A high-consistency film-forming vacuum drying apparatus

Abstract

This application relates to a vacuum drying apparatus for highly consistent film formation, comprising a housing with a sealed processing chamber inside; a negative pressure component connected to the processing chamber via multiple air extraction ports; and a flow equalization component located at the top inner edge of the housing for equalizing the airflow generated by the negative pressure component. The flow equalization component includes multiple flow equalization plates, each with multiple uniformly distributed flow equalization grooves on its top surface, and multiple through-hole air extraction holes at the bottom of each groove. Multiple flow equalization plates are stacked sequentially, with the top plate of the stack pressed against the top inner edge of the housing. Multiple air extraction holes on the upper flow equalization plate are connected to multiple flow equalization grooves on the lower flow equalization plate. This application utilizes the flow equalization component to perform multi-layer flow equalization and stabilization treatment on the high-speed, concentrated airflow before applying it to the processing chamber. This ensures the uniformity of the airflow on the film surface while maintaining the extraction rate, and the airflow is gentler, thus ensuring consistent film formation and improving film quality.

Description

Technical Field

[0001] This application relates to the field of vacuum drying technology, and in particular to a vacuum drying apparatus for high-uniform film formation. Background Technology

[0002] Perovskite solar cells are attracting increasing attention due to their high conversion efficiency, low cost, and environmental friendliness. Furthermore, the photoelectric conversion efficiency of perovskite solar cells has increased several times in just a few years, demonstrating exceptional photoelectric performance.

[0003] In the fabrication of perovskite solar cells, multiple film layers need to be formed on a substrate, typically using methods such as blade coating or spray coating. These layers then undergo vacuum drying to remove the solvent. The drying process for perovskite solar cells requires a relatively fast vacuum rate to ensure the uniformity and quality of the film layers.

[0004] In related technologies, high-powered vacuum equipment is used to evacuate the processing chamber for drying, thereby accelerating the vacuuming process to meet the requirements of vacuum drying. Typically, multiple evacuation ports are arranged at the top of the processing chamber to further speed up the evacuation.

[0005] However, high-speed air extraction can lead to excessive local airflow within the processing chamber, resulting in different gas velocities at different locations on the substrate film layer. This can cause varying drying rates at different locations, negatively impacting the uniformity and consistency of film formation. Furthermore, the film layer closer to the extraction port is more prone to drifting under the influence of high-speed airflow, causing film damage and adversely affecting film quality. Summary of the Invention

[0006] This application provides a vacuum drying apparatus for highly uniform film formation, which solves the technical problem in the related art where excessive local airflow in the processing chamber leads to different drying rates at different locations of the film, adversely affecting the uniformity and consistency of film formation or even causing film damage.

[0007] A vacuum drying apparatus for high-uniform film formation includes: The housing has a sealed processing chamber inside, and the substrate is suitable for being placed inside the housing for processing, with the film layer of the substrate facing upwards. The negative pressure assembly has multiple air extraction ports on the top of the housing, and the negative pressure assembly is connected to the processing chamber through these multiple air extraction ports. A flow equalization assembly is arranged at the inner top of the housing and is used to equalize the airflow generated by the negative pressure assembly. The flow equalization assembly includes multiple flow equalization plates, each with multiple flow equalization grooves evenly formed on its top surface. Each flow equalization groove has multiple through-holes at its bottom. Multiple flow equalization plates are stacked sequentially, with the top plate of the stack pressed against the inner top surface of the housing. The multiple flow equalization grooves of the top layer flow equalization plate are connected to multiple air extraction ports, the multiple air extraction holes of the upper layer flow equalization plate are connected to the multiple flow equalization grooves of the lower layer flow equalization plate, and the multiple air extraction holes of the bottom layer flow equalization plate are connected to the processing chamber.

[0008] In some embodiments, the diameter of the plurality of air extraction holes on each of the flow equalization plates is arranged to decrease sequentially from the center to the edge of the flow equalization plate.

[0009] In some embodiments, the bottom of each flow equalization groove of the bottom flow equalization plate is also uniformly provided with a plurality of secondary air extraction holes.

[0010] In some embodiments, the bottom of the plurality of air extraction holes and the plurality of air extraction auxiliary holes of the bottom flow equalization plate are all arranged with flared openings.

[0011] In some embodiments, the vacuum drying apparatus for highly uniform film formation further includes a frame, with the housing mounted on the frame, the housing comprising: A base body, the base body being adapted to support the substrate; A cover body, the cover body being adapted to be fastened to form a sealed processing chamber; In this configuration, one of the base and the cover is slidably arranged on the frame, while the other is fixed to the frame. The cover and the base move relative to each other in the vertical direction to open and close the housing.

