Plasma generation apparatus and electrical device

Abstract

A plasma generation apparatus (100) and an electrical device. The plasma generation apparatus (100) comprises a dielectric structure (1), a first electrode (2), and a second electrode (3); the dielectric structure (1) covers the second electrode (3); part of the dielectric structure (1) is configured as a planar dielectric layer; and the first electrode (2) is disposed at the side of the planar dielectric layer facing away from the second electrode (3). The use safety of the plasma generation apparatus (100) can be improved, and the dielectric structure (1) can also be configured according to the size of the second electrode (3), without the need to configure an excessively large dielectric structure (1), thereby controlling the volume of the plasma generation apparatus (100) and avoiding an overlarge volume of the plasma generation apparatus (100), and thus facilitating the use of the plasma generation apparatus (100) in a small space.

Description

Plasma generating device and electric appliance

[0001] Related applications

[0002] This application claims priority to Chinese Patent Application No. 202411119969.0, filed on August 14, 2024, and Chinese Patent Application No. 202421976312.1, filed on August 14, 2024, the contents of which are incorporated herein by reference in their entirety. TECHNICAL FIELD

[0003] The present application relates to the technical field of plasma, in particular to a plasma generating device and an electric appliance. BACKGROUND

[0004] Plasma sterilization and purification utilizes the energy and active components generated by discharge between two electrodes to kill VOC (volatile organic compounds) and viruses and bacteria in the air, generate water and carbon dioxide, and has advantages different from other air purification technologies.

[0005] In related technologies, in order to improve the use safety, the distance between the two electrodes needs to be increased, which easily leads to that the plasma generating device is too large in size and is difficult to use in a smaller space. SUMMARY

[0006] The main purpose of the present application is to provide a plasma generating device and an electric appliance, which aims to avoid that the plasma generating device is too large in size under the condition of safe use of the plasma generating device.

[0007] To achieve the above-mentioned purpose, the plasma generating device provided by the present application comprises a dielectric structure, a first electrode and a second electrode, the dielectric structure covers the second electrode, part of the dielectric structure is arranged as a planar dielectric layer, and the first electrode is arranged on the side of the planar dielectric layer away from the second electrode.

[0008] The present application also provides a plasma generating device, which comprises a dielectric structure, a first electrode and a second electrode, at least part of the dielectric structure is located between the first electrode and the second electrode, the first electrode and the second electrode coincide in the orthographic projection part of the dielectric structure, and the maximum circumscribed circle diameter of the overlapping area is L.

[0009] The first electrode and the second electrode have a first creepage distance D min and a second creepage distance D max, the radius R of the largest inscribed circle of the dielectric structure when the dielectric structure is spread into a planar structure satisfies (D min +L) / 2≤R≤(D max +L) / 2.

[0010] In an embodiment, the second creepage distance D max ≥3D min .

[0011] In an embodiment, the dielectric structure is a planar dielectric structure.

[0012] Or, the dielectric structure covers the second electrode, and at least part of the surface of the side of the second electrode away from the first electrode is exposed outside the dielectric structure.

[0013] In an embodiment, at least one of the first electrode and the second electrode is arranged on the surface of part of the dielectric structure between the first electrode and the second electrode.

[0014] And / or, at least one of the first electrode and the second electrode is arranged apart from part of the dielectric structure between the first electrode and the second electrode.

[0015] In an embodiment, the distance between the first electrode and the second electrode is H, and the thickness of part of the dielectric structure between the first electrode and the second electrode is d, satisfying 0≤H-d≤5mm.

[0016] And / or, the thickness d of part of the dielectric structure between the first electrode and the second electrode is ≤2mm.

[0017] In an embodiment, at least part of the first electrode arranged opposite to the dielectric structure is a sheet electrode structure.

[0018] Or, the first electrode is a conductive film.

[0019] Or, the first electrode is a conductive plating layer arranged on the surface of the dielectric structure.

[0020] Or, the plasma generating device further comprises a first carrier arranged opposite to the dielectric structure, and the first electrode is a conductive plating layer arranged on the surface of the first carrier.

[0021] Or, the first electrode is a wire.

[0022] In an embodiment, at least part of the second electrode arranged opposite to the dielectric structure is a sheet electrode structure.

[0023] Or, at least part of the second electrode arranged opposite to the dielectric structure is a conductive film;

[0024] Or, at least part of the second electrode is a conductive plating layer arranged on the surface of the dielectric structure;

[0025] Or, the plasma generating device further comprises a second carrier arranged opposite to the dielectric structure, and at least part of the second electrode is a conductive plating layer arranged on the surface of the second carrier.

[0026] In an embodiment, the dielectric structure comprises an insulating sheet;

[0027] And / or, the dielectric structure comprises at least one insulating coating layer;

[0028] And / or, the material of the dielectric structure is at least one of ceramic, quartz and polytetrafluoroethylene.

[0029] In an embodiment, at least part of the first electrode is arranged as a first extension arranged on the surface of the dielectric structure or arranged parallel to the dielectric structure with a spacing.

[0030] In an embodiment, the plasma generating device further comprises a housing, the housing forms a placement space inside and is provided with at least one outlet communicating with the placement space;

[0031] The dielectric structure, at least part of the first electrode and at least part of the second electrode are arranged in the placement space, and the first extension is arranged to extend towards one of the outlets.

[0032] In an embodiment, one of the outlets is arranged opposite to the surface of the dielectric structure, and the end of the first extension is exposed to the outlet.

[0033] In an embodiment, the housing is further provided with a flow guide structure extending from the edge of the outlet to the outside of the housing, and the end of the first extension is arranged towards the flow guide structure.

[0034] In an embodiment, the inner surface of the housing is provided with a first mounting groove, and at least part of the first extension is arranged in the first mounting groove;

[0035] And / or, the inner surface of the housing is provided with a first limiting groove, and the side of the first extension is provided with a first limiting section arranged in the first limiting groove;

[0036] And / or, part of the first electrode extends to the outside of the housing to form a first power connection section.

[0037] The application further provides a plasma generating device, comprising a dielectric structure, a first electrode and a second electrode, at least part of the dielectric structure is arranged as a planar dielectric layer, and the first electrode and the second electrode are arranged on two sides of the planar dielectric layer respectively.

[0038] The distance between the first electrode and the second electrode along the thickness direction of the planar dielectric layer is H, the thickness of the planar dielectric layer is d, and 0≤H-d≤5mm is satisfied.

[0039] In an embodiment, the thickness d of the planar dielectric layer is ≤2mm.

[0040] The application further provides an electric appliance provided with the plasma generating device as described in any one of the preceding embodiments.

