Infrared coating device for outer cylindrical surface of large-size cylindrical sample piece and process method thereof

Abstract

The invention belongs to the field of film coating, and relates to an infrared film coating device for an outer cylindrical surface of a large-size cylindrical sample piece and a process method of the infrared film coating device. A vacuum cavity comprises a fan-shaped cavity body and a square cavity body, one end of the fan-shaped cavity body is closed, the other end of the fan-shaped cavity body is movably provided with a vacuum chamber door, a vacuumizing mechanism is communicated with the fan-shaped cavity body, a cylindrical workpiece frame is rotatably installed between the closed end of the fan-shaped cavity body and the vacuum chamber door, and the sample piece is arranged on the cylindrical workpiece frame in a sleeving mode. An evaporation source and a crystal control probe corresponding to the evaporation source are arranged on the inner wall of the square cavity in the length direction, a correction mechanism is arranged in the square cavity and comprises a pair of correction baffle frames which horizontally move in the length direction, and the correction baffle frames are located above the evaporation source. The invention further provides a process method of the infrared coating device for the outer cylindrical surface of the sample piece, and the evaporated film material can be uniformly deposited on the surface of the sample piece. According to the invention, the position of the sample entering the vacuum cavity is automatically and accurately controlled, and the evaporation source is monitored through the crystal control probe.

Description

Technical Field

[0001] The present invention belongs to the technical field of coating machines, and in particular relates to an infrared coating device for the outer cylindrical surface of a large-sized cylindrical sample and a process method thereof. Background Art

[0002] Vacuum evaporation equipment is a device used to deposit thin films on the surface of a workpiece. Through the method of vapor deposition, the film material is evaporated or sputtered in a high vacuum environment, and then deposited on the surface of the workpiece to form one or more layers of thin films. At present, infrared band optical thin film coating equipment is usually a box-type vertical front-opening structure, using a bottom evaporation source and a top tooling rack layout, and coating is achieved through linear vapor transmission. However, this structure has inherent defects when coating the outer surface of cylindrical samples: only a local area of the sample faces the evaporation source, resulting in insufficient film coverage and poor uniformity, which cannot meet the full outer surface coating requirements of large-sized cylindrical samples.

[0003] Patent CN 114086145 A discloses a vacuum coating machine comprising a vacuum furnace, a turret, a cart, and an evacuation mechanism. The vacuum furnace adopts a horizontal design, which is well suited for cylindrical samples. The turret includes a rotating portion and a sliding portion. The turret is slidably connected to the cart and is transported into the vacuum furnace by the cart. The rotating portion of the turret enables the sample to be rotated. However, the turret used for large-sized samples (≥2000mm) is heavy, making manual trolley insertion difficult and positioning accuracy uncertain. The single-sided evacuation mechanism design results in a gradient distribution of film material vapor within the vacuum furnace, resulting in a thin film layer near the evacuation port and severe accumulation at the distal end, making it impossible to ensure uniform coating on the surface of large-sized samples. The evaporation source configuration is not disclosed. In the prior art, the turret's bottom support structure occupies space in the vacuum furnace, limiting the number and spatial arrangement of evaporation sources, affecting the consistency of film thickness on the surface of large-sized samples, and failing to meet the requirements for coating the entire outer surface of large cylindrical samples. Summary of the Invention

[0004] To solve the above technical problems, the present invention aims to design an infrared coating device and process method for the outer surface of large cylindrical samples, which can accurately deliver the samples into a vacuum chamber, have a reasonable layout, and achieve uniform coating. The technical solutions adopted by the present invention are as follows: An infrared coating device for the outer cylindrical surface of a large-sized cylindrical sample comprises a vacuum cavity for accommodating the sample, wherein the vacuum cavity comprises an upper fan-shaped cavity and a lower square cavity welded into one body, the fan-shaped cavity is closed at one end and sealed at the other end, and a vacuum chamber door is movably installed, the vacuum pumping mechanism is connected to the fan-shaped cavity, a cylindrical workpiece rack is rotatably installed between the closed end of the fan-shaped cavity and the vacuum chamber door, the sample is set on the outer circumference of the cylindrical workpiece rack, an evaporation source and a crystal control probe corresponding to the evaporation source are arranged on the inner wall of the square cavity along the length direction, and a correction mechanism is arranged in the square cavity, the correction mechanism comprises a pair of correction baffle frames in the length direction that can be moved horizontally, and the correction baffle frames are located above the evaporation source.

[0005] Furthermore, the correction mechanism also includes support legs, a support frame and a connecting plate. Guide rails are arranged above the beams at both ends of the support frame that are parallel to the width of the square cavity, and sliders are slidably installed on the guide rails; at least one connecting block is fixedly arranged above the beams at both ends of the correction baffle frame, and the connecting block is fixedly connected to the slider; the upper end of each support leg is fixedly connected to the four corners of the support frame, and the lower end of the support leg is fixedly connected to the bottom surface of the square cavity. The two support legs located on the width of the support frame are a group, namely the first support leg and the second support leg. The second support leg is the active support leg, and the first support leg is the driven support leg. A second chain is arranged between the first support leg and the second support leg, and the lower end faces of the beams at both ends of the correction baffle frame are fixedly connected to the Z-shaped connecting plates, and the bottom of the connecting plates are fixedly connected to the second chains.

