Measured STI step height offsets compensate photoresist exposure dosage to stabilize ion implant critical dimensions.
A search apparatus generates a prediction model to identify promising parameter regions within vast semiconductor processing spaces.
A testing method uses an interposer with conductive elements on an adhesive layer to electrically test semiconductor chips directly.
A semiconductor module uses a resistor and detector to monitor electrical changes for early breakage identification.
A three-dimensional crack detection structure surrounds a semiconductor die to identify defects across multiple vertical levels.
Automated rework recovers from non-stick conditions through electrical continuity tests and re-bonding, reducing manual intervention and production delays.
A substrate rotator positions wafers for edge metrology stations to scan all sides.
Intentional defects in dummy area patterns reveal process center shifts before yield reduction occurs.
Array substrate with separate test patterns for transistors and optical detectors.
Segmenting metal alignment marks into spaced sub-marks distributes dicing stress uniformly, preventing peeling and short circuits.
An integrated metrology and process system links measurement tools directly to deposition equipment.
A dam structure isolates identification markings from dense device regions, preventing resin leakage and ensuring reliable code reading.
Hydrochromic material in OLED encapsulation changes color upon water vapor contact, enabling precise defect detection without complex equipment.
MOS-type fault detection assembly identifies supply or ground disconnection by monitoring input voltage levels, preventing unintended activation and damage.
A substrate inspection method divides peripheral edge images into divided areas to acquire feature amounts for precise defect detection.