[0041] In the technical solution of the application, the first electrode and the second electrode are arranged separately by the dielectric structure, wherein the dielectric structure can completely cover the second electrode, so that the first electrode and the second electrode are insulated, the creepage distance between the two electrodes is infinite, and there is no problem of creepage, the dielectric structure can be arranged according to the size of the second electrode, without the need to arrange a dielectric structure that is too large, so that the volume of the plasma generating device is controlled, the problem of too large volume of the plasma generating device is avoided, and the plasma generating device is beneficial to use in a small space.

[0042] In addition, part of the conductive surface of the first electrode and the second electrode can be exposed to the outside, for example, the dielectric structure can be arranged as a planar dielectric structure between the first electrode and the second electrode, or the dielectric structure can form a covering structure with an opening for covering the second electrode; the first creepage distance D min and the second creepage distance D max between the first electrode and the second electrode can be determined according to the voltage range used by the plasma generating device, the first creepage distance is set according to the use requirement of the plasma generating device in the first working condition, and can be the minimum creepage distance for limiting the phenomenon of creepage between the first electrode and the second electrode in the first working condition; the second creepage distance is set according to the use requirement of the plasma generating device in the second working condition, and can be the minimum creepage distance for limiting the phenomenon of creepage between the first electrode and the second electrode in the second working condition; the first working condition and the second working condition are different use environments of the plasma generating device, and the first working condition and the second working condition can be differences in temperature, pressure, humidity, dust concentration and environmental pollution level, etc. The radius R of the maximum inscribed circle of the dielectric structure when spread into a planar structure satisfies (D min +L) / 2≤R≤(D max+L) / 2 can obtain stable and more powerful plasma while ensuring the safety of the plasma generator. It can also avoid the excessive size of the dielectric structure and the plasma generator, which is beneficial for the use of the plasma generator in a small space. Attached Figure Description

[0043] To more clearly illustrate the technical solutions in the embodiments of this application or the prior art, the drawings used in the description of the embodiments or the prior art will be briefly introduced below. Obviously, the drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on the structures shown in these drawings without creative effort.

[0044] Figure 1 is a structural diagram of the first embodiment of the plasma generating device provided in this application;

[0045] Figure 2 is a structural diagram of a second embodiment of the plasma generating device provided in this application;

[0046] Figure 3 is a structural diagram of the third embodiment of the plasma generating device provided in this application;

[0047] Figure 4 is a schematic diagram of an embodiment of the dielectric structure spread into a planar structure in the plasma generating device provided in this application;

[0048] Figure 5 is a structural diagram of the fourth embodiment of the plasma generating device provided in this application;

[0049] Figure 6 is a structural diagram of the fifth embodiment of the plasma generating device provided in this application;

[0050] Figure 7 is a structural diagram of the sixth embodiment of the plasma generating device provided in this application;

[0051] Figure 8 is a structural diagram of the seventh embodiment of the plasma generating device provided in this application;

[0052] Figure 9 is a structural diagram of the eighth embodiment of the plasma generating device provided in this application;

[0053] Figure 10 is an exploded view of the plasma generator in Figure 9;

[0054] Figure 11 is a structural diagram of the first half-shell in Figure 10.

[0055] Explanation of icon numbers:

[0056] 100, plasma generating device; 1, dielectric structure; 2, first electrode; 21, first extension section; 22, first power connection section; 23, first limiting section; 3, second electrode; 31, second extension section; 32, second power connection section; 33, second limiting section; 4, housing; 41, accommodating space; 42, outlet; 43, first half housing; 44, second half housing; 45, first mounting groove; 46, second mounting groove; 47, first limiting groove; 48, second limiting groove; 49, flow guide structure.

[0057] The implementation, functional features and advantages of the present application will be further described with reference to the embodiments and the accompanying drawings. Embodiments of the present application

[0058] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only part of the embodiments of the present application, rather than all the embodiments. Based on the embodiments in the present application, all other embodiments obtained by those skilled in the art without creative work fall within the scope of protection of the present application.

[0059] Plasma sterilization and purification is to use the energy and active components generated between two electrodes to kill VOC (volatile organic compounds) and viruses and bacteria in the air, generate water and carbon dioxide, and has the advantage of being different from other air purification technologies.

[0060] In the related art, the generation of plasma requires the application of alternating high voltage between two electrodes. In order to improve the use safety, the air creepage distance between the two electrodes needs to be increased as the applied voltage increases, which easily leads to the problem that the plasma generating device is too large in size and is difficult to use in a small space.

[0061] In order to solve the above problems, the present application provides a plasma generating device 100.

[0062] Please refer to FIG. 1, the present application also provides a plasma generating device 100, the plasma generating device 100 includes a dielectric structure 1, a first electrode 2 and a second electrode 3, the dielectric structure 1 covers the second electrode 3, part of the dielectric structure 1 is set as a planar dielectric layer, the first electrode 2 is arranged on the side of the planar dielectric layer away from the second electrode 3.

[0063] Among them, the dielectric structure 1 can be made of ceramic, quartz or other insulating materials, which can be a planar dielectric structure, or the dielectric structure 1 can form a covering space for covering at least part of the second electrode 3 or the first electrode 2. The first electrode 2 and the second electrode 3 are separated by the dielectric structure 1.

[0064] In the application of the plasma generating device 100, an alternating voltage is input between the first electrode 2 and the second electrode 3, so that a dielectric barrier discharge is formed on the surface of the dielectric structure 1, and acts on the fluid (such as air, exhaust gas of some processes or liquid) flowing through the first electrode 2 and the second electrode 3, so that the fluid and the substances in the fluid are charged and become plasma, so as to generate plasma, kill VOC and viruses and bacteria in the fluid, generate water and carbon dioxide, and achieve the purification effect.

[0065] In the plasma generating device 100, it is necessary to ensure the mutual insulation between the first electrode 2 and the second electrode 3. In the embodiment, the dielectric structure 1 completely covers the second electrode 3, so that the second electrode 3 has no exposed conductive surface, the first electrode 2 and the second electrode 3 are insulated by the dielectric structure 1, the creepage distance between the two electrodes is infinite, and there is no problem of creeping, thereby improving the use safety of the plasma generating device 100; at this time, the dielectric structure 1 can be arranged according to the size of the second electrode 3, without the need to arrange a dielectric structure 1 that is too large, so as to control the volume of the plasma generating device 100, avoid the volume of the plasma generating device 100 being too large, and be beneficial to the use of the plasma generating device 100 in a small space.

[0066] In combination with FIGS. 2 to 4, the application further provides a plasma generating device 100, which comprises a dielectric structure 1, a first electrode 2 and a second electrode 3, at least part of the dielectric structure 1 is located between the first electrode 2 and the second electrode 3, the first electrode 2 and the second electrode 3 coincide in the orthographic projection part of the dielectric structure 1, and the maximum circumscribed circle diameter of the overlapping area is L; the first electrode 2 and the second electrode 3 have a first creepage distance D min and a second creepage distance D max , and the dielectric structure 1 spreads into a planar structure, and the maximum inscribed circle has a radius R, which satisfies (D min +L) / 2≤R≤(D max +L) / 2.

