Cleaning system and method

Abstract

Described herein is a cleaning system comprising an enclosure structure defining an enclosure space for receiving an article therewithin, and a solvent vaporizer for introducing solvent vapour into the enclosure space for interacting with the article to remove particles therefrom. The cleaning system further comprises a solvent processor for extracting the solvent vapor and the solvent condensate from the enclosure space. The solvent processor for generating a negative pressure for substantially extracting the solvent vapour away from the enclosure space. The cleaning system further comprises a filtration system for filtering the particles from the extracted solvent vapour and solvent condensate. The solvent vapour is condensed into solvent condensate prior to filtration thereof and at least a portion of the solvent condensate is subsequently re-introducable into the enclosure space as solvent vapour.

Description

[0001] CLEANING SYSTEM AND METHOD

[0002] TECHNICAL FIELD

[0003] The present invention relates to cleaning systems and methods for precision components, particularly for removing particles from mechanical, electronic, and consumer electronic articles. The invention utilises solvent vapour, water immersion, ultrasonic and bubblebased cleaning, steam rinsing, multi-stage filtration, and intelligent data-driven control to optimise cleaning efficiency, reduce environmental impact, and maintain high cleanliness standards for articles such as sensitive components for use in in micro motors and camera image sensor modules

[0004] Background

[0005] Precision cleaning apparatuses are specialised systems configured to clean intricate components and surfaces with high accuracy and reproducibility. Such apparatuses are indispensable in industries where even microscopic contamination can critically affect product performance, including semiconductor manufacturing, aerospace, optics, medical devices, nanotechnology, and high-precision electronics. These systems typically employ advanced cleaning technologies, including ultrasonic cleaning, vapor degreasing, plasma cleaning, CO2 snow cleaning, and other micro-scale methods, to remove particles, residues, and both organic and inorganic contaminants at sub-microscopic levels.

[0006] The emergence and growth of the nanocoating industry has further intensified the demand for precision cleaning systems capable of preparing surfaces to nanoscale cleanliness. Nanocoatings involve the deposition of ultra-thin films, often measuring in nanometers, to enhance properties such as hydrophobicity, corrosion resistance, electrical conductivity, wear resistance, and overall durability. These coatings are widely applied across automotive, electronics, healthcare, optics, and textile industries. For nanocoatings to perform effectively, surfaces must be meticulously cleaned to remove even the smallest particulate contaminants or residual films that may hinder adhesion or reduce coating efficacy. Any microscopic imperfection can compromise coating uniformity, leading to performance degradation and reduced product yield. Consequently, the nanocoating sector heavily relies on precision cleaning apparatuses capable of delivering consistent nanoscale cleanliness.

[0007] In mobile imaging systems, particularly those incorporating Voice Coil Motors (VCMs), precision cleaning challenges are exacerbated. VCMs are employed in camera modules to control lens focus by moving the lens assembly electromagnetically. Contaminants present within the VCM assembly can migrate during operation, depositing on sensitive surfaces such as infrared (IR) components and leading to image defects, commonly referred to as VCM image shadows. These defects manifest as visual imperfections or shadows in captured images, contributing to high defect rates, increased scrap costs, and reduced yield. In conventional manufacturing, shadow defect rates have been reported to range from 0.5% to 3%, with approximately 2000 Defective Parts Per Million (DPPM) in affected batches. Conventional ultrasonic cleaning methods are generally prohibited due to the risk of damaging suspension wires, while traditional water-based cleaning methods, including spin wash or bubble wash, have proven insufficient for removing internal contaminants.

[0008] Current precision cleaning equipment often operates as standalone systems that are not readily integrated into production lines. This limitation hinders the implementation of fully automated or “dark factory” operations and prevents seamless workflow integration. Cleaning processes frequently rely on experience-based trial and error, with parameter selection and operational methodology lacking scientific consistency. The dependence on operator experience renders cleaning difficult to standardize or transfer across personnel, reducing reproducibility. Moreover, conventional water-based cleaning techniques are prone to leaving residual moisture or causing secondary contamination upon drying.

