166 results about "Iodine atom" patented technology

The present invention provides: an actinic-ray-sensitive or radiation-sensitive resin composition containing (A) a resin, and (Q1) an actinic-ray-sensitive or radiation-sensitive acid generator, which is an onium salt compound having a structure in which three or more iodine atoms and at least one group selected from −SO3 – and −SO2− are bonded to the same aromatic ring; an actinic-ray-sensitive or radiation-sensitive resin film formed from the actinic-ray-sensitive or radiation-sensitive resin composition; and a method for forming a pattern and a method for manufacturing an electronic device using the actinic-ray-sensitive or radiation-sensitive resin composition.

This resist composition contains: a resin component (A1), the solubility of which in a developer solution changes due to the action of an acid; and a compound (D0) represented by general formula (d0-1). In the formula, Ar is an aromatic ring; OH is a hydroxy group; Xd01 is an iodine atom, a fluorine atom, a bromine atom, or a fluorinated alkyl group; Ld is a single bond or a divalent linking group; Z+ is S+ or I+; and Xd02 is an iodine atom, a fluorine atom, a bromine atom, or a fluorinated alkyl group. [Chemical formula 1]

The invention relates to the technical field of biological medicines, and particularly discloses a BODIPY (boron dipyrromethene)-based compound and an application of the BODIPY-based compound in photodynamic oxidation of beta-amyloid protein (Abeta). The compound takes iodo-BODIPY as a photosensitive core and is connected with 4-t-butyloxycarboryl benzene as an A beta recognition group. The introduction of iodine atoms significantly enhances the intersystem crossing ability of molecules, so that the molecules have excellent reactive oxygen species (ROS) generation ability. The compound has high ROS yield, good optical stability and biocompatibility, can specifically target A beta aggregate, realizes photodynamic oxidative degradation, and provides a novel potential tool for treatment of Alzheimer's disease.

This resist composition contains a compound including cations (C0) represented by general formula (c0). In the formula, Rb01 to Rb03 each independently represent an aryl group that may have a substituent, an alkyl group that may have a substituent, or an alkenyl group that may have a substituent. Rb01 to Rb03 may be bonded to each other to form a ring together with the sulfur atom in the formula. However, one or more of Rb01 to Rb03 has at least one iodine atom, and one or more of Rb01 to Rb03 includes at least one lactone ring structure, -SO2-containing ring structure, or carbonate-containing cyclic structure.

To provide a resist composition or the like that is superior in all of sensitivity, roughness, and resolution.SOLUTION: The present invention provides a resist composition that generates an acid upon exposure and that changes solubility in a developer solution due to the action of the acid, the resist composition comprising a compound containing a cation (C0) represented by general formula (c0). [In the formula, Y0 represents a polar group containing an oxygen atom. Rf0 represents a fluorine atom or a fluorinated alkyl group. R01 represents a substituent (excluding a polar group containing an oxygen atom, a fluorine atom, and a fluorinated alkyl group), and R02 and R03 each independently represent a substituent (excluding an iodine atom)].SELECTED DRAWING: None

The present invention provides: a composition for forming a lithography underlayer film, the composition containing a polymer that contains a repeating unit derived from an iodine-containing monomer represented by general formula (1); and a positive resist composition which contains a polymer that contains a repeating unit derived from an iodine-containing monomer represented by formula (1). (In the formula, X1 is a hydrogen atom, a methyl group, or a halogen atom, Y1 is -O- or -NH-, a is 0 or 1, and R is a group containing an iodine atom and 2 to 30 carbon atoms.)

A low-temperature etching method including an etching step of setting the temperature of a member to be etched having an etching object containing silicon to 0° C. or less, bringing an etching gas containing an etching compound into contact with the member to be etched, and etching the etching object. The etching gas contains or does not contain high-boiling-point impurities, the high-boiling-point impurities being compounds having at least one type of atom among a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, a hydrogen atom, and an oxygen atom in the molecule and having a boiling point of 20° C. or more under a pressure of 101 kPa, and, when the etching gas contains the high-boiling-point impurities, the total concentration of all types of the contained high-boiling-point impurities is 500 ppm by volume or less.