[0067] In the embodiment, the dielectric structure 1 can be arranged as a planar dielectric structure, or as a covering structure having an opening and covering one of the electrodes, so that the first electrode 2 and the second electrode 3 both have part of the surface exposed to the air. In order to avoid the phenomenon of creeping between the first electrode 2 and the second electrode 3 along the surface of the air or the dielectric structure 1, it is necessary to make the electrical gap or the creepage distance between the first electrode 2 and the second electrode 3 not less than the first creepage distance D min ; the first creepage distance D minThe minimum creepage distance between the first electrode 2 and the second electrode 3 when the first electrode 2 and the second electrode 3 are arranged on the surface of the dielectric structure 1, and the minimum creepage distance needs to be met to avoid the occurrence of the creepage phenomenon.

[0068] In the embodiments of the present application, the first electrode 2 and the second electrode 3 can be arranged on the two surfaces of the dielectric structure 1 facing away from each other, or at least one of the first electrode 2 and the second electrode 3 can be arranged spaced apart from the surface of the dielectric structure 1 facing away from the other electrode. When the first electrode 2 and the second electrode 3 are arranged on the surface of the dielectric structure 1, it is necessary to avoid the occurrence of the creepage phenomenon along the surface of the dielectric structure 1, that is, it is necessary to insulate the first electrode 2 and the second electrode 3 from each other to improve the safety in use. However, when the plasma generating device 100 is used under different working conditions, the creepage distance required to avoid the occurrence of the creepage phenomenon between the first electrode 2 and the second electrode 3 is different. For example, in a working condition with a relatively high level of environmental pollution, the creepage distance required to be met by the first electrode 2 and the second electrode 3 is greater than that in a working condition with a relatively low level of environmental pollution. The difference in working conditions can also be a difference in temperature, a difference in air pressure, a difference in humidity, a difference in dust concentration, etc. The creepage distance requirements under different working conditions can be obtained according to experiments, experience or safety regulations, etc.

[0069] In the embodiments of the present application, the minimum creepage distance required to be met between the first electrode 2 and the second electrode 3 when the plasma generating device 100 is used in the first working condition is defined as the first creepage distance D min , and the minimum creepage distance required to be met between the first electrode 2 and the second electrode 3 when the plasma generating device 100 is used in the second working condition is defined as the second creepage distance D max . The second creepage distance is not less than the first creepage distance, and the environment in the second working condition is relatively deteriorated compared with the first working condition, for example, too humid or a relatively high level of pollution, etc.

[0070] In addition, when at least one of the first electrode 2 and the second electrode 3 is arranged spaced apart from the dielectric structure 1, the shortest distance between the first electrode 2 and the second electrode 3 measured along the air, i.e., the electrical gap, is greater than the creepage distance when the first electrode 2 and the second electrode 3 are arranged on the dielectric structure 1. Therefore, when the size of the dielectric structure 1 is set according to the condition that both electrodes are arranged on the dielectric structure 1 and the creepage distance between the two electrodes is not less than the first creepage distance, even if at least one of the first electrode 2 and the second electrode 3 is arranged spaced apart from the dielectric structure 1, the plasma generating device 100 can still be safely used.

[0071] In the embodiments of the present application, the first electrode 2 and the second electrode 3 can be partially overlapped in the projection area on the dielectric structure 1, so as to reduce the straight-line distance between the first electrode 2 and the second electrode 3, thereby reducing the excitation voltage of the plasma generating device 100, improving the use safety of the plasma generating device 100, and reducing the first creepage distance to be met.

[0072] Further, the electrode overlapping position needs to be at the center position or the position close to the center of the dielectric structure 1. When the dielectric structure 1 is in a spread state, the dielectric structure 1 is always in a spread state when it is a planar dielectric structure, and when the dielectric structure 1 is set as a cladding structure with an opening, the spread state is that each surface of the dielectric structure 1 forming the cladding structure is spread to the same surface. The embodiments of the present application also limit the size of the electrode, and define that the maximum circumscribed circle diameter of the overlapping projection area of the first electrode 2 and the second electrode 3 on the surface of the dielectric structure 1 is L, and the radius R of the maximum inscribed circle of the planar structure formed by the dielectric structure 1 in the spread state satisfies (D min +L) / 2≤R≤(D max +L) / 2. This setting can meet the safety use requirement of the plasma generating device 100, and can reasonably set the size of the dielectric structure 1 to avoid the size of the dielectric structure 1 being set too large. According to the required plasma energy demand, a suitable excitation voltage can be used, and the dielectric structure 1 with a proper size can be set according to the above size range, so as to improve the structural design flexibility of the plasma generating device 100. In some embodiments, the plasma generating device 100 is provided with multiple electrodes, for example, at least two first electrodes 2 can be set to overlap the same second electrode 3, or at least two first electrodes 2 and at least two second electrodes 3 can be set to correspond one by one. The minimum and maximum inscribed circles should be calculated respectively, and then the radius R of the maximum inscribed circle of the planar structure formed by the dielectric structure 11 in the spread state is defined.

[0073] Therefore, in the technical scheme of the present application, the first electrode 2 and the second electrode 3 are arranged separately by the dielectric structure 1, wherein part of the conductive surface of the first electrode 2 and the second electrode 3 can be exposed to the outside, for example, the dielectric structure 1 can be set as a planar dielectric structure between the first electrode 2 and the second electrode 3, or the dielectric structure 1 can form a cladding structure with an opening to cover the second electrode 3; the first creepage distance D min and the second creepage distance D maxThe first creepage distance is set according to the use requirement of the plasma generating device 100 in the first working condition, and can be the minimum creepage distance for limiting the occurrence of the creepage phenomenon between the first electrode 2 and the second electrode 3 in the first working condition; the second creepage distance is set according to the use requirement of the plasma generating device 100 in the second working condition, and can be the minimum creepage distance for limiting the occurrence of the creepage phenomenon between the first electrode 2 and the second electrode 3 in the second working condition; the first working condition and the second working condition are different use environments of the plasma generating device 100, and the first working condition and the second working condition can be differences in temperature, pressure, humidity, dust concentration, environmental pollution level, etc. The radius (D min + L) / 2 ≤ R ≤ (D max + L) / 2, which can not only ensure the use safety of the plasma generating device 100, but also obtain stable and stronger plasma, and can avoid the size of the dielectric structure 1 and the volume of the plasma generating device 100 being too large, which is beneficial to the use of the plasma generating device 100 in a small space.

