Mixed air inlet device and semiconductor manufacturing equipment

Abstract

The utility model relates to the technical field of semiconductor manufacturing equipment, in particular to a mixed air inlet device. The utility model provides a mixed gas inlet device which comprises an upper cover plate and a gas inlet cavity. The upper cover plate comprises a first fluid channel which penetrates through the middle of the upper cover plate from top to bottom and is used for introducing first gas into the gas inlet cavity. A plurality of gas inlet channels are formed in the side wall of the upper cover plate, are distributed along the peripheral side of the upper cover plate and are used for introducing second gas; a plurality of flow dividing grooves are formed in the upper cover plate in the circumferential direction and used for dividing second gas introduced into the gas inlet channel. Each gas inlet channel is connected with at least one flow dividing groove, and second gas enters the gas inlet cavity through the gas inlet channels and the flow dividing grooves; and the gas inlet cavity outputs mixed gas formed by mixing the introduced first gas and second gas. According to the utility model, the uniform and thorough mixing effect of two process gases in the device can be ensured, so that the uniformity and high efficiency of the semiconductor process are ensured.

Description

Technical Field

[0001] The utility model relates to the technical field of semiconductor manufacturing equipment, and more specifically, to a mixed air intake device and semiconductor manufacturing equipment. Background Art

[0002] The low-pressure epitaxy (EPI) process places extremely stringent demands on wafer surface quality. The wafer surface must be kept in optimal condition to avoid any oxide film formation or impurity residue. Therefore, before the EPI process, a pre-cleaning process is usually required to thoroughly remove the oxide film and impurities on the wafer surface. Commonly used process gases in this process include NF3 and NH3. NF3 gas first needs to be ionized to generate plasma, then fully mixed with NH3 gas, and then both enter the pre-cleaning chamber to efficiently clean the wafer surface.

[0003] To ensure uniform mixing of process gases before entering the pre-cleaning chamber, a mixing and inlet device is necessary. Current mixing and inlet device designs are typically simplistic, which can easily lead to suboptimal process gas mixing and inability to achieve uniform distribution across the wafer surface, negatively impacting the pre-cleaning performance. Utility Model Content

[0004] The utility model aims to provide a mixed gas intake device to solve the problem of poor gas mixing uniformity before entering a reaction chamber in semiconductor manufacturing equipment in the prior art.

[0005] In order to achieve the above-mentioned purpose, the present invention provides a hybrid air intake device, comprising an upper cover plate and an air intake cavity:

[0006] The upper cover is fixedly connected to the upper portion of the air inlet cavity;

[0007] The upper cover plate includes a first fluid channel, which runs through the middle portion of the upper cover plate from top to bottom and is used to introduce the first gas into the air inlet cavity;

[0008] The air inlet cavity includes a second fluid channel, which runs through the middle of the air inlet cavity from top to bottom and is connected to the first fluid channel;

[0009] The side wall of the upper cover plate is provided with a plurality of air inlet channels, the plurality of air inlet channels being distributed along the circumference of the upper cover plate, one end of the air inlet channel being located on the side wall, and the other end extending toward the center and being located inside the upper cover plate, the air inlet channel being used to introduce the second gas;

[0010] A plurality of diversion grooves are provided on the inner circumference of the upper cover plate, and the plurality of diversion grooves form an annular arrangement relative to the circumference of the upper cover plate, and are used to divert the second gas introduced into the air inlet channel;

[0011] Each of the air inlet channels is connected to at least one of the diverter grooves, and the second gas enters the second fluid channel of the air inlet cavity through the air inlet channels and the diverter grooves;

[0012] The second fluid channel outputs a mixed gas formed by mixing the first gas and the second gas introduced therein.

[0013] In some embodiments, the upper cover plate is snap-fitted to the air inlet cavity.

[0014] In some embodiments, the plurality of diversion grooves include a plurality of levels of diversion grooves opened along a plurality of circumferential directions;

[0015] Different levels of shunt troughs correspond to different circumferential radii;

[0016] The diversion troughs of the same level are arranged on the same circumference.

[0017] In some embodiments, the upper cover plate is further provided with several levels of internal communication channels:

[0018] The internal communication channel of each level is arranged between the corresponding two adjacent levels of the diverter grooves, and is used to communicate the gas between the two adjacent levels of the diverter grooves.

[0019] In some embodiments, there are multiple internal connecting channels at the same level.

[0020] In some embodiments, the internal communicating channels corresponding to the same air inlet channel in the same level of the internal communicating channels are symmetrically distributed relative to the corresponding air inlet channel.

[0021] In some embodiments, the plurality of air inlet channels are evenly distributed along the circumference of the upper cover plate.

[0022] In some embodiments, the number of the internal communication channels in each stage corresponds to the number of the diverter slots in the downstream stage;

[0023] The internal communication channel of each stage is arranged in the middle position of the diversion groove of the downstream stage.

[0024] In some embodiments, the air inlet cavity includes an air inlet cavity body and an upper annular protrusion:

[0025] The upper annular protrusion is fixedly connected to the upstream side of the air inlet cavity body;

[0026] The air inlet cavity body is provided with a docking portion, and the docking portion protrudes from the upper surface of the upper annular protruding portion;

[0027] Wherein, the upper surface of the docking portion abuts against the upper cover plate;

[0028] Each of the air inlet channels and the diverter groove in fluid communication with the air inlet channels constitutes an air inlet path; the diverter groove is formed by the upper surface of the upper annular protrusion or by the upper surface of the upper annular protrusion and the outer peripheral wall of the docking portion to form an air path.

