System for analyzing a sample by means of a laser beam, comprising a device for capturing the profile of the laser beam, and method for adjusting a system of this type
The laser beam analyzer system addresses the challenge of non-uniform beam alignment by employing a capture device with mirrors and optical means for rapid, non-destructive adjustment, ensuring precise and efficient elemental mapping in metallic solids.
Patent Information
- Application Number
- JP2025536989
- Authority / Receiving Office
- JP · JP
- Patent Type
- Applications
- Current Assignee / Owner
- Priority Date
- 2022-12-20
- Filing Date
- 2023-12-18
- Publication Date
- 2026-01-21
AI Technical Summary
Existing laser beam analysis systems for elemental mapping in metallic solids face challenges with non-uniform beam alignment, leading to laborious and time-consuming calibration processes due to external factors like vibrations and temperature, resulting in suboptimal crater shapes and impaired analysis quality.
A laser beam analyzer system with a capture device that includes a deflecting mirror, photosensitive cell, and optical means for linear expansion, allowing for rapid and non-destructive adjustment of the laser beam profile and uniformity through visual inspection and servo control, using a system of lenses and mirrors to enhance image acquisition and alignment.
Facilitates faster and more accurate alignment of the laser beam, reducing adjustment time and improving analysis quality by enabling instantaneous assessment and correction of beam uniformity and profile defects, thus enhancing the precision of elemental mapping.
Smart Images

Figure 2026502176000001_ABST
Abstract
Description
[Technical Field]
[0001] The present invention relates to the field of high resolution mapping and analysis of elements in solids.
[0002] More particularly, the present invention relates to high resolution analytical instruments, particularly but not exclusively for mapping elements within metallic solids.
[0003] The invention is particularly applicable to the elemental analysis of hydrogen and oxygen by optical emission spectroscopy on laser-produced plasmas in the field of the nuclear industry or in the aeronautical or space industry. [Background technology]
[0004] Elemental analysis of metal samples can be essential in applications such as characterizing equipment exposed to radioactive sources or characterizing the aging capabilities of equipment used in particularly harsh environments, such as aircraft or spacecraft.
[0005] More specifically, it may be necessary to be able to map these elements in the sample being analyzed, where mapping means identifying the elements that make up the sample being analyzed and, optionally, the distribution of the various elements and the chemical bonds between them.
[0006] Such analyses can be particularly useful in studying metal embrittlement by hydrogen, or fuel cladding aging in the presence of oxygen, or fuel cladding embrittlement caused by the formation of hydride compounds, which promote crack propagation.
[0007] There are a variety of known methods for mapping the elements present in a sample.
[0008] One of these methods is elemental analysis by optical emission spectroscopy on laser-produced plasma, a technique performed in natural air, also referred to by the English acronym "LIBS," which stands for "laser induced breakdown spectroscopy."
[0009] The method is particularly applicable to the in situ examination and characterization of samples of analyte moieties.
[0010] A method and apparatus for elemental analysis by optical emission spectroscopy on laser-produced plasma in the presence of argon is described in US Pat. No. 5,649,999.
[0011] In practice, the analysis system is used to emit a laser beam onto the part to be analyzed, the laser beam being emitted by a laser source and then passing through various lenses and diaphragms before impinging on the part to be analyzed.
[0012] As a result of the laser beam striking the part to be analyzed, a plasma is generated, and an optical fiber is positioned in the vicinity of the plasma, which makes it possible to acquire an image that is analyzed by ad hoc software to determine the elemental mapping of the constituent materials of the part to be analyzed, i.e. to establish a precise identification of the material constituents of the analyzed sample.
[0013] When using this system, external parameters such as vibrations and even temperature can affect the beam emission and reduce the quality of the analysis.
[0014] Indeed, temperature and / or vibrations can cause the position of the diaphragm, lens and / or laser source to shift.
[0015] As a result, when impinging on the part to be analyzed, the beam is not uniform, but has a different power at each point on its contour.
[0016] In other words, the laser beam should have equal power at every point on its profile, but in cross section is characterized by a power that varies across its profile.
