Wide-range vacuum measurement composite gauge tube

Abstract

A wide-range vacuum measurement composite gauge tube, comprising an ultrahigh vacuum sensing assembly (1), a medium vacuum sensing assembly (2), a low vacuum sensing assembly (3), and a shielding assembly. The shielding assembly comprises a shielding plate (4), a shielding cylinder (5), and an outer shielding flange cylinder (6), wherein the shielding plate (4) is disposed at a middle position inside the outer shielding flange cylinder (6); one end of the shielding cylinder (5) is connected to the shielding plate (4), and the other end thereof is fixed to the bottom face of the outer shielding flange cylinder (6) in a sealed and penetrating manner; the ultrahigh vacuum sensing assembly (1) is fixedly disposed above the shielding plate (4); the medium vacuum sensing assembly (2) is fixedly disposed below the shielding plate (4) and is located on one side of the shielding cylinder (5); and the low vacuum sensing assembly (3) is fixedly disposed below the shielding plate (4) and is located on the other side of the shielding cylinder (5).

Description

A wide-range vacuum measurement composite tube Technical Field

[0001] This application relates to the field of vacuum measurement technology, and more specifically, to a wide-range vacuum measurement complexing tube. Background Technology

[0002] Vacuum is a rarefied gas state with a pressure below one atmosphere. It is widely used in major projects such as semiconductors and accelerators, and is a crucial special environment for scientific research and high-end manufacturing. In integrated circuit manufacturing processes, the dynamic range of vacuum pressure is 10... -9 Pa-10 5 Pa; accelerator vacuum pressure is below 10 Pa; -8 Pa ensures beam life; high-end precision instruments and equipment, such as mass spectrometers and electron microscopes, also operate under conditions of 10 Pa. -9 Pa-10 5 Pa, all of the above areas require 10 -9 Pa-10 5 A high-precision, wide-range vacuum measuring instrument with a Pa range.

[0003] Single-principle vacuum gauges struggle to achieve wide-range vacuum pressure measurements. Domestically and internationally, it's common practice to combine sensors based on two or three principles to achieve this. Examples include Pirani gauges, piezoelectric vacuum sensors, and hot-and-cold cathode ionization vacuum gauges. The most prevalent approach combines Pirani and ionization vacuum gauges. However, neither Pirani nor ionization vacuum gauges are absolute vacuum measuring instruments; their sensitivity varies greatly with different gases and cannot be evaluated. Calibration can only be performed by simulating the vacuum environment of the application site, significantly hindering high-precision, low-cost, and efficient vacuum measurement.

[0004] Paul C. Arnold et al. invented a wide-range vacuum measuring instrument (wide-range composite vacuum gauge, 2008, US7418869) that combines an ionization vacuum gauge, a Pirani vacuum gauge, a differential pressure thin-film vacuum gauge, and a pressure gauge. The vacuum gauge includes a method for achieving 10... -7 Vacuum measurements in the Pa-2Pa range, using a Pirani vacuum gauge measuring 0.2Pa-6.5×10⁻⁶ Pa. 3 Pa, a differential pressure thin-film vacuum gauge and a pressure gauge work together to achieve 5×10 Pa. 2 Pa-10 5 The vacuum gauge uses three sensors to measure pressure from ultra-high vacuum to atmospheric pressure. However, problems such as hot cathode venting and thermal radiation, pressure difference introduced by the partition structure, and temperature error cause each sensor to be unable to accurately measure the pressure in the same measurement area. On the one hand, this causes inconsistent measurement linearity in different ranges. On the other hand, this design cannot achieve self-calibration and standardization during long-term operation of the gauge. Summary of the Invention

[0005] This application provides a wide-range vacuum measurement composite tube, capable of achieving 10 -9 Pa-10 5 It provides wide-range vacuum measurement within the Pa range and ensures effective connection of the measurement ranges of each sensing component.

