A high-pressure multi-component gas blending system

Abstract

The application discloses a high-pressure multi-element mixed gas preparation system, which comprises an upper computer, a lower computer, a first gas source control pipeline, a second gas source control pipeline, a binary mixer, a first oxygen meter, a binary buffer, a pressure boost control pipeline and a gas storage tank. According to the set mixed gas proportioning concentration of each gas, the corresponding matched gas target flow can be obtained to control the opening of the gas flow regulating valve on each gas source control pipeline, so that the gas in each gas source control pipeline can flow according to the corresponding matched gas target flow, and according to the continuous flow gas distribution mode, the various gas components in the mixed gas are continuously filled into the mixed gas cylinder in a certain proportion for mixing and gas distribution through the flow control of various gases, and the accurate and stable output of the mixed gas is realized. The mixed gas oxygen concentration control range is 0.4% to 40%, and the control precision is ±5% of the oxygen concentration target value.

Description

Technical Field

[0001] This invention relates to the field of mixed gas preparation technology, and in particular to a high-pressure multi-element mixed gas preparation system. Background Technology

[0002] A gas mixture is a mixture of two or more pure gases in a certain proportion. Air is a stable gas mixture composed of nitrogen, oxygen, carbon dioxide, and other gases.

[0003] The inventor of this invention previously applied for a utility model patent with patent number 2008200607705, entitled "An Automatic Gas Mixing Device for Mixed Gases". The design of this utility model patent was relatively crude. Based on this, the inventor of this invention carried out structural optimization design of the first gas source control pipeline and the second gas source control pipeline, as well as control optimization design of multi-element mixed gas preparation, thereby achieving accurate and stable output of mixed gas. Summary of the Invention

[0004] This invention addresses the problems and shortcomings of existing technologies by providing a high-pressure multi-element mixed gas preparation system.

[0005] The present invention solves the above-mentioned technical problems through the following technical solution:

[0006] This invention provides a high-pressure multi-element mixed gas preparation system, characterized in that it includes a host computer, a slave computer, a first gas source control pipeline, a second gas source control pipeline, a binary mixer, a first oxygen analyzer, a binary buffer, a pressurization control pipeline, and a gas storage tank.

[0007] The first gas source control pipeline includes: one end of the first gas source is connected to the first gas source pipeline, the other end of the first gas source pipeline is connected to the air inlet of the binary mixer, and the first gas source pipeline is sequentially provided with a first filter, a first pressure sensor, a first pressure reducer, a first solenoid valve, a first gas flow regulating valve, a first mass flow sensor and a first check valve, and the first pressure sensor, the first solenoid valve, the first gas flow regulating valve and the first mass flow sensor are all electrically connected to the lower-level electromechanical system;

[0008] The second gas source control pipeline includes: one end of the second gas source is connected to the second gas source pipeline, and the other end of the second gas source pipeline is connected to the air inlet of the binary mixer. The second gas source pipeline is sequentially equipped with a second filter, a second pressure sensor, a second pressure reducer, a second solenoid valve, a second gas flow regulating valve, a second mass flow sensor, and a second check valve. The second pressure sensor, the second solenoid valve, the second gas flow regulating valve, and the second mass flow sensor are all connected to the lower-level electromechanical system.

[0009] The sampling port of the binary mixer is connected to the pipeline of the first oxygen analyzer, the first oxygen analyzer is connected to the lower electromechanical unit, the outlet of the binary mixer is connected to the inlet pipeline of the binary buffer, the outlet of the binary buffer is connected to the booster control pipeline, the booster control pipeline is provided with a main solenoid valve and a booster in sequence, and the outlet of the booster is connected to the gas storage tank pipeline.

[0010] The host computer is used to allow users to set the target concentration range of each gas source in the gas mixture, and sends a gas mixture preparation command containing the target concentration range of each gas source in the gas mixture to the slave computer. The slave computer, upon receiving the gas mixture preparation command, controls the operation of the first and second pressure sensors. It receives the first pressure value from the first pressure sensor and the second pressure value from the second pressure sensor, determines whether the first and second pressure values ​​are non-zero, and if the first pressure value is zero, controls the issuance of a warning message that the first gas source has not entered the first gas source pipeline; if the second pressure value is zero, controls the issuance of a warning message that the second gas source has not entered the second gas source pipeline; if both the first and second pressure values ​​are non-zero, it controls the opening of the first and second solenoid valves, and calculates the corresponding matching first gas source concentration range based on the target concentration range of the first gas source. A first gas source target flow range is defined. Based on this first gas source target flow range, the opening of the first gas flow regulating valve is controlled. The first gas source, after being filtered by the first filter and depressurized by the first pressure reducer, flows sequentially through the first solenoid valve, the first gas flow regulating valve, the first mass flow sensor, and the first check valve before entering the binary mixer. The actual flow rate of the first gas source is received from the first mass flow sensor. Based on the second gas source target ratio concentration range, a corresponding matching second gas source target flow range is calculated. Based on this second gas source target flow range, the opening of the second gas flow regulating valve is controlled. The second gas source, after being filtered by the second filter and depressurized by the second pressure reducer, flows sequentially through the second solenoid valve, the second gas flow regulating valve, the second mass flow sensor, and the second check valve before entering the binary mixer. The actual flow rate of the second gas source is received from the second mass flow sensor.

