Rotary air inlet device for rapid heat treatment equipment and use method of rotary air inlet device
By designing a rotating air intake device and adjusting the air intake angle and flow rate, the problem of uneven film thickness in rapid heat treatment equipment was solved, thereby improving film uniformity and production efficiency.
Patent Information
- Application Number
- CN202511697919.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2025-11-19
- Publication Date
- 2026-03-17
AI Technical Summary
In rapid heat treatment equipment, the film thickness distribution generated by the same equipment under different gas reaction processes is uneven, which leads to wafer deformation and film damage. Moreover, changing the gas inlet structure requires shutdown operation, which wastes time.
Design a rotating air intake device, including an air intake pipe, an air outlet pipe and a base. Air intake holes are evenly arranged at the bottom of the air outlet pipe, and the angle of the air intake holes is adjusted by a motor and a main control module. Combined with a fixed flange and a sealing ring, the gas flow rate and angle can be precisely controlled.
This achieves a uniform distribution of film thickness, avoids wafer deformation and damage, and eliminates the need for downtime to replace parts, thus improving production efficiency.
Smart Images
Figure CN121674668A_ABST
Abstract
Description
TECHNICAL FIELD
[0001] The present application belongs to the technical field of semiconductor device manufacturing, and particularly relates to a rotating gas inlet device for a rapid thermal processing device and a method for using the same. BACKGROUND
[0002] In semiconductor manufacturing using such a device, a thin film is usually deposited on the surface of a wafer, and therefore the uniformity of the film thickness on the wafer surface is one of the key indicators for measuring the process performance of the deposition device. In the current film deposition process based on a rapid thermal processing (RTP) device, a reaction gas is introduced into a reaction chamber through a gas inlet device, and then thin film deposition is realized on the surface of a wafer.
[0003] In actual application, the same device is often used for different gas reaction processes. Due to the influence of chemical reaction characteristics, the thickness distribution of the thin film generated by the same device under different process conditions often differs. Some chemical reactions for depositing thin films form a distribution in which the center region is thicker and the edge region is thinner, while some other reactions may present the opposite trend, i.e., the edge is thicker and the center is thinner.
[0004] Currently, the compensation for the uniformity of the film thickness is mainly achieved by adjusting the temperature of the heating region, for example, by taking measures to increase or decrease the temperature in the center region. In some cases, the compensation for the uniformity of the film thickness is achieved by opening the chamber and replacing the gas inlet structure. However, when temperature compensation is performed, the temperature difference is likely to be too large, which may cause the wafer to deform, leading to uneven distribution of the stress of the thin film, and further causing damage to the thin film or even cracking of the wafer. In addition, replacing the gas inlet structure requires a process of stopping and restarting the machine, resulting in time waste. When the same device is used for different gas reaction processes, the generated thin film has a non-uniform thickness distribution or the deposited thin film has a morphology that does not meet the requirements, which leads to the inability to meet the process requirements. SUMMARY
[0005] Based on the technical problems existing in the prior art, the present application provides a rotating gas inlet device for a rapid thermal processing device and a method for using the same.
[0006] According to a first aspect of the technical scheme of the present application, the present application provides a rotating gas inlet device for a rapid thermal processing device, which comprises a gas inlet pipe, a gas outlet pipe and a base. A chamber is formed in the base, the upper part of the chamber is provided with the gas outlet pipe, the bottom of the gas outlet pipe is uniformly provided with a plurality of gas inlet holes along the axial direction, one end of the gas inlet holes is in communication with the gas outlet pipe, and the other end is in communication with the chamber, the bottom of the gas outlet pipe is in the chamber, one end of the gas outlet pipe is in communication with the gas outlet of the gas inlet pipe, and the gas outlet pipe is rotationally connected with the base.
[0007] A further improvement of the present invention is that: the end of the air outlet pipe away from the air inlet pipe is a solid shaft, the solid shaft passes through the base, and a fixing flange fixed to the side wall of the base is sleeved on the outside of the solid shaft.
[0008] A further improvement of the present invention is that sealing rings are fitted on the outer sides of both ends of the air outlet pipe.
