Solar cell, solar cell module, and method for manufacturing a solar cell

Abstract

To provide a solar cell, a solar cell module, and a method for manufacturing a solar cell that improve light absorption efficiency and suppresses deterioration of a conductive mirror layer.SOLUTION: A solar cell includes at least a substrate, a conductive mirror layer, a hole transport layer made of a p-type oxide semiconductor, and a light absorption layer, in this order.SELECTED DRAWING: Figure 1

Description

Technical Field

[0001] The present invention relates to a solar cell, a solar cell module, and a method for manufacturing a solar cell.

Background Art

[0002] In solar cells, from the viewpoints of reducing mass production costs and preventing peeling of the light absorption layer, there has been a limit on the upper limit of the thickness of the light absorption layer. Therefore, there has been a problem that the light absorption efficiency of light such as sunlight cannot be made a certain level or more in solar cells. Thus, attempts have been made to increase the light absorption efficiency without increasing the thickness of the light absorption layer. For example, in Non-Patent Document 1, it has been studied to improve the light absorption efficiency in a solar cell by reflecting sunlight transmitted through the light absorption layer due to the inability of the light absorption layer to absorb it completely on the back surface and causing the sunlight to be absorbed by the light absorption layer.

Prior Art Documents

Patent Documents

[0003]

Non-Patent Document 1

Summary of the Invention

Problems to be Solved by the Invention

[0004] In the solar cell described in Non-Patent Document 1, a metal mirror layer is formed on the back electrode, an oxide transparent conductive layer is formed thereon for the purpose of protecting the metal mirror layer and ensuring conductivity, and an extremely thin molybdenum or molybdenum selenide layer is further formed thereon.

[0005] However, it has been found that the oxide transparent conductive layer cannot sufficiently protect the metal mirror layer and there is a problem that the conductive mirror layer is liable to deteriorate.

[0006] The present invention has been made in view of the above problems, and an object thereof is to provide a solar cell, a solar cell module, and a method for manufacturing a solar cell that improve the light absorption efficiency and suppress the deterioration of the conductive mirror layer.

Means for Solving the Problems

[0007] The solar cell according to one embodiment of the present invention includes at least a substrate, a back electrode, a conductive mirror layer, a hole transport layer which is a p-type oxide semiconductor, and a light absorption layer in this order.

[0008] The inventors have found that, since the solar cell includes a conductive mirror layer and a hole transport layer which is a p-type oxide semiconductor exists between the conductive mirror layer and the light absorption layer, the light absorption efficiency of sunlight in the solar cell is improved, and the deterioration of the conductive mirror layer can be suppressed.

[0009] The method for manufacturing a solar cell according to one embodiment of the present invention includes a laminate preparation step of preparing at least a laminate including a substrate, a back electrode, a conductive mirror layer, a hole transport layer which is a p-type semiconductor, and a precursor layer of a light absorption layer in this order, and a heat treatment step of heat-treating the laminate in one or more atmospheres selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere.

[0010] The inventors have found that, since the laminate prepared in the laminate preparation step includes a conductive mirror layer and a hole transport layer which is a p-type oxide semiconductor exists between the conductive mirror layer and the precursor layer of the light absorption layer, the light absorption efficiency of sunlight in the solar cell manufactured by the manufacturing method is improved, and the deterioration of the conductive mirror layer can be suppressed.

Effects of the Invention

[0011] According to the present invention, it is possible to provide a solar cell, a solar cell module, and a method for manufacturing a solar cell that improve the light absorption efficiency of light such as sunlight and suppress the deterioration of the conductive mirror layer. [Brief explanation of the drawing]

[0012] [Figure 1] This is a schematic cross-sectional view of a solar cell according to one embodiment of the present invention. [Figure 2] This is a graph showing the results of the simulation. [Modes for carrying out the invention]

[0013] The embodiments of the present invention (hereinafter referred to as "these embodiments") will be described in detail below, with reference to the drawings as necessary. However, the present invention is not limited thereto, and various modifications are possible without departing from its essence. In the drawings, the same elements will be denoted by the same reference numerals, and redundant explanations will be omitted. Furthermore, unless otherwise specified, positional relationships such as up, down, left, and right will be based on the positional relationships shown in the drawings. Moreover, the dimensional ratios in the drawings are not limited to those shown.

[0014] 1. Solar cell Figure 1 is a schematic cross-sectional view of a solar cell according to one embodiment of the present invention. The solar cell 100 of this embodiment comprises, in this order, at least a substrate 101, a back electrode 102, a conductive mirror layer 104, a hole transport layer 105 which is a p-type oxide semiconductor, and a light absorption layer 106. The back electrode 102 may also be provided between the substrate 101 and the conductive mirror layer 104. Intermediate layers may be provided between each layer as needed from the viewpoint of interlayer adhesion, bonding, conductivity, etc.

[0015] In this embodiment, the solar cell 100 generates electricity by receiving light, such as sunlight, from the light absorption layer 106 side as viewed from the substrate 101. In this embodiment, the solar cell 100 tends to improve the light absorption efficiency of the solar cell 100 by providing a conductive mirror layer 104 between the back electrode 102 and the light absorption layer 106. This is thought to be because the conductive mirror layer 104 reflects the light that the light absorption layer 106 could not absorb, and the light absorption layer 106 then absorbs the reflected light.

[0016] Furthermore, the solar cell 100 of this embodiment includes a hole transport layer 105 which is a p-type oxide semiconductor. The conductive mirror layer 104 is preferably made of a material with high light reflectivity, but such materials are prone to a decrease in light reflectivity due to oxidation and corrosion, so it is common to provide a layer that can protect the conductive mirror layer 104. In this respect, the hole transport layer 105, which is a p-type oxide semiconductor, can protect the conductive mirror layer 104 and suppress a decrease in the light reflectivity of the conductive mirror layer 104. Moreover, from the viewpoint of valence band position, the p-type oxide semiconductor has good electrical compatibility with the light absorption layer 106, so even if the hole transport layer 105 is provided between the back electrode 102 and the light absorption layer 106, a decrease in photoelectric conversion efficiency can be suppressed.

[0017] Furthermore, solar cells are generally subjected to heat treatment during the manufacturing process, but as mentioned above, the reflectivity of the conductive mirror layer 104 tends to decrease, and it is also prone to decreasing due to heat treatment. In this respect, the hole transport layer 105, which is a p-type oxide semiconductor, can protect the conductive mirror layer 104 and suppress the decrease in the reflectivity of the conductive mirror layer 104.

[0018] The solar cell 100 can be formed as a thin-film solar cell or a thin-film flexible solar cell by forming each layer sufficiently thin. Thin-film solar cells and thin-film flexible solar cells are lightweight and highly flexible, so they can be applied to a variety of locations. Furthermore, forming the light-absorbing layer 106 thinly is preferable because it is possible to reduce mass production costs and prevent peeling of the light-absorbing layer. Here, since the solar cell 100 is equipped with a conductive mirror layer 104, even if the light-absorbing layer 106 is formed sufficiently thin, a decrease in light absorption efficiency can be suppressed.

[0019] The solar cell 100 may comprise, in this order at least, a substrate 101, a conductive mirror underlayer 103, a conductive mirror layer 104, a hole transport layer 105 which is a p-type oxide semiconductor, and a light absorption layer 106. Alternatively, the solar cell 100 may comprise, in this order at least, a substrate 101, a back electrode 102, a conductive mirror underlayer 103, a conductive mirror layer 104, a hole transport layer 105 which is a p-type oxide semiconductor, and a light absorption layer 106. Alternatively, the solar cell 100 may comprise a substrate 101, a back electrode 102 on the substrate 101, a conductive mirror underlayer 103 on the back electrode 102, a conductive mirror layer 104 on the conductive mirror underlayer 103, a hole transport layer 105 which is a p-type oxide semiconductor on the conductive mirror layer 104, and a light absorption layer 106 on the hole transport layer 105. Alternatively, the solar cell 100 may include a substrate 101, a back electrode 102 on the substrate 101, a conductive mirror underlayer 103 on the back electrode 102, a conductive mirror layer 104 on the conductive mirror underlayer 103, a hole transport layer 105 which is a p-type oxide semiconductor on the conductive mirror layer 104, a light absorption layer 106 on the hole transport layer 105, an electron transport layer 107 on the light absorption layer 106, and an electrode 108 on the electron transport layer 107. Furthermore, in the solar cell 100, the conductive mirror layer 104 may be provided on the hole transport layer 105, and the conductive mirror underlayer 103 may be provided on the conductive mirror layer 104. Also, in the solar cell 100, the light absorption layer 106 may be provided on the hole transport layer 105 which is a p-type oxide semiconductor. Furthermore, in the solar cell 100, the hole transport layer 105 may be provided on the light absorption layer 106, the conductive mirror layer 104 on the hole transport layer 105, and the conductive mirror underlayer 103 on the conductive mirror layer 104.

