High heat flow deposition component of high-power ion source discharge cavity

Abstract

The invention discloses a high-heat-flow deposition component of a high-power ion source discharge cavity, which belongs to the technical field of thermal management of a neutral beam injection system of a nuclear fusion device and comprises a thermal deposition component upper plate, a thermal deposition component middle plate and a thermal deposition component lower plate which are sequentially arranged from top to bottom, grooves are formed in the upper and lower surfaces of the thermal deposition part middle plate; the thermal deposition part middle plate and the thermal deposition part upper plate are welded into a whole to form a cooling water channel; the thermal deposition component middle plate and the thermal deposition component lower plate are welded into a whole to form an air inlet channel; the air inlet channels are integrated on the two sides of the thermal deposition face of the high-heat-flow deposition component. After integral welding, an anti-electrode-pollution labyrinth structure is machined on the upper surface of the high-heat-flow deposition component, and a trapezoidal groove is formed in the outer side of the anti-electrode-pollution labyrinth structure; a magnet mounting groove is milled in the bottom of the high-heat-flow deposition component. The method solves the problems of high heat load, material thermal stress concentration and non-uniform heat dissipation of a thermal deposition part caused by upgrading and reconstruction of an ion source plan.

Description

Technical Field

[0001] This invention belongs to the field of thermal management technology for neutral beam injection systems in nuclear fusion devices, and specifically relates to a high heat flux deposition component for a high-power ion source discharge cavity. Background Technology

[0002] Neutral beam injection is a key technology in nuclear fusion research for heating and driving plasmas. It involves injecting a high-energy beam of neutral particles into the plasma, utilizing inter-particle collisions and charge exchange mechanisms to achieve efficient plasma heating. The ion source, as the core component of the neutral beam injection system, directly affects the efficiency and stable operation of the entire heating system. During the operation of the neutral beam injection ion source in the advanced experimental superconducting tokamak, the beam extraction system experiences significant thermal load issues: when positively charged ions are extracted by the accelerating electric field, the accompanying reverse electron flow is accelerated in the opposite direction under the strong electric field, ultimately bombarding the thermally deposited components at high energy. This high thermal load not only leads to thermal stress concentration in the material but also severely restricts the long-pulse operation capability of the ion source.

[0003] During the operation of the positive ion source neutral beam injection system, the high-energy reverse electron flow generated during beam extraction moves in the opposite direction along the beamline, passes through the arc chamber via the plasma generator, and finally bombards the back plate of the arc chamber (i.e., the thermal deposition component). The collision between electrons and the plate wall generated in this process will create a heat load of up to 13.17 MW / m² on the back plate surface as the performance parameters of the ion source are improved (beam power increased from 4MW to 6MW). Compared with the heat load of 7.71 MW / m² before the performance upgrade, the existing traditional thermal deposition component uses deep hole drilling to form four cooling channels below the heat load surface, but it cannot withstand the upgraded heat load. Therefore, it is urgent to optimize the structure of the traditional thermal deposition component to enable it to withstand the upgraded heat load. Summary of the Invention

[0004] To solve the above-mentioned technical problems, the present invention adopts the following technical solution:

[0005] A high-heat-flux deposition component for a high-power ion source discharge cavity includes: an upper plate of the thermal deposition component, a middle plate of the thermal deposition component, and a lower plate of the thermal deposition component arranged sequentially from top to bottom;

[0006] Grooves are formed on both the upper and lower surfaces of the middle plate of the thermal deposition component; the middle plate of the thermal deposition component is welded to the upper plate of the thermal deposition component to form a cooling water channel; the middle plate of the thermal deposition component is welded to the lower plate of the thermal deposition component to form an air intake channel.

[0007] The air intake channel is integrated on both sides of the hot deposition surface of the high heat flux deposition component; after the overall welding is completed, the upper surface of the high heat flux deposition component is machined with an anti-electrode contamination labyrinth structure, and a trapezoidal groove is opened on the outside of the anti-electrode contamination labyrinth structure for installing a sealing ring;

[0008] A magnet mounting groove is milled at the bottom of the high heat flux deposition component to install a permanent magnet, forming a shearing magnetic field to confine the plasma;

[0009] A water outlet and a water inlet are obtained by drilling holes on the back of the high heat flux deposition component to achieve water circulation in the cooling water channel; several air inlets are obtained by drilling holes on the back of the high heat flux deposition component, and air outlets are set on the outer side of the heat load surface of the high heat flux deposition component and the inner side of the anti-electrode contamination labyrinth structure.

