Cleaning apparatus, control method for cleaning apparatus, base station, cleaning system and storage medium

Abstract

A cleaning apparatus (100) comprises a clean water tank (23), a first passage (31) and a second passage (32). The clean water tank (23) is provided with a liquid outlet (233) and an overflow outlet (235), wherein the height at which the liquid outlet (233) is arranged on the clean water tank (23) is less than the height at which the overflow outlet (235) is arranged on the clean water tank (23). A first outlet (313) of the first passage (31) allows liquid in the clean water tank (23) to flow out of the first passage (31), and a first power device (32) is configured to provide driving power for discharging the liquid in the clean water tank (23) out of the first passage (31). A second outlet (333) of the second passage (33) allows the liquid in the clean water tank (23) to flow out of the second passage (33). In the state of mopping a surface to be cleaned, the first power device (32) drives the liquid in the clean water tank (23) to flow into the first passage (31) from the liquid outlet (233) and flow out of the first outlet (313) such that the liquid is supplied to a cleaning member (22). In the state of washing the cleaning member (22), liquid is supplied to the clean water tank (23) by means of an external liquid source of the clean water tank (23), such that when the liquid level of the clean water tank (23) exceeds the overflow outlet (235), the liquid in the clean water tank (23) overflows from the overflow outlet (235) to the second passage (33) and flows out from the second outlet (333), and is thus discharged to the cleaning member (22) to wash the cleaning member (22).

Description

Cleaning equipment, control methods for cleaning equipment, base stations, cleaning systems and storage media Technical Field

[0001] This disclosure relates to the field of cleaning technology, and more specifically, to a cleaning device, a method for controlling the cleaning device, a base station, a cleaning system, and a computer-readable storage medium. Background Technology

[0002] Cleaning equipment typically includes types such as mopping robots, sweeping and mopping robots, and handheld floor scrubbers. Cleaning equipment can clean the surface to be cleaned by using its mopping and wiping components.

[0003] When the cleaning equipment is wiping the surface to be cleaned, its hydraulic system provides cleaning fluid (usually water) to the cleaning components to wet them. The wetted components then move to wipe the surface. After wiping the surface for a period of time, the cleaning equipment can return to its partner base station for deep cleaning. During this deep cleaning process, the hydraulic system provides a large amount of cleaning fluid (usually water) to the cleaning components. Summary of the Invention

[0004] This disclosure provides a cleaning device, a control method for the cleaning device, a base station, a cleaning system, and a computer-readable storage medium.

[0005] In a first aspect, this disclosure provides a cleaning device, comprising a cleaning component and a liquid system. The cleaning component is used to mop a surface to be cleaned. The liquid system includes a water tank, a first power unit, a first passage, and a second passage. The water tank has an outlet and an overflow outlet, with the outlet positioned at a lower height than the overflow outlet. The first passage has a first inlet and a first outlet, the first inlet communicating with the outlet, and the first outlet allowing liquid from the water tank to flow out through the first passage. The first power unit provides driving power to discharge liquid from the water tank into the first passage. The second passage has a second inlet and a second outlet, the second inlet communicating with the overflow outlet, and the second outlet allowing liquid from the water tank to flow out through the second passage. When the cleaning device is in the state of mopping a surface to be cleaned, the first power unit drives liquid from the water tank to flow into the first passage from the outlet and out from the first outlet to supply liquid to the cleaning component. When the cleaning equipment is in the state of cleaning the cleaning component, liquid is supplied to the clean water box through an external liquid source so that the liquid level in the clean water box exceeds the overflow port. When this happens, the liquid in the clean water box overflows from the overflow port into the second passage and flows out from the second outlet to drain liquid to the cleaning component and clean it.

[0006] Secondly, this disclosure also provides a cleaning device, comprising a cleaning component and a liquid system. The cleaning component is used to mop a surface to be cleaned. The liquid system includes a first chamber, a second chamber, and a second power unit. The first chamber has an inlet and an outlet. The inlet allows liquid from an external liquid source to enter the first chamber, and the outlet allows liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain wastewater. The second chamber has a connecting port for wastewater from the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through-hole. The maximum permissible liquid level in the second chamber is lower than the location of the through-hole. The second power unit is connected to the first chamber and provides driving power to drive the wastewater from the cleaning component into the second chamber, and to discharge liquid from the first chamber to the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component.

[0007] Thirdly, this disclosure also provides a control method for a cleaning device, the cleaning device having a cleaning component and a wastewater box, the wastewater box being used to contain wastewater generated by the cleaning component cleaning a surface to be cleaned, the cleaning device including a dirt detection sensor, the control method including: detecting the degree of dirtiness of the wastewater on the wastewater recycling path between the cleaning component and the wastewater box using the dirt detection sensor; and determining fluid parameters and a supply strategy for the fluid supplied to the wastewater box based on the degree of dirtiness of the wastewater.

[0008] Fourthly, this disclosure also provides a cleaning system. The cleaning system includes a base station and cleaning equipment. The base station is used to maintain the cleaning equipment. The cleaning equipment includes a cleaning component and a liquid path system. The cleaning component is used to mop the surface to be cleaned. The liquid path system includes: a water tank, a first passage, a first power unit, and a second passage. The water tank is provided with an outlet and an overflow outlet, the outlet being positioned at a lower height than the overflow outlet. The first passage is provided with a first inlet and a first outlet, the first inlet communicating with the outlet, and the first outlet allowing liquid from the water tank to flow out through the first passage. The first power unit provides driving power to discharge liquid from the water tank into the first passage. The second passage is provided with a second inlet and a second outlet, the second inlet communicating with the overflow outlet, and the second outlet allowing liquid from the water tank to flow out through the second passage. When the cleaning device is in the state of mopping the surface to be cleaned, the liquid in the water tank is driven by the first power device to flow from the outlet into the first passage and out from the first outlet to supply liquid to the cleaning component; when the cleaning device is in the state of cleaning the cleaning component, the water tank is supplied with liquid by an external liquid source so that the liquid level in the water tank exceeds the overflow outlet, the liquid in the water tank overflows from the overflow outlet into the second passage and out from the second outlet to drain liquid to the cleaning component and clean the cleaning component.

[0009] Fifthly, this disclosure also provides a cleaning system. The cleaning system includes a base station and cleaning equipment. The base station is used to maintain the cleaning equipment. The cleaning equipment includes a cleaning component and a liquid path system. The cleaning component is used to mop the surface to be cleaned. The liquid path system includes a first chamber, a second chamber, and a second power unit. The first chamber has an inlet and an outlet. The inlet allows liquid from an external liquid source to enter the first chamber, and the outlet allows liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain wastewater. The second chamber has a connecting port for wastewater from the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but fluidly connected through a through-hole. The maximum permissible liquid level in the second chamber is lower than the location of the through-hole. The second power unit is connected to the first chamber and is used to provide driving power to drive the wastewater from the cleaning component into the second chamber, and to provide driving power to discharge liquid from the first chamber to the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component.

[0010] The cleaning device, control method, and cleaning system disclosed herein are provided with a first passage and a second passage both connected to a clean water tank. When the cleaning device is in the state of mopping the surface to be cleaned, a first power unit drives the liquid in the clean water tank to supply liquid to the cleaning component through the first passage, thereby replenishing the cleaning component with liquid and keeping it moist while mopping the surface. When the cleaning device is in the state of cleaning the cleaning component, if the liquid level supplied to the clean water tank by the external liquid source exceeds the overflow port, the liquid overflows from the overflow port to the second passage and then drains to the cleaning component through the second passage to clean the cleaning component. Since it is only necessary to keep the cleaning component moist when mopping the surface to be cleaned, the flow rate of the first power unit can be relatively small. When mopping the surface to be cleaned, the first power unit drives the liquid in the clean water tank to flow out at a small flow rate, while when cleaning the cleaning component, the clean water tank can overflow to meet the need for a large flow rate of liquid to be drained to the cleaning component. Therefore, there is no need to use a power unit with adjustable flow rate to adjust the flow rate to the cleaning component, thus reducing the cost of the liquid circuit system.

[0011] Sixthly, this disclosure provides a cleaning device, which includes a cleaning component and a liquid system. The cleaning component is used to mop the surface to be cleaned. The liquid system of the cleaning device includes a clean water tank and a wastewater tank. The clean water tank has an overflow outlet. The wastewater tank has an inlet communicating with the overflow outlet. The inlet is positioned above the maximum allowable liquid level of the wastewater tank. The wastewater tank is used to recycle wastewater generated by the cleaning component. When an external liquid source supplies liquid to the clean water tank until the liquid level exceeds the overflow outlet, the liquid overflowing from the overflow outlet in the clean water tank enters the wastewater tank through the inlet to rinse the wastewater tank.

[0012] Seventhly, this disclosure also provides a cleaning system. The cleaning system includes a cleaning device and a base station. The cleaning device includes a cleaning component and a liquid supply system. The cleaning component is used to mop the surface to be cleaned, the cleaning device is used to interface with the base station, the base station is used to maintain the cleaning device, and the base station is equipped with a liquid supply system for supplying liquid. The liquid supply system of the cleaning device includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and an overflow port. The wastewater tank is connected to the overflow port and is used to recycle wastewater generated by the cleaning component. When the base station is connected to the cleaning equipment and the liquid supply system supplies liquid to the clean water box until the liquid level exceeds the overflow port, the liquid overflowing from the overflow port in the clean water box enters the wastewater box to flush the wastewater box. The base station is also provided with a docking interface connected to the liquid supply system. The docking interface is used to connect with the replenishment port. When the cleaning equipment is docked at the base station and the docking interface is connected with the replenishment port, the liquid supply system of the base station supplies liquid to the clean water box of the cleaning equipment. When the liquid supply system supplies liquid to the clean water box until the liquid level exceeds the overflow port, the liquid in the clean water box overflows into the wastewater box.

[0013] The cleaning equipment and system disclosed herein recycle wastewater generated by the cleaning components by setting up a wastewater box. The wastewater box does not need to be disassembled for manual cleaning. Instead, when an external liquid source is connected to the cleaning equipment and supplies liquid to the clean water box, the liquid overflowing from the overflow port of the clean water box is used to rinse the wastewater box, thereby achieving automatic rinsing of the wastewater box. This is efficient, convenient, time-saving, labor-saving, and can prevent the growth of bacteria.

[0014] Eighthly, this disclosure provides a cleaning system comprising cleaning equipment and a base station. The cleaning equipment includes a cleaning component for mopping a surface to be cleaned. The cleaning equipment also includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and an overflow port, and is connected to the wastewater tank via the overflow port. The wastewater tank is used to recycle wastewater generated by the cleaning component. The base station is used for maintaining the cleaning equipment and has a docking interface for connecting with the replenishment port. When the docking interface is connected to the replenishment port, the cleaning equipment includes at least a replenishment state and a wastewater discharge state. In the replenishment state, liquid provided by the base station is injected into the clean water tank through the docking interface and the replenishment port. In the wastewater discharge state, fluid provided by the base station is injected into the clean water tank through the docking interface and the replenishment port, with at least a portion of the fluid passing through the clean water tank and entering the wastewater tank via the overflow port to provide positive pressure to the wastewater tank, thereby discharging wastewater from the wastewater tank to the outside.

[0015] The cleaning system of this disclosure allows the base station and the cleaning equipment to be connected only through an interface and a liquid replenishment port. This enables the base station to provide at least one of the following substances to the cleaning equipment: liquid, gas, or gas-liquid mixture. This puts the cleaning equipment into a sewage discharge state and / or a liquid replenishment state. Only one connection accuracy needs to be considered between the interface and the liquid replenishment port, which greatly reduces the difficulty of connection and ensures high connection accuracy. This avoids waste caused by improper connection and ensures sufficient liquid replenishment. At the same time, it also ensures that sewage can be discharged along a predetermined path and will not leak into the non-liquid-containing area of ​​the base station, thus avoiding additional cleaning work.

[0016] Ninthly, this disclosure provides a base station, the base station including a base station body and a gas source system, the gas source system being disposed on the base station body. The gas source system includes a gas extraction device, a wastewater tank, a valve assembly, and a control device. The gas extraction device is used to provide a gas source. The wastewater tank is used to store liquid and is connected to an external liquid source through a liquid extraction pipe to extract liquid and to the outside through a liquid discharge pipe to discharge liquid. The valve assembly is disposed between the outlet of the wastewater tank and the outlet of the liquid discharge pipe, and the opening or closing of the valve assembly controls the connection or disconnection between the outlet and the outlet. The control device is connected to the gas extraction device through a gas supply pipe and to the valve assembly through a first pipeline assembly. The liquid extraction pipe passes through the control device, and the control device is used to control the connection or disconnection of the liquid extraction pipe and the connection or disconnection between the gas supply pipe and the first pipeline assembly. In the pre-liquid extraction state, the control device controls the gas supply pipe to connect with the first pipeline assembly, and the gas extraction device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device, and the first pipeline assembly, so that the valve assembly closes to disconnect the outlet and the discharge port. In the pre-drainage state, the control device controls the gas supply pipe to connect with the first pipeline assembly, and the gas extraction device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device, and the first pipeline assembly, so that the valve assembly opens to connect the outlet and the discharge port.

[0017] Tenthly, this disclosure also provides a base station, the base station including a base station body and a gas source system, the gas source system being disposed on the base station body. The gas source system includes a gas extraction device, a wastewater tank, a valve assembly, and a control device. The gas extraction device is used to provide a gas source. The wastewater tank is used to store liquid, and is connected to a water source through a liquid extraction pipe to draw in liquid and to the outside through a liquid discharge pipe to discharge liquid. The valve assembly is disposed between the outlet of the wastewater tank and the outlet of the liquid discharge pipe, and controls the connection or disconnection between the outlet and the outlet by opening or closing the valve assembly. The control device is connected to the gas extraction device through a gas supply pipe, to the wastewater tank through a second pipeline assembly, and to the clean water box of a cleaning device through a fourth pipeline assembly, and is used to control the connection or disconnection of the liquid extraction pipe, the connection or disconnection between the gas supply pipe and the second pipeline assembly, and the connection or disconnection between the gas supply pipe and the fourth pipeline assembly. In the formal liquid extraction state, the control device controls the liquid extraction pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid extraction pipe, the sewage tank, the second pipeline assembly, the control device, the gas supply pipe, and the gas delivery device together form a liquid extraction passage. The gas delivery device provides negative pressure gas to the liquid extraction passage so that liquid is drawn into the sewage tank through the liquid extraction pipe. The control device controls the gas supply pipe and the fourth pipeline assembly to be open. The gas delivery device provides positive pressure gas to the clear water box through the gas supply pipe, the control device, and the fourth pipeline assembly. In the formal liquid discharge state, the control device controls the gas supply pipe and the second pipeline assembly to be open. The gas delivery device, the gas supply pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly, and the discharge pipe together form a discharge passage. The gas delivery device provides positive pressure gas to the discharge passage so that liquid is discharged from the sewage tank to the outside through the discharge pipe.

[0018] Eleventhly, this disclosure also provides a cleaning system, which includes cleaning equipment and a base station. The cleaning equipment is movable to the base station for maintenance. The base station includes a base station body and a gas source system, which is installed on the base station body. The gas source system includes a gas extraction device, a wastewater tank, a valve assembly, and a control device. The gas extraction device is used to provide a gas source. The wastewater tank is used to store liquid and is connected to an external liquid source through a liquid extraction pipe to extract liquid and to the outside through a liquid discharge pipe to discharge liquid. The valve assembly is located between the outlet of the wastewater tank and the outlet of the liquid discharge pipe, and opening or closing the valve assembly controls the connection or disconnection between the outlet and the outlet. The control device is connected to the gas extraction device through a gas supply pipe and to the valve assembly through a first pipeline assembly. The liquid extraction pipe passes through the control device, and the control device is used to control the connection or disconnection of the liquid extraction pipe and the connection or disconnection between the gas supply pipe and the first pipeline assembly. In the pre-liquid extraction state, the control device controls the gas supply pipe to connect with the first pipeline assembly, and the gas extraction device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device, and the first pipeline assembly, so that the valve assembly closes to disconnect the outlet and the discharge port. In the pre-drainage state, the control device controls the gas supply pipe to connect with the first pipeline assembly, and the gas extraction device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device, and the first pipeline assembly, so that the valve assembly opens to connect the outlet and the discharge port.

[0019] The base station and cleaning system of this disclosure utilizes a control device to connect the gas supply pipe to the first pipeline assembly, and then utilizes a gas extraction device to provide positive pressure gas to the valve assembly through the gas supply pipe, control device, and first pipeline assembly, so that the valve assembly disconnects the connection between the outlet and outlet, thereby actively preparing for the opening of the liquid extraction passage; furthermore, the control device also connects the gas supply pipe to the first pipeline assembly, and then utilizes a gas extraction device to provide negative pressure gas to the valve assembly through the gas supply pipe, control device, and first pipeline assembly, so that the valve assembly opens the connection between the outlet and outlet, thereby actively preparing for the liquid drainage passage. Preparing the path for operation reduces the risk of valve component blockage, extends their service life, reduces maintenance frequency, and improves user experience. Simultaneously, the same gas extraction device and control device can be used to control the opening and closing of the liquid extraction and drainage paths, thereby controlling the extraction or drainage of the wastewater tank. This integrates the control of multiple components into a single control device, and allows multiple functions to be achieved with a single gas source, effectively reducing costs and making the overall structure of the base station or cleaning system more compact, simple, and reliable, thus improving the service life and functional reliability of the base station or cleaning system.

[0020] In a twelfth aspect, this disclosure provides a cleaning device comprising a cleaning component and a recycling component. The recycling component includes a dirt-containing cavity, a scraping portion, and a filtering portion. The scraping portion abuts against the cleaning component. In the height direction of the cleaning device, at least a portion of the dirt-containing cavity is lower than the scraping portion; during rotation of the cleaning component, the scraping portion peels dirt off the cleaning component. In the height direction of the cleaning device, the filtering portion is positioned higher than the scraping portion; the filtering portion has filter holes that connect to the outside and the dirt-containing cavity, allowing wastewater from the dirt to enter the dirt-containing cavity and blocking solid waste from the dirt outside the dirt-containing cavity.

[0021] In a thirteenth aspect, this disclosure provides a cleaning system. The cleaning system includes a cleaning device and a base station. The cleaning device includes a cleaning component and a recovery component, the recovery component including a dirt-holding chamber, a scraping part, and a filtering part. The scraping part abuts against the cleaning component; in the height direction of the cleaning device, at least a portion of the dirt-holding chamber is lower than the scraping part; during rotation of the cleaning component, the scraping part peels dirt off the cleaning component. In the height direction of the cleaning device, the filtering part is positioned higher than the scraping part; the filtering part has filter holes that connect to the outside and the dirt-holding chamber, allowing wastewater from the dirt to enter the dirt-holding chamber and blocking solid waste from the dirt outside the dirt-holding chamber. The base station is used for maintaining the returned cleaning device.

[0022] In a fourteenth aspect, this disclosure provides a control method for a cleaning device, the cleaning device including a cleaning component, a sweeping module, and a recycling component, wherein the recycling component is used to perform solid-liquid separation on the dirt picked up by the cleaning component, and the control method includes: controlling the cleaning component to detach the solid waste separated by the recycling component from the recycling component and remove it from the cleaning device; and controlling the cleaning device to clean up the solid waste through the sweeping module.

[0023] In a fifteenth aspect, this disclosure provides a control method for a cleaning device, the cleaning device including a cleaning component and a recycling component, the recycling component including a dirt-containing cavity, a scraping part, and a filtering part. The scraping part abuts against the cleaning component; in the height direction of the cleaning device, at least a portion of the dirt-containing cavity is lower than the scraping part. During the rotation of the cleaning component, the scraping part peels dirt off the cleaning component. In the height direction of the cleaning device, the filtering part is positioned higher than the scraping part; the filtering part has filter holes that connect to the outside and the dirt-containing cavity, allowing wastewater in the dirt to enter the dirt-containing cavity and blocking solid waste in the dirt outside the dirt-containing cavity. The control method includes: controlling the cleaning component to rotate in a first direction when the cleaning component of the cleaning device performs a mopping task; and controlling the cleaning component to perform a solid waste cleaning task after the cleaning component of the cleaning device finishes the mopping task.

[0024] In a sixteenth aspect, this disclosure provides a computer-readable storage medium storing a computer program that, when executed by one or more processors, implements the control method described above.

[0025] In the cleaning equipment, cleaning system, control method, and computer-readable storage medium disclosed herein, when a cleaning component drags the surface to be cleaned through a rotating motion, dirt mixed with sewage and / or solid waste is formed on the cleaning component. A scraping part abuts against the cleaning component and scrapes off the dirt. Then, a filter part disposed above the scraping part filters the scraped dirt. The sewage in the dirt can enter the dirt-holding chamber through the filter holes, thereby entering the sewage recycling link. The solid waste in the dirt cannot pass through the filter holes and is blocked outside the dirt-holding chamber and will not enter the sewage recycling link. This avoids solid waste entering the dirt-holding chamber and causing blockage of the sewage recycling link, and also eliminates the need for users to spend time and effort on maintenance.

[0026] In a seventeenth aspect, embodiments of this disclosure provide a cleaning device. The cleaning device includes a wastewater box, a collection component, a drain pipe, and a force application unit. The wastewater box is used to store wastewater. The collection component is used to temporarily store wastewater. The collection component has a sludge-containing cavity and a wastewater outlet, the wastewater outlet connecting the sludge-containing cavity and the wastewater box. The drain pipe connects the sludge-containing cavity to the outside. The drain pipe is a flexible hose; the drain pipe includes a drain outlet located at the end of the drain pipe away from the sludge-containing cavity. The force application unit is connected to the drain pipe and is used to apply a force to the drain pipe to change the bending state of the drain pipe, thereby switching the drain pipe between a non-drained state and a drained state. Specifically, when the drain pipe is not discharging sewage, it is in a first bent state and the position of the drain outlet is higher than the position of the sludge chamber, so as to prevent sewage in the sludge chamber from being discharged to the outside through the drain pipe; when the drain pipe is discharging sewage, the position of the drain outlet is not higher than the position of the sludge chamber, so as to allow sewage in the sewage box to be discharged to the outside in sequence through the sewage outlet, the sludge chamber, and the drain pipe.

[0027] In an eighteenth aspect, embodiments of this disclosure provide a base station. The base station is used for maintaining cleaning equipment. The cleaning equipment includes a wastewater box, a collection component, a drain pipe, and a force application unit. The collection component has a sludge-containing cavity and a wastewater outlet, the wastewater outlet connecting the sludge-containing cavity and the wastewater box. The drain pipe connects the sludge-containing cavity to the outside. The drain pipe is a flexible hose. The drain pipe includes a drain outlet located at the end of the drain pipe away from the sludge-containing cavity. The force application unit is connected to the drain pipe and is used to apply a force to the drain pipe to change the bending state of the drain pipe, thereby switching the drain pipe between a non-drained state and a drained state. In the drained state, wastewater in the wastewater box is discharged to the outside sequentially through the wastewater outlet, the sludge-containing cavity, and the drain pipe. In the non-draining state, the drain pipe is in a first bend and the drain outlet is positioned higher than the sludge-containing cavity to prevent sewage in the cavity from being discharged to the outside through the drain pipe. In the drain pipe's draining state, the drain outlet is positioned no higher than the sludge-containing cavity to allow sewage in the sewage box to be discharged to the outside sequentially through the drain outlet, the sludge-containing cavity, and the drain pipe. The base station includes a force-applying component. This component provides external force to the force-applying unit and can change the force applied to the drain pipe through the force-applying unit, allowing the drain pipe to switch between a non-draining state and a draining state.

[0028] In a nineteenth aspect, embodiments of this disclosure provide a cleaning system comprising cleaning equipment and a base station. The cleaning equipment includes a wastewater box, a collection component, a drain pipe, and a force application unit. The collection component has a sludge-containing cavity and a wastewater outlet, the wastewater outlet connecting the sludge-containing cavity and the wastewater box. The drain pipe connects the sludge-containing cavity to the outside. The drain pipe is a flexible hose; the drain pipe includes a drain outlet located at the end of the drain pipe away from the sludge-containing cavity. The force application unit is connected to the drain pipe and is used to apply a force to the drain pipe to change the bending state of the drain pipe, thereby switching the drain pipe between a non-drained state and a drained state. In the non-draining state, the drain pipe is in a first bend and the drain outlet is positioned higher than the sludge-containing cavity to prevent sewage in the cavity from being discharged to the outside through the drain pipe. In the drain pipe's draining state, the drain outlet is positioned no higher than the sludge-containing cavity to allow sewage in the sewage box to be discharged to the outside sequentially through the drain outlet, the sludge-containing cavity, and the drain pipe. The base station includes a force-applying component. This component provides external force to the force-applying unit and can change the force applied to the drain pipe through the force-applying unit, allowing the drain pipe to switch between a non-draining state and a draining state.

[0029] In the cleaning equipment, base station, and cleaning system of this disclosure, the cleaning equipment adjusts the force applied to the drain pipe by setting a force application unit to change the bending state of the drain pipe, enabling the recyclable component to switch between a non-drained state and a drained state, thereby achieving efficient draining of the recyclable component. When the drain pipe is in the non-drained state, sewage is temporarily stored in the sewage-containing cavity. By setting the drain pipe to a first bending state and the drain outlet being higher than the height of the sewage-containing cavity, sewage in the sewage-containing cavity can be prevented from being discharged to the outside through the drain pipe, thus reducing sewage leakage problems in the non-drained state. In the drain pipe's draining state, the drain outlet is not higher than the height of the sewage-containing cavity. Sewage in the sewage box is discharged to the outside sequentially through the sewage outlet, the sewage-containing cavity, and the drain pipe. During the sewage discharge process, the dirt accumulated in the sewage-containing cavity can be flushed away, thereby automatically cleaning the sewage-containing cavity of the recyclable component. In this disclosure, by using a force-applying unit to change the curvature of the sewage pipe and adjust the height of the sewage outlet, gravitational potential energy is utilized to allow the accumulated dirt and sewage in the sewage-holding chamber to be discharged. This avoids the need for valves or other structures inside the sewage pipe, reducing the risk of pipe blockage. The variation in the sewage outlet height in this disclosure optimizes the sewage discharge effect while effectively reducing the risk of blockage, further improving the reliability and ease of use of the recycling components.

[0030] Additional aspects and advantages of this disclosure will be set forth in part in the description which follows, and in part will be obvious from the description, or may be learned by practice of this disclosure. Attached Figure Description

[0031] The above and / or additional aspects and advantages of this disclosure will become apparent and readily understood from the description of the embodiments taken in conjunction with the following drawings, in which:

[0032] Figure 1 is a perspective view of a cleaning system according to certain embodiments of the present disclosure;

[0033] Figure 2a is a schematic diagram of the cleaning equipment in the cleaning system shown in Figure 1 cleaning the surface to be cleaned;

[0034] Figure 2b is a structural schematic diagram of one embodiment of the cleaning system shown in Figure 1;

[0035] Figure 2c is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0036] Figure 2d is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0037] Figure 2e is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0038] Figure 2f is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0039] Figure 3a is a simplified diagram of the liquid circuit system of the cleaning equipment in the cleaning system shown in Figure 1 when it is suctioning dirt to clean the surface to be cleaned.

[0040] Figure 3b is a simplified diagram of the liquid circuit system of the cleaning equipment in the cleaning system shown in Figure 1 when cleaning the cleaning parts.

[0041] Figure 3c is a simplified diagram of the liquid circuit system of the cleaning equipment in the cleaning system shown in Figure 1 when cleaning the wastewater box;

[0042] Figure 3d is a simplified diagram of the liquid circuit system of the cleaning equipment in the cleaning system shown in Figure 1 when cleaning the filter element.

[0043] Figure 4a is a schematic diagram of one embodiment of the cleaning equipment in the cleaning system shown in Figure 1;

[0044] Figure 4b is a schematic diagram of another embodiment of the cleaning equipment in the cleaning system shown in Figure 1;

[0045] Figure 4c is a structural schematic diagram of one embodiment of the cleaning system shown in Figure 1;

[0046] Figure 4d is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0047] Figure 4e is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0048] Figure 5a is a structural schematic diagram of one embodiment of the cleaning system shown in Figure 1;

[0049] Figure 5b is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0050] Figure 5c is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0051] Figure 5d is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0052] Figure 6a is a structural schematic diagram of one embodiment of the cleaning system shown in Figure 1;

[0053] Figure 6b is a structural schematic diagram of another embodiment of the cleaning system shown in Figure 1;

[0054] Figure 6c is a schematic diagram of a base station in a pre-liquid extraction state in a cleaning system according to certain embodiments of the present disclosure;

[0055] Figure 6d is a schematic diagram of the base station in the formal liquid extraction state in the cleaning system of some embodiments of this disclosure;

[0056] Figure 6e is a schematic diagram of a base station in a pre-drainage state in a cleaning system according to certain embodiments of the present disclosure;

[0057] Figure 6f is a schematic diagram of the base station in the formal drainage state in the cleaning system of some embodiments of this disclosure;

[0058] Figure 7 is a schematic diagram of the planar structure of the cleaning equipment in the cleaning system shown in Figure 1;

[0059] Figure 8 is a partial three-dimensional exploded view of the cleaning equipment shown in Figure 7;

[0060] Figure 9 is a three-dimensional assembly schematic diagram of a portion of the liquid circuit system in the cleaning equipment shown in Figure 7, from one perspective.

[0061] Figure 10 is a three-dimensional assembly schematic diagram of a portion of the liquid circuit system in the cleaning equipment shown in Figure 7 from another perspective;

[0062] Figure 11 is a three-dimensional assembly schematic diagram of the cleaning module in the cleaning equipment shown in Figure 8 from one perspective;

[0063] Figure 12 is a partial three-dimensional exploded view of the cleaning module shown in Figure 11;

[0064] Figure 13 is a three-dimensional exploded view of another part of the cleaning module shown in Figure 11;

[0065] Figure 14 is a schematic diagram of the cleaning module in Figure 11 cleaning the surface to be cleaned;

[0066] Figure 15 is a three-dimensional cross-sectional view of the cleaning module in Figure 11, showing the water spray channel;

[0067] Figure 16 is an enlarged view of point XVI in Figure 15;

[0068] Figure 17 is a schematic diagram of the housing of the cleaning module from one perspective;

[0069] Figure 18 is an enlarged schematic diagram of XVIII in Figure 17;

[0070] Figure 19 is a three-dimensional cross-sectional view of the cleaning module shown in Figure 11;

[0071] Figure 20 is another three-dimensional cross-sectional view of the cleaning module shown in Figure 11;

[0072] Figure 21 is an enlarged view of XXI in Figure 20;

[0073] Figure 22 is a three-dimensional assembly diagram of the sewage box and the second power unit in the cleaning module shown in Figure 12;

[0074] Figure 23 is a three-dimensional exploded view of the sewage box and the second power unit in the cleaning module shown in Figure 22;

[0075] Figure 24 is a three-dimensional schematic diagram of the wastewater box in the cleaning module shown in Figure 22;

[0076] Figure 25 is a three-dimensional schematic diagram of the cover of the sewage box shown in Figure 23;

[0077] Figure 26 is a working scenario diagram of the cleaning system provided in an embodiment of this disclosure;

[0078] Figure 27 is a schematic diagram of the cleaning device provided in an embodiment of the present disclosure being connected to an external liquid source for replenishment.

[0079] Figure 28 is a partial perspective view of a cleaning system according to certain embodiments of the present disclosure;

[0080] Figure 29 is a three-dimensional schematic diagram of the base station base in the cleaning system shown in Figure 28;

[0081] Figure 30 is a three-dimensional schematic diagram of a portion of the base station structure in the cleaning system shown in Figure 28 from one perspective;

[0082] Figure 31 is a three-dimensional schematic diagram of a portion of the base station structure in the cleaning system shown in Figure 28 from another perspective;

[0083] Figure 32 is a three-dimensional schematic diagram of a portion of the base station structure in the cleaning system shown in Figure 28 from another perspective;

[0084] Figure 33 is a plan view of part of the base station structure in the cleaning system shown in Figure 32;

[0085] Figure 34 is a three-dimensional assembly diagram of the control device in the base station shown in Figure 31;

[0086] Figure 35 is a partial three-dimensional exploded view of the control device shown in Figure 34 from one perspective.

[0087] Figure 36 is a partial exploded perspective view of the control device shown in Figure 34 from another angle.

[0088] Figure 37 is a plan view of the drain pipe in the base station shown in Figure 31;

[0089] Figure 38 is a cross-sectional schematic diagram of the drain pipe shown in Figure 37;

[0090] Figure 39 is a schematic plan view of the cleaning equipment in a cleaning system according to certain embodiments of the present disclosure;

[0091] Figure 40 is a partial three-dimensional schematic diagram of the cleaning equipment shown in Figure 39;

[0092] Figure 41 is a three-dimensional exploded view of a portion of the structure of the cleaning equipment shown in Figure 39;

[0093] Figure 42 is a three-dimensional assembly diagram of a portion of the cleaning equipment shown in Figure 39 from another perspective;

[0094] Figure 43 is a three-dimensional exploded view of a portion of the structure of the cleaning equipment shown in Figure 39 from another perspective;

[0095] Figure 44 is a three-dimensional assembly schematic diagram of some structures of the cleaning equipment shown in Figure 39;

[0096] Figure 45 is a three-dimensional exploded view of part of the structure of the cleaning equipment shown in Figure 39;

[0097] Figure 46 is a three-dimensional exploded view of another part of the recycling component of the cleaning equipment shown in Figure 44;

[0098] Figure 47 is an enlarged schematic diagram of part of the structure of the cleaning equipment shown in Figure 46 at point XLVII;

[0099] Figure 48 is an enlarged schematic diagram of part of the structure of the cleaning equipment shown in Figure 46 at the XLVIII;

[0100] Figure 49 is a three-dimensional cross-sectional view of the recycling component of the cleaning equipment shown in Figure 46;

[0101] Figure 50 is a three-dimensional cross-sectional view of a portion of the cleaning equipment shown in Figure 45;

[0102] Figure 51 is a three-dimensional cross-sectional view of the cleaning equipment shown in Figure 45;

[0103] Figure 52 is a schematic diagram of the layout of some structures in the cleaning equipment shown in Figure 39;

[0104] Figure 53 is a schematic diagram of the structure of the control device for the cleaning equipment provided in an embodiment of this disclosure;

[0105] Figure 54 is a schematic diagram of the connection state between a computer-readable storage medium and a processor according to certain embodiments of this disclosure;

[0106] Figure 55 is a three-dimensional exploded view of part of the structure of the cleaning equipment shown in Figure 7;

[0107] Figure 56 is a three-dimensional structural diagram of the cleaning equipment shown in Figure 7 in the state of not draining sewage;

[0108] Figure 57 is an enlarged schematic diagram of LⅦ in Figure 56;

[0109] Figure 58 is an enlarged schematic diagram of LVIII in Figure 56;

[0110] Figure 59 is a three-dimensional structural diagram of the cleaning equipment shown in Figure 7 in the sewage discharge state;

[0111] Figure 60 is an enlarged schematic diagram of LX in Figure 56;

[0112] Figure 61 is an enlarged schematic diagram of LXI in Figure 56;

[0113] Figure 62 is a three-dimensional structural diagram of part of the cleaning system shown in Figure 1 in the sewage discharge state;

[0114] Figure 63 is a top-view schematic diagram of the cleaning equipment in the base station under both sewage discharge and non-sewage discharge conditions.

