Coating device
By using a circumferentially distributed remote plasma source and components in the coating device, the product rotates and rotates in the chamber, solving the problem of poor coating uniformity and achieving a more uniform coating effect.
Patent Information
- Application Number
- CN202422476018.0
- Authority / Receiving Office
- CN · China
- Patent Type
- Utility models(China)
- Current Assignee / Owner
- Filing Date
- 2024-10-11
- Publication Date
- 2025-07-22
- Estimated Expiration
- 2034-10-11
AI Technical Summary
The coating uniformity of existing coating devices is poor.
Multiple groups of remote plasma sources that are uniformly distributed circumferentially around the extension direction of the cavity are provided to the chamber, and the supporting components, driving gears, driven gears and bearing components are combined to make the product rotate and rotate in the chamber, thereby improving the uniformity of the plasma.
The coating uniformity of the coating device is improved, ensuring that the plasma can be evenly coated on the product surface, and improving the coating efficiency and quality.
Smart Images
Figure CN223134588U_ABST
Abstract
Description
Technical Field
[0001] The present disclosure relates to the technical field of deposition coating, and particularly relates to a coating device. Background Art
[0002] Semiconductor and photovoltaic materials usually need to be processed through some processes before they can be applied to other products, such as processes like Chemical Vapor Deposition (CVD), oxidation, and diffusion. Plasma Enhanced Chemical Vapor Deposition (PECVD) is a type of CVD. PECVD mainly relies on the bombardment effect generated by the high plasma sheath voltage drop to maintain the plasma with secondary electrons, and the plasma reacts on the surface of semiconductor and photovoltaic materials to form a solid film.
[0003] Currently, in the industry, a coating device is usually used to perform a coating process on semiconductor and photovoltaic materials. However, the coating uniformity of the coating device in related technologies is poor. Summary of the Utility Model
[0004] In view of this, the embodiments of the present disclosure provide a coating device, which solves the problem of poor coating uniformity of the coating device.
[0005] The embodiments of the present disclosure provide a coating device, including: a cavity extending along a first direction, having a chamber extending along the first direction, the chamber being configured to accommodate a product; multiple groups of remote plasma sources circumferentially distributed around the first direction and configured to provide plasma to the chamber; a support assembly rotatably connected to the cavity, the rotation axis of the support assembly being parallel to the first direction; a driving gear connected to the support assembly; a driving component connected to the driving gear and configured to drive the driving gear to rotate so that the driving gear drives the support assembly to rotate; multiple driven gears respectively rotatably connected to the support assembly and respectively meshing with the driving gear, the self-rotation axis of the driven gear being parallel to the first direction; and multiple loading assemblies disposed in the chamber and respectively connected to the multiple driven gears and configured to load the product.
[0006] In some embodiments, the multiple driven gears are circumferentially distributed around the first direction.
[0007] In some embodiments, at least one set of the remote plasma sources includes at least one linear remote plasma source and / or multiple dot-shaped remote plasma sources; wherein, when at least one set of the remote plasma sources includes the linear remote plasma source, the linear remote plasma source extends along the first direction, the linear remote plasma source has a plurality of first air outlets, and the plurality of first air outlets are arranged at intervals along the first direction and are arranged at circumferential intervals along the first direction; wherein, when at least one set of the remote plasma sources includes multiple dot-shaped remote plasma sources, the multiple dot-shaped remote plasma sources are arranged at intervals along the first direction.
[0008] In some embodiments, when at least two sets of the remote plasma sources include multiple dot-shaped remote plasma sources, the multiple dot-shaped remote plasma sources included in the first set of the remote plasma sources are arranged at intervals along the first direction to form a first column; the multiple dot-shaped remote plasma sources included in the second set of the remote plasma sources are arranged at intervals along the first direction to form a second column, wherein the second set of the remote plasma sources is arranged adjacent to the first set of the remote plasma sources; the first direction is the vertical direction, and the vertical height of the geometric centers of the second air outlets of the multiple dot-shaped remote plasma sources included in the first set of the remote plasma sources is different from the vertical height of the geometric centers of the second air outlets of the multiple dot-shaped remote plasma sources included in the second set of the remote plasma sources.