[0074] In an embodiment, the second creepage distance D max ≥ 3D min of the first electrode 2 and the second electrode 3. In this way, the size of the dielectric structure 1 can be set according to the first creepage distance in the normal use environment as the setting basis of the second creepage distance, so as to ensure the performance stability of the plasma generating device 100 in harsh environments, and facilitate the structural design of the plasma generating device 100.

[0075] Please refer to FIGS. 2 and 3. In an embodiment, the dielectric structure 1 is a planar dielectric structure; or the dielectric structure 1 forms a covered space with an opening, and the second electrode 3 is arranged in the covered space, and the opening is located on the side of the second electrode 3 away from the first electrode 2.

[0076] In this embodiment, the dielectric structure 1 can be a planar dielectric structure, such as an insulating sheet or an insulating coating, and the first electrode 2 and the second electrode 3 are arranged on the two sides of the planar dielectric structure, respectively. The planar dielectric structure as the dielectric structure 1 is simple in structure and facilitates the disassembly and assembly of the plasma generating device 100.

[0077] In addition, the dielectric structure 1 can be configured to form an encapsulation space with an opening, and the second electrode 3 is arranged in the encapsulation space; for example, the dielectric structure 1 comprises a planar layer and a side portion, the planar layer is arranged between the first electrode 2 and the second electrode 3, the side portion extends from the planar layer to a side away from the first electrode 2 and is arranged at an angle with the planar layer, or the dielectric structure 1 can extend to a surface of the second electrode 3 away from the first electrode 2. In some embodiments, the dielectric structure 1 can be configured to adopt a sheet structure as a raw material, and the edges of the sheet structure are folded in a direction away from the first electrode 2 to encapsulate part of the surface of the second electrode 3. By arranging the dielectric structure 1 as an encapsulation structure, the cross-sectional size of the dielectric structure 1 can be reduced, thereby reducing the volume of the plasma generating device 100, which is conducive to the use of the plasma generating device 100 in a smaller space.

[0078] Please refer to FIGS. 2-4. In an embodiment, the distance between the first electrode 2 and the second electrode 3 is H, and the thickness of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is d, which satisfies 0≤H-d≤5mm.

[0079] In the embodiment, the relationship between the distance H between the first electrode 2 and the second electrode 3 and the distance d between the thickness of the dielectric structure 1 satisfies 0≤H-d≤5mm; specifically, the first electrode 2 and the second electrode 3 can be arranged on two surfaces of the dielectric structure 1 respectively, at this time, the distance between the first electrode 2 and the second electrode 3 is approximately the thickness of the dielectric structure 1; in addition, one of the first electrode 2 and the second electrode 3 can be arranged on the surface of the dielectric structure 1, and the other of the first electrode 2 and the second electrode 3 is arranged away from the dielectric structure 1, at this time, the distance between the electrode arranged away from the dielectric structure 1 and the dielectric structure 1 is not more than 5mm; or the first electrode 2 and the second electrode 3 are both arranged away from the dielectric structure 1, at this time, the sum of the distances between the two electrodes and the dielectric structure 1 is not more than 5mm. By arranging the first electrode 2 and the second electrode 3 close to the dielectric structure 1, the thickness and volume of the plasma generating device 100 can be reduced.

[0080] In an embodiment, the thickness d of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is ≤2mm.

[0081] In the embodiment, the dielectric structure 1 can be an insulating layer with a thickness not more than 2mm, or can be an insulating coating arranged on the surface of the electrode, so that the thickness of the dielectric structure 1 is almost negligible. By such arrangement, the thickness and volume of the plasma generating device 100 are relatively small, which is conducive to the application of the plasma generating device 100 in a smaller space.

[0082] At least one of the first electrode 2 and the second electrode 3 is arranged on a surface of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3.

[0083] At least one of the first electrode 2 and the second electrode 3 is arranged on a surface of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3.

[0084] In the embodiment, the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is a dielectric layer. At least one of the first electrode 2 and the second electrode 3 can be arranged on a surface of the dielectric layer. For example, the first electrode 2 and the second electrode 3 are arranged on two surfaces of the dielectric layer respectively, or one of the first electrode 2 and the second electrode 3 is arranged on a surface of the dielectric layer and the other is arranged away from the dielectric layer. The electrode arranged on the surface of the dielectric layer can be attached to the surface of the dielectric structure 1, or the electrode can be a plating layer on the surface of the dielectric structure 1, or the electrode and the dielectric structure 1 can be a conductive plating layer and an insulating coating layer arranged on a substrate. In this way, the thickness and volume of the plasma generating device 100 can be reduced.

[0085] In some embodiments, the first electrode 2 and the second electrode 3 can be arranged away from the dielectric layer between the first electrode 2 and the second electrode 3. In this case, the contact area between the electrodes and air in the plasma generating device 100 is increased, and the plasma generation efficiency is improved.

[0086] The application further provides a plasma generating device 100, which comprises a dielectric structure 1, a first electrode 2 and a second electrode 3. At least part of the dielectric structure 1 is arranged as a planar dielectric layer. The first electrode 2 and the second electrode 3 are arranged on two sides of the planar dielectric layer respectively. The distance between the first electrode 2 and the second electrode 3 along the thickness direction of the planar dielectric layer is H, and the thickness of the planar dielectric layer is d. It is satisfied that 0≤H-d≤5mm.

[0087] In the embodiment, the first electrode 2 and the second electrode 3 are respectively arranged on the two sides of the dielectric structure 1 opposite to the planar dielectric layer, and the projection profiles of the first electrode 2 and the second electrode 3 on the surface of the planar dielectric layer can or can not coincide. The relationship between the distance H between the first electrode 2 and the second electrode 3 in the thickness direction of the planar dielectric layer and the distance d between the first electrode 2 and the second electrode 3 satisfies 0≤H-d≤5mm. Specifically, the first electrode 2 and the second electrode 3 can be respectively arranged on the two surfaces of the dielectric structure 1 opposite to each other, and the distance between the first electrode 2 and the second electrode 3 is substantially the thickness of the dielectric structure 1. Alternatively, one of the first electrode 2 and the second electrode 3 can be arranged on the surface of the dielectric structure 1, and the other of the first electrode 2 and the second electrode 3 is spaced apart from the dielectric structure 1, and the distance between the electrode spaced apart from the dielectric structure 1 and the dielectric structure 1 is not more than 5mm. Alternatively, the first electrode 2 and the second electrode 3 are both spaced apart from the dielectric structure 1, and the sum of the distances between the two electrodes and the dielectric structure 1 is not more than 5mm. In this arrangement, the first electrode 2 and the second electrode 3 are separated by the dielectric structure 1, and the first electrode 2 and the second electrode 3 are both close to the dielectric structure 1, which can reduce the thickness and volume of the plasma generating device 100.

