Anti-glare film and method for manufacturing anti-glare film

Abstract

According to the present application, there is provided an antiglare film and a method for manufacturing the same, the antiglare film sequentially having a substrate, a first layer, and a second layer, wherein the second layer has a concavo-convex structure including elongated convex portions on a surface on the side opposite to the substrate, the arithmetic mean height Sa of the surface on the side opposite to the substrate of the second layer is 30 to 160 nm, the average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm, the content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1 mass% with respect to the total mass of the second layer, the average film thickness of the second layer is 0.3 to 3 μm, the haze of the antiglare film is 1 to 20%, and no scratches occur when a load of 1 kg / cm 2 is applied to the surface on the side opposite to the substrate of the antiglare film using steel wool of #0000 while reciprocally rubbing 100 times.

Description

TECHNICAL FIELD

[0001] The present application relates to an antiglare film and a method for manufacturing an antiglare film. BACKGROUND

[0002] In an image display device such as a liquid crystal display device (LCD), a plasma display panel (PDP), an electroluminescent display (ELD), or a micro LED (Light Emitting Diode: OLED), an antiglare film is used on the surface of a display in order to prevent a reduction in contrast caused by reflection of external light and reflected glare of an image.

[0003] It is known that an antiglare film is an optical film having a structure of a substrate and an antiglare layer having a concave-convex shape on the surface, and expresses antiglare properties by scattering light on the surface of the antiglare layer (by surface scattering properties).

[0004] Further, it is also known that an antiglare antireflection film, which expresses antireflection properties in addition to antiglare properties, is obtained by further laminating a low-refractive layer on the antiglare layer. In this case, it is known that, in order to express antireflection properties, it is generally necessary to make the film thickness of the low-refractive layer thin.

[0005] For example, in Patent Literature 1, an antireflection film having a low-refractive layer of 0.05 to 0.20 μm on an antiglare layer having a fine concave-convex structure on a transparent substrate is described. In Patent Literature 1, a technique of forming an antiglare layer by applying a coating liquid in which fine particles are dispersed in a binder to a transparent substrate is disclosed.

[0006] In Patent Literature 2, a transparent substrate in which an intermediate laminate is cured is described, the intermediate laminate having: a substrate; an antireflection layer having an irregular concave-convex structure on the surface; and a semi-cured layer provided between the substrate and the antireflection layer. In Patent Literature 2, a technique of forming a concave-convex structure using a transfer mold is disclosed.

[0007] However, if the antiglare films described in Patent Literature 1 and Patent Literature 2 are arranged on the display surface of an image display device, there is a problem that the concave-convex structure of the surface functions as a lens and causes glare.

[0008] As an antiglare film that suppresses glare, in Patent Literature 3, an antiglare film is disclosed that includes a surface having elongated convex portions formed in association with phase separation of a plurality of resin components.

[0009] PRIOR ART DOCUMENTS

[0010] PATENT LITERATURE

[0011] Patent Literature 1: International Publication No. 2008 / 084604

[0012] Patent Literature 2: Japanese Patent Application Laid-Open No. 2018-77279

[0013] Patent Literature 3: Japanese Patent Application Laid-Open No. 2014-85371 SUMMARY

[0014] PROBLEMS TO BE SOLVED BY THE INVENTION

[0015] However, as a result of the present inventors' studies, it was found that the antiglare film described in Patent Literature 3 is excellent in terms of antiglare property and suppression of glare, but has a problem in terms of scratch resistance of the film surface.

[0016] The present application provides an antiglare film that is excellent in terms of antiglare property, suppression of glare, and scratch resistance, and a method for producing the same.

[0017] MEANS FOR SOLVING THE PROBLEMS

[0018] The present inventors have conducted intensive studies and found that the above problems can be solved by the following solution.

[0019] [1] An antiglare film having, in order, a substrate, a first layer, and a second layer, wherein

[0020] the second layer has a concavo-convex structure including elongated convex portions on a surface on the side opposite to the substrate side,

[0021] an arithmetic mean height Sa of the surface on the side opposite to the substrate side of the second layer is 30 to 160 nm,

[0022] an average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm,

[0023] a content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1 mass% relative to the total mass of the second layer,

[0024] an average film thickness of the second layer is 0.3 to 3 μm,

[0025] a haze of the antiglare film is 1 to 20%,

[0026] no scratch occurs when a load of 1 kg / cm2is applied to the surface on the side opposite to the substrate side of the antiglare film with steel wool of #0000 while reciprocally rubbing 100 times. 2

[0027] [2] The antiglare film according to [1], wherein

[0028] ​An absolute value Δn of a difference between a refractive index n1 of the first layer represented by the following formula (i) and a refractive index n2 of the second layer is 0.05 or less.

[0029] (i) Δn = |n1 - n2|

[0030] [3] The antiglare film according to [1] or [2], wherein

[0031] An absolute value ΔG of a difference between an elastic modulus G1 of the first layer represented by the following formula (ii) and an elastic modulus G2 of the second layer is 2 GPa or less.

[0032] (ii) ΔG = |G1 - G2|

[0033] [4] The antiglare film according to any one of [1] to [3], wherein

[0034] An arithmetic mean height Sa of a surface of the second layer on a side opposite to the substrate side is 40 to 100 nm.

[0035] [5] The antiglare film according to any one of [1] to [4], wherein

[0036] A haze of the antiglare film is 5 to 10%.

[0037] [6] The antiglare film according to any one of [1] to [5], wherein

[0038] An average distance between adjacent convex portions in the concavo-convex structure is 5 to 15 μm.

[0039] [7] A method for manufacturing an antiglare film, the antiglare film having, in order, a substrate, a first layer, and a second layer, wherein

[0040] The second layer has a concavo-convex structure including elongated convex portions on a surface of a side opposite to the substrate side,

[0041] An arithmetic mean height Sa of a surface of the second layer on a side opposite to the substrate side is 30 to 160 nm,

[0042] An average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm,

[0043] A content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1 mass% with respect to a total mass of the second layer,

[0044] An average film thickness of the second layer is 0.3 to 3 μm,

[0045] A haze of the antiglare film is 1 to 20%,

[0046] A 1 kg / cm 2 scratch did not occur when a load of 1 kg / cm

[0047] The manufacturing method of the anti-glare film successively includes:

[0048] (I) a step of forming a first layer coating film by applying a first layer forming composition containing a polymerizable compound (al) on a substrate;

[0049] (II) a step of semi-curing the first layer coating film;

[0050] (III) a step of forming a second layer coating film by applying a second layer forming composition on the semi-cured first layer coating film; and

[0051] (IV) a step of forming the first and second layers by curing the semi-cured first layer coating film and the second layer coating film.

[0052] [8] The manufacturing method of the anti-glare film according to [7], wherein

[0053] an arithmetic mean height Sa2 of a surface on a side opposite to the substrate side of the first layer coating film semi-cured in the step (II) is 30 nm or less.

[0054] [9] The manufacturing method of the anti-glare film according to [7] or [8], wherein

[0055] a consumption rate of a polymerizable group in the polymerizable compound (al) of the first layer coating film semi-cured in the step (II) is 1 to 40%.

[0056]

[10] The manufacturing method of the anti-glare film according to any one of [7] to [9], wherein

[0057] a recovery rate of the first layer coating film semi-cured in the step (II) is 2 to 50%.

[0058] Effects of the Invention

[0059] According to the present application, it is possible to provide an anti-glare film having excellent anti-glare properties, in which glare is suppressed, and excellent scratch resistance, and a manufacturing method of the anti-glare film. BRIEF DESCRIPTION OF DRAWINGS

[0060] Figure 1 is a 3D image of a scanning white interference electron microscope photograph of a surface of the second layer of the anti-glare film obtained in Example 1.

[0061] Figure 2is a planar image of a scanning white interference electron microscope photograph of the surface of the second layer of the antiglare film obtained in Example 1.

[0062] Figure 3 is a 3D image of a scanning white interference electron microscope photograph of the surface of the second layer of the antiglare film obtained in Example 2.

[0063] Figure 4 is a planar image of a scanning white interference electron microscope photograph of the surface of the second layer of the antiglare film obtained in Example 2. DETAILED DESCRIPTION

[0064] Hereinafter, modes for carrying out the present application will be explained in detail, but the present application is not limited to these. Also, in the present specification, when a numerical value represents a physical property value, a characteristic value, or the like, the notation of "(numerical value 1) to (numerical value 2)" represents the meaning of "from (numerical value 1) or more to (numerical value 2) or less". Also, in the present specification, the notation of "(meth)acrylate" represents the meaning of "at least either one of acrylate and methacrylate". The same applies to "(meth)acrylic acid", "(meth)acryl group", "(meth)acrylamide", "(meth)acryloxy group", and the like.

[0065] [Antiglare film]

[0066] The antiglare film of the present application has, in order, a substrate, a first layer, and a second layer, wherein

[0067] the second layer has, on the surface on the side opposite to the substrate side, a concavo-convex structure including elongated convex portions,

[0068] the arithmetic mean height Sa of the surface of the second layer on the side opposite to the substrate side is 30 to 160 nm,

[0069] the average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm,

[0070] the content of particles having a particle diameter of 300 nm or more in the second layer is 0 to 0.1 mass% relative to the total mass of the second layer,

[0071] the average film thickness of the second layer is 0.3 to 3 μm,

[0072] the haze of the antiglare film is 1 to 20%,

[0073] when a load of 1 kg / cm2is applied to the surface of the second layer on the side opposite to the substrate side with steel wool of #0000 and reciprocally rubbed 100 times, no scratch occurs. 2

[0074] ​Although the reason why the anti-glare film of the present application is excellent in anti-glare property, glare is suppressed, and an effect of being excellent in scratch resistance is exerted is not completely clear, the present inventors presume as follows.

[0075] The anti-glare film of the present application has elongated convex portions on the surface of the second layer, and it is considered that the anti-glare property is expressed due to a specific concavo-convex structure formed by these elongated convex portions. Also, it is considered that since the concavo-convex structure is caused by the elongated convex portions, not by particles as in the prior art, it becomes difficult to produce a lens effect, and glare can be suppressed.

[0076] Also, as described later, the anti-glare film of the present application is preferably produced by a method including semi-curing the first layer coating film formed on the substrate, and a step of applying a second layer-forming composition on the semi-cured first layer coating film. In the above step, it is considered that a part of the second layer-forming composition penetrates into the semi-cured first layer coating film, and when drying and curing are performed thereafter, volume expansion occurs in the film thickness direction of the film, and elongated convex portions are formed.

[0077] Hereinafter, the anti-glare film of the present application will be described in detail.

[0078] The anti-glare film of the present application (sometimes also referred to as the film of the present application.) has at least a substrate, a first layer, and a second layer.

[0079] The anti-glare film of the present application has a substrate, a first layer, and a second layer in this order. That is, the anti-glare film of the present application has a first layer and a second layer laminated in this order on a substrate.

[0080] (Concavo-convex structure of the second layer)

[0081] The second layer has a concavo-convex structure including elongated convex portions on the surface on the side opposite to the substrate side. The anti-glare film of the present application can express the anti-glare property by this concavo-convex structure.

[0082] The arithmetic mean height Sa of the surface on the side opposite to the substrate side of the second layer is 30 to 160 nm. The anti-glare film of the present application becomes difficult to produce a lens effect based on the concavo-convex structure by the arithmetic mean height Sa of the surface of the second layer being in the above range, and even if arranged on the display surface of an image display device (particularly, a high-definition image display device), the anti-glare property is not impaired, and glare can be suppressed.

[0083] The arithmetic average height Sa is prescribed by ISO 25178, and is calculated by the same analysis software VS-Viewer from data measured under the measurement conditions of the wave mode of a scanning white light interference microscope (vertscan (registered trademark) 2.0, Hitachi High-Tech Science Corporation) with an objective lens of 10 times.

[0084] The arithmetic average height Sa of the surface of the side opposite to the substrate side of the second layer is 30 to 160 nm, preferably 40 to 100 nm, more preferably 45 to 100 nm, and further preferably 45 to 60 nm.

[0085] - Elongated Protrusions -

[0086] The shape of the elongated protrusions present on the surface of the second layer is not particularly limited as long as it is elongated (i.e., not particularly limited as long as it is not cubic or spherical).

[0087] The elongated protrusions may, for example, be linear. As the line when the elongated protrusions are linear (string-shaped), it can be a straight line, a broken line, or a curved line.

[0088] The elongated protrusions can have a branched structure or can not have a branched structure.

[0089] Also, the elongated protrusions can be formed in a mesh shape.

[0090] The antiglare film of the present application preferably has a plurality of elongated protrusions, the shape of each of the elongated protrusions can be the same or different, and is preferably different (i.e., is preferably non-uniform). Also, the size (length, width, height) of the elongated protrusions can be the same or different, and is preferably different (i.e., is preferably non-uniform).

[0091] The average distance between adjacent protrusions (average protrusion distance) in the concave-convex structure is 5 to 80 μm.

