Auxiliary electrode, electrochemical device and reaction method

Abstract

The invention provides an auxiliary electrode, electrochemical equipment and a reaction method, the auxiliary electrode comprises a main board, the main board comprises a hollow area and a frame area arranged around the hollow area, and the hollow area is used for installing a workpiece to be reacted; the side plates are arranged on the two opposite side edges of the main plate, the side plates are movably connected with the main plate, so that the main plate and the side plates have a coplanar state and an included angle state, in the coplanar state, the plane where the main plate is located and the planes where the side plates are located are located on the same plane, and in the included angle state, the main plate and the side plates are located on the same plane. The plane where the main plate is located intersects with the plane where the side plate is located. According to the scheme, the uniformity of workpiece surface reaction can be effectively improved.

Description

TECHNICAL FIELD

[0001] The present application belongs to the technical field of electrochemistry, and particularly relates to an auxiliary electrode, an electrochemical device and a reaction method. BACKGROUND

[0002] At present, when a workpiece is processed by an electrochemical device, due to inevitable current edge effect, electric field lines are easily concentrated in the corner area of the electrode (i.e. the workpiece), so that the edge current density of the workpiece is large, and thus the service life of the workpiece and the stability of the electrode are affected. SUMMARY

[0003] In view of the above-mentioned defects of the prior art, the purpose of the present application is to provide an auxiliary electrode, an electrochemical device and a reaction method, which are used to solve the problem of uneven plating layer on the surface of a workpiece in the prior art.

[0004] To achieve the above-mentioned purpose and other related purposes, the present application provides an auxiliary electrode, comprising:

[0005] a main plate, the main plate comprising a hollow area and a frame area arranged around the hollow area, the hollow area being used to mount a workpiece to be reacted;

[0006] a side plate arranged on opposite sides of the main plate, the side plate being movably connected with the main plate, so that the main plate and the side plate have a coplanar state and an included angle state, in the coplanar state, the plane where the main plate is located and the plane where the side plate is located are located on the same plane, and in the included angle state, the plane where the main plate is located intersects with the plane where the side plate is located.

[0007] Optionally, the side plate and the main plate are rotatably connected through a rotating shaft, so that the side plate can rotate along the rotating shaft.

[0008] Optionally, the main plate is provided with a first mounting hole for mounting the rotating shaft, and the side plate is provided with a second mounting hole for mounting the rotating shaft, and the rotating shaft is in interference fit with the first mounting hole and the second mounting hole respectively.

[0009] Optionally, a plurality of through holes are formed in the frame area, and the through holes are uniformly distributed around the hollow area.

[0010] Optionally, the total area of the through holes accounts for 25% to 35% of the area of the frame area.

[0011] Optionally, in the included angle state, the side plate and the main plate form an included angle of 15° to 90°.

[0012] Optionally, the workpiece and the main plate are detachably connected.

[0013] To achieve the above object and other related objects, the present application provides an electrochemical device, comprising at least an electrochemical tank, an electrode plate, a clamp body and an auxiliary electrode, wherein the auxiliary electrode is installed on the clamp body and is arranged opposite to the electrode plate.

[0014] Optionally, in the angle state, the side plate of the auxiliary electrode faces the electrode plate.

[0015] Optionally, in the angle state, a spacing distance is arranged between the side plate of the auxiliary electrode and the electrode plate.

[0016] To achieve the above object and other related objects, the present application further provides an electrochemical reaction method applied to the above electrochemical device, wherein the method comprises:

[0017] pretreating the workpiece;

[0018] adjusting the spacing distance between the side plate and the electrode plate;

[0019] installing the workpiece in the hollow area of the auxiliary electrode, so that the workpiece acts as an electrode;

[0020] adjusting the angle between the side plate and the main plate on the auxiliary electrode; if the spacing distance between the side plate and the electrode plate is greater than 10mm and less than 20mm, and there is no recess area on the workpiece or the recess area is less than 30% of the overall area of the workpiece, then the angle between the side plate and the main plate on the auxiliary electrode is adjusted to 30°-45°; if the recess area on the workpiece is greater than or equal to 30% of the overall area of the workpiece, then the angle between the side plate and the main plate on the auxiliary electrode is adjusted to 60°-90°; if the spacing distance between the side plate and the electrode plate is greater than 20mm, then the angle between the side plate and the main plate on the auxiliary electrode is adjusted to 15°-30°;

[0021] powering on the electrochemical device to perform electrochemical reaction.