[0088] Please refer to FIGS. 6-8. In an embodiment, the thickness d of the part of the dielectric structure 1 between the first electrode 2 and the second electrode 3 is not more than 2mm.

[0089] In the embodiment, the dielectric structure 1 can be an insulating layer with a thickness not more than 2mm, or can be an insulating coating coated on the surface of the electrode, so that the thickness of the dielectric structure 1 is almost negligible. In this way, the thickness and volume of the plasma generating device 100 are relatively small, which is beneficial to the application of the plasma generating device 100 in a smaller space.

[0090] In an embodiment, the first electrode 2 and the second electrode 3 partially coincide in the projection area of the planar dielectric layer. In this way, the straight-line distance between the first electrode 2 and the second electrode 3 can be reduced, so that the excitation voltage of the plasma generating device 100 can be reduced, which can improve the safety of the plasma generating device 100 and reduce the required first creepage distance.

[0091] In an embodiment, at least part of the first electrode 2 arranged opposite to the dielectric structure 1 is a sheet electrode structure; or the first electrode 2 is a conductive film; or the first electrode 2 is a conductive plating layer arranged on the surface of the dielectric structure 1; or the plasma generating device 100 further comprises a first carrier arranged opposite to the dielectric structure 1, and the first electrode 2 is a conductive plating layer arranged on the surface of the first carrier; or the first electrode 2 is a wire.

[0092] In the embodiment, the first electrode 2 can be one of a sheet electrode structure, a conductive film, a conductive plating layer, and a wire. When the first electrode 2 is a sheet electrode structure, the thickness of the first electrode 2 can be set according to actual needs, and the first electrode 2 can be generally made of a metal material such as silver, gold, or copper, a carbon material, a conductive polymer, or other materials, so that the first electrode 2 has relatively good structural strength and good performance stability. When the first electrode 2 is made of a conductive film or a conductive plating layer, the thickness of the first electrode 2 is small, which is conducive to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving the applicability and use flexibility. The conductive plating layer can be directly arranged on the surface of the dielectric structure 1, further reducing the overall thickness of the first electrode 2 and the dielectric structure 1, and the first carrier can also be provided to arrange the conductive plating layer to form the first electrode 2. The sheet electrode structure, the conductive film, and the conductive plating layer can be set to a desired shape and structure according to actual needs, for example, the part of the first electrode 2 arranged opposite to the dielectric structure 1 can be set to a strip structure, so as to control the plasma generation area and diffusion direction. When the first electrode 2 is made of a wire, the end of the first electrode 2 is approximately a sharp end, so that the plasma is concentrated in the end region.

[0093] In an embodiment, at least part of the second electrode 3 arranged opposite to the dielectric structure 1 is a sheet electrode structure; or, at least part of the second electrode 3 arranged opposite to the dielectric structure 1 is a conductive film.

[0094] Or, at least part of the second electrode 3 is a conductive plating layer arranged on the surface of the dielectric structure 1; or, the plasma generating device 100 further comprises a second carrier arranged opposite to the dielectric structure 1, and at least part of the second electrode 3 is a conductive plating layer arranged on the surface of the second carrier.

[0095] In the embodiment, the part of the second electrode 3 arranged opposite to the dielectric structure 1 can be provided in the form of a sheet electrode structure, a conductive film, a conductive plating layer, or the like. When the second electrode 3 is provided in the form of a sheet electrode structure, the thickness of the second electrode 3 can be set according to actual requirements, and the second electrode 3 can be generally made of a metal material such as silver, gold, copper, a carbon material, a conductive polymer, or the like, so that the second electrode 3 has relatively good structural strength and good performance stability. When the second electrode 3 is made in the form of a conductive film or a conductive plating layer, the thickness of the second electrode 3 is relatively small, which is conducive to reducing the thickness and volume of the plasma generating device 100, facilitating the application of the plasma generating device 100 in a small space, and improving the applicability and use flexibility of the plasma generating device 100. The conductive plating layer can be directly arranged on the surface of the dielectric structure 1, further reducing the overall thickness of the second electrode 3 and the dielectric structure 1, and a second carrier can also be provided to arrange the conductive plating layer to form the part of the second electrode 3 arranged opposite to the dielectric structure 1. The sheet electrode structure, the conductive film, and the conductive plating layer can all be set to a desired shape and structure according to actual requirements, for example, the second electrode 3 is provided with a second extension 31 in the above embodiment, and the end of the second extension 31 can be provided in the form of an arc, so that the field strength on one side of the second electrode 3 is lower than that of the first extension 21, thereby playing a role in controlling the plasma generating area.

[0096] In an embodiment, the dielectric structure 1 includes an insulating sheet. The insulating sheet can be a ceramic sheet, a quartz sheet, or the like, and has a certain structural strength and is not easy to deform and damage. The thickness of the insulating sheet can be set according to actual requirements and the installation space of the plasma generating device 100 in the application environment or the required working voltage and the like. In some embodiments, the insulating sheet can also be used as a carrier of the first electrode 2 and the second electrode 3 to reduce the thickness of the plasma generating device 100.

[0097] In an embodiment, the dielectric structure 1 includes at least one insulating coating layer. The insulating coating layer can be a polytetrafluoroethylene coating layer, insulating paint, or the like. The dielectric structure 1 can include only one insulating coating layer, which is arranged on the surface of the second electrode 3, so as to reduce the thickness and volume of the plasma generating device 100, facilitate the application of the plasma generating device 100 in a small space, and improve the applicability and use flexibility of the plasma generating device 100. In some embodiments, the dielectric structure 1 can cover the second electrode 3, so that the insulating coating layer is coated on each surface of the second electrode 3. Alternatively, at least part of the surface of the second electrode 3 away from the first electrode 2 can not be covered by the insulating coating layer.

[0098] In addition, the dielectric structure 1 can further comprise an insulating carrier layer and at least one insulating coating layer. The insulating carrier layer can be the insulating sheet in the foregoing embodiments. The at least one insulating coating layer is arranged on the surface of the insulating carrier layer. The insulating coating layer can improve the insulation performance of the dielectric structure 1 and reduce the thickness of the dielectric structure 1, thereby reducing the thickness and volume of the plasma generating device.

[0099] Referring to FIGS. 9 and 10, in an embodiment, at least part of the first electrode 2 is arranged as a first extension 21. The first extension 21 is arranged on the surface of the dielectric structure 1 or is arranged in parallel with the dielectric structure 1 at a distance.