[0029] In some embodiments, the number of external connecting channels connected to the same diversion groove is 2, and they are symmetrically distributed relative to the middle position of the corresponding diversion groove.

[0030] In some embodiments, the docking portion is provided with a plurality of external communication channels:

[0031] The outer communication channel connects the innermost diversion groove with the second fluid channel of the air inlet cavity.

[0032] In some embodiments, in the same branch gas path, the total flow area of ​​the plurality of external communication channels is smaller than the total flow area of ​​the internal communication channel of the last upstream stage; and / or

[0033] In at least one adjacent internal communication channel of two stages in the same air intake passage, the total flow area of ​​the internal communication channel at the downstream stage is smaller than the total flow area of ​​the internal communication channel at the upstream stage.

[0034] In some embodiments, the air inlet cavity body portion includes a first body portion and a second body portion:

[0035] The first body portion is a cylindrical structure;

[0036] The upper annular protrusion is fixedly connected to the outer periphery of the first body;

[0037] The docking portion is provided on the upper portion of the first body portion;

[0038] The second main body is fixedly connected to the bottom of the first main body.

[0039] In some embodiments, the second body portion is a hollow frustum-shaped structure, and the top surface of the second body portion is connected to the first body portion.

[0040] In some embodiments, the second fluid channel passes through a portion of the first body portion and has the same shape as the first body portion;

[0041] The second fluid channel passes through a portion of the second body portion and has the same shape as the second body portion.

[0042] In some embodiments, the air inlet cavity further includes a lower annular protrusion:

[0043] The lower annular protrusion is fixedly connected to the downstream side of the second body portion.

[0044] In some embodiments, the air inlet cavity body further includes a plurality of flow equalizers:

[0045] The flow plate is provided with a plurality of flow holes;

[0046] The plurality of flow equalizers are respectively arranged inside the main body of the air inlet cavity.

[0047] In some embodiments, the plurality of flow distributors include a first flow distributor:

[0048] The first flow equalizer is arranged between the first body portion and the second body portion;

[0049] The first flow equalizer plate is provided with a plurality of flow equalizer holes.

[0050] In some embodiments, the air inlet cavity body further includes a third body portion:

[0051] The third body portion is a cylindrical structure and is fixedly connected to the bottom of the second body portion;

[0052] The plurality of flow equalizers further includes a second flow equalizer;

[0053] The second flow equalizer is arranged inside the third body portion;

[0054] The second flow equalizer plate is provided with a plurality of flow equalizer holes.

[0055] In some embodiments, the uniform flow hole forms a certain inclined angle with the central axis of the air inlet cavity body.

[0056] In some embodiments, the uniform flow hole and the central axis of the air inlet cavity body form a certain outward inclined angle.

[0057] In order to achieve the above object, the present invention provides a semiconductor manufacturing equipment, comprising the above-mentioned mixed air intake device;

[0058] The semiconductor manufacturing equipment includes a reaction chamber, and the lower end of the mixing and inlet device is fixedly connected to the reaction chamber; and / or

[0059] The semiconductor manufacturing equipment includes a remote plasma source, and the upper end of the mixing gas inlet device is fixedly connected to the remote plasma source.

[0060] The mixed gas inlet device proposed in this utility model can ensure that the two process gases are evenly and thoroughly mixed within the device, thereby ensuring uniformity and efficiency of the semiconductor process. Semiconductor manufacturing equipment including this mixed gas inlet device has the same advantages as the semiconductor manufacturing equipment, which will not be described in detail here. BRIEF DESCRIPTION OF THE DRAWINGS

[0061] The above and other features, properties and advantages of the present invention will become more apparent through the following description in conjunction with the accompanying drawings and embodiments, in which the same reference numerals represent the same features throughout, wherein:

[0062] Figure 1 The overall axonometric diagram of a hybrid air intake device according to an embodiment of the present utility model is disclosed;

[0063] Figure 2 A cross-sectional schematic diagram of a hybrid air intake device according to an embodiment of the present utility model is disclosed;

[0064] Figure 3 The isometric diagram of the air intake cavity according to one embodiment of the present invention is disclosed;

[0065] Figure 4 A schematic cross-sectional view of a hybrid air intake device according to an embodiment of the present invention is disclosed;

[0066] Figure 5 A schematic cross-sectional view of a hybrid air intake device according to another embodiment of the present invention is disclosed;

[0067] Figure 6 A cross-sectional schematic diagram of a hybrid air intake device according to an embodiment of the present utility model is disclosed;

[0068] Figure 7a A cross-sectional schematic diagram of a mixing and intake device according to another embodiment of the present utility model is disclosed;

[0069] Figure 7b A top view of a first current equalizing plate according to another embodiment of the present invention is disclosed;

[0070] Figure 8a A cross-sectional schematic diagram of a mixing and intake device according to another embodiment of the present utility model is disclosed;

[0071] Figure 8b A top view of a second current equalizing plate according to another embodiment of the present invention is disclosed.

