A precursor line and thin film deposition system

Abstract

This invention discloses a precursor pipeline and a thin film deposition system, relating to the field of semiconductor equipment. The precursor pipeline includes a tube body, a flow regulating device, and a needle valve. The tube body has an input end for connecting to a precursor source and an output end for connecting to a reaction chamber. Both the flow regulating device and the needle valve are disposed on the tube body, with the flow regulating device positioned between the input end and the needle valve. The precursor pipeline provided by this invention reduces the difficulty of needle valve adjustment and the risk of pressure deviation.

Description

Technical Field

[0001] This invention relates to the field of semiconductor equipment, and more specifically, to a precursor pipeline and thin film deposition system. Background Technology

[0002] In thin film deposition processes such as chemical vapor deposition and atomic layer deposition in semiconductor manufacturing, it is often necessary to deliver high vapor pressure precursors into the reaction chamber of semiconductor equipment.

[0003] Currently, commercially available precursor pipelines connecting precursor sources and semiconductor devices use needle valves to control flow. However, these valves have small openings, making adjustment difficult and unable to meet stringent flow control requirements. Furthermore, the high vapor pressure of the precursor exerts a significant impact on the needle valve, posing a high risk of pressure drift. Summary of the Invention

[0004] The purpose of this invention is to provide a precursor pipeline that can reduce the difficulty of needle valve adjustment and the risk of pressure deviation.

[0005] Another objective of this invention is to provide a thin film deposition system that is easier to control and has better process performance.

[0006] An embodiment of the present invention provides a technical solution:

[0007] A precursor pipeline includes a pipe body, a flow regulating device, and a needle valve. The pipe body has an input end for connecting to a precursor source and an output end for connecting to a reaction chamber.

[0008] Both the flow regulating device and the needle valve are mounted on the tube body, with the flow regulating device positioned between the input end and the needle valve.

[0009] In an optional embodiment, the flow regulating device includes a device body having two tubular connectors. The tubular body has two mutually disconnected intermediate connectors between the input end and the needle valve. The two tubular connectors are respectively mated and nested with the two intermediate connectors to connect the device body to the tubular body.

[0010] In an optional embodiment, the flow regulating device further includes two locking nuts, one of which is threadedly engaged with the outer wall of the intermediate joint of a set of mating tubular connectors, and the remaining one is threadedly engaged with the outer wall of the intermediate joint of another set of mating tubular connectors.

[0011] In an optional embodiment, any of the tubular joint rings is provided with a first step, and the corresponding intermediate joint ring is provided with a second step, wherein the first step and the second step cooperate and are nested for sealing.

[0012] In an optional embodiment, the first step has two first annular step surfaces distributed radially in the tubular joint, and a plurality of first annular sealing teeth are provided at intervals on each of the two first annular step surfaces.

[0013] The second step has two second annular step surfaces distributed radially in the tube body. Each of the two second annular step surfaces is provided with a plurality of second annular sealing teeth at intervals. The plurality of first annular sealing teeth engage with the plurality of second annular sealing teeth to form a nested seal.

[0014] In an optional embodiment, the first step further has a first connecting surface connecting the two first annular step surfaces, the first connecting surface being provided with a sealing groove, the sealing groove being provided with a sealing ring, and the sealing ring being interference-fitted with the second step.

[0015] In an optional embodiment, the flow regulating device further includes an adjusting knob and a lip seal ring, and the device body has a mating hole, through which the adjusting knob extends into the interior of the device body;

[0016] The mating hole has a mating groove on its wall. The lip seal is fitted onto the adjusting knob and embedded in the mating groove. The lip of the lip seal faces the inside of the device body and abuts against the bottom wall of the mating groove.

[0017] In an optional embodiment, the flow regulating device further includes a sealing gasket, which is fitted onto the regulating knob and embedded in the mating groove, and the sealing gasket abuts against the side of the lip seal that faces away from the inside of the device body.

[0018] In an optional embodiment, a groove is provided on the outer side wall of the adjustment knob, and the inner edges of the lip seal and the sealing gasket are embedded in the groove. The groove and the mating groove are flush with the side facing the inside of the device body and respectively abut against the sealing gasket.