[0009] A further improvement of the present invention is that the end of the air outlet pipe near the air inlet pipe is provided with a chamfer.
[0010] A further improvement of the present invention is that it also includes a mounting plate, which is fixedly connected to the base. The surface of the mounting plate has a through channel that communicates with the chamber. The end of the chamber away from the mounting plate is a sealed structure.
[0011] A further improvement of the present invention is that: the air outlet pipe is arranged horizontally, and a vertical first channel is opened in the base, so the first channel is connected to the air inlet of the air outlet pipe, an air inlet pipe is provided in the first channel, and a buffer chamber is provided between the air inlet pipe and the air outlet pipe.
[0012] A further improvement of the present invention is that it also includes a motor and a main control module, wherein the output end of the motor is fixedly connected to the end of the air outlet pipe away from the air inlet pipe, and the main control module is electrically connected to the motor.
[0013] A further improvement of the present invention is that: a plurality of arc-shaped bolt holes are evenly provided on the circumference of the fixed flange, and a fixing screw is provided in each arc-shaped bolt hole, and the fixing screw is fixedly connected to the base.
[0014] A further improvement of the present invention is that the surface of the fixed flange is provided with graduations along the circumferential direction.
[0015] According to a second aspect of the technical solution of the present invention, the present invention provides a method of using a rotary air intake device for a rapid heat treatment equipment, which, based on the above-mentioned rotary air intake device for a rapid heat treatment equipment, includes the following steps: Step S1: Fix the base to the rapid heat treatment equipment so that the chamber is connected to the working area of the rapid heat treatment equipment; Step S2: According to the process adopted by the rapid heat treatment equipment, rotate the exhaust pipe and adjust the angle between the axis of the air inlet and the vertical direction. Step S3: The process gas is introduced into the inlet pipe. The process gas flows through the inlet pipe, the outlet pipe, several inlet holes and cavities into the working area.
[0016] Compared with the prior art, the above-mentioned technical solution of the present invention has the following beneficial technical effects: 1. The present invention provides several air inlets at the bottom of the outlet pipe to uniformly introduce process gas into the chamber and the outlet pipe rotatably connected to the base, so that the angle between the several air inlets at the bottom of the outlet pipe and the vertical direction can be adjusted, thereby controlling the entry angle of the process gas into the chamber, and thus controlling the gas flow rate in the chamber, thereby achieving effective control of film thickness distribution.
[0017] 2. The present invention facilitates the rotation of the air outlet channel by setting a fixed flange and a solid shaft.
[0018] 3. The present invention improves the stability of the air outlet channel angle adjustment by using the cooperation of the arc-shaped bolt hole and the fixing screw, and the adjustment process does not require opening a cavity or replacing parts. Attached Figure Description
[0019] The accompanying drawings are provided to better understand the invention and are not intended to unduly limit the scope of the invention. Wherein: Figure 1 This is a cross-sectional view of a rotating air intake device for a rapid heat treatment equipment according to the present invention; Figure 2 This is a side view of a rotating air intake device for a rapid heat treatment equipment according to the present invention; Figure 3 This is a side cross-sectional view of a rotating air intake device for a rapid heat treatment equipment according to the present invention, with the air intake hole vertically arranged. Figure 4 This is a side cross-sectional view of a rotating air intake device for a rapid heat treatment equipment according to the present invention, wherein the air intake hole is set at a 45° angle with the vertical direction. Figure 5 This is a schematic diagram of the overall structure of a rapid heat treatment device according to the present invention; Figure 6 This is a process rendering diagram of a rapid heat treatment equipment application according to the present invention; Figure 7 This is a flow field simulation diagram of a rapid heat treatment device with a vertically arranged air inlet according to the present invention; Figure 8 This is a flow field simulation diagram of a rapid heat treatment device with an air inlet at a 45° angle to the vertical direction, according to the present invention.
