Indium sulfide-based material for self-cleaning coating of glass and preparation method of indium sulfide-based material

Indium sulfide-based materials prepared by solvothermal method and oxygen plasma treatment solve the problem of low solar energy utilization of photocatalytic self-cleaning materials, achieve efficient decomposition of organic pollutants on glass surface, and are low in cost and suitable for large-scale production.

CN121004009APending Publication Date: 2025-11-25SHANXI ZHIQING MOUNTAIN WATER GEOLOGICAL EXPLORATION CO LTD
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Patent Information

Application Number
CN202511101486.2
Authority / Receiving Office
CN · China
Patent Type
Applications(China)
Current Assignee / Owner
Filing Date
2025-08-07
Publication Date
2025-11-25

AI Technical Summary

Technical Problem

Existing photocatalytic self-cleaning materials have low utilization of sunlight and cannot efficiently decompose organic pollutants on glass surfaces.

Method used

Indium sulfide-based materials were prepared by solvothermal method and oxygen plasma treatment, introducing activated oxygen and amorphous structure to achieve photocatalytic activity in the visible light range.

Benefits of technology

It improves the degradation efficiency of organic pollutants on glass surfaces, reduces preparation costs, and is suitable for large-scale production.

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Abstract

The invention discloses a preparation method of an indium sulfide-based material for a glass self-cleaning coating. The preparation method comprises the following steps: S1, preparing an indium sulfide powder material; s2, carrying out oxygen plasma reaction on the indium sulfide powder material prepared in the S1 to obtain a T-indium sulfide material; and S3, dispersing the T-indium sulfide material obtained in S2 in a mixed phase of ethylene glycol, water and acetone to obtain a self-cleaning glass coating material solution. Compared with the prior art, the preparation method has the advantages that the self-cleaning effect of the glass under sunlight illumination can be realized by utilizing solvothermal reaction of an indium source and a sulfur source, oxygen plasma treatment and introduction of activated oxygen and surface partial amorphous state, and the preparation process is relatively simple, low in cost, mature in process and suitable for large-scale production.
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Description

Technical Field

[0001] This invention relates to the field of catalytic cleaning technology, specifically to an indium sulfide-based material for glass self-cleaning coatings and its preparation method. Background Technology

[0002] With the widespread use of glass, cleaning and maintenance issues have arisen. Organic pollutants (such as bird droppings) are a major cause of reduced glass light transmittance. Common cleaning methods include manual cleaning and laser cleaning, but these methods are expensive, and the use of cleaning agents can cause secondary pollution. If outdoor glass surfaces had self-cleaning capabilities, capable of decomposing organic pollutants and keeping the glass clean, it would have significant environmental and economic benefits.

[0003] Based on this, researchers have proposed two technical solutions: hydrophobic self-cleaning and photocatalytic self-cleaning. Hydrophobic self-cleaning is similar to the lotus leaf effect, where tiny water droplets aggregate into larger droplets, which then roll down under their own gravity, carrying away pollutants, or are removed by external forces such as wind or windshield wipers. Photocatalytic self-cleaning typically uses coatings such as TiO2 and ZnO, which are excited under ultraviolet light to generate electron-hole pairs. These photogenerated electrons and holes move to the surface of the photocatalytic coating and react with adsorbed oxygen and water molecules, producing free radicals that decompose organic pollutants. However, most current photocatalytic self-cleaning materials are ultraviolet light absorbers, resulting in low utilization of sunlight. Therefore, designing photocatalysts that absorb in the visible light range is crucial.

[0004] Against this backdrop, this invention proposes an indium sulfide-based material for self-cleaning glass coatings and its preparation method. The material is prepared by a solvothermal reaction of an indium source and a sulfur source to obtain indium sulfide; then, the indium sulfide is subjected to oxygen plasma treatment to introduce activated oxygen and partially amorphous states on the surface, enabling absorption in the visible light range. Using this as a glass surface coating achieves a self-cleaning effect on glass. Summary of the Invention

[0005] The technical problem to be solved by the present invention is to address the shortcomings of existing self-cleaning glass by proposing an indium sulfide-based material for glass self-cleaning coating and its preparation method.

