Cleaning device, cleaning system, and cleaning method

Abstract

Embodiments of the present application provide a cleaning device, a cleaning system, and a cleaning method. The cleaning device is used for working in conjunction with a heating assembly and cleaning the surface of the heating assembly, and the cleaning device comprises a first electrode. The first electrode is electrically connected to a high-voltage output terminal of a power supply assembly so as to generate plasma, and the plasma forms a jet to clean the surface of the heating assembly.

Description

A cleaning device, a cleaning system and a cleaning method thereof

[0001] Cross-references to related applications

[0002] This application is based on and claims priority to Chinese Patent Application No. 2024116038498, filed on November 11, 2024, the entire contents of which are incorporated herein by reference. Technical Field

[0003] This application relates to the field of aerosol generation device technology, and in particular to a cleaning device, cleaning system and cleaning method thereof. Background Technology

[0004] In related technologies, aerosol generating articles used with aerosol generating devices include an aerosol forming matrix. The heating element of the aerosol generating device employs central heating, with the central heating element inserted into the aerosol generating matrix for heating. When the aerosol forming matrix generates aerosols during heating, non-volatile organic residues from the aerosol forming matrix remain and accumulate on the surface of the heating element. Therefore, the surface of the central heating element needs to be cleaned. Cleaning of the central heating element is mainly achieved through physical scrubbing, however, these methods are ineffective. Physical scrubbing can easily damage the heating element of the heating assembly and is difficult to clean thoroughly, making the cleaning process inconvenient for users. Summary of the Invention

[0005] This application aims to at least partially address one of the technical problems in the related art.

[0006] Therefore, one embodiment of this application provides a cleaning device for cleaning the surface of a heating element, the cleaning device comprising:

[0007] The first electrode is electrically connected to the high-voltage output terminal of the power supply component to generate plasma, which forms a jet to clean the surface of the heating component.

[0008] In one embodiment, the voltage at the high-voltage output terminal is greater than or equal to 1000V.

[0009] In one embodiment, the cleaning device further includes an insulating shell having a receiving cavity. When the heating element is inserted into the receiving cavity, a jet channel is formed between the cavity wall of the receiving cavity and the heating element, allowing the plasma to enter the jet channel and clean the surface of the heating element.

[0010] In one embodiment, the cleaning device further includes an airflow generating component for generating an airflow and directing the plasma within the jet channel.

[0011] In one embodiment, the jet channel has a first opening and a second opening opposite each other, at least a portion of the airflow generating component and the first electrode are disposed at one end near the first opening, and the plasma flows from the first opening toward the second opening.

[0012] In one embodiment, the cleaning device further includes a mounting base, at least a portion of the airflow generating component is disposed on the mounting base, the insulating shell is a tube, the receiving cavity is formed inside the tube, the first opening and the second opening are respectively located at opposite ends of the tube, and the mounting base is disposed at the first opening.

[0013] In one embodiment, a limiting member is provided on the side of the mounting base facing the first opening, the limiting member being used to limit the maximum length of the heating component inserted into the cleaning device.

[0014] In one embodiment, the first electrode is disposed on the wall of the tube body along the circumference of the tube body, or the first electrode is an annular electrode disposed on the wall of the tube body.

[0015] In one embodiment, the cleaning device further includes a second electrode, which is electrically connected to the two poles of the power supply component, respectively. The second electrode is disposed on the limiting member, and the second electrode is spaced apart from the first electrode and plasma can be generated between them.

[0016] In one embodiment, the projections of the first electrode and the second electrode onto the axis of the tube body at least partially overlap along the radial direction of the tube body.

[0017] In one embodiment, the cleaning device includes a second electrode, which is electrically connected to the two poles of the power supply assembly, respectively. The second electrode is disposed on the mounting base and extends along the axial direction of the tube body. The second electrode is located on the side of the first electrode away from the second opening, and the distance between the second electrode and the first electrode is less than or equal to 10 mm.

[0018] In one embodiment, the cleaning device further includes an insulating member, at least a portion of which is disposed within the space between the first electrode and the second electrode, so that a dielectric barrier discharge is generated when the first electrode and the second electrode are energized; or, the second electrode is disposed within the limiting member, at least a portion of which is located between the first electrode and the second electrode, so that a dielectric barrier discharge is generated when the first electrode and the second electrode are energized.

[0019] In one embodiment, the cleaning device further includes an insulating member that at least covers the opposing surfaces of the first electrode and the second electrode, and / or the insulating member at least covers the opposing surfaces of the second electrode and the first electrode, so that dielectric barrier discharge is generated when the first electrode and the second electrode are energized.

[0020] In one embodiment, the end of the second electrode facing the second opening is a pointed tip.

[0021] In one embodiment, the airflow generating assembly includes a fan disposed at the first opening, the fan being mounted on the mounting base such that airflow generated by the fan flows through the first electrode, and / or airflow generated by the fan flows toward the receiving cavity.

[0022] In one embodiment, the cleaning device includes a guide member with a flow guiding cavity disposed between the mounting base and the pipe body, and the flow guiding cavity communicates with the first opening. The cross-sectional area of ​​the flow guiding cavity gradually decreases from the side closer to the fan to the side away from the fan.

[0023] In one embodiment, the cleaning device includes a plurality of nozzle assemblies, which are spaced apart on the cavity wall of the receiving cavity. Each nozzle assembly contains a first electrode, and the nozzle assembly can spray plasma generated by the first electrode into the receiving cavity.