[0009] In some embodiments, when at least one set of the remote plasma sources includes multiple dot-shaped remote plasma sources, the dot-shaped remote plasma source has an air outlet end, and the side surface of the air outlet end has a plurality of second air outlets, and the plurality of second air outlets are evenly distributed around the side surface of the air outlet end.
[0010] In some embodiments, when the remote plasma source includes the linear remote plasma source, the linear remote plasma source includes a linear inductively coupled plasma source and / or a linear microwave surface wave plasma source; when the remote plasma source includes the dot-shaped remote plasma source, the dot-shaped remote plasma source includes a spiral inductively coupled plasma source and / or a dot-shaped microwave plasma source.
[0011] In some embodiments, the coating device further includes: an auxiliary internal gear, connected to the cavity and meshing with the plurality of driven gears respectively.
[0012] In some embodiments, the coating device further includes: an exhaust pipeline, extending into the chamber and extending along the first direction; wherein, the side wall of the exhaust pipeline has a plurality of exhaust ports, and the plurality of exhaust ports are arranged at intervals along the first direction.
[0013] In some embodiments, the exhaust gas pipeline enters the chamber from the first end of the chamber and extends along the first direction towards the second end of the chamber; wherein, in the direction from the first end of the chamber to the second end of the chamber, the sizes of the plurality of exhaust ports gradually increase.
[0014] In some embodiments, the coating device further includes: a controller, electrically connected to multiple groups of the remote plasma sources, and configured to adjust the power density of the multiple groups of the remote plasma sources.
[0015] The coating device provided by the embodiments of the present disclosure uses multiple groups of remote plasma sources circumferentially distributed around the extension direction of the cavity to provide plasma to the chamber of the cavity, so as to improve the uniformity of the plasma in the chamber. In addition, the coating device uses a support assembly to support the driving gear, the driven gear and the bearing assembly, and a driving assembly drives the driving gear to rotate. The driving gear drives the support assembly to rotate, so that the support assembly drives the driven gear and the bearing assembly to rotate simultaneously around the rotation axis of the support assembly, that is, the bearing assembly revolves around the rotation axis of the support assembly. And the driving gear meshes with the driven gear, and the rotation of the driving gear drives the driven gear to rotate around the rotation axis of the driven gear, so that the driven gear drives the bearing assembly to rotate around the rotation axis of the driven gear, that is, the bearing assembly rotates around the rotation axis of the driven gear. Therefore, the coating device uses the revolution and rotation of the bearing assembly to make the product carried by the bearing assembly revolve and rotate in the chamber, improving the coating uniformity of the coating device.
[0016] In summary, the coating device provided by the embodiments of the present disclosure uses multiple groups of remote plasma sources circumferentially distributed around the extension direction of the cavity to provide plasma to the chamber of the cavity, so as to improve the uniformity of the plasma in the chamber, and makes the product revolve and rotate in the chamber, so that the plasma can coat the product evenly, improving the coating uniformity of the coating device. BRIEF DESCRIPTION OF THE DRAWINGS
[0017] Figure 1 The figure shows a schematic diagram of the application scenario of a coating device provided by an embodiment of the present disclosure.
[0018] Figure 2 The figure shows a top view of a coating device provided by an embodiment of the present disclosure.
[0019] Figure 3 The figure shows a schematic structural diagram of a linear remote plasma source provided by an embodiment of the present disclosure.
[0020] Figure 4 The figure shows a schematic structural diagram of a dot-shaped remote plasma source provided by an embodiment of the present disclosure.
[0021] Figure 5The figure shows a schematic layout diagram of two adjacent columns of dot-shaped remote plasma sources provided by an embodiment of the present disclosure.
[0022] Figure 6 The figure shows a schematic structural diagram of a cavity, an exhaust pipeline, and an exhaust device provided by an embodiment of the present disclosure.
