Drum-type vacuum plasma cleaning machine

By designing a drum-type vacuum plasma cleaner, the rotation of the cylindrical screen and side plates, combined with the movement of the flexible strips and cleaning rings, solves the problems of uneven material cleaning and incomplete dust removal in traditional drum-type cleaners, achieving a more efficient cleaning effect.

CN120828037AActive Publication Date: 2025-10-24SHENZHEN DONGXIN HI-TECH AUTOMATION EQUIP CO

Patent Information

Application Number
CN202511341942.0
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-09-19
Publication Date
2025-10-24
Estimated Expiration
2045-09-19

AI Technical Summary

Technical Problem

Traditional drum-type plasma cleaners struggle to achieve uniform cleaning of flat and complex materials, and are unable to effectively remove internal dust, thus affecting processing efficiency.

Method used

A drum-type vacuum plasma cleaner was designed. By rotating the cylindrical screen and side plates, combined with the movements of the flexible strips, cleaning rings, and slides, the material is tumbled and shaken, enhancing the uniformity of cleaning. The cleaning rings and flexible strips work together to remove dust and prevent clogging.

Benefits of technology

It improves the uniformity and efficiency of plasma cleaning of materials, ensures effective removal of dust inside the materials, avoids additional dust removal steps, and improves processing efficiency.

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Abstract

The invention relates to the technical field of plasma cleaning, in particular to a drum type vacuum plasma cleaning machine which comprises a shell, the interior of the shell is a sealed environment, a cleaning cavity is rotatably installed in the shell, and a drum assembly is rotatably installed in the cleaning cavity. The roller assembly comprises a cylinder screen, a second side plate, two supporting rings and a plurality of first side plates. The first side plate and the second side plate rotate along with the drum screen, so that materials roll over when the drum screen rotates, the plasma cleaning uniformity is improved, meanwhile, the materials roll over to impact the drum screen, dust on the side wall of the drum screen is cleaned, and the cleaning efficiency is improved through the continuous switching state of the cleaning cavity. And the rolling frequency and strength of the materials in the drum screen are improved, and the uniformity of plasma cleaning is further improved. The materials are thrown upwards through rotation of the flexible strips, the collision force between the materials and between the materials and the drum screen is increased, and cleaning of dust in the drum screen and dust on the outer surfaces of the materials is further improved.
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Description

TECHNICAL FIELD

[0001] The present application relates to the technical field of plasma cleaning, in particular to a drum type vacuum plasma cleaning machine. BACKGROUND

[0002] In traditional industrial production, various pollutants such as oil, oxide and dust often exist on the surface of materials, which can seriously affect the quality of subsequent processes, for example, reduce the bonding strength of materials and affect the uniformity of coatings. In order to solve these problems, plasma cleaning technology has gradually developed. Plasma cleaning has the advantages of good cleaning effect, no residue and environmental friendliness. However, in actual production, many workpieces to be cleaned have complex shapes and various sizes, making it difficult for traditional flat plasma cleaning equipment to meet the needs of uniform cleaning. The drum type plasma cleaning machine is developed on the basis of plasma cleaning technology. The drum type design has unique advantages. The drum type design can make the workpieces continuously tumble in the drum, thereby ensuring that each surface of each workpiece can be fully exposed to the plasma. However, during use, the tumbling effect of flat and complex structure materials inside the drum is poor, making it difficult for the drum to effectively tumble the materials inside it. This results in uneven cleaning of flat and complex structure materials, and when cleaning complex structure materials, the dust inside the materials cannot be discharged, requiring the materials to be removed for dust removal treatment, increasing the working steps and affecting the processing efficiency. SUMMARY

[0003] The present application aims to solve the problems in the background art and provides a drum type vacuum plasma cleaning machine.