[0006] To solve the above-mentioned technical problems, the present invention provides the following technical solution: a method for preparing indium sulfide-based materials for self-cleaning glass coatings, comprising the following steps:

[0007] S1: Preparation of indium sulfide powder material;

[0008] S2: The indium sulfide powder material obtained in S1 is subjected to oxygen plasma reaction to obtain T-indium sulfide material;

[0009] S3: Disperse the T-indium sulfide material obtained in S2 in a mixed phase of ethylene glycol, water, and acetone to obtain a self-cleaning glass coating material solution.

[0010] Preferably, in step S1, an aqueous solution of indium chloride and an aqueous solution of thioacetamide are mixed and subjected to a thermal reaction to obtain an indium sulfide material.

[0011] Preferably, the molar ratio of indium chloride aqueous solution to thioacetamide aqueous solution in S1 is 1:2;

[0012] The concentration of the indium chloride aqueous solution is 0.1-0.2 mol / L, and the concentration of the thioacetamide aqueous solution is 0.1-0.2 mol / L;

[0013] The thermal reaction temperature is 160-180℃, and the time is 9-12 hours.

[0014] Preferably, the volume ratio of indium sulfide powder material to oxygen plasma environment in S2 is 1:10-1:20;

[0015] Oxygen flow rate 50-100 ppm, reaction time 3-5 h.

[0016] Preferably, the volume ratio of ethylene glycol, water, and acetone in S3 is 2:1:1.

[0017] Another aspect of the present invention discloses an indium sulfide-based material prepared by the above method.

[0018] Another aspect of the present invention discloses the application of an indium sulfide-based material as a self-cleaning coating for glass.

[0019] The advantages of this invention compared to the prior art are:

[0020] (1) The present invention utilizes a solvothermal method and an oxygen plasma treatment method to obtain an indium sulfide-based material that absorbs in the visible light region, which can be used for efficient photodegradation of organic pollutants in glass.

[0021] (2) The present invention introduces activated oxygen and achieves partial amorphous state on the surface of indium sulfide-based materials, which helps to capture organic pollutant molecules and enhance the catalytic activity of the coating material itself, thereby improving the degradation efficiency of organic pollutants on the glass surface.

[0022] (3) The preparation process of the glass self-cleaning coating indium sulfide-based material of the present invention is relatively simple, low cost and mature, and suitable for large-scale production. Attached Figure Description

[0023] Figure 1 This is a transmission electron microscope (TEM) image of the indium sulfide-based glass self-cleaning coating material prepared in Example 1 of this invention.

[0024] Figure 2 This is the optical absorption curve of the indium sulfide-based glass self-cleaning coating material prepared in Example 1 of the present invention.

[0025] Figure 3 This is the light transmittance curve of the glass before and after self-cleaning in Embodiment 1 of the present invention. Detailed Implementation

[0026] The present invention will now be described in further detail with reference to the accompanying drawings.

[0027] Combined with appendix Figure 1-3 As shown, an indium sulfide-based material for self-cleaning glass coating and its preparation method include the following steps:

[0028] S1, Preparation of indium sulfide materials:

[0029] In a molar ratio of 1:2, an aqueous solution of indium chloride and an aqueous solution of thioacetamide are mixed and subjected to a solvothermal reaction to obtain indium sulfide material.

[0030] S2, Oxygen plasma treatment of indium sulfide materials:

[0031] Indium sulfide powder material was placed in an oxygen plasma environment, and T-indium sulfide material was obtained after controlling the oxygen flow rate and reaction time.

[0032] S3. Preparation of self-cleaning glass coating materials:

[0033] A self-cleaning glass coating material solution can be obtained by dispersing T-indium sulfide material in a mixed phase of ethylene glycol, water, and acetone.

[0034] Preferably, the concentration of the indium chloride aqueous solution in S1 is 0.1-0.2 mol / L, and the concentration of the thioacetamide aqueous solution is 0.1-0.2 mol / L; the solvothermal reaction temperature is 160-180℃, and the reaction time is 9-12 h.