[0020] The reference numerals in the attached drawings are as follows: 1. Inlet pipe; 2. Outlet pipe; 21. Solid shaft; 3. Sealing ring; 4. Fixing flange; 5. Fixing screw; 6. Chamber; 7. Inlet hole; 8. Base; 81. Buffer chamber; 9. Hollow structure; 10. Mounting plate. Detailed Implementation
[0021] The following description, in conjunction with the accompanying drawings, illustrates exemplary embodiments of the present invention, including various details to aid understanding. These details should be considered merely exemplary. Therefore, those skilled in the art will recognize that various changes and modifications can be made to the embodiments described herein without departing from the scope and spirit of the invention. Similarly, for clarity and brevity, descriptions of well-known functions and structures are omitted in the following description.
[0022] This invention provides a rotating air intake device for a rapid heat treatment equipment, comprising an air intake pipe, an air outlet pipe, and a base. A chamber is formed within the base, and an air outlet pipe is positioned above the chamber. A plurality of air intake holes are evenly distributed along the axial direction at the bottom of the air outlet pipe. One end of each air intake hole is connected to the air outlet pipe, and the other end is connected to the chamber. The bottom of the air outlet pipe is within the chamber, and one end of the air outlet pipe is connected to the air outlet of the air intake pipe. The air outlet pipe is rotatably connected to the base.
[0023] Furthermore, a method of using a rotary air intake device for a rapid heat treatment apparatus is provided, which is based on the aforementioned rotary air intake device for a rapid heat treatment apparatus.
[0024] The following description, in conjunction with embodiments and accompanying drawings, further illustrates the rotary air intake device for a rapid heat treatment apparatus and its usage method.
[0025] Example One like Figures 1-5As shown, a rotating air intake device for a rapid heat treatment equipment includes an air intake pipe 1, an air outlet pipe 2, a chamber 6, an air inlet 7, and a base 8. The air outlet pipe 2 is a hollow pipe, and a plurality of air inlets 7 are evenly provided along the axial direction at the bottom of the air outlet pipe 2. One end of each air inlet 7 is connected to the air outlet pipe 2, and the other end is connected to the chamber 6. The base 8 has a chamber 6 inside. When the base 8 is used for the rapid heat treatment equipment, the chamber 6 is connected to the process chamber of the rapid heat treatment equipment. Both the air intake pipe 1 and the air outlet pipe 2 are located inside the base 8. The air outlet pipe 2 is located above the chamber 6. The upper part of the air outlet pipe 2 is inside the base 8, and the lower part of the air outlet pipe 2 is inside the chamber 6. One end of the air outlet pipe 2 is connected to the air outlet of the air intake pipe 1, and the air inlet of the air intake pipe 1 is connected to the air supply assembly. The air outlet pipe 2 is rotatably connected to the base 8. The base 8 is used to seal the inlet pipe 1, outlet pipe 2, and chamber 6 to prevent process gas leakage. The base 8 also connects to the rapid heat treatment equipment. Therefore, the preferred shape of the base 8 is cuboid / cube for easy installation. The inlet pipe 1 and the gas supply assembly provide process gas to the outlet pipe 2. Several inlet holes 7 at the bottom of the outlet pipe 2 are used to uniformly introduce process gas into the chamber 6. The outlet pipe 2, rotatably connected to the base 8, allows the angle between the inlet holes 7 at the bottom of the outlet pipe 2 and the vertical direction to be adjustable, thereby controlling the angle at which the process gas enters the chamber 6 and thus controlling the gas flow rate within the chamber 6. The chamber 6 is used to introduce the process gas with adjusted flow rate into the working area of the rapid heat treatment equipment, thereby changing the airflow velocity near the wafer and achieving effective control of the film thickness distribution.
[0026] Specifically, the length of the plurality of air inlets 7 at the bottom of the exhaust pipe 2 along the axial direction is denoted as the first length, the length of the chamber 6 along the axial direction of the exhaust pipe 2 is denoted as the second length, and the length of the base 8 along the axial direction of the exhaust pipe 2 is denoted as the third length, where the third length > the second length > the first length. By setting the third length to be greater than the second length, it is ensured that the chamber 6 has an opening only on the side adjacent to the rapid heat treatment equipment, while the other directions are sealed surfaces. By setting the second length to be greater than the first length, the plurality of air inlets 7 are all within the range of the chamber 6, preventing air leakage.