[0009] Similarly, solvent-based cleaning methods are limited in practical deployment due to high operational costs. Open-type solvent cleaning systems experience substantial evaporation losses, resulting in prohibitively high expenses. In traditional systems, process parameters are manually set, data is fragmented, and adjustments for product upgrades or rapid iterations are cumbersome. Such systems are ill-suited for modern highly automated, collaborative manufacturing environments or green intelligent manufacturing initiatives.

[0010] Accordingly, there exists a significant need for precision cleaning systems that integrate automated process control, data-driven decision-making, and intelligent optimization of cleaning parameters. Leveraging artificial intelligence (Al) and big data analytics can improve cleaning efficiency, standardize cleaning performance across different components, and optimize critical downstream processes, such as semiconductor packaging and testing, through the analysis of particulate and process data collected during cleaning operations.

[0011] There is therefore a need for a solution that is directed to addressing one or more of these challenges, providing solutions that enhance precision cleaning efficiency, reduce contamination risks, lower operational costs, and enable integration into modern automated manufacturing environments.

[0012] Summary

[0013] In accordance with a first aspect of the invention, there is disclosed a cleaning method comprising introducing solvent vapour into an enclosure structure for interacting with an article presented in an enclosure space substantially defined by the enclosure structure for removing particles therefrom to thereby perform a vapour clean. At least a portion of the solvent vapour condensing into solvent condensate upon contact with the article. The cleaning method further comprises extracting the solvent vapor and the solvent condensate to a solvent processor fluid communicating with the enclosure space via a solvent valve, the solvent valve being operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure and the solvent processor. The solvent processor is for generating a negative pressure at the solvent valve when in the open state for substantially extracting the solvent vapour away from the enclosure space. The cleaning method also comprises filtering the particles from the extracted solvent vapour and solvent condensate by a filtration system. The solvent vapour is condensed into solvent condensate prior to filtration thereof and at least a portion of the solvent condensate is subsequently re-introducable into the enclosure space as solvent vapour.

[0014] In accordance with a second aspect of the invention, there is disclosed a cleaning system comprising an enclosure structure for receiving an article therewithin, the enclosure structure defining an enclosure space, and a solvent vaporizer for vaporizing liquid solvent into solvent vapour and configured with the enclosure structure for introducing the generated solvent vapour into the enclosure space for interacting with the article presented in the enclosure space for removing particles therefrom to thereby perform a vapour clean. At least a portion of the solvent vapour condensing into solvent condensate upon contact with the article. The cleaning system further comprises a solvent processor for extracting the solvent vapor and the solvent condensate from the enclosure space, the solvent processor fluid communicating with the enclosure space via a solvent valve. The solvent valve is operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure and the solvent processor, the solvent processor for generating a negative pressure at the solvent valve when in the open state for substantially extracting the solvent vapour away from the enclosure space. The cleaning system further comprises a filtration system for filtering the particles from the extracted solvent vapour and solvent condensate. The solvent vapour is condensed into solvent condensate prior to filtration thereof and at least a portion of the solvent condensate is subsequently re-introducable into the enclosure space as solvent vapour. Brief Description of the Drawings

[0015] FIG. 1 shows a partial process flow chart of a cleaning method according to an aspect of the invention;

[0016] FIG. 2 shows a partial system diagram of a cleaning system for implementing the cleaning method of FIG. 1;

[0017] FIG. 3 shows a partial perspective view of the cleaning system of FIG. 2. Detailed Description

[0018] An exemplary embodiment of the present invention, a cleaning system 20 for implementing a cleaning method 100 is described hereinafter with reference to FIGS. 1 to 3.

[0019] The cleaning system 20 comprises an enclosure structure 22 for receiving an article therewithin. The enclosure structure 22 defining an enclosure space. The cleaning system 20 further comprises a solvent vapourizer 30 for vaporizing liquid solvent into solvent vapour and is configured with the enclosure structure 22 for introducing the generated solvent vapour into the enclosure space. The solvent vapour introduced into the enclosure space interacts with the article presented in the enclosure space for removing particles therefrom to thereby perform a vapour clean process 102. At least a portion of the solvent vapour condenses into solvent condensate upon contact with the article, which in turn, enables particles to be drawn by the solvent condensate as it trickles down and off the article.

