Surface treatment agent composition evaporation source

Abstract

This surface treatment agent composition evaporation source comprises a porous body which has therein a plurality of holes or voids and in which a surface treatment agent composition is present in the holes or voids, wherein: the surface treatment agent composition is composed of a material containing a non-fluorine-based organosilane compound (α), which may contain at least one selected from among an oxygen atom, a sulfur atom, a nitrogen atom, and a silicon atom and has at least one C3-C60 linear, branched, or cyclic monovalent hydrocarbon group and a reactive silyl group, and / or a partial reaction condensate thereof, and not containing a fluorine atom; the porosity of the porous body is 0.100-0.995; and a cured film having further improved water repellency, abrasion resistance, and chemical resistance can be formed by using said surface treatment agent composition evaporation source.

Description

Evaporation source for surface treatment agent composition

[0001] The present invention relates to an evaporation source for surface treatment agent compositions, and more particularly to an evaporation source for surface treatment agent compositions used in forming a cured film with excellent water repellency, abrasion resistance, and chemical resistance.

[0002] Touch panel displays in smartphones and in-car displays, as well as lenses in eyeglasses, are frequently in direct contact with fingers and cheeks, making them prone to accumulating dirt and grime. Therefore, there is a growing demand for technologies that make the display surface less susceptible to fingerprints and easier to clean, improving both appearance and visibility. The development of materials that can meet these demands is highly desirable. A common solution involves applying an anti-fouling layer.

[0003] Generally, surface treatment compositions containing fluoropolyether group compounds have very low surface free energy, which allows them to impart properties such as water and oil repellency, chemical resistance, lubricity, mold release, and antifouling to articles. These properties have led to their widespread industrial use as water, oil, and antifouling agents for paper and textiles, lubricants for magnetic recording media, oil inhibitors and mold release agents for precision equipment, cosmetics, and protective films. However, this property also means they are non-stick and non-adherent to other substrates; while they can be applied to substrate surfaces, achieving a strong adhesion of the film is difficult.

[0004] Silane coupling agents are well-known for bonding organic compounds to substrate surfaces such as glass and cloth, and are widely used as coating agents for various substrate surfaces. A silane coupling agent has an organic functional group and a reactive silyl group (generally a hydrolyzable silyl group such as an alkoxysilyl group) in one molecule. The hydrolyzable silyl group undergoes a self-condensation reaction with moisture in the air to form a film. This film becomes a strong and durable coating because the hydrolyzable silyl group chemically and physically bonds with the surface of glass, metal, etc.

[0005] Therefore, a surface treatment agent composition has been disclosed that uses a fluoropolyether group-containing polymer obtained by introducing a hydrolyzable silyl group into a fluoropolyether group-containing compound, which can easily adhere to the substrate surface and form a film on the substrate surface having water-repellent and oil-repellent properties, chemical resistance, lubricity, mold release properties, antifouling properties, etc. (Patent Documents 1 to 6: JP 2008-534696, JP 2008-537557, JP 2012-072272, JP 2012-157856, JP 2013-136833, JP 2015-199906).

[0006] On the other hand, fluorine-containing compounds, such as perfluorooctanoic acid (PFOA), tend to be highly resilient and bioaccumulative in nature. In recent years, a wide range of fluorine-containing compounds have been categorized as per / polyfluoroalkyl compounds (PFAS), and it is expected that the use, sale, and discharge of fluorine-containing compounds will be restricted under PFAS regulations. Conventional fluoropolyether group-containing compounds and fluoropolyether group-containing polymers also fall under the category of per / polyfluoroalkyl compounds (PFAS). Therefore, there is a growing need for the development of non-fluorine surface treatment agent compositions made from materials that do not contain fluorine atoms.

[0007] Furthermore, the above-mentioned surface treatment compositions can form a cured film on the surface of an article by wet coating methods (spray coating, dip coating, spin coating, wipe coating, squeegee coating, die coating, inkjet coating, flow coating, roll coating, cast coating, Langmuir / Bludget coating, gravure coating, etc.), but more generally, a cured film is formed by dry coating methods, particularly vacuum deposition.

[0008] Vacuum deposition is a conventional method of forming a hardened film on an article surface by heating and evaporating a surface treatment agent composition. Vacuum deposition offers advantages such as easy control of the film thickness of the hardened film and excellent productivity because, after forming an inorganic anti-reflective film, a hardened film can be formed continuously while maintaining a vacuum in the deposition chamber.

[0009] However, when a surface treatment agent containing a nonfluorine-based compound containing a hydrolyzable silyl group is vacuum-deposited using a conventional vacuum deposition method, the film deposition rate may be unstable, and the resulting cured film may not have sufficient abrasion resistance.

[0010] Japanese Patent Publication No. 2008-534696, Japanese Patent Publication No. 2008-537557, Japanese Unexamined Patent Publication No. 2012-072272, Japanese Unexamined Patent Publication No. 2012-157856, Japanese Unexamined Patent Publication No. 2013-136833, Japanese Unexamined Patent Publication No. 2015-199906

[0011] The present invention has been made in view of the above circumstances, and aims to provide a surface treatment agent composition evaporation source that can form a cured film with improved water repellency, abrasion resistance, and chemical resistance.

[0012] The inventors of the present invention have diligently investigated the above problems and have found that when a surface treatment agent containing a surface treatment agent composition containing a nonfluorine-based compound containing a hydrolyzable silyl group is vacuum-deposited using a conventional vacuum deposition method, the film deposition rate is unstable because bumping due to excessive heating occurs frequently. Furthermore, they have found that this is because conventional fluoropolyether-containing compounds are polymer compounds with a broad molecular weight distribution, resulting in a wide boiling point range and making bumping less likely in principle, whereas nonfluorine-based compounds are low molecular weight compounds with a narrow molecular weight distribution, resulting in a narrow boiling point range and making bumping more likely in principle. Therefore, the present inventors conducted further studies and found that a surface treatment agent composition evaporation source comprising a porous body having a plurality of voids or cavities inside, in which the surface treatment agent composition exists, wherein the surface treatment agent composition comprises a nonfluorine-based organosilane compound (α) and / or a partially reacted condensate thereof having at least one linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms and a reactive silyl group, and may contain at least one selected from oxygen atoms, sulfur atoms, nitrogen atoms, and silicon atoms, and is made of a material that does not contain fluorine atoms, and the porosity of the porous body is 0.100 to 0.995, when vacuum deposition is performed using such a surface treatment agent composition evaporation source, bumping of the surface treatment agent composition containing the nonfluorine-based compound is suppressed, the film formation rate is stabilized, and consequently, a cured film with improved water repellency, abrasion resistance, and chemical resistance can be formed, thus solving the problems of the above-mentioned prior art, and thus the present invention was made.

[0013] Accordingly, the present invention provides the following surface treatment agent composition evaporation sources: [1] A surface treatment agent composition evaporation source comprising a porous body having a plurality of pores or gaps inside, wherein the surface treatment agent composition is present in the pores or gaps, wherein the surface treatment agent composition comprises a nonfluorine-based organosilane compound (α) and / or a partially reacted condensate thereof having at least one linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms and a reactive silyl group, and is made of a material that does not contain a fluorine atom, and the porosity of the porous body is 0.100 or more and 0.995 or less. [2] The surface treatment agent composition evaporation source according to [1], wherein the porosity of the porous body is 0.20 or more and 0.99 or less. [3] The surface treatment agent composition evaporation source according to [1] or [2], wherein the melting point of the porous body at 1,013 hPa is 800°C or higher. [4] The surface treatment agent composition evaporation source according to any one of [1] to [3], wherein the material of the porous body is a ceramic material, a heat-resistant glass material, a carbon material, an organic material, or a metallic material. [5] The surface treatment agent composition evaporation source according to any one of [1] to [4], further comprising a storage container having an opening and housing the porous body, made of a ceramic material, a heat-resistant glass material, a carbon material, an organic material, or a metallic material having a melting point of 800°C or higher at 1,013 hPa. [6] The surface treatment agent composition evaporation source according to any one of [1] to [5], wherein the organosilane compound (α) has a monovalent hydrocarbon group in a linear or branched chain. [7] The surface treatment agent composition evaporation source according to any one of [1] to [6], wherein the organosilane compound (α) has two or more monovalent hydrocarbon groups. [8] The surface treatment agent composition evaporation source according to [7], wherein the two or more monovalent hydrocarbon groups in the organosilane compound (α) are bonded to the same atom. [9] The surface treatment agent composition evaporation source according to [8], wherein the organosilane compound (α) has two or more monovalent hydrocarbon groups to which the same atom is bonded is a carbon atom, a nitrogen atom, or a silicon atom.

[10] The surface treatment agent composition evaporation source according to any one of [7] to [9], wherein the organosilane compound (α) has two or more identical monovalent hydrocarbon groups.

[11] The surface treatment agent composition evaporation source according to any one of [1] to

[10] , wherein the organosilane compound (α) has 8 to 40 carbon atoms in the monovalent hydrocarbon group.

[12] The organosilane compound (α) is of the following general formula (1). (In the formula, R 1 R may independently contain at least one selected from oxygen, sulfur, nitrogen, and silicon atoms, and may be linear, branched, cyclic, or a combination thereof, and is a monovalent hydrocarbon group having 3 to 32 carbon atoms, 2 A is a hydrogen atom, halogen atom, hydroxyl group, siloxy group, amino group, thiol group, or a monovalent hydrocarbon group having 1 or 2 carbon atoms; U is a carbon atom, silicon atom, nitrogen atom, or a trivalent or tetravalent organic group; V is independently a single bond or a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, and sulfur atoms; Z is independently a single bond, carbon atom, silicon atom, nitrogen atom, sulfur atom, or a 3- to 8valent organic group; Y is independently a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, sulfur, and silicon atoms; A is independently a monovalent reactive silyl group; k1 is 2 or 3; k2 is 0 or 1; k3 is 1 or 2; k1 + k2 + k3 is 3 or 4; and m is an integer from 1 to 7.) The surface treatment agent composition evaporation source according to any one of [1] to

[11] .

[13] In the above formula (1), R 1 However, the following formula (In the formula, R AQ is a monovalent hydrocarbon group having 3 to 32 carbon atoms, which may be linear, branched, cyclic, or a combination thereof, and Q is independently an oxygen atom, a sulfur atom, a divalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a diorganosilylene group, a sylalkylene structure or sylarylene structure, and a linear or branched or cyclic divalent organopolysiloxane residue having 2 to 10 silicon atoms, or having 3 to 10 silicon atoms, a carbonyl (ketone) group, an ester group, a carbonate group, a sulfinyl group, a sulfonyl group, a thioester group, a thiocarbonate group, a thiocarbamate group, an amino group, an amide group, or a carbamate group. Q' is a divalent group selected from the group consisting of a urea group and a divalent nitrogen-containing heterocyclic group, Q' is independently a trivalent group selected from the group consisting of a nitrogen atom, a trivalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic trivalent organopolysiloxane residue having 2 to 10 silicon atoms, a trivalent amide group, and a trivalent nitrogen-containing heterocyclic group, Q'' is independently a tetravalent group selected from the group consisting of a silicon atom, a tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, and R B R is a divalent hydrocarbon group having 1 to 29 carbon atoms, which may be independently single-bonded, linear, branched, or cyclic, and C R is independent A The surface treatment agent composition evaporation source described in

[12] is any group represented by (1) or a hydrogen atom, where p is an integer from 0 to 10. However, the total number of carbon atoms in each structure is 32 or less. (14) In the above formula (1), A is the following general formula (2) or (3) (In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group, X is independently a hydroxyl group or a hydrolyzable group, and n is an integer from 1 to 3.) (In the formula, n″ is a number from 0 to 3, and n′ is (3 - n″) / 2.) The evaporation source of the surface treatment agent composition described in

[12] or

[13] .

[15] In the above formula (2), X is a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, an alkoxyalkoxy group having 2 to 10 carbon atoms, an acyloxy group having 1 to 10 carbon atoms, an alkenyloxy group having 2 to 10 carbon atoms, a halogen group, and a dialkylamino group having 2 to 10 carbon atoms. The evaporation source of the surface treatment agent composition described in

[14] .

[16] In the above formula (1), Y is an alkylene group having 1 to 20 carbon atoms which may contain at least one selected from an oxygen atom, a nitrogen atom and a sulfur atom, an alkylene group having 1 to 10 carbon atoms containing an arylene group having 6 to 8 carbon atoms, an alkylene group having 1 to 8 carbon atoms bonded to each other through a diorganosilylene group, a silaalkylene structure, a silaarylene structure or a nitrogen-containing heterocyclic group, and a bond of a linear organopolysiloxane residue having 2 to 10 silicon atoms or a branched or cyclic organopolysiloxane residue having 3 to 10 silicon atoms. The evaporation source of the surface treatment agent composition described in any one of

[12] to

[15] .

[17] In the above formula (1), Z is a single bond, or a carbon atom, a silicon atom, a nitrogen atom, a trivalent or tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, -SiR 3 =(R 3 is a hydroxyl group, an alkyl group having 1 to 3 carbon atoms, or an alkoxy group having 1 to 3 carbon atoms), a trivalent group represented by -CR 4 =(R 4The evaporation source for the surface treatment agent composition according to any one of

[12] to

[16] , wherein the group is a trivalent group represented by a hydrogen atom, a hydroxyl group, or an alkyl group having 1 to 3 carbon atoms; a linear or branched or cyclic trivalent to octavalent organopolysiloxane residue having 2 to 10 silicon atoms or 3 to 10 silicon atoms; a trivalent amide group; a trivalent carbamate group; a trivalent or tetravalent urea group; and a trivalent to octavalent nitrogen-containing heterocyclic group.

