Transport device, transport system and method for transporting an element of a system for microlithography

Abstract

The invention relates to a transport device (2) for transporting an element of a system for microlithography (3) to a system for microlithography (3) and / or away from a system for microlithography (3), the transport device comprising: a lifting device (6) for raising and / or lowering the element of a system for microlithography (3), a support element (8) for supporting and contacting the element of a system for microlithography (3), and one or more air cushions (4), wherein the support element (8) can be raised and / or lowered by means of the lifting device (6), wherein the transport device (2) can be moved by means of the one or more air cushions (4). In order to allow an element of a system for microlithography (3) to be assembled or disassembled with minimal force, it is proposed that the support element (8) can be moved, preferably slid, relative to the lifting device (6).

Description

[0001]July 31, 2025 Transport Device, Transport System, and Method for Transporting an Element of a Microlithography System The present invention relates to a transport device for transporting an element of a microlithography system to and / or from a microlithography system, comprising: a lifting device for raising and / or lowering the element of a microlithography system, a support element for supporting and contacting the element of a microlithography system, and one or more air cushions, wherein the support element can be raised and / or lowered by means of the lifting device, and wherein the transport device is movable by means of the one or more air cushions. The present invention further relates to a transport system for transporting an element of a microlithography system, comprising: a transport device, and one or moreGuide rails for guiding the transport device. The present invention further relates to a method for transporting an element of a microlithography system, comprising the following steps: a) providing a transport device according to any one of claims 1 to 14, preferably a transport system according to claim 15, b) providing an element of a microlithography system, and c) transporting the element of a microlithography system by means of the transport device. The subject matter of German patent application DE 102024207690.2 is incorporated into the present disclosure by reference. Microlithography is used for the production of microstructured components, such as integrated circuits. The microlithography process can be carried out with a projection exposure system, which includes, among other things, illumination optics and / or projection optics. The structure of a microlithography system is created by means of a projection exposure system.The mask (reticule) illuminated by the illumination optics is projected by means of the projection optics onto a substrate, for example a wafer, particularly a silicon wafer, coated with a photosensitive layer (photoresist) and arranged in the image plane of the projection optics, in order to transfer the mask structure onto the photosensitive coating of the substrate. One of the goals in the development of microlithography systems is to lithographically produce structures with increasingly smaller dimensions on the substrate, for example, to achieve higher integration densities in semiconductor devices. One approach is to work with shorter wavelengths of electromagnetic radiation. For example, optical systems have been developed that use electromagnetic radiation from the so-called "deep ultraviolet" (DUV) range, preferably with operating wavelengths in the range between 150 nm and 400 nm, in particular 365 nm, 248 nm, or193 nm, or from the extreme ultraviolet (EUV) range, preferably with operating wavelengths in the range between 5 nm and 30 nm, particularly at 13.5 nm. When installing or removing elements of a microlithography system, for example, during the initial setup of a microlithography system or when replacing optical elements, the elements are transported to or from the microlithography system using a transport device. For certain elements of a microlithography system, the corresponding element is also lifted towards the microlithography system using the transport device in order to mount the element from below. Alternatively, the element is lowered using the transport device during disassembly. The transport device used, TG / TG 240168WO, dated July 31, 2025, must withstand the often high loads.The goal is to absorb the weight forces of a microlithography system component without generating excessive specific ground pressure that could damage the substrate, particularly the floor of a cleanroom. Transport devices from other technical fields, exhibiting relatively low specific ground pressure and also including a lifting device for raising an object, are known in the prior art. For example, DE 3824563 A1 discloses a transport device with air cushions and a lifting device for raising railway wagons. However, when assembling and disassembling components of a microlithography system, it is essential that the assembly and disassembly be carried out with as little force as possible, so that no stress occurs and, consequently, no damage is caused to the microlithography system component or the microlithography system itself. Against this background, theThe present invention is based on the objective of providing a transport device, a transport system, and a method for transporting an element of a microlithography system, which enable the assembly or disassembly of an element of a microlithography system to be carried out with as little force as possible. The aforementioned objective is achieved according to the invention in the transport device by the fact that the support element is movable, preferably displaceable, relative to the lifting device. The aforementioned objective is further achieved according to the invention in the transport system by the fact that the transport device is a transport device according to any one of claims 1 to 14. TG / TG 240168WO July 31, 2025. The aforementioned objective is further achieved according to the invention by the method according to the claim for transporting an element of a microlithography system. Various embodiments of the transport device, theThe transport system and method are described, with each embodiment applying independently to the transport device, the transport system, and the method. Furthermore, the individual embodiments can be combined with one another as desired. The transport device for transporting an element of a microlithography system to and / or away from a microlithography system comprises: a lifting device for raising and / or lowering the element of the microlithography system. This allows the element of the microlithography system to be moved to or away from a desired position on the microlithography system in a structurally simple manner. The lifting device can comprise one or more lifting spindles and / or one or more lifting cylinders, preferably pneumatic and / or hydraulic. This simplifies rapidand / or precise lifting and lowering. The lifting and / or lowering by means of the lifting device can preferably be carried out along a lifting direction. The lifting device can also be designed to perform a transverse movement of the element of a microlithography system. The transverse movement preferably runs obliquely, in particular perpendicularly, to the lifting direction. The lifting device can thus be used, for example, to perform a step-like movement of the element of a microlithography system, comprising lifting and / or lowering, a subsequent transverse movement, and a subsequent lifting and / or lowering of the element of a microlithography system. TG / TG 240168WO July 31, 2025. The transport device also includes a support element for supporting and contacting the element of a microlithography system. The support element facilitates precise and secure positioning of the element of a microlithography system.Microlithography on the transport device. The support element can be designed for connection to, and preferably fixation with, the element of a microlithography system. The support element is advantageously arranged on and / or above the lifting device and / or is connected to the lifting device. Furthermore, the transport device includes one or more air cushions. This allows for a low specific ground pressure. At the same time, precise and low-friction movement of the transport device can be achieved, particularly when moving the transport device manually. When using rollers to move the transport device, the frictional forces and the resulting displacement forces would be significantly higher than with air cushions. Moreover, when using rollers to move the transport device, there are generally difficulties in precisely positioning the transport device due to...Hysteresis in the rollers. The air volume in the one or more air cushions can be adjusted, preferably by means of at least one pump. The transport device also provides that the support element can be raised and / or lowered by means of the lifting device. For this purpose, the lifting device can be retracted and / or extended and / or moved upwards and / or downwards. Furthermore, the transport device is movable by means of the one or more air cushions. Advantageously, the transport device is movable relative to the surface, in particular the surface on which the transport device is arranged, by means of the one or more air cushions. The air cushions are preferably arranged on the underside of the transport device. TG / TG 240168WO July 31, 2025. For stable alignment of the transport device during movement by means of the air cushions, it is advantageously provided that...The air cushions are arranged, preferably on the underside of the transport device, in a uniformly distributed manner. The transport device can advantageously be moved as a whole and / or at least partially relative to the surface, in particular the surface on which the transport device is mounted, by means of one or more air cushions. Furthermore, the support element is movable, preferably displaceable, relative to the lifting device. This allows the support element, and thus the microlithography system element mounted on it, to move relative to the lifting device and preferably also to the rest of the transport device during assembly and disassembly. Slight inaccuracies in the positioning of the support device can thus be compensated for during assembly or disassembly, so that the microlithography system element can be lifted into its installation position on the microlithography system.or can be mounted or dismounted without force during lowering from the installation position on the microlithography system, and thus is not subjected to stress and / or damage. Unwanted fits, especially interference fits, at at least one