Harmless treatment device and process for lpcvd tail gas

Abstract

The invention discloses a harmless treatment device and process for lpcvd tail gas, the harmless treatment device comprises a treatment tower, the top and the right side of the surface of the treatment tower are respectively provided with a gas inlet pipe and a gas outlet pipe, the treatment tower is internally provided with a decomposition chamber, a cooling chamber and an adsorption chamber in sequence from top to bottom, the decomposition chamber is internally provided with a gas decomposition assembly, and the cooling chamber is internally provided with a cooling assembly. A gas adsorption assembly is arranged in the adsorption cavity; the gas decomposition assembly comprises a catalysis cylinder, and the surface of the gas inlet pipe communicates with a plurality of gas flow guide pipes at equal intervals in the circumferential direction. According to the harmless treatment device and process for the lpcvd tail gas, toxic gas is decomposed through a noble metal catalyst in the catalysis chamber, rapid cooling is achieved through the cooling cylinder and the cooling liquid circulating pipe, residues are purified through multiple layers of adsorbents in the adsorption cylinder, then toxic components in the tail gas can be efficiently decomposed, and the gas can be rapidly cooled and deeply purified; and the tail gas treatment capacity and efficiency of the device are improved.

Description

Technical Field

[0001] The present invention relates to the technical field of tail gas treatment, in particular to a device and process for harmless treatment of LPCVD tail gas. Background Art

[0002] With the continuous development of semiconductor manufacturing technology, low-pressure chemical vapor deposition (LPCVD) technology has been widely used in the field of thin film preparation. However, the exhaust gas generated during the LPCVD process contains a variety of harmful substances, such as unreacted precursors, by-products, and particulate matter. If it is directly discharged without effective treatment, it will cause serious harm to the environment and human health.

[0003] Reference patent publication number "CN113499679B" discloses an exhaust gas treatment device, which includes at least one choke tank, a side wall of which is connected to an air inlet pipe, a heater assembly and a cooling assembly are provided in the lower part of the tank body of the choke tank, a heating wire extends from the heater assembly inside the tank body, and a plurality of choke strips are provided on the heating wire, and a cooling pipe extends from the cooling assembly into the tank body, and a plurality of choke strips are provided on the cooling pipe.

[0004] As shown in the above technology, there is a lack of targeted treatment methods for toxic gases that may exist in LPCVD exhaust, such as unreacted silane or ammonia, and there are certain limitations in achieving comprehensive harmless treatment. In addition, the existing device contains multiple functional components, the structural design is relatively complex, the maintenance cost is high, and the treatment efficiency of high-temperature exhaust is limited, which may have a certain impact on the economy and stability of the overall process. Summary of the Invention

[0005] In view of the shortcomings of the existing technology, the present invention provides a device and process for harmless treatment of LPCVD tail gas, which solves the problem that the existing tail gas treatment device is not good at treating LPCVD tail gas.

[0006] To achieve the above objectives, the present invention is implemented through the following technical solutions: a harmless treatment device for LPCVD tail gas includes a treatment tower, wherein an air inlet pipe and an exhaust pipe are respectively provided on the top and the right side of the surface of the treatment tower. The interior of the treatment tower is sequentially divided into a decomposition chamber, a cooling chamber and an adsorption chamber from top to bottom. The decomposition chamber is provided with a gas decomposition component, the cooling chamber is provided with a cooling component, and the adsorption chamber is provided with a gas adsorption component.

[0007] The gas decomposition component includes a catalytic cylinder, and the surface of the air inlet pipe is connected to a plurality of gas guide tubes at equal distances along the circumference. The bottom end of the gas guide tube is connected to an injection nozzle, and the outlet of the injection nozzle is arranged at the inner center position of the gas guide tube. The outer side of the catalytic cylinder is provided with a heating sleeve, and an annular heating cavity is formed between the inner wall of the heating sleeve and the outer wall of the catalytic cylinder. A plurality of heat conducting plates are arranged at equal distances inside the annular heating cavity. A catalytic carrier is provided inside the catalytic cylinder, and the catalytic carrier is installed inside the catalytic cylinder through an installation component.

[0008] Preferably, the catalytic carrier is made of a porous ceramic material, and a precious metal catalyst layer is coated on its surface. The bottom of the catalytic cylinder is provided with gas dispersion holes, and the gas dispersion holes are distributed in a honeycomb shape.