[0100] In the embodiment, at least part of the first electrode 2 is arranged as the first extension 21. The first extension 21 can be arranged on the surface of the dielectric structure 1 or can be arranged at a distance from the dielectric structure 1. The first extension 21 can have a linear structure or a strip structure with a certain width and length. The second electrode 3 is arranged opposite at least part of the surface of the dielectric structure 1. The second electrode 3 can be a sheet electrode, a mesh electrode, a conductive film, or a conductive plating layer arranged opposite the dielectric structure 1. The second electrode 3 can have a shape covering most of the surface of the dielectric structure 1 or can have a sheet strip structure with the second extension 31 as in the following embodiment. The arrangement of the first extension 21 can concentrate the plasma on the side of the first electrode 2 at the end region of the first extension 21, thereby controlling the position of the plasma on the side of the first electrode 2.

[0101] Referring to FIG. 10, in an embodiment, at least part of the second electrode 3 is arranged as a second extension 31. The second extension 31 is arranged on the surface of the dielectric structure 1 or is arranged in parallel with the dielectric structure 1 at a distance. The end of the second extension 31 is blunt to the end of the first extension 21.

[0102] In the embodiment, at least part of the second electrode 3 arranged opposite the dielectric structure 1 is arranged as the second extension 31. The end of the second extension 31 is blunt to the end of the first extension 21. For example, the end of the first extension 21 can have a smaller size than the end of the second extension 31, or the end of the first extension 21 can be arranged as a sharp end, and the end of the second extension 31 can be arranged as an arc-shaped profile. In this way, the field strength on the side of the first extension 21 can be increased, and the plasma in the plasma generating device 100 can be concentrated on the side of the first electrode 2.

[0103] Referring to FIG. 9, in an embodiment, the cross-sectional size of the end of the first extension 21 is arranged to taper. At least one side surface of the first extension 21 is arranged as an inclined surface inclined to the extension direction of the first extension 21.

[0104] In this embodiment, one side surface of the first extension section 21 is an inclined surface inclined with respect to the extension direction of the first extension section 21, and the cross-sectional dimension of the end portion of the first extension section 21 is gradually reduced. At this time, the end portion of the first extension section 21 can have a shape of a circular truncated cone, a prismatic truncated cone, a trapezoid, or a pointed end. With this arrangement, by designing the shape of the end portion of the first extension section 21, the local field intensity of the end portion of the first extension section 21 is increased, and the plasma is more likely to be generated at the end portion of the first extension section 21. Further, by the guidance of the inclined surface, the plasma generated in the region of the first extension section 21 is diffused toward the end portion of the first extension section 21, that is, the diffusion direction of the ion wind generated by the plasma aerodynamic effect is controlled, so that the ion wind is directional. Thus, the diffusion of the plasma generated from the first electrode 2 side of the plasma generating device 100 is controllable, and the plasma generated by the plasma generating device 100 can be diffused to a desired region as required, so that a better sterilization and purification effect is achieved.

[0105] In addition, in some embodiments, the shape of the first extension section 21 and the second electrode 3 is required to be different. By the above-mentioned tapered shape arrangement, the field intensity difference between the first extension section 21 and the second electrode 3 is larger, and more plasma is generated at the first extension section 21 side.

[0106] Please refer to FIG. 9. In some embodiments, the end portion of the first extension section 21 is formed as a pointed end. With this arrangement, the radius of curvature of the end portion of the first extension section 21 is further reduced, which is beneficial to increase the field intensity difference between the first electrode 2 and the second electrode 3, so that the field intensity of the first electrode 2 is higher than that of the second electrode 3, and thus the plasma is more likely to be generated at the first electrode 2 side of the plasma generating device 100.

[0107] The pointed end formed by the first extension section 21 can be a linear needle structure, or the end portion of the first extension section 21 can have a shape of a substantially prismatic pyramid structure, for example, the end portion of the first extension section 21 has two side surfaces in the width direction and two side surfaces in the thickness direction, and the four side surfaces converge at a point to form a pointed end.

[0108] Please refer to FIG. 9. In one embodiment, at least in the end portion region of the first extension section 21, the width of the first extension section 21 is tapered along the extension direction of the first extension section 21.

[0109] In the embodiment, the width direction of the first extending section 21 is perpendicular to the length direction of the first extending section 21 and is in the planar direction of the dielectric layer 1. The projection of the first extending section 21 on the dielectric layer 1 is substantially a strip-shaped profile with a certain width, and has two side edges arranged at intervals in the width direction. At least in a certain length range near the end of the first extending section 21, at least one side edge gradually extends in a direction close to the other side edge, so that the width and cross-sectional dimension of the first extending section 21 gradually shrink. This can reduce the curvature radius of the end of the first extending section 21, increase the local field strength of the first extending section 21, better enable the plasma to be concentrated on the side of the first electrode 2 in the plasma generating device 100, and control the diffusion of the plasma to the end of the first extending section 21.

[0110] In the embodiment, the first extending section 21 can be a sheet-shaped electrode, a conductive film or a columnar electrode independent of the dielectric layer 1, and can be arranged at intervals from the dielectric layer 1 or combined with the dielectric layer 1 by adhesion or the like. The first extending section 21 can also be a conductive plating layer arranged on the surface of the dielectric layer 1. In the embodiment, only the projection of the first extending section 21 on the dielectric layer 1 needs to be a strip-shaped structure, and the width of the end of the first extending section 21 needs to gradually shrink.

[0111] Please refer to FIG. 9. In an embodiment, the thickness of the end of the first extending section 21 gradually shrinks along the extending direction of the first extending section 21.

[0112] In the embodiment, the first extending section 21 has a certain thickness, and at least in a certain length range near the end of the first extending section 21, the thickness of the first extending section 21 gradually shrinks in a direction close to the end surface. At least one of the two surfaces in the thickness direction of the first extending section 21 can be arranged in a direction close to the other surface. This can reduce the thickness of the end of the first extending section 21, which is conducive to reducing the overall thickness of the plasma generating device 100, and can control the diffusion of the plasma to the end of the first extending section 21, so as to realize controllable ion wind flow direction. In the embodiment, the two surfaces in the thickness direction of the first extending section 21 can converge to form an edge at the end, or the two surfaces can be connected by the end surface.

[0113] In some embodiments, the surface of the first extending section 21 away from the dielectric layer 1 is arranged in a direction close to the dielectric layer 1, and the surface of the first extending section 21 close to the dielectric layer 1 is attached to or parallel to the dielectric layer 1. This can gradually shrink the thickness of the first extending section 21 while avoiding increasing the distance between the first extending section 21 and the second electrode 3, which is conducive to reducing the excitation voltage of the plasma generating device 100 and improving the safety in use.

[0114] Please refer to Fig. 9, in an embodiment, the plasma generating device 100 further comprises a housing 4, the housing 4 is formed with a placement space, and at least one outlet 42 is formed on the housing 4 and communicates with the placement space; the dielectric structure 1, at least part of the first electrode 2 and at least part of the second electrode 3 are arranged in the placement space, and the first extension section 21 is arranged to extend towards one of the outlets 42.

