56 results about "Iodine atom" patented technology

The invention relates to the technical field of biological medicines, and particularly discloses a BODIPY (boron dipyrromethene)-based compound and an application of the BODIPY-based compound in photodynamic oxidation of beta-amyloid protein (Abeta). The compound takes iodo-BODIPY as a photosensitive core and is connected with 4-t-butyloxycarboryl benzene as an A beta recognition group. The introduction of iodine atoms significantly enhances the intersystem crossing ability of molecules, so that the molecules have excellent reactive oxygen species (ROS) generation ability. The compound has high ROS yield, good optical stability and biocompatibility, can specifically target A beta aggregate, realizes photodynamic oxidative degradation, and provides a novel potential tool for treatment of Alzheimer's disease.

A two-dimensional particle that includes: one or plural layers that comprise a layer body represented by: MmXn, wherein Mis at least one metal of Group 3, 4, 5, 6, or 7; X is a carbon atom, a nitrogen atom, or a combination thereof; n is 1 to 4; and m is more than n but not more than 5, a modifier or terminal T exists on a surface of the layer body, wherein T is at least one selected from a hydroxyl group, a fluorine atom, a chlorine atom, an iodine atom, an oxygen atom, a chlorine atom, a phosphorus atom, and a hydrogen atom; and a hydrocarbon compound exists on the one or plural layers.

A resist composition in which a polymer compound having a constitutional unit derived from a compound represented by General Formula (a0-m) is used as a base resin. In the formula, W represents a polymerizable group-containing group; RAr1 and RAr2 represent an aromatic group; R01 and R02 represent an iodinated alkyl group, an iodine atom, or a hydrogen atom; L11 to L15 represent a linking group; q represents 0 or 1; when q represents 0, R02 represents an iodinated alkyl group or an iodine atom, and j2 represents an integer of 1 to 5; when q represents 1, the number of iodine atoms in R01 and R02 is 1 or more; and k1 and k2 represent 0 or 1; when q represents 0, k2 represents 1; when q represents 1, k1+k2 is 1; and Mm+ represents an m-valent onium cation.

A refrigerator oil composition which is used together with a refrigerant that contains an unsaturated fluorinated compound having a carbon-carbon unsaturated bond represented by general formula (I): C2FpR4-p (I) [in general formula (I), R each independently represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p is an integer of 1-3], in which R represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p represents an integer of 1-3], R represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom. A refrigerator oil composition containing a base oil (A), an epoxy compound (B), and a terpene compound (C), the epoxy compound (B) being an aliphatic epoxy compound (B1) or an alicyclic epoxy compound (B2), the total content of the epoxy compound (B) and the terpene compound (C) being 4.0 mass% or more based on the total amount of the refrigerator oil composition.

To provide a photosensitive composition having both etching resistance and lithography characteristics and capable of forming a pattern of fine dimensions, and a method for producing a patterned cured film.SOLUTION: The photosensitive composition includes a silicon-containing polymer (A) having a phenolic hydroxyl group and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generator (B), wherein the photoacid generator (B) includes a photoacid generator (B1) having a sulphonium cation containing an iodine atom.SELECTED DRAWING: None

The application relates to the technical field of electrocatalytic reduction of carbon dioxide, and provides a preparation method and application of a zinc-iodine diatomic pair (Zn-I / ICPs) carbon dioxide electro-reduction catalyst. The zinc-iodine diatomic pair is prepared by using nitrogen-doped carbon as a carrier and an in-situ gas-capturing MOF method, and the specific steps are as follows: first, ZIF-8 precursors are prepared by using zinc nitrate hexahydrate and 2-methyl imidazole as raw materials; then, the ZIF-8 and potassium iodide are co-pyrolyzed under a nitrogen atmosphere, the potassium iodide is used as an iodine source, zinc and iodine atoms are combined in an atomic dispersion form through a gas-phase doping mode, and a Zn-I diatomic pair is formed. The preparation method is simple and controllable, in the prepared Zn-I / ICPs, Zn sites and I sites successfully construct a synergistic catalytic center with complementary functions and electronic coupling, can effectively control an electrochemical microenvironment, accelerate water dissociation and proton transfer, and simultaneously highly effectively inhibit a hydrogen evolution side reaction, and the zinc-iodine diatomic pair can catalyze carbon dioxide electro-reduction to prepare carbon monoxide with high activity and high selectivity.