[0035] Preferably, the volume ratio of indium sulfide powder material to oxygen plasma environment in S2 is 1:10-1:20, the oxygen flow rate is 50-100ppm, and the reaction time is 3-5h.

[0036] Preferably, the volume ratio of ethylene glycol, water, and acetone in S3 is 2:1:1.

[0037] Example 1

[0038] S1, Preparation of indium sulfide materials:

[0039] A 0.1 mol / L indium chloride aqueous solution and a 0.1 mol / L thioacetamide aqueous solution were mixed at a molar ratio of 1:2 and subjected to a solvothermal reaction at 160 °C for 9 h. After the reaction, the solution was centrifuged (6000 rpm, 20 min) to obtain indium sulfide material.

[0040] S2, Oxygen plasma treatment of indium sulfide materials:

[0041] Indium sulfide powder was placed in an oxygen plasma environment (the volume ratio of indium sulfide powder to oxygen plasma environment was 1:10), the oxygen flow rate was 50 ppm, the reaction time was 3 h, and T-indium sulfide material was obtained after the reaction.

[0042] S3. Preparation of self-cleaning glass coating materials:

[0043] Dispersing T-indium sulfide material in a mixed phase of ethylene glycol, water, and acetone (volume ratio of 2:1:1) yields a self-cleaning glass coating material solution.

[0044] In this embodiment, indium sulfide-based material is sprayed onto ordinary transparent glass; then, rhodamine is used to simulate organic pollutants, and rhodamine is applied to the glass. After being exposed to sunlight for 3 hours, the transmittance of the glass is tested, and the transmittance is above 90% from 350nm to 800nm.

[0045] Example 2

[0046] S1, Preparation of indium sulfide materials:

[0047] A 0.2 mol / L indium chloride aqueous solution and a 0.2 mol / L thioacetamide aqueous solution were mixed at a molar ratio of 1:2 and subjected to a solvothermal reaction at 180℃ for 12 h. After the reaction, the solution was centrifuged (6000 rpm, 20 min) to obtain indium sulfide material.

[0048] S2, Oxygen plasma treatment of indium sulfide materials:

[0049] Indium sulfide powder was placed in an oxygen plasma environment (the volume ratio of indium sulfide powder to oxygen plasma environment was 1:20), the oxygen flow rate was 100 ppm, and the reaction time was 5 h. After the reaction, T-indium sulfide material was obtained.

[0050] S3. Preparation of self-cleaning glass coating materials:

[0051] Dispersing T-indium sulfide material in a mixed phase of ethylene glycol, water, and acetone (volume ratio of 2:1:1) yields a self-cleaning glass coating material solution.

[0052] In this embodiment, indium sulfide-based material is sprayed onto ordinary transparent glass; then, rhodamine is used to simulate organic pollutants, and rhodamine is applied to the glass. After being exposed to sunlight for 3 hours, the transmittance of the glass is tested, and the transmittance is above 82% from 350nm to 800nm.

[0053] Example 3

[0054] S1, Preparation of indium sulfide materials:

[0055] A 0.1 mol / L indium chloride aqueous solution and a 0.2 mol / L thioacetamide aqueous solution were mixed at a molar ratio of 1:2 and subjected to a solvothermal reaction at 160 °C for 12 h. After the reaction, the solution was centrifuged (6000 rpm, 20 min) to obtain indium sulfide material.

[0056] S2, Oxygen plasma treatment of indium sulfide materials:

[0057] Indium sulfide powder was placed in an oxygen plasma environment (the volume ratio of indium sulfide powder to oxygen plasma environment was 1:15), the oxygen flow rate was 80 ppm, the reaction time was 4 h, and T-indium sulfide material was obtained after the reaction.

[0058] S3. Preparation of self-cleaning glass coating materials:

[0059] Dispersing T-indium sulfide material in a mixed phase of ethylene glycol, water, and acetone (volume ratio of 2:1:1) yields a self-cleaning glass coating material solution.