[0017] Therefore, when the laser beam is not uniform and does not have the desired profile (corresponding to an ideal alignment of the generating module, the lens(es) and the diaphragm(s)), the collision of the laser beam with the part to be analyzed creates a crater (due to the ablation of that part by the laser beam), which, depending on its depth, has a substantially frustoconical shape. On the other hand, in the case of a uniform beam with the desired profile, the crater has an optimal shape that is substantially cylindrical with a circular cross section. A uniform laser beam is commonly called a "top hat" in English.
[0018] This then necessitates a step of calibrating the system, i.e., repositioning the laser source, diaphragm(s) and / or lens(es), so that the beam is accurately aligned and the crater has an optimal shape.
[0019] Such calibration is typically done empirically until the beams are aligned to what is deemed adequate, i.e., close to the optimal theoretical alignment, but this is laborious and time-consuming, and therefore is generally done approximately.
[0020] In practice, to perform this adjustment, a laser beam is emitted and impinges on a test part so that the shape of the impact is analyzed.
[0021] By analyzing the shape of the impingement, it is possible to determine whether the beam is properly aligned and proceed to adjust the position of the diaphragm, lens, and / or laser source.
[0022] However, identifying each misaligned item (diaphragm, lens, or laser source) can be challenging and make tuning the system more complicated.
[0023] In fact, the position of an element that was initially positioned accurately may be inadvertently altered, exacerbating alignment defects and thereby increasing the time required to calibrate the system. [Prior art documents] [Patent documents]
[0024] [Patent Document 1] European Patent No. 0,654,663 Summary of the Invention [Problem to be solved by the invention]
[0025] In particular, it is an object of the present invention to overcome the drawbacks of the prior art.
[0026] More specifically, it is an object of the present invention to provide a laser beam analyzer that allows for simpler and faster adjustment of the laser beam of an analytical system.
[0027] It is another object of the present invention to provide such a laser beam analyzer which ensures an instantaneous reading of the uniformity of the laser beam.
[0028] It is a further object of the present invention to provide such a beam analyzer which ensures an accurate reading of the uniformity of the laser beam. [Means for solving the problem]
[0029] These objectives, and others that will become clear hereafter, are: a module for generating a laser beam; a module for shaping the laser beam incorporating at least one shaping lens and a diaphragm for selecting a portion of the laser beam emitted by the generating module; optical means for focusing the laser beam onto the sample under study; 1. A system for elemental analysis of a sample under consideration, comprising an analytical device having a frame on which are mounted: The analysis system also comprises a device for capturing characteristics of the laser beam emitted by the generation module, intended to be placed between the shaping module and the focusing optical means; The capture device is a mirror for deflecting the laser beam, the mirror being capable of selecting a deflection position to produce a deflected laser beam; a photosensitive cell intended to acquire an image of the deflected laser beam; an optical means arranged between the deflection mirror and the photosensitive cell for linearly expanding the deflected laser beam; means for transmitting the image acquired by the photosensitive cell to a display device; This is achieved by the present invention, which relates to a system comprising:
[0030] The capture device allows for the adjustment of the analysis device in a fast and non-destructive manner compared to prior art techniques.
[0031] In fact, the capture device allows for the acquisition of an image of the laser beam, which allows for instantaneous or near-instantaneous adjustment of the analysis device, since it is not necessary to acquire an exhaustive analysis of the crater in one area.
[0032] In other words, from the two-dimensional or three-dimensional digital image, it is possible to determine profile and / or uniformity defects of the laser beam and iteratively and quickly correct the position of the generation module, lens and / or selection diaphragm to change the profile of the laser beam and / or its uniformity.
[0033] Thus, the adjustment time is significantly reduced and the adjustment can be performed visually, which speeds up the adjustment and improves the quality of the analyzer adjustment and, consequently, the analysis.
[0034] For reference, recall that linear magnification (also called lateral magnification) corresponds to the ratio of dimensions between the image of an object at a given distance and the object itself.
[0035] It should be noted that the deflecting mirrors can be fully reflective or only partially reflective.
[0036] According to one advantageous aspect, the optical means for linearly expanding the deflected laser beam comprises: a first magnifying lens having a first focal length f1; a second magnifying lens having a second focal length f2; Equipped with The first focal length f1 and the second focal length f2 are selected so that the ratio f2 / f1 is 2 or greater.
