Scanning panel and antenna apparatus

Abstract

A scanning panel (100), comprising a first substrate (10), a second substrate (20) and a dielectric layer (30), wherein the first substrate (10) comprises a first base (11) and radiation patches (171) located in a scanning area (AA), the second substrate (20) comprises a second base (21) and slot electrodes (231) located in the scanning area (AA), one radiation patch (171) and one slot electrode (231) form a scanning unit (A1), and a plurality of scanning units (A1) are distributed in an annular array. In the embodiments of the present disclosure, both the first substrate (11) and the second substrate (21) can be configured as an integral structure, thereby realizing an integral structure of the scanning panel (100), ensuring the synchronization of electromagnetic waves transmitted by transmission slots (232) in the plurality of scanning units (A1), and ensuring the communication performance of a holographic antenna having the scanning panel (100). (FIG. 2)

Description

Scanning panel and antenna device Technical Field

[0001] This disclosure relates to the field of communication technology, and more specifically, to a scanning panel and antenna device. Background Technology

[0002] A holographic antenna is an antenna system that combines holographic technology and liquid crystal technology. Its characteristic lies in the precise control of the antenna beam through the electronic control properties of liquid crystal materials. Holographic antennas have broad application prospects in fields such as communication, radar, and radio navigation.

[0003] Holographic antennas include liquid crystal scanning panels. In related technologies, liquid crystal scanning panels are usually spliced ​​together, which can easily affect the electromagnetic wave radiation performance due to misalignment during splicing, thus affecting the communication performance of the holographic antenna. Therefore, there is an urgent need for a scanning panel that can meet the communication performance requirements of holographic antennas.

[0004] It should be noted that the information disclosed in the background section above is only used to enhance the understanding of the background of this disclosure, and therefore may include information that does not constitute prior art known to those skilled in the art. Summary of the Invention

[0005] The purpose of this disclosure is to provide a scanning panel and an antenna device.

[0006] According to one aspect of this disclosure, a scanning panel is provided, the scanning panel including a scanning area, the scanning panel comprising:

[0007] A first substrate includes a first substrate, and a plurality of driving circuits and a plurality of radiating patches on one side of the first substrate and located in the scanning area, wherein one of the driving circuits is connected to one of the radiating patches.

[0008] The second substrate includes an integral second substrate and a plurality of slit electrodes on one side of the second substrate and located in the scanning area;

[0009] The plurality of radiating patches and the plurality of slot electrodes correspond one-to-one, and one of the radiating patches and one of the slot electrodes constitute a scanning unit. The plurality of scanning units are arranged in a circular array. The orthographic projections of the radiating patch and the slot electrode of each scanning unit on the first substrate at least partially overlap, and at least part of the orthographic projection of the transmission slot on the slot electrode on the first substrate is located around the radiating patch.

[0010] A dielectric layer is located between the first substrate and the second substrate.

[0011] According to any of the scanning panels described in this disclosure, the length direction of the transmission slit on each slit electrode forms a first angle with the radial direction where the center point of the transmission slit is located, the first angle being greater than or equal to 30 degrees and less than or equal to 60 degrees.

[0012] According to any of the scanning panels described in this disclosure, each ring of multiple scanning units includes at least one first scanning unit and one second scanning unit, wherein the first scanning unit and the second scanning unit operate at different frequencies;

[0013] The first scanning unit includes a slit electrode on which the transmission slit away from the center of the circle points in a radial direction along clockwise to the center point of the transmission slit, forming a first angle. The second scanning unit includes a slit electrode on which the transmission slit away from the center of the circle points in a radial direction along clockwise to the center point of the transmission slit, forming a first angle.

[0014] According to any of the scanning panels described in this disclosure, each ring of multiple scanning units includes multiple sets of scanning units;

[0015] In each scanning unit, the length directions of the transmission slots on the multiple slot electrodes are parallel to each other, the center points of the multiple transmission slots are collinear and form a straight line segment, and the length direction of the transmission slot in each scanning unit forms a second angle with the radial direction where the midpoint of the straight line segment is located. The second angle is greater than or equal to 30 degrees and less than or equal to 60 degrees.

[0016] According to any of the scanning panels described in this disclosure, the plurality of scanning units includes at least one first group of scanning units and one second group of scanning units, wherein the first group of scanning units and the second group of scanning units operate at different frequencies;

[0017] In the first group of scanning units, the length of the transmission slit on the slit electrode pointing away from the center of the circle forms a second angle along the radial direction from the midpoint of the first straight line segment clockwise. In the second group of scanning units, the length of the transmission slit on the slit electrode pointing away from the center of the circle forms a second angle along the radial direction from the midpoint of the second straight line segment counterclockwise.

[0018] According to any of the scanning panels described in this disclosure, the number of scanning units in each ring increases in the direction away from the center.

[0019] According to any of the scanning panels described in this disclosure, the scanning area includes a plurality of scanning sub-areas distributed circumferentially, each of the scanning sub-areas being surrounded by signal traces, and each of the scanning sub-areas having a driving module on its periphery.

[0020] According to any of the scanning panels described in this disclosure, the signal traces include common electrode traces and ground traces.

[0021] According to any of the scanning panels described in this disclosure, the spacing between two adjacent scanning sub-regions is greater than or equal to the distance between two adjacent scanning units in the circumferential direction.

[0022] According to any of the scanning panels described in this disclosure, the orthographic projection of the transmission slot on the slot electrode onto the first substrate has both ends located outside the region where the radiating patch is located along the length direction of the transmission slot, and both ends of the radiating patch are located outside the region where the orthographic projection of the transmission slot is located along the width direction of the transmission slot.

[0023] According to any of the scanning panels described in this disclosure, the scanning area includes an effective electrode area corresponding to each scanning unit and an ineffective area located around the effective electrode area, and the length direction of the effective electrode area is parallel to the length direction of the transmission slit on the slit electrode. The radiation patch and the transmission slit on the slit electrode are both located within the effective electrode area, and the driving circuit is located in the ineffective area.

[0024] The scanning panel includes a plurality of isolation pillars located between the first substrate and the second substrate. The plurality of isolation pillars include a plurality of first isolation pillars located in the effective electrode region and a plurality of second isolation pillars located in the non-effective region.

[0025] The support height of the first isolation column is equal to the support height of the second isolation column. The multiple sets of first isolation columns are distributed on both sides of the transmission gap along the length direction, and the arrangement direction of each set of first isolation columns is parallel to the length direction of the effective electrode area.

[0026] According to any of the scanning panels described in this disclosure, the distance between each set of first isolation pillars and the radiation patch is less than or equal to 200 micrometers.

[0027] According to any of the scanning panels described in this disclosure, the spacing between two adjacent first isolation pillars in each group of first isolation pillars is greater than or equal to 10 micrometers.

[0028] According to any of the scanning panels described in this disclosure, the transmission slit on the slit electrode includes a rectangular segment and arcuate segments located at both ends of the rectangular segment;

[0029] The plurality of first isolation pillars includes two sets of first isolation pillars located on the same side of the transmission gap and on both sides of the radiating patch. In each set of first isolation pillars, one first isolation pillar away from the radiating patch protrudes from the end of the rectangular segment along the length direction of the transmission gap.

[0030] According to any of the scanning panels described in this disclosure, the plurality of first isolation pillars includes two sets of first isolation pillars located on the same side of the transmission gap and on both sides of the radiation patch, wherein one of the first isolation pillars in each set, away from the radiation patch, protrudes from the end of the transmission gap along the length direction of the transmission gap.

[0031] According to any of the scanning panels described in this disclosure, the unit support area of ​​the first isolation column corresponding to each scanning unit is equal, and the sum of the unit support areas of the first isolation column and the second isolation column within the annular area where each ring scanning unit is located is equal.

[0032] According to any of the scanning panels described in this disclosure, the plurality of second isolation pillars include a first sub-isolation pillar and a pair of second sub-isolation pillars;

[0033] The distance from the first sub-isolation post to the drive circuit is less than or equal to 5 mm, and the pair of second sub-isolation posts are located on both sides of the effective electrode region in the length direction.

[0034] According to any of the scanning panels described in this disclosure, the plurality of isolation pillars includes a plurality of third isolation pillars located in the non-effective region;

[0035] The support height of the third isolation column is less than the support height of the second isolation column, and the plurality of third isolation columns are located on the same side of the effective electrode area in the length direction, or distributed on both sides of the effective electrode area in the length direction.

[0036] According to any of the scanning panels described in this disclosure, the unit support area of ​​the third isolation column in the scanning units of two adjacent rings is equal.

[0037] According to any of the scanning panels described in this disclosure, the first substrate includes a plurality of first occupant electrodes and a plurality of second occupant electrodes on the same layer as the radiation patch, wherein the thickness of the first occupant electrodes is greater than the thickness of the second occupant electrodes.

[0038] The first isolation post and the second isolation post each have the first occupant electrode at one end, and the third isolation post has the second occupant electrode at one end.

[0039] According to any of the scanning panels described in this disclosure, the plurality of isolation pillars further includes a fourth isolation pillar located at the periphery of the scanning area and the inner circle of the scanning area, and a fifth isolation pillar located at the periphery of the scanning area and the inner circle of the scanning area;

[0040] The support height of the fourth isolation column and the support height of the fifth isolation column are both equal to the support height of the first isolation column. Furthermore, the sum of the unit support areas of the fourth and fifth isolation columns outside the scanning area, and the sum of the unit support areas of the fourth and fifth isolation columns inside the scanning area, are all less than the sum of the unit support areas of the first and second isolation columns corresponding to each ring scanning unit within the scanning area.

[0041] According to any of the scanning panels described in this disclosure, the driving circuit includes a driving transistor and a storage capacitor, and the first substrate includes gate lines, data lines and voltage signal lines.

[0042] The control stage of the driving transistor is connected to the gate line, the first electrode of the driving transistor is connected to the data line, the second stage of the driving transistor is connected to the first plate of the storage capacitor and the radial patch, and the second plate of the storage capacitor is connected to the voltage signal line.

[0043] According to any of the scanning panels described in this disclosure, the first substrate includes a gate metal layer, an active layer, and a source / drain metal layer sequentially stacked on the side of the first substrate near the second substrate.

[0044] The gate metal layer includes a conductive portion, the active layer includes an active portion, the active portion has a channel region and a first connection portion and a second connection portion located on both sides of the channel region, and the channel region and the conductive portion have an overlapping area in the direction perpendicular to the scanning panel, and the source drain metal layer includes a first connection line and a second connection line.

[0045] The area on the conductive portion that overlaps with the channel region forms the control electrode of the driving transistor, and the ratio of the length to the width of the channel region is greater than or equal to 90 and less than or equal to 120. The first connecting portion and the second connecting portion form the first electrode and the second electrode of the driving transistor, respectively, and the first connecting line and the second connecting line are respectively connected to the first connecting portion and the second connecting portion.

[0046] According to any of the scanning panels described in this disclosure, the first connecting line and the second connecting line have an interdigitated structure, and the orthographic projections of the first connecting line and the second connecting line on the active layer are respectively located in the regions where the first connecting portion and the second connecting portion are located.

