95 results about "Iodine atom" patented technology

The invention relates to the technical field of biological medicines, and particularly discloses a BODIPY (boron dipyrromethene)-based compound and an application of the BODIPY-based compound in photodynamic oxidation of beta-amyloid protein (Abeta). The compound takes iodo-BODIPY as a photosensitive core and is connected with 4-t-butyloxycarboryl benzene as an A beta recognition group. The introduction of iodine atoms significantly enhances the intersystem crossing ability of molecules, so that the molecules have excellent reactive oxygen species (ROS) generation ability. The compound has high ROS yield, good optical stability and biocompatibility, can specifically target A beta aggregate, realizes photodynamic oxidative degradation, and provides a novel potential tool for treatment of Alzheimer's disease.

The invention provides a series of polybenzyl bromide or polybenzyl iodide-based monomolecular resin photoresists as well as a preparation method and application thereof. The monomolecular resin can be used as a main body material of the photoresists. The raw materials are cheap and easily available, and the synthesis process is simple. According to the compound disclosed by the invention, adamantane is taken as a core unit, a plurality of benzyl bromide or benzyl iodine groups, adamantane and a benzene ring are externally connected, and bromine atoms or iodine atoms are additionally introduced, so that the sensitivity and the etching resistance of the photoresist can be improved to the maximum extent.

A two-dimensional particle that includes: one or plural layers that comprise a layer body represented by: MmXn, wherein Mis at least one metal of Group 3, 4, 5, 6, or 7; X is a carbon atom, a nitrogen atom, or a combination thereof; n is 1 to 4; and m is more than n but not more than 5, a modifier or terminal T exists on a surface of the layer body, wherein T is at least one selected from a hydroxyl group, a fluorine atom, a chlorine atom, an iodine atom, an oxygen atom, a chlorine atom, a phosphorus atom, and a hydrogen atom; and a hydrocarbon compound exists on the one or plural layers.

A resist composition in which a polymer compound having a constitutional unit derived from a compound represented by General Formula (a0-m) is used as a base resin. In the formula, W represents a polymerizable group-containing group; RAr1 and RAr2 represent an aromatic group; R01 and R02 represent an iodinated alkyl group, an iodine atom, or a hydrogen atom; L11 to L15 represent a linking group; q represents 0 or 1; when q represents 0, R02 represents an iodinated alkyl group or an iodine atom, and j2 represents an integer of 1 to 5; when q represents 1, the number of iodine atoms in R01 and R02 is 1 or more; and k1 and k2 represent 0 or 1; when q represents 0, k2 represents 1; when q represents 1, k1+k2 is 1; and Mm+ represents an m-valent onium cation.

A refrigerator oil composition which is used together with a refrigerant that contains an unsaturated fluorinated compound having a carbon-carbon unsaturated bond represented by general formula (I): C2FpR4-p (I) [in general formula (I), R each independently represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p is an integer of 1-3], in which R represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p represents an integer of 1-3], R represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom. A refrigerator oil composition containing a base oil (A), an epoxy compound (B), and a terpene compound (C), the epoxy compound (B) being an aliphatic epoxy compound (B1) or an alicyclic epoxy compound (B2), the total content of the epoxy compound (B) and the terpene compound (C) being 4.0 mass% or more based on the total amount of the refrigerator oil composition.

To provide a photosensitive composition having both etching resistance and lithography characteristics and capable of forming a pattern of fine dimensions, and a method for producing a patterned cured film.SOLUTION: The photosensitive composition includes a silicon-containing polymer (A) having a phenolic hydroxyl group and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generator (B), wherein the photoacid generator (B) includes a photoacid generator (B1) having a sulphonium cation containing an iodine atom.SELECTED DRAWING: None

A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.