[0023] Figure 7 The figure shows a schematic structural diagram of a cavity and an exhaust device provided by an embodiment of the present disclosure.
[0024] Figure 8 The figure shows a schematic structural diagram of a remote plasma source and a controller provided by an embodiment of the present disclosure.
[0025] Reference numerals:
[0026] 10, coating device; 100, cavity; 1001, chamber; 1011, first end of the chamber; 1021, second end of the chamber; 1002, exhaust hole; 200, remote plasma source; 210, linear remote plasma source; 2101, first end of the linear remote plasma source; 2102, second end of the linear remote plasma source; 2110, first gas outlet; 220, dot-shaped remote plasma source; 2201, gas outlet end; 2210, second gas outlet; 300, support assembly; 301, rotation axis of the support assembly; 400, driving gear; 500, driving assembly; 600, driven gear; 601, self-rotation axis of the driven gear; 700, carrying assembly; 800, auxiliary internal gear; 900, exhaust pipeline; 901, exhaust port; 1000, controller; X1, first direction; 20, product; 30, exhaust device. Detailed implementation manners
[0027] Next, the technical solutions in the embodiments of the present disclosure will be clearly and completely described with reference to the accompanying drawings in the embodiments of the present disclosure. Obviously, the described embodiments are only a part of the embodiments of the present disclosure, rather than all the embodiments. All other embodiments obtained by those of ordinary skill in the art based on the embodiments of the present disclosure without creative efforts shall fall within the protection scope of the present disclosure.
[0028] Next, the specific structure of the coating device will be described in combination with the embodiments.
[0029] Figure 1 The figure shows a schematic application scenario diagram of a coating device provided by an embodiment of the present disclosure. Figure 2 The figure shows a top view of a coating device provided by an embodiment of the present disclosure. As Figure 1 and Figure 2As shown in the figure, the coating device 10 includes: a cavity 100, multiple groups of remote plasma sources 200, a support assembly 300, a driving gear 400, a driving assembly 500, multiple driven gears 600, and multiple carrying assemblies 700.
[0030] The cavity 100 extends along the first direction X1. The cavity 100 has a chamber 1001 that extends along the first direction X1, and the chamber 1001 is configured to accommodate the product 20. Multiple groups of remote plasma sources 200 are circumferentially distributed around the first direction X1, and the remote plasma sources 200 are configured to provide plasma to the chamber 1001. The support assembly 300 is rotatably connected to the cavity 100, and the rotation axis 301 of the support assembly is parallel to the first direction X1. The driving gear 400 is connected to the support assembly 300, and the driving assembly 500 is connected to the driving gear 400 and is configured to drive the driving gear 400 to rotate, so that the driving gear 400 drives the support assembly 300 to rotate. Multiple driven gears 600 are respectively rotatably connected to the support assembly 300 and are respectively meshed with the driving gear 400. The self-rotation axis 601 of the driven gear is parallel to the first direction X1. Multiple carrying assemblies 700 are arranged in the chamber 1001 and are respectively connected to the multiple driven gears 600. The carrying assembly 700 is configured to carry the product 20.
[0031] The coating device 10 uses multiple groups of remote plasma sources 200 that are circumferentially distributed around the extension direction of the cavity 100 to provide plasma to the chamber 1001 of the cavity 100, so as to improve the uniformity of the plasma in the chamber 1001. In addition, the coating device 10 uses the support assembly 300 to support the driving gear 400, the driven gears 600, and the carrying assembly 700. The driving assembly 500 drives the driving gear 400 to rotate, and the driving gear 400 drives the support assembly 300 to rotate, so that the support assembly 300 drives the driven gears 600 and the carrying assembly 700 to rotate simultaneously around the rotation axis 301 of the support assembly, that is, the carrying assembly 700 revolves around the rotation axis 301 of the support assembly. Moreover, the driving gear 400 is meshed with the driven gears 600, and the rotation of the driving gear 400 drives the driven gears 600 to rotate around the self-rotation axis 601 of the driven gears, so that the driven gears 600 drive the carrying assembly 700 to rotate around the self-rotation axis 601 of the driven gears, that is, the carrying assembly 700 rotates around the self-rotation axis 601 of the driven gears. Therefore, the coating device 10 uses the revolution and self-rotation of the carrying assembly 700 to make the product 20 carried by the carrying assembly 700 revolve and rotate in the chamber 1001, improving the coating uniformity of the coating device 10.