[18] A surface treatment agent composition evaporation source according to any one of

[12] to

[17] , wherein in formula (1) above, U is a trivalent or tetravalent group selected from the group consisting of a carbon atom, a silicon atom, a nitrogen atom, a trivalent or tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic trivalent or tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, a trivalent amide group, a trivalent carbamate group, a trivalent or tetravalent urea group, and a trivalent or tetravalent nitrogen-containing heterocyclic group.

[19] A surface treatment agent composition evaporation source according to any one of [1] to

[18] , wherein the surface treatment agent composition contains a solvent.

[20] The surface treatment agent composition further comprises the following general formula (5) SiR 5 n1-4 X 1 n1 (5) (wherein, R 5 X is independently a hydrogen atom or a monovalent hydrocarbon group having 1 or 2 carbon atoms, 1The surface treatment agent composition evaporation source according to any one of [1] to

[19] , wherein is independently a hydroxyl group or a hydrolyzable group, and n1 is an integer from 1 to 4.

[21] The evaporation source for the surface treatment agent composition according to

[20] , wherein the silane compound represented by the above general formula (5) is selected from the following compounds: Si(OCH3)4, Si(OC2H5)4, Si(OC3H7)4, Si(OC4H9)4, CH2=CHSi(OCH3)3, CH2=CHSi(OC2H5)3, CH2=CHSi(OC3H7)3, CH2=CHSi(OC4H9)3, CH2=CHSi(OCOCH3)3, CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, CH3Si(OC4H9)3, CH3Si(OCOCH3)3.

[22] The surface treatment composition evaporation source according to any one of [1] to

[21] , wherein the surface treatment composition further contains at least one non-fluorine material selected from the group consisting of paraffin oil, polyol ester oil, silicone oil, catalyst, transition metal, halide ion, silane coupling agent, and compounds containing atoms having lone pairs of electrons in their molecular structure.

[23] The surface treatment composition evaporation source according to any one of [1] to

[22] , used for forming a hardened film on the surface of an optical component.

[24] The surface treatment composition evaporation source according to any one of [1] to

[22] , used for forming a hardened film on the surface of a display.

[25] The surface treatment composition evaporation source according to any one of [1] to

[22] , used for forming a hardened film on the surface of a lens.

[0014] By performing a vacuum deposition treatment using the surface treatment agent composition evaporation source of the present invention, a cured film with excellent water repellency, abrasion resistance, and chemical resistance can be applied to the substrate.

[0015] This figure shows an example configuration of the surface treatment agent composition evaporation source according to this embodiment. This figure shows an example configuration when the surface treatment agent composition evaporation source has a storage container.

[0016] The present invention relates to a surface treatment agent composition evaporation source comprising a porous body having a plurality of voids or cavities inside, wherein the surface treatment agent composition exists within the voids or cavities, wherein the surface treatment agent composition comprises a nonfluorine-based organosilane compound (α) and / or a partially reacted condensate thereof having at least one linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms and a reactive silyl group, and may contain at least one selected from oxygen atoms, sulfur atoms, nitrogen atoms, and silicon atoms, and is made of a material that does not contain fluorine atoms, and the porosity of the porous body is 0.100 or more and 0.995 or less.

[0017] Furthermore, the presence of the surface treatment agent composition within multiple voids or gaps in a porous body means that, if the porous body has voids, the surface treatment agent composition is impregnated and filled into the voids by dropping it into the voids, and if the porous body has gaps, the surface treatment agent composition is injected into the gaps by dropping it into the porous body, thereby filling them.

[0018] An embodiment of the surface treatment agent composition evaporation source of the present invention will be described with reference to the drawings. Figures 1 and 2 show examples of the configuration of the surface treatment agent composition evaporation source of the present invention. As shown in Figure 1, the surface treatment agent composition evaporation source 10 of this embodiment is configured such that the surface treatment agent composition 2 exists within the pores or voids of a porous body 1 having a plurality of pores or voids inside. Alternatively, as shown in Figure 2, the surface treatment agent composition evaporation source of the present invention may be configured such that the porous body 1 is housed in a storage container 3, and the surface treatment agent composition 2 exists within the pores or voids of the porous body 1.

[0019] [Porous material] The porous material used as the evaporation source for the surface treatment agent composition of the present invention has a plurality of voids or cavities inside, and the porosity of the porous material is 0.100 or more and 0.995 or less.

[0020] The porosity of the porous material is preferably 0.100 to 0.995, more preferably 0.20 to 0.99, more preferably 0.20 to 0.97, and particularly preferably 0.25 to 0.95. If the porosity is above the lower limit, a sufficient amount of the surface treatment agent composition can be filled, and sufficient heat is transferred to the surface treatment agent composition, resulting in a stable film deposition rate. On the other hand, if the porosity value exceeds the upper limit, deposition defects such as bumping occur, and the film deposition rate is unstable.

[0021] The porosity of a porous material can be calculated using the following formula: (Porosity) = 1 - ((Bulk density of the porous material (g / cm³)) 3 ))÷(True density of the material constituting the porous body (g / cm³) 3 Furthermore, bulk density can be calculated using the following formula: (Bulk density (g / cm³) 3 )) = (mass of porous material (g)) ÷ (total volume of porous material (cm³)) 3 ))

[0022] To ensure stable vacuum deposition, the porous material preferably has a melting point of 800°C or higher, more preferably 900°C or higher, and even more preferably 1,000°C or higher at 1,013 hPa. Since the evaporation source of the surface treatment agent composition is heated to approximately 700°C by resistance heating or electron beam heating, if the melting point of the porous material is above the above range, volatilization or melting of the porous material becomes less likely due to heating.

[0023] The materials constituting the porous body are preferably ceramic materials, heat-resistant glass materials, carbon materials, organic materials, or metallic materials, and more preferably ceramic materials or metallic materials.

[0024] Specific examples of ceramic materials include aluminum oxide, zirconium oxide, silicon oxide, titanium oxide, yttrium oxide, magnesium oxide, aluminum nitride, zirconium nitride, silicon nitride, titanium nitride, boron nitride, silicon carbide, titanium carbide, boron carbide, and composite ceramics and glass ceramics thereof. Specific examples of heat-resistant glass materials include borosilicate glass and quartz glass. Specific examples of carbon materials include carbon, graphite, and synthetic diamond. Specific examples of organic materials include aramid, polyimide, PBI (polybenzimidazole), PBO (polyp-phenylene-benzobis-oxazole), polyarylate, and polytetrafluoroethylene. Specific examples of metallic materials include silver, gold, cobalt, chromium, copper, iron, iridium, molybdenum, nickel, palladium, platinum, silicon, titanium, vanadium, tungsten, zirconium, their alloys, and various types of stainless steel (SUS).

[0025] Furthermore, in order for the porous body to have a form in which multiple voids or cavities are present internally, from the viewpoint of productivity, it is preferable that the material constituting the porous body itself has a fibrous, fibrous (sintered), or sponge-like form. A fibrous form is one in which multiple voids are present internally, a fibrous (sintered) form is one in which multiple voids are present internally and also has some voids, and a sponge-like form is one in which multiple voids are present internally. Here, voids refer to the gaps between fibers, and voids refer to holes opening on the surface of the porous body that face inward. Multiple voids are connected to each other internally within the porous body, while multiple voids may or may not be connected to each other internally within the porous body.

[0026] Specific examples of materials having a fibrous form include metal fibers such as steel fibers, stainless steel fibers, copper fibers, and nickel fibers; organic fibers such as aramid fibers; and inorganic fibers such as carbon fibers, glass fibers, and ceramic fibers. Among these, metal fibers are more preferred, and copper fibers, steel fibers (steel wool), stainless steel fibers, and nickel fibers are the most preferred. Materials having a fibrous (sintered) form are materials having a fibrous form in which at least a portion of the fibers are fused together by heating or other means (sintered body). Specific examples of such materials include sintered bodies of metal fibers such as steel fibers, stainless steel fibers, copper fibers, and nickel fibers; sintered bodies of organic fibers such as aramid fibers; and sintered bodies of inorganic fibers such as carbon fibers, glass fibers, and ceramic fibers. Among these, sintered bodies of metal fibers are more preferred, and sintered bodies of copper fibers, sintered bodies of steel fibers (steel wool), sintered bodies of stainless steel fibers, and sintered bodies of nickel fibers are the most preferred. Specific examples of materials having a sponge-like form include metal sponges such as steel, stainless steel, copper, and nickel; organic sponges such as aramid; and inorganic sponges such as carbon sponges, glass sponges, and ceramic sponges. Among these, metal sponges are more preferred, with copper sponges, steel sponges, stainless steel sponges, and nickel sponges being the most preferred.

[0027] The shape of the porous body is not particularly limited and may be a specific shape such as a sphere (perfect sphere, oblong sphere), a cylinder, or a prism such as a triangular prism or a rectangular prism, or it may be an irregular shape.

[0028] [Storage Container] The storage container used in the evaporation source of the surface treatment agent composition of the present invention has an opening and is made of a ceramic material, heat-resistant glass material, carbon material, organic material, or metal material having a melting point of 800°C or higher at 1,013 hPa, and houses the porous body.

[0029] The storage container preferably has a melting point of 800°C or higher at 1,013 hPa, more preferably 900°C or higher, and even more preferably 1,000°C or higher. Since the evaporation source of the surface treatment agent composition is heated to about 700°C by resistance heating or electron beam heating, if the melting point of the storage container is above the above range, volatilization or melting of the storage container due to heating becomes less likely.

[0030] The material of the storage container is preferably a ceramic material, a heat-resistant glass material, a carbon material, an organic material, or a metallic material, and more preferably a ceramic material or a metallic material.

[0031] Specific examples of ceramic materials include aluminum oxide, zirconium oxide, silicon oxide, titanium oxide, yttrium oxide, magnesium oxide, aluminum nitride, zirconium nitride, silicon nitride, titanium nitride, boron nitride, silicon carbide, titanium carbide, boron carbide, and composite ceramics and glass ceramics thereof. Specific examples of heat-resistant glass materials include borosilicate glass and quartz glass. Specific examples of carbon materials include carbon, graphite, and synthetic diamond. Specific examples of organic materials include aramid, polyimide, PBI (polybenzimidazole), PBO (polyp-phenylene-benzobis-oxazole), polyarylate, and polytetrafluoroethylene. Specific examples of metallic materials include silver, gold, cobalt, chromium, copper, iron, iridium, molybdenum, nickel, palladium, platinum, silicon, titanium, vanadium, tungsten, zirconium, their alloys, and various types of stainless steel (SUS).

[0032] The external shape of the storage container is not particularly limited, as long as it has an opening for the surface treatment agent composition present in the porous body to evaporate to the outside. For example, it may be spherical (perfectly spherical, oblong), cylindrical, or a prism such as a triangular or rectangular prism. The shape of the opening of the storage container is also not particularly limited, as long as the surface treatment agent composition can evaporate to the outside. For example, it may be circular (perfectly circular, elliptical), rectangular, etc. The wall thickness of the storage container should be such that the container maintains its shape and strength even when the porous body is heated.

[0033] [Surface Treatment Agent Composition] The surface treatment agent composition used as an evaporation source for the surface treatment agent composition of the present invention comprises a nonfluorine-based organosilane compound (α) and / or a partially reacted condensate thereof having at least one linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms and a reactive silyl group, which may contain at least one selected from oxygen atoms, sulfur atoms, nitrogen atoms, and silicon atoms, and is made of a material that does not contain fluorine atoms.

[0034] <Organosilane compound (α) and / or its partially reacted condensate> The surface treatment agent composition used as the evaporation source for the surface treatment agent composition of the present invention mainly comprises the above organosilane compound (α) and / or its partially reacted condensate.

[0035] The organosilane compound (α) used in the present invention is a nonfluorine compound and may contain at least one selected from oxygen, sulfur, nitrogen, and silicon atoms, and has at least one linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms, and a reactive silyl group, and may be one or a mixture of two or more of these.

[0036] The organosilane compound (α) has a linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms that exhibits water repellency, and a reactive silyl group that exhibits reactivity with the substrate. The resulting cured film exhibits excellent water repellency and abrasion resistance.

[0037] In the above organosilane compound (α), the monovalent hydrocarbon group is preferably linear or branched in shape, as it exhibits high molecular mobility and the resulting cured film shows superior lubricity.

[0038] In the organosilane compound (α) described above, there is at least one monovalent hydrocarbon group, preferably two or more, and more preferably two or three.

[0039] In the above organosilane compound (α), if it has two or more monovalent hydrocarbon groups, it is preferable that these monovalent hydrocarbon groups are bonded to the same atom. When two or more monovalent hydrocarbon groups are bonded to the same atom, the organosilane compound (α) has high packing properties, and the cured film formed by the surface treatment agent composition containing the organosilane compound (α) forms a harder film. As a result, the resulting cured film exhibits superior water repellency and abrasion resistance. In this invention, "packing properties" refers to the ease with which multiple hydrocarbon chains can be oriented in one direction and densely on the surface of the cured film. Here, it is preferable that the same atom to which two or more of the above monovalent hydrocarbon groups are bonded is a carbon atom, a nitrogen atom, or a silicon atom.

[0040] Furthermore, in the organosilane compound (α) described above, the monovalent hydrocarbon group has 3 to 60 carbon atoms, preferably 3 to 40 carbon atoms, more preferably 8 to 40 carbon atoms, and even more preferably 10 to 40 carbon atoms. When the number of carbon atoms is 3 to 60, the compound can maintain high solubility in solvents, and the cured film made from the surface treatment agent composition can have high water repellency. When two or more monovalent hydrocarbon groups are bonded to the same atom, it is preferable that all carbon atoms in the monovalent hydrocarbon group have the same number, and in particular that the monovalent hydrocarbon groups are identical, as this further improves packing properties.

