Liquid processing device, gas processing device, substrate processing device, and liquid processing method
WO2026141137A1PCT designated stage Publication Date: 2026-07-02SCREEN HOLDINGS CO LTD
Patent Information
- Authority / Receiving Office
- WO · WO
- Patent Type
- Applications
- Current Assignee / Owner
- SCREEN HOLDINGS CO LTD
- Filing Date
- 2025-12-18
- Publication Date
- 2026-07-02
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Figure JP2025044345_02072026_PF_FP_ABST
Abstract
Provided is technology that can suppress a decrease in the rate of removal of an organic solvent by activated carbon. A liquid processing device (8) is provided with an acidic liquid mixing unit (82) and an organic solvent removal unit (83). The acidic liquid mixing unit (82) mixes an acidic liquid (A) that contains an acidic component into a liquid (L) to be processed that contains an organic solvent and an alkaline constituent. The organic solvent removal unit (83) removes the organic solvent from the liquid (L) to be processed by passing the liquid (L) to be processed, which has been mixed with the acidic liquid (A), through activated carbon (831).
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