Wafer cleaning liquid medicine circulating device

Abstract

The invention relates to the technical field of liquid medicine circulating devices, and discloses a wafer cleaning liquid medicine circulating device which comprises a main body, the main body comprises a shell, a space for liquid medicine deposition is arranged in the shell, and a filter screen for primary treatment of liquid medicine is fixedly arranged in the space; a liquid level sensor used for monitoring the liquid level is fixedly arranged on the shell, two connectors are fixedly arranged on the back side of the shell, and a liquid level pipe is fixedly arranged between the two connectors. The device comprises a filtering device and a sedimentation tank, according to the recovery mode of the liquid medicine of the glue removing machine, filtering, liquid medicine separation and TANK circulation are combined, equipment is simplified, and original functions are reserved; the device is simple in structure and convenient to use, used liquid medicine is repeatedly utilized, formed but not completely reacted agents or agent solution containing residual activity are filtered and temporarily stored, and the device can be repeatedly used and integrally treated, is high in equipment integration degree, small in occupied area and suitable for actual production and use.

Description

Technical Field

[0001] This invention relates to the field of pharmaceutical solution circulation devices, specifically a wafer cleaning pharmaceutical solution circulation device. Background Technology

[0002] The special chemicals used in semiconductor cleaning of wafers are consumables that are continuously applied.

[0003] Normally, the equipment uses a waste discharge system to seal the liquid medicine in batches and then process it centrally. After the liquid medicine is cleaned, it will carry a large number of particles and settle in the liquid medicine recovery tank. When the liquid medicine is recovered into the tank by a pump, a large number of deposited particles will float during the circulation of the liquid medicine and will block the pump. If a filter device is added to the circulation pipeline, it will take up a lot of space and will not be conducive to the daily maintenance of the equipment. Moreover, during maintenance, the large particles must be drained before the liquid medicine can be cleaned and maintained. Summary of the Invention

[0004] The purpose of this invention is to provide a wafer cleaning solution circulation device to solve the problems in the prior art.

[0005] The objective of this invention can be achieved through the following technical solutions:

[0006] A wafer cleaning solution circulation device, the circulation device includes a main body, the main body includes a shell, the shell has a space for solution deposition, and a filter screen for initial treatment of the solution is fixed in the space;

[0007] A liquid level sensor for monitoring the liquid level is fixedly installed on the housing, and two connectors are fixedly installed on the back side of the housing, with a liquid level tube fixedly installed between the two connectors.

[0008] Furthermore, the top of the space is provided with a rectangular opening, a cover plate is fixedly provided at the rectangular opening, and a rectangular annular pad is provided at the connection between the cover plate and the rectangular opening.

[0009] Furthermore, the two connectors are located at the top and bottom of the housing, respectively, and are in communication with the space for introducing the cleaning solution into the liquid level tube.

[0010] Furthermore, several photoelectric sensors are provided on the side of the liquid level tube.

[0011] Furthermore, a waste discharge port is fixedly provided on one side of the outer shell. The waste discharge port is located at the bottom of the outer shell and communicates with the space for the discharge of impurities.

[0012] Furthermore, the top of the outer shell is fixedly provided with several liquid inlets, which are arranged on the top of the outer shell and positioned above the filter screen in the space.

[0013] Furthermore, an exhaust pipe is fixedly provided on the outer shell, and a liquid inlet plug is provided on one side of the exhaust pipe, with the liquid inlet plug fixed on the top of the outer shell.

[0014] The beneficial effects of this invention are:

[0015] 1. This invention includes a filtration device and a sedimentation tank. Based on the recovery method of the degumming machine's liquid, filtration, liquid separation, and circulation tank are combined to simplify the equipment while retaining the original functions.

[0016] 2. This invention reuses the used medicine solution, filters and temporarily stores the formed but not fully reacted medicine solution or the medicine solution containing residual activity, and can reuse it. It is an integrated process with high equipment integration and small footprint, making it suitable for actual production use.

[0017] 3. In this invention, large particles in the drug solution filtration will be retained on the filter screen, saving equipment space. During maintenance, large particles only need to be removed from the filter screen for cleaning, which is convenient and reduces maintenance costs. Attached Figure Description

[0018] The invention will now be further described with reference to the accompanying drawings.

