of 31 g-33 g is used to perform the falling ball test on the film-coated product (10), the height at which the film-coated product (10) is broken is greater than 50 cm.

18. A housing comprising the film-coated product (10) according to any one of claims 1-17.

19. An electronic device comprising a display panel (200) and a housing (100) according to claim 18, the display panel (200) and the housing (100) being arranged in a stack.

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