Semiconductor tail gas treatment device and semiconductor process system
By designing a semiconductor exhaust gas treatment device, using purity analysis and recovery modules to efficiently process special process gases, the problems of waste and low efficiency in the prior art are solved, and efficient gas recovery and clean exhaust gas generation are achieved.
Patent Information
- Application Number
- CN202323510835.5
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2023-12-22
- Publication Date
- 2025-04-22
- Estimated Expiration
- 2033-12-22
AI Technical Summary
In the prior art, there is a waste problem that special process gas is directly passed into the adsorption tank for reaction and absorption, and the efficiency of conveying gas through Venturi is low.
A semiconductor exhaust gas treatment device is designed, including a gas supply module, a purity analysis module, a recovery module, a exhaust gas treatment module and a exhaust emission module. The purity analysis module is used to detect the gas purity purity in real time, and if it meets the standards, it will be recycled and transported to the process chamber; if it does not meet the standards, it will be processed to obtain the clean exhaust gas.
It realizes efficient recycling and utilization of special process gases, reduces waste, improves gas delivery efficiency, and ensures the cleanliness and safety of the equipment through purge and pressure relief modules.