[0006] Furthermore, a first support frame is provided along the length direction on both sides of the outer surface of the fan-shaped cavity, and a group of exhaust holes are evenly opened along the length direction on the outer surface of the fan-shaped cavity above the first support frame. The vacuum mechanism is fixedly installed on the first support frame, and the upper port of the vacuum mechanism is sealed and connected to each exhaust port.

[0007] Furthermore, a group of second support frames with a triangular structure are respectively arranged along the length direction below the exhaust holes on the inner surfaces of both sides of the fan-shaped cavity, and a U-shaped support seat is fixedly arranged above the second support frame. The first roller is rotatably installed on the upper port of the U-shaped support seat, and the central axis of the first roller is perpendicular to the central axis of the fan-shaped cavity; a step surface is formed inside the connection between the fan-shaped cavity and the square cavity in the length direction, and a fixed support seat is arranged above the step surface, and fixed plates with obtuse angle structures are respectively arranged on the inner side walls of the square cavity lower than the step surfaces on both sides, and the adjacent ends of the fixed plates on both sides are inclined upward toward the center of the fan-shaped cavity, the upper part of the crystal control probe is fixedly connected to the fixed support seat, and the lower part of the crystal control probe passes through the inclined upward end part of the fixed plate.

[0008] Furthermore, the sample loading and unloading mechanism is located at one end of the opening of the fan-shaped cavity, and the sample loading and unloading mechanism includes a main support frame, a sample support frame and a driving mechanism. A pair of I-beam guide rails are fixedly arranged on the ground between the sample loading and unloading mechanism and the base below the vacuum cavity, and a pair of third chains connected to the base and the main support frame are arranged between the I-beam guide rails; the bottom of the main support frame is a trapezoidal structure, and at least one pair of third rollers are respectively arranged on the lower end surfaces of both sides of the main support frame, and the third rollers are in contact with the ground; a fixed support plate is arranged at the center position of the bottom of the main support frame, and the driving mechanism is placed on the fixed support plate; the fixed support plate is located on one side of the vacuum cavity and extends outward along the I-beam guide rail, and at least two pairs of second rollers are arranged on the lower end surface of the fixed support plate, and the second rollers are rollingly connected with the I-beam guide rail.

[0009] Furthermore, a second guide bracket is arranged at the upper end of the main support frame, and the second guide bracket is parallel to the first guide bracket above the vacuum chamber. Guide rods are respectively arranged on both sides above the second guide bracket, and the guide rods extend horizontally toward one side of the vacuum chamber and vertically pass through the guide wheel groups arranged above both sides of the first guide bracket; the main support frame is located on one side of the vacuum chamber and a vacuum chamber door is installed, and a sample support frame is arranged on the inner side of the vacuum chamber door.

[0010] Furthermore, the sample support frame includes an upper support plate, a lower support plate, a support rod, a connecting beam and a second bearing seat. The connecting beam is arranged between the upper support plate and the lower support plate. The upper support plate, the connecting beam and the lower support plate are fixedly connected. Support rods are fixedly arranged at both ends of the connecting beam and above the upper support plate. The other end of the support rod is fixedly connected to the inner plate of the vacuum chamber door. The height of the lowest point of the support rod at both ends of the connecting beam matches the highest point of the first roller on the second support frame on both sides of the vacuum chamber. A second bearing seat is arranged on the lower support plate, and the second bearing seat is coaxial with the first bearing seat opened in the center of the vacuum chamber door. A protrusion is arranged on the outside of the second bearing seat, and the position of the protrusion corresponds to the positioning hole reserved at the closed end of the fan-shaped cavity.

[0011] Furthermore, a second motor is fixedly arranged on the outside of the vacuum chamber door, a first bearing seat is arranged in the center of the vacuum chamber door, and a coupling is arranged on the outside of the vacuum chamber door at a position corresponding to the first bearing seat, and the coupling is connected to the second motor in a transmission manner; the cylindrical workpiece rack includes a connecting shaft, a main frame and an auxiliary frame, and auxiliary frames are respectively arranged at both ends of the connecting shaft, and one end of a plurality of auxiliary frames is evenly arranged along the circumference of the connecting shaft and fixedly connected to the connecting shaft, and the other end of the auxiliary frame is fixedly connected to the main frame through an adjustable connecting seat, and the main frame and the connecting shaft are parallel to each other, one end of the connecting shaft is rotatably installed in the first bearing seat, and after passing through the first bearing seat, it is connected to the coupling in a transmission manner, and the other end of the connecting shaft is rotatably installed in the second bearing seat, and the length of the auxiliary frame is smaller than the connecting shaft.

[0012] Furthermore, the evaporation source includes an electron beam evaporation source and a resistance evaporation source, the electron beam evaporation source and the resistance evaporation source are alternately arranged, and there is one less electron beam evaporation source than the resistance evaporation source.

[0013] The aforementioned process method for the infrared coating device for the outer surface of a large-sized cylindrical sample comprises the following steps: Step 1: Fix the large-sized cylindrical sample on the cylindrical workpiece holder; Step 2: Open the vacuum chamber door and control the cylindrical workpiece holder to exit the fan-shaped cavity; Step 3: Install the cylindrical workpiece holder containing the sample on the inner side of the vacuum chamber door; Step 4: Control the cylindrical workpiece holder containing the sample to move toward one side of the fan-shaped cavity; Step 5: When the vacuum chamber door is in place, the cylindrical workpiece holder containing the sample is rotated and installed between the closed end of the sector-shaped cavity and the vacuum chamber door; Step 6: Start the vacuum pumping mechanism to perform vacuum treatment on the vacuum chamber; Step 7. Start the evaporation source to evaporate the film material to form a gas phase. At the same time, control the horizontal movement of the correction baffle frame of the correction mechanism and control the cylindrical workpiece holder to drive the sample to rotate. The outer surface of the sample passes directly above the evaporation source and above the correction baffle frame at a uniform speed. The horizontally moving correction baffle frame breaks up the cloud of evaporated film material, so that the evaporated film material is evenly deposited on the surface of the sample.

