Exposure system and photoetching equipment

Abstract

The invention provides an exposure system and photoetching equipment. The exposure system comprises a light source; the detection module is used for collecting a light intensity signal of the light source and sending the light intensity signal to the control module; and the control module is used for receiving the light intensity signal and controlling the light source to reach the set light intensity according to the light intensity signal. Thus, in the exposure system, the light source, the detection module and the control module form a closed-loop control system, the control module adjusts the light intensity of the light source according to the real-time light intensity collected by the detection module, so that real-time light attenuation compensation of the light source is realized, and the exposure system can adaptively adjust the output light intensity of the light source.

Description

Technical Field

[0001] This application relates to the field of photolithography technology, and more specifically, to an exposure system and photolithography equipment. Background Technology

[0002] Existing UV exposure systems suffer from poor light intensity stability, slow shutter response (>100ms), and inaccurate exposure dose control. These issues result in a lack of real-time light intensity compensation capabilities, significant uneven edge exposure, and substantial susceptibility to temperature drift. These defects lead to poor exposure uniformity and insufficient process consistency in silicon wafers exposed by these systems, severely impacting linewidth control accuracy and product yield in advanced processes, while also increasing calibration and maintenance costs.

[0003] Common light sources in ultraviolet lithography systems typically include light-emitting diodes (LEDs) and mercury lamps. LEDs require multiple LED arrays to achieve high power, resulting in complex optical designs and issues such as low spectral purity, large temperature drift, rapid light decay, and poor collimation. While mercury lamps offer stable light intensity, they also experience light decay, making it difficult to maintain consistent exposure dose over long periods. These characteristics significantly impact the resolution and process stability of precision photolithography. Summary of the Invention

[0004] In order to at least overcome the above-mentioned shortcomings in the prior art, the purpose of this application is to provide an exposure system, comprising: light source; The detection module is used to collect the light intensity signal of the light source and send the light intensity signal to the control module; A control module is provided, which receives the light intensity signal and controls the light source to a set light intensity based on the light intensity signal.

[0005] In one possible implementation, the exposure system further includes a motion module connected to the light source, the motion module being used to drive the light source to move under the control of the control module, so as to adjust the light source to a set light intensity; Preferably, the light source includes a mercury lamp.

[0006] In one possible implementation, the exposure system further includes a controller, which is configured to adjust the light source to a set light intensity under the control of the control module, and the controller is also configured to control the turning the light source on and off; Preferably, the light source includes a light-emitting diode.

[0007] In one possible implementation, the detection module includes a light intensity sensor.

[0008] In one possible implementation, the exposure system includes shutter blades for controlling the opening and closing of the light source; The exposure system also includes a shutter control module, which is electrically connected to the control module and is used to control the opening and closing of the shutter blades under the control of the control module.

[0009] In one possible implementation, the shutter control module includes a servo motor and an absolute encoder coaxially connected to the servo motor. The servo motor is used to drive the shutter blades to rotate to a set angle under the control of the control module. The absolute encoder is used to acquire the angle position signal of the shutter blades and transmit the angle position signal to the control module. The control module controls the servo motor to drive the shutter blades to rotate based on the angle position signal and the set angle.

[0010] In one possible implementation, the motion module includes a limiting shaft and a drive unit, the drive unit being used to drive the light source to move along the limiting shaft in the extension direction of the limiting shaft under the control of the control module.

[0011] In one possible implementation, the motion module further includes a first photoelectric switch and a second photoelectric switch located at both ends of the limiting shaft, the first photoelectric switch and the second photoelectric switch being electrically connected to the control module, for acquiring the position signal of the light source and sending the position signal to the control module; The control module is used to receive the position signal and the light intensity signal, and control the drive unit to move along the limiting axis according to the position signal and the light intensity signal, or to replace the light source.

[0012] In one possible implementation, the exposure system further includes a human-computer interaction module, which is electrically connected to the control module and is used to set the exposure time; The control module controls the light source to turn on and off according to the exposure time.

[0013] This application also provides a photolithography apparatus, including the exposure system described in any of the foregoing claims.