[0019] Embodiments of the present invention also provide a thin film deposition system, including a precursor source, a reaction chamber, and the aforementioned precursor pipeline. The precursor pipeline includes a tube body, a flow regulating device, and a needle valve. The tube body has an input end and an output end. The flow regulating device and the needle valve are both disposed on the tube body, and the flow regulating device is located between the input end and the needle valve. The input end is connected to the precursor source, and the output end is connected to the reaction chamber.

[0020] Compared to existing technologies, the precursor pipeline provided by this invention incorporates a flow regulating device between the inlet end of the pipeline and the needle valve. This flow regulating device, located upstream of the needle valve, reduces the pressure of the precursor reaching the needle valve, thereby allowing the needle valve to maintain a larger opening even under higher flow restriction requirements. This reduces the sensitivity of needle valve adjustment and also reduces the impact of the precursor on the needle valve, thus mitigating the risk of pressure deviation. Therefore, the beneficial effects of the precursor pipeline provided by this invention include: reducing the difficulty of needle valve adjustment and the risk of pressure deviation. Attached Figure Description

[0021] To more clearly illustrate the technical solutions of the embodiments of the present invention, the accompanying drawings used in the embodiments will be briefly described below. It should be understood that the following drawings only show some embodiments of the present invention and should not be considered as limiting the scope. For those skilled in the art, other related drawings can be obtained based on these drawings without creative effort.

[0022] Figure 1 A schematic diagram of the structure of a thin film deposition system provided for an embodiment of the present invention;

[0023] Figure 2 This is a partial cross-sectional schematic diagram of the precursor pipeline;

[0024] Figure 3 for Figure 2 Enlarged view of region A in the middle;

[0025] Figure 4 for Figure 2 Enlarged schematic diagram of region B in the middle.

[0026] Icons: 10-Precursor piping; 100-Pipe body; 110-Intermediate connector; 111-Second step; 1111-Second annular sealing tooth; 200-Flow regulating device; 210-Main body of the device; 211-Tube connector; 212-First step; 2121-First annular sealing tooth; 2122-Sealing groove; 2123-Sealing ring; 213-Matching hole; 2131-Matching groove; 220-Locking nut; 230-Adjusting knob; 231-Groove; 240-Lip seal; 241-Lip edge; 250-Sealing gasket; 300-Needle valve; 20-Thin film deposition system; 21-Precursor source; 22-Reaction chamber. Detailed Implementation

[0027] To make the objectives, technical solutions, and advantages of the embodiments of the present invention clearer, the technical solutions of the embodiments of the present invention will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some, not all, of the embodiments of the present invention. The components of the embodiments of the present invention described and shown in the accompanying drawings can generally be arranged and designed in various different configurations.

[0028] Therefore, the following detailed description of the embodiments of the invention provided in the accompanying drawings is not intended to limit the scope of the claimed invention, but merely to illustrate selected embodiments of the invention. All other embodiments obtained by those skilled in the art based on the embodiments of the invention without inventive effort are within the scope of protection of the invention.

[0029] It should be noted that similar labels and letters in the following figures indicate similar items. Therefore, once an item is defined in one figure, it does not need to be further defined and explained in subsequent figures.

[0030] In the description of this invention, it should be understood that the terms "upper," "lower," "inner," "outer," "left," "right," etc., indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings, or the orientation or positional relationship commonly used when the product of this invention is in use, or the orientation or positional relationship commonly understood by those skilled in the art. They are only used to facilitate the description of this invention and to simplify the description, and are not intended to indicate or imply that the device or element referred to must have a specific orientation, or be constructed and operated in a specific orientation. Therefore, they should not be construed as limitations on this invention.

[0031] Furthermore, the terms "first," "second," etc., are used only to distinguish descriptions and should not be interpreted as indicating or implying relative importance.

[0032] In the description of this invention, it should also be noted that, unless otherwise explicitly specified and limited, terms such as "set" and "connection" should be interpreted broadly. For example, "connection" can be a fixed connection, a detachable connection, or an integral connection; it can be a mechanical connection or an electrical connection; it can be a direct connection or an indirect connection through an intermediate medium; it can be a connection within two components. Those skilled in the art can understand the specific meaning of the above terms in this invention according to the specific circumstances.