[0072] The meanings of the reference numerals in the figures are as follows:

[0073] 1. Upper cover;

[0074] 11 air intake passage;

[0075] 111 upper cover plate body;

[0076] 112 upper cover plate protrusion;

[0077] 113 abutting plane;

[0078] 12 first-stage diversion trough;

[0079] 13 second-stage diversion trough;

[0080] 14 first-stage internal communication channel;

[0081] 15 annular groove;

[0082] 2 air intake cavity;

[0083] 21 air intake cavity body;

[0084] 211The first body part;

[0085] 2111 docking unit;

[0086] 2112 external connecting channel;

[0087] 212 second body portion;

[0088] 213 third body part;

[0089] 214 first flow equalizer plate;

[0090] 215 second flow equalizer plate;

[0091] 22 upper annular protrusion;

[0092] 221 plane section;

[0093] 23 lower annular protrusion. DETAILED DESCRIPTION

[0094] In order to make the purpose, technical solutions and advantages of the present invention more clearly understood, the present invention is further described in detail below with reference to the accompanying drawings and embodiments. It should be understood that the specific embodiments described herein are only used to explain the present invention and are not intended to limit the present invention.

[0095] Throughout this specification, reference to terms such as "one embodiment," "some embodiments," "examples," "specific examples," or "some examples" means that the specific features, structures, materials, or characteristics described in conjunction with that embodiment or example are included in at least one embodiment or example of the present invention. In this specification, schematic representations of the above terms do not necessarily refer to the same embodiment or example. Furthermore, the specific features, structures, materials, or characteristics described may be combined in any suitable manner in any one or more embodiments or examples.

[0096] The utility model provides a mixed air intake device and semiconductor manufacturing equipment using the mixed air intake device. The mixed air intake device can be used for pre-cleaning a cavity, thereby improving the problem of uneven air mixing in the prior art.

[0097] Figure 1 The overall axonometric diagram of the hybrid air intake device according to one embodiment of the present invention is disclosed. Figure 2 A cross-sectional view of a hybrid air intake device according to an embodiment of the present invention is disclosed. Figure 1 and Figure 2 As shown, the hybrid air intake device proposed by the present invention includes an upper cover plate 1 and an air intake cavity 2:

[0098] The upper cover plate 1 is fixedly connected to the upper portion of the air inlet cavity 2;

[0099] The upper cover plate 1 includes a first fluid channel 10, which runs through the middle of the upper cover plate 1 from top to bottom and is used to pass the first gas into the air inlet cavity 2;

[0100] The air inlet cavity 2 includes a second fluid channel 20, which runs through the middle of the air inlet cavity 2 from top to bottom and is connected to the first fluid channel 10;

[0101] The side wall of the upper cover plate 1 is provided with a plurality of air inlet channels 11, which are distributed along the circumference of the upper cover plate 1. One end of the air inlet channel 11 is located on the side wall of the upper cover plate 1, and the other end extends toward the center and is located inside the upper cover plate 1. The air inlet channel 11 is used to introduce the second gas;

[0102] A plurality of diversion grooves are provided on the inner circumference of the upper cover plate 1. The plurality of diversion grooves form an annular arrangement relative to the circumference of the upper cover plate 1, and are used to divert the second gas introduced into the air inlet channel 11.

[0103] Each of the air inlet channels 11 is connected to at least one of the diverter grooves, and the second gas enters the second fluid channel 20 of the air inlet cavity through the air inlet channels 11 and the diverter grooves;

[0104] The second fluid channel 20 outputs a mixed gas formed by mixing the first gas and the second gas introduced therein.

[0105] Among them, the diversion groove is an arc-shaped groove, which is recessed upward from the lower surface of the upper cover plate 1 and extends along the circumference of the upper cover plate 1. Therefore, after the second gas enters the diversion groove along the radially arranged air inlet channel 11, it will be diverted along the circumference and then enter the air inlet cavity 2.

[0106] In this embodiment, the first gas is NF3 and the second gas is NH3.

[0107] Furthermore, the upper cover plate 1 is snap-fitted to the air inlet cavity 2 .

[0108] like Figure 1 and Figure 2 As shown, the upper cover plate 1 includes an upper cover plate body portion 111 and an upper cover plate protrusion portion 112 . The protrusion portion 112 protrudes outward from the outer periphery of the upper cover plate body portion 111 , and the air intake channel 11 passes through the upper cover plate protrusion portion 112 along the radial direction of the upper cover plate 1 .

[0109] At least part of the lower surface of the upper cover plate protrusion 112 is lower than the lower surface of the upper cover plate main body 111. The upper cover plate protrusion 112 also has a contact plane 113. When the upper cover plate 1 is buckled into the air intake cavity 2, the contact plane 113 abuts against the flat cut surface 221 (this technical feature will be described below).

[0110] The upper end surface of the upper cover plate 1 is directly or indirectly fixedly connected to an upstream component, such as an RPS (Remote Plasma Source).

[0111] The upper cover plate 1 and the upstream component can be fastened by screws and sealed by an O-ring.

[0112] The lower end surface of the air inlet chamber 2 is directly or indirectly fixed to a downstream component, such as a cover assembly of a reaction chamber. In one embodiment, the reaction chamber is a cleaning chamber.

[0113] The air inlet cavity 2 and the downstream components can be fastened by screws and sealed by O-rings.

[0114] Furthermore, a channel for installing a temperature sensor is provided on the upper cover plate 1 .

[0115] It should be understood that this channel is fluidically isolated from the fluid channel including the air inlet channel and the diverter trough described above. The temperature measuring end of the temperature sensor is close to the air inlet channel or the diverter trough and other fluid channels to truly reflect the fluid temperature.

[0116] Preferably, the temperature sensor is a thermocouple.

[0117] Figure 3 The isometric diagram of the air intake cavity according to one embodiment of the present invention is disclosed. Figure 2 and Figure 3 As shown, in the hybrid air intake device proposed by the present invention, the air intake cavity 2 includes an air intake cavity body portion 21 and an upper annular protruding portion 22 .