[0060] In this embodiment, indium sulfide-based material is sprayed onto ordinary transparent glass; then, rhodamine is used to simulate organic pollutants, and rhodamine is applied to the glass. After being exposed to sunlight for 3 hours, the transmittance of the glass is tested, and the transmittance is above 75% from 350nm to 800nm.

[0061] Example 4

[0062] S1, Preparation of indium sulfide materials:

[0063] A 0.2 mol / L indium chloride aqueous solution and a 0.1 mol / L thioacetamide aqueous solution were mixed at a molar ratio of 1:2 and subjected to a solvothermal reaction at 170 °C for 10 h. After the reaction, the solution was centrifuged (6000 rpm, 20 min) to obtain indium sulfide material.

[0064] S2, Oxygen plasma treatment of indium sulfide materials:

[0065] Indium sulfide powder was placed in an oxygen plasma environment (the volume ratio of indium sulfide powder to oxygen plasma environment was 1:16), the oxygen flow rate was 70 ppm, the reaction time was 5 h, and T-indium sulfide material was obtained after the reaction.

[0066] S3. Preparation of self-cleaning glass coating materials:

[0067] Dispersing T-indium sulfide material in a mixed phase of ethylene glycol, water, and acetone (volume ratio of 2:1:1) yields a self-cleaning glass coating material solution.

[0068] In this embodiment, indium sulfide-based material is sprayed onto ordinary transparent glass; then, rhodamine is used to simulate organic pollutants, and rhodamine is applied to the glass. After being exposed to sunlight for 3 hours, the transmittance of the glass is tested, and the transmittance is above 83% from 350nm to 800nm.

[0069] This invention also provides a performance test for glass self-cleaning. Ordinary transparent glass is sprayed with an indium sulfide-based material; then, rhodamine is used to simulate organic pollutants. Rhodamine is applied to the glass, and after being exposed to sunlight for 3 hours, the glass is tested for light transmittance. The self-cleaning performance is evaluated by the light transmittance.

[0070] The contents not described in detail in this specification are existing technologies known to those skilled in the art.

[0071] The present invention and its embodiments have been described above. This description is not restrictive, and the accompanying drawings are only one embodiment of the present invention; the actual structure is not limited thereto. In conclusion, if those skilled in the art are inspired by this description and design similar structures and embodiments without departing from the spirit of the invention, such designs should fall within the protection scope of the present invention.

Claims

1. A method for preparing an indium sulfide-based material for a self-cleaning glass coating, characterized in that: Includes the following steps: S1: Preparation of indium sulfide powder material; S2: The indium sulfide powder material obtained in S1 is subjected to oxygen plasma reaction to obtain T-indium sulfide material; S3: Disperse the T-indium sulfide material obtained in S2 in a mixed phase of ethylene glycol, water, and acetone to obtain a self-cleaning glass coating material solution.

2. The method for preparing an indium sulfide-based material for a self-cleaning glass coating according to claim 1, characterized in that: In S1, an aqueous solution of indium chloride and an aqueous solution of thioacetamide are mixed and subjected to a thermal reaction to obtain an indium sulfide material.

3. The method for preparing an indium sulfide-based material for a self-cleaning glass coating according to claim 2, characterized in that: The molar ratio of indium chloride aqueous solution to thioacetamide aqueous solution in S1 is 1:2; The concentration of the indium chloride aqueous solution is 0.1-0.2 mol / L, and the concentration of the thioacetamide aqueous solution is 0.1-0.2 mol / L; The thermal reaction temperature is 160-180℃, and the time is 9-12 hours.

4. A method for preparing an indium sulfide-based material for a self-cleaning glass coating according to claim 1 or 3, characterized in that: The volume ratio of indium sulfide powder material to oxygen plasma environment in S2 is 1:10-1:20; Oxygen flow rate 50-100 ppm, reaction time 3-5 h.

5. The method for preparing an indium sulfide-based material for a self-cleaning glass coating according to claim 1, characterized in that: The volume ratio of ethylene glycol, water, and acetone in S3 is 2:1:

1.

6. An indium sulfide-based material, characterized in that: Prepared using the method described in any one of claims 1-5.

7. The application of an indium sulfide-based material as a self-cleaning coating for glass according to claim 6.