[0115] Key component symbols: Cleaning system 1000; Cleaning equipment 100; Body 10; Liquid system 30; Cleaning module 20; Housing 21; First housing 211; Second housing 212; First sub-housing 2121; Second sub-housing 2122; Second connecting part 21221; Third sub-housing 2123; Fourth connecting part 21231; Accommodation space 213; Mating surface 215; Second limiting part 217; Cleaning component 22; Front roller 221; Rear roller 222; Mop 223; Clean water box 23; Liquid replenishment port 231; Liquid outlet 233; Overflow port 235; First passage 31; First inlet 311; First outlet 313; First section pipe 315; Second section pipe 317; First power unit 32; Second passage 33; Second inlet 331; Second outlet 33 3; Connecting pipe 334; Third section pipe 335; Fourth section pipe 337; Wastewater box 24; Inlet 241; Outlet 242; Connecting port 243; Box body 248; Cover 249; Sealing structure 2480; First sealing structure 2481; Second sealing structure 2483; Fluid outlet 2485; Fluid inlet 2487; First chamber 244; First sub-chamber 2441; Second sub-chamber 2443; Second chamber 245; Third chamber 246; Third chamber inlet 2461; Third chamber outlet 2463; Filter element 247; Recovery element 251; Opening 2510; First connecting element 25112; Sludge-containing chamber 25115; First wastewater outlet 25116; Second wastewater outlet 25117; First limiting member 25118; Scraping part 2512; Top 25123; Filter part 2513; Filter hole 25131; Bottom surface of filter hole 25133; Support part 2514; Support surface 25141; Barrier wall 25143; Avoidance space 25145; Barrier part 2515; Reinforcing part 2516; Third connecting member 2517; Drain pipe 2518; Drain outlet 25181; Control structure 25183; First sealing member 252; Second sealing member 253; Third sealing member 254; Connecting pipe 255; Fourth sealing member 256; Force application unit 258; Transmission member 2581; First end 25811; Second end 25812; Reset member 2583; Movable end 25831; Fixed end 258 32; Force-bearing component 2585; First protective component 2587; Second protective component 25872; Rotating shaft 25875; Water spray bar 26; Outlet end 260; Spray nozzle 261; Control valve 27; Dirt detection sensor 28; Second power unit 34; Stirring device 35; Drive device 36; Anti-backflow device 37; Water full detection device 38; Guide column 381; Limiting part 3811; Floating component 383; Detection component 3831; Sensing component 385; Width direction of cleaning equipment, width direction of machine body, rotation axis direction, length direction of dirt chamber X; Traveling direction of cleaning equipment Y; Forward direction of cleaning equipment Y1; Height direction of machine body, height direction of clean water box Z; Cleaning module 40; Equipment control board 50; Through hole O;Drive wheel 101; Caster wheel 102; Support wheel 103; Injection connector 104; Injection port 1041; Blind hole 1043; One-way self-locking valve 105; Base station 200; Outlet 201; Base station body 60; Base 61; Connecting interface 63; Top 64; Side wall 65; Opening 66; Cleaning tank 610; Liquid holding area 611; Liquid supply system 70; Clean water channel 71; Clean water tank 711; External liquid source of base station 713; Inlet of clean water channel 715; Outlet of clean water channel 717; Multi-port connector 72; Input interface 721; Output interface 723; Fluid buffer chamber 725; Processing liquid container 73; First processing liquid container 731; Second processing liquid container 733; Processing liquid channel 74; First processing liquid channel 741; First port 7411; Second port 7413; Second processing liquid channel 743; Adjustment device 75; First power unit 751; Electrolysis module 752; Heating module 753; Second power unit 754; First check valve 755; Second check valve 756; First continuity detector 757; Second continuity detector 758; Gas source system 80; Sewage tank 81; Liquid extraction port 811; Flow port 813; Outlet port 815; Gas extraction device 82; First gas source port 821; Second gas source port 823; Control device 83; Body 830; Inner cavity 8300; First mounting hole 8301; Second mounting hole 8302; Third mounting hole 8303; Fourth mounting hole 8304; Fifth mounting hole 8305; Sixth mounting hole 8306; Seventh mounting hole 8307; Base 8308; Top cover 8309; One side wall 8310; Second side wall 8312; Third side wall 8314; Fourth side wall 8315; Air transmission pipe 831; First four-way connector 8311; Second four-way connector 8313; Air passage pipe 833; Valve closing air passage 8331; Valve opening air passage 8332; Liquid extraction air passage 8333; Liquid discharge air passage 8334; Balancing air passage 8335; Air pumping air passage 8336; Control switch assembly 835; Pressure application component 8351; Drive module 8353; Drive motor 83531; Reduction structure 83530; Worm gear 83532; Worm wheel 83533; First gear 83534; Second gear 83535; Third gear 83536; Rotating shaft 8355; First side 83551; Second side 83 553; Clearance space 8350; Position detector 8357; Gas supply pipe 84; First gas supply pipe 841; Second gas supply pipe 843; Liquid extraction pipe 85; First opening 851; Second opening 853; Liquid drain pipe 86; Drain inlet 861; Drain outlet 863; Pipeline assembly 87; First pipeline assembly 871; First pipeline 8711; First tee 8713; First flow port 87131; Second flow port 87133; Third flow port 87135; Second pipeline assembly 873; Second pipeline 8731; Second tee 8733; First connecting port 87331; Second connecting port 87333; Third connecting port 87335; Third pipeline assembly 875; Third pipeline 8751;First two-way valve 8753; Fourth pipeline assembly 877; Fourth pipeline 8771; Second two-way valve 8773; Valve assembly 88; Bracket 881; Cavity 8811; Vent 8813; Adjustment chamber 880; Valve body 883; Internal space 8830; Base station control board 90; Computer-readable storage medium 400; Program 410; Processor 420. Detailed Implementation

[0116] To make the above-described objects, features, and advantages of this disclosure more apparent and understandable, specific embodiments of this disclosure will be described in detail below with reference to the accompanying drawings. Many specific details are set forth in the following description to provide a thorough understanding of this disclosure. However, this disclosure can be implemented in many other ways different from those described herein, and those skilled in the art can make similar modifications without departing from the spirit of this disclosure. Therefore, this disclosure is not limited to the specific embodiments disclosed below.

[0117] In the description of this disclosure, it should be understood that the terms "center," "longitudinal," "lateral," "length," "width," "thickness," "upper," "lower," "front," "rear," "left," "right," "vertical," "horizontal," "top," "bottom," "inner," "outer," "clockwise," "counterclockwise," "axial," "radial," and "circumferential" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. They are used only for the convenience of describing this disclosure and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this disclosure.

[0118] Furthermore, the terms "first" and "second" are used for descriptive purposes only and should not be construed as indicating or implying relative importance or implicitly specifying the number of technical features indicated. Thus, a feature defined as "first" or "second" may explicitly or implicitly include at least one of that feature. In the description of this disclosure, "a plurality of" means at least two, such as two, three, etc., unless otherwise explicitly specified.

[0119] In this disclosure, unless otherwise expressly specified and limited, the terms "installation," "connection," "linking," "fixing," etc., should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral part; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication of two components or the interaction between two components, unless otherwise expressly limited. Those skilled in the art can understand the specific meaning of the above terms in this disclosure according to the specific circumstances.

[0120] In this disclosure, unless otherwise expressly specified and limited, "above" or "below" the second feature can mean that the first and second features are in direct contact, or that the first and second features are in indirect contact through an intermediate medium. Furthermore, "above," "on top of," and "over" the second feature can mean that the first feature is directly above or diagonally above the second feature, or simply that the first feature is at a higher horizontal level than the second feature. "Below," "below," and "under" the second feature can mean that the first feature is directly below or diagonally below the second feature, or simply that the first feature is at a lower horizontal level than the second feature.

[0121] It should be noted that when an element is referred to as being "fixed to" or "set on" another element, it can be directly on the other element or there may be an intervening element. When an element is considered to be "connected to" another element, it can be directly connected to the other element or there may be an intervening element. The terms "vertical," "horizontal," "upper," "lower," "left," "right," and similar expressions used herein are for illustrative purposes only and do not represent the only possible implementation.

[0122] Firstly, current cleaning equipment performs separate actions for supplying liquid to the cleaning components and the wastewater tank, which are not related to other actions of the cleaning equipment, such as replenishment operations, resulting in a relatively cumbersome overall control logic. To address this issue, please refer to Figures 1 and 2a. This disclosure provides a cleaning device 100, which includes a cleaning component 22 and a liquid system 30. The cleaning component 22 is used to mop the surface to be cleaned. The liquid system 30 includes a clean water tank 23 and a target object. The clean water tank 23 is provided with an overflow port 235. When liquid is supplied to the clean water tank 23 from an external liquid source to the extent exceeding the overflow port 235, the liquid in the clean water tank 23 flows through the overflow port 235 to the target object, which includes the cleaning component 22 and / or the wastewater tank 24. Thus, when replenishing the clean water tank 23, if the external liquid source supplies liquid to the clean water tank 23 beyond the overflow port 235, the liquid in the clean water tank 23 will supply liquid to the cleaning component 22 and / or the wastewater tank 24. On the one hand, if the liquid overflowing from the overflow port 235 supplies liquid to the cleaning component 22, the cleaning device 100 can be in the operation of cleaning the cleaning component 22; that is, the replenishment operation can be performed incidentally as the operation of cleaning the cleaning component 22, thereby simplifying the control logic of the cleaning device 100. On the other hand, if the liquid overflowing from the overflow port 235 supplies liquid to the wastewater tank 24, the cleaning device 100 can be in the operation of cleaning the wastewater tank 24; that is, the replenishment operation can be performed incidentally as the operation of cleaning the wastewater tank 24, thereby simplifying the control logic of the cleaning device 100 as well. It should be noted that "exceeding the overflow outlet 235" means that if the liquid level in the clear water tank 23 reaches the lowest position of the overflow outlet 235, and more liquid is added to the clear water tank 23, then the liquid in the clear water tank 23 will overflow from the overflow outlet 235 to the outside of the clear water tank 23. If the liquid level in the clear water tank 23 is higher than the lowest position of the overflow outlet 235, then it falls more precisely into the category of "exceeding the overflow outlet 235".

[0123] Secondly, since the cleaning equipment requires a smaller liquid supply when wiping the surface to be cleaned, but a larger liquid supply when cleaning the cleaning components, related technologies use a flow-adjustable power device in the liquid circuit system 30 to regulate the flow rate output to the cleaning components, thereby meeting the different requirements of the cleaning components wiping the surface to be cleaned and the cleaning components self-cleaning. However, using such a flow-adjustable power device is costly. To solve this problem, this disclosure provides a liquid circuit system 30 (shown in FIG. 2a, 2b, 2c, 2d, or 2e), a cleaning equipment 100 (shown in FIG. 7 or 8), a base station 200 (shown in FIG. 1), and a cleaning system 1000 (shown in FIG. 1).

[0124] Please refer to Figure 1. The cleaning system 1000 of this disclosure includes a cleaning device 100 of any of the following embodiments and a base station 200 of any of the following embodiments.

[0125] Cleaning device 100 is a device used to clean a surface to be cleaned. For example, cleaning device 100 may include a mopping robot and a sweeping and mopping robot. A mopping robot can be used to wipe and clean the surface to be cleaned, while a sweeping and mopping robot integrates the functions of both types of robots; that is, the sweeping and mopping robot can be used to sweep the surface to be cleaned, and it can also be used to wipe and clean the surface to be cleaned. The cleaning device 100 disclosed herein is described using a sweeping and mopping robot as an example. The surface to be cleaned may be, but is not limited to, a floor, marble surface, carpet, or glass surface. This disclosure uses a floor as an example of a surface to be cleaned.

[0126] Base station 200 is a device used for maintenance and upkeep of cleaning equipment 100. For example, base station 200 can clean cleaning equipment 100 and charge it. Furthermore, base station 200 may also have at least one of the following functions: replenishing water to cleaning equipment 100, draining water, collecting dust, etc. For example, when the power of cleaning equipment 100 is insufficient, cleaning equipment 100 returns to base station 200 to recharge. When cleaning equipment 100 is fully charged, it can leave base station 200 and continue cleaning the surface to be cleaned. When cleaning equipment 100 needs to drain (dirt), it returns to base station 200 to discharge the wastewater, and then leaves base station 200 to continue cleaning the surface to be cleaned.

[0127] The cleaning equipment 100 and base station 200 in the first aspect of the cleaning system 1000 will now be described in detail with reference to Figures 1, 2a to 2f, 3a, 3b, and 7 to 26.

[0128] Please refer to Figures 2a to 2f, Figure 8 and Figure 11. The cleaning device 100 includes a body 10, a cleaning component 22 (shown in Figure 11), and a fluid system 30 according to any of the following embodiments. The cleaning component 22 is disposed on the body 10. The fluid system 30 is also disposed on the body 10.

[0129] The body 10 is a component on the cleaning equipment 100 used to house other components besides the body 10. Components other than the body 10 in this document include, but are not limited to, the cleaning module 20 and the fluid system 30.

[0130] The cleaning device 100 includes a cleaning module 20, which is a module on the cleaning device 100 that participates in cleaning the surface to be cleaned by providing dragging force. The cleaning module 20 includes a housing 21 and a cleaning component 22. The housing 21 is a component for mounting the components (such as the cleaning component 22) in the cleaning module 20 other than the housing 21. The cleaning component 22 is the component in the cleaning module 20 that specifically provides dragging force to clean the surface to be cleaned. The cleaning component 22 is disposed on the body 10 in such a way that the housing 21 is mounted on the body 10 in a detachable or non-detachable manner, and the cleaning component 22 is mounted on the housing 21 in a detachable or non-detachable manner, thereby realizing that the cleaning component 22 is indirectly disposed on the body 10. For example, the connection between the housing 21 and the body 10 can also be a movable connection. For instance, the housing 21 can be raised and lowered relative to the body 10 in the height direction Z, and the housing 21 can be moved relative to the body 10 in the width direction X, thereby enabling the cleaning module 20 to be raised and lowered relative to the body 10 in the height direction Z and moved in the width direction X.

[0131] In some embodiments, the cleaning component 22 is a tracked cleaning component, in which case the cleaning device 100 is a tracked cleaning device. In other embodiments, the cleaning component 22 is a roller-type cleaning component, in which case the cleaning device 100 is a roller-type cleaning device. In still other embodiments, the cleaning component 22 can be a flatbed cleaning component or a rotating disc cleaning component, in which case the cleaning device 100 is a flatbed cleaning device or a rotating disc cleaning device. Regardless of the type of cleaning component 22, it is in contact with the surface to be cleaned when the cleaning module 20 cleans the surface to be cleaned. For rotating disc-type, tracked, or roller-type cleaning components, they all rotate relative to the surface to be cleaned when cleaning it. During the rotation of the cleaning component 22, it can roll away or wipe away the dirt on the surface to be cleaned, so as to keep the surface to be cleaned clean. The dirt here can include liquid dirt and solid dirt. The cleaning component 22 provided in the embodiments of this disclosure can be any of the above, as long as the cleaning component 22 can be supplied with liquid by the liquid circuit system 30 on the cleaning device 100. In addition, the cleaning component 22 includes, but is not limited to, disposable electrostatic mops, disposable wet mops, or reusable fabric mops.

[0132] In this embodiment of the cleaning device, the cleaning component 22 only partially contacts the surface to be cleaned at any given time. In some embodiments, the rotation axis of the cleaning component 22 may be parallel to the surface to be cleaned. For example, both the tracked cleaning component 22 and the roller cleaning component 22 can clean the surface to be cleaned by rotating. Compared to cleaning devices using traditional disc-type or flatbed cleaning components, the traditional method of cleaning disc-type or flatbed cleaning components involves the cleaning device 100 returning to the base station 200, where the base station 200 supplies water to the disc-type cleaning component to clean it. However, this design means that the cleaning component of the disc-type or flatbed cleaning device 100 becomes increasingly dirty as it cleans the surface, requiring the cleaning device 100 to frequently return to the base station 200 to clean its component. This can easily affect the cleaning effect and efficiency of the cleaning device 100. Since the tracked and roller-type cleaning components roll on the surface to be cleaned, and the cleaning device 100 is equipped with a scraping part 2512 that abuts against the tracked or roller-type cleaning components (as shown in Figure 13), the dirt on the tracked or roller-type cleaning components can be scraped into the cleaning device 100 for collection. This keeps the cleaning component 22 relatively clean, thus the tracked and roller-type cleaning devices achieve a better cleaning effect on the surface to be cleaned. Of course, in some other embodiments, the rotation axis of the cleaning component 22 may not be parallel to the surface to be cleaned.

[0133] The liquid system 30 is a system on the cleaning device 100 that participates in cleaning the surface to be cleaned by providing liquid. In some embodiments of this disclosure, the liquid system 30 can provide liquid to the cleaning component 22 to wet the cleaning component 22 when it is mopping the surface to be cleaned, so that the cleaning component 22 maintains good mopping ability. In other embodiments of this disclosure, in addition to providing liquid for cleaning the surface to be cleaned, the liquid system 30 can also recycle wastewater generated by the cleaning component 22 when mopping the surface to be cleaned, thereby realizing the self-cleaning function of the cleaning component 22. In still other embodiments of this disclosure, in addition to providing liquid for cleaning the surface to be cleaned and recycling wastewater generated by the cleaning component 22 when mopping the surface to be cleaned, thereby realizing the self-cleaning function of the cleaning component 22, the liquid system 30 can also provide liquid for cleaning the cleaning component 22 after the cleaning device 100 reaches a preset position, wherein the preset position includes, but is not limited to, the base station 200 or an area with a drainage system, such as a toilet. It should be noted that the liquid circuit system 30 and the cleaning module 20 are both structures on the cleaning equipment 100 that participate in cleaning the surface to be cleaned. The components contained in each of them may not overlap at all or may overlap at least partially.

[0134] Specifically, please refer to Figures 2a, 2b, 2c-2e, and 8-10. In some embodiments, the liquid circuit system 30 includes a clean water box 23, a first passage 31, a first power unit 32, and a second passage 33.

[0135] The water container 23 is provided with an outlet 233 and an overflow outlet 235. The outlet 233 is positioned at a lower height than the overflow outlet 235. For example, the outlet 233 may be located on the side wall of the water container 23, and the overflow outlet 235 may be located on the top wall of the water container 23. Alternatively, both the outlet 233 and the overflow outlet 235 may be located on the side wall of the water container 23, but the outlet 233 may be positioned at a lower height than the overflow outlet 235. Alternatively, the water container 23 may be irregularly shaped and may include at least two top walls, with the outlet 233 and the overflow outlet 235 located at different heights on these top walls. In summary, by setting the outlet 233 at a lower height than the overflow outlet 235 on the water tank 23, the liquid in the water tank 23 will not flow out of the overflow outlet 235 when the liquid level in the water tank 23 does not reach the height set by the overflow outlet 235, and the liquid in the water tank 23 will flow out of the overflow outlet 235 when the liquid level in the water tank 23 exceeds the overflow outlet 235.

[0136] The first passage 31 is provided with a first inlet 311 and a first outlet 313. The first inlet 311 is connected to the liquid outlet 233, and the first outlet 313 is used to supply liquid from the clean water tank 23 to flow out of the first passage 31. The first power unit 32 is used to provide driving power to discharge the liquid from the clean water tank 23 into the first passage 31. For example, the first power unit 32 can be located at the first passage 31 or the liquid outlet 233. The second passage 33 is provided with a second inlet 331 and a second outlet 333. The second inlet 331 is connected to the overflow outlet 235, and the second outlet 333 is used to supply liquid from the clean water tank 23 to flow out of the second passage 33. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the first power unit 32 drives the liquid in the clean water tank 23 to flow into the first passage 31 from the liquid outlet 233 and out from the first outlet 313 to supply liquid to the cleaning component 22. When the cleaning device 100 is in the state of cleaning the cleaning component 22, liquid is supplied to the clean water box 23 through an external liquid source so that the liquid level in the clean water box 23 exceeds the overflow port 235. When this happens, the liquid in the clean water box 23 overflows from the overflow port 235 to the second passage 33 and flows out from the second outlet 333 to drain the liquid to the cleaning component 22 and clean the cleaning component 22.

[0137] It should be noted that, in this embodiment, "liquid supply" refers to the process of providing the cleaning component 22 with the amount of water required for its normal mopping of the surface to be cleaned, while "liquid drainage" refers to the process of using the liquid discharged from the water tank 23 due to overflow to clean the cleaning component 22. For example, when the cleaning device 100 is in the state of mopping the surface to be cleaned, the liquid level in the water tank 23 does not exceed the overflow port 235.

[0138] The water container 23 is a container on the liquid system 30 and / or cleaning module 20 used to load and / or store liquids. It should be noted that the name "water container 23" does not limit the type of liquid contained within it; that is, the liquid in the water container 23 is not limited to storing only clean water, but can store liquids including clean water, mixtures of cleaning agent and clean water (hereinafter referred to as cleaning liquid), mixtures of maintenance agent and clean water (hereinafter referred to as maintenance liquid), etc., used for cleaning the cleaning components 22, and for cleaning and / or maintaining surfaces to be cleaned. Furthermore, "clean water" here is a relative concept; any water cleaner than what the user perceives as sewage is within the scope of protection. For example, clean water can be municipal tap water, clean river, lake, or sea water, etc. The water container 23 can be of any shape; for example, the shape of the cross-section of the water container 23 (in this text, "cross-section" refers to a plane intercepted by a plane perpendicular to the height direction Z of the water container 23) can be a regular shape or an irregular shape. In this document, "regular shapes" include, but are not limited to, rectangles, circles, ellipses, triangles, regular polygons, etc. Irregular shapes are shown in Figure 9. The cross-sectional design of irregular shapes can adapt to the structural layout of the cleaning equipment 100, facilitating the compact arrangement of other components. In some embodiments, please refer to Figures 8 to 10. The clean water tank 23 is provided with a replenishment port 231, a discharge port 233, and an overflow port 235. The location, height, shape, and size of the replenishment port 231 can be arbitrarily set, and this disclosure does not limit it. The shape and size of the discharge port 233 and the overflow port 235 can also be arbitrarily set, and this disclosure does not limit them. However, the height of the discharge port 233 on the clean water tank 23 is lower than the height of the overflow port 235 on the clean water tank 23. Specifically, the clean water tank 23 has a height midline (a line passing through the midpoint of the height and perpendicular to the height direction Z), with the discharge port 233 located below the height midline and the overflow port 235 located above the height midline. In one example, the outlet 233 is near the bottom of the clear water box 23, and the overflow outlet 235 is near the top of the clear water box 23.

[0139] For example, the cleaning device 100 is provided with drive wheels 101 for driving the cleaning device 100 to move on the surface to be cleaned. Taking the forward and backward direction Y of the cleaning device 100 as a reference, the cleaning module 20 provided in this embodiment can be located behind the drive wheels 101 of the cleaning device 100, and the clean water box 23 can be located behind the cleaning module 20. When the cleaning device 100 needs to enter the base station 200, the cleaning device 100 can enter the base station 200 in a backward posture. In order to adapt to the structural layout of the cleaning device 100 of this disclosure and facilitate the docking of the clean water box 23 with the base station 200 to realize the base station 200 to replenish water into the clean water box 23, the liquid inlet 231 can be set on the side of the clean water box 23 facing the rear of the cleaning device 100, and the liquid outlet 233 and the overflow outlet 235 can be set on the side of the clean water box 23 facing the front of the cleaning device 100. The replenishment port 231 is an opening for connecting the interior of the clean water tank 23 with an external liquid source, meaning that an external liquid source can enter the interior of the clean water tank 23 through the replenishment port 231. The outlet port 233 and the overflow port 235 are openings for connecting the interior of the clean water tank 23 with an external pipe, meaning that liquid in the clean water tank 23 can flow out to the external pipe through the outlet port 233 and / or the overflow port 235, and then flow to the target object through the external pipe. In this disclosure, the cleaning module 20 and / or the liquid circuit system 30 also include a spray bar 26, and the target object can be the spray bar 26. The spray bar 26 can be disposed on one side of the cleaning module 20. For example, in an embodiment of this disclosure, the spray bar 26 can be disposed on the front side of the cleaning module 20 and fixed to the front part of the housing 21 of the cleaning module 20. The spray bar 26 has a plurality of spray nozzles 261, which are arranged at intervals along the rotation axis of the cleaning member 22 and facing the cleaning member 22, so that the liquid sprayed from the spray bar 26 can flow to the cleaning member 22.

[0140] The first passage 31 is a channel for liquid flow connecting the liquid outlet 233 and the spray bar 26. The first passage 31 may include a first inlet 311 and a first outlet 313 located at opposite ends. The first inlet 311 communicates with the liquid outlet 233, and the first outlet 313 communicates with the spray bar 26, and is used for liquid outflow from the first passage 31. Specifically, in some embodiments, the first passage 31 may at least include a pipe. In other embodiments, the first passage 31 may be a channel defined by the wall surface of a component of the cleaning device 100.

[0141] The second passage 33 is a channel for liquid flow connecting the overflow outlet 235 and the spray bar 26. The second passage 33 includes a second inlet 331 and a second outlet 333 located at opposite ends. The second inlet 331 communicates with the overflow outlet 235, and the second outlet 333 communicates with the spray bar 26, and is used for liquid outflow from the second passage 33. Specifically, in some embodiments, the second passage 33 may at least include a pipe. In other embodiments, the second passage 33 may be a channel defined by the wall surface of a component of the cleaning device 100.

[0142] The first power unit 32 is a device that provides the driving power to discharge the liquid in the clean water box 23 from the first passage 31. In some embodiments, the first power unit 32 includes a peristaltic pump. Generally, peristaltic pumps have a small flow rate and are suitable for applications requiring precise flow control. In this embodiment, the first power unit 32 is disposed in the first passage 31 and is used to drive the liquid in the clean water box 23 to flow to the cleaning component 22 when the cleaning device 100 is cleaning the surface to be cleaned. This wets the cleaning component 22 and allows for better wiping of the surface to be cleaned. Therefore, in this scenario, the required flow rate of the first power unit 32 is small, allowing for more precise control of the amount of liquid supplied to the cleaning component 22 and preventing excessive water residue on the surface to be cleaned during wiping. Therefore, selecting a peristaltic pump with a small flow rate that allows for precise flow control as the first power unit 32 better meets the needs of the cleaning device 100 for wiping the surface to be cleaned. Of course, in other embodiments, the first power unit 32 may also be a water pump with a small flow rate, and this disclosure does not impose any particular limitation.

[0143] As shown in Figures 2a, 2b, 2c-2e, 8, and 9, the inlet of the first power device 32 is connected to the outlet 233 via a first section of pipe 315, and the outlet of the first power device 32 is connected to the spray bar 26 via a second section of pipe 317. The opening where the first section of pipe 315 connects to the outlet 233 is the first inlet 311, and the opening where the second section of pipe 317 connects to the spray bar 26 is the first outlet 313. In this case, the first passage 31 includes the first section of pipe 315, the first power device 32, and the second section of pipe 317. In some embodiments, the cleaning equipment 100 also includes an equipment control board 50, which is a device for controlling the operation of various functional modules in the cleaning equipment 100. The equipment control board 50 typically includes a circuit board and a controller or processor mounted on the circuit board. The equipment control board 50 is electrically connected to the first power device 32 and is used to control the opening and closing of the first power device 32.

[0144] The cleaning device 100 has two states: a state for mopping the surface to be cleaned and a state for cleaning the cleaning components 22. In the state of mopping the surface, the device control panel 50 controls the first power unit 32 to turn on. The first power unit 32 drives the liquid in the clean water tank 23 to flow from the outlet 233 into the first passage 31, and then out through the first outlet 313 to the spray bar 26, which then supplies the cleaning components 22. In the state of cleaning the cleaning components 22, the clean water tank 23 is supplied with liquid from an external liquid source. When the liquid level in the clean water tank 23 exceeds the overflow outlet 235, the liquid overflows from the overflow outlet 235 into the second passage 33, and then out through the second outlet 333 to the spray bar 26, which then supplies the cleaning components 22 to clean them. At this time, the device control panel 50 can control the first power unit 32 to turn on or off. It should be noted that when the cleaning module 20 is not equipped with the water spray bar 26: when the cleaning device 100 is in the state of mopping the surface to be cleaned, the liquid flowing out from the first outlet 313 of the first passage 31 can be directly supplied to the cleaning component 22. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid flowing out from the second outlet 333 of the second passage 33 can also be directly discharged to the cleaning component 22.

[0145] It should be noted that, since the amount of liquid applied to the cleaning component 22 when the cleaning device 100 mops the surface to be cleaned can be relatively small, that is, the flow rate of the first power device 32 is very small as described above. It is understood that the larger the cross-sectional size of the overflow port 235, the greater the flow rate of liquid overflowing from the clean water box 23 through the overflow port 235. To achieve the purpose of using a large flow rate of liquid to clean the cleaning component 22, those skilled in the art can set the cross-sectional size of the overflow port 235 as needed to achieve the purpose of cleaning the cleaning component 22 with a large flow rate.

[0146] Additionally, please refer to Figures 2a, 2b, and 2c-2e. The cleaning device 100 is used to interface with the base station 200, which is used to maintain the cleaning device 100. The base station 200 is equipped with a liquid supply system 70 for supplying liquid and a connection interface 63 connected to the liquid supply system 70. The external liquid source of the clean water box 23 includes, but is not limited to, the liquid supply system 70 of the base station 200, the water supply system inside the building, and the outdoor water supply system. It can even be another clean water box in the cleaning device 100. When the external liquid source of the clean water box 23 is the liquid supply system 70 of the base station 200, the connection interface 63 is used to interface with the replenishment port 231 (the connection interface 63 can be directly or indirectly connected to the replenishment port 231). When the cleaning device 100 is docked at the base station 200 and the connection interface 63 is connected to the replenishment port 231, the liquid supply system 70 of the base station 200 is used to supply liquid to the clean water box 23 of the cleaning device 100. When the liquid supply system 70 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid in the clean water box 23 overflows and flows to the cleaning component 22 through the second passage 33.

[0147] The liquid circuit system 30, cleaning device 100, and cleaning system 1000 disclosed herein are provided with a first passage 31 and a second passage 33, both connected to the clean water tank 23. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the first power unit 32 drives the liquid in the clean water tank 23 to supply liquid to the cleaning component 22 through the first passage 31, so as to replenish the cleaning component 22 with liquid for mopping the surface to be cleaned, keeping the cleaning component 22 moist when the cleaning device 100 is mopping the surface to be cleaned. When the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid level supplied to the clean water tank 23 by the external liquid source exceeds the overflow port 235. Liquid overflows from the overflow port 235 into the second passage 33, and then drains into the cleaning component 22 through the second passage 33 to clean the cleaning component 22. Since it is only necessary to keep the cleaning component 22 wet when mopping the surface to be cleaned, the flow rate of the first power device 32 can be relatively small. When mopping the surface to be cleaned, the first power device 32 drives the liquid in the clean water box 23 to flow out at a small flow rate. When cleaning the cleaning component 22, the clean water box 23 can overflow water to the cleaning component 22 to meet the need for a large flow rate of liquid supply to the cleaning component 22. Therefore, there is no need to use a power device with adjustable flow rate to adjust the flow rate output to the cleaning component 22, which reduces the cost of the liquid circuit system 30.

[0148] The above embodiments will be described below with reference to some specific application scenarios.

[0149] As shown in Figure 26, and in conjunction with Figures 2a, 2b, 2c, 2d, or 2e, the user starts the sweeper and mop combo (cleaning device 100). Driven by the drive wheels 101, the machine moves across the living room floor. During this movement, the built-in water tank 23 provides water to the tracked cleaning component 22, wetting it. The tracked cleaning component 22 contacts and rolls against the floor, thus wiping away dust. As the sweeper and mop combo moves, the tracked cleaning component 22 cleans the floor to a set area, such as 20 square meters. 2 When the area is insufficient or the water level in the clean water tank 23 is low, the sweeper-mop can navigate to the positioning point of the base station 200 and rotate until the replenishment port 231 of the clean water tank 23 faces the entrance of the base station 200. The sweeper-mop then reverses into the base station 200. During this process, the replenishment port 231 of the clean water tank 23 connects with the interface 63 of the base station 200, and the base station 200's liquid supply system 70 replenishes water to the clean water tank 23. As the base station 200 continuously replenishes water to the clean water tank 23, the water level in the clean water tank 23 continuously rises until it exceeds the overflow port 235 of the clean water tank 23. A large amount of water overflows from the overflow port 235 and flows onto the tracked cleaning component 22. During this process, the tracked cleaning component 22 can continuously rotate forward or alternate between forward and reverse rotation, achieving high-flow self-cleaning of the tracked cleaning component 22. After the cleaning unit 22 has finished its task, the sweeper and mop can return to the ground to clean other uncleaned areas.

[0150] Alternatively, the robot vacuum and mop used in the user's home may have a dirt detection sensor that can detect the degree of dirt on the cleaning component 22 or the degree of dirt in the wastewater scraped off the cleaning component 22. If the user is away from home for an extended period, resulting in a lot of dust on the living room floor, the user can start the robot vacuum and mop (cleaning device 100). Driven by the drive wheels 101, the robot vacuum and mop moves across the floor. During this movement, the built-in water tank 23 provides water to the tracked cleaning component 22 to wet it. The tracked cleaning component 22 then contacts and rolls against the floor, wiping away the dust. As the robot vacuum and mop moves, the dirt sensor detects that the tracked cleaning component 22 is very dirty. If it is not deeply cleaned at this point, the subsequent cleaning effect on the floor will be affected. At this time, the sweeper and mop can navigate to the positioning point of the base station 200 and rotate until the water inlet 231 of the sweeper and mop's water tank 23 faces the entrance of the base station 200. The sweeper and mop then retreats into the base station 200. During this process, the water inlet 231 of the sweeper and mop's water tank 23 connects with the interface 63 of the base station 200, and the base station 200's liquid supply system 70 replenishes water into the sweeper and mop's water tank 23. As the base station 200 continuously replenishes water into the water tank 23, the water level in the water tank 23 continuously rises until it exceeds the overflow outlet 235 of the water tank 23. A large amount of water overflows from the overflow outlet 235 and flows onto the tracked cleaning component 22. During this process, the tracked cleaning component 22 can continuously rotate forward or alternate between forward and reverse rotation, achieving high-flow self-cleaning of the tracked cleaning component 22, thereby deeply cleaning the dirt attached to the tracked cleaning component 22. After cleaning component 22 completes its task, the sweeper and mop return to the floor to clean any remaining uncleaned areas. This process is repeated until most of the dusty areas in the living room are cleaned.

[0151] Please refer to Figures 2c, 2d, 2e, and 2f. In some embodiments, the cleaning device 100 further includes a dirt detection sensor 28 electrically connected to the device control board 50. This disclosure also provides a control method for the cleaning device 100, the control method including:

[0152] 01: The degree of dirtiness of the wastewater along the wastewater recycling path between the cleaning component 22 and the wastewater box 24 (specifically the second chamber 245 inside the wastewater box 24 in the illustration) is detected by the dirt detection sensor 28;

[0153] 03: Determine the fluid parameters and supply strategy for the fluid supplied to the second chamber 245 based on the degree of contamination of the sewage.

[0154] Correspondingly, the dirt detection sensor 28 is used to detect the degree of dirtiness of the sewage on the sewage recycling path between the cleaning component 22 and the second chamber 245, and transmits the detection result to the equipment control board 50. The equipment control board 50 is used to determine the fluid parameters and supply strategy of the fluid supplied to the second chamber 245 according to the degree of dirtiness of the sewage.

[0155] Among them, the dirt detection sensor 28 is a sensor used to detect the degree of dirt in a liquid, including but not limited to: an optical sensor that detects the degree of dirt by measuring the reflection, scattering or absorption of light; or a capacitive sensor that detects the degree of dirt by utilizing changes in capacitance; or an ultrasonic sensor that determines the degree of dirt by emitting ultrasonic waves and measuring the time it takes for them to reflect back.

[0156] When the cleaning equipment 100 performs suction, the second power unit 34 is activated and draws negative pressure into the second chamber 245. The wastewater collected by the recovery unit 251 from the cleaning unit 22 enters the second chamber 245 for storage through the first wastewater outlet 25116, the connecting pipe 255, and the connecting port 243. Therefore, the cleaning unit 22, the flow path between the cleaning unit 22 and the recovery unit 251, the dirt-containing chamber 25115, the connecting pipe 255, and the second chamber 245 together form a "wastewater recovery path". The dirt detection sensor 28 can be set at any position on the wastewater recovery path, such as in the second chamber 245 (shown in FIG. 2d), on the connecting pipe 255 (shown in FIG. 2e and FIG. 2f), in the dirt-containing chamber 25115 of the recovery unit 251, on the cleaning unit 22, and on the flow path between the cleaning unit 22 and the recovery unit 251. This disclosure does not impose any restrictions.

[0157] The fluid parameters include the type of fluid, which includes at least one of gas, liquid, and gas-liquid mixture (bubble liquid). When the fluid is liquid, the main supplying entity is base station 200; when the fluid is gas, the main supplying entity can be base station 200 or the second power unit 34, and both are supplied separately. When the fluid is a gas-liquid mixture, the main supplier of the fluid can be the base station 200. In this case, the gas supply system of the base station 200 supplies gas, and the liquid supply system 70 of the base station 200 supplies liquid. The gas and liquid mix to form a gas-liquid mixture. The mixing process can occur within the base station 200, for example, before reaching the interface 63. The mixing process can also occur within the cleaning device 100, for example, when or before reaching the second chamber 245. When the fluid is a gas-liquid mixture, the main supplier of the fluid can also be the base station 200 and the second power device 34. In this case, the liquid supply system 70 of the base station 200 supplies liquid, and the second power device 34 supplies liquid. The gas and liquid mix to form a gas-liquid mixture. The mixing process occurs within the cleaning device 100, for example, when or before reaching the second chamber 245.

[0158] In this embodiment, the degree of dirtiness of the sewage on the sewage recycling path is first detected by the dirt detection sensor 28, and then the type and parameters of the fluid supplied to the second chamber 245 are determined based on the degree of dirtiness of the sewage. This allows the fluid supply to the second chamber 245 to be dynamically adjusted based on the actual cleaning situation, avoiding extreme situations of too much or too little supply, and improving the intelligence of the cleaning equipment 100.

[0159] In some implementations, 03: determining the fluid parameters and supply strategy for the fluid supplied to the second chamber 245 based on the degree of contamination of the wastewater, including:

[0160] 031: If the degree of contamination of the sewage is less than or equal to the first preset contamination threshold, it is determined to provide positive pressure gas to the second chamber 245 to perform sewage discharge on the second chamber 245.

[0161] When the test results indicate that the degree of contamination of the wastewater is less than or equal to the first preset contamination threshold, the equipment control board 50 determines to supply positive pressure gas to the second chamber 245.

[0162] When the cleaning equipment 100 performs sewage discharge, one implementation method is as follows: the equipment control board 50 controls the second power unit 34 to shut down, and the base station 200 provides positive pressure gas to the clean water box 23 through the interface 63 and the liquid replenishment port 231. The positive pressure gas overflows from the overflow port 235 into the second chamber 245, squeezing the sewage in the second chamber 245 outward and discharging it into the sewage holding chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to connect the second sewage port 25117 to the outside, and the sewage in the sewage holding chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. Another implementation is as follows: The equipment control board 50 controls the second power unit 34 to turn on and introduce positive pressure gas into the second chamber 245. The positive pressure gas forces the sewage in the second chamber 245 outward, causing it to be discharged into the sludge-containing chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to connect the second sewage port 25117 to the outside, and the sewage in the sludge-containing chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100.