The application relates to the technical field of electrocatalytic reduction of carbon dioxide, and provides a preparation method and application of a zinc-iodine diatomic pair (Zn-I / ICPs) carbon dioxide electro-reduction catalyst. The zinc-iodine diatomic pair is prepared by using nitrogen-doped carbon as a carrier and an in-situ gas-capturing MOF method, and the specific steps are as follows: first, ZIF-8 precursors are prepared by using zinc nitrate hexahydrate and 2-methyl imidazole as raw materials; then, the ZIF-8 and potassium iodide are co-pyrolyzed under a nitrogen atmosphere, the potassium iodide is used as an iodine source, zinc and iodine atoms are combined in an atomic dispersion form through a gas-phase doping mode, and a Zn-I diatomic pair is formed. The preparation method is simple and controllable, in the prepared Zn-I / ICPs, Zn sites and I sites successfully construct a synergistic catalytic center with complementary functions and electronic coupling, can effectively control an electrochemical microenvironment, accelerate water dissociation and proton transfer, and simultaneously highly effectively inhibit a hydrogen evolution side reaction, and the zinc-iodine diatomic pair can catalyze carbon dioxide electro-reduction to prepare carbon monoxide with high activity and high selectivity.

A resist composition includes a salt represented by formula (I) or a resin that includes a structural unit represented by formula (IP):wherein Q1, Q2, R1 and R2 are each a hydrogen atom, a fluorine atom, or the like; z is an integer of 0 to 6; X0 is —O—, —CO—, —S—, or the like; mm1 is 0 or 1; L1 and L2 each represent a single bond or a substituted / unsubstituted hydrocarbon group; W1 represents a substituted / unsubstituted alicyclic hydrocarbon group; A1 represents a substituted / unsubstituted hydrocarbon group; Ar1 represents an aromatic hydrocarbon group having an iodine atom, and the aforementioned group optionally has a substituent other than the iodine atom; X1 represents a single bond, —O—, —CO—, or the like; R0 represents a hydrogen atom, a halogen atom, or an alkyl group optionally having a halogen atom; and mm2 represents an integer of 1 to 5: ZI+ represents an organic cation.

A carboxylic acid generating agent containing a carboxylate represented by formula (I) and a resist composition:wherein L10 is a single bond or a substituted / unsubstituted hydrocarbon group; W1 is an alicyclic hydrocarbon group having an iodine atom; L2 is a single bond or a substituted / unsubstituted hydrocarbon group; R5 is —X1-L12-R10 or —X2-L11-X1-L12-R10, X1 and X2 are each —CO—O—, —O—CO—, or the like, respectively, L11 is a substituted / unsubstituted hydrocarbon group, L12 is a single bond or a substituted / unsubstituted hydrocarbon group, R10 is an aromatic hydrocarbon group having one or more substituents, one or more of the substituents is —OR11, R11 is a hydrogen atom or an acid labile group; m5 is an integer of 1 to 4; and Z+ represents an organic cation.

The invention relates to the technical field of small-molecule contrast agents, in particular to a small-molecule contrast agent and a preparation method thereof. According to the micromolecule contrast agent provided by the invention, a divalent glycosyl group is introduced into a binary triiodo-benzene ring structure, so that each molecule contains six iodine atoms (the theoretical iodine content reaches 48.7 wt%), the molecular weight is controlled to be 2000Da or below, the water solubility is remarkably improved, the viscosity is reduced, and the performance is superior to that of a traditional contrast agent. Preliminary CT imaging experiments show that under the same molar concentration, the average CT value generated by the contrast agent YJY-86-2 is obviously higher than that generated by iohexol, and the contrast agent shows stronger imaging contrast ability. The characteristic is expected to realize better image quality while reducing the dosage of administration and reducing the risk of iodine exposure, and provides a powerful candidate material for realizing high-sensitivity detection of early tumors.

The application belongs to the technical field of organic synthesis, and relates to a kind of linkage composite photothermal reagent development for reduction stress-copper apoptosis system.The application realizes a kind of linkage composite photothermal reagent development for reduction stress-copper apoptosis system, based on heptamethine cyanine skeleton, (imino) methyl phenol structure, iodine atom, nitro group are introduced, a compound is constructed.The compound can specifically recognize Cu 2+ 、S 2‑ 、SO2, can realize reduction stress response and copper apoptosis linkage, and simultaneously triggers its photothermal effect, and carries out targeted killing to cancer cells, so as to realize the treatment of cancer.

