Monitoring system for the internal environment of a lithography machine

Abstract

The utility model provides a kind of monitoring system of photolithography machine internal environment, comprising: photolithography machine;Air circulation air outlet located in the photolithography machine inside;Particle detection device located at the air circulation air outlet, for real-time monitoring the particle contaminant inside the photolithography machine and generating detection data;Data sending module is electrically connected with the particle detection device, for accepting the detection data and real-time transmission to external monitoring equipment;Real-time monitoring and data real-time transmission to photolithography machine internal environment particle contaminant are realized.This enables operator to promptly understand photolithography machine internal air quality condition, provides strong guarantee for the stable performance of photolithography process, improves the automation level and operating efficiency of entire photolithography machine.

Description

Technical Field

[0001] This utility model relates to the field of semiconductor process equipment technology, and specifically to a monitoring system for the internal environment of a lithography machine. Background Technology

[0002] In today's semiconductor manufacturing industry, lithography machines are key equipment in the wafer production process, and their performance and stability directly affect wafer quality and production efficiency. During operation, the wafers and photomasks inside the lithography machine are in direct contact with the air within the machine. However, the air inside the machine is not completely isolated from the external environment; external air is filtered before being introduced into the machine to maintain a relatively clean internal environment.

[0003] However, even with filters, it's difficult to achieve absolutely dust-free ambient air. Over long-term use, filters may age or become clogged, leading to a decrease in filtration efficiency and allowing some microparticles to enter the equipment. Once these microparticles adhere to the wafer and reticle surfaces, they cause contamination, affecting the precision and quality of photolithography. For example, this can lead to distortion of the photolithographic pattern, discontinuous lines, and a large number of defective wafers, resulting in significant economic losses for the company.

[0004] Current lithography machine technology has certain limitations in ensuring the internal environment. On the one hand, it relies solely on filters to maintain internal cleanliness as much as possible, but lacks real-time monitoring devices for the machine's internal environment. When product problems are discovered during inspection, it often requires machine shutdown for troubleshooting and handling, which undoubtedly reduces the effective operating time of the lithography machine. The shortened production time directly leads to reduced product output and a lower yield.

[0005] Therefore, there is an urgent need for a monitoring system for the internal environment of a lithography machine that can effectively solve the problem of decreased product yield caused by contamination of the internal environment of the lithography machine. Utility Model Content

[0006] The problem solved by this utility model is to provide a monitoring system for the internal environment of a lithography machine, which can monitor the internal air environment of the lithography machine in real time, avoid the reduction of product yield caused by the internal environment of the lithography machine, and greatly improve the effective operating time of the lithography machine.

[0007] This utility model provides a monitoring system for the internal environment of a lithography machine, comprising: a lithography machine; an air circulation outlet located inside the lithography machine; a particle detection device located at the air circulation outlet for real-time monitoring of particulate contaminants inside the lithography machine and generating detection data; and a data transmission module electrically connected to the particle detection device for receiving the detection data and transmitting it to an external monitoring device in real time.

[0008] Optionally, the particle detection device includes a probe located at the air circulation outlet, the end of which has a flow guide shroud, which forms the main airflow channel.

[0009] Optionally, the particle detection device further includes a heating element located within the probe head, the heating element being used to maintain the probe head at a temperature greater than the condensation temperature of the reactant gas.

[0010] Optionally, it also includes: a spiral scraper sleeved on the end of the probe head, the spiral scraper being located between the probe head and the flow guide, the spiral scraper being rotatably connected to the probe head, and the edge of the spiral scraper forming an auxiliary airflow channel with the outer wall of the flow guide.

[0011] Optionally, it also includes a support frame disposed on the inner wall of the lithography machine at the air circulation outlet, the probe being connected to the support frame, and the support frame adjusting the angle of the probe towards the airflow according to the airflow speed at the air circulation outlet.

[0012] Optionally, the support frame has an airflow sensor and a drive processor. The airflow sensor is used to acquire the airflow speed data and transmit the airflow speed data to the drive processor. The drive processor receives the airflow speed data and drives the support frame to rotate.

[0013] Optionally, the probe includes a laser scattering detection unit and a photoelectric conversion unit. The laser scattering detection unit is used to emit a laser beam toward particulate matter in the air, and the photoelectric conversion unit is used to detect the laser scattered by the particulate matter and convert it into an electrical signal.

[0014] Optionally, the particle detection device further includes: a signal processing circuit connected to the probe head for processing the electrical signal; and a data processing unit electrically connected to the signal processing circuit for receiving the processed electrical signal and converting the electrical signal into particulate matter concentration value and particle size distribution data according to a preset algorithm and calibration parameters, thereby generating the detection data.