[0014] Compared with the prior art, this application has the following beneficial effects: In the exposure system of this application, the light source, detection module and control module constitute a closed-loop control system. The control module adjusts the light intensity of the light source according to the real-time light intensity collected by the detection module, so as to realize real-time light attenuation compensation for the light source, thereby enabling the exposure system to adaptively adjust the output light intensity of the light source. Attached Figure Description

[0015] To more clearly illustrate the technical solutions of the embodiments of this application, the accompanying drawings required in the embodiments will be briefly introduced below. It should be understood that the following drawings only show some embodiments of this application and should not be regarded as a limitation of the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0016] Figure 1 One of the schematic diagrams of the exposure system provided in the embodiments of this application; Figure 2 A second schematic diagram of the exposure system provided in the embodiments of this application; Figure 3 Schematic diagram three of the exposure system provided in the embodiments of this application; Figure 4 This is the fourth schematic diagram of the exposure system provided in the embodiments of this application.

[0017] Icons: Light source-100; Detection module-200; Control module-300; Motion module-400; Shutter control module-500; Shutter blades-501; Human-computer interaction module-600. Detailed Implementation

[0018] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, and not all embodiments. The components of the embodiments of this application described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0019] Therefore, the following detailed description of the embodiments of this application provided in the accompanying drawings is not intended to limit the scope of the claimed application, but merely to illustrate selected embodiments of the application. All other embodiments obtained by those skilled in the art based on the embodiments of this application without inventive effort are within the scope of protection of this application.

[0020] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0021] In the description of this application, it should be noted that the terms "upper," "lower," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product is in use. They are used only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation on this application. In addition, the terms "first," "second," etc., are used only to distinguish descriptions and should not be construed as indicating or implying relative importance.

[0022] It should be noted that, where there is no conflict, different features in the embodiments of this application can be combined with each other.

[0023] The inventors' investigation revealed that existing ultraviolet exposure systems suffer from poor light intensity stability, slow shutter response (>100ms), and inaccurate exposure dosage control. These issues result in a lack of real-time light intensity compensation capabilities, significant uneven edge exposure, and substantial susceptibility to temperature drift. These defects lead to poor exposure uniformity and insufficient process consistency in silicon wafers exposed through this system, severely impacting linewidth control accuracy and product yield in advanced processes, while also increasing calibration and maintenance costs.

[0024] In view of this, this application provides an exposure system, please refer to... Figure 1 It includes a light source 100, a detection module 200, and a control module 300.

[0025] Optionally, the light source 100 may include a mercury lamp or a light-emitting diode (LED). The wavelength of the LED is in the ultraviolet band.

[0026] The detection module 200 is used to collect the light intensity signal of the light source 100 and send the light intensity signal to the control module 300.

[0027] The control module 300 is used to receive the light intensity signal and adjust the light source 100 to a set light intensity according to the light intensity signal.

[0028] Optionally, the control module 300 may include a host computer and an ADC acquisition module. The ADC acquisition module is electrically connected to the detection module 200 to receive light intensity signals and communicates with the host computer via the RS485 protocol.

[0029] Currently, due to factors such as aging and thermal effects of the light source 100, the light source 100 in the exposure system cannot maintain a constant light intensity for extended periods during operation, leading to a decrease in exposure process consistency and affecting lithography resolution and process stability. Therefore, in this embodiment, the detection module 200 detects the light intensity of the light source 100 in real time and converts it into a light intensity signal, which is then transmitted to the control module 300. The control module 300 then controls the light intensity of the light source 100 based on the light intensity signal. For example, the light intensity of the light source 100 can be controlled by adjusting the distance between the light source 100 and the object to be exposed. Thus, the detection module 200 and the control module 300 in the exposure system of this application constitute a closed-loop control system, achieving real-time light attenuation compensation for the light source 100, thereby enabling the exposure system to adaptively adjust the output light intensity of the light source 100.

[0030] In one possible implementation, please refer to Figure 2 The exposure system further includes a motion module 400 connected to the light source 100. The motion module 400 is used to drive the light source 100 to move under the control of the control module 300, so as to adjust the light source 100 to a set light intensity.