[0037] Such a ratio makes it possible to enlarge the image of the laser beam, allowing for a fast and optimal analysis of its profile and its uniformity.
[0038] In particular, the properties of the selection diaphragm are then no longer required, so that the capture device can be used in a different analysis device.
[0039] According to another advantageous aspect, the capture device is removably attached to the frame.
[0040] This allows a single capture device to be used in several different analysis devices.
[0041] Furthermore, this ensures that when the analysis device is used, there is no risk of disturbance to the analysis or removal of the capture device.
[0042] According to another advantageous aspect, the capture device comprises a plurality of reflecting mirrors arranged between the deflecting mirror and the photosensitive cell, which expand the deflected beam by redirecting it according to several directions until it reaches the photosensitive cell.
[0043] This directly benefits from the compactness of the analytical system.
[0044] In fact, by moving the deflected beam along a predetermined path, it is possible to bypass some elements of the analysis device in order to incorporate the capture device into the system without unduly increasing the footprint of the system.
[0045] According to another advantageous aspect, at least one of the deflection mirrors, the so-called main reflection mirror, is positioned between the first and second lenses of the linear magnification optical means.
[0046] This positioning ensures that the spacing of the first lens relative to the second lens of the linear magnification optical means is such that the linear magnification of the image of the laser beam is optimum.
[0047] In other words, on the one hand, this requires the deflected beam to meander to limit the area occupied by the capture device, and on the other hand, it requires increasing the linear magnification of the image of the laser beam in order to utilize the image acquired by the photosensitive cell.
[0048] According to another advantageous aspect, the capture device also incorporates an optical filter arranged between the photosensitive cell and the deflection mirror, which filters the waves of the deflected laser beam according to the wavelength range acceptable by the photosensitive cell.
[0049] Thus, only the useful part of the laser beam wave can be captured by the photosensitive cell, which has the direct benefit of facilitating the use of the captured image, since the noise caused by the unused wave is suppressed or at least limited by the presence of the optical filter.
[0050] According to another advantageous aspect, a device for displaying the images acquired by the photosensitive cells, connected to the transmitting means, is integrated into the system.
[0051] The display allows the operator to obtain a two-dimensional or three-dimensional image of the laser beam, which allows the operator to proceed with adjustments simply and quickly.
[0052] According to another advantageous aspect, the selection diaphragm is configured to select a portion of the laser beam emitted by the generation module and to define a shape of the impingement of the laser beam on the sample to be analyzed; the one or more lenses are configured to project an image of the laser beam exiting the selection diaphragm to infinity; the focusing optical means is configured to receive an image of the selection diaphragm projected at infinity by the one or more lenses and to focus the image onto the sample under consideration in order to generate a plasma on the surface of the sample; The system further comprises means for collecting an optical emission of the plasma and determination means configured to analyze the spectrum of the optical emission and define the elemental composition of the sample under consideration onto which the laser beam is projected.
[0053] According to another advantageous aspect, the system also comprises a computer unit coupled to the photosensitive cell, the computer unit being configured to control an actuator dedicated to adjusting the laser beam.
[0054] This servo control allows the laser beam to be automatically adjusted according to the image of the laser beam captured by the photosensitive cell.
[0055] This makes alignment of the laser beam easier and more reliable.
[0056] The present invention also provides an apparatus for capturing a profile of a laser beam of the above-described analysis system, comprising: a mirror for deflecting the laser beam to produce a deflected laser beam; a photosensitive cell intended to acquire an image of the deflected laser beam; an optical means arranged between the deflection mirror and the photosensitive cell for linearly expanding the deflected laser beam; means for transmitting the image acquired by the photosensitive cell to a display device; The present invention relates to an apparatus comprising:
[0057] Such a device can be easily and quickly coupled to an analytical device to determine its proper adjustment in a non-destructive manner.
[0058] As a result, subsequent calibration of the analyzer is simplified and accelerated compared to the prior art, and the operation of the analytical system is saved since the test part does not need to be used to calibrate the analyzer.
