Neutralizer and Hall ion source device comprising same

Abstract

The invention discloses a neutralizer and a Hall ion source device comprising the neutralizer, and particularly relates to the technical field of ion sources, the technical key points are as follows: an inner magnetic pole and an outer shielding cover are both placed on the upper surface of a support flange, and the lower edge part of the outer shielding cover surrounds the outer edge part of the inner magnetic pole; the outer magnetic pole is arranged above the inner magnetic pole, and the upper edge part of the outer shielding cover surrounds the outer edge part of the outer magnetic pole; a first placing groove is formed in the middle of the top surface of the inner magnetic pole, the neutralizer is mounted in the first placing groove, and the anode ring sleeves the edge part of the top of the inner magnetic pole; the inner shielding cover is arranged between the inner magnetic pole and the outer magnetic pole and is coaxial with the outer shielding cover; a plurality of permanent magnets are arranged between the inner shielding case and the outer shielding case; the air inlet pipe penetrates through the bottom of the supporting flange and the bottom of the inner magnetic pole, extends into the first placing groove and is connected with the neutralizer; a first through hole is formed in the middle of the top face of the outer magnetic pole, and the first through hole, the anode ring and the first containing groove are coaxially arranged.

Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of ion source, in particular to a neutralizer and a Hall ion source device comprising the same. BACKGROUND

[0002] Material surface treatment using plasma as an important manufacturing process has quite wide applications in many fields such as aerospace, mechanical manufacturing, electronic information, decoration, new energy and medical treatment, etc. Among them, pre-cleaning of the surface of the material to be processed by the ion source is an important link in the plasma material surface treatment process.

[0003] Through the pre-cleaning link of the ion source, the impurities adsorbed on the surface of the material can be effectively removed, and the influence of the impurities on the surface of the material on the subsequent process effect can be excluded; the surface activity and surface energy of the material can be effectively improved, and the adhesion of the film layer can be enhanced; a relatively stable and consistent material surface state can be provided for different batches of materials or different process conditions, thereby enhancing the compatibility and repeatability of the process.

[0004] The Hall ion source has been widely used in the field of material surface pretreatment due to its relatively simple structure, easy size scaling and convenient operation and maintenance. However, since the Hall ion source usually introduces a positively charged ion beam, especially for the pretreatment of non-metal material surfaces, there are some unnecessary charge accumulation and material surface damage problems. Therefore, according to the requirements of the specific application scene, the charge neutralization treatment of the Hall ion source beam needs to be carried out.

[0005] In a Chinese patent with publication number CN111759024A, an ion source device is disclosed, which comprises a Hall ion source and at least two hollow cathodes; each hollow cathode is arranged at a set position away from the Hall ion source; each hollow cathode is designed to provide neutralizing electrons to the Hall ion source, and when any one of the hollow cathodes fails, the other hollow cathode is switched to provide neutralizing electrons to the Hall ion source. The backup function of the hollow cathode is realized, avoiding the situation that when the service life of the tantalum tube of the hollow cathode ends, the last furnace is wasted or the tantalum tube needs to be replaced by breaking the vacuum during the film coating process, so that the service life of the tantalum tube of the hollow cathode can be maximized, and the ion source can work continuously for a long time. The situation that the product is scrapped due to the failure of the neutralizer is avoided.

[0006] In the above technical solution, two independent hollow cathodes are used to provide neutralizing electrons for the Hall ion source, which can achieve the purpose of neutralization. However, in the application scenario where the space size of the vacuum chamber is too small and severely limited, the independent hollow cathode will be greatly limited in space, and it is difficult to adjust the position of the independently arranged hollow cathode under the condition of severe space limitation.

[0007] Therefore, the present application aims to provide a neutralizer and a Hall ion source device comprising the same to solve the above-mentioned related problems. SUMMARY