[0031] In this embodiment, since the light source 100 will naturally attenuate during use, it is necessary to dynamically maintain its output light intensity at the set output light intensity value through real-time light intensity compensation. Specifically, the output light intensity of the light source 100 can be controlled by adjusting the distance between the light source 100 and the object to be exposed.

[0032] Optionally, the light source 100 includes a mercury lamp.

[0033] Mercury lamps possess high light power output and highly uniform illumination capabilities, especially in the characteristic ultraviolet spectrum, where they can provide extremely high energy density. Furthermore, the accompanying optical systems and power supply technologies are highly mature. The light intensity of the mercury lamp can be adjusted by regulating the distance between the lamp and the object to be exposed. Therefore, in this embodiment, a mercury lamp can be selected as the light source 100.

[0034] In one possible implementation, the exposure system further includes a controller for adjusting the light source 100 to a set light intensity under the control of the control module 300, and the controller is also used to control the turning on and off of the light source 100.

[0035] Optionally, the light source 100 includes a light-emitting diode.

[0036] Light-emitting diodes (LEDs) offer superior digital controllability. Compared to mercury lamps, they can achieve microsecond-level instantaneous switching without preheating or cooling, thus improving lithography efficiency and enabling precise exposure control. Furthermore, they eliminate the need for components like shutters. LEDs are mercury-free, making them more environmentally friendly and safer. Their monochromatic spectrum output is pure, with energy concentrated in the target wavelength band. A controller based on pulse-width modulation (PWM) dimming technology can be used to precisely control the light intensity of the LED during exposure. Therefore, in this embodiment, an LED can be selected as the light source 100.

[0037] It should be noted that, in addition to the two methods for real-time light intensity adjustment mentioned above, other types of light sources 100 can also have their light intensity adjusted using corresponding methods to achieve real-time light intensity compensation, without specific limitations here.

[0038] In one possible implementation, the detection module 200 includes a light intensity sensor.

[0039] In this embodiment, since the detection module 200 is used to detect the real-time light intensity of the light source 100, the detection module 200 includes a light intensity sensor.

[0040] Specifically, light intensity sensors may include photodiodes, which have a fast response speed and low cost, making them suitable for large-scale application in exposure systems.

[0041] It should be noted that, in addition to photodiodes, other types of light intensity sensors can also be selected, and no specific limitations are made here.

[0042] In one possible implementation, please refer to Figure 3 The exposure system includes a shutter blade 501, which is used to control the opening and closing of the light source 100.

[0043] Optionally, a larger shutter blade 501 can be designed to provide a ±5° opening margin, thereby eliminating the influence of positioning errors during operation.

[0044] The exposure system also includes a shutter control module 500, which is electrically connected to the control module 300 and is used to control the opening and closing of the shutter blades 501 under the control of the control module 300.

[0045] In this embodiment, since the time required to directly switch the light source 100 on and off is relatively long, and the time required for the light source 100 to go from being completely off to being on to the set power is also relatively long, a shutter blade 501 needs to be set outside the light source 100, and a shutter control module 500 for controlling the shutter blade 501 needs to be set.

[0046] For example, in this embodiment, a mercury lamp can be used as the light source 100. A mercury lamp is a gas arc lamp that requires extremely high voltage to break down the gas and form an arc during cold start. After ignition, the mercury inside the lamp needs to evaporate and reach a stable state, a process that takes a considerable amount of time. During this period, the light intensity of the light source 100 changes drastically. If this unstable light source 100 is used for direct exposure, the results will be completely unpredictable, resulting in a zero yield. Furthermore, the mercury lamp requires cooling before restarting after being turned off, leading to extremely low lithography efficiency. In addition, frequent switching of the mercury lamp on and off affects its lifespan. Therefore, the opening and closing of the light source 100 can be controlled by the shutter blades 501 of the shutter control module 500.

[0047] Specifically, the control module 300 sends a pre-set exposure time signal to the shutter control module 500, and the shutter control module 500 controls the opening and closing of the shutter blades 501 according to the signal.

