Lithium niobate nanostructure based on reactive ion beam etching and preparation method and application thereof
By using reactive ion beam etching technology, which combines physical bombardment and chemical reaction, the problems of verticality and roughness in lithium niobate nanofabrication have been solved, enabling the fabrication of lithium niobate nanostructures with high verticality and low roughness, thus supporting the industrialization of optical devices.
Patent Information
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- INSTITUTE OF PHYSICS CHINESE ACADEMY OF SCIENCES
- Filing Date
- 2026-03-11
- Publication Date
- 2026-07-17
AI Technical Summary
Existing technologies struggle to achieve high verticality, low surface roughness, and high etching uniformity in lithium niobate micro/nano fabrication at the nanoscale, limiting the development of lithium niobate-based photonic devices.
By employing reactive ion beam etching technology, which combines physical bombardment and chemical reaction, and through the synergistic effect of Ar⁺ ion beam and CHF3 reactive gas, highly anisotropic etching of lithium niobate is achieved, thus fabricating highly vertical nanostructures.
It achieves high verticality (≥80°), low surface roughness and high etching uniformity of lithium niobate nanostructures, making them suitable for mass production and supporting the industrialization of high-performance optical devices.
Smart Images
Figure CN122410673A_ABST