[0115] In the embodiment, the plasma generating device 100 is provided with the housing 4, the housing 4 is formed with a placement space 41 for integrating the first electrode 2, the second electrode 3 and the dielectric structure 1 into an integrated structure, and the first electrode 2, the second electrode 3 and the dielectric structure 1 can be protected. In addition, the outlet 42 is formed on the housing 4 and communicates with the placement space 41, and the generated plasma can diffuse outwardly from the outlet 42, so that the plasma diffusion area of the plasma generating device 100 can be controlled.

[0116] The outlet 42 on the housing 4 can be arranged opposite to the surface of the dielectric structure 1, or the outlet 42 can be arranged on the side of the dielectric structure 1, for example, the outlet 42 is formed on the side of the housing 4 pointed by the first extension section 21. In addition, one outlet 42 can be formed on the housing 4, and the end of the first extension section 21 extends towards the outlet 42, so that the plasma diffused to the end of the first extension section 21 can diffuse to the outlet 42 and then diffuse outwardly; in some embodiments, two or more outlets 42 can be formed, for example, two outlets 42 can be formed and arranged opposite to the first extension section 21 and the second electrode 3 on the two sides of the dielectric structure 1, when part of the structure of the second electrode 3 is exposed to the air, part of the plasma is generated in the area of the second electrode 3, and the outlet 42 corresponding to the second electrode 3 is arranged to facilitate the outward diffusion of the plasma generated on one side of the second electrode 3, and improve the efficiency of the outward discharge of the plasma.

[0117] In combination with Figs. 9 to 11, in some embodiments, the housing 4 comprises a first half housing 43 and a second half housing 44 arranged opposite to each other, and the first half housing 43 and the second half housing 44 can be opened and closed relative to each other to facilitate the disassembly and assembly of the first electrode 2, the second electrode 3 and the dielectric structure 1.

[0118] Please refer to Fig. 9, in an embodiment, one of the outlets 42 is arranged opposite to the surface of the dielectric structure 1, and the end of the first extension section 21 is exposed to the outlet 42. In this way, the plasma can be discharged outwardly from the outlet 42, the efficiency of the plasma discharge is improved, and the sterilization and purification effects of the plasma generating device 100 are improved.

[0119] Please refer to Figure 9, in an embodiment, the shell 4 is further provided with a flow guide structure 49, the flow guide structure 49 extends from the edge of the outlet 42 to the outside of the shell 4, and the end of the first extension section 21 is arranged towards the flow guide structure 49.

[0120] In the embodiment, the flow guide structure 49 is arranged on the shell 4, the flow guide structure 49 is located in front of the end of the first extension section 21, and extends from the edge of the outlet 42 to the direction away from the shell 4, so that when the plasma diffuses from the first extension section 21 to the end and continues to diffuse forward, it is blocked by the flow guide structure 49, and then diffuses along the surface of the flow guide structure 49 to the direction away from the shell 4; wherein the extension direction of the flow guide structure 49 can be consistent with the axial direction of the outlet 42, or can be arranged to be inclined relative to the axial direction of the outlet 42, which is not limited herein. The arrangement of the flow guide structure 49 further adjusts the diffusion direction of the plasma, so that the application of the plasma generating device 100 is more flexible.

[0121] In an embodiment, the second electrode 3 is not completely covered by the dielectric structure 1, and part of the structure is exposed in the air. At this time, at least two outlets 42 can be opened in the shell 4, and the two outlets 42 are respectively located on the two sides of the dielectric structure 1 and are respectively arranged opposite to the first electrode 2 and the second electrode 3; so that plasma can be generated on the first electrode 2 and the second electrode 3 and respectively discharged from the two outlets 42 on the two sides of the shell 4, thereby improving the plasma generation efficiency and utilization efficiency.

[0122] In an embodiment, the inner surface of the shell 4 is provided with a first mounting groove 45, and at least part of the first extension section 21 is arranged in the first mounting groove 45.

[0123] In the embodiment, the first mounting groove 45 can be arranged on the inner surface of the shell 4 to mount the first extension section 21, so as to limit the first extension section 21, improve the stability of the mounting position of the first extension section 21, and accurately control the plasma generation and diffusion area.

[0124] In an embodiment, the inner surface of the shell 4 is provided with a first limiting groove 47, and the side of the first extension section 21 is provided with a first limiting section 23, and the first limiting section 23 is arranged in the first limiting groove 47; in the embodiment, the first limiting section 23 can be arranged on the surface of the first extension section 21 or the side of the first extension section 21, and the first limiting groove 47 for limiting and mounting the first limiting section 23 is arranged on the inner surface of the shell 4, so as to improve the bonding strength between the first electrode 2 and the shell 4, limit the first electrode 2, improve the stability of the mounting position of the first extension section 21, and accurately control the plasma generation and diffusion area.

[0125] In some embodiments, part of the first electrode 2 extends outside the shell 4 to form a first power connection section 22; that is, the first electrode 2 is arranged through the shell 4, and the part of the first electrode 2 outside the shell 4 forms the first power connection section 22 for connecting an external power supply to apply voltage to the first electrode 2. In this way, when the plasma generating device 100 is applied, it is not necessary to disassemble the shell 4 and then connect the first electrode 2 and the external power supply. When the plasma generating device 100 needs to be disassembled, the connection between the first electrode 2 and the external power supply outside the shell 4 can be directly disconnected, thereby improving the convenience of use of the plasma generating device 100.

[0126] In an embodiment, the dielectric structure 1 is a planar dielectric structure, and part of the second electrode 3 is arranged opposite to the planar dielectric structure, which can be arranged on the surface of the planar dielectric structure or arranged in parallel with the planar dielectric structure. Based on this, a second mounting groove 46 can be arranged on the inner surface of the shell 4, and at least part of the second electrode 3 is arranged in the second mounting groove 46; thereby improving the positional installation accuracy of the second electrode 3 and avoiding the second electrode 3 from being deviated.

[0127] In addition, part of the second electrode 3 can be arranged as a second extension section 31, which is arranged on the surface of the planar dielectric structure or arranged in parallel with the planar dielectric structure, and the side of the second extension section 31 extends outwardly with a second limiting section 33. Correspondingly, a second limiting groove 48 is arranged on the inner surface of the shell 4, so that the second limiting section 33 is limitedly arranged in the second limiting groove 48; thereby improving the bonding strength of the second electrode 3 and the shell 4, avoiding the second electrode 3 from being deviated or shaken in the shell 4, and improving the overall structural reliability and performance stability of the plasma generating device 100. In this case, the second mounting groove 46 and the second limiting groove 48 can be arranged on the inner surface of the shell 4 at the same time, the second extension section 31 is arranged in the second mounting groove 46, and the second limiting section 33 is arranged in the second limiting groove 48, so that the positional installation accuracy and stability of the second electrode 3 are better.