[0010] The present invention has the following beneficial effects:

[0011] This invention features a compact overall structure. By replacing the high-temperature resistant material and employing vacuum brazing, the grooved middle plate of the hot deposition component is welded to the upper and lower plates of the deposition component into a single structure. This results in multi-branched rectangular cross-section water channels and air intake channels, providing a simple, convenient, and efficient solution to the problems of high heat load, material thermal stress concentration, and uneven heat dissipation of the hot deposition component caused by ion source upgrades. It provides technical reference for the operation, maintenance, and ion source upgrades of the EAST-NBI (Early Superconducting Tokamak Experimental Device) and supports the stable operation of the ion source under high beam power (6MW) conditions. Attached Figure Description

[0012] Figure 1 This is a schematic diagram of the overall structure of the present invention, wherein: 1-upper plate of the thermal deposition component; 2-middle plate of the thermal deposition component; 3-lower plate of the thermal deposition component; 4-water outlet; 5-cooling water channel; 6-magnet mounting groove; 7-air inlet; 8-water inlet; 9-coil sealing groove; 10-anti-electrode contamination labyrinth structure; 11-air outlet; 12-air inlet channel;

[0013] Figure 2 This is a schematic diagram of the cooling water channel distribution of the present invention, wherein 5 is a cooling water channel;

[0014] Figure 3 This is a schematic diagram of the magnet mounting groove structure of the present invention, wherein 4-water outlet; 6-magnet mounting groove; 7-air inlet; 8-water inlet;

[0015] Figure 4 This is a schematic diagram of the air intake channel and hole distribution of the present invention, wherein 11-air outlet; 12-air intake channel. Detailed Implementation

[0016] To make the objectives, technical solutions, and advantages of this invention clearer, the invention will be further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are merely illustrative and not intended to limit the invention. Furthermore, the technical features involved in the various embodiments of this invention described below can be combined with each other as long as they do not conflict with each other.

[0017] The present invention will now be described in detail with reference to the accompanying drawings and specific embodiments. However, the following embodiments are only for illustrative purposes, and the scope of protection of the present invention should include all the contents of the claims. Moreover, through the description of the following embodiments, those skilled in the art can fully implement all the contents of the claims of the present invention.

[0018] As attached Figure 1As shown, a high-heat-flux deposition component (hereinafter referred to as the thermal deposition component, or simply the high-heat-flux deposition component) for a high-power ion source discharge cavity includes an upper plate 1, a middle plate 2, and a lower plate 3, all integrally formed by welding chromium-zirconium-copper material. The upper plate 1, middle plate 2, and lower plate 3 are arranged sequentially from top to bottom, and grooves are formed on both the upper and lower surfaces of the middle plate 2. The grooved middle plate 2 is welded to the upper plate 1 using vacuum brazing to form a cooling channel 5, which effectively removes the heat deposited on the integral surface by reverse electron bombardment during beam extraction, preventing damage to the component. The grooved middle plate 2 and lower plate 3 are also welded together using vacuum brazing to form an air intake channel 12. The air intake channel 12 is integrated on both sides of the hot deposition surface of the hot deposition component (the air intake channel 12 must avoid the hot deposition surface area) to avoid interference with the cooling water channel 5. After the overall welding is completed, an anti-electrode contamination labyrinth structure 10 is machined on the upper surface of the hot deposition component using a CNC milling machine. The anti-electrode contamination labyrinth structure 10 is a rectangular annular flange (the specific size can be set as needed). This rectangular annular flange has a hollow structure, which encloses the hot deposition area. The outer plane of the flange is used for contact and fixation with other components, and is equipped with an insulating gasket and a coil sealing groove 9 to ensure that the thermionic electrons and tungsten vapor emitted by the filament work are in contact with the insulating gasket installed outside the anti-electrode contamination labyrinth structure 10 (during later assembly). The hot deposition component will be installed on the arc chamber, and an insulating gasket will be added at the contact point between the hot deposition component and the arc chamber. The anti-electrode contamination labyrinth structure 10 is to enclose the hot flow surface. A hollowed-out area is installed around the outside of the anti-electrode contamination labyrinth structure 10. The rectangular insulating gasket has no effect. A trapezoidal groove is opened on the outside of the anti-electrode contamination labyrinth structure 10 to install the sealing ring and ensure the sealing during the ion source assembly process. A magnet mounting groove 6 is milled at the bottom of the thermal deposition component to install a permanent magnet and form a shear magnetic field to confine the plasma. After the thermal deposition component is vacuum brazed, holes (inlet and outlet Φ16mm, depth 29mm) are drilled on the back of the thermal deposition component to obtain the water outlet 4 and water inlet 8 to realize the circulation of water in the cooling water channel 5. Holes (air inlet Φ7.2mm, depth 22mm) are drilled on the back of the thermal deposition component to obtain the air inlet 7. A micropore array is prepared on the outside of the thermal load surface of the thermal deposition component and the inside of the anti-electrode contamination labyrinth structure 10 by laser drilling to obtain the air outlet 11. Threaded through holes are processed at the edge of the upper surface of the thermal deposition component for the positioning and assembly of the thermal deposition component, which is compatible with the existing ion source assembly interface and does not change the support structure.