[0020] Examples of the article to be cleaned by the cleaning system 20 implementing the cleaning method 100 includes mechanical components, electronic components and consumer electronics including but not being limited to voice coil actuation devices, circuit boards, semiconductor packages and mobile phone devices and components. The cleaning system 20 utilises vacuum technology to effectively lock solvent vapours within the system, avoiding evaporation losses and thereby significantly reducing cleaning costs.

[0021] The cleaning system 20 further comprises a solvent processor 40 for extracting the solvent vapour and the solvent condensate from the enclosure space. The solvent processor 40 fluid communicates with the enclosure space via a solvent valve 42. The solvent valve 42 is operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure 22 and the solvent processor 40. The solvent processor 40 is further for generating a negative pressure at the solvent valve 42 when in the open state for substantially extracting the solvent vapour away from the enclosure space. Preferably, the solvent processor comprises a vacuum module 44 for generating the negative pressure at the solvent valve 42. The cleaning system 20 further comprises a filtration system 48 for filtering the particles from the extracted solvent vapour and solvent condensate. Preferably, the solvent vapour is condensed into solvent condensate prior to filtration thereof by the filtration system 48 with at least a portion of the solvent condensate being subsequently re-introducable into the enclosure space as solvent vapour.

[0022] The filtration system 48 is designed as a multi-stage filtration system to prevent secondary particle contamination, thereby avoiding interference and pollution in high-cleanliness environment, for example in high-cleanliness semiconductor manufacturing cleanrooms, and effectively reducing the energy resources required to maintain high-cleanliness environments.

[0023] Preferably, the cleaning system 20 further comprises a plurality of cooling fins 50 (also known as a heat exchanger 50) wherethrough the extracted solvent vapour passages for condensation thereof into solvent condensate. The plurality of cooling fins 50 may be formed from multiple planar fin-like structures or multiple planar plates that are cooled by cold fluid passaging through channels formed therein, by cooling tubes or pipes formed with or configured on surfaces of the cooling fins 50 or by a dedicated heat-exchange system integrated therewith. The plurality of cooling fins 50 are preferably spatially inter-displaced from one another with one being positioned substantially parallel the other thereof. The use of the plurality of cooling fins 50 enables an increased area of cooling surfaces to be presented to improve cooling and condensing of the solvent vapour into vapour condensate.

[0024] The cleaning system 20 further comprises a controller 52 and an analyzer system 54 being operationally controlled by the controller 52. The analyzer system 54 comprises a liquid particle counter (LPC) configured along a pathway between the plurality of cooling fins 50 and the filtration system 48 at least one of count and characterize the particles in the solvent condensate prior to filtration of the particles from the solvent condensate. The at least one of count and characterize the particles in the solvent condensate is for generating particulate data associable with characteristics of the article for use as training date for the controller 52 to train and test a pre-trained machine-learning model (“pre -trained model”) for generating control parameters for use in cleaning of the article by the cleaning system 20.

[0025] The analyzer system 54 is part of an intelligent learning system incorporated into the cleaning system 20, configured to provide automated determination of cleaning parameters and optimisation of cleaning processes through accumulation and analysis of particulate data, thereby enhancing cleaning efficiency and precision.

[0026] Preferably, the cleaning system 20 further comprises a container defining a brim and for containing liquid to enable immersion of at least a portion of the article therein for performing a liquid bath process 104. The container is disposed and presented within the enclosure structure 22. The cleaning system 20 further comprises at least one of an ultrasound transducer 66, a cavitation transducer 68 and a bubble generator 70 for generating at least one of ultrasonic wave and bubble stream in the liquid bath process 104 for removing particles from the article. In the liquid bath process 104, the removed particles are transported away from container by liquid overflowing the brim of the container. The liquid in the container generally comprises an immiscible solution of at least solvent and water, with the water being substantially from moisture entering the enclosure space during disposing of the article into the enclosure structure 22. Preferably, the brim of the container defining a jagged edge for reducing surface tension of liquid thereat to facilitate liquid overflow with the container being floodable with liquid to further facilitate liquid overflow therefrom. As the liquid in the container comprises an immiscible solution of water and solvent which is denser than water, the water will displace to form a layer at the top of the liquid in the container and separated from the solvent during overflow thereof from the brim of the container. In some implementations and situations where the article is a sensitive component, the bubble generator 70 may be used without the ultrasound transducer 66 to prevent or reduce damage or component breakage thereto. The liquid bath process 104 using ultrasonic waves and bubble streams is capable of removing micro-level pollutants from the articles, particularly micro motors within mobile phone camera image sensor modules, thereby significantly enhancing cleaning results and yield of good products.

