Inlet water pretreatment device

By introducing a pre-precision filter, EDI processor, and purification mechanism into the ultrasonic cleaning equipment, the problem of damage caused by impurities during water intake is solved, achieving a continuous supply of high-purity water and protection of the equipment.

CN224242908UActive Publication Date: 2026-05-15QIAN SHAN KE JI (XIA MEN) YOU XIAN GONG SI
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Patent Information

Application Number
CN202521224256.0
Authority / Receiving Office
CN · China
Patent Type
Utility models(China)
Current Assignee / Owner
Filing Date
2025-06-16
Publication Date
2026-05-15
Estimated Expiration
2035-06-16

AI Technical Summary

Technical Problem

Existing ultrasonic cleaning equipment uses raw water directly or simple filtration when it enters the system, which makes the equipment prone to damage due to particulate impurities. Over time, the water quality oxidizes and cannot meet the requirements for high-purity water.

Method used

Employing a pre-precision filter, EDI processor, and refining mechanism, including a polishing resin tank and conductivity meter, the system ensures ultrapure water quality through multi-stage filtration and deep desalination, while also monitoring system status.

Benefits of technology

It achieves a continuous supply of high-purity water, protects equipment components, extends their service life, and avoids water oxidation problems caused by long-term storage.

✦ Generated by Eureka AI based on patent content.

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Abstract

The utility model relates to the technical field of inlet water treatment of ultrasonic cleaning equipment, in particular to an inlet water pretreatment device which comprises a device frame body, a front precision filter is mounted on one side of the surface of the device frame body, and a refining treatment mechanism is arranged on one side of the device frame body. According to the utility model, equipment water can be treated in real time, water oxidation and the like caused by long-time storage can be avoided due to small-amount storage, whether the water produced by the system reaches the ultrapure water standard can be directly judged through the conductivity detector, and meanwhile, the conductivity detector can monitor the EDI water production conductivity and assess whether the EDI working state is normal or not; the desalinization rate can be calculated by comparing the inflow water conductivity and the produced water conductivity of the EDI processor; the pre-filter can protect the booster pump, the EDI processor and the resin tank from being damaged by particulate matters, the booster pump provides necessary operating pressure for the EDI and the resin tank, and the EDI processor protects polishing resin, so that the polishing resin only needs to process trace ions, and the service life is prolonged.
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Description

Technical Field

[0001] This utility model relates to the field of water inlet treatment technology for ultrasonic cleaning equipment, specifically to a water inlet pretreatment device. Background Technology

[0002] Ultrasonic cleaning equipment can achieve a thorough cleaning effect, and is particularly ideal for cleaning deep holes, blind holes, and grooves, without affecting the material or precision of the object. Ultrasonic cleaning equipment requires water filling before use.

[0003] Currently, existing ultrasonic cleaning equipment uses raw water directly or only employs simple filtration when it receives water. This results in the presence of particulate impurities in the incoming water, which can easily damage the ultrasonic cleaning equipment over time. Therefore, a water pretreatment device is needed. Utility Model Content

[0004] The purpose of this invention is to provide an influent pretreatment device to solve the problems mentioned in the background art.

[0005] To achieve the above objectives, this utility model provides the following technical solution: an influent pretreatment device, comprising a device frame, a pre-precision filter installed on one side of the device frame, an EDI processor fixed at the end of the device frame away from the pre-precision filter, a booster pump installed on the surface of the device frame and on the side of the pre-precision filter, the booster pump being used to transport the water filtered by the pre-precision filter to the EDI processor; and a refining mechanism provided on one side of the device frame, the refining mechanism being used for water pretreatment.

[0006] Preferably, the inlet end of the pre-filter is equipped with an inlet pipe for the intake of raw water; the input end of the booster pump is equipped with a water delivery pipe, and the other end of the water delivery pipe is connected to the outlet end of the pre-filter.

[0007] Preferably, the water inlet of the EDI processor is equipped with a water guide pipe, which is connected to the output of the booster pump.

[0008] Preferably, a drain pipe is installed at one of the outlet ends of the EDI processor, which is used for separate water output after processing by the pre-precision filter and the EDI processor.