To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity.SOLUTION: The carboxylic acid generator and the resist composition contain a carboxylate represented by formula (I). [wherein L10 is a bond or a substituted or unsubstituted hydrocarbyl; W1 is an aliphatic hydrocarbyl having an iodine atom; L2 is a bond or a substituted or unsubstituted hydrocarbyl; R5 is - X1 - L12 - R10 or - X2 - L11 - - -, each of and being - CO-O -, - O-CO -, or the like; is a substituted or unsubstituted hydrocarbyl; is a bond or a substituted or unsubstituted hydrocarbyl; is an aromatic hydrocarbyl having one or more substituents; L11 X1 L12 X2 L12 R10 X1 R10, At least one of the substituents is -OR11, R11 is hydrogen or an acid labile group, m5 is an integer of 1 to 4, and Z + is an organic cation. ] SELECTED DRAWING: None

This invention provides a resist composition with excellent sensitivity and resolution for photolithography using high-energy rays such as EB and EUV lithography, as well as a laminate and pattern formation method using the resist composition. [Solution] A resist composition characterized by comprising a hypervalent iodine compound represented by the following formula (1), a carboxyl group-containing compound, and a solvent. [Case 1] TIFF2026063668000124.tif25166 (in the formula, R 1 , R 2 Each of these is independently a C1-C10 hydrocarbyl group which may contain a halogen atom or a heteroatom, and may bond to each other to form a ring with the carbonyloxy group to which they are bonded and the atoms between the carbonyloxy groups. 3 , R 4 These are hydrocarbyl groups, each independently containing a halogen atom or a heteroatom, which may bond to each other to form a ring with the iodine atom to which they are bonded and the atoms between the iodine atoms.

There is provided a method for storing fluoroalkene in which, even when stabilizers for suppressing reactions of fluoroalkene are not added, the reactions of the fluoroalkene hardly occur and the purity of the fluoroalkene hardly decreases during storage. Fluoroalkene having a bromine atom or an iodine atom in the molecule is at least one type of fluoroethylene represented by a first general formula C2HpFqXr and fluoropropene represented by a second general formula C3H3FtXu (X represents a bromine atom or an iodine atom), and contains or does not contain at least one type among manganese, cobalt, nickel, and silicon as metal impurities. When any of the foregoing is contained, the fluoroalkene is stored in a container with the total concentration of the manganese, the cobalt, the nickel, and the silicon set to 1000 ppb by mass or less.

A resist composition containing a resin component whose solubility in a development solution changes under the action of the acid and a compound represented by General Formula (d0). In the formula, Ar is an aromatic ring; Xd is an iodine atom, a fluorine atom, a bromine atom or a fluorinated alkyl group; Rd is a substituent; nd is an integer of 1 or more as long as the valence allows, and md is an integer of 0 or more as long as the valence allows; Ld is a single bond or a divalent linking group; m is an integer of 1 or more, and Mm+ is an m-valent cation

The invention discloses a preparation method of a heterojunction modified C60 supported monatomic iodine catalyst, and belongs to the technical field of nano materials and catalysis. According to the method, iodine atoms are stably loaded on a C60 carrier through oxidation pretreatment, heterostructure construction and a pyrolysis anchoring process. The method comprises the following steps: firstly, carrying out surface carboxylation activation on C60 by adopting nitric acid / sulfuric acid mixed acid; then mixing with thiourea, and performing high-temperature annealing to realize nitrogen-sulfur co-doping, so as to form a donor-acceptor pair heterojunction in a C60 skeleton; and finally, ball-milling and mixing with ammonium iodide or potassium iodate, and pyrolyzing in an inert atmosphere, so that iodine atoms and defect sites of the carrier form a C-I-N or C-I-S coordination structure, and monatomic-scale dispersion is realized. Topological defect anchoring points are created in C60 through heterojunction engineering, so that the iodine loading capacity reaches 5.0 wt% or above, the cycling stability is remarkably improved, the electron structure is optimized through nitrogen and sulfur synergistic doping, the half-wave potential of the catalyst in the oxygen reduction reaction reaches 0.85 V or above, and the apparent rate constant of persulfate for activating and degrading pollutants reaches 0.45 min <-1 >. The method has the advantages of simple process and low raw material cost, and is suitable for preparing efficient non-metal catalysts in the fields of fuel cells, metal-air battery electrodes, advanced oxidation water treatment and the like.