[0022] As described above, the auxiliary electrode, the electrochemical device and the reaction method of the present application have the following beneficial effects:

[0023] In use, the workpiece acts as an electrode, the workpiece is installed in the hollow area of the main plate, and then the angle between the side plate and the main plate is adjusted according to the process requirement, so that the electrochemical device can be used for electrochemical operation to form a plating layer on the surface of the workpiece.

[0024] In the present scheme, the setting of the auxiliary electrode makes the electric field lines concentrate on the auxiliary electrode when the current edge effect occurs. The setting of the side plate can play a role in consuming part of the current, which helps to further balance the current distribution on the surface of the workpiece. The side plate is movably connected with the main plate to facilitate adjustment of the angle between the main plate and the side plate. By adjusting the angle between the side plate and the main plate, the reaction rate of the electrolyte on both sides of the workpiece during electrochemistry is changed. BRIEF DESCRIPTION OF DRAWINGS

[0025] Figure 1 The auxiliary electrode structure in the embodiment of the present application is shown.

[0026] Figure 2 The structure of the electrochemical device in the embodiment of the present application is shown.

[0027] Figure 3 The flowchart of the electrochemical reaction method in the embodiment of the present application is shown. DETAILED DESCRIPTION

[0028] The reference signs in the drawings of the specification include: main plate 1, through hole 101, side plate 2, workpiece 3, rotating shaft 4, electrochemical tank 5, electrode plate 6, clamping body 7.

[0029] The following describes the embodiments of the present application by specific examples, and those skilled in the art can easily understand other advantages and effects of the present application from the content disclosed in the specification.

[0030] Referring to the drawings Figure 1 As shown in the drawings, in an exemplary embodiment of the present application, an auxiliary electrode is provided, comprising:

[0031] The main plate 1 includes a hollow area and a frame area arranged around the hollow area, and the hollow area is used to install the workpiece 3 to be reacted;

[0032] The side plate 2 is arranged on the opposite two sides of the main plate 1, and the side plate 2 is movably connected with the main plate 1, so that the main plate 1 and the side plate 2 have a coplanar state and an included angle state. In the coplanar state, the plane where the main plate 1 is located and the plane where the side plate 2 is located are on the same plane, and in the included angle state, the plane where the main plate 1 is located intersects with the plane where the side plate 2 is located.

[0033] In use, the workpiece 3 acts as an electrode, the workpiece 3 is installed to the hollow area of the main plate 1, and then the angle between the side plate 2 and the main plate 1 is adjusted according to the process requirement, and then the electrochemical device is used for electrochemical operation to form a reaction on the surface of the workpiece 3.

[0034] In the embodiment, the auxiliary electrode is arranged to concentrate the electric field lines on the auxiliary electrode when the current edge effect occurs. The side plate 2 is arranged to consume part of the current, which helps to further balance the current distribution on the surface of the workpiece 3. The side plate 2 is movably connected with the main plate 1 to facilitate adjustment of the angle between the main plate 1 and the side plate 2. The reaction rate of the electrolyte on both sides of the workpiece 3 in the electrochemical process is changed by adjusting the angle between the main plate 1 and the side plate 2.

[0035] Exemplarily, the auxiliary electrode is made of stainless steel or other metal materials, so that the auxiliary electrode is easy to clean and not easy to bend.

[0036] Exemplarily, the workpiece 3 can be in the shape of a sheet, a plate or other shapes.

[0037] In an exemplary embodiment, the side plate 2 is rotatably connected with the main plate 1 through the rotating shaft 4, so that the side plate 2 can rotate along the rotating shaft 4.

[0038] In the embodiment, the side plate 2 is rotated to switch the position between the coplanar state and the multiple included angle states with the main plate 1.

[0039] In an exemplary embodiment, the main plate 1 is provided with a first mounting hole for mounting the rotating shaft 4, and the side plate 2 is provided with a second mounting hole for mounting the rotating shaft 4, and the rotating shaft 4 is in interference fit with the first mounting hole and the second mounting hole, respectively.

[0040] It should be noted that the first mounting hole and the second mounting hole are arranged to realize the mounting of the rotating shaft 4. In order to keep the side plate 2 at the target angle after rotation, the rotating shaft 4 is in interference fit with the first mounting hole and the second mounting hole, respectively, so that there is a certain friction force between the rotating shaft 4 and the hole wall, thereby preventing the side plate 2 from changing the angle by itself under the action of water flow and the like after being adjusted to the corresponding angle.

[0041] In an exemplary embodiment, a plurality of through holes 101 are formed in the frame area, and the through holes 101 are uniformly distributed around the hollow area.