[0048] Furthermore, the shutter control module 500 includes a servo motor and an absolute encoder coaxially connected to the servo motor. The servo motor is used to drive the shutter blade 501 to rotate to a set angle under the control of the control module 300. The absolute encoder is used to collect the angle position signal of the shutter blade 501 and transmit the angle position signal to the control module 300.

[0049] In this embodiment, the servo motor is linked with the shutter blade 501, which can drive the blade to rotate.

[0050] The control module 300 controls the servo motor to drive the shutter blade 501 to rotate according to the angle position signal and the set angle.

[0051] In this embodiment, the shutter control module 500, driven by a high-torque servo motor and a high-precision absolute encoder, has a fast response capability (<30ms) and can accurately control the exposure dose.

[0052] Furthermore, it should be noted that the shutter control module 500 also includes a third photoelectric switch, which can monitor whether the shutter blades 501 are open at this time and send a signal indicating whether the shutter blades 501 are open normally to the control module 300. When installing the exposure system in this embodiment for the first time, zero-position calibration needs to be performed through the third photoelectric switch to ensure that the shutter blades 501 can completely block the light at this point and to reset the absolute encoder count to zero.

[0053] For example, in this embodiment, the control module 300 sends a motion command to the shutter control module 500 according to the preset exposure time and exposure program; then the shutter control module 500 calculates the command and drives the servo motor to rotate, which in turn drives the shutter blades 501 to move through the mechanical linkage device; at the same time, the absolute encoder connected coaxially to the motor feeds back the actual angular position signal of the shaft to the control module 300 in real time; the control module 300 continuously calculates the error value between the set angle and the actual angular position signal, and dynamically adjusts the current output to the servo motor to eliminate the error, so as to achieve fast, stable and accurate positioning of the servo motor; after the shutter blades 501 reach the specified opening, the shutter control module 500 continues to fine-tune to maintain a stable state; after the exposure is completed, the control module 300 issues a closing command, and the above process is repeated in reverse, finally completing the closing of the shutter blades 501.

[0054] In one possible implementation, the motion module 400 includes a limiting shaft and a driving unit, the driving unit being used to drive the light source 100 to move along the limiting shaft in the extension direction of the limiting shaft under the control of the control module 300.

[0055] In this embodiment, the light intensity of the light source 100 can be adjusted by changing the distance between the light source 100 and the object to be exposed. For example, in this embodiment, a mercury lamp can be used as the light source 100, and the output light intensity of the mercury lamp can be adjusted by changing the position of the mercury lamp on the limiting axis through the driving unit. The driving unit may include a stepper motor driver and a stepper motor. Under the control of the control module 300, the stepper motor driver drives the stepper motor to move the light source 100 on the limiting axis.

[0056] Specifically, the control module 300 acquires the light intensity signal from the detection module 200 and adjusts the position of the light source 100 on the limiting axis according to the control algorithm to ensure that the output light intensity of the exposure system is always maintained at the set output light intensity.

[0057] In one possible implementation, the motion module 400 further includes a first photoelectric switch and a second photoelectric switch located at the two ends of the limiting shaft, respectively. The first photoelectric switch and the second photoelectric switch are electrically connected to the control module 300 to collect the position signal of the light source 100 and send the position signal to the control module 300.

[0058] The control module 300 is used to receive the position signal and the light intensity signal, and control the drive unit to move along the limiting axis according to the position signal and the light intensity signal, or to replace the light source 100.

[0059] In this embodiment, the first photoelectric switch and the second photoelectric switch can be used to acquire the position signal of the light source 100 on the limiting axis, and to displace the light source 100 according to its position signal and the set output light intensity. Alternatively, if the control module 300 detects that even if the light source 100 is driven to move along the limiting axis, its light intensity cannot be changed to the set output light intensity, it proves that the attenuation of the light source 100 in the exposure system is too great, and the output light intensity cannot be adaptively adjusted. In this case, the light source 100 needs to be replaced.