point between the element of a microlithography system and the microlithography system itself, due to a slightly inaccurate arrangement of the transport device, can thus be avoided, for example. The support element is advantageously movably mounted on the lifting device, preferably floating. The support element is preferably movable in a compensating direction relative to the lifting device, preferably displaceable. The compensating direction advantageously extends obliquely, preferably perpendicularly, to the lifting direction. Alternatively or additionally, the support element can be moved, preferably relative to the lifting device, along at least one, preferably at least two, and in particular at leastThe transport device is movable along three translational degrees of freedom and / or along at least one, preferably at least two, and in particular at least three rotational degrees of freedom. This simplifies force-free assembly or disassembly of the element of a microlithography system. The transport device is preferably a mobile transport device and / or the transport device is movable, preferably by means of one or more air cushions, as a whole and / or at least in parts, at least sectionally parallel to the surface, in particular the surface on which the transport device is arranged. In one embodiment of the transport device, it is provided that the transport device has one or more movable alignment elements for aligning the position and / or orientation of the transport device, preferably relative to the surface, and / or for supporting the transport device on the surface.The system comprises and preferably includes one or more alignment elements that are movable between an alignment position for aligning the position and / or orientation of the transport device and / or for supporting the transport device on the surface and a home position. Supporting the transport device ensures its stability. Aligning the position and / or orientation compensates for tilting of the transport device, thus simplifying the precise assembly or disassembly of the microlithography system component using the transport device. Furthermore, the transport device can be moved closer to the microlithography system, thereby reducing the need for a shorter lift by the lifting device to position the microlithography system component in the desired installation position. The one or more alignment elements canPreferably, the alignment elements are extendable, preferably in the direction of, and / or retractable, preferably in the direction of, and / or in the home position. The one or more alignment elements can be designed to be spaced apart from the surface in the home position. The one or more alignment elements can preferably be moved independently and / or simultaneously from one another, in particular retractable and / or extendable. Independent movement simplifies precise positioning and / or orientation of the transport device. The one or more alignment elements are advantageously extended in the alignment position, preferably relative to the base body of the transport device, and / or retracted in the home position, preferably relative to and / or within the base body of the transport device. The one or more movableAlignment elements can be designed to align the position and / or orientation, preferably relative to the ground, and / or to support the entire transport device, and / or the one or more movable alignment elements can be designed to align the position and / or orientation, preferably relative to the ground, and / or to support at least a part of the transport device, preferably the base element, the support element, and / or the lifting device. The alignment position can be designed to align the position and / or orientation of the entire transport device and / or to support the entire transport device on the ground. Alternatively or additionally, the alignment position can be designed to align the position and / or orientation of at least a part of the transport device, preferably the base element, the support element, and / or the lifting device, and / or to support at least a part of theThe transport device, preferably of the base element, the support element, and / or the lifting device, is designed to be mounted on the surface. Within the scope of this disclosure, the "orientation" of an object, such as the transport device, is understood to mean the angular position of the object with respect to one or more independent axes of rotation, while "position" is understood to mean the arrangement of the object along independent spatial directions of a coordinate system. TG / TG 240168WO July 31, 2025. In one embodiment of the transport device, it is provided that the transport device comprises a primary measuring device for determining the position and / or orientation of the transport device, preferably for determining the position and / or orientation of the support element, and that the transport device comprises a secondary measuring device for determining a distance from the transport device, preferably for determining a distancefrom the transport device to a microlithography system, and / or that the transport device includes a tertiary measuring device for determining a force acting on the lifting device and / or the support element. The primary and secondary measuring devices simplify the precise alignment of the transport device. The tertiary measuring device, in turn, simplifies determining whether, when lifting an element of a microlithography system, the corresponding element is moved beyond the desired installation position and, for example, pressed against the microlithography system, thus increasing the force on the lifting device and / or the support element. Alternatively or additionally, it can also be determined during lowering whether the corresponding element is still partially supported by the microlithography system, for example, due to unreleasing connections or due to tilting, so that theThe force on the lifting device and / or the support element is less than the weight of the element of a microlithography system. The primary measuring device may include at least one tilt sensor and / or be configured to determine the position and / or orientation absolutely and / or relative to the horizontal. The primary measuring device may be configured to determine the position and / or orientation of the entire transport device and / or the primary measuring device may be configured to determine the position and / or orientation of at least a part of the transport device, preferably the base element, the support element and / or the lifting device. The secondary measuring device may be configured to determine a distance from the entire transport device, preferably a distance from the entire transport device to a microlithography system, TG / TG 240168WO 31 July 2025 and / orThe secondary measuring device can be configured to determine the distance of at least a part of the transport device, preferably the distance of at least a part of the transport device to a microlithography system. In one embodiment of the transport device, the lifting device has a frame structure and / or one or more lifting mechanisms, preferably allowing the frame structure to be raised and / or lowered by means of these lifting mechanisms. The one or more lifting mechanisms preferably effect the movement, in particular the raising and / or lowering, by means of the lifting device. The one or more lifting mechanisms can advantageously comprise one or more lifting spindles and / or one or more lifting cylinders, preferably pneumatic and / or hydraulic. The support element is advantageously attached to theThe frame structure is movable, preferably floating, mounted, and / or movable relative to the frame structure, preferably displaceable. The support element can be movable, preferably relative to the frame structure, along at least one, preferably at least two, and in particular at least three, translational degrees of freedom and / or along at least one, preferably at least two, and in particular at least three, rotational degrees of freedom. This simplifies force-free assembly or disassembly of the element of a microlithography system. In one embodiment of the transport device, it is provided that the transport device, preferably the lifting device, comprises a locking device, that the locking device has one or more movable locking elements for blocking a movement, preferably an upward movement and / or a downward movement, of the lifting device, and that, preferably, theor several locking elements are movable between a locking position to block movement of the lifting device (TG / TG 240168WO 31 July 2025) and an unlocking position to release movement of the lifting device. This allows the lifting device to be secured, so that work can be carried out safely below the lifting device and / or the element of a microlithography system. It also allows the position of the lifting device and / or the element of a microlithography system to be precisely maintained. The one or more locking elements are advantageously extended in the locking position, preferably relative to the base body of the transport device, and / or retracted in the unlocking position, preferably relative to and / or within the base body of the transport device. Preferably, the locking position to block upward movement and / orThe lifting device is designed to allow for a downward movement and / or the unlocking position is designed to release an upward movement and / or a downward movement of the lifting device. The one or more locking elements can each be designed, at least partially, as rods, allowing the locking elements to be provided in a structurally simple manner. The one or more locking elements can also preferably be movable independently of each other and / or simultaneously, in particular retractable and / or extendable. Simultaneous extension allows for quick and comprehensive and stable locking. In one embodiment of the transport device, it is provided that the one or more locking elements can extend, at least partially, through the lifting device and / or that, in the locking position, the one or more locking elements can be extended through the lifting device at leastExtend through the frame structure in sections and / or, in the unlocked position, the one or more locking elements are spaced apart from the lifting device. This allows movement of the lifting device to be blocked and its position to be maintained in a structurally simple and safe manner. Advantageously, the one or more locking elements are extendable through the frame structure and / or the one or more lifting elements (TG / TG 240168WO July 31, 2025; the lifting elements will be discussed in more detail below). Alternatively or additionally, it is provided that, in the locked position, the one or more locking elements extend through the frame structure and / or the