A low-temperature plasma processing device controlled by a transverse magnetic field and its implementation method

Abstract

The present invention belongs to the field of atmospheric pressure glow discharge and relates to a low-temperature plasma processing device controlled by a transverse magnetic field. The device comprises a power supply unit, a discharge unit with a built-in high-voltage spike electrode, an annular ground electrode, and an electromagnetic coil, a gas unit, a gas control unit, a magnetostrictive unit, and a sample unit for holding a treatment liquid or collecting gaseous products processed in the discharge unit. The discharge end of the high-voltage spike electrode is a pointed tip, and the radially inner side of the annular ground electrode is prefabricated with an axially symmetrical cut angle. A magnetic core is provided on the inner surface of the outer cylinder, and the magnetic core includes a first annular magnetic core and a second annular magnetic core. The device improves the efficiency of generating high-energy active particles in the low-temperature plasma by significantly increasing the discharge area. It can either utilize the discharge process of a specific dielectric gas to generate high-energy active particles for subsequent liquid treatment, or directly mix the gas to be treated with the dielectric gas in a certain proportion in the gas unit and then complete the treatment directly in the discharge unit.

Description

Technical Field

[0001] The present invention belongs to the field of atmospheric pressure glow discharge, and in particular relates to a low-temperature plasma processing device controlled by a transverse magnetic field and an implementation method thereof. Background Art

[0002] Glow discharge under atmospheric pressure, especially glow discharge in open air, not only has the characteristics of high energy, high electron density, and rich active particles, but also has the advantages of no vacuum and batch processing. Atmospheric pressure glow discharge, which can obtain high-performance and low-cost low-temperature plasma in open air, has great industrial application prospects.

[0003] Due to the high density of gas molecules in the air, the frequency of collisions between electrons and gas molecules is high during the discharge process, and electron avalanches can easily develop into streamers and then transform into arcs. Therefore, stable atmospheric pressure air glow discharge is not easy to achieve. In addition, the high density of gas molecules in the air confines the glow discharge channel in the air to a very small spatial area. In practical applications, glow discharge generally requires a large volume of diffuse plasma, especially in material surface treatment, biological activity enhancement, sterilization and disinfection, harmful gas removal, sewage degradation, etc. However, at present, diffuse atmospheric pressure glow discharge can still only be generated in an electrode gap of the order of a few millimeters. The efficiency of obtaining high-energy active particles is low and the distribution area is small, which seriously restricts the industrial application of atmospheric pressure glow discharge plasma. Summary of the Invention

[0004] The purpose of the present invention is to provide a low-temperature plasma processing device controlled by a transverse magnetic field and an implementation method thereof, which solves the problem of small distribution area of ​​atmospheric pressure glow discharge.

[0005] The present invention is achieved through the following technical solutions:

[0006] A low-temperature plasma processing device controlled by a transverse magnetic field comprises a power supply unit, a magnetron unit, a sample unit, and a gas unit, a gas control unit and a discharge unit connected in sequence;

[0007] The discharge unit includes an outer cylinder, a high-voltage sharp electrode, an annular grounding electrode and an electromagnetic coil. The outer cylinder contains a sealed discharge cavity.

[0008] The tip of the high-voltage spike electrode penetrates the discharge cavity, and the other end is connected to the power supply unit;

[0009] An annular grounding electrode is provided on the inner surface of the outer cylinder, and an electromagnetic coil is provided transversely on the outer periphery of the outer cylinder. The electromagnetic coil is connected to a magnetic control unit, and the magnetic control unit provides current to the electromagnetic coil;

[0010] The discharge end of the high-voltage spike electrode is pointed, and the radial inner side of the annular ground electrode is prefabricated to facilitate the axially symmetrical cutting angle generated by the discharge;

[0011] A magnetic core is provided on the inner surface of the outer cylinder, and the magnetic core includes a first annular magnetic core and a second annular magnetic core, which are symmetrically arranged on both sides of the annular grounding electrode;

[0012] An air inlet is provided on one side of the outer cylinder where the high-voltage tip electrode is installed, and an air outlet is provided on the other side of the outer cylinder. The air inlet and air outlet provide inlet and outlet channels for the discharge gas medium.