Provided are: a pattern forming method comprising a step for forming a film by using an actinic ray-sensitive or radiation-sensitive resin composition containing a photoacid generator, a solvent, and a resin (A) which includes a repeating unit (a) having an iodine atom and a repeating unit (b) having a specific structure and which has a polarity that increases under the action of an acid, a step for exposing the film to light, and a step for developing the exposed film with an organic processing liquid containing butyl acetate and a hydrocarbon having from 9 to 12 carbon atoms; the actinic ray-sensitive or radiation-sensitive resin composition; and a method for manufacturing an electronic device that includes the pattern forming method.

This catalyst is for use in condensation of a carboxylic acid and an amine compound having an amino group or a substituted amino group in which one hydrogen atom in the amino group is substituted with a substituent. The catalyst comprises a compound represented by general formula (1) (in the formula, R1, R2, R3, and R4 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a nitro group, an amino group, a sulfo group, an alkyl group, or an acyl group, and X1 represents a hydrogen atom, a silyl-based protecting group, a sulfonyl-based protecting group, an alkyl group, an alkenyl group, an aralkyl group, or an acyl group). This amide compound production method comprises a step for obtaining an amide compound through condensation of the carboxylic acid and the amine compound by using the catalyst.

A compound represented by formula (1). (In the formula, RG is a group containing at least one cyclic structure, I is an iodine atom, R1 is a monovalent functional group that does not contain a polymerizable unsaturated bond and that may be the same or different and has 0-30 carbon atoms, n is an integer of 1-5, and m is an integer of 1-5)

A resist composition including a base material component whose solubility in a developing solution is changed by an action of an acid and a compound represented by General Formula (d0). In Formula (d0), Rf represents a fluorinated hydrocarbon group; V0 represents a hydrocarbon group which may have a substituent or a single bond; Y0 represents a divalent linking group having an oxygen atom; I represents an iodine atom; x represents an integer of 1 to 4, y represents an integer of 1 to 4; 2≤x+y≤5 is satisfied; a total number of fluorine atoms contained in x pieces of Rf's is 5 or more; Mm+ represents a sulfonium cation or an iodonium cation; and m represents an integer of 1 or greater.

This application provides acidic compounds, polyimide covalent organic frameworks, their preparation methods, and applications. The structural formula of the acidic compounds is shown in formula (I), wherein R1 is selected from substituted or unsubstituted arylene groups or substituted or unsubstituted heteroarylene groups, and X is selected from chlorine, bromine, or iodine atoms. The acidic compounds provided in this application can be used to prepare three-dimensional polyimide covalent organic frameworks. Furthermore, the polyimide covalent organic frameworks contain phosphorus-containing pivots, which provide flame retardant effects, thus facilitating the use of polyimide covalent organic frameworks.

A resist composition which generates an acid upon light exposure and whose solubility in a developing solution is changed by an action of the acid, the resist composition including a resin component whose solubility in a developing solution is changed by the action of the acid, and a compound represented by General Formula (d0). In the formula, Ar represents an aromatic ring; I represents an iodine atom; Rd1 represents a substituent; nd1 represents an integer of 0 or greater as long as a valence permits; nd2 represents an integer of 1 or greater as long as a valence permits; and Z+ represents an organic cation

Provided are: a thermoplastic resin having a high refractive index, a low b value, and high wet heat resistance; an optical lens using the thermoplastic resin; and the like. According to one embodiment, a thermoplastic resin containing a structural unit represented by general formula (1) is provided. (In formula (1), R1 and R2 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, an alkyl group having 1 to 6 carbon atoms, a monocyclic or polycyclic aryl group having 6 to 36 carbon atoms, a monocyclic or polycyclic heteroaryl group having 5 to 36 ring atoms, an alkenyl group having 2 to 6 carbon atoms, an alkoxy group having 1 to 6 carbon atoms, or an aralkyl group having 7 to 17 carbon atoms, 1, 2, 3 or 4 of the ring atoms are selected from nitrogen, sulfur and oxygen, the other ring atoms are carbon, and X, a and b are respectively described in the specification. )