[0041] The organosilane compound (α) is more preferably represented by the following general formula (1). (In the formula, R 1R may independently contain at least one selected from oxygen, sulfur, nitrogen, and silicon atoms, and may be linear, branched, cyclic, or a combination thereof, and is a monovalent hydrocarbon group having 3 to 32 carbon atoms, 2 k1 is a hydrogen atom, halogen atom, hydroxyl group, siloxy group, amino group, thiol group, or a monovalent hydrocarbon group having 1 or 2 carbon atoms; U is a carbon atom, silicon atom, nitrogen atom, or a trivalent or tetravalent organic group; V is independently a single bond or a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, and sulfur atoms; Z is independently a single bond, carbon atom, silicon atom, nitrogen atom, sulfur atom, or a trivalent to octavalent organic group; Y is independently a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, sulfur, and silicon atoms; A is independently a monovalent reactive silyl group; k1 is 2 or 3; k2 is 0 or 1; k3 is 1 or 2; k1 + k2 + k3 is 3 or 4; and m is an integer from 1 to 7.

[0042] In the above formula (1), R 1 This group may independently contain at least one selected from oxygen, sulfur, nitrogen, and silicon atoms, and may be linear, branched, cyclic, or a combination thereof, and is a monovalent hydrocarbon group having 3 to 32 carbon atoms, preferably 6 to 28 carbon atoms, more preferably 8 to 28 carbon atoms, and even more preferably 13 to 28 carbon atoms. Here, when at least one selected from oxygen, sulfur, nitrogen, and silicon atoms is included, it is preferable that it be included as a group such as an ether group, carbonyl (ketone) group, ester group, urethane group, carbonate group, thioether group, sulfinyl group, sulfonyl group, thioester group, thiocarbonate group, thiocarbamate group, amino group, amide group, carbamate group, urea group, oxazole group, imidazole group, triazole group, cyanurate group, isocyanurate group, diorganosilylene group, organopolysiloxane residue, sylalkylene group, or sylarylene group. Furthermore, from the viewpoint of chemical resistance, it is preferable that the material does not contain functional groups containing O-C=O bonds, such as ester groups or urethane groups.

[0043] R1 The base represented by the following formula is preferred. (In the formula, R A Q is a monovalent hydrocarbon group having 3 to 32 carbon atoms, which may be linear, branched, cyclic, or a combination thereof, and Q is independently an oxygen atom, a sulfur atom, a divalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a diorganosilylene group, a sylalkylene structure or sylarylene structure, and a linear or branched or cyclic divalent organopolysiloxane residue having 2 to 10 silicon atoms, or having 3 to 10 silicon atoms, a carbonyl (ketone) group, an ester group, a carbonate group, a sulfinyl group, a sulfonyl group, a thioester group, a thiocarbonate group, a thiocarbamate group, an amino group, an amide group, a carbamate group, a urea group, or a divalent nitrogen-containing heterocyclic group (divalent oxazole group, divalent imidazole group). Q' is a divalent group selected from the group consisting of a group (such as a divalent triazole group), Q' is a trivalent group selected from the group consisting of a nitrogen atom, a trivalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic trivalent organopolysiloxane residue having 2 to 10 silicon atoms, a trivalent amide group, or a trivalent nitrogen-containing heterocyclic group (such as a trivalent cyanurate group, a trivalent isocyanurate group, or a trivalent triazole group), and Q'' is a tetravalent group selected from the group consisting of a silicon atom, a tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, or R B R is a divalent hydrocarbon group having 1 to 29 carbon atoms, which may be independently single-bonded, linear, branched, or cyclic, and C R is independent A (Or a hydrogen atom, where p is an integer between 0 and 10. However, the total number of carbon atoms in each structure is 32 or less.)

[0044] In the above formula, R A R is a monovalent hydrocarbon group having 3 to 32 carbon atoms, preferably 6 to 28 carbon atoms, more preferably 8 to 28 carbon atoms, and even more preferably 13 to 28 carbon atoms, which may be linear, branched, cyclic, or a combination thereof. A For example, the following can be cited: (In the formula, x is an integer between 2 and 31, preferably between 5 and 27, more preferably between 7 and 27, and y and y' are integers of 1 or more such that the sum of the number of carbon atoms in each structure is 32 or less.)

[0045] In the above formula, Q is independently a divalent group selected from the group consisting of an oxygen atom, a sulfur atom, a divalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a diorganosilylene group, a sylalkylene structure or sylarylene structure, and a divalent organopolysiloxane residue having 2 to 10 silicon atoms, particularly a linear structure with 2 to 8 silicon atoms, or a branched or cyclic structure with 3 to 10 silicon atoms, particularly a branched or cyclic structure with 3 to 8 silicon atoms, a carbonyl (ketone) group, an ester group, a carbonate group, a sulfinyl group, a sulfonyl group, a thioester group, a thiocarbonate group, a thiocarbamate group, an amino group, an amide group, a carbamate group, a urea group, and a divalent nitrogen-containing heterocyclic group (such as a divalent oxazole group, a divalent imidazole group, or a divalent triazole group).

[0046] Here, the groups that bond to silicon atoms in diorganosilylene groups, sylalkylene structures, sylarylene structures, and organopolysiloxane residues are preferably alkyl groups such as methyl, ethyl, propyl, and butyl groups, or phenyl groups, having 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms. Furthermore, the alkylene groups in the sylalkylene structures are preferably ethylene groups, propylene groups (trimethylene group, methylethylene group), butylene groups (tetramethylene group, methylpropylene group), etc., having 2 to 6 carbon atoms, preferably 2 to 4 carbon atoms. Moreover, the organopolysiloxane residue may also contain a sylalkylene structure in which two silicon atoms are bonded by alkylene groups such as ethylene and propylene groups.

[0047] Examples of such Q include those shown below. In the structure below, the left-hand coupling is R A or R B It is joined to the right side, and the joining hand is R B It combines with it. (In the formula, f is an integer between 2 and 4, and e is an integer between 1 and 9.)

[0048] In the above formula, Q' is a trivalent group selected independently from the group consisting of a nitrogen atom, a trivalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a trivalent organopolysiloxane residue having 2 to 10 silicon atoms, particularly a linear group having 2 to 8 silicon atoms, or a branched or cyclic group having 3 to 10 silicon atoms, particularly a trivalent amide group, or a trivalent nitrogen-containing heterocyclic group (such as a trivalent cyanurate group, a trivalent isocyanurate group, or a trivalent triazole group).

[0049] The organopolysiloxane residue may have an alkyl group such as a methyl group, ethyl group, propyl group, or butyl group, or a phenyl group, having 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. The organopolysiloxane residue may also contain a sylalkylene structure in which two silicon atoms are linked by an alkylene group such as an ethylene group or a propylene group.

[0050] Examples of such Q' include those shown below. In the structure below, the left-hand coupling is R A or R B And the coupling on the right is R B And the other bonds are R C It combines with it. (In the formula, f is an integer between 2 and 4.)

[0051] In the above formula, Q'' is a tetravalent group independently selected from the group consisting of a silicon atom, a tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, particularly 2 to 8 silicon atoms, or a branched or cyclic tetravalent organopolysiloxane residue having 3 to 10 silicon atoms, particularly 3 to 8 silicon atoms.

[0052] The organopolysiloxane residue may have an alkyl group such as a methyl group, ethyl group, propyl group, or butyl group, or a phenyl group, having 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. The organopolysiloxane residue may also contain a sylalkylene structure in which two silicon atoms are linked by an alkylene group such as an ethylene group or a propylene group.

[0053] Examples of such Q'' include those shown below. In the structure below, the left-hand coupling is R A or R B And the coupling on the right is R B And the other bonds are R C It combines with it.

[0054] In the above formula, R B These are divalent hydrocarbon groups having 1 to 29 carbon atoms, which may be independently single-bonded, linear, branched, or cyclic, and the following are examples: (In the formula, z is an integer between 1 and 10.)

[0055] In the above formula, R C R is independent A Or it is a hydrogen atom. Note that R C R A In that case, the above R A It may be the same as or different from it.

[0056] In the above formula, p is an integer between 0 and 10, and is preferably 0, 1, or 2. However, R 1 The total number of carbon atoms in each structure is 32 or less.

[0057] This kind of R 1 The following are preferred for use. (In the formulas, x, y, y', and z are the same as above, except that the total number of carbon atoms in each structure is between 3 and 32.)

[0058] In the above formula (1), R 2 R is a hydrogen atom, halogen atom, hydroxyl group, siloxy group, amino group, thiol group, or a monovalent hydrocarbon group having 1 or 2 carbon atoms (methyl group, ethyl group). 2Preferably, the atoms are hydrogen atoms, chlorine atoms, hydroxyl groups, methyl groups, and ethyl groups.

[0059] In formula (1) above, U is a carbon atom, a silicon atom, a nitrogen atom, or a trivalent or tetravalent organic group. The trivalent or tetravalent organic group is preferably a trivalent or tetravalent group selected from a trivalent or tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear trivalent or tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, particularly 2 to 8 silicon atoms, or a branched or cyclic trivalent or tetravalent organopolysiloxane residue having 3 to 10 silicon atoms, particularly 3 to 8 silicon atoms, a trivalent amide group, a trivalent carbamate group, a trivalent or tetravalent urea group, and a trivalent or tetravalent nitrogen-containing heterocyclic group (such as a trivalent cyanurate group, a trivalent isocyanurate group, and a trivalent triazine ring-containing group).

[0060] The organopolysiloxane residue may have an alkyl group such as a methyl group, ethyl group, propyl group, or butyl group, or a phenyl group, having 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. The organopolysiloxane residue may also contain a sylalkylene structure in which two silicon atoms are linked by an alkylene group such as an ethylene group or a propylene group.

[0061] Examples of such U are shown below. In the structure below, it is preferable that the right-hand coupling bond connects to V.

[0062] In formula (1) above, V may independently contain a single bond or at least one selected from oxygen, nitrogen, and sulfur atoms, preferably a divalent hydrocarbon group having 1 to 20 carbon atoms, and is a linking group connecting the U group and the Z group. When Z is a single bond, V is preferably a single bond. Examples of the divalent hydrocarbon group include an alkylene group having 1 to 10 carbon atoms which may contain at least one selected from oxygen, nitrogen, and sulfur atoms, an alkylene group having 1 to 10 carbon atoms which includes an arylene group having 6 to 8 carbon atoms (for example, an alkylene-arylene group having 7 to 18 carbon atoms).

[0063] Examples of such V include, in addition to single bonds, the following. In the structure below, the bond on the left is bonded to U, and the bond on the right is bonded to Z. (In the formula, q is an integer between 1 and 10, r, s, and t are each integers between 1 and 8, the sum of r and s is an integer between 2 and 10, and the sum of r, s, and t is an integer between 3 and 10.)

[0064] In formula (1) above, Z is independently a single bond, a carbon atom, a silicon atom, a nitrogen atom, a sulfur atom, or a 3- to 8-valent organic group, and the 3- to 8-valent organic group is a trivalent or tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, -SiR 3 = (R 3 (A trivalent group represented by a hydroxyl group, an alkyl group having 1 to 3 carbon atoms, or an alkoxy group having 1 to 3 carbon atoms), -CR 4 = (R 4 Examples of 3-8 valent groups include trivalent groups represented by a hydrogen atom, a hydroxyl group, or an alkyl group having 1 to 3 carbon atoms; linear 3-8 valent organopolysiloxane residues with 2 to 10 silicon atoms, particularly 2 to 8 silicon atoms, or branched or cyclic 3-8 valent organopolysiloxane residues with 3 to 10 silicon atoms, particularly 3 to 8 silicon atoms; trivalent amide groups; trivalent carbamate groups; trivalent or tetravalent urea groups; and 3-8 valent nitrogen-containing heterocyclic groups (such as trivalent cyanurate groups, trivalent isocyanurate groups, and trivalent or tetravalent triazine ring-containing groups).

[0065] The organopolysiloxane residue may have an alkyl group such as a methyl group, ethyl group, propyl group, or butyl group, or a phenyl group, having 1 to 8 carbon atoms, more preferably 1 to 4 carbon atoms. The organopolysiloxane residue may also contain a sylalkylene structure in which two silicon atoms are linked by an alkylene group such as an ethylene group or a propylene group.

[0066] Examples of such Z bonds include, in addition to single bonds, those shown below. In the structure below, the bond on the left is bonded to V, and the other bonds are bonded to Y. (In the formula, f is an integer between 2 and 4.)

[0067] In formula (1) above, Y may independently contain at least one selected from oxygen, nitrogen, sulfur, and silicon atoms, preferably a divalent hydrocarbon group having 1 to 20 carbon atoms, and is a linking group connecting the Z group and the A group. Examples of the divalent hydrocarbon group include, specifically, an alkylene group having 1 to 20 carbon atoms, preferably 1 to 10 carbon atoms, which may contain at least one selected from oxygen, nitrogen, and sulfur atoms; an alkylene group having 1 to 10 carbon atoms including an arylene group having 6 to 8 carbon atoms (for example, an alkylene-arylene group having 7 to 18 carbon atoms); a divalent group in which alkylene groups having 1 to 8 carbon atoms are bonded to each other via a diorganosilylene group, a sylalkylene structure, a sylarylene structure, or a nitrogen-containing heterocyclic group; and a divalent group in which an alkylene group having 1 to 10 carbon atoms is bonded to the binding site of a linear organopolysiloxane residue having 2 to 10 silicon atoms, particularly 2 to 8 silicon atoms, or a branched or cyclic organopolysiloxane residue having 3 to 10 silicon atoms, particularly 3 to 8 silicon atoms.