[0024] In one embodiment, the distance between the first electrode and the second electrode is greater than or equal to 0.2 mm and less than or equal to 3 mm.

[0025] Another embodiment of this application provides a cleaning method, which includes the following steps:

[0026] At least a portion of the heating element is inserted into the receiving cavity of the cleaning device;

[0027] The power supply assembly is controlled to supply power to the first electrode to generate plasma;

[0028] The airflow generation component is activated to guide the plasma to move directionally within the containment cavity, thereby cleaning the surface of the heating component.

[0029] Another embodiment of this application provides a cleaning system, including an aerosol generating device and any of the above-described cleaning devices. The aerosol generating device includes a heating element, and the cleaning device generates a plasma jet and cleans the surface of the heating element.

[0030] This application provides a cleaning device, a cleaning system, and a cleaning method thereof. The cleaning device is used to clean the surface of a heating element. The cleaning device includes a first electrode, which is electrically connected to the high-voltage output terminal of a power supply component to generate plasma. The plasma forms a jet to clean the surface of the heating element. Thus, on the one hand, the first electrode electrically connected to the power supply component generates plasma, and the plasma jet effectively removes dirt formed by atomized deposits on the surface of the heating element, improving cleaning efficiency and enhancing the cleaning effect. Attached Figure Description

[0031] Figure 1 is a schematic diagram of the cleaning device according to the first embodiment of this application;

[0032] Figure 2 is a cross-sectional view of the cleaning device in Figure 1;

[0033] Figure 3 is a cross-sectional view of the cleaning device according to the second embodiment of this application;

[0034] Figure 4 is a cross-sectional view of the cleaning device according to the third embodiment of this application;

[0035] Figure 5 is a cross-sectional view of the cleaning device according to the fourth embodiment of this application;

[0036] Figure 6 is a structural schematic diagram of the cleaning device according to the fifth embodiment of this application;

[0037] Figure 7 is a cross-sectional view of the cleaning device in Figure 6;

[0038] Figure 8 is a flowchart of the cleaning method of the cleaning device according to the sixth embodiment of this application. Detailed Implementation

[0039] In this application, the terms "extension direction," "radial," or "positional relationship" are based on the orientation or positional relationship shown in Figure 1. It should be understood that these orientational terms are only for the convenience of describing this application and simplifying the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as limiting this application.

[0040] One embodiment of this application provides a cleaning device, as shown in Figures 1 and 2. The cleaning device is used to clean the surface of the heating component 20 and includes a first electrode 10.

[0041] The first electrode 10 is electrically connected to the high-voltage output terminal of the power supply component to generate plasma, and the plasma forms a jet to clean the surface of the heating component 20.

[0042] Specifically, the cleaning device of this application is used to clean the outer surface of the heating component 20.

[0043] For example, the heating element 20 is the heating element 20 of an aerosol generating device. The specific structural form of the heating element 20 is not limited; for example, the heating element 20 is a central heating element.

[0044] For ease of description, this application uses the heating element 20 as an example of a heating element 20 that is centrally heated in an aerosol generating device.

[0045] The heating element 20 can be a plasma heating element 20, or other types of heating elements 20, such as a resistive heating element or an electromagnetic heating element.

[0046] The first electrode 10 is electrically connected to a power supply assembly (not shown in the figure). The power supply assembly can provide high voltage to the first electrode 10, thereby generating plasma through discharge forms such as corona discharge.

[0047] The type of power supply component is not limited.

[0048] For example, the power supply component can be a high-voltage DC power supply or a high-voltage AC power supply.

[0049] The voltage, frequency, and other parameters of the power supply components can be set according to actual conditions.

[0050] For example, the voltage at the high-voltage output terminal of the power supply component is greater than or equal to 1000V. For instance, the voltage at the high-voltage output terminal of the power supply component is 1kV, 3kV, 5kV, or 10kV, 12kV, 15kV, 20kV.

[0051] It should be noted that when one output terminal of the power supply component is electrically connected only to the first electrode 10, the voltage of the high-voltage output terminal of the power supply component is greater than or equal to 10kV, thereby enabling plasma to be generated at the first electrode 10.

[0052] For example, a power supply component generates high-voltage alternating current with a frequency greater than or equal to 50 kHz and less than or equal to 200 kHz. For instance, the frequency of the high-voltage alternating current could be 50 kHz, 100 kHz, 150 kHz, or 200 kHz.

[0053] It should be noted that plasma is a state of matter containing a large number of charged particles and neutral atoms and molecules, and maintaining overall electrical neutrality. Plasma can be generated by the ionization of gas under the influence of an electric field.

[0054] Specifically, there are no restrictions on how plasma is generated. For example, a plasma arc can be generated by breaking down air (or other electrically neutral gases, such as nitrogen or argon) through a high-voltage discharge. Another example is the generation of DBD plasma through dielectric barrier discharge (DBD).

[0055] It should be noted that the cleaning device is used in conjunction with the aerosol generating device to clean the surface of the heating element 20 of the aerosol generating device. The specific configuration of the power supply component is not limited.

[0056] For example, the power supply component is a power supply structure within the aerosol generating device. When the cleaning device cooperates with the heating component 20, the power supply component of the aerosol generating device supplies power to the first electrode 10, thereby cleaning the surface of the heating component 20.

[0057] For example, the power supply component is a built-in power supply structure of the cleaning device. When the cleaning device is used in conjunction with the heating component 20, the built-in power supply component of the cleaning device can supply power to the first electrode 10, thereby cleaning the surface of the heating component 20.

