A heating panel

Abstract

A heating panel (112) configured for heating a reaction medium is proposed. The heating panel (112) has an open geometric shape. The heating panel (112) comprising at least one heating resistor (114) and a base element (116) of Oxide Ceramic Matrix Composite (OCMC). The base element (116) comprises a first side configured for being in contact with the reaction medium. The heating resistor (114) is arranged on a second side of the base element (116) opposing to the first side.

Description

[0001] 240545W001

[0002] A heating panel

[0003] Technical Field

[0004] The invention relates to a heating panel, a furnace for heating a reaction medium and several uses. For example, the heating panel can be used for direct heating of a reaction medium, preferably direct heating in an industrial furnace, more preferably direct heating in a reactor furnace. However, other applications are possible.

[0005] Background art

[0006] When transforming industrial furnace, e.g. of steam crackers, from fossil heating to electric heating, finding suitable heating panels for heating cracker coils is challenging. The problem is that the heating panels are usually installed as self-supporting elements in a furnace chamber. This may result in conflicting properties regarding mechanical resistance and thermal surface load of the heating panels. On the one hand, heating panels with a low specific surface area may be mechanically stable but tend to overheat. On the other hand, heating panels with a high specific surface area may release the heating power at a low overtemperature but are susceptible to distortion. Moreover, replacement of the heating source with an otherwise unchanged reactor design may not result in an economically optimal solution. A significant part of the electric power supply would be delivered as inferior sensitive heat with the product stream. An adapted design of a reactor is needed which allows reducing for a given production for a given production capacity of steam splitting the consumption of electric energy.

[0007] US2021 / 0113980 A1 describes a reactor configuration comprising at least one electrically heated furnace which defines a space, with at least one reactor tube placed within the furnace space and said reactor tube having an exit and entrance outside of the reactor furnace, and wherein said furnace is further provided with at least one electrical radiative heating panel suitable for heating to high temperatures located inside said furnace in such a way that the heating panel is in no direct contact with the at least one reactor tube; and a number of inspection ports in the furnace wall such to be able to visually inspect the condition of the at least one reactor tube on all sides of said reactor tube during operation, the total number of inspection ports being sufficient to inspect all reactor tubes present in the furnace at their full length and circumference; and wherein the heating duty of the furnace is at least 3 MW.

[0008] However, the heating panels proposed in US2021 / 0113980 A1 are arranged open within the furnace. This can result in contrasting properties in terms of mechanical strength and power density on the surface of the heating panels: on the one hand, heating panels with a low specific surface area have a high stiffness and accordingly favorable conditions for good dimensional stability. On the other hand, these heating panels have a low specific surface area such that an 240545W001

[0009] - 2 - overtemperature is necessary in order to increasing heating power. Therefore, the heating panels can be susceptible against overheating and thermic creeping. Heating panels with high surface area can be able to transfer heat at a reduced overtemperature, but have a reduced stiffness and have to be supported.

[0010] EP 3 835 639 A1 discloses to a gas-tight multilayer composite tube having a heat transfer coefficient of > 500 W / m2 / K comprising at least two layers, an inner layer consists of a nonporous monolithic oxide ceramic, which is enclosed by an outer layer of oxide fiber composite ceramic, wherein this outer layer has an open porosity of 5% < E < 50%, preferably 10% < E < 30%, wherein an electrically conductive system is integrated in the outer annular space of the multilayer composite tube, the boundaries of which are defined by the outer surface of the inner layer and by the inner surface of the outer layer. Moreover, it relates to the use of the multilayer composite tube as a reaction tube for endothermic reactions, lances or rotary tubes. The closed circumferential surface of cylindrical shape is considered a necessary feature to ensure the stability of the multilayer wall structure. Despite the achievements describes in EP 3 835 639 A1 , it can be expected that the technical teaching cannot be transferred to a sandwich structure having a plane geometry. Prior experiments to achieve this have failed until now.

[0011] WO2018054629 A1 describes that known infrared surface emitters comprise a carrier with a heating surface and with a conductor track applied to a conductor track covering surface of the carrier and consisting of an electroconductive resistive material that generates heat as a current flows through, the conductor track comprising a first conductor track section for producing a first surface output and a second conductor track section for producing a second surface output different from the first surface output. The aim of the invention is to provide an infrared surface emitter with a high level of irradiation, designed to emit radiation with an irradiation strength that is as homogeneous as possible. To this end, the carrier contains a composite material comprising an amorphous matrix component and an additional component in the form of a semiconductor material, and the first conductor track section and the second conductor track section are connected in series and differ from each other in terms of the covering density thereof and / or the conductor cross-section thereof. However, using an amorphous material is not suitable, in particular due to its brittleness and limited temperature resistance to max. 1150°C.

[0012] Moreover, DE 10 2022200 652 A1 describes a multilayer composite pipe, its use and the manufacture of the multilayer composite pipe.

[0013] US 2002 / 185487 A1 describes a ceramic heater for use as a platform or support in producing a semiconductor wafer. A method for use of the ceramic heater as well as a method for controlling the temperature of a semiconductor wafer is described.

[0014] Problem to be solved 240545W001

[0015] - 3 -

[0016] It is therefore desirable to provide a heating panel and a furnace which at least partially address above-mentioned technical challenges of known methods and devices. Specifically, a heating panel shall be provided which is suitable for an electrical industrial furnaces using direct heating.

[0017] Summary

[0018] This problem is addressed by a heating panel, a furnace for heating a reaction medium and several uses with the features of the independent claims. Advantageous embodiments which might be realized in an isolated fashion or in any arbitrary combinations are listed in the dependent claims as well as throughout the specification.

[0019] As used herein, the terms “have”, “comprise” or “include” or any arbitrary grammatical variations thereof are used in a non-exclusive way. Thus, these terms may both refer to a situation in which, besides the feature introduced by these terms, no further features are present in the entity described in this context and to a situation in which one or more further features are present. As an example, the expressions “A has B”, “A comprises B” and “A includes B” may both refer to a situation in which, besides B, no other element is present in A (i.e. a situation in which A solely and exclusively consists of B) and to a situation in which, besides B, one or more further elements are present in entity A, such as element C, elements C and D or even further elements.

[0020] Further, it shall be noted that the terms “at least one”, “one or more” or similar expressions indicating that a feature or element may be present once or more than once typically are used only once when introducing the respective feature or element. In most cases, when referring to the respective feature or element, the expressions “at least one” or “one or more” are not repeated, nonwithstanding the fact that the respective feature or element may be present once or more than once.

[0021] Further, as used herein, the terms "preferably", "more preferably", "particularly", "more particularly", "specifically", "more specifically" or similar terms are used in conjunction with optional features, without restricting alternative possibilities. Thus, features introduced by these terms are optional features and are not intended to restrict the scope of the claims in any way. The invention may, as the skilled person will recognize, be performed by using alternative features. Similarly, features introduced by "in an embodiment of the invention" or similar expressions are intended to be optional features, without any restriction regarding alternative embodiments of the invention, without any restrictions regarding the scope of the invention and without any restriction regarding the possibility of combining the features introduced in such way with other optional or non-optional features of the invention.

[0022] In a first aspect of the present invention, a heating panel configured for heating a reaction medium is disclosed. 240545W001

[0023] - 4 -

[0024] The heating panel is a three dimensional structure having two plane opposing surfaces or a curved three dimensional structure spanning at least one opening. The heating panel comprises at least one heating resistor and a base element of Oxide Ceramic Matrix Composite (OCMC). The base element comprises a first side configured for being in contact with the reaction medium. The heating resistor is arranged on a second side of the base element opposing to the first side.

[0025] The term “heating” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to at least one process for maintaining and / or changing a temperature of at least one element, e.g. a reaction medium in a pipeline. For example, the heating may comprise heating a reaction medium to a temperature range from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C. The temperature range may be dependent on an application. For example, the heating may ensure a constant temperature. For example, the heating may comprise supplying of an endothermic reaction at constant temperature.

[0026] The term “panel” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to a three dimensional structure having two opposing surfaces having a length and a width perpendicular to a surface normal and a thickness which is smaller than the length and the width. The surface of the heating panel may be planar, open curved, and / or open arched. The panel may have at least a planar or a corrugated 2D surface comprising of polygonally arranged edges spanning a 3D space maximally by half, e.g. between a first end a second end of the panel. Inner and outer surfaces of the panel have at least two ends which are not in contact which each other. The panel may have a flat extension, e.g. a sheet and / or shell like element. The term “panel” further may refer to a geometrical property of an element.

[0027] The heating panel has an open geometric shape. The term “open geometrical shape” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to a three dimensional body having in a surface spanning the length and width a planar geometry or at least one curvature forming at least one open curve that bends in a certain direction without forming a closed shape, e.g. without forming a circle, a tetragon, a polygon or a hexagon. The heating panel may have a non-closed geometric shape. The curvature of the heating panel may be concave or convex. The curvature may define an unrestricted open field. In any plane that intersects the heating panel, any two points that do not belong to the heating panel can be connected by a line in the plane that does not intersect the heating panel. The surface of the heating panel may define an unrestricted open space. 240545W001

[0028] - 5 -

[0029] The heating panel may have on a large scale a planar shape but may have a wave-shaped and / or corrugated substructure. For example, the heating plane may have in a substructure a wave in the range of 10 nr2. Such a wave-shaped structure can allow stiffening a supporting structure made of the OCMC and preventing delamination. The heating panel may comprise a plurality of heating panels each having a wave-shape. The corrugated heating panels may be combined to a structured packing, e.g. similar to SULZER Mellapak™ packings.

[0030] The heating panel may have a surface area A. The surface area may refer to the total area that the surface of the object occupies. The surface of the heating panel may be planar. However, other embodiments such as curved, arched and / or shell-formed surfaces may be possible. Techniques for determining the surface area A are known to the skilled person. The heating panel may have a thickness s. The thickness may be defined as extension along a surface normal. The thickness may be defined as the smallest of three descriptive measurements: height, width and length. The heating panel may be thin-walled. The term “thin-walled” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to the fact that the thickness of the heating panel is significantly smaller compared to the further dimensions of the heating panel. For example, a ratio of the thickness to an extension along the other dimension may be 1 / 10. The thickness of the heating panel may be from 0.5 mm to 10 mm. The heating panel may have a normalized shell thickness Snorm= — from 0.0001 to 0.1 , with s being a thickness of the panel and Deq= 4- with A being the surface area of the heating panel and U being the perimeter of the surface area. Preferably, the normalized shell thickness of the heating panel is from 0.0005 to 0.03. The heating panel may be designed as cylinder segment of a circumference of a cylinder, e.g. a half shell.

[0031] The heating panel may have an area of 0.01 m2to 50 m2, preferably from 0.05 m2to 10 m2, more preferably from 0.1 m2to 5 m2. The heating panel may have a length of 0.05 m to 50 m, preferably from 0.1 m to 30 m, more preferably from 0,5 m to 20 m. The heating panel may have a width of 0.05 m to 2 m, preferably from 0.1 to 2 m, more preferably from 0.1 to 1 m. The heating panel may have a bending of 0 1 / m to 3 1 / m, preferably from 0 1 / m to 2 1 / m, more preferably from 0 1 / m to 1 1 / m. The heating panel may have a thickness of 0.5 mm to 10 mm, preferably from 1 .5 mm to 7.5 mm, more preferably from 2 mm to 5 mm. However, also other dimensions may be feasible.