[0033] The specific embodiments of the present invention will now be described in detail with reference to the accompanying drawings.

[0034] Example

[0035] Please refer to the following: Figure 1 and Figure 2 , Figure 1The diagram shown is a structural schematic of the thin film deposition system 20 provided in this embodiment. Figure 2 The diagram shown is a partial cross-sectional view of the precursor pipeline 10.

[0036] The thin film deposition system 20 provided in this embodiment includes a precursor source 21, a reaction chamber 22, and a precursor pipeline 10. The two ends of the precursor pipeline 10 are connected to the precursor source 21 and the reaction chamber 22, respectively, for conveying the precursor output from the precursor source 21 to the semiconductor device 22. The reaction chamber 22 can be selected according to actual application requirements, and can be a chamber of a chemical vapor deposition device or a chamber of an atomic layer deposition device, etc.

[0037] In this embodiment, the precursor pipeline 10 includes a pipe body 100, a flow regulating device 200, and a needle valve 300. The pipe body 100 has an input end connected to the precursor source 21 and an output end connected to the reaction chamber 22. The flow regulating device 200 and the needle valve 300 are both disposed on the pipe body 100, and the flow regulating device 200 is located between the input end and the needle valve 300.

[0038] In practical applications, the precursor output from precursor source 21 first flows into pipe body 100 through the input end, and then flows along pipe body 100 to flow regulating device 200. Flow regulating device 200 can adjust the pressure and flow rate of the precursor, allowing needle valve 300 to have a larger opening even under high flow restriction requirements, reducing the sensitivity of needle valve 300 adjustment, and thus reducing the difficulty of adjusting needle valve 300. Furthermore, when the vapor pressure of the precursor is high, it can reduce the impact of the precursor on needle valve 300, effectively reducing the risk of pressure deviation.

[0039] Please refer to the following: Figure 3 , Figure 3 As shown Figure 2 An enlarged schematic diagram of region A in the middle.

[0040] In this embodiment, the flow regulating device 200 includes a device body 210, which has two tubular connectors 211. The tube body 100 has two intermediate connectors 110 that are disconnected from each other between the input end and the needle valve 300. The two tubular connectors 211 are connected to the two intermediate connectors 110 respectively to connect the device body 210 to the tube body 100.

[0041] In order to ensure a stable and reliable sealing effect at the connection between the tubular joint 211 and the intermediate joint 110, thereby meeting the sealing requirements of the high vapor pressure precursor, in this embodiment, the two tubular joints 211 and the two intermediate joints 110 are respectively connected and nested for sealing.

[0042] Furthermore, the flow regulating device 200 also includes two locking nuts 220, one of which engages with the outer wall thread of a set of mating tubular joints 211 and intermediate joints 110, and the remaining one engages with the outer wall thread of another set of mating tubular joints 211 and intermediate joints 110.

[0043] Any tubular joint 211 is nested and sealed with the corresponding intermediate joint 110 to achieve a good sealing effect. Then, the tubular joint 211 and the corresponding intermediate joint 110 are locked with the locking nut 220 to cover the docking area, so as to further improve the sealing effect. After the main body of the device 210 is connected to the pipe body through two tubular joints 211, it is locked with two locking nuts 220, which realizes a reliable seal at the connection position of the main body of the device 210 and can meet the sealing requirements under high vapor pressure.

[0044] To further improve the sealing effect, in this embodiment, any tubular joint 211 is provided with a first step 212, and the corresponding intermediate joint 110 is provided with a second step 111. The first step 212 and the second step 111 cooperate and nest to seal.

[0045] Specifically, the first step 212 has two first annular step surfaces distributed radially in the tubular connector 211, and a plurality of first annular sealing teeth 2121 are provided at intervals on both first annular step surfaces; the second step 111 has two second annular step surfaces distributed radially in the pipe body 100, and a plurality of second annular sealing teeth 1111 are provided at intervals on both second annular step surfaces, and the plurality of first annular sealing teeth 2121 engage with the plurality of second annular sealing teeth 1111 to form a nested seal.