[0058] The structure of the first electrode 10 is not limited.

[0059] For example, the first electrode 10 is a ring electrode.

[0060] For example, the first electrode 10 is a plurality of circumferentially symmetrical sheet electrodes.

[0061] For example, the first electrode 10 is a plurality of circumferentially symmetrical strip electrodes.

[0062] For example, the first electrode 10 is a plurality of circumferentially symmetrical block electrodes.

[0063] The cleaning device of this application embodiment is used to clean the surface of a heating element 20. The cleaning device includes a first electrode 10. The first electrode 10 is electrically connected to the high-voltage output terminal of a power supply component to generate plasma, and the plasma forms a jet to clean the surface of the heating element 20. Thus, on the one hand, the first electrode 10, electrically connected to the power supply component, generates plasma, and the plasma jet effectively removes dirt formed by atomized deposits on the surface of the heating element 20, improving cleaning efficiency and enhancing cleaning effect. On the other hand, plasma cleaning is relatively gentle and will not adversely affect the structure and performance of the heating element 20, thereby extending the service life of the heating element 20.

[0064] In one embodiment, as shown in Figures 1 and 2, the cleaning device further includes an insulating shell 30 with a receiving cavity 30a. When cleaning is required, the heating element 20 can be inserted into the receiving cavity 30a. A jet channel is formed between the cavity wall of the receiving cavity 30a and the heating element 20, allowing plasma to enter the jet channel and clean the surface of the heating element 20. Thus, the plasma flows within the jet channel to thoroughly clean the outer surface of the heating element 20, thereby improving the cleaning effect.

[0065] Specifically, the size of the insulating shell 30 is not limited, as long as the cross-sectional dimension of its receiving cavity 30a is larger than the cross-sectional dimension of the heating element 20.

[0066] For example, the difference in cross-sectional dimensions between the receiving cavity 30a and the heating element 20 is greater than or equal to 0.2 mm and less than or equal to 3 mm. For instance, the difference in cross-sectional dimensions between the receiving cavity 30a and the heating element 20 can be 0.2 mm, 1 mm, 2 mm, or 3 mm. Controlling the cross-sectional dimension difference within the above range allows for better plasma flow along the jet channel. If the size of the receiving cavity 30a is too large, the directional movement effect and distance of the plasma will be limited; if the size of the receiving cavity 30a is too small, it will affect the insertion of the heating element 20. Therefore, controlling it within the above-mentioned size range is advantageous.

[0067] When the heating element 20 is inserted into the receiving cavity 30a, the minimum distance between the heating element 20 and the inner wall of the receiving cavity 30a is greater than or equal to 0.1 mm and less than or equal to 3 mm.

[0068] The material of the insulating shell 30 is not limited.

[0069] For example, the insulating shell 30 is made of quartz. The insulating shell 30 may be a quartz tube with an opening at at least one end.

[0070] The jet channel refers to the channel formed between the cavity wall of the cavity 30a and the heating component 20 when the heating component 20 is inserted into the cavity 30a, which allows plasma to flow.

[0071] It is understandable that the heating element 20 is disposed within the receiving cavity 30a, and the jet channel is an annular channel surrounding the heating element 20.

[0072] In one embodiment, as shown in Figures 1 and 2, the cleaning device further includes an airflow generating component 40, which generates airflow and drives the plasma to move directionally within the jet channel. Thus, propelled by the airflow, the plasma can more efficiently reach all parts of the heating component that need cleaning, thereby achieving comprehensive cleaning of the heating component and improving the cleaning effect.

[0073] Specifically, the airflow generating component 40 can guide the plasma to move directionally within the jet channel to clean the heating component 20.

[0074] In one embodiment, as shown in Figures 1 and 2, the insulating shell 30 is a quartz tube open at both ends, and the jet channel has a first opening 30b and a second opening 30c opposite to each other. At least a portion of the airflow generating component 40 and the first electrode 10 are disposed near the end close to the first opening 30b, and the plasma flows from the first opening 30b to the second opening 30c. Thus, the airflow generated by the airflow generating component 40 drives the plasma to move from the first opening 30b to the second opening 30c, reducing disordered plasma diffusion and thereby improving the cleaning effect.

[0075] Specifically, the structure of the airflow generating component 40 is not limited. For example, the airflow generating component 40 includes a fan 41.

[0076] The plasma moves directionally within the jet channel. In fact, guided by the gas flow generating component 40, the plasma moves from the first opening 30b to the second opening 30c, and the jet channel is also one of the factors influencing the directional movement of the plasma.

[0077] In one embodiment, referring to Figures 1 and 2, the cleaning device further includes a mounting base 90. At least a portion of the airflow generating assembly 40 is disposed on the mounting base 90. The insulating shell 30 is a tube with openings at both ends, and a receiving cavity 30a is formed inside the tube. A first opening 30b and a second opening 30c are located at opposite ends of the tube, respectively. The mounting base 90 is disposed at the first opening 30b. Thus, the mounting base 90 allows the airflow generating assembly 40 to be stably positioned near the end close to the first opening 30b, thereby making the airflow generated by the airflow generating assembly 40 more stable, and consequently making the flow of the plasma jet more stable and reliable, improving the cleaning effect.

[0078] Specifically, the structure of the mounting base 90 is not limited, as long as it can fix the airflow generating component 40.

[0079] The cavity 30a refers to the internal space of the tube body, which is used to house the heating element 20, and the plasma jet can move in the cavity 30a.