[0012] In some embodiments, the vacuum drying apparatus for high-consistency film formation further includes a lifting assembly, wherein the seat is slidably and vertically arranged on the frame; the lifting assembly includes a push block and a lifting drive, wherein the lifting drive drives the push block to rise, the push block rising to push the seat upward, thereby engaging the cover, and forming a sealed processing chamber between the seat and the cover.

[0013] In some embodiments, the vacuum drying apparatus for highly consistent film formation further includes a sealing structure comprising a sealing ring disposed at the bottom edge of the cover and / or the top edge of the seat; the sealing ring deforms when the seat is raised to be fastened by the cover; The pusher block pushes the seat upward, causing the seat and the cover to be pressed together by the sealing ring. Then, the negative pressure assembly applies a negative pressure environment to the processing chamber, causing the sealing ring to deform and thus driving the seat to rise further, creating a gap between the seat and the pusher block.

[0014] In some embodiments, the lifting assembly further includes a mating block, which is installed on the base and is abutted by the push block, and the push block and the mating block form an interlocking fit in the vertical direction.

[0015] In some embodiments, the vacuum drying apparatus for high-consistency film formation further includes multiple damping elements, which are installed at the drive end of the lifting drive element, and the buffer end of the damping element continuously faces upward and presses against the base. When the negative pressure environment inside the processing chamber is released, the damping component buffers the downward impact force on the seat.

[0016] In some embodiments, the top surface of the base is raised in the middle, and the raised position in the middle of the base is used to support the substrate, and the bottom surface of the cover abuts against the edge of the base.

[0017] The beneficial effects of the technical solution provided in this application include: This application provides a vacuum drying apparatus for highly consistent film formation. During film formation, the substrate is first placed in the processing chamber of the housing. The concentrated high-speed airflow generated by the negative pressure component is initially diverted by the top-level flow equalization groove, and then sequentially passes through a multi-stage alternating flow guide path of "flow equalization groove → air extraction hole → lower flow equalization groove". After the high-speed airflow is evenly and stably distributed in the flow equalization groove, the extraction airflow is more evenly transferred to the lower flow equalization plate, and finally the extraction airflow acts stably and evenly on the processing chamber. This achieves step-by-step buffering, diffusion and redistribution of airflow, significantly reducing local fluctuations in airflow velocity within the processing chamber, making the gas velocity distribution in each area of ​​the substrate film surface highly uniform, ensuring that the drying rate at different locations on the substrate film tends to be consistent, and significantly improving the uniformity and consistency of film formation.

[0018] The flow equalization component progressively equalizes and buffers the high-speed suction airflow generated by the negative pressure component, significantly reducing the gas velocity reaching the membrane surface. Multiple suction holes in the bottom flow equalization plate disperse the airflow into more uniform and gentler streams, greatly reducing the local shear force exerted on the membrane. Combined with the membrane surface facing upwards, this completely eliminates the risk of membrane migration and tearing caused by high-speed airflow impact, effectively protecting the integrity of the membrane structure and significantly improving film quality.

[0019] While maintaining high pumping efficiency to meet the requirements of rapid vacuum drying process, there is no need to reduce pumping power or extend drying time. This balances production efficiency and film formation consistency, meets process requirements, and significantly improves the photoelectric conversion efficiency stability and batch yield of perovskite solar cells. Attached Figure Description

[0020] To more clearly illustrate the technical solutions in the embodiments of this application, the accompanying drawings used in the description of the embodiments will be briefly introduced below. Obviously, the accompanying drawings described below are only some embodiments of this application. For those skilled in the art, other drawings can be obtained based on these drawings without creative effort.

[0021] Figure 1 A schematic diagram of a vacuum drying apparatus for high-consistency film formation provided in an embodiment of this application; Figure 2 A schematic diagram of the base, cover, and lifting assembly provided in the embodiments of this application; Figure 3 An internal schematic diagram of the cover and seat after they are fastened together, as provided in an embodiment of this application; Figure 4 A partial exploded view of the housing and flow equalization assembly provided in the embodiments of this application; Figure 5 A partial schematic diagram of the bottom surface of the flow equalization plate provided in an embodiment of this application; Figure 6 A schematic diagram showing the seat being pushed up by a lifting assembly, as provided in an embodiment of this application; Figure 7 A schematic diagram from another perspective showing the seat being pushed up by the lifting assembly, as provided in the embodiments of this application. Figure 8 A schematic diagram of the seat contact sealing ring provided in an embodiment of this application; Figure 9 This is a schematic diagram illustrating the further compression of the sealing ring in the seat body provided in the embodiments of this application.