[0047] According to any of the scanning panels described in this disclosure, the data line has multiple corners, and at least some of the multiple corners are covered with compensation blocks, the outer contour of which is an arc structure.

[0048] According to any of the scanning panels described in this disclosure, the data line has multiple corners, and at least some of the multiple corners have a rounded chamfer design.

[0049] According to any of the scanning panels described in this disclosure, the first substrate further includes a first electrostatic discharge circuit and a second electrostatic discharge circuit.

[0050] One end of the first electrostatic discharge circuit is connected to the gate line, one end of the second electrostatic discharge circuit is connected to the data line, and the other ends of the first electrostatic discharge circuit and the second electrostatic discharge circuit are both connected to the voltage signal line.

[0051] According to any of the scanning panels described in this disclosure, the first substrate further includes a support electrode in the same layer as the radiation patch.

[0052] According to any of the scanning panels described in this disclosure, the first substrate further includes a support circuit.

[0053] According to one aspect of this disclosure, an antenna device is provided, including the scanning panel described in the above aspect.

[0054] It should be understood that the above general description and the following detailed description are exemplary and explanatory only, and are not intended to limit this disclosure. Attached Figure Description

[0055] The accompanying drawings, which are incorporated in and form part of this specification, illustrate embodiments consistent with this disclosure and, together with the description, serve to explain the principles of this disclosure. It is obvious that the drawings described below are merely some embodiments of this disclosure, and those skilled in the art can obtain other drawings based on these drawings without any inventive effort.

[0056] Figure 1 is a cross-sectional structural diagram of a scanning panel provided in an embodiment of this disclosure.

[0057] Figure 2 is a top view of a scanning panel provided in an embodiment of this disclosure.

[0058] Figure 3 is a schematic diagram of a driving circuit and scanning unit provided in an embodiment of this disclosure.

[0059] Figure 4 is a cross-sectional view of another scanning panel provided in this embodiment of the present disclosure.

[0060] Figure 5 is a schematic diagram showing the positional relationship between a radiating patch and a transmission gap provided in an embodiment of this disclosure.

[0061] Figure 6 is a schematic diagram of the distribution of a single-ring scanning unit provided in an embodiment of this disclosure.

[0062] Figure 7 is a schematic diagram of the distribution of another one-ring scanning unit provided in an embodiment of this disclosure.

[0063] Figure 8 is a structural schematic diagram of the orientation of a scanning unit provided in an embodiment of this disclosure.

[0064] Figure 9 is a structural schematic diagram of another scanning unit orientation provided in this embodiment.

[0065] Figure 10 is a schematic diagram of the distribution of a local region in another one-ring scanning unit provided by the present disclosure.

[0066] Figure 11 is a structural schematic diagram of another scanning unit orientation provided in the embodiments of this disclosure.

[0067] Figure 12 is a top view of another scanning panel provided in this embodiment of the present disclosure.

[0068] Figure 13 is a schematic diagram of the support structure of a scanning unit provided in an embodiment of this disclosure.

[0069] Figure 14 is a schematic diagram of the support structure of another scanning unit provided in this embodiment of the present disclosure.

[0070] Figure 15 is a schematic diagram of the distribution structure of a first isolation column provided in an embodiment of this disclosure.

[0071] Figure 16 is a schematic diagram of another distribution structure of the first isolation column provided in an embodiment of this disclosure.

[0072] Figure 17 is a comparative schematic diagram of the support height of an isolation column provided in the embodiments of this disclosure.

[0073] Figure 18 is a top view of a driving transistor according to an embodiment of the present disclosure.

[0074] Figure 19 is a top view of another driving transistor provided in an embodiment of this disclosure.

[0075] Figure 20 is a top view of another driving transistor provided in this embodiment.

[0076] Figure 21 is a schematic diagram of the routing design of signal lines in a first substrate provided by an embodiment of the present disclosure.

[0077] Figure 22 is a schematic diagram of another signal line routing design in the first substrate provided by an embodiment of this disclosure.

[0078] Figure 23 is a schematic diagram of an electrostatic discharge circuit provided in an embodiment of this disclosure.

[0079] Figure label:

[0080] 100. Scanning panel; AA. Scanning area; A1. Scanning unit; A11. First scanning unit; A12. Second scanning unit; A2. Effective electrode area; A3. Ineffective area; A4. Scanning sub-area;

[0081] B1, outer perimeter of the scanning area; B2, inner circle of the scanning area; B3, common electrode trace; B4, ground trace;

[0082] 10. First substrate; 20. Second substrate; 30. Dielectric layer; 40. Isolation pillar;

[0083] 11. First substrate; 12. Gate metal layer; 13. Gate insulating layer; 14. Active layer; 15. Source / drain metal layer; 16. First passivation layer; 17. Drive metal layer; 18. Second passivation layer; 19. First alignment layer;

[0084] 111. Driving circuit; 112. Driving transistor; 113. Storage capacitor; 114. First electrode plate; 115. Second electrode plate;

[0085] 121. Conductive part; 122. Gate line;

[0086] 141. Active part; 142. Channel area; 143. First connecting part; 144. Second connecting part;

[0087] 151. First connecting line; 152. Second connecting line; 153. Data line; 154. Voltage signal line; 155. Compensation block;

[0088] 171. Radiation patch; 172. First occupant electrode; 173. Second occupant electrode;

[0089] 181. Opening; 182. Conductive metal;

[0090] 21. Second substrate; 22. Third passivation layer; 23. Gap metal layer; 24. Second alignment layer;

[0091] 231. Slit electrode; 232. Transmission slit; 233. Rectangular segment; 234. Arc-shaped segment;

[0092] 41. First isolation column; 42. Second isolation column; 43. Third isolation column;

[0093] 421. First sub-isolation column; 422. Second sub-isolation column. Detailed Implementation

[0094] Exemplary embodiments will now be described more fully with reference to the accompanying drawings. However, these exemplary embodiments can be implemented in many forms and should not be construed as limited to the embodiments set forth herein; rather, they are provided so that this disclosure will be thorough and complete, and will fully convey the concept of the exemplary embodiments to those skilled in the art. The same reference numerals in the drawings denote the same or similar structures, and therefore detailed descriptions of them will be omitted. Furthermore, the drawings are merely illustrative of this disclosure and are not necessarily drawn to scale.

[0095] Although relative terms such as "up" and "down" are used in this specification to describe the relative relationship of one component of an icon to another, these terms are used only for convenience, such as according to the orientation of the examples shown in the accompanying drawings. It is understood that if the device of the icon is flipped upside down, the component described as "up" will become the component described as "down." When a structure is "up" of another structure, it may mean that the structure is integrally formed on the other structure, or that the structure is "directly" mounted on the other structure, or that the structure is "indirectly" mounted on the other structure through another structure.

[0096] The terms “a,” “one,” “the,” “the,” and “at least one” are used to indicate the presence of one or more elements / components / etc.; the terms “including” and “having” are used to indicate an open-ended inclusion and to mean that there may be other elements / components / etc. in addition to the listed elements / components / etc.; the terms “first,” “second,” and “third,” etc., are used only as markers and are not a limitation on the number of objects.

[0097] A transistor is a device that includes at least three terminals: a gate electrode, a drain electrode, and a source electrode. A transistor has a channel region between the drain electrode (drain terminal, drain region, or drain electrode) and the source electrode (source terminal, source region, or source electrode), and current can flow through the drain electrode, the channel region, and the source electrode. The channel region is the area through which the current primarily flows.

[0098] The first electrode can be the drain electrode and the second electrode can be the source electrode, or vice versa. In cases where transistors with opposite polarities are used or the current direction changes during circuit operation, the functions of the "source electrode" and "drain electrode" are sometimes interchanged. Therefore, in this specification, the "source electrode" and "drain electrode" can be interchanged.

[0099] Figure 1 illustrates a schematic diagram of the structure of a scanning panel 100 provided in an embodiment of the present disclosure. As shown in Figure 1, the scanning panel 100 includes: a first substrate 10 and a second substrate 20 disposed opposite to each other, and a dielectric layer 30 located between the first substrate 10 and the second substrate 20.

[0100] As shown in Figures 1 and 2, the scanning panel 100 includes a scanning area AA. The first substrate 10 includes a plurality of driving circuits 111 and a plurality of radiating patches 171 located in the scanning area AA. One driving circuit 111 is connected to one radiating patch 171. The second substrate 20 includes a plurality of slit electrodes 231 located in the scanning area AA. The plurality of radiating patches 171 and the plurality of slit electrodes 231 correspond one-to-one. A corresponding radiating patch 171 and a slit electrode 231 constitute a scanning unit A1. The radiating patch 171 and the slit electrode 231 of each scanning unit A1 at least partially overlap in the thickness direction of the scanning panel 100. The transmission slit 232 on the slit electrode 231 has at least a portion of its orthographic projection on the first substrate 10 located around the radiating patch 171.

[0101] In this way, electromagnetic waves can be fed into the scanning panel 100 through the transmission slot 232 on the slot electrode 231, and the portion extending outward from the radiating patch 171 through the transmission slot 232 can radiate outward. At the same time, a bias voltage can be applied to the radiating patch 171 and the slot electrode 231 to adjust the dielectric constant of the dielectric layer 30 through the formed electric field, thereby controlling the direction of the electromagnetic waves fed into the scanning panel 100 and realizing the scanning performance of the radiated electromagnetic waves. Furthermore, the dielectric constant of the dielectric layer 30 in the corresponding area of ​​a portion of the scanning unit A1 can be adjusted separately to prevent the electromagnetic waves from radiating along a portion of the scanning unit A1, thereby realizing the control of the scanning waveform and thus realizing the waveform switchable performance of the scanning panel 100.

[0102] The dielectric layer 30 undergoes a change in dielectric constant when subjected to an electric field, thereby controlling the direction of electromagnetic waves fed into the transmission slot 232 along the slot electrode 231, thus achieving electromagnetic beam scanning. The material of the dielectric layer 30 can be chosen by those skilled in the art according to actual conditions, and is not limited here. For example, the dielectric layer 30 may include an electrodielectrically variable material, such as liquid crystal or graphene.

[0103] The scanning panel 100 also includes an adhesive frame located between the first substrate 10 and the second substrate 20, and a plurality of isolation pillars 40 supporting the first substrate 10 and the second substrate 20 (as shown in Figure 1). The adhesive frame realizes the fixed connection between the first substrate 10 and the second substrate 20, and the plurality of isolation pillars 40 ensure the gap between the first substrate 10 and the second substrate 20, thereby ensuring the filling of the dielectric layer 30 (such as liquid crystal).

[0104] In some embodiments, as shown in FIG3, the driving circuit 111 includes a driving transistor 112 and a storage capacitor 113. The first substrate 10 includes a gate line 122, a data line 153 and a voltage signal line 154. The control stage of the driving transistor 112 is connected to the gate line 122. The first electrode of the driving transistor 112 is connected to the data line 153. The second stage of the driving transistor 112 is connected to the first electrode plate 114 and the radial patch 171 of the storage capacitor 113. The second electrode plate 115 of the storage capacitor 113 is connected to the voltage signal line 154.