[0092] The average distance between adjacent convex portions in the concave-convex structure is the average value of the distance A between a certain elongated convex portion and another elongated convex portion adjacent to the certain elongated convex portion. The distance A is the distance between a point a on the outline (contour line) of a certain elongated convex portion and a point b on the outline (contour line) of another elongated convex portion adjacent to the certain elongated convex portion in a photograph of the surface of the second layer taken from a direction orthogonal to the surface of the substrate by a vert scan (registered trademark) 2.0 (Hitachi High-Tech Science Corporation). The point b is the point on the outline (contour line) of the elongated convex portion that exists in the direction opposite to the direction from the point a toward the inside of the elongated convex portion to which the point a belongs, among the points on the outline (contour line) of the elongated convex portion that intersect a straight line c orthogonal to the tangent line at the point a, and is the point closest to the point a.

[0093] The average distance between adjacent convex portions in the concave-convex structure is the average value of the distance A determined at any 10 or more places.

[0094] If the average distance exceeds 80 μm, the anti-glare performance based on the surface concave-convex structure cannot be sufficiently exerted.

[0095] The average distance between adjacent convex portions in the concave-convex structure is preferably 5 to 60 μm, more preferably 5 to 50 μm, further preferably 5 to 30 μm, particularly preferably 5 to 20 μm, and most preferably 5 to 15 μm.

[0096] The elongated convex portion is preferably an elongated convex portion having a total length of 100 μm or more (preferably 200 μm or more, and further preferably 500 μm or more). The "total length" of the elongated convex portion indicates the total length of the elongated convex portion, and in the case of an elongated convex portion having a branched structure, indicates the total length of the lengths of the branches.

[0097] When the second layer is viewed from above (when viewed from a direction orthogonal to the surface of the substrate), the shape (two-dimensional shape) of the elongated convex portion is generally a string shape having a curved portion in part or as a whole, and the average width of the elongated convex portion is preferably 0.1 to 30 μm, more preferably 0.1 to 20 μm, further preferably 0.1 to 15 μm, particularly preferably 0.1 to 10 μm, and most preferably 0.1 to 5 μm. By setting the average width of the elongated convex portion to 0.1 μm or more, it becomes easy to obtain the anti-glare property, and by setting it to 30 μm or less, it becomes easy to obtain the glare suppression effect.

[0098] In addition, in the anti-glare film of the present application, all of the convex portions present on the surface of the second layer do not need to be elongated, and other convex portions (non-elongated convex portions) can be included.

[0099] The length ratio of the elongated protrusions to the other protrusions on the surface of the second layer can be selected, for example, from the range of elongated protrusion length / other protrusion length = 100 / 0 to 10 / 90, for example, 100 / 0 to 30 / 70, preferably 100 / 0 to 50 / 50, further preferably 100 / 0 to 70 / 30 (particularly 100 / 0 to 90 / 10), and particularly preferably approximately 100% (for example, the surface contains only elongated protrusions).

[0100] The area ratio of the total protrusions in the surface of the second layer to the total surface is, for example, 10 to 100%, preferably 30 to 100%, and further preferably approximately 50 to 100% (particularly 70 to 100%). By setting the area ratio to the above range, it becomes easy to balance the anti-glare property and the suppression of glare.

[0101] The length and width, shape (presence or absence of branched structure), and area of the elongated protrusions can be determined or evaluated based on the two-dimensional shape observed in an electron microscope photograph. Also, the average value is the average of the values determined at 10 or more arbitrary places. Also, the length ratio of the elongated protrusions to the other protrusions can be determined by measuring each length in a 1 mm 2 square region. In observing the shape of the elongated protrusions with a microscope, it can be recognized based on the ridge-like (edge line-like) portion connecting the apexes of the protrusions. Also, in the present specification, the length of the elongated protrusions can be determined as the length of the ridge portion described above.

[0102] (Haze)

[0103] The haze (total haze) of the anti-glare film of the present application is 1 to 20%.

[0104] By setting the haze to 1% or more, the anti-glare property can be expressed, and by setting it to 20% or less, the faded appearance can be reduced. The haze of the anti-glare film of the present application is preferably 1 to 15%, more preferably 3 to 13%, and further preferably 5 to 10%.

[0105] (Scratch resistance)

[0106] The anti-glare film of the present application does not have scratches when a surface on the side opposite to the above-described substrate side is rubbed 100 times with a load of 1 kg / cm 2 using steel wool of #0000 while reciprocating. More specifically, under the evaluation environmental conditions of 25°C and a relative humidity of 60%, steel wool (manufactured by NIHON STEEL WOOL Co., Ltd., grade No. #0000) was used as the rubbing material, and when the surface on the side opposite to the substrate was rubbed 100 times with a load of 1 kg / cm 2 , no scratches were confirmed upon visual observation.

[0107] The anti-glare film of the present application preferably does not have scratches when a load of 1 kg / cm2is applied to the surface of the side opposite the substrate side described above using steel wool of #0000 while reciprocally rubbing 250 times, more preferably does not have scratches when reciprocally rubbing 500 times. 2

[0108] In addition, when the layer structure of the anti-glare film of the present application is "substrate / first layer / second layer", the surface of the side opposite the substrate side is the surface of the second layer.

[0109] In order to set the scratch resistance of the anti-glare film within the range described above, it is possible to achieve this by appropriately adjusting the combination of raw materials that form the first and second layers in the anti-glare film or the conditions in the manufacturing method of the anti-glare film described later, such as the solid content concentration of the composition used in order to form these layers and the layer curing conditions.

[0110] In the anti-glare film of the present application, the content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1 mass% relative to the total mass of the second layer.

[0111] This means that the anti-glare film of the present application does not substantially contain particles that form surface irregularities and contribute to the expression of anti-glare properties in the second layer.

[0112] The content of the particles described above is preferably 0 to 0.05 mass%, more preferably 0 to 0.01 mass%, and most preferably 0 mass% relative to the total mass of the second layer, i.e., does not contain the particles described above.

[0113] The anti-glare film of the present application preferably does not substantially contain particles having a particle size of 300 nm or more in the layers other than the second layer. That is, the anti-glare film of the present application preferably does not contain particles that form surface irregularities and contribute to the expression of anti-glare properties in any layer.

[0114] The anti-glare film of the present application has a first layer and a second layer sequentially laminated on a substrate. The functions possessed by the first and second layers are not particularly limited, and the first layer described above is preferably a hard coat layer. Furthermore, the second layer described above is preferably a scratch-resistant layer.

[0115] The anti-glare film of the present application can further have a first layer, a hard coat layer as a second layer, and a functional layer other than a scratch-resistant layer.

[0116] As the layer structure of the anti-glare film of the present application, for example, the following layer structures can be given.

[0117] • substrate / hard coat layer (first layer) / scratch-resistant layer (second layer)

[0118] • substrate / adhesive layer / hard coat layer (first layer) / scratch-resistant layer (second layer)

[0119] ​• Substrate / conductive layer / hard coat layer (1st layer) / scratch resistant layer (2nd layer)

[0120] • Substrate / barrier layer / hard coat layer (1st layer) / scratch resistant layer (2nd layer)

[0121] • Substrate / ultraviolet absorbing layer / hard coat layer (1st layer) / scratch resistant layer (2nd layer)

[0122] • Substrate / hard coat layer (1st layer) / scratch resistant layer (2nd layer) / fingerprint resistant layer (3rd layer)

[0123] [Substrate]

[0124] The anti-glare film of the present application has a substrate. Hereinafter, preferred modes of the raw material (material forming the substrate) and the like of the substrate will be described.

[0125] The substrate used in the anti-glare film of the present application preferably has a transmittance of 70% or more in the visible light region, more preferably 80% or more, and further preferably 90% or more.

[0126] (Polymer)

[0127] The substrate preferably contains a polymer.

[0128] As the polymer, a polymer having excellent optical transparency, mechanical strength, thermal stability, and the like is preferred.

[0129] As the polymer, for example, polycarbonate-based polymers, polyester-based polymers such as polyethylene terephthalate (PET), polyethylene naphthalate (PEN), polystyrene, acrylonitrile-styrene copolymers (AS resin), and the like can be given. Also, polyolefins such as polyethylene, polypropylene, norbornene-based resins, polyolefin-based polymers such as ethylene-propylene copolymers, (meth)acrylic-based polymers such as polymethyl methacrylate, chlorovinyl-based polymers, nylon, aromatic polyamides, imide-based polymers, sulfone-based polymers, polyether sulfone-based polymers, polyether ether ketone-based polymers, polyphenylene sulfide-based polymers, vinylidene dichloride-based polymers, vinyl alcohol-based polymers, vinyl butyral-based polymers, arylate-based polymers, polyformaldehyde-based polymers, epoxy-based polymers, cellulose-based polymers represented by triacetyl cellulose, or copolymers of the above polymers with each other, polymers obtained by mixing the above polymers with each other can be given.

[0130] In particular, since amide-based polymers such as aromatic polyamides and imide-based polymers have a high number of breakage flexes and high hardness as measured by MIT tester in accordance with JIS (Japanese Industrial Standards) P8115 (2001), they are preferably used as the base material. For example, aromatic polyamides as described in Example 1 of Japanese Patent No. 5699454, polyimides as described in Japanese Patent Application Publication No. 2015-508345, Japanese Patent Application Publication No. 2016-521216, and WO 2017 / 014287 can be preferably used as the base material.

[0131] As the amide-based polymer, an aromatic polyamide (aramid-based polymer) is preferable.

[0132] The base material preferably contains at least one polymer selected from the group consisting of imide-based polymers and aramid-based polymers.

[0133] Further, the base material can also be formed as a cured layer of an ultraviolet-cured, heat-cured resin such as an acrylic, urethane, acryl urethane, epoxy, silicone, or the like.

[0134] (Softening raw material)

[0135] The base material can also contain a raw material that further softens the above-described polymer. The softening raw material refers to a compound that increases the number of breakage flexes, and as the softening raw material, a rubbery elastomer, a brittleness improver, a plasticizer, a slip ring polymer, or the like can be used.

[0136] As the softening raw material, specifically, the softening raw materials described in

[0051] to

[0114] in Japanese Patent Application Publication No. 2016-167043 can be preferably used.

[0137] The softening raw material can be mixed into the polymer alone, or a plurality of softening raw materials can be appropriately mixed at the same time, and the softening raw material can also be used alone or a plurality of softening raw materials can be used at the same time as the base material without being mixed with the polymer.

[0138] The amount of the softening raw material mixed is not particularly limited, and the polymer alone can be used as the base material of the film with a sufficient number of breakage flexes, the softening raw material can be mixed, or all of the softening raw material (100%) can be mixed to have a sufficient number of breakage flexes.

[0139] (Other additives)

[0140] Various additives (for example, ultraviolet absorbers, matting agents, antioxidants, peeling promoters, retardation (optical anisotropy) adjusting agents, and the like) corresponding to the use can be added to the base material. These can be solids or oils. That is, the melting point or boiling point thereof is not particularly limited. Also, regarding the timing of adding the additives, the additives can be added at any point in the process of producing the base material, or the process of adding the additives and producing can be performed in the raw material preparation process. Furthermore, regarding the amount of each raw material to be added, there is no particular limitation as long as the function is exerted.

[0141] As the other additives, the additives described in

[0117] to

[0122] in Japanese Patent Application Publication No. 2016-167043 can be preferably used.

[0142] The above additives can be used alone or in combination with two or more kinds.

[0143] (Thickness of base material)

[0144] The base material is preferably in the form of a film.

[0145] The thickness of the base material is more preferably 100 μm or less, further preferably 80 μm or less, and most preferably 50 μm or less. Also, from the viewpoint of easily handling the base material, the thickness of the base material is preferably 3 μm or more, more preferably 5 μm or more, and most preferably 15 μm or more.

[0146] At least one surface of the base material can be subjected to surface treatment.

[0147] [First layer]

[0148] The antiglare film of the present application has a first layer on the base material. The first layer is preferably a hard coat layer. The first layer can have functions such as conductivity and barrier properties in addition to the hard coat property.

[0149] <Raw material of first layer>

[0150] Preferred modes of the raw material of the first layer (material for forming the first layer) and the like in the antiglare film of the present application are described.

[0151] The first layer is preferably formed by curing a first layer-forming composition. That is, the first layer preferably contains a cured product of the first layer-forming composition.

[0152] (Polymerizable compound (a1))

[0153] The first layer-forming composition preferably contains a polymerizable compound (a1) (sometimes referred to as “compound (a1)”). As the compound (a1), there is no particular limitation, and examples include radical polymerizable compounds, cationic polymerizable compounds, anionic polymerizable compounds, and the like, but a radical polymerizable compound is preferable.

[0154] As the radical polymerizable group possessed by the radical polymerizable compound, a polymerizable unsaturated group can be mentioned, more preferably a vinyl group, an allyl group, a (meth)acryloyloxy group, or a (meth)acrylamido group, further preferably a (meth)acryloyloxy group or a (meth)acrylamido group, and particularly preferably a (meth)acrylamido group.

[0155] The compound (al) is preferably a compound having two or more radical polymerizable groups in one molecule, and more preferably a compound having three or more radical polymerizable groups in one molecule

[0156] As a preferable mode of the compound (al), a compound having one or more amide bonds, urethane bonds, or urea bonds in one molecule can be mentioned. More preferably, a compound having two or more radical polymerizable groups in one molecule, and having one or more amide bonds or urethane bonds.