[0014] Beneficial effects of the present invention: The present invention provides a vacuum cavity with an Ω-shaped cross-section, rationally arranges the installation position of the sample and the placement position of the evaporation source, automatically and accurately controls the position of the sample entering the vacuum cavity, precisely monitors the corresponding evaporation source through a crystal-controlled probe, and enables the evaporated film material to be evenly deposited on the surface of the sample through a correction mechanism. BRIEF DESCRIPTION OF THE DRAWINGS

[0015] Figure 1 Schematic diagram of the three-dimensional structure of the first embodiment of the present invention; Figure 2 Schematic diagram of the front view of the vacuum chamber according to the first embodiment of the present invention; Figure 3 for Figure 2 Cross-sectional view in the AA direction; Figure 4 Schematic diagram of a partial three-dimensional structure of a correction mechanism in a vacuum chamber according to the first embodiment of the present invention; Figure 5 for Figure 4 A partial enlarged view of point B in the middle; Figure 6 Schematic diagram of the three-dimensional structure of the sample loading and unloading mechanism equipped with a cylindrical workpiece holder according to the first embodiment; Figure 7 Schematic diagram of the three-dimensional structure of the sample loading and unloading mechanism of the first embodiment without the cylindrical workpiece holder; Figure 8 Schematic diagram of the three-dimensional structure of a cylindrical workpiece holder according to the first embodiment of the present invention; Figure 9 for Figure 8 A partial enlarged view of point C in the middle; Among them, 1. vacuum chamber, 2. fan-shaped chamber, 2-1. positioning hole, 2-2. exhaust hole, 3. square chamber, 3-1. observation window, 4. base, 5. vacuum mechanism, 6. first guide bracket, 7. guide wheel group, 8. first support frame, 9. second support frame, 9-1. U-shaped support seat, 9-2. first roller, 10. fixed support seat, 11. step surface, 12. fixed plate, 13. crystal control probe, 14. first motor, 15. support frame, 16. correction baffle frame, 17. first support leg, 18. guide rail, 19. connecting plate, 20. second support leg, 21. first chain, 22. gear group, 23. second chain, 24. connecting block, 25. slide Block, 26. Electron beam evaporation source, 27. Resistance evaporation source, 28. Sample loading and unloading mechanism, 29. I-beam track, 30. Third chain, 31. Vacuum chamber door, 31-1. First bearing seat, 31-2. Coupling, 31-3. Second motor, 32. Main support frame, 33. Fixed support plate, 33-1. Third motor, 34. Second roller, 35. Third roller, 36. Second guide bracket, 37. Guide rod, 38. Sample support frame, 39. Support rod, 40. Upper support plate, 41. Connecting beam, 42. Second bearing seat, 43. Lower support plate, 44. Cylindrical workpiece holder, 45. Connecting shaft, 46. Auxiliary skeleton, 47. Connecting seat, 48. Main skeleton. DETAILED DESCRIPTION

[0016] The technical solution of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, but not all of the embodiments. Example 1

[0017] If not otherwise specified, the present invention is Figure 2 The upper and lower directions of this embodiment are defined as shown; Figure 3 The left-right direction shown defines the two ends described in this embodiment, and the up-down direction defines the two sides described in this embodiment.

[0018] like Figure 1-9As shown, the first embodiment of this invention shows an infrared coating apparatus for the outer surface of a large cylindrical sample, comprising a vacuum chamber 1 and a sample loading and unloading mechanism 28. The vacuum chamber 1 is a horizontal, side-opening structure consisting of two parts: a fan-shaped chamber 2 with one end open and the other sealed, and a square chamber 3 without an upper surface. The fan-shaped chamber 2 is mounted above the square chamber 3 and connected to the upper opening of the square chamber 3. The fan-shaped chamber 2 is fixed by argon arc welding, has an internal length ranging from 3800mm to 4200mm, and is made of 304 stainless steel with a thickness of 5mm to 10mm. An inverted T-shaped base 4 is provided at the bottom of the vacuum chamber 1 to firmly support the vacuum chamber 1, forming a structure with an "Ω" cross-section.

[0019] The central angle of the fan-shaped cavity 2 is 300°, and the internal radius is between 2400mm and 2800mm to adapt to the diameter of large-sized cylindrical samples; a first guide frame and a guide wheel group 7 are provided on the upper outer edge of the open end of the fan-shaped cavity 2, and a first support frame 8 is provided on both sides of the outer surface of the fan-shaped cavity 2 along the length direction to support the vacuum mechanism 5, and a group of exhaust holes 2-2 are evenly opened along the length direction on the outer surface of the fan-shaped cavity 2 above the first support frame 8 for connecting the exhaust ports of the vacuum mechanism 5. The vacuum mechanism 5 is evenly distributed on both sides of the fan-shaped cavity 2, and the length of a group of exhaust holes 2-2 adapts to the length of the large-sized cylindrical sample to prevent the film material vapor from forming a gradient distribution in the vacuum cavity 1, thereby ensuring the uniformity of the coating on the surface of the large-sized sample.