[0080] The position of the first electrode 10 in the tube is not limited.

[0081] For example, the first electrode 10 is disposed on the tube wall along the circumference of the tube body, or on the side of the mounting base 90 near the tube body.

[0082] The structure of the first electrode 10 is not limited.

[0083] For example, the first electrode 10 is a ring electrode, which is disposed on the tube wall of the tube body.

[0084] In one embodiment, referring to Figures 2, 3, and 4, a limiting member 50 is provided on the side of the mounting base 90 facing the first opening 30b. The limiting member 50 is used to limit the maximum length of the heating element 20 inserted into the cleaning device. Thus, by limiting the maximum length of the heating element 20 inserted into the cleaning device by the limiting member 50, the heating element 20 and the first electrode 10 maintain a relatively stable and appropriate positional relationship. This allows the plasma to act more effectively on the surface of the heating element 20, thereby improving the cleaning effect of the cleaning device on the heating element 20.

[0085] Specifically, the first electrode 10 is electrically connected to the power supply component, which applies a DC high voltage to the first electrode 10, causing the electric field strength near the side of the first electrode 10 close to the receiving cavity 30a to exceed the breakdown voltage of air, thereby forming corona discharge plasma. At the same time, under the action of the jet generating component, the plasma extends towards the heating component 20 to form a jet, which covers the outer surface of the heating component 20, thereby achieving a cleaning effect.

[0086] The limiting component 50 is made of insulating material.

[0087] For example, the material type of the limiting component 50 is quartz, ceramic, plastic, or rubber.

[0088] The cross-sectional dimension of the limiting member 50 is smaller than the cross-sectional dimension of the receiving cavity 30a and the cross-sectional area of ​​the first opening 30b, so as to avoid the limiting member 50 blocking the first opening 30b.

[0089] In one embodiment, referring to Figures 2, 3, 4, and 5, the cleaning device further includes a second electrode 60. The second electrode 60 and the first electrode 10 are electrically connected to the two poles of the power supply component, respectively. The second electrode 60 is disposed on the limiting member 50, and the second electrode 60 and the first electrode 10 are spaced apart, allowing plasma to be generated between them. Thus, by placing the second electrode 60 on the limiting member 50, the limiting member 50 can stabilize the position of the second electrode 60, thereby enabling the second electrode 60 to cooperate with the first electrode 10 to more effectively generate plasma, thereby improving the cleaning effect.

[0090] Specifically, the distance between the second electrode 60 and the first electrode 10 is not limited.

[0091] For example, the distance between the first electrode 10 and the second electrode 60 is greater than or equal to 0.2 mm and less than or equal to 3 mm. For instance, the distance between the first electrode 10 and the second electrode 60 can be 0.2 mm, 1 mm, 2 mm, or 3 mm. This allows for better plasma flow along the jet channel.

[0092] It should be noted that the power supply component is electrically connected to the first electrode 10 and the second electrode 60 respectively to generate an electric arc plasma. At this time, the voltage at the high-voltage output terminal of the power supply is greater than or equal to 5kV. For example, the voltage at the high-voltage output terminal of the power supply component is 5kV or 10kV. After the electric arc plasma is formed, the power supply component maintains the voltage at the high-voltage output terminal of the electric arc plasma to be greater than or equal to 1000V.

[0093] It should be noted that the first electrode 10 and the second electrode 60 can generate plasma in any way, such as dielectric barrier discharge or by breaking down air to generate a plasma arc.

[0094] For example, no insulating structure is provided between the first electrode 10 and the second electrode 60. Therefore, when the first electrode 10 and the second electrode 60 are connected to a power source, and the voltage of the power supply component is sufficiently high, high voltage is applied to the first electrode 10 and the second electrode 60, causing the gap between them to be broken down by high-voltage discharge, resulting in the generation of an electric arc plasma. Driven by the jet generated by the jet generation component, the electric arc plasma cleans the heating component 20. In this embodiment, the power supply component can be a high-voltage DC power supply or a high-voltage AC power supply.

[0095] For example, referring to Figure 3, the cleaning device also includes an insulating member 70, at least a portion of which is disposed within the space between the first electrode 10 and the second electrode 60, so that a dielectric barrier discharge is generated when the first electrode 10 and the second electrode 60 are energized. Thus, the insulating member 70 generates a large amount of plasma through the dielectric barrier discharge, thereby improving the cleaning effect.

[0096] It should be noted that dielectric barrier discharge (DBD) involves applying a strong alternating voltage between two electrodes to ionize gas molecules. At the same time, the insulating dielectric between the electrodes blocks direct spark discharge. Charge accumulates on the surface of the insulating dielectric and interacts with newly generated ions and electrons as the polarity of the alternating voltage changes, thus maintaining the discharge and generating non-equilibrium plasma.

[0097] It should be noted that when the power supply component performs dielectric barrier discharge, the voltage at the high-voltage output terminal of the power supply is greater than or equal to 5kV. For example, if the voltage at the high-voltage output terminal of the power supply component is 5kV or 10kV, after plasma is generated by dielectric barrier discharge, the voltage at the high-voltage output terminal of the power supply component to maintain the plasma is greater than or equal to 1000V.