[0118] The upper annular protrusion 22 is fixedly connected to the upstream side of the air inlet cavity body 21;

[0119] The air inlet cavity body 21 is provided with a docking portion 2111;

[0120] The docking portion 2111 protrudes from the upper surface of the upper annular protruding portion 22;

[0121] The docking portion 2111 is a circular ring structure, and its upper surface abuts against the upper cover plate 1;

[0122] Each air intake channel and a diverter groove connected to the fluid of the air intake channel constitute an air intake path, and the diverter groove is formed by the upper surface of the upper annular protrusion 22 or by the upper surface of the upper annular protrusion 22 and the outer peripheral wall of the docking part 2111 to form a closed air path.

[0123] Furthermore, the upper surface of the docking portion 2111 abuts against the annular groove 15 of the upper cover plate 1 .

[0124] An annular groove 15 extends from the annular side surface surrounding the first fluid channel 10, away from the center of the upper cover plate 1. The annular groove 15 extends downward through the lower surface of the upper cover plate body 111. As a key feature of the upper cover plate 1, the annular groove 15 utilizes the geometric properties of the annular shape to provide a stable support surface for the docking portion 2111. Its specific shape and size ensure a tight fit and precise positioning between the two. It also serves as a sealing surface.

[0125] As the component that directly contacts annular groove 15, the shape, size, and material selection of docking portion 2111 require rigorous consideration. During the manufacturing process, high-precision processing equipment and strict quality control procedures ensure the flatness and dimensional accuracy of the upper surface of docking portion 2111, allowing it to accurately abut against annular groove 15.

[0126] In this embodiment, the upper cover plate 1 and the air inlet cavity 2 are designed to be separated, which facilitates the formation of diversion grooves during the processing to meet the corresponding gas mixing function requirements.

[0127] like Figure 2 As shown, the air inlet cavity body portion 21 includes a first body portion 211 and a second body portion 212:

[0128] The first body portion 211 is a cylindrical structure;

[0129] The second body portion 212 is a hollow frustum-shaped structure and is fixedly connected to the bottom of the first body portion 211 .

[0130] The first body portion 211 and the second body portion 212 can be independent separate structures or an integral one-piece structure.

[0131] The trumpet mouth design with a truncated cone structure is designed to slow down the flow rate and expand the cross-sectional area of ​​the gas, promoting uniform diffusion of the gas to a larger cross-sectional area.

[0132] A geometric solid formed by rotating the sides of a right trapezoid, with the line perpendicular to the base as the axis of rotation, is called a frustum. The axis of rotation is called the frustum's axis, the circular surfaces formed by rotating the upper and lower bases of the right trapezoid are called the upper and lower bases of the frustum, and the curved surfaces formed by rotating the other side are called the side surfaces of the frustum. In some embodiments, the upper base is also called the top surface.

[0133] The connection between the second body portion 212 and the first body portion 211 is the top surface (upper bottom surface) of a truncated cone, and the radius of the lower bottom surface of the second body portion 212 is larger than the top surface;

[0134] In this embodiment, the portion of the second fluid channel 20 that passes through the first body portion 211 has the same shape as the first body portion 211, and the portion of the second fluid channel 20 that passes through the second body portion 212 has the same shape as the second body portion 212. This means that the cross-sectional area of ​​the second fluid channel 20 gradually increases from the upper bottom surface to the lower bottom surface, and the mixed gas continues to flow downward along the trumpet-shaped channel with a gradually increasing diameter, and eventually enters the downstream component and enters the reaction chamber.

[0135] Furthermore, the air inlet cavity 2 further includes a lower annular protrusion 23:

[0136] The lower annular protrusion 23 is fixedly connected to the downstream side of the air inlet cavity body 21 .

[0137] Preferably, the lower end surface of the air inlet cavity body portion 21 is coplanar with the lower end surface of the lower annular protruding portion 23 .

[0138] Furthermore, the upper annular protrusion 22 is fixedly connected to the outer periphery of the first body portion 211 , and the lower annular protrusion 23 is fixedly connected to the downstream side of the second body portion 212 .

[0139] Furthermore, if Figure 3 As shown, the upper annular protrusion 22 has two oppositely arranged flat cut surfaces 221, which are used to cooperate with the abutment plane 113 mentioned above for abutment and positioning.

[0140] Furthermore, the docking portion 2111 is a portion of the first body portion 211 that protrudes from the upper surface of the upper annular protruding portion 22 .

[0141] In the mixed gas device proposed in the present invention, the layout and arrangement of the air inlet channel and the diversion groove of the upper cover plate 1 show a high degree of flexibility and diversity.

[0142] More specifically, in the upper cover plate 1 proposed by the present invention, a plurality of air inlet channels 11 are evenly distributed along the circumferential direction of the upper cover plate 1 .

[0143] There is no limit to the number of intake channels, and it can be either an odd or an even number.

[0144] The advantage of setting up multiple air intake channels in the circumferential direction compared to a single air intake channel is that it can cause the gas to enter the air intake cavity 2 from multiple angles along the circumferential direction at the same time, thereby significantly improving the uniformity of gas distribution in the circumferential direction and avoiding the generation of dead zones.

[0145] More specifically, the interior of the upper cover plate 1 is provided with a plurality of step-by-step flow channels along a plurality of circumferences from the outside to the inside;

[0146] Different levels of shunt troughs correspond to different circumferential radii;

[0147] The diversion troughs of the same level are arranged on the same circumference.