[0009] Preferably, the refining mechanism includes a polishing resin tank, a conductivity meter, a water inlet pipe, and a water delivery pipe. Two sets of polishing resin tanks are provided, and the two sets of polishing resin tanks are fixed to the surface of the device frame.

[0010] Preferably, the top of the polishing resin tank is connected to a conductivity meter, and the water inlet of the polishing resin tank is connected to another water outlet of the EDI processor through a water inlet pipe; the water outlet of the polishing resin tank is equipped with a water supply pipe, which is used to supply water to the ultrasonic cleaning equipment.

[0011] Compared with the prior art, the beneficial effects of this utility model are: the water pretreatment device is equipped with a pre-precision filter, an EDI processor, and a refining mechanism; in practice, the water enters the pre-precision filter through the inlet pipe to remove particulate impurities, and the filtered water is pumped by a booster pump through the water delivery pipe and the water guide pipe to enter the EDI processor for deep desalination to produce high-purity water. At this time, it can be discharged separately through the drain pipe or enter the refining mechanism for further treatment. This invention can treat the water used in the equipment in real time. Small-scale storage avoids water oxidation caused by long-term storage. The conductivity meter can directly determine whether the system's produced water meets the ultrapure water standard (≥18.2MΩ·cm). At the same time, the conductivity meter can monitor the conductivity of the EDI produced water to assess whether the EDI is working properly. The desalination rate can be calculated by comparing the conductivity of the EDI processor's inlet water and the produced water. Moreover, the pre-filter can protect the booster pump, EDI processor, and resin tank from particulate damage. The booster pump provides the necessary operating pressure for the EDI and resin tank, and the EDI processor protects the polishing resin, allowing it to process only trace amounts of ions and extending its lifespan. Attached Figure Description

[0012] Figure 1 This is a three-dimensional structural schematic diagram of the present invention;

[0013] Figure 2 This is a schematic diagram of the main structure of this utility model;

[0014] Figure 3 This is a side view of the structure of this utility model;

[0015] Figure 4 This is a top view of the structure of this utility model.

[0016] In the diagram: 1. Device frame; 2. Pre-filter; 21. Inlet pipe; 3. Booster pump; 31. Water delivery pipe; 4. EDI processor; 41. Water guide pipe; 42. Drain pipe; 5. Refining mechanism; 51. Polishing resin tank; 52. Conductivity meter; 53. Water inlet pipe; 54. Water delivery pipe. Detailed Implementation

[0017] The technical solutions of the present utility model will be clearly and completely described below with reference to the accompanying drawings of the embodiments of the present utility model. Obviously, the described embodiments are only some embodiments of the present utility model, and not all embodiments.

[0018] The structure of the influent pretreatment device provided by this utility model is as follows: Figure 1 , Figure 3 as well as Figure 4 As shown, the device includes a frame 1. A pre-filter 2 is installed on one side of the frame 1. An inlet pipe 21 is installed at the inlet end of the pre-filter 2 for feeding raw water. An EDI processor 4 is fixed at the end of the frame 1 away from the pre-filter 2. A booster pump 3 is installed on the surface of the frame 1 and on the side of the pre-filter 2. A water delivery pipe 31 is installed at the input end of the booster pump 3, and the other end of the water delivery pipe 31 is connected to the outlet end of the pre-filter 2. The booster pump 3 is used to deliver the water filtered by the pre-filter 2 to the EDI processor 4. A water guide pipe 41 is installed at the inlet end of the EDI processor 4, and the water guide pipe 41 is connected to the output end of the booster pump 3. A drain pipe 42 is installed at one outlet end of the EDI processor 4 for separate water output after treatment by the pre-filter 2 and the EDI processor 4.

[0019] During implementation, the water enters the pre-precision filter 2 through the inlet pipe 21 to remove particulate impurities. The filtered water is then pumped by the booster pump 3 through the water supply pipe 31 and the guide pipe 41 into the EDI processor 4 for deep desalination to produce high-purity water, which can then be discharged separately through the drain pipe 42.