[0068] Here, the groups that bond to silicon atoms in diorganosilylene groups, sylalkylene structures, sylarylene structures, and organopolysiloxane residues are preferably alkyl groups such as methyl, ethyl, propyl, and butyl groups, or phenyl groups, having 1 to 8 carbon atoms, preferably 1 to 4 carbon atoms. Furthermore, the alkylene groups in the sylalkylene structures are preferably ethylene groups, propylene groups (trimethylene group, methylethylene group), butylene groups (tetramethylene group, methylpropylene group), etc., having 2 to 6 carbon atoms, preferably 2 to 4 carbon atoms. Moreover, the organopolysiloxane residue may also contain a sylalkylene structure in which two silicon atoms are bonded by alkylene groups such as ethylene and propylene groups.

[0069] Examples of such a Y group include the following. In the structure below, the left-hand bond connects to Z, and the right-hand bond connects to A. (In the formula, a is an integer between 1 and 10, b, c, and d are each integers between 1 and 8, the sum of b and c is an integer between 2 and 10, and the sum of b, c, and d is an integer between 3 and 10. e is an integer between 1 and 9, and f is an integer between 2 and 4.)

[0070] In formula (1) above, A is independently a monovalent reactive silyl group, preferably a hydroxyl group-containing silyl group (silanol group) or a hydrolyzable silyl group.

[0071] The following general formula (2) is used for hydroxyl group-containing silyl groups and hydrolyzable silyl groups. (In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group, X is independently a hydroxyl group or a hydrolyzable group, and n is an integer from 1 to 3.) Or the following general formula (3) A base represented by (wherein n'' is a number from 0 to 3, and n'' is (3 - n'') / 2) is preferred.

[0072] In formula (2) above, R is independently an alkyl group such as a methyl group, ethyl group, propyl group, or butyl group having 1 to 4 carbon atoms, or a phenyl group, with the methyl group being preferred. Also, in formula (2) above, X is independently a hydroxyl group or a hydrolyzable group, and examples of such X include hydroxyl groups; alkoxy groups having 1 to 10 carbon atoms such as methoxy, ethoxy, propoxy, isopropoxy, and butoxy groups; alkoxyalkoxy groups having 2 to 10 carbon atoms such as methoxymethoxy and methoxyethoxy groups; acyloxy groups having 1 to 10 carbon atoms such as acetoxy groups; alkenyloxy groups having 2 to 10 carbon atoms such as isopropenoxy and cyclopentenyloxy groups; halogen groups such as chlor, bromo, and iodine groups; and dialkylamino groups having 2 to 10 carbon atoms such as dimethylamino and diethylamino groups. Among these, methoxy, ethoxy, isopropenoxy, and chlor groups are preferred. X may be the same or different.

[0073] In formula (3) above, n'' is a number from 0 to 3 (a positive number less than or equal to 3), preferably n'' < 3, and more preferably n'' = 0. In formula (3) above, when n'' = 3, general formula (1) above represents the molecular formula (structural formula) of the hydrocarbon terminal group-containing compound (monomer monomer), and in formula (3) above, when n'' < 3, general formula (1) above represents the compositional formula of the hydrocarbon terminal group-containing compound (polysilazane compound). In formula (3) above, n'' is (3 - n'') / 2, preferably 1.5.

[0074] In the above formula (1), k1 is 2 or 3, k2 is 0 or 1, k3 is 1 or 2, k1 + k2 + k3 is 3 or 4, when U is trivalent, k1 + k2 + k3 is 3, and when U is tetravalent, k1 + k2 + k3 is 4. Also, m is an integer from 1 to 7, preferably an integer from 1 to 3.

[0075] The following structures are examples of the structure of the compound represented by the above formula (1). R in the above formula (1) 1 , R 2 By changing the combinations of U, V, Z, Y, A, k1, k2, k3, and m, several different hydrocarbon end-group-containing compounds can be obtained.

[0076]

[0077]

[0078]

[0079]

[0080]

[0081]

[0082]

[0083]

[0084] (In the formula, x, y, y', z, q, r, s, a, b, c, d, e, and f are all independently the same as above.)

[0085] Furthermore, the cured film formed by the surface treatment agent composition containing the above hydrocarbon-terminated compound represented by formula (1) has chemical resistance. Among these, the compound represented by the following general formula (4) is a compound with particularly excellent chemical resistance. (In the formula, R 1´ R is a monovalent hydrocarbon group having 13 to 32 carbon atoms, which may be linear, branched, cyclic, or a combination thereof. 2k1 is a hydrogen atom, halogen atom, hydroxyl group, siloxy group, amino group, thiol group, or a monovalent hydrocarbon group having 1 or 2 carbon atoms; U is a carbon atom, silicon atom, nitrogen atom, or a trivalent or tetravalent organic group; V is independently a single bond or a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, and sulfur atoms; Z is independently a single bond, carbon atom, silicon atom, nitrogen atom, sulfur atom, or a trivalent to octavalent organic group; Y is independently a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, sulfur, and silicon atoms; A is independently a monovalent reactive silyl group; k1 is 2 or 3; k2 is 0 or 1; k3 is 1 or 2; k1 + k2 + k3 is 3 or 4; and m is an integer from 1 to 7.

[0086] In the above formula (4), R 1´ R is a monovalent hydrocarbon group having 13 to 32 carbon atoms, which may be independently linear, branched, cyclic, or a combination thereof, and is preferably a monovalent hydrocarbon group having 15 to 28 carbon atoms. 1´ Having 13 or more carbon atoms provides an effect that prevents chemicals from penetrating the substrate-adhering portion, thereby improving chemical resistance. Furthermore, R 1´ By not having a structure containing one or more oxygen, sulfur, nitrogen, and silicon atoms (especially ester or urethane structures), the effect of preventing chemical penetration is enhanced, resulting in improved chemical resistance.

[0087] R in equation (4) above 2 U, V, Z, Y, A, k1, k2, k3, k1+k2+k3, m is R in the above equation (1). 2 U, V, Z, Y, A, k1, k2, k3, k1+k2+k3, and m are the same.

[0088] Examples of methods for preparing the compound represented by general formula (1) include the following: [Preparation Method 1] A compound represented by formula (1) can be produced by mixing a hydrocarbon-terminal compound having an alkenyl group at its terminus with a compound having an SiH group and a hydrolyzable silyl group, and carrying out a hydrosilylation addition reaction in the presence of a hydrosilylation catalyst. If the hydrolyzable group is a halogen group as the compound having an SiH group and a hydrolyzable silyl group, the compound can then be produced by converting the substituent (halogen atom) on the silyl group to another hydrolyzable group.

[0089] Here, examples of hydrocarbon terminal group-containing compounds having an alkenyl group at the terminal include compounds represented by the following formula (1A). (In the formula, R 1 , R 2 U, V, Z, k1, k2, k3, k1+k2+k3, and m are the same as above. Y 1 (This may independently contain at least one atom selected from oxygen, nitrogen, sulfur, and silicon atoms, preferably a divalent hydrocarbon group having 1 to 18 carbon atoms.)

[0090] In the above formula (1A), Y 1 This may independently contain at least one atom selected from oxygen, nitrogen, sulfur, and silicon, preferably a divalent hydrocarbon group having 1 to 18 carbon atoms, as shown below as examples. In the structure below, the left bond is bonded to Z, and the right bond is bonded to a carbon atom. (In the formula, a' is an independent integer between 0 and 8, b and c are integers between 1 and 8, c' and d' are integers between 0 and 6, the sum of b and c' is an integer between 2 and 8, and the sum of b, c, and d' is an integer between 3 and 8. e is an integer between 1 and 9, and f is an integer between 2 and 4.)

[0091] Examples of compounds represented by formula (1A) are listed below. (In the formula, x, y, y', z, q, r, s, a', b, and c' are all independently the same as above.)

[0092] Examples of compounds having an SiH group and a hydrolyzable silyl group include trimethoxysilane, triethoxysilane, triacetoxysilane, and trichlorosilane.

[0093] In preparation method 1, the amount of compound having an SiH group and a hydrolyzable silyl group used is preferably 1 to 6 moles, particularly 1.5 to 4 moles, per mole of alkenyl group in the hydrocarbon terminal group-containing compound having an alkenyl group at the terminal end.

[0094] In preparation method 1, examples of the hydrosilylation reaction catalyst include platinum black, chloroplatinic acid, alcohol-modified chloroplatinic acid, complexes of chloroplatinic acid with olefins, aldehydes, vinylsiloxanes, acetylene alcohols, etc., and platinum group metal catalysts such as tetrakis(triphenylphosphine)palladium and chlorotris(triphenylphosphine)rhodium. Preferably, it is a platinum-based compound such as a vinylsiloxane coordination compound. It is preferable to dissolve the platinum-based compound in a solvent such as toluene, lower alcohol, higher alcohol, or silicone-based solvent before use. The amount of hydrosilylation reaction catalyst used is preferably 0.001 to 1,000 ppm, more preferably 0.01 to 100 ppm, in terms of transition metal (mass), relative to the mass of the hydrocarbon end-group-containing compound having an alkenyl group at the terminal end.

[0095] In preparation method 1, a solvent can be used when carrying out the reaction. Examples of solvents include aromatic hydrocarbons such as toluene and xylene, aliphatic or alicyclic hydrocarbons such as n-pentane, n-hexane, and cyclohexane, cyclic ether compounds such as tetrahydrofuran and dioxane, and ketones such as acetone and methyl ethyl ketone. The amount of solvent used is preferably 0 to 1,000 parts by mass, more preferably 50 to 200 parts by mass, per 100 parts by mass of the hydrocarbon terminal group-containing compound having an alkenyl group at the terminal end.

[0096] In preparation method 1, the reaction conditions for the hydrocarbon terminal group-containing compound having an alkenyl group at its terminus and the compound having an SiH group and a hydrolyzable silyl group are preferably a temperature of 20 to 120°C, particularly 60 to 100°C, for 0.5 to 72 hours, and especially 1 to 36 hours.

[0097] In preparation method 1, if a compound having a SiH group and a hydrolyzable silyl group is used, such as trichlorosilane, in which the hydrolyzable group is a halogen group (a compound containing an SiH group and a silyl halogen group), the substituent (halogen atom) on the silyl group is then converted to another hydrolyzable group, such as an alkoxy group like a methoxy group. Examples of compounds that can be used to convert the substituent (halogen atom) on the silyl group to another hydrolyzable group include methanol, ethanol, isopropanol, ethylene glycol monomethyl ether, and trimethyl orthoformate. The amount used is preferably 3 to 9 moles, particularly 3 to 5 moles, per mole of halogen atoms in the reaction product of the hydrocarbon terminal group-containing compound having an alkenyl group at the terminal and the SiH group and silyl halogen group-containing compound.

[0098] In preparation method 1, the reaction conditions for converting substituents (halogen atoms) on the silyl group to other hydrolyzable groups are preferably a temperature of 0 to 80°C, particularly 20 to 60°C, for 0.5 to 72 hours, and especially 1 to 36 hours.

[0099] Other methods for preparing the compound represented by the general formula (1) of the present invention include the following: [Preparation method 2] A compound represented by formula (1) can be produced by mixing a hydrocarbon-terminal group-containing compound having an SiH group at the terminal end with a compound having an alkenyl group and a reactive silyl group such as a hydrolyzable silyl group, and carrying out a hydrosilylation addition reaction in the presence of a hydrosilylation reaction catalyst.

[0100] Examples of hydrocarbon terminal group-containing compounds having an SiH group at the terminal include compounds represented by the following formulas (1B) or (1C). (In the formula, R 1 , R 2U, V, Z, k1, k2, k3, k1+k2+k3, and m are the same as above. Z 1 These are linear or branched or cyclic organopolysiloxane residues with 2 to 10 silicon atoms, or with 3 to 10 silicon atoms, and the m hydrogen atoms in formula (1B) are Z １ It bonds with the silicon atom inside. Y 2 (It is a monovalent hydrocarbon group that independently has a silicon atom or a siloxane bond and has an SiH group at its terminal end.)

[0101] In the above formula (1B), Z 1 These are 3-8 valent organopolysiloxane residues with 2-10 silicon atoms, particularly 2-8 silicon atoms in a linear chain, or 3-10 silicon atoms, particularly 3-8 silicon atoms in a branched or cyclic structure, as shown below. In the structure below, the left-hand bond is bound to V, and the other bond is bound to H. (In the formula, f is an integer between 2 and 4.)

[0102] Examples of compounds represented by formula (1B) are listed below. (In the formula, x, q, r, and s are all independently the same as above.)

[0103] In the above formula (1C), Y 2 These are monovalent hydrocarbon groups that independently have a silicon atom or a siloxane bond and have an SiH group at their terminus, and the following are examples. (In the formula, b is an integer between 1 and 8, e is an integer between 1 and 9, and f is an integer between 2 and 4.)

[0104] Examples of compounds represented by formula (1C) are listed below. (In the equation, x and b are independently the same as above.)

[0105] In preparation method 2, examples of compounds having an alkenyl group and a reactive silyl group such as a hydrolyzable silyl group include vinyltrimethoxysilane, allyltrimethoxysilane, and octenyltrimethoxysilane.

[0106] In preparation method 2, the amount of compounds having reactive silyl groups such as alkenyl groups and hydrolyzable silyl groups used is preferably 1 to 5 moles, particularly 1 to 3 moles, per mole of SiH groups in the hydrocarbon-terminated compound having an SiH group at the terminal.

[0107] In preparation method 2, examples of hydrosilylation reaction catalysts include those similar to those used in preparation method 1. Preferably, it is a platinum-based compound such as a vinylsiloxane coordination compound. It is preferable to dissolve the platinum-based compound in a solvent such as toluene, a lower alcohol, a higher alcohol, or a silicone-based solvent before use. The amount of hydrosilylation reaction catalyst used is preferably 0.001 to 1,000 ppm, more preferably 0.01 to 100 ppm, in terms of transition metal mass, relative to the mass of the hydrocarbon-terminal group-containing compound having an SiH group at the terminal end.