[0157] In addition, the amide bond described above can be an amide bond included in a radical polymerizable group such as a (meth)acrylamido group.

[0158] The molecular weight of the compound (al) is not particularly limited, and can be a monomer, an oligomer, or a polymer.

[0159] Polyorganosilsesquioxane having a radical polymerizable group

[0160] From the viewpoint of scratch resistance, as one of the preferable modes of the compound (al), a polyorganosilsesquioxane having a radical polymerizable group (also referred to as polyorganosilsesquioxane (al-1)) can be mentioned.

[0161] The radical polymerizable group possessed by the polyorganosilsesquioxane (al-1) is preferably a (meth)acryloyloxy group or a (meth)acrylamido group, and more preferably a (meth)acrylamido group.

[0162] The polyorganosilsesquioxane (al-1) preferably has a constitutional unit represented by General Formula (S1-1) or a constitutional unit represented by General Formula (S2-1).

[0163] [Chemical Formula 1]

[0164]

[0165] In General Formula (S1-1),

[0166] L 11 represents a substituted or unsubstituted alkylene group,

[0167] R 11represents a single bond, -NH-, -O-, -C(=O)-, or a divalent linking group obtained by combining these,

[0168] L 12 represents a substituted or unsubstituted alkylene group,

[0169] Q 11 represents a radical polymerizable group.

[0170] "SiO 1.5 " in General Formula (S1-1) represents a structural moiety constituted by a siloxane bond (Si-O-Si) in a polyorganosilsesquioxane.

[0171] A polyorganosilsesquioxane refers to a network polymer or a polyhedral cluster having a siloxane-constituting unit (silsesquioxane unit) derived from a hydrolyzable tri-functional silane compound, and capable of forming a random structure, a ladder structure, a cage structure, or the like through a siloxane bond. In the present application, the structural moiety represented by "SiO 1.5 " can be any of the above structures, but preferably contains a plurality of ladder structures. By forming a ladder structure, the deformation recovery of the hard coat film can be favorably ensured. As to the formation of a ladder structure, the presence or absence of an absorption derived from characteristic Si-O-Si stretching in the ladder structure appearing near 1020-1050 cm -1 when FT-IR (Fourier Transform Infrared Spectroscopy) is measured is qualitatively confirmed.

[0172] In General Formula (S1-1), L 11 represents an alkylene group, and is preferably an alkylene group having 1 to 10 carbon atoms, and examples thereof include a methylene group, a methylmethylene group, a dimethylmethylene group, an ethylene group, an isopropylene group, a n-propylene group, a n-butylene group, a n-pentylene group, a n-hexylene group, a n-decylene group, and the like.

[0173] When the alkylene group represented by L 11 has a substituent, examples of the substituent include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group, a silyl group, and the like.

[0174] L 11 is preferably an unsubstituted linear alkylene group having 2 to 4 carbon atoms, and is more preferably an ethylene group or a n-propylene group, and is further preferably a n-propylene group.

[0175] In General Formula (S1-1), R 11 represents a single bond, -NH-, -O-, -C(=O)-, or a divalent linking group obtained by combining these.

[0176] As the divalent linking group resulting from the combination of -NH-, -O-, -C(=O)-, there can be mentioned *-NH-C(=O)-**, *-C(=O)-NH-**, *-NH-C(=O)-O-**, *-O-C(=O)-NH-**, -NH-C(=O)-NH-, *-C(=O)-O-**, *-O-C(=O)-**, and the like. * indicates the bond to L 11 in General Formula (S1-1), and ** indicates the bond to L 12 in General Formula (S1-1).

[0177] R 11 is preferably -NH-C(=O)-NH-, *-NH-C(=O)-O-**, *-NH-C(=O)-**, or -O-, more preferably -NH-C(=O)-NH-, *-NH-C(=O)-O-**, or *-NH-C(=O)-**.

[0178] In General Formula (S1-1), L 12 represents an alkylene group, and is preferably an alkylene group having 1 to 10 carbon atoms, and examples thereof include methylene, methylmethylene, dimethylmethylene, ethylene, isopropylene, n-propylene, n-butylene, n-pentylene, n-hexylene, n-decylene, and the like.

[0179] When the alkylene group represented by L 12 has a substituent, examples of the substituent include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group, a silyl group, and the like.

[0180] L 12 is preferably a linear alkylene group having 1 to 3 carbon atoms, and is more preferably a methylene group, an ethylene group, an n-propylene group, or a 2-hydroxy-n-propylene group, and is further preferably a methylene group or an ethylene group.

[0181] In General Formula (S1-1), Q 11 represents a radically polymerizable group. As the radically polymerizable group, a vinyl group, an allyl group, a (meth)acryloyloxy group, or a (meth)acrylamido group is more preferable, and a (meth)acryloyloxy group or a (meth)acrylamido group is further preferable.

[0182] The constitutional unit represented by General Formula (S1-1) is preferably a constitutional unit represented by General Formula (S1-2) below.

[0183] [Chemical Formula 2]

[0184]

[0185] In General Formula (S1-2),

[0186] L11 represents a substituted or unsubstituted alkylene group,

[0187] r 11 represents a single bond, -NH- or -O-,

[0188] L 12 represents a substituted or unsubstituted alkylene group,

[0189] q 11 represents -NH- or -O-,

[0190] q 12 represents a hydrogen atom or a methyl group.

[0191] "SiO 1.5 " in General Formula (S1-2) represents a structural moiety constituted by a siloxane bond (Si-O-Si) in a polyorganosilsesquioxane.

[0192] In General Formula (S1-2), L 11 represents a substituted or unsubstituted alkylene group. L 11 has the same meaning as L 11 in General Formula (S1-1), and the preferable examples are also the same.

[0193] In General Formula (S1-2), L 12 represents a substituted or unsubstituted alkylene group. L 12 has the same meaning as L 12 in General Formula (S1-1), and the preferable examples are also the same.

[0194] q 12 represents a hydrogen atom or a methyl group, and preferably a hydrogen atom.

[0195] [Chemical Formula 3]

[0196]

[0197] In General Formula (S2-1),

[0198] L 21 represents a substituted or unsubstituted alkylene group,

[0199] Q 21 represents a (meth)acrylamide group.

[0200] "SiO 1.5 " in General Formula (S2-1) represents a structural moiety constituted by a siloxane bond (Si-O-Si) in a polyorganosilsesquioxane.

[0201] In General Formula (S2-1), L 21" represents an alkylene group, preferably an alkylene group having 1 to 10 carbon atoms. Examples thereof include methylene, methylmethylene, dimethylmethylene, ethylene, isopropylene, n-propylene, n-butylene, n-pentylene, n-hexylene, n-decylene, and the like.

[0202] L 21 When the alkylene group represented by the above formula has a substituent, examples of the substituent include a hydroxyl group, a carboxyl group, an alkoxy group, an aryl group, a heteroaryl group, a halogen atom, a nitro group, a cyano group, a silyl group, and the like.

[0203] L 21 Preferably, the alkylene group is an unsubstituted linear alkylene group having 2 to 4 carbon atoms, more preferably an ethylene group or an n-propylene group, and further preferably an n-propylene group.

[0204] The polyorganosilsesquioxane (a1-1) can have a constitutional unit other than the constitutional unit represented by the above general formula (S1-1) or (S2-1), within a range that does not impair the effects of the present application. In the polyorganosilsesquioxane (a1-1), the molar ratio of the constitutional unit other than the constitutional unit represented by the above general formula (S1-1) or (S2-1) is preferably 10 mol% or less, more preferably 5 mol% or less, and further preferably the polyorganosilsesquioxane (a1-1) does not contain a constitutional unit other than the constitutional unit represented by the above general formula (S1-1) or (S2-1).

[0205] Specific examples of the polyorganosilsesquioxane (a1-1) are shown below, but the present application is not limited to these. In the following structural formulas, "SiO 1.5 " represents a silsesquioxane unit.

[0206] [Chemical Formula 4]

[0207]

[0208] From the viewpoint of improving the hardness of the pencil, the weight average molecular weight (Mw) of the polyorganosilsesquioxane (a1-1) based on standard polystyrene conversion by gel permeation chromatography (GPC) is preferably 5000 to 1000000, more preferably 10000 to 1000000, and further preferably 10000 to 100000.

[0209] The molecular weight dispersity (Mw / Mn) of the polyorganosilsesquioxane (a1-1) based on standard polystyrene conversion by GPC is, for example, 1.0 to 4.0, preferably 1.1 to 3.7, more preferably 1.2 to 3.0, and further preferably 1.3 to 2.5. Mw represents the weight average molecular weight, and Mn represents the number average molecular weight.

[0210] The weight average molecular weight and the molecular weight dispersity of the polyorganosilsesquioxane (a1-1) were measured by the following device and conditions.

[0211] Measurement device: Trade name "LC-20AD" (manufactured by SHIMADZU CORPORATION)

[0212] Column: Shodex KF-801 x 2, KF-802, and KF-803 (manufactured by SHOWA DENKO K.K.)

[0213] Measurement temperature: 40°C

[0214] Eluent: N-methylpyrrolidone (NMP), sample concentration 0.1 to 0.2 mass%

[0215] Flow rate: 1 mL / minute

[0216] Detector: UV-VIS detector (trade name "SPD-20A", manufactured by SHIMADZU CORPORATION)

[0217] Molecular weight: converted to standard polystyrene

[0218] -Method for producing polyorganosilsesquioxane (a1-1)-

[0219] The method for producing the polyorganosilsesquioxane (a1-1) is not particularly limited, and can be produced using a publicly known production method, for example, can be produced by a method in which a hydrolyzable silane compound is subjected to hydrolysis and condensation. As the hydrolyzable silane compound, a compound represented by the following general formula (Sd1-1), a compound represented by the following general formula (Sd2-1), or the like is preferably used.

[0220] The compound represented by the following general formula (Sd1-1) corresponds to the constitutional unit represented by the above general formula (S1-1), and the compound represented by the following general formula (Sd2-1) corresponds to the constitutional unit represented by the above general formula (S2-1).

[0221] [Chemical Formula 5]

[0222]

[0223] In the general formula (Sd1-1), X 1 ~X 3 each independently represents an alkoxy group or a halogen atom, L 11 represents a substituted or unsubstituted alkylene group, R 11 represents a single bond, -NH-, -O-, -C(=O)-, or a divalent linking group obtained by combining these, L 12 represents a substituted or unsubstituted alkylene group, Q11 represents a radical polymerizable group. Among them, the constitutional unit represented by General Formula (S1-1) has at least one group containing a hydrogen atom capable of forming a hydrogen bond.

[0224] In General Formula (Sd2-1), X 4 ~X 6 each independently represents an alkoxy group or a halogen atom, L 21 represents a substituted or unsubstituted alkylene group, Q 21 represents a (meth)acrylamide group.

[0225] In General Formula (Sd1-1), L 11 , R 11 , L 12 and Q 11 have the same meanings as L 11 , R 11 , L 12 and Q 11 in General Formula (S1-1), respectively, and the preferable ranges are also the same.

[0226] In General Formula (Sd2-1), L 21 and Q 21 have the same meanings as L 21 and Q 21 in General Formula (S2-1), respectively, and the preferable ranges are also the same.

[0227] In General Formulae (Sd1-1) and (Sd2-1), X 1 ~X 6 each independently represents an alkoxy group or a halogen atom.

[0228] As the above alkoxy group, for example, a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a butoxy group, an isobutoxy group, or the like, an alkoxy group having 1 to 4 carbon atoms, or the like can be given.

[0229] As the above halogen atom, for example, a fluorine atom, a chlorine atom, a bromine atom, an iodine atom, or the like can be given.

[0230] As X 1 ~X 6 , an alkoxy group is preferable, and a methoxy group, an ethoxy group, or the like is more preferable. In addition, X 1 ~X 6 may be the same or different, respectively.

[0231] The use amount and the composition of the above hydrolyzable silane compound can be appropriately adjusted in correspondence with the structure of the desired polyorganosilsesquioxane (a1-1).

[0232] Also, the hydrolysis and condensation reaction of the above hydrolyzable silane compound can be performed simultaneously or sequentially. The order of the reaction is not particularly limited when the reaction is performed sequentially.

[0233] The hydrolysis and condensation reaction of the above hydrolyzable silane compound can be performed in the presence of a solvent or in the absence of a solvent, and is preferably performed in the presence of a solvent.

[0234] As the above solvent, for example, aromatic hydrocarbons such as benzene, toluene, xylene, ethylbenzene; ethers such as diethyl ether, dimethoxyethane, tetrahydrofuran, dioxane; ketones such as acetone, methyl ethyl ketone, methyl isobutyl ketone; esters such as methyl acetate, ethyl acetate, isopropyl acetate, butyl acetate; amides such as N,N-dimethylformamide, N,N-dimethylacetamide; nitriles such as acetonitrile, propionitrile, benzonitrile; alcohols such as methanol, ethanol, isopropanol, butanol, and the like can be given.