[0032] The term “heating panel” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to a panel configured for providing at least one heating function. The heating panel may be configured for direct heating of the reaction medium. The heating panel may be in direct contact with the reaction medium and, thus, can directly heat the reaction medium. 240545W001

[0033] - 6 -

[0034] The heating panel may be used as heating element within a furnace, e.g. an electrically heated furnace, and / or a reaction tube, e.g. an electrically heated reaction tube. For example, the heating panel may be used within a catalytic reactor. For example, the heating panel may be positioned within a reaction volume. For example, the heating element may be positioned within a gas room. For example, the heating panel may be embedded in a pile of solid particles. For example, the heating element may be immersed in a fluid or in a melt. For example, the heating panel may be immersed in a boiling fluid. For example, the hating panel may be immersed in a two-phase flow of gas and fluid (Bubble column). For example, the heating panel may be immersed in a two-phase flow of gas and solid material (Fluidized bed) or of fluid and solid material (suspension). For example, the heating panel may be a composed heating panel comprising a plurality of heating panels. For example, a plurality of heating panels may be combined and used as contact for a reactive flow. In one embodiment, the heating panel may be used for heating the at least one reaction medium within a reaction tube of an electric steam cracker. For example, the heating panel and the at least one reactive component may be in contact inside the cracker coils of a steam cracker.

[0035] The term “heating resistor” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to component of the heating panel configured for converting electrical energy into heat, in particular through the process of Joule heating. The heating resistor is a heating resistor. For example, the heating resistor may be a resistance wire, e.g. a metallic resistance wire.

[0036] The heating resistor may exemplarily have an Ohmic resistance of 10 mQ to 1000 Q, preferably from 20 mQ to 500 Ohm, more preferably from 50 mQ to 100 Q.

[0037] The heating resistor may be a metallic and / or ceramic heating resistor.

[0038] The heating resistor may comprise at least one metallic material selected from the group consisting of: an iron-based alloy; a nickel-based alloy, a platinum group metal (PGM); a refractory metal; at least one ferritic iron-chromium-aluminum (FeCrAI) alloy; or one alloy having a material number according to DIN 17007-2:1961-09: n1.m1 m2m3m4, with n1 being a digit selected from the group 1 , 2, 3, and preferably a digit from the group 1 and 2, with ml being a digit selected from the group 0, 1 , 3, 4, 8, preferably a digit selected from the group 3 and 4, and particularly preferably the digit 4, with m2 being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit selected from the group 5, 6, 7, 8, 9 and particularly preferably a digit selected from the group 7, 8, 9, with m3 and m4, preferably each independently, being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys may comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D. PGM may comprise the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof. Refractory metals may comprise the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof. 240545W001

[0039] - 7 -

[0040] For example, the heating resistor may comprise at least one electrically conductive material, such as at least one ceramic material. The heating resistor may be a ceramic heating resistor, wherein the ceramic material may be selected from the group consisting of carbon (graphite or carbon fibers); car-bides, e.g. silicon carbide (SiC) or zirconium carbide (ZrC); nitrides, e.g. silicon nitride (SisN^; silicides, e.g. molybdenum disilicide (MoSi2); binary oxides, e.g. Yttria Stabilized Zirconia (YSZ), Magnesia Stabilized Zirconia (MSZ), titanium oxides (TiO); Zirconium Suboxide, e.g. ZrO, Z^Os, ZrxOy(where x < y), Titanium Suboxide, e.g. TiO, Ti20s, TixOy(where x<y), Iron Oxides, e.g. FeO, FesC ; ternary oxides, e.g. Perovskite, ferrites. Also other materials may be feasible.

[0041] For example, the heating resistor may be made from a mixture of metal and ceramic, e.g. nickel and titanium oxide or zirconium oxide.

[0042] The heating resistor may have a band-like or meander-like structure. The heating resistor may be longer than wide. The heating resistor may have a constant surface area or a varied surface area. The resistance of the heating resistor can be specifically adjusted over a wide range by the cutting pattern of the heating tape. In addition, the surface-specific ohmic resistance can be specifically varied. As a result, the power density can be distributed specifically over the surface of the heating panel.

[0043] For example, the heating resistor may be formed by a metallic tape. The heating resistor may be formed by a thin metallic tape having a favorable surface-to-volume ratio. As a result, the heat can be released to the environment with a moderate radiation density and a correspondingly moderate overtemperature of the metallic tape. The metallic tape may have a thickness from 0.03 mm to 0.3 mm, preferably from 0.05 mm to 0.1 mm. A ratio l / b of a length I of the heating resistor and of a width b of the heating resistor may be from 10 to 5000, preferably from 50 to 100. The heating resistor may have a surface-to-volume ratio configured for releasing heat to the environment with a moderate radiation density and a correspondingly moderate overtemperature of the heating resistor. The length I and the width b of the heating resistor may be defined as follows

[0044] The length I may be from 0.1 m to 500 m, preferably from 0.3 to 200 m, more preferably from 0.5 to 100 m, wherein the width is from 2 mm to 500 mm, preferably from 5 mm to 200 mm, more preferably from 10 mm to 100 mm, wherein a ratio l / b is from 5 to 5000, preferably from 10 to 1000, more preferably from 10 to 500. The thickness of the heating resistor s is from 0.03 mm to 0.3 mm, preferably from 0.05 mm to 0.1 mm. For example, the specific ohmic resistivity of the heating resistor p is from 0.05 pQm to 100 pQm, preferably from 0.1 pQm to 100 pQm, particularly from 0,2 pQm to 10 pQm. For example, the surface related heat flux q generated by the heating resistor is from 0.1 kW / m2to 500 kW / m2, preferably from 0.5 kW / m2to 250 kW / m2, more preferably from 1 kW / m2to 150 kW / m2. For example, a voltage U may be from 10 V to 10000 V, 240545W001

[0045] - 8 - preferably from 20 V to 5000 V, more preferably from 50 V to 2000 V. For example, an electrical current I may be from 1 to 10000 A, preferably from 2 to 5000 A, more preferably from 10 to 1000 A.

[0046] The term “length” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an extension perpendicular to a surface normal of the element, e.g. the heating resistor. The length may be defined as the largest of three descriptive measurements: height, width and length. The length of the heating resistor may be a length in an unwinded state. The term “thickness” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an extension along a surface normal of the element, e.g. the heating resistor. The thickness may be defined as the smallest of three descriptive measurements: height, width and length. The term “width” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an extension perpendicular to the length and the thickness of the element, e.g. of the heating resistor.

[0047] The heating resistor may be applied to the base element using a force-fit and / or form-fit and / or material connection. For example, the application may comprise one or more of embedding, impregnating, printing, chemical vapor deposition (CVD), physical vapor deposition (PVD). galvanic deposition, electroless plating, sol-gel-deposition, atmospheric plasma spraying (APS), and the like. For example, the heating resistor may be applied to the base element using at least one conductive path using additive manufacturing.

[0048] The composite structure of the base element and the heating resistor can allow for operating the heating resistor at high temperatures (up to 1300°C): A sole metallic or ceramic tape would lose in this temperature range its strength almost completely. Surprisingly, the composite structure was found to be stable despite the different thermal expansion coefficients of the material of the heating resistor and OCMC. This can allow fabrication of large-scale, thin-walled shells, which generate and radiate heat over a large area.

[0049] The heating resistor may be configured for performing at least one sensoric function. The heating resistor may be configured as a thermometer. A temperature dependency resistivity of the material of the heating resistor may be used for detecting temperature, e.g. temperature changes. For example, a medium temperature of the heating resistor may be determined. The temperature dependency of the heating resistor may be known or predetermined. A resistivity measurement may be performed as follows. Measuring a supply current and supply voltage which is used for supplying the heating resistor. A total resistivity may be determined, in particular using Ohm’s law, from the measured supply current and supply voltage. Additionally or alternatively, the resistivity measurement may comprise measuring a potential difference and / or the 240545W001

[0050] - 9 - resistivity by using contacts of the heating resistor. For example, the heating resistor may comprise, e.g. embedded within the material of the heating resistor, a stripe or wire of a suitable material having at least one contact at its respective ends for measuring the resistivity. For example, the heating resistor may comprise at least one thermocouple for measuring a temperature dependent voltage.

[0051] The heating resistor may comprise a first contact end and a second contact end configured for being contacted by at least one contact of an electric supply line. The heating resistor may be configured for being powered directly, e.g. by applying at least one electrical voltage to the heating resistor via the first and second contact ends, e.g. by using a power line. The term “power line” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an arbitrary power supply, e.g. a voltage source. The heating resistor may be contacted by the power line in a series connection or on a parallel connection. For example, a power may be from 10 kW to 2000 kW, 20 kW to 1000 kW, 50 kW to 500 kW. For example, an electrical current may be from 1 to 10000 A, preferably from 2 to 5000 A, more preferably from 10 to 1000 A. For example, an electric current density may be from 1 A / mm2to 500 A / mm2, preferably from 5 A / mm2to 100 A / mm2. For example, a voltage gradient may be from 1 V / m to 100 V / m, preferably from 5 V / m to 50 V / m. For example, a voltage may be from 10 V to 10000 V, preferably from 20 V to 5000 V, more preferably from 50 V to 2000 V.

[0052] The first contact end and / or the second contact end may be on the identical side of the heating element or at opposing sides.

[0053] The first contact end and / or the second contact end have an extended cross section. For example, a cross section ratio of the first contact end and the contact second end to the heating resistor is from 1 to 100, preferably from 2 to 50, more preferably from 5 to 20. For example, heating resistor may comprise a main body, the first contact end at an area located at a first end of the main body and the second contact end at an area located at a second end of the main body. The main body may comprise a cross section, which may remain constant over the length of the main body. The heating resistor at the area of the first contact end and at the area of the second contact end may have an extended cross section in comparison to the cross section of the main body. Both contact ends may have an extended cross section in comparison to the main body or only one of the first contact end and the second contact end may have an extended cross section in comparison to the main body. For example, the ratio of the cross section at the first contact end and of the cross section the main body may be 1 , and the ratio of the cross section at the second contact end and of the cross section the main body may be greater than 1 , or vice versa. However, embodiments are thinkable in which the ratio of the cross section at the first contact end and of the cross section the main body may be close to 1 and the ratio of the cross section at the second contact end and of the cross section the main body may be close to 1 .

[0054] The extended cross section can allow forming cold lead ends for contacting of the heating panel 240545W001

[0055] - 10 - to the power line. The cold lead ends can be integrated into the heating resistor by cutting the heating tape appropriately.

[0056] Additionally or alternatively, the heating panel may be configured for being powered indirectly. For example, the base element may be configured as susceptor for coupling of inductive currents to the heating resistor.

[0057] The term “base element” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an element of the heating panel configured for providing at least one supporting function, e.g. for at least one further element of the heating panel such as the heating resistor. For example, the supporting function may be providing stiffness and / or strength e.g. against internal and / or external loads. The base element may provide the dimensional stability of the heating panel.