[0163] The first preset dirt level threshold is a critical value used to describe whether the second chamber 245 needs cleaning. It is a known empirical value, usually set before leaving the factory or derived from historical experience data. When the dirt level of the wastewater is less than or equal to the first preset dirt level threshold, it indicates that the second chamber 245 is not very dirty and will not accumulate or adhere to the inner wall. Therefore, cleaning of the second chamber 245 is not required; only the wastewater in the second chamber 245 needs to be drained.

[0164] In other embodiments, when the fluid is a liquid, the fluid parameters also include: liquid pressure, liquid flow rate, and liquid supply duration, etc. 03: Determine the fluid parameters and supply strategy for the fluid supplied to the second chamber 245 based on the degree of contamination of the wastewater, including:

[0165] 032: When the degree of contamination of the sewage is greater than the first preset contamination threshold and less than or equal to the second preset contamination threshold, it is determined that gas is first supplied to the second chamber 245 to perform sewage discharge, and then liquid is supplied to the second chamber 245 to flush the second chamber 245. At least one of the liquid pressure, liquid flow rate and liquid supply duration is determined according to the degree of contamination of the sewage.

[0166] When the test results show that the degree of contamination of the sewage is greater than the first preset contamination threshold and less than or equal to the second preset contamination threshold, the equipment control board 50 determines to first supply gas to the second chamber 245 to perform sewage discharge on the second chamber 245, and then supply liquid to the second chamber 245, and determines at least one of the liquid pressure, liquid flow rate and liquid supply duration according to the degree of contamination of the sewage.

[0167] The second preset dirt level threshold is used to describe whether the dirt in the pores of the filter element 247 has accumulated to a critical value that requires separate cleaning. The second preset dirt level threshold is a known empirical value, usually set before leaving the factory or derived from historical experience data. When the dirt level of the wastewater is greater than the first preset dirt level threshold but less than or equal to the second preset dirt level threshold, it indicates that the second chamber 245 is already very dirty. If not cleaned, it will accumulate or adhere to the inner wall. However, the dirt in the pores of the filter element 247 has not accumulated to the point that it obstructs fluid flow and requires separate cleaning. Therefore, it is not necessary to clean the filter element 247 separately; only the second chamber 245 needs to be cleaned.

[0168] The liquid pressure, flow rate, and supply duration can be adjusted according to the degree of soiling of the wastewater. Generally, the dirtier the wastewater, the higher the liquid pressure, the higher the flow rate, and the longer the supply duration, thus improving cleaning efficiency and effectiveness. When implementing the method in 032, the liquid pressure can be determined solely based on the degree of soiling, while the flow rate and supply duration remain unchanged from their initial settings. The deeper the soiling (the dirtier the wastewater), the higher the liquid pressure. Alternatively, the liquid flow rate can be determined solely based on the degree of soiling, while the liquid pressure and supply duration remain unchanged from their initial settings. The deeper the soiling (the dirtier the wastewater), the higher the liquid flow rate. Furthermore, the liquid supply duration can be determined solely based on the degree of soiling, while the liquid pressure and flow rate remain unchanged from their initial settings. The deeper the soiling (the dirtier the wastewater), the longer the liquid supply duration. Of course, the liquid pressure and flow rate can be determined simultaneously based on the degree of contamination of the wastewater, while the liquid supply duration remains unchanged at the initial setting; or, the liquid pressure and liquid supply duration can be determined based on the degree of contamination of the wastewater, while the liquid flow rate remains unchanged at the initial setting; or, the liquid flow rate and liquid supply duration can be determined based on the degree of contamination of the wastewater, while the liquid pressure remains unchanged at the initial setting; or, all three—liquid pressure, liquid flow rate, and liquid supply duration—can be determined based on the degree of contamination of the wastewater.

[0169] In this embodiment, based on the detection results obtained by the dirt detection sensor 28, if the degree of dirtiness of the wastewater is determined to be at a stage where the second chamber 245 needs to be flushed, gas is first supplied to the second chamber 245 to discharge the wastewater, and then liquid is supplied to the second chamber 245 to flush it, instead of just discharging wastewater. This allows for immediate cleaning of the second chamber 245, avoiding the problem of dirt adhering to the walls or accumulating due to long-term uncleanliness, which would require manual disassembly and cleaning by the user. Furthermore, during the process of supplying liquid to the second chamber 245 for flushing, at least one of the liquid pressure, liquid flow rate, and liquid supply duration is determined based on the degree of dirtiness of the wastewater. Compared to using fixed liquid pressure, liquid flow rate, and liquid supply duration for flushing the second chamber 245, the flushing in this embodiment is more in line with actual needs, avoiding the problem of excessive energy consumption and resource waste due to excessively large parameters, and also avoiding the problem of incomplete cleaning due to excessively small parameters. In other words, the parameters of this implementation method are determined based on the degree of dirtiness of the wastewater, which can save energy and resources while ensuring the cleaning effect.

[0170] In some embodiments, when the fluid is a liquid, the fluid parameters also include: liquid pressure, liquid flow rate, and liquid supply duration, etc.; when the fluid is a gas-liquid mixture, the fluid parameters also include: gas-liquid mixture pressure, gas-liquid mixture flow rate, gas-liquid mixture supply duration, gas and liquid ratio, etc. 03: Determine the fluid parameters and supply strategy for the fluid supplied to the second chamber 245 based on the degree of sewage contamination, including:

[0171] 033: When the degree of contamination of the sewage exceeds the second preset contamination threshold, it is determined that a gas-liquid mixture is first supplied to the second chamber 245 to flush the filter element 247, and at least one of the following is determined according to the degree of contamination of the sewage: pressure of the gas-liquid mixture, flow rate of the gas-liquid mixture, supply duration of the gas-liquid mixture, and gas-liquid ratio. Then, gas is supplied to the second chamber 245 to perform sewage discharge. Finally, liquid is supplied to flush the second chamber 245, and at least one of the following is determined according to the degree of contamination of the sewage: pressure of the liquid, flow rate of the liquid, and supply duration of the liquid.

[0172] When the level of contamination in the wastewater exceeds a second preset contamination threshold, it indicates that the contaminants in the pores of the filter element 247 have accumulated to the point where fluid cannot pass through without cleaning. In this case, the second chamber 245 is also very dirty, with deposits or residue forming on its inner wall. Therefore, a gas-liquid mixture can be first supplied to the second chamber 245 to flush the filter element 247. After the contaminants in the pores of the filter element 247 are cleaned and liquid can pass through, gas can be supplied to the second chamber 245 to drain the wastewater. Finally, liquid can be supplied to the second chamber 245 for cleaning.

[0173] In the process of rinsing the filter element 247 using a gas-liquid mixture, the gas-liquid mixture (bubble liquid) is equivalent to pressurizing the liquid. Compared to rinsing the filter element 247 solely with liquid, the bubble liquid provides a stronger rinsing force, resulting in better rinsing efficiency and effect. At this time, at least one of the following can be determined based on the degree of contamination of the wastewater: the pressure of the gas-liquid mixture, the flow rate of the gas-liquid mixture, the supply duration of the gas-liquid mixture, and the gas-liquid ratio. Generally, the dirtier the wastewater, the higher the pressure of the gas-liquid mixture, the higher the flow rate of the gas-liquid mixture, the longer the supply duration of the gas-liquid mixture, and the higher the gas-liquid ratio, thus improving cleaning efficiency and effect. The adjustment method can be referred to the adjustment method described in 032 above, and will not be elaborated further here. Furthermore, the description in 033 of "supplying gas to the second chamber 245 to discharge wastewater from the second chamber 245, and finally supplying liquid to the second chamber 245 for cleaning" refers to the previous explanation and will not be repeated here.

[0174] In this embodiment, based on the detection results obtained by the dirt detection sensor 28, if the degree of dirtiness of the wastewater is determined to be at a stage where the filter element 247 needs to be rinsed first, then aerated liquid is provided to the filter element 247 to rinse it. This avoids the problem of simply using liquid to clean the second chamber 245, where the pores of the filter element 247 are blocked by dirt, preventing liquid from entering the second chamber 245 and causing it to be discharged from the drain port 242, resulting in waste, while the second chamber 245 is not cleaned. Furthermore, during the process of providing aerated liquid to the second chamber 245 to rinse the filter element 247, at least one of the following parameters—pressure of the gas-liquid mixture, flow rate of the gas-liquid mixture, supply duration of the gas-liquid mixture, and gas-liquid ratio—is determined according to the degree of dirtiness of the wastewater. Compared to using fixed parameter values ​​for rinsing, the rinsing of the filter element 247 in this embodiment is more in line with actual needs, avoiding the problem of high energy consumption and resource waste caused by excessively large parameters, and also avoiding the problem of incomplete cleaning due to excessively small parameters. In other words, the parameters of this implementation method are determined based on the degree of dirtiness of the wastewater, which can save energy and resources while ensuring the cleaning effect.

[0175] Please refer to Figures 2a, 2b, 2c, 2d, or 2e. In some embodiments, when the cleaning device 100 is in the state of cleaning the cleaning component 22 and the liquid level supplied to the water tank 23 by the external liquid source exceeds the overflow port 235, the first power unit 32 drives the liquid in the water tank 23 to flow from the liquid outlet 233 into the first passage 31 and out from the first outlet 313 to supply the cleaning component 22.

[0176] As mentioned above, when the cleaning equipment 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water tank 23 supplies liquid to the clean water tank 23 until the liquid level exceeds the overflow port 235, the equipment control board 50 can control the first power device 32 to start. At this time, the cleaning equipment 100 can not only provide liquid for cleaning the cleaning component 22 through the second passage 33 via the liquid overflowing from the clean water tank 23, but also drive the liquid in the clean water tank 23 through the first passage 31 via the first power device 32 to provide liquid for cleaning the cleaning component 22, thereby further increasing the liquid supply when cleaning the cleaning component 22, which can effectively improve the cleaning efficiency and cleaning effect of the cleaning component 22.

[0177] Please refer to Figures 2a and 2b. In some embodiments, the second passage 33 is a pipe through which liquid overflowing from the overflow port 235 flows and exits directly to supply the cleaning component 22. That is, the second passage 33 is composed only of a pipe, which is simple in structure and low in cost. For example, one end of the pipe is connected to the overflow port 235, and the other end is connected to the spray bar 26. The opening of the pipe connected to the overflow port 235 is the second inlet 331, and the opening of the pipe connected to the spray bar 26 is the second outlet 333. In this embodiment, the cleaning component 22 of the cleaning device 100 does not have a self-cleaning function. The so-called "self-cleaning function" means that during the process of mopping the surface to be cleaned, the cleaning device 100 will simultaneously clean the dirt attached to the cleaning component 22. Specifically, when the cleaning component 22 is wiping the surface to be cleaned, dirt accumulates, and the originally clean liquid becomes dirty and turns into sewage. The cleaning device 100, which does not have a self-cleaning function for the cleaning component, cannot recycle the sewage on the cleaning component 22 when performing the cleaning task. Only when the cleaning device 100 is in a preset position, such as when it returns to the base station 200, does the cleaning device 100 use the liquid overflowing from the clean water box 23 to provide cleaning liquid to the cleaning component 22 through the second passage 33. Alternatively, the first power device 32 can drive the liquid in the clean water box 23 to provide cleaning liquid to the cleaning component 22 through the first passage 31, thereby achieving the purpose of cleaning the cleaning component 22 of the cleaning device 100.

[0178] Referring to Figures 2c, 2d, or 2e, in some embodiments, the second passage 33 is provided with a first chamber 244 and a second chamber 245, as well as a second power unit 34. The first chamber 244 has an inlet 241 and an outlet 242. The inlet 241 allows liquid from an external liquid source to enter the first chamber 244, and the outlet 242 allows liquid entering the first chamber 244 to be discharged to the cleaning component 22. The second chamber 245 is used to contain wastewater. The second chamber 245 has a connecting port 243 for allowing wastewater from the cleaning component 22 to enter the second chamber 245. The second chamber 245 is separated from the first chamber 244 but is fluidly connected through a through-hole O. The maximum permissible liquid level in the second chamber 245 is lower than the location of the through-hole O.

[0179] As shown in Figure 2d, the first chamber 244 and the second chamber 245 can be formed by two independently arranged containers, or, as shown in Figure 2e, they can be two separate chambers formed within the same container. The first chamber 244 and the second chamber 245 can be arranged vertically (as shown in Figure 2d) or horizontally (as shown in Figure 2e), and this embodiment does not impose any particular limitation. The second chamber 245, as the space for storing sewage, can have a larger capacity, while the first chamber 244 can serve only as a water passage space, and its capacity can be smaller, or it can even be formed as a single pipe to save installation space for the entire cleaning equipment 100.

[0180] The second power unit 34 is connected to the drain port 242 and is used to provide driving power to drive the wastewater on the cleaning component 22 into the second chamber 245, and to drive the liquid in the clean water box 23 out of the second passage 33. That is, the second power unit 34 takes into account both the wastewater generated by the cleaning component 22 during cleaning and the large flow of liquid required for cleaning the cleaning component 22.

[0181] For example, the second power unit 34 can be a water-air dual-purpose pump. The second power unit 34 can be in the start-up state in the following two operating states:

[0182] As shown in Figure 3a, when the cleaning device 100 is cleaning the surface to be cleaned, the second power unit 34 is in the activated state. Since the second power unit 34 is connected to the drain port 242, that is, the second power unit 34 is connected to the first chamber 244, and the first chamber 244 and the second chamber 245 are fluidly connected through the through hole O, when the second power unit 34 draws air, the air in the second chamber 245 flows through the through hole O through the first chamber 244 and is discharged from the drain port 242 together with the air in the first chamber 244. This allows the second power unit 34 to draw air from the first chamber 244 and the second chamber 245, creating a negative pressure in the second chamber 245, thereby driving the wastewater on the cleaning component 22 into the second chamber 245. In this way, the second power unit 34 enables the cleaning device 100 to collect the wastewater generated by the cleaning component 22 during cleaning of the surface to be cleaned.

[0183] As shown in Figure 3b, when the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied by the external liquid source to the water tank 23 exceeds the overflow port 235, the second power device 34 drives the liquid in the water tank 23 to overflow from the overflow port 235 to the second passage 33, and flows out from the second passage 33 in sequence through the inlet 241, the first chamber 244, the outlet 242, and the second outlet 333 to supply the cleaning component 22. Since the cleaning device 100 is in the state of cleaning the cleaning component 22, for the first chamber 244, the external liquid (the liquid overflowing from the clean water box 23) enters the first chamber 244 through the inlet 241. Since the second power device 34 is connected to the drain 242 of the first chamber 244, the second power device 34 preferentially drives the liquid in the first chamber 244 to the cleaning component 22 through the drain 242. Specifically, it drives the liquid to the spray bar 26 next to the cleaning component 22 and supplies it to the cleaning component 22. During this process, since the maximum allowable liquid level in the second chamber 245 is lower than the location of the through hole O, the sewage in the second chamber 245 will not enter the first chamber 244. Furthermore, during the startup of the second power unit 34, the continuous flow of liquid in the first chamber 244 will block the through hole and prevent the second power unit 34 from driving the liquid in the second chamber 245 to the first chamber 244. Thus, the cleaning equipment 100 can meet the demand for high-flow liquid supply while cleaning the cleaning component 22, without causing the sewage in the second chamber 245 to flow back into the cleaning component 22.

[0184] The liquid circuit system 30 provided in this embodiment, for the cleaning device 100 with self-cleaning function, in addition to the need for the first power device 32 connected to the clean water box 23 of the cleaning device 100 to realize the small flow of liquid supply to the cleaning component 22 for normal mopping of the cleaning device 100, also needs to be equipped with a power device on the cleaning device 100 to realize the function of pumping the sewage on the cleaning component 22 to the cleaning device when cleaning the surface to be cleaned. The cleaning equipment 100 of this embodiment needs to meet the requirement of high-flow-rate cleaning of the cleaning components 22. Therefore, this embodiment utilizes the second power device 34 to perform both the functions of suction during normal cleaning and high-flow-rate liquid supply during cleaning of the cleaning equipment 100 and cleaning of the cleaning components 22. This effectively eliminates the need to set up another power device as the power source for high-flow-rate liquid supply to the cleaning components 22, or eliminates the need to set up a power device with adjustable flow rate (which is more expensive than a power device with non-adjustable flow rate) to meet the switching between low-flow-rate and high-flow-rate liquid supply to the cleaning components 22, thereby effectively reducing the overall cost of the cleaning equipment 100.

[0185] More specifically, please refer to Figures 2c, 2e, and 20. For example, the liquid system 30 includes a wastewater box 24, with a first chamber 244 and a second chamber 245 both formed within it. The wastewater box 24 is provided with an inlet 241, a drain 242, and a connecting port 243. The inlet 241 communicates with a second inlet 331, the drain 242 communicates with a second outlet 333, and the connecting port 243 allows wastewater from the cleaning component 22 to enter the wastewater box 24. The wastewater box 24 communicates with a clean water box 23 via the inlet 241 and with a second outlet 333 of the second passage 33 via the drain 242, making the wastewater box 24 part of the second passage 33. When the liquid level in the clean water box 23 exceeds the overflow port 235, the liquid in the clean water box 23 can overflow into the wastewater box 24.

[0186] When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then flows out of the second passage 33 through the inlet 241 of the sewage box 24, the cavity of the sewage box 24, the outlet 242, and the second outlet 333 to be discharged to the cleaning component 22. The sewage box 24 is a container on the liquid circuit system 30 and / or cleaning module 20 used for passing, loading, and / or storing liquids. It should be noted that the naming of the sewage box 24 does not constitute a limitation on the type of liquid inside it. That is, the liquid in the sewage box 24 is not limited to storing only sewage, but can store clean water, sewage, etc. Here, the explanation of "clean water" is the same as before, while "sewage" is a relative concept. It only needs to be water that is dirtier than the user's perception of clean water (or a mixture of water and dirt) within the protection scope. The wastewater box 24 can be of any shape; for example, the cross-sectional shape of the wastewater box 24 can be regular or irregular. In this paper, the cross-sectional shape of the wastewater box 24 is irregular. The irregular cross-sectional design can adapt to the structural layout of the cleaning equipment 100, facilitating the compact arrangement of other components.

[0187] Please refer to Figures 2c and 8 to 10. The wastewater container 24 is provided with an inlet 241, a drain 242, and a connecting port 243. The shape and size of the inlet 241, drain 242, and connecting port 243 can be arbitrarily set, and this disclosure does not limit them. In some embodiments, the drain 242 is set at a higher height on the wastewater container 24 than the connecting port 243 is set at a higher height on the wastewater container 24. Specifically, the wastewater container 24 has a height dividing line (see the previous explanation), with the inlet 241 and drain 242 located above the height dividing line, and the connecting port 243 located below the height dividing line. In one example, the connecting port 243 is near the bottom of the wastewater container 24, and the inlet 241 and drain 242 are near the top of the wastewater container 24. To accommodate the structural layout of the cleaning equipment 100 disclosed herein, the inlet 241 is located on the left side of the wastewater box 24 in the width direction X of the machine body, the outlet 242 is located on the right side of the wastewater box 24 in the width direction X of the machine body, and the connecting port 243 is located on the side of the clean water box 23 facing the rear of the cleaning equipment 100. Here, "left side" and "right side" refer to the perspective when the cleaning equipment 100 is moving forward. The inlet 241 is an opening for connecting the inside and outside of the wastewater box 24, specifically connecting to the second inlet 331 of the second passage 33. That is, liquid in the clean water box 23 can enter the second passage 33 through the second inlet 331, and then enter the inside of the wastewater box 24 through the inlet 241. The outlet 242 is an opening for connecting the inside and outside of the wastewater box 24, that is, liquid in the wastewater box 24 can flow out to the outside pipe through the outlet 242, and then flow to the target object—the spray bar 26—through the outside pipe. In this embodiment, both the first chamber 244 and the second chamber 245 are formed within the wastewater box 24, thereby making the structure of the liquid circuit system 30 more compact. The distance between the connecting pipes of the first chamber 244 and the second chamber 245 can be shorter, effectively saving overall space and reducing pipeline costs. For example, as shown in FIG20, along the height direction Z of the wastewater box 24, the first chamber 244 can be located above the second chamber 245. Since the volume of the first chamber 244 only needs to meet the flow requirements when supplying a large flow of liquid to the cleaning component 22, the volume of the first chamber 244 can be smaller than that of the second chamber 245. Therefore, the relatively narrow space above the second chamber 245 can be used as the first chamber 244. Furthermore, the first chamber 244 is located above the second chamber 245, so that the through hole O connecting the two can be set at the top of the second chamber 245 corresponding to the bottom of the first chamber 244, which is more conducive to ensuring that the setting height of the through hole O is not higher than the maximum allowable liquid level of the second chamber 245.

[0188] Referring to Figures 11 to 13, in some embodiments, the liquid system 30 and / or cleaning module 20 may further include a recovery component 251, which is used to collect, load, and / or store wastewater generated by the cleaning component 22 during cleaning of the surface to be cleaned. A connecting port 243 is an opening for connecting the interior of the wastewater box 24 (specifically the second chamber 245) to the recovery component 251. Wastewater in the recovery component 251 can enter the wastewater box 24 (specifically the second chamber 245) through the connecting port 243 for storage. Liquid (which may be clean water or wastewater) in the wastewater box 24 can also enter the recovery component 251 through the connecting port 243 and then be discharged from the recovery component 251 to the outside of the cleaning device 100. Specifically, the recovery component 251 may include a scraping part 2512 and a dirt-receiving cavity 25115. The scraping part 2512 is used to abut against the cleaning component 22 to scrape dirt from the cleaning component 22 into the dirt-receiving cavity 25115. The sewage box 24 has a connecting port 243 connected to the sewage chamber 25115. The connecting port 243 is used to allow sewage on the cleaning component 22 to enter the sewage box 24 through the sewage chamber 25115, and to allow sewage in the sewage box 24 to enter the sewage chamber 25115 for discharge to the outside of the cleaning equipment 100.

[0189] More specifically, in some embodiments, referring to FIG13, the sludge-containing cavity 25115 extends along the rotation axis direction X of the cleaning member 22. One end of the sludge-containing cavity 25115 in the length direction X is provided with a first sewage outlet 25116, and the other end of the sludge-containing cavity 25115 in the length direction X is provided with a second sewage outlet 25117. The first sewage outlet 25116 communicates with the communication port 243 of the second chamber 245. The cleaning device 100 also includes a control structure 25183, which can be set at any position in the sludge-containing cavity 25115, for example, at the first sewage outlet 25116, or at the second sewage outlet 25117, or at any position between the first sewage outlet 25116 and the second sewage outlet 25117 in the sludge-containing cavity 25115. In one example, the control structure 25183 can be a valve. Opening the valve allows communication between the inside and outside of the sludge chamber 25115, while closing it shuts off the connection. In another example, the control structure 25183 is a pipe that is deformable or movable, allowing its opening to face either a first or a second direction. When facing the first direction, the pipe opening is higher than when facing the second direction. For example, when the pipe opening faces the first direction (e.g., upwards), the control structure 25183 is closed, preventing wastewater from flowing out of the sludge chamber 25115. When the pipe opening faces the second direction (e.g., horizontally or lower), the control structure 25183 allows communication between the inside and outside of the sludge chamber 25115, enabling wastewater to flow out. The control structure 25183 is used to maintain communication between the inside and outside of the sludge chamber 25115 when the cleaning equipment 100 is in a discharge state. It should be noted that in the cleaning equipment 100 that does not have a self-cleaning function for cleaning components, the recycling component 251 mentioned above and related components that perform the function of recycling sewage can be omitted.

[0190] Referring to Figures 10 and 11, the second power unit 34 is a device that provides the driving power to discharge liquid from the clean water box 23 into the second passage 33. In some embodiments, the second power unit 34 includes a water-air pump, that is, the second power unit 34 is both a water pump, which can be used to pump water or drain water, and an air pump, which can be used to create negative pressure or create positive pressure. In one example, the inlet of the second power unit 34 is connected to the drain port 242 through a third section of pipe, and the outlet of the second power unit 34 is connected to the spray bar 26 through a fourth section of pipe. The opening of the fourth section of pipe connected to the spray bar 26 is the second outlet 333. In this case, the second passage 33 includes the pipe between the clean water box 23 and the wastewater box 24, the wastewater box 24, the third section of pipe, the second power unit 34, and the fourth section of pipe. When the cleaning equipment 100 also includes an equipment control board 50, the equipment control board 50 is electrically connected to the second power unit 34 and is also used to control the opening and closing of the second power unit 34. Of course, it is understandable that the aforementioned “pipeline” could also be formed by channels formed on the shell.

[0191] Please refer to Figures 2b, 2c, and 8 to 10. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the device control board 50 controls the second power unit 34 to open. The second power unit 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then flows out of the second passage 33 through the inlet 241 of the sewage box 24, the cavity of the sewage box 24, the outlet 242, and the second outlet 333 to the spray bar 26, and then through the spray bar 26 to the cleaning component 22. In this embodiment, the liquid circuit system 30 collects the sewage formed on the cleaning component 22 by setting the sewage box 24. The cleaning component 22 can wipe the surface to be cleaned while collecting the sewage formed by wiping the surface to be cleaned through the connecting port 243 into the sewage box 24 for storage, thus realizing the self-cleaning function of the cleaning component 22 in the cleaning device 100. After the cleaning equipment 100 reaches the preset position (e.g., base station 200), the sewage in the sewage box 24 is discharged to the recycling component 251 through the connection port 243, and finally discharged into the base station 200 for cleaning through the recycling component 251. During the cleaning process of the cleaning component 22 at the base station 200, the equipment control board 50 can control both the first power unit 32 and the second power unit 34 to be turned on. The first power unit 32 drives the liquid in the water tank 23 to enter the first passage 31 from the outlet 233 and flow out from the first outlet 313 of the first passage 31 to the spray bar 26. The second power unit 34 drives the liquid in the water tank 23 to overflow from the overflow outlet 235 into the second passage 33 and flow out from the second outlet 333 of the second passage 33 to the spray bar 26. The liquid entering the spray bar 26 from the two passages is finally supplied to the cleaning component 22 through the spray nozzle 261 to clean the cleaning component 22. The addition of the second power unit 34 enables the cleaning component 22 to be actively replenished with the liquid flowing through the second passage 33 while it is being cleaned. The amount of liquid replenished is greatly increased compared to when the second power unit 34 is not set, which improves the cleaning efficiency and cleaning effect of the cleaning component 22.

[0192] In some embodiments, the flow rate of the second power unit 34 is greater than the flow rate of the first power unit 32. Therefore, the liquid flow rate supplied to the cleaning element 22 by the first passage 31 is less than the liquid flow rate supplied to the cleaning element 22 by the second passage 33. Since the cleaning element 22 requires less liquid when the cleaning equipment 100 is cleaning the surface to be cleaned, the equipment control board 50 can control only the first power unit 32 to be turned on, so that liquid is supplied to the spray bar 26 only through the first passage 31. When the cleaning equipment 100 is in the state of cleaning the cleaning component 22, the cleaning component 22 has a large demand for liquid. The equipment control board 50 can control both the first power device 32 and the second power device 34 to be turned on. At this time, both the first passage 31 and the second passage 33 supply liquid to the spray bar 26. Moreover, the flow rate of the second power device 34 is greater than that of the first power device 32. Compared with not setting the second power device 34 (the second passage 33 is only composed of pipes) or setting the second power device 34 with the same or smaller flow rate as the first power device 32, the total liquid supply from the clean water box 23 to the spray bar 26 is increased by more in this embodiment, thereby greatly improving the cleaning efficiency and cleaning effect of the cleaning component 22.

[0193] As mentioned above, the wastewater box 24 is a container for passing through, loading and / or storing liquids. The recycling unit 251 is used to collect, load and / or store wastewater generated by the cleaning unit 22 when cleaning the surface to be cleaned. Therefore, the first chamber 244 is located above the second chamber 245. When the second power unit 34 is turned on and draws negative pressure into the wastewater box 24, the wastewater in the recycling unit 251 will enter the wastewater box 24 through the connecting port 243 and be mainly stored in the lower second chamber 245. The first chamber 244 does not store wastewater.

[0194] In some embodiments, when the second power unit 34 is off and liquid in the clean water tank 23 overflows from the overflow port 235 into the first chamber 244, at least a portion of the liquid in the first chamber 244 is discharged into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245. Based on the above embodiments, when the second power unit 34 is off and liquid oil overflows from the clean water tank 23 into the first chamber 244, the liquid in the first chamber 244 will enter the second chamber 245 through the through hole O. This allows at least a portion of the second chamber 245 to be flushed, reducing the probability of dirt adhesion in the sewage holding space, which is beneficial for subsequent cleaning of the sewage holding space and improves the user experience. When the cleaning device 100 returns to the preset position and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the cleaning device 100 also includes a state of preliminary cleaning of the wastewater box 24 and a state of sewage discharge. When the cleaning device 100 is in the state of cleaning the cleaning component 22, the device control board 50 controls at least the second power device 34 to be turned on. The liquid in the clean water box 23 flows through the second passage 33 to the spray bar 26 to discharge to the cleaning component 22, thereby cleaning the cleaning component 22. At the same time, the device control board 50 can control the first power device 32 to be turned off or on. When the first power device 32 is turned on, the liquid in the clean water box 23 can also flow through the first passage 31 to the spray bar 26 to supply the cleaning component 22, thereby cleaning the cleaning component 22. When the cleaning equipment 100 is in the initial cleaning state of the wastewater box 24, the equipment control board 50 controls the second power unit 34 to shut down (the first power unit 32 can be shut down). The liquid in the clean water box 23 overflows from the overflow port 235 into the first chamber 244, and is discharged into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245 to clean the second chamber 245.

[0195] As mentioned above, the second power unit 34 can be a water-air dual-purpose pump. Before performing the initial cleaning of the wastewater box 24, the cleaning equipment 100 usually performs sewage discharge. In some embodiments, the base station 200 can be equipped with an air supply system. After the cleaning equipment 100 is connected to the base station 200, the air supply system of the base station 200 can ventilate the wastewater box of the cleaning equipment 100 to provide positive pressure. Under the action of positive pressure, the wastewater in the wastewater box 24 flows into the recovery unit 251 through the connecting port 243, and finally is discharged from the recovery unit 251 to the base station 200. After the sewage discharge is completed, the cleaning equipment 100 can perform the aforementioned initial cleaning of the wastewater box 24. The wastewater generated after cleaning the second chamber 245 flows into the recovery unit 251 through the connecting port 243, and finally is also discharged from the recovery unit 251 to the base station 200.

[0196] In other embodiments, the second power unit 34 may first vent air into the wastewater box 24 to provide positive pressure. Under the action of positive pressure, the wastewater in the wastewater box 24 flows into the recovery unit 251 through the connection port 243, and finally exits from the recovery unit 251 into the cleaning equipment 100. After the wastewater discharge is completed, the cleaning equipment 100 performs the aforementioned preliminary cleaning of the wastewater box 24. The wastewater generated after cleaning the second chamber 245 flows into the recovery unit 251 through the connection port 243, and finally exits from the recovery unit 251 into the base station 200.

[0197] It should be noted that before the cleaning equipment 100 performs the cleaning of the cleaning component 22, the cleaning system 1000 does not know the specific amount of sewage in the sewage box 24 inside the cleaning equipment 100 after the cleaning equipment 100 returns to the base station 200. Therefore, the cleaning system 1000 provided in this embodiment can first perform a sewage box draining operation on the sewage box 24 after the cleaning equipment 100 returns to the base station 200, so that the initially dirty sewage in the sewage box 24 is emptied, thereby facilitating the subsequent cleaning of the cleaning component 22.

[0198] In the above embodiment where the second power device 34 is used to ventilate the sewage box 24 to discharge sewage, the base station 200 does not need to be equipped with an air source system to discharge sewage to the cleaning equipment 100, which makes the design of the base station 200 simpler and smaller.

[0199] The following description, using specific application scenarios, further demonstrates the advantages of the above solution:

[0200] Please refer to Figure 27. The user's home is small with limited space and lacks a dedicated base station 200 for maintaining the cleaning equipment 100. However, a connector is provided in the toilet or bathroom to interface with the cleaning equipment 100. This connector connects to the user's water tap. When the cleaning equipment 100 needs to replenish the water tank 23, it returns to a predetermined position, connecting the water tank 23 to the connector. The water path from the connector to the tap serves as the external liquid source for the water tank 23. Water from the tap flows through the pipe to the connector and into the water tank 23. When the cleaning equipment 100 detects that the water tank 23 is about to reach its preset full level, it disconnects from the connector. The cleaning equipment 100 can then proceed with cleaning the surface to be cleaned. During cleaning, the water in the water tank 23 flows out through the first passage 31 to the cleaning component 22, keeping it moist and ensuring effective cleaning.

[0201] When the cleaning device 100 has been cleaning the surface to be cleaned for a period of time, the cleaning component 22 may be quite dirty and requires a large flow of liquid to deeply clean it. The cleaning device 100 can first move to the vicinity of the floor drain and start the second power device 34. The second power device 34 uses positive pressure to discharge the sewage box 24, so that the sewage in the sewage box 24 passes through the recovery component 251 and is discharged from the second sewage outlet 25117 of the recovery component 251 to the floor drain. Then the cleaning device 100 returns to the docking position and replenishes the clean water box 23 with water through the faucet, so that the water in the clean water box 23 flows out from the second passage 33 to the cleaning component 22. During this process, the cleaning component 22 rotates to fully self-clean itself. Since most of the sewage in the sewage box 24 has been discharged to the floor drain, the sewage after self-cleaning is not very dirty. Thus, the slightly cleaner sewage generated from cleaning the cleaning component 22 can flow to the floor drain.

[0202] Of course, in practical applications, the floor drain and the connector can be set close together, so that the operation of the cleaning equipment 100 in discharging the sewage from the sewage box 24 to the floor drain and cleaning the cleaning parts 22 can both occur in the same location, thus improving the maintenance efficiency of the cleaning equipment 100.

[0203] As can be seen from the above, because the cleaning device 100 has self-cleaning and self-draining functions, the design of the base station 200 can be simplified, its size reduced, and it may even be unnecessary to install a base station 200. Only a water source for supplying water to the cleaning device 100 and a floor drain need to be provided in the user's home. Referring to Figures 9 and 20, more specifically, in some embodiments, a filter element 247 is provided at the through-hole between the first chamber 244 and the second chamber 245. The first chamber 244 and the second chamber 245 are fluidly connected through the pores on the filter element 247. The filter element 247 is used to prevent at least some solid waste in the second chamber 245 from entering the first chamber 244. Specifically, when the second power device 34 is off, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the liquid in the clean water box 23 overflows from the overflow port 235 into the first chamber 244, passes through the filter element 247, and then enters the second chamber 245.

[0204] Filter element 247 is a component used to filter large-sized substances from a liquid. In one example, filter element 247 is a filter screen located at the through-hole between the first chamber 244 and the second chamber 245, and has multiple holes. The size of the holes can be set as needed, only requiring that liquid can pass through but larger-sized substances (solid waste) cannot. As mentioned earlier, wastewater is usually stored in the second chamber 245. There is no wastewater in the first chamber 244, and the first chamber 244 is for the passage of clean water from the clean water box 23, which flows out from the drain port 242 to the spray bar 26, and finally discharges from the spray bar 26 to the cleaning element 22 to clean the cleaning element 22. Therefore, when the cleaning device 100 is in the state of cleaning the cleaning element 22, the liquid passing through the first chamber 244 needs to be clean water and cannot be mixed with solid waste. Based on this, a filter element 247 is provided between the second chamber 245 and the first chamber 244. On the one hand, it can prevent the clean water flowing into the spray bar 26 through the first chamber 244 from being contaminated by solid waste in the second chamber 245, thereby ensuring the cleaning effect of the cleaning element 22.

[0205] On the other hand, liquids usually flow from high to low. Therefore, when the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid entering the first chamber 244 from the inlet 241 tends to flow into the second chamber 245. Although the second power device 34 can have the driving force to drive the fluid to the outlet 242, a certain amount of liquid will still enter the second chamber 245, thereby reducing the amount of liquid flowing to the spray bar 26 through the second passage 33 and reducing the effect of cleaning the cleaning component 22. In this embodiment, compared to the through hole between the first chamber 244 and the second chamber 245, a filter element 247 is provided between the first chamber 244 and the second chamber 245. This makes it less likely for clean water entering the first chamber 244 from the liquid inlet 241 to flow into the second chamber 245. Instead, the water flows laterally through the first chamber 244 and flows out from the liquid outlet 242 to the spray bar 26. This ensures that a larger amount of liquid is supplied to the cleaning component 22 when cleaning the cleaning component 22, thereby improving the cleaning effect of the cleaning component 22. When the cleaning equipment 100 is in the initial cleaning state of the wastewater box 24, the equipment control panel 50 controls the second power unit 34 to shut down, and the liquid level supplied by the external liquid source to the clean water box 23 exceeds the overflow port 235. The liquid in the clean water box 23 overflows from the overflow port 235 into the first chamber 244, and after passing through the filter element 247, it enters the second chamber 245 to clean the filter element 247, flushing the solid debris adhering to the filter element 247 into the second chamber 245, thereby cleaning at least a portion of the second chamber 245. Similarly, before performing the initial cleaning of the wastewater box 24, the cleaning equipment 100 usually performs a sludge discharge, as detailed above.