[0235] As the above solvent, a ketone or an ether is preferred. Also, the solvent can be used alone or in combination of two or more.

[0236] The amount of the solvent used is not particularly limited, and generally, it can be in the range of 0 to 2000 parts by mass with respect to 100 parts by mass of the total amount of the hydrolyzable silane compound, and can be appropriately adjusted according to the desired reaction time and the like.

[0237] The hydrolysis and condensation reaction of the above hydrolyzable silane compound is preferably performed in the presence of a catalyst and water. The above catalyst can be an acid catalyst or a base catalyst.

[0238] The above acid catalyst is not particularly limited, and for example, inorganic acids such as hydrochloric acid, sulfuric acid, nitric acid, phosphoric acid, boric acid; phosphoric acid esters; carboxylic acids such as acetic acid, formic acid, trifluoroacetic acid; sulfonic acids such as methanesulfonic acid, trifluoromethanesulfonic acid, p-toluenesulfonic acid; solid acids such as activated clay; Lewis acids such as ferric chloride, and the like can be given.

[0239] As the above-mentioned base catalyst, there is no particular limitation, and for example, alkali metal hydroxides such as lithium hydroxide, sodium hydroxide, potassium hydroxide, and cesium hydroxide; alkaline earth metal hydroxides such as magnesium hydroxide, calcium hydroxide, and barium hydroxide; alkali metal carbonates such as lithium carbonate, sodium carbonate, potassium carbonate, and cesium carbonate; alkaline earth metal carbonates such as magnesium carbonate; alkali metal bicarbonates such as lithium bicarbonate, sodium bicarbonate, potassium bicarbonate, and cesium bicarbonate; alkali metal organic acid salts (for example, acetates) such as lithium acetate, sodium acetate, potassium acetate, and cesium acetate; alkaline earth metal organic acid salts (for example, acetates) such as magnesium acetate; alkali metal alkoxides such as lithium methoxide, sodium methoxide, sodium ethoxide, sodium isopropoxide, potassium ethoxide, and potassium tert-butoxide; alkali metal phenolates such as sodium phenoxide; amines (tertiary amines and the like) such as triethylamine, N-methylpiperidine, 1,8-diazabicyclo[5.4.0]undec-7-ene, and 1,5-diazabicyclo[4.3.0]non-5-ene; nitrogen-containing aromatic heterocyclic compounds such as pyridine, 2,2'-bipyridine, and 1,10-phenanthroline; and the like can be given.

[0240] In addition, the catalyst can be used alone, or two or more kinds can be used in combination. Furthermore, the catalyst can be used in a state of being dissolved or dispersed in water or a solvent or the like.

[0241] The amount of the above-mentioned catalyst used is not particularly limited, and generally, it can be appropriately adjusted within a range of 0.002 to 0.200 moles relative to 1 mole of the total amount of the hydrolyzable silane compound.

[0242] The amount of water used when the above-mentioned hydrolysis and condensation reactions are performed is not particularly limited, and generally, it can be appropriately adjusted within a range of 0.5 to 40 moles relative to 1 mole of the total amount of the hydrolyzable silane compound.

[0243] The method of adding the above-mentioned water is not particularly limited, and the total amount of water used (total amount used) can be added at once, or it can be added sequentially. When added sequentially, it can be added continuously or intermittently.

[0244] The reaction temperature of the above-mentioned hydrolysis and condensation reactions is not particularly limited, and for example, it is 40 to 100°C, and preferably 45 to 80°C. Furthermore, the reaction time of the above-mentioned hydrolysis and condensation reactions is not particularly limited, and for example, it is 0.1 to 15 hours, and preferably 1.5 to 10 hours. Furthermore, the above-mentioned hydrolysis and condensation reactions can be performed under normal pressure, or they can be performed under pressurization or depressurization. In addition, the environmental atmosphere when the above-mentioned hydrolysis and condensation reactions are performed can be any one of, for example, a nitrogen atmosphere, an argon atmosphere, or the like, a non-active gas atmosphere, the presence of oxygen such as air, or the like, but it is preferably a non-active gas atmosphere.

[0245] The polyorganosilsesquioxane (al-1) can be obtained by hydrolysis and condensation of the above-mentioned hydrolyzable silane compound. After the above-mentioned hydrolysis and condensation are completed, the catalyst can be neutralized. Also, the polyorganosilsesquioxane (al) can be isolated and purified, for example, by a separation method such as water washing, acid washing, alkali washing, filtration, concentration, distillation, extraction, crystallization, recrystallization, column chromatography, or a combination of these.

[0246] - urethane (meth)acrylate compound, (meth)acrylamide compound

[0247] In addition to the above-mentioned polyorganosilsesquioxane (al-1), as a preferable form of the compound (al), a urethane (meth)acrylate compound or a (meth)acrylamide compound can be mentioned. The urethane (meth)acrylate compound or the (meth)acrylamide compound is preferably a urethane (meth)acrylate compound or a (meth)acrylamide compound having two or more polymerizable groups in one molecule, and more preferably a urethane (meth)acrylate compound or a (meth)acrylamide compound having three or more polymerizable groups in one molecule.

[0248] Specifically, the following compounds are preferable.

[0249] [Chemical Formula 6]

[0250]

[0251] The compound (al) can be used singly or two or more kinds of different structures can be used simultaneously.

[0252] The content ratio of the compound (al) in the first layer-forming composition is not particularly limited, and is preferably 50% by mass or more, more preferably 70% by mass or more, and further preferably 80% by mass or more, relative to the total solid content of the first layer-forming composition. Also, the content ratio of the compound (al) in the first layer-forming composition is preferably 99.9% by mass or less, more preferably 98% by mass or less, and further preferably 97% by mass or less, relative to the total solid content of the first layer-forming composition.

[0253] In addition, the total solid content refers to all components other than the solvent.

[0254] <Polymerization Initiator>

[0255] The first layer-forming composition preferably contains a polymerization initiator.

[0256] The polymerizable group possessed by the compound (al) used in the first layer-forming composition is preferably a radical polymerization initiator as long as it is a radical polymerization group.

[0257] The polymerization initiator is preferably a radical polymerization initiator. The radical polymerization initiator can be a radical photopolymerization initiator or a radical thermal polymerization initiator, and is more preferably a radical photopolymerization initiator.

[0258] The polymerization initiator can be used singly or two or more kinds of different structures can be used simultaneously.

[0259] As the radical photopolymerization initiator, known radical photopolymerization initiators can be used without any limitation as long as they can generate radicals as active species by light irradiation. As specific examples, for example, the following can be given: diethoxyacetophenone, 2-hydroxy-2-methyl-l-phenylpropan-l-one, benzyl dimethyl ketal, 4-(2-hydroxyethoxy)phenyl-(2-hydroxy-2-propyl) ketone, l-hydroxycyclohexyl phenyl ketone, 2-methyl-2-morpholino(4-thiomethylphenyl)propan-l-one, 2-benzyl-2-dimethylamino-l-(4-morpholinophenyl)butanone, 2-hydroxy-2-methyl-l-[4-(l-methylethenyl)phenyl]propanone oligomer, 2-hydroxy-l-{4-[4-(2-hydroxy-2-methyl-propionyl)-benzyl]phenyl}-2-methyl-propan-l-one, and the like acetophenones; l,2-octanedione, l-[4-(phenylthio)-, 2-(O-benzoyloxime)], ketone, l-[9-ethyl-6-(2-methylbenzoyl)-9H-carbazol-3-yl]-, l-(O-acetyloxime), and the like oxime esters; benzoic acid, benzoic acid methyl ether, benzoic acid ethyl ether, benzoic acid isopropyl ether, benzoic acid isobutyl ether, and the like benzoic acids; benzophenone, methyl o-benzoylbenzoate, 4-phenylbenzophenone, 4-benzoyl-4'-methyl-diphenyl sulfide, 3,3',4,4'-tetra(t-butylperoxycarbonyl)benzophenone, 2,4,6-trimethylbenzophenone, 4-benzoyl-N,N-dimethyl-N-[2-(l-oxo-2-propenyloxy)ethyl]benzenemethanaminium bromide, (4-benzoylbenzyl)trimethylammonium chloride, and the like benzophenones; 2-isopropylthioxanthone, 4-isopropylthioxanthone, 2,4-diethylthioxanthone, 2,4-dichlorothioxanthone, l-chloro-4-propoxythioxanthone, 2-(3-dimethylamino-2-hydroxy)-3,4-dimethyl-9H-thioxanthen-9-one methochloride, and the like thioxanthones; 2,4,6-trimethylbenzoyl-diphenylphosphine oxide, bis(2,6-dimethoxybenzoyl)-2,4,4-trimethyl-pentylphosphine oxide, bis(2,4,6-trimethylbenzoyl)-phenylphosphine oxide, and the like acylophosphine oxides, and the like. Also, as the coagent of the radical photopolymerization initiator, triethanolamine, triisopropanolamine, 4,4'-dimethylaminobenzophenone (Michler's ketone), 4,4'-diethylaminobenzophenone, 2-dimethylaminoethyl benzoic acid, 4-dimethylaminoethyl benzoic acid ethyl ester, 4-dimethylaminobenzoic acid (n-butoxy) ethyl ester, 4-dimethylaminobenzoic acid isopentyl ester, 4-dimethylaminobenzoic acid 2-ethylhexyl ester, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, and the like can be used simultaneously.

[0260] The above radical photopolymerization initiators and coagents can be synthesized by known methods, and can also be obtained as commercial products.

[0261] The content of the polymerization initiator in the first layer-forming composition is not particularly limited, and for example, 0.1 to 200 parts by mass, preferably 1 to 50 parts by mass, relative to 100 parts by mass of the compound (al) is preferable.

[0262] <solvent>

[0263] The first layer-forming composition can contain a solvent.

[0264] As the solvent, an organic solvent is preferable, and one or two or more kinds of organic solvents can be used in any ratio. As specific examples of the organic solvent, for example, alcohols such as methanol, ethanol, propanol, n-butanol, and isobutyl alcohol; ketones such as acetone, methyl isobutyl ketone, methyl ethyl ketone, and cyclohexanone; cellosolves such as ethyl cellosolve; aromatic compounds such as toluene and xylene; glycol ethers such as propylene glycol monomethyl ether; acetates such as methyl acetate, ethyl acetate, and butyl acetate; and diacetone alcohol can be given.

[0265] The content of the solvent in the first layer-forming composition can be appropriately adjusted within a range in which the coatability of the first layer-forming composition can be ensured. For example, it can be set to 50 to 500 parts by mass, preferably 80 to 200 parts by mass, relative to 100 parts by mass of the total solid content of the first layer-forming composition.

[0266] The first layer-forming composition is usually set to a liquid form.

[0267] The concentration of the solid content of the first layer-forming composition is usually about 10 to 90% by mass, preferably 20 to 80% by mass, and particularly preferably about 40 to 70% by mass.

[0268] <other additives>

[0269] The first layer-forming composition can contain components other than the above, and for example, can contain inorganic fine particles, dispersants, leveling agents, stain-proofing agents, antistatic agents, ultraviolet absorbers, antioxidants, surfactants, and the like.

[0270] The surfactant is not particularly limited, and for example, a compound having the following structure can be used. In the following structural formula, the ratio of the repeating units is a mass ratio.

[0271] The molecular weight of the surfactant is not particularly limited, and for example, a weight average molecular weight of 3000 or less is preferable.

[0272] [Chemical Formula 7]

[0273]

[0274] [Chemical Formula 8]

[0275]

[0276] [Chemical Formula 9]

[0277]

[0278] [Chemical Formula 10]

[0279]

[0280] [Chemical Formula 11]

[0281]

[0282] [Chemical Formula 12]

[0283]

[0284] [Chemical Formula 13]

[0285]

[0286] [Chemical Formula 14]

[0287]

[0288] The first layer-forming composition can be prepared by mixing the various components described above in any order or over time. The method of preparation is not particularly limited, and a known stirrer or the like can be used in the preparation.

[0289] The first layer of the antiglare film of the present application preferably contains a cured product of the first layer-forming composition containing the polymerizable compound (al), and more preferably contains a cured product of the first layer-forming composition containing the polyorganosilsesquioxane (al-1) and the polymerization initiator.

[0290] The cured product of the first layer-forming composition preferably contains a cured product in which the polymerizable groups of the polymerizable compound (al) are bonded by polymerization.

[0291] The content ratio of the cured product of the first layer-forming composition in the first layer of the antiglare film of the present application is preferably 50% by mass or more, more preferably 60% by mass or more, and further preferably 70% by mass or more.

[0292] (Refractive index of the first layer)

[0293] The refractive index nl of the first layer is preferably 1.48 to 1.70, more preferably 1.50 to 1.65, and further preferably 1.51 to 1.60, from the viewpoint of interference unevenness.

[0294] The refractive index nl of the first layer can be adjusted, for example, by the type of the polymerizable compound (al).

[0295] The refractive index n1 of the first layer is the refractive index at a wavelength of 550 nm, and is determined by a plurality of point identical analysis (a method of calculating the refractive index from samples having the same refractive index but different film thicknesses) using a reflection spectrometer film thickness meter FE3000 (OTSUKI ELECTRONICS CO., LTD.).