[0004] To achieve the above-mentioned purpose, the present application adopts the following technical scheme: A drum type vacuum plasma cleaning machine, comprising a shell, the inside of the shell is a sealed environment, a cleaning cavity is rotatably installed inside the shell, a drum assembly is rotatably installed inside the cleaning cavity, the drum assembly comprises a cylindrical screen, a side plate two, two support rings and a plurality of side plates one, the two support rings are fixedly installed on both sides of the cylindrical screen, the plurality of side plates one and the side plate two are evenly distributed in the inside of the cylindrical screen in a circular manner, and the height of the side plate two is greater than the height of the side plate one. An electrode rod is fixedly installed on the side wall of the plasma device, a cleaning assembly is movably installed on the outside of the electrode rod, the cleaning assembly comprises a sliding frame one, a sliding frame two, a cleaning ring and a sliding ring, the sliding frame one and the sliding frame two are slidably installed on the outside of the electrode rod, the cleaning ring and the sliding ring are movably installed on the outside of the electrode rod, the cleaning ring and the sliding ring are rotatably connected, and the sliding ring is rotatably sleeved on the outside of the sliding frame one.

[0005] In the above-mentioned drum-type vacuum plasma cleaning machine, a rotating shaft and four limiting wheels are rotatably installed inside the cleaning chamber, one of the limiting wheels is fixedly installed on the outside of the rotating shaft, and the limiting wheels are evenly distributed on the outside of the support ring. Gear 2 is fixedly installed on the side wall of one of the support rings, and gear 3 is fixedly installed on the side wall of the rotating shaft. Gear 2 and gear 3 are meshed with each other, and motor 1 is fixedly installed inside the shell, and belt 3 is provided between the output shaft of motor 1 and the rotating shaft.

[0006] In the above-mentioned drum-type vacuum plasma cleaning machine, a driving chamber is fixedly installed inside the shell, an electric push rod is fixedly installed outside the driving chamber, the output end of the electric push rod is fixedly connected to a rack, and a gear 1 is fixedly installed on the side wall of the cleaning chamber. The rack and gear 1 are both located inside the driving chamber, and the rack and gear 1 are meshed with each other.

[0007] In the above-mentioned drum-type vacuum plasma cleaning machine, a sealing cover is rotatably installed on the side wall of the shell, the sealing cover corresponds to the cleaning chamber, an observation tube is fixedly installed inside the sealing cover, the observation tube corresponds to the cylindrical screen, a dust collecting plate is provided inside the cleaning chamber, the dust collecting plate is located below the cylindrical screen, and a vacuum detector is fixedly installed on the side wall of the cleaning chamber.

[0008] In the above-mentioned drum-type vacuum plasma cleaning machine, a number of evenly distributed flexible strips are rotatably installed between slide one and slide two, and a number of evenly distributed rollers are rotatably installed on the side walls of slide one and slide two. Belt one is sleeved between the rollers on one side wall of the slide and the flexible strip, and belt two is sleeved between the rollers on the side wall of slide two and the flexible strip.

[0009] In the above-mentioned drum-type vacuum plasma cleaning machine, the roller on one side wall of the slide and the inner wall of the slip ring are in conflict with each other, and a groove is provided on the outer peripheral wall of the slip ring. The groove is slidably installed on the outer side of side plate one and side plate two, and the roller on the side wall of slide two and the inner wall of the cylindrical screen are in conflict with each other.

[0010] In the above-mentioned drum-type vacuum plasma cleaning machine, a dust cover is fixedly installed on the side wall of the electrode rod close to the plasma device, the dust cover and the slide are in conflict with each other, a spring is provided between the inner side of the dust cover and the side wall of the cleaning ring, a counterweight is fixedly installed on the side wall of the cleaning ring, and a number of evenly distributed balls are provided between the cleaning ring and the electrode rod.

[0011] In the above-mentioned drum-type vacuum plasma cleaning machine, two evenly distributed semicircular brushes are fixedly installed on the outer side of the cleaning ring, a spring top block is movably installed between the two semicircular brushes, the spring top block abuts against the side plate two, and the semicircular brush abuts against the cylindrical screen.