[0098] Specifically, the insulating component 70 is disposed within the space between the first electrode 10 and the second electrode 60. The first electrode 10 and the second electrode 60 are electrically connected to the two poles of the power supply assembly, which is an AC power supply. Under the action of the power supply assembly, due to the obstruction of the insulating component 70, charged particles emitted near the surfaces of the first electrode 10 and the second electrode 60 cannot reach the other pole, thus accumulating on the surface of the insulating component 70. During the upper half-cycle of the voltage, a spatial electric field opposite to the voltage of that half-cycle is formed; during the lower half-cycle of the voltage, the voltage reverses, and the spatial electric field is the same as that formed during the upper half-cycle, causing the charged particles to move back to their original electrodes. This process repeats, generating plasma on opposite sides of the insulating component 70.

[0099] The insulating component 70 refers to a part used to separate the first electrode 10 and the second electrode 60 and has good insulation properties. The insulating component 70 can prevent current from directly conducting between the first electrode 10 and the second electrode 60, so that the discharge process takes place in a specific dielectric barrier manner, thereby promoting plasma generation.

[0100] The statement that at least a portion of the insulating member 70 is disposed within the space between the first electrode 10 and the second electrode 60 means that the insulating member 70 may be disposed in a portion of the space between the first electrode 10 and the second electrode 60, or the entire space between the first electrode 10 and the second electrode 60 may be disposed within the space between the first electrode 10 and the second electrode 60.

[0101] The location of the insulating element 70 within the space is not limited.

[0102] For example, the insulating element 70 is disposed on the side of the space near the first electrode 10.

[0103] For example, the insulating element 70 is disposed on the side of the space near the second electrode 60.

[0104] For example, the insulating element 70 is disposed between the first electrode 10 and the second electrode 60 in the space.

[0105] In another embodiment, the second electrode 60 is disposed within the limiting member 50, and the limiting member 50 is at least partially located between the first electrode 10 and the second electrode 60, so that dielectric barrier discharge is generated when the first electrode 10 and the second electrode 60 are energized.

[0106] In one embodiment, referring to Figures 3 and 4, the projections of the first electrode 10 and the second electrode 60 onto the axis of the tube at least partially overlap along the radial direction of the tube. This enhances the cleaning effect on the heating element 20.

[0107] Specifically, the fact that the projections of the first electrode 10 and the second electrode 60 on the axis of the tube body at least partially overlap means that the projections of the first electrode 10 and the second electrode 60 on the axis of the tube body can partially overlap, or the projections of the first electrode 10 and the second electrode 60 on the axis of the tube body can completely overlap.

[0108] In one embodiment, referring to Figure 5, the cleaning device includes a second electrode 60. The second electrode 60 and the first electrode 10 are electrically connected to the two poles of the power supply assembly, respectively. The second electrode 60 is disposed on the mounting base 90, extending axially along the tube body. The second electrode 60 is located on the side of the first electrode 10 opposite to the second opening 30c, and the distance between the second electrode 60 and the first electrode 10 is less than or equal to 10 mm. This allows a relatively concentrated and moderately strong electric field to be formed between the first electrode 10 and the second electrode 60, which is beneficial for more effectively breaking down air to generate plasma, thereby improving the cleaning effect.

[0109] In other words, the second electrode 60 and the first electrode 10 are staggered along the axial extension direction of the tube.

[0110] Specifically, the second electrode 60 being located on the side of the first electrode 10 away from the second opening 30c means that, along the extending direction of the insulating shell 30, the side of the second electrode 60 near the first electrode 10 can be flush with the side of the first electrode 10 near the second electrode 60, or there can be a gap, so that the second electrode 60 and the first electrode 10 are misaligned.

[0111] It should be noted that the distance between the second electrode 60 and the first electrode 10 is less than or equal to 10 mm. For example, the distance between the second electrode 60 and the first electrode 10 can be 0 mm, 2 mm, 3 mm, 5 mm, 7 mm, or 10 mm. The distance between the first electrode 10 and the second electrode 60 along the extending direction of the insulating shell 30 should not be too large, as this will result in poor plasma generation. Controlling the distance within the above range will allow for better plasma generation.

[0112] Of course, the second electrode 60 and the first electrode 10 can also be set without misalignment.

[0113] In one embodiment, referring to FIG3, the cleaning device further includes an insulating member 70, which at least covers the opposing surfaces of the first electrode 10 and the second electrode 60, so that dielectric barrier discharge is generated when the first electrode 10 and the second electrode 60 are energized.

[0114] Specifically, the insulating member 70 covers the side of the first electrode 10 closest to the second electrode 60. That is, the size of the side of the insulating member 70 closest to the first electrode 10 is greater than or equal to the size of the side of the first electrode 10 closest to the second electrode 60.

[0115] The insulating member 70 may or may not cover the surfaces of the second electrode 60 and the first electrode 10 facing each other. That is, the size of the surface of the insulating member 70 near the second electrode 60 may be greater than or equal to the size of the surface of the second electrode 60 near the first electrode 10, or the size of the surface of the insulating member 70 near the second electrode 60 may be smaller than the size of the surface of the second electrode 60 near the first electrode 10.

[0116] In one embodiment, referring to FIG3, the cleaning device further includes an insulating member 70, which at least covers the opposing surfaces of the second electrode 60 and the first electrode 10, so that dielectric barrier discharge is generated when the first electrode 10 and the second electrode 60 are energized.

[0117] Specifically, the insulating member 70 covers the side of the second electrode 60 closest to the first electrode 10. That is, the size of the side of the insulating member 70 closest to the second electrode 60 is greater than or equal to the size of the side of the second electrode 60 closest to the first electrode 10.