To provide a resist material which has high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.SOLUTION: The resist material contains a bis-onium salt containing: a divalent anion which has a sulfonic acid anion structure directly bonded to an aromatic group substituted with an iodine atom, and a sulfonimide anion structure or a sulfonamide anion structure bonded to the aromatic group directly or via a linking group containing one or more atoms; and an onium cation.SELECTED DRAWING: None

A compound represented by the following formula (1):wherein RG is a group containing at least one cyclic structure,I is an iodine atom,R1 is a monovalent functional group having 0 to 30 carbon atoms, containing no polymerizable unsaturated bond, and being optionally the same or different;n is an integer of 1 to 5, andm is an integer of 1 to 5.

To provide a resist material which has high sensitivity and improved LWR and CDU regardless of whether it is positive or negative, and a pattern forming method using the same.SOLUTION: The resist material contains a base polymer having a sulfonium salt or iodonium salt structure in which an arylsulfonic acid anion substituted with an iodine atom is bonded to the main chain.SELECTED DRAWING: None

The invention relates to an onium salt type monomer, a polymer, a chemically amplified resist composition and a pattern forming method. The present invention provides a photolithographic composition which has excellent solvent solubility, high sensitivity, high contrast, excellent photolithographic performance such as exposure margin, edge roughness, size uniformity, and depth of focus in optical lithography using high-energy rays, and which can be used in optical lithography using high-energy rays. The present invention relates to an onium salt-type monomer used in a chemically amplified resist composition which can resist pattern collapse even when a fine pattern is formed, a polymer containing a repeating unit derived from the onium salt-type monomer, a chemically amplified resist composition containing the polymer, and a pattern forming method using the chemically amplified resist composition. An onium salt type monomer comprising a cation represented by formula (a1) and a sulfonic acid anion that contains a polymerizable group and does not contain an iodine atom. # imgabs0 #

To provide a resist composition good in all of sensitivity, CDU and resolution, a resist pattern forming method using the resist composition, and a compound used in the resist composition.SOLUTION: The resist composition contains a compound containing a cation (C0) represented by formula (c0) (where Z+ represents S+ or I+; Ar1, Ar2 and Ar3 represent aromatic rings; I represents an iodine atom; Rz11, Rz21 and Rz31 represent C1-5 alkyl groups; and lz1, lz2, lz3, mz1, mz2, mz3, nz1, nz2 and nz3 represent integers of 0 or more, provided that at least one of lz1, mz1 and nz1 represents an integer of 1 or more and at least one of lz2, mz2 and nz2 represents an integer of 1 or more).SELECTED DRAWING: None

To provide an onium salt for a resist composition having high sensitivity to particle beams or electromagnetic radiation, in particular, electron beams or extreme ultraviolet rays.SOLUTION: The onium salt is represented by general formula (1) or (2) in the figure. The onium salt has at least one fluorine atom or iodine atom bonded as a substituent in its structure.SELECTED DRAWING: None

The present invention provides: an active ray-sensitive or radiation-sensitive resin composition, containing (A) a resin and (Q1) an active ray-sensitive or radiation-sensitive acid generator which is an onium salt compound having a structure in which three or more iodine atoms and at least two or more atoms selected from oxygen atoms and sulfur atoms are bonded to the same aromatic ring; an active ray-sensitive or radiation-sensitive film formed from the active ray-sensitive or radiation-sensitive resin composition; a pattern forming method using the active ray-sensitive or radiation-sensitive resin composition; and a method for producing an electronic device.