[0011] The lower-level machine is used to receive the real-time oxygen concentration in the binary mixer detected by the first oxygen analyzer, and adjust the opening of the first gas flow regulating valve in real time based on the actual flow rate of the first gas source and the real-time oxygen concentration value to adjust the real-time oxygen flow rate. When the real-time oxygen concentration value in the binary mixer reaches the corresponding target concentration range, the main solenoid valve is controlled to open, and the mixed gas temporarily stored in the binary buffer is delivered to the booster. The booster increases the pressure of the mixed gas to the set pressure value and then stores it in the gas storage tank.

[0012] The first gas source is oxygen, and the second gas source is helium or nitrogen.

[0013] Based on this, when the second gas source is helium, the third gas source is nitrogen, or when the second gas source is nitrogen, the third gas source is helium;

[0014] The system also includes a third gas source control pipeline, a ternary mixer, a second oxygen analyzer, and a ternary buffer;

[0015] The third gas source control pipeline includes: one end of the third gas source is connected to the third gas source pipeline, the other end of the third gas source pipeline is connected to the air inlet of the three-way mixer, and the third gas source pipeline is sequentially equipped with a third filter, a third pressure sensor, a third pressure reducer, a third solenoid valve, a third gas flow regulating valve, a third mass flow sensor and a third check valve. The third pressure sensor, the third solenoid valve, the third gas flow regulating valve and the third mass flow sensor are all connected to the lower-level electromechanical system.

[0016] The sampling port of the ternary mixer is connected to the pipeline of the second oxygen analyzer, the second oxygen analyzer is connected to the lower electromechanical unit, the outlet of the binary buffer is connected to the inlet pipeline of the ternary mixer through the fourth check valve, the outlet of the ternary mixer is connected to the inlet pipeline of the ternary buffer, and the outlet of the ternary buffer is connected to the pipeline of the booster through the main solenoid valve.

[0017] The lower-level machine receives the gas mixture preparation command and controls the operation of the first, second, and third pressure sensors. It receives the first pressure value from the first sensor, the second pressure value from the second sensor, and the third pressure value from the third sensor. It determines whether each of these pressure values ​​is non-zero. If the first pressure value is zero, it controls the issuance of a warning message indicating that the first gas source has not entered the first gas source pipeline; if the second pressure value is zero, it controls the issuance of a warning message indicating that the second gas source has not entered the second gas source pipeline; and if the third pressure value is zero, it controls the issuance of a warning message indicating that the third gas source has not entered the third gas source pipeline. When all three pressure values ​​are non-zero, it controls the opening of the first, second, and third solenoid valves. Based on the target concentration range of the first gas source, it calculates the corresponding target flow range of the first gas source and controls the opening of the first gas flow regulating valve based on this target flow range. The first gas source, after being filtered by the first filter and depressurized by the first pressure reducer, flows sequentially through the first solenoid valve, the first gas flow regulating valve, and the first mass flow sensor. After passing through the first check valve, binary mixer, binary buffer, and fourth check valve, the gas enters the ternary mixer and receives the actual flow rate of the first gas source from the first mass flow sensor. Based on the target concentration range of the second gas source, the corresponding matching target flow rate range of the second gas source is calculated. Based on the target flow rate range of the second gas source, the opening of the second gas flow regulating valve is controlled. After being filtered by the second filter and depressurized by the second pressure reducer, the second gas source flows sequentially through the second solenoid valve, the second gas flow regulating valve, the second mass flow sensor, the second check valve, the binary mixer, the binary buffer, and the fourth check valve before entering the ternary mixer and receiving the actual flow rate of the second gas source from the second mass flow sensor. Based on the target concentration range of the third gas source, the corresponding matching target flow rate range of the third gas source is calculated. Based on the target flow rate range of the third gas source, the opening of the third gas flow regulating valve is controlled. After being filtered by the third filter and depressurized by the third pressure reducer, the third gas source flows sequentially through the third solenoid valve, the third gas flow regulating valve, the third mass flow sensor, and the third check valve before entering the ternary mixer and receiving the actual flow rate of the third gas source from the third mass flow sensor.

[0018] The lower-level machine is used to receive the real-time oxygen concentration in the ternary mixer detected by the second oxygen analyzer, and adjust the opening of the first gas flow regulating valve in real time based on the actual flow rate of the first gas source and the real-time oxygen concentration value to adjust the real-time oxygen flow rate. When the real-time oxygen concentration value in the ternary mixer reaches the corresponding target concentration range, it controls the main solenoid valve to open, and the mixed gas temporarily stored in the ternary buffer is delivered to the booster. The booster increases the pressure of the mixed gas to the set pressure value and then stores it in the gas storage tank.