[0042] It should be noted that the through holes 101 are arranged to increase the specific surface area of the main plate 1, so that the main plate 1 can share a larger current.

[0043] In an exemplary embodiment, the total area of the through holes 101 accounts for 25% to 35% of the area of the frame area.

[0044] It should be noted that if the ratio between the total area of the through holes 101 and the area of the frame area is too large, the rigidity of the main plate 1 will be affected. If the ratio between the total area of the through holes 101 and the area of the frame area is too small, the current sharing of the main plate 1 will be affected. Therefore, in the embodiment, the total area of the through holes 101 accounts for 25% to 35% of the area of the frame area.

[0045] Exemplarily, the total area of the plurality of through holes 101 accounts for 25%, 30% or 35% of the area of the frame region, and the specific proportion can be set according to actual needs.

[0046] In an exemplary embodiment, in the angle state, the side plate 2 and the main plate 1 form an angle of 15°-90°.

[0047] It should be noted that, in order to make the workpiece 3 more uniform in reaction, the angle between the side plate 2 and the main plate 1 will be different when electrochemistry is performed on workpieces 3 of different specifications and shapes, and the angle between the side plate 2 and the main plate 1 can be adjusted according to actual needs.

[0048] Exemplarily, the side plate 2 and the main plate 1 form an angle of 30°, 60° or 90° to meet different needs.

[0049] In an exemplary embodiment, the workpiece 3 and the main plate 1 are detachably connected.

[0050] Exemplarily, the workpiece 3 and the main plate 1 are connected by bolts.

[0051] Exemplarily, the workpiece 3 is provided with mounting holes, and the bolts pass through the mounting holes on the workpiece 3 and the through holes 101 on the main plate 1 and are connected with nuts to achieve the connection between the workpiece 3 and the main plate 1.

[0052] Specifically, the number of connection points between the workpiece 3 and the main plate 1 can be set according to needs.

[0053] Exemplarily, the number of connection points between the workpiece 3 and the main plate 1 is set to adapt to the number of mounting holes on the workpiece 3 itself, so as to avoid increasing the processing cost of the workpiece 3.

[0054] Referring to FIG. 1, Figure 2 As shown in the accompanying drawings, in an exemplary embodiment of the present application, an electrochemical device is provided, which at least includes an electrochemical tank 5, an electrode plate 6, a clamp body 7 and an auxiliary electrode, the auxiliary electrode is installed on the clamp body 7 and is oppositely arranged with the electrode plate 6. In an embodiment, the electrode plate 6 may, for example, be an anode plate.

[0055] As Figure 2 shown in the accompanying drawings, in the present embodiment, the auxiliary electrode is fixedly installed on the clamp body 7, the workpiece 3 is installed on the auxiliary electrode, and then electrochemical operation can be performed to realize electrochemistry on the surface of the workpiece 3. It should be noted that, in the accompanying drawings, the main plate 1 and the side plate 2 present a 90° angle state. Figure 2

[0056] In an exemplary embodiment, in the angle state, the side plate 2 of the auxiliary electrode faces the electrode plate 6.

[0057] ​It should be noted that when the distance between the electrode plate 6 and the auxiliary electrode is fixed, if the side plate 2 is rotated in a direction away from the electrode plate 6, the occupied space in the electrochemical cell 5 will increase compared to rotating the side plate 2 toward the electrode plate 6. Therefore, in this application, the side plate 2 of the auxiliary electrode is arranged toward the electrode plate 6.

[0058] In an exemplary embodiment, in the angled state, a spacing distance is provided between the side plate 2 of the auxiliary electrode and the electrode plate 6 .

[0059] It should be noted that, in order to avoid the electrode plate 6 and the auxiliary electrode from being connected to form a current path, there is always a spacing between the side plate 2 of the auxiliary electrode and the electrode plate 6 .

[0060] Exemplarily, the electrode plate 6 and the main plate 1 are arranged in parallel, the distance between them is L, the length of the side plate 2 is K, and the spacing between the side plate 2 and the electrode plate 6 is M, then L=K+M.

[0061] It should be noted that as the rotation angle of the side plate 2 changes, the spacing between the side plate 2 and the electrode plate 6 will change. Therefore, the minimum spacing between the side plate 2 and the electrode plate 6 needs to be greater than a preset value.

[0062] Exemplarily, the preset value of the minimum spacing distance is greater than or equal to 10 mm.

[0063] The electrochemical device of the present application may be, for example, an electrochemical analyzer, an electrochemical processing device, an electrochemical deposition device, an electrolysis device, or other electrochemical devices.