[0020] A group of second support frames 9 with a triangular structure are respectively arranged along the length direction below the exhaust holes 2-2 on the inner surfaces of both sides of the fan-shaped cavity 2. A U-shaped support seat 9-1 is fixedly arranged above each second support frame 9. The upper port of the U-shaped support seat 9-1 is rotatably mounted with a first roller 9-2, and the central axis of the first roller 9-2 is perpendicular to the central axis of the fan-shaped cavity 2. A step surface 11 is formed inside the connection between the fan-shaped cavity 2 and the square cavity 3 in the length direction, and a fixed support seat 10 is provided above the step surface 11 to support the crystal control probe 13. Fixed plates 12 with obtuse angle structures are respectively provided on the inner side walls of the square cavity 3 below the step surfaces 11 on both sides. The adjacent ends of the fixed plates 12 on both sides are tilted upward toward the center of the fan-shaped cavity 2. The upper part of the crystal control probe 13 is fixedly connected to the fixed support seat 10, and the lower part of the crystal control probe 13 passes through the tilted upward end of the fixed plate 12. The adjacent ends of the fixed plates 12 on both sides cooperate with the fixed support seat 10 to tilt and fix the crystal control probe 13 inward and downward. The tilt angle of the crystal control probe 13 does not affect the movement space of the sample in the cavity.

[0021] The square cavity 3 is located below the fan-shaped cavity 2 and is fixedly connected to the fan-shaped cavity 2 by welding. The square cavity 3 communicates with the interior of the fan-shaped cavity 2. The interior height of the square cavity 3 is between 700mm and 800mm. Multiple observation windows 3-1 are provided on the longitudinal sidewalls of the square cavity 3. Evaporation sources are arranged along the length of the bottom surface of the square cavity 3. The evaporation sources include electron beam evaporation sources 26 and resistance evaporation sources 27. For the coating of multi-layer film materials, the two evaporation sources are used in combination to ensure better coating effects. The electron beam evaporation sources 26 and resistance evaporation sources 27 are arranged alternately. Depending on the length of the large-scale sample, the total number of evaporation sources in the square cavity 3 is 7 or 9, with one electron beam evaporation source 26 less than the resistance evaporation source 27. The evaporation point of each evaporation source is located at the center of the width of the square cavity 3 and is between 350mm and 450mm away from the longitudinal edge of the square cavity 3. The number of the crystal-controlled probes 13 corresponds to the total number of evaporation sources. Similar to the alternating arrangement of the evaporation sources, the crystal-controlled probes 13 are also alternately arranged on both sides of the vacuum chamber 1, and each crystal-controlled probe 13 faces an evaporation source, and the crystal-controlled probe 13 precisely monitors the corresponding evaporation source.

[0022] The square chamber 3 of the first embodiment is provided with a correction mechanism, which includes support legs, a support frame 15, a correction baffle frame 16, and a connecting plate 19. The support frame 15 is adapted to the internal space of the square chamber 3 and is supported above each evaporation source and below the crystal control probe 13 by the support legs. Guide rails 18 are provided above the crossbeams at both ends of the support frame 15, which are parallel to the width of the square chamber 3. Slide blocks 25 are slidably mounted on the guide rails 18. The correction baffle frame 16 is provided within the support frame 15, and the crossbeams at both ends are less than half of the crossbeams at both ends of the support frame 15. At least one connecting block 24 is fixedly provided above the crossbeams at both ends of the correction baffle frame 16. Each connecting block 24 extends toward the outer crossbeams at both ends of the support frame 15. The connecting block 24 extends above the slide block 25 and is fixedly connected to the slide block 25 by bolts, thereby achieving a sliding connection between the two ends of the correction baffle frame 16 and the two ends of the support frame 15.

[0023] The upper end of each support leg of the correction mechanism is fixedly connected to the four corners of the support frame 15, and the lower end of the support leg is fixedly connected to the inner bottom surface of the square cavity 3. The two support legs located on the width of the support frame 15 are a group, namely the first support leg 17 and the second support leg 20; the second support leg 20 is an active support leg, which adopts a double-layer structure, and the outer layer is rotatably connected to the inner layer through a bearing. Fixedly connected gears are provided at the upper and lower ends of the outer layer of the second support leg 20. A first motor 14 is fixedly provided on the outer end surface of the bottom of the square cavity 3. The main shaft of the first motor 14 passes through the bottom end surface of the square cavity 3 and is connected to the gear at the lower end of the outer layer of the second support leg 20 through the gear set 22 and the first chain 21; the first support leg 17 is a driven support leg, and a gear is provided at the upper end of the first support leg 17. The gear is rotatably connected to the first support leg 17 through a bearing. The gear at the upper end of the second support leg 20 corresponds to the position of the gear at the upper end of the first support leg 17 and is connected through a second chain 23.

[0024] The lower end surfaces of the cross beams at both ends of the correction baffle frame 16 are fixedly connected with "Z"-shaped connecting plates 19, and the lower parts of each connecting plate 19 are fixedly connected to the second chain 23 between the gears at the upper ends of each group of support legs at both ends. Driven by the first motor 14, the second chain 23 drives the connecting plate 19, so that the correction baffle frame 16 moves back and forth along the cross beams at both ends of the support frame 15, which can break up the cloud of film material evaporated by the evaporation sources below, so that the film material evaporated by the evaporation source can be better dispersed and evenly deposited on the outer surface of the cylindrical sample to complete the coating.

