Lithography machine temperature and humidity monitoring system and method
Patent Information
- Application Number
- CN202610500889.2
- Authority / Receiving Office
- CN · China
- Patent Type
- Applications(China)
- Current Assignee / Owner
- Filing Date
- 2026-04-15
- Publication Date
- 2026-08-11
AI Technical Summary
1. 原厂工具只能逐个读取BLG文件，无法实现长期趋势分析
[0024]本发明通过BLG文件预读取模块能实现对光刻机的BLG文件进行预读取并解码形成可读的解码后数据，通过数据库预处理模块能对解码后数据进一步转换为温湿度结构化数据并将不同时间的温度和湿度分类写入到数据库中，这样，在进行监控时直接对数据库中不同时间的温度和湿度数据进行读取即可实现，故本发明能实现对光刻机的温度和湿度数据随时读取并从而实现对光刻机机况的监控，所以，本发明能提高数据读取效率，具有高效性；还能增加数据备份量并实现对历史数据趋势分析，能突破现有仅能对单个BLG文件进行分析的限制，故具有全面性；而且光刻机的BLG文件最后备份到数据库中，能确保数据安全，避免数据意外丢失，具有很好的可靠性；本发明光刻机温湿度监控系统还能支持多台光刻机的同时监控，具有很好的扩展性。
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Figure CN122547159A_ABST
Abstract
Description
Technical Field
[0001] This invention relates to the field of semiconductor integrated circuit manufacturing, and in particular to a temperature and humidity monitoring system for a lithography machine. This invention also relates to a method for monitoring the temperature and humidity of a lithography machine. Background Technology
[0002] In semiconductor manufacturing, the temperature and humidity environment of the lithography machine has a significant impact on process stability and product yield. The lithography machine generates a binary performance log (BLG) file to record the equipment's operating status and environmental parameters. However, existing technologies have the following shortcomings: 1. The original tool can only read BLG files one by one and cannot perform long-term trend analysis.
[0003] 2. BLG files are stored in binary format, based on IEEE 754 floating-point encoding, not ASCII encoding, and cannot be directly parsed by conventional methods.
[0004] 3. Lack of automated backup mechanism, historical data is easily lost.
[0005] 4. The monitoring system has a slow response speed and cannot meet the real-time requirements of production environments.
[0006] One existing improvement method is to use a manual, non-standard approach, which involves sending the data to the original manufacturer for interpretation. This method is slow, has a long feedback time, and can only identify a single log file (with a data volume of approximately 2,000 items per minute). It is time-consuming and labor-intensive and cannot achieve the monitoring objective. Summary of the Invention
[0007] The technical problem to be solved by this invention is to provide a temperature and humidity monitoring system for a lithography machine, which can read the temperature and humidity data of the lithography machine in real time and thus monitor the machine's condition. This system not only improves data reading efficiency but also increases data backup capacity and enables analysis of historical data. To this end, this invention also provides a method for monitoring the temperature and humidity of a lithography machine.
[0008] To solve the above-mentioned technical problems, the lithography machine temperature and humidity monitoring system provided by the present invention includes: a BLG file pre-reading module and a database preprocessing module.
[0009] The BLG file pre-reading module is used to read the BLG file generated by the lithography machine. The BLG file includes device operating status data and environmental parameter data in binary format based on IEEE 754 floating-point encoding. The environmental parameter data includes temperature and humidity. The BLG file pre-reading module is also used to decode each data in the BLG file based on the IEEE 754 floating-point encoding standard and obtain decoded data. The decoded data includes temperature, humidity and corresponding time.
[0010] The database preprocessing module is used to preprocess the decoded data and convert it into structured temperature and humidity data, and write the structured temperature and humidity data into the database, where the temperature and humidity are stored separately.
[0011] A further improvement includes an automatic timed backup module for periodically backing up the BLG file grown by the lithography machine.
[0012] The BLG file pre-reading module reads the BLG file directly from the backup data of the automatic timed backup module.
[0013] A further improvement is that the preprocessing of the database preprocessing module includes data validity verification, which includes range checking and continuity checking.
[0014] A further improvement includes an automatic reporting module, used to read the structured temperature and humidity data in the database and generate automatic monitoring reports.
[0015] A further improvement includes a trend analysis module with a visual interface, which reads the structured temperature and humidity data for a set time period from the database and generates curves to achieve trend analysis of the temperature and humidity of the lithography machine.
[0016] A further improvement is that the temperature and humidity monitoring system for the lithography machine is shared by multiple lithography machines.