[0105] In some embodiments, the driving transistor 112 has a bottom gate structure, and as shown in FIG1, the first substrate 10 includes a first substrate 11, and a gate metal layer 12, a gate insulating layer 13, an active layer 14, a source drain metal layer 15, a first passivation layer 16, a driving metal layer 17, a second passivation layer 18, and a first alignment layer 19 are sequentially stacked on the side of the first substrate 11 near the second substrate 21.

[0106] As shown in Figures 1 and 3, the gate metal layer 12 includes a gate line 122 and a conductive portion 121. The active layer 14 includes an active portion 141, which has a channel region 142 and a first connection portion 143 and a second connection portion 144 located on both sides of the channel region 142. The channel region 142 and the conductive portion 121 have an overlapping area in the direction perpendicular to the scanning panel 100. The source / drain metal layer 15 includes a data line 153, a first connection line 151, and a second connection line 152. The driving metal layer 17 includes a plurality of radial patches 171 arranged in an array. The area on the conductive portion 121 that overlaps with the channel region 142 forms the control electrode of the driving transistor 112. The first connection portion 143 and the second connection portion 144 form the first electrode and the second electrode of the driving transistor 112, respectively. The first connection line 151 and the second connection line 152 are connected to the first connection portion 143 and the second connection portion 144, respectively. The first connection line 151 is also connected to the data line 153.

[0107] In addition, the gate metal layer 12 also includes a first metal sheet; the gate insulating layer 13 at least covers the gate line 122, the conductive portion 121 and the first metal sheet; the source drain metal layer 15 also includes a voltage signal line 154 and a second metal sheet, and the second metal sheet and the first metal sheet have an overlapping area in the direction of the vertical scanning panel 100; the first passivation layer 16 at least covers the source portion 141, the data line 153, the voltage signal line 154, the first connecting line 151, the second connecting line 152 and the second metal sheet; the second passivation layer 18 at least covers a plurality of radiating patches 171.

[0108] The first metal sheet and the second metal sheet form the first electrode plate 114 and the second electrode plate 115 of the storage capacitor 113, respectively; the conductive part 121 is connected to the grid line 122, the second connecting line 152 is also connected to the second metal sheet and the radiating patch 171, and the first metal sheet is connected to the voltage signal line 154.

[0109] The first substrate 11 can be a commonly used PCB insulating material such as polytetrafluoroethylene glass fiber laminate, phenolic paper laminate, or phenolic glass cloth laminate, or it can be a rigid material with low microwave loss such as quartz or glass. In addition, the first substrate 11 can be a single-layer board structure or a multi-layer composite board structure.

[0110] It should be noted that, for the radiating patch 171 included in the driving metal layer 17, in addition to the second passivation layer 18 covering the radiating patch 171, it can also be as shown in Figure 4, where the second passivation layer 18 has an opening 181 to expose the radiating patch 171, and at the same time, the opening 181 on the second passivation layer 18 is filled with conductive metal 182 (such as ITO metal) to reduce the thickness of the insulating layer between the radiating patch 171 and the slot electrode 231, thereby ensuring the electric field effect formed between the radiating patch 171 and the slot electrode 231.

[0111] In some embodiments, as shown in FIG1 or FIG4, the second substrate 20 includes a second substrate 21, and a third passivation layer 22, a gap metal layer 23 and a second alignment layer 24 sequentially stacked on the side of the second substrate 21 near the first substrate 11.

[0112] The structure and material of the second substrate 21 can be referenced to the first substrate 11 described above, and will not be repeated here. Furthermore, the slot metal layer 23 can be a single layer structure with multiple transmission slots 232 arranged in an array to form multiple slot electrodes 231 arranged in an array. The transmission slots 232 on the slot electrodes 231 can be elongated holes, such as long rectangular holes or long circular holes, as long as they facilitate the feeding of electromagnetic waves along the transmission slots 232.

[0113] It should be noted that for each scanning unit A1, including the radiating patch 171 and the slit electrode 231, at least one end of the transmission slit 232 on the slit electrode 231 extends beyond the corresponding radiating patch 171 along the length direction of the transmission slit 232. This is to prevent electromagnetic waves from being blocked by the radiating patch after being fed in along the transmission slit 232, thereby ensuring the radiation effect of electromagnetic waves in the scanning panel 100. For example, as shown in FIG5, the transmission slit 232 is an elongated hole structure, and both ends of the transmission slit 232 extend beyond the corresponding radiating patch 171 along the length direction. That is, the orthographic projection of the transmission slit 232 on the slit electrode 231 onto the first substrate 10 is such that both ends of the transmission slit 232 along the length direction are located outside the area where the radiating patch 171 is located.

[0114] Furthermore, in the width direction of the transmission gap 232 on the gap electrode 231, at least one end of the radiating patch 171 extends out of the corresponding transmission gap 232 to ensure that there is an overlapping area between the radiating patch 171 and the corresponding gap electrode 231 (i.e., the solid portion on the gap electrode 231) in the thickness direction of the scanning panel 100, thereby forming an effective electric field. For example, as shown in FIG5, in the width direction of the transmission gap 232, both ends of the radiating patch 171 extend out of the corresponding transmission gap 232, that is, both ends of the radiating patch 171 along the width direction of the transmission gap 232 are located outside the area where the transmission gap is projected onto the first substrate 10.

[0115] For example, as shown in FIG5, in the length direction of the transmission slot 232 on the slot electrode 231, the two ends of the transmission slot 232 extend out of the corresponding radiating patch 171, and in the width direction of the transmission slot 232 on the slot electrode 231, the two ends of the radiating patch 171 extend out of the corresponding transmission slot 232.

[0116] Specifically, the orthographic projections of the radiating patch 171 and the transmission slot 232 onto the first substrate 11 form a cross-shaped overlap, and the center point of the radiating patch 171 coincides with the center point of the transmission slot 232. This ensures that the electric field formed between the radiating patch 171 and the slot electrode 231 can uniformly adjust the direction of the electromagnetic wave fed along the transmission slot 232, thus guaranteeing the effective control of the electromagnetic wave radiation direction by the scanning unit A1.

[0117] In this embodiment of the disclosure, the multiple scanning units A1 within the scanning area AA on the scanning panel 100 can be arranged in a circular array as shown in FIG2, that is, the scanning area AA is circular. This circular array arrangement of multiple scanning units A1 facilitates the application of the scanning panel 100 in holographic antennas, thereby expanding the application scenarios of the scanning panel 100.

[0118] The first substrate 11 of the first substrate 10 and the second substrate 21 of the second substrate 20 can both be configured as an integral structure, thereby realizing the integral structure of the scanning panel 100. This ensures the synchronization of electromagnetic waves radiated along the multiple scanning units A1 while the electromagnetic waves are directionally controlled, thereby ensuring the communication performance of the holographic antenna with the scanning panel 100.

[0119] In some embodiments, as shown in FIG2, each of the multiple scanning units A1 in each ring includes at least one first scanning unit A11 and one second scanning unit A12. The first scanning unit A11 and the second scanning unit A12 operate at different frequencies, thereby realizing the radiation and reception of electromagnetic waves through the first scanning unit A11 and the second scanning unit A12 with different operating frequencies, so as to meet the transceiver performance of the scanning panel 100.

[0120] The first scanning unit A11 and the second scanning unit A12 have different structural dimensions. For example, the size of the radiating patch 171 included in the first scanning unit A11 and the second scanning unit A12 are different, or the size of the transmission slot 232 on the slot electrode 231 is different, or both the size of the radiating patch 171 and the size of the transmission slot 232 on the slot electrode 231 are different, to ensure that the operating frequencies of the first scanning unit A11 and the second scanning unit A12 are different. In addition, the layout orientation of the first scanning unit A11 and the second scanning unit A12 is basically perpendicular, that is, the length direction of the transmission slot 232 in the first scanning unit A11 is approximately perpendicular to the length direction of the transmission slot 232 in the second scanning unit A12.

[0121] Of course, each ring's multiple scanning units A1 may also include three or four scanning units with different operating frequencies, so as to radiate electromagnetic waves through at least one of the at least three scanning units and receive electromagnetic waves through at least one scanning unit. For example, each ring's multiple scanning units A1 may include a first scanning unit A11, a second scanning unit A12, and a third scanning unit with different operating frequencies, where the first scanning unit A11 and the third scanning unit are used to radiate electromagnetic waves, and the second scanning unit A12 is used to receive electromagnetic waves.

[0122] In some implementations, the number of scanning units A1 in each ring increases in the direction away from the center. This avoids the situation where the circumference of the outer ring is greater than that of the inner ring, causing the spacing between scanning units A1 in the outer ring to be greater than that in the inner ring. This ensures that the circumferential spacing of scanning units A1 in each ring is equal, and the distribution of multiple scanning units A1 in the scanning area AA is uniform.

[0123] For example, the number of scanning units A1 in each ring follows an arithmetic sequence with a common difference of 4, meaning that in two adjacent rings of scanning units A1, the outer ring has four more scanning units A1 than the inner ring; or the number of scanning units A1 in each ring follows an arithmetic sequence with a common difference of 8, meaning that in two adjacent rings of scanning units A1, the outer ring has eight more scanning units A1 than the inner ring.

[0124] In some embodiments, multiple scanning units A1 arranged in a circular array are arranged such that the radial distance between two adjacent rings of scanning units A1 is equal, and the circumferential distance between two adjacent scanning units A1 within each ring is also equal. This ensures uniformity in the distribution of the multiple scanning units A1 within the scanning area AA, thereby guaranteeing the uniformity of coverage after electromagnetic waves radiate along the transmission slot 232 on the slot electrode 231, and ultimately ensuring the coverage effect of the holographic antenna.

[0125] Specifically, the distance between two adjacent radial scanning units A1 can be the distance between the center points of scanning units A1 (i.e., the center point of the transmission slit 232 on the slit electrode 231), and the distance between two adjacent circumferential scanning units A1 can be the distance between the center points of scanning units A1 (i.e., the center point of the transmission slit 232 on the slit electrode 231); or, the distance between two adjacent radial scanning units A1 can be the minimum distance between two adjacent ring scanning units A1 (i.e., the distance between the outer edge of the inner ring scanning unit A1 and the inner edge of the outer ring scanning unit A1), and the distance between two adjacent circumferential scanning units A1 can be the minimum distance between two adjacent circumferential scanning units A1 (i.e., the distance between the adjacent ends of the transmission slit 232 on the slit electrode 231 in two adjacent circumferential scanning units A1). Furthermore, the distances between two adjacent radial scanning units A1 and between two adjacent circumferential scanning units A1 described below can refer to the above descriptions, and will not be repeated in this embodiment.