[0059] The present invention further provides a method for adjusting an analytical device of the analytical system described above, comprising the steps of: positioning the deflection mirror in its deflection position; generating a laser beam by a generating module; capturing an image of the deflected beam with a photosensitive cell; analyzing the image captured by the photosensitive cell to detect profile defects of the laser beam relative to a theoretical profile; If a profile defect is detected, correcting the orientation of the generating module and / or the shaping lens or selection diaphragm; repeating the capturing, analyzing, and correcting steps until no profile defects relative to the theoretical profile are detected; The present invention relates to a method comprising the steps of:
[0060] Such a method is faster and simpler than prior art analytical device adjustments, which are performed iteratively and continuously, but without cutting the test portion, i.e., destroying at least one portion of the test portion, which is analyzed to determine defects in the analytical device adjustment.
[0061] According to one advantageous aspect, the step of analyzing the image also includes a substep of checking the uniformity of the intensity of the laser beam, and a correction step is carried out when a non-uniformity in the intensity of the laser beam is found.
[0062] This checking substep makes it possible to further improve the quality of the adjustment of the analytical device: in fact, even if the laser beam profile is good, it is still possible that the intensity of the laser beam is non-uniform, which will subsequently impair the operation of the analytical system and, consequently, the quality of the elemental analysis of the sample under consideration.
[0063] According to another advantageous aspect, the method also includes a step of servo-controlling an actuator dedicated to adjusting the laser beam.
[0064] This servo control step allows the laser beam to be automatically adjusted according to the image of the laser beam captured by the photosensitive cell.
[0065] This makes alignment of the laser beam easier and more reliable.
[0066] Other characteristics and advantages of the invention will become more apparent on reading the following description of a preferred embodiment of the invention, given as an illustrative and non-limiting example, and also from the accompanying drawings, which are described below. [Brief explanation of the drawings]
[0067] [Figure 1] 1 is a schematic diagram of a system for elemental analysis by laser beam according to the present invention; [Figure 2] FIG. 1 is a schematic diagram of an apparatus for capturing characteristics of a laser beam. [Figure 3] 1 is a schematic diagram of a first type of image acquired using a characteristic capture device. [Figure 4] 10 is a schematic diagram of a second type of image acquired using a characteristic capture device. DETAILED DESCRIPTION OF THE INVENTION
[0068] FIG. 1 shows a system 1 for elemental analysis of a sample 2 under consideration.
[0069] The system 1 includes an analytical device 3, which will be described below. The analytical device 3 comprises a stand 31 for receiving a sample 2.
[0070] The analysis device 3 also a module 4 for generating a laser beam 5; a module for shaping the laser beam 5 incorporating at least one shaping lens 61 and a diaphragm 7 for selecting a portion of the laser beam 5 emitted by the generating module 4; optical means 8 for focusing the laser beam 5 onto the sample 2 under study; It also has a frame on which it is attached.
[0071] As shown in FIG. 1, the analysis device 3 comprises a plurality of lenses, including a shaping lens 61 and an auxiliary lens 62, and a single selection diaphragm 7, according to the direction of emission of the laser beam 5 from the generation module 4 towards the sample 4.
[0072] The analysis device 3 also comprises a number of mirrors 32 making it possible to deflect the laser beam 5 from the generation module 4 until it reaches the focusing means 8 in order to limit the footprint of the analysis device 3. At least one of the mirrors 32 is an adjusting mirror 320 positioned between the positioning lens 61 and the selection diaphragm 7.
[0073] At the output of the focusing optical means 8, the laser beam 5 becomes a focused beam 51. In this case, the focused beam 51 has a conical shape that tapers in the direction of the sample 2.
[0074] Furthermore, the system 1 comprises collecting means 9 and determining means 10. The role of these means will be explained below.
[0075] The diaphragm 7 is configured to select a portion of the laser beam 5 emitted by the generating module 4 and to define the shape of the impingement of the laser beam 5 on the sample 2 to be analyzed.
[0076] The focusing optical means 8 is configured to receive the image of the selection diaphragm 7 projected by the lens 6 directly upstream at infinity and to focus this image onto the sample 2 under consideration in order to generate a plasma on the surface of this sample 2.