[0032] In summary, the coating apparatus 10 uses multiple groups of remote plasma sources 200 evenly distributed circumferentially along the extension direction of the cavity 100 to provide plasma to the chamber 1001 of the cavity 100, so as to improve the uniformity of the plasma in the chamber 1001, and rotates the product 20 around its own axis and revolves around the center of the chamber 1001, so that the plasma can coat the product 20 evenly, thereby improving the coating uniformity of the coating apparatus 10.
[0033] Exemplarily, the cross-sectional shape of the cavity 100 can be a rectangular ring, a circular ring, a polygonal ring, etc. Exemplarily, the cross-sectional shape of the cavity 100 is a circular ring, and multiple groups of remote plasma sources 200 are evenly distributed circumferentially around the cavity 100. Exemplarily, the cross-sectional shape of the cavity 100 is a rectangular ring or a polygonal ring, and multiple groups of remote plasma sources 200 are arranged at equal intervals around the outer sidewall of the cavity 100.
[0034] Exemplarily, multiple groups of remote plasma sources 200 can all be arranged in the chamber 1001, and multiple groups of remote plasma sources 200 can also all be arranged outside the cavity 100. Exemplarily, some groups of the multiple groups of remote plasma sources 200 are arranged in the chamber 1001, and some groups of remote plasma sources 200 are arranged outside the cavity 100. Figure 1 and Figure 2 All the multiple groups of remote plasma sources 200 shown in
[0035] Exemplarily, the remote plasma source 200 is connected to the cavity 100 and communicates with the chamber 1001 to provide plasma for the chamber 1001. Exemplarily, the remote plasma source 200 is not connected to the cavity 100 but communicates with the chamber 1001. For example, multiple air inlets communicating with the chamber 1001 are provided on the cavity 100, and the remote plasma source 200 has an air outlet. The air inlet is aligned and communicated with the air outlet to enable the remote plasma source 200 to provide plasma into the chamber 1001.
[0036] Exemplarily, the driving assembly 500 can include a motor, a rotary electric cylinder, etc.
[0037] Exemplarily, the support assembly 300, the driving gear 400 and the driven gear 600 can be arranged at the first end 1011 of the chamber or the second end 1021 of the chamber. Figure 1 In
[0038] Exemplarily, the carrier component 700 can horizontally carry a plurality of products 20, and the carrier component 700 can also vertically carry a plurality of products 20, so as to enable the coating device 10 to coat a plurality of products 20 simultaneously, thereby improving the coating efficiency of the coating device 10.
[0039] Exemplarily, the product 20 can be a silicon wafer, a semiconductor wafer, a glass substrate, etc.
[0040] Exemplarily, the plasma can be a plasma containing fluorine ions or oxygen ions, or a plasma containing other ions.
[0041] Exemplarily, multiple groups of remote plasma sources 200 can provide different types of plasma. Different types of plasma can coat the products 20 in the chamber 1001, and can also clean, graft-modify, ion-implant, etc. the products 20 in the chamber 1001.
[0042] In some embodiments, as Figure 2 shown, a plurality of driven gears 600 are circumferentially evenly distributed around the first direction X1, so as to further improve the coating uniformity.
[0043] In some embodiments, as Figures 1 to 3 shown, at least one group of remote plasma sources 200 includes at least one linear remote plasma source 210. The linear remote plasma source 210 extends along the first direction X1. The linear remote plasma source 210 has a plurality of first air outlets 2110. The plurality of first air outlets 2110 are spaced along the first direction X1 and are circumferentially spaced along the first direction X1, so as to further improve the uniformity of the plasma provided by the linear remote plasma source 210 to the chamber 1001, thereby further improving the coating uniformity.