[0015] Compared with the prior art, the technical solution of this utility model has the following advantages:

[0016] The technical solution of this utility model for a monitoring system of the internal environment of a lithography machine includes: a lithography machine; an air circulation outlet located inside the lithography machine; a particle detection device located at the air circulation outlet, used to monitor particulate contaminants inside the lithography machine in real time and generate detection data; and a data transmission module electrically connected to the particle detection device, used to receive the detection data and transmit it to external monitoring equipment in real time. This achieves real-time monitoring and transmission of particulate contaminants in the internal environment of the lithography machine. This allows operators to promptly understand the air quality inside the lithography machine, providing strong support for the stable operation of the lithography process and improving the automation level and operating efficiency of the entire lithography machine.

[0017] Furthermore, the particle detection device includes a probe located at the air circulation outlet, and the end of the probe has a guide shroud, which forms the main airflow channel; this helps guide the airflow into the probe, enabling the probe to collect particulate matter samples in the air more accurately, thereby improving the accuracy and representativeness of particle detection.

[0018] Furthermore, it also includes: a spiral scraper sleeved at the end of the probe head, the spiral scraper being located between the probe head and the flow guide, the spiral scraper being rotatably connected to the probe head, and the edge of the spiral scraper forming an auxiliary airflow channel with the outer wall of the flow guide; when the spiral scraper rotates, the auxiliary airflow channel between its edge and the outer wall of the flow guide can generate an airflow disturbance, making it difficult for particulate matter to accumulate on the surface of the probe head, thereby maintaining the cleanliness of the probe head and ensuring the accuracy and stability of the detection; at the same time, the rotation of the spiral scraper is equivalent to performing a mechanical cleaning on the surface of the probe head, that is, the spiral scraper scrapes off particulate matter on the surface of the probe head, reducing the frequency and difficulty of manual cleaning, improving the convenience of system maintenance, and also reducing the risk of damage to the probe head that may be caused by improper manual cleaning. Attached Figure Description

[0019] Figure 1 This invention provides a monitoring system for the internal environment of a lithography machine in one embodiment.

[0020] Figure 2 This is a schematic diagram of the working signal propagation of a particle detection device according to an embodiment of the present invention. Detailed Implementation

[0021] Currently, the lack of real-time monitoring devices for the internal environment of lithography machines means that the environment inside the machines cannot be guaranteed, affecting product yield.

[0022] Based on this, the present invention provides a monitoring system for the internal environment of a lithography machine, comprising: a lithography machine; an air circulation outlet located inside the lithography machine; a particle detection device located at the air circulation outlet, used to monitor particulate contaminants inside the lithography machine in real time and generate detection data; and a data transmission module electrically connected to the particle detection device, used to receive the detection data and transmit it to external monitoring equipment in real time; thus realizing real-time monitoring and data transmission of particulate contaminants in the internal environment of the lithography machine. This allows operators to promptly understand the air quality status inside the lithography machine, providing strong support for the stable operation of the lithography process and improving the automation level and operating efficiency of the entire lithography machine.

[0023] To make the above-mentioned objectives, features and advantages of this utility model more apparent and understandable, the specific embodiments of this utility model will be described in detail below with reference to the accompanying drawings.

[0024] Please refer to the reference. Figure 1 and Figure 2 The monitoring system for the internal environment of the lithography machine includes: lithography machine 101, air circulation outlet 101a, particle detection device 102, and data transmission module 104.

[0025] Figure 1 The dashed box roughly indicates the location of the air circulation outlet 101a.

[0026] In this embodiment, the air circulation outlet 101a is located inside the lithography machine 101; the particle detection device 102 is located at the air circulation outlet 101a and is used to monitor particulate contaminants inside the lithography machine 101 in real time and generate detection data; the data transmission module 104 is electrically connected to the particle detection device 102 and is used to receive the detection data and transmit it to an external monitoring device in real time.

[0027] In this embodiment, the particle detection device 102 is located inside the lithography machine 101.

[0028] In this embodiment, by directly deploying the particle detection device 102 at the air circulation outlet 101a, the status of particulate contaminants in the airflow inside the lithography machine 101 can be captured in real time, avoiding the delays and missed detections caused by traditional external sampling. This allows operators to understand the air quality inside the lithography machine 101 in a timely manner, providing a strong guarantee for the stable operation of the lithography process. The data transmission module 104 is linked with external monitoring equipment to realize the instant transmission of the detection data, reducing delays caused by human intervention and having a wide range of applications.

[0029] In this embodiment, the particle detection device 102 includes a probe 103 located at the air circulation outlet 101a. The end of the probe 103 has a flow guide (not shown in the figure), and the flow guide constitutes the main airflow channel.