[0108] In preparation method 2, a solvent can be used when carrying out the reaction. Examples of solvents are the same as those used in preparation method 1. The amount of solvent used is preferably 0 to 1,000 parts by mass, more preferably 50 to 200 parts by mass, per 100 parts by mass of the hydrocarbon terminal group-containing compound having an SiH group at the terminal end.

[0109] In preparation method 2, the reaction conditions are preferably a temperature of 20 to 120°C, particularly 60 to 100°C, for 0.5 to 72 hours, and especially 1 to 36 hours.

[0110] Other methods for preparing the compound represented by general formula (1) include the following: [Preparation method 3] A hydrocarbon terminal group-containing compound having an alkenyl group at the terminal end is mixed with trichlorosilane and reacted in the presence of a hydrosilylation catalyst. Subsequently, the resulting compound is reacted with ammonia gas to produce the compound represented by formula (1) (particularly a compound having an amino group-containing silyl group at the terminal end and / or a polysilazane compound which is a polymer thereof).

[0111] Here, the reaction product of a hydrocarbon-terminal compound having an alkenyl group at its terminus and trichlorosilane can be prepared in the same manner as in Preparation Method 1.

[0112] In preparation method 3, the amount of ammonia gas used is preferably 1 to 300 cc / min, and more preferably 30 to 200 cc / min.

[0113] In preparation method 3, the reaction conditions for the reaction product of the hydrocarbon terminal group-containing compound having an alkenyl group at the terminal end and trichlorosilane with ammonia gas are preferably at room temperature (23 ± 15°C), particularly 20 to 30°C, for 2 to 36 hours, and especially 4 to 12 hours.

[0114] Other methods for preparing compounds represented by general formula (1) include the following: [Preparation Method 4] A compound represented by formula (1) (particularly a compound having a reactive silyl group at the end via a urethane bond) can be produced by mixing a hydrocarbon-terminal compound having a hydroxyl group at the end with a compound having an isocyanate group and a reactive silyl group, and reacting them in the presence of a catalyst.

[0115] Examples of hydrocarbon terminal group-containing compounds having a hydroxyl group at the terminal include compounds represented by the following formulas (1D) or (1E). (In the formula, R 1 , R 2 U, V, Z, k1, k2, k3, k1+k2+k3, m, b are the same as above. V 1 (It is a divalent hydrocarbon group having 1 to 10 carbon atoms.)

[0116] Examples of compounds represented by formula (1D) are listed below. (In the formula, x, z, and b are all independently the same as above.)

[0117] In the above formula (1E), V 1 This is a divalent hydrocarbon group having 1 to 10 carbon atoms, preferably an alkylene group, and the following are examples. (In the formula, q is the same as above.)

[0118] Examples of compounds represented by formula (1E) are listed below. (In the formula, x, z, and q are each independently the same as above.)

[0119] Examples of compounds having an isocyanate group and a reactive silyl group include (3-isocyanatopropyl)trimethoxysilane and (3-isocyanatopropyl)triethoxysilane.

[0120] In preparation method 4, the amount of compound having an isocyanate group and a reactive silyl group used is preferably 1 to 3 moles, particularly 1 to 1.5 moles, per mole of hydroxyl groups in the hydrocarbon terminal group-containing compound having a hydroxyl group at the terminal end.

[0121] In preparation method 4, examples of catalysts include titanium compounds such as titanium tetra-2-ethylhexoxide, tetra-n-butyl titanate, and tetra-n-propyl titanate; zirconium compounds such as tetra-n-butyl zirconate and tetra-n-propyl zirconate; tin compounds such as dibutyltin dimethoxide and dibutyltin dilaurate; bismuth compounds such as bismastris (2-ethylhexanoate); and amine catalysts such as diazabicycloundecene. The amount of catalyst used is preferably 0.01 to 100 parts by mass, more preferably 0.1 to 20 parts by mass, per 100 parts by mass of the hydrocarbon-terminated compound having a hydroxyl group at the terminal end.

[0122] In preparation method 4, a solvent can be used when carrying out the reaction. Examples of solvents are the same as those used in preparation method 1. The amount of solvent used is preferably 0 to 1,000 parts by mass, more preferably 50 to 200 parts by mass, per 100 parts by mass of the hydrocarbon terminal group-containing compound having a hydroxyl group at the terminal end.

[0123] In preparation method 4, the reaction conditions are preferably a temperature of 20 to 100°C, particularly 30 to 60°C, for 0.5 to 72 hours, and especially 1 to 36 hours.

[0124] Other methods for preparing compounds represented by general formula (1) include the following: [Preparation Method 5] Compounds represented by formula (1) (particularly compounds having a reactive silyl group at the terminal via a urea bond) can be produced by mixing a hydrocarbon terminal group-containing compound having an NH group at the terminal with a compound having an isocyanate group and a reactive silyl group and reacting them.

[0125] Here, examples of hydrocarbon terminal group-containing compounds having an NH group at the terminal include compounds represented by the following formula (1F). (In the formula, R 1 (This is the same as above.)

[0126] Examples of compounds represented by formula (1F) are listed below. (In the equation, x is independently the same as above.)

[0127] Examples of compounds having an isocyanate group and a reactive silyl group include (3-isocyanatopropyl)trimethoxysilane and (3-isocyanatopropyl)triethoxysilane.

[0128] In preparation method 5, the amount of compound having an isocyanate group and a reactive silyl group used is preferably 1 to 3 moles, particularly 1 to 1.5 moles, per mole of the hydrocarbon-terminated compound having an NH group at the terminal end.

[0129] In preparation method 5, a solvent can be used when carrying out the reaction. Examples of solvents are the same as those used in preparation method 1. The amount of solvent used is preferably 0 to 1,000 parts by mass, more preferably 50 to 200 parts by mass, per 100 parts by mass of the hydrocarbon terminal group-containing compound having an NH group at the terminal end.

[0130] In preparation method 5, the reaction conditions are preferably a temperature of 0 to 100°C, particularly 20 to 60°C, for 0.5 to 72 hours, and especially 1 to 36 hours.

[0131] The compound represented by general formula (1) obtained by the above reaction is preferably subjected to purification and isolation operations such as concentration, column purification, distillation, and extraction. If the reaction solution does not contain fluorine atoms, the reaction solution can be used as is as a mixture containing the compound represented by general formula (1).

[0132] Furthermore, the above surface treatment agent composition may also contain a partially reacted condensate obtained by the partial reaction condensation of the reactive silyl group of the organosilane compound (α) (for example, a partially (hydrolyzed) condensate obtained by condensing the hydroxyl group of the compound represented by formula (1) above, or the hydroxyl group obtained by partially hydrolyzing the hydrolyzable group of the compound represented by formula (1) above using a known method). In this invention, "partially (hydrolyzed) condensate" refers to a partially condensed product or a partially hydrolyzed condensate.

[0133] The surface treatment agent composition used as an evaporation source in the present invention consists of materials that do not contain fluorine atoms, and is less likely to decompose and accumulate in nature.

[0134] <Non-fluorinated solvents> The above surface treatment agent composition may contain a non-fluorinated solvent that does not contain fluorine atoms. Examples of solvents include alcohol-based solvents (propylene glycol monomethyl ether, butanol, isopropanol, etc.), ether-based solvents (tetrahydrofuran (THF), dipropyl ether, dibutyl ether, methylcyclopentyl ether, methyl t-butyl ether, ethylene glycol dimethyl ether, diethylene glycol dimethyl ether, triethylene glycol dimethyl ether, propylene glycol dimethyl ether, etc.), ketone-based solvents (acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclopentanone, cyclohexanone, etc.), ester-based solvents (ethyl acetate, propyl acetate, butyl acetate, pentyl acetate, propylene glycol monomethyl ether acetate, etc.), and carboxymethyl ethers. Examples of solvents include nate solvents (dimethyl carbonate, ethyl methyl carbonate, diethyl carbonate, ethylene carbonate, propylene carbonate, etc.), siloxane solvents (hexamethyldisiloxane, octamethyltrisiloxane, decamethyltetrasiloxane, dodecamethylpentasiloxane, octamethylcyclotetrasiloxane, decamethylcyclopentasiloxane, dodecamethylcyclohexasiloxane, etc.), and hydrocarbon solvents (petroleum benzine, toluene, xylene, hexane, cyclohexane, methylcyclohexane, ethylcyclohexane, heptane (n-heptane, isoheptane, etc.), octane (n-octane, isooctane, etc.), nonane (n-nonane, isononane, etc.)).

[0135] When a non-fluorinated solvent is incorporated, the amount is preferably 0.01 to 100,000 parts by mass, and more preferably 0.1 to 20,000 parts by mass, per 100 parts by mass of the organosilane compound (α) and / or its partially reacted condensate.

[0136] <Other silane compounds> The above surface treatment agent composition may further contain the following general formula (5) SiR 5 n1-4 X 1 n1 (5) (wherein, R 5is independently a hydrogen atom or a monovalent hydrocarbon group having 1 or 2 carbon atoms, and X 1 is independently a hydroxyl group or a hydrolyzable group, and n1 is an integer of 1 to 4.) may contain at least one silane compound represented by the formula.

[0137] When the surface treatment agent composition contains the silane compound represented by the general formula (5), the silane compound represented by the general formula (5) acts as a dehydrating agent that captures moisture in the surface treatment agent composition, so that the obtained surface treatment agent composition can maintain its performance even after long-term storage.

[0138] In the above formula (5), R 5 is independently a hydrogen atom or a monovalent hydrocarbon group having 1 or 2 carbon atoms. Examples of the monovalent hydrocarbon group having 1 or 2 carbon atoms include alkyl groups such as methyl group and ethyl group, and alkenyl groups such as vinyl group. R 5 is preferably a methyl group or a vinyl group among them.

[0139] In the above formula (5), X 1 is independently a hydroxyl group or a hydrolyzable group. Such X 1 includes: hydroxyl group; alkoxy groups having 1 to 10 carbon atoms such as methoxy group, ethoxy group, propoxy group, isopropoxy group, and butoxy group; alkoxyalkoxy groups having 2 to 10 carbon atoms such as methoxymethoxy group and methoxyethoxy group; acyloxy groups having 1 to 10 carbon atoms such as acetoxy group; alkenyloxy groups having 2 to 10 carbon atoms such as isopropenoxy group and cyclopentenyl oxy group; halogen groups such as chlorine group, bromine group, and iodine group; dialkylamino groups having 2 to 10 carbon atoms such as dimethylamino group and diethylamino group, etc. Among them, methoxy group, ethoxy group, isopropenoxy group, and chlorine group are preferred. X 1 may be the same or different.

[0140] In the above formula (5), n1 is an integer of 1 to 4, preferably 3 or 4. <0>

[0141] Particularly preferred examples of silane compounds represented by the above general formula (5) include the following compounds: Si(OCH3)4, Si(OC2H5)4, Si(OC3H7)4, Si(OC4H9)4, CH2=CHSi(OCH3)3, CH2=CHSi(OC2H5)3, CH2=CHSi(OC3H7)3, CH2=CHSi(OC4H9)3, CH2=CHSi(OCOCH3)3, CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, CH3Si(OC4H9)3, CH3Si(OCOCH3)3

[0142] When a silane compound represented by formula (5) is incorporated into a surface treatment agent composition, its content is preferably 0.001 to 30 parts by mass, more preferably 0.005 to 25 parts by mass, and even more preferably 0.01 to 20 parts by mass, per 100 parts by mass of the organosilane compound (α) and / or its partially reacted condensate. If the content of the silane compound represented by formula (5) is below the lower limit of the above range, the amount of water in the surface treatment agent composition that the silane compound represented by formula (5) can capture is limited to a small amount, and therefore it cannot act sufficiently as a dehydrating agent, which may lead to a decrease in performance after long-term storage. If the content of the silane compound represented by formula (5) exceeds the upper limit of the above range, the water repellency and abrasion resistance of the resulting cured film may decrease.

[0143] <Other Components> The above surface treatment agent composition may further contain, to the extent that it does not impair the objectives of the present invention, at least one non-fluorine material selected from the group consisting of a paraffin compound (hereinafter referred to as paraffin oil) that is non-reactive with organosilane compound (α), a polyol ester compound (hereinafter referred to as polyol ester oil) that is non-reactive with organosilane compound (α), a silicone compound (hereinafter referred to as silicone oil) that is non-reactive with organosilane compound (α), a catalyst, a transition metal, a halide ion, a silane coupling agent, and a compound containing an atom having a lone pair of electrons in its molecular structure.

[0144] The paraffin oils mentioned above include linear, branched, or cyclic paraffin oils with 2,000 or fewer carbon atoms. Specific examples of paraffin oils include liquid paraffin, paraffin wax, polyethylene, polypropylene, and PAO (polyalphaolefin). While paraffin oils that are liquid at room temperature (25°C) are preferred, solid paraffin oils can also be used.

[0145] In the surface treatment agent composition of the present invention, when paraffin oil is included, the content is preferably 0.001 to 80 parts by mass per 100 parts by mass of the total amount of organosilane compound (α) and / or its partially reacted condensate and solvent.

[0146] Examples of the polyol ester oils mentioned above include polyol ester compounds which are condensates of di- to hexavalent alcohols and fatty acids having 3 to 22 carbon atoms. Specifically, examples of polyol ester compounds include di(2-ethylhexanoic acid) neopentyl glycol ester, di(oleic acid) neopentyl glycol ester, di(stearic acid) neopentyl glycol ester, tri(2-ethylhexanoic acid) trimethylolethane ester, tri(oleic acid) trimethylolethane ester, tri(stearic acid) trimethylolethane ester, tri(2-ethylhexanoic acid) trimethylolpropane ester, tri(oleic acid) trimethylolpropane ester, tri(stearic acid) trimethyl Examples include rolpropane esters, tri(2-ethylhexanoic acid) glycerol esters, tri(oleic acid) glycerol esters, tri(stearic acid) glycerol esters, tetra(2-ethylhexanoic acid) pentaerythritol esters, tetra(oleic acid) pentaerythritol esters, tetra(stearic acid) pentaerythritol esters, hexa(2-ethylhexanoic acid) dipentaerythritol esters, hexa(oleic acid) dipentaerythritol esters, and hexa(stearic acid) dipentaerythritol esters. Polyol ester oils that are liquid at room temperature (25°C) are preferred, but those that are solid can also be used.