[0013] The gas unit is used to provide target gas to the discharge unit, and the gas control unit is connected to the air inlet;

[0014] The air outlet holes of the sample unit and the discharge unit are connected.

[0015] Furthermore, the air inlet includes an upper air inlet located on the upper side and a lower air inlet located on the lower side, and the air outlet includes an upper air outlet located on the upper side and a lower air outlet located on the lower side;

[0016] When the density of the target gas is greater than that of air at the same pressure, the upper air inlet and lower air outlet are enabled;

[0017] When the target gas has a density less than that of air at the same pressure, the lower inlet and upper outlet are enabled.

[0018] Furthermore, the air outlets of the sample unit and the discharge unit are connected via an air pipe;

[0019] If the target gas is treated in the discharge chamber by a plasma rich in high-energy active species, the sample unit is used to collect the treated gas;

[0020] If the discharge unit is used to obtain high-energy active particles, the sample unit is used to hold samples to be processed, and the high-energy active particles enter the liquid to be processed in the sample unit through the air outlet of the discharge unit.

[0021] Furthermore, the outer cylinder is made of non-magnetic metal material, and the outer surface of the outer cylinder is coated with insulating paper.

[0022] Furthermore, a terminal is provided on one side of the outer cylinder, the annular grounding electrode is grounded via the terminal, and the grounding end of the power supply unit is connected to the terminal.

[0023] Furthermore, the gas control unit includes a gas valve and a flow meter.

[0024] Furthermore, the materials of the high-voltage tip electrode and the annular grounding electrode are brass.

[0025] Furthermore, the magnetic core is made of non-metallic magnetic core material.

[0026] Furthermore, the direction of the electric field in the electrode gap space formed by the high-voltage sharp electrode and the annular ground electrode is radial to the annular ground electrode, and the main component of the current is along the direction of the electric field, while the direction of the magnetic field in the electrode gap space is perpendicular to the plane of the sharp ring. The discharge plasma channel will rotate in the gap between the sharp annular ground electrode under the action of electromagnetic force;

[0027] A bright anode glow zone appears near the high-voltage tip electrode, and a bright cathode glow layer appears near the inner layer of the annular ground electrode. The discharge plasma is diffusely distributed in the gap between the tip and the ring under the action of electromagnetic force.

[0028] The present invention also discloses a method for implementing the plasma processing device for regulating atmospheric pressure glow discharge by a transverse magnetic field, which includes the following steps:

[0029] The voltage of the power supply unit is adjusted to the required value. After confirming that the discharge is stable by monitoring the voltage on the high-voltage tip electrode, the magnetron unit is adjusted to provide a transverse magnetic field of a preset strength for the electrode gap. The discharge channel rotates under the action of the transverse magnetic field force. The rotation speed is controlled by adjusting the magnetic field strength. Atmospheric pressure glow discharge diffuse plasma is obtained in the discharge cavity.

[0030] Turn on the gas control unit and adjust the gas flow rate according to actual needs. The target processing gas enters from the air inlet and flows out from the air outlet to achieve gas processing;

[0031] When processing liquid, the gas control unit controls the composition and flow rate of the discharge atmosphere gas. After the atmosphere gas passes through the discharge unit, it obtains gas rich in active particles, flows out from the gas outlet, and enters the liquid to achieve the treatment of the target liquid.