[0009] Preferably, the mounting assembly includes four fixed slide rails, which are fixedly installed on the inner wall of the catalytic cylinder at equal distances along the circumference, the inner surfaces of the four fixed slide rails are slidably connected with a clamping plate, the top of one of the fixed slide rails is fixedly connected with a handle, a limiting spring is fixedly connected between the clamping plate and the inner wall of the fixed slide rail, the inner sides of the four fixed slide rails are fixedly connected with a sliding sleeve, the inner surfaces of the four sliding sleeves are slidably connected with a sliding rod, the other ends of the four sliding rods are fixedly connected with a fixing ring, the surface of the fixing ring is rotatably connected with four connecting rods at equal distances along the circumference, and the other ends of the four connecting rods are rotatably connected to the bottom of the four fixed slide rails respectively.

[0010] Preferably, the cooling assembly includes a cooling cylinder and a coolant circulation pipe, the outer side of the cooling cylinder is fixedly connected to the inner wall of the cooling chamber, the coolant circulation pipe is spirally wound on the outer side of the cooling cylinder, and the two ends of the cooling cylinder are respectively connected to the coolant inlet and the coolant outlet, and the inner surface of the cooling cylinder is fixedly connected with a plurality of support frames at equal distances along the circumference, and the support frame is composed of two round rods, and a plurality of gas guide plates are fixedly connected to the surfaces of the two round rods of the support frame at equal distances, the gas guide plates are arranged at an angle, and the inclination angle of the gas guide plates is 30° to 45°, and a plurality of guide grooves are provided on the surface of the gas guide plates.

[0011] Preferably, the gas adsorption component includes an adsorption cylinder and an adsorbent filling layer. The top end of the adsorption cylinder is connected to the bottom end of the cooling cylinder through a flange. The interior of the adsorption cylinder is filled with multiple layers of adsorbent filling layers, and the adsorbent filling layers are composed of activated carbon particles and molecular sieves arranged alternately.

[0012] Preferably, a temperature regulating component is provided on the outside of the processing tower, and the temperature regulating component includes a temperature control box and a heat exchanger. A temperature sensor and a control module are provided inside the temperature control box. The probe of the temperature sensor extends to the inside of the processing tower. One end of the heat exchanger is connected to the side wall of the main processing chamber, and the other end is connected to the inside of the temperature control box. A heat exchange tube is provided inside the heat exchanger, and the two ends of the heat exchange tube are respectively connected to the coolant inlet and the coolant outlet.

[0013] The present invention also discloses a harmless treatment process for LPCVD tail gas, which specifically includes the following steps:

[0014] Step 1: Gas introduction: LPCVD exhaust gas enters the gas flow tube through the air inlet and is then sprayed into the catalyst chamber at high speed through the injection nozzle. During this process, the heating sleeve heats the catalyst chamber, and the toxic gases in the exhaust gas react chemically with the precious metal catalyst on the surface of the catalyst support under high temperature conditions;

[0015] Step 2: Gas dispersion and cooling: The gas after the catalytic reaction enters the main processing chamber through the gas dispersion holes at the bottom of the catalytic chamber, and then enters the cooling cylinder. The coolant in the coolant circulation pipe reduces the gas temperature through heat exchange. The gas flows inside the cooling cylinder along the guide grooves of the gas guide plate;

[0016] Step 3: Gas adsorption: The cooled gas enters the adsorption cylinder, passes through multiple layers of adsorbent filling layers in sequence, and finally enters the gas collection chamber and is discharged through the exhaust port. The filter intercepts the tiny particles that may be carried;

[0017] Step 4: Temperature adjustment: The temperature sensor monitors the temperature inside the main processing chamber in real time and transmits the data to the control module. The control module adjusts the working state of the heat exchanger according to the set temperature range and controls the temperature of the main processing chamber through the flow of coolant in the heat exchange tube.

[0018] Preferably, in step 4, the temperature sensor monitors the temperature inside the treatment tower in real time, and the control module adjusts the working state of the heat exchanger according to the set temperature range to ensure that the entire treatment process is carried out within the appropriate temperature range.