[0019] The positive and progressive effects of this invention are as follows:

[0020] This invention calculates the corresponding target gas flow rate based on the set concentration ratio of each gas in the mixed gas, and controls the opening of the gas flow regulating valves on each gas pipeline. This ensures that the gas in each pipeline flows according to the corresponding target gas flow rate. Following a continuous flow gas distribution method and after pre-calibration, the various gas components in the mixed gas are continuously injected into the mixed gas cylinder in a certain proportion for mixing and distribution through the flow control of various gases, achieving accurate and stable output of the mixed gas. The oxygen concentration control range of the mixed gas is 0.4%-40%, with a control accuracy of ±5% of the target oxygen concentration value. Attached Figure Description

[0021] Figure 1 This is a control principle diagram of a high-pressure multi-element mixed gas preparation system according to a preferred embodiment of the present invention. Detailed Implementation

[0022] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0023] This embodiment provides a high-pressure multi-element gas mixing system, which includes a host computer, a slave computer, a first gas source control pipeline, a second gas source control pipeline, a binary mixer, a first oxygen analyzer, a binary buffer, a pressurization control pipeline, and a gas storage tank. The first gas source is oxygen, and the second gas source is helium or nitrogen. The slave computer uses a PLC. This high-pressure multi-element gas mixing system is planned to be installed in the gas distribution room of a saturation diving system.

[0024] like Figure 1 As shown, in this embodiment, the first gas source is oxygen and the second gas source is helium.

[0025] The first gas source control pipeline includes: a first gas source (oxygen) connected to one end of a first gas source pipeline 1, and the other end of the first gas source pipeline 1 connected to the inlet of a binary mixer 2. The first gas source pipeline 1 is sequentially equipped with a first filter 3, a first pressure sensor 4, a first pressure reducer 5, a first solenoid valve 6, a first gas flow regulating valve 7, a first mass flow sensor 8, and a first check valve 9. The first pressure sensor 4, the first solenoid valve 6, the first gas flow regulating valve 7, and the first mass flow sensor 8 are all electrically connected to the lower-level computer 10. This first gas source control pipeline is an automatic control pipeline for the first gas source, controlled and regulated by the lower-level computer 10.

[0026] Furthermore, a first manual shut-off valve 11 is installed on the first gas source pipeline 1, located between the first filter 3 and the first pressure sensor 4. A first gas flow regulating valve 7 is connected in parallel with a second manual shut-off valve 12 and a first manual needle valve 13 connected in series. A first pressure gauge 14 for displaying the pressure before pressure reduction is installed on the first gas source pipeline 1, located upstream of the first filter 3. The first solenoid valve 6 is a normally open solenoid valve (in the conducting state). Here, the first gas source control pipeline is the first gas source manual control pipeline.

[0027] The second gas source control pipeline includes: a second gas source (helium) connected to one end of a second gas source pipeline 15, and the other end of the second gas source pipeline 15 connected to the inlet of a binary mixer 2. The second gas source pipeline 15 is sequentially equipped with a second filter 16, a second pressure sensor 17, a second pressure reducer 18, a second solenoid valve 19, a second gas flow regulating valve 20, a second mass flow sensor 21, and a second check valve 22. The second pressure sensor 17, the second solenoid valve 19, the second gas flow regulating valve 20, and the second mass flow sensor 21 are all electrically connected to the lower-level computer 10. This second gas source control pipeline is an automatic control pipeline for the second gas source, controlled and regulated by the lower-level computer 10.

[0028] Furthermore, a third manual shut-off valve 23 is installed on the second gas source pipeline 15, located between the second filter 16 and the second pressure sensor 17. The second gas flow regulating valve 20 is connected in parallel with the fourth manual shut-off valve 24 (connected in series) and the second manual needle valve 25. A second pressure gauge 26 for displaying the pressure before depressurization is installed on the second gas source pipeline 15, located upstream of the second filter 16. The second solenoid valve 19 is a normally open solenoid valve (in the conducting state). Here, the second gas source control pipeline is a second gas source manual control pipeline.

[0029] The sampling port of the binary mixer 2 is connected to the first oxygen analyzer 27 via a pipeline after being depressurized by a pressure reducer. The first oxygen analyzer 27 is electrically connected to the lower-level computer 10. The outlet of the binary mixer 2 is connected to the inlet of the binary buffer 28 via a pipeline. The outlet of the binary buffer 28 is connected to the booster control pipeline 29. The booster control pipeline 29 is sequentially equipped with a main solenoid valve 30 and a booster 31. The outlet of the booster 31 is connected to the gas storage tank 32 via a pipeline. In this embodiment, there are two first oxygen analyzers 27 and two binary buffers 28.

[0030] The binary buffer 28 is connected to a first exhaust pipe, on which a first exhaust solenoid valve 33 is installed. A first flow meter 34 is installed on the pipe between the binary mixer 2 and the first oxygen analyzer 27. A binary mixture pressure sensor 35 is installed on the binary buffer 28. The first exhaust solenoid valve 33, the first flow meter 34, and the binary mixture pressure sensor 35 are all electrically connected to the lower-level computer 10. A first exhaust manual shut-off valve may also be installed on the first exhaust pipe for manual exhaust operation.