[0020] The following provides a detailed explanation of each possible configuration included in solar cell 100.

[0021] In this embodiment, when referring to a compound by name, it includes not only the pure compound itself, but also the compound to which trace amounts of elements, etc., have been added, to the extent that the properties of the compound are not lost.

[0022] Furthermore, in this embodiment, since elements in each layer of the solar cell module may exist in different oxidation states, all oxidation states are referred to by the name of the element unless otherwise specifically stated. For example, "hydrogen" means hydrogen atoms, hydrogen ions, hydride ions, hydrogen in compound states, and hydrogen in elemental states.

[0023] Furthermore, in this embodiment, the oxide is MO x When expressed as such (where M represents a metallic element), it includes not only compounds where the molar ratio of the metallic element to the oxygen element is exactly 1:x, but also compounds where the molar ratio deviates slightly. For example, when expressed as NiO, it includes not only compounds where the molar ratio of Ni and O elements is 1:1, but also nickel oxide where the molar ratio of Ni and O elements deviates from 1:1 due to the presence of small amounts of trivalent Ni and oxygen vacancies.

[0024] Furthermore, in this embodiment, when a numerical range is described as A to B, it means that the numerical range is greater than or equal to A and less than or equal to B.

[0025] 1.1. Circuit board The solar cell 100 includes a substrate 101. The substrate 101 is not particularly limited, but for example, a glass substrate; a metal substrate such as a stainless steel plate or aluminum foil; or a resin substrate such as a polyimide resin substrate or epoxy resin substrate can be used. Among these, a glass substrate or a metal substrate is preferred. The performance of the solar cell 100 tends to improve when the light absorption layer 106 contains alkali metal elements. Specifically, defects tend to be passivated and the open-circuit voltage tends to improve. In this regard, by using a glass substrate as the substrate 101, it becomes possible to diffuse alkali metal elements such as sodium elements contained in the glass substrate into the light absorption layer 106, which will be described later. Furthermore, by using a metal substrate, the substrate 101 can be used as an electrode, eliminating the need to provide a separate electrode. This tends to enable the thinning of the solar cell 100. When using a metal substrate as the substrate 101, by using a metal to which alkali metal elements have been added as the material of the metal substrate, it becomes possible to diffuse the alkali metal elements into the light absorption layer 106, which will be described later. The substances contained in the substrate 101 may be used individually or in combination of two or more.

[0026] Examples of alkali metal elements include sodium, potassium, rubidium, and cesium, with sodium and potassium being preferred among them.

[0027] The thickness of the substrate 101 is not particularly limited, but for example, it can be 0.01 to 30.0 mm, 0.05 to 25.0 mm, 0.1 to 20.0 mm, 0.5 to 20.0 mm, 1.0 to 10.0 mm, or 1.5 to 5.0 mm. Having the substrate 101 thickness within the above range tends to enable the thinning of the solar cell 100. In other words, it tends to enable the lightweighting and flexibility of the solar cell 100.

[0028] 1.2. Back surface electrode The solar cell 100 includes a back electrode 102. The back electrode 102 is not particularly limited as long as it is conductive, but for example, a metal conductive layer made of a metal such as molybdenum, chromium, tungsten, or titanium; a conductive inorganic compound conductive layer made of a conductive inorganic compound other than a metal; or a conductive organic compound conductive layer made of a conductive organic compound can be used. The substance contained in the back electrode 102 may be used alone or two or more in combination.

[0029] When using a metal as the material for the back electrode 102, a metal that undergoes little volume change due to heating is preferred. This tends to make the back electrode 102 less likely to peel off from the substrate 101. Examples of such metals include tungsten and molybdenum. Furthermore, tungsten and molybdenum are also preferred from a cost standpoint.

[0030] The thickness of the back electrode 102 is not particularly limited, but for example, it is 100-800 nm, 150-750 nm, or 200-700 nm. When the thickness of the back electrode 102 is within the above range, it tends to be possible to make the solar cell lighter and more flexible while extracting current sufficiently without loss.

[0031] 1.3. Conductive Mirror Underlayer The solar cell 100 may include a conductive mirror underlayer 103 between the back electrode 102 and the conductive mirror layer 104. By providing the conductive mirror underlayer 103, the light reflectivity of the conductive mirror underlayer 103 and the conductive mirror layer 104 (described later) is further improved, and thermal stability also tends to be improved.

[0032] The conductive mirror base layer 103 preferably has a high light reflectivity. From this viewpoint, the conductive mirror base layer 103 preferably contains a metal. Examples of metals include metals that have a face-centered cubic lattice structure at room temperature; and metals that have a structure other than a face-centered cubic lattice structure at room temperature (for example, titanium). However, from the viewpoint of improving the light reflectivity of the conductive mirror layer 103, metals that have a face-centered cubic lattice structure at room temperature are more preferable. Specifically, as metals that have a face-centered cubic lattice structure at room temperature, it is preferable to include one or more selected from the group consisting of nickel, aluminum, calcium, copper, strontium, rhodium, palladium, silver, iridium, platinum, gold, and lead. It is even more preferable to include one or more selected from the group consisting of aluminum, calcium, copper, strontium, rhodium, palladium, silver, iridium, platinum, gold, and lead. It is even more preferable to include one or more selected from the group consisting of gold, aluminum, copper, and silver. Furthermore, it is even more preferable to include one or more substances selected from the group consisting of aluminum, copper, and silver. The substances contained in the conductive mirror underlayer 103 may be used individually or in combination of two or more substances.

[0033] The metal content in the conductive mirror underlayer 103 is preferably 50-100% by mass, 60-100% by mass, 70-100% by mass, 80-100% by mass, 90-100% by mass, and 95-100% by mass, relative to the total amount of the conductive mirror underlayer 103.

[0034] The thickness of the conductive mirror underlayer 103 is preferably 5 to 75 nm, 7 to 50 nm, or 10 to 30 nm. When the thickness of the conductive mirror underlayer 103 is within the above range, the light reflectivity tends to be further improved, and thermal stability also tends to be improved.

[0035] 1.4. Conductive Mirror Layer The solar cell 100 includes a conductive mirror layer 104. The conductive mirror layer 104 is not particularly limited as long as it can reflect light such as sunlight, but it is preferable to include one or more selected from the group consisting of gold, silver, aluminum, gold alloys, silver alloys, and aluminum alloys. It is even more preferable to include one or more selected from the group consisting of silver, aluminum, silver alloys, and aluminum alloys. The substances included in the conductive mirror layer 104 may be used individually or in combination of two or more.

[0036] Furthermore, it is preferable to use different materials for the conductive mirror underlayer 103 and the conductive mirror layer 104.

[0037] The conductive mirror layer 104 preferably has a reflectance of 60-98% for light having a wavelength in the 800-1140 nm range.

[0038] The metal content in the conductive mirror layer 104 is preferably 50-100% by mass, 60-100% by mass, 70-100% by mass, 80-100% by mass, 90-100% by mass, and 95-100% by mass, relative to the total amount of the conductive mirror layer 104.

[0039] The thickness of the conductive mirror layer 104 is preferably 5 to 75 nm, 7 to 50 nm, or 10 to 30 nm. When the thickness of the conductive mirror underlayer 103 is within the above range, the light reflectivity tends to improve further.

[0040] 1.5. Hall Transport Layer The solar cell 100 includes a hole transport layer 105 which is a p-type oxide semiconductor. The hole transport layer 105 tends to efficiently extract holes generated in the light absorption layer 106 (described later) and suppress the recombination of electrons and holes generated simultaneously in the light absorption layer 106.

[0041] The hole transport layer 105 is not particularly limited as long as it is a p-type oxide semiconductor, but it preferably contains one or more metal oxides selected from molybdenum oxide (MoO2, MoO3), nickel oxide (NiO), copper oxide (CuO), gallium copper oxide (CuGaO2), chromium copper oxide (CuCrO2), and aluminum copper oxide (CuAlO2), more preferably one or more metal oxides selected from NiO, CuO, CuGaO2, CuCrO2, and CuAlO2, and more preferably CuAlO2. Alternatively, it is preferable to contain one or more metal oxides selected from MoO2, MoO3, NiO, CuO, CuGaO2, and CuAlO2. The substances contained in the hole transport layer 105 may be used individually or in combination of two or more.

[0042] By including one or more of the above-mentioned metal oxides in the hole transport layer 105, the conductive mirror layer 104 can be better protected, and a decrease in the photoelectric conversion efficiency of the solar cell 100 can be suppressed. Furthermore, since the above-mentioned metal oxides have excellent heat resistance and weather resistance, the solar cell 100 using the above-mentioned metal oxides also tends to have excellent heat resistance and weather resistance.