[0118] The insulating member 70 may or may not cover the opposing surfaces of the first electrode 10 and the second electrode 60. That is, the size of the side of the insulating member 70 closest to the first electrode 10 may be greater than or equal to the size of the side of the first electrode 10 closest to the second electrode 60, or the size of the side of the insulating member 70 closest to the first electrode 10 may be smaller than the size of the side of the first electrode 10 closest to the second electrode 60.

[0119] In one embodiment, the end of the second electrode 60 facing the second opening 30c is a pointed tip. This allows for better plasma generation between the second electrode 60 and the first electrode 10, enabling the first electrode 10 and the second electrode 60 to interact more effectively, ionizing gas molecules and generating more plasma, thereby further improving the cleaning efficiency of the cleaning device.

[0120] Specifically, the end of the second electrode 60 facing the second opening 30c is a pointed tip. That is to say, the cross-sectional area of ​​the second electrode 60 gradually decreases, at least at the end closest to the second opening 30c.

[0121] In one embodiment, referring to Figures 2, 3, 4, and 5, the airflow generating component includes a fan 41 disposed at the first opening 30b. The fan 41 is mounted on the mounting base 90 so that the airflow generated by the fan 41 flows through the first electrode 10. Thus, by guiding the plasma movement through the airflow generated by the fan 41, the plasma can bombard the outer surface of the heating component 20, thereby enhancing the interaction between the plasma and the dirt and improving the cleaning effect.

[0122] In one embodiment, referring to Figures 2, 3, 4, and 5, the airflow generating assembly includes a fan 41 disposed at the first opening 30b. The fan 41 is mounted on the mounting base 90 so that the airflow generated by the fan 41 flows towards the receiving cavity 30a. Thus, by guiding the plasma movement through the airflow generated by the fan 41, the plasma can bombard the outer surface of the heating component 20, thereby enhancing the interaction between the plasma and the dirt and improving the cleaning effect.

[0123] Specifically, guided by the airflow, the plasma moves from the first opening 30b to the second opening 30c to form a jet. Due to the high energy of the plasma jet, the charged particles in it bombard the dirt on the outer surface of the heating element 20 at high speed, causing processes such as burning, etching, and sputtering, so that the dirt on the outer surface of the heating element 20 is removed by physical and chemical methods.

[0124] The plasma flow path is the path along which the plasma moves within the jet channel. In reality, guided by the jet generating component, the plasma moves from the first opening 30b towards the second opening 30c.

[0125] In one embodiment, referring to Figures 2, 3, 4, and 5, the cleaning device includes a guide member 80 with a guide cavity 80a disposed between the mounting base 90 and the tube body, and the guide cavity 80a communicating with the first opening 30b. The cross-sectional area of ​​the guide cavity 80a gradually decreases from the side closer to the fan 41 to the side away from the fan 41. Therefore, when the airflow generated by the fan 41 enters the first opening 30b through the guide member 80, it has higher kinetic energy, thereby more effectively driving the plasma movement, and thus enabling the cleaning device to achieve a better cleaning effect.

[0126] Specifically, the flow guide 80 refers to the component in the cleaning device that guides the flow direction of fluid (mainly airflow) and regulates the fluid characteristics.

[0127] The flow guide 80 has a flow guide cavity 80a for controlling the path and distribution of airflow.

[0128] The shape of the flow guiding cavity 80a is not limited. For example, the flow guiding cavity 80a is frustum-shaped.

[0129] The size of the guide cavity 80a near the first opening 30b is not limited, as long as the airflow generated by the fan 41 can enter the jet channel.

[0130] For example, the cross-sectional area of ​​the guide cavity 80a near the first opening 30b is equal to the cross-sectional area of ​​the first opening 30b. This allows the airflow to enter the jet channel smoothly and without obstruction, reducing energy loss and turbulence at the first opening 30b and ensuring the stability and continuity of the airflow.

[0131] In one embodiment, referring to Figures 6 and 7, the cleaning device includes multiple nozzle assemblies 42, which are spaced apart on the wall of the receiving cavity 30a. Each nozzle assembly 42 contains a first electrode 10, and the nozzle assemblies 42 can spray plasma generated by the first electrode 10 into the receiving cavity 30a. Thus, by simultaneously generating multiple jets through the nozzle assemblies 42, the jets can be evenly distributed on the surface of the heating element 20, ensuring that every part of the heating element 20 is cleaned, avoiding cleaning dead zones, and thereby improving the cleaning effect.

[0132] The position of the nozzle 42 assembly on the cavity wall of the receiving cavity 30a is not limited.

[0133] For example, at least some of the nozzle 42 assemblies are arranged circumferentially along the cavity wall of the receiving cavity 30a. This improves the cleaning effect on the surface of the heating element 20 circumferentially.

[0134] For example, at least some of the nozzle 42 assemblies are arranged at intervals along the extension direction of the receiving cavity 30a. This improves the cleaning effect on the outer surface of the heating element 20 along the axial direction.

[0135] It is understandable that the first electrode 10 in each nozzle 42 assembly is electrically connected to the power supply assembly, and each first electrode 10 independently generates plasma.

[0136] In one specific embodiment, the nozzle 42 assembly includes a nozzle 42. The relative position of the nozzle 42 and the first electrode 10 is not limited, as long as the airflow flowing out of the nozzle 42 can drive the plasma generated by the first electrode 10 to move and clean the heating component 20.

[0137] For example, the first electrode 10 is located on the side of the nozzle 42 near the heating element 20.

[0138] For example, the first electrode 10 is located on the side of the nozzle 42 away from the heating element 20.