[0031] The system also includes a first back pressure valve 36, one port of which is connected to the binary mixer 2 pipeline, the second port of which is connected to the first pressure reducer 5 pipeline, and the third port of which is connected to the second pressure reducer 18 pipeline. The first back pressure valve 36 is used to track and provide feedback on the air pressure in the binary mixer 2, adjust the air pressure in the first pressure reducer 5 so that the air pressure in the first pressure reducer 5 is greater than the air pressure in the binary mixer 2, and adjust the air pressure in the second pressure reducer 18 so that the air pressure in the second pressure reducer 18 is greater than the air pressure in the binary mixer 2.

[0032] Gas source pressure is a key factor affecting outlet flow rate. Due to the large fluctuation range of gas supply pressure from various sources (1.5-20 MPa), flow rates are unstable, pressure regulator outlet pressure is not constant, and gas distribution accuracy is difficult to control. This embodiment designs a back pressure valve, using one back pressure valve to control the output of two pressure regulators (first pressure regulator 5 and second pressure regulator 18). Through pressure feedback, the outlet pressures of the two pressure regulators are kept consistent, and the pressure difference between the two pressure regulators and the binary mixer 2 is kept consistent, ensuring stable gas source flow rate.

[0033] The following details the process of mixing oxygen and helium to prepare a gas mixture:

[0034] The host computer is used to allow users to set the target concentration range of each gas source (oxygen and helium) in the mixed gas, and to send a mixed gas preparation command containing the target concentration range of each gas source in the mixed gas to the slave computer 10.

[0035] The lower-level machine 10 is used to receive the mixed gas preparation command and control the first pressure sensor 4 and the second pressure sensor 17 to work. It receives the first pressure value from the first pressure sensor 4 and the second pressure value from the second pressure sensor 17, and determines whether the first pressure value is not zero. If it is, it indicates that the first gas source has entered the first gas source pipeline 1. If it is not, it indicates that the first gas source has not entered the first gas source pipeline 1, and controls the issuance of a warning message that the first gas source has not entered the first gas source pipeline. It also determines whether the second pressure value is not zero. If it is, it indicates that the second gas source has entered the second gas source pipeline 15. If it is not, it indicates that the second gas source has not entered the second gas source pipeline 15, and controls the issuance of a warning message that the second gas source has not entered the second gas source pipeline 15.

[0036] The lower-level machine 10 controls the first solenoid valve 6 and the second solenoid valve 19 to open when both the first pressure value and the second pressure value are not zero. It calculates the corresponding target flow range of the first gas source based on the target concentration range of the first gas source, and controls the opening of the first gas flow regulating valve 7 based on the target flow range of the first gas source. The first gas source, after being filtered by the first filter 3 and reduced in pressure by the first pressure reducer 5, flows sequentially through the first solenoid valve 6, the first gas flow regulating valve 7, the first mass flow sensor 8, and the first check valve 9 before entering the binary mixer 2. It also receives feedback from the first mass flow sensor 8 regarding the actual first gas source flow rate. Flow rate; the target flow rate range of the second gas source is calculated based on the target ratio concentration range of the second gas source, and the opening of the second gas flow regulating valve 20 is controlled based on the target flow rate range of the second gas source. After being filtered by the second filter 16 and depressurized by the second pressure reducer 18, the second gas source flows sequentially through the second solenoid valve 19, the second gas flow regulating valve 20, the second mass flow sensor 21, and the second check valve 22 before entering the binary mixer 2. The actual flow rate of the second gas source is received from the second mass flow sensor 21. The mixed helium-oxygen gas in the binary mixer 2 is temporarily stored in the binary buffer 28.

[0037] The lower-level machine 10 is used to receive the real-time oxygen concentration in the binary mixer 2 detected by the first oxygen analyzer 27. Based on the actual flow rate of the first gas source and the real-time oxygen concentration value, it adjusts the opening of the first gas flow regulating valve 7 in real time to adjust the real-time oxygen flow rate. When the real-time oxygen concentration value in the binary mixer 2 does not reach the corresponding target concentration range, it controls the main solenoid valve 30 to open and simultaneously controls the first exhaust solenoid valve 33 to open. The mixed gas temporarily stored in the binary buffer 28 is discharged through the first exhaust pipeline. When the real-time oxygen concentration value in the binary mixer 2 reaches the corresponding target concentration range, it controls the main solenoid valve 30 to open. The mixed gas temporarily stored in the binary buffer 28 is transported to the booster 31. The booster 31 increases the pressure of the mixed gas to the set pressure value (such as 20MPa) and then stores it in the gas storage tank 32.

[0038] In this embodiment, the booster 31 is a pneumatic compressor used for gas pressurization, providing the user terminal with the required pressure of mixed gas. The pneumatic compressor is small in size (weight) and meets the installation and usage requirements.

[0039] This technical solution employs a continuous flow gas mixing method. Continuous flow gas mixing involves pre-calibrating and controlling the flow rates of various gases to ensure that the various gas components in the mixture are continuously introduced into the mixing cylinder in a specific proportion. The design of the continuous flow gas mixing system guarantees the continuous and accurate preparation of the mixture. Before using the continuous flow gas mixing system, the precision flow control valves for each gas component (i.e., the first gas flow control valve 7 and the second gas flow control valve 20) should be adjusted to the same pressure and temperature.