[0022] In the diagram: 1. Base; 2. Cover; 2a. Air extraction port; 3. Frame; 4. Lifting assembly; 41. Push block; 42. Lifting drive component; 43. Mating block; 5. Sealing structure; 6. Damping component; 7. Lifting assembly; 71. Lifting cylinder; 72. Lateral drive component; 8. Flow equalization plate; 8a. Flow equalization groove; 8b. Air extraction port; 8c. Secondary air extraction port; A. Housing; a. Processing chamber. Detailed Implementation

[0023] To make the objectives, technical solutions, and advantages of the embodiments of this application clearer, the technical solutions of the embodiments of this application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of this application, not all embodiments. Based on the embodiments of this application, all other embodiments obtained by those skilled in the art without creative effort are within the scope of protection of this application.

[0024] This application provides a vacuum drying apparatus for highly uniform film formation. It utilizes a flow equalization component to perform multi-layer flow equalization and stabilization treatment on a high-speed, concentrated airflow before applying it to the processing chamber. This ensures the uniformity of airflow on the film surface while maintaining the pumping rate, and the airflow is gentler, guaranteeing film formation consistency and improving film quality. This application addresses the technical problem of excessive localized airflow within the processing chamber, which leads to different drying rates at different locations on the film, adversely affecting film uniformity and consistency, and even causing film damage.

[0025] Reference Figure 1 and Figure 2 A vacuum drying apparatus for high-consistency film formation includes a frame 3, a housing A, and a negative pressure assembly. The housing A is mounted on the frame 3 and includes a sealed processing chamber a. During vacuum drying film formation, a substrate is placed inside the housing A with the film layer facing upwards. Multiple air extraction ports 2a are provided on the top of the housing A, and the negative pressure assembly communicates with the processing chamber a through these ports 2a.

[0026] Preferably, the multiple suction ports 2a are evenly arranged. The negative pressure assembly includes an external suction pump, which may be at least one of a dry pump and a molecular pump.

[0027] The processing chamber a inside the housing A is evacuated by a negative pressure component, and the film layer on the substrate surface is vacuum dried to complete the film formation process.

[0028] Reference Figure 3 and Figure 4 Optionally, in this embodiment, the vacuum drying apparatus for high-uniform film formation further includes a flow equalization component, which is arranged at the top inner part of the housing A and is used to equalize the airflow generated by the negative pressure component. The equalized airflow then acts on the processing chamber a.

[0029] Reference Figure 3 and Figure 4Specifically, the flow equalization assembly includes multiple flow equalization plates 8. Multiple flow equalization grooves 8a are evenly distributed on the top surface of each flow equalization plate 8, and multiple through-holes 8b are formed at the bottom of each groove 8a. Multiple flow equalization plates 8 are stacked sequentially, with the top plate 8 pressed against the inner top surface of the housing A. The multiple flow equalization grooves 8a of the top-layer flow equalization plate 8 are connected to multiple air extraction ports 2a, the multiple air extraction holes 8b of the upper-layer flow equalization plate 8 are connected to the multiple flow equalization grooves 8a of the lower-layer flow equalization plate 8, and the multiple air extraction holes 8b of the bottom-layer flow equalization plate 8 are connected to the processing chamber a.

[0030] With this setup, during film drying, the substrate is first placed in processing chamber a of housing A. The concentrated high-speed airflow generated by the negative pressure component is initially diverted by the top-layer flow equalization groove 8a, and then sequentially passes through a multi-stage alternating flow path of "flow equalization groove 8a → air extraction hole 8b → lower flow equalization groove 8a". After the high-speed airflow is evenly and stably distributed in the flow equalization groove 8a, the extraction airflow is more evenly transferred to the lower flow equalization plate 8, and finally the extraction airflow acts stably and evenly on processing chamber a. This achieves step-by-step buffering, diffusion, and redistribution of airflow, significantly reducing local fluctuations in airflow velocity within processing chamber a, making the gas velocity distribution highly uniform in all areas of the substrate film surface, ensuring that the drying rate at different locations on the substrate film tends to be consistent, and significantly improving the uniformity and consistency of film formation.

[0031] The flow equalization component progressively equalizes and buffers the high-speed suction airflow generated by the negative pressure component, significantly reducing the gas velocity reaching the membrane surface. Multiple suction holes 8b in the bottommost flow equalization plate 8 disperse the airflow into more uniform and gentler streams, greatly reducing the local shear force exerted on the membrane. Combined with the membrane surface facing upwards, this completely eliminates the risk of membrane migration and tearing caused by high-speed airflow impact, effectively protecting the integrity of the membrane structure and significantly improving film quality.

[0032] While maintaining high pumping efficiency to meet the requirements of rapid vacuum drying, there is no need to reduce pumping power or extend drying time. This balances production efficiency and film formation consistency, meets process requirements, and significantly improves the photoelectric conversion efficiency stability and batch yield of perovskite solar cells. It is understandable that after the high-speed airflow enters the flow equalization groove 8a, the opening of the flow equalization groove 8a is blocked, the airflow fills the flow equalization groove 8a and is stabilized, and then enters the flow equalization groove 8a below or the processing chamber a from the air extraction hole 8b, thereby gradually ensuring the consistency of the air extraction airflow in each place after entering the processing chamber a, and making the air extraction airflow gentler.

