A single crystal silicon wafer processing clamp
Through a tiered clamping design and modular drive unit, precise clamping of monocrystalline silicon wafers of different thicknesses is achieved, solving the problems of poor adaptability and damage risk of existing fixtures, improving processing accuracy and efficiency, and making it suitable for automated production lines.
Patent Information
- Application Number
- CN202511904055.X
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Filing Date
- 2025-12-17
- Publication Date
- 2026-05-12
- Estimated Expiration
- 2045-12-17
AI Technical Summary
Existing single-crystal silicon wafer processing fixtures have poor adaptability and cannot accommodate silicon wafers of different thicknesses. Furthermore, the wafer edges are prone to chipping or scratching during clamping, making it difficult to meet the high-efficiency processing requirements of automated production lines.
The device employs a tiered clamping design, which uses a drive unit and clamping components within the mounting ring to achieve precise clamping of silicon wafers of different thicknesses. This includes a modular layout of primary and secondary clamping components, combined with vacuum adsorption and mechanical clamping to ensure clamping stability and accuracy.
It expands the applicability of the fixture, reduces the risk of silicon wafer damage, improves processing accuracy and efficiency, adapts to automated processing procedures, and reduces operational complexity and maintenance costs.