[0040] The host computer is a touchscreen PC that monitors the system's operating status, displays changes in various process signals (such as pressure, oxygen concentration, and flow rate), and is responsible for issuing operational commands. It can also display various statuses (such as normal, alarm, and fault). The host computer monitors the gas mixing process in real time, records and displays data such as oxygen concentration, pressure, and flow rate, and handles anomalies, thus achieving an automated gas mixing process. The PLC primarily acts as the system's slave computer, acquiring system status information, directly controlling the system, collecting data from various sensors, and receiving and executing operational commands from the host computer.

[0041] In addition to preparing the binary mixed gas described above, the high-pressure multi-component mixed gas preparation system of this embodiment can also prepare the ternary mixed gas described below. In this embodiment, the third gas source is nitrogen.

[0042] The system also includes a third gas source control line, a three-way mixer, a second oxygen analyzer, and a three-way buffer.

[0043] The third gas source control pipeline includes: one end of the third gas source is connected to the third gas source pipe 37, and the other end of the third gas source pipe 37 is connected to the air inlet of the ternary mixer 38. The third gas source pipe 37 is sequentially equipped with a third filter 39, a third pressure sensor 40, a third pressure reducer 41, a third solenoid valve 42, a third gas flow regulating valve 43, a third mass flow sensor 44, and a third check valve 45. The third pressure sensor 40, the third solenoid valve 42, the third gas flow regulating valve 43, and the third mass flow sensor 44 are all electrically connected to the lower-level computer 10. This third gas source control pipeline is an automatic control pipeline for the third gas source, controlled and regulated by the lower-level computer 10.

[0044] A fifth manual shut-off valve 46 is installed on the third gas source pipeline 37, located between the third filter 39 and the third pressure sensor 40. The third gas flow regulating valve 43 is connected in parallel with the sixth manual shut-off valve 47 and the third manual needle valve 48, which are connected in series. A third pressure gauge 49 for displaying the pressure before depressurization is installed on the third gas source pipeline 37, located upstream of the third filter 39. The third solenoid valve 42 is a normally open solenoid valve (in the conducting state). Here, the third gas source control pipeline is a manual control pipeline for the third gas source.

[0045] The sampling port of the ternary mixer 38 is connected to the second oxygen analyzer 50 after being depressurized by the pressure reducer. The second oxygen analyzer 50 is electrically connected to the lower-level machine 10. The outlet of the binary buffer 28 is connected to the inlet of the ternary mixer 38 through the fourth check valve 51. The outlet of the ternary mixer 38 is connected to the inlet of the ternary buffer 52. The outlet of the ternary buffer 52 is connected to the booster 31 through the main solenoid valve 30.

[0046] The ternary buffer 52 is connected to a second exhaust pipe, on which a second exhaust solenoid valve 53 is installed. A second flow meter 54 is installed on the pipe between the ternary mixer 38 and the second oxygen analyzer 50. A ternary mixture pressure sensor 55 is installed on the ternary buffer 52. Both the second flow meter 54 and the ternary mixture pressure sensor 55 are electrically connected to the lower-level computer 10. In this embodiment, there is one second oxygen analyzer 50 and two ternary buffers 52. A second exhaust manual shut-off valve may also be installed on the second exhaust pipe for manual exhaust operation.

[0047] The system also includes a second back pressure valve 56. One port of the second back pressure valve 56 is connected to the pipeline of the ternary mixer 38, and the other port is connected to the pipeline of the third pressure reducer 41. The second back pressure valve 56 is used to track and feedback the air pressure in the ternary mixer 38 and adjust the air pressure in the third pressure reducer 41 so that the air pressure in the third pressure reducer 41 is greater than the air pressure in the ternary mixer 38.