[0060] Specifically, in this embodiment, a mercury lamp can be used as the light source 100. Mercury lamps have a limited lifespan. If the control module 300 detects that the mercury lamp cannot reach the set output light intensity at any position on the limiting shaft, it determines that the mercury lamp's degradation is too great and it needs to be replaced. A warning message can be displayed on the screen of the human-machine interface module 600 to remind the operator to replace the mercury lamp in a timely manner.

[0061] Optionally, the control module 300 also includes a motion control card, which can be directly inserted into the PCIe slot of a PC host to communicate with the host computer and control the motion module 400 and the shutter control module 500 via the EtherCAT bus protocol. This enables high-speed data interaction within the lithography equipment. Its integrated control algorithm not only improves system response speed and control accuracy but also significantly reduces the development complexity of the host computer software. The control module 300, formed by the host computer, ADC acquisition module, and motion control card, effectively solves the technical bottlenecks of traditional exposure systems in dose control and dynamic response, ultimately achieving stable control of the output light intensity of the light source 100 and rapid response (<30ms) of the shutter blades 501, providing a reliable solution for high-precision lithography applications in the microelectronics manufacturing field.

[0062] For example, when using the exposure system provided in this embodiment for the first time, it is necessary to first perform zero-position calibration on the third photoelectric switch and set the absolute encoder count to zero. Then, adjust the optical structure to ensure that the maximum output light intensity of the exposure system is 70mw / cm². After debugging, the exposure system can start working, and the aforementioned steps do not need to be performed again for subsequent use.

[0063] The exposure system uses 220V AC power as input. Powering on the system is done by clicking the "Mercury Lamp Power Button," which illuminates when the indicator light illuminates. Next, clicking the "Mercury Lamp Trigger Button" triggers the lamp. If the voltmeter and ammeter display an output current signal, the lamp is triggered. After a certain period, if the operator observes that the product of voltage and current does not exceed the lamp's rated power, the lamp is operating stably and exposure can proceed. Furthermore, to prevent the current surge generated during lamp triggering from affecting the lithography equipment, after triggering, clicking the "Control Power Button" powers on the other parts of the exposure system. The "Control Power Button" indicator light illuminates when the system is powered on.

[0064] Next, the control module 300 receives the light intensity signal from the detection module 200 and adjusts the position of the light source 100 on the limiting axis according to the control algorithm to ensure that the system output light intensity is always maintained at 70mw / cm².

[0065] The operator modifies the exposure time via software. When exposing an area to be exposed, clicking the "Exposure" button activates the exposure system, which controls the servo motor to rotate, driving the shutter blades 501 to rotate and initiate the exposure. Once the exposure time is reached, the servo motor returns to zero, completing the exposure. If the exposure dose needs to be adjusted, this process is repeated multiple times to expose multiple areas of the object.

[0066] After exposure is complete, the exposure system can be powered off. To prevent current surges caused by power failure of the mercury lamp, first click the "Control Power Button," wait for it to turn off, and then click the "Mercury Lamp Power Button." If the "Mercury Lamp Power Button" indicator light turns off, the entire exposure system has been powered off.

[0067] In another possible implementation, when a light-emitting diode (LED) is used as the light source 100 in the exposure system of this embodiment, the output light intensity of the LED is controlled by a controller based on pulse width modulation (PWM) dimming technology. Therefore, when the control module 300 detects that the controller cannot adjust the output light intensity of the LED to the set output light intensity, it determines that the LED's attenuation is too great and it needs to be replaced. A warning message can be displayed on the screen of the human-machine interface module 600 to prompt the operator to replace the LED in a timely manner.

[0068] In one possible implementation, please refer to Figure 4 The exposure system also includes a human-computer interaction module 600, which is electrically connected to the control module 300 and is used to set the exposure time.

[0069] The control module 300 controls the light source 100 to turn on and off according to the exposure time.

[0070] Furthermore, the human-machine interface module 600 includes a display screen. The operator can input the set exposure time through the graphical interface on the display screen. Since the exposure dose is the product of the output light intensity and the exposure time, the control module 300 controls the rotation angle of the shutter blades 501 according to the exposure time set by the operator, thereby controlling the opening and closing of the light source 100 and adjusting the exposure dose. Simultaneously, the display screen can also display the exposure progress and real-time light intensity through a progress bar or other methods.

