Process kit ring for substrate processing chamber
JP1831225SActive Publication Date: 2026-07-09APPLIED MATERIALS INC
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Patent Information
- Application Number
- JP2026005515D
- Authority / Receiving Office
- JP · JP
- Patent Type
- Designs
- Current Assignee / Owner
- Priority Date
- 2025-09-25
- Filing Date
- 2026-03-25
- Publication Date
- 2026-07-09
- Estimated Expiration
- 2051-03-25
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Abstract
This article relates to a process kit ring for a substrate processing chamber used to process semiconductor substrates and the like.
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