[0030] In this embodiment, the probe 103 is rotatably mounted on the particle detection device 102, and the angle of the probe 103 can be adjusted according to actual needs.

[0031] In this embodiment, the top of the probe 103 is fixed to the top surface of the air circulation outlet 101a.

[0032] In this embodiment, the opening of the flow guide is positioned facing the particle detection device 102, thereby maximizing particle collection.

[0033] In this embodiment, the particle detection device 102 and the data transmission module 104 are wirelessly connected, and the arrows in the figure indicate that there is a data transmission relationship between them.

[0034] In this embodiment, on the one hand, it helps guide the airflow into the detector head 103, enabling the detector head 103 to collect particulate matter samples in the air more accurately, thereby improving the accuracy and representativeness of particle detection; on the other hand, inserting the detector head 103 into the air circulation outlet 101a reduces the need for additional sampling devices or pipes, making the structure of the entire particle detection device 102 more compact, saving the limited space inside the lithography machine 101, and also helping to reduce the complexity and cost of the system.

[0035] In this embodiment, the particle detection device 102 further includes a heating element (not shown) located within the probe head 103. The heating element maintains the probe head 103 at a temperature higher than the condensation temperature of the reactant gas, effectively preventing condensation of the reactant gas on the surface of the probe head 103. If the reactant gas condenses, it may alter the surface properties of the probe head 103 or lead to false detections, thus affecting the accuracy of the detection results. This design ensures the normal operation of the probe head 103 under different process conditions, improving the reliability of the detection. Furthermore, preventing the reactant gas from condensing on the probe head 103 reduces corrosion or damage caused by condensate accumulation, thereby extending the service life of the probe head 103 and reducing equipment maintenance costs and replacement frequency.

[0036] In this embodiment, it further includes: a spiral scraper (not shown in the figure) sleeved on the end of the probe head 103. The spiral scraper is located between the probe head 103 and the flow guide shroud. The spiral scraper is rotatably connected to the probe head 103. The edge of the spiral scraper and the outer wall of the flow guide shroud form an auxiliary airflow channel.

[0037] In this embodiment, when the spiral scraper rotates, the auxiliary airflow channel between its edge and the outer wall of the guide shroud can generate an airflow disturbance, making it difficult for particles to accumulate on the surface of the probe 103, thereby maintaining the cleanliness of the probe 103 and ensuring the accuracy and stability of the detection; at the same time, the rotation of the spiral scraper is equivalent to scraping off the particles on the surface of the probe 103, reducing the frequency and difficulty of manual cleaning, improving the convenience of system maintenance, and also reducing the risk of damage to the probe 103 that may be caused by improper manual cleaning.

[0038] In this embodiment, a support frame (not shown in the figure) is also provided on the inner wall of the lithography machine 101 at the air circulation outlet 101a. The probe head 103 is connected to the support frame, and the support frame adjusts the angle of the probe head 103 towards the airflow according to the airflow speed at the air circulation outlet 101a.

[0039] In this embodiment, during the operation of the lithography machine 101, the airflow speed may fluctuate due to changes in process conditions. The support frame (not shown in the figure) ensures that the probe 103 can accurately collect particulate matter samples under various airflow conditions, improving the adaptability and flexibility of the detection system. Furthermore, by appropriately adjusting the angle of the probe 103 towards the airflow using the support frame, the flow state of the airflow around the probe 103 can be optimized, reducing the interference of the airflow on particulate matter sampling, improving the particulate matter capture efficiency, and thus further enhancing the accuracy and reliability of the detection data.

[0040] In this embodiment, the support frame (not shown in the figure) is equipped with an airflow sensor (not shown in the figure) and a drive processor (not shown in the figure). The airflow sensor is used to acquire the airflow speed data and transmit the airflow speed data to the drive processor. The drive processor receives the airflow speed data and drives the support frame to rotate. The automatic adjustment mechanism requires no manual intervention, which greatly improves the intelligence level and automation of the system and ensures that the probe 103 is always in the optimal sampling state. Moreover, the real-time feedback and control mechanism ensures the real-time performance and dynamic adaptability of the detection system, which is of great significance for ensuring the stability of the internal environment of the lithography machine 101 and the smooth progress of the lithography process.