[0126] In some embodiments, the radial spacing between two adjacent scanning units A1 is equal to the circumferential spacing between two adjacent scanning units A1. This further ensures the uniformity of the distribution of the multiple scanning units A1 within the scanning area AA, thereby guaranteeing the uniformity of the coverage after the electromagnetic wave radiates along the transmission slot 232 on the slot electrode 231, and thus ensuring the coverage effect of the holographic antenna.

[0127] Among them, the distance between two adjacent scanning units A1 in the radial direction is equal to the distance between two adjacent scanning units A1 in the circumferential direction. They can be strictly equal or approximately equal, that is, the difference between the two distances is less than the reference value.

[0128] In some embodiments, as shown in FIG6 or FIG7 and FIG8 or FIG9, the length direction O2 of the transmission slot 232 on each slot electrode 231 forms a first angle θ1 with the radial direction O1 where the center point of the transmission slot 232 is located. The first angle θ1 is greater than or equal to 30 degrees and less than or equal to 60 degrees.

[0129] In this way, the radial dimension of each scanning unit A1 is approximately equal to its circumferential dimension, meaning the area occupied by each scanning unit A1 is approximately square. This ensures that the radial spacing of the scanning units A1 is approximately equal to their circumferential spacing, thereby guaranteeing the uniformity of the distribution of multiple scanning units A1 within the scanning area AA. Furthermore, the length direction of the transmission slit 232 on the slit electrode 231 in each scanning unit A1 is individually configured, which facilitates ensuring the roundness of the ring containing multiple scanning units A1 within each ring. This, in turn, ensures the uniformity of the radial coverage of the electromagnetic waves radiated by the multiple scanning units A1 along the transmission slit 232 within the scanning area AA.

[0130] For example, the first angle θ1 formed by the length direction O2 of the transmission slot 232 on each slot electrode 231 and the radial direction O1 where the center point of the transmission slot 232 is located is 30 degrees, 35 degrees, 40 degrees, 45 degrees, 50 degrees, 55 degrees, and 60 degrees.

[0131] Furthermore, the first angle θ1 formed by the length direction O2 of the transmission gap 232 on each gap electrode 231 and the radial direction O1 where the center point of the transmission gap 232 is located can be set to 45 degrees, so as to ensure that the size occupied by each scanning unit A1 in the radial direction is equal to the size occupied in the circumferential direction, that is, the area occupied by each scanning unit A1 is square, thereby ensuring the uniformity of the distribution of multiple scanning units A1 in the scanning area AA.

[0132] Taking the above-mentioned multiple scanning units A1 of each ring, including a first scanning unit A11 and a second scanning unit A12 with different operating frequencies, as shown in Figures 8 and 9, the first scanning unit A11 includes a transmission gap 232 on the gap electrode 231 whose length pointing O2 away from the center of the circle is clockwise to the radial direction O1 where the center point of the transmission gap 232 is located, forming a first angle θ1. The second scanning unit A12 includes a transmission gap 232 on the gap electrode 231 whose length pointing O2 away from the center of the circle is counterclockwise to the radial direction O1 where the center point of the transmission gap 232 is located, forming a first angle θ1.

[0133] This facilitates the differentiation of the first scanning unit A11 and the second scanning unit A12 within the scanning area AA, thereby simplifying the manufacturing process of the first scanning unit A11 and the second scanning unit A12 when manufacturing the scanning panel 100.

[0134] For example, the first scanning unit A11 includes a slit electrode 231 whose transmission slit 232, pointing away from the center, has a radial direction O2 that moves clockwise to the center point of the transmission slit 232, forming a first angle θ1 of 45 degrees. The second scanning unit A12 includes a slit electrode 231 whose transmission slit 232, pointing away from the center, has a radial direction O2 that moves counterclockwise to the center point of the transmission slit 232, forming a first angle θ1 of 45 degrees.

[0135] In other embodiments, as shown in Figures 10 and 11, each ring includes multiple sets of scanning units A1; the length directions O2 of the transmission gaps 232 on the multiple gap electrodes 231 in each set of scanning units A1 are parallel to each other, the center points of the multiple transmission gaps 232 are collinear and form a straight line segment L, and the length direction O2 of the transmission gaps 232 in each set of scanning units A1 and the radial direction O3 where the midpoint of the straight line segment L is located are both at a second angle θ2, the second angle θ2 is greater than or equal to 30 degrees and less than or equal to 60 degrees.

[0136] In this way, it can be ensured that the transmission gap 232 on the gap electrode 231 in each group of multiple scanning units A1 points away from the center in the same direction, thereby ensuring that multiple scanning units A1 are evenly distributed in the scanning area AA, while simplifying the manufacturing process of each group of scanning units A1.

[0137] For example, the second included angle θ2 formed by the length direction O2 of the transmission slot 232 on the multiple slot electrodes 231 of each group and the radial direction O3 where the center point of the straight line segment L is located is 30 degrees, 35 degrees, 40 degrees, 45 degrees, 50 degrees, 55 degrees, and 60 degrees.

[0138] Furthermore, the second angle θ2 formed by the length direction O2 of the transmission gap 232 on the multiple gap electrodes 231 of each group and the radial direction O3 where the center point of the straight line segment L is located can be set to 45 degrees, so as to ensure that the size occupied by each scanning unit A1 in the radial direction is close to the size occupied in the circumferential direction, that is, the area occupied by each scanning unit A1 is approximately square, thereby ensuring the uniformity of the distribution of multiple scanning units A1 in the scanning area AA.

[0139] Taking the example of multiple scanning units A1 in each ring as described above, including first scanning unit A11 and second scanning unit A12 with different operating frequencies, the multiple sets of scanning units A1 include at least one first set of scanning units A1 and one second set of scanning units A1. The first set of scanning units A1 and the second set of scanning units A1 have different operating frequencies. In the first set of scanning units A1, the length of the transmission gap 232 on the gap electrode 231 away from the center of the circle points O2 clockwise to the radial direction O3 where the midpoint of the first straight line segment L11 is located, forming a second included angle θ2. In the second set of scanning units A1, the length of the transmission gap 232 on the gap electrode 231 away from the center of the circle points O2 counterclockwise to the radial direction O3 where the midpoint of the second straight line segment L12 is located, forming a second included angle θ2.

[0140] This facilitates the differentiation of the first scanning unit A11 and the second scanning unit A12 within the scanning area AA, thereby simplifying the manufacturing process of the first scanning unit A11 and the second scanning unit A12 when manufacturing the scanning panel 100.

[0141] In some embodiments, as shown in FIG3, the distance A between the center point of the transmission slot 232 on the slot electrode 231 and the drive circuit 111 is greater than or equal to 800 micrometers and less than or equal to 900 micrometers.

[0142] In this way, while ensuring a large transmission gap 232 on the slot electrode 231, it avoids overlapping areas between the transmission gap 232 and the driving circuit 111 in the thickness direction of the scanning panel 100 when adjusting the length and orientation of the transmission gap 232, which would affect the radiation of electromagnetic waves along the transmission gap 232. Simultaneously, it avoids excessively long connection traces between the driving circuit 111 and the radiating patch 171, which would affect the driving efficiency of the radiating patch 171. For example, the distance between the center point of the transmission gap 232 on the slot electrode 231 and the driving circuit 111 is 800 micrometers, 820 micrometers, 840 micrometers, 860 micrometers, 880 micrometers, 900 micrometers, etc.

[0143] In this embodiment of the present disclosure, for the annular scanning area AA, the scanning panel 100 further includes a driving module (such as a Gate driving module or a Source driving module) located on the periphery B1 of the scanning area, so as to connect with the gate line 122 and data line 153 in the scanning area AA on the first substrate 10 through the driving module, so as to ensure the normal driving of the driving circuit 111; at the same time, the scanning panel 100 also includes a common electrode trace B3 surrounding the scanning area AA disposed on the periphery B1 and the inner circle B2 of the scanning area, so as to connect with the slit electrode 231 on the second substrate 20 through the common electrode trace B3, so as to apply voltage to the slit electrode 231.

[0144] The area B1 surrounding the scanning area can be the outer area of ​​the scanning area AA, and the area B2 within the scanning area can be the inner area of ​​the scanning area AA. Furthermore, the explanations of the outer area B1 and inner area B2 of the scanning area described below are all based on the above descriptions, and will not be repeated here.

[0145] The driving module and the common electrode trace B3 can both be located on the first substrate 10. The connection between the common electrode trace B3 and the gap electrode 231 can be achieved by providing conductive silver paste dots between the first substrate 10 and the second substrate 20 to connect the common electrode trace B3 and the gap electrode 231 through the silver paste dots; or by doping conductive particles in the adhesive frame between the first substrate 10 and the second substrate 20 to connect the common electrode trace B3 and the gap electrode 231 through the conductive particles, etc.

[0146] Alternatively, when connecting the common electrode trace B3 to the gap electrode 231 using conductive particles doped within the frame, the second substrate 20 can include a transition metal layer (such as an ITO metal layer) on the same layer as the gap metal layer 23 and disposed around the gap metal layer 23 (such as a copper metal layer). The thickness of the transition metal layer is less than the thickness of the gap metal layer 23, and the frame is in direct contact with the transition metal layer. In this way, by thinning the metal layer connected to the frame on the second substrate 20, the large particle size of the conductive particles can be avoided from affecting the support of the multiple isolation pillars 40 between the first substrate 10 and the second substrate 20.

[0147] Furthermore, a grounding trace B4 can be provided around and / or inside the scanning area AA to connect to the electrostatic discharge circuit on the scanning panel 100, thereby avoiding the influence of electrostatic discharge on the performance of the scanning panel 100, and ensuring the scanning performance of the scanning panel 100 and the radiation performance of electromagnetic waves along the transmission gap 232.

[0148] In some embodiments, the first substrate 10 further includes a support electrode in the same layer as the radiating patch 171.

[0149] Thus, the support electrodes on the outer periphery B1 and inner ring of the scanning area facilitate the consistency of the gap between the first substrate 10 and the second substrate 20 of the scanning panel 100, that is, ensure the uniformity of the dielectric layer 30 thickness, thereby ensuring the intended effect of each scanning unit A1.

[0150] In this design, both the outer periphery B1 and the inner periphery B2 of the scanning area may have supporting electrodes. Since the supporting electrodes are disposed in the same layer as the radiating patch 171, the radiating patch 171 and the supporting electrodes can be fabricated simultaneously in a single process, thus simplifying the fabrication process of the first substrate 10. Of course, in addition to being disposed in the same layer as the radiating patch 171, the supporting electrodes may also be disposed in the same layer as the gate metal layer 12, the active layer 14, or the source / drain metal layer 15, in conjunction with the metal layers included in the first substrate 10.

[0151] In some embodiments, the first substrate 10 also includes support circuitry.

[0152] Thus, the support circuits arranged around the scanning area B1 and the inner ring facilitate the consistency of the gap between the first substrate 10 and the second substrate 20 of the scanning panel 100, that is, ensure the uniformity of the dielectric layer 30 thickness, thereby ensuring the intended effect of each scanning unit A1.