[0025] The sample loading and unloading mechanism 28 of the first embodiment is located at one end of the opening of the vacuum chamber 1 (i.e., the fan-shaped chamber 2). The sample loading and unloading mechanism 28 includes a main support frame 32, a sample support frame 38, a vacuum chamber door 31 and a driving mechanism. A pair of I-beam guide rails are fixedly arranged on the ground between the sample loading and unloading mechanism 28 and the base 4 below the vacuum chamber 1, and a pair of third chains 30 connected to the base 4 below the vacuum chamber 1 and the main support frame 32 of the sample loading and unloading mechanism 28 are arranged between the I-beam guide rails. The bottom of the main support frame 32 is a trapezoidal structure, and at least one pair of third rollers 35 are respectively provided on the lower end surfaces on both sides of the main support frame 32, and the third rollers 35 are in contact with the ground; a fixed support plate 33 is provided at the center position of the bottom of the main support frame 32, and the fixed support plate 33 is used to place and support the driving mechanism, and the driving mechanism includes a third motor 33-1. Through the cooperation of the motor gear set of the third motor 33-1 and the third chain 30, the sample loading and unloading structure moves along the I-beam guide rail. The driving mechanism can also be implemented by other existing linear drive structures, which will not be repeated here; the fixed support plate 33 at the bottom of the main support frame 32 is located on one side of the vacuum chamber 1 and extends outward along the I-beam guide rail to increase the bottom support area of the fixed support plate 33, and the lower end surface of the fixed support plate 33 is provided with at least two pairs of second rollers 34, and the second rollers 34 are rollingly connected with the I-beam guide rail.

[0026] A second guide bracket 36 is provided at the upper end of the main support frame 32. The second guide bracket 36 is parallel to the first guide bracket 6 above the vacuum chamber 1. Guide rods 37 are provided on both sides of the second guide bracket 36. The guide rods 37 extend horizontally toward one side of the vacuum chamber 1 and vertically pass through the guide wheel groups 7 provided above both sides of the first guide bracket 6. A vacuum chamber door 31 is provided on one side of the main support frame 32 located at the vacuum chamber 1. The vacuum chamber door 31 is circular, and the diameter of the vacuum chamber door 31 is twice the radius of the fan-shaped chamber 2. The inner side of the vacuum chamber door 31 faces the vacuum chamber 1 and is provided with a sample support bracket 38. A second motor 31-3 is fixedly provided on the outer side of the vacuum chamber door 31. A first bearing seat 31-1 is provided at the center of the vacuum chamber door 31. A coupling 31-2 is provided on the outer side of the vacuum chamber door 31 at a position corresponding to the first bearing seat 31-1. The coupling 31-2 is in transmission connection with the second motor 31-3.

[0027] In the first embodiment of the present invention, the sample support frame 38 is located between the vacuum chamber 1 and the vacuum chamber door 31. The sample support frame 38 is fixed to the inner plate of the vacuum chamber door 31 by bolts. The sample support frame 38 is used to support the cylindrical workpiece frame 44. The sample support frame 38 is composed of an upper support plate 40, a lower support plate 43, a support rod 39, a connecting beam 41 and a second bearing seat 42. The connecting beam 41 is set between the upper support plate 40 and the lower support plate 43. The upper support plate 40, the connecting beam 41 and the lower support plate 43 are fixedly connected by bolts. Support rods 39 are fixedly provided at both ends of the connecting beam 41 and above the upper support plate 40 by bolts. The three support rods 39 are arranged in a triangle. The other end of each support rod 39 is fixedly connected to the inner plate of the vacuum chamber door 31 by bolts and other connecting components. The lowest point height of the support rods 39 at both ends of the connecting beam 41 matches the highest point of the first roller 9-2 on the second support frame 9 on both sides of the vacuum chamber 1. The first roller 9-2 plays a supporting and guiding role for the sample support frame 38 as a whole, so that the sample support frame 38 can drive the cylindrical workpiece frame 44 containing the sample to smoothly enter the vacuum chamber 1 and play a supporting role; the matching height of the upper support plate 40 and the support rod 39 is greater than the sample radius and smaller than the radius of the fan-shaped chamber 2, and a second bearing seat 42 is provided on the lower support plate 43. The second bearing seat 42 is coaxial with the first bearing seat 31-1 opened at the center of the vacuum chamber door 31, and a protrusion is provided on the outer side of the second bearing seat 42. The position of the protrusion corresponds to the positioning hole 2-1 reserved at the closed end of the fan-shaped cavity 2.

[0028] The cylindrical workpiece frame 44 includes a connecting shaft 45, a main skeleton 48, and an auxiliary skeleton 46. The auxiliary skeletons 46 are respectively provided at both ends of the connecting shaft 45. One end of a plurality of auxiliary skeletons 46 is evenly arranged along the circumference of the connecting shaft 45 and fixedly connected to the connecting shaft 45. The other end of the auxiliary skeleton 46 is fixedly connected to the main skeleton 48 via an adjustable connecting seat 47. The main skeleton 48 and the connecting shaft 45 are parallel to each other. The plurality of main skeletons 48 form a cylindrical frame. The connection between the main skeleton 48 and the auxiliary skeleton 46 can be adjusted by the connecting seat 47, thereby changing the diameter of the cylindrical frame to accommodate the different inner diameters of large-sized cylindrical samples. One end of the connecting shaft 45 is rotatably mounted in the first bearing seat 31-1, and after passing through the first bearing seat 31-1, it is transmission-connected to the coupling 31-2. The other end of the connecting shaft 45 is rotatably mounted in the second bearing seat 42. The length of the auxiliary skeleton 46 is shorter than the connecting shaft 45 , and both ends of the auxiliary skeleton 46 do not contact the vacuum chamber door 31 and the closed end of the fan-shaped cavity 2 , ensuring that the cylindrical workpiece holder 44 rotates smoothly in the fan-shaped cavity 2 .