[0296] (Elastic Modulus of the First Layer)

[0297] From the viewpoint of scratch resistance and pencil hardness, the elastic modulus G1 of the first layer at 25°C is preferably 4 to 15 GPa, more preferably 6 to 12 GPa, and further preferably 7 to 10 GPa.

[0298] The elastic modulus G1 of the first layer described above can be adjusted, for example, by the type of the polymerizable compound (al).

[0299] The elastic modulus G1 of the first layer at 25°C is determined using Aron Alpha (registered trademark) (manufactured by TOAGOSEI CO., LTD.) to bond the substrate side of the first layer to glass, and using a hardness tester (model HM2000) (manufactured by Fischer Instruments K.K., diamond Knoop and indenter) under the following conditions.

[0300] Maximum load: 50 mN

[0301] Load application time: 10 seconds

[0302] Creep: 5 seconds

[0303] Load unloading time: 10 seconds

[0304] Post-unloading load holding time: 60 seconds

[0305] Number of measurements: 10 times

[0306] (Film Thickness of the First Layer)

[0307] The average film thickness of the first layer is not particularly limited, and is preferably 0.5 to 30 μm, more preferably 1 to 25 μm, further preferably 2 to 20 μm, particularly preferably 2 to 14 μm, and most preferably 2 to 10 μm.

[0308] The film thickness of the first layer is calculated by observing the cross section of the anti-glare film using a scanning electron microscope (SEM). The cross section sample can be produced by a slicing method using a cross section cutting device ultramicrotome or a cross section processing method using a focused ion beam (FIB) device, or the like.

[0309] [Second Layer]

[0310] The anti-glare film of the present application has a second layer on the side opposite the substrate of the first layer described above. The second layer is preferably a scratch-resistant layer.

[0311] <Scratch-resistant layer raw material>

[0312] A preferred mode of the raw material of the second layer (material forming the second layer) in the anti-glare film of the present application is described.

[0313] The second layer is preferably formed by curing a second layer-forming composition. That is, the second layer preferably contains a cured product of the second layer-forming composition.

[0314] (Polymerizable compound (c1))

[0315] The second layer-forming composition preferably contains a polymerizable compound (c1) (also referred to as "compound (c1)"). As the compound (c1), there is no particular limitation, and examples include radical polymerizable compounds, cationic polymerizable compounds, anionic polymerizable compounds, and the like, but a radical polymerizable compound is preferred.

[0316] As the radical polymerizable group possessed by the radical polymerizable compound, a polymerizable unsaturated group can be given, and specifically, a vinyl group, an allyl group, a (meth)acryloxy group, or a (meth)acrylamido group is more preferred, a (meth)acryloxy group or a (meth)acrylamido group is further preferred, and a (meth)acrylamido group is particularly preferred.

[0317] The compound (c1) is preferably a compound having two or more radical polymerizable groups in one molecule, and more preferably a compound having three or more radical polymerizable groups in one molecule.

[0318] As one of the preferred modes of the compound (c1), a compound having one or more amide bonds, urethane bonds, or urea bonds in one molecule can be given. More preferably, a compound having two or more radical polymerizable groups in one molecule and having one or more amide bonds or urethane bonds.

[0319] In addition, the amide bond described above can be an amide bond included in a radical polymerizable group such as a (meth)acrylamido group.

[0320] In addition, the molecular weight of the compound (c1) is not particularly limited, and it can be a monomer, an oligomer, or a polymer.

[0321] As the compound (c1), as a preferred mode, the polyorganosilsesquioxane (a1-1) listed as the compound (a1) described above, a urethane (meth)acrylate compound, and an acrylamide compound can be given.

[0322] The compound (c1) can be used singly or two or more kinds of different structures can be used simultaneously.

[0323] From the viewpoint of controlling the surface unevenness, the compound (c1) is further preferably a compound having two or more (meth)acryloyl groups in one molecule in addition to the compounds exemplified as the compound (a1).

[0324] As the compound having two (meth)acryloyl groups in one molecule, pentaerythritol di(meth)acrylate, 1,9-nonanediol di(meth)acrylate, dipropylene glycol di(meth)acrylate, tripropylene glycol di(meth)acrylate, tetraethylene glycol di(meth)acrylate, hydroxypivalic acid neopentyl glycol di(meth)acrylate, polyethylene glycol di(meth)acrylate, dicyclopentenyl (meth)acrylate, dicyclopentenyl oxyethyl (meth)acrylate, dicyclopentyl di(meth)acrylate, and compounds modified from these compounds (e.g., alkylene oxide-modified) are preferable.

[0325] As the compound having three or more (meth)acryloyl groups in one molecule, esters of polyhydric alcohol and (meth)acrylic acid can be given. Specifically, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, trimethylolpropane tri(meth)acrylate, trimethylol ethane tri(meth)acrylate, ditrimethylolpropane tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, pentaerythritol hexa(meth)acrylate, and compounds modified from these compounds (e.g., alkylene oxide-modified) are preferable.

[0326] As the content of the compound (c1) when two or more kinds of the compounds having two or more (meth)acryloyl groups in one molecule are used simultaneously, it is preferably 0 to 90% by mass, more preferably 20 to 80% by mass, and further preferably 20 to 60% by mass, relative to the total amount of the compound (c1).

[0327] The content of the compound (c1) in the second layer-forming composition is preferably 80% by mass or more, more preferably 85% by mass or more, and further preferably 90% by mass or more, relative to the total solid content in the second layer-forming composition.

[0328] (Polymerization initiator)

[0329] The second layer-forming composition preferably contains a polymerization initiator.

[0330] The polymerizable group possessed by the compound (c1) used in the second layer-forming composition is preferably a radical polymerization initiator as long as it is a radical polymerizable group.

[0331] The polymerization initiator is preferably a radical polymerization initiator. The radical polymerization initiator can be a radical photopolymerization initiator or a radical thermal polymerization initiator, and is more preferably a radical photopolymerization initiator.

[0332] As the radical polymerization initiator, the same radical polymerization initiator as that which can be contained in the aforementioned composition for forming the first layer can be contained.

[0333] The polymerization initiator can be used alone or two or more kinds of different structures can be used simultaneously.

[0334] The content of the radical polymerization initiator in the composition for forming the second layer is not particularly limited, and for example, 0.1 to 200 parts by mass, preferably 1 to 50 parts by mass, relative to 100 parts by mass of the compound (c1) is preferable.

[0335] (Solvent)

[0336] The composition for forming the second layer can contain a solvent.

[0337] As the solvent, the same solvent as that which can be contained in the aforementioned composition for forming the first layer can be contained.

[0338] The content of the solvent in the composition for forming the second layer can be appropriately adjusted within a range in which the coatability of the composition for forming the second layer can be ensured. For example, 50 to 500 parts by mass, preferably 80 to 200 parts by mass, relative to 100 parts by mass of the total solid content of the composition for forming the second layer can be set.

[0339] As described later, the antiglare film of the present application coats the composition for forming the second layer on the semi-cured first layer coating film. At this time, it is considered that a part of the composition for forming the second layer penetrates into the semi-cured first layer coating film, but when the penetration rate is adjusted, the content of the solvent in the composition for forming the second layer is preferably also adjusted.

[0340] The composition for forming the second layer generally takes a liquid form.

[0341] The concentration of the solid content of the composition for forming the second layer is generally 5 to 50% by mass, preferably 10 to 40% by mass, and particularly preferably 15 to 35% by mass.

[0342] (Other additives)

[0343] The composition for forming the second layer can contain components other than the above, and for example, can contain inorganic particles, a leveling agent, a stain-proofing agent, an antistatic agent, a lubricant, a solvent, and the like.

[0344] In particular, as the lubricant, the following fluorine-containing compound is preferably contained.

[0345] [fluorine-containing compound]

[0346] The fluorine-containing compound can be any one of a monomer, an oligomer, or a polymer. The fluorine-containing compound preferably has a substituent that contributes to the bond formation with the compound (c1) in the second layer or the compatibility. The substituents can be the same or different, and preferably a plurality of substituents are present.

[0347] The substituent is preferably a polymerizable group, and can be any one of a radical polymerizable group, a cationic polymerizable group, an anionic polymerizable group, a polycondensable group, and an addition polymerizable group, and examples of the preferable substituent include an acryloyl group, a methacryloyl group, a vinyl group, an allyl group, a cinnamoyl group, an epoxy group, an oxetanyl group, a hydroxyl group, a polyoxyalkylene group, a carboxyl group, and an amino group. Among them, a radical polymerizable group is preferable, and an acryloyl group and a methacryloyl group are particularly preferable.

[0348] The fluorine-containing compound can be a polymer of a compound that does not contain a fluorine atom, or can be an oligomer.

[0349] The above fluorine-containing compound is preferably a fluorine compound represented by the following general formula (F).

[0350] General formula (F): (R f )-[(W)-(R A ) nf mf

[0351] (In the formula, R f represents a (per)fluoroalkyl group or a (per)fluoropolyether group, W represents a single bond or a linking group, and R A represents a polymerizable unsaturated group. nf represents an integer of 1 to 3. mf represents an integer of 1 to 3.)

[0352] In the general formula (F), R A represents a polymerizable unsaturated group. The polymerizable unsaturated group is preferably a group having an unsaturated bond that can cause a radical polymerization reaction by irradiation of active energy rays such as ultraviolet rays or electron beams (i.e., a radical polymerizable group), and examples include a (meth)acryloyl group, a (meth)acryloyloxy group, a vinyl group, and an allyl group, and a (meth)acryloyl group, a (meth)acryloyloxy group, and a group in which any hydrogen atom in these groups is substituted with a fluorine atom are preferably used.

[0353] In the general formula (F), R f represents a (per)fluoroalkyl group or a (per)fluoropolyether group.

[0354] ​Here, (per)fluoroalkyl group means at least one of fluoroalkyl group and perfluoroalkyl group, and (per)fluoropolyether group means at least one of fluoropolyether group and perfluoropolyether group. From the viewpoint of scratch resistance, R f is preferably high in the content of fluorine.

[0355] The (per)fluoroalkyl group is preferably a group having 1 to 20 carbon atoms, and more preferably a group having 1 to 10 carbon atoms.

[0356] The (per)fluoroalkyl group can be a straight chain structure (for example, -CF2CF3, -CH2(CF2)4H, -CH2(CF2)8CF3, -CH2CH2(CF2)4H), a branched chain structure (for example, -CH(CF3)2, -CH2CF(CF3)2, -CH(CH3)CF2CF3, -CH(CH3)(CF2)5CF2H), or an alicyclic structure (preferably a 5-membered ring or a 6-membered ring, for example, perfluorocyclohexyl group and perfluorocyclopentyl group, and an alkyl group substituted with these groups).

[0357] The (per)fluoropolyether group means a group in which the (per)fluoroalkyl group has an ether bond, and can be a monovalent group or a divalent or higher valent group. As the fluoropolyether group, for example, -CH2OCH2CF2CF3, -CH2CH2OCH2C4F8H, -CH2CH2OCH2CH2C8F 17 , -CH2CH2OCF2CF2OCF2CF2H, a fluorocycloalkyl group having 4 or more fluorine atoms and 4 to 20 carbon atoms, and the like can be given. Also, as the perfluoropolyether group, for example, -(CF2O) pf -(CF2CF2O) qf -, -[CF(CF3)CF2O] pf -[CF(CF3)] qf -, -(CF2CF2CF2O) pf -, -(CF2CF2O) pf -, and the like can be given.

[0358] The above pf and qf each independently represent an integer of 0 to 20. Among them, pf + qf is an integer of 1 or more.

[0359] The total of pf and qf is preferably 1 to 83, more preferably 1 to 43, and further preferably 5 to 23.

[0360] From the viewpoint of excellent scratch resistance, the above fluorine-containing compound is particularly preferably a perfluoropolyether group represented by -(CF2O) pf -(CF2CF2O) qf .

[0361] In the present application, the fluorine-containing compound preferably has a perfluoropolyether group, and has a plurality of polymerizable unsaturated groups in one molecule.

[0362] In General Formula (F), W represents a linking group. As W, for example, a linking group such as an alkylene group, an arylene group, and a heteroalkylene group, and a linking group in which these groups are combined can be given. These linking groups can further have a functional group such as an oxy group, a carbonyl group, a carbonyloxy group, a carbonylimino group, and a sulfonamide group, and a functional group in which these groups are combined.

[0363] As W, an ethylene group is preferable, and an ethylene group bonded to a carbonylimino group is more preferable.

[0364] The fluorine atom content of the fluorine-containing compound is not particularly limited, and is preferably 20% by mass or more, more preferably 30 to 70% by mass, and further preferably 40 to 70% by mass.

[0365] As examples of the preferable fluorine-containing compound, R-2020, M-2020, R-3833, M-3833, and Optool DAC (trade names) manufactured by Daikin Chemical Industries, Megaface F-171, F-172, F-179A, RS-78, RS-90, Defender MCF-300, and MCF-323 (trade names) manufactured by DIC Corporation can be given, but are not limited to these.