[0008] The present application aims to solve the technical problem that the independent hollow cathode is greatly limited in space in the application scenario where the size of the vacuum chamber space is too small and severely limited, and aims to provide a neutralizer and a Hall ion source device comprising the same, which is designed by arranging the neutralizer in the built-in structure of the Hall ion source device, so as to facilitate the reduction of the size of the Hall ion source device, thereby forming a compact Hall ion source device, which can be used in the application scenario where the size of the vacuum chamber space is too small and severely limited; the hollow cathode effect is utilized to charge neutralize the ion beam extracted from the ion source by the electron beam extracted from the neutralizer; the first gas inlet and the second gas inlet on the bottom plate of the neutralizer are arranged, and the gas inlet cavity is formed between the bottom plate and the bottom of the first placement slot, which is in communication with the first gas inlet, the second gas inlet and the gas inlet pipe, so that the Hall ion source device is connected with one gas inlet pipe, and the gas inlet pipe for the neutralizer is not needed, so that the working gas can be shared by the Hall ion source device and the neutralizer, thereby achieving the purpose of sharing the gas inlet pipe by the neutralizer and the Hall ion source device; the device cathode is formed by the inner magnetic pole and the outer magnetic pole, so as to facilitate the power supply of the neutralizer by the potential difference between the anode ring and the device cathode, thereby eliminating the need for separate power supply of the neutralizer; the first cooling water inlet and the second cooling water inlet are connected with the water inlet pipe, and the first cooling water outlet and the second cooling water outlet are connected with the water outlet pipe, so as to complete the cooling work of the neutralizer and the anode ring by one water inlet pipe and one water outlet pipe, thereby achieving the purpose of sharing the cooling water by the neutralizer and the ion source.

[0009] The present application is realized by the following technical solutions: A neutralizer comprises a shell and a bottom plate for forming the bottom of the shell, a neutralization area is arranged in the shell, a top of the neutralization area is provided with an extraction port, and a first gas inlet is arranged in the middle of the bottom plate and in communication with the neutralization area; a plurality of second gas inlets are arranged in the edge area of the outer wall of the shell and spaced apart from each other. A first cooling channel is arranged in the sidewall of the shell, and a first cooling water inlet and a first cooling water outlet are respectively arranged in the two sides of the bottom plate and in communication with the first cooling channel.

[0010] The present application also provides a Hall ion source device, which comprises an anode ring, an inner magnetic pole, an outer magnetic pole, an inner shield, an outer shield, a support flange, a gas inlet pipe and the above-mentioned neutralizer. The inner magnetic pole and the outer shielding cover are placed on the upper surface of the support flange, and the lower edge part of the outer shielding cover encloses the outer edge part of the inner magnetic pole; the outer magnetic pole is arranged above the inner magnetic pole, and the upper edge part of the outer shielding cover encloses the outer edge part of the outer magnetic pole; The top surface of the inner magnetic pole is provided with a first placing groove, and the neutralizer is installed in the first placing groove; and the anode ring is sleeved on the top edge part of the inner magnetic pole. The inner shielding cover is arranged between the inner magnetic pole and the outer magnetic pole, and is coaxially arranged with the outer shielding cover; a plurality of permanent magnets are arranged between the inner shielding cover and the outer shielding cover. The gas inlet pipe penetrates through the bottom of the support flange and the bottom of the inner magnetic pole, extends into the first placing groove, and penetrates through the neutralizer. The top surface of the outer magnetic pole is provided with a first through hole, and the first through hole, the anode ring and the first placing groove are coaxially arranged.

[0011] Further, the upper surface of the support flange is provided with a second placing groove, and the inner magnetic pole and the outer shielding cover are placed in the second placing groove.

[0012] Further, the upper surface edge part of the inner magnetic pole is provided with a first clamping groove, the lower surface edge part of the outer magnetic pole is provided with a second clamping groove, the lower edge part of the inner shielding cover is placed in the first clamping groove, and the upper edge part of the inner shielding cover is placed in the second clamping groove.

[0013] Further, the top ends of the plurality of permanent magnets are in contact with the lower surface of the outer magnetic pole, and the bottom ends of the plurality of permanent magnets are in contact with the lower surface of the inner magnetic pole.

[0014] Further, sealing rings are arranged between the second placing groove and the outer shielding cover, between the support flange and the gas inlet pipe, and between the inner magnetic pole and the gas inlet pipe.

[0015] Further, the outer side wall of the shell and the inner side wall of the first placing groove form an air inlet channel through the second air inlet, the bottom plate is fixedly connected with the inner side wall of the first placing groove, and an air inlet cavity is formed between the bottom plate and the bottom of the first placing groove, the air inlet cavity being arranged through the first air inlet and the second air inlet.

[0016] Further, the gas inlet pipe penetrates through the bottom of the support flange and the bottom of the inner magnetic pole, extends into the air inlet cavity, and penetrates through the air inlet cavity.