[0029] The vacuum chamber door 31 and the vacuum cavity 1 are sealed with an O-shaped rubber ring, and the vacuum chamber door 31 and the vacuum cavity 1 are fixed by a cylinder pressing method, which is a prior art and will not be described in detail here.

[0030] The vacuum chamber 1 of the present invention is formed by welding a fan-shaped chamber 2 with an open end at the top and a square chamber 3 without an upper surface at the bottom. It is suitable for large-sized cylindrical samples, so that the internal components can be reasonably arranged and the samples can be evenly coated along the length direction of the cylindrical samples.

[0031] The sample is mounted on a cylindrical workpiece rack 44, which is then mounted on a sample support rack 38 of a sample loading and unloading mechanism 28. The sample loading and unloading mechanism 28 is driven by a motor to deliver the sample accurately into the vacuum chamber 1 under the action of the guide rail 18 and the guide rod 37.

[0032] A correction mechanism is provided in the square cavity 3 below the vacuum cavity 1, which can break up the cloud of film material evaporated by the evaporation source provided below the square cavity 3, so that the film material evaporated by the evaporation source can be better dispersed and evenly adhered to the outer surface of the cylindrical sample to complete the coating.

[0033] Furthermore, the cylindrical workpiece rack 44 is installed between the lower support plate 43 of the sample support rack 38 and the vacuum chamber door 31. The end connected to the vacuum chamber door 31 passes through the vacuum chamber door 31 and is connected to the second motor 31-3 arranged on the outside of the vacuum chamber door 31 through the coupling 31-2. During the coating process, the second motor 31-3 drives the cylindrical workpiece rack 44 to rotate, so that the sample can rotate axially with the cylindrical workpiece rack 44. Through rotation, the outer surface of the cylindrical sample passes at a uniform speed directly above the evaporation source, and the outer cylindrical surface of the entire cylindrical sample can be coated as a whole, and the uniformity of the overall coating can be guaranteed. Example 2

[0034] The process method of the infrared coating device for the outer cylindrical surface of a large-sized cylindrical sample according to the first embodiment of the present invention includes the following steps: Step 1: First, place the large-sized cylindrical sample on the cylindrical workpiece holder 44. By adjusting the connecting seat 47, the main frame 48 is extended and retracted relative to the auxiliary frame 46 to tightly support the sample without relative rotation.

[0035] Step 2: Start the clamping cylinder to open the vacuum chamber door 31, and control the third motor 33-1 to make the sample loading and unloading mechanism 28 drive the vacuum chamber door 31 and the sample support frame 38 to exit the fan-shaped cavity 2 along the I-beam track 29 and the guide rod 37 and the guide wheel group 7 (the maximum movement distance of the sample loading and unloading mechanism 28 is between 1-2 times the length of the fan-shaped cavity 2, leaving enough space for sample loading and unloading, and the length of the guide rod 37 is adapted to the maximum movement distance of the sample loading and unloading mechanism 28 without separating from the guide wheel group 7).

[0036] Step 3. After the sample loading and unloading mechanism 28 moves to the appropriate position along the guide rail 18, one end of the connecting shaft 45 of the cylindrical workpiece holder 44 containing the sample is installed in the first bearing seat 31-1 in the center of the vacuum chamber door 31, and the other end is installed in the second bearing seat 42 of the support plate 43 under the sample support frame 38, so that the sample is parallel to the horizontal plane.

[0037] Step 4, start the third motor 33-1 to make the sample loading and unloading mechanism 28 drive the vacuum chamber door 31 and the sample support frame 38 supporting the cylindrical workpiece frame 44 to move toward the side of the fan-shaped cavity 2 along the I-beam track 29, the guide rod 37 and the guide wheel group 7; during the movement, the support rods 39 at both ends of the connecting beam 41 of the sample support frame 38 are supported and guided by the first rollers 9-2 on the second support frames 9 on both sides of the fan-shaped cavity 2 (and under electric drive, the sample enters the vacuum cavity 1 to realize simple operation and ensure the positioning accuracy of the sample).

[0038] Step 5. When the vacuum chamber door 31 is in place, the door lock in place signal is triggered, the pressing cylinder is started, and the vacuum chamber door 31 is pressed; at this time, the sample completely enters the fan-shaped cavity 2, and the protrusion of the second shaft support seat 42 on the lower support plate 43 of the sample support frame 38 is docked with the positioning hole 2-1 at the relative position of the closed end of the fan-shaped cavity 2, realizing the positioning support of the cylindrical workpiece frame 44 and the sample.

[0039] Step 6: After the vacuum chamber door 31 is closed, the vacuum pumping mechanism 5 is started to perform vacuum pumping on the vacuum chamber 1 .

[0040] Step 7. After reaching high vacuum, start the evaporation source to evaporate the film material and form a gas phase. At the same time, start the first motor 14 to activate the correction mechanism and the second motor 31-3 to enable the cylindrical workpiece holder 44 to drive the cylindrical sample to rotate (the speed is between 5 and 50 / min). The outer surface of the cylindrical sample passes directly above the evaporation source at a uniform speed, and the cloud of evaporated film material is broken up by the correction mechanism, so that the film material evaporated from the evaporation source is more evenly deposited on the surface of the sample.