[0041] In this embodiment, the detector head 103 includes a laser scattering detection unit 103a and a photoelectric conversion unit 103b. The laser scattering detection unit 103a emits a laser beam towards particulate matter in the air, and the photoelectric conversion unit 103b detects the laser light scattered by the particulate matter and converts it into an electrical signal. The combination of the laser scattering detection unit 103a and the photoelectric conversion unit 103b enables the precise detection of extremely small particulate matter in the air. The scattered light signal generated by the laser beam irradiating the particulate matter is efficiently converted into an electrical signal by the photoelectric conversion unit 103b. This detection principle has high sensitivity to tiny particulate matter, capable of detecting particles down to the nanometer scale, meeting the high-precision environmental monitoring requirements inside the lithography machine 101. Furthermore, the laser scattering detection method can quickly respond to the presence of particulate matter in a short time, and by analyzing the intensity and angle of the scattered light, it can accurately obtain information such as the size and shape of the particulate matter, thereby enabling real-time and accurate monitoring of particulate contaminants in the internal environment of the lithography machine 101, providing strong support for timely detection and handling of pollution problems.

[0042] In this embodiment, please refer to Figure 2 The particle detection device 102 further includes: a signal processing circuit 105 connected to the probe head 103, used to process the electrical signal; and a data processing unit 106 electrically connected to the signal processing circuit 105, used to receive the processed electrical signal and convert it into particle concentration and particle size distribution data according to a preset algorithm and calibration parameters, generating the detection data. The signal processing circuit 105 amplifies and filters the electrical signal generated by the probe head 103, effectively removing noise interference and improving signal quality and stability. The processed electrical signal is clearer and more accurate, which is beneficial for the data processing unit 106 to perform precise analysis and conversion, thereby improving the performance and reliability of the entire detection system. The data processing unit 106 accurately converts the processed electrical signal into particle concentration and particle size distribution data according to a preset algorithm and calibration parameters. This precise data conversion function makes the detection data more scientific and practical, providing detailed and accurate environmental information for the operators of the lithography machine 101, so as to better evaluate and control the environmental conditions of the lithography process.

[0043] Figure 2 The middle arrow indicates the direction of signal propagation.

[0044] While the present invention has been disclosed above, it is not limited thereto. Any person skilled in the art can make various modifications and alterations without departing from the spirit and scope of the present invention; therefore, the scope of protection of the present invention should be determined by the scope defined in the claims.

Claims

1. A monitoring system for the internal environment of a lithography machine, characterized in that, include: Photolithography machine; The air circulation outlet is located inside the lithography machine; A particle detection device located at the air circulation outlet is used to monitor particulate contaminants inside the lithography machine in real time and generate detection data; The data transmission module is electrically connected to the particle detection device and is used to receive the detection data and transmit it to an external monitoring device in real time.

2. The monitoring system for the internal environment of the lithography machine as described in claim 1, characterized in that, The particle detection device includes a probe located at the air circulation outlet, and the end of the probe has a flow guide, which forms the main airflow channel.

3. The monitoring system for the internal environment of the lithography machine as described in claim 2, characterized in that, The particle detection device further includes a heating element located inside the probe head, the heating element being used to maintain the probe head at a temperature greater than the condensation temperature of the reactant gas.

4. The monitoring system for the internal environment of the lithography machine as described in claim 2, characterized in that, Also includes: A spiral scraper is fitted onto the end of the probe head. The spiral scraper is located between the probe head and the flow guide. The spiral scraper is rotatably connected to the probe head. The edge of the spiral scraper forms an auxiliary airflow channel with the outer wall of the flow guide.

5. The monitoring system for the internal environment of the lithography machine as described in claim 2, characterized in that, It also includes a support frame installed on the inner wall of the lithography machine at the air circulation outlet, the probe head is connected to the support frame, and the support frame adjusts the angle of the probe head to the airflow according to the airflow speed at the air circulation outlet.

6. The monitoring system for the internal environment of the lithography machine as described in claim 5, characterized in that, The support frame has an airflow sensor and a drive processor. The airflow sensor is used to acquire the airflow speed data and transmit the airflow speed data to the drive processor. The drive processor receives the airflow speed data and drives the support frame to rotate.

7. The monitoring system for the internal environment of the lithography machine as described in claim 2, characterized in that, The probe includes a laser scattering detection unit and a photoelectric conversion unit. The laser scattering detection unit is used to emit a laser beam toward particulate matter in the air, and the photoelectric conversion unit is used to detect the laser scattered by the particulate matter and convert it into an electrical signal.

8. The monitoring system for the internal environment of the lithography machine as described in claim 7, characterized in that, The particle detection device further includes: A signal processing circuit connected to the probe head is used to process the electrical signal; The data processing unit, which is electrically connected to the signal processing circuit, is used to receive the processed electrical signal and convert the electrical signal into particulate matter concentration value and particle size distribution data according to a preset algorithm and calibration parameters, thereby generating the detection data.

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