[0017] Further, the anode ring is provided with a second cooling channel, and the second cooling channel is provided with a second cooling water inlet and a second cooling water outlet. The first cooling water inlet and the second cooling water inlet are connected with the water inlet pipe, and the first cooling water outlet and the second cooling water outlet are connected with the water outlet pipe.

[0018] Further, the outer magnetic pole and the inner magnetic pole are fixedly connected through bolts.

[0019] Compared with the prior art, the present application has the following advantages and beneficial effects: In the present application, by setting the neutralizer in the built-in structure design of the Hall ion source device, the size of the Hall ion source device is facilitated to be reduced, so as to form a compact Hall ion source device, which can be used in application scenarios where the size of the vacuum chamber space is too small and severely limited; by the hollow cathode effect, the electron beam current introduced by the neutralizer is used to charge neutralize the ion beam current introduced by the ion source; by the first gas inlet and the second gas inlet on the bottom plate of the neutralizer, and by the gas inlet cavity formed between the bottom plate and the bottom of the first placement slot, which is in communication with the first gas inlet, the second gas inlet and the gas inlet pipe, so that the Hall ion source device is connected with one gas inlet pipe, and the neutralizer does not need to be additionally provided with a gas inlet pipe, so that the Hall ion source device can share the working gas with the neutralizer, achieving the purpose of sharing the gas inlet pipe by the neutralizer and the Hall ion source device; by the inner magnetic pole and the outer magnetic pole, the device cathode is formed, which facilitates the neutralizer to be powered by the potential difference between the anode ring, so that the neutralizer does not need to be powered separately; by the common connection of the first cooling water inlet and the second cooling water inlet with the water inlet pipe, and the common connection of the first cooling water outlet and the second cooling water outlet with the water outlet pipe, the cooling work of the neutralizer and the anode ring is facilitated to be completed by using the same water inlet pipe and water outlet pipe, so as to achieve the purpose of sharing the cooling water by the neutralizer and the ion source. BRIEF DESCRIPTION OF DRAWINGS

[0020] In order to more clearly illustrate the technical solutions of the exemplary embodiments of the present application, the following will briefly introduce the drawings needed to be used in the embodiments, and it should be understood that the following drawings only show some embodiments of the present application, and therefore should not be regarded as a limitation on the scope, and for those skilled in the art, other related drawings can also be obtained without creative labor. In the drawings: Figure 1 It is a structural schematic diagram of a neutralizer in the present embodiment; Figure 2 It is a structural schematic diagram of a neutralizer in the present embodiment; Figure 1 It is a sectional view in the direction of B-B; Figure 3 It is a sectional view of a Hall ion source device in the present embodiment; Figure 4 It is a sectional view of a Hall ion source device in the present embodiment; Figure 3 It is an enlarged view of A.

[0021] In the drawings, the marks and corresponding component names are as follows: 1, anode ring; 2, inner magnetic pole; 3, outer magnetic pole; 4, inner shield cover; 5, outer shield cover; 6, support flange; 7, gas inlet pipe; 8, neutralizer; 801, shell; 802, bottom plate; 803, neutralization area; 804, outlet; 805, first gas inlet; 806, second gas inlet; 807, first cooling channel; 808, first cooling water inlet; 809, first cooling water outlet; 9, first placement groove; 10, permanent magnet; 11, first through hole; 12, second placement groove; 13, first clamping groove; 14, second clamping groove; 15, second cooling channel. DETAILED DESCRIPTION

[0022] In the following description, numerous specific details are set forth to provide a thorough understanding of the present application. However, it will be apparent to one of ordinary skill in the art that the present application can be practiced without the specific details. In other instances, well-known structures, circuits, materials or processes have not been described in detail in order to avoid obscuring the present application.

[0023] Reference throughout this specification to "one embodiment", "an embodiment", "one example", or "an example" means that a particular feature, structure, or characteristic described in connection with the embodiment or example is included in at least one embodiment of the present application. Thus, appearances of the phrases "one embodiment", "an embodiment", "one example", or "an example" in various places throughout this specification are not necessarily all referring to the same embodiment or example. Furthermore, the particular features, structures, or characteristics can be combined in any suitable

[0024] In the description of the present application, the terms "front", "back", "left", "right", "up", "down", "vertical", "horizontal", "high", "low", "inner", "outer", and the like, indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the purpose of facilitating the description of the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as limiting the scope of protection of the present application.