[0153] In this embodiment, both the outer periphery B1 and the inner ring B2 of the scanning area may have support circuits, and the specific structure of the support circuits can refer to the driving circuit 111 described above. Of course, the support circuits may also include only one of the driving transistor 112 and the storage capacitor 113 of the driving circuit 111, and this embodiment does not limit this. In addition, when the outer periphery B1 and the inner ring of the scanning area include support electrodes, since the support electrodes do not need to be loaded with voltage, there may be no signal between the support circuit and the support electrodes. It only serves to support the film layer, and the support electrodes do not need to be provided with transmission gaps 232 for feeding electromagnetic waves in the area corresponding to the gap electrodes.

[0154] In some implementations, as shown in FIG12, the scanning area AA includes a plurality of scanning sub-areas A4 distributed circumferentially, and each scanning sub-area A4 is surrounded by signal traces (examples of common electrode trace B3 and ground trace B4 in the figure), and each scanning sub-area A4 has a driving module (not shown in the figure) on its periphery.

[0155] In this way, by setting up multiple scanning sub-regions A4, and the corresponding drive module and signal traces for each scanning sub-region A4, the individual control of multiple scanning sub-regions A4 can be achieved, thereby shortening the length of the signal traces and shortening the length of the gate line 122 and data line 153 between the drive module and the drive circuit 111. This facilitates improving the driving efficiency of the scanning unit A1 within the scanning area AA, while reducing the driving load of the scanning unit A1.

[0156] For example, as shown in Figure 12, the scanning area AA includes four scanning sub-areas A4 distributed at intervals, so that the scanning unit A1 in the four scanning sub-areas A4 can be synchronously controlled by the driving module in each scanning sub-area A4, while reducing the driving load of the scanning unit A1.

[0157] The driving module corresponding to each scanning sub-region A4 can be located in the outer area of ​​each scanning sub-region A4. The signal traces surrounding each scanning sub-region A4 can be a ring of signal traces set in the scanning sub-region A4, as well as the inner circle and the outer circle of the scanning sub-region A4.

[0158] As shown in Figure 12, the signal traces include a common electrode trace B3, meaning that each scan sub-region A4 is surrounded by a ring of common electrode traces B3. Thus, each scan sub-region A4 can be connected to the gap metal layer 23 of the second substrate 20 via the ring of common electrode traces B3 (the connection method can be referred to above), thereby shortening the voltage loading path on the gap metal layer 23, improving the driving efficiency of the scan unit A1 within each scan sub-region A4, and simultaneously reducing the driving load of the scan unit A1.

[0159] Furthermore, as shown in Figure 12, the signal traces also include a ground trace B4, meaning that each scanning sub-region A4 is surrounded by a ring of ground traces B4. In this way, the ring of ground traces B4 in each scanning sub-region A4 can be connected to the electrostatic discharge circuit within each scanning sub-region A4, thereby shortening the electrostatic discharge path and improving the electrostatic discharge effect within each scanning sub-region A4, while simultaneously ensuring the scanning performance of the scanning unit A1.

[0160] In some implementations, the spacing between two adjacent scanning sub-regions A4 is greater than or equal to the distance between two adjacent scanning units A1 in the circumferential direction.

[0161] In this way, the problem of interference caused by some scanning units A1 being too close in adjacent scanning sub-regions A4 can be avoided. At the same time, when the distance between two adjacent scanning sub-regions A4 is equal to the distance between two adjacent scanning units A1, the integration of multiple scanning sub-regions A4 can be visually achieved, thereby ensuring the uniformity of the distribution of multiple scanning units A1 in the scanning area AA.

[0162] In some implementations, the scanning units A1 within the multiple scanning sub-regions A4 are rotationally symmetric. This ensures that the multiple scanning sub-regions A4 are of uniform size, meaning that the number of scanning units A1 within each scanning sub-region A4 is the same. This simplifies the layout design of the multiple scanning units A1 while ensuring the synchronization of the control of each scanning unit A1 within the multiple scanning sub-regions A4.

[0163] In this embodiment of the disclosure, the multiple scanning units A1 in the scanning area AA may be arranged in a non-uniform density, and the spacing between some scanning units A1 is relatively large. In order to ensure the stability of the multiple isolation pillars 40 supporting each scanning unit A1, a distribution method of multiple isolation pillars 40 between the first substrate 10 and the second substrate 20 is provided.

[0164] As shown in Figure 13 or Figure 14, the scanning area AA includes an effective electrode area A2 corresponding to each scanning unit A1 and an ineffective area A3 located around the effective electrode area A2. The length direction of the effective electrode area A2 is parallel to the length direction of the transmission gap 232 on the gap electrode 231, and the radiation patch 171 and the transmission gap 232 on the gap electrode 231 are both located within the effective electrode area A2. The driving circuit 111 is located in the ineffective area A3.

[0165] The effective electrode region A2 can be an elongated rectangular region including the radiating patch 171 and the transmission gap 232, with the length of the effective electrode region A2 slightly greater than the length of the transmission gap 232, and the width of the effective electrode region A2 slightly greater than the dimension of the radiating patch 171 in the width direction of the transmission gap 232. For example, as shown in Figure 13 or Figure 14, the effective electrode region A2 is an elongated rectangle.

[0166] In some embodiments, as shown in FIG13 or FIG14, the plurality of isolation pillars 40 include a plurality of first isolation pillars 41 located in the effective electrode region A2 and a plurality of second isolation pillars 42 located in the non-effective region A3. The support height of the first isolation pillars 41 is equal to the support height of the second isolation pillars 42. The plurality of first isolation pillars 41 are distributed on both sides of the transmission gap 232 along the length direction. The arrangement direction of each group of first isolation pillars 41 is parallel to the length direction of the effective electrode region A2, and the orthographic projection of the plurality of first isolation pillars 41 on the first substrate 10 is located at the periphery of the radiating patch 171.

[0167] Thus, through multiple sets of first isolation pillars 41 surrounding the transmission gap 232 in the effective electrode region A2, effective support is achieved for the effective electrode region A2 where the scanning unit A1 is located. At the same time, through multiple second isolation pillars 42 in the non-effective region A3, effective support is achieved for the surrounding non-effective region A3. This effectively ensures the effective support between the first substrate 10 and the second substrate 20 in the scanning region AA, so as to ensure that the spacing between the first substrate 10 and the second substrate 20 in the scanning region AA is basically consistent, that is, to ensure that the thickness of the dielectric layer 30 in the scanning region AA is basically consistent.

[0168] In this configuration, the ratio between the unit support area of ​​the first isolation pillar 41 and the unit support area of ​​the corresponding second isolation pillar 42 for each scanning unit A1 is greater than or equal to 3. For example, the ratio of their unit support areas is 3, 4, 5, 6, etc., to achieve low-density support for the second isolation pillar 42. The support heights of the first isolation pillar 41 and the second isolation pillar 42 are consistent. This can be because the heights of the first isolation pillar 41 and the second isolation pillar 42 are the same, and the thickness of the occupancy film layer in their respective regions is the same; or the difference in height between the first isolation pillar 41 and the second isolation pillar 42 is equal to the difference in thickness of the occupancy film layer in their respective regions. When the thickness of the occupancy film layer in the regions where the first isolation pillar 41 and the second isolation pillar 42 are located is the same, the first substrate 10 can include multiple first occupancy electrodes 172 on the same layer as the radiating patch 171, and one end of each of the first isolation pillar 41 and the second isolation pillar 42 has a first occupancy electrode 172.

[0169] The number of groups of first isolation pillars 41 in the effective electrode region A2 can be set according to the relative position of the radiation patch 171 and the transmission gap 232. The number of first isolation pillars 41 in each group of multiple groups of first isolation pillars 41 in the effective electrode region A2 can be the same or different.

[0170] For example, as shown in Figure 13 or Figure 14, the plurality of isolation pillars 40 include four groups of first isolation pillars 41 located within each effective electrode region A2, and each group includes four first isolation pillars 41.

[0171] Of the four sets of first isolation pillars 41, two sets are located on one side of the transmission gap 232 along its length and are distributed on both sides of the radiating patch 171. The remaining two sets are located on the other side of the transmission gap 232 along its length and are also distributed on both sides of the radiating patch 171. Furthermore, the multiple first isolation pillars 41 included in the four sets are symmetrically distributed along a centerline parallel to the width direction of the transmission gap 232, thereby ensuring the uniformity of support for the effective electrode region A2 by the three sets of first isolation pillars 41. For example, all four sets of first isolation pillars 41 are located near the end of the transmission gap 232 along its length.

[0172] Optionally, as shown in Figure 15, the transmission slot 232 on the slot electrode 231 includes a rectangular segment 233 and arc-shaped segments 234 located at both ends of the rectangular segment 233; the multiple sets of first isolation pillars 41 include two sets of first isolation pillars 41 located on the same side of the transmission slot 232 and on both sides of the radiating patch 171, and one of the first isolation pillars 41 in each set of first isolation pillars 41, which is away from the radiating patch 171, protrudes from the end of the rectangular segment 233 along the length direction of the transmission slot 232. In this way, it can be ensured that the main body of the transmission slot 232 on the slot electrode 231 (i.e., the rectangular segment 233 part) is completely within the support area of ​​the multiple sets of first isolation pillars 41, thereby ensuring the effective support of the multiple sets of first isolation pillars 41 for the effective electrode area A2 where the scanning unit A1 is located.

[0173] Optionally, as shown in Figure 16, the plurality of first isolation pillars 41 include two sets of first isolation pillars 41 located on the same side of the transmission gap 232 and on both sides of the radiating patch 171. In each set of first isolation pillars 41, one first isolation pillar 41 away from the radiating patch 171 protrudes from the end of the transmission gap 232 along the length direction of the transmission gap 232. In this way, it can be ensured that the transmission gap 232 on the gap electrode 231 is completely within the support area of ​​the plurality of first isolation pillars 41, thereby further ensuring the effective support of the plurality of first isolation pillars 41 for the effective electrode area A2 where the scanning unit A1 is located.

[0174] Optionally, the distance between each set of first isolation pillars 41 and the radiating patch 171 is less than or equal to 200 micrometers, thereby ensuring that each set of first isolation pillars 41 effectively supports the area near the radiating patch 171.

[0175] Furthermore, the distance between each group of first isolation pillars 41 and the radiating patch 171 can be set to be less than or equal to 100 micrometers. For example, the distance between each group of first isolation pillars 41 and the radiating patch 171 can be 10 micrometers, 20 micrometers, 40 micrometers, 60 micrometers, 80 micrometers, 100 micrometers, etc.

[0176] In this case, there is no overlapping area between each group of first isolation pillars 41 and the radiating patch 171 in the thickness direction of the scanning panel 100. It is even possible to set the distance between each group of first isolation pillars 41 and the radiating patch 171 to be greater than 5 micrometers, so as to avoid the four groups of first isolation pillars 41 affecting the electric field formed between the radiating patch 171 and the slit electrode 231.