[0032] Compared with the prior art, the present invention has the following beneficial technical effects:

[0033] The present invention discloses a transverse magnetic field-controlled low-temperature plasma processing device, comprising a power supply unit, a gas unit, a gas control unit, a discharge unit, a magnetostrictive unit, and a sample unit. The discharge unit is connected to the power supply unit, the gas control unit, the magnetostrictive unit, and the sample unit. The power supply unit provides a strong electric field to the gap between a pointed annular ground electrode. The gas unit provides a single-component gas to the discharge unit, or a mixture of different gases in different proportions as needed. The magnetostrictive unit provides current to the electromagnetic coil of the discharge unit, enabling precise control of the transverse electromagnetic field intensity in the discharge gap by adjusting the voltage and current. The transverse magnetic field perpendicular to the electromagnetic coil and the pointed annular gap discharge channel causes the plasma channel to rotate at high speed under the action of electromagnetic force, thereby achieving a large-area diffuse distribution of atmospheric pressure glow discharge low-temperature plasma. This solves the problem of atmospheric pressure glow discharge plasma being confined in a thin filament channel and excessively concentrated in energy. The tip of the high-voltage electrode and the inner corner of the annular ground electrode are cut to generate a strong electric field in these areas, facilitating discharge formation. By adjusting the magnetostrictive unit, the power supply unit, and the electrode dimensions, the rotation speed of the plasma channel is changed, thereby varying the dispersion of the atmospheric pressure glow discharge plasma. In addition, the discharge unit, in cooperation with the power supply unit, gas control unit, magnetron unit and sample unit, can meet the processing requirements of atmospheric pressure glow discharge plasma for certain gases and liquids; the device can control the composition and flow rate of the discharge gas medium, which not only realizes the controllable active particles in the outlet of the discharge cavity, and is used for the degradation of environmental pollution components in the liquid, but also can realize the efficient treatment of harmful gases directly in the discharge cavity.

[0034] Furthermore, the magnetic core is a non-metallic magnetic core material with high magnetic permeability. The magnetic core is two annular structures distributed on both sides of the annular grounding electrode. The magnetic core specifically includes a first annular magnetic core and a second annular magnetic core, which are used to reduce the attenuation of the electromagnetic field generated by the electromagnetic coil and enhance the transverse magnetic field strength in the space where the discharge gap is located.

[0035] Furthermore, the air outlets of the sample unit and the discharge unit are connected by an air pipe. The unit functions differently in different applicable situations. If the mixed gas is directly processed in the discharge unit through a plasma rich in high-energy active particles, then the function of the sample unit is to collect the processed gas; if the discharge unit is used to obtain high-energy active particles, then the sample unit is generally used to hold samples to be processed, and the high-energy active particles are connected to the liquid to be processed in the sample unit from the air outlet of the discharge unit to realize functions such as sewage treatment, sterilization and disinfection or catalysis of other chemical reactions. BRIEF DESCRIPTION OF THE DRAWINGS

[0036] Figure 1 This is a block diagram of the connection principle of each unit in the low-temperature plasma processing device controlled by the transverse magnetic field provided by the present invention;

[0037] Figure 2This is a schematic structural diagram of a discharge unit for atmospheric pressure glow discharge in a pointed annular grounded electrode gap regulated by a transverse magnetic field provided by the present invention;

[0038] Figure 3 It is a schematic diagram of the electric field and magnetic field distribution in the gap between the high-voltage sharp electrode tip and the annular grounding electrode;

[0039] Figure 4 Schematic diagram of an embodiment of the present invention controlling atmospheric pressure air glow discharge to obtain diffuse plasma in a 30 mm inner diameter annular grounded electrode;

[0040] Among them: 1. High-voltage tip electrode; 2. Left cover; 3. Upper air inlet; 4. Lower air inlet; 5. Outer cylinder; 6. Insulation paper; 7. First annular magnetic core; 8. Annular grounding electrode; 9. Second annular magnetic core; 10. Terminal; 11. Right cover; 12. Electromagnetic coil; 13. Lower air outlet; 14. Upper air outlet; 15. Electric field in the electrode gap space; 16. Magnetic field in the electrode gap space; 17. Anode glow region; 18. Diffuse discharge plasma; 19. Cathode glow layer. DETAILED DESCRIPTION

[0041] In order to make the purpose, technical solutions and advantages of the present invention more clear, the following is a further detailed description with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention. That is, the embodiments described are only part of the embodiments of the present invention, not all of the embodiments.