[0046] The first step 212 also has a first connecting surface connecting two first annular step surfaces. In order to further improve the sealing effect of the tubular joint 211 and the intermediate joint 110, in this embodiment, the first connecting surface is provided with a sealing groove 2122, and a sealing ring 2123 is embedded in the sealing groove 2122. The sealing ring 2123 is interference-fitted with the second step 111. In fact, the sealing ring 2123 abuts against the second connecting surface on the second step 111 that connects the two second annular step surfaces.

[0047] As can be seen, in this embodiment, the first step 212 circumferentially arranged on the tubular joint 211 cooperates with the second step 111 circumferentially arranged on the intermediate joint 110 to achieve preliminary step sealing. The two first annular step surfaces of the first step 212 and the two second annular step surfaces of the second step 111 are nested and sealed to further improve the radial sealing effect. The sealing ring 2123 provided between the first connecting surface of the first step 212 and the second connecting surface of the second step 111 further improves the axial sealing effect.

[0048] Please refer to the following: Figure 4 , Figure 4 As shown Figure 2 Enlarged schematic diagram of region B in the middle.

[0049] The flow regulating device 200 provided in this embodiment also includes an adjusting knob 230 and a lip seal ring 240. A mating hole 213 is provided on the device body 210, and the adjusting knob 230 extends into the interior of the device body 210 through the mating hole 213. It can be understood that the device body 210 contains structures such as a valve core, and the adjusting knob 230 is actually connected to the valve core for transmission, used to rotate under external force to drive the valve core to move, thereby adjusting the flow area inside the device body 210.

[0050] Because the precursor vapor pressure is high, the high-pressure precursor flowing through the device body 210 is prone to leakage through the mating hole 213. To solve this problem, in this embodiment, a mating groove 2131 is provided around the hole wall of the mating hole 213. A lip seal 240 is sleeved on the adjusting knob 230 and embedded in the mating groove 2131. The lip 241 of the lip seal 240 faces the inside of the device body 210 and abuts against the bottom wall of the mating groove 2131.

[0051] It is understandable that, for the lip seal 240, the inside of the device body 210 is equivalent to the high-pressure side, while the outside of the device body 210 is equivalent to the low-pressure side. When the pressure on the high-pressure side acts on the lip seal 240, since the lip edge 241 of the lip seal 240 faces the inside of the device body 210 and abuts against the bottom wall of the mating groove 2131, the lip edge 241 of the lip seal 240 is further pressed against the bottom wall of the mating groove 2131 under pressure, and the sealing effect is further enhanced.

[0052] In order to ensure the stability of the lip seal 240 and prevent the lip seal 240 from flipping, in this embodiment, the flow regulating device 200 also includes a sealing gasket 250. The sealing gasket 250 is sleeved on the regulating knob 230 and embedded in the mating groove 2131, and the sealing gasket 250 abuts against the side of the lip seal 240 facing away from the inside of the device body 210.

[0053] To further improve the sealing effect, a groove 231 is provided on the outer side wall of the adjustment knob 230. The inner edges of the lip seal ring 240 and the sealing gasket 250 are embedded in the groove 231. The groove 231 and the mating groove 2131 are flush with one side facing the inside of the device body 210 and respectively abut against the sealing gasket 250.

[0054] Understandably, the opposite sides of the lip seal 240 and the sealing gasket 250 abut against the two sidewalls of the groove 231, achieving a reliable axial sealing effect. Meanwhile, the inner edges of the lip seal 240 and the sealing gasket 250 are embedded in the groove 231, and the lip 241 of the lip seal 240 abuts against the bottom wall of the mating groove 2131, achieving a reliable radial sealing effect. When the adjusting knob 230 is rotated under force, the state of the lip seal 240 and the sealing gasket 250 does not change, meaning the axial and radial sealing effects are maintained, satisfying the sealing effect under high vapor pressure.

[0055] The lip seal 240 and the sealing gasket 250 form a sealing unit. To further improve the sealing effect of the adjusting knob 230, this embodiment uses two sealing units, which are spaced apart axially along the adjusting knob 230. Correspondingly, there are also two mating grooves 2131 and two recessed grooves 231. In another embodiment, the number of sealing units can be adjusted according to the sealing requirements of the actual application, and the number of mating grooves 2131 and recessed grooves 231 can be adjusted accordingly.