An object is to provide a resist composition or the like that can produce a resist pattern having good CD uniformity (CDU). 【Solution means】A resist composition containing a carboxylate represented by formula (I). TIFF2026110561000183.tif18112[In formula (I), L 10 represents a chain hydrocarbon group having 1 to 12 carbon atoms which may have a fluorine atom. L 2 represents a single bond or a hydrocarbon group having 1 to 40 carbon atoms which may have a substituent, and -CH2- contained in the hydrocarbon group may be replaced by -O-, -CO-, -S-, -SO-, -SO2- or -NR 7 -. R 7 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. W 1 represents a cyclic hydrocarbon group having 3 to 36 carbon atoms having an iodine atom, and -CH2- contained in the cyclic hydrocarbon group may be replaced by -O-, -CO-, -S-, -SO-, -SO2- or -NR 7 -, and the cyclic hydrocarbon group may have a substituent other than an iodine atom. Z + represents an organic cation.]

The invention relates to the technical field of small-molecule contrast agents, in particular to a small-molecule contrast agent and a preparation method thereof. The structure is shown in the specification. According to the micromolecular contrast agent provided by the invention, based on a symmetric skeleton coupled by iohexol dimer and glycosyl, the imaging performance and the stability of the micromolecular contrast agent are superior to those of a traditional micromolecular contrast agent. Compared with clinical classical iohexol, the molecule integrates two iohexol monomers and a glycosyl targeting group, the number of iodine atoms in each molecule is increased to six, and the high iodine content is directly converted into high inherent contrast brightness.

A method for producing an iodine-containing compound includes reacting a halogen-containing organic iodine compound and a compound containing a reactive carbon-carbon double bond in the presence of a compound of Formula (21) or Formula (22). Each of R21, R23 and R24 represents a hydrogen atom, an iodine atom, or an organic group having from 1 to 20 carbon atoms; R22 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a boron-containing group; R25 represents a hydrogen atom, an iodine atom, an organic group having from 1 to 20 carbon atoms, or a silicon-containing group; and each of A1 and A2 represents a hydrogen atom, a chlorine atom, a bromine atom, or an iodine atom.

The application provides a series of monomolecular resin photoresists based on polybenzyl bromide or polybenzyl iodine and a preparation method and application thereof, and the monomolecular resin can be used as a main body material of the photoresist. Raw materials are cheap and easy to obtain, and the synthesis process is simple. The compound provided by the application takes adamantane as a core unit, is externally connected with multiple benzyl bromide or benzyl iodine groups, and the core structure of adamantane and benzene ring and the introduction of bromine atoms or iodine atoms can maximize the sensitivity and etching resistance of the photoresist.

A compound represented by formula (1). (In formula (1), A1 represents an optionally substituted aromatic group, I represents an iodine atom, Q independently represents a dissociative group, A2 independently represents an optionally substituted aliphatic group or aromatic group, Ra independently represents a hydrogen atom, a methyl group, or a halogen atom, Rb and Rc independently represent a hydrogen atom, an aliphatic group, or a halogen atom, and X represents a hydrogen atom, a methyl group, or a halogen atom. Each X1 independently represents a single bond or a divalent linking group, p represents an integer of 1-2, n1 represents an integer of 1-6, n2 represents an integer of 1-6, and z represents an integer of 1 or more. )

To provide a negative photosensitive composition having both etching resistance and lithography characteristics and capable of forming a pattern of fine dimensions, and a method for producing a patterned cured film.SOLUTION: The negative photosensitive composition contains a silicon-containing polymer (A) having a phenolic hydroxyl group, a photoacid generator (B), and a crosslinking agent (C), wherein the photoacid generator (B) contains a photoacid generator (B1) having a sulphonium cation containing an iodine atom.SELECTED DRAWING: None