[0012] Compared with the prior art, the present application has the following advantages: 1. The cooperation between the cleaning cavity and the cylindrical screen enables the cylindrical screen to drive the side plate one and the side plate two to rotate during plasma cleaning, so that the material rolls in the process of rotation of the cylindrical screen, improving the uniformity of plasma cleaning of the material, and the rolling of the material impacts the cylindrical screen, thereby cleaning the dust on the side wall of the cylindrical screen.

[0013] 2. The cooperation between the flexible strip and the cylindrical screen enables the flexible strip to rotate in the same direction as the cylindrical screen during rotation of the cylindrical screen, so that the flexible strip throws the material upward, increasing the rolling height of the material and improving the impact force between the material and the cylindrical screen, thereby further improving the cleaning of dust inside the cylindrical screen and dust on the surface of the material.

[0014] 3. The cooperation between the cleaning ring and the sliding carriage one enables the cleaning ring to rotate with the cylindrical screen when the side plate two abuts against the spring top block during rotation of the cylindrical screen, so that the cleaning ring pulls the topmost and bottommost flexible strips, and the sliding carriage one moves towards the sliding carriage two, at this time, the rotation range of the remaining flexible strips increases, when the topmost and bottommost flexible strips are taut, the spring top block retracts, the cleaning ring returns to the original position through the torsion spring, and the sliding carriage one returns to the original position through the spring one, the intermittent rotation of the cleaning ring increases the rotation range of the flexible strips intermittently, improves the coverage range of the flexible strips and the rolling height of the material, and further improves the uniformity of plasma cleaning of the material.

[0015] 4、The application is through the cooperation between the cleaning ring and the flexible strip, when the cleaning cavity is switched from horizontal to vertical, the cleaning ring drives the first slide to move to the second slide, at this time, the flexible strip moves and twists with the cleaning ring, through the twisting of the flexible strip, the material is evenly distributed on the side wall of the second slide, improving the uniformity of the material plasma cleaning, when the cleaning cavity is switched from vertical to horizontal, the cleaning ring drives the first slide to return, the first slide pulls the flexible strip, through the movement of the flexible strip, the material is evenly distributed in the internal of the cylinder screen, improving the uniformity and efficiency of the material plasma cleaning, at this time, the cleaning ring is reversed through the torsion spring and the pulling of the flexible strip, the internal wall of the cylinder screen is cleaned through the cleaning ring, the dust on the side wall of the cylinder screen is discharged, avoiding the blockage of the cylinder screen, improving the cleanliness of the internal of the cylinder screen. BRIEF DESCRIPTION OF DRAWINGS

[0016] Figure 1 It is a three-dimensional structure schematic diagram of the application; Figure 2 It is a structure schematic diagram of the cleaning cavity in the application; Figure 3 It is a structure sectional view of the cleaning cavity in the application; Figure 4 It is an enlarged schematic diagram of A in the application; Figure 3 Figure 5 It is an enlarged schematic diagram of B in the application; Figure 3 Figure 6 It is a structure schematic diagram of the internal of the cleaning cavity in the application; Figure 7 It is a structure sectional view of the cylinder screen in the application; Figure 8 It is a structure schematic diagram of the cleaning assembly in the application; Figure 9 It is a structure schematic diagram of the flexible strip in the application; Figure 10 It is a disassembly schematic diagram of the cleaning ring, the first slide and the sliding ring in the application.

[0017] ​​In the figure: 1, the shell; 11, sealing cover; 12, observation cylinder; 13, drive cavity; 131, gear one; 132, rack; 133, electric push rod; 14, vacuum detector; 15, cleaning cavity; 151, dust collection plate; 152, gear two; 153, cylindrical screen; 154, support ring; 155, side plate one; 156, side plate two; 161, motor one; 162, rotating shaft; 163, limit wheel; 164, gear three; 165, belt three; 21, plasma device; 211, dust cover; 212, spring one; 213, electrode rod; 22, flexible strip; 221, slide one; 222, slide two; 223, roller; 224, belt one; 225, belt two; 23, cleaning ring; 231, slip ring; 232, counterweight; 233, ball; 234, spring top block; 235, semicircular brush; 236, clamping groove. DETAILED DESCRIPTION

[0018] The technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the drawings in the embodiments of the present application. Obviously, the described embodiments are only some of the embodiments of the present application, not all the embodiments of the present application.