[0017] To solve the above-mentioned technical problems, the photolithography machine temperature and humidity monitoring method provided by the present invention includes: Performing BLG file pre-reading includes: reading the BLG file generated by the lithography machine and decoding each data in the BLG file based on the IEEE 754 floating-point encoding standard to obtain decoded data, the decoded data including temperature, humidity and corresponding time; the BLG file includes device operating status data and environmental parameter data in binary format based on IEEE 754 floating-point encoding, the environmental parameter data including temperature and humidity.
[0018] The decoded data is preprocessed and converted into structured temperature and humidity data, which is then written into a database and stored separately for temperature and humidity.
[0019] Further improvements include: The BLG file grown by the lithography machine is backed up periodically; the BLG file is read directly from the backup data of the periodic backup during the BLG file pre-reading.
[0020] A further improvement is that the preprocessing includes data validity verification, which includes range checking and continuity checking.
[0021] Further improvements include: The structured temperature and humidity data in the database are read and an automatic monitoring report is generated.
[0022] Further improvements include: The structured temperature and humidity data for a set time period in the database are read, a curve is generated, and displayed in the visualization interface to achieve trend analysis of the temperature and humidity of the lithography machine.
[0023] A further improvement is that the lithography machine temperature and humidity monitoring method can simultaneously monitor multiple lithography machines.
[0024] This invention utilizes a BLG file pre-reading module to pre-read and decode the BLG files of a lithography machine, generating readable decoded data. A database preprocessing module further converts this decoded data into structured temperature and humidity data, categorizing and writing the temperature and humidity data from different times into the database. This allows for direct reading of temperature and humidity data from different times within the database during monitoring. Therefore, this invention enables real-time reading of temperature and humidity data from the lithography machine, facilitating monitoring of the machine's condition. This significantly improves data reading efficiency and is highly efficient. It also increases data backup capacity and enables historical data trend analysis, overcoming the limitation of analyzing only a single BLG file, thus providing comprehensiveness. Furthermore, the final backup of the lithography machine's BLG files to the database ensures data security and prevents accidental data loss, demonstrating excellent reliability. Finally, this lithography machine temperature and humidity monitoring system supports simultaneous monitoring of multiple lithography machines, exhibiting excellent scalability. Attached Figure Description
[0025] The present invention will be further described in detail below with reference to the accompanying drawings and specific embodiments: Figure 1 This is a schematic diagram of the structure of the temperature and humidity monitoring system for a lithography machine according to an embodiment of the present invention; Figure 2 This is a flowchart of the temperature and humidity monitoring method for a lithography machine according to an embodiment of the present invention; Figure 3 yes Figure 2 The step-by-step diagram in the dashed box 201. Detailed Implementation
[0026] like Figure 1 The diagram shown is a structural schematic of the temperature and humidity monitoring system for a lithography machine according to an embodiment of the present invention. The temperature and humidity monitoring system for a lithography machine according to an embodiment of the present invention includes: a BLG file pre-reading module 103 and a database preprocessing module 104.
[0027] The BLG file pre-reading module 103 is used to read the BLG file 102 generated by the lithography machine 101. The BLG file 102 includes device operating status data and environmental parameter data in binary format based on IEEE 754 floating-point encoding. The environmental parameter data includes temperature and humidity. The BLG file pre-reading module 103 is also used to decode each data in the BLG file 102 based on the IEEE 754 floating-point encoding standard and obtain decoded data. The decoded data includes temperature, humidity and corresponding time.
[0028] In this embodiment of the invention, an automatic timed backup module is also included, which is used to perform timed backups of the BLG file 102 grown by the lithography machine 101.
[0029] The BLG file pre-reading module 103 reads the BLG file 102 directly from the backup data of the automatic timed backup module.
[0030] The database preprocessing module 104 is used to preprocess the decoded data and convert it into temperature and humidity structured data, and write the temperature and humidity structured data into the database 105, where the temperature and humidity are stored separately.
[0031] In this embodiment of the invention, the preprocessing of the database preprocessing module 104 includes data validity verification, which includes range checking and continuity checking.
[0032] In addition to having the database 105, this embodiment of the invention further includes an automatic reporting module, used to read the structured temperature and humidity data in the database 105 and generate an automatic monitoring report.
[0033] The trend analysis module has a visual interface, reads the structured temperature and humidity data for a set time period in the database 105 and forms a curve to realize the trend analysis of the temperature and humidity of the lithography machine 101.
[0034] In this embodiment of the invention, the temperature and humidity monitoring system for the lithography machine is shared by multiple lithography machines 101.