[0019] Beneficial effects

[0020] The present invention provides a device and process for harmless treatment of LPCVD tail gas. Compared with the prior art, it has the following beneficial effects:

[0021] 1. This device and process for harmless treatment of LPCVD tail gas decomposes toxic gases through the precious metal catalyst in the catalytic chamber, achieves rapid cooling through the cooling cylinder and coolant circulation pipe, and purifies the residues with multiple layers of adsorbent in the adsorption cylinder, thereby efficiently decomposing the toxic components in the tail gas, rapidly cooling and deeply purifying the gas, improving the device's tail gas treatment capacity and efficiency, and significantly enhancing the harmlessness level and process stability of the tail gas treatment.

[0022] 2. The device and process for harmless treatment of LPCVD exhaust gas installs the catalytic carrier into the interior of the catalytic cylinder through the installation component. During installation, the catalytic carrier only needs to be placed between four clamping rods and the clamping rods are clamped to the outside of the catalytic carrier by the elastic force of the spring. The installation operation is convenient and quick, which improves the convenience of using the device.

[0023] 3. The device and process for harmless treatment of LPCVD exhaust gas are equipped with a cooling cylinder and a coolant circulation pipe. The coolant circulation pipe is spirally wound on the outside of the cooling cylinder. The guide groove of the gas guide plate guides the gas to flow along a specified path, ensuring that the gas is in full contact with the inner wall of the cooling cylinder, thereby achieving rapid cooling, solving the problem of low efficiency in high-temperature exhaust gas treatment, and improving the economy of the overall process. BRIEF DESCRIPTION OF THE DRAWINGS

[0024] Figure 1 It is a schematic diagram of the appearance of the present invention;

[0025] Figure 2 is a cross-sectional view of the present invention;

[0026] Figure 3 is a schematic diagram of the catalytic assembly of the present invention;

[0027] Figure 4 is a cross-sectional view of the catalytic assembly of the present invention;

[0028] Figure 5 A schematic diagram of the installation assembly of the present invention;

[0029] Figure 6 Schematic diagram of the interior of the cooling assembly of the present invention.

[0030] In the figure: 1. Treatment tower; 2. Air inlet pipe; 3. Exhaust pipe; 4. Gas decomposition assembly; 41. Catalytic cylinder; 42. Heating sleeve; 43. Heat conduction plate; 44. Catalytic carrier; 45. Mounting assembly; 451. Fixed slide rail; 452. Clamp; 453. Limit spring; 454. Slide sleeve; 455. Slide rod; 456. Fixed ring; 457. Connecting rod; 458. Handle; 46. Gas dispersion hole; 51. Gas guide tube; 52. Injection nozzle; 6. Cooling assembly; 61. Cooling cylinder; 62. Coolant circulation pipe; 63. Support frame; 64. Gas guide plate; 65. Guide groove; 7. Gas adsorption assembly; 8. Temperature adjustment assembly. DETAILED DESCRIPTION

[0031] The following will clearly and completely describe the technical solutions in the embodiments of the present invention in conjunction with the accompanying drawings. Obviously, the described embodiments are only part of the embodiments of the present invention, not all of the embodiments. Based on the embodiments of the present invention, all other embodiments obtained by ordinary technicians in this field without making creative efforts are within the scope of protection of the present invention.

[0032] See also Figures 1-6 , this provides two technical solutions for the harmless treatment device of LPCVD exhaust gas:

[0033] The first embodiment comprises a treatment tower 1, wherein an air inlet pipe 2 and an exhaust pipe 3 are respectively provided on the top and the right side of the surface of the treatment tower 1. The interior of the treatment tower 1 is divided into a decomposition chamber, a cooling chamber and an adsorption chamber from top to bottom. A gas decomposition component 4 is provided inside the decomposition chamber, a cooling component 6 is provided inside the cooling chamber, and a gas adsorption component 7 is provided inside the adsorption chamber.

[0034] The gas decomposition component 4 includes a catalytic cylinder 41. The surface of the intake pipe 2 is connected to a plurality of gas flow tubes 51 at equal distances along the circumferential direction. The bottom end of the gas flow tube 51 is connected to an injection nozzle 52, and the outlet of the injection nozzle 52 is arranged at the inner center position of the gas flow tube 51. The outer side of the catalytic cylinder 41 is sleeved with a heating sleeve 42. An annular heating cavity is formed between the inner wall of the heating sleeve 42 and the outer wall of the catalytic cylinder 41. A plurality of heat conducting plates 43 are arranged at equal distances inside the annular heating cavity. A catalytic carrier 44 is arranged inside the catalytic cylinder 41, and the catalytic carrier 44 is installed inside the catalytic cylinder 41 through an installation component 45. The catalytic carrier 44 is made of porous ceramic material and a precious metal catalyst layer is coated on its surface. Gas dispersion holes 46 are opened at the bottom of the catalytic cylinder 41, and the gas dispersion holes 46 are distributed in a honeycomb shape.