[0027] Specifically, the exhaust pipe 2 has a solid cylinder (solid shaft 21) at one end along its axial direction and a hollow pipe at the other end. The plurality of air inlets 7 are only located at the bottom of the hollow pipe. The base 8 has a second channel horizontally, one end of which is connected to the outside, and the other end is a sealed structure. The exhaust pipe 2 is located within the second channel, with the hollow pipe portion adjacent to the sealed structure of the second channel. The solid shaft 21 protrudes from the second channel, and a fixing flange 4, fixed to the side wall of the base 8, is fitted around the outside of the solid shaft 21. By providing the solid shaft 21 to protrude from the second channel, it is easy to rotate the solid shaft 21, causing the plurality of air inlets 7 to rotate and adjusting the air intake angle of the chamber 6. The fixing flange 4 on the outside of the solid shaft 21 provides an axial and radial positioning surface, transferring the load of the solid shaft 21 to the base 8 and preventing the solid shaft 21 from swaying or shifting during rotation.
[0028] Specifically, sealing rings 3 are fitted on the outer sides of both ends of the air outlet pipe 2. A sealing ring 3 is also provided between the solid shaft 21 and the second channel, and a sealing ring 3 is provided between the portion of the hollow channel that does not contact the chamber 6 and the second channel. A set of sealing rings 3 is provided on each side of the air outlet pipe 2 along the axial direction where it does not contact the chamber 6, thereby preventing air leakage. Preferably, there are four sealing rings 3, with two sealing rings 3 located between the solid shaft 21 and the second channel, and the other two sealing rings 3 located between the portion of the hollow channel that does not contact the chamber 6 and the second channel. The double-layer sealing rings 3 improve the airtightness.
[0029] Specifically, the base 8 has several hollow structures 9. The hollow structures 9 are not connected to other components (e.g., chamber 6, air inlet pipe 1 or air outlet pipe 2) and are not connected to the outside world. They are independent parts. By setting the hollow structures 9, the weight of the base 8 is reduced without affecting the load of the outer shell, making it easier to fix the base 8 to the rapid heat treatment equipment.
[0030] Specifically, it also includes a mounting plate 10, which is fixedly connected to the base 8. The mounting plate 10 has a through-channel on its surface, which communicates with the chamber 6. The end of the chamber 6 furthest from the mounting plate 10 is a sealed structure. The mounting plate 10 has chamfered edges to prevent collisions with the rapid heat treatment equipment or other equipment. One end of the mounting plate 10 is fixedly connected to the base 8, and the other end is used to fix it to the rapid heat treatment equipment. The mounting plate increases the contact area with the rapid heat treatment equipment, facilitating installation and improving installation stability. The channel connects the chamber 6 and the working area of the rapid heat treatment equipment.
[0031] Specifically, the outlet pipe 2 is horizontally arranged, and a vertical first channel is opened in the base 8, so the first channel is connected to the air inlet of the outlet pipe 2. An air inlet pipe 1 is provided in the first channel, and a buffer chamber 81 is provided between the air inlet pipe 1 and the outlet pipe 2. The first channel and the second channel form an L-shaped structure, and the buffer chamber 81 is located at the inflection point of the L-shape. By setting the buffer chamber 81 and the vertical air inlet pipe 1, the flow rate is slowed down during the introduction of process gas, the uniformity of process gas is improved, and thus the uniformity of the membrane is improved.
[0032] Specifically, it also includes a motor and a main control module. The output end of the motor is fixedly connected to the end of the air outlet pipe 2 away from the air inlet pipe 1 (i.e., the solid shaft 21). The main control module is electrically connected to the motor. The main control module controls the motor, thereby controlling the rotation speed and angle of the solid shaft 21 (i.e., the air outlet pipe 2), improving the accuracy of rotation, facilitating control, and eliminating the need for manual rotation. Preferably, the main control module uses a PLC to send signals to the motor for precise angle setting, and the motor is a stepper motor that drives the solid shaft 21 to rotate.