[0048] The lower-level machine 10 receives the gas mixture preparation command and controls the first pressure sensor 4, the second pressure sensor 17, and the third pressure sensor 40 to operate. It receives the first pressure value from the first pressure sensor 4, the second pressure value from the second pressure sensor 17, and the third pressure value from the third pressure sensor 40. It determines whether the first, second, and third pressure values ​​are not zero. If the first pressure value is zero, it controls the issuance of a warning message indicating that the first gas source has not entered the first gas source pipeline. If the second pressure value is zero, it controls the issuance of a warning message indicating that the second gas source has not entered the second gas source pipeline. If the third pressure value is zero, it controls the issuance of a warning message indicating that the third gas source has entered the second gas source pipeline. Warning message indicating no entry into the third gas source pipeline; when the first, second, and third pressure values ​​are all non-zero, control the first solenoid valve 6, the second solenoid valve 19, and the third solenoid valve 42 to open; calculate the corresponding matching first gas source target flow range based on the first gas source target ratio concentration range; control the opening of the first gas flow regulating valve 7 based on the first gas source target flow range; after the first gas source is filtered by the first filter 1 and reduced in pressure by the first pressure reducer 5, it flows sequentially through the first solenoid valve 6, the first gas flow regulating valve 7, the first mass flow sensor 8, the first check valve 9, the binary mixer 2, the binary buffer 28, and the fourth check valve 51. The gas enters the ternary mixer 38 and receives the actual flow rate of the first gas source from the first mass flow sensor 8. Based on the target concentration range of the second gas source, a corresponding target flow rate range for the second gas source is calculated. The opening of the second gas flow regulating valve 20 is controlled based on this target flow rate range. The second gas source, after being filtered by the second filter 16 and reduced in pressure by the second pressure reducer 18, flows sequentially through the second solenoid valve 19, the second gas flow regulating valve 20, the second mass flow sensor 21, the second check valve 22, the binary mixer 2, the binary buffer 28, and the fourth check valve 51 before entering the ternary mixer 38 and receiving feedback from the second mass flow sensor 8. 21. Feedback on the actual flow rate of the second gas source; Calculate the corresponding target flow rate range of the third gas source based on the target ratio concentration range of the third gas source, and control the opening of the third gas flow regulating valve 43 based on the target flow rate range of the third gas source. After being filtered by the third filter 39 and depressurized by the third pressure reducer 41, the third gas source flows sequentially through the third solenoid valve 42, the third gas flow regulating valve 43, the third mass flow sensor 44, and the third check valve 45 before entering the ternary mixer 38. The actual flow rate of the third gas source is received from the third mass flow sensor 44. The mixed helium-oxygen-nitrogen gas in the ternary mixer 38 is temporarily stored in the ternary buffer 52.

[0049] The lower-level machine 10 is used to receive the real-time oxygen concentration in the ternary mixer 38 detected by the second oxygen analyzer 50. Based on the actual flow rate of the first gas source and the real-time oxygen concentration value, it adjusts the opening of the first gas flow regulating valve 7 in real time to adjust the real-time oxygen flow rate. When the real-time oxygen concentration value in the ternary mixer 38 does not reach the corresponding target concentration range, it controls the main solenoid valve 30 to open and simultaneously controls the second exhaust solenoid valve 53 to open. The mixed gas temporarily stored in the ternary buffer 52 is discharged through the second exhaust pipeline. When the real-time oxygen concentration value in the ternary mixer 38 reaches the corresponding target concentration range, it controls the main solenoid valve 30 to open. The mixed gas temporarily stored in the ternary buffer 52 is transported to the booster 31. The booster 31 increases the pressure of the mixed gas to the set pressure value (such as 20MPa) and then stores it in the gas storage tank 32.

[0050] This embodiment can prepare a predetermined high-pressure multi-element mixed gas during the saturation diving preparation stage, including various mixers to achieve full and uniform mixing of multi-element gases, and a buffer to stabilize the pressure at the input end of the booster.

[0051] While specific embodiments of the present invention have been described above, those skilled in the art should understand that these are merely illustrative examples, and the scope of protection of the present invention is defined by the appended claims. Those skilled in the art can make various changes or modifications to these embodiments without departing from the principles and essence of the present invention, but all such changes and modifications fall within the scope of protection of the present invention.