[0056] In summary, the precursor pipeline 10 provided in this embodiment can reduce the difficulty of adjusting the needle valve 300 and the risk of pressure deviation, and can meet the sealing requirements under high vapor pressure. Benefiting from the beneficial effects of the precursor pipeline 10, the thin film deposition system 20 provided in this embodiment has the characteristics of lower control difficulty, better sealing performance, and better process effect.

[0057] The above description is merely a preferred embodiment of the present invention and is not intended to limit the invention. Various modifications and variations can be made to the present invention by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of the present invention should be included within the scope of protection of the present invention.

Claims

1. A precursor line, characterized by, It includes a tube body (100), a flow regulating device (200) and a needle valve (300), wherein the tube body (100) has an input end for connecting to a precursor source (21) and an output end for connecting to a reaction chamber (22); The flow regulating device (200) and the needle valve (300) are both disposed on the tube body (100), and the flow regulating device (200) is located between the input end and the needle valve (300).

2. The precursor line of claim 1, wherein, The flow regulating device (200) includes a device body (210) having two tubular connectors (211). The tube body (100) has two mutually disconnected intermediate connectors (110) between the input end and the needle valve (300). The two tubular connectors (211) and the two intermediate connectors (110) are respectively connected and nested and sealed to connect the device body (210) to the tube body (100).

3. The precursor line of claim 2, wherein, The flow regulating device (200) also includes two locking nuts (220), one of which is threaded into the outer wall of a set of mating tubular joints (211) and intermediate joints (110), and the remaining one is threaded into the outer wall of another set of mating tubular joints (211) and intermediate joints (110).

4. The precursor pipeline according to claim 2, characterized in that, Any of the tubular joints (211) is provided with a first step (212), and the corresponding intermediate joint (110) is provided with a second step (111). The first step (212) and the second step (111) cooperate and are nested for sealing.

5. The precursor pipeline according to claim 4, characterized in that, The first step (212) has two first annular step surfaces distributed radially in the tubular joint (211), and a plurality of first annular sealing teeth (2121) are provided at intervals on the two first annular step surfaces; The second step (111) has two second annular step surfaces distributed radially in the tube body (100). Multiple second annular sealing teeth (1111) are provided at intervals on both second annular step surfaces. Multiple first annular sealing teeth (2121) mesh with multiple second annular sealing teeth (1111) to form a nested seal.

6. The precursor pipeline according to claim 5, characterized in that, The first step (212) also has a first connecting surface connecting the two first annular step surfaces. The first connecting surface is provided with a sealing groove (2122). A sealing ring (2123) is embedded in the sealing groove (2122). The sealing ring (2123) is interference-fitted with the second step (111).

7. The precursor pipeline according to claim 2, characterized in that, The flow regulating device (200) also includes an adjusting knob (230) and a lip seal (240). The device body (210) has a mating hole (213), and the adjusting knob (230) extends into the interior of the device body (210) through the mating hole (213). The mating hole (213) has a mating groove (2131) circumferentially provided on the hole wall. The lip seal (240) is sleeved on the adjusting knob (230) and embedded in the mating groove (2131). The lip (241) of the lip seal (240) faces the inside of the device body (210) and abuts against the bottom wall of the mating groove (2131).

8. The precursor pipeline according to claim 7, characterized in that, The flow regulating device (200) also includes a sealing gasket (250), which is sleeved on the regulating knob (230) and embedded in the mating groove (2131), and the sealing gasket (250) and the lip seal (240) abut against each other on the side facing away from the inside of the device body (210).

9. The precursor pipeline according to claim 8, characterized in that, The outer wall of the adjustment knob (230) is provided with a groove (231). The inner edges of the lip seal (240) and the sealing gasket (250) are embedded in the groove (231). The groove (231) and the mating groove (2131) are flush with the side facing the inside of the device body (210) and abut against the sealing gasket (250) respectively.

10. A thin film deposition system, characterized in that, It includes a precursor source (21), a reaction chamber (22), and a precursor pipeline (10) as described in any one of claims 1-9, wherein the input end is connected to the precursor source (21) and the output end is connected to the reaction chamber (22).

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