[0033] Reference Figure 3 and Figure 4Preferably, the air extraction hole 8b or air extraction port 2a that communicates with the flow equalization groove 8a is located in the middle of the opening of the flow equalization groove 8a, so that the air extraction airflow can be evenly filled into the flow equalization groove 8a.

[0034] Furthermore, the multiple air extraction holes 8b in each flow equalization groove 8a are evenly distributed at the bottom edge of the flow equalization groove 8a. Therefore, after the airflow entering the flow equalization groove 8a stabilizes, it diffuses to the edge of the flow equalization groove 8a and then passes evenly through the multiple air extraction holes 8b, ensuring the uniformity of the airflow in different air extraction holes 8b.

[0035] In this embodiment, the flow equalization plates 8 are fixed together by bolts, and sealing rings are arranged between the flow equalization plates 8 and between the flow equalization plates 8 and the inner top wall of the box A, so as to ensure that each flow equalization groove 8a on each flow equalization plate 8 is independent and to avoid airflow crosstalk that affects the uniformity and stability of the airflow.

[0036] Each flow equalization plate 8 is composed of multiple single plates, and each single plate has a flow equalization groove 8a. In this embodiment, preferably, each single plate has at least one flow equalization groove 8a.

[0037] This configuration, utilizing single-board assembly, makes it easier to assemble and maintain the flow equalization components. It also prevents deformation of the large-size flow equalization plate 8, which could prevent the surface of the flow equalization plate 8 from being completely attached to the upper flow equalization plate 8 or the top surface of the housing A. This ensures that the multiple flow equalization slots 8a on the flow equalization plate 8 are completely independent, avoiding airflow crosstalk.

[0038] Reference Figure 4 and Figure 5 Optionally, the diameter of the plurality of air extraction holes 8b on each flow equalizer 8 is arranged to decrease sequentially from the center to the edge of the flow equalizer 8.

[0039] With this configuration, the airflow entering processing chamber a is more concentrated near the center of chamber a compared to near its sidewalls. Understandably, the airflow near the inner wall of chamber a is blocked, resulting in a higher airflow velocity at the film edge. By differentiating the airflow flow between the film edge and center, better consistency in airflow between these areas is ensured, thus guaranteeing consistent film formation.

[0040] Reference Figure 4 and Figure 5 Optionally, each flow equalization groove 8a of the bottom flow equalization plate 8 is also provided with multiple air extraction auxiliary holes 8c evenly distributed at the bottom of the groove.

[0041] Specifically, multiple auxiliary extraction holes 8c are evenly arranged at the bottom of the flow equalization tank 8a. Preferably, the diameter of the auxiliary extraction holes 8c is smaller than the diameter of the extraction holes 8b.

[0042] This configuration utilizes the auxiliary venting hole 8c to assist in venting, further increasing the number of venting positions and facilitating a more uniform application of the venting airflow to the film layer on the substrate surface.

[0043] Reference Figure 4 and Figure 5 Optionally, further, the bottom of the multiple extraction holes 8b and multiple extraction auxiliary holes 8c of the bottom flow equalization plate 8 are all arranged with flared openings.

[0044] Specifically, the bottom of both the extraction port 8b and the auxiliary extraction port 8c is flared to increase the orifice diameter and prevent the extraction airflow from concentrating and entering the processing chamber a. This allows the extraction airflow to act more gently on the film surface, thus ensuring the morphology of the film.

[0045] In this embodiment, the flow equalization plate 8 includes two.

[0046] Reference Figure 1 and Figure 2 The vacuum drying apparatus for high-consistency film formation also includes a frame 3, with a housing A mounted on the frame 3. The housing A includes a base 1 and a cover 2. The base 1 is adapted to support the substrate. The cover 2 is adapted to be fastened to form a sealed processing chamber a.

[0047] Reference Figure 1 and Figure 2 Specifically, one of the seat 1 and the cover 2 is slidably arranged on the frame 3, and the other is fixed to the frame 3. The cover 2 and the seat 1 move relative to each other in the vertical direction to open and close the box A.

[0048] In this embodiment, preferably, the cover 2 is fixed to the frame 3, and the seat 1 is slidably arranged on the frame 3.

[0049] Specifically, the base 1 is raised and lowered to abut against the cover 2, and the cover 2 is then engaged with the base 1, forming a sealed processing chamber a between the cover 2 and the base 1. A negative pressure assembly is used to evacuate the processing chamber a.

[0050] In this embodiment, the base 1 is arranged on the frame 3 by lifting and lowering via at least one of the slide rails and guide rods.