A resist composition includes a salt represented by formula (I) or a resin that includes a structural unit represented by formula (IP):wherein Q1, Q2, R1 and R2 are each a hydrogen atom, a fluorine atom, or the like; z is an integer of 0 to 6; X0 is —O—, —CO—, —S—, or the like; mm1 is 0 or 1; L1 and L2 each represent a single bond or a substituted / unsubstituted hydrocarbon group; W1 represents a substituted / unsubstituted alicyclic hydrocarbon group; A1 represents a substituted / unsubstituted hydrocarbon group; Ar1 represents an aromatic hydrocarbon group having an iodine atom, and the aforementioned group optionally has a substituent other than the iodine atom; X1 represents a single bond, —O—, —CO—, or the like; R0 represents a hydrogen atom, a halogen atom, or an alkyl group optionally having a halogen atom; and mm2 represents an integer of 1 to 5: ZI+ represents an organic cation.

A carboxylic acid generating agent containing a carboxylate represented by formula (I) and a resist composition:wherein L10 is a single bond or a substituted / unsubstituted hydrocarbon group; W1 is an alicyclic hydrocarbon group having an iodine atom; L2 is a single bond or a substituted / unsubstituted hydrocarbon group; R5 is —X1-L12-R10 or —X2-L11-X1-L12-R10, X1 and X2 are each —CO—O—, —O—CO—, or the like, respectively, L11 is a substituted / unsubstituted hydrocarbon group, L12 is a single bond or a substituted / unsubstituted hydrocarbon group, R10 is an aromatic hydrocarbon group having one or more substituents, one or more of the substituents is —OR11, R11 is a hydrogen atom or an acid labile group; m5 is an integer of 1 to 4; and Z+ represents an organic cation.

The application belongs to the technical field of organic synthesis, and relates to a kind of linkage composite photothermal reagent development for reduction stress-copper apoptosis system.The application realizes a kind of linkage composite photothermal reagent development for reduction stress-copper apoptosis system, based on heptamethine cyanine skeleton, (imino) methyl phenol structure, iodine atom, nitro group are introduced, a compound is constructed.The compound can specifically recognize Cu 2+ 、S 2‑ 、SO2, can realize reduction stress response and copper apoptosis linkage, and simultaneously triggers its photothermal effect, and carries out targeted killing to cancer cells, so as to realize the treatment of cancer.

To provide a carboxylate, a carboxylic acid generator, and a resist composition capable of producing a resist pattern having good CD uniformity.SOLUTION: The carboxylic acid generator and the resist composition contain a carboxylate represented by formula (I). [wherein L10 is a bond or a substituted or unsubstituted hydrocarbyl; W1 is an aliphatic hydrocarbyl having an iodine atom; L2 is a bond or a substituted or unsubstituted hydrocarbyl; R5 is - X1 - L12 - R10 or - X2 - L11 - - -, each of and being - CO-O -, - O-CO -, or the like; is a substituted or unsubstituted hydrocarbyl; is a bond or a substituted or unsubstituted hydrocarbyl; is an aromatic hydrocarbyl having one or more substituents; L11 X1 L12 X2 L12 R10 X1 R10, At least one of the substituents is -OR11, R11 is hydrogen or an acid labile group, m5 is an integer of 1 to 4, and Z + is an organic cation. ] SELECTED DRAWING: None

This invention provides a resist composition with excellent sensitivity and resolution for photolithography using high-energy rays such as EB and EUV lithography, as well as a laminate and pattern formation method using the resist composition. [Solution] A resist composition characterized by comprising a hypervalent iodine compound represented by the following formula (1), a carboxyl group-containing compound, and a solvent. [Case 1] TIFF2026063668000124.tif25166 (in the formula, R 1 , R 2 Each of these is independently a C1-C10 hydrocarbyl group which may contain a halogen atom or a heteroatom, and may bond to each other to form a ring with the carbonyloxy group to which they are bonded and the atoms between the carbonyloxy groups. 3 , R 4 These are hydrocarbyl groups, each independently containing a halogen atom or a heteroatom, which may bond to each other to form a ring with the iodine atom to which they are bonded and the atoms between the iodine atoms.