[0077] The collection means 9 is configured to acquire the emission of plasma generated by the impingement of the laser beam 5 on the surface of the sample 2 to be analyzed.
[0078] Finally, the determination means 10 are configured to analyze the spectrum of the emitted light collected by the collection means 9 and to define the elemental composition of the sample 2 under consideration onto which the laser beam 5 is projected.
[0079] As previously mentioned, the system 1 allows for the analysis of a sample 2 to map its elemental composition.
[0080] For this purpose, a laser beam 5 is emitted by the generation module 4 so as to be directed towards the sample 2 and to impinge on its surface.
[0081] When the laser beam 5 strikes the sample 2 under consideration, a plasma P is generated, producing an optical emission that is analyzed to map the elements that make up the sample 2 .
[0082] Collection of the plasma emission is performed by collection means 9 .
[0083] The collecting means 9 comprise first communication means 95 intended to establish a communication path with second communication means 101 of the determining means 10 .
[0084] The first communication means 95 and the second communication means 101 may be of the wireless type.
[0085] Alternatively, the first communication means 95 and the second communication means 101 may be in the form of connectors intended to receive plugs of wired connection cables.
[0086] To enable adjustment of the emission of the laser beam 5 , the system 1 also includes a device 11 for capturing the characteristics of the laser beam 5 .
[0087] Next, the capture device 11 will be described with reference to FIGS.
[0088] Advantageously, the capture device 11 is removably attached to the frame of the analysis device 3 .
[0089] As shown in FIGS. 1 and 2, the capture device 11 includes: a mirror 111 for deflecting the laser beam 5; a photosensitive cell 112 intended to acquire an image of the deflected laser beam 500; an optical means 113 arranged between the deflection mirror 111 and the photosensitive cell 112 for linearly expanding the deflected laser beam 500; means 114 for transmitting the image acquired by the photosensitive cell 112 to the display device 12; Equipped with.
[0090] A device 12 for displaying the image acquired by the photosensitive cell 112 connected to a transmitting means 114 is incorporated in the system 1 .
[0091] For example, the display device 12 can be in the form of a screen that allows viewing of the data emitted by the determination means 10, or it can be a dedicated mobile screen, such as a digital tablet, or it can be in the form of a monitor integrated into the capture device 11.
[0092] The deflection mirror 111 is in this case a sampling blade, and it is possible to choose a deflection position that produces the deflected laser beam 500 .
[0093] For this purpose, the deflection mirror 111 is movably mounted on a member 115 which moves between the deflection position where the deflection mirror produces the deflected laser beam 500 and a gap position where the deflection mirror 111 is moved away from the laser beam 500.
[0094] For example, the moving member 115 can be in the form of a support that slides on rails. Other moving members can be considered, such as, in particular, members that allow the rotation of the deflecting mirror 111 between the deflection position and the gap position.
[0095] As shown in FIG. 2, the optical means 113 for linearly expanding the deflected laser beam 500 is a first magnifying lens 1131 having a first focal length f1; a second magnifying lens 1132 having a second focal length f2; Equipped with.
[0096] The first focal length f1 and the second focal length f2 are different from each other.
[0097] More specifically, the first focal length f1 and the second focal length f2 are selected so that the ratio f2 / f1 is 2 or greater.
[0098] Such a focal ratio makes it possible to facilitate acquisition of an image of the deflected laser beam 500 by the photosensitive cell 112 .
[0099] Continuing to refer to FIG. 2, the capture device 11 includes a plurality of reflecting mirrors 116 disposed between the deflecting mirror 111 and the photosensitive cell 112.
[0100] A number of reflecting mirrors 116 make it possible to expand the deflected beam 500 by redirecting it according to several directions until it reaches the photosensitive cell 112 .
[0101] This can then allow the capture device 11 to be made compact while ensuring the linear magnification of the deflected laser beam to facilitate image capture by the photosensitive cell 112 .
[0102] Preferably, at least one of the reflecting mirrors 116 , the so-called main reflecting mirror 1161 , is positioned between the first magnifying lens 1131 and the second magnifying lens 1132 .