[0051] When loading and unloading the substrate, the base 1 descends, thereby increasing the space above the base 1 to facilitate the loading and unloading of the substrate.

[0052] With this arrangement, since the base 1 is raised and lowered, the cover 2 does not affect the space above the base 1 when the substrate is loaded and unloaded. Therefore, there is no need to reserve extra space for the ejector pin assembly required for substrate loading and unloading. As a result, the processing chamber a formed after the cover 2 is fastened to the base 1 can be made smaller, which improves the vacuuming speed and meets the process requirements of rapid vacuuming, thus ensuring printing quality.

[0053] Furthermore, since the base 1 rises and falls, the cover 2, which is connected to the negative pressure component, remains fixed and does not need to move. Therefore, the connecting pipe between the negative pressure component and the suction port 2a does not need to be arranged as a flexible hose. During high-power vacuuming, there is no problem of the pipe shrinking and deforming due to air pressure, avoiding air leakage caused by pipe deformation, and ensuring the suction rate, so as to ensure that the vacuuming process meets the required process requirements and ensures the film quality.

[0054] The top surface of the base 1 has a raised section in the middle, which is used to support the substrate. The bottom surface of the cover 2 abuts against the edge of the base 1.

[0055] With this configuration, after the cover 2 is fastened to the base 1, the protruding part of the base 1 further occupies the internal space of the cover 2, thereby reducing the internal volume of the processing chamber a, improving the vacuuming efficiency of the processing chamber a, and ensuring the film formation quality.

[0056] Reference Figure 2 and Figure 6 The lifting assembly 4 includes a push block 41 and a lifting drive component 42. The lifting drive component 42 is mounted on the frame 3, and the push block 41 is mounted on the drive end of the lifting drive component 42. By driving the push block 41 to rise and push the seat 1 upward, the seat 1 can be raised. When the push block 41 falls, the seat 1 falls together with the push block 41 due to the gravity of the seat 1.

[0057] In this embodiment, it is necessary to ensure the movement accuracy of the seat 1 so that the seat 1 is just pressed against the cover 2, avoiding any impact to the cover 2 or any gap between the seat 1 and the cover 2. Preferably, the lifting drive component 42 includes a lead screw mechanism or a linear motor.

[0058] In this embodiment, the lifting assembly 4 is provided in multiple sets. The multiple sets of lifting assemblies 4 simultaneously apply force to multiple positions of the seat 1 to stably support the seat 1 and stably push the seat 1 to rise.

[0059] Reference Figure 2 and Figure 3 The vacuum drying apparatus for high-uniform film formation further includes a sealing structure 5, which comprises a sealing ring disposed at the bottom edge of the cover 2 and / or the top edge of the seat 1. In this embodiment, the sealing ring is disposed at the top edge of the seat 1. When the seat 1 rises to be fastened by the cover 2, the sealing ring deforms.

[0060] Reference Figures 7-9 Specifically, the pusher block 41 causes the seat 1 to rise until it abuts against the sealing ring, thereby forming a sealed processing chamber a. Subsequently, under the action of the negative pressure component, the sealing ring will further deform, thereby further raising the seat 1.

[0061] With this configuration, since the push block 41 is not directly connected to the seat 1, when the negative pressure component draws a vacuum, causing the sealing ring to deform and the seat 1 to rise, the push block 41 will not be driven to rise by the seat 1. Therefore, the lifting drive component 42 will not be subjected to tension, thus avoiding damage to the lifting drive component 42.

[0062] Reference Figures 7-9 In this process, the pusher block 41 pushes the seat 1 upward, so that the seat 1 and the cover 2 are pressed together by the sealing ring. Then, the negative pressure assembly applies a negative pressure environment to the processing chamber a, so that the sealing ring is deformed and the seat 1 is further raised, so that a gap is generated between the seat 1 and the pusher block 41.

[0063] This configuration, by applying negative pressure to the processing chamber a, further compresses the sealing ring and uses the air pressure difference to support the seat 1, ensures the sealing state of the processing chamber a.

[0064] The two end faces of the sealing ring are the mounting surface and the abutment surface, respectively. The part of the sealing ring closer to the abutment surface is more prone to deformation than the part closer to the mounting surface.

[0065] This design ensures that when the seat 1 and cover 2 are initially pressed together by the sealing ring, the sealing ring is prone to deformation. This deformation of both the seat 1 and cover 2 guarantees a seal between them, reducing the precision requirements for machining the seat 1 and cover 2 and saving on manufacturing costs. Furthermore, even when the sealing ring is further compressed by air pressure, it can still withstand deformation and prevent collisions between the seat 1 and cover 2.