[0019] Furthermore, the heat deposition component is formed by welding an upper plate 1, a middle plate 2, and a lower plate 3 of the heat deposition component through a vacuum brazing process. Grooves are pre-cut on the upper and lower surfaces of the middle plate 2. Multiple small rectangular grooves are excavated in the middle of the upper surface of the middle plate 2. These grooves are welded together to form a cooling water channel 5 containing multiple small rectangular water paths. Water flows from the inlet 8 into these multiple small rectangular water paths and eventually converges at the same outlet 4. A chamfered edge and rounded corner transition design is implemented in the confluence area of ​​the multiple small rectangular water paths to effectively balance the flow distribution of the multiple water paths and eliminate the phenomenon of concentrated flow field in the middle water path. Two large rectangular grooves are excavated on both sides of the lower surface of the middle plate 2. The four corners of each rectangular groove are rounded, and these grooves are welded together to form a hollow channel of a certain size.

[0020] Furthermore, a magnet mounting groove 6 is machined on the back of the thermally deposited component for mounting a permanent magnet, forming a magnetic field to confine the plasma.

[0021] Furthermore, holes are drilled on the back of the thermally deposited component according to the positions of the cooling water channel 5 and the air intake channel 12 to form a water inlet 8, a water outlet 4 and an air intake hole 7: holes are drilled to the corresponding depth at the junction of the cooling water channels to obtain the water inlet 8 and the water outlet 4, and holes are drilled to the corresponding depth at the two air intake channels to obtain two air intake holes 7.

[0022] Furthermore, several small holes are drilled to the corresponding depth on the heat-loaded surface of the thermally deposited component above the two air inlet channels 12 to form multiple air outlets 11.

[0023] The upper plate 1 of the thermal deposition component has a certain thickness, and its upper surface mainly bears the reverse electron bombardment load. The anti-electrode contamination labyrinth structure 10 is used to ensure that the thermionic electrons and tungsten vapor emitted by the filament do not affect the insulating gasket. At the same time, a coil sealing groove 9 is provided on the outer side of the anti-electrode contamination labyrinth structure 10. The three plates are welded into a whole by vacuum brazing to form a cooling water channel 5 and an air intake channel 12, respectively, avoiding the risks of flow resistance loss and gas leakage caused by traditional deep hole drilling and external hoses. The internal cooling water channel 5 and air intake channel 12 formed by welding significantly improve the structural integrity of the thermal deposition component.

[0024] Holes of a certain depth are made on the back of the completed heat-deposited component according to the positioning to obtain water outlet 4, water inlet 8 and air inlet 7. Furthermore, a magnet mounting groove 6 is made in the middle area of ​​the back to install permanent magnets and form a tangential magnetic field to confine plasma. Then, a micro-hole array is prepared on the upper surface of the heat-deposited component plate 1 by laser drilling. Several (e.g., 20) micro-hole arrays with a certain spacing realize the micro-hole air outlet system. The micro-hole array is integrated on both sides of the heat-deposited surface of the component to obtain air outlet 11, which avoids interference between cooling water channel 5 and air inlet channel 12 while avoiding heat flow surface load.

[0025] The following is in conjunction with the appendix Figure 2 Appendix Figure 3 and attached Figure 4 The invention will be further illustrated by the following examples:

[0026] ① The upper plate 1, middle plate 2, and lower plate 3 of the thermal deposition component have the same length and width, all being rectangular plates, but with varying thicknesses; brazing filler metal is applied to the welding surface, and the process is carried out in a vacuum environment (≤10). -3 Pa) Heat and keep warm, then weld the thermally deposited parts as a whole. After welding, perform machining to correct the flatness.

[0027] ② The two ends of the cooling water channel 5 are designed with chamfered edges and rounded corners. The grooved heat deposition component middle plate 2 and the heat deposition component upper plate 1 are welded together by vacuum brazing to form the cooling water channel 5, avoiding the uneven heat cooling phenomenon caused by drilling deep holes in the traditional heat deposition component cooling water channel. The rectangular cross-section water channel realizes flow distribution. The water channel size is 6mm×2.5mm (wall thickness 4mm) and the maximum length is 620mm, effectively controlling the uniformity of heat exchange.

[0028] ③ The size of the water inlet 8 and the water outlet 4 is Φ16mm, and they are symmetrically distributed about the short central axis; the size of the air inlet 7 is Φ7.2mm, and they are symmetrically distributed about the long central axis and close to the water inlet.

[0029] ④ The overall dimensions of the magnet mounting slot 6 are: 10mm in width and 20mm in depth. For easy installation, rounded corners are provided on the short side.