[0044] Exemplarily, each group of remote plasma sources 200 of the multiple groups of remote plasma sources 200 includes a linear remote plasma source 210, and each linear remote plasma source 210 extends along the first direction X1. The plurality of linear remote plasma sources 210 are circumferentially spaced along the first direction X1. Figure 3 The arrows in represent the flow direction of the plasma when it flows out of the remote plasma source 200.
[0045] Exemplarily, a plurality of first air inlets communicating with the chamber 1001 are provided on the cavity 100. The first air inlets are aligned and communicated with the first air outlets 2110, so as to enable the linear remote plasma source 210 to provide plasma into the chamber 1001.
[0046] In some embodiments, as Figure 1 and Figure 2As shown, at least one set of remote plasma sources 200 includes a plurality of dot-shaped remote plasma sources 220. The plurality of dot-shaped remote plasma sources 220 are spaced apart along the first direction X1 to further improve the uniformity of the plasma provided by the plurality of dot-shaped remote plasma sources 220 to the chamber 1001, thereby further improving the coating uniformity.
[0047] Exemplarily, each set of the multiple sets of remote plasma sources 200 includes a plurality of dot-shaped remote plasma sources 220. The plurality of dot-shaped remote plasma sources 220 in each set are spaced apart along the first direction X1, and the plurality of dot-shaped remote plasma sources 220 of the multiple sets are circumferentially spaced apart along the first direction X1.
[0048] In some embodiments, at least one set of the multiple sets of remote plasma sources 200 includes at least one linear remote plasma source 210, and at least one set of remote plasma sources 200 includes a plurality of dot-shaped remote plasma sources 220. The linear remote plasma source 210 extends along the first direction X1. The linear remote plasma source 210 has a plurality of first gas outlets 2110. The plurality of first gas outlets 2110 are spaced apart along the first direction X1 and are circumferentially spaced apart along the first direction X1. The plurality of dot-shaped remote plasma sources 220 of one set of remote plasma sources 200 are spaced apart along the first direction X1 to further improve the uniformity of the plasma provided by the remote plasma sources 200 to the chamber 1001, thereby further improving the coating uniformity.
[0049] Exemplarily, as Figure 1 and Figure 2 shown, the multiple sets of remote plasma sources 200 include four sets of linear remote plasma sources 210 and four sets of dot-shaped remote plasma sources 220. Each set of linear remote plasma sources 210 includes one linear remote plasma source 210. Each linear remote plasma source 210 extends along the first direction X1. The four linear remote plasma sources 210 are circumferentially spaced apart along the first direction X1. Each set of dot-shaped remote plasma sources 220 includes four dot-shaped remote plasma sources 220. The four dot-shaped remote plasma sources 220 in each set are spaced apart along the first direction X1, and the four sets of dot-shaped remote plasma sources 220 are circumferentially spaced apart along the first direction X1.
[0050] Exemplarily, the length of the linear remote plasma source 210 extending along the first direction X1 is greater than the vertical height of the carrier assembly 700, and the plurality of first gas outlets 2110 are spaced apart between the first end 2101 and the second end 2102 of the linear remote plasma source to further improve the uniformity of the plasma provided by the linear remote plasma source 210 to the chamber 1001, thereby further improving the coating uniformity.
[0051] In some embodiments, as Figure 2 and Figure 4 shown, the dot-shaped remote plasma source 220 has an air outlet end 2201, and a plurality of second air outlet ports 2210 are provided on the side surface of the air outlet end 2201. The plurality of second air outlet ports 2210 are evenly distributed around the side surface of the air outlet end 2201 to further improve the uniformity of the plasma provided by the dot-shaped remote plasma source 220 to the chamber 1001, thereby further improving the coating uniformity. Figure 4 The arrow in
[0052] represents the flow direction of the plasma when it flows out of the dot-shaped remote plasma source 220.
