A purification system for wet chemicals used in semiconductor manufacturing
By employing a bidirectional wound diaphragm structure with a central column and an isolation column, along with a fully sealed gasket design, the problems of flow path short circuits and sealing in semiconductor wet chemical purification devices are solved. This achieves efficient retention of trace impurities and high purity of chemicals, making it suitable for semiconductor manufacturing processes.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- JIANGSU RONGDAO SEMICON TECH CO LTD
- Filing Date
- 2026-06-01
- Publication Date
- 2026-07-07
AI Technical Summary
Existing semiconductor wet chemical purification devices have a simple structure and flow path, which makes them prone to short circuits, poor filtration effect, insufficient sealing, easy introduction of external pollutants, and lack of negative pressure purification environment and inert gas protection, resulting in insufficient purification accuracy and chemical oxidation and deterioration.
It adopts a bidirectional wound diaphragm structure with a central column and an isolation column, combined with a fully sealed gasket design, to increase the contact area of the liquid medicine, enhance the stability of the flow path, and prevent the intrusion of external impurities and chemical oxidation through negative pressure pump and inert gas protection.
It significantly improves the precision of trapping and purifying trace impurities, prevents the intrusion of external pollutants, ensures the high cleanliness and stability of chemicals, and meets the high standards required for semiconductor manufacturing processes.
Smart Images
Figure CN122342952A_ABST