[0043] Furthermore, the hole transport layer 105 is subjected to heat treatment together with the precursor layer of the light absorption layer 106. In particular, if the heat treatment is carried out at a high temperature (e.g., 500°C) in a corrosive gas atmosphere such as a sulfur atmosphere, selenium atmosphere, chlorine atmosphere, bromine atmosphere, and iodine atmosphere, at least a portion of the hole transport layer 105 may be modified. For example, a hole transport layer 105 subjected to heat treatment at a high temperature (e.g., 500°C) in a sulfur atmosphere, selenium atmosphere, chlorine atmosphere, bromine atmosphere, or iodine atmosphere may be sulfidated, selenized, chlorinated, bromidized, or iodized in at least a portion. The portion of the hole transport layer 105 referred to is not particularly limited, but for example, it is a portion of the surface of the hole transport layer 105 facing the light absorption layer 106. Note that even if the hole transport layer 105 is subjected to heat treatment, most of it (e.g., the entire surface facing the light absorption layer 106) or the entirety of it will not be modified. Furthermore, a hole transport layer 105 that is modified in part, like an unmodified hole transport layer 105, can more effectively suppress the decrease in the photoelectric conversion efficiency of the solar cell 100.

[0044] Furthermore, it is preferable that the hole transport layer 105 contains a metal oxide to which an alkali metal element has been added. Adding an alkali metal element to the light absorption layer 106, which will be described later, tends to improve the performance of the solar cell 100. One method for adding an alkali metal element to the light absorption layer 106 is to diffuse the alkali metal element from the substrate 101 to the light absorption layer 106 by heat treatment. In this case, it is preferable that the hole transport layer 105 contains a metal compound to which an alkali metal element has been added, as this makes the diffusion of the alkali metal element from the substrate 101 to the light absorption layer 106 more likely to occur. In this embodiment, when simply referring to a metal oxide, it includes not only metal oxides but also metal oxides to which an alkali metal element has been added.

[0045] In this embodiment, metal oxides to which alkali metal elements have been added may be expressed using the compositional formula before the addition of the alkali metal elements. For example, in aluminum copper oxide to which sodium elements have been added, the molar ratio of Cu to Al elements may not be 1:1, but aluminum copper oxide to which sodium elements have been added may be expressed as CuAlO2 to which sodium elements have been added.

[0046] Examples of alkali metal elements include sodium, potassium, rubidium, and cesium, with sodium and potassium being preferred among them.

[0047] Furthermore, the hole transport layer 105 preferably contains CuAlO2 or CuAlO2 with added alkali metal elements. This provides better protection for the conductive mirror layer 104 and tends to improve the performance of the solar cell 100.

[0048] The alkali metal element content in the hole transport layer 105 is preferably 5 to 30 mol%, and 10 to 25 mol%, relative to the total number of moles of metal elements contained in the hole transport layer 105.

[0049] The alkali metal element content in the hole transport layer 105 is not particularly limited, but can be measured using, for example, ICP, EDX, or SIMS.

[0050] The oxide content in the hole transport layer 105 is not particularly limited as long as the hole transport layer 105 has the properties of a p-type semiconductor, but for example, it is 80-100% by mass, 90-100% by mass, 95-100% by mass, and 99-100% by mass relative to the total amount of the hole transport layer 105.

[0051] The thickness of the hole transport layer 105 is preferably 5 to 100 nm, 7 to 80 nm, or 10 to 60 nm. By having the thickness of the hole transport layer 105 within the above range, holes generated in the light absorption layer 106 (described later) can be efficiently extracted from the light absorption layer 106, suppressing the recombination of electrons and holes generated simultaneously with the holes in the light absorption layer 106, while also enabling lighter and more flexible solar cells.

[0052] 1.6. Light-absorbing layer The solar cell 100 includes a light-absorbing layer 106. The light-absorbing layer 106 absorbs light such as near-infrared light, visible light, and ultraviolet light to generate electrons and holes. Examples of light such as near-infrared light, visible light, and ultraviolet light include sunlight. The light-absorbing layer 106 preferably contains one or more selected from the group consisting of chalcopyrite compounds, kestelite compounds, and perovskite compounds. The perovskite compound may be used alone or in combination of two or more. The chalcopyrite compound may be used alone or in combination of two or more. Similarly, the kestelite compound may be used alone or in combination of two or more.

[0053] When the light-absorbing layer 106 contains one or more compounds selected from the group consisting of chalcopyrite compounds, kestelite compounds, and perovskite compounds, it is preferable to form the light-absorbing layer 106 thinly from the viewpoint of reducing mass production costs and preventing peeling of the light-absorbing layer. In this case, even if the light-absorbing layer 106 is formed thinly, the solar cell will still function sufficiently, so it is also preferable to form the light-absorbing layer 106 thinly from the viewpoint of making the solar cell lighter and more flexible. On the other hand, when the light-absorbing layer 106 is formed thinly, the light-absorbing layer 106 may not be able to absorb all of the light, such as sunlight, and the light absorption efficiency tends to decrease.

[0054] In this respect, the solar cell 100 tends to have improved light absorption efficiency because it is equipped with a conductive mirror layer 104.

[0055] Furthermore, if the light-absorbing layer 106 of the solar cell 100 contains one or more compounds selected from the group consisting of chalcopyrite compounds, kestelite compounds, and perovskite compounds, the light-absorbing layer 106 has good electrical compatibility with the hole transport layer 105, which is a p-type oxide semiconductor, from the viewpoint of valence band position. Therefore, even if the hole transport layer 105 is provided between the back electrode 102 and the light-absorbing layer 106, the decrease in photoelectric conversion efficiency tends to be further suppressed. Also, even if the hole transport layer 105 is provided on the substrate 101 side of the light-absorbing layer 106, the increase in electrical resistance at the interface between the hole transport layer 105 and the light-absorbing layer 106 tends to be suppressed, and the decrease in photoelectric conversion efficiency tends to be further suppressed.

[0056] Furthermore, if the light-absorbing layer 106 contains one or more compounds selected from the group consisting of chalcopyrite compounds, kestelite compounds, and perovskite compounds, the solar cell 100 is manufactured by heat-treating the precursor layer of the light-absorbing layer 106 in an atmosphere such as selenium gas or sulfur gas. In this case, along with the precursor layer of the light-absorbing layer 106, the conductive mirror layer 104 and the hole transport layer 105 located on the substrate 101 side (bottom side) of the light-absorbing layer 106 are also subjected to the heat treatment. The conductive mirror layer 104 is prone to a decrease in reflectivity due to oxidation and corrosion, but in the solar cell 100, a hole transport layer 105, which is a p-type oxide semiconductor, is formed on the upper side of the conductive mirror layer 104. Therefore, even if the conductive mirror layer 104 is subjected to heat treatment in an atmosphere such as selenium gas or sulfur gas, the hole transport layer 105 protects the conductive mirror layer 104, and the decrease in reflectivity of the conductive mirror layer 104 tends to be suppressed.

[0057] Examples of perovskite compounds include those represented by the general formula AMX3 and those represented by the general formula A2MX4. Here, M represents a divalent cation, A represents a monovalent cation, and X represents a monovalent anion.

[0058] The monovalent cation A is not particularly limited and includes, for example, cations of Group 1 elements of the periodic table and organic cations. Among these, cesium ions, rubidium ions, optionally substituted ammonium ions (including amidinium ions), optionally substituted phosphonium ions, or optionally substituted amidinium ions are preferred. Examples of optionally substituted ammonium ions include primary ammonium ions and secondary ammonium ions. Specific examples of optionally substituted ammonium ions include alkylammonium ions, arylammonium ions, amidinium ions, and guanidium ions. In particular, monoalkylammonium ions are preferred to avoid steric hindrance, and from the viewpoint of improving stability, alkylammonium ions substituted with one or more fluorine atoms are preferred. Furthermore, a combination of two or more cations can be used as cation A. Examples of monovalent cation A include methylammonium ion, methylammonium monofluoride ion, methylammonium difluoride ion, methylammonium trifluoride ion, ethylammonium ion, isopropylammonium ion, n-propylammonium ion, isobutylammonium ion, n-butylammonium ion, t-butylammonium ion, dimethylammonium ion, diethylammonium ion, phenylammonium ion, benzylammonium ion, phenethylammonium ion, guanidium ion, formamidinium ion, acetamidinium ion, and imidazolium ion.

[0059] The divalent cation M is not particularly limited and can be, for example, a divalent metal cation or a metalloid cation. Specific examples include cations of Group 14 elements of the periodic table, and more specifically, lead cations (Pb 2+ ), tin cation (Sn 2+ ), and germanium cation (Ge 2+ ) are examples. In addition, a combination of two or more cations can be used as cation M.