[0035] This invention, through a BLG file pre-reading module, can pre-read and decode the BLG file 102 of the lithography machine 101 to form readable decoded data. The database preprocessing module 104 further converts the decoded data into structured temperature and humidity data, and categorizes and writes the temperature and humidity data from different times into the database 105. Thus, during monitoring, the temperature and humidity data from different times can be directly read from the database 105. Therefore, this invention can achieve real-time reading of the temperature and humidity data of the lithography machine 101, thereby enabling monitoring of the machine's condition. This invention improves data reading efficiency and is highly efficient; it also increases data backup capacity and enables historical data trend analysis, overcoming the limitation of existing systems that can only analyze a single BLG file 102, thus providing comprehensiveness. Furthermore, the final backup of the BLG file 102 of the lithography machine 101 to the database 105 ensures data security and prevents accidental data loss, demonstrating excellent reliability. This invention's lithography machine temperature and humidity monitoring system can also support simultaneous monitoring of multiple lithography machines 101, exhibiting excellent scalability.
[0036] like Figure 2 The diagram shown is a flowchart of a lithography machine temperature and humidity monitoring method according to an embodiment of the present invention; the lithography machine temperature and humidity monitoring method according to an embodiment of the present invention includes: Step S101: The lithography machine 101 generates a BLG file 102. The BLG file 102 includes device operating status data and environmental parameter data in binary format based on IEEE 754 floating-point encoding. The environmental parameter data includes temperature and humidity.
[0037] The temperature and humidity monitoring method for lithography machines in this embodiment of the invention can simultaneously monitor multiple lithography machines 101. For example, it can monitor the temperature and humidity of multiple lithography machines 101 in the same semiconductor manufacturing plant (fab), or it can monitor the temperature and humidity of multiple lithography machines 101 in multiple different fabs.
[0038] Step S102: The automatic scheduled backup module performs incremental backups, that is: The BLG file 102 grown by the lithography machine 101 is backed up periodically. Subsequently, the BLG file 102 is read directly from the backup data of the periodically backed-up BLG file during BLG file pre-reading.
[0039] Step S103: The BLG file pre-reading module performs IEEE745 decoding, i.e., BLG file pre-reading, including: reading the BLG file 102 generated by the lithography machine 101 and decoding each data in the BLG file 102 based on the IEEE754 floating-point encoding standard to obtain the decoded data, which includes temperature, humidity and corresponding time.
[0040] Step S104: The database preprocessing module preprocesses and converts the decoded data and writes it into the database, that is: preprocesses the decoded data and converts it into temperature and humidity structured data, writes the temperature and humidity structured data into database 105, and stores the temperature and humidity separately in database 105.
[0041] The method of this invention includes data validity verification in the preprocessing stage, which includes range checking and continuity checking.
[0042] Step S105: The trend analysis module performs trend analysis, that is, it reads the structured temperature and humidity data for a set time period in the database 105, forms a curve, and displays it in the visualization interface to realize the trend analysis of the temperature and humidity of the lithography machine 101.
[0043] Step S106: The automatic report module generates an automatic monitoring report, that is, it reads the structured temperature and humidity data in the database 105 and generates an automatic monitoring report.
[0044] In the method of this embodiment of the invention, steps S103 and S104 in the dashed box 201 are key steps of the method of this embodiment of the invention, used to perform BLG processing, so that the files stored in the database 105 after BLG processing can be directly read, thereby enabling monitoring. The expansion steps of steps S103 and S104 are further explained below: Figure 3 As shown, is Figure 2 The expanded diagram of steps in dashed box 201; the expanded steps include: Step S201: BLG processing begins.
[0045] Step S202: Read the BLG file header.
[0046] Step S203: Locate the starting position of the data segment.
[0047] Step S204: Read data blocks in a loop: The temperature value is obtained by parsing the IEEE 754 floating-point number. Humidity values are obtained by parsing IEEE 754 floating-point numbers; Timestamp extraction.
[0048] Step S205, Data Validation: Range check; Continuity check.
[0049] Step S206: Convert to structured data.
[0050] Step S207: Write to the database.
[0051] Step S208, BLG processing complete.
[0052] Steps S201 to S204 are expansion steps of step S103, and steps S205 to S208 are expansion steps of step S104.
[0053] In steps S103 and S104 above, the binary (hexadecimal) numbers in the target file are read using the IEEE 754 standard for segmentation, transcoding, and categorized storage. The underlying principle is to convert the binary (hexadecimal) numbers into meaningful floating-point / integer numbers using a specific algorithm. For example, the IEEE 754 standard in C# is used to read the binary (hexadecimal) numbers in the target file for ordered segmentation, transcoding, and categorized storage.
[0054] In a scenario corresponding to this example, such as parsing the temperature control system log of a lithography machine, the following might be included: 1. Input data: BLG file fragment C1C20000 3F800000... (hexadecimal); 2. Parsing process: The first 4 bytes C1C20000 are extracted and decomposed into sign bit 1 (negative), exponent 10000011 (decimal 131), and mantissa 10000000000000000000000000.
[0055] 3. Calculate the value: Output = 22.3℃, and write it to the database.