[0025] The terms "first", "second", "third", "fourth" and the like in the description and in the claims of the present application, and in the above Description of Related Art, if any, are used for distinguishing between similar objects and not necessarily for describing a particular sequential or chronological order. It is to be understood that the use of these terms herein is to be construed to cover the embodiments of the application described herein, for example, the use of "first" and "second" is to be understood to cover at least a first and a second step, a first and a second unit, a first and a second part, etc. and not necessarily a first and a second in time or in order of use or occurrence. Furthermore, the terms "comprising", "having", "including", and the like, when used in the present specification and in the following claims, are each intended to mean the inclusion of the stated element or elements prior to any additional element or elements. None of the language in this specification or the claims shall be construed as indicating any non-claimed element as essential to the practice of the application.

[0026] As described in the background, the Hall ion source is widely used in the field of material surface pretreatment due to its relatively simple structure, easy to scale, and convenient to maintain. However, since the Hall ion source usually introduces a positively charged ion beam, especially for the pretreatment of non-metal material surface, there will be some unnecessary charge accumulation and material surface damage problems. Therefore, according to the specific application scene requirements, the Hall ion source beam needs to be charge neutralized; and the prior art uses two independent hollow cathodes to provide neutralizing electrons for the Hall ion source, which can achieve the purpose of neutralization, but in the application scene where the space size of the vacuum chamber is too small and severely limited, the independent hollow cathode will be greatly limited in space, and it is difficult to adjust the position of the separately arranged hollow cathode under the condition of serious space limitation. To solve the above technical problems, the present application provides a neutralizer and a Hall ion source device comprising the same, and the specific embodiments are shown in the following embodiments: Embodiments Referring to Figures 1-2 as shown, Figure 1 a cross-sectional view of a neutralizer 8 is shown, Figure 2 As shown in the structure diagram of the neutralizer 8, the neutralizer 8 comprises a shell 801 and a bottom plate 802 for forming the bottom of the shell 801, a neutralization area 803 is arranged in the shell 801, a top of the neutralization area 803 is provided with an outlet 804, a first gas inlet 805 is drilled in the middle of the bottom plate 802 and is connected with the neutralization area 803; four second gas inlets 806 are drilled in the edge area of the outer side wall of the shell 801 and are spaced apart; a first cooling channel 807 is arranged in the side wall of the shell 801, and a first cooling water inlet 808 and a first cooling water outlet 809 are drilled in the both sides of the bottom plate 802 and are connected with the first cooling channel 807.

[0027] It should be noted that in the embodiment, the shell 801 adopts a cylindrical structure, the bottom plate 802 adopts a circular plate structure, the bottom plate 802 is integrally formed with the shell 801, and the two are coaxially arranged. In other embodiments, the shell 801 and the bottom plate 802 can also adopt other structures, which are not limited here; at the same time, the radius of the bottom plate 802 is greater than the radius of the shell 801, so that a longitudinal section is in an inverted “T” shape structure, and thus the area of the bottom plate 802 not covered by the bottom of the shell 801 is the edge area of the bottom plate 802 extending outside the sidewall of the shell 801; at the same time, in the embodiment, the number of the second air inlets 806 is four, and in other embodiments, the number can also be two, three, six, eight, ten or other numbers that can be achieved, which are not limited here; the number of the first air inlets 805 is one, and in other embodiments, the number can also be two, three, six, eight, ten or other numbers that can be achieved, which are not limited here; At the same time, in the embodiment, the second air inlets 806 adopt a circular arc through-hole structure, and the four second air inlets 806 are symmetrically arranged with the first air inlet 805 as the center and the center of the bottom plate 802 as the center of the circular arc. In other embodiments, the second air inlets 806 can also adopt a circular, square or other structure that can be achieved, which is not limited here; at the same time, in the embodiment, the first cooling channel 807 adopts a ring-shaped channel, and the first cooling water inlet 808 and the first cooling water outlet 809 are respectively arranged on both sides of the bottom of the first cooling channel 807.

[0028] Specifically, in the embodiment, the first cooling channel 807 encloses the neutralization area 803, which is used for cooling and cooling treatment of the neutralization area 803 during ionization of the working gas; the exhaust port 804 is used for facilitating the extraction of the electron beam current generated in the neutralization area 803; the first air inlet 805 is used for facilitating the working gas to enter the neutralization area 803; and the second air inlet 806 is used for facilitating the working gas to enter the discharge area of the Hall ion source device.