[0366] From the viewpoint of scratch resistance, in General Formula (F), the product (nf x mf) of nf and mf is preferably 2 or more, and more preferably 4 or more.

[0367] The weight average molecular weight (Mw) of the fluorine-containing compound having a polymerizable unsaturated group can be measured using a molecular exclusion chromatography method, for example, gel permeation chromatography (GPC).

[0368] The Mw of the fluorine-containing compound used in the present application is preferably 400 or more and less than 50,000, more preferably 400 or more and less than 30,000, and further preferably 400 or more and less than 25,000.

[0369] The content of the fluorine-containing compound is preferably 0.01 to 5% by mass, more preferably 0.1 to 5% by mass, further preferably 0.5 to 5% by mass, and particularly preferably 0.5 to 2% by mass, with respect to the total solid content in the second layer-forming composition.

[0370] The second layer-forming composition used in the present application can be prepared by mixing the various components described above simultaneously or sequentially in any order. The method of preparation is not particularly limited, and a known stirrer or the like can be used at the time of preparation.

[0371] The second layer of the antiglare film of the present application preferably contains a cured product of the second layer-forming composition containing the compound (c1), and more preferably contains a cured product of the second layer-forming composition containing the compound (c1) and a radical polymerization initiator.

[0372] The cured product of the second layer-forming composition preferably contains a cured product of the radical polymerizable group of the compound (c1) that has undergone a polymerization reaction.

[0373] The content ratio of the cured product of the second layer-forming composition in the second layer is preferably 60% by mass or more, more preferably 70% by mass or more, and further preferably 80% by mass or more, with respect to the total mass of the second layer.

[0374] (Refractive index of the second layer)

[0375] The refractive index n2 of the second layer is preferably 1.48 to 1.70, more preferably 1.50 to 1.65, and further preferably 1.51 to 1.60, from the viewpoint of interference unevenness.

[0376] The refractive index n2 of the second layer described above can be adjusted, for example, by the type of the polymerizable compound (c1).

[0377] The refractive index n2 of the second layer is the refractive index at a wavelength of 550 nm, and is measured by a plurality of point identical analysis (a method of calculating the refractive index from samples having the same refractive index but different film thicknesses) by a reflection spectrophotometer film thickness meter FE3000 (OTSUKI ELECTRONICS CO., LTD.).

[0378] The antiglare film of the present application preferably has an absolute value Δn of the difference between the refractive index n1 of the first layer and the refractive index n2 of the second layer represented by the following formula (i) of 0.05 or less.

[0379] (i) Δn = |n1 - n2|

[0380] By setting Δn to 0.05 or less, it becomes easy to form the desired surface relief structure at the time of film formation. Δn is more preferably 0.00 to 0.03, and further preferably 0.00 to 0.02.

[0381] Δn can be adjusted, for example, by appropriately selecting the types of the polymerizable compound (a1) and the polymerizable compound (c1).

[0382] (Elastic modulus of the second layer)

[0383] The elastic modulus G2 of the second layer at 25°C is preferably 4 to 15 GPa, more preferably 6 to 12 GPa, and further preferably 7 to 10 GPa, from the viewpoint of hardness (scratch resistance or pencil hardness).

[0384] The elastic modulus G2 of the second layer can be adjusted, for example, by the kind of the polymerizable compound (c1).

[0385] The elastic modulus G2 of the second layer at 25°C was measured using Aron Alpha (registered trademark) (manufactured by TOAGOSEI CO., LTD.) to bond the substrate side of the second layer to glass, and using a hardness tester (model HM2000, manufactured by Fischer Instruments K.K., diamond Knoop and indenter) under the following conditions.

[0386] Maximum load: 50 mN

[0387] Load application time: 10 seconds

[0388] Creep: 5 seconds

[0389] Load unloading time: 10 seconds

[0390] Post-unloading load holding time: 60 seconds

[0391] Number of measurements: 10 times

[0392] With respect to the antiglare film of the present application, the absolute value ΔG of the difference between the elastic modulus G1 of the first layer and the elastic modulus G2 of the second layer represented by the following formula (ii) is preferably 2 GPa or less.

[0393] (ii) ΔG = |G1 - G2|

[0394] By setting ΔG to 2 GPa or less, it becomes easy to form the desired surface uneven structure at the time of film formation. ΔG is more preferably 0 to 1.5 GPa, and further preferably 0 to 1.2 GPa.

[0395] ΔG can be adjusted, for example, by appropriately selecting the kind of the polymerizable compound (a1) and the polymerizable compound (c1).

[0396] (Thickness of the second layer)

[0397] The average thickness of the second layer is 0.3 to 3 μm. If the thickness of the second layer is less than 0.3 μm, the scratch resistance becomes poor. Also, if the thickness of the second layer exceeds 3 μm, it becomes impossible to obtain sufficient antiglare properties. The thickness is preferably 0.5 to 2 μm, and more preferably 0.7 to 1 μm.

[0398] The thickness of the second layer was calculated by observing the cross section of the antiglare film with a scanning electron microscope (SEM). The cross section sample can be produced by a slicing method using a cross section cutting device ultramicrotome or a cross section processing method using a focused ion beam (FIB) device, or the like.

[0399] [Method for producing anti-glare film]

[0400] The method for producing the anti-glare film of the present invention will be described.

[0401] The method for producing an anti-glare film of the present invention is the method for producing an anti-glare film of the present invention described above, and is a method for producing an anti-glare film comprising the following steps (I) to (IV) in order.

[0402] (I) Step of coating a first layer-forming composition containing a polymerizable compound (a1) on a substrate to form a first coating film

[0403] (II) Process of semi-curing the first coating film

[0404] (III) A step of applying a second layer-forming composition on the semi-cured first layer coating film to form a second layer coating film

[0405] (IV) Step of forming the first layer and the second layer by curing the semi-cured first layer coating film and the second layer coating film

[0406] The anti-glare film is manufactured by the above-mentioned method for manufacturing an anti-glare film. The anti-glare film comprises a substrate, a first layer and a second layer in this order, wherein:

[0407] The second layer has a concavo-convex structure including elongated convex portions on the surface opposite to the substrate side.

[0408] The arithmetic mean height Sa of the surface of the second layer on the side opposite to the substrate is 30 to 160 nm,

[0409] The average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm.

[0410] The content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1% by mass relative to the total mass of the second layer.

[0411] The average thickness of the second layer is 0.3 to 3 μm.

[0412] The haze of the anti-glare film is 1 to 20%.

[0413] While applying 1 kg / cm2 of #0000 steel wool to the surface of the anti-glare film on the side opposite to the substrate, 2 No scratches occurred when the steel was rubbed back and forth 100 times with a load of 100.

[0414] -Process (I)-

[0415] The step (I) is a step of providing a first layer coating film by applying a first layer forming composition containing the polymerizable compound (al) on a substrate.

[0416] The substrate, the polymerizable compound (al) and the first layer forming composition are as described above.

[0417] The method of applying the first layer forming composition is not particularly limited, and a publicly known method can be used. For example, dip coating, air knife coating, curtain coating, roll coating, wire bar coating, gravure coating, die coating and the like can be mentioned.

[0418] - Step (II) -

[0419] The step (II) is a step of semi-curing the above first layer coating film. Further, the semi-curing of the first layer coating film means that a part of the polymerizable groups of the polymerizable compound (al) contained in the first layer coating film is subjected to a polymerization reaction.

[0420] The semi-curing of the first layer coating film is preferably performed by irradiation of ionizing radiation or heating.

[0421] The kind of the ionizing radiation is not particularly limited, and X-ray, electron beam, ultraviolet ray, visible light, infrared ray and the like can be mentioned, but ultraviolet ray is preferably used. For example, if the first layer coating film is of an ultraviolet ray-curable type, it is preferable to cure only a part of the polymerizable compound (al) by irradiating ultraviolet ray of an irradiation amount of 10 mJ / cm 2 ~ 2000 mJ / cm 2 . More preferably, the ultraviolet ray irradiation amount is 20 mJ / cm 2 ~ 500 mJ / cm 2 , and further preferably, the ultraviolet ray irradiation amount is 40 mJ / cm 2 ~ 300 mJ / cm 2 . As the type of the ultraviolet ray lamp, a metal halide lamp, a high-pressure mercury lamp and the like are preferably used.

[0422] When the curing is performed by heat, the temperature is not particularly limited, and is preferably 80°C or higher and 200°C or lower, more preferably 100°C or higher and 180°C or lower, and further preferably 120°C or higher and 160°C or lower.

[0423] The oxygen concentration at the time of the curing is preferably 0 to 1.0 vol%, further preferably 0 to 0.1 vol%, and most preferably 0 to 0.05 vol%.

[0424] The semi-curing of the first layer coating film can be performed by adjusting the irradiation amount of the ionizing radiation or by adjusting the temperature and time of the heating.

[0425] The arithmetic average height (Sa2) of the surface of the side opposite to the substrate side of the semi-cured first layer coating film in the above-mentioned process (II) is preferably 30 nm or less, more preferably 0 to 20 nm, and further preferably 0 to 10 nm.

[0426] Sa2 is calculated by the same method as Sa described above.

[0427] The consumption rate of the polymerizable group in the above-mentioned polymerizable compound (a1) in the semi-cured first layer coating film in the above-mentioned process (II) is preferably 1 to 40%. By adjusting the degree of semi-curing of the first layer coating film so that the consumption rate is within the above-mentioned range, the degree of penetration of the second layer-forming composition to be coated in the later-mentioned process (III) into the first layer coating film is adjusted, and it is easy to adjust the surface shape of the second layer in the final obtained anti-glare film to a desired shape. The consumption rate of the polymerizable group is more preferably 2 to 30%, and further preferably 3 to 25%.

[0428] In addition, the consumption rate of the polymerizable group in the above-mentioned polymerizable compound (a1) is represented by the following formula (iii), and can be calculated by measuring the change in the peak height derived from the double bond group by FT-IR (Fourier Transform Infrared Spectroscopy) single reflection ATR (Attenuated Total Reflection) measurement.

[0429] (iii) Consumption rate of polymerizable group (%) = (peak height derived from double bond group before semi-curing - peak height derived from double bond group after semi-curing) / (peak height derived from double bond group after semi-curing)

[0430] In the above-mentioned process (II), the recovery rate of the semi-cured first layer coating film is preferably 2 to 50%. Here, the recovery rate refers to the ratio of the applied pushing energy (area) to the recovered energy (area). That is, in the case of a perfect elastic body, the recovery rate becomes 100%. The above-mentioned recovery rate is calculated by the following formula, using Aron Alpha (registered trademark) (manufactured by TOAGOSEI CO., LTD.) to bond one face of the first layer coating film to glass, and using a HM2000-type hardness tester (manufactured by Fischer Instruments K.K., Knoop indenter made of diamond) to measure the other face (the face not bonded to glass) of the first layer coating film under the following conditions.

[0431] Maximum load: 50 mN

[0432] Load application time: 10 seconds

[0433] Creep: 5 seconds

[0434] Load-unload time: 10 seconds

[0435] Post-unload holding time: 60 seconds

[0436] Number of measurements: 10

[0437] Recovery rate (%) = elastic energy / (elastic energy + plastic energy)

[0438] The elastic energy is the area value of the SS curve (stress-strain curve) at the time of applying the load, and the plastic energy is the area value of the SS curve at the time of unloading the load.

[0439] The above recovery rate is more preferably 2 to 40%, and further preferably 10 to 30%.

[0440] - Step (III) -

[0441] Step (III) is a step of forming a second layer coating film by applying a second layer-forming composition to the semi-cured first layer coating film.

[0442] The second layer-forming composition is as described above.

[0443] The application method of the second layer-forming composition is not particularly limited, and a publicly known method can be used. For example, dip coating, air knife coating, curtain coating, roll coating, wire bar coating, gravure coating, die coating, and the like can be given.

[0444] It is considered that since the first layer coating film is a semi-cured coating film, a part of the second layer-forming composition applied in Step (III) penetrates into the first layer coating film.

[0445] - Step (IV) -

[0446] Step (IV) is a step of forming the first layer and the second layer by curing the semi-cured first layer coating film and the second layer coating film.

[0447] The curing of the coating film is preferably performed by irradiation of ionizing radiation or heating. The irradiation of ionizing radiation and the heating are the same as described in Step (II).

[0448] In addition, the curing of the semi-cured first layer coating film means that at least a part of the polymerizable groups in the unreacted polymerizable compound (al) contained in the semi-cured first layer coating film is subjected to a polymerization reaction. Also, the curing of the second layer coating film means that at least a part of the polymerizable groups of the curable compound (preferably, the polymerizable compound (cl)) contained in the second layer coating film is subjected to a polymerization reaction.

[0449] In the process (IV), preferably, the second layer coating film is subjected to curing, while the first layer is subjected to complete curing.

[0450] A drying treatment can be performed as necessary between the process (I) and the process (II), between the process (II) and the process (III), between the process (III) and the process (IV), or after the process (IV). The drying treatment can be performed by, for example, spraying of warm air, placement into a heating oven, conveyance in the heating oven, heating with a roller not provided with the first layer and the second layer (substrate surface), or the like. The heating temperature is not particularly limited as long as it is set to a temperature at which the solvent can be dried and removed. Here, the heating temperature refers to the temperature of the warm air or the ambient temperature in the heating oven.