[0177] Optionally, the spacing between two adjacent first isolation pillars 41 in each group of first isolation pillars 41 is greater than or equal to 10 micrometers, thereby ensuring a large gap between two adjacent first isolation pillars 41 to facilitate the flow of dielectric layer 30 in the gap between two adjacent first isolation pillars 41.

[0178] Furthermore, the spacing between two adjacent first isolation pillars 41 in each group can be set to be greater than or equal to 50 micrometers to further ensure the flow of dielectric layer 30 in the gap between two adjacent first isolation pillars 41. For example, the spacing between two adjacent first isolation pillars 41 is 50 micrometers, 60 micrometers, 80 micrometers, 100 micrometers, etc.

[0179] In some implementations, for multiple scanning units A1 within the scanning area AA, the unit support area of ​​the first isolation pillar 41 corresponding to each scanning unit A1 can be equal, that is, the ratio of the total support area of ​​multiple sets of first isolation pillars 41 within each effective electrode area A2 to the area of ​​the effective electrode area A2 is equal, so as to ensure the stability of the support of multiple scanning units A1 within the scanning area AA.

[0180] Among them, the first scanning unit A11 and the second scanning unit A12, which have different structural dimensions, can be set up with the same support method or with different support methods.

[0181] When the same support method is used, the first scanning unit A11 and the second scanning unit A12 have effective electrode areas A2 of the same size, and the multiple sets of first isolation pillars 41 within the effective electrode area A2 are arranged in exactly the same way. However, when different support methods are used, the first scanning unit A11 and the second scanning unit A12 may have effective electrode areas A2 of different sizes. Assuming that the unit support area of ​​the first isolation pillar 41 corresponding to the first scanning unit A11 is known, the total support area of ​​the multiple sets of first isolation pillars 41 corresponding to the second scanning unit A12 can be determined by combining the area of ​​the effective electrode area A2 corresponding to the second scanning unit A12. Then, based on the total support area of ​​the multiple sets of first isolation pillars 41, the structural parameters, spacing parameters, and number of each set of first isolation pillars 41 can be designed.

[0182] In some embodiments, as shown in FIG13 or FIG14, the plurality of second isolation pillars 42 include a first sub-isolation pillar 421 and a pair of second sub-isolation pillars 422; the distance from the first sub-isolation pillar 421 to the drive circuit 111 is less than or equal to 5 mm, and the pair of second sub-isolation pillars 422 are located on both sides of the effective electrode region A2 in the length direction.

[0183] Thus, by setting the first sub-isolation pillar 421 and a pair of second sub-isolation pillars 422, the effective support of the non-effective area A3 near the drive circuit 111 and the effective support of the non-effective area A3 near the scanning unit A1 are respectively achieved, thereby ensuring the effective support of the non-effective area A3 around the scanning unit A1.

[0184] The distance from the first sub-isolation pillar 421 to the driving circuit 111 can be the distance to the driving transistor 112, the distance to the storage capacitor 113, or the maximum distance to both the driving transistor 112 and the storage capacitor 113.

[0185] Furthermore, the distance from the first sub-isolation post 421 to the drive circuit 111 can be set to be less than or equal to 0.5 mm, to further ensure the effective support of the first sub-isolation post 421 for the ineffective area A3 near the drive circuit 111. For example, the distance from the first sub-isolation post 421 to the drive circuit 111 is 0.1 mm, 0.2 mm, 0.3 mm, 0.4 mm, 0.5 mm, etc.

[0186] Optionally, for a pair of second sub-isolation pillars 422 distributed on both sides of the effective electrode region A2 along the length direction of the effective electrode region A2, the pair of second sub-isolation pillars 422 can be symmetrically distributed on both sides of the effective electrode region A2, and the plane containing the center point of the pair of second sub-isolation pillars 422 and the transmission gap 232 on the gap electrode 231 is parallel to the thickness direction of the scanning panel 100.

[0187] For example, for a plurality of second isolation pillars 42 including a first sub-isolation pillar 421 and a pair of second sub-isolation pillars 422, as shown in FIG13 or FIG14, the distance between the first sub-isolation pillar 421 and the effective electrode region A2 is 500 micrometers in the radial direction O1 where the center point of the transmission gap 232 is located, and the distance between the first sub-isolation pillar 421 and the center point of the transmission gap 232 is 250 micrometers in the tangential direction O4 of the circumference where the center point of the transmission gap 232 is located; the pair of second sub-isolation pillars 422 are symmetrically distributed on both sides of the effective electrode region A2, and the distance between the second sub-isolation pillar 422 and the center point of the transmission gap 232 in the radial direction O1 where the center point of the transmission gap 232 is located, and the distance between the second sub-isolation pillar 422 and the center point of the transmission gap 232 in the tangential direction O4 of the circumference where the center point of the transmission gap 232 is located, is 500 micrometers.

[0188] In some implementations, for the multi-ring scanning unit A1 within the scanning area AA, the sum of the unit support areas of the first isolation column 41 and the second isolation column 42 corresponding to each ring scanning unit A1 can be equal. That is, the ratio of the total support area of ​​the first isolation column 41 and the second isolation column 42 within the annular area where each ring scanning unit A1 is located to the area of ​​the annular area is equal, so as to ensure the stability of the multi-ring scanning unit A1 within the scanning area AA.

[0189] Regarding the support design of the first isolation pillar 41 and the second isolation pillar 42 in two adjacent ring scanning units A1, the support design of the first isolation pillar 41 can refer to the above-described embodiment, while the support design of the second isolation pillar 42 can be calculated based on the fact that the unit support area corresponding to each ring scanning unit A1 is equal. For example, for adjacent m-th ring scanning units A1 and m+1-th ring scanning units A1, assuming that the m-th ring scanning unit A1 has X scanning units A1 and the area of ​​its ring region is Sm, the m+1-th ring scanning unit A1 has Y scanning units A1 and the area of ​​its ring region is Sm+1, the unit support area S1 of the first isolation pillar 41 corresponding to scanning unit A1, and the unit support area S2 of the second isolation pillar 42 corresponding to scanning unit A1 within the m-th ring scanning unit A1, then the sum of S1 and S2 can be determined first, and then the product with X can be determined to determine the total support area of ​​the m-th ring scanning unit A1. Finally, the ratio of the total support area to Sm can be calculated. The unit support area corresponding to the m-th ring scanning unit A1 is determined; the ratio of the unit support area corresponding to the m-th ring scanning unit A1 to Sm+1 is determined as the total support area of ​​the (m+1)-th ring scanning unit A1; the ratio of this total support area to Y is then determined as the support area of ​​the isolation column 40 corresponding to each scanning unit A1 in the (m+1)-th ring scanning unit A1; the difference between the support area of ​​the isolation column 40 and S1 is then determined as the support area of ​​the second isolation column 42 corresponding to each scanning unit A1 in the (m+1)-th ring scanning unit A1; and finally, the structural parameters of the second isolation column 42 (i.e., the support area of ​​one second isolation column 42) are determined based on the total support area of ​​the second isolation column 42.

[0190] Based on the above process, after determining the structural parameters of the second isolation pillar 42 corresponding to each ring scanning unit A1, if the diameter difference of the second isolation pillar 42 between two adjacent rings is less than 1 micrometer, the diameter of the second isolation pillar 42 in the multi-ring scanning unit A1 can be used for gradient design to simplify the structural design of the second isolation pillar 42. For example, the multi-ring scanning unit A1 may include multiple groups of scanning units A1 distributed radially, and each group of multi-ring scanning units A1 uses the same second isolation pillar 42 design, with the radial difference of the second isolation pillar 42 being the same between two adjacent groups of scanning units A1.

[0191] In this system, the number of rings of scanning units A1 in each group of scanning units A1 can be the same or different. For example, each group may include two rings of scanning units A1, and the diameter difference of the second isolation pillar 42 between adjacent groups of scanning units A1 is 1 micrometer. In addition, since the structural dimensions of the second isolation pillar 42 are all equal between the multi-ring scanning units A1 in each group, there will be a slight difference in the unit support area of ​​the second isolation pillar 42. That is, in each group of multi-ring scanning units A1, there will be a slight difference in the sum of the unit support areas of the first isolation pillar 41 and the second isolation pillar 42 corresponding to each ring of scanning unit A1.

[0192] In some embodiments, as shown in FIG13 or FIG14, the plurality of isolation columns 40 further include a plurality of third isolation columns 43 located in the non-effective area A3, wherein the support height of the third isolation columns 43 is less than the support height of the second isolation columns 42.

[0193] The support height of the third isolation column 43 is less than that of the second isolation column 42. This provides support for the scanning panel 100 against pressure and deformation, based on the support of the first isolation columns 41 and 42, thereby improving the structural strength of the scanning panel 100. Furthermore, the ratio between the unit support area of ​​the first isolation column 41 and the unit support area of ​​the corresponding third isolation column 43 for each scanning unit A1 is greater than or equal to 3. For example, the ratio of their unit support areas is 3, 4, 5, 6, etc., to achieve low-density support for the third isolation column 43.

[0194] The multiple third isolation pillars 43 are located on the same side of the effective electrode region A2 along its length, or distributed on both sides of the effective electrode region A2 along its length. For example, the non-effective region A3 includes two third isolation pillars 43, and as shown in FIG13, both third isolation pillars 43 are located on the same side of the effective electrode region A2 along its length, or as shown in FIG14, the two third isolation pillars 43 are respectively located on both sides of the effective electrode region A2 along its length.

[0195] For example, for the two third isolation pillars 43 of the non-effective area A3, as shown in Figure 13 or Figure 14, one third isolation pillar 43 is located on the tangent direction O4 of the circumference where the center point of the transmission gap 232 is located, and the distance between it and the center point of the transmission gap 232 is (350+500) micrometers. The other third isolation pillar 43 is located on the radial direction O1 where the center point of the transmission gap 232 is located, and the distance between it and the center point of the transmission gap 232 is 350 micrometers. On the tangent direction O4 of the circumference where the center point of the transmission gap 232 is located, the distance between it and the center point of the transmission gap 232 is (500+500) micrometers.

[0196] In the case where the support height of the third isolation post 43 is less than the support height of the second isolation post 42, the third isolation post 43 and the second isolation post 42 may have the same height, and the occupancy membrane layer in the area where the third isolation post 43 is located is thinner than the occupancy membrane layer in the area where the second isolation post 42 is located; or the third isolation post 43 may have a lower height than the second isolation post 42, and the occupancy membrane layer in the area where the third isolation post 43 is located is the same thickness as the occupancy membrane layer in the area where the second isolation post 42 is located; or the third isolation post 43 may have a lower height than the second isolation post 42, and the occupancy membrane layer in the area where the third isolation post 43 is located is thinner than the occupancy membrane layer in the area where the second isolation post 42 is located. In the case where the occupancy film layer in the region where the third isolation pillar 43 is located is thinner than the occupancy film layer in the region where the second isolation pillar 42 is located, the first substrate 10 may include, in addition to the first occupancy electrode 172, as shown in FIG17, a plurality of second occupancy electrodes 173 in the same layer as the radiating patch 171, and the thickness of the first occupancy electrode 172 is greater than the thickness of the second occupancy electrode 173, and one end of the third isolation pillar 43 has a second occupancy electrode 173.