one or more lifting elements at least in sections and / or, in the unlocked position, the one or more locking elements are spaced apart from the frame structure and / or the one or more lifting elements. Advantageously, theThe lifting device, preferably the frame structure, includes one or more openings, preferably one or more through-openings, for extending the one or more locking elements. Alternatively or additionally, it can be provided that the one or more locking elements are movable by means of a locking element drive, preferably pneumatic and / or hydraulic, preferably in the direction of the locking position and / or in the direction of the unlocking position. This simplifies the operation of the transport device, in particular of the locking element, and also allows the locking element to be moved quickly and precisely into the desired position. The locking elements can be moved into the locking position and / or into the unlocking position, in particular by means of the locking element drive. In one embodiment of the transport device, it is provided that the transport device has one or more guide elements.The transport device comprises one or more guide rails and / or one or more drive rollers for propelling the transport device. The guide elements simplify precise transport using the transport device, particularly since moving the transport device using only air cushions may not achieve the desired accuracy in some cases. The one or more guide elements can be designed to interact with one or more guide rails and / or can each be designed as a guide shoe. The one or more drive rollers simplify the movement of the TG / TG 240168WO 31 July 2025 transport device, as manual movement of the transport device can preferably be dispensed with. The one or more drive rollers can, in turn, be driven by one or more drive roller drives.Guide elements can be configured to guide the entire transport device on one or more guide rails, and / or the one or more guide elements can be configured to guide at least a part of the transport device, preferably the transport body described below, on one or more guide rails. The one or more drive rollers can be configured to drive the entire transport device, and / or the one or more drive rollers can be configured to drive at least a part of the transport device, preferably the transport body. In one embodiment of the transport device, it is provided that the transport device has a base body and / or a transport body, and that, preferably, the lifting device, the one or more lifting devices, the one or more air cushions, the one or more alignment elements, the primary measuring device, the secondaryThe measuring device, the tertiary measuring device, which includes one or more drive rollers and / or one or more guide elements arranged at least sectionally on the base body, the transport body comprising one or more air cushions, the transport body being movable by means of the one or more air cushions, preferably at least sectionally parallel to the surface and / or along the surface, the base body and the transport body being connected to each other in a connected position and separated from each other in a disconnected position, and / or the base body being movable, preferably in the connected position, by means of the transport body, preferably at least sectionally parallel to the surface, along the surface and / or by means of the one or more air cushions. Alternatively or additionally, the locking device and / or the holding device can be arranged at least sectionally on the base body (on the holding device).(This will be discussed further below TG / TG 240168WO July 31, 2025). The base body can be U-shaped at least in sections and / or the base body, preferably the U-shaped section of the base body, can surround the lifting device at least in sections. The base body ensures sufficient stability of the transport device, with the U-shaped section providing a clearance below the lifting device, which simplifies working below the lifting device, the support element, and / or the element of a microlithography system. In the configuration where the transport device comprises the transport body, particularly in combination with the base body, the transport device can comprise at least two main components that can be used independently of each other, at least temporarily. The air cushions are preferably arranged on the underside of the transport body.The transport body can have a receiving section, for example a U-shaped one, wherein the receiving section is configured to receive the base body, preferably within the receiving section, at least partially, at least in the connection position. It can be provided, for example, that the base body can be moved towards and / or away from the microlithography system by means of the transport body. The base body can then be transported by the transport body to a desired position, preferably relative to the microlithography system, and detached from the transport body. After the installation and / or replacement of the element of a microlithography system, it can be reattached to the transport body and transported away from the transport body. This allows the transport body to be used in the meantime for transporting another element, preferably a different one.The base body can be used. Alternatively or additionally, this simplifies the alignment of the base body relative to the microlithography system, since the base body can be placed directly on the substrate and the entire transport device does not have to be positioned so far from the substrate or at least designed in such a way that the relatively unstable TG / TG 240168WO 31 July 2025 air cushions are not used to support the entire transport device relative to the substrate. In one embodiment of the transport device, it is provided that the transport device, preferably the lifting device, comprises one or more stackable lifting elements and that, preferably, at least one of the one or more lifting elements can be arranged at least partially on and / or below the frame structure and / or at least one of the one or more lifting elements can be arranged on the base body.The lifting elements, especially compared to other lifting cylinders or lifting spindles, enable stable lifting and lowering via the lifting device, even over large strokes. For example, lifting cylinders become unstable beyond a certain stroke because the piston rod is extended far beyond the piston cylinder. Furthermore, the lifting elements can theoretically be stacked to any height, whereas the stroke of a lifting cylinder is limited by the length of the piston rod and / or the length of the cylinder. Alternatively or additionally, it can be provided that at least one of the one or more lifting elements can be arranged at least partially below the support element. The one or more lifting elements can be connected to each other by positive locking and / or friction locking, thus simplifying the provision of a stable stack of lifting elements. In one embodiment of the transport device, it is provided that theThe transport device, preferably the lifting device, comprises a holding device with one or more holding elements for holding at least one lifting element of the one or more lifting elements, and preferably, the one or more holding elements are each movable between a holding position for holding at least one lifting element of the one or more lifting elements and an initial position. This simplifies stacking or unstacking the lifting elements, particularly from bottom to top, since already stacked lifting elements are then held stably in position by means of the holding elements, and a new lifting element can be placed, particularly below the holding elements, or removed. In the initial position, the one or more holding elements are preferably spaced apart from the one or more lifting elements. The one or more holding elements can preferably be moved independently of each other and / or simultaneously.The lifting mechanism should be retractable and / or extendable. The one or more retaining elements are advantageously extended in the holding position, preferably relative to the base body of the transport device, and / or retracted in the initial position, preferably relative to and / or within the base body of the transport device. The one or more retaining elements are preferably provided in addition to the one or more locking elements. This increases the safety of the transport device, as a plurality of elements then hold the lifting elements and block movement of the lifting device. The one or more retaining elements are preferably designed to hold at least one of the lifting elements in position, and / or the holding position is designed to hold at least one of the lifting elements in position. This ensures precise holding of the lifting device and thus of theElements of a microlithography system are simplified. The one or more holding elements can each be designed, at least partially, as rods, allowing for a structurally simple provision of the holding elements. In one embodiment of the transport device, it is provided that the one or more lifting elements can be raised and / or lowered by means of the one or more lifting devices. This simplifies stacking or unstacking the lifting elements, as the lifting device handles the raising and lowering movement of the lifting elements. Alternatively or additionally, it can be provided that at least one lifting element of the one or more lifting elements can be moved by means of the one or more lifting devices between a stacking position for placing and / or removing at least one lifting element below the support element and / or the frame structure and a locking position, preferably for holding.The lifting element is movable by means of one or more retaining elements. This also simplifies the stacking or unstacking of the lifting elements. The lifting element is preferably positioned further away from the base in the locked position than in the stacked position. In the stacked position, the one or more lifting devices are preferably each retracted, and / or in the locked position, the one or more lifting devices are preferably each extended. In the stacked position, the at least one lifting element can be arranged on the lifting device, whereby the lifting element can then be stacked from bottom to top against another lifting element of the one or more lifting elements and / or arranged from bottom to top against the frame structure. Likewise, in the stacked position, the at least one lifting element can be unstacked from another lifting element and / or removed from the frame structure. In the locked position, the lifting element is preferably connected to anotherThe lifting element of one or more lifting elements and / or connected to the frame structure, preferably locked to it, contributes to raising or lowering by means of the lifting device. The