[0041] Step 8: The outer surface of the entire cylindrical sample is precisely monitored by the crystal-controlled probe 13 until the coating is completed.

[0042] In the embodiments of the present invention, technical features not described in detail are all existing technologies or conventional technical means and will not be described in detail here.

[0043] Finally, it should be noted that the above embodiments are only specific implementation methods of the present invention, which are used to illustrate the technical solutions of the present invention, rather than to limit them, and the protection scope of the present invention is not limited thereto. Those skilled in the art should understand that any person skilled in the art who is familiar with the technical field can modify or easily think of changes to the technical solutions described in the above embodiments within the technical scope disclosed by the present invention, or make equivalent replacements for some of the technical features therein; and these modifications, changes or replacements do not deviate the essence of the corresponding technical solutions from the spirit and scope of the technical solutions of the embodiments of the present invention, and should all be included in the protection scope of the present invention.

Claims

1. An infrared coating device for the outer surface of a large cylindrical sample, comprising a vacuum chamber (1) for accommodating the sample, characterized in that: The vacuum chamber (1) comprises an upper fan-shaped chamber (2) and a lower square chamber (3) which are welded together. One end of the fan-shaped chamber (2) is closed and the other end is sealed and a vacuum chamber door (31) is movably installed. The vacuum pumping mechanism (5) is connected to the fan-shaped chamber (2). A cylindrical workpiece rack (44) is rotatably installed between the closed end of the fan-shaped chamber (2) and the vacuum chamber door (31). The sample is set on the outer periphery of the cylindrical workpiece rack (44). An evaporation source and a crystal control probe (13) corresponding to the evaporation source are arranged on the inner wall of the square chamber (3) along the length direction. A correction mechanism is arranged in the square chamber (3). The correction mechanism comprises a pair of correction baffle frames (16) that can move horizontally in the length direction. The correction baffle frames (16) are located above the evaporation source.

2. The infrared coating device for the outer surface of a large cylindrical sample according to claim 1, characterized in that: The correction mechanism further comprises a support leg, a support frame (15) and a connecting plate (19); guide rails (18) are provided above the beams at both ends of the support frame (15) and parallel to the width direction of the square cavity (3); a slider (25) is slidably mounted on the guide rails (18); at least one connecting block (24) is fixedly provided above the beams at both ends of the correction baffle frame (16); the connecting block (24) is fixedly connected to the slider (25); the upper end of each support leg is fixedly connected to the four corners of the support frame (15), and the lower end of the support leg is fixedly connected to the square cavity (3); ) is fixedly connected to the inner bottom surface, and the two support legs located on the width of the support frame (15) form a group, namely the first support leg (17) and the second support leg (20), the second support leg (20) is the active support leg, and the first support leg (17) is the driven support leg. A second chain (23) is set between the first support leg (17) and the second support leg (20), and the lower end surfaces of the cross beams at both ends of the correction baffle frame (16) are respectively fixedly connected to the Z-shaped connecting plate (19), and the lower part of the connecting plate (19) is respectively fixedly connected to the second chain (23).

3. The infrared coating device for the outer surface of a large cylindrical sample according to claim 1, characterized in that: A first support frame (8) is provided on both sides of the outer surface of the sector-shaped cavity (2) along the length direction, and a group of air extraction holes (2-2) are evenly opened along the length direction on the outer surface of the sector-shaped cavity (2) above the first support frame (8). The vacuum extraction mechanism (5) is fixedly mounted on the first support frame (8), and the upper port of the vacuum extraction mechanism (5) is sealed and connected to each air extraction port (2-2).

4. The infrared coating device for the outer surface of a large cylindrical sample according to claim 3, characterized in that: A group of second support frames (9) with a triangular structure are respectively arranged below the air extraction holes (2-2) on the inner surfaces of both sides of the fan-shaped cavity (2) along the length direction, and a U-shaped support seat (9-1) is fixedly arranged above the second support frame (9), and a first roller (9-2) is rotatably installed on the upper end of the U-shaped support seat (9-1), and the central axis of the first roller (9-2) is perpendicular to the central axis of the fan-shaped cavity (2); a step surface (11) is formed inside the connection between the fan-shaped cavity (2) and the square cavity (3) in the length direction, and a fixed support seat (10) is arranged above the step surface (11), and fixed plates (12) with obtuse angle structures are respectively arranged on the inner side walls of the square cavity (3) below the step surfaces (11) on both sides, and the adjacent ends of the fixed plates (12) on both sides are inclined upward toward the center of the fan-shaped cavity (2), the upper part of the crystal control probe (13) is fixedly connected to the fixed support seat (10), and the lower part of the crystal control probe (13) passes through the inclined upward end of the fixed plate (12).

5. The infrared coating device for the outer surface of a large cylindrical sample according to claim 1, characterized in that: The sample loading and unloading mechanism (28) is located at one end of the opening of the fan-shaped cavity (2). The sample loading and unloading mechanism (28) includes a main support frame (32), a sample support frame (38) and a driving mechanism. A pair of I-shaped steel guide rails are fixedly arranged on the ground between the sample loading and unloading mechanism (28) and the base (4) below the vacuum cavity (1), and a pair of third chains (30) connected to the base (4) and the main support frame (32) are arranged between the I-shaped steel guide rails. The bottom of the main support frame (32) is a trapezoidal structure. At least one pair of third rollers (35) are respectively provided on the lower end surfaces of both sides of the support frame (32), and the third rollers (35) are in contact with the ground; a fixed support plate (33) is provided at the center position of the bottom of the main support frame (32), and a driving mechanism is placed on the fixed support plate (33); the fixed support plate (33) is located on one side of the vacuum chamber (1) and extends outward along the I-shaped steel guide rail, and at least two pairs of second rollers (34) are provided on the lower end surface of the fixed support plate (33), and the second rollers (34) are rollingly connected with the I-shaped steel guide rail.