[0206] In some embodiments, before performing the cleaning component 22, a sewage discharge operation can be performed to purge the sewage box 24 with positive pressure. Then, a preliminary cleaning operation of the sewage box is performed: the second power unit 34 is shut off, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235. The liquid in the clean water box 23 overflows from the overflow port 235 into the first chamber 244, passes through the filter element 247, and enters the second chamber 245. During this process, the filter element 247 is cleaned to remove any solid debris adhering to it. This further prevents any small amount of debris adhering to the filter element 247 from being sucked into the second power unit 34 by the driving force provided by the second power unit 34 during the cleaning component 22 operation, thus avoiding damage to the second power unit 34. Furthermore, when preliminary cleaning of the wastewater box is required, air and water can be injected simultaneously into the clean water box 23, making the fluid overflowing from the clean water box 23 into the wastewater box 24 a liquid aerated with bubbles. This is equivalent to pressurizing the water, thereby further increasing the impact force on the filter element 247 and more effectively cleaning the solid dirt on the filter element 247. It is worth noting that the above-mentioned "drainage state" and "preliminary cleaning of the wastewater box" operations can also be performed simultaneously. For example, when there is still wastewater in the wastewater box 24, air and water can be injected simultaneously into the clean water box 23, making the fluid overflowing from the clean water box 23 into the wastewater box 24 a liquid aerated with bubbles, which can effectively improve the cleaning efficiency of the wastewater box 34.

[0207] Furthermore, when the second power unit 34 applies negative pressure to the sewage box 24 to extract sewage from the recovery unit 251, the filter element 247 can also prevent particulate waste from entering the second power unit 34 and affecting its service life. Simultaneously, when the cleaning equipment 100 is flipped and inverted, the sewage in the second chamber 245 flows towards the first chamber 244, and the filter element 247 can again prevent particulate waste from entering the second power unit 34 and affecting its service life.

[0208] Specifically, referring to Figures 20, 22, and 23, in some embodiments, the wastewater box 24 includes a box body 248 and a cover 249. The cover 249 covers the top wall of the box body 248, and a through hole is provided in the top wall of the box body 248. A second chamber 245 is formed in the box body 248, and a first chamber 244 is located in the space enclosed by the cover 249 and the box body 248. This is one way in which the first chamber 244 and the second chamber 245 are formed. Of course, the first chamber 244 and the second chamber 245 can also be formed in other ways. For example, the first chamber 244 is located in the cover 249, the through hole is provided in the bottom wall of the cover 249, and the second chamber 245 is located in the space enclosed by the cover 249 and the box body 248. Another example: the first chamber 244 is located in the cover 249, the second chamber 245 is located in the box body 248, and the through hole is located at the connection between the cover 249 and the box body 248.

[0209] Further, please refer to Figures 20, 23 and 25. In some embodiments, a sealing structure 2480 is provided between the cover 249 and the box 248. The sealing structure 2480 is at least used to form a first chamber 244 between the cover 249 and the box 248, and the through hole is located in the area enclosed by the sealing structure 2480.

[0210] The sealing structure 2480 is a structure used to prevent liquid from flowing out. In this disclosure, the first chamber 244 is surrounded by the sealing structure 2480, so that the liquid in the first chamber 244 is blocked by the sealing structure 2480 and will not leak. The sealing structure 2480 can be a sealing soft rubber or other structure that performs a sealing function. "A sealing structure 2480 is provided between the cover 249 and the box 248" can mean that only the cover 249 is provided with the sealing structure 2480, and when the cover 249 is combined with the box 248, the sealing structure 2480 and the top plate of the box 248 together form the first chamber 244. In this case, the sealing structure 2480 can be a sealing ring or a rib; or, only the box 248 is provided with the sealing structure 2480, and when the cover 249 is combined with the box 248, the sealing structure 2480 and the top plate of the box 248 together form the first chamber 244. 4. At this time, the sealing structure 2480 can also be a sealing ring or a rib; alternatively, the cover 249 is provided with a first sealing structure 2481 (as shown in Figure 25), and the box 248 is provided with a second sealing structure 2483. The first sealing structure 2481 and the second sealing structure 2483 cooperate to form a first chamber 244, as shown in Figures 23 and 25 of this disclosure. Specifically, the first sealing structure 2481 can be a rib, and the second sealing structure 2483 can be a groove. The rib is inserted into the groove, and the rib and the groove are bonded together with an adhesive. Of course, the first sealing structure 2481 can be a groove, and the second sealing structure 2483 can be a rib. The rib is inserted into the groove, and the rib and the groove are bonded together with an adhesive. The through hole is located within the area enclosed by the sealing structure 2480, that is, the through hole is located within the area of ​​the first chamber 244, or the through hole is located within the area enclosed by the rib and the groove. Therefore, when the sealing structure 2480 is completely sealed on all sides, the liquid in the first chamber 244 will only flow downwards and will not leak to the surroundings; when the sealing structure 2480 only has openings at specific locations (such as the fluid inlet 2485 or fluid outlet 2487 mentioned later), the liquid in the first chamber 244 has a tendency to flow downwards and also a tendency to flow out from the fluid inlet 2485 to the fluid outlet 2487, and there will be no liquid leakage in the area other than the openings.

[0211] Please refer to Figures 19 to 21. In some embodiments, the housing 248 is further provided with a third chamber 246. The third chamber 246 is independent of the second chamber 245 and is connected to the second power device 34. The top wall of the housing 248 is provided with a third chamber inlet 2461 that communicates with the third chamber 246. The third chamber inlet 2461 is located inside the first chamber 244. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 to the first chamber 244, and then flows to the cleaning component 22 through the third chamber inlet 2461, the third chamber 246, the drain port 242, and the second power device 34.

[0212] The phrase "the third chamber 246 and the second chamber 245 are independent" means that the third chamber 246 and the second chamber 245 are not directly connected. Since the first chamber 244 and the second chamber 245 are connected, the third chamber 246 can be indirectly connected to the second chamber 245 through the first chamber 244. The phrase "the third chamber 246 is connected to the second power device 34" specifically means that the outlet 2463 of the third chamber is connected to the inlet of the second power device 34. Therefore, the "drain outlet 242" is the outlet 2463 of the third chamber, and the aforementioned "third section of pipe" can be omitted. The outlet of the second power device 34 is connected to the spray bar 26 through a fourth section of pipe. In this embodiment, the "fourth section of pipe" is a channel within the sewage box 24, and its outlet is the second outlet 333 connected to the spray bar 26.

[0213] When the cleaning equipment 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water box 23 by the external liquid source exceeds the overflow port 235, the equipment control board 50 controls the second power unit 34 to start. The second power unit 34 drives the liquid in the clean water box 23 to overflow from the overflow port 235 into the first chamber 244. The liquid in the first chamber 244 enters the third chamber 246 through the third chamber inlet 2461, and then enters the second power unit 34 from the third chamber outlet 2463. It then passes through the fourth section of pipe and reaches the spray bar 26 from the second outlet 333. Finally, it is sprayed from the spray nozzle 261 of the spray bar 26 onto the cleaning component 22 to clean it.

[0214] Furthermore, referring to Figures 20, 21, and 25, in some embodiments, the first chamber 244 is divided by a sealing structure 2480 to form a first sub-chamber 2441 and a second sub-chamber 2443. A through hole O is located in the first sub-chamber 2441, and a third chamber inlet 2461 is located in the second sub-chamber 2443. The sealing structure 2480 is provided with a fluid outlet 2485 communicating with the first sub-chamber 2441 and a fluid inlet 2487 communicating with the second sub-chamber 2443. The fluid outlet 2485 and the fluid inlet 2487 are spaced apart and in fluid communication.

[0215] The sealing structure 2480 has a cross-sectional outer contour comprising two closed (end-to-end) annular rings. The first annular ring corresponds to the first sub-chamber 2441, and the second annular ring corresponds to the second sub-chamber 2443. The "fluid outlet 2485" is an opening allowing liquid to flow into the first chamber 244, and the "fluid inlet 2487" is an opening allowing liquid from the first chamber 244 to enter the second sub-chamber 2443. "Fluid communication" means that liquid can flow between the fluid outlet 2485 and the fluid inlet 2487, typically from the fluid outlet 2485 to the fluid inlet 2487.

[0216] By using a sealing structure 2480 to divide the first chamber 244 into two independent sub-chambers (first sub-chamber 2441 and second sub-chamber 2443), and by setting a "fluid inlet 2487" and a "fluid outlet 2485" that are far apart, the fluid in the two first chambers 244 can only flow in the direction from the "fluid outlet 2485" to the "fluid inlet 2487". When the wastewater box 24 needs to be initially cleaned, the second power unit 34 is turned off. Since the second power unit 34 is connected to the second sub-chamber 2443, when the second power unit 34 is turned off, the second power unit 34 will not generate suction force at the second sub-chamber 2443. The first sub-chamber 2441 and the second sub-chamber 2443 are mostly isolated from each other by the sealing structure 2480, and are only connected by the spaced "fluid inlet 2487" and "fluid outlet 2485". This makes it difficult for the liquid in the first sub-chamber 2441 to flow into the second sub-chamber 2443, thereby ensuring the amount of liquid flowing into the second chamber 245 when the wastewater box 24 is initially cleaned.

[0217] When the second power unit 34 is activated, since the first sub-chamber 2441 and the second sub-chamber 2443 are mostly isolated from each other by the sealing structure 2480 and are only connected by the spaced "fluid inlet 2487" and "fluid outlet 2485", the cross-sectional area of ​​the channel flowing from the first sub-chamber 2441 to the second sub-chamber 2443 is small. For fluid, the smaller the cross-sectional area of ​​its flow channel, the greater the suction force generated, making it easier to draw the fluid in the first sub-chamber 2441 to the second sub-chamber 2443. This allows for a rapid response and faster provision of a large flow of liquid to clean the cleaning component 22 when a large flow rate is required.

[0218] Please refer to Figures 7, 11, and 14. In some embodiments, the cleaning component 22 is a tracked cleaning component. In the traveling direction Y of the cleaning device 100, the spray nozzle 261 of the water spray bar 26 of the liquid system 30 is located on the front side of the cleaning component 22, and the recovery component 251 of the liquid system 30 is located on the rear side of the cleaning component 22. It should be noted that the above-mentioned "front side" and "rear side" are relative. In the embodiments of this disclosure, the tracked cleaning component typically includes a mounting bracket and a mop 223. The mounting bracket includes two spaced rollers, namely a front roller 221 and a rear roller 222, which are arranged relatively apart. The mop 223 is arranged around the outside of the mounting bracket. The rotation of the two rollers can drive the mop 223 to rotate around the rotation axis X. The spray nozzle 261 of the water spraying strip 26 is located on the front side of the cleaning component 22, meaning that the spray nozzle 261 of the water spraying strip 26 is close to the front roller 221 of the cleaning component 22. The recovery component 251 is located on the rear side of the cleaning component 22, meaning that the recovery component 251 is located on the rear roller 222 of the cleaning component 22. The clean water on the front side wets the cleaning component 22, and after contacting the dirt on the cleaning component 22, it becomes wastewater and rotates with the cleaning component 22 to the rear side, where it can be scraped off and recovered by the recovery component 251. It is then drawn into the wastewater box 24 by the second power device 34 under negative pressure for storage. On the one hand, when the cleaning equipment 100 is mopping the surface to be cleaned, the liquid on the cleaning component 22 can remain in a relatively clean state, avoiding the accumulation of dirt that leads to incomplete mopping and improving the cleaning effect on the surface to be cleaned. On the other hand, the wastewater formed on the cleaning component 22 can be efficiently recovered by the recovery component 251 into the wastewater box 24, preventing it from overflowing onto the surface to be cleaned.

[0219] Furthermore, if the spray bar 26 is positioned directly above or near the rear of the cleaning component 22, the distance between the spray nozzle 261 and the retrieval component 251 is too close. The water sprayed from the nozzle 261 is not fully wetted before being scraped off by the scraping part 2512 and entering the dirt-holding chamber 25115, resulting in insufficient wetting of the mop 223 and ultimately affecting the cleaning effect of the cleaning component 22 on the surface to be cleaned. In this embodiment, since the spray nozzle 261 of the spray bar 26 is located on the front of the cleaning component 22 and the retrieval component 251 is located on the rear of the cleaning component 22, the distance between the spray nozzle 261 and the retrieval component 251 is relatively large. The water sprayed from the nozzle 261 takes a longer time to reach the scraping part 2512, and by this time, the water has fully wetted the mop 223, ensuring a better cleaning effect of the cleaning component 22 on the surface to be cleaned.

[0220] Further, referring to Figures 15 to 18, the spray bar 26 has a flow channel with two inlet ends. One inlet end communicates with the first outlet 313 to allow fluid from the first channel 31 to enter the flow channel, and the other inlet end communicates with the second outlet 333 to allow fluid from the second channel 33 to enter the flow channel. The flow channel also has multiple outlet ends 260, which protrude relative to the housing 21 toward the cleaning member 22 to press against it. Spray nozzles 261 are disposed on the sidewalls of the outlet ends 260. The flow channel can be meandering between the inlet end and the outlet end 260, for example, including a main flow channel and multiple branch flow channels, each branch flow channel including at least two branches. For example, as shown in Figure 15 of this disclosure, the flow channel of the spray bar 26 includes a main flow channel and four levels of branch flow channels, each level of branch flow channel including branches flowing to both sides, and the outlet end 260 is the end of the fourth level branch flow channel.

[0221] The outlet end 260 protrudes towards the cleaning component 22 relative to the housing 21 and presses against the cleaning component 22. Compared to a spaced-apart arrangement between the outlet end 260 and the cleaning component 22, the outlet end 260, the cleaning component 22, and the inner wall of the housing 21 of this disclosure are more easily filled with liquid, and the liquid stays in this area for a longer time, thus more fully wetting the cleaning component 22. In addition, the spray nozzle 261 is provided on the side wall of the outlet end 260, so that the direction S of the liquid sprayed from the spray nozzle 261 forms an angle with the rotation axis X of the cleaning component 22. Compared to placing the spray nozzle directly above the cleaning component 22 (where the direction of the liquid is perpendicular to the cleaning component 22), the spray nozzle 261 of this disclosure has a wider spray direction and a larger wetting area, thereby improving the wetting efficiency of the cleaning component 22. Furthermore, since the dust and debris in the sewage tend to move along the circumferential contour of the cleaning component 22 when the cleaning component 22 rotates carrying dirt, the water nozzle 261 is set on the side wall of the outlet end 260, so that the dust and debris in the sewage will not be thrown onto the water nozzle 261, making the water nozzle 261 less prone to clogging and improving the overall reliability of the machine.

[0222] Please refer to Figures 2c-2e or Figures 2f-3b. This disclosure also provides another cleaning device 100, which includes a cleaning component 22 and a liquid system 30. The cleaning component 22 is used to mop the surface to be cleaned. The liquid system 30 includes a first chamber 244, a second chamber 245, and a second power unit 34. The first chamber 244 is provided with an inlet 241 and an outlet 242. The inlet 241 allows liquid from an external liquid source to enter the first chamber 244, and the outlet 242 allows the liquid entering the first chamber 244 to be discharged to the cleaning component 22. The second chamber 245 is used to contain sewage. The second chamber 245 is provided with a connecting port 243 for sewage on the cleaning component 22 to enter the second chamber 245. The second chamber 245 is separated from the first chamber 244 and is fluidly connected through a through hole O. The maximum allowable liquid level in the second chamber 245 is lower than the location of the through hole O. The second power unit 34 is connected to the first chamber 244 and is used to provide driving power to drive the sewage on the cleaning component 22 into the second chamber 245, and to provide driving power to discharge the liquid in the first chamber 244 into the cleaning component 22. When the cleaning device 100 is cleaning the surface to be cleaned, the second power unit 34 is in the start state, drawing air from the first chamber 244 and the second chamber 245 to create a negative pressure in the second chamber 245, thereby driving the wastewater on the cleaning component 22 into the second chamber 245; when the cleaning device 100 is cleaning the cleaning component, the first chamber 244 is connected to an external liquid source to supply liquid to the first chamber 244, and the second power unit 34 is in the start state to draw the liquid from the first chamber 244 into the cleaning component 22.

[0223] This embodiment is basically the same as the above embodiment, except that the liquid system 30 provided in this embodiment is not limited to the source of the liquid in the first chamber 244 being the clean water box 23. It can be that the first chamber 244 of the cleaning device 100 is directly connected to the base station 200, and the liquid supply system 70 of the base station 200 directly supplies water to the first chamber 244. As long as the cleaning component 22 needs to be cleaned, the liquid can be supplied to the first chamber 244 through the liquid source outside the first chamber 244. The specific implementation and effects of other structures in this embodiment are the same as those in the above embodiment, which uses a second power device 34 to simultaneously collect the wastewater generated by the cleaning device 100 in cleaning the surface to be cleaned by the cleaning component 22, and to meet the large flow rate liquid supply requirements in cleaning the cleaning component 22. These will not be described in detail in this embodiment.

[0224] Similar to the above embodiments, the liquid system 30 includes a wastewater box 24; a first chamber 244 and a second chamber 245 may both be formed on the wastewater box 24. When the second power device 34 is off and an external liquid source supplies liquid to the first chamber 244, at least a portion of the liquid in the first chamber 244 is discharged into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245.

[0225] The other structures and functions in the embodiments shown in Figures 2f to 3b are the same as those in the embodiments where the water overflows from the clear water box 23 to the first chamber 244 and / or the second chamber 245. For details, please refer to the description of the aforementioned embodiments. This embodiment will not repeat the description.

[0226] As shown in Figures 7 and 8, this embodiment of the present disclosure also provides a cleaning device 100, including: a body 10, a cleaning component 22, and a liquid circuit system 30 provided in any of the above embodiments, wherein the liquid circuit system 30 is disposed on the body 10.

[0227] For example, the cleaning component 22 is a tracked cleaning component. In the travel direction Y of the cleaning equipment 100, the spray nozzle 261 of the water spray bar 26 of the liquid system 30 is located on the front side of the cleaning component 22, and the recovery component 251 of the liquid system 30 is located on the rear side of the cleaning component 22.

[0228] It should be noted that the structure and function of the liquid circuit system 30 in the cleaning equipment 100 provided in this embodiment are the same as those in the above embodiments. For details, please refer to the specific description of the above embodiments. This embodiment will not repeat the description.

[0229] As shown in Figures 1 and 2b-2f, this embodiment of the present disclosure also provides a base station 200, which is used to maintain the cleaning equipment 100 provided in the above embodiments. The base station 200 is provided with a liquid supply system 70 for supplying liquid.

[0230] For example, the clean water box 20 is provided with a replenishment port 231, and the base station 200 is provided with a docking interface 63 that communicates with the liquid supply system 70. The docking interface 63 is used to connect with the replenishment port 231. When the cleaning equipment 100 is docked at the base station 200 and the docking interface 63 is connected with the replenishment port 231, the liquid supply system 70 of the base station 200 supplies liquid to the clean water box 20 of the cleaning equipment 100. When the liquid supply system 30 supplies liquid to the clean water box 20 until the liquid level exceeds the overflow port 235, the liquid in the clean water box 20 overflows into the second passage 33.

[0231] This disclosure also provides a cleaning system 1000, including: the cleaning device 100 provided in the above embodiments; and / or, a base station 200 provided in any of the above embodiments, the base station 200 being used to maintain the cleaning device 100.

[0232] It should be noted that the structure and function of the liquid circuit system 30 in the cleaning system 1000 provided in this embodiment are the same as those in the above embodiments. For details, please refer to the specific description of the above embodiments. This embodiment will not repeat the description.

[0233] Thirdly, currently, the liquid system of cleaning equipment typically includes a clean water tank. When the cleaning equipment is wiping the surface to be cleaned, the liquid in the clean water tank provides cleaning fluid (usually water) to the cleaning components, which then move to apply the cleaning fluid to the surface. As the cleaning equipment performs its wiping task, wastewater accumulates on the cleaning components. To prevent this wastewater from participating in subsequent wiping tasks and affecting the cleaning effect, some cleaning equipment includes a wastewater tank to collect the wastewater generated during wiping. However, because the collected wastewater is stored in the wastewater tank for a long time, debris or bacteria may adhere to the side walls or corners of the tank, requiring manual removal and cleaning, which is time-consuming and labor-intensive. To solve the above problems, this disclosure provides a cleaning device 100 (shown in Figures 4a and 4b) and a cleaning system 1000 (shown in Figures 1, 4c, 4d, and 4e).

[0234] Please refer to Figure 1. The cleaning system 1000 provided in this disclosure includes a cleaning device 100 according to any of the following embodiments and a base station 200 according to any of the following embodiments. The definitions and functional explanations of the cleaning device 100 and the base station 200 are the same as those in the first aspect, and will not be repeated here.

[0235] The cleaning equipment 100 will now be described in detail with reference to Figures 1, 3a to 3d, 4a to 4e, 7 to 13, 19 to 21, and 26. It should be noted that for explanations of the components in the third aspect cleaning system 1000, please refer to the explanations of the components in the second aspect cleaning system 1000. The following embodiments will only further explain the differences from the cleaning system 1000 in the first aspect and the effects of the corresponding embodiments.

[0236] Referring to Figures 4a to 4e, a cleaning device 100 according to one embodiment of this disclosure includes a cleaning component 22 and a liquid system 30. The cleaning component 22 is used to mop the surface to be cleaned. The liquid system 30 of the cleaning device 100 includes a clean water tank 23 and a wastewater tank 24. The clean water tank 23 has an overflow port 235. The wastewater tank 24 has an inlet 241 communicating with the overflow port 235. The inlet 241 is positioned above the maximum allowable liquid level of the wastewater tank 24. The wastewater tank 24 is used to recycle the wastewater generated by the cleaning component 22. When the clean water tank 23 is supplied with liquid from an external liquid source until the liquid level exceeds the overflow port 235, the liquid overflowing from the overflow port 235 in the clean water tank 23 enters the wastewater tank 24 through the inlet 241 to rinse the wastewater tank 24.

[0237] The "maximum allowable liquid level" of the wastewater box 24 refers to the factory-set full water level of the wastewater box 24. For example, when the amount of wastewater contained in the wastewater box 24 exceeds the set full water level, the user can be notified that the wastewater box 24 is full. Alternatively, it can refer to the highest liquid level that the internal space of the wastewater box 24 can hold, such as the top of the wastewater box 24.

[0238] Referring to Figures 11 to 13, in some embodiments, the liquid system 30 and / or the cleaning module 20 may further include a recovery component 251. The recovery component 251 may include a scraping part 2512 and a dirt-receiving cavity 25115. The scraping part 2512 is used to abut against the cleaning component 22 to scrape dirt on the cleaning component 22 into the dirt-receiving cavity 25115. Wastewater in the dirt-receiving cavity 25115 can enter the wastewater box 24 through the connecting pipe 255 for storage, thereby realizing the self-cleaning function of the cleaning component 22.

[0239] The external liquid source for the water tank 23 includes, but is not limited to, the liquid supply system 70 of the base station 200 (Figures 4c, 4d, and 4e), the indoor water supply system, and the outdoor water supply system, and may even be another water tank in the cleaning device 100. The liquid supply system 70 is the system in the base station 200 that provides liquid to the cleaning device 100. The liquid provided by the external liquid source includes, but is not limited to, clean water and cleaning fluid, with the cleaning fluid being a mixture of clean water and cleaning agent. When the external liquid source for the water tank 23 is the liquid supply system 70 of the base station 200, the cleaning device 100 is connected to the base station 200. In one embodiment, the base station 200 may have only one interface 63, which can be connected to and communicate with an opening on the water tank 23 (e.g., the "liquid replenishment port 231" mentioned below) to allow various fluids (liquids, gases, and gas-liquid mixtures mentioned below) to be transported to the water tank 23 through the same interface 63 and the same liquid replenishment port 231. In another embodiment, the base station 200 may be provided with at least two interfaces 63, which may be connected to at least two openings on the water box 23 to form multiple transmission paths, each of which may transmit fluids of different properties to the water box 23.

[0240] The cleaning equipment 100 and cleaning system 1000 of this embodiment recycle wastewater generated by the cleaning components 22 by setting up a wastewater box 24. The wastewater box 24 does not need to be disassembled for manual cleaning; instead, when an external liquid source supplies liquid to the clean water box 23, the liquid overflowing from the overflow port 235 of the clean water box 23 is used to flush the wastewater box 24, achieving automatic flushing. This is efficient, convenient, time-saving, and labor-saving, and prevents bacterial growth. Furthermore, during the process of replenishing clean water to the clean water box 23 from an external liquid source (base station 200 or other water supply system), the flushing process of the wastewater box 24 can continue by extending the time for replenishing clean water to the clean water box 23. The cleaning system 1000 does not need to design two separate control logics to control the opening and closing of the clean water replenishment link and the wastewater discharge link, simplifying the software control logic. Moreover, compared to directly supplying liquid to the sewage box 24 from an external liquid source for cleaning, the liquid used to rinse the sewage box 24 in this disclosure comes from the overflow port 235 of the clean water box 23. Therefore, there is no need to set up an interface on the external liquid source (such as the base station 200) to connect with the sewage box 24. Only one interface needs to be designed to connect with the clean water box 23, which reduces the number of interfaces between the cleaning device 100 and the external liquid source and improves the reliability of the connection.

[0241] Please refer to Figures 4a, 4b, 4c, 4d, and 4e. In some embodiments, the wastewater box 24 is provided with an inlet 241 and a connecting port 243. The inlet 241 is connected to the overflow port 235. The height of the inlet 241 is higher than the height of the connecting port 243. When the cleaning device 100 is in the state of wiping the surface to be cleaned, the wastewater on the cleaning component 22 enters the wastewater box 24 through the connecting port 243. When the cleaning device 100 is in the state of discharging wastewater, the wastewater in the wastewater box 24 flows out of the wastewater box 24 through the connecting port 243.

[0242] Referring to Figures 9 to 13, in some embodiments, the sludge-containing cavity 25115 extends along the rotation axis X of the cleaning component 22. One end of the sludge-containing cavity 25115 along its length X is provided with a first wastewater outlet 25116, and the other end is provided with a second wastewater outlet 25117. One end of the connecting pipe 255 is connected to the connecting port 243, and the other end is connected to the first wastewater outlet 25116. The second wastewater outlet 25117 may be provided with a control structure 25183, which is used to connect the interior of the sludge-containing cavity 25115 to the outside when the cleaning device 100 is in the wastewater discharge state. The cleaning device 100 has at least two states: a state of mopping the surface to be cleaned and a state of wastewater discharge. The liquid system 30 and / or the cleaning module 20 also includes a spray bar 26, which is used to supply liquid to the cleaning component 22. When the cleaning device 100 is mopping the surface to be cleaned, the spray bar 26 supplies clean water to the cleaning component 22 through the spray nozzle 261 to wet the cleaning component 22. The clean water turns into wastewater after contacting the dirt on the cleaning component 22 and rotates with the cleaning component 22 to the collection component 251. The scraping part 2512 of the collection component 251 scrapes off and collects the wastewater. When the wastewater box 24 is under negative pressure, the wastewater in the collection component 251 is sequentially drawn into the wastewater box 24 for storage through the first wastewater port 25116, the connecting pipe 255, and the connecting port 243. On the one hand, when the cleaning device 100 is mopping the surface to be cleaned, the scraping part 2512 scrapes off and collects the wastewater on the cleaning component 22, keeping the liquid on the cleaning component 22 in a relatively clean state, avoiding dirt accumulation that leads to incomplete mopping, and improving the cleaning effect on the surface to be cleaned. On the other hand, the wastewater formed on the cleaning component 22 can be efficiently collected by the collection component 251 into the wastewater box 24, preventing it from overflowing onto the surface to be cleaned. When the cleaning equipment 100 is in the sewage discharge state, positive pressure gas is introduced into the sewage box 24. The positive pressure gas forces the sewage in the sewage box 24 outward, causing it to be discharged into the sewage chamber 25115 through the connecting port 243, the connecting pipe 255, and the first sewage port 25116. Then, the control 25183 connects the second sewage port 25117 to the outside, and the sewage in the sewage chamber 25115 is discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100.

[0243] In some other embodiments, the wastewater box 23 of the cleaning device 100 may have a wastewater outlet (not shown) connected to the base station 200. This outlet can be connected to the base station 200's wastewater tank. After the cleaning device 100 returns to the base station 200, the base station 200 can first extract the wastewater formed in the wastewater box 24 after cleaning the surface to be cleaned into its wastewater tank. Then, the base station 200's liquid supply system 70 supplies liquid to the clean water box 23 of the cleaning device 100. The liquid in the clean water box 23 overflows into the wastewater box 24 to rinse it. Subsequently, the base station 200 extracts the relatively clean wastewater from the wastewater box 24 into its wastewater tank. In other words, this embodiment does not limit the method by which wastewater is discharged from the wastewater box 24 of the cleaning device 100; those skilled in the art can choose the appropriate method as needed.

[0244] Please refer to Figures 4a, 4b, 4c, 4d, 4e, 9, and 10. In some embodiments, the wastewater container 24 is connected to a second power unit 34. When the cleaning equipment 100 is cleaning the surface to be cleaned, the second power unit 34 is in the open state and draws negative pressure into the wastewater container 24 to provide power to draw wastewater from the cleaning component 22 into the wastewater container 24. When the cleaning equipment 100 is in the sewage discharge state, the second power unit 34 is in the closed state, and positive pressure gas is supplied to the wastewater container 24 through the base station 200 to provide power to discharge the wastewater in the wastewater container 24 to the outside of the wastewater container 24. Alternatively, the second power unit 34 is in the open state and draws positive pressure gas into the wastewater container 24 to provide power to discharge the wastewater in the wastewater container 24 to the outside of the wastewater container 24.

[0245] Corresponding to the arrangement of the second power unit 34, the sewage box 24 is also provided with a drain port 242. The shape and size of the drain port 242 can be arbitrarily set, and this disclosure does not limit it. The liquid, gas or gas-liquid mixture in the sewage box 24 can flow out to the external pipeline through the drain port 242.

[0246] The second power unit 34 is connected to the drain port 242 and is used to provide the driving power to drive the sewage on the cleaning component 22 into the sewage box 24. That is, the second power unit 34 has the function of an air pump, which can draw negative pressure into the sewage box 24 to provide the sewage scraped from the cleaning component 22 into the sewage box 24. Further, the cleaning equipment 100 may also include an equipment control board 50. Referring to Figure 3a, when the cleaning equipment 100 is cleaning the surface to be cleaned, the equipment control board 50 controls the second power unit 34 to turn on and draw negative pressure into the sewage box 24. The sewage scraped from the cleaning component 22 into the recovery component 251 is sequentially drawn into the sewage box 24 through the first sewage port 25116, the connecting pipe 255 and the connecting port 243 for storage, so as to realize the sewage suction operation. When the cleaning equipment 100 is in the sewage discharge state, one implementation method is as follows: The base station 200 also includes a gas source system 80 (Figures 4c, 4d, and 4e). The equipment control board 50 controls the second power unit 34 to shut down. The gas source system 80 of the base station 200 supplies positive pressure gas to the sewage box 24. The positive pressure gas forces the sewage in the sewage box 24 outward, causing it to be discharged into the sewage chamber 25115 through the connecting port 243, the connecting pipe 255, and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to connect the second sewage port 25117 to the outside. The sewage in the sewage chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. Another implementation is as follows: The equipment control board 50 controls the second power unit 34 to turn on and introduces positive pressure gas into the sewage box 24. The positive pressure gas forces the sewage in the sewage box 24 outward, causing it to be discharged into the sewage chamber 25115 through the connecting port 243, the connecting pipe 255, and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to connect the second sewage port 25117 to the outside, and the sewage in the sewage chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100.

[0247] Please refer to Figures 4e, 3a and 3c. In some embodiments, the wastewater box 24 is provided with a filter element 247, which is used to prevent solid waste in the wastewater box 24 from entering the second power unit 34. The liquid overflowing from the overflow port 235 of the clean water box 23 can at least rinse the filter element 247 to clean it.

[0248] Furthermore, referring to Figures 4e, 3a, and 3c, in some embodiments, the wastewater box 24 includes a first chamber 244 and a second chamber 245. The second chamber 245 is used to contain wastewater. The first chamber 244 and the second chamber 245 are separated from each other but fluidly connected through a through-hole O. The maximum permissible liquid level in the second chamber 245 is lower than the location of the through-hole O. A filter element 247 is provided at the through-hole O. The second power unit 34 is connected to the first chamber 244. The inlet 241 is located in the first chamber 244, and the connecting port 243 is located in the second chamber 245. The filter element 247 is used to prevent at least some solid waste in the second chamber 245 from entering the first chamber 244. In one example, in the height direction Z of the wastewater box 24, the first chamber 244 is located above the second chamber 245, and the through-hole O is located on the top wall of the second chamber 245.

[0249] Referring to Figure 3d, when the external liquid source for the cleaning equipment 100 to flush the wastewater box 24 is the liquid supply system 70 of the base station 200, the base station 200 may also be equipped with a gas source system 80. When the base station 200 is connected to the cleaning equipment 100 and the second power device 34 is in the off state, the base station 200 provides a gas-liquid mixture to the wastewater box 24 through the liquid supply system 70 and the gas source system 80, so as to at least flush the filter element 247. The gas source system 80 is used to output gas and to communicate with the clean water box 23 when the base station 200 is connected to the cleaning equipment 100. The gas output by the gas source system 80 of the base station 200 can be mixed with the liquid in the clean water box 23 to form a mixture that flows into the wastewater box 24. In some other embodiments, the gas supply system 80 of the base station 200 can be directly connected to the sewage box 24 when the base station 200 is connected to the cleaning equipment 100. The gas output by the gas supply system 80 of the base station 200 can be mixed with the liquid entering the sewage box 24 to form a gas-liquid mixture to flush the sewage box 24.

[0250] Specifically, when the liquid supply system 70 and the gas supply system 80 of the base station 200 simultaneously supply liquid and gas to the cleaning equipment 100, the gas and liquid mix to form a gas-liquid mixture, which can then supply the wastewater box 24 with a gas-liquid mixture (bubble liquid). The mixing process of gas and liquid to form a gas-liquid mixture occurs at the same location as before. During the process of rinsing the filter element 247 with the gas-liquid mixture, the gas-liquid mixture (bubble liquid) is equivalent to pressurizing the liquid. Compared with rinsing the filter element 247 with only liquid, the bubble liquid has a greater rinsing force on the filter element 247, resulting in better rinsing efficiency and effect.

[0251] Referring to Figures 4a, 4b, 4c, 4d, and 4e, in some embodiments, the cleaning device 100 further includes a dirt detection sensor 28 electrically connected to the device control board 50. The dirt detection sensor 28 is used to detect the degree of dirtiness of the wastewater on the wastewater recycling path. The device control board 50 is electrically connected to the dirt detection sensor 28. When the cleaning device 100 is docked with the base station 200, the device control board 50 is used to control the fluid parameters and supply strategy of the fluid supplied to the wastewater box 24 according to the degree of dirtiness detected by the dirt detection sensor 28.

[0252] In this embodiment, the degree of dirtiness of the sewage on the sewage recycling path is first detected by the dirt detection sensor 28, and then the type of fluid and supply strategy to be provided to the sewage box 24 are determined based on the degree of dirtiness of the sewage. This allows the fluid supply to the sewage box 24 to be dynamically adjusted based on the actual cleaning situation, avoiding extreme situations of too much or too little supply, and improving the intelligence of the cleaning equipment 100.

[0253] In some implementations, when the fluid is a liquid, the fluid parameters also include: liquid pressure, liquid flow rate, and liquid supply duration, etc. Correspondingly, the equipment control board 50 determines the fluid parameters and supply strategy for the fluid supplied to the wastewater box 24 based on the degree of dirt detected by the dirt detection sensor 28, which may specifically include:

[0254] When the degree of contamination of the sewage is greater than the first preset contamination threshold and less than or equal to the second preset contamination threshold, the equipment control board 50 determines to first provide positive pressure gas to the second chamber 245 to discharge sewage from the sewage box 24, and then provide liquid to the sewage box 24 to flush the sewage box 24, and determines at least one of the liquid pressure, liquid flow rate and liquid supply duration according to the degree of contamination of the sewage.

[0255] In this embodiment, based on the detection results obtained by the dirt detection sensor 28, if the degree of dirtiness of the sewage is determined to be at a stage where the sewage box 24 needs to be flushed, positive pressure gas is first supplied to the sewage box 24 to discharge the sewage, and then liquid is supplied to the sewage box 24 to flush it, instead of just discharging the sewage. This allows for immediate cleaning of the sewage box 24, avoiding the problem of dirt sticking to or accumulating on the walls of the sewage box 24 due to long-term uncleaning, which would require manual disassembly and cleaning by the user. Furthermore, during the process of supplying liquid to the sewage box 24 for flushing, at least one of the liquid pressure, liquid flow rate, and liquid supply duration is determined according to the degree of dirtiness of the sewage. Compared to using fixed liquid pressure, fixed liquid flow rate, and fixed liquid supply duration to flush the sewage box 24, the flushing in this embodiment is more in line with actual needs, avoiding the problem of excessive energy consumption and waste of resources due to excessively large parameters, and also avoiding the problem of incomplete cleaning due to excessively small parameters. In other words, the parameters of this implementation method are determined based on the degree of dirtiness of the wastewater, which can save energy and resources while ensuring the cleaning effect.