[0029] Specifically, in the use process, the working gas enters the neutralization area 803 in the neutralizer 8 through the first air inlet 805, and the neutralizer 8 ionizes the working gas to form an electron beam current under the action of an external magnetic field. The electron beam current is extracted out of the neutralizer 8 through the exhaust port 804; at the same time, during the ionization process, the cooling water enters the first cooling channel 807 through the first cooling water inlet 808 to cool the neutralizer 8, and the cooled cooling water flows out through the first cooling water outlet 809; at the same time, the input working gas also has a cooling effect on the neutralizer 8.

[0030] The embodiment also provides a Hall ion source device, which is shown in Figure 3 Figure 3 ​A cross-sectional view of a Hall ion source device is shown, wherein the Hall ion source device comprises an anode ring 1, an inner magnetic pole 2, an outer magnetic pole 3, an inner shield 4, an outer shield 5, a support flange 6, a gas inlet tube 7, and a neutralizer 8 as described above; the inner magnetic pole 2 and the outer shield 5 are both placed on the upper surface of the support flange 6, and the lower edge of the outer shield 5 encloses the outer edge of the inner magnetic pole 2; the outer magnetic pole 3 is placed above the inner magnetic pole 2, and the upper edge of the outer shield 5 encloses the outer edge of the outer magnetic pole 3; a first placement groove 9 is excavated in the middle of the top surface of the inner magnetic pole 2, the neutralizer 8 is installed in the first placement groove 9, the anode ring 1 is sleeved on the top edge of the inner magnetic pole 2, and the outer magnetic pole 3 and the inner magnetic pole 2 are fixedly connected by bolts; the inner shield 4 is placed between the inner magnetic pole 2 and the outer magnetic pole 3, and is coaxially arranged with the outer shield 5; a plurality of permanent magnets 10 are arranged between the inner shield 4 and the outer shield 5, the top ends of the plurality of permanent magnets 10 are in contact with the lower surface of the outer magnetic pole 3, and the bottom ends of the plurality of permanent magnets 10 are in contact with the lower surface of the inner magnetic pole 2; the gas inlet tube 7 penetrates through the bottom of the support flange 6 and the bottom of the inner magnetic pole 2, extends into the first placement groove 9, and is connected with the neutralizer 8; the top surface of the outer magnetic pole 3 is provided with a first through hole 11, and the first through hole 11, the anode ring 1, and the first placement groove 9 are coaxially arranged.

[0031] It should be noted that in the present embodiment, a cavity structure is formed by the outer shield 5, the outer magnetic pole 3, and the support flange 6, then the inner magnetic pole 2 is placed at the bottom of the cavity structure, a placement groove for placing the neutralizer 8 is arranged on the upper surface of the inner magnetic pole 2, the neutralizer 8 is embedded in the inner magnetic pole 2, then the anode ring 1 is sleeved on the top of the inner magnetic pole 2, finally the inner shield 4 is placed between the inner magnetic pole 2 and the outer magnetic pole 3 in the cavity structure, and the permanent magnets 10 are placed between the inner shield 4 and the outer shield 5, the number of the permanent magnets 10 is determined according to the actual situation, which can be ten, twelve, or other numbers that can be achieved, and will not be described in detail here. Meanwhile, in the present embodiment, referring to Figure 4As shown, the first placement groove 9 will be arranged according to the outer surface structure of the neutralizer 8, and the longitudinal section of the first placement groove 9 is also arranged as an inverted "T" structure, and the radius of the upper half of the first placement groove 9 is greater than the radius of the shell 801, so that a gap with a certain width is maintained between the outer side wall of the neutralizer 8 and the inner side wall of the first placement groove 9, and the gap forms an air inlet channel that is in communication with the second air inlet 806, and through the air inlet channel, the discharge area can be accessed. The width of the gap can be consistent with the difference between the inner and outer diameters of the second air inlet 806, or it can be greater than the difference between the inner and outer diameters of the second air inlet 806, which is determined according to actual needs and will not be described in detail here. The radius of the lower half of the first placement groove 9 is greater than or equal to the radius of the bottom plate 802, which will not be described in detail here. The bottom plate 802 is fixedly connected to the inner side upper surface of the lower half of the first placement groove 9 through a bolt, so that an air inlet cavity is formed between the bottom plate 802 and the bottom of the first placement groove 9, and the air inlet cavity is in communication with the air inlet pipe 7, the first air inlet 805 and the second air inlet 806, so that the working gas output by the air inlet pipe 7 can smoothly enter the first air inlet 805 and the second air inlet 806. At the same time, it should be noted that the anode ring 1 is powered by an external power supply, which is a conventional technical means in the art and will not be described in detail here.