[0148] The layout of the flow channels of different levels can be stacked in sequence and / or staggered, so as to more effectively achieve uniform distribution of the gas.

[0149] More specifically, the interior of the upper cover plate 1 may further be provided with a plurality of internal communication channels 14:

[0150] The internal communication channel of each level is arranged between the corresponding two adjacent levels of diversion grooves, and is used to communicate the gas between the two adjacent levels of diversion grooves.

[0151] There are multiple internal communicating channels at the same level, and the internal communicating channels corresponding to the same intake channel in the same level are symmetrically distributed relative to the corresponding intake channel, that is, symmetrically distributed relative to the central axis of the intake channel.

[0152] Furthermore, the docking portion 2111 is provided with a plurality of external communication channels 2112:

[0153] The external communication channel 2112 connects the diverter groove corresponding to the air intake path with the air intake cavity 2 .

[0154] Furthermore, the outer connecting channel 2112 connects the innermost diversion groove with the second fluid channel of the air inlet cavity.

[0155] Correspondingly, the external communication channel 2112 of the docking portion 2111 of the air inlet cavity 2 can also be distributed in a variety of ways.

[0156] Various layout configuration options of the air inlet channel, the diverter groove, the inner connecting channel, and the outer connecting channel can be combined into a variety of different configuration combinations to achieve corresponding uniform gas distribution effects.

[0157] In order to more clearly illustrate the above features of the present invention, specific embodiments will be described in detail below.

[0158] Figure 4 for Figure 2 The cross-sectional structure diagram of the mixed air intake device along the AA direction of an embodiment is shown as follows: Figure 4 In the embodiment shown, two air inlet channels 11 are radially opened on the side wall of the upper cover plate 1 . The two air inlet channels 11 are symmetrical along the circumference of the upper cover plate 1 and are symmetrically arranged along the center of the circle.

[0159] The second gas enters the upper cover plate 1 through the air inlet channel 11 .

[0160] Six diversion slots are provided inside the upper cover plate 1, including two first-stage diversion slots 12 and four second-stage diversion slots 13;

[0161] Along the radial direction of the upper cover plate 1 , the second-stage diverter groove 13 is located inside the first-stage diverter groove 12 .

[0162] The two first-stage diversion slots 12 are arranged on the same circumference and are centrally symmetrically distributed along the center of the upper cover plate body 111;

[0163] The four second-stage diversion slots 13 are arranged on the same circumference and are centrally symmetrically distributed along the center of the upper cover plate body 111 .

[0164] Each air intake channel 11 is respectively connected to one first-stage diverter groove 12 and two second-stage diverter grooves 13 to form an air intake path. The upper surface of the upper annular protrusion 22 and the outer peripheral wall of the docking portion 2111 respectively cooperate with the first-stage diverter groove 12 and the second-stage diverter groove 13 to form a closed air path.

[0165] Furthermore, a plurality of first-stage internal communication channels 14 are provided between the first-stage diverter groove 12 and the second-stage diverter groove 13 to communicate the gas between the first-stage diverter groove 12 and the second-stage diverter groove 13 .

[0166] The second gas enters the first-stage diverter groove 12 through the gas inlet channel 11 , and enters the second-stage diverter groove 13 through the first-stage internal communication channel 14 .

[0167] The plurality of first-stage internal communication channels 14 are symmetrically distributed relative to the corresponding intake channels 11 .

[0168] In this embodiment, two air intake channels 11 are distributed on both sides of the upper cover plate 1, and the number of first-stage internal connecting channels 14 corresponding to the air intake channels 11 on each side is 10; the first-stage internal connecting channels 14 are divided into two groups of the same number, then each group consists of 5 first-stage internal connecting channels 14, and the two groups of first-stage internal connecting channels 14 are symmetrically distributed relative to the corresponding air intake channels 11.

[0169] In this embodiment, a plurality of external communication channels 2112 are provided on the docking portion 2111 , connecting the fluid to the innermost second-stage diverter groove 13 of the air intake channel 11 and the second fluid channel 20 of the air intake cavity 2 .

[0170] In this embodiment, the number of the external communication channels 2112 corresponding to the air intake channel 11 on each side is 6, and the external communication channels 2112 on each side are divided into two groups of the same number, with 3 channels in each group.

[0171] The two groups of external communication channels 2112 are symmetrically distributed relative to the corresponding air intake channels 11 . Meanwhile, the air intake channels 11 are arranged in the middle of the first-stage diverter groove 12 .

[0172] The first-stage internal communication channels 14 corresponding to the two air inlet channels 11 are also centrally symmetrically arranged along the center of the circle.

[0173] The external communication channels 2112 corresponding to the two air inlet channels 11 are also centrally symmetrically arranged along the center of the circle.

[0174] Optionally, the number of external communication channels 2112 can be 6, 8, 10, etc. to meet different needs.

[0175] Preferably, the plurality of external communication channels 2112 are evenly arranged along the circumferential direction, thereby helping to improve the mixing effect of the gas.

[0176] In one embodiment, in the same branch gas path, the total flow area of ​​the plurality of external communication channels 2112 is smaller than the total flow area of ​​the internal communication channel 14 of the last upstream stage, thereby further promoting the improvement of the gas mixing effect.

[0177] The bypass gas path refers to all the gas flow channels corresponding to the intake channel after a bypass. Figure 4 In the dotted frame shown, the air inlet channel 11 is diverted by the first-stage diverter groove 12 and then enters all the gas flow channels in the dotted frame, which is the diverter gas path.