[0006] To achieve the above objectives, this application provides a wide-range vacuum measurement composite tube, including an ultra-high vacuum sensing component, a medium vacuum sensing component, a low vacuum sensing component, and a shielding component. The shielding component includes a shielding plate, a shielding cylinder, and an outer shielding flange. The shielding plate is positioned in the middle of the outer shielding flange, and the shielding cylinder is positioned directly below the shielding plate. One end of the shielding cylinder is connected to the shielding plate, and the other end is fixed to the bottom surface of the outer shielding flange in a sealed, through-hole configuration. The ultra-high vacuum sensing component is an ionization-type vacuum component, fixedly positioned above the shielding plate. The medium vacuum sensing component is a medium vacuum MEMS capacitive film vacuum component, fixedly positioned below the shielding plate and located on one side of the shielding cylinder. The low vacuum sensing component is a low vacuum MEMS capacitive film vacuum component, fixedly positioned below the shielding plate and located on the other side of the shielding cylinder.

[0007] Furthermore, the outer shielding flange cylinder includes a knife-edge flange, a metal cylinder, and a Kovar base plate, wherein: the knife-edge flange is located on both sides outside the top of the metal cylinder; and the Kovar base plate is located at the bottom of the metal cylinder.

[0008] Furthermore, the ultra-vacuum sensing component includes a cathode, an anode grid, and an ion collecting electrode, wherein: the cathode is a carbon nanotube field emission electron source, which is disposed on the side of the anode grid; the anode grid is a metal grid, which is fixedly disposed above the shielding plate by means of insulation; and the ion collecting electrode is a long metal filament, which is disposed inside the anode grid and fixed on the shielding plate.

[0009] Furthermore, the vacuum sensing component includes a first shielding cover, a first MEMS diaphragm, a first temperature sensor, and a first terminal block, wherein: the first shielding cover is disposed on one side of the shielding cylinder and connected to the shielding plate by screws; the first MEMS diaphragm is disposed inside the first shielding cover, with its opening exposed to the vacuum; the first temperature sensor is disposed on the inner wall of the first shielding cover; and the first terminal block is disposed below the first MEMS diaphragm and the first temperature sensor, respectively.

[0010] Furthermore, the measurement range of the first MEMS diaphragm is 0.1 Pa - 10 Pa. 2 Pa.

[0011] Furthermore, the low vacuum sensing component includes a second shield, a second MEMS diaphragm, a second temperature sensor, and a second terminal block, wherein: the second shield is disposed on the other side of the shielding cylinder and connected to the shielding plate by screws; the second MEMS diaphragm is disposed inside the second shield, with its opening exposed to the vacuum; the second temperature sensor is disposed on the inner wall of the second shield; and the second terminal block is disposed below the second MEMS diaphragm and the second temperature sensor, respectively.

[0012] Furthermore, the measurement range of the second MEMS diaphragm is 10. 2 Pa-10 5 Pa.

[0013] Furthermore, it also includes terminals that penetrate the Kovar base plate through a vacuum seal and are connected to the first terminal and the second terminal respectively.

[0014] Furthermore, both the first MEMS film and the second MEMS film are composed of etched single-crystal silicon and glass.

[0015] Furthermore, the first and second temperature sensors enable accurate temperature measurement within the range of 0-100℃.

[0016] The wide-range vacuum measurement composite tube provided in this application has the following beneficial effects:

[0017] This application achieves wide-range, precise measurement from atmospheric pressure to ultra-high vacuum by combining low- and medium-vacuum sensing components with ultra-high vacuum components. The low- and medium-vacuum sensing components can perform absolute vacuum pressure measurement from 0.1 Pa to atmospheric pressure and can also perform in-situ calibration of gauges. The structure of the shielding plate and shielding cylinder ensures the accuracy and reliability of ion current measurement of the ultra-high vacuum component. In addition, the shielding plate also ensures that the electron trajectory is strictly constrained in the ionization region, ensuring stable sensitivity. The shielding cover protects the MEMS diaphragm from interference from surrounding electromagnetic fields and thermal radiation, ensuring stable diaphragm performance and reliable and accurate measurement results. The integration of the temperature sensor enables precise calibration and correction during the pressure data inversion process, effectively solving the technical problems of difficulty in expanding the measurement range, low sensitivity, and lack of in-situ calibration methods in the field of vacuum measurement. Attached Figure Description

[0018] The accompanying drawings, which form part of this application, are used to provide a further understanding of the application and to make other features, objects, and advantages of the application more apparent. The illustrative embodiments and descriptions of this application are used to explain the application and do not constitute an undue limitation of the application. In the drawings:

[0019] Figure 1 is a schematic diagram of the structure of a wide-range vacuum measurement complex tube provided according to an embodiment of this application;

[0020] Figure 2 is a schematic diagram of the structure of a vacuum sensing component provided according to an embodiment of this application;

[0021] Figure 3 is a schematic diagram of the structure of a low vacuum sensing component provided according to an embodiment of this application;

[0022] Figure 4 is a graph showing the calibration results of the ultra-high vacuum sensing component provided according to an embodiment of this application.