There is provided a method for storing fluoroalkene in which, even when stabilizers for suppressing reactions of fluoroalkene are not added, the reactions of the fluoroalkene hardly occur and the purity of the fluoroalkene hardly decreases during storage. Fluoroalkene having a bromine atom or an iodine atom in the molecule is at least one type of fluoroethylene represented by a first general formula C2HpFqXr and fluoropropene represented by a second general formula C3H3FtXu (X represents a bromine atom or an iodine atom), and contains or does not contain at least one type among manganese, cobalt, nickel, and silicon as metal impurities. When any of the foregoing is contained, the fluoroalkene is stored in a container with the total concentration of the manganese, the cobalt, the nickel, and the silicon set to 1000 ppb by mass or less.

A resist composition containing a resin component whose solubility in a development solution changes under the action of the acid and a compound represented by General Formula (d0). In the formula, Ar is an aromatic ring; Xd is an iodine atom, a fluorine atom, a bromine atom or a fluorinated alkyl group; Rd is a substituent; nd is an integer of 1 or more as long as the valence allows, and md is an integer of 0 or more as long as the valence allows; Ld is a single bond or a divalent linking group; m is an integer of 1 or more, and Mm+ is an m-valent cation

The invention discloses a preparation method of a heterojunction modified C60 supported monatomic iodine catalyst, and belongs to the technical field of nano materials and catalysis. According to the method, iodine atoms are stably loaded on a C60 carrier through oxidation pretreatment, heterostructure construction and a pyrolysis anchoring process. The method comprises the following steps: firstly, carrying out surface carboxylation activation on C60 by adopting nitric acid / sulfuric acid mixed acid; then mixing with thiourea, and performing high-temperature annealing to realize nitrogen-sulfur co-doping, so as to form a donor-acceptor pair heterojunction in a C60 skeleton; and finally, ball-milling and mixing with ammonium iodide or potassium iodate, and pyrolyzing in an inert atmosphere, so that iodine atoms and defect sites of the carrier form a C-I-N or C-I-S coordination structure, and monatomic-scale dispersion is realized. Topological defect anchoring points are created in C60 through heterojunction engineering, so that the iodine loading capacity reaches 5.0 wt% or above, the cycling stability is remarkably improved, the electron structure is optimized through nitrogen and sulfur synergistic doping, the half-wave potential of the catalyst in the oxygen reduction reaction reaches 0.85 V or above, and the apparent rate constant of persulfate for activating and degrading pollutants reaches 0.45 min <-1 >. The method has the advantages of simple process and low raw material cost, and is suitable for preparing efficient non-metal catalysts in the fields of fuel cells, metal-air battery electrodes, advanced oxidation water treatment and the like.

This catalyst is for use in condensation of a carboxylic acid and an amine compound having an amino group or a substituted amino group in which one hydrogen atom in the amino group is substituted with a substituent. The catalyst comprises a compound represented by general formula (1) (in the formula, R1, R2, R3, and R4 each independently represent a hydrogen atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a nitro group, an amino group, a sulfo group, an alkyl group, or an acyl group, and X1 represents a hydrogen atom, a silyl-based protecting group, a sulfonyl-based protecting group, an alkyl group, an alkenyl group, an aralkyl group, or an acyl group). This amide compound production method comprises a step for obtaining an amide compound through condensation of the carboxylic acid and the amine compound by using the catalyst.

A compound represented by formula (1). (In the formula, RG is a group containing at least one cyclic structure, I is an iodine atom, R1 is a monovalent functional group that does not contain a polymerizable unsaturated bond and that may be the same or different and has 0-30 carbon atoms, n is an integer of 1-5, and m is an integer of 1-5)

A resist composition including a base material component whose solubility in a developing solution is changed by an action of an acid and a compound represented by General Formula (d0). In Formula (d0), Rf represents a fluorinated hydrocarbon group; V0 represents a hydrocarbon group which may have a substituent or a single bond; Y0 represents a divalent linking group having an oxygen atom; I represents an iodine atom; x represents an integer of 1 to 4, y represents an integer of 1 to 4; 2≤x+y≤5 is satisfied; a total number of fluorine atoms contained in x pieces of Rf's is 5 or more; Mm+ represents a sulfonium cation or an iodonium cation; and m represents an integer of 1 or greater.

This application provides acidic compounds, polyimide covalent organic frameworks, their preparation methods, and applications. The structural formula of the acidic compounds is shown in formula (I), wherein R1 is selected from substituted or unsubstituted arylene groups or substituted or unsubstituted heteroarylene groups, and X is selected from chlorine, bromine, or iodine atoms. The acidic compounds provided in this application can be used to prepare three-dimensional polyimide covalent organic frameworks. Furthermore, the polyimide covalent organic frameworks contain phosphorus-containing pivots, which provide flame retardant effects, thus facilitating the use of polyimide covalent organic frameworks.