[0178] like Figure 4 In the dashed box shown, the total flow area of ​​the three external communication channels 2112 is smaller than the total flow area of ​​the five first-stage internal communication channels 14 located upstream.

[0179] When there are multiple levels of internal connecting channels, in at least one adjacent two-level internal connecting channels in the same diversion gas path, the total flow area of ​​the multiple internal connecting channels located downstream is smaller than the total flow area of ​​the multiple internal connecting channels located upstream, thereby further promoting the improvement of the mixing effect.

[0180] In order to make the flow path of the second gas through the air inlet channel, the internal connecting channel, the diverter groove, and the external connecting channel consistent, and to make the gas diversion more uniform, in one embodiment, the number of the internal connecting channels of each level corresponds to (that is, is equal to) the number of the diverter grooves of the downstream level, and the internal connecting channel of each level is arranged in the middle position of the diverter groove of the downstream level.

[0181] Furthermore, the number of external connecting channels connected to the same diverter slot is 2, and they are symmetrically distributed relative to the middle position of the corresponding diverter slot.

[0182] To illustrate the above technical solution, for example, in another embodiment of the present invention, two air intake channels 11 are symmetrically distributed on the circumference of the upper cover plate 1. The number of the second-stage diverter grooves 13 of the air intake channel 11 on each side is two, and the number of the corresponding first-stage internal communication channels 14 is two. The two first-stage internal communication channels 14 are symmetrical with respect to the air intake channel 11, and each first-stage internal communication channel 14 is arranged at the middle position of the corresponding second-stage diverter groove 13.

[0183] Specifically, the two first-stage internal communication channels 14 are connected to the circumferential ends of the first-stage diverter 12. The first-stage internal communication channels 14 extend in the radial direction of the upper cover plate 1 (it should be understood that the radial direction of the upper cover plate 1 in this application refers to the radial direction of the upper cover plate body 111).

[0184] Furthermore, the number of the external connecting channels 2112 connected to the same second-stage diverter groove 13 is two, and they are symmetrically distributed relative to the middle position of the corresponding second-stage diverter groove 13 .

[0185] Thus, each first-stage internal connecting channel 14 corresponds to two external connecting channels 2112, and the second-stage diversion groove 13 connected to the first-stage internal connecting channel 14 is symmetrical about the first-stage internal connecting channel 14 (that is, symmetrical about the axis of the first-stage internal connecting channel 14), and the two external connecting channels 2112 are also symmetrical relative to the first-stage internal connecting channel 14, so that the fluid flow path is consistent, and the gas diversion can be made more uniform.

[0186] In particular, the two external communication channels 2112 are respectively connected to the two ends of the second-stage diverter groove 13 along the circumferential direction. The external communication channels 2112 extend along the radial direction of the air inlet cavity 2.

[0187] Furthermore, the plurality of external communication channels 2112 are evenly distributed along the circumferential direction, so that the fluid reaching the second flow channel 20 is more evenly distributed in the second fluid channel 20 .

[0188] Figure 5 for Figure 2 The cross-sectional structure diagram of the mixed air intake device of another embodiment of the AA position is shown as follows: Figure 5 In the embodiment shown, the number of the air inlet channels 11 radially opened on the side wall of the upper cover plate 1 is four and is evenly distributed along the circumferential direction.

[0189] Each air intake channel 11 is connected to a first-stage diverter groove 12 respectively. The upper surface of the upper annular protrusion 22, the outer peripheral wall of the docking portion 2111 and the first-stage diverter groove 12 cooperate to form an air intake path.

[0190] In this embodiment, a plurality of external communication channels 2112 are provided on the docking portion 2111 , connecting the first-stage diverter groove 12 of the air intake channel 11 with the second fluid channel 20 of the air intake cavity 2 .

[0191] Preferably, the plurality of external communication channels 2112 are evenly arranged along the circumferential direction, thereby helping to improve the circumferential uniformity of the gas in the second fluid channel 20 .

[0192] In this embodiment, only the first-stage diversion groove 12 is provided in the upper cover plate 1, and the second-stage diversion groove 13 is no longer provided, thereby achieving a simplified structure and improving the simplicity of the overall design.

[0193] In some embodiments, the number of external connecting channels 2112 connected to the same first-stage diversion channel 12 is 2 (different from Figure 5 3 of them), are symmetrically distributed relative to the middle position of the corresponding first-stage diverter groove 12, so the path of the second gas flowing through the air inlet channel 11, the first-stage diverter groove 12 and the external connecting channel 2112 is consistent, thereby making the gas diversion more uniform.

[0194] Figure 6 A cross-sectional view of a hybrid air intake device according to an embodiment of the present invention is disclosed. Figure 6 As shown, the gas inlet cavity 2 outputs a mixed gas formed by mixing the first gas and the second gas introduced.

[0195] In order to further mix the first gas and the second gas evenly in the gas inlet cavity 2 , in the mixed gas device proposed in the present invention, the gas inlet cavity 2 may further be provided with a first flow equalizer plate 214 and / or a second flow equalizer plate 215 .

[0196] Figure 7a A cross-sectional view of a hybrid air intake device according to another embodiment of the present invention is disclosed. Figure 7b A top view of the first current equalizing plate according to another embodiment of the present invention is disclosed, as shown in FIG. Figure 7a In the embodiment shown, the air inlet cavity body 21 further includes a first flow equalizer 214:

[0197] The first flow equalizer 214 is disposed between the first body portion 211 and the second body portion 212 .