[0071] This application also provides a photolithography apparatus, including the exposure system described in any of the foregoing claims.

[0072] In this embodiment, since the aforementioned exposure system sets up a closed-loop light intensity feedback system—the control module 300 adjusts the light intensity of the light source 100 based on the light intensity collected by the detection module 200, and realizes real-time light attenuation compensation for the light source 100, the lithography equipment including the aforementioned exposure system has good process consistency during exposure, thereby improving the resolution and process stability of lithography.

[0073] In one possible implementation, the controlled object in the exposure system can be connected to other controlled objects in the lithography equipment via the EtherCAT bus protocol, which simplifies the circuit complexity and reduces the impact of the exposure system communication delay on the exposure dose.

[0074] In summary, this application provides an exposure system and a lithography apparatus, comprising: a light source 100; a detection module 200, which acquires the light intensity signal of the light source 100 and sends the light intensity signal to a control module 300; and a control module 300, which receives the light intensity signal and controls the light source 100 to a set light intensity based on the light intensity signal. Thus, in the exposure system of this application, the light source 100, the detection module 200, and the control module 300 constitute a closed-loop control system—the control module 300 adjusts the light intensity of the light source 100 based on the real-time light intensity acquired by the detection module 200, thereby achieving real-time light attenuation compensation for the light source 100, and enabling the exposure system to adaptively adjust the output light intensity of the light source 100.

[0075] It should be noted that, in this document, relational terms such as "first" and "second" are used only to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0076] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. An exposure system, characterized by, The exposure system comprises: a light source; a detection module, which is used to collect a light intensity signal of the light source and send the light intensity signal to a control module; the control module is used to receive the light intensity signal and control the light source to a set light intensity according to the light intensity signal.

2. The exposure system according to claim 1, wherein The exposure system further comprises a motion module connected with the light source, which is used to drive the light source to move under the control of the control module, so as to adjust the light source to a set light intensity. Preferably, the light source comprises a mercury lamp.

3. The exposure system according to claim 1, wherein The exposure system further comprises a controller, which is used to adjust the light source to a set light intensity under the control of the control module, and is also used to control the opening and closing of the light source. Preferably, the light source comprises a light-emitting diode.

4. The exposure system according to claim 1, wherein The detection module comprises a light intensity sensor.

5. The exposure system according to claim 2, wherein The exposure system comprises a shutter blade, which is used to control the opening and closing of the light source. The exposure system further comprises a shutter control module, which is electrically connected with the control module and is used to control the opening and closing of the shutter blade under the control of the control module.

6. The exposure system according to claim 5, wherein The shutter control module comprises a servo motor and an absolute value encoder coaxially connected with the servo motor, the servo motor is used to drive the shutter blade to rotate to a set angle under the control of the control module, and the absolute value encoder is used to collect an angle position signal of the shutter blade and transmit the angle position signal to the control module. The control module controls the servo motor to drive the shutter blade to rotate according to the angle position signal and the set angle.

7. The exposure system according to claim 2, wherein The motion module comprises a limiting shaft and a driving unit, the driving unit is used to drive the light source to move along the limiting shaft in the extension direction of the limiting shaft under the control of the control module.

8. The exposure system according to claim 7, wherein The motion module further comprises a first photoelectric switch and a second photoelectric switch respectively located at the two ends of the limiting shaft, the first photoelectric switch and the second photoelectric switch are respectively electrically connected with the control module, and are used to collect a position signal of the light source and send the position signal to the control module. The control module is used to receive the position signal and the light intensity signal, and control the driving unit to move along the limiting shaft or replace the light source according to the position signal and the light intensity signal.

9. The exposure system according to any one of claims 1, wherein The exposure system further comprises a human-computer interaction module, which is electrically connected with the control module and is used to set an exposure time. The control module controls the opening and closing of the light source according to the exposure time.

10. A lithographic apparatus, characterized in that, The exposure system comprises any one of claims 1-9.

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