[0033] Specifically, the angle between the axis of the air inlet 7 and the vertical direction is in the range of [-45°, 45°]. The circumference of the air outlet 2 within the chamber 6 is greater than or equal to one-quarter of the circumference, thereby ensuring that the air inlet 7 can smoothly introduce process gas into the chamber 6 during rotation. The angle limitation here only indicates that process gas can be introduced into the chamber 6 within the range of [-45°, 45°], and does not mean that the air outlet 2 can only rotate within this range.
[0034] Specifically, the fixed flange 4 has graduations along its circumference. These graduations allow the operator to determine the position of the air inlet 7 when rotating the solid shaft, enabling accurate control. The fixed flange 4 also has four evenly spaced arc-shaped bolt holes on its circumference. A fixing screw 5 is installed in each arc-shaped bolt hole to secure the fixed flange 4 to the base 8.
[0035] Specifically, the end of the air outlet pipe 2 near the air inlet pipe 1 is designed with a chamfer, which facilitates the installation of the air outlet pipe 2 in the second channel of the base 8.
[0036] Specifically, when the rapid heat treatment equipment is running, the process gas enters the outlet pipe 2 from the inlet pipe 1; the gas is isolated by the sealing ring 3 to ensure that all the process gas flows into the outlet pipe 2. Then the gas enters the chamber 6 after passing through the inlet hole 7. The process gas in the chamber 6 finally flows into the working area of the rapid heat treatment equipment (i.e., the area where the wafer is located). Figure 1The diameter and number of air inlets 7 shown are only one possible configuration; other sizes and numbers of holes can also be used in practice.
[0037] Specifically, the rotary air intake device for rapid heat treatment equipment in this embodiment is not only applicable to rapid heat treatment equipment, but also to other semiconductor equipment that is sensitive to the air intake angle.
[0038] Example Two A method of using a rotary air intake device for a rapid heat treatment equipment, based on the rotary air intake device for a rapid heat treatment equipment described in Embodiment 1, includes the following steps: Step S1: Fix the base 8 to the rapid heat treatment equipment so that the chamber 6 is connected to the working area of the rapid heat treatment equipment. Step S2: According to the process adopted by the rapid heat treatment equipment, rotate the exhaust pipe 2 and adjust the angle between the axis of the air inlet 7 and the vertical direction. Step S3: The process gas is introduced into the inlet pipe 1. The process gas flows through the inlet pipe 1, the outlet pipe 2, several inlet holes 7 and the chamber 6 into the working area.
[0039] Simulations were performed using the rotary air intake device for rapid heat treatment equipment described in Embodiment 1 and the rotary air intake device for rapid heat treatment equipment described in Embodiment 2. The simulation results are as follows: Figures 6-8 As shown in the simulation, the gas flow field distribution within the cavity 6 differs significantly between the vertically arranged air inlets 7 and the air inlets 7 arranged at a 45° angle to the vertical direction. Under the same operating pressure and flow rate, the airflow velocity in the wafer center region of the vertically arranged air inlets 7 is approximately 0.04 m / s, and the airflow velocity in the lateral regions is approximately 0.02 m / s. Conversely, the airflow velocity in the center region of the air inlets 7 arranged at a 45° angle to the vertical direction is approximately 0.08 m / s, and the airflow velocity in the lateral regions is approximately 0.02 m / s. Airflow velocity affects the residence time and temperature distribution of the reaction, thus affecting the film thickness. Different processes have different sensitivities to airflow velocity; therefore, the angle of the rotating air inlets needs to be selected according to the specific process. For example, vertically arranged air inlets 7 are used when employing the O2 process, while air inlets 7 arranged at a 45° angle to the vertical direction are used when employing the N2O process.
[0040] Those skilled in the art will clearly understand that, for the sake of convenience and brevity, the above-described division of functional units and modules is merely an example. In practical applications, the above functions can be assigned to different functional units and modules as needed, that is, the internal structure of the device can be divided into different functional units or modules to complete all or part of the functions described above. The functional units and modules in the embodiments can be integrated into one processing unit, or each unit can exist physically separately, or two or more units can be integrated into one unit. The integrated unit can be implemented in hardware or as a software functional unit. Furthermore, the specific names of the functional units and modules are only for easy differentiation and are not intended to limit the scope of protection of this application. The specific working process of the units and modules in the above system can be referred to the corresponding process in the foregoing method embodiments, and will not be repeated here.