[0056] The embodiments of the present invention can automatically back up and efficiently parse BLG files and realize long-term temperature and humidity trend monitoring, overcoming the shortcomings of the prior art such as low data processing efficiency and difficulty in analyzing historical data.
[0057] In this embodiment of the invention, the BLG file pre-reading module is implemented by writing a program. The program reads the BLG log file and restores it into readable floating-point / integer data, which is then written into the database. The restored data can be read at any time when needed to monitor the status of the lithography machine.
[0058] The embodiments of the present invention can realize automatic data acquisition, use, alarm and other functions of lithography machine, and play a role in monitoring the machine's condition. It has the following characteristics: 1. High efficiency: Through pre-read and batch write technology, the data processing speed is more than 100 times faster than the original tools of the lithography machine.
[0059] 2. Comprehensiveness: Supports trend analysis of historical data over many years, breaking through the limitations of a single BLG file.
[0060] 3. Reliability: Automatic backup mechanism ensures data security and avoids accidental loss.
[0061] 4. Scalability: The system architecture supports simultaneous monitoring of multiple lithography machines.
[0062] The present invention has been described in detail above through specific embodiments, but these are not intended to limit the invention. Many modifications and improvements can be made by those skilled in the art without departing from the principles of the invention, and these should also be considered within the scope of protection of the present invention.
Claims
1. A temperature and humidity monitoring system for a lithography machine, characterized in that, include: BLG file pre-reading module and database preprocessing module; The BLG file pre-reading module is used to read the BLG file generated by the lithography machine. The BLG file includes device operating status data and environmental parameter data in binary format based on IEEE 754 floating-point encoding. The environmental parameter data includes temperature and humidity. The BLG file pre-reading module is also used to decode each data in the BLG file based on the IEEE 754 floating-point encoding standard and obtain decoded data. The decoded data includes temperature, humidity and corresponding time. The database preprocessing module is used to preprocess the decoded data and convert it into structured temperature and humidity data, and write the structured temperature and humidity data into the database, where the temperature and humidity are stored separately.
2. The lithography machine temperature and humidity monitoring system as described in claim 1, characterized in that, Also includes: An automatic timed backup module is used to perform timed backups of the BLG file grown by the lithography machine; The BLG file pre-reading module reads the BLG file directly from the backup data of the automatic timed backup module.
3. The lithography machine temperature and humidity monitoring system as described in claim 2, characterized in that: The preprocessing in the database preprocessing module includes data validity verification, which includes range checking and continuity checking.
4. The temperature and humidity monitoring system for a lithography machine as described in claim 1, characterized in that: Also includes: The automatic reporting module is used to read the structured temperature and humidity data in the database and generate automatic monitoring reports.
5. The temperature and humidity monitoring system for a lithography machine as described in claim 1, characterized in that: Also includes: The trend analysis module has a visual interface, reads the structured temperature and humidity data for a set time period from the database and generates curves to achieve trend analysis of the temperature and humidity of the lithography machine.
6. The temperature and humidity monitoring system for a lithography machine as described in claim 1, characterized in that: The temperature and humidity monitoring system for the lithography machine is shared by multiple lithography machines.
7. A method for monitoring temperature and humidity in a lithography machine, characterized in that, include: Performing BLG file pre-reading includes: reading the BLG file generated by the lithography machine and decoding each data in the BLG file based on the IEEE 754 floating-point encoding standard to obtain decoded data, the decoded data including temperature, humidity and corresponding time; the BLG file includes device operating status data and environmental parameter data in binary format based on IEEE 754 floating-point encoding, the environmental parameter data including temperature and humidity; The decoded data is preprocessed and converted into structured temperature and humidity data, which is then written into a database and stored separately for temperature and humidity.
8. The method for monitoring temperature and humidity in a lithography machine as described in claim 7, characterized in that, Also includes: The BLG file grown by the lithography machine is backed up periodically. The BLG file pre-reading process reads the BLG file directly from the backup data of the scheduled backup.
9. The method for monitoring temperature and humidity in a lithography machine as described in claim 8, characterized in that: The preprocessing includes data validity verification, which includes range checking and continuity checking.
10. The method for monitoring temperature and humidity in a lithography machine as described in claim 7, characterized in that: Also includes: The structured temperature and humidity data in the database are read and an automatic monitoring report is generated.
11. The method for monitoring temperature and humidity in a lithography machine as described in claim 7, characterized in that: Also includes: The structured temperature and humidity data for a set time period in the database are read, a curve is generated, and displayed in the visualization interface to achieve trend analysis of the temperature and humidity of the lithography machine.
12. The method for monitoring temperature and humidity in a lithography machine as described in claim 7, characterized in that: The method for monitoring the temperature and humidity of lithography machines can simultaneously monitor multiple lithography machines.