[0027] The liquid with the particles is discharged to a liquid processor 74 fluid communicating with the enclosure space via a discharge valve 76. The discharge valve 76 is operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure 22 and the liquid processor 74. The control parameters includes operating parameters of the at least one of ultrasonic wave and bubble stream controllable by the controller 52 and optimised based on the pre-trained model. Preferably, the control parameters comprises at least one of ultrasound frequency, ultrasound power, bubble size, bubble driving pressure and cycle duration.

[0028] The cleaning system 20 comprises a manipulator 78 controllable by the controller 52 for positioning the article within and away from the enclosure space. Examples of such a manipulator includes a rotary actuator, a prismatic actuator and a robotic arm with an endeffector for gripping, locating and spatially manipulating the article. The cleaning system further comprises a steam generator 80 for generating steam, for example a steam jet or a steam mist.

[0029] In a steam rinse process 106, the manipulator first removes the article from the water in the container by the manipulator. Once the article is positioned away from the water in the container, steam generated a steam generator 80 is directed towards the article for rinsing particles from the article with flow of water, particularly water condensate, condensing from steam contacting the article. Remaining particles on the article is drawn by the water trickling down and off the article for subsequent discharge to the liquid processor 74. The water discharged to the liquid processor 74 is analyzed by the analyzer system 54 for at least one of counting and characterizing the particles discharged with the water to the liquid processor 74 for generating further particulate data associatable with characteristics of the article.

[0030] The use of steam rinsing in the steam rinse process 106 prevents water stain pollution commonly associated with conventional liquid cleaning methods, thereby maintaining the surface integrity and cleanliness of sensitive articles.

[0031] The cleaning system 20 further comprises a powered door configured with an access opening defined by the enclosure structure 22. The powered door is controllable by the controller 52 for displacing between a closed position for substantially disabling fluid communication and an open position for enabling fluid communication between the enclosure space and the atmosphere through the access opening. The article is accessible through the access opening when the powered door is in the open position.

[0032] The cleaning method 100 comprises the vapour clean process 102, the liquid bath process 104 and steam rinse process 106 for respectively performing vapour clean, liquid bath and steam rinse to the article in various sequence and iterations. The cleaning method 100 comprises the vapour clean process 102, the liquid bath process 104 and steam rinse process 106 for respectively performing vapour clean, liquid bath and steam rinse to the article in various sequence and iterations. Although each of the vapour clean process 102, the liquid bath process 104 and steam rinse process 106 is an independent process, they may be sequentially and contiguously performed to improve cleaning effectiveness of the article.

[0033] The cleaning system 20 is configured to operate in a fully automated manner, reducing the need for manual intervention and thereby minimizing labor costs and operational errors. Its compact design allows installation in various production environments with limited space.

[0034] In the cleaning method 100, the vapour clean process 102 comprises a step 110 of introducing solvent vapour into the enclosure structure 22 for interacting with an article for removing particles therefrom with at least a portion of the solvent vapour condensing into solvent condensate upon contact with the article. Next, in a step 112, the solvent vapour and the solvent condensate is extracted to the solvent processor 40 fluid communicating with the enclosure space via the solvent valve 42. In the step 112, negative pressure is generated at the solvent valve 42 when in the open state for substantially substantially extracting the solvent vapour away from the enclosure space to recover the solvent vapour to reduce wastage via dissipation when the enclosure space is subsequently exposed to the atmosphere.

[0035] In a step 114, the extracted solvent vapour passages through the plurality of cooling fins 50 for condensation thereof into solvent condensate. The analyzer system 54 then at least one of count and characterize the particles for generating particulate data associable with characteristics of the article in a step 116 prior to filtration of the particles from the solvent condensate by the filtration system 48 in a step 118.