[0147] In the surface treatment agent composition of the present invention, when polyol ester oil is included, the content is preferably 0.001 to 80 parts by mass per 100 parts by mass of the total amount of organosilane compound (α) and / or its partially reacted condensate and solvent.

[0148] Examples of the above-mentioned silicone oils include linear, branched, or cyclic silicone oils having 2,000 or fewer siloxane bonds. Linear silicone oils may be so-called straight silicone oils and modified silicone oils. Examples of straight silicone oils include dimethyl silicone oil, methylphenyl silicone oil, and methyl hydrogen silicone oil. Examples of modified silicone oils include straight silicone oils modified with alkyl, aralkyl, polyether, higher fatty acid esters, etc. Examples of cyclic silicone oils include cyclic dimethylsiloxane oil. While it is preferable that the silicone oil is liquid at room temperature (25°C), solid silicone oils can also be used.

[0149] In the surface treatment agent composition of the present invention, when silicone oil is included, the content is preferably 0.001 to 80 parts by mass per 100 parts by mass of the total amount of organosilane compound (α) and / or its partially reacted condensate and solvent.

[0150] Examples of catalysts include organic acids (acetic acid, methanesulfonic acid, etc.), inorganic acids (hydrochloric acid, sulfuric acid, phosphoric acid, etc.), organic bases (ammonia, triethylamine, diethylamine, etc.), inorganic bases (sodium hydroxide, potassium hydroxide, calcium hydroxide, etc.), organotin compounds (dibutyltin dimethoxide, dibutyltin dilaurate, etc.), and organotitanium compounds (tetra-n-butyl titanate, etc.). The catalyst can promote the hydrolysis polycondensation reaction of organosilane compounds (α) and accelerate the formation of a cured film.

[0151] The amount of surface treatment agent composition to be filled into a porous body should be less than or equal to the total volume of voids or cavities inside the porous body, and from the viewpoint of handling, it is preferable that it be less than the total volume of voids or cavities inside. Specifically, the amount of surface treatment agent composition to be filled is preferably 0.01 to 100% by volume of the total voids or cavities inside the porous body, and more preferably 0.1 to 95% by volume. If the amount of surface treatment agent composition to be filled is too small, it may not be possible to form a cured film with a practically sufficient thickness, and if it is too large, the surface treatment agent composition may not be able to be held in the voids or cavities, which may reduce handling. The amount of surface treatment agent composition to be filled can be determined from the ratio of the volume of the surface treatment agent composition to be filled to the total volume of voids or cavities inside the porous body (the same applies hereinafter).

[0152] Furthermore, when using a storage container, the amount of surface treatment agent composition to be filled should be such that it does not overflow from the container. From the viewpoint of ease of handling, it is preferable that the amount is less than or equal to the total volume of voids or cavities inside the porous body, and more preferably less than the total volume of voids or cavities inside. Specifically, the amount of surface treatment agent composition to be filled is preferably 0.01 to 100% by volume of the total voids or cavities inside the porous body, and more preferably 0.1 to 95% by volume. If the amount of surface treatment agent composition to be filled is too small, it may not be possible to form a cured film with a practically sufficient thickness, and if it is too large, the surface treatment agent composition may not be able to be held in the voids or cavities, which may reduce ease of handling.

[0153] [Method for Manufacturing a Surface Treatment Agent Composition Evaporation Source] The surface treatment agent composition evaporation source of the present invention can be manufactured by filling a plurality of voids or cavities in a porous body with a surface treatment agent composition. The following methods can be used to fill a plurality of voids or cavities in a porous body with a surface treatment agent composition. When an organosilane compound (α) and / or its partially reacted condensate is used alone as the surface treatment agent composition, if the organosilane compound (α) and / or its partially reacted condensate is liquid at room temperature, the organosilane compound (α) and / or its partially reacted condensate can be impregnated or injected into the voids or cavities by dropping it directly onto the porous body. Alternatively, if the melting point of the organosilane compound (α) and / or its partially reacted condensate is above room temperature and it is solid at room temperature, the organosilane compound (α) and / or its partially reacted condensate can be heated to melt it, and then impregnated or injected into the voids or cavities by dropping it onto the porous body. Even if the organosilane compound (α) and / or its partially reacted condensate cool and solidify again after filling, the evaporation source can be used without any problems.

[0154] Furthermore, if the surface treatment agent composition is a mixture of an organosilane compound (α) and / or its partially reacted condensate and a solvent, the mixture can be impregnated or injected into the interior of pores or voids by directly dropping it onto a porous body, thereby creating an evaporation source. Alternatively, after filling a porous body with the surface treatment agent composition, which is a mixture of an organosilane compound (α) and / or its partially reacted condensate and a solvent, some or all of the solvent can be removed by heating or vacuuming the entire body, creating another evaporation source. Similarly, the solvent can also be used as an evaporation source without vacuuming. These methods can be implemented whether the organosilane compound (α) and / or its partially reacted condensate are liquid or solid under room temperature conditions.

[0155] Furthermore, the size of the evaporation source of the resulting surface treatment agent composition is not particularly limited and can be any size corresponding to the object to be vapor-deposited.

[0156] [Method of using the surface treatment agent composition evaporation source] The surface treatment agent composition evaporation source of the present invention can form a cured film with excellent water repellency, abrasion resistance, and chemical resistance by vacuum deposition, and is therefore suitably used to impart these properties to a substrate. Specifically, the surface treatment agent composition evaporation source of the present invention can be used to form a cured film having antifouling and water repellency.

[0157] The heating method during vacuum deposition can be either resistance heating or electron beam heating; there are no particular limitations on which method is used.

[0158] Vacuum deposition involves heating a surface treatment agent composition deposition source to several hundred degrees Celsius, preferably 800 degrees Celsius or lower, more preferably 200 to 750 degrees Celsius, under high vacuum to evaporate the surface treatment agent composition and deposit it onto the substrate. After the deposition treatment using the surface treatment agent composition evaporation source of the present invention, a curing treatment is performed to form a cured film. The curing conditions vary depending on the curing method, but for example, it is preferable to use 25 to 200 degrees Celsius, particularly 25 to 150 degrees Celsius, for 15 minutes to 36 hours, and especially 30 minutes to 24 hours. Curing may also be performed under humid conditions.

[0159] Furthermore, the thickness of the cured film is appropriately selected depending on the type of substrate, but is usually 0.1 to 100 nm, and particularly 1 to 20 nm. The film thickness can be measured by methods such as spectroscopic reflectance measurement, X-ray reflectance measurement, spectroscopic ellipsometry measurement, and X-ray fluorescence measurement.

[0160] The substrate to be treated by vacuum deposition using the surface treatment agent composition evaporation source of the present invention is not particularly limited and may be made of various materials such as paper, cloth, metals and their oxides, glass, plastics, ceramics, and quartz. SiO2-treated glass and film are particularly preferred.

[0161] Articles that can be treated by vacuum deposition using the surface treatment agent composition evaporation source of the present invention include car navigation systems, mobile phones, smartphones, digital cameras, digital video cameras, PDAs, portable audio players, car audio systems, game consoles, eyeglass lenses, camera lenses, lens filters, sunglasses, medical devices such as endoscopes, photocopiers, PCs, liquid crystal displays, organic EL displays, plasma displays, touch panel displays, protective films, anti-reflective films, and other optical components.

[0162] Furthermore, the evaporation source of the surface treatment agent composition of the present invention is also useful for applications such as antifouling coatings for sanitary products such as bathtubs and washbasins, antifouling coatings for windows or tempered glass of automobiles, trains, and aircraft, headlamp covers, etc., water-repellent coatings for exterior building materials, stain-resistant coatings for kitchen building materials, antifouling and anti-sticker / graffiti coatings for telephone booths, coatings that provide stain resistance to works of art, etc., and stain-resistant coatings for compact discs, DVDs, etc.

[0163] The surface treatment agent composition evaporation source of the present invention can form a cured film with excellent water repellency and abrasion resistance by vacuum deposition, and is therefore particularly suitable for forming a cured film on the surfaces of optical components, displays, and lenses.

[0164] The present invention will be described in more detail below with reference to synthesis examples, examples, and comparative examples, but the present invention is not limited to the following examples. In the following examples, the film thickness was measured by spectroscopic ellipsometry using a spectroscopic ellipsometer. The room temperature is 25°C.

[0165] [Synthesis Example 1] In the reaction vessel, the following formula (A) 1.00 g (2.96 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 1.08 g (8.87 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 1.13 × 10 -2 g (as Pt alone, 3.49 × 10) -8(Containing mol) was mixed and aged at 80 °C for 24 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 1.30 g of the product (compound).

[0166] The obtained compound 1 was confirmed to have a structure represented by the following formula (B) by 1H-NMR.

[0167] [Synthesis Example 2] In a reaction vessel, 1.00 g (3.10×10 mol) of the compound represented by the following formula (C), 1.00 g of toluene, 1.14 g (9.31×10 -3 mol) of trimethoxysilane, and 1.18×10 -3 g of a toluene solution of chloroplatinic acid / vinylsiloxane complex (containing 3.66×10 -2 mol of Pt as a simple substance) were mixed and aged at 80 °C for 24 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 1.25 g of the product (compound). -8

[0168] The obtained compound 1 was confirmed to have a structure represented by the following formula (D) by 1H-NMR.

[0169] [Synthesis Example 3] In a reaction vessel, 1.00 g (1.73×10 mol) of the compound represented by the following formula (E), 1.00 g of toluene, 0.636 g (5.20×10 -3 mol) of trimethoxysilane, and 6.62×10 -3 g of a toluene solution of chloroplatinic acid / vinylsiloxane complex (containing 2.05×10 -3 mol of Pt as a simple substance) were mixed and aged at 80 °C for 24 hours. Thereafter, the solvent and unreacted substances were distilled off under reduced pressure to obtain 1.13 g of the product (compound). -8

[0170] The obtained compound 1 was confirmed to have a structure represented by the following formula (F) by 1H-NMR.

[0171] [Synthesis Example 4] In a reaction vessel, the following formula (G) 1.00 g (1.25 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.458 g (3.75 x 10 -3 mol), and 4.77 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone, 1.47 × 10⁻⁶) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.10 g of the product (compound).

[0172] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (H).

[0173] [Synthesis Example 5] In the reaction vessel, the following formula (I) 1.00 g (1.34 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.490 g (4.01 x 10 -3 mol), and 5.10 × 10¹⁰ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone, 1.58 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.11 g of the product (compound).

[0174] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (J).

[0175] [Synthesis Example 6] In the reaction vessel, the following formula (M) 1.00 g (1.37 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.502 g (4.11 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 5.23 × 10 -3 g (as Pt alone, 1.62 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.09 g of the product (compound).

[0176] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (N).

[0177] [Synthesis Example 7] In the reaction vessel, the following formula (O) 1.00 g (1.29 × 10) of the compound represented by -3 mol), toluene 2.00g, allyltrimethoxysilane 1.25g (7.73 x 10) -3 mol), and 4.92 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone: ​​1.52 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.58 g of the product (compound).

[0178] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (P).

[0179] [Synthesis Example 8] In the reaction vessel, the following formula (Q) 1.00 g (2.59 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.949 g (7.77 x 10 -3 mol), and 9.89 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (3.06 × 10 as Pt alone) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.30 g of the product (compound).

[0180] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (R).

[0181] [Synthesis Example 9] In the reaction vessel, the following formula (S) 1.00 g (1.29 × 10) of the compound represented by -3mol), toluene 1.00 g, trimethoxysilane 0.474 g (3.88 x 10 -3 mol), and 4.94 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone: ​​1.53 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.14 g of the product (compound).

[0182] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (T).

[0183] [Synthesis Example 10] In the reaction vessel, the following formula (U) 1.00 g (1.48 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.544 g (4.45 x 10 -3 mol), and 5.67 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone, 1.75 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.12 g of the product (compound).

[0184] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (V).

[0185] [Synthesis Example 11] In the reaction vessel, the following formula (W) 1.00 g (1.79 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 1.31 g (1.07 x 10) -2 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.83 × 10 -3 g (Pt alone is 2.11 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.36 g of the product (compound).

[0186] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (X).

[0187] [Synthesis Example 12] In the reaction vessel, the following formula (AC) 1.00 g (1.75 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 1.28 g (1.05 x 10 -2 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.67 × 10 -3 g (Pt alone: ​​2.06 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.40 g of the product (compound).

[0188] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (AD).

[0189] [Synthesis Example 13] In the reaction vessel, the following formula (AG) 1.00 g (1.69 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.621 g (5.08 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.47 × 10 -3 g (Pt alone: ​​2.00 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted materials were removed by reduced pressure distillation to obtain 1.18 g of the product (compound).

[0190] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (AH).

[0191] [Synthesis Example 14] In the reaction vessel, the following formula (AI) 1.00 g (1.15 × 10) of the compound represented by -3 mol), toluene 2.00g, octenyltrimethoxysilane 2.40g (1.03 x 10) -2mol), and 4.39 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone: ​​1.36 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted materials were removed by reduced pressure distillation to obtain 1.18 g of the product (compound).

[0192] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (AJ).

[0193] [Synthesis Example 15] In the reaction vessel, the following formula (AM) 1.00 g (1.35 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 1.49 g (1.22 x 10 -2 mol), and 5.17 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone, 1.60 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.47 g of the product (compound).