6. The infrared coating device for the outer surface of a large cylindrical sample according to claim 5, characterized in that: A second guide bracket (36) is provided at the upper end of the main support frame (32), and the second guide bracket (36) is parallel to the first guide bracket (6) above the vacuum chamber (1). Guide rods (37) are provided on both sides above the second guide bracket (36), and the guide rods (37) extend horizontally toward one side of the vacuum chamber (1) and vertically pass through the guide wheel groups (7) provided above both sides of the first guide bracket (6); the main support frame (32) is located on one side of the vacuum chamber (1), and a vacuum chamber door (31) is installed, and a sample support frame (38) is provided on the inner side of the vacuum chamber door (31).

7. The infrared coating device for the outer surface of a large cylindrical sample according to claim 6, characterized in that: The sample support frame (38) includes an upper support plate (40), a lower support plate (43), a support rod (39), a connecting beam (41) and a second bearing seat (42). The connecting beam (41) is arranged between the upper support plate (40) and the lower support plate (43). The upper support plate (40), the connecting beam (41) and the lower support plate (43) are fixedly connected. Support rods (39) are fixedly arranged at both ends of the connecting beam (41) and above the upper support plate (40). The other end of the support rod (39) is connected to the inner side of the vacuum chamber door (31). The plates are fixedly connected, the lowest point height of the support rods (39) connecting the two ends of the cross beam (41) matches the highest point of the first roller (9-2) on the second support frames (9) on both sides of the vacuum chamber (1), and a second bearing seat (42) is provided on the lower support plate (43). The second bearing seat (42) is coaxial with the first bearing seat (31-1) opened at the center of the vacuum chamber door (31). A protrusion is provided on the outer side of the second bearing seat (42), and the position of the protrusion corresponds to the positioning hole (2-1) reserved at the closed end of the fan-shaped cavity (2).

8. The infrared coating device for the outer surface of a large cylindrical sample according to claim 7, characterized in that: A second motor (31-3) is fixedly arranged on the outer side of the vacuum chamber door (31), a first bearing seat (31-1) is arranged at the center of the vacuum chamber door (31), a coupling (31-2) is arranged on the outer side of the vacuum chamber door (31) at a position corresponding to the first bearing seat (31-1), and the coupling (31-2) is transmission-connected to the second motor (31-3); the cylindrical workpiece frame (44) comprises a connecting shaft (45), a main frame (48) and an auxiliary frame (46), and auxiliary frames (46) are respectively arranged at both ends of the connecting shaft (45), and a plurality of auxiliary frames (46) are connected together. The ends of the auxiliary skeleton (46) are evenly arranged along the circumference of the connecting shaft (45) and are fixedly connected to the connecting shaft (45). The other end of the auxiliary skeleton (46) is fixedly connected to the main skeleton (48) through an adjustable connecting seat (47). The main skeleton (48) and the connecting shaft (45) are parallel to each other. One end of the connecting shaft (45) is rotatably installed in the first bearing seat (31-1) and is transmission-connected to the coupling (31-2) after passing through the first bearing seat (31-1). The other end of the connecting shaft (45) is rotatably installed in the second bearing seat (42). The length of the auxiliary skeleton (46) is smaller than that of the connecting shaft (45).

9. The infrared coating device for the outer surface of a large cylindrical sample according to claim 1, characterized in that: The evaporation source comprises an electron beam evaporation source (26) and a resistance evaporation source (27). The electron beam evaporation source (26) and the resistance evaporation source (27) are alternately arranged, and the number of the electron beam evaporation source (26) is less than that of the resistance evaporation source (27).

10. The process method of the infrared coating device for the outer surface of a large cylindrical sample according to claim 1, characterized in that: The following steps are involved: Step 1: Fixing a large-sized cylindrical sample on a cylindrical workpiece holder (44); Step 2: Open the vacuum chamber door (31) and control the cylindrical workpiece holder (44) to exit the fan-shaped cavity (2); Step 3: Install the cylindrical workpiece holder (44) containing the sample on the inner side of the vacuum chamber door (31); Step 4: Control the cylindrical workpiece holder (44) containing the sample to move toward one side of the fan-shaped cavity (2); Step 5: When the vacuum chamber door (31) is in place, the cylindrical workpiece holder (44) containing the sample is rotatably installed between the closed end of the sector-shaped cavity (2) and the vacuum chamber door (31); Step 6: Start the vacuum pumping mechanism (5) to perform vacuum pumping on the vacuum chamber (1); Step 7: Start the evaporation source to evaporate the film material to form a gas phase. At the same time, control the horizontal movement of the correction baffle frame (16) of the correction mechanism and control the cylindrical workpiece holder (44) to drive the sample to rotate. The outer surface of the sample passes directly above the evaporation source and above the correction baffle frame (16) at a uniform speed. The horizontally moving correction baffle frame (16) breaks up the cloud of evaporated film material, so that the evaporated film material is evenly deposited on the surface of the sample.

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