[0060] The monovalent anion X is not particularly limited, and examples thereof include halide ions, acetate ions, nitrate ions, sulfate ions, borate ions, acetylacetonate ions, carbonate ions, citrate ions, sulfur ions, tellurium ions, thiocyanate ions, titanate ions, zirconate ions, 2,4-pentanedionato ions, and silicon fluoride ions. X may be one type of anion or a combination of two or more types of anions. It is preferable to use a halide ion or a combination of a halide ion and another anion as X. Examples of the halide ion X include chloride ions, bromide ions, and iodide ions.

[0061] Examples of the perovskite compound include organic-inorganic perovskite compounds, particularly halide-based organic-inorganic perovskite compounds. Specific examples of the perovskite compound include CH3NH3PbI3, CH3NH3PbBr3, CH3NH3PbCl3, CH3NH3SnI3, CH3NH3SnBr3, CH3NH3SnCl3, CH3NH3PbI (3-x) Cl x 、CH3NH3PbI (3-x) Br x 、CH3NH3PbBr (3-x) Cl x 、CH3NH3Pb (1-y) Sn y I3、CH3NH3Pb (1-y) Sn y Br3、CH3NH3Pb (1-y) Sn y Cl3、CH3NH3Pb (1-y) Sn y I (3-x) Cl x 、CH3NH3Pb (1-y) Sn y I (3-x) Br x 、及びCH3NH3Pb (1-y) Sn y Br (3-x) Cl xFurthermore, examples include compounds in which CFH2NH3, CF2HNH3, CF3NH3, or NH2CH=NH2 are used instead of CH3NH3 in the above compounds. In the above formula, x represents any value between 0 and 3, and y represents any value between 0 and 1.

[0062] Preferably, the chalcopyrite compound is a group I-III-VI2 chalcopyrite compound. The group I-III-VI2 chalcopyrite compound is not particularly limited, but examples include CuAlS2, CuAlSe2, CuAlTe2, CuGaS2, CuGaSe2, CuGaTe2, CuInS2, CuInSe2, CuInTe2, AgAlS2, AgAlSe2, AgAlTe2, AgGaS2, AgGaSe2, AgGaTe2, AgInS2, AgInSe2, AgInTe2, and combinations thereof. "These combinations" is not particularly limited, but for example, when CuGaS2 and CuInSe2 are combined, Cu(In x Ga 1-x )(Se y S 1-y Examples include )2 (0≦x≦1, 0≦y≦1). Among these chalcopyrite compounds, CuGaS2, CuGaSe2, CuInS2, CuInSe2, and Cu(In x Ga 1-x )(Se y S 1-y )2 (0≦x≦1, 0≦y≦1) is preferred, Cu(In x Ga 1-x )(Se y S 1-y )2 (0≦x≦1, 0≦y≦1) is more preferable. In this embodiment, when referring to a CIS compound, it is a chalcopyrite compound containing Cu, In, and Se; when referring to a CIGS compound, it is a chalcopyrite compound containing Cu, In, Ga, and Se; and when referring to a CIGSS compound, it is a chalcopyrite compound containing Cu, In, Ga, Se, and S.

[0063] Preferably, kestellite compounds include I2-II-IV-VI4 kestellite compounds. While not particularly limited, examples of I2-II-IV-VI4 kestellite compounds include Cu2ZnSnS4, Cu2ZnSnSe4, Cu2ZnGeS4, Cu2ZnGeSe4, Cu2MnSnS4, Cu2MnSnSe4, Cu2MnGeS4, Cu2MnGeSe4, Ag2ZnSnS4, Ag2ZnSnSe4, Ag2ZnGeS4, Ag2ZnGeSe4, Ag2MnSnS4, Ag2MnSnSe4, Ag2MnGeS4, Ag2MnGeSe4, and combinations thereof. "These combinations" are not particularly limited, but for example, when Cu2ZnSnS4 and Ag2ZnSnSe4 are combined (Cu x Ag 1-x )2ZnSn(S y Se 1-y )4 (0≦x≦1) is one example. Cu2ZnSn(S x Se 1-x )4(0≦x≦1, 0≦y≦1) are examples. Among these kestellite compounds, Cu2ZnSnS4, Cu2ZnSnSe4, Ag2ZnSnS4, Ag2ZnSnSe4, (Cu x Ag 1-x )2ZnSn(S y Se 1-y )4 (0≦x≦1, 0≦y≦1) is preferred, (Cu x Ag 1-x )2ZnSn(S y Se 1-y )4 (0≦x≦1, 0≦y≦1) is more preferable. In this embodiment, when referring to a CZTS compound, it is a kesterite compound containing Cu, Zn, Sn, and S; when referring to an ACZTS compound, it is a kesterite compound containing Ag, Cu, Zn, Sn, and S; and when referring to an ACZTSS compound, it is a kesterite compound containing Ag, Cu, Zn, Sn, and Se.

[0064] The light-absorbing layer 106 preferably contains a perovskite compound with an alkali metal element, a chalcopyrite compound with an alkali metal element, and a kestellite compound with an alkali metal element. This tends to improve the performance of the solar cell 100. Examples of alkali metal elements include sodium, potassium, rubidium, and cesium, with sodium being preferred among them.

[0065] The alkali metal element content in the light-absorbing layer 106 is preferably 0.1 to 5 mol%, and more preferably 0.5 to 2 mol%, relative to the total number of moles of metal elements contained in the light-absorbing layer 106. When the alkali metal element content in the light-absorbing layer 106 is within the above range, the performance of the solar cell 100 tends to improve.

[0066] The alkali metal element content in the light-absorbing layer 106 is not particularly limited, but can be measured using, for example, ICP, EDX, or SIMS.

[0067] The content of the perovskite compound, chalcopyrite compound, and kestelite compound in the light-absorbing layer 106 is not particularly limited as long as the light-absorbing layer 106 can absorb light such as visible light and ultraviolet light to generate electrons and holes. More specifically, although not particularly limited, the content of the chalcopyrite compound and kestelite compound is 50-100% by mass, 60-100% by mass, 70-100% by mass, 80-100% by mass, and 90-100% by mass, respectively, based on the total mass of the light-absorbing layer 106.

[0068] The light-absorbing layer 106 may contain additives such as binders and surfactants in addition to the materials mentioned above. The amount of these additives is not particularly limited, but for example, it is 0.1 to 10% by mass relative to the total mass of the light-absorbing layer 106. The light-absorbing layer 106 does not need to contain these additives.

[0069] The thickness of the light-absorbing layer 106 is preferably 0.5 to 5.0 μm, 0.5 to 4.5 μm, or 0.5 to 3.0 μm. Having the thickness of the light-absorbing layer 106 within the above range tends to enable the solar cell to be lighter and more flexible while absorbing visible light, ultraviolet light, and other light to generate electrons and holes. Furthermore, it tends to prevent the light-absorbing layer 106 from peeling off.

[0070] The solar cell 100 of this embodiment may have two light-absorbing layers 106. In this case, the material contained in the first light-absorbing layer 106 and the material contained in the second light-absorbing layer 106 may be different or the same, but it is preferable that they be different. A solar cell in which the materials contained in the first and second light-absorbing layers 106 are different is also called a tandem solar cell. By having two light-absorbing layers 106 in the solar cell 100, the wavelength range of light that the light-absorbing layers 106 can absorb tends to be expanded, and as a result, the performance of the solar cell 100 tends to improve. Furthermore, the solar cell 100 of this embodiment may have three or more light-absorbing layers 106.

[0071] 1.7.Electron transport layer The solar cell 100 may or may not have an electron transport layer 107 on the side of the light absorption layer 106 opposite to the substrate 101, but from the viewpoint of improving the photoelectric conversion efficiency of the solar cell 100, it is preferable to have an electron transport layer 107.

[0072] The electron transport layer 107 tends to efficiently extract electrons generated in the light absorption layer 106 and suppress the recombination of electrons with holes generated simultaneously in the light absorption layer 106. The electron transport layer 107 is preferably an n-type semiconductor. The substances included in the n-type semiconductor are not particularly limited, but examples include metal oxides such as zinc oxide, tin oxide, titanium oxide, zinc sulfide (zinc oxide with added sulfur), zinc magnesium oxide (zinc oxide with added magnesium), zinc tin oxide (zinc oxide with added tin), and zinc titanium oxide (zinc oxide with added titanium). The substances included in the electron transport layer 107 may be used individually or in combination of two or more.