An object is to provide a resist composition or the like that can produce a resist pattern having good CD uniformity (CDU). 【Solution means】A resist composition containing a carboxylate represented by formula (I). TIFF2026110561000183.tif18112[In formula (I), L 10 represents a chain hydrocarbon group having 1 to 12 carbon atoms which may have a fluorine atom. L 2 represents a single bond or a hydrocarbon group having 1 to 40 carbon atoms which may have a substituent, and -CH2- contained in the hydrocarbon group may be replaced by -O-, -CO-, -S-, -SO-, -SO2- or -NR 7 -. R 7 represents a hydrogen atom or an alkyl group having 1 to 6 carbon atoms. W 1 represents a cyclic hydrocarbon group having 3 to 36 carbon atoms having an iodine atom, and -CH2- contained in the cyclic hydrocarbon group may be replaced by -O-, -CO-, -S-, -SO-, -SO2- or -NR 7 -, and the cyclic hydrocarbon group may have a substituent other than an iodine atom. Z + represents an organic cation.]

The application provides a series of monomolecular resin photoresists based on polybenzyl bromide or polybenzyl iodine and a preparation method and application thereof, and the monomolecular resin can be used as a main body material of the photoresist. Raw materials are cheap and easy to obtain, and the synthesis process is simple. The compound provided by the application takes adamantane as a core unit, is externally connected with multiple benzyl bromide or benzyl iodine groups, and the core structure of adamantane and benzene ring and the introduction of bromine atoms or iodine atoms can maximize the sensitivity and etching resistance of the photoresist.

A compound represented by formula (1). (In formula (1), A1 represents an optionally substituted aromatic group, I represents an iodine atom, Q independently represents a dissociative group, A2 independently represents an optionally substituted aliphatic group or aromatic group, Ra independently represents a hydrogen atom, a methyl group, or a halogen atom, Rb and Rc independently represent a hydrogen atom, an aliphatic group, or a halogen atom, and X represents a hydrogen atom, a methyl group, or a halogen atom. Each X1 independently represents a single bond or a divalent linking group, p represents an integer of 1-2, n1 represents an integer of 1-6, n2 represents an integer of 1-6, and z represents an integer of 1 or more. )

To provide a negative photosensitive composition having both etching resistance and lithography characteristics and capable of forming a pattern of fine dimensions, and a method for producing a patterned cured film.SOLUTION: The negative photosensitive composition contains a silicon-containing polymer (A) having a phenolic hydroxyl group, a photoacid generator (B), and a crosslinking agent (C), wherein the photoacid generator (B) contains a photoacid generator (B1) having a sulphonium cation containing an iodine atom.SELECTED DRAWING: None

The embodiment of the invention discloses a pyrazole-based fund cyclic trinuclear complex, a synthesis method thereof and application of the pyrazole-based fund cyclic trinuclear complex in the field of X-ray imaging, relates to the technical field of metal-organic complex luminescent materials, and aims to overcome the defects of existing scintillator materials in practical application. According to the application of the pyrazole-based gold ring trinuclear complex in the field of X-ray imaging, the pyrazole-based gold ring trinuclear complex is used for preparing a scintillation screen material for X-ray imaging; the general structural formula of the pyrazolyl-based cyclic trinuclear complex is shown as follows: in the formula, R1, R2 and R3 are all substituent groups; the substituent group comprises at least one of methyl, ethyl, trifluoromethyl, carboxylic acid ethyl ester group, chlorine atom, bromine atom or iodine atom.

Provided are a material for a photoelectric conversion element for an imaging element, and the like, that contribute to producing a photoelectric conversion element that has a low dark current and excels in responsiveness.　A compound represented by formula (1) is used. In formula (1), R1-R13 are each independently a hydrogen atom, a deuterium atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a nitro group, a hydroxy group, a thiol group, an allyl group, a 6-30C monocyclic, linked, or condensed aromatic hydrocarbon group that may have a substituent, a 3-36C monocyclic, linked, or condensed heteroaromatic group that may have a substituent, or a group represented by formula (2). However, R5 and R6, and / or R7 and R8, are linked to each other to form a benzene ring, and form a group represented by formula (3).