[0197] Optionally, the unit support area of ​​the third isolation pillar 43 in the scanning units A1 of the two adjacent rings is equal, so as to ensure the uniformity of the support such as compression and deformation between the first substrate 10 and the second substrate 20 in the scanning area AA.

[0198] The support design for the third isolation pillar 43 in the scanning unit A1 of the two adjacent rings can be specifically referred to the design of the first isolation pillar 41 corresponding to the scanning unit A1 of different sizes mentioned above. This disclosure does not limit this aspect.

[0199] In some embodiments, the plurality of isolation pillars 40 further include a fourth isolation pillar 44 located at the outer periphery B1 and the inner ring B2 of the scanning area, and a fifth isolation pillar 45 located at the outer periphery B1 and the inner ring B2 of the scanning area. The support height of the fourth isolation pillar 44 and the support height of the fifth isolation pillar 45 are both equal to the support height of the first isolation pillar 41. Furthermore, the sum of the unit support areas of the fourth isolation pillar 44 and the fifth isolation pillar 45 at the outer periphery B1 of the scanning area, and the sum of the unit support areas of the fourth isolation pillar 44 and the fifth isolation pillar 45 at the inner ring B2 of the scanning area, are all less than the sum of the unit support areas of the first isolation pillar 41 and the second isolation pillar 42 corresponding to each ring scanning unit A1 within the scanning area AA.

[0200] Specifically, the design of the fourth isolation pillar 44 and the fifth isolation pillar 45 in the outer perimeter B1 and inner ring B2 of the scanning area ensures the overall uniformity of support between the first substrate 10 and the second substrate 20 in the scanning area AA, the outer perimeter B1, and the inner ring B2, thereby ensuring the overall support effect of the scanning panel 100. In addition, the support strength of the scanning panel 100 in the scanning area AA is greater than the support strength in the outer perimeter B1 and the inner ring B2, thereby ensuring the accommodation space of the dielectric layer 30 in the scanning area AA, while ensuring the control of the volume of the dielectric layer 30.

[0201] In the case where both the outer perimeter B1 and the inner perimeter B2 of the scanning area are provided with supporting electrodes as described above, the relative positions of the fourth isolation pillar 44 and the fifth isolation pillar 45 provided in the outer perimeter B1 and the inner perimeter B2 of the scanning area with respect to the supporting electrodes can be referenced to the relative positions of the first isolation pillar 41 (corresponding to the fourth isolation pillar 44), the second isolation pillar 42 (corresponding to the fifth isolation pillar 45) and the radiation patch 171 in the scanning area AA.

[0202] Furthermore, the plurality of isolation pillars 40 also includes a sixth isolation pillar 46 located at the outer perimeter B1 and the inner ring B2 of the scanning area. The support height of the sixth isolation pillar 46 is equal to the support height of the third isolation pillar 43, and the unit support area of ​​the sixth isolation pillar 46 at the outer perimeter B1 and the unit support area of ​​the sixth isolation pillar 46 at the inner ring B2 of the scanning area are both smaller than the unit support area of ​​the third isolation pillar 43 corresponding to each ring scanning unit A1 within the scanning area AA.

[0203] In this embodiment, the scanning panel 100 can be used for devices with low refresh rates, such as phased array antennas with a refresh rate of around 60Hz, or for devices with high refresh rates, such as phased array antennas with a refresh rate greater than or equal to 200Hz. When the scanning panel 100 is used for devices with high refresh rates, it is necessary to ensure that the driving circuit 111 connected to each scanning unit A1 has a high charging frequency to guarantee the charging rate of the driving circuit 111.

[0204] In conjunction with the above, the driving circuit 111 connected to each scanning unit A1 includes a driving transistor 112. Therefore, when the scanning panel 100 is used for devices with high refresh rates, the driving transistor 112 needs to have a large channel region 142 to ensure a large charging rate.

[0205] In some embodiments, the length-to-width ratio of the upper channel region 142 of the driving transistor 112 is greater than or equal to 90 and less than or equal to 120.

[0206] Thus, by setting the length-to-width ratio of the channel region 142, a smaller on-resistance and a larger charging current are achieved when the driving transistor 112 is turned on, thereby ensuring a larger charging rate, even reaching 95% or higher. For example, the length-to-width ratio of the channel region 142 on the driving transistor 112 is 90, 95, 100, 105, 110, 115, 120, etc.

[0207] The length of the channel region 142 can be the length of the doped region of the active portion 141 on the active layer 14 along the extension direction, and the width of the channel region 142 can be the distance between the first connection portion 143 and the second connection portion 144 of the active portion 141 on the active layer 14.

[0208] In some embodiments, as shown in FIG18, the first connecting line 151 and the second connecting line 152 are both straight lines and are distributed in parallel. The orthographic projections of the first connecting line 151 and the second connecting line 152 on the active layer 14 are located in the regions where the first connecting portion 143 (not shown in the figure) and the second connecting portion 144 (not shown in the figure) are located, respectively.

[0209] Thus, by defining the shapes of the first connecting line 151 and the second connecting line 152, the first connecting portion 143 and the second connecting portion 144 are both defined as straight lines, ensuring that the channel area 142 between the first connecting portion 143 and the second connecting portion 144 has a large length D1; at the same time, by setting the spacing between the first connecting line 151 and the second connecting line 152, the channel area 142 between the first connecting portion 143 and the second connecting portion 144 has a small width D2, thereby ensuring that the ratio of the length to the width of the channel area 142 is greater than or equal to 90 and less than or equal to 120.

[0210] In some other embodiments, as shown in FIG19, the first connecting line 151 has a straight portion and the second connecting line 152 has a U-shaped structure. The straight portion of the first connecting line 151 is located within the U-shaped structure of the second connecting line 152. The orthographic projections of the straight portion of the first connecting line 151 and the second connecting line 152 on the active layer 14 are respectively located in the regions where the first connecting portion 143 (not shown in the figure) and the second connecting portion 144 (not shown in the figure) are located.

[0211] Thus, by defining the shapes of the first connecting line 151 and the second connecting line 152, a U-shaped channel area 142 is formed between the first connecting portion 143 and the second connecting portion 144, thereby ensuring that the channel area 142 has a large length D3; at the same time, by setting the opening width of the U-shaped structure, when the straight portion is located within the U-shaped structure, the channel area 142 has a small width D4, thereby ensuring that the ratio of the length to the width of the channel area 142 is greater than or equal to 90 and less than or equal to 120.

[0212] In some other embodiments, as shown in FIG20, the first connecting line 151 and the second connecting line 152 are in an interdigitated structure, and the orthographic projections of the first connecting line 151 and the second connecting line 152 on the active layer 14 are respectively located in the regions where the first connecting portion 143 (not shown in the figure) and the second connecting portion 144 (not shown in the figure) are located.

[0213] Both the first connecting line 151 and the second connecting line 152 have a comb-like structure, and the comb teeth of the first connecting line 151 and the second connecting line 152 interlock to form an interdigitated structure. The interlocking of the two sets of comb teeth forms an S-shaped, continuously winding channel region 142, ensuring that the channel region 142 has a large length n*D5. Simultaneously, by setting the spacing between an adjacent comb tooth on the first connecting line 151 and an adjacent comb tooth on the second connecting line 152, the channel region 142 has a small width D6, ensuring that the length-to-width ratio of the channel region 142 is greater than or equal to 90 and less than or equal to 120. Furthermore, the interdigitated structure of the first connecting line 151 and the second connecting line 152 facilitates a reduction in the size of the driving transistor 112 in a single direction, thus avoiding excessive space occupation.

[0214] In some embodiments, since the scanning units A1 in the scanning area AA are arranged in a circular array, and in order to ensure that the gate lines 122 and data lines 153 on the first substrate 10 are simultaneously connected to the driving circuits 111 of multiple scanning units A1, the gate lines 122 and / or data lines 153 may have corners.

[0215] For example, as shown in Figure 21 or Figure 22, the data line 153 of the source / drain metal layer 15 has multiple corners. The following explanation will focus on the case where the data line 153 has corners.

[0216] In some embodiments, as shown in FIG21, the data line 153 has multiple corners, and at least some of the corners are covered with compensation blocks 155, the outer contour of which is an arc structure.

[0217] In this way, by covering the corner of the data line 153 with the compensation block 155, the sharp corner of the data line 153 is avoided, thereby avoiding the impact of static electricity generated by the data line 153. At the same time, the voltage drop or even breakdown of the adjacent film layer caused by overheating of the data line 153 at the corner is avoided.

[0218] The outer contour of the compensation block set at the corner can be circular, elliptical, etc., as long as sharp corners are avoided.

[0219] In other embodiments, as shown in FIG22, the gate line 122 and the data line 153 have multiple corners, and at least some of the corners are designed with rounded chamfers.

[0220] Thus, by using a rounded chamfer design at the corners, the sharp corners of the data cable 153 are avoided, thereby preventing the impact of static electricity generated by the data cable 153. At the same time, the voltage drop or even breakdown of the adjacent film layer caused by overheating of the data cable 153 at the corners is also avoided.

[0221] It should be noted that for the multiple corners on the data cable 153, one of the two above-described embodiments can be used for all of them, or some of the multiple corners can be designed using one of the two above-described embodiments, while the remaining corners can be designed using the other of the two above-described embodiments. This disclosure does not limit this.

[0222] In some embodiments, the first substrate 10 further includes a first electrostatic discharge circuit and a second electrostatic discharge circuit. One end of the first electrostatic discharge circuit is connected to the gate line 122, one end of the second electrostatic discharge circuit is connected to the data line 153, and the other ends of the first electrostatic discharge circuit and the second electrostatic discharge circuit are both connected to the voltage signal line 154.

[0223] Thus, through the design of the first electrostatic discharge circuit and the second electrostatic discharge circuit, the static electricity formed by the gate line 122 and the data line 153 on the first substrate 10 can be released along the electrostatic discharge circuit, so as to further avoid the influence of the static electricity formed by the gate line 122 and the data line 153 and ensure the stable loading of voltage on the radiating patch 171.

[0224] The structure of the first electrostatic discharge circuit can be the same as or different from that of the second electrostatic discharge circuit. Taking the first electrostatic discharge circuit as an example, the first electrostatic discharge circuit may include two transistors, three transistors, four transistors, etc. Taking the first electrostatic discharge circuit including two transistors as an example, the circuit diagram of the first electrostatic discharge circuit is shown in Figure 23. The control electrode g1 and the first stage s11 of the first transistor T1, and the first electrode s21 of the second transistor T2 are all connected to the voltage signal line 154. The control electrode g2 and the second electrode s22 of the second transistor T2, and the second electrode s12 of the first transistor T1 are all connected to the gate line 122.