[0073] The electron transport layer 107, which is an n-type oxide semiconductor, is preferably substantially composed of zinc oxide, tin oxide, titanium oxide, zinc sulfide oxide, magnesium zinc oxide, tin zinc oxide, or titanium zinc oxide, and is preferably zinc oxide, tin oxide, titanium oxide, zinc sulfide oxide, magnesium zinc oxide, tin zinc oxide, or titanium zinc oxide. Furthermore, the content of metal oxides such as zinc oxide, tin oxide, titanium oxide, zinc sulfide oxide, magnesium zinc oxide, tin zinc oxide, or titanium zinc oxide in the electron transport layer 107, which is an n-type oxide semiconductor, is preferably 80-100% by mass, 90-100% by mass, 95-100% by mass, or 99-100% by mass, relative to the total amount of the electron transport layer 107.

[0074] The thickness of the electron transport layer 107 is preferably 50-200 nm, 55-175 nm, 60-150 nm, or 65-125 nm. By having the electron transport layer 107 thickness within the above range, electrons generated in the light absorption layer 106 can be efficiently extracted from the light absorption layer 106, suppressing the recombination of electrons with holes generated simultaneously with electrons in the light absorption layer 106, while also enabling lighter and more flexible solar cells.

[0075] 1.8.Surface electrode The solar cell 100 has a surface electrode 108. The surface electrode 108 is provided, for example, to extract an electric current generated by electrons in the light-absorbing layer 106.

[0076] 1.8.1.Transparent electrode layer The surface electrode 108 may have a transparent electrode layer 109. A transparent electrode is an electrode made of a material that combines high electrical conductivity and high visible light transmittance. High electrical conductivity is not particularly limited, but for example, a resistivity of 5.0 × 10⁻⁶ -3 This means that the density is less than or equal to Ωcm. High visible light transmittance is not particularly limited, but for example, it means that the average transmittance in the wavelength range of 400 to 1300 nm is 80% or more. As the material for the transparent electrode, known materials can be used, such as indium tin oxide (ITO), hydrogen-containing indium oxide (IOH), fluorine-containing tin oxide (FTO), boron-containing zinc oxide (ZnO:B), and aluminum-containing zinc oxide (ZnO:Al). The substance contained in the transparent electrode layer 109 may be used alone or two or more in combination.

[0077] When the second transparent electrode 109 is a transparent electrode, the content of the above material is not particularly limited as long as the second transparent electrode 109 functions as a transparent electrode. More specifically, although not particularly limited, the content of the above material is 50-100% by mass, 60-100% by mass, 70-100% by mass, 80-100% by mass, 90-100% by mass, and 95-100% by mass, relative to the total mass of the second transparent electrode 109.

[0078] The thickness of the second transparent electrode 109 is not particularly limited, but for example, it is 100 to 1500 nm or 200 to 1000 nm. By having the thickness of the second transparent electrode 109 within the above range, it tends to be possible to make the solar cell lighter and more flexible while extracting current sufficiently without loss.

[0079] 1.8.2. Grid electrodes The surface electrode 108 may have a grid electrode 110. The material of the grid electrode 110 is not particularly limited as long as it is conductive, but for example, metals such as Mo, Cr, Ag, Cu, Ni, Al, or Ti; conductive inorganic compounds other than metals; and conductive organic compounds can be used. The substances included in the grid electrode 110 may be used individually or in combination of two or more.

[0080] The content of the above material in the grid electrode 110 is not particularly limited as long as the grid electrode 110 functions as an electrode. More specifically, although not particularly limited, the content of the above material is 50-100% by mass, 60-100% by mass, 70-100% by mass, 80-100% by mass, and 90-100% by mass, relative to the total mass of the grid electrode 110.

[0081] The thickness of the grid electrode 110 is not particularly limited, but is, for example, 5 to 50 μm. Having the grid electrode 110 within this thickness range tends to enable lighter and more flexible solar cells while allowing for sufficient current extraction without loss.

[0082] The surface electrode 108 may consist only of the transparent electrode 109, only of the grid electrode 110, or of both the transparent electrode 109 and the grid electrode 110. Preferably, the electrode 110 consists of the transparent electrode 109 and the grid electrode 110.

[0083] 2. Method for manufacturing solar cells The manufacturing method for the solar cell 100 of this embodiment includes a laminate preparation step of preparing a laminate comprising, in this order, at least a substrate 101, a back electrode 102, a conductive mirror layer 104, a hole transport layer 105 which is a p-type semiconductor, and a precursor layer of a light absorption layer 106; and a heat treatment step of heat treating the laminate in one or more atmospheres selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere.

[0084] In the solar cell 100 manufactured by the manufacturing method of this embodiment, a hole transport layer 105, which is a p-type semiconductor, is present between the conductive mirror layer 104 and the light absorption layer 106. Therefore, the conductive mirror layer 104 does not undergo modification such as corrosion during the heat treatment process, and a decrease in the light reflectivity of the conductive mirror layer 104 can be suppressed.

[0085] The following describes in detail each step that may be included in the manufacturing method of the solar cell 100 of this embodiment.

[0086] 2.1. Laminate preparation process The method for manufacturing a solar cell of this embodiment includes a laminate preparation step of preparing a laminate comprising, in this order, a substrate 101, a back electrode 102, a conductive mirror layer 104, a hole transport layer 105 which is a p-type semiconductor, and a precursor layer of a light absorption layer 106. A sputtering method is one example of a method for preparing such a laminate.

[0087] Specifically, a back electrode 102 may be laminated on the substrate 101 using a sputtering method, a conductive mirror layer 104 may be laminated on the back electrode 102 using a sputtering method, a hole transport layer 105 may be laminated on the conductive mirror layer 104 using a sputtering method, and a precursor layer of the light absorption layer 106 may be laminated on the hole transport layer 105 using a sputtering method. Alternatively, a back electrode 102 may be laminated on the substrate 101 using a sputtering method, a conductive mirror underlayer 103 may be laminated on the back electrode 102 using a sputtering method, a conductive mirror layer 104 may be laminated on the conductive mirror underlayer 103 using a sputtering method, a hole transport layer 105 may be laminated on the conductive mirror layer 104 using a sputtering method, and a precursor layer of the light absorption layer 106 may be laminated on the hole transport layer 105 using a sputtering method. Furthermore, an intermediate layer may be provided between each layer, if necessary, by sputtering, vapor deposition, spray coating, or other methods, from the viewpoint of interlayer adhesion, bonding, conductivity, etc.

[0088] The sputtering method may be performed in an argon atmosphere, using the material of each layer as the sputtering target. For example, when forming the conductive mirror layer 104 by sputtering, aluminum may be used as the sputtering target, and sputtering may be performed in an argon atmosphere.

[0089] Furthermore, the sputtering method may be performed using a sputtering target containing two or more compounds, if necessary. Also, the sputtering method may be performed in an atmosphere other than an argon atmosphere, such as an oxygen atmosphere, if necessary. For example, when forming a hole transport layer 105 containing CuAlO2 by sputtering, Cu2O and Al2O3 may be used as sputtering targets and sputtering may be performed in an oxygen atmosphere. In this case, the sputtering target may consist of two components, Cu2O and Al2O3, or a single component that is a mixture of Cu2O and Al2O3. In addition, the sputtering target may contain additives such as binders in addition to the materials of each layer. Furthermore, the concentration of the oxygen source in the gas supplied during sputtering is not particularly limited, but for example, it is 0.2 to 10.0 volume percent in terms of oxygen molecules.

[0090] One method for adding alkali metal elements to the hole transport layer 105 is to use a sputtering target to which alkali metal elements have been added. For example, when forming a hole transport layer 105 containing CuAlO2 to which alkali metal elements have been added by sputtering, there are no particular limitations, but for example, three sputtering targets of CuO, Al2O3 and Na2O may be used, two sputtering targets of a mixture of CuO and Al2O3 and Na2O may be used, or one sputtering target which is a mixture of CuO, Al2O3 and Na2O may be used.

[0091] The amount of alkali metal elements added to the hole transport layer 105 can be adjusted by adjusting the amount of alkali metal elements in the sputtering target.

[0092] The precursor layer of the light-absorbing layer 106 contains a substance that becomes the light-absorbing layer 106 through a heat treatment process described later. When the light-absorbing layer 106 contains a perovskite compound, the precursor layer of the light-absorbing layer 106 is not particularly limited, but includes, for example, a laminate of PbI2 or FAI. When the light-absorbing layer 106 contains a chalcopyrite compound, the precursor layer of the light-absorbing layer 106 is not particularly limited, but includes, for example, a laminate of CuGa or In. When the light-absorbing layer 106 contains a kesterite compound, the precursor layer of the light-absorbing layer 106 is not particularly limited, but includes, for example, a laminate of Zn, Sn, or Cu.

[0093] Methods for adding alkali metal elements to the light-absorbing layer 106 include diffusing alkali metal elements that may be present in the substrate 101 and hole transport layer 105 to the light-absorbing layer 106 through a heat treatment process described later, and adding alkali metal elements to the precursor layer of the light-absorbing layer 106. One method for adding alkali metal elements to the precursor layer of the light-absorbing layer 106 is to use a sputtering target to which alkali metal elements have been added.