[0036] The incorporation of in-line liquid particle counting (LPC) sensors integrated directly into the fluid streams in the cleaning system 20, providing continuous monitoring of particle concentration and size in real-time. The controller 52 is configured to automatically adjust cleaning parameters, including filter replacement or cleaning cycle modifications, based on the real-time LPC data.

[0037] In the cleaning method 100, the liquid bath process 104 comprises immersing at least a portion of the article in water contained in the container in a step 120 and generating at least one of ultrasonic wave and bubble stream in the liquid bath process 104 for removing particles from the article in a step 122. Next, in a step 124, the removed particles are transported away from container by water overflowing the brim of the container for discharge to the liquid processor 74 fluid communicating with the enclosure space via the discharge valve 76 to be analyzed by the analyzer system 54.

[0038] In the cleaning method 100, the steam rinse process 106 comprises removing the article from the water in the container in a step 130 if not already done so. In a step 132, the steam generator 80 generates and direct steam towards the article for rinsing particles from the article with flow of water condensing from steam contacting the article. The water containing the particles is then discharged to the liquid processor 74 in a step 134 for analysis by the analyzer system 54 for generating further particulate data associatable with characteristics of the article.

[0039] The cleaning method 100 provides rapid drying of the article, eliminating the need for a separate drying step and thereby accelerating the production process. The cleaning system 20 is suitable for cleaning a variety of precision modules and components, including mobile phone camera image sensor modules and micro motors, providing broad applicability across production lines

[0040] As fumes, for example from the solvent vapour, is contained within the enclosure space during the vapour clean process 102 and is extracted therefrom prior to exposing the enclosure space to the atmosphere, the cleaning system 20 and the cleaning method 100 may be implemented as a standalone station or as a line station in a production line. In an exemplary preferred implementation of the cleaning method 100, the article is pre-cleaned by undergoing the liquid bath process 104 and the steam rinse process 106 twice before being subjected to the vapour clean process 102. After completion of the vapour clean process 102, the article again undergoes the liquid bath process 104 and the steam rinse process 106 before continuing on to downstream processes.

[0041] The cleaning system 20 and cleaning method 100 provide high-efficiency cleaning technology through in-situ bubble generation and ultrasonic cleaning, serve as an eco-friendly alternative to conventional solvent cleaning methods, achieve ultra-low solvent consumption for economic operation, and are equipped with intelligent self-learning capabilities to automatically optimise cleaning parameters and processes. The cleaning system presents a compact design for ease of installation, automated operation to reduce labor costs, and an optimised cleaning process that shifts from conventional solvents to green, pollution-free cleaning solvents. The intelligent learning system records and analyses cleaning data for different products, including new products, enhancing process optimization and cleaning precision. The in-line particle counting and control system allows for real-time monitoring and automatic correction of contamination, maintaining the cleanliness of sensitive components and improving product yields.

[0042] The cleaning system 20 and method 100 provide multiple advantages that enhance both operational efficiency and overall product quality. By employing in-situ bubble impact technology, the system effectively addresses cleaning challenges associated with micro motors and camera image sensor modules, resulting in improved cleaning performance and higher yield of defect-free products. Moreover, the system functions as an environmentally responsible alternative to traditional solvent-based cleaning methods, minimizing environmental impact while maintaining economic efficiency through ultra-low solvent consumption and reduced operating costs. Rapid drying is achieved without requiring additional drying steps, further accelerating production cycles. The system is versatile and can accommodate a wide range of precision components, supported by an optimised cleaning process that transitions from conventional solvents to green, non-polluting alternatives.

[0043] The apparatus features an intelligent, user-friendly interface, including a multi-language menu system capable of adapting automatically based on the device’s location, ensuring ease of use in different regions. A manual language selection option is also available to accommodate user preferences. In conjunction with this interface, a data-driven control system monitors and analyses cleaning parameters in real-time, automatically adjusting processes for existing and newly introduced products. This adaptive functionality ensures consistent cleaning performance and continuous process improvement.