[0066] Preferably, the surface of the cover 2 or the seat 1 for installing the sealing ring is provided with an annular groove, and the sealing ring is installed in the annular groove to limit the lateral movement of the sealing ring and facilitate the installation and positioning of the sealing ring.

[0067] Optionally, the lifting assembly 4 also includes a mating block 43, which is installed on the base 1 and is abutted by the push block 41. The push block 41 and the mating block 43 form an interlocking fit in the vertical direction.

[0068] This configuration, with the mating block 43 providing a position for the pusher block 41 to push against the base 1, serves two purposes. First, it provides the pusher block 41 with a force-applying position to push against the base 1, preventing damage to the base 1 caused by prolonged pushing by the pusher block 41. Second, when the pusher block 41 lifts and supports the base 1, the lateral movement of the base 1 is restricted through the interlocking of the pusher block 41 and the mating block 43, ensuring stable lifting and lowering of the base 1 and preventing wobbling of the base plate on the base 1.

[0069] In some embodiments, the lifting assembly 4 further includes an elastic element, and the push block 41 is connected to the driving end of the lifting drive 42 through the elastic element, and the deformation direction of the elastic element is vertical.

[0070] Specifically, when the lifting drive 42 drives the push block 41 to rise and push the seat 1, as the push block 41 rises, it comes into contact with the seat 1, and the elastic element is gradually compressed. Then, the lifting drive 42 drives the elastic element and the seat 1 together to rise. After the seat 1 and the cover 2 abut against each other through the sealing ring, as the negative pressure component evacuates the processing chamber a, the seat 1 rises further under the action of the pressure difference. At this time, the push block 41, under the action of the elastic element, rises along with the seat 1 and continues to press against the seat 1. Finally, after the vacuum in the processing chamber a is released, the seat 1 falls and is directly caught by the push block 41, without any hard collision with the push block 41.

[0071] With this configuration, the lifting drive component 42 supports the push block 41 via an elastic element. After the seat 1 rises due to the air pressure difference, the elastic force of the elastic element causes the push block 41 to continuously press against the seat 1. Furthermore, the lifting drive component 42 and the push block 41 are elastically connected through the elastic element. After the vacuum in the subsequent processing chamber a is broken, the seat 1 will fall at high speed due to its weight and the rebound force of the sealing ring. Because the push block 41 continuously presses against the seat 1, the seat 1 will not collide hard with the push block 41. Moreover, due to the action of the elastic element, the falling seat 1 is buffered, thus the impact on the lifting drive component 42 is buffered, making it less likely to be damaged.

[0072] It should be noted that the pressure difference causes the seat 1 to rise further, which further compresses the sealing ring. When the vacuum state of the processing chamber a is released, the elastic force of the sealing ring is relatively large, causing the seat 1 to fall violently with a strong impact force. If the rebound force of the sealing ring accelerates the descent of the seat 1 and impacts the push block 41, it can easily cause a sudden increase in the instantaneous force on the lifting drive component 42, resulting in damage.

[0073] In this embodiment, the elastic element includes a damper, a spring, etc.

[0074] Reference Figure 3 and Figure 6 The vacuum drying device for high-consistency film formation also includes multiple damping elements 6, which are installed at the drive end of the lifting drive element 42. The buffer end of the damping element 6 continuously faces upward and presses against the seat 1. When the negative pressure environment in the processing chamber a is released, the damping element 6 buffers the downward impact force on the seat 1.

[0075] Specifically, the damping element 6 and the push block 41 are both installed on the driving end of the lifting drive element 42. The height of the buffer end of the damping element 6 that abuts against the seat 1 is higher than the height of the push end of the push block 41 that abuts against the seat 1, and the height difference between the two is greater than the deformation length of the sealing ring.

[0076] Reference Figures 7-9 As the lifting drive 42 drives the push block 41 to rise, the damping element 6 rises simultaneously, and the damping element 6 abuts against the seat 1 before the push block. As the lifting drive 42 further drives the push block 41 to rise until it abuts against the seat 1, and the seat 1 abuts against the cover 2, the buffer end of the damping element 6 undergoes an elastic downward displacement. As the negative pressure assembly evacuates the processing chamber a, and the seat 1 rises further due to the pressure difference, compressing the sealing ring, the buffer end of the damping element 6 rises synchronously and remains pressed against the seat 1.

[0077] In this embodiment, the damping element 6 includes a damper.

[0078] With this configuration, the damping element 6 continuously presses against the seat 1, and even after the seat 1 rises and detaches from the pusher block 41 due to the air pressure difference, the damping element 6 continues to push against the seat 1. When the negative pressure in the processing chamber a is released, the seat 1 is supported by the damping element 6 and slowly falls, thereby preventing the seat 1 from falling rapidly and hitting the pusher, thus protecting the lifting drive component 42 from sudden force increase.