[0019] In the description of the present application, it should be understood that the terms "upper", "lower", "front", "back", "left", "right", "top", "bottom", "inner", "outer" and the like indicate the orientation or positional relationship based on the orientation or positional relationship shown in the drawings, and are only for the convenience of describing the present application and simplifying the description, and do not indicate or imply that the device or element referred to must have a particular orientation, be constructed and operated in a particular orientation, and therefore cannot be understood as a limitation of the present application.

[0020] Reference Figure 1 - Figure 10 As shown in the figure, a drum-type vacuum plasma cleaning machine includes a shell 1, the inside of the shell 1 is a sealed environment, a cleaning cavity 15 is rotatably installed inside the shell 1, a drum assembly is rotatably installed inside the cleaning cavity 15, the drum assembly includes a cylindrical screen 153, a side plate two 156, two support rings 154 and a plurality of side plates one 155, the two support rings 154 are fixedly installed on both sides of the cylindrical screen 153, the plurality of side plates one 155 and the side plate two 156 are evenly distributed in the inside of the cylindrical screen 153 in a circular manner, the height of the side plate two 156 is greater than the height of the side plate one 155; The inside of the cleaning cavity 15 is fixedly installed with a plasma device 21, the side wall of the plasma device 21 is fixedly installed with an electrode stick 213, the outer side of the electrode stick 213 is movably installed with a cleaning assembly, the cleaning assembly comprises a sliding frame one 221, a sliding frame two 222, a cleaning ring 23 and a sliding ring 231, the sliding frame one 221 and the sliding frame two 222 are slidingly installed on the outer side of the electrode stick 213, the cleaning ring 23 and the sliding ring 231 are movably installed on the outer side of the electrode stick 213, the cleaning ring 23 and the sliding ring 231 are rotatably connected, and the sliding ring 231 is rotatably sleeved on the outer side of the sliding frame one 221.

[0021] As shown in Figure 2 and Figure 3 , the side wall of the shell 1 is rotatably installed with a sealing cover 11, the sealing cover 11 corresponds to the cleaning cavity 15, the inside of the sealing cover 11 is fixedly installed with a viewing cylinder 12, the viewing cylinder 12 corresponds to the cylindrical sieve 153, the inside of the cleaning cavity 15 is provided with a dust collecting plate 151, the dust collecting plate 151 is located below the cylindrical sieve 153, and the side wall of the cleaning cavity 15 is fixedly installed with a vacuum detector 14.

[0022] Among them, after the material is filled into the inside of the cylindrical sieve 153, the sealing cover 11 is closed, at this time the vacuum device in the shell 1 performs vacuumizing treatment on the inside of the shell 1, after the vacuum detector 14 responds, the plasma device 21 starts, and the material is plasma cleaned in the inside of the cleaning cavity 15.

[0023] As shown in Figure 3 and Figure 6 , the inside of the cleaning cavity 15 is rotatably installed with a rotating shaft 162 and four limiting wheels 163, one of the limiting wheels 163 is fixedly installed on the outer side of the rotating shaft 162, the limiting wheels 163 are uniformly distributed on the outer side of the supporting ring 154, the side wall of one of the supporting rings 154 is fixedly installed with a gear two 152, the side wall of the rotating shaft 162 is fixedly installed with a gear three 164, the gear two 152 and the gear three 164 are engaged, the inside of the shell 1 is fixedly installed with a motor one 161, the output shaft of the motor one 161 and the rotating shaft 162 are provided with a belt three 165, the inside of the shell 1 is fixedly installed with a driving cavity 13, the outer side of the driving cavity 13 is fixedly installed with an electric push rod 133, the output end of the electric push rod 133 is fixedly connected with a rack 132, the side wall of the cleaning cavity 15 is fixedly installed with a gear one 131, the rack 132 and the gear one 131 are located in the inside of the driving cavity 13, and the rack 132 and the gear one 131 are engaged.