[0058] As outlined above, the base element is of Oxide Ceramic Matrix Composite (OCMC). The term “composite material” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an arbitrary material being produced from two or more constituent materials. These constituent materials may have notably dissimilar chemical or physical properties and may be merged to create a material with properties unlike the individual materials. Within the composite material, the individual materials may remain separate and distinct. Specifically, the composite material may be a fiber-reinforced composite material. The term “fiber-reinforced composite material (FRC)” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an arbitrary material generally comprising at least two main components: reinforcing fibers and an embedding matrix which may serve as a filler and / or adhesive between the fibers. Mutual interactions between the two components may give overall material higher-grade properties than either of the two components involved alone. The fiber-reinforced composite (FRC) may specifically comprise the fibers as a discontinuous or dispersed phase, the matrix as a continuous phase and an interphase region, which may also be referred to as interface.

[0059] The term “Ceramic Matrix Composite (CMC)” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an arbitrary composite material, specifically to an arbitrary fiber-reinforced composite material, comprising a plurality of ceramic fibers embedded in a ceramic matrix. Thereby, carbon and carbon fibers may also be regarded as a ceramic material. The term “Oxide Ceramic Matrix Composite (OCMC)” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized 240545W001

[0060] - 11 - meaning. The term specifically may refer, without limitation, to an arbitrary ceramic matrix composite comprising an oxide ceramic matrix reinforced by oxide ceramic reinforcing fibers. The term “OCMC” may refer to pure OCMC structures and to hybrid OCMC structures comprising in addition to the OCMC at least one further material such as metallic fibers. Specifically, OCMCs are fiber reinforced composite materials comprising oxide fibers embedded in a porous matrix of oxide ceramics. Advantages of such OCMCs can be ensuring high temperature resistance up to 1300 °C or above, high thermal shock resistance and quasi-ductile deformation and fracture behavior. An open porosity E of fiber composite ceramics can usually take on values between 5% and 50%. A fracture toughness of OCMC can reach values of KIC = 10 - 50 MPaVm. As a result of the porous structure, fiber composite ceramics may have a lower density, a lower modulus of elasticity and a lower thermal conductivity coefficient compared to monolithic ceramics with the same chemical composition. The following table gives a list of the relevant standards for the determination of these parameters; in particular a list of relevant norms for the determination of structural, mechanical and thermophysical parameters for monolithic ceramics and for OCMC.

[0061] The thermal conductivity coefficient is defined by the following relationship: thermal conductivity coefficient = density x (specific heat capacity) x thermal diffusivity coefficient.

[0062] As an example, the following table compares between the properties of monolithic ceramics and OCMC based on aluminum oxide. 240545W001

[0063] - 12 -

[0064] For example, the OCMC may be prepared by the following manufacturing procedure: A fiber fabric in the form of a textile or a fiber bundle such as a rovings may be infiltrated with a slurry. The infiltration may be carried out by dipping or knife coating. Several layers may be laminated over a suitable mold until a desired wall thickness is achieved. Drying may be carried out in a temperature range of 40 °C to 150 °C, preferably from 60 °C to 100 °C. In a subsequent step, the OCMC layer may be fired. Firing may take place in a temperature range of 1100 °C to 1300 °C, preferably in a temperature range of 1150 °C to 1250 °C.

[0065] Specifically, components made of OCMs may be manufactured using a manufacturing process as described, for example, in DE102016007652A1 , comprising the following steps: The textile framework is impregnated with a slurry and placed on a mold or laminated. A slurry may be understood to be the pulpy to pasty mixture of water and mineral powder, which is used as a raw mass for the production of ceramic products. For example, the powder contains metal oxides, carbides, nitrides. Preferably, the powder contains aluminum oxide, zirconia, mullite or zirconia reinforced aluminum oxide. Subsequently, the component is dried at temperatures of 40 °C to 150 °C, preferably from 60 °C to 100 °C. This can allow giving the component sufficient stability that it is self-supporting and can be removed from the mold. Finally, the component may be fired in a high-temperature furnace at temperatures of 1100°C to 1300°C, preferably in a temperature range of 1150 °C to 1250 °C. The finished component may comprise an intimate composite of the textile framework and a sintered, porous ceramic matrix.

[0066] However, also other manufacturing processes may be possible.

[0067] As outlined above, the OCMC may have a matrix, specifically an oxide ceramic matrix. The term “matrix” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an arbitrary constituent of a composite material. Specifically, the matrix may refer to or may comprise at least one material in which other components are embedded. The matrix may specifically serve the following functions. The matrix may be configured for binding a fiber reinforcement. Further, the matrix may be configured for providing a composite component its shape and may direct its surface quality.

[0068] The matrix may specifically comprise at least one of: a binary oxide (MXOZ); a mixed oxide such as M1xM2yOz and / or M1xM2yM3wOz; a complex matrix comprising a plurality of ceramic particles and / or of metallic particles. Specifically, the OCMC may have a matrix composition selected from the group consisting of: SixMyOz, SixM1yM2wOz, SixByNzCw, AIN, MxOy and mixtures of oxides (M1xOy / M2wOz). For example, the OCMC may have a matrix composition comprising a mixture of oxides such as 85% AI2O3 and 15% ZrO2 (e.g. a matrix available under FW12 from WPS). However, also other kinds of materials may be possible. 240545W001

[0069] - 13 -

[0070] Thereby, O may refer to the chemical element oxygen. B may refer to the chemical element boron (B). N may refer to the chemical element nitrogen (N) and C may refer to the chemical element carbon (C).

[0071] M may specifically be an element selected from the group consisting of: aluminum (Al), zirconium (Zr), silicon (Si), calcium (Ca), magnesium (Mg), beryllium (Be), yttrium (Y), lanthanum (La), iron (Fe), nickel (Ni), chromium (Cr), tungsten (W), hafnium (Hf), strontium (Sr). Preferably, M may be an element selected from the group consisting of: aluminum (Al), zirconium (Zr), silicon (Si), strontium (Sr), lanthanum (La), yttrium (Y). M1 may specifically be an element selected from the group consisting of: aluminum (Al), zirconium (Zr), yttrium (Y). Preferably, M 1 may be aluminum (Al). M2 may specifically be an element selected from the group consisting of: zirconium (Zr), silicon (Si). Preferably, M2 may silicon (Si). M3 may specifically be cobalt (Co), x, y and w may each independently be between 1 and 10, preferably between 1 and 7 and most preferably between 1 and 5. z may specifically be between 1 and 30, preferably between 1 and 20 and most preferably between 1 and 10.

[0072] The metallic particles may specifically be made of at least one material selected from the group consisting of: an iron-based alloy, a nickel-based alloy, a platinum group metal (PGM) or a refractory metal. The metallic particles may specifically be made of at least one ferritic iron-chro- mium-aluminum alloy (FeCrAI alloy) or one of at least one material having a material number according to DIN 17007-2:1961-09: n1.m1 m2m3m4. n1 may specifically be a digit from the group 1 ,2,3 and preferably a digit from the group 1 and 2. ml may specifically be a digit from the group 0, 1 , 3, 4, 8, preferably a digit from the group 3 and 4 and particularly preferably the digit 4. m2 may specifically be a digit from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit from the group 5, 6, 7, 8, 9 and particularly preferably a digit from the group 7, 8, 9. m3 and m4 preferably each independently may stand for one of the digits from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D. PGM comprise the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof. Refractory metals comprise the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof.

[0073] Specifically, the matrix may be made of FW12 from Walter E.C. Pritzkow Special Ceramics (85% AI2O3 and 15% 3YSZ).

[0074] The base element of OCMC, specifically the matrix of the OCMC, may have a porosity from 10 % to 60 %, preferably from 20 % to 50 %, more preferably from 20 % to 40%. A pore size of the base element of OCMC, specifically the matrix of the OCMC, may specifically be between 0.001 pm and 100 pm, preferably between 0.01 pm and 10 pm and most preferably between 0.05 pm and 0.5 pm. However, also other embodiments may be possible.

[0075] As outlined above, the OCMC may have a plurality of fibers, specifically a plurality of oxide ceramic reinforcing fibers. The term “fiber” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a 240545W001

[0076] - 14 - special or customized meaning. The term specifically may refer, without limitation, to an arbitrary element having a length and a width, wherein the length of the element exceeds the width of the element such as at least by a factor of 5, preferably at least by a factor of 10 and most preferably at least by a factor of 20. The fiber may specifically be an artificial fiber. The artificial fiber may be a fiber whose chemical composition, structure, and / or properties may be significantly modified during a manufacturing process. Artificial may refer to regenerated fibers and synthetic fibers.

[0077] The oxide ceramic reinforcing fibers may comprise at least one material selected from the group consisting of: a binary oxide (MXOZ), a mixed oxide (M1xM2yOzor M1xM2yM3wOz), a metal (M), a metal carbide (MxCy). Specifically, OCMC may have oxide ceramic reinforcing fibers comprising at least one material selected from the group consisting of: mullite, AI2O3, a combination of mullite and AI2O3. However, also other kinds of materials may be possible.

[0078] Thereby, O may refer to the chemical element oxygen (O) and C may refer to the chemical element carbon (C). M may specifically be an element selected from the group consisting of: aluminum (Al), zirconium (Zr), silicon (Si), calcium (Ca), magnesium (Mg), beryllium (Be), yttrium (Y), lanthanum (La), iron (Fe), nickel (Ni), chromium (Cr), tungsten (W), hafnium (Hf), strontium (Sr),. Preferably, M may be selected from the group consisting of: aluminum (Al), silicon (Si), strontium (Sr), zirconium (Zr), lanthanum (La), yttrium (Y). M1 may specifically be an element selected from the group consisting of: aluminum (Al), zirconium (Zr), yttrium (Y). Preferably, M 1 may be aluminum (Al). M2 specifically be an element selected from the group consisting of: silicon (Si), zirconium (Zr). Preferably, M2 may be silicon (Si). M3 may specifically be cobalt (Co), x, y and w may each independently be between 1 and 10, preferably between 1 and 7 and most preferably between 1 and 5. z may specifically be between 1 and 30, preferably between 1 and 20 and most preferably between 1 and 10.

[0079] Metallic fibers may specifically be made of at least one material selected from the group consisting of: an iron-based alloy, a nickel-based alloy, a platinum group metal (PGM) or a refractory metal. Metallic fibers may specifically be made of at least one ferritic iron-chromium-aluminum alloy (FeCrAI alloy) or one alloy having a material number according to DIN 17007-2:1961-09: n1 .ml m2m3m4. n1 may specifically be a digit from the group 1 ,2,3 and preferably a digit from the group 1 and 2. ml may specifically be a digit from the group 0, 1 , 3, 4, 8, preferably a digit from the group 3 and 4 and particularly preferably the digit 4. m2 may specifically be a digit from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit from the group 5, 6, 7, 8, 9 and particularly preferably a digit from the group 7, 8, 9. m3 and m4 preferably each independently may stand for one of the digits from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D. PGM comprise the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof. Refractory metals comprise the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof. 240545W001

[0080] - 15 -

[0081] The OCMC may have a plurality of the oxide ceramic reinforcing fibers which may form a fiber fabric. The term “fiber fabric” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to a manufacturing of the fibers. The fiber fabric may be manufactured in a sheet, a mat, specifically a continuous mat, or as continuous filaments. The fiber fabric may be manufactured from at least one technique selected from the group consisting of: weaving, knitting, braiding and stitching. The fibers may be manufactured in two-dimensional or three-dimensional orientations. In the two-dimensional orientation the fibers may be essentially only aligned along a plane in x-direction, and in y-direction of the material. In the three-dimensional orientation fibers may be incorporated in the x-direction, y-direction and z-direction. The fiber fabric may also be referred to as fiber preform, fiber backbone, fiber scaffold or fiber framework.

