Sputtering target
By using conical or wedge-shaped inserts with gradually increasing length and cross-sectional area in the depth direction in the sputtering target, the problem of uneven material ratio during the use of multi-material targets is solved, and the uniformity and stability of coating composition are achieved.
CN116897220BActive Publication Date: 2026-07-03CEMECON AG
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Patent Information
- Application Number
- CN202280016152.3
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2021-02-23
- Filing Date
- 2022-02-22
- Publication Date
- 2026-07-03
- Estimated Expiration
- 2042-02-22
AI Technical Summary
Technical Problem
In the use of existing sputtering targets, the material ratio of multi-material targets is uneven during the service life, resulting in uneven coating composition.
Method used
An insert made of a second sputtered material is designed as a tapered or wedge-shaped structure with gradually increasing length and cross-sectional area in the depth direction and is fixed to the base plate to ensure that the proportion of the second sputtered material is compensated throughout its service life.
Benefits of technology
This achieves uniformity of material proportions throughout the entire service life of the sputtering target, ensuring the uniformity and stability of the coating composition.
✦ Generated by Eureka AI based on patent content.
Abstract
This invention relates to a sputtering target (10), a coating system (30), and a coating method thereof. The sputtering target (10) includes a base (12) with a target plate (14) fixed to the base and made of a first sputtering material. The target plate has a surface (16) and a plurality of recesses (18) formed in the surface. A plurality of inserts (20) are arranged in the recesses (18). At least some of the inserts (20) are made of a second sputtering material, wherein the second sputtering material has a higher sputtering rate than the first sputtering material. The object of the invention is to obtain a particularly uniform coating. This is achieved by molding the inserts (20) made of the second sputtering material such that the lengths (D1, D2) of the inserts, measured in a direction parallel to the surface (14), increase in the depth direction (T) from the surface (14) to the base (12).
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