[0019] Figure 1 This is a schematic diagram of the structure of the drug liquid circulation device of the present invention;

[0020] Figure 2 This is a schematic diagram of the structure of the drug liquid circulation device of the present invention;

[0021] Figure 3 This is a side view of the drug circulation device of the present invention;

[0022] Figure 4 This is an attached view of the drug circulation device of the present invention;

[0023] Figure 5 This is a schematic diagram of the drug solution circulation of the present invention.

[0024] The annotations in the attached figures are explained as follows:

[0025] 1. Main body; 2. Waste outlet; 3. Outer shell; 4. Cover plate; 5. Liquid level sensor; 6. Connector; 7. Liquid inlet; 8. Liquid level tube; 9. Photoelectric sensor; 10. Exhaust pipe; 11. Liquid inlet plug; 12. Filter screen. Detailed Implementation

[0026] The technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present invention, and not all embodiments. Based on the embodiments of the present invention, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of the present invention.

[0027] A wafer cleaning solution circulation device, such as Figures 1-4 As shown, the circulation device includes a main body 1, which includes a shell 3. The shell 3 has a space inside for drug liquid deposition. A removable filter screen 12 is provided in the space. A rectangular opening is provided at the top of the space. A cover plate 4 is fixedly provided at the rectangular opening. A rectangular annular pad is provided at the connection position between the cover plate 4 and the rectangular opening. The rectangular annular pad is made of corrosion-resistant material to improve service life. The purpose of the rectangular annular pad is to increase the sealing effect of the closed space of the cover plate 4.

[0028] A liquid level sensor 5 is fixedly installed on the outer casing 3. The liquid level sensor 5 used in this embodiment is model NI-GCT-AE-EC02. The liquid level sensor 5 is used to detect changes in the liquid level of the drug solution in the space under various conditions. Two connectors 6 are fixedly installed on the back side of the outer casing 3. The two connectors 6 are arranged vertically and are located at the top and bottom of the internal space of the outer casing 3, respectively. The two connectors 6 are used for liquid outflow at room temperature. A liquid level tube 8 is fixedly installed between the two connectors 6. The liquid level tube 8 is used to monitor changes in the liquid level at room temperature. Several photoelectric sensors 9 are installed on the side of the liquid level tube 8. The photoelectric sensors convert light signals into electrical signals to monitor the wafer cleaning solution in the liquid level tube 8.

[0029] Waste outlet 2 is fixedly provided on one side of the outer shell 3. Waste outlet 2 is located at the bottom of the outer shell 3 and is connected to the space. It is used to discharge impurities filtered out inside the space to ensure the cleanliness of the space.

[0030] Several liquid inlets 7 are fixedly provided on the top of the outer casing 3. The liquid inlets 7 are arranged on the top of the outer casing 3 and are located above the filter screen 12 in the space. The wafer cleaning solution is injected into the space, so that the cleaning solution first passes through the filter screen 12 for filtration, and then is temporarily stored in the space. It can then be pumped out into the circulation TANK for recycling, thereby improving the utilization rate of the cleaning solution in the wafer production process. An exhaust pipe 10 is fixedly provided on the outer casing 3, and a liquid inlet plug 11 is provided on one side of the exhaust pipe 10. The liquid inlet plug 11 is fixed on the top of the outer casing 3.

[0031] By combining the filter screen 12 with the medicine recovery tank, large particles filtered out by the medicine will be retained on the filter screen 12, saving equipment space. During maintenance, large particles only need to be removed from the filter device for cleaning, which greatly reduces maintenance costs.

[0032] The working principle is as follows:

[0033] like Figure 5 As shown, the waste liquid from the wafer cleaning solution is collected and supplied into the space through the inlet 7. The waste liquid is located inside the filter screen 12. Large particles in the waste liquid are deposited on the structure of the filter screen 12, while small particles fall onto the inner wall of the space. The liquid level sensor 5 is compatible with liquid level monitoring at high temperatures. The connector 6 located above is connected to a waste outlet for discharging excess waste liquid in case of overflow. The liquid level tube 8 can provide an indication of the liquid level at room temperature, providing a more economical method. The solution filtered from the filter screen 12 is located in the space, and then the pre-filtered solution is pumped out by the diaphragm pump, so that the solution enters the cycle used in the wafer cleaning process.