[0020] Furthermore, such as Figure 2 , Figure 3 as well as Figure 4 As shown, a refining mechanism 5 is provided on one side of the device frame 1. This refining mechanism 5 is used for water pretreatment. The refining mechanism 5 includes a polishing resin tank 51, a conductivity meter 52, a water inlet pipe 53, and a water delivery pipe 54. Two sets of polishing resin tanks 51 are provided, and the two sets of polishing resin tanks 51 are fixed to the surface of the device frame 1. The top of the polishing resin tank 51 is connected to the conductivity meter 52. The water inlet of the polishing resin tank 51 is connected to the other water outlet of the EDI processor 4 through the water inlet pipe 53. The water outlet of the polishing resin tank 51 is equipped with a water delivery pipe 54, which is used to supply water to the ultrasonic cleaning equipment. Valves for water control are installed on the pipes of the water inlet pipe 41, the drain pipe 42, the water inlet pipe 53, and the water delivery pipe 54.

[0021] During implementation, water from the EDI processor 4 enters the polishing resin tank 51 through the water inlet pipe 53 to remove most of the residual ions and undergo final purification to produce ultrapure water. During this process, the resistivity of the produced water is continuously monitored by the conductivity detector 52 to ensure that it reaches the standard of 18.2 MΩ·cm, and the status of the polishing resin is monitored at the same time. An alarm will be triggered if the water quality is not up to standard.

[0022] Working principle: When in use, the raw water first enters the pre-precision filter 2 through the inlet pipe 21 to remove particulate impurities. The filtered water is then pumped by the booster pump 3 through the water supply pipe 31 and the guide pipe 41 into the EDI processor 4 for deep desalination to produce high-purity water. At this time, it can be discharged separately through the drain pipe 42 or further processed in the refining treatment unit 5.

[0023] This invention is used in applications requiring high-quality cleaning water. It is used in conjunction with ultrasonic cleaning equipment for treating the incoming water, which can significantly improve water quality and prevent oxidation of deionized water caused by long-distance pipeline transportation.

[0024] It will be apparent to those skilled in the art that this invention is not limited to the details of the exemplary embodiments described above, and that it can be implemented in other specific forms without departing from the spirit or essential characteristics of this invention.

Claims

1. A water pretreatment device, comprising a device frame (1), characterized in that: A pre-precision filter (2) is installed on one side of the surface of the device frame (1). An EDI processor (4) is fixed at the end of the device frame (1) away from the pre-precision filter (2). A booster pump (3) is installed on the surface of the device frame (1) and on the side of the pre-precision filter (2). The booster pump (3) is used to transport the water filtered by the pre-precision filter (2) to the EDI processor (4). A purification treatment mechanism (5) is provided on one side of the device frame (1). The purification treatment mechanism (5) is used for water pretreatment.

2. The influent pretreatment device according to claim 1, characterized in that: The inlet end of the pre-precision filter (2) is equipped with an inlet pipe (21), which is used for the intake of raw water; the input end of the booster pump (3) is equipped with a water delivery pipe (31), and the other end of the water delivery pipe (31) is connected to the outlet end of the pre-precision filter (2).

3. The influent pretreatment device according to claim 1, characterized in that: The EDI processor (4) has a water inlet pipe (41) installed at its water inlet end, which is connected to the output end of the booster pump (3).

4. The influent pretreatment device according to claim 3, characterized in that: The EDI processor (4) has a drain pipe (42) installed at one of its outlet ends. The drain pipe (42) is used for separate water output after processing by the pre-precision filter (2) and the EDI processor (4).

5. The influent pretreatment device according to claim 1, characterized in that: The refining mechanism (5) includes a polishing resin tank (51), a conductivity meter (52), a water inlet pipe (53), and a water delivery pipe (54). Two sets of polishing resin tanks (51) are provided, and the two sets of polishing resin tanks (51) are fixed to the surface of the device frame (1).

6. The influent pretreatment device according to claim 5, characterized in that: The top of the polishing resin tank (51) is connected to a conductivity meter (52), and the water inlet of the polishing resin tank (51) is connected to another water outlet of the EDI processor (4) through a water inlet pipe (53); a water supply pipe (54) is installed at the water outlet of the polishing resin tank (51), which is used to supply water to the ultrasonic cleaning equipment.