[0198] like Figure 7b As shown, the first flow equalizer plate 214 is provided with a plurality of flow equalizer holes.

[0199] When the first gas encounters the first flow plate 214, its velocity decreases and becomes evenly distributed, creating more favorable mixing conditions for the second gas entering from the side. Against the backdrop of the slow and even first gas, the second gas can more easily penetrate, diffuse, and interact with the first gas, achieving more complete and uniform mixing.

[0200] Figure 8a A cross-sectional view of a hybrid air intake device according to another embodiment of the present invention is disclosed. Figure 8b A top view of the second current equalizing plate according to another embodiment of the present invention is disclosed, as shown in FIG. Figure 8a In the embodiment shown, the air inlet cavity body portion 21 further includes a third body portion 213 and a second flow equalizer plate 215:

[0201] The third body portion 213 is a cylindrical structure and is fixedly connected to the bottom of the second body portion 212;

[0202] Likewise, the third body portion 213 and the second body portion 212 can be independent structures fixed together, or can be an integrally formed structure.

[0203] In this embodiment, the lower annular protrusion 23 is fixedly connected to the outer periphery of the third body portion 213 .

[0204] The second flow equalizer 215 is disposed inside the third body portion 213 .

[0205] like Figure 8b As shown, the second flow equalizer plate 215 is provided with a plurality of flow equalizer holes.

[0206] Furthermore, in this embodiment, the uniform flow holes of the first uniform flow plate 214 or the second uniform flow plate 215 are inclined at a certain angle to the central axis of the main body of the air inlet chamber. Preferably, when viewed from top to bottom, the angle is inclined outward, which helps the gas to diffuse to a larger cross-sectional area, thereby achieving more uniform gas distribution.

[0207] In other embodiments, the uniform flow hole may also be arranged vertically downward.

[0208] Based on the above-mentioned mixed air intake device, the present invention provides a semiconductor manufacturing equipment, which at least includes a reaction chamber and the above-mentioned mixed air intake device:

[0209] The lower end of the mixing and air intake device is fixed to the reaction chamber;

[0210] In one embodiment, the reaction chamber is a pre-clean chamber.

[0211] Furthermore, the semiconductor manufacturing equipment further includes a remote plasma source, and the upper end of the mixing gas intake device is fixed to the remote plasma source.

[0212] Since the specific structure of the mixed air intake device has been previously described in detail, the contents related to the mixed air intake device in the semiconductor manufacturing equipment proposed by the present invention will not be repeated here.

[0213] Verified by flow field simulation technology, the mixed air intake device and semiconductor manufacturing equipment proposed by the present invention have a mixing uniformity improved by about 15% compared with related equipment in the prior art.

[0214] In addition, specialized measuring equipment was used to test the surface quality of the processed wafers. The results showed that after using the mixed air intake device disclosed in this patent, the oxide film and impurities on the wafer surface can be removed more evenly, thus providing a strong prerequisite guarantee for the subsequent EPI process.

[0215] The mixed air intake device proposed in the present invention can be used in pre-cleaning equipment (including the pre-cleaning chamber mentioned above), which can ensure that the two process gases are mixed evenly and thoroughly in the device, thereby ensuring the uniformity and efficiency of the pre-cleaning effect on the wafer surface.

[0216] As used in this application and the claims, unless the context clearly indicates otherwise, the words "a," "an," "an," and / or "the" are not intended to refer to the singular but may include the plural. Generally speaking, the terms "comprises" and "include" only indicate the inclusion of the steps and elements specifically identified, and these steps and elements do not constitute an exclusive list. A method or apparatus may also include other steps or elements.

[0217] In the description of the present invention, it should be noted that the terms "upper", "lower", "front", "back", "left", "right", "vertical", "inside", "outside", etc., indicating directions or positional relationships, are based on the directions or positional relationships shown in the accompanying drawings. They are only for the convenience of describing the present invention and simplifying the description, and do not indicate or imply that the device or element referred to must have a specific direction, be constructed and operated in a specific direction. Therefore, they cannot be understood as limitations on the present invention.

[0218] In the present invention, unless otherwise expressly specified or limited, a first feature being "above" or "below" a second feature may include the first and second features being in direct contact, or may include the first and second features being in contact not directly but through another feature between them. Moreover, a first feature being "above," "above," and "above" a second feature may include the first feature being directly above or obliquely above the second feature, or may simply mean that the first feature is higher in level than the second feature. A first feature being "below," "below," and "below" a second feature may include the first feature being directly below or obliquely below the second feature, or may simply mean that the first feature is lower in level than the second feature.

[0219] In the description of this utility model, it should be noted that, unless otherwise specified or limited, the terms "mounted," "connected," and "connected" should be understood in a broad sense. For example, they can refer to fixed connections, detachable connections, or integral connections; they can refer to direct connections, indirect connections through an intermediate medium, or the internal connection of two components. Those skilled in the art will understand the specific meanings of these terms in this utility model based on the specific circumstances.

[0220] Those skilled in the art will readily envision other embodiments of the present invention after considering the specification and practicing the invention disclosed herein. This application is intended to cover any variations, uses, or adaptations of the present invention that follow the general principles of the invention and include common knowledge or customary techniques in the art not disclosed herein. The description and examples are to be considered as exemplary only, with the true scope and spirit of the invention being indicated by the following claims.

[0221] The above embodiments are provided for persons familiar with the art to implement or use the present invention. Personnel familiar with the art may make various modifications or changes to the above embodiments without departing from the utility model concept of the present invention. Therefore, the scope of protection of the present invention is not limited to the above embodiments, but should be the maximum scope of the innovative features mentioned in the claims.