[0082] The base element, specifically the plurality of the oxide ceramic reinforcing fibers, more specifically the fiber fabric, may have fabric, a mesh, a woven or a knitted structure. However, also other embodiments may be feasible.

[0083] For example, a fabric with an open weaving pattern may be used as fiber framework for the OCMC. Thermal radiation can be intensified by using a fabric with an open weaving pattern as the fiber framework for the OCMC base element and / or cover element.

[0084] The fiber fabric may specifically be woven in a weave pattern selected from the group consisting of: unidirectional, plain weave, twill K1 / 2, twill K2 / 2, twill K1 / 3, twill 4 / 4, atlas A1 / 4, atlas A1 / 7. Preferred weave patterns may be twill 2 / 2, twill 4 / 4, atlas 1 / 4, atlas 1 / 7, and specifically twill 4 / 4, atlas 1 / 4 and atlas 1 / 7. The fiber fabric may specifically be laminated at an angle of 0 / 90° or at an angle of 45°. However, also other embodiments may be feasible.

[0085] The fiber fabric may be a homogeneous fiber fabric or a hybrid fiber fabric. Specifically, the hybrid fiber fabric may also be part of a functional layer. The homogeneous fiber fabric may comprise exclusively one kind of fibers. The hybrid fiber fabric may comprise at least two different kinds of fibers. One kind of fibers of the hybrid fiber fabric may refer to fibers being electrically conductive. The fiber fabric may specifically comprise electrically conductive fibers as warp and / or weft threads. Preferably, the fiber fabric may comprise electrically conductive fibers as weft threads. The fibers being electrically conductive may comprise at least one of metals, carbon and silicon carbide, preferably at least one of metal and carbon and most preferably metal. The metallic fibers may be made of at least one material selected from the group consisting of: an iron-based alloy, a nickel-based alloy, a platinum group metal (PGM) or a refractory metal. The metallic fibers may specifically be made of at least one ferritic iron-chromium-aluminum alloy (FeCrAI alloy) or one alloy having a material number according to DIN 17007-2:1961-09: n1 .ml m2m3m4. n1 may specifically be a digit from the group 1 ,2,3 and preferably a digit from the group 1 and 2. ml may specifically be a digit from the group 0, 1 , 3, 4, 8, preferably a digit from the group 3 and 4 and particularly preferably the digit 4. m2 may specifically be a digit from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit from the group 5, 6, 7, 8, 9 and particularly 240545W001

[0086] - 16 - preferably a digit from the group 7, 8, 9. m3 and m4 preferably each independently may stand for one of the digits from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D. PGM comprise the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof. Refractory metals comprise the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof.

[0087] The oxide ceramic reinforcing fibers may have a fiber diameter from 1 pm to 50 pm, preferably from 3 pm to 30 pm and most preferably from 5 pm to 20 pm. However, also other dimensions may be possible.

[0088] A plurality of single oxide ceramic reinforcing fibers, which may also be referred to as filaments, may be bundled to a strand, wire or yarn. Thereby, the plurality of single oxide ceramic reinforcing fibers may essentially extend in one direction. Specifically, the filaments may be twisted into a single yarn strand. One yarn strand may comprise 100 to 20000 filaments, preferably 200 to 10000 filaments. A yarn thickness according to ISO1144 may specifically be in the range of 50 to 2500 Tex, preferably in the range of 100 to 1500 Tex, most preferably in the range of 150 to 1000 Tex. A yarn may specifically be made of 200 to 10000 filaments, preferably of 300 to 3000 filaments, and most preferably of 300 to 2000 filaments. A fiber volume content may specifically be from 5% to 75%, preferably from 10% to 60% and most preferably from 20% to 50%. A diameter of the filaments may be from 1 pm to 50 pm, preferably from 3 pm to 30 pm, more preferably from 5 pm to 20 pm.

[0089] In an exemplary embodiment, a fiber fabric may comprise six superimposed fabric sheets wound in 0 / 90° orientation, e.g. of type DF-11 from 3M (St. Paul, MN, U.S.A.) which may be impregnated with slurry forming the matrix of the OCMC structure after firing. The slurry may comprise a mixture of 85% AI2O3 and 15% ZrC>2. The slurry may comprise additional components.

[0090] The base element and / or a cover element, which is described in more detail below, may have a geometry selected from the group consisting of: a planar geometry, an arched geometry, a regular or irregular geometry. The base element and / or the cover element may not form a tube or a pipe. For example, the heating element may be rod-shaped having a circular cross-section. The base element and / or the cover element may have a circular cross-section, wherein a bending radius may be e.g. 5 times a diameter of the base element and / or the cover element.

[0091] For example, the heating panel may be positioned within a reaction tube. A ratio of the surface areas of the heating panel and the reaction tube may be e.g. 1 :5. In order to provide a required power to the reaction tube, a power density at the surface of the heating panel may be greater by said ratio of the surface areas than the power density at the surface area of the reaction tube.

[0092] The specific surface of the base element al indicates the ratio of the surface area of the base element and the volume of the base element and is defined as follows: 240545W001

[0093] - 17 - aEEmay be from 650 m2 / m3to 4000 m2 / m3, preferably from 1000 m2 / m3to 3000 m2 / m3. The base element may have a thickness SBE of 0.5 mm to 3 mm, preferably from 0.75 mm to 2 mm, more preferably from 1 mm to 1 .5 mm.

[0094] For example, a specific surface area of the heating element, i.e. surface area of the heating element / volume of the heating element, may be from 650 m2 / m3to 4000 m2 / m3(for comparison: a 6mm thick wire has 650 m2 / m3).

[0095] For example, a specific surface area of the heating element, i.e. surface area of the heating element / volume of a furnace in which the heating element is positioned, may be 10 m2 / m3(for comparison for a 6 mm thick wire: 1 .5 m2 / m3).

[0096] The terms "first", "second" and other terms of a similar nature are used as nomenclature, without hereby order or ranking. Also, several "first" or "second" properties and / or elements may be provided.

[0097] As outlined above, the base element comprises a first side configured for being in contact with the reaction medium. The second side with the heating resistor of the base element may be configured for being in contact with the reaction medium, too. The first side and / or the second side may be in contact with the reaction medium. In particular, the OCMC of the base element is porous such that, without additional measures, both sides of the base element may be in contact with the reaction medium. The first side may constitute a surface configured for being in contact with the reaction medium. The second side may constitute a surface configured for being in contact with the reaction medium. The term “being in contact with the reaction medium” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to interaction between the reaction medium and the first and / or the second side of the base element. For example, in case of fluidic or gaseous reaction medium, the reaction medium may flow over, e.g. tangential, and / or flow through the first and / or the second side of the base element. For example, in case of solid reaction medium, the reaction medium and the first and / or the second side of the base element may be in solid contact and / or surface contact. The term “configured for being in contact with the reaction medium” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to suitability of a surface for being thermally resistant and chemically stable under operating conditions, in particular the operating conditions comprise a temperature range of from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C. The reaction medium may flow along the surface of the first side of the base element. 240545W001

[0098] - 18 -

[0099] The present invention proposes a composite panel in which the heating resistor is embedded in a, in particular mechanical stable and dimensionally stable, base element and / or between the base element and a cover element of OCMC. The tape-shaped heating resistor may be embedded on the OCMC base element or between the base element and a cover element of OCMC. This can allow positioning of the heating panel within the process such that a direct contact between OCMC and the reaction medium is achieved. Thus, a directly electrical heating of the reaction medium can be realized.

[0100] A surface of the first side of the base element may be coated and / or impregnated with at least one catalytic material. The catalytic material may be at least one material selected from the group consisting of: at least one platinum group metal catalyst (PGM), such as Pt, Rh, Ru, or at least one mixture or at least one alloys of these; at least one transition metal such as Ni, Fe, Co, Cr; at least one oxide catalyst such as Perovskite or spinel.

[0101] The surface of the first side of the base element may be blackened. The term “blackened” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to reducing reflection properties and / or minimizing transmission properties. The term may refer to maximizing opacity of the base element. This can allow increasing the efficiency of the thermal radiation. For example, the surface of first side of the base element may be coated with at least one material selected from the group consisting of: SiC; carbon; carbon-Nanotubes; at least one oxide. Preferably the surface of first side of the base element may be coated with at least one oxide, more preferably with at least one material selected from the group consisting of: zirconium oxide, titanium oxide, iron oxide, manganese oxide, nickel oxide, cobalt oxide.

[0102] A surface of the first side of the base element may be corrugated. This can allow increasing an effective surface. The term “corrugated” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to a non-pla- nar structure, e.g. a wave-shaped structure. For example, the corrugated surface may comprise a sinusoidal wave. For example, an amplitude of the wave is from 0 mm to 100 mm, preferably from 0 mm to 50 mm, more preferably from 0 mm to 20 mm, wherein the wavelength is from 5 mm to 1000 mm, preferably from 5 mm to 500 mm, more preferably from 5 mm to 100 mm. For example, an orientation of the wave with respect to the longitudinal edge is from 0° to 90°, preferably 0° to 60°, more preferably 0° to 45°.

[0103] The base element may be configured for supporting the heating resistor on a first side.

[0104] The heating panel may specifically comprise at least one layer stack. The term “layer stack” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to an arbitrary sequence of at least two layers which 240545W001

[0105] - 19 - are applied to one another directly or with the interposition of one or more intermediate layers. The layer stack may comprise several layers of the same material. Furthermore, the layer stack may have layers of different materials. Other embodiments are also feasible in principle. In particular, the layer stack may have at least two layers. Another number of layers is also conceivable in principle. The layers may be delimited from each other by interfaces. The interfaces may be planar or textured. The "layer stack" may therefore also be referred to as a "layer structure". The layers of the layer stack may be arranged on top of each other.

[0106] The heating panel may comprise a cover element of Oxide Ceramic Matrix Composite. With respect to options and embodiments for the cover element reference is made to the options and embodiments of the base element.

[0107] The heating resistor may be connected to the cover element by using a force-fit and / or form-fit and / or material connection. The term “cover element in” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to a component of the heating panel configured for supporting the heating resistor on a second side opposing the first side of the heating resistor supported by the base element. The heating resistor may be embedded in between the base element and the cover element. The cover element, e.g. a first side of the cover element, may be arranged on a second side of the base element opposing the first side of the base element. In particular, a surface of the second side of the base element and a surface of the first side of the cover element may be in direct contact with each other. The term “embedded in” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to one or more of integral to, fixed on and / or within, or enclosed by. In particular, the heating resistor may be sandwiched in between the base element and the cover element. The heating resistor may be supported, in particular via a force-fit and / or form-fit and / or material connection, by the base element and the cover element. This can allow ensuring stiffness of the heating panel. For example, in case of a material connection, a groove may be generated in the base element and / or the cover element, the heating resistor may be placed in the groove and the cover element may be applied by using at least one adhesive.