[0103] Moreover, the capture device 11 also incorporates an optical filter 117 arranged between the photosensitive cell 112 and the deflection mirror 111. This optical filter 117 makes it possible to filter the waves of the deflected laser beam 500 according to the wavelength range acceptable by the photosensitive cell 112.
[0104] The capture device 11 makes the adjustment of the laser beam 5, and consequently the analysis device 3, simple and fast compared to prior art methods.
[0105] In practice, the technician positions the deflection mirror 111 in its deflection position, i.e. across the laser beam 5 , to generate a deflected laser beam 5 directed towards the photosensitive cell 112 .
[0106] From the deflection mirror 111 to the photosensitive cell 112 , the deflected laser beam is expanded by the presence of a first magnifying lens 1131 and a second magnifying lens 1132 .
[0107] When the deflected laser beam 500 reaches the photosensitive cell 112, an image of this deflected beam is then displayed on a display device by the transmitting means 114, and can be analyzed by a technician.
[0108] 3 and 4 show the first and second type images acquired by the photosensitive cell 112, respectively.
[0109] Starting from an image I of the laser beam 5, it is possible to obtain different profiles P of the laser beam 5.
[0110] Referring to FIG. 3, a first profile P1 can be defined in a first plane, and a second profile P2 can be defined in a second plane.
[0111] As shown by FIG. 3, image I shows that the laser beam 5 has a plurality of substantially concentric areas of intensity that define the profile of the laser beam 5.
[0112] Referring to FIG. 4, adjusting the position of the generating module 4, the shaping lens 61, the selection diaphragm 7 or the adjusting mirror 320 aims to direct the profile P of the laser beam 5 so that it is closer to the theoretical profile T, which has a substantially cylindrical shape.
[0113] By having a profile P close to the theoretical profile T, the laser beam 5 allows for controlled impingement on the sample, promoting a noise-free plasma and resulting improved analysis.
[0114] Based on the acquired image, the technician can change the positioning of the generating module 4, the positioning lens 61, the selection diaphragm 7, or the adjusting mirror 320 so that the laser beam 5 has the desired characteristics, i.e., characteristics identical to those of a theoretical laser beam or at least characteristics as close as possible to those of a theoretical laser beam. For example, this change can be made manually.
[0115] Furthermore, the photosensitive cell 112 can be coupled to a computer unit 118 that allows servo control of the positioning of the generating module 4, the positioning lens 61, the selection diaphragm 7 or the adjusting mirror 320 so that the laser beam 5 has the desired characteristics. Actuators can then be provided to allow adjustment of the position of the generating module 4, the positioning lens 61, the selection diaphragm 7 or the adjusting mirror 320.
[0116] In other words, the computer unit is arranged to control actuators dedicated to adjusting the laser beam 5 .
[0117] For reference, a theoretical laser beam has a substantially cylindrical shape and uniform intensity across its cross section.
[0118] When the laser beam 5 is poorly centered, it will not have the intensity uniformity or the desired profile, which will cause partial ablation of the sample 2 and result in poor plasma quality, making proper mapping of the sample 2 difficult or even impossible. In other words, a non-circular crater geometry with a larger than desired size and an enlarged HAZ (Heat-Affected Zone) will hinder the measurement.
[0119] The capture device 11 significantly reduces the time required to adjust the system 1 and allows adjustments to be made visually, thereby improving and speeding up the adjustment of the analysis device 3 and the resulting quality of the analysis.
Claims
1. a module (4) for generating a laser beam (5); a module for shaping the laser beam (5), incorporating at least one shaping lens (61) and a diaphragm (7) for selecting a portion of the laser beam (5) emitted by the generating module (4); optical means (8) for focusing said laser beam (5) onto the sample (2) under study; A system (1) for the elemental analysis of a sample (2) under consideration, comprising an analytical device (3) having a frame on which are mounted: The analysis system (1) also comprises a device (11) for capturing the characteristics of the laser beam (5) emitted by the generation module (4), intended to be placed between the shaping module and the focusing optical means (8), The capture device (11) a mirror (111) for deflecting the laser beam (5), the mirror being capable of selecting a deflection position to generate a deflected laser beam (500); a photosensitive cell (112) intended to acquire an image of said deflected laser beam (500); an optical means (113) arranged between the deflection mirror (111) and the photosensitive cell (112) for linearly expanding the deflected laser beam (500); means (114) for transmitting the image acquired by the photosensitive cell (112) to a display device (12); A system comprising:
2. The optical means (113) for linearly expanding the deflected laser beam (500) comprises: a first magnifying lens (1131) having a first focal length f1; a second magnifying lens (1132) having a second focal length f2; Equipped with 2. The system of claim 1, wherein the first focal length f1 and the second focal length f2 are selected such that the ratio f2 / f1 is 2 or greater.