The invention provides a series of polybenzyl bromide or polybenzyl iodide-based monomolecular resin photoresists as well as a preparation method and application thereof. The monomolecular resin can be used as a main body material of the photoresists. The raw materials are cheap and easily available, and the synthesis process is simple. According to the compound disclosed by the invention, adamantane is taken as a core unit, a plurality of benzyl bromide or benzyl iodine groups, adamantane and a benzene ring are externally connected, and bromine atoms or iodine atoms are additionally introduced, so that the sensitivity and the etching resistance of the photoresist can be improved to the maximum extent.

A two-dimensional particle that includes: one or plural layers that comprise a layer body represented by: MmXn, wherein Mis at least one metal of Group 3, 4, 5, 6, or 7; X is a carbon atom, a nitrogen atom, or a combination thereof; n is 1 to 4; and m is more than n but not more than 5, a modifier or terminal T exists on a surface of the layer body, wherein T is at least one selected from a hydroxyl group, a fluorine atom, a chlorine atom, an iodine atom, an oxygen atom, a chlorine atom, a phosphorus atom, and a hydrogen atom; and a hydrocarbon compound exists on the one or plural layers.

A resist composition in which a polymer compound having a constitutional unit derived from a compound represented by General Formula (a0-m) is used as a base resin. In the formula, W represents a polymerizable group-containing group; RAr1 and RAr2 represent an aromatic group; R01 and R02 represent an iodinated alkyl group, an iodine atom, or a hydrogen atom; L11 to L15 represent a linking group; q represents 0 or 1; when q represents 0, R02 represents an iodinated alkyl group or an iodine atom, and j2 represents an integer of 1 to 5; when q represents 1, the number of iodine atoms in R01 and R02 is 1 or more; and k1 and k2 represent 0 or 1; when q represents 0, k2 represents 1; when q represents 1, k1+k2 is 1; and Mm+ represents an m-valent onium cation.

Provided is a polymer composition that achieves both substrate adhesion properties and antithrombogenicity. The polymer composition is characterized by containing a polymer having a monomer unit represented by chemical formula (1). m represents a natural number of 2-12; n represents the number of repetitions of the monomer unit; R1 represents a hydrogen atom or an alkyl group having 1-6 carbon atoms; R2 represents an oxygen atom, a sulfur atom, SO, SO2, or NR3; and X1, X2 and X3 each independently represent (I) a hydrogen atom, (II) a fluorine atom, a chlorine atom, a bromine atom, or an iodine atom, (III) a substituted or unsubstituted alkyl group having 1-12 carbon atoms, a substituted or unsubstituted alkenyl group having 2-10 carbon atoms, or a substituted or unsubstituted alkynyl group having 2-10 carbon atoms, or (IV) a methoxy group, an ethoxy group, or a 2-hydroxyethoxy group. Provided that X1, X2 and X3 are not all hydrogen atoms.

Provided is a resist composition which generates an acid upon exposure to light, and the solubility of which in a developer solution changes by the action of an acid. The resist composition comprises: a base material component (A) of which the solubility in a developer solution changes by the action of an acid; and a compound (D0) represented by formula (d0). In formula (d0), Ar01 is an aromatic ring; Rd01 is a substituent other than an iodine atom; Rx0 is a group represented by formula (Rx0-1) or (Rx0-2); m01 is an integer of 0 or more; n01 is an integer of 1 or more; m is an integer of 1 or more; Mm+ is an m-valent cation; and n is an integer of 2 or more. In formula (Rx0-2), Ar02 is an aromatic ring; Ld0 is a single bond or a divalent linking group; Rd02 is a substituent; and m02 is an integer of 0 or more.

A refrigerator oil composition which is used together with a refrigerant that contains an unsaturated fluorinated compound having a carbon-carbon unsaturated bond represented by general formula (I): C2FpR4-p (I) [in general formula (I), R each independently represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p is an integer of 1-3], in which R represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p represents an integer of 1-3], R represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom, and p represents a hydrogen atom, a chlorine atom, a bromine atom or an iodine atom. A refrigerator oil composition containing a base oil (A), an epoxy compound (B), and a terpene compound (C), the epoxy compound (B) being an aliphatic epoxy compound (B1) or an alicyclic epoxy compound (B2), the total content of the epoxy compound (B) and the terpene compound (C) being 4.0 mass% or more based on the total amount of the refrigerator oil composition.