[0032] It should be noted that in this embodiment, the Hall ion source is in an operating state, the cathode potential is -350~-800V, the anode is grounded, and the operating current is 0.05~5A; during operation, the hollow inner magnetic pole 2 of the Hall ion source is installed with the neutralizer 8, and the neutralizer 8 is at the same potential as the inner magnetic pole 2 (i.e. the cathode) and has a voltage of -350~-800V.

[0033] It should be noted that in this embodiment, the working gas is krypton, and in other embodiments it can be argon, neon, helium, or other working gases, which will not be described in detail here.

[0034] Specifically, in the present embodiment, by the plurality of permanent magnets 10, it is facilitated to generate a transverse magnetic field in the Hall ion source to accelerate in a radial electric field, and under the action of Lorentz force of the permanent magnet 10 magnetic field, it is forced to make spiral motion along the magnetic force line, thereby significantly prolonging the residence time of the electrons in the discharge region, making them have more opportunities to collide with working gas molecules, thereby improving the ionization efficiency; the anode ring 1 is used to ionize the working gas in the discharge region to form an ion beam; the device cathode is formed by the inner magnetic pole 2 and the outer magnetic pole 3, thereby using the potential difference generated between the anode ring 1 to supply power to the neutralizer 8; by the outer shield 5, it is facilitated to block the interference of external stray electromagnetic field on the internal electromagnetic field of the ion source, avoiding the problems of unstable ion beam flow, increased energy divergence, etc. caused by field distribution disorder; at the same time, it reduces the leakage of the strong electromagnetic field inside the Hall ion source device to the outside, avoiding interference with the surrounding electronic equipment (such as control circuit, sensor); by the inner shield 4, it is facilitated to block the high-energy ions in the plasma from bombarding the cathode, anode or other components during the operation of the Hall ion source, causing metal or dielectric particles deposited on the key components due to sputtering of the material, avoiding performance degradation due to pollution; by the gas inlet pipe 7, it is facilitated to transport working gas into the Hall ion source device; the gas inlet cavity is formed between the bottom plate 802 and the bottom of the first placement slot 9, which is in communication with the first gas inlet 805, the second gas inlet 806 and the gas inlet pipe 7, so that the Hall ion source device is connected with the gas inlet pipe 7, and the gas inlet pipe is not additionally arranged for the neutralizer, so that the Hall ion source device can share the working gas with the neutralizer, achieving the purpose of sharing the gas inlet pipe by the neutralizer and the Hall ion source device; the neutralizer is embedded in the center of the hollow inner magnetic pole to ensure that the potential of the neutralizer and the inner magnetic pole is the same.

[0035] In another embodiment, the upper surface of the support flange 6 is excavated with a second placement slot 12, and the inner magnetic pole 2 and the outer shield 5 are placed in the second placement slot 12.

[0036] It should be noted that, in the present embodiment, the inner magnetic pole 2 and the outer shield 5 are fixedly installed on the upper surface of the support flange 6 through the second placement slot 12; and a sealing ring strip is also installed between the second placement slot 12 and the outer shield 5, thereby increasing the sealing effect of the device.

[0037] In another embodiment, the upper surface edge of the inner magnetic pole 2 is excavated with a first clamping slot 13, the lower surface edge of the outer magnetic pole 3 is excavated with a second clamping slot 14, the lower edge of the inner shield 4 is placed in the first clamping slot 13, and the upper edge of the inner shield 4 is placed in the second clamping slot 14.

[0038] It should be noted that in the present embodiment, through the cooperation of the first clamping groove 13 and the second clamping groove 14, the inner shielding cover 4 is fixedly installed between the inner magnetic pole 2 and the outer magnetic pole 3, and at the same time, the space between the inner shielding cover 4 and the outer shielding cover 5 is formed, which can place the permanent magnet 10.

[0039] In another embodiment, a sealing ring is fixedly installed between the second placement groove 12 and the outer shielding cover 5, between the support flange 6 and the gas inlet pipe 7, and between the inner magnetic pole 2 and the gas inlet pipe 7.