[0042] The components described and illustrated in the drawings and embodiments of the present invention may be arranged and designed in a variety of different configurations. Therefore, the detailed description of the embodiments of the present invention provided in the following drawings is not intended to limit the scope of the claimed invention, but merely represents a selected embodiment of the present invention. All other embodiments derived by those skilled in the art based on the drawings and embodiments of the present invention without inventive effort shall fall within the scope of protection of the present invention.

[0043] It should be noted that the terms "comprises", "includes" or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, element, method, article or device comprising a series of elements includes not only those elements, but also other elements not explicitly listed, or also includes elements inherent to the process, element, method, article or device. In addition, the terms "lateral" and "left and right" are based on the orientation and positional relationship of the devices or components shown in the drawings, and are only for the purpose of better describing the present invention, rather than requiring the devices, components or devices shown to have such a specific orientation, and therefore should not be understood as limiting the present invention.

[0044] The features and performance of the present invention are further described in detail below with reference to the embodiments.

[0045] like Figure 1 As shown, the present invention provides a transverse magnetic field controlled low-temperature plasma processing device, comprising a power supply unit, a magnetron unit, a sample unit, and a gas unit, a gas control unit, and a discharge unit connected in sequence. The discharge unit is connected to the power supply unit, the gas control unit, the magnetron unit, and the sample unit respectively.

[0046] The power supply unit provides a strong electric field for the gap between the sharp ring electrodes. The power supply unit can use a DC high-voltage source connected in series with a current-limiting resistor and then connected to the high-voltage sharp electrode 1, or a fast-front repetitive pulse high-voltage source, or a high-voltage resonant constant current source. The ground terminal of the power supply unit is reliably connected to the terminal 10 of the discharge unit.

[0047] The gas unit can provide a single-component gas to the discharge unit, or it can mix different gases in different proportions as needed. It can use a certain gas as a discharge medium to obtain high-energy active particles from the outlet of the discharge unit to access the sample unit, or it can mix the gas to be treated according to the treatment requirements and then pass it into the discharge unit for direct treatment using the diffuse discharge plasma 18 in the sharp ring discharge gap.

[0048] The gas control unit includes a gas valve and a flow meter, and the accuracy of the flow meter is selected according to actual processing requirements.

[0049] like Figure 2 As shown, the discharge unit is the core unit of the invention and includes an outer tube 5, a high-voltage spike electrode 1, an annular ground electrode 8, and an electromagnetic coil 12. A left cover plate 2 is provided on the left side of the outer tube 5, and a right cover plate 11 is provided on the right side. The cavity sealed by the outer tube 5, the left cover plate 2, and the right cover plate 11 is a sealed cavity, serving as the discharge cavity. One end of the high-voltage spike electrode 1 extends through the left cover plate 2 into the discharge cavity, and the other end is connected to the power supply unit. The annular ground electrode 8 is tightly connected to the inner surface of the outer tube 5 and is grounded via a terminal 10, providing a zero potential in the glow discharge channel. An electromagnetic coil 12 is provided on the periphery of the outer tube 5 and is connected to the magnetron unit. A magnetic core is provided on the inner surface of the outer tube 5 and is arranged on both sides of the annular ground electrode 8. An air inlet is provided on the left cover plate 2, and an air outlet is provided on the right cover plate 11. The air inlet and outlet provide inlet and outlet channels for the discharge gas medium.

[0050] The tip of the high-voltage electrode and the inner edge of the bevel of the annular ground electrode 8 are designed to generate a strong electric field in these areas, which is conducive to the formation of discharge.

[0051] The high-voltage tip electrode 1 is connected to the power supply unit wire, and the high voltage provided by the power supply enables a strong electric field distribution to be obtained near the tip.