3. A system according to the preceding claim, characterized in that the capture device (11) is detachably attached to the frame.
4. 10. The system according to any one of the preceding claims, characterized in that the capture device (11) comprises a plurality of reflecting mirrors (116) arranged between the deflecting mirror (111) and the photosensitive cell (112) for expanding the deflected beam (500) by redirecting the deflected beam (500) according to several directions until it reaches the photosensitive cell (112).
5. 10. The system according to any one of the preceding claims, characterized in that the capture device (11) also incorporates an optical filter (117) arranged between the photosensitive cell (112) and the deflection mirror (111) for filtering the waves of the deflected laser beam (500) according to the wavelength range acceptable by the photosensitive cell (112).
6. 6. The system (1) according to any one of the preceding claims, characterized in that the device (12) for displaying the image acquired by the photosensitive cell (112), connected to the transmitting means (114), is integrated into the system.
7. the selection diaphragm (7) is configured to select a portion of the laser beam (5) emitted by the generation module (4) and to define the extent of the shape of the impingement of the laser beam (5) on the sample (2) to be analyzed; the lens or lenses are configured to project the image of the laser beam (5) at the output of the selection diaphragm (7) to infinity; the focusing optical means (8) are configured to receive the image of the selection diaphragm (7) projected by the lens at infinity and to focus said image onto the sample (2) under consideration in order to generate a plasma on the surface of this sample (2); 10. The system (1) according to any one of the preceding claims, characterized in that it further comprises means (9) for collecting an optical emission of the plasma and determination means (10) configured to analyze the spectrum of said optical emission and to define the elemental composition of the sample (2) under consideration onto which the laser beam (5) is projected.
8. 10. The system according to any one of the preceding claims, characterized in that the system also comprises a computer unit (118) coupled to the photosensitive cell (112), the computer unit (118) being configured to control an actuator dedicated to adjusting the laser beam (5).
9. A device (11) for capturing a profile of the laser beam (5) of an analysis system (1) according to any one of the preceding claims, comprising: a mirror (111) for deflecting the laser beam (5) to produce a deflected laser beam (500); a photosensitive cell (112) intended to acquire an image of said deflected laser beam (500); an optical means (113) arranged between the deflection mirror (111) and the photosensitive cell (112) for linearly expanding the deflected laser beam (500); means (114) for transmitting the image acquired by the photosensitive cell (112) to a display device (12); An apparatus comprising:
10. A method for adjusting an analytical device (3) of an analytical system (1) according to any one of the preceding claims, comprising: positioning the deflection mirror (111) in its deflection position; generating a laser beam (5) by said generating module (4); capturing an image of the deflected beam (500) by the photosensitive cell (112); analyzing the image captured by the photosensitive cell (112) to detect profile defects of the laser beam (5) relative to a theoretical profile; correcting the orientation of the generating module (4) and / or the shaping lens (6) or the selection diaphragm (7) if a profile defect is detected; repeating the capturing, analyzing, and correcting steps until no profile defects relative to the theoretical profile are detected; A method comprising:
11. 11. The adjustment method according to claim 10, characterized in that the step of analyzing the image also includes a sub-step of checking the uniformity of the intensity of the laser beam (5), and the correction step is carried out when a non-uniformity in the intensity of the laser beam (5) is found.
12. 12. Method according to claim 10 or 11, characterized in that the method also comprises the step of servo-controlling an actuator dedicated to the adjustment of the laser beam (5).
Citation Information
Patent Citations
EP0,654,663