[0044] Practical implementation of the system has demonstrated measurable enhancements in production metrics, notably reducing defect rates in sensitive components such as camera control modules. By maintaining strict micro-level cleanliness, the system reduces the likelihood of image quality defects and increases the proportion of high-quality units produced. Automated monitoring and real-time data analysis allow the system to respond immediately to changes in particle contamination levels, ensuring optimal cleaning outcomes and operational reliability.

[0045] The cleaning apparatus integrates essential components, including a vacuum system, cleaning tank, liquid storage, heating and in-situ bubble generation units, condensation recovery mechanisms, and an intelligent control and learning module supported by a data algorithm model. Together, these elements provide precise control over solvent handling, multi-stage filtration, ultrasonic and bubble-based cleaning, and intelligent process optimization, achieving highly efficient, consistent, and environmentally conscious cleaning operations.

[0046] The invention apparatus comprises key components including a vacuum system, cleaning tank, liquid storage tank, heating and in-situ bubble generation unit, condensation recovery unit, intelligent control and learning unit, and a data algorithm model. These components function cohesively to maintain solvent integrity, provide multi-stage filtration, perform ultrasonic and bubble -based cleaning, and deliver intelligent, data-informed process control, resulting in efficient, precise, and environmentally responsible cleaning operations.

[0047] Aspects of particular embodiments of the present disclosure address at least one aspect, problem, limitation, and / or disadvantage associated with existing cleaning methods and systems. While features, aspects, and / or advantages associated with certain embodiments have been described in the disclosure, other embodiments may also exhibit such features, aspects, and / or advantages, and not all embodiments need necessarily exhibit such features, aspects, and / or advantages to fall within the scope of the disclosure. It will be appreciated by a person of ordinary skill in the art that several of the above-disclosed structures, components, or alternatives thereof, can be desirably combined into alternative structures, components, and / or applications. In addition, various modifications, alterations, and / or improvements may be made to various embodiments that are disclosed by a person of ordinary skill in the art within the scope of the present disclosure, which is limited only by the following claims.

Claims

Claims1. A cleaning method comprising:introducing solvent vapour into an enclosure structure for interacting with an article presented in an enclosure space substantially defined by the enclosure structure for removing particles therefrom to thereby perform a vapour clean, at least a portion of the solvent vapour condensing into solvent condensate upon contact with the article;extracting the solvent vapor and the solvent condensate to a solvent processor fluid communicating with the enclosure space via a solvent valve, the solvent valve being operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure and the solvent processor, the solvent processor for generating a negative pressure at the solvent valve when in the open state for substantially extracting the solvent vapour away from the enclosure space; andfiltering the particles from the extracted solvent vapour and solvent condensate by a filtration system,wherein the solvent vapour is condensed into solvent condensate prior to filtration thereof and at least a portion of the solvent condensate is subsequently reintroducable into the enclosure space as solvent vapour.

2. The cleaning method as in claim 1, filtering the particles from the extracted solvent vapour and solvent condensate by a filtration system comprising:condensing the solvent vapour into solvent condensate;at least one of counting and characterizing the particles by an analyser system prior to filtration of the particles from the solvent condensate for generating particulate data associable with characteristics of the article.

3. The cleaning method as in claim 1, passaging the extracted solvent vapour through a plurality of cooling fins for condensation thereof into solvent condensate.

4. The cleaning method as in claim 1, further comprising:immersing at least a portion of the article in liquid contained in a container defining a brim for performing a liquid bath, the container being presented within the enclosure structure;generating at least one of ultrasonic wave and bubble stream in the liquid bath for removing particles from the article; andtransporting the removed particles away from container by liquid overflowing the brim of the container,wherein the liquid with the particles is discharged to a liquid processor fluid communicating with the enclosure space via a discharge valve, the discharge valve being operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure and the liquid processor, andwherein control parameters of the at least one of ultrasonic wave and bubble stream are controllable by a control system and optimised based on a pre-trained model, the control parameters comprising at least one of ultrasound frequency, ultrasound power, bubble size, bubble driving pressure and cycle duration.

5. The cleaning method as in claim 4, the brim of the container defining a jagged edge for reducing surface tension of water thereat to facilitate water overflow, wherein the container is floodable with liquid to further facilitate liquidr overflow therefrom, the liquid comprising water and solvent, the solvent being denser than water,wherein the water in the liquid forming a layer at the surface of the liquid overflows from the brim of the container to separate from the solvent.