[0079] Reference Figure 1 In some embodiments, the vacuum drying apparatus for high-consistency film formation further includes a lifting assembly 7. After the lifting assembly 4 raises the seat 1 to a predetermined height, the lifting assembly 7 raises the seat 1 and presses it against the cover 2 through a sealing ring. After the connection between the cover 2 and the seat 1 is released, the lifting assembly 7 catches the falling seat 1. This embodiment can be arranged together with the embodiment with the damping element 6, or arranged separately.

[0080] With this configuration, after the lifting drive component 42 pushes the top block 41 to a predetermined height, the lifting assembly 7 pushes the seat 1 to rise, and the lifting assembly 7 drives the seat 1 to rise and abut against the cover 2. After the connection between the cover 2 and the seat 1 is released, the lifting assembly 7 supports the falling seat 1, and then the lifting assembly 7 drives the seat 1 to descend until it is supported by the top block 41.

[0081] The lifting assembly 7 is used to support the falling seat 1, preventing the seat 1 from hitting the push block 41 and causing damage to the lifting drive component 42, thereby protecting the lifting drive component 42.

[0082] Specifically, in this embodiment, the lifting assembly 7 includes a lifting cylinder 71 and a transverse drive 72. The lifting cylinder 71 is installed on the transverse drive 72. After the seat 1 is at the pre-set height, the transverse drive 72 drives the lifting cylinder 71 to move below the seat 1. The lifting cylinder 71 pushes the seat 1 up so that the seat 1 is pressed against the cover 2 by the sealing ring.

[0083] Specifically, the lateral movement drive 72 is mounted on the frame 3, and the lifting cylinder 71 is driven by the lateral movement drive 72 to move laterally. The lifting cylinder 71 can move laterally to the bottom of the base 1, or the lifting cylinder 71 can move to the side of the base 1, thereby leaving space for the base 1 to descend.

[0084] The lifting cylinder 71 pushes the seat 1 to abut the cover 2, and then the lifting cylinder 71 absorbs the impact force of the seat 1. Due to the inherent cylinder characteristics of the lifting cylinder 71, it has a certain buffering capacity and is not easily damaged by impact. Therefore, a pin cylinder is used to support the seat 1.

[0085] In this embodiment, the lateral drive 72 includes a linear motor, a cylinder, or a lead screw mechanism.

[0086] This application provides a vacuum drying apparatus for highly consistent film formation. During film formation, the substrate is first placed in the processing chamber a of housing A. The concentrated high-speed airflow generated by the negative pressure component is initially diverted by the top flow equalization groove 8a, and then sequentially passes through a multi-stage alternating flow path of "flow equalization groove 8a → air extraction hole 8b → lower flow equalization groove 8a". After the high-speed airflow is evenly and stably distributed in the flow equalization groove 8a, the extraction airflow is more evenly transferred to the lower flow equalization plate 8, and finally the extraction airflow acts stably and evenly on the processing chamber a. This achieves step-by-step buffering, diffusion and redistribution of airflow, significantly reducing local fluctuations in airflow velocity within the processing chamber a, making the gas velocity distribution in each area of ​​the substrate film surface highly uniform, ensuring that the drying rate at different locations on the substrate film tends to be consistent, and significantly improving the uniformity and consistency of film formation.

[0087] The flow equalization component progressively equalizes and buffers the high-speed suction airflow generated by the negative pressure component, significantly reducing the gas velocity reaching the membrane surface. Multiple suction holes 8b in the bottommost flow equalization plate 8 disperse the airflow into more uniform and gentler streams, greatly reducing the local shear force exerted on the membrane. Combined with the membrane surface facing upwards, this completely eliminates the risk of membrane migration and tearing caused by high-speed airflow impact, effectively protecting the integrity of the membrane structure and significantly improving film quality.

[0088] While maintaining high pumping efficiency to meet the requirements of rapid vacuum drying process, there is no need to reduce pumping power or extend drying time. This balances production efficiency and film formation consistency, meets process requirements, and significantly improves the photoelectric conversion efficiency stability and batch yield of perovskite solar cells.

[0089] In the description of this application, it should be noted that the terms "upper," "lower," etc., indicating the orientation or positional relationship are based on the orientation or positional relationship shown in the accompanying drawings, and are only for the convenience of describing this application and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation, and therefore should not be construed as a limitation of this application. Unless otherwise expressly specified and limited, the terms "installed," "connected," and "linked" should be interpreted broadly. For example, they can refer to a fixed connection, a detachable connection, or an integral connection; they can refer to a mechanical connection or an electrical connection; they can refer to a direct connection or an indirect connection through an intermediate medium; they can refer to the internal communication between two elements. For those skilled in the art, the specific meaning of the above terms in this application can be understood according to the specific circumstances.