[0139] The shape of nozzle 42 is not limited.

[0140] For example, the nozzle 42 is circular in shape.

[0141] For example, the nozzle 42 is elliptical in shape, which allows it to produce a flat jet, which is beneficial for quickly cleaning the large surface area of ​​the heating element 20.

[0142] For example, the nozzle 42 is square in shape, which allows the nozzle 42 to produce a more uniform jet coverage area.

[0143] The orientation of nozzle 42 is not limited.

[0144] For example, at least a portion of the nozzles 42 are oriented towards the heating element 20. That is, the jet flowing from the nozzles 42 impacts the surface of the heating element 20 perpendicularly. As a result, the plasma jet from the nozzles 42 can directly act on the surface of the heating element 20, thereby further improving the cleaning effect.

[0145] For example, at least some of the nozzles 42 are oriented at an angle relative to the heating element 20. That is, the jet flowing from the nozzles 42 impacts the surface of the heating element 20 at an angle, thereby allowing the plasma jet to more comprehensively cover the surface of the heating element 20.

[0146] In one specific embodiment, the first electrode 10 is electrically connected to the power supply component to generate plasma. The cleaning device has an air intake channel 30d with an air inlet 30e. The cleaning device includes a fan 41, which is disposed on one side of the air inlet 30e. The airflow generated by the fan 41 enters the air intake channel 30d through the air inlet 30e and is ejected by the nozzle 42. The plasma enters the jet channel with the airflow to clean the surface of the heating component 20.

[0147] Another embodiment of this application provides a cleaning system, including an aerosol generating device and any of the above-mentioned cleaning devices. The aerosol generating device includes a heating element 20. When the aerosol generating device needs to be cleaned, the heating element 20 is combined with the cleaning device, and the cleaning device generates plasma to clean the surface of the heating element 20.

[0148] In the above embodiments, during the cleaning process, the highest operating temperature of the plasma is greater than or equal to 200°C, for example, 200°C, 250°C, 300°C, or 400°C; preferably greater than or equal to 400°C, for example, 400°C, 450°C, 500°C, or 600°C.

[0149] Another embodiment of this application provides a cleaning method for the above-described cleaning device. Referring to FIG8, the cleaning method includes the following steps:

[0150] Step S1: Insert at least a portion of the heating element 20 into the receiving cavity 30a of the cleaning device.

[0151] Step S2: Control the power supply component to supply power to the first electrode 10 to generate plasma.

[0152] Step S3: Start the airflow generating component 40 to guide the plasma to move directionally within the containment cavity 30a, thereby driving the plasma to clean the surface of the heating component 20.

[0153] Specifically, the power supply component applies a high-voltage bias to the first electrode 10, causing the electric field strength near the side of the first electrode 10 close to the heating element 20 to exceed the breakdown voltage of air, thereby forming corona discharge plasma. The plasma forms a jet to clean the surface of the heating element 20.

[0154] In one specific embodiment, the cleaning device includes an insulating shell 30, a mounting base 90, an airflow generating assembly 40, and a second electrode 60. The insulating shell 30 has a receiving cavity 30a, and a jet channel is formed between the cavity wall of the receiving cavity 30a and the heating assembly 20. The jet channel has a first opening 30b and a second opening 30c opposite to each other. Along the extending direction of the receiving cavity 30a, the first electrode 10 is disposed on the side of the insulating shell 30 opposite to the second opening 30c, and the second electrode 60 is disposed on the mounting base 90. The first electrode 10 and the second electrode 60 are electrically connected to the two poles of a power supply assembly, respectively. The power supply assembly applies a high-voltage current to the first electrode 10 and the second electrode 60, respectively, to break down the air between the first electrode 10 and the second electrode 60, generating an electric arc plasma. The airflow generating assembly 40 is activated to cause the plasma to move directionally within the jet channel, cleaning the surface of the heating assembly 20 during the plasma flow.

[0155] In one specific embodiment, the cleaning device includes an insulating shell 30, a mounting base 90, a second electrode 60, an airflow generating assembly 40, and an insulating member 70. The insulating shell 30 has a receiving cavity 30a, and a jet channel is formed between the cavity wall of the receiving cavity 30a and the heating assembly 20. The jet channel has a first opening 30b and a second opening 30c opposite to each other. The insulating member 70 is disposed on the mounting base 90, and a portion of the insulating member 70 near the heating assembly 20 is recessed to form a mounting groove. The second electrode 60 is disposed in the mounting groove and is radially arranged along the receiving cavity 30a. The second electrode 60 is spaced apart from the first electrode 10, and the groove wall of the mounting groove is located within the space between the first electrode 10 and the second electrode 60. The first electrode 10 and the second electrode 60 are electrically connected to the two poles of a power supply assembly, respectively. The power supply assembly applies high-voltage alternating current to the first electrode 10 and the second electrode 60, respectively. Under the action of the power supply assembly, due to the obstruction of the insulating member 70, charged particles emitted near the surfaces of the first electrode 10 and the second electrode 60 cannot reach the other pole, and thus accumulate on the surface of the insulating member 70. During the first half-cycle of the voltage cycle, a spatial electric field opposite to the voltage of that half-cycle is formed; during the second half-cycle, the voltage reverses, and the spatial electric field is the same as that formed during the first half-cycle, causing charged particles to move back to their original electrodes. This process repeats, generating DBD plasma on opposite sides of the insulating component 70. The airflow generating component 40 is activated to direct the plasma within the jet channel, cleaning the surface of the heating component 20 during the plasma flow.