[0194] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (AN).

[0195] [Synthesis Example 16] In the reaction vessel, the following formula (AO) 1.00 g (1.73 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.636 g (5.20 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.62 × 10 -3 g (Pt alone: ​​2.05 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.20 g of the product (compound).

[0196] The resulting compound was 1¹H-NMR confirmed that the structure is represented by the following formula (AP).

[0197] [Synthesis Example 17] In the reaction vessel, the following formula (AU) 1.00 g (1.83 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.671 g (5.49 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.99 × 10 -3 g (Pt alone: ​​2.16 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.17 g of the product (compound).

[0198] The resulting compound was 1 H-NMR confirmed that the structure is represented by the following formula (AV).

[0199] [Synthesis Example 18] In the reaction vessel, the following formula (AY) 1.00 g (1.52 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.557 g (4.55 x 10 -3 mol), and 5.80 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (as Pt alone, 1.79 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.13 g of the product (compound).

[0200] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (AZ).

[0201] [Synthesis Example 19] In the reaction vessel, the following formula (BC) 1.00 g (1.97 × 10) of the compound represented by -3 mol), toluene 1.00 g, trichlorosilane 0.802 g (5.92 x 10 -3mol), and 7.54 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (Pt alone is 2.33 × 10) -8 The mixture (containing mol) was mixed and aged at 60°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation. The obtained product was mixed with 3.00 g of toluene and aged at room temperature for 6 hours while bubbling ammonia gas (ammonia gas usage: 40 cc / min). After that, the mixture was filtered, and the solvent and unreacted substances were removed by vacuum distillation to obtain 1.01 g of the product (compound).

[0202] The resulting compound was 1 ¹H-NMR confirmed that the structure is represented by the following formula (BD).

[0203] [Synthesis Example 20] In the reaction vessel, the following formula (BI) 1.00 g (1.92 × 10) of the compound represented by -3 mol), toluene 1.00 g, (3-isocyanatopropyl)triethoxysilane 0.521 g (2.11 x 10 -3 The mixture (mol) was aged at 50°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.45 g of the product (compound).

[0204] The resulting compound was 1 H-NMR confirmed that the structure is represented by the following formula (BJ).

[0205] [Synthesis Example 21] In the reaction vessel, the following formula (BK) 1.00 g (3.33 × 10) of the compound represented by -3 mol), toluene 1.00 g, (3-isocyanatopropyl)trimethoxysilane 1.43 g (6.99 x 10 -3 mol), and titanium tetra-2-ethylhexoxide 9.40 × 10 -2 g (1.67 × 10 -4 The mixture (mol) was aged at 50°C for 24 hours. Then, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 2.34 g of the product (compound).

[0206] The resulting compound was 1¹H-NMR confirmed that the structure is represented by the following formula (BL).

[0207] [Synthesis Example 22] In the reaction vessel, the following formula (XA) 1.00 g (1.82 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 0.668 g (5.47 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.96 × 10 -3 g (Pt alone: ​​2.15 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.21 g of the product (compound).

[0208] The resulting compound was 1 H-NMR confirmed that the structure is represented by the following formula (XB).

[0209] [Synthesis Example 23] In the reaction vessel, the following formula (XC) 1.00 g (1.59 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 1.16 g (9.51 x 10 -3 mol), and toluene solution of chloroplatinate / vinylsiloxane complex 6.06 × 10 -3 g (as Pt alone, 1.87 × 10⁻⁶) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by vacuum distillation to obtain 1.35 g of the product (compound).

[0210] The resulting compound was 1 H-NMR confirmed that the structure is represented by the following formula (XD).

[0211] [Synthesis Example 24] In the reaction vessel, the following formula (XK) 1.00 g (2.06 × 10) of the compound represented by -3 mol), toluene 1.00 g, trimethoxysilane 2.26 g (1.84 x 10 -2mol), and 7.85 × 10¹³ toluene solution of chloroplatinate / vinylsiloxane complex -3 g (Pt alone: ​​2.43 × 10) -8 The mixture (containing mol) was aged at 80°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.42 g of the product (compound).

[0212] The resulting compound was 1 H-NMR confirmed that the structure is represented by the following formula (XL).

[0213] [Synthesis Example 25] In the reaction vessel, the following formula (XM) 1.00 g (1.57 × 10) of the compound represented by -3 mol), toluene 1.00 g, (3-isocyanatopropyl)trimethoxysilane 0.354 g (1.73 x 10 -3 The mixture (mol) was aged at 60°C for 24 hours. After that, the solvent and unreacted substances were removed by reduced pressure distillation to obtain 1.60 g of the product (compound).

[0214] The resulting compound was 1 H-NMR confirmed that the structure is represented by the following formula (XN).

[0215] Porous materials 1 to 5, shown in Table 1 below, were placed at the bottom of a cylindrical copper container (dimensions of the cylinder: outer diameter 18 mm, inner diameter 16 mm, height 7 mm, one end of the cylinder open, mass: 4.5 g). The melting point and true density of the materials constituting the porous materials are literature values, the radius, height and mass are measured values, the bottom area and volume are calculated values ​​from these, and the bulk density, porosity and void volume are calculated values ​​using the following formula: Bulk density (g / cm³) 3 )) = (mass of porous material (g)) ÷ (total volume of porous material (cm³)) 3 )) Porosity (Porosity) = 1 - ((Bulk density of porous material (g / cm³) 3 ))÷(True density of the material constituting the porous body (g / cm³) 3 ))) Void volume (Void volume (cm) 3 )) = (Volume (cm³) 3 ))×(porosity)

[0216] [Example 1] The compound obtained in Synthesis Example 1 was heated and melted under conditions of 50°C, and then 20 μL was dropped onto the porous body 1 contained in the above storage container to prepare an evaporation source for the surface treatment agent composition.

[0217] [Example 2] 20 μL of the compound obtained in Synthesis Example 2 was dropped onto a porous body 4 contained in the above-mentioned storage container to prepare an evaporation source for the surface treatment agent composition.

[0218] [Example 3] The compound obtained in Synthesis Example 3 was dissolved in dibutyl ether to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the dibutyl ether was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0219] [Example 4] The compound obtained in Synthesis Example 4 was dissolved in dibutyl ether to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 2 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the dibutyl ether was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0220] [Example 5] The compound obtained in Synthesis Example 5 was dissolved in toluene to a concentration of 10% by mass to prepare a solution, and 200 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the toluene was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0221] [Example 6] The compound obtained in Synthesis Example 6 was dissolved in isononane to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 3 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the isononane was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0222] [Example 7] The compound obtained in Synthesis Example 7 was dissolved in dibutyl ether to a concentration of 5% by mass to prepare a solution, and 400 μL of this solution was dropped onto the porous body 5 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the dibutyl ether was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0223] [Example 8] The compound obtained in Synthesis Example 8 was dissolved in propylene glycol monomethyl ether acetate to a concentration of 30% by mass to prepare a solution, and 60 μL of this solution was dropped onto the porous body 3 contained in the above storage container to create an evaporation source for the surface treatment agent composition.

[0224] [Example 9] The compound obtained in Synthesis Example 9 was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 2 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the toluene was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0225] [Example 10] The compound obtained in Synthesis Example 10 was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the toluene was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0226] [Example 11] The compound obtained in Synthesis Example 11 was dissolved in isooctane to a concentration of 10% by mass to prepare a solution, and 200 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the isooctane was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0227] [Example 12] The compound obtained in Synthesis Example 12 was dissolved in dibutyl ether to a concentration of 50% by mass to prepare a solution, and 40 μL of this solution was dropped onto the porous body 4 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the dibutyl ether was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0228] [Example 13] The compound obtained in Synthesis Example 13 was dissolved in a hexane / isooctane (mass ratio 50 / 50) mixed solution to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the hexane and isooctane were removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0229] [Example 14] The compound obtained in Synthesis Example 14 was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 3 contained in the above storage container to create an evaporation source for the surface treatment agent composition.

[0230] [Example 15] The compound obtained in Synthesis Example 15 was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 2 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the toluene was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0231] [Example 16] The compound obtained in Synthesis Example 16 was dissolved in dibutyl ether to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the dibutyl ether was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0232] [Example 17] The compound obtained in Synthesis Example 17 was dissolved in isooctane to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the isooctane was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0233] [Example 18] The compound obtained in Synthesis Example 18 was dissolved in isooctane to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container to create an evaporation source for the surface treatment agent composition.

[0234] [Example 19] The compound obtained in Synthesis Example 19 was dissolved in isooctane to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 3 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the isooctane was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0235] [Example 20] The compound obtained in Synthesis Example 20 was dissolved in isooctane to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the isooctane was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0236] [Example 21] The compound obtained in Synthesis Example 21 was dissolved in butyl acetate to a concentration of 10% by mass to prepare a solution, and 200 μL of this solution was dropped onto the porous body 5 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the butyl acetate was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to prepare an evaporation source for the surface treatment agent composition.

[0237] [Example 22] The compound obtained in Synthesis Example 22 was dissolved in ethylcyclohexane to a concentration of 10% by mass to prepare a solution, and 200 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the ethylcyclohexane was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0238] [Example 23] The compound obtained in Synthesis Example 23 was dissolved in dibutyl ether to a concentration of 10% by mass to prepare a solution, and 200 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the dibutyl ether was removed by reducing the pressure at a temperature of 25°C and a pressure of 667 Pa (5 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0239] [Example 24] The compound obtained in Synthesis Example 24 was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 2 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the toluene was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to create an evaporation source for the surface treatment agent composition.

[0240] [Example 25] The compound obtained in Synthesis Example 25 was dissolved in butyl acetate to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 contained in the above storage container. The porous body was placed in a vacuum desiccator, and the butyl acetate was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to prepare an evaporation source for the surface treatment agent composition.

[0241] [Example 26] A mixture was prepared by adding 5 parts by mass of tetramethoxysilane to 100 parts by mass of the compound obtained in Synthesis Example 1. The mixture was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of the solution was dropped onto the porous body 1 contained in the above storage container to create an evaporation source for the surface treatment agent composition.

[0242] [Example 27] 10 parts by mass of methyltrimethoxysilane was added to 100 parts by mass of the compound obtained in Synthesis Example 22 to prepare a mixture. The mixture was dissolved in ethylcyclohexane to a concentration of 10% by mass to prepare a solution, and 200 μL of this solution was dropped onto the porous body 1 accommodated in the above storage container to prepare a surface treatment agent composition evaporation source.

[0243] [Comparative Example 1] A compound represented by the following formula was dissolved in toluene to a concentration of 20% by mass to prepare a solution, and 100 μL of this solution was dropped onto the porous body 1 accommodated in the above storage container. The porous body was placed in a vacuum desiccator and the toluene was removed by reducing the pressure at a temperature of 25°C and a pressure of 133 Pa (1 torr) for 30 minutes to prepare a surface treatment agent composition evaporation source.

[0244] [Comparative Example 2] After heating and melting the compound obtained in Synthesis Example 1 under the condition of 50°C, 20 μL was stored in the above copper storage container (using only the copper storage container without using a porous body).

[0245] [Comparative Example 3] Without a surface treatment agent composition.

[0246] In the surface treatment agent composition evaporation sources prepared in Examples 1 to 27 and Comparative Example 1, the filling amounts of the compound or the surface treatment agent composition were all 0.1 to 95% by volume.

[0247] On glass (Corning Gorilla Glass (product number: Gorilla III, size: 100 mm × 50 mm × 0.7 mm)) with SiO2 coated on the outermost surface of the cured film to a thickness of 10 nm, vacuum evaporation (device: manufactured by Optran, product number: OTF - C1300) was performed using each of the surface treatment agent composition evaporation sources or compounds prepared in the above Examples and Comparative Examples (treatment conditions: pressure: 2.0×10 -2 Pa, heating temperature: 700°C), and it was cured for 1 hour in an atmosphere of 80°C and 80% relative humidity, and further for 12 hours in an atmosphere of 25°C and 50% relative humidity to form a cured film with a film thickness of 3 to 5 nm.

[0248] The stability of the film deposition rate was evaluated by visually observing the surface appearance of the cured film. Regarding the stability of the film deposition rate, the presence of minute protrusions originating from minute droplets caused by bumping of the surface treatment agent on the surface of the cured film was considered poor, while the absence of minute protrusions originating from minute droplets was considered good. The results are shown in Table 2.

[0249] The water repellency, slipperiness, dirt-wiping properties, and abrasion resistance of the glass with a hardened coating were evaluated using the method described below. For Comparative Example 3, a glass (Corning Gorilla Glass, part number: Gorilla III, size: 100 mm x 50 mm x 0.7 mm) with no surface treatment, but coated with SiO2 to a thickness of 10 nm, was used as is and evaluated in the same manner.

[0250] Evaluation of Water Repellency The contact angle (water repellency) of the hardened film formed on the glass prepared as described above was measured with a Drop Master contact angle meter (manufactured by Kyowa Interface Science Co., Ltd.) (droplet: 2 μL, temperature: 25°C, relative humidity: 40%). The results are shown in Table 2. In this invention, a good (water-repellent) water contact angle was defined as 90° or higher.