locking position can also be provided to hold the at least one lifting element in position by means of one or more retaining elements. In one embodiment of the transport device, it is provided that the one or more retaining elements can extend at least partially through at least one lifting element of the one or more lifting elements and / or that in the holding position and / or the locking position, the one or more retaining elements extend at least partially through at least one lifting element of the one or more lifting elements. This allows the one or more lifting elements to be held in a structurally simple and secure manner. Advantageously, the one or more lifting elements each comprise one or moreOpenings, preferably one or more through-openings, for extending the one or more retaining elements and / or the one or more locking elements. TG / TG 240168WO July 31, 2025. Alternatively or additionally, it can be provided that the one or more retaining elements are movable by means of a, preferably pneumatic and / or hydraulic, retaining element drive, preferably in the direction of the holding position and / or in the direction of the starting position. This simplifies the operation of the transport device, in particular the retaining elements, and also allows the retaining elements to be moved quickly and precisely into the desired position. The retaining elements can, in particular, be moved into the holding position and / or into the starting position by means of the retaining element drive. In one embodiment of the transport device, it is provided that the one or more lifting elements each have at least one projection for producing aThe lifting element comprises a positive-locking connection with another lifting element and / or at least one recess for creating a positive-locking connection with another lifting element. This provides a stable positive-locking connection. The at least one projection can be arranged on a first, preferably upper, side of the respective lifting element and / or the at least one recess can be arranged on a second, preferably lower and / or opposite, side of the respective lifting element. Alternatively or additionally, it can be provided that the one or more lifting elements each comprise at least one, preferably movable, locking pin for engaging in a locking groove of another lifting element and / or at least one locking groove for interacting with a, preferably movable, locking pin of another lifting element. This also provides a stable positive-locking connection.which can also be easily opened or closed by means of the movement of the locking pin. The at least one locking pin can be arranged on a first, preferably upper, side of the respective lifting element and / or the at least one locking groove TG / TG 240168WO 31 July 2025 can be arranged on a second, preferably lower and / or opposite side of the respective lifting element. In one embodiment of the transport device, it is provided that the transport device includes a monitoring device and that the monitoring device is configured to monitor the position of the one or more locking elements and / or the position of the one or more retaining elements. This increases the safety of the transport device, as it monitors whether the locking elements or retaining elements are in the intended position and thus whether the desired movement of the lifting device is possible.The lifting device is not blocked, or safe work beneath it is possible by blocking and / or holding the lifting device. In this context, it can be particularly advantageous if the monitoring device is configured to detect whether the one or more locking elements are in and / or out of the locked and / or unlocked position. Alternatively or additionally, the monitoring device can be configured to detect whether the one or more holding elements are in and / or out of the holding and / or starting position. The transport system for transporting an element of a microlithography system comprises: a transport device, and one or more guide rails for guiding the transport device, wherein the transport device is a transport device according to any one of claims 1 to 14. The guide rails facilitate precise movement of the transport device andThis enables the precise transport of an element of a microlithography system. One or more position stops can be arranged on the one or more guide rails to limit the movement of the transport device along the one or more guide rails. The position stops simplify the precise positioning of the transport device in a desired position. The one or more guide elements of the TG / TG 240168WO 31 July 2025 can be arranged on, preferably at least partially on, the guide rail. The method for transporting an element of a microlithography system comprises the following step: a) Providing a transport device according to one of claims 1 to 14, preferably a transport system according to claim 15. This enables the assembly or disassembly of an element of a microlithography system to be carried out with as little force as possible and with as much precision as possible.Reference is made to the preceding descriptions of the transport device and the transport system. The method also comprises the following step: b) Providing an element of a microlithography system. The provided element of a microlithography system is preferably an optical element, preferably comprising at least one lens and / or at least one mirror. However, other elements of a microlithography system are also conceivable. In addition, a microlithography system can be provided in step b), wherein the element of a microlithography system is preferably to be mounted on or removed from the microlithography system. The method also comprises the following step: c) Transporting the element of a microlithography system by means of the transport device. The transport is preferablyat least sectionally by means of one or more air cushions and / or at least sectionally along one or more guide rails. The element of a microlithography system can preferably be transported to and / or away from a microlithography system. One embodiment of the method is preferably characterized by the following step: d) Determining the distance of the transport device, preferably the support element, and / or the element of a microlithography system to a microlithography system, preferably by means of the secondary measuring device. This allows the determination of how far the transport device, preferably the support element, and / or the element of a microlithography system is from the microlithography system. Based on this, the position and / or orientation of theThe transport device can be adapted. Alternatively or additionally, the method is preferably characterized by the following step: e) Supporting the transport device on the surface, preferably by means of one or more alignment elements and / or taking into account the distance determined in step d). This allows a stable position of the transport device to be created and / or the position, in particular the height of the support element, relative to the microlithography system to be adjusted. For example, before raising and / or lowering the element of a microlithography system by means of the lifting device, the support element can be brought to the desired height so that the lifting device only has to raise and / or lower the support element a short distance. In step e), the entire transport device can be supported on the surface and / or at least a part of the transport device, preferably the base element, whichThe support element and / or the lifting device are supported. Alternatively or additionally, the method is preferably characterized by the following step: f) Determining the position and / or orientation of the transport device, preferably by means of the primary measuring device. This allows, in particular, the determination of the orientation and / or position of the transport device, for example, an undesired tilting of the transport device, the absolute position of the transport device, and / or the relative position of the transport device to the microlithography system. In step f), the position and / or orientation of the entire transport device can be determined, and / or the position and / or orientation of at least a part of the transport device, preferably the base element, the support element, and / or the lifting device, can be determined. Alternatively or additionally, the method is preferably characterized byThe following step is taken: g) Aligning the position and / or orientation of the transport device, preferably by means of one or more alignment elements and / or taking into account the position and / or orientation of the transport device determined in step f). This eliminates tilting of the transport devices and / or brings the transport device into the desired position, in particular for raising and / or lowering the element of a microlithography system. In step g), the position and / or orientation of the entire transport device can be aligned and / or the position and / or orientation of at least one part of the transport device, preferably the base element, the support element, and / or the lifting device, can be aligned. One embodiment of the method is preferably characterized by the following step: h) Raising, lowering, and / or laterally moving the element of a system for theMicrolithography, preferably by means of a lifting device, in particular by means of one or more lifting devices. This allows the element of a microlithography system to be moved into a desired installation position on the microlithography system and / or removed from an installation position on the microlithography system. The lifting and / or lowering preferably takes place along the lifting direction. The lateral movement, preferably by means of the lateral movement, preferably takes place obliquely, in particular perpendicularly, to the lifting direction. The lifting device can thus, for example, perform a step-like movement of the element of a microlithography system, comprising lifting and / or lowering, a subsequent lateral movement, and a subsequent lifting and / or lowering of the element of a microlithography system. TG / TG 240168WO July 31, 2025. Alternatively or additionally, the method is preferably characterized by the following:Step i) Blocking a movement of the lifting device, preferably by means of one or more locking elements. This simplifies safe work below the lifting device and simultaneously allows the element of a microlithography system to be held in a desired position. Blocking a movement of the lifting device preferably includes blocking a movement of one or more lifting elements. Alternatively or additionally, the method is preferably characterized by the following step: j) Holding at least one of the lifting elements by means of one or more holding elements. This simplifies the safe addition or removal