[0156] In the description of this application, the references to terms such as "in one embodiment," "in some embodiments," "in a specific embodiment," or "exemplary," etc., refer to a specific feature, structure, material, or characteristic described in connection with that embodiment or example, which is included in at least one embodiment or example of the embodiments of this application. In this application, the illustrative expressions of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in one or more embodiments or examples. Furthermore, without contradiction, those skilled in the art can combine the different embodiments or examples described in this application, as well as the features of the different embodiments or examples.

[0157] The above description is merely a preferred embodiment of this application and is not intended to limit the application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application are included within the scope of protection of this application.

Claims

1. A cleaning device for cleaning the surface of a heating element, the cleaning device comprising: The first electrode is electrically connected to the high-voltage output terminal of the power supply component to generate plasma, which forms a jet to clean the surface of the heating component.

2. The cleaning device according to claim 1, wherein the voltage at the high-voltage output terminal is greater than or equal to 1000V.

3. The cleaning device according to claim 1, further comprising an insulating shell having a receiving cavity, wherein when the heating component is inserted into the receiving cavity, a jet channel is formed between the cavity wall of the receiving cavity and the heating component, and the plasma can enter the jet channel and clean the surface of the heating component.

4. The cleaning apparatus according to claim 3, further comprising an airflow generating component for generating an airflow and driving the plasma to move directionally within the jet channel.

5. The cleaning apparatus of claim 4, wherein the jet channel has a first opening and a second opening opposite each other, at least a portion of the airflow generating component and the first electrode are disposed at one end near the first opening, and the plasma flows from the first opening toward the second opening.

6. The cleaning device according to claim 5, further comprising a mounting base, at least a portion of the airflow generating component being disposed on the mounting base, the insulating shell being a tube, the receiving cavity being formed within the tube, the first opening and the second opening being located at opposite ends of the tube, and the mounting base being disposed at the first opening.

7. The cleaning device according to claim 6, wherein a limiting member is provided on the side of the mounting base facing the first opening, the limiting member being used to limit the maximum length of the heating component inserted into the cleaning device.

8. The cleaning device according to claim 7, wherein the first electrode is disposed on the wall of the tube body along the circumference of the tube body, or the first electrode is an annular electrode disposed on the wall of the tube body.

9. The cleaning device according to claim 8, the cleaning device further comprising a second electrode, the second electrode and the first electrode being electrically connected to the two poles of the power supply component respectively, the second electrode being disposed on the limiting member, the second electrode being spaced apart from the first electrode and plasma being generated between them.

10. The cleaning apparatus according to claim 9, wherein the projections of the first electrode and the second electrode on the axis of the tube body at least partially overlap along the radial direction of the tube body.

11. The cleaning device according to claim 6, wherein the cleaning device includes a second electrode, the second electrode and the first electrode are respectively electrically connected to the two poles of the power supply assembly, the second electrode is disposed on the mounting base along the axial extension direction of the tube body, the second electrode is located on the side of the first electrode opposite to the second opening, and the distance between the second electrode and the first electrode is less than or equal to 10 mm.

12. The cleaning device according to claim 9, further comprising an insulating member, at least a portion of which is disposed within the space between the first electrode and the second electrode, so that a dielectric barrier discharge is generated when the first electrode and the second electrode are energized; or, the second electrode is disposed within the limiting member, at least a portion of which is located between the first electrode and the second electrode, so that a dielectric barrier discharge is generated when the first electrode and the second electrode are energized.

13. The cleaning device according to claim 9, further comprising an insulating member, the insulating member at least covering the opposing surfaces of the first electrode and the second electrode, and / or the insulating member at least covering the opposing surfaces of the second electrode and the first electrode, so that dielectric barrier discharge is generated when the first electrode and the second electrode are energized.

14. The cleaning device according to claim 11, wherein the end of the second electrode facing the second opening is a pointed tip.

15. The cleaning device according to any one of claims 6-14, wherein the airflow generating component includes a fan disposed at the first opening, the fan being disposed on the mounting base such that airflow generated by the fan flows through the first electrode, and / or such airflow generated by the fan flows toward the receiving cavity.

16. The cleaning device according to claim 15, wherein the cleaning device includes a guide member having a guide cavity disposed between the mounting base and the pipe body, and the guide cavity is in communication with the first opening, and the cross-sectional area of ​​the guide cavity gradually decreases from the side near the fan to the side away from the fan.

17. The cleaning apparatus according to claim 4, wherein the cleaning apparatus comprises a plurality of nozzle assemblies, the plurality of nozzle assemblies being spaced apart from each other on the cavity wall of the receiving cavity, each nozzle assembly having a first electrode disposed therein, the nozzle assembly being able to spray plasma generated by the first electrode toward the receiving cavity.

18. The cleaning device according to any one of claims 9, 10, 12 or 13, wherein the distance between the first electrode and the second electrode is greater than or equal to 0.2 mm and less than or equal to 3 mm.

19. A cleaning method for a cleaning device, the cleaning method comprising the following steps: At least a portion of the heating element is inserted into the receiving cavity of the cleaning device; The control power supply assembly supplies power to the first electrode to generate plasma; The airflow generation component is activated to guide the plasma to move directionally within the containment cavity, thereby cleaning the surface of the heating component.

20. A cleaning system comprising an aerosol generating device and a cleaning device according to any one of claims 1-18, the aerosol generating device comprising a heating element, the cleaning device generating a plasma jet and cleaning the surface of the heating element.

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