[0024] Wherein, in the process of plasma cleaning, the electric push rod 133 and the electric motor one 161 are started, the electric motor one 161 drives the rotating shaft 162 to rotate, the rotating shaft 162 drives the support ring 154 and the cylindrical screen 153 to rotate through the gear two 152 and the gear three 164, the cylindrical screen 153 drives the side plate one 155 and the side plate two 156 to rotate, the side plate one 155 and the side plate two 156 rotate with the cylindrical screen 153, so that the material rolls in the process of the rotation of the cylindrical screen 153, improves the uniformity of the material plasma cleaning, at the same time, the rolling of the material collides with the cylindrical screen 153, so as to clean the dust on the side wall of the cylindrical screen 153, the electric push rod 133 continuously pushes the rack 132, so that the rack 132 continuously reciprocates, and the cleaning cavity 15 is driven to continuously change from horizontal to vertical through the gear one 131, in the process of the continuous change of the cleaning cavity 15 from horizontal to vertical, the material in the cylindrical screen 153 rolls and shakes, through the continuous change of the cleaning cavity 15, the frequency and intensity of the rolling of the material in the cylindrical screen 153 are improved, and the uniformity of the material plasma cleaning is further improved.

[0025] As shown in Figure 3 , Figure 8 and Figure 9 , a plurality of flexible strips 22 are uniformly distributed and rotationally installed between the sliding frame one 221 and the sliding frame two 222, a plurality of evenly distributed rollers 223 are rotationally installed on the side walls of the sliding frame one 221 and the sliding frame two 222, the rollers 223 on the side wall of the sliding frame one 221 are sleeved with the belt one 224 between the flexible strips 22, and the rollers 223 on the side wall of the sliding frame two 222 are sleeved with the belt two 225 between the flexible strips 22.

[0026] As shown in Figure 3 , Figure 5 and Figure 8 , the rollers 223 on the side wall of the sliding frame one 221 abut against the inner wall of the slip ring 231, the outer peripheral wall of the slip ring 231 is provided with a clamping groove 236, the clamping groove 236 is slidingly installed on the outer side of the side plate one 155 and the side plate two 156, and the rollers 223 on the side wall of the sliding frame two 222 abut against the inner wall of the cylindrical screen 153.

[0027] Wherein, in the process of the rotation of the cylindrical screen 153, the slip ring 231 rotates with the cylindrical screen 153, so that the rollers 223 on the side wall of the sliding frame one 221 rotate, the rollers 223 on the side wall of the sliding frame two 222 rotate through the rotation of the cylindrical screen 153, through the rotation of the rollers 223 on the side wall of the sliding frame one 221 and the sliding frame two 222, the flexible strips 22 rotate in the same direction as the cylindrical screen 153, through the rotation of the flexible strips 22, the material is thrown upward, the height of the rolling of the material is increased, the intensity of the collision between the material and the cylindrical screen 153 is improved, so as to further clean the dust in the cylindrical screen 153 and the dust on the surface of the material.

[0028] As Figure 5 , Figure 8 and Figure 10 shown, the outer side of the cleaning ring 23 is fixedly installed with two evenly distributed semicircular brushes 235, and a spring pressing block 234 is movably installed between the two semicircular brushes 235, the spring pressing block 234 abuts against the side plate two 156, and the semicircular brushes 235 abut against the cylindrical screen 153.