of another lifting element from the stack of lifting elements. Alternatively or additionally, this also contributes to holding the element of a microlithography system in a desired position. Advantageously, in step j), the lowest lifting element is held in each case.A lifting element of a stack of lifting elements is held by means of one or more holding elements. In one embodiment of the method, it is provided that in step h) at least one lifting element of the one or more lifting elements is raised and / or lowered by means of the one or more lifting devices. This allows the lifting or lowering of the element of a microlithography system by means of the lifting device and / or the lifting elements to be brought into the position for stacking and / or unstacking. Alternatively or additionally, it is provided that in step h) at least one lifting element of the one or more lifting elements is arranged on at least one lifting device of the one or more lifting devices and / or on another lifting element of the one or more lifting elements. This allows the at least one lifting element to be stacked with further lifting elements by means of the lifting device. TG / TG 240168WO July 31, 2025Additionally, it is provided that in step h) at least one lifting element of the one or more lifting elements is removed from at least one lifting device of the one or more lifting devices and / or from another lifting element of the one or more lifting elements. This allows the at least one lifting element to be unstacked. Alternatively or additionally, it is provided that in step h) several of the one or more lifting elements are stacked on top of each other. Alternatively or additionally, it is provided that in step h) at least one lifting element of the one or more lifting elements is held at least temporarily by means of the one or more holding elements. This simplifies the safe addition or removal of another lifting element from the stack of lifting elements. Alternatively or additionally, this also contributes to holding the element of a microlithography system in a desired position. Advantageously, in step h), the bottommostA lifting element of a stack of lifting elements is held at least temporarily by means of one or more holding elements. Further features and advantages of the transport device, the transport system, and the method will become apparent from the following description of exemplary embodiments, with reference to the accompanying drawing. In the drawing, Fig. 1a shows a transport system comprising a first embodiment of a transport device in a front view, Fig. 1b shows the transport system from Fig. 1a, wherein the alignment elements are in an alignment position, Fig. 2a shows a locking element of the transport device of Fig. 1a in a locking position in a sectional front view of the transport device, Fig. 2b shows the locking element of Fig. 2a in an unlocked position in a sectional front view of the transport device, and Fig. 3a shows a transport system comprising a second embodiment of a transport device in aFront view, Fig. 3b the transport system from Fig. 3a, wherein additional lifting elements have been added to the stack of lifting elements, Fig. 4a a locking element and two holding elements of the transport device of Fig. 3a in a locking position and a holding position in a perspective view, Fig. 4b one of the holding elements of Fig. 4a in a starting position in a perspective view, Fig. 5 two stacked lifting elements in a sectional view, Fig. 6a a transport system comprising a third embodiment of a transport device in a front view, wherein the base body and the transport body are connected to each other in a connecting position, and Fig. 6b the transport system from Fig. 6a, wherein the base body and the transport body are separated from each other in a separating position. TG / TG 240168WO 31 July 2025 Fig. 1a shows a transport system 1 comprising a first embodiment of a transport device 2 in a front view.The transport device 2 is designed for transporting an element of a microlithography system 3. To enable movement of the transport device 2, it includes several air cushions 4, which, in the illustrated embodiment, are arranged on the underside of the transport device 2. To position the element of the microlithography system 3 into a desired installation position from below on a microlithography system 5, the transport device 2 includes a lifting device 6 which can raise and lower the element of the microlithography system 3. In the embodiment of the transport device 2 shown in Fig. 1a, the raising and lowering is effected by means of several lifting devices 7, for example, lifting cylinders as shown in Fig. 1a (the raising and lowering is indicated in Fig. 1a by double arrows adjacent to the lifting devices 7). Other lifting devices 7, for example, lifting spindles, arealso usable. In Fig. 1a, the lifting device 7 is shown in a partially extended state. The transport device 2 also includes a support element 8 for supporting and contacting the element of a microlithography system 3. The support element 8 can be raised and lowered by means of the lifting device 6 and is also movably mounted relative to the lifting device 6, in particular the frame structure 10 of the lifting device 6, by means of a bearing 9. This mobility allows the support element 8, and thus also the element of a microlithography system 3, to perform compensatory movements, in the case shown here (the mobility is indicated by double arrows adjacent to the support element 8) translational movements. For example, if the transport device 2 is positioned slightly inaccurately, the element of a microlithography system 3 can then be moved force-free into a TG / TG by means of the compensatory movements.240168WO July 31, 2025, the desired installation position 11 on the microlithography system 5 is to be brought. In order to stably support the transport device 2 on the substrate and also to precisely adjust the position, especially along the vertical, as well as the orientation of the transport device 2, the transport device 2 comprises several movable alignment elements 12 (the mobility is indicated by double arrows next to the alignment elements 12). In Fig. 1a, the alignment elements 12 are in a basic position spaced apart from the substrate. Furthermore, the transport device 2 comprises a guide element 13 in the form of a guide shoe. The guide element 13 is guided on a guide rail 14 of the transport system 1, so that the transport device 2 can be guided precisely to a desired position. In addition, the transport device 2 comprises a drive roller 15 by means of which the transport device 2 can be driven. However,It is also conceivable to dispense with the drive roller 15 and, for example, to push the transport device 2 manually. The transport device 2 also comprises a plurality of measuring devices 16, 17, 18. These include, firstly, a primary measuring device 16 for determining the position and / or orientation of the transport device 2. Based on the determination of the position and / or orientation of the transport device 2, the position and / or orientation of the transport device 2 can be aligned using the alignment elements 12. This can be done either automatically or manually, whereby the results of the determination of the position and / or orientation of the transport device 2 are displayed to the operator on a display device 19, and the alignment elements 12 are then manually controlled based on this display. In the embodiment shown, the primary measuring device 16 comprises several sensors, the exact number of which is not important.not present. TG / TG 240168WO July 31, 2025. Furthermore, the transport device 2 shown includes a secondary measuring device 17 for determining a distance from the transport device 2 to the microlithography system 5. Based on the determination of the distance of the transport device 2 relative to the microlithography system 5, the position of the transport device 2, in particular along the vertical, can be aligned by means of the alignment elements 12, in particular the distance of the transport device 2 to the desired installation position 11 can be reduced. This can be done either automatically or manually, whereby the results of the distance determination are displayed to the operator on a display device 19 and the alignment elements 12 can be controlled manually based on this. In addition, the transport device 2 shown includes a tertiary measuring device 18 for determining a distance on the lifting device 6 and / or theThe force acting on the support element 8 can be determined. This allows, for example, the detection of whether the element of a microlithography system 3 has been moved beyond the desired installation position 11 and is thereby unintentionally pressed against the microlithography system 5, increasing the force on the lifting device 6 and the support element 8. Similarly, when lowering the element using the lifting device 6, it can be determined whether the element of a microlithography system 3 is still partially attached to the microlithography system 5, for example, due to unreleasing connections between the element of a microlithography system 3 and the microlithography system 5, such that the force on the lifting device 6 and the support element 8 is less than the weight of the element of a microlithography system 3. In the illustrated embodiment of the transport device 2, the transport device 2 has a U-shaped base body.20, wherein the lifting device 6 is arranged at least partially in the space between the legs of the U-shaped base body 20. This allows work, in particular on the element of a microlithography system 3, to be carried out below the lifting device 6. Fig. 1b shows the transport system 1 from Fig. 1a, with the alignment elements 12 in an alignment position. For this purpose, the alignment elements 12 were extended and supported against the ground. This ensures that the transport device 2 is stable and aligned in its position and orientation. In addition, the lifting devices 7 of the lifting device 6 were extended further, so that the element of a microlithography system 3 is now in a desired installation position 11 on the microlithography system 5. In Fig. 1b, the securing device 21, in particular the securing elements 22 of the securing device 21, is also shown.The locking elements 22 are shown in the locked position, in which they extend through the frame structure 10 of the lifting device 6, thus blocking movement of the lifting device 6. This ensures safe working conditions under the lifting device 6 and also holds the lifting device 6 and the support element 8 attached to it in position. Fig. 2a shows a locking element 22 of the transport device 2 of Fig. 1a in a locked position in a sectional front view of the transport device. This corresponds to the position of one of the locking elements 22 shown in Fig. 1b. Here, the locking element 