Claims

1. A hybrid air intake device, characterized in that: Including the upper cover and the air intake cavity: The upper cover is fixedly connected to the upper portion of the air inlet cavity; The upper cover plate includes a first fluid channel, which runs through the middle portion of the upper cover plate from top to bottom and is used to introduce the first gas into the air inlet cavity; The air inlet cavity includes a second fluid channel, which runs through the middle of the air inlet cavity from top to bottom and is connected to the first fluid channel; A plurality of air inlet channels are provided on the side wall of the upper cover plate. The plurality of air inlet channels are distributed along the circumference of the upper cover plate. One end of the air inlet channel is located on the side wall, and the other end of the air inlet channel extends toward the center and is located inside the upper cover plate. The air inlet channel is used to introduce the second gas; A plurality of diversion grooves are provided on the inner circumference of the upper cover plate, and the plurality of diversion grooves form an annular arrangement relative to the circumference of the upper cover plate, and are used to divert the second gas introduced into the air inlet channel; Each of the air inlet channels is connected to at least one of the diverter grooves, and the second gas enters the second fluid channel of the air inlet cavity through the air inlet channels and the diverter grooves; The second fluid channel outputs a mixed gas formed by mixing the first gas and the second gas introduced therein.

2. The hybrid air intake device according to claim 1, characterized in that: The plurality of diversion slots include a plurality of levels of diversion slots opened along a plurality of circumferential directions: Different levels of diversion troughs correspond to different circumference radii, and the diversion troughs of the same level are arranged on the same circumference; The interior of the upper cover is also provided with several levels of internal communication channels: The internal communication channel of each level is arranged between the corresponding two adjacent levels of the diverter grooves, and is used to communicate the gas between the two adjacent levels of the diverter grooves.

3. The hybrid air intake device according to claim 2, characterized in that: The internal communicating channels corresponding to the same air inlet channel in the same level are symmetrically distributed relative to the corresponding air inlet channel; The plurality of air inlet channels are evenly distributed along the circumferential direction of the upper cover plate.

4. The hybrid air intake device according to claim 3, characterized in that: The number of the internal communication channels in each stage corresponds to the number of the diversion slots in the downstream stage; The internal communication channel of each stage is arranged in the middle position of the diversion groove of the downstream stage.

5. The hybrid air intake device according to claim 2, characterized in that: The air inlet cavity comprises an air inlet cavity body and an upper annular protruding portion: The upper annular protrusion is fixedly connected to the upstream side of the air inlet cavity body; The air inlet cavity body is provided with a docking portion, and the docking portion protrudes from the upper surface of the upper annular protruding portion; The docking portion is provided with a plurality of external communication channels, and the external communication channels connect the innermost diverter groove with the second fluid channel of the air inlet cavity; Wherein, the upper surface of the docking portion abuts against the upper cover plate; Each of the air inlet channels and the diverter groove in fluid communication with the air inlet channels constitutes an air inlet path; the diverter groove is formed by the upper surface of the upper annular protrusion or by the upper surface of the upper annular protrusion and the outer peripheral wall of the docking portion to form an air path.

6. The hybrid air intake device according to claim 5, characterized in that: The number of external connecting channels connected to the same diversion slot is 2, and they are symmetrically distributed relative to the middle position of the corresponding diversion slot.

7. The hybrid air intake device according to claim 5, characterized in that: In the same branch gas path, the total flow area of ​​the plurality of external communication channels is smaller than the total flow area of ​​the internal communication channel of the last upstream stage; and / or In at least one adjacent internal communication channel of two stages in the same branch gas path, the total flow area of ​​the plurality of internal communication channels at the downstream stage is smaller than the total flow area of ​​the internal communication channels at the upstream stage.

8. The hybrid air intake device according to claim 5, characterized in that: The air inlet cavity body portion includes a first body portion and a second body portion: The first body portion is a cylindrical structure; The upper annular protrusion is fixedly connected to the outer periphery of the first main body; The docking portion is provided on the upper portion of the first body portion; The second body portion is fixedly connected to the bottom of the first body portion; The second body portion is a hollow truncated cone structure, and the top surface of the second body portion is connected to the first body portion.

9. The hybrid air intake device according to claim 8, characterized in that: The air inlet cavity body also includes a plurality of flow equalizers: The flow plate is provided with a plurality of flow holes; The plurality of flow equalizers are respectively arranged inside the main body of the air inlet cavity.

10. The hybrid air intake device according to claim 9, characterized in that: The plurality of flow equalizers include a first flow equalizer: The first flow equalizer is arranged between the first body portion and the second body portion; and / or, The air inlet cavity body also includes a cylindrical third body, the plurality of flow equalizers include a second flow equalizer, the third body is fixedly connected to the bottom of the second body, and the second flow equalizer is arranged inside the third body.

11. The hybrid air intake device according to claim 9, characterized in that: The uniform flow hole forms a certain inclined angle with the central axis of the air inlet cavity body.

12. A semiconductor manufacturing equipment, characterized in that: comprising a hybrid air intake device according to any one of claims 1 to 11; The semiconductor manufacturing equipment includes a reaction chamber, and the lower end of the mixing and inlet device is fixedly connected to the reaction chamber; and / or The semiconductor manufacturing equipment includes a remote plasma source, and the upper end of the mixing gas inlet device is fixedly connected to the remote plasma source.

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