[0052] The high-voltage tip electrode 1 is made of brass material with good conductivity. The discharge end is a high-curvature tip for generating high field strength. The high-voltage end of the power supply is threaded to facilitate the screw tightening of the high-voltage lead. There is a fine thread in the middle that fits tightly with the left cover plate 2 to ensure good airtightness of the cavity and adjustability of the discharge tip position.

[0053] The annular ground electrode 8 is made of brass with good conductivity. The outer radial ring has threads for fixing and adjusting the position, and the inner radial ring has an axially symmetrical cut angle that is conducive to discharge generation. The annular ground electrode 8 is grounded to provide a zero potential in the glow discharge channel.

[0054] The left cover plate 2 is made of insulating material, and has pre-made threads for tight fit between the air intake spiral and the high-voltage tip electrode 1 , as well as tight fit threads between the left cover plate 2 and the outer cylinder 5 .

[0055] The gas unit is connected to the air inlet via the air control unit. The air inlet includes an upper air inlet 3 located on the upper side of the left cover plate 2 and a lower air inlet 4 located on the lower side of the left cover plate 2. The air outlet includes an upper air outlet 14 located on the upper side of the right cover plate 11 and a lower air outlet 13 located on the lower side of the right cover plate 11. The upper air inlet 3 and lower air outlet 13 are used in conjunction with each other, while the lower air inlet 4 and upper air outlet 14 are used in conjunction with each other. When the target gas has a greater density than air at the same pressure, the upper air inlet 3 and lower air outlet 13 are used. When the target gas has a lesser density than air at the same pressure, the lower air inlet 4 and upper air outlet 14 are used.

[0056] The sealed cavity provides a well-sealed space to ensure the controllable composition of the discharge gas medium. The stainless steel outer cylinder 5, the left cover plate 2, and the right cover plate 11 are fastened together by fine threads. Since the gas pressure in the discharge cavity is basically the same as the atmospheric pressure of air, there is basically no pressure difference between the inside and outside of the cavity, so no sealing ring is required. When there are strict control requirements for the gas medium composition, raw tape and sealant can be used to process the connection parts.

[0057] The electromagnetic coil 12 provides a transverse vertical magnetic field for the electric field between the high-voltage tip electrode 1 and the annular ground electrode 8. The width, thickness, wire selection and other parameters of the electromagnetic coil 12 are determined according to the actual magnetic field strength requirements and the size of the discharge cavity. The electromagnetic coil 12 includes a densely wound enameled wire and is connected to a DC power supply with adjustable voltage. The magnetic field strength is controlled by adjusting the voltage.

[0058] The magnetic core is a non-metallic magnetic core material with high magnetic permeability. The magnetic core is two annular structures distributed on both sides of the annular grounding electrode 8. The magnetic core specifically includes a first annular magnetic core 7 and a second annular magnetic core 9, which are used to reduce the attenuation of the electromagnetic field generated by the electromagnetic coil 12, increase the magnetic field strength of the plasma channel, and enhance the transverse magnetic field strength of the space where the discharge gap is located.

[0059] The magnetic control unit provides current to the electromagnetic coil 12, and preferably a DC power supply that can sensitively adjust the voltage and current. Before using the device, a Gauss meter is required to calibrate the correspondence between the magnetic field strength inside the discharge cavity and the voltage and current of the power supply. During discharge, precise control of the transverse electromagnetic field strength of the discharge gap is achieved only by adjusting the voltage and current.

[0060] The air outlets of the sample unit and the discharge unit are connected by an air pipe. The unit functions differently in different applicable situations. If the mixed gas is directly processed in the discharge unit through a plasma rich in high-energy active particles, then the function of the sample unit is to collect the processed gas; if the discharge unit is used to obtain high-energy active particles, then the sample unit is generally used to hold samples to be processed, and the high-energy active particles are connected to the liquid to be processed in the sample unit from the air outlet of the discharge unit to realize functions such as sewage treatment, sterilization and disinfection or catalysis of other chemical reactions.