Claims

1. A high-pressure multi-element mixed gas preparation system, characterized in that, It includes a host computer, a slave computer, a first gas source control pipeline, a second gas source control pipeline, a binary mixer, a first oxygen analyzer, a binary buffer, a pressurization control pipeline, and a gas storage tank; The first gas source control pipeline includes: one end of the first gas source is connected to the first gas source pipeline, the other end of the first gas source pipeline is connected to the air inlet of the binary mixer, and the first gas source pipeline is sequentially provided with a first filter, a first pressure sensor, a first pressure reducer, a first solenoid valve, a first gas flow regulating valve, a first mass flow sensor and a first check valve, and the first pressure sensor, the first solenoid valve, the first gas flow regulating valve and the first mass flow sensor are all electrically connected to the lower-level electromechanical system; The second gas source control pipeline includes: one end of the second gas source is connected to the second gas source pipeline, and the other end of the second gas source pipeline is connected to the air inlet of the binary mixer. The second gas source pipeline is sequentially equipped with a second filter, a second pressure sensor, a second pressure reducer, a second solenoid valve, a second gas flow regulating valve, a second mass flow sensor, and a second check valve. The second pressure sensor, the second solenoid valve, the second gas flow regulating valve, and the second mass flow sensor are all connected to the lower-level electromechanical system. The sampling port of the binary mixer is connected to the pipeline of the first oxygen analyzer, the first oxygen analyzer is connected to the lower electromechanical unit, the outlet of the binary mixer is connected to the inlet pipeline of the binary buffer, the outlet of the binary buffer is connected to the booster control pipeline, the booster control pipeline is provided with a main solenoid valve and a booster in sequence, and the outlet of the booster is connected to the gas storage tank pipeline. The host computer is used to allow users to set the target concentration range of each gas source in the gas mixture, and sends a gas mixture preparation command containing the target concentration range of each gas source in the gas mixture to the slave computer. The slave computer, upon receiving the gas mixture preparation command, controls the operation of the first and second pressure sensors. It receives the first pressure value from the first pressure sensor and the second pressure value from the second pressure sensor, determines whether the first and second pressure values ​​are non-zero, and if the first pressure value is zero, controls the issuance of a warning message that the first gas source has not entered the first gas source pipeline; if the second pressure value is zero, controls the issuance of a warning message that the second gas source has not entered the second gas source pipeline; if both the first and second pressure values ​​are non-zero, it controls the opening of the first and second solenoid valves, and calculates the corresponding matching first gas source concentration range based on the target concentration range of the first gas source. A first gas source target flow range is defined. Based on this first gas source target flow range, the opening of the first gas flow regulating valve is controlled. The first gas source, after being filtered by the first filter and depressurized by the first pressure reducer, flows sequentially through the first solenoid valve, the first gas flow regulating valve, the first mass flow sensor, and the first check valve before entering the binary mixer. The actual flow rate of the first gas source is received from the first mass flow sensor. Based on the second gas source target ratio concentration range, a corresponding matching second gas source target flow range is calculated. Based on this second gas source target flow range, the opening of the second gas flow regulating valve is controlled. The second gas source, after being filtered by the second filter and depressurized by the second pressure reducer, flows sequentially through the second solenoid valve, the second gas flow regulating valve, the second mass flow sensor, and the second check valve before entering the binary mixer. The actual flow rate of the second gas source is received from the second mass flow sensor. The lower-level machine is used to receive the real-time oxygen concentration in the binary mixer detected by the first oxygen analyzer, and adjust the opening of the first gas flow regulating valve in real time based on the actual flow rate of the first gas source and the real-time oxygen concentration value to adjust the real-time oxygen flow rate. When the real-time oxygen concentration value in the binary mixer reaches the corresponding target concentration range, the main solenoid valve is controlled to open, and the mixed gas temporarily stored in the binary buffer is delivered to the booster. The booster increases the pressure of the mixed gas to the set pressure value and then stores it in the gas storage tank. The first gas source is oxygen, and the second gas source is helium or nitrogen.

2. The high-pressure multi-element mixed gas preparation system as described in claim 1, characterized in that, The binary buffer is connected to a first exhaust pipe, and a first exhaust solenoid valve is provided on the first exhaust pipe. The lower-level machine is used to control the main solenoid valve to open and the first exhaust solenoid valve to open when the real-time oxygen concentration value in the binary mixer does not reach the corresponding target concentration range. The mixed gas temporarily stored in the binary buffer is discharged through the first exhaust pipe.

3. The high-pressure multi-element mixed gas preparation system as described in claim 1, characterized in that, The system also includes a first back pressure valve, one port of which is connected to the binary mixer pipeline, the second port of which is connected to the first pressure reducer pipeline, and the third port of which is connected to the second pressure reducer pipeline. The first back pressure valve is used to track and provide feedback on the air pressure in the binary mixer, adjust the air pressure in the first pressure reducer so that the air pressure in the first pressure reducer is greater than the air pressure in the binary mixer, and adjust the air pressure in the second pressure reducer so that the air pressure in the second pressure reducer is greater than the air pressure in the binary mixer.

4. The high-pressure multi-element mixed gas preparation system as described in claim 1, characterized in that, A first manual shut-off valve is provided on the first gas source pipeline and located between the first filter and the first pressure sensor. The first gas flow regulating valve is connected in parallel with the second manual shut-off valve and the first manual needle valve connected in series. A first pressure gauge for displaying the pressure before pressure reduction is provided on the first gas source pipeline and located at the front end of the first filter. The first solenoid valve is a normally open solenoid valve. A third manual shut-off valve is installed on the second gas source pipeline and located between the second filter and the second pressure sensor. The second gas flow regulating valve is connected in parallel with the fourth manual shut-off valve and the second manual needle valve connected in series. A second pressure gauge for displaying the pressure before pressure reduction is installed on the second gas source pipeline and located at the front end of the second filter. The second solenoid valve is a normally open solenoid valve.

5. The high-pressure multi-element mixed gas preparation system as described in claim 1, characterized in that, A first flow meter is installed on the pipeline between the binary mixer and the first oxygen analyzer, and a binary mixed gas pressure sensor is installed on the binary buffer. Both the first flow meter and the binary mixed gas pressure sensor are electrically connected to the lower-level machine.