[0128] In some embodiments, the second electrode 3 is arranged through the shell 4, and the part of the second electrode 3 outside the shell 4 forms a second power connection section 32 for connecting an external power supply to apply voltage to the second electrode 3. In this way, when the plasma generating device 100 is applied, it is not necessary to disassemble the shell 4 and then connect the second electrode 3 and the external power supply. When the plasma generating device 100 needs to be disassembled, the connection between the second electrode 3 and the external power supply outside the shell 4 can be directly disconnected, thereby improving the convenience of use of the plasma generating device 100.

[0129] In an embodiment, the extension directions of the first power connection section 22 and the second power connection section 32 are different. In this way, when the first power connection section 22 and the second power connection section 32 are arranged on the same side, the distance between them is not too short to cause short circuit, thereby improving the safety in use.

[0130] The application also provides an electric appliance provided with the plasma generating device 100 according to any one of the above embodiments, and the specific structure of the plasma generating device 100 is referred to the above embodiments. Since the electric appliance adopts all the technical solutions of the above embodiments, it at least has all the beneficial effects brought by the technical solutions of the above embodiments, which will not be repeated here. The electric appliance can be, but is not limited to, an air conditioner, an air purifier, a floor cleaning machine, etc. The plasma generated by the plasma generating device 100 arranged in the electric appliance can reduce the toxic and harmful substances contained in the air blown out by the air conditioner and the air purifier, and can purify, sterilize and disinfect the water used for cleaning in the floor cleaning machine.

[0131] The above is only an exemplary embodiment of the application, and does not limit the patent scope of the application. Any equivalent structural transformation made by using the content of the specification and drawings, or direct / indirect application in other related technical fields is included in the patent protection scope of the application.

Claims

1. A plasma generating device, wherein, The plasma generating device comprises a dielectric structure, a first electrode and a second electrode, the dielectric structure covers the second electrode, and part of the dielectric structure is arranged as a planar dielectric layer, and the first electrode is arranged on the side of the planar dielectric layer away from the second electrode.

2. A plasma generating device, wherein, The plasma generating device comprises a dielectric structure, a first electrode and a second electrode, at least part of the dielectric structure is located between the first electrode and the second electrode, the first electrode and the second electrode coincide in the projection part of the dielectric structure, and the maximum circumscribed circle diameter of the overlapping area is L. defining a first creepage distance D min and a second creepage distance D max , the radius R of the largest inscribed circle of the dielectric structure when spread into a planar structure, satisfies (D min +L) / 2≤R≤(D max +L) / 2.

3. The plasma generating device of claim 2, wherein, a second creepage distance D of the first electrode and the second electrode max ≥ 3D min .

4. The plasma generating device of claim 2, wherein, The dielectric structure is a planar dielectric structure. Or, the dielectric structure covers the second electrode, and at least part of the surface of the side of the second electrode away from the first electrode is exposed outside the dielectric structure.

5. The plasma generating device as defined in any one of claims 1 to 4, wherein At least one of the first electrode and the second electrode is arranged on the surface of part of the dielectric structure between the first electrode and the second electrode. And / or, at least one of the first electrode and the second electrode is arranged in parallel with part of the dielectric structure between the first electrode and the second electrode.

6. The plasma generating device as defined in any one of claims 1 to 4, wherein The distance between the first electrode and the second electrode is H, the thickness of part of the dielectric structure between the first electrode and the second electrode is d, and 0≤H-d≤5mm is satisfied. And / or, the thickness d of part of the dielectric structure between the first electrode and the second electrode is ≤2mm.

7. The plasma generating device as defined in any one of claims 1 to 4, wherein At least part of the first electrode arranged opposite to the dielectric structure is a sheet electrode structure. Or, the first electrode is a conductive film. Or, the first electrode is a conductive plating layer arranged on the surface of the dielectric structure. Or, the plasma generating device further comprises a first carrier arranged opposite to the dielectric structure, and the first electrode is a conductive plating layer arranged on the surface of the first carrier. Or, the first electrode is a wire.

8. The plasma generating device as defined in any one of claims 1 to 4, wherein At least part of the second electrode arranged opposite to the dielectric structure is a sheet electrode structure. Or, at least part of the second electrode arranged opposite to the dielectric structure is a conductive film. Or, at least part of the second electrode is a conductive plating layer arranged on the surface of the dielectric structure. Or, the plasma generating device further comprises a second carrier arranged opposite to the dielectric structure, and at least part of the second electrode is a conductive plating layer arranged on the surface of the second carrier.

9. The plasma generating device as defined in any one of claims 1 to 4, wherein The dielectric structure comprises an insulating sheet. And / or, the dielectric structure comprises at least one insulating coating layer. And / or, the material of the dielectric structure is at least one of ceramic, quartz and polytetrafluoroethylene.

10. The plasma generating device as defined in any one of claims 1 to 4, wherein, At least part of the first electrode is arranged as a first extension, and the first extension is arranged on the surface of the dielectric structure or is arranged in parallel with the dielectric structure.

11. The plasma generating device of claim 10, wherein, The plasma generating device further comprises a shell, the shell forms a placement space inside, and at least one outlet communicating with the placement space is arranged on the shell. The dielectric structure, at least part of the first electrode and at least part of the second electrode are arranged in the accommodation space, and the first extending section is arranged to extend towards one of the outlets.

12. The plasma generating device of claim 11, wherein, One of the outlets is arranged opposite to a surface of the dielectric structure, and an end of the first extending section is exposed from the outlet.

13. The plasma generating device of claim 12, wherein, The shell is further provided with a flow guide structure extending from an edge of the outlet to outside of the shell, and an end of the first extending section is arranged towards the flow guide structure.

14. The plasma generating device of claim 11, wherein, An inner surface of the shell is provided with a first mounting groove, and at least part of the first extending section is arranged in the first mounting groove. An inner surface of the shell is provided with a first limiting groove, and a side of the first extending section is provided with a first limiting section arranged in the first limiting groove. Part of the first electrode extends to outside of the shell to form a first power connection section.

15. A plasma generating device, wherein, The plasma generating device comprises a dielectric structure, a first electrode and a second electrode, at least part of the dielectric structure is arranged as a planar dielectric layer, and the first electrode and the second electrode are arranged on two sides of the planar dielectric layer respectively. The distance between the first electrode and the second electrode along the thickness direction of the planar dielectric layer is H, the thickness of the planar dielectric layer is d, and 0≤H-d≤5mm is satisfied.

16. The plasma generating device of claim 15, wherein, The thickness of the planar dielectric layer is d≤2mm.

17. An electrical appliance wherein, The electric appliance is provided with the plasma generating device as claimed in any one of claims 1 to 16.

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