[0035] The cooling assembly 6 includes a cooling cylinder 61 and a coolant circulation pipe 62. The outer side of the cooling cylinder 61 is fixedly connected to the inner wall of the cooling chamber. The coolant circulation pipe 62 is spirally wound around the outer side of the cooling cylinder 61. The two ends of the cooling cylinder 61 are respectively connected to the coolant inlet and the coolant outlet. The inner surface of the cooling cylinder 61 is fixedly connected with a plurality of support frames 63 at equal distances along the circumference, and the support frame 63 is composed of two round rods. A plurality of gas guide plates 64 are fixedly connected to the surfaces of the two round rods of the support frame 63 at equal distances. The gas guide plates 64 are arranged at an angle, and the inclination angle of the gas guide plates 64 is 30° to 45°. A plurality of guide grooves 65 are provided on the surface of the gas guide plates 64.

[0036] The gas adsorption component 7 includes an adsorption cylinder and an adsorbent filling layer. The top of the adsorption cylinder is connected to the bottom of the cooling cylinder 61 through a flange. The interior of the adsorption cylinder is filled with multiple layers of adsorbent filling layers, which are composed of activated carbon particles and molecular sieves arranged alternately.

[0037] A temperature regulating assembly 8 is provided on the outside of the processing tower 1. The temperature regulating assembly 8 includes a temperature control box and a heat exchanger. A temperature sensor and a control module are provided inside the temperature control box. The probe of the temperature sensor extends to the inside of the processing tower 1. One end of the heat exchanger is connected to the side wall of the main processing chamber, and the other end is connected to the inside of the temperature control box. A heat exchange tube is provided inside the heat exchanger, and the two ends of the heat exchange tube are respectively connected to the coolant inlet and the coolant outlet.

[0038] Toxic gases are decomposed by the precious metal catalyst in the catalytic chamber, and rapid cooling is achieved by the cooling cylinder 61 and the coolant circulation pipe 62. The multi-layer adsorbent in the adsorption cylinder 7 purifies the residue, thereby being able to efficiently decompose the toxic components in the exhaust gas, quickly cool and deeply purify the gas, thereby improving the exhaust gas treatment capacity and efficiency of the device, and significantly improving the harmlessness level and process stability of the exhaust gas treatment. By setting the cooling cylinder 61 and the coolant circulation pipe 62, the coolant circulation pipe 62 is spirally wound on the outside of the cooling cylinder 61, and the guide groove 63 of the gas guide plate 64 guides the gas to flow along a specified path, ensuring that the gas is in full contact with the inner wall of the cooling cylinder 61, thereby achieving rapid cooling, solving the problem of low efficiency in high-temperature exhaust gas treatment, and improving the economy of the overall process.

[0039] The mounting assembly 45 includes four fixed rails 451, which are fixedly installed on the inner wall of the catalytic cylinder 41 at equal distances along the circumferential direction. The inner surfaces of the four fixed rails 451 are slidably connected with a splint 452, the top of one of the fixed rails 451 is fixedly connected with a handle 458, and a limiting spring 453 is fixedly connected between the splint 452 and the inner wall of the fixed rail 451. The inner sides of the four fixed rails 451 are fixedly connected with a sleeve 454, and the inner surfaces of the four sleeves 454 are slidably connected with a slide rod 455. The other ends of the four slide rods 455 are fixedly connected with a fixing ring 456, and the surface of the fixing ring 456 is rotatably connected with four connecting rods 457 at equal distances along the circumferential direction. The other ends of the four connecting rods 457 are rotatably connected to the bottom of the four fixed rails 451 respectively.

[0040] The catalytic carrier 44 is installed inside the catalytic cylinder 41 through the installation component 45. During installation, the catalytic carrier 44 only needs to be placed between the four clamping rods 42 and the clamping rods 42 are clamped to the outside of the catalytic carrier through the elastic force of the spring. The installation operation is convenient and fast, and it is convenient and quick to remove, which improves the convenience of using the device.