[0094] 2.2. Heat Treatment Process The method for manufacturing a solar cell in this embodiment includes a heat treatment step in which the laminate prepared in the laminate preparation step is heat-treated in one or more atmospheres selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere. As a result, the precursor layer of the light-absorbing layer 106 becomes the light-absorbing layer 106.

[0095] The above laminate includes a hole transport layer 105 which is a p-type semiconductor. The hole transport layer 105 can protect the conductive mirror layer 104, thereby preventing the conductive mirror layer 104 from undergoing corrosion or other degeneration during the heat treatment process, and suppressing a decrease in the light reflectivity of the conductive mirror layer 104.

[0096] The atmosphere used in the heat treatment process is one or more atmospheres selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere. Specifically, it may be an atmosphere containing one selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere, or a mixed atmosphere containing two or more selected from the above group. Furthermore, after a heat treatment process is carried out in one atmosphere, a further heat treatment process may be carried out in another atmosphere. Specifically, after a heat treatment process is carried out in a selenium atmosphere, a heat treatment process may be carried out in a sulfur atmosphere.

[0097] When the light-absorbing layer 106 is a chalcopyrite compound or a kestelite compound, it is preferable that the heat treatment process be carried out in one or more atmospheres, either a sulfur atmosphere or a selenium atmosphere, and it is more preferable that the heat treatment process be carried out in a selenium atmosphere first, followed by a heat treatment process in a sulfur atmosphere.

[0098] When the light-absorbing layer 106 is a perovskite compound, it is preferable that the heat treatment process be carried out in one or more atmospheres selected from the group consisting of a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere.

[0099] In this embodiment, the term "sulfur atmosphere" refers to an atmosphere containing a gas that has the element sulfur. That is, an atmosphere containing both a gas that does not have the element sulfur (e.g., nitrogen gas, argon gas) and a gas that has the element sulfur is included in the sulfur atmosphere. The same applies to selenium atmospheres, chlorine atmospheres, bromine atmospheres, and iodine atmospheres.

[0100] In the heat treatment process, the laminate is preferably heat-treated at a temperature of 60 to 600°C, and more preferably at a temperature of 150 to 600°C. More specifically, in the case of a sulfur atmosphere and a selenium atmosphere, the heat treatment temperature is preferably 300 to 600°C, 350 to 600°C, 400 to 600°C, and 450 to 600°C. In the case of a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere, the heat treatment temperature is preferably 60 to 230°C, 70 to 200°C, and 80 to 170°C.

[0101] In the heat treatment process, the heat treatment time is preferably 1 minute or more and 30 minutes or less, 3 minutes or more and 15 minutes or less, or 5 minutes or more and 15 minutes or less.

[0102] 2.3.Electron transport layer formation process The method for manufacturing a solar cell of this embodiment may include an electron transport layer formation step for forming an electron transport layer 107. The electron transport layer formation step may be performed using a sputtering method. Specifically, an electron transport layer which is an n-type oxide semiconductor containing titanium dioxide zinc may be formed on the light absorption layer 106 by sputtering with zinc oxide and titanium dioxide as sputtering targets under an argon atmosphere. The sputtering targets may be appropriately changed depending on the material contained in the electron transport layer 107.

[0103] 2.4. Surface electrode formation process The method for manufacturing a solar cell according to this embodiment may include a surface electrode formation step for forming the surface electrode 108. The surface electrode formation step may be performed using a sputtering method.

[0104] Specifically, a transparent electrode layer 109 may be laminated on the light absorption layer 106 or the electron transport layer 107 using a sputtering method, and a grid electrode 110 may be provided on the transparent electrode layer 109 using a sputtering method. In the sputtering method, the materials of each component may be used as sputtering targets and the process may be carried out in an argon atmosphere.

[0105] Alternatively, a method for forming the surface electrode 108 may be a combination of sputtering and other methods. Specifically, a transparent electrode layer 109 may be laminated on the light absorption layer 106 or electron transport layer 107 using the sputtering method, and a grid electrode 110 may be provided on the transparent electrode layer 109 using vapor deposition, a method of printing a paste-like conductive material, or a method of crimping conductive wires.

[0106] 3. Solar cell modules In the solar cell module of this embodiment, multiple solar cells 100 are electrically connected in series or in parallel. One method of electrically connecting multiple solar cells 100 in series is to solder a metal ribbon to the back electrode 102 of one solar cell 100, and to solder the metal ribbon wire to the front electrode 108 of the other solar cell 100. One method of electrically connecting multiple solar cells 100 in parallel is to prepare multiple solar cells 100, each with a metal ribbon soldered to the back electrode 102 and another metal ribbon soldered to the front electrode 108, and then electrically connect the metal ribbons soldered to the back electrode 102 and the metal ribbons soldered to the front electrode 108.

[0107] In a solar cell module where multiple solar cells 100 are electrically connected in series, a higher voltage can be obtained, which is preferable. In a solar cell module where multiple solar cells 100 are electrically connected in parallel, a higher current can be obtained, and power generation can be performed more stably, which is preferable. In a solar cell module where multiple solar cells 100 are electrically connected in a combination of series and parallel, the voltage and current can be adjusted to a suitable range, and power generation can be performed stably, which is preferable.

[0108] 4. How to use solar cells The solar cell 100 can be used in normal temperature environments where the solar cell temperature is around 45 to 85°C, similar to conventional solar cells. Furthermore, unlike conventional solar cells, the solar cell 100 can be suitably used in high-temperature environments where the solar cell temperature exceeds 85°C (for example, in space, the stratosphere, deserts, tropical regions, building rooftops, car roofs, and on the exterior walls of airplanes).

[0109] Furthermore, the solar cell 100 can be made into a thin film, enabling weight reduction and flexibility. Therefore, the solar cell 100 can be attached to the windows and walls of buildings, the windows and roofs of mobile vehicles, etc., and used as a power generation device. In addition, the solar cell 100 can be used as an independent power supply device for streetlights, sensors, digital signage, etc., and in such cases, the solar cell 100 can be bent or otherwise adapted to various environments. The solar cell 100 can also be used as a mobile energy device. [Examples]

[0110] The present invention will be described more specifically below using examples and comparative examples. The present invention is not limited in any way by the following examples.

[0111] 1. Simulation experiment on conductive mirror layer The effects of adding a conductive mirror layer were investigated using simulation software (e-ARC, a thin-film solar cell characteristic simulation software manufactured by the National Institute of Advanced Industrial Science and Technology). First, Model 1 was fabricated, consisting of the glass substrate, back electrode, hole transport layer, light absorption layer, electron transport layer, and front electrode in that order. Then, Model 2 was fabricated, consisting of the glass substrate, back electrode, conductive mirror layer, hole transport layer, light absorption layer, electron transport layer, and front electrode in that order. The configuration of each layer in Models 1 and 2 is as follows. Substrate: 2mm thick glass Back electrode: A layer made of metallic molybdenum with a thickness of 400 nm. Conductive mirror layer: A layer made of metallic silver with a thickness of 50 nm. Hole transport layer: A layer made of CuAlO2 with a thickness of 50 nm. Light-absorbing layer: A layer consisting of CIGSS compounds with a thickness of 1-3 μm. Electron transport layer: A layer made of titanium zinc oxide with a thickness of 100 nm. Surface electrode: A layer made of ITO with a thickness of 350 nm.

[0112] Simulations were performed using models 1 and 2 above, irradiating light from the surface electrode side. The results are shown in Figure 2. Model 2, which has a conductive mirror layer, showed a higher short-circuit current density J at each thickness of the light-absorbing layer than model 1, which does not. SC It can be seen that the size has increased. From this, it can be seen that by providing a conductive mirror layer, the light-absorbing layer can absorb more light, that is, the light absorption efficiency has improved.

[0113] 2. Fabrication of partial structures of solar cells [Example 1] In Example 1, a 2 mm thick glass substrate was used. A back electrode containing metallic molybdenum was formed on this substrate to a thickness of 400 nm. For the formation of the back electrode, metallic molybdenum was used as a sputtering target, and the sputtering method was employed under an argon atmosphere.

[0114] A conductive mirror underlayer containing metallic nickel was formed on the back electrode to a thickness of 50 nm using the sputtering method. For the formation of the conductive mirror underlayer, metallic nickel was used as the sputtering target, and the sputtering method was employed under an argon atmosphere.

[0115] A conductive mirror layer containing metallic silver was formed to a thickness of 50 nm on a conductive mirror substrate using the sputtering method. For the formation of the conductive mirror layer, metallic silver was used as the sputtering target, and the sputtering method was employed under an argon atmosphere.