[0451] In particular, it is preferable to provide a drying treatment step between the process (III) and the process (IV). As described above, it is considered that a part of the second layer-forming composition applied in the process (III) penetrates into the first layer coating film, and the first layer coating film swells in the film thickness direction. Therefore, it is considered that, by drying of the semi-cured first layer coating film and the second layer coating film, it shrinks to form unevenness on the surface of the second layer coating film. When the above drying is performed, the drying speed is important, and if the drying speed is too fast (for example, if the air is blown too much), portions in which the surface unevenness is expressed and portions in which it is not expressed are likely to occur in the surface.

[0452] [Display device]

[0453] The anti-glare film of the present application has high scratch resistance and less glare. Therefore, the anti-glare film of the present application can be used for various display devices, such as liquid crystal display (LCD) devices, organic EL display (OLED) devices, plasma displays, display devices with touch panels, and the like. In particular, the anti-glare film of the present application can be used as a component that does not impair the image quality due to glare or blurring of characters even in a high-definition display device of 200 ppi or more (in particular, 300 ppi or more). Therefore, the anti-glare film of the present application can be preferably used in devices that are more often used as high-definition display devices, such as liquid crystal display devices (including liquid crystal display devices that are also display devices with touch panels), organic EL display devices (including organic EL devices that are also display devices with touch panels), among these display devices.

[0454] Examples

[0455] Hereinafter, the present application will be described more specifically by examples, but the scope of the present application is not limited to this but is explained.

[0456] <Manufacture of substrate>

[0457] (Manufacture of polyimide powder)

[0458] After adding N,N-dimethylacetamide (DMAc) 832 g to a 1 L reactor equipped with a stirrer, a nitrogen injection device, a dropping funnel, a temperature regulator, and a cooler under a stream of nitrogen, the temperature of the reactor was set to 25°C. To this was added bis-trifluoromethylbenzidine (TFDB) 64.046 g (0.2 mol) and dissolved. While maintaining the resulting solution at 25°C, 2,2-bis(3,4-dicarboxyphenyl)hexafluoropropane dianhydride (6FDA) 31.09 g (0.07 mol) and biphenyltetracarboxylic dianhydride (BPDA) 8.83 g (0.03 mol) were added, and the mixture was stirred for a certain period of time to allow the reaction to proceed. Then, terephthaloyl chloride (TPC) 20.302 g (0.1 mol) was added to obtain a polyamic acid solution having a solid content of 13 mass%. Next, pyridine 25.6 g and acetic anhydride 33.1 g were added to the polyamic acid solution and stirred for 30 minutes, and after further stirring at 70°C for 1 hour, the mixture was cooled to room temperature. Methanol 20 L was added thereto, and the precipitated solid content was filtered and pulverized. Then, the mixture was dried at 100°C for 6 hours in vacuo to obtain 111 g of a polyimide powder.

[0459] (Production of the substrate S-1)

[0460] A solution having a solid content of 13 mass% was obtained by dissolving 100 g of the above polyimide powder in 670 g of N,N-dimethylacetamide (DMAc). The resulting solution was cast onto a stainless steel plate, and dried with a hot air of 130°C for 30 minutes. Then, the film was peeled from the stainless steel plate, fixed to a frame with a pin, and the film-fixed frame was put into a vacuum oven, and heated while gradually increasing the temperature from 100°C to 300°C for 2 hours, and then gradually cooled. After separating the cooled film from the frame, as a final heat treatment step, further heat treatment was performed at 300°C for 30 minutes to obtain a substrate S-1 composed of a polyimide film having a thickness of 50 μm.

[0461] (Production of the substrate S-2)

[0462] A substrate S-2 composed of a polyimide film having a thickness of 30 μm was produced in the same manner as in the production of the substrate S-1.

[0463] (Production of the substrate S-3)

[0464] 〔Production of the cellulose acylate film 1〕

[0465] (Production of the core layer cellulose acylate dope)

[0466] A cellulose acetate solution to be used as a core layer cellulose acylate dope was prepared by adding the following composition to a mixing tank and stirring to dissolve the components.

[0467] <Core layer cellulose acylate concentrated solution>

[0468]

[0469] Compound G

[0470] [Chemical Formula 15]

[0471]

[0472] (Production of outer layer cellulose acylate concentrated solution)

[0473] To 90 parts by mass of the above-mentioned core layer cellulose acylate concentrated solution, 10 parts by mass of the following matting agent solution was added to produce a cellulose acetate solution used as an outer layer cellulose acylate concentrated solution. <Matting agent solution>

[0474]

[0475] (Production of cellulose acylate film 1)

[0476] After the above-mentioned core layer cellulose acylate concentrated solution and the above-mentioned outer layer cellulose acylate concentrated solution were filtered with a filter paper having an average pore diameter of 34 μm and a sintered metal filter having an average pore diameter of 10 μm, the above-mentioned core layer cellulose acylate concentrated solution and the outer layer cellulose acylate concentrated solutions on both sides thereof were simultaneously cast from a casting die onto a drum at 20°C in 3 layers. The film was peeled off in a state where the solvent content was approximately 20% by mass, the both ends in the width direction of the film were fixed with tenter clips, and the film was stretched in the transverse direction at a stretching ratio of 1.1 times while being dried. Then, the obtained film was further dried by being conveyed between rollers of a heat treatment device, and an optical film having a thickness of 50 μm was produced as cellulose acylate film 1. The thickness of the core layer of cellulose acylate film 1 was 46 μm, and the thickness of the outer layers disposed on both sides of the core layer was 2 μm each. The in-plane retardation of the obtained cellulose acylate film 1 at a wavelength of 550 nm was 0 nm.

[0477] The obtained cellulose acylate film 1 was used as the substrate S-3.

[0478] (Synthesis of polyorganosilsesquioxane (acrylamide SQ))

[0479] 300 millimoles (70.0 g) of 3-(trimethoxysilyl)propyl acrylamide, 7.39 g of triethylamine, and 434 g of acetone were mixed, and 73.9 g of pure water was added dropwise using a dropping funnel over 30 minutes. The reaction solution was heated to 50°C, and a polycondensation reaction was performed for 10 hours.

[0480] Then, the reaction solution was cooled, neutralized with 12 mL of 1 mol / L hydrochloric acid aqueous solution, and then 600 g of 1-methoxy-2-propanol was added, followed by concentration at 30 mmHg and 50°C to obtain a transparent liquid product, polyorganosilsesquioxane (acrylamide SQ), as a propylene glycol monomethyl ether (PGME) solution having a solid content concentration of 49 mass%.

[0481] The structure of the acrylamide SQ is shown below. In the following structural formula, "SiO 1.5 " represents a silsesquioxane unit. The weight average molecular weight of the acrylamide SQ was 15100, and the number average molecular weight was 5700.

[0482] [Chemical Formula 16]

[0483]

[0484] Also, the structural formulas of the polymerizable compounds used in the examples and comparative examples are shown below.

[0485] U-4HA: (manufactured by Shin-Nakamura Chemical Co., Ltd.)

[0486] [Chemical Formula 17]

[0487]

[0488] FAM-401: (manufactured by Fujifilm Corporation)

[0489] [Chemical Formula 18]

[0490]

[0491] A-TMMT: pentaerythritol tetraacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.)

[0492] [Chemical Formula 19]

[0493]

[0494] DPHA: dipentaerythritol hexaacrylate (manufactured by Shin-Nakamura Chemical Co., Ltd.)

[0495] Preparation of the Hard Coat Layer Forming Composition

[0496] Preparation of the Hard Coat Layer Forming Composition HC-1

[0497] To a PGME solution (solid content concentration 49 mass%) of a polyorganosilsesquioxane (acrylamide SQ) was added the surfactant (Z-1), IRGACURE 127, and PGME, the contents of the respective components were adjusted to the following, and they were put into a mixing tank, and stirring was performed. The resulting composition was filtered with a polypropylene filter having a pore size of 0.45 μm to produce a hard coat-forming composition HC-1.

[0498]

[0499] [Chemical Formula 20]

[0500]

[0501] The ratio (76% and 24%) of each constituent unit in (Z-1) is mass ratio.

[0502] In addition, IRGACURE 127 (Irg. 127) is a radical polymerization initiator manufactured by IGM Resin B.V. Co.

[0503] (Preparation of Hard Coat-Forming Composition HC-2)

[0504] To the urethane acrylate (U-4HA) was added the surfactant (Z-1), IRGACURE 127, and PGME, the contents of the respective components were adjusted to the following, and they were put into a mixing tank, and stirring was performed. The resulting composition was filtered with a polypropylene filter having a pore size of 0.45 μm to produce a hard coat-forming composition HC-2.

[0505]

[0506] (Preparation of Hard Coat-Forming Composition HC-3)

[0507] To the acrylamide monomer (FAM-401) was added the surfactant (Z-1), IRGACURE 127, and PGME, the contents of the respective components were adjusted to the following, and they were put into a mixing tank, and stirring was performed. The resulting composition was filtered with a polypropylene filter having a pore size of 0.45 μm to produce a hard coat-forming composition HC-3.

[0508]

[0509]

[0510] Preparation of Scratch-Resistant Layer-Forming Composition

[0511] (Preparation of Scratch-Resistant Layer-Forming Composition SR-1)

[0512] Each component was put into a mixing tank with the composition described below, stirred, and filtered with a polypropylene filter having a pore size of 0.4 μm to produce a scratch-resistant layer-forming composition SR-1 having a solid content concentration of 25 mass%.

[0513]

[0514] In addition, RS-90 is as follows.

[0515] RS-90: Lubricant, manufactured by DIC CORPORATION

[0516] (Preparation of Scratch-Resistant Layer-Forming Composition SR-2)

[0517] In the above SR-1, except that the added amount of PGME was changed so that the solid content concentration became 15 mass%, SR-2 was prepared in the same manner as in the preparation of SR-1.

[0518] (Preparation of Scratch-Resistant Layer-Forming Composition SR-3)

[0519] In the above preparation of SR-1, except that the added amount of A-TMMT was changed so that the content of A-TMMT became 70 mass% with respect to the total amount of acrylamide SQ and A-TMMT, SR-3 was prepared in the same manner as in the preparation of SR-1.

[0520] (Preparation of Scratch-Resistant Layer-Forming Composition SR-4)

[0521] In the above preparation of SR-1, except that the added amount of A-TMMT was changed so that the content of A-TMMT became 80 mass% with respect to the total amount of acrylamide SQ and A-TMMT, SR-4 was prepared in the same manner as in the preparation of SR-1.

[0522] (Preparation of Scratch-Resistant Layer-Forming Composition SR-5)

[0523] Each component was put into a mixing tank with the composition described below, stirred, and filtered with a polypropylene filter having a pore size of 0.4 μm to produce a scratch-resistant layer-forming composition SR-5 having a solid content concentration of 25 mass%.

[0524]

[0525] (Preparation of Scratch-Resistant Layer-Forming Composition SR-6)

[0526] Each component was put into a mixing tank with the composition described below, stirred, and filtered with a polypropylene filter having a pore size of 0.4 μm to produce a scratch-resistant layer-forming composition SR-6 having a solid content concentration of 25 mass%.

[0527]

[0528] [Example 1]

[0529] Manufacture of Hard Coat Film 1

[0530] The above hard coat layer-forming composition HC-1 was bar coated on the polyimide substrate S-1 having a thickness of 50 μm using a bar coater #12 so that the film thickness after curing would be 4.8 μm, and a hard coat layer coating film was provided on the substrate (Step (I)).

[0531] Next, after drying the hard coat layer coating film at 120°C for 1 minute, it was grounded on a hot plate at 25°C, and irradiated with an air-cooled mercury lamp under conditions of an oxygen concentration of 100 ppm (parts per million) at an illuminance of 20 mW / cm 2 , and an irradiation amount of 60 mJ / cm 2 of ultraviolet rays. In this way, the hard coat layer coating film was semi-cured (Step (II)).

[0532] On the above semi-cured hard coat layer coating film, the above scratch-resistant layer-forming composition SR-1 was bar coated using a bar coater #3 so that the average film thickness after curing would be 0.8 μm, and a scratch-resistant layer coating film was provided (Step (III)).

[0533] Next, after drying the scratch-resistant layer coating film at 100°C for 1 minute, it was grounded on a hot plate at 25°C, and irradiated with an air-cooled mercury lamp under conditions of an oxygen concentration of 100 ppm at an illuminance of 52 mW / cm 2 , and an irradiation amount of 600 mJ / cm 2 of ultraviolet rays, and the hard coat layer coating film and the scratch-resistant layer coating film were cured. To further promote cross-linking, the sample on which the scratch-resistant layer coating film was cured was grounded on a hot plate at 100°C under conditions of an oxygen concentration of 100 ppm, and irradiated with an air-cooled mercury lamp at an illuminance of 52 mW / cm 2 , and an irradiation amount of 600 mJ / cm 2 of ultraviolet rays, and a hard coat layer and a scratch-resistant layer were formed, and a glare-proof film 1 was obtained (Step (IV)).