[0225] Specifically, when the voltage signal line 154 accumulates charge due to static electricity and its potential is higher than the threshold voltage of the first transistor, the first electrode and the second stage of the first transistor are turned on. At this time, the accumulated charge is dispersed onto the gate line 122, achieving the function of dispersing static electricity. Conversely, when the gate line 122 accumulates charge due to static electricity and its potential is higher than the threshold voltage of the second transistor, the first electrode and the second stage of the second transistor are turned on. At this time, the accumulated charge is transferred to the voltage signal line 154, achieving the function of dispersing static electricity.

[0226] This disclosure also provides an antenna device, including the scanning panel 100 described in the above embodiments. This antenna device can be a holographic antenna or the like. By combining the scanning performance and electromagnetic wave radiation performance of the scanning panel 100 described above, the communication performance of the antenna device is guaranteed.

[0227] Other embodiments of this disclosure will readily occur to those skilled in the art upon consideration of the specification and practice of the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of this disclosure that follow the general principles of this disclosure and include common knowledge or customary techniques in the art not disclosed herein. The specification and examples are to be considered exemplary only, and the true scope and spirit of this disclosure are indicated by the appended claims.

Claims

1. A scanning panel, wherein, The scanning panel includes a scanning area, and the scanning panel includes: A first substrate includes a first substrate, and a plurality of driving circuits and a plurality of radiating patches on one side of the first substrate and located in the scanning area, wherein one of the driving circuits is connected to one of the radiating patches. The second substrate includes an integral second substrate and a plurality of slit electrodes on one side of the second substrate and located in the scanning area; The plurality of radiating patches and the plurality of slot electrodes correspond one-to-one, and one of the radiating patches and one of the slot electrodes constitute a scanning unit. The plurality of scanning units are arranged in a circular array. The orthographic projections of the radiating patch and the slot electrode of each scanning unit on the first substrate at least partially overlap, and at least part of the orthographic projection of the transmission slot on the slot electrode on the first substrate is located around the radiating patch. A dielectric layer is located between the first substrate and the second substrate.

2. The scanning panel as claimed in claim 1, wherein, The length direction of the transmission slot on each of the slot electrodes forms a first angle with the radial direction of the center point of the transmission slot, wherein the first angle is greater than or equal to 30 degrees and less than or equal to 60 degrees.

3. The scanning panel as described in claim 2, wherein, Each ring includes at least one first scanning unit and one second scanning unit, wherein the first scanning unit and the second scanning unit operate at different frequencies; The first scanning unit includes a slit electrode on which the transmission slit away from the center of the circle points in a radial direction along clockwise to the center point of the transmission slit, forming a first angle. The second scanning unit includes a slit electrode on which the transmission slit away from the center of the circle points in a radial direction along clockwise to the center point of the transmission slit, forming a first angle.

4. The scanning panel as claimed in claim 1, wherein, Each ring comprises multiple sets of scanning units; In each scanning unit, the length directions of the transmission slots on the multiple slot electrodes are parallel to each other, the center points of the multiple transmission slots are collinear and form a straight line segment, and the length direction of the transmission slot in each scanning unit forms a second angle with the radial direction where the midpoint of the straight line segment is located. The second angle is greater than or equal to 30 degrees and less than or equal to 60 degrees.

5. The scanning panel as described in claim 4, wherein, The plurality of scanning units includes at least one first group of scanning units and one second group of scanning units, wherein the first group of scanning units and the second group of scanning units operate at different frequencies; In the first group of scanning units, the length of the transmission slit on the slit electrode pointing away from the center of the circle forms a second angle along the radial direction from the midpoint of the first straight line segment clockwise. In the second group of scanning units, the length of the transmission slit on the slit electrode pointing away from the center of the circle forms a second angle along the radial direction from the midpoint of the second straight line segment counterclockwise.

6. The scanning panel as claimed in claim 1, wherein, The number of scanning units in each ring increases in the direction away from the center.

7. The scanning panel as claimed in claim 1, wherein, The scanning area includes multiple scanning sub-regions distributed circumferentially. Each scanning sub-region is surrounded by signal traces, and each scanning sub-region has a driving module on its periphery.

8. The scanning panel as claimed in claim 7, wherein, The signal traces include common electrode traces and ground traces.

9. The scanning panel as claimed in claim 7 or 8, wherein, The spacing between two adjacent scanning sub-regions is greater than or equal to the distance between two adjacent scanning units in the circumferential direction.

10. The scanning panel as described in any one of claims 1-8, wherein, The orthographic projection of the transmission slot on the slot electrode onto the first substrate has both ends along the length direction of the transmission slot located outside the area where the radiating patch is located, and both ends along the width direction of the transmission slot are located outside the area where the orthographic projection of the transmission slot is located.

11. The scanning panel as claimed in claim 10, wherein, The scanning area includes an effective electrode area corresponding to each scanning unit and an ineffective area located around the effective electrode area. The length direction of the effective electrode area is parallel to the length direction of the transmission slot on the slot electrode. The radiation patch and the transmission slot on the slot electrode are both located within the effective electrode area, and the driving circuit is located in the ineffective area. The scanning panel includes a plurality of isolation pillars located between the first substrate and the second substrate. The plurality of isolation pillars include a plurality of first isolation pillars located in the effective electrode region and a plurality of second isolation pillars located in the non-effective region. The support height of the first isolation pillar is equal to the support height of the second isolation pillar. The plurality of first isolation pillars are distributed on both sides of the transmission gap along the length direction. The arrangement direction of each group of first isolation pillars is parallel to the length direction of the effective electrode area, and the orthographic projection of the plurality of first isolation pillars on the first substrate is located at the periphery of the radiating patch.

12. The scanning panel as claimed in claim 11, wherein, The distance between each set of first isolation pillars and the radiation patch is less than or equal to 200 micrometers.

13. The scanning panel as claimed in claim 11, wherein, The spacing between any two adjacent first isolation columns in each group is greater than or equal to 10 micrometers.

14. The scanning panel as claimed in claim 11, wherein, The transmission slot on the slot electrode includes a rectangular segment and an arc-shaped segment located at the end of the rectangular segment; The plurality of first isolation pillars includes two sets of first isolation pillars located on the same side of the transmission gap and on both sides of the radiating patch. In each set of first isolation pillars, one first isolation pillar away from the radiating patch protrudes from the end of the rectangular segment along the length direction of the transmission gap.

15. The scanning panel as claimed in claim 11, wherein, The plurality of first isolation pillars includes two sets of first isolation pillars located on the same side of the transmission gap and on both sides of the radiating patch. In each set of first isolation pillars, one first isolation pillar away from the radiating patch protrudes from the end of the transmission gap along the length direction of the transmission gap.

16. The scanning panel as described in any one of claims 11-15, wherein, The unit support area of ​​the first isolation column corresponding to each scanning unit is equal, and the sum of the unit support areas of the first isolation column and the second isolation column within the annular area where each ring scanning unit is located is equal.

17. The scanning panel as described in any one of claims 11-15, wherein, The plurality of second isolation pillars include a first sub-isolation pillar and a pair of second sub-isolation pillars; The distance from the first sub-isolation post to the drive circuit is less than or equal to 5 mm, and the pair of second sub-isolation posts are located on both sides of the effective electrode region in the length direction.

18. The scanning panel as described in any one of claims 11-15, wherein, The plurality of isolation columns includes a plurality of third isolation columns located in the non-effective region; The support height of the third isolation column is less than the support height of the second isolation column, and the plurality of third isolation columns are located on the same side of the effective electrode area in the length direction, or distributed on both sides of the effective electrode area in the length direction.

19. The scanning panel of claim 18, wherein, The unit support area of ​​the third isolation column in the scanning units of two adjacent rings is equal.

20. The scanning panel of claim 18, wherein, The first substrate includes a plurality of first occupant electrodes and a plurality of second occupant electrodes on the same layer as the radiating patch, wherein the thickness of the first occupant electrodes is greater than the thickness of the second occupant electrodes. The first isolation post and the second isolation post each have the first occupant electrode at one end, and the third isolation post has the second occupant electrode at one end.

21. The scanning panel as claimed in claim 20, wherein, The plurality of isolation pillars also includes a fourth isolation pillar located outside the scanning area and inside the scanning area, and a fifth isolation pillar located outside the scanning area and inside the scanning area; The support height of the fourth isolation column and the support height of the fifth isolation column are both equal to the support height of the first isolation column. Furthermore, the sum of the unit support areas of the fourth and fifth isolation columns outside the scanning area, and the sum of the unit support areas of the fourth and fifth isolation columns inside the scanning area, are all less than the sum of the unit support areas of the first and second isolation columns corresponding to each ring scanning unit within the scanning area.

22. The scanning panel as described in any one of claims 1-8, wherein, The driving circuit includes a driving transistor and a storage capacitor, and the first substrate includes gate lines, data lines and voltage signal lines. The control stage of the driving transistor is connected to the gate line, the first electrode of the driving transistor is connected to the data line, the second stage of the driving transistor is connected to the first plate of the storage capacitor and the radial patch, and the second plate of the storage capacitor is connected to the voltage signal line.

23. The scanning panel as claimed in claim 22, wherein, The first substrate includes a gate metal layer, an active layer, and a source / drain metal layer sequentially stacked on the side of the first substrate near the second substrate; The gate metal layer includes a conductive portion, the active layer includes an active portion, the active portion has a channel region and a first connection portion and a second connection portion located on both sides of the channel region, and the channel region and the conductive portion have an overlapping area in the direction perpendicular to the scanning panel, and the source drain metal layer includes a first connection line and a second connection line. The area on the conductive portion that overlaps with the channel region forms the control electrode of the driving transistor, and the ratio of the length to the width of the channel region is greater than or equal to 90 and less than or equal to 120. The first connecting portion and the second connecting portion form the first electrode and the second electrode of the driving transistor, respectively, and the first connecting line and the second connecting line are respectively connected to the first connecting portion and the second connecting portion.

24. The scanning panel as claimed in claim 23, wherein, The first connecting line and the second connecting line have an interdigitated structure, and the orthographic projections of the first connecting line and the second connecting line on the active layer are respectively located in the regions where the first connecting portion and the second connecting portion are located.

25. The scanning panel as claimed in claim 22, wherein, The data line has multiple corners, and at least some of the corners are covered with compensation blocks, the outer contour of which is an arc structure.

26. The scanning panel of claim 22, wherein, The data cable has multiple corners, and at least some of the corners are rounded.

27. The scanning panel of claim 22, wherein, The first substrate further includes a first electrostatic discharge circuit and a second electrostatic discharge circuit. One end of the first electrostatic discharge circuit is connected to the gate line, one end of the second electrostatic discharge circuit is connected to the data line, and the other ends of the first electrostatic discharge circuit and the second electrostatic discharge circuit are both connected to the voltage signal line.

28. The scanning panel as described in any one of claims 1-8, wherein, The first substrate also includes a support electrode in the same layer as the radiating patch.

29. The scanning panel as claimed in claim 28, wherein, The first substrate also includes a support circuit.

30. An antenna device, wherein, Includes the scanning panel as described in any one of claims 1-29.

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