[0040] It should be noted that in the present embodiment, the sealing ring is made of fluorine rubber, and in other embodiments, sealing rings made of other materials can also be used, which will not be described in detail here; by arranging the sealing ring between the second placement groove 12 and the outer shielding cover 5, between the support flange 6 and the gas inlet pipe 7, and between the inner magnetic pole 2 and the gas inlet pipe 7, the sealing effect of the device can be further guaranteed.

[0041] In another embodiment, the anode ring 1 is provided with a second cooling channel 15, and the second cooling channel 15 is provided with a second cooling water inlet and a second cooling water outlet, which is a conventional technical means in the art and will not be described in detail here; the first cooling water inlet and the second cooling water inlet are connected with the water inlet pipe, and the first cooling water outlet and the second cooling water outlet are connected with the water outlet pipe.

[0042] Specifically, in the present embodiment, the second cooling channel 15 is used to cool the anode ring 1, so that the anode ring 1 does not overheat during discharge, which can effectively prevent the temperature in the discharge area from being too high, and the overall heating of the device can cause the magnetic pole to demagnetize, which can effectively guarantee the stable discharge of the device; the first cooling water inlet and the second cooling water inlet are connected with the water inlet pipe, and the first cooling water outlet and the second cooling water outlet are connected with the water outlet pipe, which realizes the neutralizer 8 and the Hall ion source device, so as to achieve the purpose of sharing the cooling water of the neutralizer 8 and the Hall ion source.

[0043] Workflow: During the discharge of the device, the working gas successively passes through the gas inlet pipe 7 and the gas inlet cavity, and then enters the neutralization area of the neutralizer 8 through the first gas inlet 805, and enters the discharge area of the Hall ion source through the second gas inlet 806 and the gas inlet channel; the working gas entering the neutralizer 8 is ionized to generate electrons, and the electron beam is guided out along the ion source axis direction through the outlet 804 and sent to the discharge area of the Hall ion source device; the working gas is guided out of the ion beam in the discharge area of the Hall ion source device, and the number of electrons guided out of the neutralizer 8 and the ion beam cross the comprehensive action of the electromagnetic field in the discharge area of the device, and oscillate between the inner and outer magnetic poles 3 in a spiral line type motion trajectory to be combined into a neutral particle beam; at the same time, cooling water is supplied during operation to avoid overheating of the neutralizer 8 during operation and thus affect the normal operation of the Hall ion source, and improve the operation stability and reliability of the device.

[0044] In summary, the technical effects of the present application are: by setting the neutralizer 8 in the built-in structure design of the Hall ion source device, the size of the Hall ion source device can be reduced, thereby forming a compact Hall ion source device, which can be used in application scenarios where the size of the vacuum chamber space is too small and severely limited; through the hollow cathode effect, the electron beam guided out of the neutralizer 8 is used to charge neutralize the ion beam guided out of the ion source; by setting the first gas inlet 805 and the second gas inlet 806 on the bottom plate 802 of the neutralizer 8, and by forming a gas inlet cavity through the first gas inlet 805, the second gas inlet 806 and the gas inlet pipe 7 between the bottom plate 802 and the bottom of the first placement slot 9, the Hall ion source device is connected with one gas inlet pipe, and no additional gas inlet pipe is needed for the neutralizer, so that the Hall ion source device can share the working gas with the neutralizer, achieving the purpose of sharing the gas inlet pipe by the neutralizer and the Hall ion source device; by forming the device cathode by the inner magnetic pole 2 and the outer magnetic pole 3, the neutralizer 8 can be powered by the potential difference between the anode ring 1, so that the neutralizer 8 does not need to be powered separately; by connecting the first cooling water inlet and the second cooling water inlet with the water inlet pipe, and connecting the first cooling water outlet and the second cooling water outlet with the water outlet pipe, the cooling work of the neutralizer 8 and the anode ring 1 can be completed by using one water inlet pipe and one water outlet pipe, so as to achieve the purpose of sharing the cooling water by the neutralizer 8 and the ion source.

[0045] The above specific embodiments further illustrate the purpose, technical solutions and advantages of the present application, and it should be understood that the above description is only a specific embodiment of the present application and is not used to limit the protection scope of the present application, and any modifications, equivalent replacements, improvements, etc. made within the spirit and principles of the present application shall be included in the protection scope of the present application.