[0256] In some embodiments, when the fluid is a liquid, the fluid parameters also include: liquid pressure, liquid flow rate, and liquid supply duration, etc.; when the fluid is a gas-liquid mixture, the fluid parameters also include: gas-liquid mixture pressure, gas-liquid mixture flow rate, gas-liquid mixture supply duration, gas-liquid mixture ratio, etc. Correspondingly, the equipment control board 50 may further include the following for determining the fluid parameters and supply strategy for the fluid supplied to the wastewater box 24 based on the degree of dirt detected by the dirt detection sensor 28:

[0257] When the degree of contamination of the wastewater exceeds the second preset contamination threshold, the equipment control board 50 determines to first provide a gas-liquid mixture to the wastewater box 24 to flush the filter element 247, and determines at least one of the following based on the degree of contamination of the wastewater: pressure of the gas-liquid mixture, flow rate of the gas-liquid mixture, supply duration of the gas-liquid mixture, and the ratio of gas and liquid. Then, positive pressure gas is provided to the wastewater box 24 to discharge the wastewater. Finally, liquid is provided to flush the wastewater box 24, and at least one of the following based on the degree of contamination of the wastewater: pressure of the liquid, flow rate of the liquid, and supply duration of the liquid.

[0258] In this embodiment, based on the detection results obtained by the dirt detection sensor 28, if the degree of dirtiness of the wastewater is determined to be at a stage where the filter element 247 needs to be rinsed first, then aerated liquid is provided to the filter element 247 to rinse it. This avoids the problem of simply using liquid to clean the wastewater box 24, where the pores of the filter element 247 are blocked by dirt, preventing the liquid from entering the wastewater box 24 and causing it to drain out from the drain port 242, resulting in waste and the wastewater box 24 not being cleaned. Furthermore, during the process of providing aerated liquid to the wastewater box 24 to rinse the filter element 247, at least one of the following parameters—pressure of the gas-liquid mixture, flow rate of the gas-liquid mixture, supply duration of the gas-liquid mixture, and the gas-liquid ratio—is determined according to the degree of dirtiness of the wastewater. Compared to using fixed parameter values ​​for rinsing, the rinsing of the filter element 247 in this embodiment is more in line with actual needs, avoiding the problem of excessive energy consumption and resource waste due to excessively high parameters, and also avoiding the problem of incomplete cleaning due to excessively low parameters. In other words, the parameters of this implementation method are determined based on the degree of dirtiness of the wastewater, which can save energy and resources while ensuring the cleaning effect.

[0259] Further, referring to Figures 2, 19 to 21, in some embodiments, a stirring device 35 is provided inside the sewage box 24. When the cleaning equipment 100 is in the sewage discharge state, the stirring device 35 stirs the sewage in the sewage box 24. Specifically, a drive device 36 is provided on the top wall of the sewage box 24, and the stirring device 35 is connected to the drive device 36. The rotating shaft of the stirring device 35 extends from the top wall of the sewage box 24 toward the inside of the sewage box 24. The equipment control board 50 is electrically connected to the drive device 36 and is used to control the operation of the drive device 36.

[0260] The stirring device 35 is a device that generates stirring force by rotation to agitate the sewage in the sewage box 24. Typically, the stirring device 35 includes a rotating shaft and an impeller mounted on the shaft. The drive device 36 is a drive structure for driving the stirring device 35 to rotate, and typically includes a motor and a transmission structure (including but not limited to gears, racks, belts, pulleys, etc.). The transmission structure is connected to both the motor and the rotating shaft, and the motor drives the rotating shaft to rotate through the transmission structure. The rotation of the rotating shaft drives the impeller to rotate, thereby agitating the sewage in the sewage box 24. Since the sewage box 24 contains sewage, large particles of waste will accumulate or adhere to the walls when the sewage is left to settle. When the cleaning equipment 100 is in the sewage discharge state (the second power unit 34 and / or the air source system 80 supply positive pressure gas to the sewage box 24), the stirring device 35 stirs the sewage in the sewage box 24, which can break the accumulation and adhesion of large particles of waste. The large particles of waste will float and disperse. The dispersed large particles of waste are more likely to flow out from the connecting port 243, then enter the sludge chamber 25115 through the first sewage port 25116, and finally be discharged to the outside of the cleaning equipment 100 through the second sewage port 25117, thereby improving the sewage discharge efficiency and effect.

[0261] In some embodiments, an anti-backflow device 37 is provided inside the sewage box 24. In other embodiments, an anti-backflow device 37 is provided on the connecting pipe 334 connecting the clean water box 23 and the sewage box 24. In still other embodiments, both the sewage box 24 and the connecting pipe 334 connecting the clean water box 23 and the sewage box 24 are equipped with an anti-backflow device 37. The anti-backflow device 37 is used to prevent sewage in the sewage box 24 from entering the clean water box 23 through the inlet 241. For example, the anti-backflow device 37 is a one-way valve.

[0262] Please also refer to Figures 2, 19 to 21. In some embodiments, the wastewater box 24 is provided with a full water detection device 38, which is triggered when the liquid level in the wastewater box 24 reaches a set level.

[0263] Specifically, the full-water detection device 38 includes a guide post 381, a floating element 383, and a sensing element 385. The floating element 383 is disposed inside the wastewater tank 24, and the sensing element 3831 is mounted on the floating element 383. The guide post 381 is connected to the top wall of the wastewater tank 24, and the floating element 383 is sleeved on the outside of the guide post 381. A limiting part 3811 is provided at the end of the guide post 381 away from the top wall of the wastewater tank 24, which is used to prevent the floating element 383 from detaching from the guide post 381. The sensing element 385 is disposed on the wall of the wastewater tank 24 and is used to sense the position of the sensing element 3831. When the liquid level in the wastewater box 24 reaches the set level, the detection element 3831 will rise to the predetermined height along with the floating element 383. The sensing element 385 can then sense that the detection element 3831 has reached the predetermined height, and the water full detection device 38 will be triggered. That is, the water full detection device 38 outputs a water full signal to the device controller 50. The device controller 50 can then control the cleaning device 100 to return to the preset position mentioned above for automatic sewage discharge, or issue a prompt signal to remind the user to manually control the sewage discharge. In this way, excessive sewage in the wastewater box 24 can be prevented from overflowing onto the surfaces that have not been mopped or have already been mopped, thus increasing the cleaning burden on the user.

[0264] The above embodiments will be described below with reference to some specific application scenarios.

[0265] The user purchased a robot vacuum and mop (cleaning device 100) and has many plants on their balcony, causing the floor to frequently accumulate dirt. When the robot vacuum and mop is activated, it sweeps and mops the balcony, collecting larger pieces of dirt into the dustbin. The mopping component 22 then cleans the swept floor. Since some dust and dirt remain after sweeping, the robot's wastewater bin 24 collects the wastewater generated during mopping. This wastewater contains a significant amount of dirt, resulting in a considerable amount of dirt remaining on the walls of the wastewater bin 24. Afterward, the robot returns to the base station 200, and the wastewater discharge path of the wastewater bin 24 opens, releasing the previously stored wastewater to the base station 200. The base station 200 then supplies water to the robot's clean water bin 23. When the water level in the clean water bin 23 reaches the preset overflow outlet 235, it overflows into the wastewater bin 24, washing away the remaining dirt. In this way, the clean water box 23 has been replenished with water, and the wastewater box 24 has also been cleaned. The user does not need to manually clean the wastewater box 24, which saves a lot of time and effort. In addition, the cleaning device 100 of this embodiment can also automatically supply liquid to the cleaning component 22 during the cleaning process to keep the cleaning component 22 in a moist state.

[0266] Please refer to Figures 4a to 4e and Figures 8 to 10. In some embodiments, the hydraulic system 30 further includes a first passage 31 and a first power unit 32.

[0267] In some embodiments, the first power unit 32 includes a peristaltic pump. Generally, peristaltic pumps have a low flow rate and are suitable for applications requiring precise flow control. In this embodiment, the first power unit 32 is located in the first channel 31 and, when the cleaning device 100 is cleaning the surface to be cleaned, drives the liquid in the water tank 23 to flow to the cleaning component 22, wetting the cleaning component 22 to better wipe the surface. Therefore, in this scenario, the required flow rate of the first power unit 32 is low, allowing for more precise control of the amount of liquid supplied to the cleaning component 22 and preventing excessive water residue on the surface during wiping. Therefore, selecting a peristaltic pump with a low flow rate and precise flow control as the first power unit 32 better meets the needs of the cleaning device 100 for wiping the surface. Of course, in other embodiments, a water pump with a low flow rate can also be used as the first power unit 32; this disclosure does not impose any particular limitation.

[0268] When the cleaning device 100 is in the state of mopping the surface to be cleaned, the device control board 50 controls the first power unit 32 to turn on. The first power unit 32 drives the liquid in the clean water box 23 to flow from the liquid outlet 233 into the first passage 31, and then flows out from the first outlet 313 to the spray bar 26, and then supplies the cleaning component 22 through the spray bar 26.

[0269] The cleaning device 100 of this embodiment can also be supplied with a large flow of liquid from an external liquid source (e.g., the liquid supply system of the base station 200) to clean the cleaning component 22 at a high flow rate. Referring to Figures 4b, 4d, and 8 to 10, in some embodiments, the liquid circuit system 30 further includes a second passage 33. The wastewater box 24 and the second power unit 34 are both located on the second passage 33.

[0270] The cleaning equipment 100 also includes a state for cleaning the cleaning component 22, as shown in Figure 3b. When the cleaning equipment 100 is in the state of cleaning the cleaning component 22, liquid is supplied to the clean water box 23 through an external liquid source. When the liquid level in the clean water box 23 exceeds the overflow port 235, the liquid in the clean water box 23 overflows from the overflow port 235 into the second passage 33, and flows out from the second outlet 333 to the spray bar 26, and then is discharged to the cleaning component 22 through the spray bar 26 to clean the cleaning component 22. At this time, the equipment control board 50 can control the first power unit 32 to be turned on or off. It should be noted that when the cleaning module 20 is not equipped with the water spray bar 26: when the cleaning device 100 is in the state of mopping the surface to be cleaned, the liquid flowing out from the first outlet 313 of the first passage 31 can be directly supplied to the cleaning component 22. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid flowing out from the second outlet 333 of the second passage 33 can also be directly supplied to the cleaning component 22.

[0271] The liquid circuit system 30, cleaning device 100, and cleaning system 1000 disclosed herein are provided with a first passage 31 and a second passage 33, both connected to the clean water tank 23. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the first power unit 32 drives the liquid in the clean water tank 23 to supply liquid to the cleaning component 22 through the first passage 31, so as to replenish the cleaning component 22 with liquid for mopping the surface to be cleaned, so that the cleaning component 22 remains moist when the cleaning device 100 is mopping the surface to be cleaned. When the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid level supplied to the clean water tank 23 by the external liquid source exceeds the overflow port 235. Liquid overflows from the overflow port 235 into the second passage 33, and then supplies liquid to the cleaning component 22 through the second passage 33 to clean the cleaning component 22. Since it is only necessary to keep the cleaning component 22 wet when mopping the surface to be cleaned, the flow rate of the first power device 32 can be relatively small. When mopping the surface to be cleaned, the first power device 32 drives the liquid in the clean water box 23 to flow out at a small flow rate. When cleaning the cleaning component 22, the clean water box 23 can overflow water to the cleaning component 22 to meet the need for a large flow rate of liquid supply to the cleaning component 22. Therefore, there is no need to use a power device with adjustable flow rate to adjust the flow rate output to the cleaning component 22, which reduces the cost of the liquid circuit system 30.

[0272] Furthermore, the second power unit 34 can also function as a water pump. In this case, the second power unit 34 can be a water-air dual-purpose pump, and it is also used to provide the driving power to discharge the liquid in the clean water box 23 into the second passage 33. That is, the second power unit 34 takes into account both the wastewater generated by the cleaning device 100 in collecting the wastewater generated by the cleaning component 22 in cleaning the surface to be cleaned, and the large flow rate liquid supply required in cleaning the cleaning component 22.

[0273] As shown in Figure 3a, when the cleaning device 100 is cleaning the surface to be cleaned, the second power unit 34 is in the activated state. Since the second power unit 34 is connected to the drain port 242, that is, the second power unit 34 is connected to the first chamber 244, and the first chamber 244 and the second chamber 245 are fluidly connected through the through hole O, when the second power unit 34 draws air, the air in the second chamber 245 flows through the through hole O through the first chamber 244 and is discharged from the drain port 242 together with the air in the first chamber 244. This allows the second power unit 34 to draw air from the first chamber 244 and the second chamber 245, creating a negative pressure in the second chamber 245, thereby driving the wastewater on the cleaning component 22 into the second chamber 245. Thus, the second power unit 34 enables the cleaning device 100 to collect the wastewater generated by the cleaning component 22 during cleaning of the surface to be cleaned.

[0274] Referring to Figures 4b, 4d, and 3b, when the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the water tank 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the water tank 23 to overflow from the overflow port 235 to the second passage 33, and then flows out of the second passage 33 through the inlet 241, the first chamber 244, the outlet 242, and the second outlet 333 to be discharged to the cleaning component 22. Since the cleaning device 100 is in the state of cleaning the cleaning component 22, for the first chamber 244, the external liquid (the liquid overflowing from the clean water box 23) enters the first chamber 244 through the inlet 241. Since the second power device 34 is connected to the drain 242 of the first chamber 244, the second power device 34 preferentially drives the liquid in the first chamber 244 to the cleaning component 22 through the drain 242. Specifically, it drives the liquid to the spray bar 26 next to the cleaning component 22 and supplies it to the cleaning component 22. During this process, since the maximum allowable liquid level in the second chamber 245 is lower than the location of the through hole O, the sewage in the second chamber 245 will not enter the first chamber 244. Furthermore, during the startup of the second power unit 34, the continuous flow of liquid in the first chamber 244 will block the through hole O and also prevent the second power unit 34 from driving the liquid in the second chamber 245 to the first chamber 244. Thus, the cleaning equipment 100 can meet the demand for high-flow liquid supply while cleaning the cleaning component 22, without causing the sewage in the second chamber 245 to flow back into the cleaning component 22.

[0275] The liquid circuit system 30 provided in this embodiment, for the cleaning device 100 with self-cleaning function, in addition to the need for the first power device 32 connected to the clean water box 23 of the cleaning device 100 to realize the small flow of liquid supply to the cleaning component 22 for normal mopping of the cleaning device 100, also needs to be equipped with a power device on the cleaning device 100 to realize the function of pumping the sewage on the cleaning component 22 to the cleaning device when cleaning the surface to be cleaned. The cleaning equipment 100 of this embodiment needs to meet the requirement of high-flow-rate cleaning of the cleaning components 22. Therefore, this embodiment utilizes the second power device 34 to perform both the functions of suction during normal cleaning and high-flow-rate liquid supply during cleaning of the cleaning equipment 100 and cleaning of the cleaning components 22. This effectively eliminates the need to set up another power device as the power source for high-flow-rate liquid supply to the cleaning components 22, or eliminates the need to set up a power device with adjustable flow rate (which is more expensive than a power device with non-adjustable flow rate) to meet the switching between low-flow-rate and high-flow-rate liquid supply to the cleaning components 22, thereby effectively reducing the overall cost of the cleaning equipment 100.

[0276] Please refer to Figures 4a, 4b, 4c, 4d, or 4e. Secondly, this disclosure also provides a cleaning system 1000. The cleaning system 1000 includes a cleaning device 100 and a base station 200. The cleaning device 100 includes a cleaning component 22 and a liquid path system 30. The cleaning component 22 is used to mop the surface to be cleaned. The cleaning device 100 is used to interface with the base station 200, which is used to maintain the cleaning device 100. The base station 200 is provided with a liquid supply system 70 for supplying liquid. The liquid path system 30 of the cleaning device 100 includes a clean water tank 23 and a wastewater tank 24. The clean water tank 23 is provided with a replenishment port and an overflow port 235. Wastewater box 24 is connected to overflow port 235. Wastewater box 24 is used to recycle wastewater generated by cleaning component 22. When base station 200 is connected to cleaning equipment 100 and liquid is supplied to clean water box 23 through liquid supply system 70 until the liquid level exceeds overflow port 235, the liquid overflowing from overflow port 235 in clean water box 23 enters wastewater box 24 to rinse wastewater box 24. Base station 200 is also provided with interface connected to liquid supply system 70. Interface is used to connect to replenishment port. When cleaning equipment 100 is docked at base station 200 and interface is connected to replenishment port, liquid is supplied to clean water box 23 of cleaning equipment 100 through liquid supply system 70 of base station 200. When liquid is supplied to clean water box 23 by liquid supply system 70 until the liquid level exceeds overflow port 235, the liquid in clean water box 23 overflows into wastewater box 24.

[0277] It should be noted that the structure and function of the liquid circuit system 30 in the cleaning system 1000 provided in this embodiment are the same as those in the above embodiments. For details, please refer to the specific description of the above embodiments. This embodiment will not repeat the description.

[0278] The above embodiments will be described below with reference to some specific application scenarios.

[0279] As shown in Figure 26, and in conjunction with Figures 4a, 4b, 4c, 4d, or 4e, the user starts the sweeper-mop combo (cleaning device 100), which moves across the living room floor driven by the drive wheels 101. During this movement, the built-in water tank 23 provides water to the tracked cleaning component 22 to wet it. The tracked cleaning component 22 contacts and rolls against the floor, thus wiping away dust. Simultaneously, the scraping section 2512 scrapes dirt from the cleaning component 22 into the dirt collection chamber 25115. The second power unit 34 applies negative pressure to the wastewater collection box 24 to pump the wastewater from the dirt collection chamber 25115 into the wastewater collection box 24 for storage. As the sweeper-mop combo moves, the tracked cleaning component 22 cleans the floor to a set area, such as 20m². 2When the sewage in the sewage box 24 reaches the preset level, the sweeper and mop can navigate to the positioning point of the base station 200 and rotate until the replenishment port 231 of the clean water box 23 of the sweeper and mop faces the entrance of the base station 200. The sweeper and mop then retreats into the base station 200. During this process, the replenishment port 231 of the clean water box 23 of the sweeper and mop is connected to the interface 63 of the base station 200. The air source system 80 and / or the second power device 34 of the base station 200 are used to pass positive pressure gas through the sewage box 24 to discharge sewage. After the sewage discharge is completed, the liquid supply system 70 of the base station 200 replenishes water into the clean water box 23 of the sweeper and mop. During the continuous replenishment of water to the clean water box 23 by the base station 200, the second power unit 34 can be shut off first, causing the water level in the clean water box 23 to rise continuously until it exceeds the overflow port 235 of the clean water box 23. A large volume of water overflows from the overflow port 235 and flows into the sewage box 24 to flush the sewage box 24. The flushed liquid is discharged into the floor drain of the base station 200 through the connecting pipe 255 and the recycling component 251. When the dirt detection sensor 28 on the sewage recycling path detects that the dirt level is lower than the first preset dirt level threshold, the second power unit 34 is turned on, allowing the clean water overflowing from the overflow port 235 in the clean water box 23 to flow through the first chamber 244 and the drain port 242 to the second channel 33, and then to the tracked cleaning component 22 through the second channel 33. During this process, the tracked cleaning component 22 can continuously rotate forward or alternate between forward and reverse rotation to achieve high-flow self-cleaning of the tracked cleaning component 22. After the cleaning unit 22 has finished its task, the sweeper and mop can return to the ground to clean other uncleaned areas.

[0280] Fourthly, currently, base stations typically have two interfaces: one interface connects to the clean water tank of the cleaning equipment to replenish the cleaning solution, and the other interface connects to the wastewater tank of the cleaning equipment to discharge wastewater generated during cleaning. This dual-interface design undoubtedly increases the difficulty of connection. If the interface connecting to the clean water tank is not properly aligned, it will lead to insufficient replenishment of the cleaning solution or leakage, resulting in waste. If the interface connecting to the wastewater tank is not properly aligned, the wastewater will not be discharged along the predetermined path or will leak into the non-liquid-containing areas of the base station, increasing the need for additional cleaning work. To address this problem, this disclosure provides a cleaning system 1000 (shown in Figure 1). The cleaning equipment 100 will now be described in detail with reference to Figures 1, 5a to 5d, 4a to 4e, 7 to 26, and 28 to 31. It should be noted that for the explanation of each component in the fourth aspect cleaning system 1000, please refer to the explanation of each component in the second aspect cleaning system 1000. In the following embodiments, only the differences from the cleaning system 1000 in the second aspect and the effects of the corresponding embodiments will be further explained.

[0281] Referring to Figure 1, the cleaning system 1000 of this embodiment includes a cleaning device 100 and a base station 200. Referring to Figures 5a and 5b, the cleaning device 100 includes a cleaning component 22 for mopping the surface to be cleaned. The cleaning device 100 also includes a clean water tank 23 and a wastewater tank 24. The clean water tank 23 has a replenishment port 231 and an overflow port 235. The clean water tank 23 is connected to the wastewater tank 24 through the overflow port 235, and the wastewater tank 24 is used to recycle the wastewater generated by the cleaning component 22. The base station 200 is used for maintaining the cleaning device 100 and has a connection interface 63 for connecting with the replenishment port 231. When the connection interface 63 is connected with the replenishment port 231, the cleaning device 100 includes at least a replenishment state and a discharge state. When the cleaning device 100 is in the replenishment state, the liquid provided by the base station 200 is injected into the clean water tank 23 through the connection interface 63 and the replenishment port 231. When the cleaning equipment 100 is in the sewage discharge state, the fluid provided by the base station 200 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. At least part of the fluid passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235 to provide positive pressure to the sewage box 24, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0282] To enable the cleaning equipment 100 to connect with the base station 200, and to supply liquid to the clean water box 23 of the cleaning equipment 100 and clean the wastewater box 24 through the base station 200, the following embodiment provides a solution for connecting the liquid circuit of the base station 200 and the cleaning equipment 100 through an interface, which can effectively improve the reliability of the connection between the cleaning equipment 100 and the base station 200.

[0283] Specifically, referring to Figures 5a, 5b, 9, and 10, in some embodiments, the liquid circuit system 30 includes a clean water tank 23 and a wastewater tank 24. The clean water tank 23 and the wastewater tank 24 are connected. As mentioned above, the explanation of the clean water tank 23 and the wastewater tank 24 can be found in the explanation of the clean water tank 23 and wastewater tank 24 in the first aspect above, and will not be repeated here.

[0284] In this embodiment, the base station 200 is provided with a docking interface 63 for connecting with the replenishment port 231. When the docking interface 63 is connected with the replenishment port 231, the cleaning device 100 includes at least a replenishment state and a discharge state. In the replenishment state, the liquid provided by the base station 200 is injected into the clean water box 23 through the docking interface 63 and the replenishment port 231; in the discharge state, the fluid provided by the base station 200 is injected into the clean water box 23 through the docking interface 63 and the replenishment port 231, and at least a portion of the fluid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to provide positive pressure to the wastewater box 24, thereby discharging the wastewater in the wastewater box 24 to the outside of the wastewater box 24.

[0285] In this disclosure, "fluid" includes at least one of the following: gas, liquid, and gas-liquid mixture (e.g., "bubble liquid" hereinafter). The properties of a fluid include at least one of the following: fluid composition, fluid temperature, and fluid concentration. Regarding "liquid," in terms of composition, the "liquid" mentioned herein includes, but is not limited to, water, a maintenance solution formed by mixing water and a maintenance agent, and a cleaning solution formed by mixing water and a cleaning agent. Water and cleaning solution can be used as cleaning solutions for cleaning surfaces to be cleaned, cleaning parts 22, or wastewater boxes 24, while maintenance solutions are used to maintain surfaces to be cleaned. In terms of temperature, "liquid" includes unheated liquids and heated liquids; in terms of concentration, "liquid" includes a maintenance solution formed by mixing water and a maintenance agent in a predetermined ratio, and a cleaning solution formed by mixing water and a cleaning agent in a preset ratio. The "gas" mentioned herein can be air, or, like the aforementioned "liquid," can have some adjustments in terms of composition, temperature, and concentration. Regarding the "gas-liquid mixture," since it is formed by the simultaneous mixing of gas and liquid supplied by base station 200, the "liquid" and "gas" can be adjusted according to the aforementioned corresponding attributes to form the final "gas-liquid mixture." In this disclosure, when the cleaning equipment 100 is in the liquid replenishment state, base station 200 supplies liquid to the cleaning equipment 100; while when the cleaning equipment 100 is in the state of cleaning the wastewater box 24 (including the state of discharging wastewater and cleaning the wastewater box 24), base station 200 can supply liquid, gas, or a gas-liquid mixture to the cleaning equipment 100. The supply behavior of base station 200 when the cleaning equipment 100 is in the liquid replenishment state and the wastewater discharge state will be described in detail below with reference to Figures 5a and 5b.

[0286] In one example, when the interface 63 of the base station 200 is connected to the replenishment port 231, and cleaning fluid is injected into the clean water box 23 through the interface 63 and the replenishment port 231, at least a portion of the cleaning fluid output from the base station 200 is stored in the clean water box 23 to replenish the cleaning equipment 100. At this time, the cleaning equipment 100 is in the replenishment state. When the liquid level in the clean water box 23 exceeds the overflow port 235, the portion of the cleaning fluid exceeding the overflow port 235 enters the sewage box 24 through the overflow port 235. At this time, the cleaning equipment 100 is in the sewage discharge state. Thus, the cleaning equipment 100 can replenish the liquid first and then discharge the sewage, and the two are performed in separate time periods.

[0287] In another example, the interface 63 of the base station 200 is connected to the liquid replenishment port 231. Gas is first injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The gas enters the sewage box 24 through the overflow port 235, squeezing the sewage in the sewage box 24 outward and discharging it from the sewage box 24, thereby realizing the sewage discharge of the cleaning device 100. At this time, the cleaning device 100 is in the sewage discharge state. Then, the base station 200 injects liquid into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The liquid is stored in the clean water box 23 to realize the liquid replenishment of the cleaning device 100. At this time, the cleaning device 100 is in the liquid replenishment state. Thus, the cleaning device 100 can discharge sewage first and then replenish liquid.

[0288] In another example, when the interface 63 of the base station 200 is connected to the liquid replenishment port 231, and gas and liquid are simultaneously injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231, the gas and liquid mix to form a gas-liquid mixture. A portion of the gas-liquid mixture is stored in the clean water box 23 to replenish the cleaning equipment 100. At this time, the cleaning equipment 100 is in the replenishment state. At the same time, a portion of the gas-liquid mixture enters the sewage box 24 through the overflow port 235, squeezing the sewage in the sewage box 24 outward to discharge it from the sewage box 24, thereby achieving the sewage discharge of the cleaning equipment 100. At this time, the cleaning equipment 100 is also in the sewage discharge state. Thus, the replenishment and sewage discharge of the cleaning equipment 100 are carried out simultaneously.

[0289] In another example, the interface 63 of the base station 200 is connected to the liquid replenishment port 231. Gas is first injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The gas enters the sewage box 24 through the overflow port 235, squeezing the sewage in the sewage box 24 outward to discharge it, thereby realizing the sewage discharge of the cleaning equipment 100. At this time, the cleaning equipment 100 is in the sewage discharge state. Then, the base station 200 simultaneously injects gas and liquid into the clean water box 23 through the interface 63 and the liquid replenishment port 231. After the gas and liquid mix, they form a gas-liquid mixture. Part of the gas-liquid mixture is stored in the clean water box 23 to replenish the liquid of the cleaning equipment 100, and part of the gas-liquid mixture enters the sewage box 24 through the overflow port 235, continuing to squeeze the sewage in the sewage box 24 outward to discharge it from the sewage box 24. Thus, the cleaning equipment 100 first discharges sewage and then replenishes liquid and discharges sewage simultaneously.

[0290] In some embodiments, interface 63 is directly connected to the replenishment port 231, and a one-way self-locking valve 105 is provided at interface 63 or replenishment port 231. In other embodiments, interface 63 and replenishment port 231 are indirectly connected via a pipe, and a one-way self-locking valve 105 is provided at interface 63, replenishment port 231, or inside the pipe. When interface 63 and replenishment port 231 are connected or not connected, and the one-way self-locking valve 105 is closed, interface 63 and replenishment port 231 are not connected; when interface 63 and replenishment port 231 are connected, and the one-way self-locking valve 105 is open, interface 63 and replenishment port 231 are connected, and the flow is unidirectional along the direction from base station 200 to cleaning equipment 100.

[0291] In the cleaning system 1000 disclosed herein, the base station 200 and the cleaning equipment 100 can be connected by only an interface 63 and a liquid replenishment port 231. This allows the base station 200 to provide at least one of liquid, gas, or gas-liquid mixture to the cleaning equipment 100, so that the cleaning equipment 100 is in a sewage discharge state and / or a liquid replenishment state. Only one connection accuracy needs to be considered between the interface 63 and the liquid replenishment port 231, which greatly reduces the connection difficulty and ensures high connection accuracy. This avoids waste caused by incomplete connection and ensures sufficient liquid replenishment. At the same time, it also ensures that the sewage can be discharged according to the predetermined path and will not leak into the non-liquid-containing area of ​​the base station 200, thus avoiding additional cleaning work.

[0292] Referring to Figures 8 and 9, along the forward direction Y1 of the cleaning device 100, the cleaning device 100 includes opposing front and rear sides. In one embodiment, the body 10 of the cleaning device 100 is also provided with casters 102. The casters 102 are wheels on the body 10 that can rotate horizontally 360 degrees to flexibly turn the cleaning device 100. Both the water tank 23 and the casters 102 are located on the rear side of the cleaning device 100. In the projection in a plane perpendicular to the forward direction Y1 of the cleaning device 100, the projection of the casters 102 is located below the projection of the water tank 23. In the projection in a plane perpendicular to the height direction Z of the cleaning device 100, the geometric center of the projection of the casters 102 is located within the projection of the water tank 23. Since the water tank 23 is relatively heavy, the design of the positional relationship between the caster 102 and the water tank 23 is beneficial to support the heavier part of the cleaning equipment 100, making it more stable when the caster 102 drives the cleaning equipment 100 to turn, and preventing the liquid in the water tank 23 from sloshing and overflowing.

[0293] In another embodiment, the body 10 of the cleaning device 100 is also provided with support wheels 103. Support wheels 103 are wheels on the body 10 that support the weight and maintain stability, and their rotation axis is parallel to the width direction X of the body. Both the water tank 23 and the support wheels 103 are located on the rear side of the cleaning device 100. In the projection onto a plane perpendicular to the forward direction Y1 of the cleaning device 100, the projection of the support wheels 103 is located below the projection of the water tank 23. In the projection onto a plane perpendicular to the height direction Z of the cleaning device 100, the geometric center of the projection of the support wheels 103 is located within the projection of the water tank 23. Because the water tank 23 is relatively heavy, this positional relationship between the support wheels 103 and the water tank 23 is beneficial for supporting the heavier parts of the cleaning device 100, making the cleaning device 100 more stable when moving and preventing the liquid in the water tank 23 from sloshing and overflowing.

[0294] In some embodiments, the rear sidewall of the cleaning device 100 is provided with an injection connector 104, which has an injection port 1041 that communicates with the replenishment port 231 of the clean water box 23. The "injection connector 104" here can be the "pipe or adapter" used for indirect connection between the interface 63 and the replenishment port 231 mentioned above. The geometric center of the caster wheel 102 or support wheel 103 is located on the centerline of the width direction X of the cleaning device 100, thus stably supporting the body 10 and driving the body 10 to move stably. Along the width direction X of the cleaning device 100, the injection port 1041 on the injection connector 104 is located on one side of the caster wheel 102 or support wheel 103 and is spaced apart from the caster wheel 102 or support wheel 103. The injection connector 104 is also provided with a blind hole 1043, which is symmetrically arranged with the injection port 1041 along the width direction X of the cleaning device 100 on both sides of the caster wheel 102 or the support wheel 103. The injection port 1041 is used to mate with the docking port 63, so that the docking port 63 can communicate with the replenishment port 231 through the injection port 1041. The symmetrical arrangement of the blind hole 1043 and the injection port 1041 on both sides of the caster wheel 102 or the support wheel 103 makes the cleaning device 100 more aesthetically pleasing.

[0295] In some embodiments, the base station 200 is provided with a liquid supply system 70 for providing liquid and a gas supply system 80 for providing gas. When the cleaning equipment 100 is in a liquid replenishment state, the liquid provided by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. When the cleaning equipment 100 is in a sewage discharge state, the liquid and / or gas provided by the gas supply system 80 and / or the liquid supply system 70 are injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. At least a portion of the liquid and / or gas passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0296] In some embodiments, the wastewater box 24 is connected to a second power unit 34 and a filter element 247. When the cleaning device 100 is cleaning the surface to be cleaned, the second power unit 34 is in the on state and draws negative pressure into the wastewater box 24 to provide power to draw wastewater from the cleaning element 22 into the wastewater box 24. The filter element 247 is used to prevent solid waste in the wastewater box 24 from entering the second power unit 34. When the interface 63 is connected to the liquid replenishment port 231, the cleaning device 100 also includes a state of rinsing the wastewater box 24. When the cleaning device 100 is in the state of rinsing the wastewater box 24, the liquid provided by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231, and the gas provided by the gas source system 80 is injected into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The liquid and gas together form a bubble liquid to rinse the filter element 247 in the wastewater box 24.

[0297] The cleaning equipment 100 is provided with a sewage discharge channel for discharging the waste in the sewage box 24 out of the sewage box 24; the sewage discharge channel is provided with a control structure 25183 for controlling the opening and closing of the sewage discharge channel. When the cleaning equipment 100 is in the sewage discharge state, the control structure 25183 opens the sewage discharge channel.

[0298] In some embodiments, the cleaning fluid provided by the base station 200 can be supplied to the clean water box 23 through the interface 63 and the replenishment port 231. By injecting the cleaning fluid into the clean water box 23, the cleaning fluid can overflow from the overflow port 235. The overflowed cleaning fluid can pass through the sewage box 24 and then be discharged to the cleaning component 22 to clean the cleaning component 22. Thus, the function of using the cleaning fluid overflowing from the clean water box 23 to clean the cleaning component 22 can also be realized.

[0299] Referring to Figures 5a and 5b, in some specific embodiments, the liquid circuit system 30 of the cleaning device 100 further includes a first passage 31, a first power unit 32, and a second passage 33. The first passage 31 is provided with a first inlet 311 and a first outlet 313. The first inlet 311 is connected to the outlet 233 of the clean water box 23, and the first outlet 313 is used for the liquid to flow out of the first passage 31. The first power unit 32 is provided on the first passage 31, and the first power unit 32 is used to provide driving power to discharge the liquid from the clean water box 23 into the first passage 31. The second passage 33 is provided with a second inlet 331 and a second outlet 333. The second inlet 331 is connected to the overflow outlet 235, and the second outlet 333 is used for the liquid to flow out of the second passage 33. The second passage 33 is provided with the aforementioned wastewater box 24 and the second power unit 34. The wastewater box 24 is connected to both the overflow outlet 245 and the second power unit 34. The second power unit 34 is also used to provide driving power to discharge the liquid from the clean water box 23 into the second passage 33.

[0300] Based on the above embodiments, the cleaning equipment 100 of this disclosure includes at least the following states: mopping the surface to be cleaned, cleaning the cleaning component 22, vacuuming, and rinsing the wastewater box 24. These states will be described in detail below with reference to Figures 5a, 5b, 11, and 13.

[0301] When the cleaning device 100 is in the state of mopping the surface to be cleaned, the device control board 50 controls the first power unit 32 to start. The first power unit 32 drives the liquid or gas-liquid mixture in the clean water box 23 to flow from the liquid outlet 233 into the first passage 31, and then out from the first outlet 313 to the spray bar 26. After passing through the spray bar 26, it is discharged to the cleaning component 22, and the moistened cleaning component 22 can then mop the surface to be cleaned. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the cleaning device 100 is also in the state of suction. In other words, the cleaning device 100 performs self-cleaning of the cleaning component 22 while mopping the surface to be cleaned. Specifically, when the cleaning device 100 is in the state of mopping the surface to be cleaned, the cleaning component 22 rotates and mops the surface to be cleaned. The wastewater on the cleaning component 22 is scraped off by the scraping part 2512 and flows into the wastewater collection chamber 25115. The device control board 50 controls the second power unit 34 to turn on, the control structure 25183 to turn off, and the second power unit 34 to draw negative pressure into the wastewater box 24 to provide the power to suck the wastewater on the cleaning component 22 into the wastewater box 24. The wastewater in the wastewater collection chamber 25115 is sucked into the wastewater box 24 for storage through the first wastewater port 25116 and the connecting port 243.

[0302] When the cleaning equipment 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the equipment control board 50 controls the second power device 34 to open. The second power device 34 drives the liquid or gas-liquid mixture in the clean water box 23 to overflow from the overflow port 235 to the second passage 33, and then flows out through the inlet 241 of the sewage box 24, the cavity of the sewage box 24, the outlet 242, and the second outlet 333 to the spray bar 26, and then through the spray bar 26 to the cleaning component 22 to clean the cleaning component 22. At this time, the equipment control board 50 can control the first power device 32 to open or close. If the equipment control panel 50 controls the first power unit 32 to be turned off, only the liquid or gas-liquid mixture in the second passage 33 flows to the spray bar 26 to clean the cleaning component 22; if the equipment control panel 50 controls the first power unit 32 to be turned on, both the liquid or gas-liquid mixture in the first passage 31 and the second passage 33 flow to the spray bar 26, increasing the amount of liquid used to clean the cleaning component 22, which can effectively improve the cleaning efficiency and cleaning effect of the cleaning component 22.