[0534] The first layer of the glare-proof film 1 was a hard coat layer, and the second layer was a scratch-resistant layer.

[0535] [Examples 2 and 3]

[0536] A glare-proof film 2 and 3 were obtained in the same manner as in Example 1 except that the film thickness after curing of the hard coat layer and the irradiation amount of ultraviolet rays (UV irradiation amount) in Step (II) in which the hard coat layer coating film was semi-cured were changed to those described in Table 1, respectively.

[0537] [Example 4]

[0538] A glare-reducing film 4 was obtained in the same manner as in Example 1, except that the substrate was changed to S-3, and the film thickness after curing of the hard coat layer and the scratch-resistant layer was changed to that described in Table 1.

[0539] [Examples 5 and 6]

[0540] Glare-reducing films 5 and 6 were obtained in the same manner as in Example 1, except that the substrate was changed to S-2, the type of the composition for forming each layer of the hard coat layer and the scratch-resistant layer, the film thickness after curing, and the amount of irradiation of ultraviolet rays (UV irradiation amount) in the process (II) of semi-curing the hard coat layer coating film were changed to those described in Table 1, respectively.

[0541] [Example 7]

[0542] A glare-reducing film 7 was obtained in the same manner as in Example 1, except that the solid content concentration of the scratch-resistant layer-forming composition SR-1 was changed to that described in Table 1.

[0543] [Comparative Example 1]

[0544] A comparative glare-reducing film r1 was obtained in the same manner as in Example 1, except that the film thickness after curing of the hard coat layer and the amount of irradiation of ultraviolet rays (UV irradiation amount) in the process (II) of semi-curing the hard coat layer coating film were changed to those described in Table 1, and the scratch-resistant layer-forming composition SR-1 was replaced with SR-2 having a low solid content concentration.

[0545] [Comparative Examples 2 and 3]

[0546] Comparative glare-reducing films r2 and r3 were obtained in the same manner as in Example 1, except that the type of the scratch-resistant layer-forming composition and the film thickness after curing of the scratch-resistant layer were changed to those described in Table 1, respectively.

[0547] [Comparative Example 4]

[0548] A comparative glare-reducing film r4 was obtained in the same manner as in Example 5, except that the amount of irradiation of ultraviolet rays (UV irradiation amount) in the process (II) of semi-curing the hard coat layer coating film was changed to that described in Table 1.

[0549] [Comparative Example 5]

[0550] As Comparative Example 5, a commercially available glare-reducing film PF23-125 (manufactured by Daicel Corporation) was used.

[0551] <Properties of the 1st layer, the 2nd layer, and the hard coat film>

[0552] The arithmetic average height (Sa2) of the surface on the side opposite to the substrate side in the first layer coating film semi-cured in the process (II), the consumption rate of the polymerizable group in the polymerizable compound (a1) (polymerizable group consumption rate) in the first layer coating film semi-cured in the process (II), and the recovery rate of the first layer coating film semi-cured in the process (II) were calculated.

[0553] Further, the refractive index (n1 and n2) and the elastic modulus (G1 and G2) of the first layer and the second layer were respectively calculated. Δn and ΔG were calculated from the formula (i) and the formula (ii).

[0554] (i) Δn = |n1 - n2|

[0555] (ii) ΔG = |G1 - G2|

[0556] Further, the arithmetic average height (Sa) of the surface on the side opposite to the substrate side of the second layer, the average distance between adjacent protrusions (average protrusion distance) in the concave-convex structure including the elongated convex portion on the side opposite to the substrate side of the second layer, and the haze (total haze) of the anti-glare film were calculated.

[0557] In addition, the content of the particles having a particle diameter of 300 nm or more in the second layer of the anti-glare film of all of the examples and the comparative examples was 0 mass% with respect to the total mass of the second layer.

[0558] (polymerizable group consumption rate)

[0559] The polymerizable group consumption rate was calculated by the aforementioned method.

[0560] (recovery rate)

[0561] The recovery rate was measured by the aforementioned method.

[0562] (haze)

[0563] The haze (total haze) and the total light transmittance of the anti-glare film were measured. The haze and the total light transmittance were each measured using SH-4000 manufactured by NIPPON DENSHOKU INDUSTRIES Co., Ltd. in accordance with JIS K 7136 for the haze and JIS K 7361 for the total light transmittance.

[0564] (Sa)

[0565] The Sa was calculated by the aforementioned method. That is, the data measured under the measurement conditions of the wave mode of the scanning white light interference microscope (vertscan (registered trademark) 2.0, Hitachi High-Tech Science Corporation) and the objective lens 10 times by the same analysis software VS-Viewer were calculated.

[0566] (Sa2)

[0567] For the surface of the side opposite to the substrate side in the first layer coating film semi-cured in the process (II), Sa2 was calculated in the same manner as Sa.

[0568] (Average distance between protrusions)

[0569] The average distance between protrusions was calculated by the aforementioned method. In addition, the average distance between protrusions was set to the average value of the values measured at 10 points.

[0570] (Refractive index)

[0571] n1 and n2 are the refractive indices at a wavelength of 550 nm, and were measured by the same analysis of a plurality of points (a method for calculating the refractive index from samples having the same refractive index but different film thicknesses) using a reflection spectrophotometer FE3000 (OTSUKA ELECTRONIC CO., LTD).

[0572] (Elastic modulus)

[0573] G1 and G2 were measured by the aforementioned method.

[0574] Figure 1 and Figure 2 The 3D image and the planar image of the scanning white interference electron microscope photograph of the surface of the second layer of the anti-glare film obtained in Example 1 are shown.

[0575] Figure 3 and Figure 4 The 3D image and the planar image of the scanning white interference electron microscope photograph of the surface of the second layer of the anti-glare film obtained in Example 2 are shown.

[0576] Figures 1-4 In the right side, the axis indicates the height.

[0577] Evaluation of Anti-Glare Film

[0578] (Scratch resistance)

[0579] Using a rubbing tester, a scratch test was performed on the surface of the scratch-resistant layer of the anti-glare film under the following conditions.

[0580] Evaluation environmental conditions: 25°C, relative humidity 60%

[0581] Rubbing material: Steel wool (manufactured by NIHON STEEL WOOL Co., Ltd., grade No. #0000)

[0582] The rubbing front end portion (2 cm x 2 cm) of the tester in contact with the sample was wound and the tape was fixed

[0583] Moving distance (one way) : 13 cm

[0584] Friction speed : 13 cm / sec

[0585] Load : 1 kg / cm 2

[0586] Front end contact area : 2 cm x 2 cm

[0587] Friction number : 10 times, 100 times, 250 times, 500 times

[0588] The side opposite to the rubbed surface of the anti-glare film after the test (the surface of the base material) was coated with an oily black ink, and the number of times of rubbing until a scratch was generated on the portion in contact with the steel wool was measured by visual observation with reflected light, and evaluated.

[0589] A: No scratch was generated at 500 times of reciprocating rubbing.

[0590] B: No scratch was generated at 250 times of reciprocating rubbing, but a scratch was generated at 500 times of reciprocating rubbing.

[0591] C: No scratch was generated at 100 times of reciprocating rubbing, but a scratch was generated at 250 times of reciprocating rubbing.

[0592] D: No scratch was generated at 10 times of reciprocating rubbing, but a scratch was generated at 100 times of reciprocating rubbing.

[0593] E: A scratch was generated at 10 times of reciprocating rubbing.

[0594] (glare)

[0595] Using a smartphone (iPhone (registered trademark) 6s manufactured by Apple Inc.), the degree of local enlargement or reduction unevenness of B, G, and R pixels (glare) observed by the naked eye was evaluated by the following criteria with the display portion of the smartphone displayed in a green color all over the display.

[0596] A: Glare could not be recognized.

[0597] B: Glare could be recognized, but could be completely ignored.

[0598] C: Glare could be recognized, but could be almost ignored.

[0599] D: Glare could be recognized, and was obvious.

[0600] E: Glare could be recognized, and was very obvious.

[0601]

[0602] [Table 2]

[0603]

[0604] From the results shown in Tables 1 to 2, it is found that the anti-glare film of the example is excellent in anti-glare property, glare is suppressed, and is excellent in scratch resistance.

[0605] Industrial Applicability

[0606] According to the present application, it is possible to provide an anti-glare film excellent in anti-glare property, glare is suppressed, and excellent in scratch resistance, and a manufacturing method of the anti-glare film.

[0607] While the present application has been described in detail and with reference to specific embodiments thereof, it will be apparent to one skilled in the art that various changes and modifications can be made therein without departing from the spirit and scope thereof.

[0608] This application claims priority based on Japanese Patent Application (Japanese Patent Application 2020-071190) filed on April 10, 2020, the contents of which are hereby incorporated by reference.

Claims

1. An anti-glare film comprising a substrate, a first layer, and a second layer in this order, wherein: The first layer comprises a cured product of a first layer-forming composition, wherein the first layer-forming composition comprises a polymerizable compound (a1), wherein the polymerizable compound (a1) is at least one selected from polyorganosilsesquioxane having a radical polymerizable group, a urethane (meth)acrylate compound, and a (meth)acrylamide compound. The second layer comprises a cured product of a second layer-forming composition, wherein the second layer-forming composition comprises a polymerizable compound (c1), wherein the polymerizable compound (c1) is at least one selected from a polyorganosilsesquioxane having two or more radical polymerizable groups in one molecule, a urethane (meth)acrylate compound, and a (meth)acrylamide compound. The second layer has a concavo-convex structure including elongated convex portions on a surface opposite to the substrate side. The arithmetic mean height Sa of the surface of the second layer on the side opposite to the substrate side is 30 to 160 nm, The average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm. The content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1% by mass relative to the total mass of the second layer. The average film thickness of the second layer is 0.3 to 3 μm, The haze of the anti-glare film is 1 to 20%, While applying 1 kg / cm2 of #0000 steel wool to the surface of the anti-glare film on the side opposite to the substrate, 2 No scratches occurred when the steel was rubbed back and forth 100 times with a load of 100.

2. The anti-glare film according to claim 1, wherein The absolute value Δn of the difference between the refractive index n1 of the first layer and the refractive index n2 of the second layer represented by the following formula (i) is 0.05 or less, (i)Δn=|n1-n2|.

3. The anti-glare film according to claim 1 or 2, wherein The absolute value ΔG of the difference between the elastic modulus G1 of the first layer and the elastic modulus G2 of the second layer represented by the following formula (ii) is 2 GPa or less. (ii) ΔG = |G1-G2|.

4. The anti-glare film according to claim 1 or 2, wherein The arithmetic mean height Sa of the surface of the second layer on the side opposite to the substrate side is 40 to 100 nm.

5. The anti-glare film according to claim 1 or 2, wherein The anti-glare film has a haze of 5 to 10%.

6. The anti-glare film according to claim 1 or 2, wherein The average distance between adjacent convex portions in the concavo-convex structure is 5 to 15 μm.

7. A method for producing an anti-glare film, the anti-glare film comprising a substrate, a first layer, and a second layer in this order, wherein: The second layer has a concavo-convex structure including elongated convex portions on a surface opposite to the substrate side. The arithmetic mean height Sa of the surface of the second layer on the side opposite to the substrate side is 30 to 160 nm, The average distance between adjacent convex portions in the concavo-convex structure is 5 to 80 μm. The content of particles having a particle size of 300 nm or more in the second layer is 0 to 0.1% by mass relative to the total mass of the second layer. The average film thickness of the second layer is 0.3 to 3 μm, The haze of the anti-glare film is 1 to 20%, While applying 1 kg / cm2 of #0000 steel wool to the surface of the anti-glare film on the side opposite to the substrate, 2 No scratches occur when the load is reciprocated 100 times. The method for manufacturing the anti-glare film comprises the following steps: (I) a step of applying a first layer-forming composition containing a polymerizable compound (a1) on a substrate to form a first coating film; (II) semi-curing the first coating layer; (III) a step of applying a second layer-forming composition on the semi-cured first layer coating film to form a second layer coating film; and (IV) a step of forming the first layer and the second layer by curing the semi-cured first layer coating film and the second layer coating film, The polymerizable compound (a1) is at least one selected from polyorganosilsesquioxane having a free radical polymerizable group, urethane (meth)acrylate compounds, and (meth)acrylamide compounds. The second layer-forming composition contains a polymerizable compound (c1) that is at least one selected from polyorganosilsesquioxane having two or more radical polymerizable groups in one molecule, a urethane (meth)acrylate compound, and a (meth)acrylamide compound.

8. The method for producing an anti-glare film according to claim 7, wherein: The arithmetic mean height Sa2 of the surface of the first coating film on the side opposite to the substrate side semi-cured in the step (II) is 30 nm or less.

9. The method for producing an anti-glare film according to claim 7 or 8, wherein: The consumption rate of the polymerizable groups in the polymerizable compound (a1) in the first coating film semi-cured in the step (II) is 1 to 40%.

10. The method for producing an anti-glare film according to claim 7 or 8, wherein: The recovery rate of the semi-cured first coating film in the step (II) is 2 to 50%.

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