To provide a photosensitive composition having both etching resistance and lithography characteristics and capable of forming a pattern of fine dimensions, and a method for producing a patterned cured film.SOLUTION: The photosensitive composition includes a silicon-containing polymer (A) having a phenolic hydroxyl group and an alkali-soluble group protected by an acid-dissociable group, and a photoacid generator (B), wherein the photoacid generator (B) includes a photoacid generator (B1) having a sulphonium cation containing an iodine atom.SELECTED DRAWING: None

The invention relates to a resist material and a pattern forming method. The present invention addresses the problem of providing: a resist material having high sensitivity regardless of the positive type or the negative type and improved LWR and CDU; and a pattern forming method using the same. [Solution] A resist material containing a dionium salt, a divalent anion containing an onium cation, and a benzene oxide anion structure substituted with an iodine atom and a fluorosulfonic acid anion structure bonded to an aromatic ring of the benzene oxide anion structure.

A radiation-sensitive composition contains: (A) a polymer including a structural unit (U) represented by the following formula (1); and (B) a radiation-sensitive acid-generator formed of an onium cation having at least one group Rf1 selected from the group consisting of a fluoroalkyl group and a fluoro group (excepting a fluoro group in the fluoroalkyl group) and an organic anion having an iodine atom. In formula (1), R1 represents a hydrogen atom, a methyl group, or the like. X1 represents a single bond, an ether bond, an ester bond, or the like. Ar1 represents a cyclic group bound to X1 via an aromatic ring. A hydroxy group or group —ORY is bound to an atom adjacent to the atom bound to X1, among the atoms forming the aromatic group in Ar1. RY represents an acid-releasable group.

The application relates to the technical field of electrocatalytic reduction of carbon dioxide, and provides a preparation method and application of a zinc-iodine diatomic pair (Zn-I / ICPs) carbon dioxide electro-reduction catalyst. The zinc-iodine diatomic pair is prepared by using nitrogen-doped carbon as a carrier and an in-situ gas-capturing MOF method, and the specific steps are as follows: first, ZIF-8 precursors are prepared by using zinc nitrate hexahydrate and 2-methyl imidazole as raw materials; then, the ZIF-8 and potassium iodide are co-pyrolyzed under a nitrogen atmosphere, the potassium iodide is used as an iodine source, zinc and iodine atoms are combined in an atomic dispersion form through a gas-phase doping mode, and a Zn-I diatomic pair is formed. The preparation method is simple and controllable, in the prepared Zn-I / ICPs, Zn sites and I sites successfully construct a synergistic catalytic center with complementary functions and electronic coupling, can effectively control an electrochemical microenvironment, accelerate water dissociation and proton transfer, and simultaneously highly effectively inhibit a hydrogen evolution side reaction, and the zinc-iodine diatomic pair can catalyze carbon dioxide electro-reduction to prepare carbon monoxide with high activity and high selectivity.

This vinyl polymer comprises a polymer (P1) represented by formula (1), wherein the proportion of a polymer (P2) represented by formula (2) with respect to the total amount of the polymer (P1) and the polymer (P2) is not more than 20 mol%. In the formulae, A1 represents a polymer chain which has a structural unit derived from a vinyl monomer, and A2 is a single bond or represents a polymer chain which has a structural unit derived from a vinyl monomer. R1 is a residue resulting from removal of two iodine atoms of a bifunctional iodine polymerization control agent, and X1 is a hydrogen atom, or is a monovalent group which does not have iodine. R1 in formula (1) and R1 in formula (2) are the same group.　(1): I-A1-R1-A2-I (2): I-A1-R1-A2-X1