[0041] The specific embodiments described above do not constitute a limitation on the scope of protection of this invention. Those skilled in the art should understand that various modifications, combinations, sub-combinations, and substitutions can occur depending on design requirements and other factors. Any modifications, equivalent substitutions, and improvements made within the spirit and principles of this invention should be included within the scope of protection of this invention.
Claims
1. A rotating gas inlet device for a rapid thermal processing apparatus, characterized by, It includes air inlet pipe (1), air outlet pipe (2) and base (8), the cavity (6) is set up in the base (8), the top of the cavity (6) is equipped with air outlet pipe (2), the bottom of the air outlet pipe (2) is evenly provided with several air inlet holes (7) along the axis direction, one end of the several air inlet holes (7) is communicated with the air outlet pipe (2), the other end is communicated with the cavity (6), the bottom of the air outlet pipe (2) is in the cavity (6), one end of the air outlet pipe (2) is communicated with the air outlet of the air inlet pipe (1), the air outlet pipe (2) is rotatably connected with the base (8).
2. The rotary gas inlet device for a rapid thermal processing apparatus according to claim 1, wherein The end of the air outlet pipe (2) away from the air inlet pipe (1) is a solid shaft (21), the solid shaft (21) penetrates the base (8), the solid shaft (21) is provided with a fixed flange (4) fixed on the side wall of the base (8).
3. The rotary gas inlet device for a rapid thermal processing apparatus according to claim 1, wherein The outer side of both ends of the air outlet pipe (2) is provided with a sealing rubber ring (3).
4. The rotary gas inlet device for a rapid thermal processing apparatus according to claim 1, wherein The end of the air outlet pipe (2) close to the air inlet pipe (1) is provided with a chamfer.
5. The rotary gas inlet device for a rapid thermal processing apparatus according to claim 1, wherein It also includes a mounting plate (10), the mounting plate (10) is fixedly connected with the base (8), a through channel is formed on the surface of the mounting plate (10), the through channel is communicated with the cavity (6), and the end of the cavity (6) away from the mounting plate (10) is a closed structure.
6. The rotary gas inlet for a rapid thermal processing apparatus as set forth in claim 1, wherein The air outlet pipe (2) is horizontally arranged, a vertical first channel is formed in the base (8), the first channel is communicated with the air inlet of the air outlet pipe (2), the air inlet pipe (1) is arranged in the first channel, and a buffer chamber (81) is arranged between the air inlet pipe (1) and the air outlet pipe (2).
7. The rotary gas inlet for a rapid thermal processing apparatus as defined in claim 1, wherein It also includes a motor and a main control module, the output end of the motor is fixedly connected with the end of the air outlet pipe (2) away from the air inlet pipe (1), and the main control module is electrically connected with the motor.
8. The rotary gas inlet for a rapid thermal processing apparatus as set forth in claim 2, wherein A plurality of arc bolt holes are uniformly arranged on the circumference of the fixed flange (4), a fixing screw (5) is arranged in each arc bolt hole, and the fixing screw (5) is fixedly connected with the base (8).
9. The rotary gas inlet for a rapid thermal processing apparatus as set forth in claim 2, wherein The fixed flange (4) is provided with a scale on the surface in the circumferential direction.
10. A method of using a rotating gas inlet device for rapid thermal processing equipment according to any one of claims 1-9, wherein, The method comprises the following steps: Step S1, the base (8) is fixedly connected with the rapid heat treatment equipment, so that the cavity (6) is communicated with the working area of the rapid heat treatment equipment; Step S2, according to the process adopted by the rapid heat treatment equipment, rotate the air outlet pipe (2), adjust the included angle between the axis of the air inlet hole (7) and the vertical direction; Step S3, the process gas is introduced into the air inlet pipe (1), and the process gas flows through the air inlet pipe (1), the air outlet pipe (2), the several air inlet holes (7) and the cavity (6) into the working area.