6. The high-pressure multi-element mixed gas preparation system as described in claim 1, characterized in that, When the second gas source is helium, the third gas source is nitrogen; or, when the second gas source is nitrogen, the third gas source is helium. The system also includes a third gas source control pipeline, a ternary mixer, a second oxygen analyzer, and a ternary buffer; The third gas source control pipeline includes: one end of the third gas source is connected to the third gas source pipeline, the other end of the third gas source pipeline is connected to the air inlet of the three-way mixer, and the third gas source pipeline is sequentially equipped with a third filter, a third pressure sensor, a third pressure reducer, a third solenoid valve, a third gas flow regulating valve, a third mass flow sensor and a third check valve. The third pressure sensor, the third solenoid valve, the third gas flow regulating valve and the third mass flow sensor are all connected to the lower-level electromechanical system. The sampling port of the ternary mixer is connected to the pipeline of the second oxygen analyzer, the second oxygen analyzer is connected to the lower electromechanical unit, the outlet of the binary buffer is connected to the inlet pipeline of the ternary mixer through the fourth check valve, the outlet of the ternary mixer is connected to the inlet pipeline of the ternary buffer, and the outlet of the ternary buffer is connected to the pipeline of the booster through the main solenoid valve. The lower-level machine receives the gas mixture preparation command and controls the operation of the first, second, and third pressure sensors. It receives the first pressure value from the first sensor, the second pressure value from the second sensor, and the third pressure value from the third sensor. It determines whether each of these pressure values ​​is non-zero. If the first pressure value is zero, it controls the issuance of a warning message indicating that the first gas source has not entered the first gas source pipeline; if the second pressure value is zero, it controls the issuance of a warning message indicating that the second gas source has not entered the second gas source pipeline; and if the third pressure value is zero, it controls the issuance of a warning message indicating that the third gas source has not entered the third gas source pipeline. When all three pressure values ​​are non-zero, it controls the opening of the first, second, and third solenoid valves. Based on the target concentration range of the first gas source, it calculates the corresponding target flow range of the first gas source and controls the opening of the first gas flow regulating valve based on this target flow range. The first gas source, after being filtered by the first filter and depressurized by the first pressure reducer, flows sequentially through the first solenoid valve, the first gas flow regulating valve, and the first mass flow sensor. After passing through the first check valve, binary mixer, binary buffer, and fourth check valve, the gas enters the ternary mixer and receives the actual flow rate of the first gas source from the first mass flow sensor. Based on the target concentration range of the second gas source, the corresponding matching target flow rate range of the second gas source is calculated. Based on the target flow rate range of the second gas source, the opening of the second gas flow regulating valve is controlled. After being filtered by the second filter and depressurized by the second pressure reducer, the second gas source flows sequentially through the second solenoid valve, the second gas flow regulating valve, the second mass flow sensor, the second check valve, the binary mixer, the binary buffer, and the fourth check valve before entering the ternary mixer and receiving the actual flow rate of the second gas source from the second mass flow sensor. Based on the target concentration range of the third gas source, the corresponding matching target flow rate range of the third gas source is calculated. Based on the target flow rate range of the third gas source, the opening of the third gas flow regulating valve is controlled. After being filtered by the third filter and depressurized by the third pressure reducer, the third gas source flows sequentially through the third solenoid valve, the third gas flow regulating valve, the third mass flow sensor, and the third check valve before entering the ternary mixer and receiving the actual flow rate of the third gas source from the third mass flow sensor. The lower-level machine is used to receive the real-time oxygen concentration in the ternary mixer detected by the second oxygen analyzer, and adjust the opening of the first gas flow regulating valve in real time based on the actual flow rate of the first gas source and the real-time oxygen concentration value to adjust the real-time oxygen flow rate. When the real-time oxygen concentration value in the ternary mixer reaches the corresponding target concentration range, it controls the main solenoid valve to open, and the mixed gas temporarily stored in the ternary buffer is delivered to the booster. The booster increases the pressure of the mixed gas to the set pressure value and then stores it in the gas storage tank.

7. The high-pressure multi-element mixed gas preparation system as described in claim 6, characterized in that, The ternary buffer is connected to a second exhaust pipe, and a second exhaust solenoid valve is provided on the second exhaust pipe. The lower-level machine is used to control the main solenoid valve to open and the second exhaust solenoid valve to open when the real-time oxygen concentration value in the ternary mixer does not reach the corresponding target concentration range. The mixed gas temporarily stored in the ternary buffer is discharged through the second exhaust pipe.

8. The high-pressure multi-element mixed gas preparation system as described in claim 6, characterized in that, The system also includes a second back pressure valve, one port of which is connected to the ternary mixer pipeline and the other port of which is connected to the third pressure reducer pipeline. The second back pressure valve is used to track and provide feedback on the air pressure in the ternary mixer and adjust the air pressure in the third pressure reducer so that the air pressure in the third pressure reducer is greater than the air pressure in the ternary mixer.

9. The high-pressure multi-element mixed gas preparation system as described in claim 6, characterized in that, A fifth manual shut-off valve is installed on the third gas source pipeline and located between the third filter and the third pressure sensor. The third gas flow regulating valve is connected in parallel with the sixth manual shut-off valve and the third manual needle valve, which are connected in series. A third pressure gauge for displaying the pressure before depressurization is installed on the third gas source pipeline and located at the front end of the third filter. The third solenoid valve is a normally open solenoid valve.

10. The high-pressure multi-element mixed gas preparation system as described in claim 6, characterized in that, A second flow meter is installed on the pipeline between the ternary mixer and the second oxygen analyzer, and a ternary mixed gas pressure sensor is installed on the ternary buffer. Both the second flow meter and the ternary mixed gas pressure sensor are electrically connected to the lower-level electromechanical unit.

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