Automated analysis device
WO2026140344A1PCT designated stage Publication Date: 2026-07-02HITACHI HIGH TECH CORP
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- HITACHI HIGH TECH CORP
- Filing Date
- 2025-08-12
- Publication Date
- 2026-07-02
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Figure JP2025028449_02072026_PF_FP_ABST
Abstract
In order to provide an automated analysis device including a liquid level detector that is less susceptible to the effects of electrostatic discharge, the following configuration was adopted. This automated analysis device comprises a dispensing mechanism including a nozzle for dispensing a liquid, an arm for supporting the nozzle, and an arm supporting portion for supporting the arm, and is characterized in that: a substrate for measuring the capacitance between the nozzle and the ground, and a substrate cover for covering at least the top and sides of the substrate are provided inside the arm; at least a portion of the substrate cover is made of a conductive material; and the conductive material is grounded via a conductive path.
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