[0108] The cover element and the base element may be made from the same material. However, other embodiments are possible.

[0109] The cover element and the base element may have the same or different dimensions. However other embodiments are possible. Even embodiments are thinkable in which the cover element and the base element may be arranged offset to each other, i.e. protruding over an edge of the other element. The heating resistor may extend along the full length of the base element and / or the cover element or may extend only partially along the length of the base element and / or the cover element. 240545W001

[0110] - 20 -

[0111] A second side of the cover element, e.g. opposing the first side of the cover element, may be configured for being in direct contact with the reaction medium.

[0112] Even other embodiments are possible. For example, the heating resistor may be in contact with the reaction medium. For example, the heating resistor may be printed on the first side of the base element.

[0113] The term “reaction medium” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to at least one material to be heated. For example, the reaction medium may be a gaseous and / or liquid medium, e.g. a fluid, or at least one solid material, e.g. particles. The reaction medium may for example be selected from the group consisting of: water, steam, air, e.g. air for a combustion process, a hydrocarbon mixture, a hydrocarbon to be cracked. For example, the reaction medium may be a hydrocarbon to be thermally cracked, in particular a mixture of hydrocarbons to be thermally cracked. For example, the reaction medium may be water or steam and additionally comprise a hydrocarbon to be thermally cracked, in particular a mixture of hydrocarbons to be thermally cracked. The reaction medium may for example be a preheated mixture of hydrocarbons to be thermally cracked and steam. Other fluids are also conceivable.

[0114] The heating panel may be one or more of self-supporting, thermally resistant and chemically stable under operating conditions. The operating conditions comprise a temperature range of from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C.

[0115] The term “self-supporting” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to the suitability of the heating panel to bear its own weight and applied loads without needing external support during its use. The heating panel may be designed to be stable and remain standing or in place without external support. In particular, the heating resistor may remain stable. This can allow using thin sheets and / or foils, which also can remain dimensionally stable at high temperatures (in combination with the OCMC). This can lead to the advantage that a smaller cross-section leads to higher resistance, which, at constant current, results in greater heat generation.

[0116] The term “thermally resistant” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to suitability of the heating panel to maintain its structural integrity and / or properties under operating conditions. Changes within tolerance may be allowed as long as structural integrity and / or properties under operating conditions are maintained. 240545W001

[0117] - 21 -

[0118] The term “chemically stable” as used herein is a broad term and is to be given its ordinary and customary meaning to a person of ordinary skill in the art and is not to be limited to a special or customized meaning. The term specifically may refer, without limitation, to suitability of the heating panel to maintain its structural integrity and composition without degradation and / or change due to chemical reactions under operating conditions. Changes within tolerance may be allowed as long as structural integrity and / or properties under operating conditions are maintained.

[0119] Surprisingly, it was found that high power densities are possible by using the heating panel according to the present invention. In particular, volume-related power density (power / process volume) of 50 MW / m3can be achieved. In comparison, volume-related power density in a conventional reaction tube may be around 0.5 MW / m3. The higher volume-related power density can allow realizing extremely short retention times at high temperatures which cannot be achieved by the known techniques. Therefore, thermally unstable products of endothermal reactions can be produced with high selectivity and high throughput. In comparison to heating elements with a closed cross-section, e.g. as described in DE 10 2022 200 652 A1 , the heating panel according to the present invention can allow for a process route as a continuous volume. Thus, devices comprising at least one heating panel according to the present invention can be scaled while not increasing their structural complexity.

[0120] By embedding the heating panel within the reaction medium an effective heat transfer between heating panel and reaction medium can be achieved. Thus, volume specific heating power up to 50000 kW / m3can be reached. Such a power density can allow reducing time within the furnace in comparison to known furnaces by 90 %. Such an extended operating range can be used for several different processes such as transport limited endothermic reactions, e.g. for increasing selectivity and output, or for heat exchanger, in particular because non-wanted reactions and their consequences, e.g. fouling, can be suppressed.

[0121] The proposed heating panel with direct contact with the reaction medium can be used for realizing high performance reactor with high power density and effective temperature control.

[0122] In a further aspect of the present invention, a use of a heating panel according to the present invention, such as described above or in more detail below, is disclosed for one or more of: a purpose of direct electrical heating, preferably direct electrical heating in a furnace, more preferably direct electrical heating in a reactor furnace such as for a preheater and / or for a catalytic reactor.

[0123] With respect to definitions and embodiments relating to the used of the heating panel reference is made to the description of the heating panel above or as given in more detail below.

[0124] The furnace may configured to carry out at least one process selected from the group consisting of: performing at least one endothermic reaction; cracking; steam cracking; steam reforming; alkane dehydrogenation; heating, preheating; superheating or for intermediate superheating of steam; styrene production by ethylbenzene dehydrogenation; production of acetylene; catalytic 240545W001

[0125] - 22 - cracking; splitting ammonia for hydrogen production; hydrocyanic acid synthesis from hydrocarbons and ammonia; ammonia cracking (NH3 I / 2N2 + 3 / 2H2); methane steam reforming: (CH4 + CO + 3H2); cyanic acid from methane and ammonia (BMA) (CH4 + NH3 HCN + 3H2); formamide cleavage HCN + H2O); Alkane dehydrogenation (CnH(2n+2) CnH(2n) + H2, n=2,3,4); styrene synthesis (CsHw CsHs + H2); or Cyclohexane dehydrogenation (C6Hi2 C6H6+ 3H2).

[0126] In a further aspect of the present invention, a furnace for heating a reaction medium is disclosed. The furnace comprises at least one heating panel according to the present invention

[0127] With respect to definitions and embodiments of the furnace reference is made to the description of the heating panel and use of the heating panel above or as given in more detail below.

[0128] The furnace comprises at least one continuous reaction chamber for receiving the reaction medium. The heating panel may be arranged within the reaction chamber. The first side of the base element is configured for being in contact with the reaction medium, wherein the furnace comprises at least one power source, which is connected to the heating panel and is designed for applying at least one voltage to the heating resistor thereby generating heat for heating the reaction medium.

[0129] The furnace may be configured for heating the reaction medium to a temperature range from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C.

[0130] The furnace may configured to carry out at least one process selected from the group consisting of: performing at least one endothermic reaction; formation of unsaturated basic products of the chemical value chain, e.g. ethylene, propylene, butene isomers, butadiene, benzene, by steam cracking of hydrocarbons, e.g. naphtha, ethane, propane (CnH2n+2 XC2H4 + yCsHe + ZC4H8, + VC4H6 + wCeHe + UH2); syngas production e.g. via methane steam reforming (SMR) (CH4 + H2O

[0131] CO + 3H2), via methane dry reforming (CH4 + CO2 2CO + 2H2); hydrogen production via ammonia cracking (NH3 I / 2N2 + 3 / 2H2); cyanic acid formation, e.g. from methane and ammonia (BMA) (CH4 + NH3 HCN + 3H2), from propane and ammonia (Fluohmic process) (3NH3+C3H8 3HCN + 7H2), by formamide cleavage (HCONH2 HCN + H2O); dehydrogenation of unsaturated hydrocarbons, e.g. alkane dehydrogenation (CnH(2n+2) CnH(2n) + H2, n=2,3,4), styrene synthesis (CsHw CsHs + H2), cyclohexane dehydrogenation (CeHi2 CeHe + 3H2); coupling of methane, e.g. ethane formation C2H6 + H2), ethylene formation (2CH4 C2H4 + 2H2), benzene formation (dehydroaromatization) (6CH4 CeHe + 9H2), or a mixture thereof; olefin formation through dehydration of alcohols (CnH(2n+i)OH CnH(2n) + H2O, n=2 6); water-free formaldehyde formation by dehydrogenation of methanol (CH3OH CH2O + H2). Combined heating panels may be used as saggars for calcination of powders, e.g. ores, catalyst precursors, precursors of cathode active materials (CAM) for lithium batteries. 240545W001

[0132] - 23 -

[0133] The furnace may, for example, be part of a steam cracker. “Steam cracking” may be understood as meaning a process in which longer-chain hydrocarbons, for example naphtha, propane, butane and ethane, as well as gas oil and hydrowax, are converted into short-chain hydrocarbons by thermal cracking in the presence of steam. In steam cracking, hydrogen, methane, ethene and propene can be produced as the main product, as well as inter alia butene and pyrolysis benzene. The steam cracker may be designed for heating up the feedstock to a temperature in the range of 550°C to 1100°C.

[0134] For example, the furnace may be part of a reformer furnace. “Steam reforming” may be understood as meaning a process for producing hydrogen and carbon oxides from water and carbon- containing feedstocks, in particular hydrocarbons such as natural gas, light gasoline, or biogas. For example, the feedstock may be heated up to a temperature in the range of 200°C to 1000°C, preferably of 400°C to 900°C.

[0135] For example, the furnace may be part of a device for alkane dehydrogenation. “Alkane dehydrogenation” may be understood as meaning a process for producing alkenes by dehydrogenating alkanes, for example dehydrogenating butane into butene (BDH) or dehydrogenating propane into propene (PDH). The device for alkane dehydrogenation may be designed for heating up the feedstock to a temperature in the range of 400°C to 700°C.

[0136] However, other temperatures and temperature ranges are also conceivable.

[0137] A heat transport on the heating panel can optionally be intensified by circulating surrounding reaction medium. As a result, at a given power output, the overheating on the heating element can be reduced.

[0138] Summarizing and without excluding further possible embodiments, the following embodiments may be envisaged:

[0139] Embodiment 1 . A heating panel configured for heating a reaction medium, wherein the heating panel has an open geometric shape, the heating panel comprising at least one heating resistor and a base element of Oxide Ceramic Matrix Composite (OCMC), wherein the base element comprises a first side configured for being in contact with the reaction medium, wherein the heating resistor is arranged on a second side of the base element opposing to the first side.

[0140] Embodiment 2. The heating panel according to the preceding embodiment, wherein the heating panel comprises a cover element of Oxide Ceramic Matrix Composite, wherein the heating resistor is embedded in between the base element and the cover element. 240545W001

[0141] - 24 -

[0142] Embodiment 3. The heating panel according to any one of the preceding embodiments, wherein a surface of the first side is coated and / or impregnated with at least one catalytic material, wherein the catalytic material is at least one material selected from the group consisting of: at least one platinum group metal catalyst (PGM), such as Pt, Rh, Ru, or at least one mixture or at least one alloys of these; at least one transition metal such as Ni, Fe, Co, Cr; at least one oxide catalyst such as Perovskite or spinel.

[0143] Embodiment 4. The heating panel according to any one of the preceding embodiments, wherein the base element and / or the cover element have a geometry selected from the group consisting of: a planar geometry, an arched geometry, a regular or irregular geometry.

[0144] Embodiment 5. The heating panel according to any one of the preceding embodiments, wherein a surface of the first side of the base element is corrugated.

