Device and method for drying a liquid film

WO2026052168A1PCT designated stage Publication Date: 2026-03-12HELMHOLTZ-ZENTRUM BERLIN FÜR MATERIALIEN UND ENERGIE
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Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
Filing Date
2025-09-03
Publication Date
2026-03-12

AI Technical Summary

Technical Problem

Existing methods for gas flow arrangements in chemical vapor deposition processes face challenges in achieving homogeneous distribution and efficient evaporation of chemical vapors, leading to non-uniform film deposition and inefficient use of gas flows.

Method used

A swiveling gas flow arrangement with concave features and side walls is introduced to enhance the homogeneity of gas flows, ensuring uniform distribution and efficient evaporation of chemical vapors, which includes pivoting and swiveling mechanisms to optimize gas flow distribution.

Benefits of technology

The solution achieves improved homogeneity and uniformity in gas flow distribution, enhancing the efficiency of chemical vapor deposition processes by ensuring consistent evaporation and deposition of chemical vapors.

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Abstract

The invention relates to a device and a method for drying a liquid film (5) on a substrate. The device and the method are characterized by the following features: - a first and a second air knife (1, 2) with slot dies for providing a first and a second laminar gas flow, each of which has flow direction specified by the slot die of the respective air knife (1, 2), the slot dies being situated parallel to one another and the air knives (1, 2) being pivotably mounted in the device while maintaining the parallelism of the slot dies; - a holder (7, 7') for pivotably mounting the air knives; - a first and a second translatable lateral wall (3, 4) for at least partly blocking surface gas flows when the laminar gas flows are being provided by the air knives (1, 2), the lateral walls (3, 4) enclosing the laminar gas flows; and - a holder for mounting and translating the lateral walls in the device; - the device being at least partly open in the direction facing away from the flow directions in the process. During the operation of the device, the lateral walls (3, 4) follow the pivoting movement of the air knives.
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Description

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Claims

03-03-2025-43709001-H auPtPcst-0023 PCT / DE2025 / 000093 encompassing and and specified and wherein preservation arrangement and gas flows and gas flows arrangement and and wherein the opposite arrangement arrangement arrangement an extraction to encompassing C3“09“202S- 4370900 “HauP pus -0024 and wherein gas flows and gas flows the and the gas flows and wherein gas flows arrangement side walls the pivotable gas flows pivoting gas flows change

Citation Information

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