[0116] A hole transport layer, a p-type semiconductor containing CuGaO2, was formed on a conductive mirror layer with a thickness of 50 nm using the sputtering method. For the formation of the hole transport layer, a mixture of Cu2O and Ga2O3, with a molar ratio of Cu to Ga of 1:1, was used as the sputtering target, and the sputtering method was performed under a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90 vol%:10 vol%. In this way, the partial structure of the solar cell before heat treatment in Example 1 was prepared.

[0117] The partial structure of the solar cell before heat treatment was subjected to heat treatment at 500°C for 10 minutes under a sulfur atmosphere (a mixed gas atmosphere of nitrogen gas:H2S gas = 95% by volume:5% by volume). In this way, the partial structure of the solar cell after heat treatment, as in Example 1, was fabricated.

[0118] [Example 2] The partial structure of the solar cell before and after heat treatment for Example 2 was fabricated in the same manner as in Example 1, except that a hole transport layer made of p-type semiconductor containing NiO with a thickness of 50 nm was used. For the formation of the hole transport layer, NiO was used as the sputtering target, and the sputtering method was used in a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90 volume%:10 volume%.

[0119] [Example 3] The partial structure of the solar cell before and after heat treatment for Example 3 was fabricated in the same manner as in Example 1, except that a hole transport layer made of a p-type semiconductor containing MoO2 with a thickness of 50 nm was used. MoO2 was used as the deposition source and the deposition method was employed for the formation of the hole transport layer.

[0120] [Example 4] The partial structure of the solar cell before and after heat treatment for Example 4 was fabricated in the same manner as in Example 1, except that a hole transport layer made of a p-type semiconductor containing MoO3 with a thickness of 50 nm was used. MoO3 was used as the deposition source and the deposition method was employed for the formation of the hole transport layer.

[0121] [Example 5] The partial structure of the solar cell before and after heat treatment for Example 5 was fabricated in the same manner as in Example 1, except that a hole transport layer, which is a p-type semiconductor containing silver-doped NiO and has a thickness of 50 nm, was used. For the formation of the hole transport layer, a mixture of AgO and NiO, with a molar ratio of Ag to Ni of 1:99, was used as the sputtering target, and the sputtering method was used under a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90 vol%:10 vol%.

[0122] [Example 6] The partial structure of the solar cell before and after heat treatment for Example 6 was fabricated in the same manner as in Example 1, except that a hole transport layer made of a p-type semiconductor containing CuAlO2 with a thickness of 50 nm was used. For the formation of the hole transport layer, a mixture of Cu2O and Al2O3, with a molar ratio of Cu to Al of 1:1, was used as the sputtering target, and the sputtering method was used under a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90 vol%:10 vol%.

[0123] [Comparative Example 1] In Comparative Example 1, a 2 mm thick glass substrate was used. A back electrode containing metallic molybdenum was formed on this substrate to a thickness of 400 nm. For the formation of the back electrode, metallic molybdenum was used as a sputtering target, and the sputtering method was employed under an argon atmosphere. In this way, the partial structure of the solar cell before heat treatment in Comparative Example 1 was prepared.

[0124] The partial structure of the solar cell before heat treatment described above was subjected to heat treatment at 500°C for 10 minutes in a sulfur atmosphere (a mixed gas atmosphere of nitrogen gas:H2S gas = 95% by volume:5% by volume). In this way, the partial structure of the solar cell after heat treatment, as in Comparative Example 1, was fabricated.

[0125] [Comparative Example 2] In Comparative Example 2, a 2 mm thick glass substrate was used. A back electrode containing metallic molybdenum was formed on this substrate to a thickness of 400 nm. For the formation of the back electrode, metallic molybdenum was used as a sputtering target, and the sputtering method was employed under an argon atmosphere.

[0126] A conductive mirror layer containing metallic silver was formed on the back electrode with a thickness of 50 nm using the sputtering method. For the formation of the conductive mirror layer, metallic silver was used as the sputtering target, and the sputtering method was employed under an argon atmosphere. In this way, a partial structure of the solar cell before heat treatment, as in Comparative Example 2, was prepared.

[0127] The partial structure of the solar cell before heat treatment described above was subjected to heat treatment at 500°C for 10 minutes under a sulfur atmosphere (a mixed gas atmosphere of nitrogen gas:H2S gas = 95% by volume:5% by volume). In this way, the partial structure of the solar cell after heat treatment, as in Comparative Example 2, was fabricated.

[0128] [Comparative Example 3] In Comparative Example 3, a 2 mm thick glass substrate was used. A back electrode containing metallic molybdenum was formed on this substrate to a thickness of 400 nm. For the formation of the back electrode, metallic molybdenum was used as a sputtering target, and the sputtering method was employed under an argon atmosphere.

[0129] A conductive mirror underlayer containing metallic nickel was formed on the back electrode to a thickness of 50 nm using the sputtering method. For the formation of the conductive mirror underlayer, metallic nickel was used as the sputtering target, and the sputtering method was employed under an argon atmosphere.

[0130] A conductive mirror layer containing metallic silver was formed to a thickness of 50 nm on a conductive mirror substrate using the sputtering method. For the formation of the conductive mirror layer, metallic silver was used as the sputtering target, and the sputtering method was employed under an argon atmosphere. In this way, a partial structure of the solar cell before heat treatment, as in Comparative Example 3, was prepared.

[0131] The partial structure of the solar cell before heat treatment described above was subjected to heat treatment at 500°C for 10 minutes in a sulfur atmosphere (a mixed gas atmosphere of nitrogen gas:H2S gas = 95% by volume:5% by volume). In this way, the partial structure of the solar cell after heat treatment, as in Comparative Example 3, was fabricated.

[0132] For each example of a solar cell substructure, light with a wavelength range of 800-1140 nm was incident from the exposed side opposite the substrate, and the reflectivity of the light was measured. The reflectivity was measured for the substructure of the single-cell solar cells before and after heat treatment.

[0133] The results for Examples 1-6 and Comparative Examples 1-3 are shown in Table 1.

[0134] [Table 1]

[0135] It can be seen that the light reflectivity is improved by providing a conductive mirror layer, the light reflectivity is further improved by providing a conductive mirror underlayer, and the light reflectivity after heat treatment is improved by providing a hole transport layer which is a p-type semiconductor.

[0136] [Example 7] Except for using a conductive mirror layer containing metallic silver with a thickness of 25 nm, using a hole transport layer which is a p-type semiconductor containing CuAlO2 with a thickness of 10 nm, and not forming a conductive mirror underlayer, the partial structure of the solar cell of Example 7 before and after heat treatment was fabricated in the same manner as in Example 6.

[0137] [Example 8] The partial structure of the solar cell before and after heat treatment for Example 8 was fabricated in the same manner as in Example 7, except that a conductive mirror underlayer containing Al with a thickness of 25 nm was used. For the formation of the conductive mirror underlayer, Al was used as the sputtering target, and the sputtering method was used under an argon atmosphere.

[0138] [Example 9] The partial structure of the solar cell before and after heat treatment in Example 9 was fabricated in the same manner as in Example 8, except that a hole transport layer, which is a p-type semiconductor containing sodium-doped CuAlO2 and has a thickness of 10 nm, was used. For the formation of the hole transport layer, a mixture of Na2O, Cu2O, and Al2O3 was prepared with a molar ratio of Na:Cu:Al of 1:4:5, and this mixture was used as a sputtering target. The sputtering method was performed under a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90 vol%:10 vol%.

[0139] [Example 10] The partial structure of the solar cell before and after heat treatment for Example 10 was fabricated in the same manner as in Example 9, except that a 25 nm thick conductive mirror layer containing Al and a 25 nm thick conductive mirror underlayer containing Ti were used. For the formation of the conductive mirror layer, Al was used as the sputtering target and the sputtering method was used under an argon atmosphere. Similarly, for the formation of the conductive mirror underlayer, Ti was used as the sputtering target and the sputtering method was used under an argon atmosphere.

[0140] [Example 11] The partial structure of the solar cell before and after heat treatment for Example 11 was fabricated in the same manner as in Example 10, except that a conductive mirror underlayer containing Ag with a thickness of 25 nm was used. For the formation of the conductive mirror underlayer, Ag was used as the sputtering target, and the sputtering method was used under an argon atmosphere.

[0141] For each example, the heat-treated substructure of the solar cell was exposed from the side opposite the substrate, with light having a wavelength range of 800 to 1140 nm, and the reflectance of the light was measured.

[0142] The results for Examples 7-11 are shown in Table 2.

[0143] [Table 2]

[0144] Furthermore, in the same manner as in Example 11, the light reflectance after heat treatment was measured using a material in which an ITO layer, an oxide transparent conductive layer, was formed at the same position as the hole transport layer in Example 11, instead of the p-type semiconductor containing CuAlO2 with sodium elements added. As a result, the light reflectance was significantly reduced.