[0303] It should be noted that when the cleaning module 20 is not equipped with the spray bar 26: when the cleaning device 100 is in the state of mopping the surface to be cleaned, the liquid or gas-liquid mixture flowing out from the first outlet 313 of the first passage 31 is supplied to the cleaning component 22. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the external liquid source of the clean water box 23 supplies liquid to the clean water box 23 until the liquid level exceeds the overflow port 235, the liquid or gas-liquid mixture flowing out from the second outlet 333 of the second passage 33 can be directly discharged to the cleaning component 22 to clean the cleaning component 22.

[0304] Based on the above-described embodiment with the first passage 31 and the second passage 33, in order to discharge the sewage in the sewage box 24 when the cleaning equipment 100 is in the sewage discharge state, one implementation method is as follows: the equipment control board 50 controls the second power device 34 to shut down, and the base station 200 provides positive pressure fluid (which can be gas, liquid, or a gas-liquid mixture) to the clean water box 23 through the interface 63 and the liquid replenishment port 231. The positive pressure fluid overflows from the overflow port 235 into the sewage box 24, squeezing the sewage in the sewage box 24 outward so that it is discharged into the sludge chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to open to connect the second sewage port 25117 to the outside, and the sewage in the sludge chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. Another implementation is as follows: The equipment control board 50 controls the second power unit 34 to turn on and introduce positive pressure gas into the sewage box 24. The positive pressure gas forces the sewage in the sewage box 24 outward, causing it to be discharged into the sludge chamber 25115 through the connecting port 243 and the first sewage port 25116. Then, the equipment control board 50 controls the control structure 25183 to open to connect the second sewage port 25117 with the outside. The sewage in the sludge chamber 25115 is then discharged to the base station 200 through the second sewage port 25117, thereby realizing the sewage discharge of the cleaning equipment 100. The liquid circuit system 30 also includes a connecting pipe 255 for connecting the connecting port 243 and the first sewage port 25116. For example, when the cleaning equipment 100 is in the non-discharge state, the equipment control board 50 controls the control structure 25183 to close to block the connection between the sewage discharge channel and the outside.

[0305] In some embodiments, a control valve 27 may be provided between the clean water box 23 and the wastewater box 24. The equipment control board 50 is electrically connected to the control valve 27 and is used to control the opening or closing of the control valve 27. The control valve 27 is used to open when the cleaning equipment 100 is in the discharge state to allow fluid in the clean water box 23 to enter the wastewater box 24, and to close when the cleaning equipment 100 is in the replenishment state to prevent fluid in the clean water box 23 from entering the wastewater box 24. In one example, the control valve 27 may be a one-way valve. It is worth noting that in this embodiment, since the opening and closing of the communication path between the clean water box 23 and the wastewater box 24 can be controlled by the control valve 27, it is not necessary to strictly limit the setting height of the overflow port 235 to be higher than the setting height of the liquid outlet 233. Furthermore, the sewage discharge operation and the cleaning component 22 cleaning operation of the cleaning equipment 100 can be performed alternately. For example, after the cleaning equipment 100 returns to the base station 200, it can first perform the sewage discharge operation, discharging the sewage in the sewage box 24 into the sewage tank 81 of the base station 200, or discharging it into the base station 200 and then further discharging it into the drainage system outside the base station 200 through a floor drain. Next, the cleaning equipment 100 performs the cleaning component 22 cleaning operation, that is, the fluid on the first passage 31 and the second passage 33 flows to the spray bar 26, and the rotating cleaning component 22 is cleaned by the spray bar 26. When the cleaning component 22 is being cleaned, and the cleaning component 22 is rotating clockwise (the direction of rotation is the same as the direction of rotation when the cleaning device 100 is normally wiping the surface to be cleaned), the scraping part 2512 can scrape the wastewater on the cleaning component 22 into the wastewater collection chamber 25115 of the recycling component 251. During this process, the control structure 25183 can remain open, so that most of the wastewater on the rotating cleaning component 22 can enter the wastewater collection chamber 25115 and then be directly discharged into the base 61 of the base station 200 through the second wastewater outlet 25117, and collected into the wastewater tank 81 of the base station 200, or discharged into the drainage system outside the base station 200 through a floor drain. When the cleaning component 22 is being cleaned and the cleaning component 22 is reversed (the direction of rotation is opposite to the direction of rotation when the cleaning device 100 is normally wiping the surface to be cleaned), the scraping part 2512 can scrape the sewage on the cleaning component 22 directly onto the base station 200 base station 61 and collect it into the sewage tank 81 of the base station 200, or discharge it into the drainage system outside the base station 200 through the floor drain. During this process, since the sewage does not need to be discharged into the base station 200 through the sewage chamber 25115, the control structure 25183 can remain in the open or closed state.

[0306] When the cleaning device 100 is in the sewage discharge state, and the positive pressure fluid supplied by the base station 200 to the clean water box 23 through the interface 63 and the liquid replenishment port 231 contains liquid (which can be a liquid or a gas-liquid mixture), the positive pressure fluid overflows from the overflow port 235 into the sewage box 24, thereby cleaning at least a portion of the sewage box 24. During this process, the control structure 25183 can be in the open state, and the aforementioned positive pressure fluid squeezes the sewage in the sewage box 24 outward to discharge it. At this time, the cleaning device 100 of this disclosure recovers the sewage generated by the cleaning component 22 by setting the sewage box 24. The cleaning of the sewage box 24 does not require disassembling the sewage box 24 for manual cleaning. Instead, when the base station 200 is connected to the cleaning device 100 and supplies fluid to the clean water box 23, the fluid overflowing from the overflow port 235 of the clean water box 23 is used to rinse the sewage box 24, achieving automatic cleaning of the sewage box 24. This is efficient, convenient, time-saving, labor-saving, and avoids the growth of bacteria.

[0307] Since the cleaning equipment requires a smaller liquid supply when wiping the surface to be cleaned, but a larger liquid supply when cleaning the cleaning parts, related technologies use a flow-adjustable power device in the liquid circuit system to adjust the flow rate output to the cleaning parts, so as to meet the different needs of the cleaning parts when wiping the surface to be cleaned and when the cleaning parts are self-cleaning. However, the cost of using such a flow-adjustable power device is relatively high. The liquid circuit system 30, cleaning device 100, and cleaning system 1000 disclosed herein are provided with a first passage 31 and a second passage 33, both connected to the clean water tank 23. A first power device 32 is provided on the first passage 31, and a second power device 34 is provided on the second passage 33. When the cleaning device 100 is in the state of mopping the surface to be cleaned, the first power device 32 drives the liquid in the clean water tank 23 to be discharged through the first passage 31 to the cleaning component 22 to replenish the cleaning component 22 with liquid for mopping the surface to be cleaned. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the clean water tank 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the clean water tank 23 to be discharged through the second passage 33 to the cleaning component 22. Alternatively, while the second power device 34 drives the liquid in the clean water tank 23 to be discharged through the second passage 33 to the cleaning component 22, the first power device 32 also drives the liquid in the clean water tank 23 to be discharged through the first passage 31 to the cleaning component 22. This ensures that the liquid supply of the cleaning equipment 100 is relatively small when wiping the surface to be cleaned, and relatively large when cleaning the cleaning component 22. Therefore, there is no need to use a flow-adjustable power device to regulate the flow rate output to the cleaning component 22, thus reducing the cost of the liquid circuit system 30.

[0308] In some embodiments, before the cleaning device 100 is in a replenishment state by the base station 200 supplying liquid to the water tank 23 through the replenishment port 231, the liquid in the water tank 23 can be discharged out of the water tank 23 through the first passage 31 by the first power device 32. As mentioned above, the "liquid" referred to herein includes, but is not limited to, clean water, maintenance liquid, and cleaning liquid. Clean water and cleaning liquid can be used as cleaning liquids for cleaning the surface to be cleaned, the cleaning component 22, or the wastewater tank 24, while maintenance liquid is used to maintain the surface to be cleaned. Different liquids have different effects on the surface to be cleaned. For example, if the surface to be cleaned is a wooden floor, the cleaning component 22 sprayed with clean water (through the spraying component 26) can clean wooden floors with a general level of dirt, the cleaning component 22 sprayed with cleaning liquid can clean oily wooden floors, and the cleaning component 22 sprayed with maintenance liquid can maintain the cleaned wooden floor. That is, the cleaning device 100 may use liquids with different properties to perform different tasks. Various liquids with different properties share a single clean water tank 23. If the liquid in the clean water tank 23 is not emptied first, the liquid remaining in the clean water tank 23 after the last task will mix with the liquid supplied by the base station 200 in the current task. Since it is impossible to determine the amount of liquid remaining in the clean water tank 23 after each task, it is also impossible to determine the properties of the liquid after mixing the liquid remaining in the clean water tank 23 from the previous task with the liquid supplied by the base station 200 in the current task. As a result, the properties (composition, concentration, temperature) of the liquid supplied to the cleaning component 22 from the clean water tank 23 in the current task are inconsistent with the properties of the liquid supplied by the base station 200 through the interface 63 and the replenishment port 231. In other words, it is impossible to determine the properties of the mixed liquid, thereby affecting the execution of the task as expected. For example, if the previous task was to mop the surface to be cleaned with clean water, then the clean water tank 23 contained clean water in the previous task. If the clean water in the clean water tank 23 is not emptied when the current task is to mop the surface with a mixed cleaning solution, the concentration of the input mixed cleaning solution will become diluted, failing to achieve the desired cleaning effect. Therefore, before the base station 200 supplies liquid to the clean water tank 23 through the replenishment port 231 to put the cleaning device 100 into a replenishment state, the first power unit 32 drives the liquid in the clean water tank 23 to be discharged outside the clean water tank 23 through the first passage 31. This ensures that the properties of the liquid stored in the clean water tank 23 during the current task are consistent with the properties of the liquid supplied to the clean water tank 23 by the base station 200 through the interface 63 and the replenishment port 231, thus ensuring that each task can be executed smoothly. It should be noted that in this embodiment, only the first passage 31 connected to the clean water tank 23 needs to be considered, and it does not depend on whether the clean water tank 23 is connected to a second passage 33.

[0309] In some embodiments, referring to Figures 5c and 5d, the wastewater box 24 includes a first chamber 244 and a second chamber 245, that is, both the first chamber 244 and the second chamber 245 are formed in the wastewater box 24. The second passage 33 is provided with the first chamber 244, the second chamber 245, and a second power unit 34. The first chamber 244 is provided with an inlet 241 and an outlet 242. The inlet 241 is used to allow liquid from an external liquid source to enter the first chamber 244, and the outlet 242 is used to discharge the liquid entering the first chamber 244 to the cleaning component 22. The second chamber 245 is used to contain wastewater. The second chamber 245 is provided with a connecting port 243, which allows wastewater from the cleaning component 22 to enter the second chamber 245. The second chamber 245 is separated from the first chamber 244 but is fluidly connected through a through-hole O. The maximum permissible liquid level in the second chamber 245 is lower than the location of the through-hole O. The second chamber 245, which serves as the space for storing wastewater, can have a larger capacity, while the first chamber 244 can serve only as a water passage space, with a smaller capacity, or even be formed as a pipe, to save installation space for the entire cleaning equipment 100.

[0310] Referring to Figure 5c, in some embodiments, the first chamber 244 and the second chamber 245 can be arranged vertically. Specifically, in the height direction Z of the wastewater box 24, the first chamber 244 is located above the second chamber 245, and the first chamber 244 and the second chamber 245 are connected through a through hole O. Referring to Figure 5d, in other embodiments, the first chamber 244 and the second chamber 245 can be arranged side by side. Specifically, in the plane perpendicular to the height direction Z of the wastewater box 24, the first chamber 244 is located to one side of the second chamber 245, and the first chamber 244 and the second chamber 245 are connected through a through hole O.

[0311] When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the water box 23 by the external liquid source (e.g., base station 200) exceeds the overflow port 235, the second power device 34 drives the liquid in the water box 23 to overflow from the overflow port 235 to the second passage 33, and flows out of the second passage 33 in sequence through the inlet 241, the first chamber 244, the outlet 242, and the second outlet 333 to be discharged to the cleaning component 22; and / or, when the second power device 34 is off, and the liquid level supplied to the water box 23 by the external liquid source exceeds the overflow port 235, the liquid in the water box 23 overflows from the overflow port 235 to the first chamber 244, and is discharged into the second chamber 245 through the through hole O between the first chamber 244 and the second chamber 245.

[0312] The second power unit 34 is connected to the drain port 242 and is used to provide driving power to drive the wastewater on the cleaning component 22 into the second chamber 245, and to drive the liquid in the clean water box 23 out of the second passage 33. That is, the second power unit 34 takes into account both the wastewater generated by the cleaning component 22 during cleaning and the large flow of liquid required for cleaning the cleaning component 22.

[0313] As mentioned above, the second power unit 34 can be a dual-purpose water / air pump. The second power unit 34 can be in the start-up state in the following two operating conditions:

[0314] Please refer to Figures 5c, 5d, and 3a. When the cleaning device 100 is cleaning the surface to be cleaned, the second power unit 34 is in the activated state. Since the second power unit 34 is connected to the drain port 242, that is, the second power unit 34 is connected to the first chamber 244, and the first chamber 244 and the second chamber 245 are fluidly connected through the through hole O, when the second power unit 34 draws air, the air in the second chamber 245 flows through the through hole O through the first chamber 244 and is discharged from the drain port 242 together with the air in the first chamber 244. This allows the second power unit 34 to draw air from the first chamber 244 and the second chamber 245, creating a negative pressure state in the second chamber 245. This drives the wastewater generated by the cleaning component 22 and entering the dirt-holding chamber 25115 of the recycling component 251 into the second chamber 245. In this way, the second power unit 34 enables the cleaning device 100 to collect the wastewater generated by the cleaning component 22 when cleaning the surface to be cleaned.

[0315] Please refer to Figures 5c, 5d and 3b. When the cleaning device 100 is in the state of cleaning the cleaning component 22, and the liquid level supplied to the water tank 23 by the external liquid source exceeds the overflow port 235, the second power device 34 drives the liquid in the water tank 23 to overflow from the overflow port 235 to the second passage 33, and then flows out of the second passage 33 through the inlet 241, the first chamber 244, the outlet 242 and the second outlet 333 to be discharged to the cleaning component 22. Since the cleaning device 100 is in the state of cleaning the cleaning component 22, for the first chamber 244, the external liquid (the liquid overflowing from the clean water box 23) enters the first chamber 244 through the inlet 241. Since the second power device 34 is connected to the drain 242 of the first chamber 244, the second power device 34 preferentially drives the liquid in the first chamber 244 to the cleaning component 22 through the drain 242. Specifically, it can drive the liquid to the spray bar 26 next to the cleaning component 22 and then discharge it to the cleaning component 22. During this process, since the maximum allowable liquid level in the second chamber 245 is lower than the location of the through hole O, the sewage in the second chamber 245 will not enter the first chamber 244. Furthermore, during the startup of the second power unit 34, the continuous flow of liquid in the first chamber 244 will block the through hole O and also prevent the second power unit 34 from driving the liquid in the second chamber 245 to the first chamber 244. Thus, the cleaning equipment 100 can meet the demand for high-flow-rate liquid supply while cleaning the cleaning component 22, without causing the sewage in the second chamber 245 to flow back into the cleaning component 22.

[0316] The liquid circuit system 30 provided in this embodiment, for the cleaning device 100 with self-cleaning function, in addition to the need for the first power device 32 connected to the clean water box 23 of the cleaning device 100 to realize the small flow of liquid supply to the cleaning component 22 for normal mopping of the cleaning device 100, also needs to be equipped with a power device on the cleaning device 100 to realize the function of pumping the sewage on the cleaning component 22 to the cleaning device 100 when cleaning the surface to be cleaned. The cleaning equipment 100 of this embodiment needs to meet the requirement of high-flow-rate cleaning of the cleaning components 22. Therefore, this embodiment utilizes the second power device 34 to perform both the functions of suction during normal cleaning and high-flow-rate liquid supply during cleaning of the cleaning equipment 100 and cleaning of the cleaning components 22. This effectively eliminates the need to set up another power device as the power source for high-flow-rate liquid supply to the cleaning components 22, or eliminates the need to set up a power device with adjustable flow rate (which is more expensive than a power device with non-adjustable flow rate) to meet the switching between low-flow-rate and high-flow-rate liquid supply to the cleaning components 22. This effectively reduces the overall cost of the cleaning equipment 100.

[0317] In the embodiments shown in this disclosure, both the first chamber 244 and the second chamber 245 are formed within the wastewater box 24. That is, the first chamber 244 and the second chamber 245 are two separate cavities formed within the same container (wastewater box 24), thereby making the structure of the liquid circuit system 30 more compact. The distance of the connecting pipe between the first chamber 244 and the second chamber 245 can be shorter, effectively saving overall space and reducing piping costs. In other embodiments of this disclosure, the first chamber 244 and the second chamber 245 can be formed by two independently arranged containers, and the through holes O therein can be connected by pipes or directly connected. In this case, the assembly of the two containers can be interpreted as the "wastewater box 24" of this disclosure.

[0318] Please refer to Figures 5a, 5b, 19, and 20. In some embodiments, the filter element 247 mentioned in the foregoing embodiments may be specifically disposed at the through hole O between the first chamber 244 and the second chamber 245. The first chamber 244 and the second chamber 245 are in fluid communication through the pores on the filter element 247. The filter element 247 is used to prevent at least part of the solid waste in the second chamber 245 from entering the first chamber 244. Specifically, when the second power device 34 is turned off, and the liquid level supplied to the water box 23 by the external liquid source (e.g., base station 200) exceeds the overflow port 235, the liquid in the water box 23 overflows from the overflow port 235 into the first chamber 244, passes through the filter element 247, and then enters the second chamber 245.

[0319] As mentioned earlier, wastewater is typically stored in the second chamber 245, while the first chamber 244 contains no wastewater. The first chamber 244 is for the relatively clean liquid from the clean water box 23 to pass through, flowing out from the drain port 242 to the spray bar 26, and finally exiting from the spray bar 26 to the cleaning component 22 for cleaning. Therefore, when the cleaning equipment 100 is cleaning the cleaning component 22, the liquid passing through the first chamber 244 needs to be relatively clean and free from solid waste. Based on this, a filter 247 is installed between the second chamber 245 and the first chamber 244. This prevents the clean liquid flowing from the first chamber 244 into the spray bar 26 from being contaminated by solid waste in the second chamber 245, thus ensuring the cleaning effect on the cleaning component 22.

[0320] On the other hand, when the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid entering the first chamber 244 from the inlet 241 tends to flow into the second chamber 245. Although the second power device 34 can have the driving force to drive the fluid to the outlet 242, a certain amount of liquid will still enter the second chamber 245, thereby reducing the amount of liquid flowing to the spray bar 26 through the second passage 33 and reducing the cleaning effect of the cleaning component 22. In this embodiment, compared to the through hole O between the first chamber 244 and the second chamber 245, a filter element 247 is provided between the first chamber 244 and the second chamber 245. This allows the liquid entering the first chamber 244 from the inlet 241 to flow into the second chamber 245 less easily, but instead flows across the first chamber 244 and out of the outlet 242 to the spray bar 26. This ensures that the amount of liquid supplied to the cleaning component 22 when cleaning the cleaning component 22 is large, thus improving the cleaning effect of the cleaning component 22. When the cleaning equipment 100 is in the state of flushing the wastewater box 24, the equipment control board 50 controls the second power unit 34 to shut down, and the liquid level supplied to the clean water box 23 by the external liquid source (e.g., base station 200) exceeds the overflow port 235. The liquid in the clean water box 23 overflows from the overflow port 235 into the first chamber 244, and after passing through the filter element 247, enters the second chamber 245 to clean the filter element 247, flushing solid waste adhering to the filter element 247 into the second chamber 245, thereby cleaning at least a portion of the second chamber 245. Similarly, the cleaning equipment 100 usually performs a sewage discharge before flushing the wastewater box 24, as detailed above.

[0321] Furthermore, when the second power unit 34 applies negative pressure to the sewage box 24 to extract sewage from the recovery unit 251, the filter element 247 can also prevent solid waste from entering the first chamber 244 from the second chamber 245 and then from the first chamber 244 into the second power unit 34, thus affecting the service life of the second power unit 34. Simultaneously, when the cleaning equipment 100 is flipped and inverted, the sewage in the second chamber 245 will flow towards the first chamber 244, and the filter element 247 can also prevent solid waste from entering the second power unit 34 and affecting its service life.

[0322] Furthermore, when a filter element 247 is installed in the wastewater box 24, if the cleaning equipment 100 is in the state of rinsing the wastewater box 24, the base station 200 simultaneously injects liquid and gas into the clean water box 23 through the interface 63 and the liquid replenishment port 231. The liquid and gas together form a bubble liquid, which rinses the filter element 247.

[0323] As mentioned earlier, since the filter element 247 is a component used to prevent at least part of the solid waste in the second chamber 245 from entering the first chamber 244, solid waste will inevitably stick to the filter element 247. Over time, the solid waste will clog the holes on the filter element 247. The clogging of the holes will cause the clean liquid passing through the first chamber 244 to come into contact with the solid waste before reaching the spray bar 26, resulting in the liquid used to rinse the cleaning element 22 being dirty and the cleaning effect of the cleaning element 22 being poor. On the other hand, it will also prevent the second power device 34 or the base station 200 from supplying positive pressure to the sewage box 24, thereby obstructing the discharge of sewage from the sewage box 24. At the same time, the second power device 34 will also be unable to draw negative pressure into the sewage box 24, thereby obstructing the suction of sewage into the sewage box 24. In this embodiment, the base station 200 injects both liquid and gas into the clean water box 23. The liquid and gas together form a bubble liquid, which overflows from the overflow port 235 and enters the sewage box 24. This is equivalent to pressurizing the water. Compared with rinsing the filter element 247 by liquid alone, the bubble liquid has a greater rinsing force on the filter element 247, which can prevent solid waste from clogging the holes on the filter element 247. Thus, while ensuring that the liquid used to clean the cleaning element 22 is relatively clean, it can also ensure that the cleaning equipment 100 can discharge and suck up sewage smoothly.

[0324] To enable the cleaning equipment 100 and the base station 100 to connect through a single interface, the base station 200 of this embodiment will be described in detail below with reference to the accompanying drawings.

[0325] In some embodiments, referring to Figures 5a or 5b, the base station 200 is connected to the cleaning equipment 100 and used for maintenance of the cleaning equipment 100. The base station 200 is provided with a liquid supply system 70 for providing liquid and a gas supply system 80 for providing gas. Both the liquid supply system 70 and the gas supply system 80 are connected to the interface 63. In this disclosure, there is only one interface 63, and both the liquid supply system 70 and the gas supply system 80 are connected to the same interface 63 and are connected to the same replenishment port 231 on the clean water box 23 through the same interface 63. In this way, the base station 200 can provide liquid, gas, or gas-liquid mixture to the cleaning equipment 100, so that the cleaning equipment 100 is in at least one of the following states: sewage discharge state, liquid replenishment state, cleaning of cleaning parts 22 state, and rinsing of sewage box 23 state. Therefore, only one docking accuracy needs to be considered between the interface 63 and the replenishment port 231, which greatly reduces the docking difficulty and achieves higher docking accuracy.

[0326] When the cleaning equipment 100 is in the replenishment state, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231; when the cleaning equipment 100 is in the sewage discharge state, the fluid liquid and / or gas supplied by the liquid supply system 70 and / or the gas source system 80 are injected into the clean water box 23 through the interface 63 and the replenishment port 231, and at least part of the liquid and / or gas passes through the clean water box 23 and enters the sewage box 24 through the overflow port 235, so that the sewage in the sewage box 24 is discharged to the outside of the sewage box 24.

[0327] In some embodiments, when the cleaning device 100 is in the state of cleaning the cleaning component 22, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. When the cleaning device 100 is in the state of rinsing the wastewater box 24, the liquid supplied by the liquid supply system 70 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. The liquid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to rinse the wastewater box 24. Alternatively, the fluid supplied by the liquid supply system 70 and the gas source system 80 is injected into the clean water box 23 through the interface 63 and the replenishment port 231. The liquid and gas together form a bubble liquid. The bubble liquid passes through the clean water box 23 and enters the wastewater box 24 through the overflow port 235 to rinse the wastewater box 24 (especially the filter component 247). Please refer to the above description for details, which will not be repeated here.

[0328] Specifically, please refer to Figures 1, 5a and 5b. The base station 200 also includes a base station body 60 and a multi-channel connector 72, which is disposed on the base station body 60.

[0329] The base station body 60 is a component used to house other components on the base station 200 besides itself. The base station body 60 typically includes a base 61, a top 64, and a side wall 65. These three components form a semi-enclosed structure, with an opening 66 for the cleaning equipment 100 to enter and exit. The base 61 can be used to receive wastewater discharged from the cleaning equipment 100's sludge chamber 25115 (shown in Figure 13) and liquid generated by the base station 200's own liquid supply. Specifically, the base 61 has a liquid-containing area 611, which can be a groove on the base 61, used to at least contain wastewater discharged from the cleaning equipment 100, wastewater flowing in when the base station 200's liquid supply system 70 supplies liquid to the cleaning equipment 100 to clean the cleaning components 22, and wastewater generated by the liquid supply system 70's self-cleaning process.

[0330] A multi-port connector 72 is also disposed on the base station body 60. It can be part of the liquid supply system 70, part of the gas supply system 80, or a component independent of the liquid supply system 70 and the gas supply system 80. Specifically, the multi-port connector 72 includes at least two input interfaces 721, an output interface 723, and a fluid buffer chamber 723. Both the at least two input interfaces 721 and the output interface 723 are connected to the fluid buffer chamber 723. The at least two input interfaces 721 are also connected to the liquid channels of the liquid supply system 70 and / or the gas channels of the gas supply system 80, and the output interface 723 is connected to the corresponding interface 63. In one example, the liquid supply system 70 and the gas supply system 80 are connected to the fluid buffer chamber 723 through different input interfaces 721 of the multi-port connector 72, and output from the same output interface 723 to connect with the same corresponding interface 63. Fluid input from the different input interfaces 721 of the multi-port connector 72 can be mixed in the fluid buffer chamber 723 and then flow out through the output interface 723. The liquid supply system 70 can supply liquid to the interface 63 through the multi-port connector 72, and the gas supply system 80 can also supply gas to the interface 63 through the multi-port connector 72. If the liquid supply system 70 supplies liquid to the interface 63 through the multi-port connector 72 at the same time, the gas supply system 80 supplies gas to the interface 63 through the multi-port connector 72, the gas and liquid will mix in the fluid buffer chamber 723 of the multi-port connector 72 to form the aforementioned bubble liquid. The bubble liquid then enters the clean water box 23 through the interface 63 and the liquid replenishment port 231 for use as flushing wastewater box 24, flushing filter element 247, and / or discharging wastewater from wastewater box 24.

[0331] The base station 200 also includes a base station control board 90, which is a device for controlling the operation of various functional modules in the base station 200. The base station control board 90 typically includes a circuit board and a controller or processor mounted on the circuit board.

[0332] The liquid supply system 70 of the base station 200 will be described in detail below with reference to Figures 5a and 5b.

[0333] The liquid supply system 70 includes a clean water channel 71. The clean water channel 71 connects to the interface 63 and the clean water tank 711 inside the base station 200 or an external liquid source 713, such as municipal tap water. The clean water channel 71 is used to transport clean water. The clean water channel 71 includes an inlet 715 and an outlet 717 located at opposite ends. The inlet 715 of the clean water channel 71 connects to the clean water tank 711 or the external liquid source 713 of the base station, and the outlet 717 of the clean water channel 71 connects to an input interface 721 of a multi-port connector 72, thereby indirectly connecting to the interface 63 via the multi-port connector 72, so that the liquid supply system 70 can supply clean water to the clean water box 23 of the cleaning equipment 100. The explanation of the clean water tank 711 can be found in the previously mentioned "clean water box 23". In one example, the clean water tank 711 has one inlet and one outlet. The inlet of the clean water tank 711 is connected to the external liquid source 713, and the outlet of the clean water tank 711 is connected to the inlet 715 of the clean water channel 71. In another example, the clean water tank 711 has one inlet and one outlet. The inlet of the clean water tank 711 can be opened and closed for water replenishment, and the outlet of the clean water tank 711 is connected to the inlet 715 of the clean water channel 71. In this case, the base station 100 may not be connected to the external liquid source 713. The capacity of the clean water tank 711 is relatively large, and it can be replenished by the user periodically. Thus, the location of the base station 100 is not limited to being close to the external liquid source 713 and can be set up in any location. In other embodiments, the number of inlets and outlets of the clean water tank 711 can be set as needed and is not limited to this embodiment.

[0334] The liquid supply system 70 also includes a treatment liquid container 73 and a treatment liquid channel 74. The treatment liquid container 73 is used to store the treatment liquid. The treatment liquid is a liquid used in the field of cleaning technology to treat surfaces to be cleaned, including but not limited to cleaning solutions and conditioning solutions. The treatment liquid channel 74 connects the treatment liquid container 73 and at least one other input interface 721 of the multi-port connector 72 (an input interface 721 different from the input interface 721 connected to the clean water channel 711), thereby indirectly connecting to the interface 63 through the multi-port connector 72, so that the liquid supply system 70 can supply treatment liquid to the clean water box 23 of the cleaning equipment 100. For an explanation of the treatment liquid container 73, please refer to the "clean water box 23" mentioned above. Unlike the "clean water box 23", in this disclosure, the treatment liquid container 73 needs to have a separate filling port. Usually, the filling port is closed and is only opened for adding treatment liquid when it is used up (mostly manually, but it can also be automatic). The processing fluid container 73 may have one outlet connected to the processing fluid channel 74, in which case the processing fluid channel 74 is a unidirectional channel; alternatively, the processing fluid container 73 may have two openings, both of which are connected to the processing fluid channel 74, in which case the processing fluid channel 74 is a circulation channel. Alternatively, after the processing fluid in the processing fluid container 73 is used up, it can be replaced by a new processing fluid container 73 by the user.

[0335] Specifically, in some embodiments, the treatment fluid channel 74 includes a first treatment fluid channel 741, and the treatment fluid container 73 includes a first treatment fluid container 731. The first treatment fluid container 731 is used to contain a curing agent for maintaining the ground.

[0336] The first processing fluid channel 741 includes a first port 7411 and a second port 7413, which are connected to the input interface 721 of the multi-port connector 72. In one example, the first port 7411 and the second port 7413 are connected to the same input interface 721 of the multi-port connector 72. In another example, the first port 7411 and the second port 7413 are respectively connected to two different input interfaces 721 of the multi-port connector 72.

[0337] The first treatment fluid container 731 is connected between the first port 7411 and the second port 7413. The first treatment fluid channel 741 includes a first usage state and a second usage state. In the first usage state, the curing agent in the first treatment fluid container 731 flows into the multi-port connector 72 through the first port 7411, thereby indirectly connecting to the interface 63 through the multi-port connector 72, so that the liquid supply system 70 provides curing fluid to the clean water box 23 of the cleaning equipment 100. In the second usage state, the clean water in the clean water channel 71 sequentially flows through the multi-port connector 72, the first port 7411 and the second port 7413 to clean the first treatment fluid channel 741. The liquid after cleaning the first treatment fluid channel 741 flows through the second port 7413 to the multi-port connector 72 or is discharged to the liquid holding area 611 of the base 61.

[0338] Because the curing agent has high viscosity and poor fluidity, if the first treatment liquid channel 741 is left to stand for a period of time, the curing agent will accumulate inside, making it difficult to replenish the cleaning equipment 100 with curing liquid later. In this disclosure, the clean water in the clean water channel 71 can sequentially pass through the multi-port connector 72, the first port 7411, and the second port 7413 to clean the first treatment liquid channel 741. If the cleaning action of the first treatment liquid channel 741 is performed after each replenishment of the cleaning equipment 100 with curing liquid, the accumulation of curing agent in the first treatment liquid channel 741 can be avoided, ensuring that the curing liquid can still be supplied smoothly later. At this time, the liquid after cleaning the first treatment liquid channel 741 can be discharged from the second port 7413 into the liquid holding area 611 of the base 61. In addition, in some alternative embodiments, if the liquid after cleaning the first treatment liquid channel 741 flows to the multi-port connector 72 through the second port 7413, the liquid after cleaning the first treatment liquid channel 741 can be used as a maintenance liquid to replenish the cleaning equipment 100. Therefore, the action of cleaning the first treatment liquid channel 741 can be performed at the end of each time the maintenance liquid is replenished to the cleaning equipment 100, which not only improves the utilization rate of the maintenance agent and saves costs, but also saves the time of replenishing the maintenance liquid and improves the efficiency of replenishing the maintenance liquid.

[0339] Furthermore, when the first treatment liquid channel 741 is in its first operating state, the clean water in the clean water channel 71 can be controlled to be delivered to the multi-port connector 72, so that the curing agent and clean water can be mixed in the multi-port connector 72. The surface to be cleaned is not cured with pure curing agent, but requires a curing solution of a certain concentration. Therefore, when the first treatment liquid channel 741 is in its first operating state, the curing agent in the first treatment liquid container 731 flows into the multi-port connector 72 through the first port 7411. At the same time, the clean water in the clean water channel 71 is delivered to the multi-port connector 72, so that the curing agent and clean water can be mixed in the multi-port connector 72. Additionally, the required concentration of curing solution can be obtained by controlling the amount of clean water delivered to the multi-port connector 72.

[0340] In other embodiments, the treatment fluid channel 74 includes a second treatment fluid channel 743, and the treatment fluid container 73 includes a second treatment fluid container 733. The second treatment fluid container 733 is used to hold cleaning agent. The second treatment fluid container 733 has an outlet, which communicates with the inlet of the second treatment fluid channel 743. The outlet of the second treatment fluid channel 743 is connected to at least one other input interface 721 of the multi-port connector 72 (an input interface 721 that is different from the input interface 721 connected to the clean water channel 711 and the first treatment fluid channel 741), thereby indirectly connecting to the interface 63 through the multi-port connector 72, so that the liquid supply system 70 can supply cleaning fluid to the clean water box 23 of the cleaning device 100. It should be noted that the second treatment fluid channel 743 is not limited to the unidirectional channel in this embodiment, and can also adopt the same structure as the first treatment fluid channel 741. In this way, the cleaning agent can be prevented from accumulating in the second treatment fluid channel 743, ensuring that the cleaning fluid can still be supplied smoothly in the future.

[0341] It should be noted that in some embodiments, the processing liquid channel 74 may simultaneously include a first processing liquid channel 741 and a second processing liquid channel 743. Correspondingly, the processing liquid channel 74 may also simultaneously include a first processing liquid container 731 and a second processing liquid container 733. The specific structure and function are as described above.

[0342] Furthermore, the liquid supply system 70 also includes an adjustment device 75, which is disposed on the clean water channel 71 and / or the processed liquid channel 74. The adjustment device 75 is used to adjust the properties of the liquid entering the interface 63 so that the properties of the liquid output from the interface 63 to the clean water box 23 are preset properties. The liquid properties include at least one of the following: liquid temperature, liquid concentration, and liquid composition. The base station control board 90 can be electrically connected to the adjustment device 75 to control the operation of the adjustment device 75.

[0343] Specifically, in some embodiments, the regulating device 75 includes a first power unit 751. The first power unit 751 is disposed on the clean water channel 71 and is used to provide driving power for conveying clean water through the clean water channel 71 to the multi-connector 72. The base station control board 90 can control the first power unit 751 to turn on and off, and can also control the amount of clean water conveyed to the multi-connector 72 by controlling the start-up duration and / or flow rate of the first power unit 751. When the liquid supply system 70 conveys clean water to the multi-connector 72 through the clean water channel 71, the base station control board 90 controls the first power unit 751 to turn on; when the clean water channel 71 does not convey clean water to the multi-connector 72, the base station control board 90 controls the first power unit 751 to turn off. In one example, the first power unit 751 may be a water pump.

[0344] In some embodiments, the regulating device 75 may further include an electrolysis module 752, which is disposed on the clean water channel 71 and used to electrolyze the clean water in the clean water channel 71 to convert the clean water in the clean water channel 71 into electrolyzed water. Electrolysis of water can remove limescale. Specifically, water generates highly oxidizing hydroxide ions through electrolysis. These ions can decompose the minerals in the limescale, thereby achieving the effect of removing limescale. More specifically, during the electrolysis of the clean water in the clean water channel 71 by the electrolysis module 752, water molecules decompose into hydrogen ions and oxygen ions. Hydrogen ions accumulate at the cathode, and oxygen ions accumulate at the anode, ultimately generating hydrogen gas and oxygen gas. Hydrogen gas, as a reducing agent, can reduce metal ions, causing them to precipitate, thereby achieving a cleaning effect; oxygen gas, as an oxidizing agent, can oxidize organic matter into carbon dioxide and water, further achieving a cleaning effect. Because electrolysis of clean water can remove limescale, the clean water channel 71 will not be blocked by limescale and can always smoothly deliver clean water to the multi-port connector 72. The base station control board 90 can control the electrolysis module 752 to be turned on and off. When both the first power unit 751 and the electrolysis module 752 are turned on by the base station control board 90, the electrolysis module 752 electrolyzes clean water, and the liquid supply system 70 delivers the electrolyzed clean water to the multi-port connector 72 through the clean water channel 71; when the first power unit 751 is turned on by the base station control board 90 and the electrolysis module 752 is turned off, the liquid supply system 70 delivers unelectrolyzed clean water to the multi-port connector 72 through the clean water channel 71.