[0053] In some embodiments, as Figure 2 , Figure 4 and Figure 5 shown, in the case where at least two groups of the remote plasma sources 200 include a plurality of the dot-shaped remote plasma sources 220, the plurality of dot-shaped remote plasma sources 220 included in the first group of remote plasma sources 200 are arranged at intervals along the first direction X1 to form a first column. The plurality of dot-shaped remote plasma sources 220 included in the second group of remote plasma sources 200 are arranged at intervals along the first direction X1 to form a second column. The second group of remote plasma sources 200 is arranged adjacent to the first group of remote plasma sources 200. The first direction X1 is the vertical direction, and the vertical height of the geometric centers of the respective second air outlet ports 2210 of the plurality of dot-shaped remote plasma sources 220 included in the first group of remote plasma sources 200 is different from the vertical height of the geometric centers of the respective second air outlet ports 2210 of the plurality of dot-shaped remote plasma sources 220 included in the second group of remote plasma sources 200, that is, the plurality of dot-shaped remote plasma sources 220 in adjacent two columns are arranged in a staggered manner to further improve the uniformity of the plasma provided by the plurality of dot-shaped remote plasma sources 220 to the chamber 1001, thereby further improving the coating uniformity.
[0054] The coating device in the related art uses medium-frequency power supply discharge, resulting in relatively large ion bombardment damage and low gas ionization efficiency.
[0055] In some embodiments, in the case where the remote plasma source 200 includes a linear remote plasma source 210, the linear remote plasma source 210 includes a linear inductively coupled plasma source, or a linear microwave surface wave plasma source, or a linear inductively coupled plasma source and a linear microwave surface wave plasma source.
[0056] Both the linear inductively coupled plasma source and the linear microwave surface wave plasma source have a very high gas ionization rate, so that the coating device 10 has a very high gas utilization rate and coating efficiency.
[0057] In some embodiments, when the remote plasma source 200 includes a dot-shaped remote plasma source 220, the dot-shaped remote plasma source 220 includes a helical inductively coupled plasma source, or a dot-shaped microwave plasma source, or a helical inductively coupled plasma source and a dot-shaped microwave plasma source.
[0058] Both the helical inductively coupled plasma source and the dot-shaped microwave plasma source have a very high gas ionization rate, so that the coating device 10 has a very high gas utilization rate and coating efficiency.
[0059] In some embodiments, as Figure 2 shown, the coating device 10 further includes an auxiliary internal gear 800. The auxiliary internal gear 800 is connected to the cavity 100 and meshes with a plurality of driven gears 600 respectively. The auxiliary internal gear 800 is used to improve the rotational stability of the driven gears 600.
[0060] In some embodiments, as Figure 1 and Figure 6 shown, the coating device 10 further includes an exhaust pipeline 900. The exhaust pipeline 900 extends into the chamber 1001 and extends along the first direction X1. The side wall of the exhaust pipeline 900 has a plurality of exhaust ports 901, and the plurality of exhaust ports 901 are arranged at intervals along the first direction X1 to improve the exhaust uniformity.
[0061] Exemplarily, the exhaust pipeline 900 is located in the central area of the chamber 1001 to further improve the exhaust uniformity.
[0062] In some embodiments, as Figure 6 shown, the exhaust pipeline 900 enters the chamber 1001 from the first end 1011 of the chamber and extends along the first direction X1 towards the second end 1021 of the chamber. In the direction from the first end 1011 of the chamber to the second end 1021 of the chamber, the sizes of the plurality of exhaust ports 901 gradually increase to further improve the exhaust uniformity.
[0063] Exemplarily, the exhaust port 901 is a round hole, and the size of the exhaust port 901 can be the diameter. Exemplarily, the exhaust port 901 is a square hole, and the size of the exhaust port 901 can be the side length. Exemplarily, the exhaust port 901 is an irregular hole, and the size of the exhaust port 901 can be the opening area of the exhaust port 901.
[0064] Exemplarily, the end of the exhaust pipeline 900 close to the first end 1011 of the chamber extends out of the chamber 1001 and is connected to the exhaust device 30.