22 is extended and reaches through the frame structure 10 of the lifting device 6, thus blocking movement of the lifting device 6. Fig. 2b shows the locking element of Fig. 2a in an unlocked position in a sectional front view.Front view of the transport device. This corresponds to the position of the locking elements 22 in Fig. 1a. Here, the locking element 22 TG / TG 240168WO July 31, 2025 is retracted and spaced apart from the lifting device 6, in particular the frame structure 10 of the lifting device 6. The movement between the locked position and the unlocked position can be effected by means of a preferably pneumatic locking element drive. Movement of the lifting device 6 is permitted in the unlocked position shown. Fig. 3a shows a transport system comprising a second embodiment of a transport device 2 in a front view. The transport device 2 of the second embodiment according to Fig. 3a essentially corresponds to the transport device 2 of the first embodiment according to Fig. 1a, so that the same reference numerals are used below for the same components, and in particular, the differences of the transport device 2 of the second embodiment are noted.The embodiment of the transport device 2 is compared to the transport device 2 of the first embodiment. In the embodiment of the transport device 2 shown in Fig. 3a, the alignment elements 12 are already arranged in the alignment position, as shown in Fig. 1b. In this embodiment, the lifting device 6 of the transport device 2 comprises several lifting elements 23, with several of the lifting elements 23 already stacked on top of each other in two stacks in Fig. 3a. By stacking the lifting elements 23, the lifting device 6 can lift the support element 8, and thus the element of a system for microlithography 3, significantly higher and more stably than would be possible with lifting cylinders alone. The lifting elements 23 are stacked on top of each other below the frame structure 10 and below the support element 8 for lifting. To effect lifting, lifting elements 23 are added from below the frame structure 10 or, if a lifting element 23 has already been added, from the stack of lifting elements 23.Lifting elements 23, further lifting elements 23 TG / TG 240168WO July 31, 2025 are supplied. The lifting elements 23 to be supplied, and in the case of already stacked lifting elements 23, also the entire stack of lifting elements 23, are moved from bottom to top by means of the lifting devices 7 and held there in a detent position by means of a holding device 24 with several holding elements 25. The lifting devices 7 can then be retracted again and further lifting elements 23 can be supplied in a stacked position (see Fig. 3b), whereby the further lifting elements 23 are arranged on the lifting devices 7. The holding element 25 can then be moved from the holding position, as shown in Fig. 3a, to a retracted starting position. This will be explained in more detail below in Figs. 4a and 4b. The supplied lifting elements 23, and also the entire stack of lifting elements 23, can then be lifted again by means of the lifting devices 7 and subsequently by means of theHolding elements 25 are used to hold the support element 8, and thus the microlithography system 3, at the desired height. To lower the support element 8, and thus the microlithography system 3, the previously described process can be reversed. For this, the lower lifting elements 23 of the respective stack of lifting elements 23, and thus the entire stack of lifting elements 23, are lowered by means of the lifting device 7. The penultimate lifting elements 23 of each stack are then held by the holding elements 25, allowing the lowest and / or last lifting elements 23 of the respective stack to be removed. The lifting devices 7 are then extended again and, after the holding elements 25 have been retracted into their starting position, can lower the stack of lifting elements 23 again.This process is then repeated until the support element 8, and thus preferably also the element of a microlithography system 3, is at the desired height by lowering. TG / TG 240168WO July 31, 2025. Fig. 3b shows the transport system 1 from Fig. 3a, wherein an additional lifting element 23 has been added to the stack of lifting elements 23. In each case, another lifting element 23 was added from below to the respective stacks of lifting elements 23 in a stacked position. The lifting method described in connection with Fig. 3a can then be continued by inserting the retaining elements 25 and lifting the lifting element 23, and thus the stack of lifting elements 23, by means of lifting by means of the lifting devices 7. Fig. 4a shows a locking element 22 and two retaining elements 25 of the transport device of Fig. 3a in a locking position and a holding position in a perspective view. For clarityFor the sake of clarity, only two of the lifting elements 23 of one of the stacks of lifting elements 23 in Fig. 3a are shown. In Fig. 3a, the locking element 22 extends through the lower lifting element 23 in the locked position via a through-opening 26 in the lower lifting element 23. The two retaining elements 25 also each extend through their respective through-openings 26 in the lower lifting element 23 in a holding position. The lifting elements 23, and thus also the support element 8, are therefore securely held, and movement of the lifting device 7 is blocked. Two projections 27 and a locking pin 28 are also already visible on the upper lifting element 23; these will be discussed further in connection with Fig. 5. Fig. 4b shows one of the retaining elements 25 of Fig. 4a in a starting position in a perspective view. The locking element 22, which is still visible in Fig. 4a, is also in an unlocked position, as is the other, not shown,The second retaining element 25 is more clearly visible in the initial position. TG / TG 240168WO July 31, 2025. In the initial position shown, the respective retaining element 25 is spaced apart from the lifting elements 23. Furthermore, the locking element 22 is spaced apart from the lifting elements 23 in the unlocked position. In this arrangement, the lifting elements 23 can then be raised or lowered by means of the lifting device 7. Fig. 5 shows two stacked lifting elements 23 in a sectional view. These are lifting elements 23 as shown in the transport device 2 of the second embodiment according to Figs. 3a and 3b. Several projections 27 are arranged on the upper sides of each lifting element 23, and several recesses 29 are provided on the underside of each lifting element 23. The projections of one lifting element 23 can each be arranged in a recess 29 of another lifting element 23, so that a positive-locking connection betweenThe lifting elements 23 can be provided in a structurally simple manner. Furthermore, a movable, in particular sliding, locking pin 28 is arranged on the upper side of each lifting element 23, and a locking groove 30 is provided on the underside of each lifting element 23. The locking pin 28 of one lifting element 23 can engage in the locking groove 30 of another lifting element 23, thus providing a releasable and / or lockable positive-locking connection. Fig. 6a shows a transport system 1 comprising a third embodiment of a transport device 2 in a front view, wherein the base body 20 and the transport body 31 are connected to each other in a connected position. The transport device 2 of the third embodiment according to Figs. 6a and 6b essentially corresponds to the transport device 2 of the first embodiment according to Fig. 1a, so that the same reference numerals TG / TG 240168WO 31 July 2025 are used below for the same components.In particular, the differences between the transport device 2 of the third embodiment and the transport device 2 of the first embodiment will be discussed. The transport device 2 of the third embodiment additionally comprises a transport body 31. The air cushions 4 are arranged on the transport body 31, and the transport body 31 can be moved along the surface, particularly parallel to the surface, by means of the one or more air cushions 4. In Fig. 6a, the transport body 31 and the base body 20 are connected to each other in the connected position. This allows the transport body 31 to be used to move the base body 20 and the elements of the transport device 2 arranged on it, for example, towards and / or away from the microlithography system 5. The base body 20 and the elements arranged on it can then be moved, for example, by the transport body 31 to a desired position, preferablyrelative to the microlithography system 5, the transport body 31 is transported and then separated from the transport body 31. In the third embodiment shown, the transport device 2 does not have a drive roller 15; however, it would also be conceivable for the transport device 2 to have a drive roller 15. Furthermore, it would be alternatively or additionally conceivable for the lifting device 6 of the transport device 2 to be designed according to the second embodiment of the transport device 2 and to include, among other things, several lifting elements 23. Fig. 6b shows the transport system 1 from Fig. 6a, in which the base body 20 and the transport body 31 are separated from each other in a separation position. Here, the transport body 31 was separated from the base body 20 after the base body 20 was moved to a desired position relative to the microlithography system 5 by means of the transport body 31. Subsequently, the transport body 31 was separated parallel to the surface by the transport body 31.Base body 20 moved away. TG / TG 240168WO July 31, 2025. The part of the transport device 2, which is detached from the transport body 31 and includes, among other things, the base body 20, can then be aligned, for example, by means of the alignment elements 12. In the meantime, the transport body 31 can be used, for example, for transporting another element, preferably another base body 20. In Fig. 6b, it can be seen that the transport body 31 has a receiving section 32, for example, U-shaped, wherein the receiving section 32 is configured to receive the base body 20 at least partially within the receiving section 32, at least in the connecting position. Reference numeral list: 1 Transport system 2 Transport device 3 Element of a microlithography system 4 Air cushion 5 Microlithography system 6 Lifting device 7 Lifting device 8 Support element 9 Bearing 10 Frame structure 11 Installation position 12Alignment element 13 Guide element 14 Guide rail 15 Drive roller 16 Primary measuring device 17 Secondary measuring device TG / TG 240168WO 31 July 2025 18 Tertiary measuring device 19 Display device 20 Base body 21 Locking device 22 Locking element 23 Lifting element 24 Holding device 25 Holding element 26 Through opening 26' Through opening 27 Projection 28 Detent pin 29 Recess 30 Detent groove 31 Transport body 32 Receiving section TG / TG 240168WO 31 July 2025