[0145] 3. Fabrication of solar cells [Example 12] In Example 1, a 2 mm thick glass substrate was used. A back electrode containing metallic molybdenum was formed on this substrate to a thickness of 400 nm. For the formation of the back electrode, metallic molybdenum was used as a sputtering target, and the sputtering method was employed under an argon atmosphere.

[0146] A conductive mirror layer containing metallic silver was formed on the back electrode with a thickness of 50 nm using the sputtering method. For the formation of the conductive mirror layer, metallic silver was used as the sputtering target, and the sputtering method was employed under an argon atmosphere.

[0147] A hole transport layer, a p-type semiconductor containing sodium-doped CuAlO2, was formed on a conductive mirror layer with a thickness of 10 nm using the sputtering method. For the formation of the hole transport layer, a mixture of Na2O, Cu2O, and Al2O3, with a molar ratio of Na:Cu:Al of 1:4:5, was used as the sputtering target, and the sputtering method was performed under a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90 vol%:10 vol%.

[0148] A precursor layer of the light-absorbing layer containing Cu, Ga, and In was formed on the hole transport layer using a sputtering method. Subsequently, a heat treatment was performed in a selenium atmosphere at 400°C to 600°C for 5 to 30 minutes, followed by a heat treatment in a hydrogen sulfide atmosphere at 400°C to 600°C for 5 to 30 minutes to form a light-absorbing layer containing Cu(In,Ga)(Se,S)2 (CIGSS compound). The light-absorbing layer was formed with a thickness of 2 μm.

[0149] An electron transport layer, an n-type oxide semiconductor containing titanium dioxide zinc, was formed to a thickness of 80 nm on the light absorption layer of a heat-treated laminate using the sputtering method. For the formation of the electron transport layer, a mixture of zinc dioxide and titanium dioxide was used as the sputtering target, and the sputtering method was employed under a mixed gas atmosphere (oxygen atmosphere) of argon gas:oxygen gas = 90%:10% by volume.

[0150] On this electron transport layer, a transparent electrode layer containing hydrogen-containing indium oxide (IOH) was formed to a thickness of 300 nm using a sputtering method. On the electrode layer, a grid electrode made of metallic silver was formed to a thickness of 5 μm using a vapor deposition method. In this way, the solar cell of Example 12 was prepared.

[0151] [Comparative Example 4] A solar cell for Comparative Example 4 was prepared in the same manner as in Example 12, except that a 110 nm thick oxide transparent conductive layer containing ITO was formed by sputtering, instead of a 10 nm thick p-type semiconductor hole transport layer containing sodium-doped CuAlO2.

[0152] [Measurement of conversion efficiency] For the solar cells of Example 12 and Comparative Example 4, under standard test conditions for solar cells (spectral spectrum AM1.5 light at an irradiance of 1 kW / m²), 2 The IV curve was measured under test conditions where light was incident and the solar cell temperature was 25°C. The conversion efficiency was measured from the IV curve. Conversion efficiency is the output at the optimal operating point (maximum output: P) on the IV curve. max This value is obtained by dividing ) by the light energy E received by the solar cell. Conversion efficiency (%) = P max ÷E × 100

[0153] The conversion efficiency of the solar cell in Example 12 was 12.3%. On the other hand, the conversion efficiency of the solar cell in Comparative Example 4 was 7.6%.

[0154] <Note> Embodiments of this disclosure include the following aspects: [1] The device comprises, in this order, at least, a substrate, a back electrode, a conductive mirror layer, a hole transport layer which is a p-type oxide semiconductor, and a light absorption layer. Solar cell. [2] A conductive mirror underlayer is provided between the back electrode and the conductive mirror layer. [1] The solar cell described above. [3] The conductive mirror underlayer contains a metal having a face-centered cubic lattice structure. [2] The solar cell described above. [4] The conductive mirror underlayer contains one or more elements selected from the group consisting of gold, aluminum, copper, and silver. [2] or [3] The solar cell described above. [5] The conductive mirror layer is provided on the hole transport layer, The conductive mirror underlayer is provided on the conductive mirror layer. A solar cell as described in any one of [2] to [4]. [6] The hole transport layer comprises one or more metal oxides selected from NiO, CuO, CuGaO2, CuCrO2, and CuAlO2. A solar cell as described in any one of [1] to [5]. [7] The aforementioned metal oxide is a metal oxide to which an alkali metal element has been added. [6] The solar cell described above. [8] The hole transport layer comprises CuAlO2 or CuAlO2 to which alkali metal elements are added. A solar cell as described in any one of [1] to [7]. [9] The conductive mirror layer includes one or more selected from the group consisting of gold, silver, aluminum, gold alloys, silver alloys, and aluminum alloys. A solar cell as described in any one of [1] to [8].

[10] The light-absorbing layer comprises one or more compounds selected from the group consisting of chalcopyrite compounds, kestelite compounds, and perovskite compounds. A solar cell as described in any one of [1] to [9].

[11] Multiple solar cells described in any one of [1] to

[10] are electrically connected in series or in parallel. Solar cell module.

[12] A laminate preparation step is to prepare a laminate comprising, in this order, a substrate, a back electrode, a conductive mirror layer, a hole transport layer which is a p-type semiconductor, and a precursor layer for a light absorption layer. A heat treatment step in which the laminate is heat-treated in one or more atmospheres selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere, including, A method for manufacturing solar cells.

[13] In the heat treatment step, the laminate is heat-treated at a temperature of 60 to 600°C. The manufacturing method described in

[12] . [Industrial applicability]

[0155] Because the solar cell of the present invention has improved light absorption efficiency, such as that of sunlight, it has industrial applicability as a solar cell that can be used in various environments. [Explanation of Symbols]

[0156] 100...Solar cell, 101...Substrate, 102...Back electrode, 103...Conductive mirror underlayer, 104...Conductive mirror layer, 105...Hole transport layer, 106...Light absorption layer, 107...Electron transport layer, 108...Surface electrode, 109...Transparent electrode layer, 110...Grid electrode

Claims

1. The device comprises, in this order, at least, a substrate, a back electrode, a conductive mirror layer, a hole transport layer which is a p-type oxide semiconductor, and a light absorption layer. A conductive mirror underlayer is provided between the back electrode and the conductive mirror layer. The back electrode, the conductive mirror underlayer, and the conductive mirror layer each contain different materials. The conductive mirror underlayer contains a metal, Solar cell.

2. The back electrode comprises at least one selected from the group consisting of a metallic conductive layer containing at least one selected from the group consisting of molybdenum, chromium, tungsten, and titanium; a conductive inorganic compound conductive layer containing a conductive inorganic compound other than a metal; and a conductive organic compound conductive layer made of a conductive organic compound. The solar cell according to claim 1.

3. The conductive mirror underlayer contains a metal having a face-centered cubic lattice structure. The solar cell according to claim 1.

4. The conductive mirror underlayer contains one or more elements selected from the group consisting of gold, aluminum, copper, and silver. The solar cell according to claim 3.

5. The conductive mirror layer is provided on the hole transport layer, The conductive mirror underlayer is provided on the conductive mirror layer. The solar cell according to claim 1.

6. The hole transport layer consists of NiO, CuO, and CuGaO. 2 CuCrO 2 , and CuAlO 2 It includes one or more metal oxides selected from the following: The solar cell according to claim 1.

7. The aforementioned metal oxide is a metal oxide to which an alkali metal element has been added. The solar cell according to claim 6.

8. The hole transport layer is CuAlO 2 Or CuAlO with added alkali metal elements 2 including, The solar cell according to claim 6.

9. The conductive mirror layer includes one or more selected from the group consisting of gold, silver, aluminum, gold alloys, silver alloys, and aluminum alloys. The solar cell according to claim 1.

10. The light-absorbing layer comprises one or more compounds selected from the group consisting of chalcopyrite compounds, kestelite compounds, and perovskite compounds. The solar cell according to claim 1.

11. A plurality of solar cells according to claim 1 are electrically connected in series or in parallel. Solar cell module.

12. A laminate preparation step is to prepare a laminate comprising, in this order, a substrate, a back electrode, a conductive mirror underlayer, a conductive mirror layer, a hole transport layer which is a p-type oxide semiconductor, and a precursor layer for a light absorption layer. A heat treatment step in which the laminate is heat-treated in one or more atmospheres selected from the group consisting of a sulfur atmosphere, a selenium atmosphere, a chlorine atmosphere, a bromine atmosphere, and an iodine atmosphere, Includes, The back electrode, the conductive mirror underlayer, and the conductive mirror layer each contain different materials. The conductive mirror underlayer contains a metal, A method for manufacturing solar cells.

13. In the heat treatment step, the laminate is heat-treated at a temperature of 60 to 600°C. The manufacturing method according to claim 12.

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