[0345] In some embodiments, the regulating device 75 may further include a heating module 753, which is disposed on the clean water channel 71 and used to heat the clean water in the clean water channel 71. In one example, the heating module 753 may be a heating coil, resistance wire, or heating film, etc. Since the dirt on the surface to be cleaned may be stubborn and difficult to clean, the heating module 753 is disposed on the clean water channel 71, and the liquid supply system 70 can provide hot water to the cleaning device 100 to wipe away stubborn dirt on the surface to be cleaned. The base station control board 90 can control the heating module 753 to be turned on and off. When the base station control board 90 controls both the first power unit 751 and the heating module 753 to be turned on, the heating module 753 heats the clean water, and the liquid supply system 70 delivers heated clean water to the multi-port connector 72 through the clean water channel 71; when the base station control board 90 controls the first power unit 751, the electrolysis module 752 and the heating module 753 to be turned on, the liquid supply system 70 delivers electrolyzed and heated clean water to the multi-port connector 72 through the clean water channel 71.

[0346] In some embodiments, the regulating device 75 may further include a second power unit 754 disposed on the processing fluid channel 74 and used to provide driving power for conveying the processing fluid through the processing fluid channel 74 to the multi-connector 72. The base station control board 90 can control the second power unit 754 to turn on and off, and can also control the amount of processing fluid conveyed to the multi-connector 72 by controlling the start-up duration and / or flow rate of the second power unit 754. In one example, the second power unit 754 may be a peristaltic pump. When the fluid supply system 70 conveys processing fluid to the multi-connector 72 through the processing fluid channel 74, the base station control board 90 controls the second power unit 754 to turn on; when the processing fluid channel 74 does not convey processing fluid to the multi-connector 72, the base station control board 90 controls the second power unit 754 to turn off. In one example, the number of second power units 754 is the same as the number of processing fluid channels 74. When the processing fluid channel 74 includes both a first processing fluid channel 741 and a second processing fluid channel 743, there are two second power units 754. One is disposed on the first processing fluid channel 741 to provide driving power for conveying the maintenance agent through the first processing fluid channel 741 to the multi-port connector 72, and the other is disposed on the second processing fluid channel 743 to provide driving power for conveying the cleaning agent through the second processing fluid channel 743 to the multi-port connector 72.

[0347] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, and the second power unit 754 on the first processing liquid channel 741 to be turned on, the electrolysis module 752 electrolyzes the clean water, and the second power unit 754 drives the curing agent on the first processing liquid channel 741 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed clean water to the multi-port connector 72 through the clean water channel 71 and delivers curing agent to the multi-port connector 72 through the first processing liquid channel 741. The curing agent and the electrolyzed clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of curing liquid to the cleaning equipment 100.

[0348] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, the heating module 753, and the second power unit 754 on the first processing liquid channel 741 to be turned on, the electrolysis module 752 electrolyzes the clean water, the heating module 753 heats the clean water, and the second power unit 754 drives the curing agent on the first processing liquid channel 741 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed and heated clean water to the multi-port connector 72 through the clean water channel 71 and the curing agent to the multi-port connector 72 through the first processing liquid channel 741. The curing agent and the electrolyzed and heated clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of curing liquid to the cleaning equipment 100.

[0349] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, and the second power unit 754 on the second processing liquid channel 743 to be turned on, the electrolysis module 752 performs electrolysis on the clean water, and the second power unit 754 drives the cleaning liquid on the second processing liquid channel 743 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed clean water to the multi-port connector 72 through the clean water channel 71 and delivers cleaning agent to the multi-port connector 72 through the second processing liquid channel 743. The cleaning agent and the electrolyzed clean water are mixed in the fluid buffer chamber 723 of the multi-port connector 72 and then enter the clean water box 23 through the interface 63 and the replenishment port 231 to complete the replenishment of cleaning liquid to the cleaning equipment 100.

[0350] When the base station control board 90 controls the first power unit 751, the electrolysis module 752, the heating module 753, and the second power unit 754 on the second processing liquid channel 743 to be turned on, the electrolysis module 752 electrolyzes the clean water, the heating module 753 heats the clean water, and the second power unit 754 drives the cleaning agent on the second processing liquid channel 743 to be delivered to the multi-port connector 72. Then the liquid supply system 70 delivers electrolyzed and heated clean water to the multi-port connector 72 through the clean water channel 71 and delivers cleaning agent to the multi-port connector 72 through the second processing liquid channel 743. The cleaning agent and the electrolyzed and heated clean water are mixed in the fl...