[0064] like Figure 3 As shown, in an exemplary embodiment of the present application, an electrochemical reaction method is further provided, which is applied to the above-mentioned electrochemical device. The method at least includes steps S110 to S130.

[0065] Step S110 , pre-processing the workpiece 3 .

[0066] Exemplarily, the pretreatment process for the workpiece 3 includes: placing the workpiece 3 in a liquid reservoir, then pouring alcohol into the reservoir until the alcohol completely covers the workpiece 3, thereby cleaning and disinfecting the workpiece 3 and improving the adhesion of the workpiece 3. After soaking in alcohol for 5-10 minutes, the workpiece 3 is turned over and soaked for another 5-10 minutes. Finally, the workpiece is rinsed with pure water for 3-5 minutes and then drained.

[0067] Exemplarily, the liquid storage box is made of polypropylene.

[0068] Exemplarily, the alcohol concentration is 95% to increase the disinfection effect.

[0069] For example, the time for soaking the workpiece 3 in alcohol can be 5 minutes, 6 minutes, 8 minutes or 10 minutes, and the specific soaking time can be determined according to the surface condition of the workpiece 3.

[0070] For example, before the workpiece 3 is placed in the liquid storage box, the workpiece 3 can also be mechanically polished, polished, chemically etched, laser treated, etc. to increase the adhesion of the workpiece.

[0071] Step S120, adjust the spacing distance between the side plate 2 and the electrode plate 6.

[0072] It should be noted that the minimum distance between the side plate 2 and the electrode plate 6 must be greater than 10 mm to avoid current conduction.

[0073] Step S130, install the workpiece 3 in the hollow area of the auxiliary electrode, so that the workpiece 3 acts as an electrode.

[0074] For example, the workpiece 3 can be fixed in the hollow area by a bolt or other fixing method.

[0075] Step S140, adjust the included angle between the side plate 2 on the auxiliary electrode and the main plate 1; wherein if the spacing distance between the side plate 2 and the electrode plate 6 is greater than 10 mm and less than 20 mm, and there is no recess area on the workpiece 3 or the recess area is less than 30% of the overall area of the workpiece, the included angle between the side plate 2 on the auxiliary electrode and the main plate 1 is adjusted to 30°-45°; if the recess area on the workpiece 3 is greater than or equal to 30% of the overall area of the workpiece, the included angle between the side plate 2 on the auxiliary electrode and the main plate 1 is adjusted to 60°-90°; if the spacing distance between the side plate 2 and the electrode plate 6 is greater than 20 mm, the included angle between the side plate 2 on the auxiliary electrode and the main plate 1 is adjusted to 15°-30°.

[0076] For example, the angle between the side plate 2 and the main plate 1 can be adjusted to 15°, 20°, 30°, 40°, 45°, 60°, 66° or 90° as needed.

[0077] It should be noted that the angle between the main plate 1 and the side plate 2 can be adjusted according to actual needs, and the current distribution can be adjusted after adjusting the angle to improve the service life of the auxiliary electrode.

[0078] It is also to be noted that if the distance between the side plate and the electrode plate is greater than 10 mm and less than 20 mm, and there is no recessed area on the workpiece or the recessed area is less than 30% of the overall area of the workpiece, the angle between the side plate 2 and the main plate 1 on the auxiliary electrode is adjusted to 30°-45°, so that the side plate 2 and the main plate 1 are close to coplanar, the effective surface area of the auxiliary electrode is increased, more edge current is shared, and overplating of the edge of the workpiece 3 is avoided. If the recessed area on the workpiece 3 is greater than or equal to 30% of the overall area of the workpiece 3, the angle between the side plate 2 and the main plate 1 on the auxiliary electrode is adjusted to 60°-90°, and the large-angle inclined side plate (such as 90°) can form a "shielding effect", forcing the electric field lines to detour to the recessed area of the workpiece, thereby improving the plating coverage of the inner wall of the deep hole. If the distance between the side plate 2 and the electrode plate 6 is greater than 20 mm, the angle between the side plate 2 and the main plate 1 on the auxiliary electrode is adjusted to 15°-30°, so that the side plate 2 and the main plate 1 form a continuous conductive surface, the current carrying capacity of the auxiliary electrode is expanded, and the edge of the workpiece 3 is prevented from being burned under high current. In combination with the area ratio of the through hole 101 (such as the area ratio of the through hole 101 being 30%), the circulation of the electrolyte in the frame area is accelerated, and the concentration difference is avoided.