[0145] Embodiment 6. The heating panel according to any one of the preceding embodiments, wherein the base element has a thickness of 0.5 mm to 3 mm, preferably from 0.75 mm to 2 mm, more preferably from 1 mm to 1 .5 mm.

[0146] Embodiment 7. The heating panel according to any one of the preceding embodiments, wherein a ratio of the surface area of the base element and a volume of the base element is from 650 m2 / m3to 4000 m2 / m3, preferably from 1000 m2 / m3to 3000 m2 / m3.

[0147] Embodiment 8. The heating panel according to any one of the preceding embodiments, wherein the heating resistor has a band-like or meander-like structure.

[0148] Embodiment 9. The heating panel according to any one of the preceding embodiments, wherein the heating resistor has a constant surface area or a varied surface area.

[0149] Embodiment 10. The heating panel according to any one of the preceding embodiments, wherein the heating resistor is formed by a metallic tape, wherein the metallic tape has a thickness from 0.03 mm to 0.3 mm, preferably from 0.05 mm to 0.1 mm.

[0150] Embodiment 11 . The heating panel according to any one of the preceding embodiments, wherein a ratio l / b of a length I of the heating resistor and of a width b of the heating resistor is from 5 to 5000, preferably from 10 to 1000, more preferably from 10 to 500.

[0151] Embodiment 12. The heating panel according to any one of the preceding embodiments, wherein the heating resistor is applied to the base element using a force-fit and / or formfit and / or material connection, wherein the application comprises one or more of embedding, impregnating, printing, and the like. 240545W001

[0152] - 25 -

[0153] Embodiment 13. The heating panel according to any one of the preceding embodiments, wherein the heating resistor is applied to the base element using at least one conductive path using additive manufacturing.

[0154] Embodiment 14. The heating panel according to any one of the preceding embodiments, wherein the heating resistor is configured for performing at least one sensoric function.

[0155] Embodiment 15. The heating panel according to any one of the preceding embodiments, wherein a surface of the first side of the base element is blackened.

[0156] Embodiment 16. The heating panel according to any one of the preceding embodiments, wherein the OCMC has a matrix composition selected from the group consisting of: SixMyOz, SixM1yM2wOz, SixByNzCw, AIN, MxOy and mixtures of oxides (M1xOy / M2wOz).

[0157] Embodiment 17. The heating panel according to any one of the preceding embodiments, wherein the OCMC has oxide ceramic reinforcing fibers comprising at least one material selected from the group consisting of: mullite, AI2O3, a combination of mullite and AI2O3.

[0158] Embodiment 18. The heating panel according to any one of the preceding embodiments, wherein the heating resistor is a metallic and / or ceramic heating resistor, wherein the heating resistor comprises at least one metallic material selected from the group consisting of: an iron-based alloy; a nickel-based alloy, a platinum group metal (PGM); a refractory metal; at least one ferritic iron-chromium-aluminum (FeCrAI) alloy; or one alloy having a material number according to DIN 17007-2:1961-09: n1.m1 m2m3m4, with n1 being a digit selected from the group 1 , 2, 3, and preferably a digit from the group 1 and 2, with ml being a digit selected from the group 0, 1 , 3, 4, 8, preferably a digit selected from the group 3 and 4, and particularly preferably the digit 4, with m2 being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit selected from the group 5, 6, 7, 8, 9 and particularly preferably a digit selected from the group 7, 8, 9, with m3 and m4, preferably each independently, being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys may comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D, wherein PGM comprises the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof, refractory metals comprises the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof, and / or wherein the heating resistor comprises a ceramic material may be selected from the group consisting of carbon (graphite or carbon fibers); car-bides, e.g. silicon carbide (SiC) or zirconium carbide (ZrC); nitrides, e.g. silicon nitride (SisN^; silicides, e.g. molybdenum disilicide (MoSi2); binary oxides, e.g. Yttria Stabilized Zirconia (YSZ), Magnesia Stabilized Zirconia (MSZ), titanium oxides (TiC>2); Zirconium Suboxide, e.g. ZrO, Z^Os, ZrxOy(where x < y), Titanium Suboxide, e.g. TiO, Ti2C>3, TixOy (where x<y), Iron Oxides, e.g. FeO, FesO i; ternary oxides, e.g. Perovskite, ferrites. 240545W001

[0159] - 26 -

[0160] Embodiment 19. The heating panel according to any one of the preceding embodiments, wherein the heating resistor comprises a first contact end and a second contact end configured for being contacted by at least one contact of an electric supply line, wherein the first contact end and / or the second contact end have an extended cross section, wherein a cross section ratio of the first contact end and the contact second end to the heating resistor is from 1 to 100, preferably from 2 to 50, more preferably from 5 to 20.

[0161] Embodiment 20. The heating panel according to any one of the preceding embodiments, wherein the heating panel is one or more of self-supporting, thermally resistant and chemically stable under operating conditions, wherein the operating conditions comprise a temperature range of from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C.

[0162] Embodiment 21 . Use of a heating panel according to any one of the preceding embodiments, for one or more of: a purpose of direct electrical heating, preferably direct electrical heating in a furnace, more preferably direct electrical heating in a reactor furnace such as for a preheater and / or for a catalytic reactor.

[0163] Embodiment 22. A furnace for heating a reaction medium comprising at least one heating panel according to any one of the preceding embodiments relating to a heating panel, wherein the furnace comprises at least one continuous reaction chamber for receiving the reaction medium, wherein the heating panel is arranged within the reaction chamber, wherein the first side of the base element is configured for being in contact with the reaction medium, wherein the furnace comprises at least one power source, which is connected to the heating panel and is designed for applying at least one voltage to the heating resistor thereby generating heat for heating the reaction medium.

[0164] Embodiment 23. The furnace according to the preceding embodiment, wherein the furnace is configured for heating the reaction medium to a temperature range from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C.

[0165] Embodiment 24. The furnace according to any one of the preceding embodiments referring to a furnace, wherein a ratio of a surface area of the base element and a furnace volume is from 10 m2 / m3to 500 m2 / m3, preferably from 20 m2 / m3to 400 m2 / m3, more preferably from 40 m2 / m3to 200 m2 / m3.

[0166] Embodiment 25. The furnace according to any one of the preceding embodiments referring to a furnace, wherein the furnace is configured for at least one process selected from the group consisting of: performing at least one endothermic reaction; cracking; steam cracking; steam reforming; alkane dehydrogenation; heating, preheating; superheating or for intermediate superheating of steam; styrene production by ethylbenzene 240545W001

[0167] - 27 - dehydrogenation; production of acetylene; catalytic cracking; splitting ammonia for hydrogen production; hydrocyanic acid synthesis from hydrocarbons and ammonia; ammonia cracking (NH3 I / 2N2 + 3 / 2H2); methane steam reforming: (CH4 + CO + 3H2); cyanic acid from methane and ammonia (BMA) (CH4 + NH3-> HCN + 3H2); formamide cleavage (HCONH2 HCN + H2O); Alkane dehydrogenation (CnH(2n+2) CnH(2n) + H2, n=2,3,4); styrene synthesis (CsH CsHs + H2); or Cyclohexane dehydrogenation (C6Hi2 C6H6+ 3H2).

[0168] Short description of the Figures

[0169] Further optional features and embodiments will be disclosed in more detail in the subsequent description of embodiments, preferably in conjunction with the dependent claims. Therein, the respective optional features may be realized in an isolated fashion as well as in any arbitrary feasible combination, as the skilled person will realize. The scope of the invention is not restricted by the preferred embodiments. The embodiments are schematically depicted in the Figures. Therein, identical reference numbers in these Figures refer to identical or functionally comparable elements.

[0170] In the Figures:

[0171] Figure 1 shows a side view of a vertical section of an embodiment of an electrically heated furnace with four heating panels according to the present invention;

[0172] Figure 2 shows a top view of a horizontal section of the electrically heated furnace;

[0173] Figures 3A to 3C show embodiments of a heating resistor;

[0174] Figure 4 shows a further embodiment of a furnace with heating panel according to the present invention;

[0175] Figures 5 to 7 show cross-sectional views of the embodiment of Figure 4;

[0176] Figures 8 and 9 show cross-sectional views of an embodiment of a heating panel according to the present invention with a corrugated surface; and

[0177] Figure 10 shows an embodiment of a sagger consisting of combined heating panels.

[0178] Detailed description of the embodiments 240545W001

[0179] - 28 -

[0180] Figure 1 shows a side view of a vertical section of an embodiment of an electrically heated furnace 110. In this embodiment, the furnace 110 may comprise eight heating panels 112 according to the present invention. Figure 2 shows a tope view of a horizontal section of the furnace 110.

[0181] The furnace 110 may be configured for heating the reaction medium to a temperature range from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C. The furnace 110 may configured to carry out at least one process selected from the group consisting of: performing at least one endothermic reaction; formation of unsaturated basic products of the chemical value chain, e.g. ethylene, propylene, butene isomers, butadiene, benzene, by steam cracking of hydrocarbons, e.g. naphtha, ethane, propane (CnH2n+2 XC2H4 + yCsHe + ZC4H8, + VC4H6 + wCeHe + UH2); syngas production e.g. via methane steam reforming (SMR) (CH4 + H2O - CO + 3H2), via methane dry reforming (CH4 + CO2 -> 2CO + 2H2); hydrogen production via ammonia cracking (NH3 I / 2N2 + 3 / 2H2); cyanic acid formation, e.g. from methane and ammonia (BMA) (CH4 + NH3 HCN + 3H2), from propane and ammonia (Fluohmic process) (3NH3+C3H8 -> 3HCN + 7H2), by formamide cleavage (HCONH2 -> HCN + H2O); dehydrogenation of unsaturated hydrocarbons, e.g. alkane dehydrogenation (CnH(2n+2) CnH(2n) + H2, n=2,3,4), styrene synthesis (CsH CsHs + H2), cyclohexane dehydrogenation (CeHi2 CeHe + 3H2); coupling of methane, e.g. ethane formation (2CH4 C2H6 + H2), ethylene formation (2CH4 C2H4 + 2H2), benzene formation (dehydroaromatization) (6CH4 CeHe + 9H2), or a mixture thereof; olefin formation through dehydration of alcohols (CnH(2n+i)OH

[0182] CnH(2n) + H2O, n=2 6); water-free formaldehyde formation by dehydrogenation of methanol (CH3OH CH2O + H2). Combined heating panels may be used as saggars for calcination of powders, e.g. ores, catalyst precursors, precursors of cathode active materials (CAM) for lithium batteries.

[0183] The heating panel 112 has an open geometric shape. Each of the heating panels 112 is a three dimensional structure having two opposing surfaces having a length and a width perpendicular to a surface normal and a thickness which is smaller than the length and the thickness The surface of the heating panel 112 may be planar, open curved, open arched and / or shell-formed. The panel 112 may have at least a smooth or a corrugated 2D surface comprising of polygonally arranged edges spanning a 3D space maximally by half, e.g. between a first end a second end of the panel. Each of the heating panels 112 comprises at least one heating resistor 114 and a base element 116 of Oxide Ceramic Matrix Composite (OCMC). The base element 116 comprises a first side configured for being in contact with the reaction medium. The heating resistor 116 is arranged on a second side of the base element 116 opposing to the first side.