[0065] In some embodiments, the extraction pipeline 900 enters the chamber 1001 from the second end 1021 of the chamber and extends along the first direction X1 towards the first end 1011 of the chamber. In the direction from the second end 1021 to the first end 1011 of the chamber, the sizes of the plurality of extraction ports 901 gradually increase to further improve the uniformity of extraction. Exemplarily, the end of the extraction pipeline 900 near the second end 1021 of the chamber extends out of the chamber 1001 and is connected to the extraction device 30.
[0066] In some embodiments, as Figure 7 shown, the side wall of the cavity 100 has at least one extraction hole 1002 communicating the chamber 1001 with the outside, and the gas in the chamber 1001 can be extracted through the extraction hole 1002. Exemplarily, the extraction device 30 extracts the gas in the chamber 1001 through the extraction hole 1002. Figure 7 The arrows in
[0067] Exemplarily, the plurality of extraction holes 1002 are located in the middle region of the side wall of the cavity 100 and are arranged at intervals along the first direction X1 to improve the uniformity and efficiency of extraction.
[0068] In some embodiments, as Figure 1 and Figure 8 shown, the coating device 10 further includes a controller 1000, and the controller 1000 is electrically connected to multiple groups of remote plasma sources 200 and is configured to adjust the power density of the multiple groups of remote plasma sources 200.
[0069] The heating method of the coating device 10 can be selected as quasi / thermal equilibrium plasma heating, that is, the plasma provided by the remote plasma source 200 is used to heat the product 20 by its own heat, and the temperature of the plasma is controlled by adjusting the power density of the remote plasma source 200. This heating method can eliminate the heating system and temperature control system of the coating device 10.
[0070] Exemplarily, the heating system can include infrared lamps, carbon tapes or sheathed heaters, etc. Exemplarily, when it is necessary to arrange a heating system in the chamber 1001 of the cavity 100, the circular cavity 100 is more convenient for the circumferential uniform distribution of the heating system around the first direction X1.
[0071] In the embodiments of the present disclosure, if not clearly defined, the connection form can be detachable connection by means of bolts and nuts, screws, buckles, magnetic attraction, etc. In some connections, if there is no special requirement for the form of detachable cooperation, non-detachable connection can be carried out by means of welding, bonding, etc.
[0072] As used in the specification, phrases such as "an embodiment" and "embodiments" mean that the described embodiments may include specific features, structures, or characteristics, but not every embodiment necessarily includes such specific features, structures, or characteristics. Moreover, such phrases do not necessarily refer to the same embodiment. Further, when a specific feature, structure, or characteristic is described in connection with an embodiment, it is within the knowledge of those skilled in the art to implement such feature, structure, or characteristic in connection with other embodiments, whether explicitly or implicitly described.
[0073] It should be understood that the terms "on", "above", and "over" in this disclosure should be construed in the broadest sense, such that "on" not only means "directly on something", but also includes the meaning of "on something" with intermediate features or layers therebetween, and "above" or "over" not only includes the meaning of "above" or "over something", but may also include the meaning of "above" or "over something" with no intermediate features or layers therebetween (i.e., directly on something).
[0074] In addition, for ease of description, spatial relative terms may be used in the text, such as "below", "beneath", "under", "above", "over", etc., to describe the relationship of one component or feature to another component or feature as shown in the figures. Spatial relative terms are intended to encompass different orientations of the components in use or operation in addition to the orientation shown in the figures. The device may have other orientations (rotated 90 degrees or at other orientations), and the spatial relative descriptive terms used in the text may be interpreted accordingly.
[0075] It should be noted that, in this document, the term "comprising", "including" or any other variation thereof is intended to cover a non-exclusive inclusion, such that a process, method, article, or apparatus that comprises a series of elements includes not only those elements but also other elements not expressly listed, or elements inherent to such process, method, article, or apparatus. Without further limitation, an element defined by the phrase "comprising a..." does not exclude the presence of additional identical elements in the process, method, article, or apparatus that comprises the element.