Claims

A cleaning apparatus comprising a cleaning member for wiping a surface to be cleaned, and a liquid system, wherein The fluid circuit system includes: A clear water box is provided with a liquid outlet and an overflow outlet, wherein the liquid outlet is positioned at a lower height than the overflow outlet on the clear water box; The first passage is provided with a first inlet and a first outlet. The first inlet is connected to the liquid outlet, and the first outlet is used to allow the liquid from the clear water box to flow out from the first passage. A first power unit, the first power unit being used to provide driving power for discharging liquid from the water tank into the first passage; and The second passage is provided with a second inlet and a second outlet. The second inlet is connected to the overflow outlet, and the second outlet is used to allow the liquid from the clear water box to flow out from the second passage. When the cleaning device is in the state of mopping the surface to be cleaned, the liquid in the clean water box is driven by the first power device to flow from the liquid outlet into the first passage and out from the first outlet to supply liquid to the cleaning component; When the cleaning equipment is in the state of cleaning the cleaning component, liquid is supplied to the clean water box through an external liquid source so that the liquid level in the clean water box exceeds the overflow port. When this happens, the liquid in the clean water box overflows from the overflow port into the second passage and flows out from the second outlet to drain liquid to the cleaning component and clean it. The cleaning apparatus according to claim 1, wherein When the cleaning device is in the state of mopping the surface to be cleaned, the liquid level in the clean water box does not exceed the overflow port. The cleaning apparatus according to claim 1, wherein The first power unit is located at the first passage or the liquid outlet; and / or, When the cleaning device is in the state of cleaning the cleaning component, and the liquid level supplied by the external liquid source to the water tank exceeds the overflow port, the first power device drives the liquid in the water tank to flow from the outlet into the first passage and out from the first outlet to drain the liquid to the cleaning component. The cleaning apparatus according to any one of claims 1 to 3, wherein The second passage is a pipe through which liquid overflowing from the overflow port flows to the pipe and flows directly out of the pipe to drain liquid to the cleaning component and clean the cleaning component. The cleaning apparatus according to claim 1, wherein The second path is equipped with: The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used to allow liquid from an external liquid source to enter the first chamber, and the liquid outlet is used to allow liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain sewage. The second chamber is provided with a communication port for sewage on the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. The second power unit is connected to the drain port and is used to provide driving power to drive the sewage on the cleaning component into the second chamber, and driving power to discharge the liquid in the clean water box into the second passage. When the cleaning device is in the state of cleaning the cleaning component, and the liquid level supplied by the external liquid source to the water box exceeds the overflow port, the second power device drives the liquid in the water box to overflow from the overflow port to the second passage, and flows out from the second passage in sequence through the inlet, the first chamber, the outlet, and the second outlet to discharge liquid to the cleaning component and clean the cleaning component. The cleaning apparatus according to claim 5, wherein When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, and draws air from the first chamber and the second chamber to make the second chamber negative pressure, thereby driving the sewage on the cleaning component into the second chamber. The cleaning apparatus according to claim 5, wherein The liquid circuit system also includes a wastewater box; both the first chamber and the second chamber are formed on the wastewater box; And / or, along the height direction of the cleaning equipment, the first chamber is located above the second chamber; And / or, when the second power device is off and the liquid in the water box overflows from the overflow port into the first chamber, at least a portion of the liquid in the first chamber is discharged into the second chamber through the through hole between the first chamber and the second chamber. The cleaning equipment according to any one of claims 5 to 7, wherein, A filter element is provided at the through hole between the first chamber and the second chamber. The first chamber and the second chamber are in fluid communication through the holes in the filter element. The filter element is used to prevent at least part of the solid waste in the second chamber from entering the first chamber. In the case where the second power device is off and the liquid level supplied by the external liquid source to the water box exceeds the overflow port, the liquid in the water box overflows from the overflow port into the first chamber, passes through the filter element, and enters the second chamber. The cleaning apparatus according to claim 7, wherein The liquid circuit system also includes a wastewater box; the wastewater box includes a box body and a cover, the cover is disposed on the top wall of the box body, the through hole is disposed on the top wall of the box body, the second chamber is formed in the box body, and the first chamber is located in the space enclosed by the cover and the box body. The cleaning apparatus according to claim 9, wherein A sealing structure is provided between the cover and the box, the sealing structure being at least used to form the first chamber between the cover and the box, and the through hole is located within the area enclosed by the sealing structure. The cleaning apparatus according to claim 10, wherein The box body is also provided with a third chamber, which is independent of the second chamber and is connected to the second power device. The top wall of the box body is provided with a third chamber entrance that is connected to the third chamber, and the third chamber entrance is located inside the first chamber. When the cleaning device is in the state of cleaning the cleaning component, and the liquid level supplied by the external liquid source to the water tank exceeds the overflow port, the second power device drives the liquid in the water tank to overflow from the overflow port to the first chamber, and then flows to the cleaning component through the inlet of the third chamber, the third chamber, the drain port, and the second power device. The cleaning apparatus according to claim 11, wherein The first chamber is divided into a first sub-chamber and a second sub-chamber by the sealing structure. The through hole is located in the first sub-chamber, and the inlet of the third chamber is located in the second sub-chamber. The sealing structure has a fluid outlet communicating with the first sub-chamber and a fluid inlet communicating with the second sub-chamber. The fluid outlet and the fluid inlet are spaced apart and in fluid communication. The cleaning apparatus according to claim 5, wherein Also includes: The recycling component includes a scraping part and a dirt-receiving cavity, wherein the scraping part is used to abut against the cleaning component to scrape dirt on the cleaning component into the dirt-receiving cavity; The connecting port of the second chamber is connected to the dirt-containing chamber. The connecting port is used to allow wastewater on the cleaning component to enter the second chamber through the dirt-containing chamber, and to allow wastewater in the second chamber to enter the dirt-containing chamber and be discharged to the outside of the cleaning equipment. Wherein, the rotation axis of the cleaning component is parallel to the surface to be cleaned; and / or, the cleaning component includes a tracked cleaning component or a roller-type cleaning component. The cleaning apparatus according to claim 13, wherein The sludge-holding cavity extends along the rotation axis of the cleaning component. One end of the sludge-holding cavity along its length is provided with a first sewage outlet, and the other end of the sludge-holding cavity along its length is provided with a second sewage outlet. The first sewage outlet is connected to the communication port of the second chamber. The cleaning device also includes a control structure, which is used to connect the inside of the sludge-holding cavity with the outside when the cleaning device is in the sewage discharge state. The cleaning apparatus according to claim 5, wherein The flow rate of the second power unit is greater than the flow rate of the first power unit; And / or, the first power unit includes a peristaltic pump, and the second power unit includes a water-air pump. The cleaning apparatus according to claim 1, wherein The cleaning component includes a tracked cleaning component or a roller cleaning component, and the hydraulic system further includes: The water spray bar has a first outlet of the first passage connected to the water spray bar, and a second outlet of the second passage connected to the water spray bar. The water spray bar has multiple spray nozzles, which are spaced apart along the rotation axis of the cleaning component. A cleaning apparatus comprising a cleaning member for wiping a surface to be cleaned, and a liquid system, wherein The fluid circuit system includes: The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used to allow liquid from an external liquid source to enter the first chamber, and the liquid outlet is used to allow liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain sewage. The second chamber is provided with a communication port for sewage on the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. A second power unit is connected to the first chamber and is used to provide driving power to drive the sewage on the cleaning component into the second chamber, and to provide driving power to discharge the liquid in the first chamber into the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component. The cleaning apparatus of claim 17, wherein, The liquid circuit system further includes a clean water box and a wastewater box; both the first chamber and the second chamber are formed on the wastewater box; And / or, when the second power device is off, and the liquid in the water tank overflows from the overflow port of the water tank into the first chamber, at least a portion of the liquid in the first chamber is discharged into the second chamber through the through hole between the first chamber and the second chamber. A control method of a cleaning device, applied to a cleaning device, the cleaning device is provided with a cleaning piece and a sewage box, the sewage box is used for containing sewage generated by the cleaning piece cleaning a to-be-cleaned surface, wherein, The cleaning equipment includes a dirt detection sensor, and the control method includes: The degree of soiling in the wastewater along the wastewater recycling path from the cleaning unit to the wastewater box is detected by the soiling detection sensor; and The fluid parameters and supply strategy for the fluid supplied to the wastewater box are determined based on the degree of contamination of the wastewater. The control method according to claim 19, wherein The method for determining the fluid supply strategy to the wastewater tank based on the degree of contamination of the wastewater includes: If the degree of contamination of the wastewater is less than or equal to a first preset contamination threshold, it is determined to provide positive pressure gas to the wastewater box to perform sewage discharge. According to the control method of claim 19, wherein, The step of determining the fluid parameters and supply strategy to be provided to the wastewater tank based on the degree of contamination of the wastewater includes: When the degree of contamination of the wastewater is greater than a first preset contamination threshold and less than or equal to a second preset contamination threshold, it is determined that gas should first be supplied to the wastewater box to discharge the wastewater, and then liquid should be supplied to the wastewater box to flush the wastewater. At least one of the following is determined based on the degree of contamination of the wastewater: liquid pressure, liquid flow rate, and liquid supply duration. According to the control method of claim 19, wherein, The step of determining the fluid parameters and supply strategy for the fluid supplied to the wastewater tank based on the degree of contamination of the wastewater includes: When the degree of contamination of the wastewater exceeds a second preset contamination threshold, the wastewater box is first supplied with a gas-liquid mixture to flush it. At least one of the following parameters is determined based on the degree of contamination: pressure of the gas-liquid mixture, flow rate of the gas-liquid mixture, supply duration of the gas-liquid mixture, and the ratio of gas to liquid. Then, gas is supplied to the wastewater box to discharge it. Finally, liquid is supplied to flush the wastewater box, and at least one of the following parameters is determined based on the degree of contamination: pressure of the liquid, flow rate of the liquid, and supply duration of the liquid. A cleaning system, wherein, include: A base station and cleaning equipment, wherein the base station is used for maintaining the cleaning equipment; The cleaning equipment includes a cleaning component and a liquid system. The cleaning component is used to mop the surface to be cleaned, and the liquid system includes: A clear water box is provided with a liquid outlet and an overflow outlet, wherein the liquid outlet is positioned at a lower height than the overflow outlet on the clear water box; The first passage is provided with a first inlet and a first outlet. The first inlet is connected to the liquid outlet, and the first outlet is used to allow the liquid from the clear water box to flow out from the first passage. A first power unit, the first power unit being used to provide driving power for discharging liquid from the water tank into the first passage; and The second passage is provided with a second inlet and a second outlet. The second inlet is connected to the overflow outlet, and the second outlet is used to allow the liquid from the clear water box to flow out from the second passage. When the cleaning device is in the state of mopping the surface to be cleaned, the liquid in the clean water box is driven by the first power device to flow from the liquid outlet into the first passage and out from the first outlet to supply liquid to the cleaning component; When the cleaning equipment is in the state of cleaning the cleaning component, liquid is supplied to the clean water box through an external liquid source so that the liquid level in the clean water box exceeds the overflow port. When this happens, the liquid in the clean water box overflows from the overflow port into the second passage and flows out from the second outlet to drain liquid to the cleaning component and clean it. A cleaning system, wherein, It includes a base station and cleaning equipment, wherein the base station is used for maintaining the cleaning equipment; The cleaning equipment includes a cleaning component and a liquid system. The cleaning component is used to mop the surface to be cleaned, and the liquid system includes: The first chamber is provided with a liquid inlet and a liquid outlet. The liquid inlet is used to allow liquid from an external liquid source to enter the first chamber, and the liquid outlet is used to allow liquid entering the first chamber to be discharged to the cleaning component. The second chamber is used to contain sewage. The second chamber is provided with a communication port for sewage on the cleaning component to enter the second chamber. The second chamber is separated from the first chamber but is fluidly connected to it through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. A second power unit is connected to the first chamber and is used to provide driving power to drive the sewage on the cleaning component into the second chamber, and to provide driving power to discharge the liquid in the first chamber into the cleaning component. When the cleaning equipment is in the state of cleaning the surface to be cleaned, the second power unit is in the start state, drawing air out of the first chamber and the second chamber to create a negative pressure state in the second chamber, thereby driving the wastewater on the cleaning component into the second chamber; when the cleaning equipment is in the state of cleaning the cleaning component, the first chamber is connected to an external liquid source to supply liquid to the first chamber, and the second power unit is in the start state to draw the liquid from the first chamber to the cleaning component. The cleaning system according to claim 24, wherein, The liquid circuit system further includes a clean water box and a wastewater box; both the first chamber and the second chamber are formed on the wastewater box; And / or, when the second power device is off, and the liquid in the water tank overflows from the overflow port of the water tank into the first chamber, at least a portion of the liquid in the first chamber is discharged into the second chamber through the through hole between the first chamber and the second chamber. A cleaning device includes a cleaning component and a fluid system, wherein the cleaning component is used to mop the surface to be cleaned, wherein... The liquid circuit system of the cleaning equipment includes: The water container has an overflow outlet; and The wastewater box is provided with an inlet that communicates with the overflow port. The inlet is positioned above the maximum allowable liquid level of the wastewater box. The wastewater box is used to recycle the wastewater generated by the cleaning component. When the liquid level of the clean water box exceeds the overflow port due to the external liquid source supplying the clean water box, the liquid overflowing from the overflow port in the clean water box enters the wastewater box through the inlet to rinse the wastewater box. The cleaning equipment according to claim 26, wherein, The cleaning equipment is used to interface with a base station, the base station is used to maintain the cleaning equipment, the base station is equipped with a liquid supply system, and the external liquid source includes the liquid supply system. The cleaning equipment according to claim 27, wherein, The wastewater box is equipped with: The connection port is provided, and the height of the liquid inlet is higher than the height of the connection port. When the cleaning device is in the state of wiping the surface to be cleaned, the wastewater on the cleaning component enters the wastewater box through the connection port. When the cleaning device is in the state of discharging wastewater, the wastewater in the wastewater box flows out of the wastewater box through the connection port. The cleaning equipment according to claim 28, wherein, The wastewater box is connected to a second power unit. When the cleaning equipment is cleaning the surface to be cleaned, the second power unit is in the open state and draws negative pressure into the wastewater box to provide power to draw the wastewater on the cleaning components into the wastewater box. When the cleaning equipment is in the sewage discharge state, the second power unit is in the closed state and provides positive pressure gas to the wastewater box through the base station to provide power to discharge the wastewater in the wastewater box to the outside of the wastewater box. Alternatively, the second power unit is in the open state and provides positive pressure gas to the wastewater box to provide power to discharge the wastewater in the wastewater box to the outside of the wastewater box. The cleaning equipment according to claim 29, wherein, The wastewater box is equipped with a filter element, which is used to prevent solid waste in the wastewater box from entering the second power device. The liquid overflowing from the overflow port of the clean water box can at least rinse the filter element to clean it. The cleaning equipment according to claim 29, wherein, The wastewater box includes a first chamber and a second chamber. The second chamber is used to contain wastewater. The first chamber and the second chamber are separated from each other and are fluidly connected through a through hole. The maximum allowable liquid level in the second chamber is lower than the location of the through hole. A filter element is provided at the through hole. The second power device is connected to the first chamber. The liquid inlet is located in the first chamber, and the connection port is located in the second chamber. The filter element is used to prevent at least part of the solid waste in the second chamber from entering the first chamber. And / or, the second power unit includes a water-air pump. The cleaning equipment according to claim 31, wherein, In the height direction of the wastewater box, the first chamber is located above the second chamber, and the through hole is located on the top wall of the second chamber. The cleaning equipment according to claim 30 or 31, wherein, The base station is also equipped with a gas source system, which is used to output gas and to communicate with the clean water box and / or the wastewater box when the base station is connected to the cleaning equipment. When the base station is connected to the cleaning equipment and the second power device is off, the base station provides a gas-liquid mixture to the wastewater box through the gas source system and the liquid supply system to at least rinse the filter element. The cleaning equipment according to claim 28, wherein, The fluid circuit system also includes: The recycling component includes a scraping part and a dirt-receiving cavity, wherein the scraping part is used to abut against the cleaning component to scrape dirt on the cleaning component into the dirt-receiving cavity; The wastewater box has a connecting port that is connected to the sludge-containing cavity. The connecting port is used to allow wastewater on the cleaning component to enter the wastewater box through the sludge-containing cavity, and to allow wastewater in the wastewater box to be discharged out of the cleaning equipment through the sludge-containing cavity. The cleaning components include tracked cleaning components or roller-type cleaning components; The sludge-holding cavity extends along the rotation axis of the cleaning component. One end of the sludge-holding cavity along its length is provided with a first sewage outlet, and the other end of the sludge-holding cavity along its length is provided with a second sewage outlet. The first sewage outlet is connected to the sewage box, and the second sewage outlet is provided with a drain valve, which is used to open when the cleaning equipment is in the sewage discharge state. The cleaning equipment according to claim 34, wherein, A dirt detection sensor is provided on the wastewater recycling path from the cleaning component to the wastewater box. The dirt detection sensor is used to detect the degree of dirtiness of the wastewater on the wastewater recycling path. The cleaning equipment also includes an equipment control board, which is electrically connected to the dirt detection sensor. When the cleaning equipment is connected to the base station, the equipment control board is used to determine the fluid parameters and supply strategy of the fluid supplied to the wastewater box based on the degree of dirt detected by the dirt detection sensor. The cleaning equipment according to any one of claims 26-32 and 34-35, wherein, The wastewater box is equipped with a stirring device. When the cleaning equipment is in the sewage discharge state, the stirring device stirs the wastewater in the wastewater box. The top wall of the wastewater box is equipped with a driving device, and the stirring device is connected to the driving device. The rotating shaft of the stirring device extends from the top wall of the wastewater box toward the inside of the wastewater box. The cleaning equipment according to any one of claims 26-32 and 34-35, wherein, The wastewater box is equipped with a water full detection device, which is triggered when the liquid level in the wastewater box reaches a set level. The cleaning equipment according to claim 37, wherein, The water level detection device includes: A floating element is disposed inside the wastewater box, and a detection element is provided on the floating element; A guide post is connected to the top wall of the wastewater box. The floating component is sleeved on the outside of the guide post. A limiting part is provided at the end of the guide post away from the top wall of the wastewater box, and the limiting part is used to prevent the floating component from detaching from the guide post; and A sensing element is disposed on the wall of the wastewater box and is used to sense the position of the detection element. A cleaning system, wherein, The cleaning system includes cleaning equipment and a base station. The cleaning equipment includes a cleaning component and a liquid circuit system. The cleaning component is used to mop the surface to be cleaned. The cleaning equipment is used to interface with the base station. The base station is used to maintain the cleaning equipment. The base station is equipped with a liquid supply system for supplying liquid. The liquid circuit system of the cleaning equipment includes: The clear water container is equipped with a replenishment port and an overflow port; and A wastewater box, connected to the overflow port, is used to recycle wastewater generated by the cleaning device. When the base station is connected to the cleaning equipment and the liquid supply system supplies liquid to the clean water box until the liquid level exceeds the overflow port, the liquid overflowing from the overflow port in the clean water box enters the wastewater box to rinse the wastewater box. The base station is also provided with a docking interface connected to the liquid supply system. The docking interface is used to connect to the replenishment port. When the cleaning equipment is docked at the base station and the docking interface is connected to the replenishment port, the liquid supply system of the base station supplies liquid to the clean water box of the cleaning equipment. When the liquid supply system supplies liquid to the clean water box until the liquid level exceeds the overflow port, the liquid in the clean water box overflows into the wastewater box. A cleaning system, wherein, include: A cleaning device includes a cleaning component for mopping a surface to be cleaned. The cleaning device also includes a clean water tank and a wastewater tank. The clean water tank has a replenishment port and an overflow port, and the clean water tank is connected to the wastewater tank through the overflow port. The wastewater tank is used to collect wastewater generated by the cleaning component. A base station for maintaining the cleaning equipment, the base station being provided with an interface for connecting and communicating with the replenishment port; Wherein, when the interface is connected to the replenishment port, the cleaning equipment includes at least a replenishment state and a discharge state; when the cleaning equipment is in the replenishment state, the liquid provided by the base station is injected into the clean water box through the interface and the replenishment port; when the cleaning equipment is in the discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port, and at least a portion of the fluid passes through the clean water box and enters the wastewater box through the overflow port to provide positive pressure to the wastewater box, thereby discharging the wastewater in the wastewater box to the outside of the wastewater box. The cleaning system according to claim 40, wherein, The base station is equipped with a liquid supply system for providing liquid and a gas supply system for providing gas; When the cleaning equipment is in the replenishment state, the liquid supplied by the liquid supply system is injected into the clean water box through the docking port and the replenishment port. When the cleaning equipment is in the sewage discharge state, the liquid and / or the gas supplied by the gas source system and / or the liquid supply system are injected into the clean water box through the docking port and the replenishment port. At least a portion of the liquid and / or the gas passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box is discharged to the outside of the sewage box. The cleaning system according to claim 41, wherein, There is one interface, and both the gas source system and the liquid supply system are connected to the same interface and are connected to the same liquid replenishment port through the same interface. And / or, the cleaning component is a tracked cleaning component or a roller cleaning component. The cleaning system according to claim 41, wherein, The cleaning equipment is provided with a sewage discharge channel for discharging waste from the sewage box. The sewage discharge channel is provided with a control structure for controlling the opening and closing of the sewage discharge channel. When the cleaning equipment is in the sewage discharge state, the control structure opens the sewage discharge channel. The cleaning system according to claim 41, wherein, The overflow outlet is located above the midline of the height of the water tank and near the top of the water tank; and / or, A control valve is provided on the communication passage between the clean water box and the wastewater box. The control valve is used to open when the cleaning equipment is in the sewage discharge state to allow the fluid in the clean water box to enter the wastewater box, and to close when the cleaning equipment is in the liquid replenishment state to prevent the fluid in the clean water box from entering the wastewater box. The cleaning system according to claim 42, wherein, Along the forward direction of the cleaning device, the cleaning device includes opposing front and rear sides; The cleaning device is also equipped with casters or support wheels. The water tank and the casters, or the water tank and the support wheels, are both located on the rear side of the cleaning device. In the projection in a plane perpendicular to the forward direction of the cleaning device, the projection of the casters or the support wheels is located below the projection of the water tank. In the projection in a plane perpendicular to the height direction of the cleaning device, the geometric center of the projection of the casters or the support wheels is located within the projection of the water tank. The cleaning system according to claim 45, wherein, The cleaning device is provided with an injection connector on the rear side wall, and the injection connector is provided with an injection port, which is connected to the liquid replenishment port of the clean water box; The geometric center of the caster wheel or the support wheel is located on the center line of the width direction of the cleaning equipment. Along the width direction of the cleaning equipment, the injection port on the injection connector is located on one side of the caster wheel or the support wheel and is spaced apart from the caster wheel or the support wheel. The cleaning system according to claim 46, wherein, The injection connector is also provided with blind holes, which are symmetrically arranged on both sides of the caster wheel or the support wheel along the width direction of the cleaning equipment, along with the injection port. The cleaning system according to claim 41, wherein, The wastewater box is connected to a second power unit and a filter element. When the cleaning equipment is cleaning the surface to be cleaned, the second power unit is in the open state and draws negative pressure into the wastewater box to provide the power to draw the wastewater on the cleaning element into the wastewater box. The filter element is used to prevent solid waste in the wastewater box from entering the second power unit. When the interface is connected to the replenishment port, the cleaning equipment also includes a state for rinsing the wastewater box. When the cleaning equipment is in the state of rinsing the wastewater box, the liquid provided by the liquid supply system is injected into the clean water box through the interface and the replenishment port, and the gas provided by the gas source system is injected into the clean water box through the interface and the replenishment port. The liquid and the gas together form a bubble liquid to rinse the filter element in the wastewater box. The cleaning system according to any one of claims 41-48, wherein, The gas supply system includes: Gas extraction device, used to provide a gas source; The control device is connected to the gas pumping device via a gas supply pipe and to the docking interface via a fourth pipeline assembly, and is used to control the connection and disconnection between the gas supply pipe and the fourth pipeline assembly. When the cleaning equipment is in the sewage discharge state, the control device controls the air supply pipe and the fourth pipeline assembly to be connected, and the gas extraction device supplies gas to the clean water box through the air supply pipe, the control device, the fourth pipeline assembly, the docking port and the liquid replenishment port. The cleaning system according to claim 49, wherein, The base station also includes: A wastewater tank is used to store liquid and is connected to a liquid-containing area outside the wastewater tank via a liquid-drawing pipe to draw in liquid and / or connected to the outside of the base station via a liquid-draining pipe to discharge liquid. The liquid-drawing pipe passes through the control device, which is also used to control the opening and closing of the liquid-drawing pipe. After the cleaning equipment returns to the base station, the wastewater discharged from the wastewater box enters the liquid-containing area outside the wastewater tank. The control device is also connected to the wastewater tank via a second pipeline assembly and is used to control the opening and closing between the gas supply pipe and the second pipeline assembly. When the cleaning equipment is in the sewage discharge state, the control device controls the base station to be in the sewage pumping state. When the base station is in the sewage pumping state, the control device controls the liquid pumping pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, and the gas pumping device together form a liquid pumping passage. The gas pumping device provides negative pressure to the liquid pumping passage so that the liquid in the liquid-containing area is pumped into the sewage tank through the liquid pumping pipe. The cleaning system according to any one of claims 41 to 48, wherein, The liquid supply system includes: A clean water channel connects the interface to the clean water tank inside the base station and / or the liquid source outside the base station, for transporting clean water; The gas supply system includes: An exhaust channel, connected to the gas extraction device of the gas source system, is used to discharge gas from the gas extraction device to the outside of the base station; and A multi-port connector includes an output interface and at least two input interfaces, wherein the output interface is connected to the output interface, and the outlet of the clean water channel and the outlet of the exhaust channel are respectively connected to different input interfaces. The cleaning system according to claim 51, wherein, The liquid supply system also includes: Processing fluid container, used to store processing fluid; The processing fluid channel connects the processing fluid container and at least one other input interface of the multi-port connector; and The multi-port connector includes a fluid buffer chamber, through which fluids input from different input ports of the multi-port connector can be mixed and then flow out through the output port. The cleaning system according to claim 52, wherein, The liquid supply system further includes an adjustment device, which is disposed on the clean water channel and / or the treatment liquid channel, for adjusting the properties of the liquid entering the interface so that the properties of the liquid output from the interface to the clean water box are preset properties, wherein the properties of the liquid include at least one of the following: the temperature of the liquid, the concentration of the liquid, and the composition of the liquid. The cleaning system according to claim 53, wherein, The regulating device includes: A first power unit is disposed on the clean water channel and is used to provide driving power for conveying clean water through the clean water channel to the multi-port connector. The amount of clean water conveyed to the multi-port connector is controlled by controlling the start-up duration and / or the flow rate of the first power unit; and / or, The regulating device includes: an electrolysis module disposed on the clear water channel and used to electrolyze the clear water in the clear water channel to convert the clear water in the clear water channel into electrolyzed water; and / or, The regulating device includes a heating module, which is disposed on the clean water channel and is used to heat the clean water in the clean water channel. The cleaning system according to claim 53, wherein, The regulating device includes: The second power unit is disposed on the processing fluid channel and is used to provide driving power to transport the processing fluid through the processing fluid channel to the multi-port connector. The amount of processing fluid transported to the multi-port connector is controlled by controlling the start-up time and / or the flow rate of the second power unit. The cleaning system according to claim 52, wherein, The processing fluid channel includes a first processing fluid channel, and the processing fluid container includes a first processing fluid container; The first processing fluid channel includes a first port and a second port, which are respectively connected to the input interface of the multi-port connector; The first processing liquid container is connected between the first port and the second port. The first processing liquid channel includes a first usage state and a second usage state. In the first usage state, the liquid in the first processing liquid container flows into the multi-port connector through the first port. In the second usage state, the clean water in the clean water channel flows sequentially through the multi-port connector, the first port and the second port to clean the first processing liquid channel. The liquid after cleaning the first processing liquid channel flows to the multi-port connector through the second port. The cleaning system according to claim 56, wherein, The first treatment liquid container is used to hold the ground maintenance agent. When the first treatment liquid channel is in the first use state, the clean water in the clean water channel is controlled to be delivered to the multi-port connector so that the maintenance agent and the clean water are mixed in the multi-port connector. The cleaning system according to claim 52, wherein, The treatment fluid channel includes a second treatment fluid channel, and the treatment fluid container includes a second treatment fluid container, which is used to contain cleaning agent. The cleaning system according to claim 40, wherein, The cleaning equipment further includes a recovery component, which comprises a scraping part and a dirt-receiving cavity. The scraping part is used to abut against the cleaning component to scrape dirt from the cleaning component into the dirt-receiving cavity. The wastewater box is provided with: The inlet is connected to the overflow outlet; and A connecting port is connected to the dirt-containing cavity, and the liquid inlet is set at a height higher than the connecting port. When the cleaning equipment is in the sewage discharge state, the fluid provided by the base station is injected into the clean water box through the interface and the replenishment port. At least part of the fluid passes through the clean water box and enters the sewage box through the overflow port, so that the sewage in the sewage box flows out from the communication port into the sewage holding chamber. The cleaning system according to claim 59, wherein, The base station also includes: A base for receiving wastewater discharged from the sludge chamber; A wastewater tank for storing liquid, connected to the base via a suction pipe for drawing in liquid and / or connected to the outside via a drain pipe for discharging liquid; and Gas source system, the gas source system comprising: Gas extraction device, used to provide a gas source; The control device is connected to the gas extraction device via a gas supply pipe and to the sewage tank via a second pipeline assembly. It is used to control the on / off connection between the gas supply pipe and the second pipeline assembly. The liquid extraction pipe passes through the control device, which also controls the on / off connection of the liquid extraction pipe. The liquid extraction pipe, the sewage tank, the second pipeline assembly, the control device, and the gas extraction device together form a liquid extraction passage. The cleaning system according to claim 40, wherein, The interface is directly connected to the replenishment port, and a one-way self-locking valve is provided at the interface or the replenishment port; or... The interface and the replenishment port are indirectly connected via a pipe, and a one-way self-locking valve is provided at the interface, the replenishment port or inside the pipe; When the interface and the replenishment port are not connected and the one-way self-locking valve is closed, the interface and the replenishment port are not in communication. When the interface is connected to the replenishment port and the one-way self-locking valve is open, the interface is connected to the replenishment port. The cleaning system according to claim 40, wherein, The water box is also provided with a liquid outlet, and the overflow outlet is set at a higher height on the water box than the liquid outlet is set at a higher height on the water box. The cleaning equipment also includes: The first passage is provided with a first inlet and a first outlet. The first inlet is connected to the liquid outlet, and the first outlet is used to supply liquid to flow out of the first passage. The first passage is provided with a first power device, which is used to provide driving power to discharge the liquid in the clear water box from the first passage. Before the base station supplies liquid to the water tank through the liquid replenishment port to put the cleaning equipment into the liquid replenishment state, the first power unit drives the liquid in the water tank to be discharged out of the water tank through the first passage. A type of base station, wherein, include: Base station body; and A gas supply system, wherein the gas supply system is installed on the base station body, and the gas supply system includes: Gas extraction device, used to provide a gas source; A wastewater tank is used to store liquids and is connected to an external liquid source via a pumping pipe to draw in liquids and to the outside via a draining pipe to discharge liquids. A valve assembly is disposed between the outlet of the wastewater tank and the outlet of the drain pipe. Opening or closing the valve assembly controls the connection or disconnection between the outlet and the drain pipe. The control device is connected to the gas pumping device through the gas supply pipe and to the valve assembly through the first pipeline assembly. The liquid extraction pipe passes through the control device. The control device is used to control the opening or closing of the liquid extraction pipe and the opening or closing of the gas supply pipe and the first pipeline assembly. When the control device is in the pre-liquid extraction state, the control device controls the gas supply pipe to be connected to the first pipeline assembly, and the gas extraction device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly closes to disconnect the outlet and the discharge outlet. When the control device is in the pre-drainage state, the control device controls the gas supply pipe to be connected to the first pipeline assembly. The gas pumping device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly opens to connect the outlet and the discharge outlet. The base station according to claim 63, wherein, The control device is also connected to the sewage tank via a second pipeline assembly and is used to control the connection or disconnection between the gas supply pipe and the second pipeline assembly; When the control device is in the formal liquid pumping state, the control device controls the liquid pumping pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid pumping pipe, the sewage tank, the second pipeline assembly, the control device, the gas supply pipe and the gas pumping device together form a liquid pumping passage. The gas pumping device provides negative pressure gas to the liquid pumping passage so that the sewage tank can be pumped into the liquid pumping pipe. When the control device is in the formal drainage state, the control device controls the gas supply pipe and the second pipeline assembly to be connected. The gas extraction device, the gas supply pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly and the drainage pipe together form a drainage passage. The gas extraction device provides positive pressure gas to the drainage passage so that the sewage tank discharges liquid to the outside through the drainage pipe. The base station according to claim 64, wherein, The control device is also connected to the outside atmosphere through a third pipeline assembly and is used to control the connection or disconnection between the gas pipeline and the third pipeline assembly. When the control device is in the formal drainage state, the control device controls the gas supply pipe and the third pipeline assembly to be connected. The third pipeline assembly, the control device, the gas supply pipe and the gas extraction device together form a balanced passage. The gas extraction device provides negative pressure gas to the balanced passage to draw in external gas. The base station according to claim 64, wherein, The control device is also connected to the clean water box of the cleaning equipment through the fourth pipeline assembly, and is used to control the connection or disconnection between the gas supply pipe and the fourth pipeline assembly; When the control device is in the formal liquid pumping state, the control device controls the gas delivery pipe and the fourth pipeline assembly to be connected. The gas pumping device, the gas delivery pipe, the control device and the fourth pipeline assembly together form an air pumping passage. The gas pumping device provides positive pressure gas to the air pumping passage to deliver it to the clear water box. The base station according to claim 64, wherein, After the control device switches from the pre-liquid extraction state to the formal liquid extraction state or from the pre-drainage state to the formal liquid drainage state, the control device controls the gas delivery pipe to disconnect from the first pipeline assembly. The base station according to claim 64, wherein, When the control device is in the zero position, the control device controls the liquid extraction tube to be connected and controls the gas delivery tube to be connected to the first pipeline assembly, the second pipeline assembly, the third pipeline assembly and the fourth pipeline assembly; In response to a liquid extraction command, the gas extraction device operates, and the control device switches from the zero-position state to the pre-extraction state, and then switches from the pre-extraction state to the formal extraction state; when the liquid level in the wastewater tank reaches a preset level, the gas extraction device stops operating, and the control device switches from the formal extraction state to the zero-position state; or... In response to the drain command, the gas pumping device operates, and the control device switches from the zero position state to the pre-drain state, and then switches from the pre-drain state to the formal drain state; after the gas pumping device has been operating for a preset time, the gas pumping device stops operating, and the control device switches from the formal drain state to the zero position state. The base station according to any one of claims 63-68, wherein, The control device includes: a main body, and an air transmission pipe, an air passage pipe, and a control switch assembly disposed on the main body; The gas transmission pipe is connected to the gas delivery pipe and the gas pumping device. The gas path pipe is connected to the gas delivery pipe and the gas transmission pipe. The gas path pipe includes a valve closing gas path, a valve opening gas path, a liquid extraction gas path, a liquid discharge gas path, a balancing gas path, and an air pumping gas path. The valve closing gas path and the valve opening gas path are both connected to the valve assembly through the first pipeline assembly. The liquid extraction gas path and the liquid discharge gas path are both connected to the sewage tank through the second pipeline assembly. The balancing gas path is connected to the outside atmosphere through the third pipeline assembly. The air pumping gas path is connected to the clean water box of the cleaning equipment through the fourth pipeline assembly. The control switch assembly controls the opening or closing of the valve assembly by controlling the opening or closing of the valve-closing air circuit and the valve-opening air circuit; controls the liquid-drawing air circuit, the liquid-draining air circuit, the liquid-drawing pipe, and the balancing air circuit by controlling the opening or closing of the liquid-drawing air circuit, the liquid-draining air circuit, the liquid-drawing pipe, and the balancing air circuit by controlling the opening or closing of the air-pressurizing air circuit to control whether or not the positive pressure gas is input into the clean water box. When liquid is being pumped into the sewage tank, the control device is in the formal pumping state. The valve assembly is closed to disconnect the outlet from the discharge outlet. The control switch assembly closes the valve-closing air path, the valve-opening air path, the liquid discharge air path, and the balancing air path, and opens the liquid pumping air path, the air pumping air path, and the liquid pumping pipe. The gas pumping device operates and extracts the gas from the sewage tank through the gas delivery pipe, the gas transmission pipe, and the liquid pumping air path, so that the liquid from the external liquid source enters the sewage tank through the liquid pumping pipe under negative pressure. When the sewage tank discharges liquid, the control device is in the formal discharge state. The valve assembly opens to connect the outflow outlet and the discharge outlet. The control switch assembly closes the liquid extraction gas path, the air pumping gas path, and the liquid extraction pipe, and opens the liquid discharge gas path and the balancing gas path. The gas pumping device operates and delivers gas to the sewage tank through the gas delivery pipe, the gas transmission pipe, and the liquid discharge gas path, so that the liquid in the sewage tank is discharged to the outside of the gas source system through the liquid discharge pipe under positive pressure. The base station according to claim 69, wherein, The first piping assembly includes: A first pipeline, one end of which is connected to the valve assembly; and The first three-way valve is provided with a first flow port, a second flow port and a third flow port that are interconnected. The first flow port is connected to the other end of the first pipeline, and the second flow port and the third flow port are respectively connected to the valve-closing air passage and the valve-opening air passage. The second piping assembly includes: The second pipeline, one end of which is connected to the sewage tank; and The second three-way connector has a first connecting port, a second connecting port, and a third connecting port that are interconnected. The first connecting port is connected to the other end of the second pipeline, and the second connecting port and the third connecting port are respectively connected to the liquid extraction gas path and the liquid discharge gas path; the third pipeline assembly includes: The third conduit has one end connected to the outside atmosphere and the other end connected to the balancing gas path; or, the third conduit assembly includes: a third conduit, one end connected to the outside atmosphere; and a first two-way valve, the two ends of which are respectively connected to the other end of the third conduit and the balancing gas path; and... The fourth piping assembly includes: The fourth pipe has one end connected to the water box and the other end connected to the air pumping circuit; or, the fourth pipe assembly includes: a fourth pipe, one end of which is connected to the water box; and a second two-way connector, the two ends of which are respectively connected to the other end of the fourth pipe and the air pumping circuit. The base station according to claim 69, wherein, At least a portion of the liquid extraction tube, the valve closing air path, the valve opening air path, the liquid extraction air path, the liquid discharge air path, the balancing air path, and the air pumping air path is flexible. The base station according to claim 71, wherein, The control switch assembly closes the liquid extraction tube, the valve closing air circuit, the valve opening air circuit, the liquid extraction air circuit, the liquid discharge air circuit, the balancing air circuit, or the air pumping air circuit in at least one of the following ways: Squeeze the flexible portion of the liquid extraction tube, the valve closing air passage, the valve opening air passage, the liquid extraction air passage, the liquid discharge air passage, the balancing air passage, or the air pumping air passage; Bending the flexible portion of the liquid extraction tube, the valve closing air passage, the valve opening air passage, the liquid extraction air passage, the liquid discharge air passage, the balancing air passage, or the air pumping air passage; The flexible portion of the liquid extraction tube, the valve closing air passage, the valve opening air passage, the liquid extraction air passage, the liquid discharge air passage, the balancing air passage, or the air pumping air passage is clamped. The base station according to claim 69, wherein, The gas supply pipe includes a first gas supply pipe and a second gas supply pipe. One end of the first gas supply pipe is connected to the first gas source port of the gas extraction device, and one end of the second gas supply pipe is connected to the second gas source port of the gas extraction device. The gas transmission pipe includes a first four-way valve and a second four-way valve. One port of the first four-way valve is connected to the other end of the first gas supply pipe, and the other three ports of the first four-way valve are respectively connected to the valve closing gas path, the liquid drainage gas path, and the air pumping gas path. One port of the second four-way valve is connected to the other end of the second gas supply pipe, and the other three ports of the second four-way valve are respectively connected to the valve opening gas path, the liquid extraction gas path, and the balancing gas path. The base station according to claim 69, wherein, The control switch assembly includes: Pressure-applying components; The drive module has its output end connected to the pressure-applying component and is used to drive the pressure-applying component to move, so that the control device switches between the zero position state, the pre-liquid extraction state, the formal liquid extraction state, the pre-drainage state, and the formal liquid drainage state. When the control device is in the zero position, the pressure application component opens the liquid extraction pipe, the valve closing air circuit, the valve opening air circuit, the liquid extraction air circuit, the liquid discharge air circuit, the balancing air circuit, and the air pumping air circuit. When the control device is in the pre-liquid extraction state, the pressure application component opens the liquid extraction pipe, the valve closing air circuit and the liquid extraction air circuit, and closes the valve opening air circuit, the liquid discharge air circuit, the balancing air circuit and the air pumping air circuit. When the control device is in the pre-drainage state, the pressure application component opens the valve opening air path and the drainage air path, and closes the liquid extraction pipe, the valve closing air path, the liquid extraction air path, the balancing air path and the air pumping air path. When the control device is in the formal liquid extraction state, the pressure application component opens the liquid extraction pipe, the liquid extraction air path and the air pumping air path, and closes the valve opening air path, the valve closing air path, the liquid discharge air path and the balancing air path; When the control device is in the formal drainage state, the pressure application component opens the drainage air path and the balancing air path, and closes the valve closing air path, the liquid extraction pipe, the valve opening air path, the liquid extraction air path and the air pumping air path. The base station according to claim 74, wherein, The driving module drives the pressure-applying component to move in at least one of the following ways: The drive module is used to drive the pressure component to rotate, so that when the control device is in the zero position state, the pre-liquid extraction state, the formal liquid extraction state, the pre-draining state, or the formal draining state, the pressure component squeezes at least one of the following: the liquid extraction pipe, the valve opening air path, the valve closing air path, the liquid extraction air path, the liquid drainage air path, the air pumping air path, and the balancing air path. The drive module is used to move the pressure application component so that when the control device is in the zero position state, the pre-liquid extraction state, the formal liquid extraction state, the pre-draining state, or the formal draining state, at least one of the liquid extraction pipe, the valve opening air path, the valve closing air path, the liquid extraction air path, the liquid drainage air path, the air pumping air path, and the balancing air path is bent accordingly. The drive module is used to drive the pressure application component to open and close, so that when the control device is in the zero position state, the pre-liquid extraction state, the formal liquid extraction state, the pre-drainage state, and the formal drainage state, it clamps at least one of the liquid extraction pipe, the valve opening air path, the valve closing air path, the liquid extraction air path, the liquid drainage air path, the air pumping air path, and the balancing air path. The base station according to claim 74, wherein, The pressure-applying component includes a plurality of components, which are arranged along a first direction; In the control device, the liquid extraction pipe, the valve closing air path, the valve opening air path, the liquid extraction air path, the liquid discharge air path, the balancing air path, and the air pumping air path are all arranged along the second direction and located around the pressure applying component; The second direction is different from the first direction, and the driving module drives the pressure-applying component to rotate. The base station according to claim 76, wherein, The control switch assembly further includes a rotating shaft, the pressure-applying component is disposed on the rotating shaft, the rotating shaft is disposed along the first direction and is connected to the drive module, the drive module drives the rotating shaft to rotate so as to drive the pressure-applying component to rotate; The number of pressure-applying components is at least four, and the at least four pressure-applying components are spaced apart on the rotating shaft so that when the control device is in the zero position state, the pre-liquid extraction state, the formal liquid extraction state, the pre-drainage state, and the formal liquid drainage state, at least one of the liquid extraction pipe, the valve opening air path, the valve closing air path, the liquid extraction air path, the liquid drainage air path, the air pumping air path, and the balancing air path is closed respectively. The base station according to claim 76, wherein, In a third direction perpendicular to the first and second directions, the rotating shaft includes a first side and a second side facing away from each other. The valve closing air passage, the liquid draining air passage, and the air pumping air passage are located on the first side of the rotating shaft, and the valve opening air passage, the liquid pumping air passage, and the balancing air passage are located on the second side of the rotating shaft. The number of pressure-applying components is at least four, and the at least four pressure-applying components are spaced apart on the rotating shaft to form at least four clearance spaces between the rotating shaft and the body. When the pressure-applying components rotate to the point that at least one of the liquid extraction pipe, the valve closing air passage, the valve opening air passage, the liquid extraction air passage, the liquid drainage air passage, the balancing air passage, and the air pumping air passage is located in the clearance space, the liquid extraction pipe, the valve closing air passage, the valve opening air passage, the liquid extraction air passage, the liquid drainage air passage, the balancing air passage, or the air pumping air passage located in the clearance space is opened accordingly. The base station according to claim 74, wherein, The body has an internal cavity, and the pressure-applying component is located inside the internal cavity. The outer wall of the body has an installation hole that communicates with the internal cavity. The liquid extraction pipe and the gas passage pipe pass through the installation hole and penetrate the internal cavity. The base station according to claim 74, wherein, The control switch assembly further includes a rotating shaft and a position detector, and the pressure application element is disposed on the rotating shaft; The drive module includes: A drive motor, wherein the drive motor is disposed on the main body or disposed on the base station main body; The speed reduction structure has a portion that is connected to the output end of the drive motor and a portion that is connected to the rotating shaft to drive the rotating shaft to rotate, thereby driving the pressure application component to rotate. The position detector is used to detect the rotational orientation of the pressure-applying component. The base station according to claim 63, wherein, The valve assembly includes: The bracket has one end connected to the outlet of the sewage tank and the other end connected to the outlet of the drain pipe. The bracket has an internal cavity and a vent on its side wall. A valve body is housed within the cavity. The side wall of the valve body and the inner wall of the bracket form an adjustment cavity. The vent communicates with the adjustment cavity. The internal space of the valve body is separated from the adjustment cavity by the side wall of the valve body and communicates with the outlet and the discharge outlet. The gas extraction device supplies positive pressure gas to the regulating chamber through the gas supply pipe, the control device, and the first pipeline assembly via the vent, thereby closing the valve assembly; the gas extraction device also supplies negative pressure gas to the regulating chamber through the gas supply pipe, the control device, and the first pipeline assembly via the vent, thereby opening the valve assembly. The base station according to claim 81, wherein, The base station body is also provided with a cleaning tank connected to the liquid extraction pipe, the cleaning tank being used to accommodate and clean the cleaning components of the cleaning equipment; When the cleaning equipment enters the docking position of the base station and begins to perform the cleaning process of the cleaning component, water is injected into the cleaning tank and / or onto the cleaning component to clean it. When the base station is in the liquid pumping state, the liquid after cleaning the cleaning component enters the wastewater tank through the liquid pumping pipe. When the base station is in the liquid draining state, the liquid in the wastewater tank is discharged to the outside through the liquid draining pipe. A type of base station, wherein, include: Base station body; and A gas supply system, wherein the gas supply system is installed on the base station body, and the gas supply system includes: Gas extraction device, used to provide a gas source; A wastewater tank is used to store liquids and is connected to a water source via a pumping pipe to draw in liquids and to the outside via a drain pipe to discharge liquids. A valve assembly is disposed between the outlet of the wastewater tank and the outlet of the drain pipe. Opening or closing the valve assembly controls the connection or disconnection between the outlet and the drain pipe. The control device is connected to the gas extraction device via a gas supply pipe, to the sewage tank via a second pipeline assembly, and to the clean water box of the cleaning equipment via a fourth pipeline assembly. It is used to control the opening or closing of the liquid extraction pipe, the opening or closing of the gas supply pipe and the second pipeline assembly, and the opening or closing of the gas supply pipe and the fourth pipeline assembly. When the control device is in the formal liquid extraction state, the control device controls the liquid extraction pipe to be open, and the gas supply pipe and the second pipeline assembly to be open. The liquid extraction pipe, the sewage tank, the second pipeline assembly, the control device, the gas supply pipe and the gas extraction device together form a liquid extraction passage. The gas extraction device provides negative pressure gas to the liquid extraction passage so that the sewage tank can be pumped into the liquid extraction pipe. The control device controls the gas supply pipe and the fourth pipeline assembly to be open. The gas extraction device provides positive pressure gas to the clear water box through the gas supply pipe, the control device and the fourth pipeline assembly. When the control device is in the formal drainage state, the control device controls the gas supply pipe and the second pipeline assembly to be connected. The gas extraction device, the gas supply pipe, the control device, the second pipeline assembly, the sewage tank, the valve assembly and the drainage pipe together form a drainage passage. The gas extraction device provides positive pressure gas to the drainage passage so that the sewage tank discharges liquid to the outside through the drainage pipe. A cleaning system, wherein, include: Cleaning equipment; and The cleaning equipment is movable into the base station for maintenance. The base station includes: a base station body; and A gas supply system, wherein the gas supply system is installed on the base station body, and the gas supply system includes: Gas extraction device, used to provide a gas source; A wastewater tank is used to store liquids and is connected to an external liquid source via a pumping pipe to draw in liquids and to the outside via a draining pipe to discharge liquids. A valve assembly is disposed between the outlet of the wastewater tank and the outlet of the drain pipe. Opening or closing the valve assembly controls the connection or disconnection between the outlet and the drain pipe. The control device is connected to the gas pumping device through the gas supply pipe and to the valve assembly through the first pipeline assembly. The liquid extraction pipe passes through the control device. The control device is used to control the opening or closing of the liquid extraction pipe and the opening or closing of the gas supply pipe and the first pipeline assembly. When the control device is in the pre-liquid extraction state, the control device controls the gas supply pipe to be connected to the first pipeline assembly, and the gas extraction device provides positive pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly closes to disconnect the outlet and the discharge outlet. When the control device is in the pre-drainage state, the control device controls the gas supply pipe to be connected to the first pipeline assembly. The gas pumping device provides negative pressure gas to the valve assembly through the gas supply pipe, the control device and the first pipeline assembly, so that the valve assembly opens to connect the outlet and the discharge outlet. A cleaning device comprising a cleaning component and a recycling component, wherein, The recycled components include: Stain-containing cavity; A scraping section abuts against the cleaning component; in the height direction of the cleaning equipment, at least a portion of the dirt-containing cavity is lower than the scraping section; during the rotation of the cleaning component, the scraping section peels dirt off the cleaning component from it; and The filter section is positioned higher than the scraping section in the height direction of the cleaning equipment. The filter section has filter holes that connect the outside to the dirt-holding cavity, allowing wastewater from the dirt to enter the dirt-holding cavity and blocking solid waste from the dirt outside the dirt-holding cavity. The cleaning equipment according to claim 85, wherein, The filter section abuts against the cleaning component. The cleaning equipment according to claim 85, wherein, When the cleaning equipment cleans solid waste outside the dirt-holding cavity, the cleaning component that contacts the dirt-scraping part moves upward. The cleaning equipment according to claim 85, wherein, When the cleaning device performs a mopping task, the cleaning component that contacts the scraping part moves downward. The cleaning equipment according to claim 85, wherein, The filter section is further away from the cleaning component relative to the scraping section. The cleaning equipment according to claim 85, wherein, The cleaning device uses the cleaning component to detach solid waste outside the sludge-containing cavity from the recycling component and remove it from the cleaning device. The cleaning equipment according to claim 85, wherein, In the forward direction of the cleaning equipment, the rear profile of the cleaning equipment is arc-shaped, the cleaning component is located at the rear of the cleaning equipment, and the projection of the cleaning component on the horizontal plane is within the outline range of the projection of the cleaning equipment on the horizontal plane. The recycling component is located on the rear side of the cleaning component; the length of the dirt-holding chamber and / or the filter section is less than the length of the cleaning component. The cleaning equipment according to claim 91, wherein, The recycling component also includes a support portion connected to the filter portion and located at one or both ends of the filter portion along its length, and is used to support the scraping portion located at one or both ends of the dirt-holding cavity. The cleaning equipment according to claim 92, wherein, The side of the support portion facing the cleaning component is the support surface, which is an inclined surface. The portion of the support surface closer to the filter portion is further away from the cleaning component. The cleaning equipment according to claim 92, wherein, The cleaning equipment includes a housing; the recycling component includes: A first seal is disposed between the support portion and the housing, and is used to seal the gap between the support portion and the housing. The cleaning equipment according to claim 92, wherein, The support portion is provided with a blocking wall at the end away from the filter portion, and the blocking wall is used to prevent sewage in the dirt from leaking out to the end away from the filter portion. The cleaning equipment according to claim 92, wherein, Along the length of the sludge-containing cavity, the support protrudes relative to the sludge-containing cavity to form an avoidance space. The avoidance space is at least used for installing a first sewage outlet, which is used to communicate with the sewage box of the cleaning equipment through a connecting pipe. The cleaning equipment according to claim 92, wherein, Along the length of the sludge-containing cavity, the support protrudes relative to the sludge-containing cavity to form an avoidance space. The avoidance space is at least used for installing a drain pipe, which is used to discharge wastewater from the sludge-containing cavity to the outside of the recycling component. The cleaning equipment according to claim 85, wherein, The length of the filter section is less than or equal to the length of the dirt-holding cavity; and / or, The length of the scraping section is greater than or equal to the length of the cleaning component; and / or, The area of the filtering hole ranges from 10 mm 2 - 50 mm 2 . The cleaning equipment according to claim 85, wherein, The cleaning equipment includes a wastewater box, which is connected to the sludge-containing cavity via a connecting pipe, and the flow area of ​​the filter holes is smaller than the minimum flow area of ​​the connecting pipe. The cleaning equipment according to claim 85, wherein, The top surface of the scraping section forms the bottom surface of the filter hole. The cleaning device according to claim 100, wherein, The top surface of the scraping part slopes downward toward the dirt-containing cavity. The cleaning equipment according to claim 85, wherein, The recycled components also include: A blocking part is provided on the scraping part. In the height direction of the cleaning device, the blocking part is located below the scraping part. In the front-back direction of the cleaning device, the blocking part is located between the cleaning component and the dirt-holding tank. The cleaning equipment according to claim 85, wherein, The cross-section of the dirt-holding cavity has at least the lower inner contour that is arc-shaped, and the cross-section of the dirt-holding cavity is a plane intercepted by a plane that is perpendicular to the horizontal plane and parallel to the direction of travel of the cleaning equipment. The cleaning equipment according to claim 85, wherein, The cleaning equipment includes a wastewater box; The recycling component is provided with a first sewage outlet. In the length direction of the sewage-containing cavity, the first sewage outlet is located at the first end of the sewage-containing cavity. The first sewage outlet connects the sewage-containing cavity and the sewage box. The bottom surface of the inner surface of the sewage-containing cavity is inclined downward towards the first end. The cleaning equipment according to claim 85, wherein, The recycling component includes a sludge-containing tank that forms the sludge-containing cavity, with an open top. The cleaning equipment according to claim 105, wherein, The filter section is located on one side of the opening; The cleaning equipment also includes a housing; the recycling component also includes: A second seal surrounds the opening on all sides except the side where the filter is located, and the second seal is used to seal the gap between the housing and the recycling unit. The cleaning equipment according to claim 85, wherein, The first end of the sludge-containing cavity is provided with a first sewage outlet, and the second end of the sludge-containing cavity is provided with a second sewage outlet. The first sewage outlet is connected to the sludge-containing cavity. The second wastewater outlet connects the sludge-containing cavity to the outside, and the recycling component further includes: Sewage box; A connecting pipe, one end of which connects to the sludge-containing cavity via the first sewage outlet, and the other end of which connects to the sewage box; and The second power unit, connected to the sewage box, is used to provide negative pressure to the sewage box to draw sewage from the sludge-containing cavity into the sewage box through the connecting pipe; and to provide positive pressure to the sewage box so that the sewage in the sewage box is discharged into the sludge-containing cavity through the connecting pipe, so that the sewage is discharged to the outside through the second sewage outlet. The cleaning equipment according to claim 85, wherein, The recycling component also includes a reinforcing portion located between the two ends of the recycling component along its length, and located on the side of the recycling component closer to the cleaning component in the front-back direction. The cleaning equipment according to claim 85, wherein, The cleaning equipment includes a housing, and the recycling component is detachably mounted on the housing. The cleaning equipment according to claim 109, wherein, The housing includes a mating surface facing the surface to be cleaned, and the cleaning component is rotatably mounted on the side of the housing facing the surface to be cleaned, with the cleaning component fitting against the mating surface. The cleaning device according to claim 110, wherein, The mating surface is connected to the top of the filter section. A cleaning system, wherein, The cleaning system includes cleaning equipment and a base station; The cleaning equipment includes a cleaning component and a recycling component, wherein the recycling component includes: Stain-containing cavity; The cleaning device includes a scraping section that abuts against the cleaning component; at least a portion of the dirt-containing cavity is lower than the scraping section in the height direction of the cleaning device; during the rotation of the cleaning component, the scraping section peels dirt off the cleaning component from the cleaning component. The filter section is positioned higher than the scraping section in the height direction of the cleaning equipment. The filter section is provided with filter holes that connect the outside to the dirt-holding cavity, allowing wastewater in the dirt to enter the dirt-holding cavity and blocking solid waste in the dirt outside the dirt-holding cavity. The base station is used for maintenance of the returning cleaning equipment. A control method for a cleaning device, the cleaning device comprising a cleaning component, a sweeping module, and a recovery component, wherein the recovery component is used to perform solid-liquid separation on the dirt picked up by the cleaning component, wherein... The control method includes: The cleaning component is controlled to detach the solid waste separated by the recycling component from the recycling component and remove it from the cleaning equipment; The cleaning equipment is controlled to clean up the solid waste through the cleaning module. The control method according to claim 113, wherein, Controlling the cleaning component to detach the solid waste separated by the recycling component from the cleaning equipment includes: The cleaning component is controlled to reverse so as to detach the solid waste separated by the recycling component from the recycling component and remove it from the cleaning equipment. The reversal is to control the cleaning component to rotate in the opposite direction to when the cleaning component picks up the dirt. The control method according to claim 113, wherein, Also includes: Before the cleaning component detaches the solid waste separated by the recycling component from the recycling component, the cleaning component is controlled to rise upwards to separate the cleaning component from the surface to be cleaned; or, While controlling the cleaning component to peel the solid waste separated by the recycling component from the recycling component, the cleaning component is also controlled to be lifted upwards so as to separate the cleaning component from the surface to be cleaned. The control method according to claim 113, wherein, Controlling the cleaning component to detach the solid waste separated by the recycling component from the recycling component and remove it from the cleaning equipment is performed by the cleaning equipment before returning to the base station. The control method according to claim 113, wherein, The position of the cleaning device remains unchanged during the process of controlling the cleaning component to detach the solid waste separated by the recycling component from the cleaning device and remove it from the cleaning device; And / or, The control of the cleaning component to detach the solid waste separated by the recycling component from the cleaning device is performed by the cleaning device at a preset position. According to the control method of claim 113, the cleaning equipment includes a cleaning component and a recycling component, wherein, The recycled components include: Stain-containing cavity; A scraping section abuts against the cleaning component; in the height direction of the cleaning equipment, at least a portion of the dirt-containing cavity is lower than the scraping section; during the rotation of the cleaning component, the scraping section peels dirt off the cleaning component from it; and The filter section is positioned higher than the scraping section in the height direction of the cleaning equipment. The filter section has filter holes that connect the outside to the dirt-holding cavity, allowing wastewater from the dirt to enter the dirt-holding cavity and blocking solid waste from the dirt outside the dirt-holding cavity. A method for controlling a cleaning device, the cleaning device comprising a cleaning component and a recycling component, the recycling component comprising: Stain-containing cavity; The cleaning part abuts against the cleaning component; In the height direction of the cleaning device, at least a portion of the dirt-containing cavity is lower than the dirt-scraping part; During the rotation of the cleaning component, the scraping part peels the dirt off the cleaning component. and A filtration unit is positioned higher than the scraping unit in the height direction of the cleaning equipment. The filtration unit has filter holes that connect the outside to the dirt-holding chamber, allowing wastewater from the dirt to enter the chamber while blocking solid debris from entering. The control method includes: When the cleaning component of the cleaning device performs a mopping task, the cleaning component is controlled to rotate in a first direction; After the cleaning component of the cleaning device finishes its mopping task, it is controlled to perform a solid waste cleaning task. The control method according to claim 119, wherein, The solid waste cleaning task includes: performing a reversal task; the reversal task includes the cleaning component rotating along a second direction, the first direction being opposite to the second direction; wherein, the first direction is at the point where the scraping part contacts the cleaning component, the cleaning component rotates downward relative to the scraping part. The control method according to claim 119, wherein, When the cleaning device finishes mopping the surface to be cleaned, and before the cleaning component performs a reverse task, the cleaning component is controlled to be lifted upwards so as to separate the cleaning component from the surface to be cleaned; or, When the cleaning device finishes mopping the surface to be cleaned, and while the cleaning component is performing a reverse rotation task, the cleaning component is controlled to be lifted upwards so that the cleaning component is separated from the surface to be cleaned. The control method according to claim 119, wherein, Controlling the cleaning equipment to perform solid waste cleaning tasks is performed by the cleaning equipment before it returns to the base station; and / or, The position of the cleaning equipment remains unchanged during the execution of the solid waste cleaning task. And / or, Controlling the cleaning equipment to perform solid waste cleaning tasks is performed by the cleaning equipment at a preset position. The control method according to claim 119, wherein, The cleaning equipment includes a cleaning module; After completing the solid waste cleaning task, the cleaning equipment is controlled to use the cleaning module to clean a preset area, which is at least a portion of the area that the cleaning equipment passes through when performing the reverse task. A computer-readable storage medium storing a computer program, wherein, When the computer program is executed by one or more processors, a method for controlling a cleaning device is implemented, the control method as described in claims 29-39. A cleaning device, wherein, include: Wastewater boxes are used to store wastewater. Recyclable parts, used for temporary storage of sewage; The recycling component is provided with a sludge-containing cavity and a wastewater outlet, and the wastewater outlet is connected to the sludge-containing cavity and the wastewater box; A drain pipe, which connects the sewage-containing cavity to the outside; the drain pipe is a flexible hose. The sewage pipe includes a sewage outlet, which is located at the end of the sewage pipe away from the sewage-containing cavity; A force-applying unit, connected to the sewage pipe, is used to apply a force to the sewage pipe to change the bending state of the sewage pipe, so that the sewage pipe switches between a non-sewage-discharging state and a sewage-discharging state. Specifically, when the drain pipe is not discharging sewage, it is in a first bent state and the position of the drain outlet is higher than the position of the sludge chamber, so as to prevent sewage in the sludge chamber from being discharged to the outside through the drain pipe; when the drain pipe is discharging sewage, the position of the drain outlet is not higher than the position of the sludge chamber, so as to allow sewage in the sewage box to be discharged to the outside in sequence through the sewage outlet, the sludge chamber, and the drain pipe. The cleaning equipment according to claim 125, wherein, When the drain pipe is in the draining state, the drain pipe is in a straight line and the drain outlet is at the same height as the sewage chamber; or When the drain pipe is in the draining state, the drain pipe is in the second curved state and the position height of the drain outlet is lower than the position height of the sewage chamber. The cleaning equipment according to claim 125, wherein, The sewage pipe is in a straight line under normal conditions. The cleaning equipment according to claim 125, wherein, When the drain pipe is not draining, the angle between the central axis of the drain outlet extending away from the sludge chamber and the height direction of the cleaning equipment from bottom to top is zero or an acute angle; when the drain pipe is draining, the angle between the central axis of the drain outlet extending away from the sludge chamber and the height direction of the cleaning equipment from bottom to top is greater than or equal to 90°. The cleaning equipment according to claim 125, wherein, Whether the drain pipe is in a non-draining state or a draining state, the drain pipe is in a conductive state. The cleaning equipment according to claim 125, wherein, The cleaning device includes a cleaning component; the recycling component includes a scraping part that abuts against the cleaning component; at least a portion of the dirt-containing cavity is lower than the scraping part; during the rotation of the cleaning component, the scraping part peels dirt off the cleaning component from the cleaning component. The cleaning equipment according to claim 130, wherein, The recycling component also includes a filter section; in the height direction of the cleaning equipment, the filter section is positioned higher than the scraping section; the filter section has filter holes that connect the outside to the sludge-holding cavity, allowing wastewater from the sludge to enter the sludge-holding cavity and blocking solid waste from the sludge outside the sludge-holding cavity. The cleaning equipment according to claim 125, wherein, The force-applying unit includes: A transmission component, the first end of which is connected to the sewage pipe; A reset component, comprising a fixed end and a movable end; the fixed end is connected to the housing of the cleaning equipment, and the movable end of the reset component is connected to the second end of the transmission component; The reset component includes a first state and a second state. When the reset component is in the first state, it drives the transmission component to put the drain pipe in a non-drainage state. When the reset component is in the second state, it drives the transmission component to put the drain pipe in a drainage state. A force-bearing component is connected to the movable end of the reset component; an external force is applied to the force-bearing component so that the reset component can switch between the first state and the second state. The cleaning equipment according to claim 132, wherein, When the drain pipe is not discharging sewage, the load-bearing component is not subjected to external force; When the drain pipe is in the draining state, the force-bearing component is continuously subjected to external force. The cleaning equipment according to claim 132, wherein, The reset element is an elastic element. In the first state, the elastic element is in a natural state or in a first compressed state. In the second state, the elastic element is in a second compressed state. The degree of compression in the first compressed state is less than the degree of compression in the second compressed state. or, The reset element is an elastic element. In the first state, the elastic element is in a natural state or in a first stretched state. In the second state, the elastic element is in a second stretched state. The degree of stretching in the first stretched state is less than the degree of stretching in the second stretched state. The cleaning equipment according to claim 132, wherein, When the drain pipe switches between the non-drainage state and the drainage state, the force-bearing component switches between a first position and a second position along the extension direction of the transmission component; The distance traveled between the first position and the second position is greater than or equal to the first distance; The first distance is the difference between the height of the connection between the transmission component and the sewage pipe when the sewage pipe is not discharging sewage and the height of the axis of the sewage pipe when the sewage pipe is in a straight state. The cleaning equipment according to claim 132, wherein, At least the recycling component, the drain pipe, and the force application unit are capable of moving as a whole along the width direction of the cleaning equipment, so that at least a portion of the force-bearing component of the force application unit protrudes relative to the outer contour of the cleaning equipment body. The cleaning equipment according to claim 132, wherein, The force-applying unit also includes a fixed base, which is disposed on the outer wall of the sewage pipe; the fixed base is provided with a rotating shaft, and the transmission component is connected to the rotating shaft. The cleaning equipment according to claim 125, wherein, The cleaning equipment also includes: A first protective element is installed on the drain pipe; in the non-drained state, the first protective element at least covers the side of the drain pipe facing the cleaning equipment that is closer to the drain pipe. The cleaning equipment according to any one of claims 125-138, wherein, The cleaning equipment also includes: The second power unit, connected to the sewage box, is used to provide negative pressure to the sewage box to draw sewage from the sludge-containing cavity into the sewage box through the sewage outlet, and to provide positive pressure to the sewage box so that the sewage in the sewage box is discharged to the outside through the sewage outlet, the sludge-containing cavity and the drain pipe. A base station is used for maintaining cleaning equipment; wherein, The cleaning equipment includes: Sewage box; A recycling component, wherein the recycling component is provided with a sludge-containing cavity and a wastewater outlet, the wastewater outlet being connected to the sludge-containing cavity and the wastewater box; A drain pipe is provided, which connects the sludge-containing cavity to the outside; the drain pipe is a flexible hose; the drain pipe includes a drain outlet, which is located at the end of the drain pipe away from the sludge-containing cavity. A force-applying unit, connected to the sewage pipe, is used to apply a force to the sewage pipe to change its bending state, so that the sewage pipe switches between a non-discharged state and a discharged state; in the discharged state, the sewage in the sewage box is discharged to the outside through the sewage outlet, the sewage-containing cavity, and the sewage pipe in sequence; Specifically, when the drain pipe is not discharging sewage, it is in a first bend and the drain outlet is positioned higher than the sludge chamber to prevent sewage in the sludge chamber from being discharged to the outside through the drain pipe; when the drain pipe is discharging sewage, the drain outlet is positioned no higher than the sludge chamber to allow sewage in the sewage box to be discharged to the outside sequentially through the drain outlet, the sludge chamber, and the drain pipe. The base station includes: The force-applying component is used to provide external force to the force-applying unit and can change the force applied to the drain pipe through the force-applying unit, so that the drain pipe can switch between a non-drainage state and a drainage state. The base station according to claim 140, wherein, When the cleaning equipment returns to the base station, at least the recycling component, the drain pipe, and the force application unit can move as a whole along the width direction of the cleaning equipment so that at least a portion of the force application unit protrudes relative to the outer contour of the cleaning equipment body, the force application component abuts against the force application unit to apply the external force to the force application unit. A cleaning system, wherein, include: Cleaning equipment and base stations; The cleaning equipment includes: Sewage box; A recycling component, wherein the recycling component is provided with a sludge-containing cavity and a wastewater outlet, the wastewater outlet being connected to the sludge-containing cavity and the wastewater box; A drain pipe is provided, which connects the sludge-containing cavity to the outside; the drain pipe is a flexible hose; the drain pipe includes a drain outlet, which is located at the end of the drain pipe away from the sludge-containing cavity. A force-applying unit, connected to the sewage pipe, is used to apply a force to the sewage pipe to change the bending state of the sewage pipe, so that the sewage pipe switches between a non-sewage-discharging state and a sewage-discharging state. Specifically, when the drain pipe is not discharging sewage, it is in a first bend and the drain outlet is positioned higher than the sludge chamber to prevent sewage in the sludge chamber from being discharged to the outside through the drain pipe; when the drain pipe is discharging sewage, the drain outlet is positioned no higher than the sludge chamber to allow sewage in the sewage box to be discharged to the outside sequentially through the drain outlet, the sludge chamber, and the drain pipe. The base station includes: The force-applying component is used to provide external force to the force-applying unit and can change the force applied to the drain pipe through the force-applying unit, so that the drain pipe can switch between a non-drainage state and a drainage state.

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