[0061] The outer surface of the outer cylinder 5 is covered with insulating paper 6 to ensure good insulation between the outer cylinder 5 and the electromagnetic coil 12 .

[0062] The specific implementation process of the plasma processing device for atmospheric pressure glow discharge regulated by a transverse magnetic field provided by the present invention is as follows:

[0063] Step 1: Select the appropriate ring electrode size according to the processing requirements, adjust the positions of the high-voltage spike electrode 1 and the ring electrode, connect the power supply unit and the high-voltage spike electrode 1 with a wire, connect the power supply output ground electrode and the terminal 10 with a wire and connect them to the ground wire;

[0064] Step 2: Reliably connect the magnetic control unit calibrated with the corresponding relationship between the power supply voltage, current and magnetic field strength to the electromagnetic coil 12;

[0065] Step 3: Select the air inlet and outlet according to the density of the gas to be introduced into the discharge unit, connect the air inlet to the gas control unit, connect the air outlet to the sample unit, and close the unused air inlet and outlet valves;

[0066] Step 4: Connect the gas unit and the gas control unit, and determine the content of the test unit according to actual needs;

[0067] Step 5: Adjust the voltage of the power supply unit to the required value. After confirming that the discharge is stable by monitoring the voltage on the high-voltage tip electrode 1, adjust the magnetic control unit to provide a transverse magnetic field of a certain strength for the electrode gap.

[0068] Step 6: Turn on the gas control unit switch and adjust the gas flow rate according to actual needs. The target gas enters from the air inlet and flows out from the air outlet.

[0069] like Figure 3As shown, the arrow indicates the electric field 15 in the electrode gap space between the sharp electrode and the annular ground electrode 8, and the cross indicates the magnetic field 16 in the electrode gap space perpendicular to the paper. The electric field is in the radial direction of the annular ground electrode 8, and the main component of the current is along the electric field direction, while the magnetic field is perpendicular to the plane of the sharp ring. In other words, the magnetic field direction is perpendicular to the current direction. Therefore, the discharge plasma channel will rotate at high speed in the electrode gap between the sharp rings under the action of electromagnetic force.

[0070] like Figure 4 As shown, a bright anode glow region 17 can be seen near the tip electrode, and a bright cathode glow layer 19 can be seen near the inner layer of the annular ground electrode 8. The discharge plasma is diffusely distributed in the gap between the tip and the ring under the action of electromagnetic force.

[0071] The basic principles of the present invention have been described above in conjunction with specific embodiments. However, it should be noted that the advantages, strengths, and effects mentioned in the present invention are merely illustrative and non-limiting, and should not be construed as necessarily possessed by each embodiment of the present invention. Furthermore, the specific details disclosed above are provided for illustrative purposes and to facilitate understanding, and are not intended to be limiting. These details do not necessarily limit the present invention to being implemented using these specific details.

Claims

1. A low-temperature plasma processing device controlled by a transverse magnetic field, characterized in that: It includes a power supply unit, a magnetic control unit, a sample unit, and a gas unit, a gas control unit and a discharge unit connected in sequence; The discharge unit comprises an outer cylinder (5), a high-voltage sharp electrode (1), an annular grounding electrode (8) and an electromagnetic coil (12); the outer cylinder (5) contains a sealed discharge cavity; The tip of the high-voltage sharp electrode (1) penetrates the discharge cavity, and the other end is connected to the power supply unit; An annular grounding electrode (8) is provided on the inner surface of the outer cylinder (5), an electromagnetic coil (12) is laterally provided on the periphery of the outer cylinder (5), the electromagnetic coil (12) is connected to a magnetic control unit, and the magnetic control unit provides current to the electromagnetic coil (12); The discharge end of the high-voltage sharp electrode (1) is a pointed tip, and the radial inner side of the annular grounding electrode (8) is prefabricated with an axially symmetrical cutting angle that is beneficial to discharge generation; A magnetic core is provided on the inner surface of the outer cylinder (5), and the magnetic core comprises a first annular magnetic core (7) and a second annular magnetic core (9), which are symmetrically arranged on both sides of the annular grounding electrode (8); An air inlet is provided on one side of an outer cylinder (5) for mounting a high-voltage sharp electrode (1), and an air outlet is provided on the other side of the outer cylinder (5), wherein the air inlet and the air outlet provide inlet and outlet channels for a discharge gas medium; The gas unit is used to provide target gas to the discharge unit, and the gas control unit is connected to the air inlet; The air outlets of the sample unit and the discharge unit are connected.

2. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The air inlet includes an upper air inlet (3) located on the upper side and a lower air inlet (4) located on the lower side, and the air outlet includes an upper air outlet (14) located on the upper side and a lower air outlet (13) located on the lower side; When the density of the target gas is greater than that of air at the same pressure, the upper air inlet (3) and the lower air outlet (13) are in an enabled state; When the density of the target gas is less than that of air at the same pressure, the lower air inlet (4) and the upper air outlet (14) are in an enabled state.

3. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The air outlets of the sample unit and the discharge unit are connected through an air pipe; If the target gas is treated in the discharge chamber by a plasma rich in high-energy active species, the sample unit is used to collect the treated gas; If the discharge unit is used to obtain high-energy active particles, the sample unit is used to hold samples to be processed, and the high-energy active particles enter the liquid to be processed in the sample unit through the air outlet of the discharge unit.

4. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The outer cylinder (5) is made of a non-magnetic metal material, and the outer surface of the outer cylinder (5) is covered with insulating paper (6).

5. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: A terminal (10) is provided on one side of the outer cylinder (5), the annular grounding electrode (8) is grounded via the terminal (10), and the grounding end of the power supply unit is connected to the terminal (10).

6. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The air control unit includes an air valve and a flow meter.

7. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The high-voltage tip electrode (1) and the annular grounding electrode (8) are made of brass.

8. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The magnetic core is made of non-metallic magnetic core material.

9. The low-temperature plasma processing device controlled by a transverse magnetic field according to claim 1, characterized in that: The direction of the electric field (15) in the electrode gap space formed by the high-voltage sharp electrode (1) and the annular ground electrode (8) is radial to the annular ground electrode (8), the main component of the current is along the direction of the electric field, and the direction of the magnetic field (16) in the electrode gap space is perpendicular to the plane of the sharp ring, and the discharge plasma channel rotates in the gap of the sharp annular ground electrode (8) under the action of electromagnetic force; A bright anode glow region (17) appears near the high-voltage sharp electrode (1), and a bright cathode glow layer (19) appears near the inner layer of the annular ground electrode (8). Discharge plasma is diffusely distributed in the gap between the sharp rings under the action of electromagnetic force.

10. The method for implementing the plasma processing device for atmospheric pressure glow discharge controlled by a transverse magnetic field according to any one of claims 1 to 9, characterized in that: The following processes are included: The voltage of the power supply unit is adjusted to a desired value. After confirming that a discharge is stably formed by monitoring the voltage on the high-voltage sharp electrode (1), the magnetron unit is adjusted to provide a transverse magnetic field of a preset strength for the electrode gap. The discharge channel rotates under the action of the transverse magnetic field force. The rotation speed is controlled by adjusting the magnetic field strength. Atmospheric pressure glow discharge diffuse plasma is obtained in the discharge cavity. Turn on the gas control unit and adjust the gas flow rate according to actual needs. The target processing gas enters from the air inlet and flows out from the air outlet to achieve gas processing; When processing liquid, the gas control unit controls the composition and flow rate of the discharge atmosphere gas. After the atmosphere gas passes through the discharge unit, it obtains gas rich in active particles, flows out from the gas outlet, and enters the liquid to achieve the treatment of the target liquid.

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