[0041] Treatment tower The treatment tower 1 is composed of three sections of cylinders, and a cover is installed on the top cylinder. When the catalytic carrier 44 needs to be removed, the splint 452 is pulled by the handle 458, and the splint 452 moves and drives the fixing ring 456 to move upward through the connecting rod 457, and then the catalytic carrier 44 is pushed upward through the sliding rod 455. At this time, the catalytic carrier 44 can be quickly taken out.

[0042] The present invention also discloses a harmless treatment process for LPCVD tail gas, which specifically includes the following steps:

[0043] Step 1: Gas introduction: LPCVD exhaust gas enters the gas flow tube through the air inlet and is then sprayed into the catalyst chamber at high speed through the injection nozzle. During this process, the heating sleeve heats the catalyst chamber, and the toxic gases in the exhaust gas react chemically with the precious metal catalyst on the surface of the catalyst support under high temperature conditions;

[0044] Step 2: Gas dispersion and cooling: The gas after the catalytic reaction enters the main processing chamber through the gas dispersion holes at the bottom of the catalytic chamber, and then enters the cooling cylinder. The coolant in the coolant circulation pipe reduces the gas temperature through heat exchange. The gas flows inside the cooling cylinder along the guide grooves of the gas guide plate;

[0045] Step 3: Gas adsorption: The cooled gas enters the adsorption cylinder, passes through multiple layers of adsorbent filling layers in sequence, and finally enters the gas collection chamber and is discharged through the exhaust port. The filter intercepts the tiny particles that may be carried;

[0046] Step 4: Temperature adjustment: The temperature sensor monitors the temperature inside the main processing chamber in real time and transmits the data to the control module. The control module adjusts the working state of the heat exchanger according to the set temperature range and controls the temperature of the main processing chamber through the flow of coolant in the heat exchange tube.

[0047] It should be noted that, in this document, relational terms such as first and second, etc., are used only to distinguish one entity or operation from another entity or operation, and do not necessarily require or imply any actual relationship or order between these entities or operations. Moreover, the terms "comprises," "comprising," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that includes a list of elements includes not only those elements but also other elements not explicitly listed, or elements inherent to such process, method, article, or apparatus.

[0048] While embodiments of the present invention have been shown and described, it will be appreciated by those skilled in the art that various changes, modifications, substitutions, and variations may be made to these embodiments without departing from the principles and spirit of the invention, and that the scope of the invention is defined by the appended claims and their equivalents.

Claims

1. A device for harmless treatment of LPCVD tail gas, comprising a treatment tower (1), wherein an air inlet pipe (2) and an exhaust pipe (3) are respectively provided on the top and the right side of the surface of the treatment tower (1), characterized in that: The interior of the treatment tower (1) is composed of a decomposition chamber, a cooling chamber, and an adsorption chamber from top to bottom. A gas decomposition component (4) is provided inside the decomposition chamber, a cooling component (6) is provided inside the cooling chamber, and a gas adsorption component (7) is provided inside the adsorption chamber. The gas decomposition component (4) comprises a catalytic cylinder (41), a surface of the air inlet pipe (2) is connected to a plurality of gas flow guide tubes (51) at equal distances along the circumferential direction, the bottom end of the gas flow guide tube (51) is connected to an injection nozzle (52), and the outlet of the injection nozzle (52) is arranged at the inner center position of the gas flow guide tube (51), the outer side of the catalytic cylinder (41) is sleeved with a heating sleeve (42), an annular heating cavity is formed between the inner wall of the heating sleeve (42) and the outer wall of the catalytic cylinder (41), a plurality of heat conducting plates (43) are arranged at equal distances inside the annular heating cavity, a catalytic carrier (44) is arranged inside the catalytic cylinder (41), and the catalytic carrier (44) is installed inside the catalytic cylinder (41) through a mounting assembly (45).

2. The device for harmless treatment of LPCVD tail gas according to claim 1, characterized in that: The catalytic carrier (44) is made of a porous ceramic material and a noble metal catalyst layer is coated on its surface. The bottom of the catalytic cylinder (41) is provided with gas dispersion holes (46), and the gas dispersion holes (46) are distributed in a honeycomb shape.