[0030] ⑤ The intake channel 12 is located outside the cooling water channel 5. After being formed by vacuum brazing, a micro-pore array is prepared on the upper surface of the thermal deposition component by laser drilling and integrated on both sides of the thermal deposition surface of the component to avoid interference with the cooling water channel 5. Its distribution and arrangement are as follows: Figure 4 .

[0031] ⑥ The working principle of the cooling water channel 5 of the heat deposition component is as follows: Under a certain water pressure, cooling water enters the cooling water channel 5 through the inlet 8, flows to the outlet 4 after passing through the branch water channel, absorbs the heat generated inside the ion source during operation; the high-pressure cooling water flow raises the temperature and carries away the heat transferred to the heat deposition component, realizing energy exchange.

[0032] The above description is merely an embodiment of the present invention and does not limit the scope of the present invention. Any equivalent structural or procedural transformations made based on the content of the present invention specification and drawings, or direct or indirect applications in other related system fields, are similarly included within the protection scope of the present invention.

[0033] The contents not described in detail in this specification are existing technologies known to those skilled in the art.

Claims

1. A high heat flux deposition component of a high power ion source discharge chamber, characterized by, The application relates to a high-heat-flow deposition component. The upper plate, the middle plate and the lower plate of the thermal deposition component are sequentially arranged from top to bottom. The upper and lower surfaces of the middle plate of the thermal deposition component are provided with grooves. The middle plate and the upper plate of the thermal deposition component are welded into a whole to form a cooling water channel. The middle plate and the lower plate of the thermal deposition component are welded into a whole to form an air inlet channel. The air inlet channel is integrated on both sides of the thermal deposition surface of the high-heat-flow deposition component. After the whole welding is completed, a trapezoidal groove is formed on the outer side of the anti-electrode pollution labyrinth structure for mounting a sealing ring. A magnet mounting groove is milled on the bottom of the high-heat-flow deposition component for mounting a permanent magnet to form a cutting magnetic field to confine the plasma.

2. A high heat flux deposition component of a discharge chamber of a high power ion source according to claim 1, characterized in that Drilling holes on the back of the high-heat-flow deposition component obtains a water outlet and a water inlet to realize the circulation of water in the cooling water channel.

3. A high heat flux deposition component of a discharge chamber of a high power ion source according to claim 1, characterized in that Drilling holes on the back of the high-heat-flow deposition component obtains a plurality of air inlets, and air outlets are arranged on the outer side of the thermal load surface of the high-heat-flow deposition component and the inner side of the anti-electrode pollution labyrinth structure.

4. The high heat flux deposition component of a high power ion source discharge chamber of claim 1, wherein, The middle plate and the upper plate of the thermal deposition component are welded into a whole through a vacuum brazing process.

5. The high heat flux deposition component of a high power ion source discharge chamber of claim 1, wherein, The anti-electrode pollution labyrinth structure is machined on the upper surface of the high-heat-flow deposition component through a numerical control milling machine.

6. A high heat flux deposition component of a discharge chamber of a high power ion source according to claim 1, characterized in that The anti-electrode pollution labyrinth structure is machined on the outer side of the thermal load surface of the high-heat-flow deposition component and the inner side of the anti-electrode pollution labyrinth structure through laser drilling to obtain a micropore array and air outlets.

7. A high heat flux deposition component of a discharge chamber of a high power ion source according to claim 6, characterized in that Screw through holes are machined on the edge of the upper surface of the high-heat-flow deposition component for the positioning and assembly of the high-heat-flow deposition component, and the screw through holes are compatible with the existing ion source assembly interface.

8. The high heat flux deposition component of a high power ion source discharge chamber of claim 1, wherein, A plurality of small rectangular grooves are excavated in the middle position of the upper surface of the middle plate of the thermal deposition component, and the plurality of small rectangular grooves form a cooling water channel containing a plurality of small rectangular water channels through welding.

9. The high heat flux deposition component of a high power ion source discharge chamber of claim 1, wherein, The bevel chamfer and the round corner transition design are implemented in the confluence area of the plurality of small rectangular water channels.

10. A high heat flux deposition component of a discharge chamber of a high power ion source according to claim 1, characterized in that Two large rectangular grooves are arranged on both sides of the lower surface of the middle plate of the thermal deposition component, the four corners of each rectangular groove are implemented with round corner transition, and a channel with a certain size and hollow is formed through welding. The anti-electrode pollution labyrinth structure 10 is a rectangular annular flange, which is a hollow structure and encloses the thermal deposition area; the outer side plane of the flange is used for contacting and fixing with other components; the outer side of the anti-electrode pollution labyrinth structure is provided with an insulating gasket and a coil sealing groove. The water inlet and the water outlet are symmetrically distributed about the short central axis; the air inlets are symmetrically distributed about the long central axis and close to the water inlet side.

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