[0076] The above are only the preferred embodiments of this disclosure, and are not intended to limit this disclosure. Any modifications, equivalent substitutions, etc. made within the spirit and principles of this disclosure shall be included within the protection scope of this disclosure.
Claims
1. A coating device, characterized in that, Comprising: A cavity extending along a first direction and having a chamber extending along the first direction, the chamber being configured to accommodate a product; Multiple groups of remote plasma sources evenly distributed circumferentially around the first direction and configured to supply plasma to the chamber; A support assembly rotatably connected to the cavity, the rotation axis of the support assembly being parallel to the first direction; A driving gear connected to the support assembly; A driving assembly connected to the driving gear and configured to drive the driving gear to rotate so that the driving gear drives the support assembly to rotate; Multiple driven gears respectively rotatably connected to the support assembly and respectively meshing with the driving gear, the self-rotation axes of the driven gears being parallel to the first direction; Multiple loading assemblies disposed in the chamber and respectively connected to the multiple driven gears, configured to load the product.
2. The coating device according to claim 1, characterized in that, The multiple driven gears are evenly distributed circumferentially around the first direction.
3. The coating device according to claim 1, wherein At least one group of the remote plasma sources includes at least one linear remote plasma source and / or multiple dot-shaped remote plasma sources; Wherein, when at least one group of the remote plasma sources includes the linear remote plasma source, the linear remote plasma source extends along the first direction, the linear remote plasma source has multiple first air outlets, and the multiple first air outlets are spaced along the first direction and circumferentially spaced along the first direction; Wherein, when at least one group of the remote plasma sources includes multiple dot-shaped remote plasma sources, the multiple dot-shaped remote plasma sources are spaced along the first direction.
4. The coating device according to claim 3, characterized in that, When at least two groups of the remote plasma sources include multiple dot-shaped remote plasma sources, The multiple dot-shaped remote plasma sources included in the first group of the remote plasma sources are spaced along the first direction to form a first column; The multiple dot-shaped remote plasma sources included in the second group of the remote plasma sources are spaced along the first direction to form a second column, wherein the second group of the remote plasma sources is adjacent to the first group of the remote plasma sources; The first direction is the vertical direction, and the vertical height of the geometric centers of the second air outlets of the multiple dot-shaped remote plasma sources included in the first group of the remote plasma sources is different from the vertical height of the geometric centers of the second air outlets of the multiple dot-shaped remote plasma sources included in the second group of the remote plasma sources.
5. The coating device according to claim 3, wherein When at least one group of the remote plasma sources includes multiple dot-shaped remote plasma sources, the dot-shaped remote plasma source has an air outlet end, and the side surface of the air outlet end has multiple second air outlets, and the multiple second air outlets are evenly distributed around the side surface of the air outlet end.
6. The coating device according to claim 3, wherein When the remote plasma source includes the linear remote plasma source, the linear remote plasma source includes a linear inductively coupled plasma source and / or a linear microwave surface wave plasma source; In the case where the remote plasma source includes the dot-shaped remote plasma source, the dot-shaped remote plasma source includes a helical inductively coupled plasma source and / or a dot-shaped microwave plasma source.
7. The coating device according to any one of claims 1 to 6, characterized in that, Further included is: An auxiliary internal gear, connected to the cavity and respectively meshing with a plurality of the driven gears.
8. The coating device according to any one of claims 1 to 6, characterized in that, Further included is: An exhaust pipeline, extending into the chamber and extending along the first direction; Wherein, the side wall of the exhaust pipeline has a plurality of exhaust ports, and the plurality of exhaust ports are arranged at intervals along the first direction.
9. The coating device according to claim 8, characterized in that, The exhaust pipeline enters the chamber from the first end of the chamber and extends along the first direction towards the second end of the chamber; Wherein, in the direction from the first end of the chamber to the second end of the chamber, the sizes of the plurality of exhaust ports gradually increase.
10. The coating device according to any one of claims 1 to 6, characterized in that, Further included is: A controller, electrically connected to multiple groups of the remote plasma sources and configured to adjust the power density of the multiple groups of the remote plasma sources.