Liquid processing device, gas processing device, substrate processing device, and liquid processing method

WO2026141137A1PCT designated stage Publication Date: 2026-07-02SCREEN HOLDINGS CO LTD

Patent Information

Authority / Receiving Office
WO · WO
Patent Type
Applications
Current Assignee / Owner
SCREEN HOLDINGS CO LTD
Filing Date
2025-12-18
Publication Date
2026-07-02

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Abstract

Provided is technology that can suppress a decrease in the rate of removal of an organic solvent by activated carbon. A liquid processing device (8) is provided with an acidic liquid mixing unit (82) and an organic solvent removal unit (83). The acidic liquid mixing unit (82) mixes an acidic liquid (A) that contains an acidic component into a liquid (L) to be processed that contains an organic solvent and an alkaline constituent. The organic solvent removal unit (83) removes the organic solvent from the liquid (L) to be processed by passing the liquid (L) to be processed, which has been mixed with the acidic liquid (A), through activated carbon (831).
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