A resist composition includes a salt represented by formula (I) or a resin that includes a structural unit represented by formula (IP):wherein Q1, Q2, R1 and R2 are each a hydrogen atom, a fluorine atom, or the like; z is an integer of 0 to 6; X0 is —O—, —CO—, —S—, or the like; mm1 is 0 or 1; L1 and L2 each represent a single bond or a substituted / unsubstituted hydrocarbon group; W1 represents a substituted / unsubstituted alicyclic hydrocarbon group; A1 represents a substituted / unsubstituted hydrocarbon group; Ar1 represents an aromatic hydrocarbon group having an iodine atom, and the aforementioned group optionally has a substituent other than the iodine atom; X1 represents a single bond, —O—, —CO—, or the like; R0 represents a hydrogen atom, a halogen atom, or an alkyl group optionally having a halogen atom; and mm2 represents an integer of 1 to 5: ZI+ represents an organic cation.

A carboxylic acid generating agent containing a carboxylate represented by formula (I) and a resist composition:wherein L10 is a single bond or a substituted / unsubstituted hydrocarbon group; W1 is an alicyclic hydrocarbon group having an iodine atom; L2 is a single bond or a substituted / unsubstituted hydrocarbon group; R5 is —X1-L12-R10 or —X2-L11-X1-L12-R10, X1 and X2 are each —CO—O—, —O—CO—, or the like, respectively, L11 is a substituted / unsubstituted hydrocarbon group, L12 is a single bond or a substituted / unsubstituted hydrocarbon group, R10 is an aromatic hydrocarbon group having one or more substituents, one or more of the substituents is —OR11, R11 is a hydrogen atom or an acid labile group; m5 is an integer of 1 to 4; and Z+ represents an organic cation.

The invention relates to the technical field of small-molecule contrast agents, in particular to a small-molecule contrast agent and a preparation method thereof. According to the micromolecule contrast agent provided by the invention, a divalent glycosyl group is introduced into a binary triiodo-benzene ring structure, so that each molecule contains six iodine atoms (the theoretical iodine content reaches 48.7 wt%), the molecular weight is controlled to be 2000Da or below, the water solubility is remarkably improved, the viscosity is reduced, and the performance is superior to that of a traditional contrast agent. Preliminary CT imaging experiments show that under the same molar concentration, the average CT value generated by the contrast agent YJY-86-2 is obviously higher than that generated by iohexol, and the contrast agent shows stronger imaging contrast ability. The characteristic is expected to realize better image quality while reducing the dosage of administration and reducing the risk of iodine exposure, and provides a powerful candidate material for realizing high-sensitivity detection of early tumors.

The application belongs to the technical field of organic synthesis, and relates to a kind of linkage composite photothermal reagent development for reduction stress-copper apoptosis system.The application realizes a kind of linkage composite photothermal reagent development for reduction stress-copper apoptosis system, based on heptamethine cyanine skeleton, (imino) methyl phenol structure, iodine atom, nitro group are introduced, a compound is constructed.The compound can specifically recognize Cu 2+ 、S 2‑ 、SO2, can realize reduction stress response and copper apoptosis linkage, and simultaneously triggers its photothermal effect, and carries out targeted killing to cancer cells, so as to realize the treatment of cancer.

An ion implantation system, an ion source, and a method are provided for forming an aluminum ion beam from an aluminum-containing species in an ion source. One or more of a halide species and a halide molecule are introduced into the ion source, the halide species being selected from the group consisting of a chlorine atom, a bromine atom, and an iodine atom, and the halide molecule including a halide selected from the group consisting of chlorine, bromine, and iodine. One or more of the halide species and the halide molecule clean one or more components of the ion source and further react with the aluminum-containing species to produce an aluminum-halide vapor. The aluminum ion beam is further formed from at least the aluminum-halide vapor.