Claims

July 31, 2025 Patent Claims 1. Transport device (2) for transporting an element of a microlithography system (3) to and / or from a microlithography system (3), comprising: - a lifting device (6) for raising and / or lowering the element of the microlithography system (3), - a support element (8) for supporting and contacting the element of the microlithography system (3), and - one or more air cushions (4), - wherein the support element (8) can be raised and / or lowered by means of the lifting device (6), - wherein the transport device (2) is movable by means of the one or more air cushions (4), characterized by the fact that the support element (8) is movable, preferably displaceable, relative to the lifting device (6). 2.Transport device (2) according to claim 1, characterized in that the transport device (2) comprises one or more movable alignment elements (12) for aligning the position and / or orientation of the transport device (2), preferably relative to the ground, and / or for supporting the transport device (2) on the ground, and that, preferably, the one or more alignment elements (12) are movable between an alignment position for aligning the position and / or orientation of the transport device (2) and / or for supporting the transport device (2) on the ground and a home position. - 2 - 3. Transport device (2) according to claim 1 or claim 2, characterized by the fact that the transport device (2) comprises a primary measuring device (16) for determining the position and / or orientation of the transport device (2), preferably for determining the position and / or orientation of the support element (8), that the transport device (2) comprises a secondary measuring device (17) for determining a distance from the transport device (2), preferably for determining a distance from the transport device (2) to a microlithography system (5), and / or that the transport device (2) comprises a tertiary measuring device (18) for determining a force acting on the lifting device (6) and / or the support element (8). 4.Transport device (2) according to any one of claims 1 to 3, characterized by the fact that the lifting device (6) has a frame structure (10), and / or that the lifting device (6) has one or more lifting devices (7), wherein preferably the frame structure (10) can be raised and / or lowered by means of the one or more lifting devices (7).