3. The device for harmless treatment of LPCVD tail gas according to claim 1, characterized in that: The mounting assembly (45) includes four fixed rails (451), which are fixedly mounted on the inner wall of the catalytic cylinder (41) at equal distances along the circumferential direction. The inner surfaces of the four fixed rails (451) are all slidably connected with clamping plates (452), the top of one of the fixed rails (451) is fixedly connected with a handle (458), and a limit spring (453) is fixedly connected between the clamping plate (452) and the inner wall of the fixed rail (451). The inner sides of the fixed slide rails (451) are fixedly connected with sliding sleeves (454), the inner surfaces of the four sliding sleeves (454) are slidably connected with sliding rods (455), the other ends of the four sliding rods (455) are fixedly connected with fixed rings (456), the surface of the fixed ring (456) is rotatably connected with four connecting rods (457) at equal distances along the circumference, and the other ends of the four connecting rods (457) are respectively rotatably connected to the bottoms of the four fixed slide rails (451).

4. The device for harmless treatment of LPCVD tail gas according to claim 1, characterized in that: The cooling assembly (6) includes a cooling cylinder (61) and a coolant circulation pipe (62), the outer side of the cooling cylinder (61) is fixedly connected to the inner wall of the cooling chamber, the coolant circulation pipe (62) is spirally wound on the outer side of the cooling cylinder (61), and the two ends of the cooling cylinder (61) are respectively connected to the coolant inlet and the coolant outlet, the inner surface of the cooling cylinder (61) is fixedly connected with a plurality of support frames (63) at equal distances along the circumference, and the support frames (63) are composed of two round rods, and the surfaces of the two round rods of the support frames (63) are fixedly connected with a plurality of gas guide plates (64) at equal distances, the gas guide plates (64) are arranged in an inclined manner, and the inclination angle of the gas guide plates (64) is 30° to 45°, and the surface of the gas guide plates (64) is provided with a plurality of guide grooves (65).

5. The device for harmless treatment of LPCVD tail gas according to claim 1, characterized in that: The gas adsorption component (7) includes an adsorption cylinder and an adsorbent filling layer. The top end of the adsorption cylinder is connected to the bottom end of the cooling cylinder (61) via a flange. The interior of the adsorption cylinder is filled with multiple layers of adsorbent filling layers. The adsorbent filling layers are composed of activated carbon particles and molecular sieves arranged alternately.

6. The device for harmless treatment of LPCVD tail gas according to claim 1, characterized in that: The outside of the treatment tower (1) is provided with a temperature regulating assembly (8), which includes a temperature control box and a heat exchanger. The inside of the temperature control box is provided with a temperature sensor and a control module. The probe of the temperature sensor extends into the inside of the treatment tower (1). One end of the heat exchanger is communicated with the side wall of the main treatment chamber, and the other end is communicated with the inside of the temperature control box. A heat exchange tube is provided inside the heat exchanger, and the two ends of the heat exchange tube are respectively connected to the coolant inlet and the coolant outlet.

7. A process for harmless treatment of LPCVD tail gas, used for implementing the device for harmless treatment of LPCVD tail gas according to any one of claims 1 to 6, characterized in that: The specific steps include: Step 1: Gas introduction: LPCVD exhaust gas enters the gas flow tube through the air inlet and is then sprayed into the catalyst chamber at high speed through the injection nozzle. During this process, the heating sleeve heats the catalyst chamber, and the toxic gases in the exhaust gas react chemically with the precious metal catalyst on the surface of the catalyst support under high temperature conditions; Step 2: Gas dispersion and cooling: The gas after the catalytic reaction enters the main processing chamber through the gas dispersion holes at the bottom of the catalytic chamber, and then enters the cooling cylinder. The coolant in the coolant circulation pipe reduces the gas temperature through heat exchange. The gas flows inside the cooling cylinder along the guide grooves of the gas guide plate; Step 3: Gas adsorption: The cooled gas enters the adsorption cylinder, passes through multiple layers of adsorbent filling layers in sequence, and finally enters the gas collection chamber and is discharged through the exhaust port. The filter intercepts the tiny particles that may be carried; Step 4: Temperature adjustment: The temperature sensor monitors the temperature inside the main processing chamber in real time and transmits the data to the control module. The control module adjusts the working state of the heat exchanger according to the set temperature range and controls the temperature of the main processing chamber through the flow of coolant in the heat exchange tube.

8. The process for harmless treatment of LPCVD tail gas according to claim 7, characterized in that: In step 4, the temperature sensor monitors the temperature inside the treatment tower (1) in real time, and the control module adjusts the working state of the heat exchanger according to the set temperature range to ensure that the entire treatment process is carried out within an appropriate temperature range.

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