[0184] The heating resistor 114 may be a metallic and / or ceramic heating resistor. 240545W001

[0185] - 29 -

[0186] The heating resistor 114 may comprise at least one metallic material selected from the group consisting of: an iron-based alloy; a nickel-based alloy, a platinum group metal (PGM); a refractory metal; at least one ferritic iron-chromium-aluminum (FeCrAI) alloy; or one alloy having a material number according to DIN 17007-2:1961-09: n1.m1 m2m3m4, with n1 being a digit selected from the group 1 , 2, 3, and preferably a digit from the group 1 and 2, with ml being a digit selected from the group 0, 1 , 3, 4, 8, preferably a digit selected from the group 3 and 4, and particularly preferably the digit 4, with m2 being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit selected from the group 5, 6, 7, 8, 9 and particularly preferably a digit selected from the group 7, 8, 9, with m3 and m4, preferably each independently, being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys may comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D. PGM may comprise the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof. Refractory metals may comprise the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof.

[0187] For example, the heating resistor 114 may comprise at least one electrically conductive material, such as at least one ceramic material. The heating resistor may be a ceramic heating resistor, wherein the ceramic material may be selected from the group consisting of carbon (graphite or carbon fibers); car-bides, e.g. silicon carbide (SiC) or zirconium carbide (ZrC); nitrides, e.g. silicon nitride (SisN^; silicides, e.g. molybdenum disilicide (MoSi2); binary oxides, e.g. Yttria Stabilized Zirconia (YSZ), Magnesia Stabilized Zirconia (MSZ), titanium oxides (TiO2); Zirconium Suboxide, e.g. ZrO, Z^Os, ZrxOy(where x < y), Titanium Suboxide, e.g. TiO, Ti20s, TixOy(where x<y), Iron Oxides, e.g. FeO, FesC ; ternary oxides, e.g. Perovskite, ferrites. Also other materials may be feasible.

[0188] For example, the heating resistor 114 may be made from a mixture of metal and ceramic, e.g. nickel and titanium oxide or zirconium oxide.

[0189] The heating resistor 114 may have a band-like or meander-like structure, e.g. as shown in Figures 3A to 3C. In Figure 3A the heating resistor 114 has rectangular edges, whereas in Figures 3B and 3C the heating resistor 114 has rounded edges.

[0190] The heating resistor 114 may be longer than wide. The heating resistor 114 may have a constant surface area or a varied surface area. The resistance of the heating resistor 114 can be specifically adjusted over a wide range by the cutting pattern of the heating tape. In addition, the surface-specific ohmic resistance can be specifically varied. As a result, the power density can be distributed specifically over the surface of the heating panel 110.

[0191] For example, the heating resistor 114 may be formed by a metallic tape. The heating resistor 114 may be formed by a thin metallic tape having a favorable surface-to-volume ratio. As a result, the heat can be released to the environment with a moderate radiation density and a correspondingly moderate overtemperature of the metallic tape. The metallic tape may have a thickness from 0.03 mm to 0.3 mm, preferably from 0.05 mm to 0.1 mm. A ratio l / b of a length I of the 240545W001

[0192] - 30 - heating resistor and of a width b of the heating resistor may be from 5 to 5000, preferably from 10 to 1000, more preferably from 10 to 500. The heating resistor 114 may have a surface-to-vol- ume ratio configured for releasing heat to the environment with a moderate radiation density and a correspondingly moderate overtemperature of the heating resistor. The length I and the width b of the heating resistor may be defined as fo Jllows s

[0193] 2 - q - p

[0194] The length I may be from 0.1 m to 500 m, preferably from 0.3 to 200 m, more preferably from 0.5 to 100 m, wherein the width is from 2 mm to 500 mm, preferably from 5 mm to 200 mm, more preferably from 10 mm to 100 mm, wherein a ratio l / b is from 5 to 5000, preferably from 10 to 1000, more preferably from 10 to 500. The thickness of the heating resistor s is from 0.03 mm to 0.3 mm, preferably from 0.05 mm to 0.1 mm. For example, the specific ohmic resistivity of the heating resistor p is from 0.05 pQm to 100 pQm, preferably from 0.1 pQm to 100 pQm, particularly from 0,2 pQm to 10 pQm. For example, the surface related heat flux q generated by the heating resistor is from 0.1 kW / m2to 500 kW / m2, preferably from 0.5 kW / m2to 250 kW / m2, more preferably from 1 kW / m2to 150 kW / m2. For example, a voltage U may be from 10 V to 10000 V, preferably from 20 V to 5000 V, more preferably from 50 V to 2000 V. For example, an electrical current I may be from 1 to 10000 A, preferably from 2 to 5000 A, more preferably from 10 to 1000 A.

[0195] The heating resistor 114 may be applied to the base element 116 using a force-fit and / or form-fit and / or material connection. For example, the application may comprise one or more of embedding, impregnating, printing and the like. For example, the heating resistor 114 may be applied to the base element 116 using at least one conductive path using additive manufacturing.

[0196] The composite structure of the base element 116 and the heating resistor 114 can allow for operating the heating resistor at high temperatures (up to 1300°C): A sole metallic tape would lose in this temperature range its strength almost completely. Surprisingly, the composite structure was found to be stable despite the different thermal expansion coefficients of and OCMC. This can allow fabrication of large-scale, thin-walled shells, which generate and radiate heat over a large area.

[0197] The heating resistor 114 may be configured for performing at least one sensoric function. For example, as shown in Figure 3B, the heating resistor 114 may be used as temperature sensor. The heating resistor 114 may be configured as a thermometer. A temperature dependency resistivity of the material of the heating resistor may be used for detecting temperature, e.g. temperature changes. To do this, the heating resistor may be connected to a suitable measuring device, for example to a voltmeter or an ohmmeter, via contacts 138 and 140. Optionally, a resistor separate from the heating resistor can be positioned as sensor 135 on the base element 116. 240545W001

[0198] - 31 -

[0199] As shown in Figures 3A to 3C, the heating resistor 114 may comprise a first contact end 118 and a second contact end 120 configured for being contacted by at least one contact of an electric supply line. The heating resistor 114 may be configured for being powered directly, e.g. by applying at least one electrical voltage to the heating resistor via the first and second contact ends, e.g. by using a power line. The heating resistor 114 may be contacted by the power line in a series connection or on a parallel connection. For example, a power may be from 10 kW to 2000 kW, 20 kW to 1000 kW, 50 kW to 500 kW. For example, an electrical current may be from 1 to 10000 A, preferably from 2 to 5000 A, more preferably from 10 to 1000 A. For example, an electric current density may be from 1 A / mm2to 500 A / mm2, preferably from 5 A / mm2to 100 A / mm2. For example, a voltage gradient may be from 1 V / m to 100 V / m, preferably from 5 V / m to 50 V / m. For example, a voltage may be from 10 V to 10000 V, preferably from 20 V to 5000 V, more preferably from 50 V to 2000 V. Figure 3A shows the heating resistor 114 only and Figures 3B and 3C shows the heating resistor 114 applied on the base element 116. The first contact end 118 and / or the second contact 120 end may be on the identical side of the heating element 112, e.g. as shown in Figures 3B and 3C, or at opposing sides. The first contact end 118 and / or the second contact end 120 have an extended cross section. For example, a cross-section ratio of the first contact end 118 and the contact second end 120 to the heating resistor 114 is from 1 to 100, preferably from 2 to 50, more preferably from 5 to 20. The extended cross section can allow forming cold lead ends for contacting of the heating panel to the power line. The cold lead ends can be integrated into the heating resistor by cutting the heating tape appropriately.

[0200] As shown in Figures 1 and 2, the base element 116 may have a geometry selected from the group consisting of: a planar geometry, an arched geometry, a regular or irregular geometry. The base element 116 may not form a tube or a pipe. In the embodiment of Figure 1 , the base element 116 have an arched shape.

[0201] The base element 116 may have a thickness of 0.5 mm to 3 mm, preferably from 0.75 mm to 2 mm, more preferably from 1 mm to 1 .5 mm. The specific surface area of the base element 116 aEEmay be from 650 m2 / m3to 4000 m2 / m3, preferably from 1000 m2 / m3to 3000 m2 / m3.

[0202] As outlined above, the base element 116 comprises a first side configured for being in contact with the reaction medium. The first side may constitute a surface configured for being in contact with the reaction medium. The surface of the first side of the base element 116 may be configured for being thermally resistant and chemically stable under operating conditions, in particular the operating conditions comprise a temperature range of from 200 °C to 1300 °C, preferably from 300 °C to 1200 °C, more preferably from 400 °C to 1000 °C. The reaction medium may flow along the surface of the first side of the base element 116.

[0203] The present invention proposes a composite panel in which the heating resistor 114 is embedded in a, in particular mechanical stable and dimensionally stable, base element 116 and / or be- 240545W001

[0204] - 32 - tween the base element 116 and a cover element 122 of OCMC. The tape-shaped heating resistor 114 may be embedded on the OCMC base element 116 or between the base element 116 and a cover element 122 of OCMC. This can allow positioning of the heating panel 112 within the process such that a direct contact between OCMC and the reaction medium is achieved. Thus, a directly electrical heating of the reaction medium can be realized.

[0205] A surface of the first side of the base element 116 may be coated and / or impregnated with at least one catalytic material. The catalytic material may be at least one material selected from the group consisting of: at least one platinum group metal catalyst (PGM), such as Pt, Rh, Ru, or at least one mixture or at least one alloys of these; at least one transition metal such as Ni, Fe, Co, Cr; at least one oxide catalyst such as Perovskite or spinel.

[0206] The surface of the first side of the base element 116 may be blackened. This can allow increasing the efficiency of the thermal radiation. For example, the surface of first side of the base element 116 may be coated with at least one material selected from the group consisting of: SiC; carbon; carbon-Nanotubes; at least one oxide. Preferably the surface of first side of the base element 116 may be coated with at least one oxide. For example, the surface of first side of the base element may be coated with at least one material selected from the group consisting of: SiC; carbon; carbon-Nanotubes; at least one oxide. Preferably the surface of first side of the base element may be coated with at least one oxide, more preferably with at least one material selected from the group consisting of: zirconium oxide, titanium oxide, iron oxide, manganese oxide, nickel oxide, cobalt oxide.

[0207] A surface, in particular of the first side, of the base element 116 may be planar, e.g. as shown in the embodiment of Figures 4 to 7. Figure 4 shows a furnace 110 with a plurality of heating panels with their surfaces arranged parallel to each other. A power supply may be embodied using a conductor rail 131 and power source 134. Figure 4 shows a three dimensional view and indicates cutting planes A-A, B-B and C-C which are shown in Figures 5, 6 and 7 respectively. Cutting plane A-A relates to horizontal cutting along conductor rails 131 . Cutting plane B-B vertical cutting along a heating panel. Cutting plane C-C relates to vertical cutting from top to bottom perpendicular to the surface of the heating elements.