[0090] It should be noted that in this application, relational terms such as "first" and "second" are used merely to distinguish one entity or operation from another, and do not necessarily require or imply any such actual relationship or order between these entities or operations. Furthermore, the terms "comprising," "including," or any other variations thereof are intended to cover non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a list of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such a process, method, article, or apparatus. Without further limitations, an element defined by the phrase "comprising one..." does not exclude the presence of other identical elements in the process, method, article, or apparatus that includes said element.

[0091] The above description is merely a specific embodiment of this application, enabling those skilled in the art to understand or implement this application. Various modifications to these embodiments will be readily apparent to those skilled in the art, and the general principles defined herein may be implemented in other embodiments without departing from the spirit or scope of this application. Therefore, this application is not to be limited to the embodiments shown herein, but is to be accorded the widest scope consistent with the principles and novel features claimed herein.

Claims

1. A vacuum drying apparatus for highly uniform film formation, characterized in that, It includes: The housing has a sealed processing chamber inside, and the substrate is suitable for being placed inside the housing for processing, with the film layer of the substrate facing upwards. The negative pressure assembly has multiple air extraction ports on the top of the housing, and the negative pressure assembly is connected to the processing chamber through these multiple air extraction ports. A flow equalization assembly is arranged at the inner top of the housing and is used to equalize the airflow generated by the negative pressure assembly. The flow equalization assembly includes multiple flow equalization plates, each with multiple flow equalization grooves evenly formed on its top surface. Each flow equalization groove has multiple through-holes at its bottom. Multiple flow equalization plates are stacked sequentially, with the top plate of the stack pressed against the inner top surface of the housing. The multiple flow equalization grooves of the top layer flow equalization plate are connected to multiple air extraction ports, the multiple air extraction holes of the upper layer flow equalization plate are connected to the multiple flow equalization grooves of the lower layer flow equalization plate, and the multiple air extraction holes of the bottom layer flow equalization plate are connected to the processing chamber.

2. The vacuum drying apparatus for high-uniform film formation according to claim 1, characterized in that, The diameter of the plurality of air extraction holes on each of the flow equalization plates is arranged to decrease sequentially from the center to the edge of the flow equalization plate.

3. The vacuum drying apparatus for high-uniform film formation according to claim 2, characterized in that, The bottom of each flow equalization groove of the flow equalization plate at the bottom layer is also uniformly provided with multiple auxiliary air extraction holes.

4. The vacuum drying apparatus for high-uniform film formation according to claim 3, characterized in that, The bottom of the plurality of air extraction holes and the plurality of air extraction auxiliary holes of the flow equalization plate at the bottom layer are all arranged with flared openings.

5. The vacuum drying apparatus for high-uniform film formation according to claim 1, characterized in that, It also includes a rack, on which the enclosure is mounted, the enclosure comprising: A base body, the base body being adapted to support the substrate; A cover body, the cover body being adapted to be fastened to form a sealed processing chamber; In this configuration, one of the base and the cover is slidably arranged on the frame, while the other is fixed to the frame. The cover and the base move relative to each other in the vertical direction to open and close the housing.

6. The vacuum drying apparatus for high-uniform film formation according to claim 5, characterized in that, It also includes a lifting assembly, wherein the seat is slidably and vertically arranged on the frame; the lifting assembly includes a push block and a lifting drive, wherein the lifting drive drives the push block to rise, and the push block rises to push the seat upward, so that the cover is fastened to the cover, and a sealed processing chamber is formed between the seat and the cover.

7. The vacuum drying apparatus for high-uniform film formation according to claim 6, characterized in that, It also includes a sealing structure comprising a sealing ring disposed at the bottom edge of the cover and / or the top edge of the seat; the sealing ring deforms when the seat is raised to be fastened by the cover; The pusher block pushes the seat upward, causing the seat and the cover to be pressed together by the sealing ring. Then, the negative pressure assembly applies a negative pressure environment to the processing chamber, causing the sealing ring to deform and thus driving the seat to rise further, creating a gap between the seat and the pusher block.

8. The vacuum drying apparatus for high-uniform film formation according to claim 7, characterized in that, The lifting assembly also includes a mating block, which is installed on the base and is abutted by the push block. The push block and the mating block are interlocked in the vertical direction.

9. The vacuum drying apparatus for high-uniform film formation according to claim 7, characterized in that, It also includes multiple damping components, which are installed on the drive end of the lifting drive component, and the buffer end of the damping component continuously faces upward and presses against the seat body; When the negative pressure environment inside the processing chamber is released, the damping component buffers the downward impact force on the seat.

10. The vacuum drying apparatus for high-uniform film formation according to claim 5, characterized in that, The top surface of the base body is raised in the middle, and the raised position in the middle of the base body is used to support the substrate. The bottom surface of the cover body abuts against the edge of the base body.

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