[0251] Evaluation of Slipperiness The slipperiness of the glass with the hardened coating prepared as described above was evaluated by assessing the coefficient of dynamic friction with the nonwoven fabric using the method described below. The coefficient of dynamic friction of the glass with the hardened coating with the nonwoven fabric was measured in accordance with ASTM D1894 using a surface properties measuring instrument TYPE: 14FW (manufactured by Shinto Kagaku Co., Ltd.) under the conditions of a load of 100 gf and a tensile speed of 500 mm / min. The results (coefficient of dynamic friction) are shown in Table 2. [Slipperiness Evaluation Conditions] Load: 100 gf Stroke: 100 mm Contact area: 1 × 3 cm 2 Nonwoven fabric: BEMCOT (manufactured by Asahi Kasei Corporation)

[0252] Evaluation of stain removal properties A 2 cm straight line was drawn on the glass with the hardened film prepared as described above using a Hi-Mackie (manufactured by Zebra Co., Ltd.), the ink was dried, and then the surface was wiped with tissue paper. The number of rubs required to remove the ink was evaluated according to the following criteria. The results are shown in Table 2. [Stain Removal Properties Evaluation Criteria] A: 4 rubs or less B: 5 rubs or more C: Ink cannot be wiped off

[0253] Abrasion Resistance Evaluation The glass with the hardened coating prepared as described above was rubbed every 500 times using a rubbing tester (manufactured by Shinto Kagaku Co., Ltd.) under the following conditions. The contact angle (water repellency) of the hardened coating with water was measured in the same manner as described above, and the number of times the water contact angle fell below 80° was recorded to evaluate abrasion resistance. The test environment conditions were 25°C and 40% relative humidity. The results (number of times the water contact angle fell below 80°) are shown in Table 2. [Steel Wool Abrasion Resistance Test Conditions] Steel wool: Bonster #0000 Contact area: 1 cm 2 Distance traveled (one way): 40 mm; Speed: 4,800 mm / min; Load: 500 gf / cm 2

[0254] The cured films of Examples 1 to 27 exhibited good water repellency, slipperiness, dirt-wiping properties, and abrasion resistance. The cured film of Comparative Example 1, which used a compound with a different structure from the organosilane compound (α) of the present invention, showed good initial water repellency, slipperiness, and dirt-wiping properties, but exhibited low abrasion resistance. The cured film of Comparative Example 2, which did not use a porous material, showed good water repellency, slipperiness, dirt-wiping properties, and abrasion resistance, but because it did not use a porous material, the film formation rate could not be controlled, and its abrasion resistance was inferior to that of Example 1, which used a similar compound. Comparative Example 3 was a glass substrate without a cured film, so all properties were low, confirming the effects of the Examples. As described above, with the surface treatment agent composition evaporation source of the Examples, it was possible to obtain a cured film with excellent water repellency, slipperiness, dirt-wiping properties, and abrasion resistance at a high level in vacuum deposition coating.

[0255]

[0256] Evaluation of Chemical Resistance The glass with the hardened coating prepared as described above was immersed in a storage container containing an alkaline solution and left standing in a constant-temperature oven. The glass immersed in the storage container was removed every hour, the entire surface of the glass was washed with pure water, and then dried with dry air. After that, the contact angle (water repellency) of the hardened coating with respect to water was measured in the same manner as described above for the area immersed in the alkaline solution. This operation was repeated, and the immersion time at which the water contact angle became less than 80° was confirmed. The results (chemical resistance (immersion time at which the water contact angle became less than 80°)) are shown in Table 3. The chemical resistance test conditions are as follows. Furthermore, good chemical resistance in this invention means that in the chemical resistance test described above, the immersion time at which the water contact angle of the formed hardened coating becomes less than 80° is 2 hours or more, more preferably 4 hours or more, and most preferably 5 hours or more. [Chemical Resistance Test Conditions] Chemical: 30% by mass sodium hydroxide aqueous solution Temperature: 55°C

[0257]

[0258] The cured coatings in the examples exhibited water repellency and good chemical resistance due to the presence of hydrocarbon chains with a predetermined number of carbon atoms at the molecular chain ends of the compounds used. In particular, the compounds in Examples 6, 9, 13, 16, 19, 20, 22, and 23, which have two hydrocarbon chains with a predetermined number of carbon atoms at the molecular chain ends, with a long hydrocarbon chain length of 13 or more carbon atoms, and which do not contain ester, urethane, or -O-C(=O)- structures, exhibited an effect of preventing chemical penetration into the substrate adhesion area, resulting in a long durability time.

[0259] 1. Porous body 2. Surface treatment agent composition 3. Storage container 10. Evaporation source for surface treatment agent composition

Claims

1. A surface treatment agent composition evaporation source comprising a porous body having a plurality of voids or cavities inside, wherein the surface treatment agent composition is present in the voids or cavities, wherein the surface treatment agent composition comprises a nonfluorine-based organosilane compound (α) and / or a partially reacted condensate thereof having at least one linear, branched, or cyclic monovalent hydrocarbon group having 3 to 60 carbon atoms and a reactive silyl group, and may contain at least one selected from oxygen atoms, sulfur atoms, nitrogen atoms, and silicon atoms, and is made of a material that does not contain fluorine atoms, and the porosity of the porous body is 0.100 or more and 0.995 or less.

2. The evaporation source for the surface treatment agent composition according to claim 1, wherein the porosity of the porous body is 0.20 or more and 0.99 or less.

3. The evaporation source for the surface treatment agent composition according to claim 1, wherein the melting point of the porous material at 1,013 hPa is 800°C or higher.

4. The evaporation source for the surface treatment agent composition according to claim 1, wherein the material of the porous body is a ceramic material, a heat-resistant glass material, a carbon material, an organic material, or a metallic material.

5. The surface treatment agent composition evaporation source according to claim 1, further comprising a storage container having an opening and containing the porous body, made of a ceramic material, heat-resistant glass material, carbon material, organic material, or metal material having a melting point of 800°C or higher at 1,013 hPa.

6. The surface treatment agent composition evaporation source according to claim 1, wherein the organosilane compound (α) has a monovalent hydrocarbon group that is linear or branched.

7. The surface treatment agent composition evaporation source according to claim 1, wherein the organosilane compound (α) has two or more monovalent hydrocarbon groups.

8. The surface treatment agent composition evaporation source according to claim 7, wherein in the organosilane compound (α) above, two or more monovalent hydrocarbon groups are bonded to the same atom.

9. The surface treatment agent composition evaporation source according to claim 8, wherein in the organosilane compound (α) above, the same atom to which two or more monovalent hydrocarbon groups are bonded is a carbon atom, a nitrogen atom, or a silicon atom.

10. The surface treatment agent composition evaporation source according to claim 7, wherein the organosilane compound (α) has two or more identical monovalent hydrocarbon groups.

11. The surface treatment agent composition evaporation source according to claim 1, wherein the organosilane compound (α) has 8 to 40 carbon atoms in the monovalent hydrocarbon group.

12. The above organosilane compound (α) is the following general formula (1) (In the formula, R 1 R may independently contain at least one selected from oxygen, sulfur, nitrogen, and silicon atoms, and may be linear, branched, cyclic, or a combination thereof, and is a monovalent hydrocarbon group having 3 to 32 carbon atoms, 2 The surface treatment agent composition evaporation source according to claim 1, wherein k1 is a hydrogen atom, halogen atom, hydroxyl group, siloxy group, amino group, thiol group, or a monovalent hydrocarbon group having 1 or 2 carbon atoms; U is a carbon atom, silicon atom, nitrogen atom, or a trivalent or tetravalent organic group; V is independently a single bond, or a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, and sulfur atoms; Z is independently a single bond, carbon atom, silicon atom, nitrogen atom, sulfur atom, or a 3- to 8valent organic group; Y is independently a divalent hydrocarbon group which may contain at least one selected from oxygen, nitrogen, sulfur, and silicon atoms; A is independently a monovalent reactive silyl group; k1 is 2 or 3; k2 is 0 or 1; k3 is 1 or 2; k1 + k2 + k3 is 3 or 4; and m is an integer from 1 to 7.

13. In the above equation (1), R 1 However, the following formula (In the formula, R A Q is a monovalent hydrocarbon group having 3 to 32 carbon atoms, which may be linear, branched, cyclic, or a combination thereof, and Q is independently an oxygen atom, a sulfur atom, a divalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a diorganosilylene group, a sylalkylene structure or sylarylene structure, and a linear or branched or cyclic divalent organopolysiloxane residue having 2 to 10 silicon atoms, or having 3 to 10 silicon atoms, a carbonyl (ketone) group, an ester group, a carbonate group, a sulfinyl group, a sulfonyl group, a thioester group, a thiocarbonate group, a thiocarbamate group, an amino group, an amide group, or a carbamate group. Q' is a divalent group selected from the group consisting of a urea group and a divalent nitrogen-containing heterocyclic group, Q' is independently a trivalent group selected from the group consisting of a nitrogen atom, a trivalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic trivalent organopolysiloxane residue having 2 to 10 silicon atoms, a trivalent amide group, and a trivalent nitrogen-containing heterocyclic group, Q'' is independently a tetravalent group selected from the group consisting of a silicon atom, a tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, and R B R is a divalent hydrocarbon group having 1 to 29 carbon atoms, which may be independently single-bonded, linear, branched, or cyclic, C R is independent A The surface treatment agent composition evaporation source according to claim 12, which is any group represented by (or a hydrogen atom, where p is an integer from 0 to 10, provided that the total number of carbon atoms in each structure is 32 or less).

14. In the above formula (1), A is the following general formula (2) or (3) (In the formula, R is independently an alkyl group having 1 to 4 carbon atoms or a phenyl group, X is independently a hydroxyl group or a hydrolyzable group, and n is an integer from 1 to 3.) The surface treatment agent composition evaporation source according to claim 12, wherein the group is represented by (wherein n'' is a number from 0 to 3, and n'' is (3 - n'') / 2).

15. The surface treatment agent composition evaporation source according to claim 14, wherein in formula (2) above, X is selected from the group consisting of a hydroxyl group, an alkoxy group having 1 to 10 carbon atoms, an alkoxyalkoxy group having 2 to 10 carbon atoms, an acyloxy group having 1 to 10 carbon atoms, an alkenyloxy group having 2 to 10 carbon atoms, a halogen group, and a dialkylamino group having 2 to 10 carbon atoms.

16. The surface treatment agent composition evaporation source according to claim 12, wherein Y is a group selected from the group consisting of an alkylene group having 1 to 20 carbon atoms which may contain at least one selected from oxygen atoms, nitrogen atoms, and sulfur atoms; an alkylene group having 1 to 10 carbon atoms which includes an arylene group having 6 to 8 carbon atoms; a divalent group in which alkylene groups having 1 to 8 carbon atoms are bonded to each other via a diorganosilylene group, a sylalkylene structure, a sylarylene structure, or a nitrogen-containing heterocyclic group; and a divalent group in which an alkylene group having 1 to 10 carbon atoms is bonded to the binding site of a linear or branched or cyclic organopolysiloxane residue having 2 to 10 silicon atoms.

17. In the above formula (1), Z is a single bond, or a carbon atom, a silicon atom, a nitrogen atom, a trivalent or tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, -SiR 3 = (R 3 is a hydroxyl group, an alkyl group having 1 to 3 carbon atoms, or a trivalent group represented by an alkoxy group having 1 to 3 carbon atoms), -CR 4 = (R 4 is a hydrogen atom, a hydroxyl group, or a trivalent group represented by an alkyl group having 1 to 3 carbon atoms), a linear organopolysiloxane residue having 2 to 10 silicon atoms or a branched or cyclic trivalent to octavalent organopolysiloxane residue having 3 to 10 silicon atoms, a trivalent amide group, a trivalent carbamate group, a trivalent or tetravalent urea group, and a trivalent to octavalent nitrogen-containing heterocyclic group-containing group The evaporation source of the surface treatment agent composition according to claim 12, which is a trivalent to octavalent group selected from the group consisting of 18. The evaporation source for a surface treatment agent composition according to claim 12, wherein in formula (1) above, U is a trivalent or tetravalent group selected from the group consisting of a carbon atom, a silicon atom, a nitrogen atom, a trivalent or tetravalent cyclic hydrocarbon group having 6 to 8 carbon atoms, a linear or branched or cyclic trivalent or tetravalent organopolysiloxane residue having 2 to 10 silicon atoms, a trivalent amide group, a trivalent carbamate group, a trivalent or tetravalent urea group, and a trivalent or tetravalent nitrogen-containing heterocyclic group.

19. The surface treatment agent composition evaporation source according to claim 1, wherein the surface treatment agent composition contains a solvent.

20. The above surface treatment agent composition further comprises the following general formula (5) SiR 5 n1-4 X 1 n1 (5) (wherein, R 5 X is independently a hydrogen atom or a monovalent hydrocarbon group having 1 or 2 carbon atoms, 1 The surface treatment agent composition evaporation source according to claim 1, wherein is independently a hydroxyl group or a hydrolyzable group, and n1 is an integer from 1 to 4.

21. The evaporation source for a surface treatment agent composition according to claim 20, wherein the silane compound represented by the above general formula (5) is selected from the following compounds: Si(OCH3)4, Si(OC2H5)4, Si(OC3H7)4, Si(OC4H9)4, CH2=CHSi(OCH3)3, CH2=CHSi(OC2H5)3, CH2=CHSi(OC3H7)3, CH2=CHSi(OC4H9)3, CH2=CHSi(OCOCH3)3, CH3Si(OCH3)3, CH3Si(OC2H5)3, CH3Si(OC3H7)3, CH3Si(OC4H9)3, CH3Si(OCOCH3)3.

22. The surface treatment agent composition evaporation source according to claim 1, wherein the surface treatment agent composition further contains at least one non-fluorine material selected from the group consisting of paraffin oil, polyol ester oil, silicone oil, catalyst, transition metal, halide ion, silane coupling agent, and compounds containing atoms having lone pairs of electrons in their molecular structure.

23. Evaporation source for a surface treatment agent composition according to any one of claims 1 to 22, used for forming a hardened film on the surface of an optical component.

24. Evaporation source for a surface treatment agent composition according to any one of claims 1 to 22, used for forming a cured film on the surface of a display.

25. Evaporation source for a surface treatment agent composition according to any one of claims 1 to 22, used for forming a hardened film on the surface of a lens.

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