To provide a resist composition or the like having good sensitivity and roughness.SOLUTION: A resist composition which generates an acid upon exposure and whose solubility in a developer changes by the action of the acid. (A) whose solubility in a developing solution changes by the action of an acid and a compound (b0) represented by Formula (b0). In formula (b0), Ar01, Ar02 and Ar03 each represent an aromatic ring; Rf02 and Rf03 each represent a fluoro atom or a fluorinated alkyl group; Rc01, Rc02 and Rc03 each represent an alkyl group, hydroxy, nitro, carboxy, nitrile, amino, carbonyl, an ester bond-containing group, an amide bond-containing group or an ether bond-containing group. X - represents a sulfonate anion containing an iodine atom.SELECTED DRAWING: None

Provided is a method for producing an aqueous fluoroelastomer dispersion, the production method comprising: (1) preparing a fluoropolymer-containing first aqueous dispersion by carrying out a first polymerization of fluorine-containing monomer in a container in the presence of an aqueous medium and a polymerization initiator and substantially in the absence of fluorine-containing surfactant that lacks a functional group capable of reacting by radical polymerization; (2) removing the first aqueous dispersion from the container and diluting the removed first aqueous dispersion 3- to 40-fold to prepare a second aqueous dispersion, or diluting the first aqueous dispersion in the container 3- to 40-fold to prepare a second aqueous dispersion and removing the second aqueous dispersion from the container; and (3) preparing a fluoroelastomer-containing third aqueous dispersion by carrying out, in the same container as the container in which the first polymerization was performed or in a container different from the container in which the first polymerization was performed, a second polymerization of fluorine-containing monomer substantially in the absence of fluorine-containing surfactant that lacks a functional group capable of reacting by radical polymerization and in the presence of the second aqueous dispersion, a chain transfer agent having an iodine atom or a bromine atom, and at least one selection from the group consisting of monomers that provide a crosslinkable group containing an iodine atom, a bromine atom, or a cyano group.

The present application provides a material for a photoelectric conversion element for an image pickup element, and the like, which contributes to production of a photoelectric conversion element having low dark current and excellent responsiveness. A compound represented by the following formula (1) is used. In formula (1), R 1 ~R 14 each independently is a hydrogen atom, a deuterium atom, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a nitro group, a hydroxyl group, a thiol group, an allyl group, a monocyclic, bicyclic or fused ring aromatic hydrocarbon group having 6 to 30 carbon atoms which can be substituted, a monocyclic, bicyclic or fused ring heteroaromatic group having 3 to 36 carbon atoms which can be substituted, or a group represented by the following formula (2). Among them, at least one or more of R 1 ~R 14 in formula (2) is a group represented by formula (2).

The present invention provides a composition from which a pattern having high resolution can be formed. The present invention provides a resist film, a pattern forming method, and a method for producing an electronic device that are related to the composition. A composition according to the present invention includes a compound A having a plurality of iodine atoms that are each an iodine atom bonded to a carbon atom, and a compound B having a plurality of specific functional groups that are each a specific functional group selected from the group consisting of a nitrogen-containing aromatic heterocyclic group, —NH2, an NH2 group protected with a removable protecting group, —NHRN1, an NHRN1 group protected with a removable protecting group, —NRN22, —C≡N, —OH, —ORO, —SH, —SRS, —PRP12, and —P(ORP2)2 and not having an iodine atom bonded to a carbon atom. The composition satisfies at least one of requirement 1 or requirement 2.

An actinic ray-sensitive or radiation-sensitive resin composition containing (A) a resin including a repeating unit having a group which is decomposed by action of an acid to provide increased polarity, and (C) a nonionic aminoxyl radical having a molecular weight of 300 or more and not including an iodine atom, an actinic ray-sensitive or radiation-sensitive film, a pattern forming method, and a method for producing an electronic device which uses the actinic ray-sensitive or radiation-sensitive composition.

The present invention is a resist composition containing: a hypervalent iodine compound represented by the following formula (1); a carboxy-group-containing compound; and a solvent, where R1 and R2 each independently represent a halogen atom or a hydrocarbyl group having 1 to 10 carbon atoms and optionally containing a heteroatom and may be bonded to each other to form a ring together with the carbonyloxy groups bonded thereto and the atoms between the carbonyloxy groups, and R3 and R4 each independently represent a halogen atom or a hydrocarbyl group optionally containing a heteroatom and may be bonded to each other to form a ring together with the iodine atoms bonded thereto and the atom between the iodine atoms. This can provide: a resist composition excellent in sensitivity and resolution in photolithography using a high-energy beam, such as EB and EUV lithography; a laminate including the resist composition; and a patterning process using the resist composition.