[0079] Illustratively, the recessed area on the workpiece 3 refers to the holes, cavities or other complex geometric structure parts on the workpiece 3.

[0080] In step S150, the electrochemical equipment is powered on to perform an electrochemical reaction.

[0081] It is emphasized that before power-on, the circuit connection should be checked to ensure smooth reaction.

[0082] Illustratively, after the workpiece is produced, the auxiliary electrode is subjected to acid spraying and polishing treatment. A dilute sulfuric acid solution is sprayed on the surface of the auxiliary cathode, and the surface is preliminarily polished with 400-600 mesh sandpaper to remove burrs and oxide layers.

[0083] In this embodiment, the workpiece 3 is arranged in the hollow area at the middle position of the auxiliary electrode, which can increase the uniformity of the reaction on the surface of the workpiece 3. By arranging the auxiliary electrode, the influence of the current edge effect on the workpiece 3 during the reaction process can be avoided. By changing the angle between the main plate 1 and the side plate 2 on the auxiliary electrode, the current concentration position during the reaction process can be changed, and the service life of the auxiliary electrode can be increased.

[0084] The electrochemical equipment of the present application can be applied, for example, to an electrolytic cell, an electrodeposition device, an electrochemical synthesis reactor, an electrochemical water treatment system, a wastewater treatment device or other electrochemical equipment / system.

[0085] The above embodiments are only illustrative of the principles of the present application and its efficacy, and are not intended to limit the present application. Any modification or change made by any person skilled in the art without departing from the spirit and scope of the present application shall be covered by the claims of the present application.

Claims

1. An auxiliary electrode, characterized in that: include: A mainboard, the mainboard comprising a hollow area and a frame area arranged around the hollow area, the hollow area being used for mounting a workpiece to be reacted; The side panels are arranged on the opposite side edges of the main board, and the side panels are movably connected to the main board so that the main board and the side panels have a coplanar state and an angled state. In the coplanar state, the plane of the main board and the plane of the side panels are located on the same plane. In the angled state, the plane of the main board and the plane of the side panels intersect.

2. The auxiliary electrode according to claim 1, wherein: The side panels are rotatably connected to the main panel via a rotating shaft, so that the side panels can rotate along the rotating shaft.

3. The auxiliary electrode according to claim 2, characterized in that The main board is provided with a first mounting hole for mounting the rotating shaft, and the side panel is provided with a second mounting hole for mounting the rotating shaft. The rotating shaft is interference-fitted with the first mounting hole and the second mounting hole respectively.

4. The auxiliary electrode according to claim 1, wherein: A plurality of through holes are formed on the frame area, and the through holes are distributed around the hollow area.

5. The auxiliary electrode according to claim 4, characterized in that The total area of ​​the through holes accounts for 25% to 35% of the area of ​​the frame region.

6. The auxiliary electrode according to any one of claims 1 to 5, characterized in that In the angled state, an angle of 15° to 90° is formed between the side panel and the main panel.

7. The auxiliary electrode according to claim 4, characterized in that The workpiece and the main board are detachably connected.

8. An electrochemical device, characterized in that The device comprises at least an electrochemical cell, an electrode plate, a clamp body and the auxiliary electrode according to any one of claims 1 to 7, wherein the auxiliary electrode is mounted on the clamp body and arranged opposite to the electrode plate.

9. The electrochemical device according to claim 8, characterized in that In the angled state, the side plate of the auxiliary electrode faces the electrode plate, and a spacing is provided between the side plate of the auxiliary electrode and the electrode plate.

10. An electrochemical reaction method, characterized in that: Applied to the electrochemical device according to claim 8 or 9, the method comprises: Pre-process the workpiece; Adjust the distance between the side plate and the electrode plate; The workpiece is mounted on the hollow area of ​​the auxiliary electrode so that the workpiece acts as an electrode; Adjust the angle between the side plate and the main plate on the auxiliary electrode; if the spacing between the side plate and the electrode plate is greater than 10 mm and less than 20 mm, and there is no recessed area on the workpiece or the recessed area is less than 30% of the overall area of ​​the workpiece, adjust the angle between the side plate and the main plate on the auxiliary electrode to 30° to 45°; if the recessed area on the workpiece is greater than or equal to 30% of the overall area of ​​the workpiece, adjust the angle between the side plate and the main plate on the auxiliary electrode to 60° to 90°; if the spacing between the side plate and the electrode plate is greater than 20 mm, adjust the angle between the side plate and the main plate on the auxiliary electrode to 15° to 30°; The electrochemical device is energized to perform an electrochemical reaction.

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