6. The cleaning method as in claim 4, further comprising:removing the article from the liquid in the container; anddirecting steam generated by a steam generator towards the article for rinsing particles from the article with flow of water condensing from steam contacting the article to thereby perform a steam rinse,wherein the liquid containing the particles is dischargable to the liquid processor.

7. The cleaning method as in claim 6, further comprising:at least one of counting and characterizing the particles discharged with the water to the liquid processor by an analyser system for generating particulate data associatable with characteristics of the article.

8. A cleaning system comprising:an enclosure structure for receiving an article therewithin, the enclosure structure defining an enclosure space;a solvent vaporizer for vaporizing liquid solvent into solvent vapour and configured with the enclosure structure for introducing the generated solvent vapour into the enclosure space for interacting with the article presented in the enclosure space for removing particles therefrom to thereby perform a vapour clean, at least a portion of the solvent vapour condensing into solvent condensate upon contact with the article;a solvent processor for extracting the solvent vapor and the solvent condensate from the enclosure space, the solvent processor fluid communicating with the enclosure space via a solvent valve, the solvent valve being operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure and the solvent processor, the solvent processor for generating a negative pressure at the solvent valve when in the open state for substantially extracting the solvent vapour away from the enclosure space; anda filtration system for filtering the particles from the extracted solvent vapour and solvent condensate,wherein the solvent vapour is condensed into solvent condensate prior to filtration thereof and at least a portion of the solvent condensate is subsequently reintroducable into the enclosure space as solvent vapour.

9. The cleaning system as in claim 8, the solvent processor further for condensing the solvent vapour into solvent condensate, and at least one of counting and characterizing the particles by an analyser system prior to filtration of the particles from the solvent condensate for generating particulate data associable with characteristics of the article.

10. The cleaning system as in claim 8, further comprising:a plurality of cooling fins wherethrough the extracted solvent vapour passages for condensation thereof into solvent condensate.

11. The cleaning system as in claim 8, further comprising:a container defining a brim and for containing liquid to enable immersion of at least a portion of the article therein for performing a liquid bath, the container being presented within the enclosure structure;at least one of an ultrasound transducer, a cavitation transducer and a bubble generator for generating at least one of ultrasonic wave and bubble stream in the liquid bath for removing particles from the article; andwherein the removed particles are transported away from container by liquid overflowing the brim of the container, the liquid with the particles is discharged to a liquid processor fluid communicating with the enclosure space via a discharge valve, the discharge valve being operable to switch between a closed state for disabling fluid communication and an open state for enabling fluid communication between the enclosure structure and the liquid processor, andwherein control parameters of the at least one of ultrasonic wave and bubble stream are controllable by a control system and optimised based on a pre-trainedmodel, the control parameters comprising at least one of ultrasound frequency, ultrasound power, bubble size, bubble driving pressure and cycle duration.

12. The cleaning system as in claim 11, the brim of the container defining a jagged edge for reducing surface tension of water thereat to facilitate water overflow, wherein the container is floodable with liquid to further facilitate liquid overflow therefrom, the liquid comprising water and solvent with the solvent being denser than water,wherein the water in the liquid forming a layer at the surface of the liquid overflows from the brim of the container to separate from the solvent..

13. The cleaning system as in claim 11, further comprising:a manipulator for removing the article from the liquid in the container; and a steam generator for directing steam generated thereby towards the article for rinsing particles from the article with flow of water condensing from steam contacting the article to thereby perform a steam rinse,wherein the water containing the particles is dischargable to the liquid processor.

14. The cleaning system as in claim 11, further comprising:an analyser system for at least one of counting and characterizing the particles discharged with the water to the liquid processor for generating particulate data associatable with characteristics of the article.

15. The cleaning system as in claim 8, further comprising:a control system;a manipulator controllable by the controller for positioning the article within the enclosure space; anda powered door configured with an access opening defined by the enclosure structure and controllable by the controller for displacing between a closed positionfor substantially disabling fluid communication and an open position for enabling fluid communication between the enclosure space and the atmosphere through the access opening, the article being accessible through the access opening when the powered door is in the open position.

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