[0034] Based on the recovery method of the degumming machine's chemical solution, filtration, chemical solution separation, and circulation tank are combined to streamline the equipment while retaining the original functions.

[0035] The chemicals used in RCA cleaning processes (such as high-purity sulfuric acid, hydrogen peroxide, ammonia, and hydrofluoric acid) are expensive. By recycling and purifying the used chemicals, the solutions can be restored to a reusable standard, significantly reducing the need for new chemicals and directly lowering production costs. Although there is an initial investment in the recycling equipment, the long-term savings in chemical costs are substantial, resulting in a high return on investment. Untreated RCA cleaning wastewater contains high concentrations of acids, alkalis, organic matter, and metal ions, classifying it as hazardous waste. Recycling the chemicals means significantly reducing the amount of hazardous waste generated at the source. Reduced wastewater volume also lowers the load on subsequent wastewater treatment, reducing the energy and chemical neutralizing agents required during treatment and further mitigating environmental impact. Establishing an in-equipment chemical recovery and regeneration system can reduce dependence on external chemical supply chains and, to a certain extent, ensure the stable operation of the production line. This invention combines a sedimentation tank and a filtration device, with multiple openings allowing simultaneous filtration, avoiding single filtration, increasing the effective filtration area, and accommodating large particles to form a two-level partition, ensuring the inner wall is relatively clean with the chemical solution, preventing damage to the pump. At the same time, the combined system concentrates the chemical solution on the wafer cleaning chemical solution circulation device, greatly reducing equipment space.

[0036] The foregoing has shown and described the basic principles, main features, and advantages of the present invention. Those skilled in the art should understand that the present invention is not limited to the above embodiments. The embodiments and descriptions in the specification are merely illustrative of the principles of the invention. Various changes and modifications can be made to the invention without departing from its spirit and scope, and all such changes and modifications fall within the scope of the claimed invention.

Claims

1. A wafer cleaning chemical solution circulating device, the circulating device comprising a main body (1), characterized in that, The main body (1) comprises a shell (3), a space for depositing liquid medicine is arranged inside the shell (3), and a filter screen (12) for primary treatment of the liquid medicine is arranged in the space; The shell (3) is fixedly provided with a liquid level sensor (5) for monitoring the liquid level, and the back side of the shell (3) is fixedly provided with two connectors (6), and the liquid level pipe (8) is fixedly arranged between the two connectors (6).

2. The wafer cleaning chemical circulating device according to claim 1, wherein The top of the space is provided with a rectangular opening, and the rectangular opening is fixedly provided with a cover plate (4), and the connection between the cover plate (4) and the rectangular opening is provided with a rectangular ring-shaped cushion block.

3. The wafer cleaning chemical solution circulating device according to claim 1, wherein The two connectors (6) are respectively located at the top and bottom of the shell (3), and the two connectors (6) are communicated with the space, and are used for guiding the cleaning liquid into the liquid level pipe (8).

4. The wafer cleaning chemical circulating device according to claim 3, wherein The side of the liquid level pipe (8) is provided with a plurality of photoelectric sensors (9).

5. The wafer cleaning chemical solution circulating device according to claim 1, wherein One side of the shell (3) is fixedly provided with a waste discharge port (2), the waste discharge port (2) is located at the bottom of the shell (3) and is communicated with the space, and is used for discharging impurities.

6. The wafer cleaning chemical solution circulating device according to claim 1, wherein The top of the shell (3) is fixedly provided with a plurality of liquid inlet ports (7), and the plurality of liquid inlet ports (7) are arranged on the top of the shell (3), and the liquid inlet port (7) is arranged above the filter screen (12) in the space.

7. The wafer cleaning chemical solution circulating device according to claim 6, wherein The shell (3) is fixedly provided with an air exhaust pipe (10), and the air exhaust pipe (10) is provided with a liquid inlet plug (11) on one side, and the liquid inlet plug (11) is fixed above the shell (3).

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