Claims

1. A neutralizer, characterized in that: The neutralizer (8) comprises a shell (801) and a bottom plate (802) for forming the bottom of the shell (801); a neutralization area (803) is provided in the shell (801); a top of the neutralization area (803) is provided with an outlet (804); a middle portion of the bottom plate (802) is provided with a first air inlet (805) that is in continuous communication with the neutralization area (803); and a plurality of second air inlets (806) are provided at intervals in an edge region of the bottom plate (802) extending out of an outer wall of the shell (801); A first cooling channel (807) is provided in the side wall of the shell (801), and a first cooling water inlet (808) and a first cooling water outlet (809) which are connected to the first cooling channel (807) are respectively opened on both sides of the bottom plate (802).

2. A Hall ion source device, characterized in that: The device comprises an anode ring (1), an inner magnetic pole (2), an outer magnetic pole (3), an inner shield (4), an outer shield (5), a supporting flange (6), an air inlet pipe (7), and a neutralizer (8) as claimed in claim 1; The inner magnetic pole (2) and the outer shield (5) are both placed on the upper surface of the support flange (6), and the lower edge of the outer shield (5) is enclosed by the outer edge of the inner magnetic pole (2); the outer magnetic pole (3) is arranged above the inner magnetic pole (2), and the upper edge of the outer shield (5) is enclosed by the outer edge of the outer magnetic pole (3); A first placement groove (9) is provided in the middle of the top surface of the inner magnetic pole (2), the neutralizer (8) is installed in the first placement groove (9), and the anode ring (1) is sleeved on the top edge of the inner magnetic pole (2); The inner shielding cover (4) is arranged between the inner magnetic pole (2) and the outer magnetic pole (3), and is coaxially arranged with the outer shielding cover (5); a plurality of permanent magnets (10) are arranged between the inner shielding cover (4) and the outer shielding cover (5); The air inlet pipe (7) passes through the bottom of the support flange (6) and the bottom of the inner magnetic pole (2), extends into the first placement groove (9) and is connected to the neutralizer (8); A first through hole (11) is provided in the middle of the top surface of the outer magnetic pole (3); the first through hole (11), the anode ring (1) and the first placement groove (9) are coaxially arranged.

3. A Hall ion source device according to claim 2, characterized in that: A second placement groove (12) is provided on the upper surface of the support flange (6), and the inner magnetic pole (2) and the outer shielding cover (5) are both placed in the second placement groove (12).

4. A Hall ion source device according to claim 2, characterized in that: The upper surface edge of the inner magnetic pole (2) is provided with a first card slot (13), the lower surface edge of the outer magnetic pole (3) is provided with a second card slot (14), the lower edge of the inner shielding cover (4) is placed in the first card slot (13), and the upper edge of the inner shielding cover (4) is placed in the second card slot (14).

5. A Hall ion source device according to claim 2, characterized in that: The top ends of the plurality of permanent magnets (10) are in contact with the lower surface of the outer magnetic pole (3), and the bottom ends of the plurality of permanent magnets (10) are in contact with the lower surface of the inner magnetic pole (2).

6. A Hall ion source device according to claim 3, characterized in that: Sealing rings are provided between the second placement groove (12) and the outer shielding cover (5), between the supporting flange (6) and the air inlet pipe (7), and between the inner magnetic pole (2) and the air inlet pipe (7).

7. A Hall ion source device according to claim 2, characterized in that: An air intake passage communicating with the second air intake port (806) is formed between the outer side wall of the shell (801) and the inner side wall of the first placement groove (9); the bottom plate (802) is fixedly connected to the inner side wall of the first placement groove (9); and an air intake cavity is formed between the bottom plate (802) and the bottom of the first placement groove (9); the air intake cavity is communicated with both the first air intake port (805) and the second air intake port (806).

8. A Hall ion source device according to claim 7, characterized in that: The air inlet pipe (7) passes through the bottom of the supporting flange (6) and the bottom of the inner magnetic pole (2), extends into the air inlet cavity and is in communication with the air inlet cavity.

9. A Hall ion source device according to claim 2, characterized in that: The anode ring (1) is provided with a second cooling channel (15), and the second cooling channel (15) is provided with a second cooling water inlet and a second cooling water outlet; The first cooling water inlet and the second cooling water inlet are both connected to the water inlet pipe, and the first cooling water outlet and the second cooling water outlet are both connected to the water outlet pipe.

10. The Hall ion source device according to claim 2, characterized in that: The outer magnetic pole (3) and the inner magnetic pole (2) are fixedly connected by bolts.

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