[0029] As Figure 3 , Figure 4 and Figure 8 shown, the dust cover 211 is fixedly installed on the side wall of the electrode rod 213 close to the plasma device 21, the dust cover 211 abuts against the sliding frame two 222, a spring one 212 is arranged between the inner side of the dust cover 211 and the side wall of the cleaning ring 23, the side wall of the cleaning ring 23 is fixedly installed with a counterweight 232, and a plurality of evenly distributed rolling balls 233 are arranged between the cleaning ring 23 and the electrode rod 213.

[0030] Among them, the rotating connection between the cleaning ring 23 and the sliding frame one 221 is provided with a torsion spring, in the process of rotating the cylindrical screen 153, when the side plate two 156 abuts against the spring pressing block 234, the cleaning ring 23 rotates with the cylindrical screen 153, the cleaning ring 23 pulls the topmost and bottommost flexible strips 22, the sliding frame one 221 drives the cleaning ring 23 and the sliding ring 231 to move to the sliding frame two 222, so that the rotation range of the remaining several flexible strips 22 is increased, when the topmost and bottommost flexible strips 22 are taut, the spring pressing block 234 retracts and moves away from the side plate two 156, then the cleaning ring 23 is returned to the original position through the torsion spring, the sliding frame one 221 and the sliding ring 231 are returned to the original position through the spring one 212, and the rotation range of the flexible strips 22 is intermittently increased through the intermittent rotation of the cleaning ring 23, so that the coverage range of the flexible strips 22 and the material tumbling height are improved, and the uniformity of the material plasma cleaning is further improved.

[0031] Further referring to Figure 3 and Figure 8It is explained that in the process of continuously switching the horizontal and vertical of the cleaning cavity 15, when the cleaning cavity 15 is switched from horizontal to vertical, the cleaning ring 23 drives the sliding block one 221 and the sliding ring 231 to move to the sliding block two 222 through the counterweight 232, at this time the cleaning ring 23 pulls the flexible strip 22, so that the flexible strip 22 twists with the cylinder sieve 153, through the twisting of the flexible strip 22, the material is uniformly distributed on the side wall of the sliding block two 222, improving the uniformity of the material plasma cleaning, when the cleaning cavity 15 is switched from vertical to horizontal, the spring one 212 is released, the cleaning ring 23 drives the sliding block one 221 and the sliding ring 231 to return to the original position, when the sliding block one 221 returns to the original position, the sliding block one 221 pulls the flexible strip 22, so that the flexible strip 22 moves rapidly with the material, through the movement of the flexible strip 22, the material is quickly and uniformly distributed in the inside of the cylinder sieve 153, improving the uniformity and efficiency of the material plasma cleaning, at this time the cleaning ring 23 is reversed through the pulling of the torsion spring and the flexible strip 22, so that the cleaning ring 23 is reversed in the process of returning to the original position, through the cleaning ring 23 cleaning the inner wall of the cylinder sieve 153, the dust on the side wall of the cylinder sieve 153 is discharged, avoiding the cylinder sieve 153 from being blocked, improving the cleanliness of the inside of the cylinder sieve 153.