[0208] A surface of the first side of the base element 116 may be corrugated. This can allow increasing an effective surface. An embodiment of a base element 116 with a corrugated surface is shown in Figures 8 and 9. Figure 8 shows an embodiment with a heating resistor 114 extending along the base element 116 in a first direction. The heating resistor 114 may be positioned on the maxima of the corrugated surface. Figure 9 shows an embodiment with a heating resistor 114 extending along the base element 116 in a second direction. The heating resistor 114 may be positioned following the waves of the corrugated surface. The cutting planes are identical to the cutting lines indicated in Figure 4. Figure 8 upper part shows the base element 116 along C-C and lower part along B-B. Figure 9A shows the base element 116 upper part along C-C and lower part along B-B. For example, the corrugated surface may comprise a sinusoidal wave. For example, an amplitude of the wave is from 0 mm to 100 mm, preferably from 0 mm to 50 mm, 240545W001

[0209] - 33 - more preferably from 0 mm to 20 mm, wherein the wavelength is from 5 mm to 1000 mm, preferably from 5 mm to 500 mm, more preferably from 5 mm to 100 mm. For example, an orientation of the wave with respect to the longitudinal edge is from 0° to 90°, preferably 0° to 60°, more preferably 0° to 45°.

[0210] The base element 116 may be configured for supporting the heating resistor 114 on a first side.

[0211] The heating panel 112 may comprise the cover element 122 of Oxide Ceramic Matrix Composite. With respect to options and embodiments for the cover element 112 reference is made to the options and embodiments of the base element 116.

[0212] The heating resistor 114 may be connected to the cover element 122 by using a force-fit and / or form-fit and / or material connection. The heating resistor 114 may be embedded in between the base element 116 and the cover element 122. The cover element 122, e.g. a first side of the cover element 122, may be arranged on a second side of the base element 116 opposing the first side of the base element 116. In particular, a surface of the second side of the base element 116 and a surface of the first side of the cover element 122 may be in direct contact with each other. In particular, the heating resistor 114 may be sandwiched in between the base element 116 and the cover element 122. The heating resistor 114 may be supported, in particular via a force-fit and / or form-fit connection, by the base element 116 and the cover element 122. This can allow ensuring stiffness of the heating panel 112.

[0213] The cover element 122 and the base element 116 may be made from the same material. However, other embodiments are possible.

[0214] The cover element 122 and the base element 116 may have the same or different dimensions. However other embodiments are possible. Even embodiments are thinkable in which the cover element 122 and the base element 116 may be arranged offset to each other, i.e. protruding over an edge of the other element. The heating resistor 114 may extend along the full length of the base element 116 and / or the cover element 122 or may extend only partially along the length of the base element 116 and / or the cover element 122. In the embodiment of Figure 1 , the cover element 122 may extend over the base element 116 and may provide a contact area 124 for contacting the heating panel 112.

[0215] A second side of the cover element 122, e.g. opposing the first side of the cover element 122, may be configured for being in direct contact with the reaction medium.

[0216] For example, as shown in Figures 1 and 2, the heating panel 112 may be positioned within the reaction furnace 110. The furnace 110 may comprise connection blocks 126 for power supply to the heating resistor 114. The furnace 110 may comprise at least one displacer 130. The catalytic active reaction area is denoted with reference number 128. 240545W001

[0217] - 34 -

[0218] Figure 10 shows an embodiment of a combined heating panel 112 consisting of five heating panels 112. Combined heating panels may be used as saggars for calcination of powders, e.g. ores, catalyst precursors, precursors of cathode active materials (CAM) for lithium batteries.

[0219] 240545W001

[0220] - 35 -

[0221] List of reference numbers

[0222] 110 furnace

[0223] 112 heating panel

[0224] 114 heating resistor

[0225] 116 base element

[0226] 118 first contact end

[0227] 120 second contact end

[0228] 122 cover element

[0229] 124 contact area

[0230] 126 connection blocks

[0231] 128 catalytic active reaction area

[0232] 130 displacer

[0233] 131 conductor rail

[0234] 134 power source

[0235] 135 temperature sensor

[0236] 138 first contact end to measuring device

[0237] 140 second contact to measuring device

Claims

240545W001- 36 -Claims1 . A heating panel (112) configured for heating a reaction medium, wherein the heating panel (112) has an open geometric shape, wherein the open geometric shape is a three dimensional body having in a surface spanning length and width a planar geometry or at least one curvature forming at least one open curve which bends in a certain direction without forming a closed shape, the heating panel (112) comprising at least one heating resistor (114) and a base element (116) of Oxide Ceramic Matrix Composite (OCMC), wherein the base element (116) comprises a first side configured for being in contact with the reaction medium, wherein the heating resistor (114) is arranged on a second side of the base element (116) opposing to the first side.

2. The heating panel (112) according to the preceding claim, wherein the heating panel (112) comprises a cover element (122) of Oxide Ceramic Matrix Composite, wherein the heating resistor (114) is embedded in between the base element (116) and the cover element (122).

3. The heating panel (112) according to any one of the preceding claims, wherein a surface of the first side is coated and / or impregnated with at least one catalytic material, wherein the catalytic material is at least one material selected from the group consisting of: at least one platinum group metal catalyst (PGM), such as Pt, Rh, Ru, or at least one mixture or at least one alloys of these; at least one transition metal selected from the group consisting of: Ni, Fe, Co, Cr; at least one oxide catalyst such as Perovskite or spinel.

4. The heating panel (112) according to any one of the preceding claims, wherein the base element (116) and / or the cover element (122) have a geometry selected from the group consisting of: a planar geometry, an arched geometry, a regular or irregular geometry.

5. The heating panel (112) according to any one of the preceding claims, wherein the heating resistor (114) has a band-like or meander-like structure.

6. The heating panel (112) according to any one of the preceding claims, wherein the heating resistor (114) is configured for performing at least one sensoric function.

7. The heating panel (112) according to any one of the preceding claims, wherein the OCMC has a matrix composition selected from the group consisting of: SixMyOz, SixM1yM2wOz, SixByNzCw, AIN, MxOy and mixtures of oxides (M1xOy / M2wOz), wherein M is an element selected from the group consisting of: aluminum (Al), zirconium (Zr), silicon (Si), calcium (Ca), magnesium (Mg), beryllium (Be), yttrium (Y), lanthanum (La), iron (Fe), nickel (Ni), chromium (Cr), tungsten (W), hafnium (Hf), strontium (Sr), wherein M1240545W001- 37 - is an element selected from the group consisting of: aluminum (Al), zirconium (Zr), yttrium (Y), wherein M2 is an element selected from the group consisting of: zirconium (Zr), silicon (Si), x, y and w are each independently between 1 and 10.

8. The heating panel (112) according to any one of the preceding claims, wherein the OCMC has oxide ceramic reinforcing fibers comprising at least one material selected from the group consisting of: mullite, AI2O3, a combination of mullite and AI2O3.

9. The heating panel (112) according to any one of the preceding claims, wherein the heating resistor (114) is a metallic and / or ceramic heating resistor, wherein the heating resistor (114) comprises at least one metallic material selected from the group consisting of: an iron-based alloy; a nickel-based alloy, a platinum group metal (PGM); a refractory metal; at least one ferritic iron-chromium-aluminum (FeCrAI) alloy; or one alloy having a material number according to DIN 17007-2:1961-09: n1.m1 m2m3m4, with n1 being a digit selected from the group 1 , 2, 3, and preferably a digit from the group 1 and 2, with ml being a digit selected from the group 0, 1 , 3, 4, 8, preferably a digit selected from the group 3 and 4, and particularly preferably the digit 4, with m2 being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9, preferably a digit selected from the group 5, 6, 7, 8, 9 and particularly preferably a digit selected from the group 7, 8, 9, with m3 and m4, preferably each independently, being a digit selected from the group 0, 1 , 2, 3, 4, 5, 6, 7, 8, 9. FeCrAI alloys may comprise for example products distributed under the trade name Kanthal® AF, Kanthal® A-1 , Kanthal® D, wherein PGM comprises the elements platinum, palladium, iridium, rhodium, osmium, ruthenium and alloys thereof, refractory metals comprises the elements titanium, zirconium, hafnium, niobium, molybdenum, tantalum, tungsten, rhenium and alloys thereof, and / or wherein the heating resistor (114) comprises a ceramic material may be selected from the group consisting of carbon (graphite or carbon fibers); carbides, e.g. silicon carbide (SiC) or zirconium carbide (ZrC); nitrides, e.g. silicon nitride (SisN^; silicides, e.g. molybdenum disilicide (MoSi2); binary oxides, e.g. Yttria Stabilized Zirconia (YSZ), Magnesia Stabilized Zirconia (MSZ), titanium oxides (TiO2); Zirconium Suboxide, e.g. ZrO, Z^Os, ZrxOy(where x < y), Titanium Suboxide, e.g. TiO, Ti20s, TixOy(where x<y), Iron Oxides, e.g. FeO, FesC ; ternary oxides, e.g. Perovskite, ferrites.

10. The heating panel (112) according to any one of the preceding claims, wherein the heating resistor (114) comprises a first contact end (118) and a second contact end (120) configured for being contacted by at least one contact of an electric supply line, wherein the first contact end (118) and / or the second contact end (120) have an extended cross section, wherein a cross section ratio of the first contact end (118) and the contact second end (120) to the heating resistor (114) is from 1 to 100, preferably from 2 to 50, more preferably from 5 to 20.240545W001- 38 -11 . The heating panel (112) according to any one of the preceding claims, wherein the heating panel (112) is one or more of self-supporting, thermally resistant and chemically stable under operating conditions, wherein the operating conditions comprise a temperature range of from 20 °C to 1300 °C, preferably from 200 °C to 1200 °C, more preferably from 300 °C to 1100 °C.

12. Use of a heating panel (112) according to any one of the preceding claims, for one or more of: a purpose of direct electrical heating, preferably direct electrical heating in a furnace, more preferably direct electrical heating in a reactor furnace such as for a preheater and / or for a catalytic reactor.

13. A furnace (110) for heating a reaction medium comprising at least one heating panel (112) according to any one of the preceding claims relating to a heating panel, wherein the furnace (110) comprises at least one continuous reaction chamber for receiving the reaction medium, wherein the heating panel (112) is arranged within the reaction chamber, wherein the first side of the base element (116) is configured for being in contact with the reaction medium, wherein the furnace (110) comprises at least one power source, which is connected to the heating panel (112) and is designed for applying at least one voltage to the heating resistor (114) thereby generating heat for heating the reaction medium.

14. The furnace (110) according to the preceding claim, wherein the furnace (110) is configured for at least one process selected from the group consisting of: performing at least one endothermic reaction; cracking; steam cracking; steam reforming; alkane dehydrogenation; heating; preheating; superheating or for intermediate superheating of steam; styrene production by ethylbenzene dehydrogenation; production of acetylene; catalytic cracking; splitting ammonia for hydrogen production; hydrocyanic acid synthesis from hydrocarbons and ammonia; ammonia cracking (NH3I / 2N2 + 3 / 2H2); methane steam reforming: (CH4 +CO + 3H2); cyanic acid from methane and ammonia (BMA) (CH4 + NH3 HCN + 3H2); formamide cleavage (HCONH2HCN + H2O); Alkane dehydrogenation (CnH(2n+2) CnH(2n) + H2, n=2,3,4); styrene synthesis (CsHCsHs + H2); or Cyclohexane dehydrogenation (CeHi2 Ceb + 3H2).

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