5. Transport device (2) according to any one of claims 1 to 4, characterized by the fact that the transport device (2), preferably the lifting device (6), comprises a locking device (21), and that the locking device (21) has one or more movable locking elements (22) for blocking a movement, preferably for blocking an upward movement and / or a downward movement, of the lifting device (6), and TG / TG 240168WO 31 July 2025. - 3 - -that, preferably, the one or more locking elements (22) are movable between a locking position to block a movement of the lifting device (6) and an unlocking position to release a movement of the lifting device (6). 6.Transport device (2) according to claim 5, characterized in that: - the one or more locking elements (22) are extendable at least section by section through the lifting device (6); - in the locking position, the one or more locking elements (22) extend at least section by section through the lifting device (6); and / or in the unlocking position, the one or more locking elements (22) are spaced apart from the lifting device (6); and / or - the one or more locking elements (22) are movable by means of a locking element drive, preferably pneumatic and / or hydraulic, preferably in the direction of the locking position and / or in the direction of the unlocking position. 7.Transport device (2) according to any one of claims 1 to 6, characterized in that the transport device (2) comprises one or more guide elements (13) for guiding the transport device (2) on one or more guide rails (14) and / or that the transport device (2) comprises one or more drive rollers (15) for driving the transport device (2).

8. Transport device (2) according to any one of claims 1 to 7, characterized in that the transport device (2) comprises a base body (20) and / or a transport body (31) and that, preferably, TG / TG 240168WO July 31, 2025. - 4 - -the lifting device (6), comprising one or more lifting devices (7), one or more air cushions (4), one or more alignment elements (12), the primary measuring device (16), the secondary measuring device (17), the tertiary measuring device (18), one or more drive rollers (15) and / or one or more guide elements (13) arranged at least section by section on the base body (20), -the transport body (31) comprising one or more air cushions (4), -the transport body (31) being movable by means of the one or more air cushions (4), preferably at least section by means of the base body (20) parallel to the ground and / or along the ground, -the base body (20) and the transport body (31) being connected to each other in a connected position and separated from each other in a separated position and / or -the base body (20), preferably in the connected position, by means of the transport body (31),preferably movable at least sectionally parallel to the ground, along the ground and / or by means of one or more air cushions (4).

9. Transport device (2) according to one of claims 1 to 8, characterized in that the transport device (2), preferably the lifting device (6), comprises one or more stackable lifting elements (23) and that, preferably, at least one lifting element (23) of the one or more lifting elements (23) can be arranged at least sectionally on and / or below the frame structure (10) and / or at least one lifting element (23) of the one or more lifting elements (23) can be arranged on the base body (20).

10. Transport device (2) according to one of claims 1 to 9, characterized in that sTG / TG 240168WO July 31, 2025, - 5 - -the transport device (2), preferably the lifting device (6), comprises a holding device (24) with one or more holding elements (25) for holding at least one lifting element (23) of the one or more lifting elements (23), and -that, preferably, the one or more holding elements (23) are each movable between a holding position for holding at least one lifting element (23) of the one or more lifting elements (23) and a starting position. 11.Transport device (2) according to claim 9 or claim 10, characterized in that the one or more lifting elements (23) can be raised and / or lowered by means of the one or more lifting devices (7), and / or that at least one lifting element (23) of the one or more lifting elements (23) is movable by means of the one or more lifting devices (7) between a stacked position for arranging and / or removing the at least one lifting element (23) below the support element (8) and / or the frame structure (10) and a detent position, preferably for being held by means of the one or more retaining elements (25). 12.Transport device (2) according to claim 10 or claim 11, characterized in that the one or more retaining elements (25) are extendable at least partially through at least one lifting element (23) of the one or more lifting elements (23), that in the holding position and / or the detent position the one or more retaining elements (25) extend at least partially through at least one lifting element (23) of the one or more lifting elements (23), and / or TG / TG 240168WO 31 July 2025. - 6 - -that the one or more holding elements (25) are movable by means of a holding element drive, preferably pneumatic and / or hydraulic, preferably in the direction of the holding position and / or in the direction of the starting position.

13. Transport device (2) according to one of claims 9 to 12, characterized in that s- the one or more lifting elements (23) each have at least one projection (27) for forming a positive-locking connection with another lifting element (23) and / or at least one recess (29) for forming a positive-locking connection with another lifting element (23) and / or -that the one or more lifting elements (23) each comprise at least one, preferably movable, locking pin (28) for engaging in a locking groove (30) of another lifting element (23) and / or at least one locking groove (30) for interacting with a, preferably movable, locking pin (28) of another lifting element (23). 14.Transport device (2) according to one of claims 1 to 13, characterized in that the transport device (2) comprises a monitoring device and that the monitoring device is configured to monitor the position of one or more locking elements (22) and / or the position of one or more retaining elements (25).

15. Transport system (1) for transporting an element of a microlithography system (3), comprising: - a transport device (2), and - one or more guide rails (14) for guiding the transport device (2), characterized in that sTG / TG 240168WO 31 July 2025. - 7 - the transport device (2) is a transport device (2) according to any one of claims 1 to 14.

16. Method for transporting an element of a microlithography system (3), comprising the following steps: a) providing a transport device (2) according to any one of claims 1 to 14, preferably a transport system (1) according to claim 15, b) providing an element of a microlithography system (3), and c) transporting the element of a microlithography system (3) by means of the transport device (2). 17.The method according to claim 16, characterized by at least one of the following steps: d) Determining the distance of the transport device (2), preferably of the support element (8), and / or of the element of a microlithography system (3) to a microlithography system (5), preferably by means of the secondary measuring device (17); e) Supporting the transport device (2) on the substrate, preferably by means of the one or more alignment elements (12) and / or taking into account the distance determined in step d); f) Determining the position and / or orientation of the transport device (2), preferably by means of the primary measuring device (16); and / or g) Aligning the position and / or orientation of the transport device (2), preferably by means of the one or more alignment elements (12) and / or taking into account the position and / or orientation of the transport device (2) determined in step f). 18.The method of claim 16 or claim 17, characterized by at least one of the following steps: TG / TG 240168WO 31 July 2025. - 8 - h) Raising, lowering and / or laterally moving the element of a microlithography system (3), preferably by means of the lifting device (6), in particular by means of the one or more lifting devices (7), i) Blocking a movement of the lifting device (6), preferably by means of the one or more locking elements (22), and / or j) Holding at least one lifting element (23) of the one or more lifting elements (23) by means of the one or more holding elements (25).

19. Method according to claim 18, characterized by: - ​​in step h) at least one lifting element (23) of the one or more lifting elements (23) is raised and / or lowered by means of the one or more lifting devices (7), - that in step h) at least one lifting element (23) of the one or more lifting elements (23) is arranged on at least one lifting device (7) of the one or more lifting devices (7) and / or on another lifting element (23) of the one or more lifting elements (23),-that in step h) at least one lifting element (23) of the one or more lifting elements (23) is removed from at least one lifting device (7) of the one or more lifting devices (7) and / or from another lifting element (23) of the one or more lifting elements (23), -that in step h) several of the one or more lifting elements (23) are stacked on top of each other, and / or -that in step h) at least one lifting element (23) of the one or more lifting elements (23) is held at least temporarily by means of the one or more holding elements (23). TG / TG 240168WO 31 July 2025,

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