[0032] The specific working principle and use method of the present invention are explained in detail below: after the material is filled into the interior of the cylindrical screen 153, the vacuum device evacuates the interior of the shell 1, and after the vacuum detector 14 responds, the plasma device 21, the electric push rod 133 and the motor 161 are started, and the motor 161 drives the cylindrical screen 153 to rotate, and the cylindrical screen 153 drives the side plate 155 and the side plate 2 156 to rotate, and the side plate 155 and the side plate 2 156 follow the cylindrical screen 153 to rotate, so that the material rolls during the rotation of the cylindrical screen 153, thereby improving the uniformity of the plasma cleaning of the material, and at the same time, the rolling of the material hits the cylindrical screen 153, thereby cleaning the dust on the side wall of the cylindrical screen 153, and During the rotation of 153, the side wall rollers 223 of slide 1 221 and slide 2 222 rotate, causing the flexible strip 22 to rotate in the same direction as the cylindrical screen 153. The material is thrown upward by the rotation of the flexible strip 22, increasing the height of the material rolling and increasing the collision force between the materials and between the materials and the cylindrical screen 153, thereby further improving the cleaning of the dust inside the cylindrical screen 153 and the dust on the surface of the material. When the side plate 2 156 contacts the spring top block 234, the cleaning ring 23 rotates with the cylindrical screen 153 and pulls the top and bottom flexible strips 22. The slide 1 221 moves toward the slide 2 222, increasing the rotation range of the remaining flexible strips 22. When the top and bottom flexible strips 22 are tightened, the cleaning ring 23 is returned to its original position by the torsion spring, and the slide 1 221 and the slip ring 231 are returned to their original position by the spring 1 212. The intermittent rotation of the cleaning ring 23 increases the rotation range of the flexible strip 22 intermittently, thereby increasing the coverage range of the flexible strip 22 and the height of the material rolling, and further improving the uniformity of the plasma cleaning of the material. The electric push rod 133 drives the cleaning chamber 15 to be continuously horizontally and vertically positioned, so that the material inside the cylindrical screen 153 rolls and shakes. The state of the continuous switching of the cleaning chamber 15 increases the frequency and strength of the material rolling inside the cylindrical screen 153, and further improves the uniformity of the plasma cleaning of the material. When the cleaning chamber 15 is switched from horizontal to vertical, the cleaning ring 23 drives the slide 1 221 and the slip ring 231 to the slide 2 through the counterweight block 232. 222 moves, at this time the cleaning ring 23 pulls the flexible strip 22, so that the flexible strip 22 twists along with the cylindrical screen 153, and the twisting of the flexible strip 22 makes the material evenly distributed on the side wall of the slide 222, thereby improving the uniformity of the plasma cleaning of the material. When the cleaning chamber 15 switches from vertical to horizontal, the spring 1 212 is released, and the cleaning ring 23 drives the slide 1 221 and the slip ring 231 to return to their positions. When the slide 1 221 returns to its position, the slide 1 221 pulls the flexible strip 22, so that the flexible strip 22 drives the material to move quickly. Through the movement of the flexible strip 22, the material is quickly and evenly distributed inside the cylindrical screen 153, thereby improving the uniformity and efficiency of the plasma cleaning of the material. At this time, the cleaning ring 23 is reversed by the pulling of the torsion spring and the flexible strip 22.The cleaning ring 23 is reversed during homing, the inner wall of the cylindrical screen 153 is cleaned by the cleaning ring 23, the dust on the side wall of the cylindrical screen 153 is discharged, the cylindrical screen 153 is prevented from being blocked, and the cleanliness inside the cylindrical screen 153 is improved.

[0033] Further, the fixed connection should be understood in a broad sense unless otherwise specified and limited, for example, it can be welding, or gluing, or integrally formed, and other conventional means familiar to those skilled in the art.

[0034] The above is only a preferred specific embodiment of the present application, but the protection scope of the present application is not limited thereto, any person skilled in the art within the technical range disclosed by the present application, according to the technical scheme and the inventive concept of the present application, equivalent replacement or change, should be covered within the protection scope of the present application.

Claims

1. A drum-type vacuum plasma cleaning machine comprising a housing (1), characterized in that: The inside of the shell (1) is a sealed environment, the inside of the shell (1) is rotatably installed with a cleaning cavity (15), the inside of the cleaning cavity (15) is rotatably installed with a roller assembly, the roller assembly comprises a cylindrical screen (153), a side plate two (156), two support rings (154) and a plurality of side plate one (155), two support rings (154) are fixedly installed on both sides of the cylindrical screen (153), a plurality of side plate one (155) and side plate two (156) are evenly distributed in the inside of the cylindrical screen (153), the height of the side plate two (156) is greater than the height of the side plate one (155); The inside of the cleaning cavity (15) is fixedly installed with a plasma device (21), the side wall of the plasma device (21) is fixedly installed with an electrode rod (213), the outside of the electrode rod (213) is movably installed with a cleaning assembly, the cleaning assembly comprises a sliding frame one (221), a sliding frame two (222), a cleaning ring (23) and a sliding ring (231), the sliding frame one (221) and the sliding frame two (222) are slidably installed on the outside of the electrode rod (213), the cleaning ring (23) and the sliding ring (231) are movably installed on the outside of the electrode rod (213), the cleaning ring (23) and the sliding ring (231) are rotatably connected, and the sliding ring (231) is rotatably sleeved on the outside of the sliding frame one (221).

2. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: The inside of the cleaning cavity (15) is rotatably installed with a rotating shaft (162) and four limit wheels (163), one of the limit wheels (163) is fixedly installed on the outside of the rotating shaft (162), the limit wheels (163) are evenly distributed on the outside of the support ring (154), one side wall of one of the support rings (154) is fixedly installed with a gear two (152), a side wall of the rotating shaft (162) is fixedly installed with a gear three (164), the gear two (152) and the gear three (164) are engaged, and the inside of the shell (1) is fixedly installed with a motor one (161). The output shaft of the motor one (161) and the rotating shaft (162) are provided with a belt three (165).

3. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: The inside of the shell (1) is fixedly installed with a driving cavity (13), the outside of the driving cavity (13) is fixedly installed with an electric push rod (133), the output end of the electric push rod (133) is fixedly connected with a rack (132), the side wall of the cleaning cavity (15) is fixedly installed with a gear one (131), the rack (132) and the gear one (131) are located in the inside of the driving cavity (13), and the rack (132) and the gear one (131) are engaged.

4. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: The side wall of the shell (1) is rotationally mounted with a sealing cover (11), the sealing cover (11) corresponds to the cleaning cavity (15), the inside of the sealing cover (11) is fixedly mounted with an observation cylinder (12), the observation cylinder (12) corresponds to the cylindrical screen (153), the inside of the cleaning cavity (15) is provided with a dust collecting plate (151), the dust collecting plate (151) is below the cylindrical screen (153), and the side wall of the cleaning cavity (15) is fixedly mounted with a vacuum detector (14).

5. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: A plurality of flexible strips (22) are rotationally mounted between the slide one (221) and the slide two (222) and are uniformly distributed, a plurality of rolling wheels (223) are rotationally mounted on the side walls of the slide one (221) and the slide two (222) and are uniformly distributed, a belt one (224) is sleeved between the rolling wheel (223) on the side wall of the slide one (221) and the flexible strip (22), and a belt two (225) is sleeved between the rolling wheel (223) on the side wall of the slide two (222) and the flexible strip (22).

6. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: The rolling wheel (223) on the side wall of the slide one (221) abuts against the inner wall of the slip ring (231), the outer peripheral wall of the slip ring (231) is provided with a clamping groove (236), the clamping groove (236) is slidingly mounted on the outer sides of the side plate one (155) and the side plate two (156), and the rolling wheel (223) on the side wall of the slide two (222) abuts against the inner wall of the cylindrical screen (153).

7. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: The dust cover (211) is fixedly mounted on the side wall of the electrode rod (213) close to one side of the plasma device (21), the dust cover (211) abuts against the slide two (222), the inside of the dust cover (211) and the side wall of the cleaning ring (23) are provided with a spring one (212), the side wall of the cleaning ring (23) is fixedly mounted with a counterweight (232), and a plurality of uniformly distributed rolling balls (233) are arranged between the cleaning ring (23) and the electrode rod (213).

8. The drum-type vacuum plasma cleaning machine according to claim 1, wherein: The outside of the cleaning ring (23) is fixedly mounted with two uniformly distributed semicircular brushes (235), the spring top block (234) is movably mounted between the two semicircular brushes (235), the spring top block (234) abuts against the side plate two (156), and the semicircular brush (235) abuts against the cylindrical screen (153).

Citation Information

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    CN114504895A

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