[0023] Figure 5 is a graph showing the calibration results of the vacuum sensing component according to an embodiment of this application.

[0024] Figure 6 is a graph showing the calibration results of the low vacuum sensing component provided according to an embodiment of this application.

[0025] In the figure: 1-Ultra-high vacuum sensing component, 11-Cathode, 12-Anode grid, 13-Ion collecting electrode, 2-Medium vacuum sensing component, 21-First shielding cover, 22-First MEMS diaphragm, 23-First temperature sensor, 24-First terminal block, 3-Low vacuum sensing component, 31-Second shielding cover, 32-Second MEMS diaphragm, 33-Second temperature sensor, 34-Second terminal block, 4-Shielding plate, 5-Shielding cylinder, 6-Outer shielding flange cylinder, 61-Knife flange, 62-Metal cylinder, 63-Kovar base plate, 7-Terminal block. Detailed Implementation

[0026] To enable those skilled in the art to better understand the present application, the technical solutions in the embodiments of the present application will be clearly and completely described below with reference to the accompanying drawings. Obviously, the described embodiments are only some embodiments of the present application, and not all embodiments. Based on the embodiments in the present application, all other embodiments obtained by those of ordinary skill in the art without creative effort should fall within the scope of protection of the present application.

[0027] It should be noted that the terms "first," "second," etc., in the specification, claims, and accompanying drawings of this application are used to distinguish similar objects and are not necessarily used to describe a specific order or sequence. It should be understood that such data can be interchanged where appropriate for the embodiments of this application described herein. Furthermore, the terms "comprising" and "having," and any variations thereof, are intended to cover non-exclusive inclusion; for example, a process, method, system, product, or apparatus that comprises a series of steps or units is not necessarily limited to those steps or units explicitly listed, but may include other steps or units not explicitly listed or inherent to such processes, methods, products, or apparatus.

[0028] In this application, the terms "upper," "lower," "left," "right," "front," "rear," "top," "bottom," "inner," "outer," "middle," "vertical," "horizontal," "lateral," and "longitudinal" indicate the orientation or positional relationship based on the orientation or positional relationship shown in the accompanying drawings. These terms are primarily for the purpose of better describing this application and its embodiments, and are not intended to limit the indicated device, element, or component to having a specific orientation, or to be constructed and operated in a specific orientation.

[0029] Furthermore, in addition to indicating location or positional relationship, some of the aforementioned terms may also have other meanings. For example, the term "above" may also be used in some cases to indicate a certain dependency or connection relationship. Those skilled in the art can understand the specific meaning of these terms in this application based on the specific circumstances.

[0030] In addition, the term "multiple" should mean two or more.

[0031] It should be noted that, unless otherwise specified, the embodiments and features described in this application can be combined with each other. This application will now be described in detail with reference to the accompanying drawings and embodiments.

[0032] As shown in Figure 1, this application provides a wide-range vacuum measurement composite tube, including an ultra-high vacuum sensing component 1, a medium vacuum sensing component 2, a low vacuum sensing component 3, and a shielding component. The shielding component includes a shielding plate 4, a shielding cylinder 5, and an outer shielding flange cylinder 6. The shielding plate 4 is located in the middle of the outer shielding flange cylinder 6, and the shielding cylinder 5 is located directly below the shielding plate 4. One end of the shielding cylinder 5 is connected to the shielding plate 4, and the other end is fixed to the bottom surface of the outer shielding flange cylinder 6 in a sealed, through-hole manner. The ultra-high vacuum sensing component is an ionization vacuum component, fixedly positioned above the shielding plate 4. The medium vacuum sensing component 2 is a medium vacuum MEMS capacitive film vacuum component, fixedly positioned below the shielding plate 4 and located on one side of the shielding cylinder 5. The low vacuum sensing component 3 is a low vacuum MEMS capacitive film vacuum component, fixedly positioned below the shielding plate 4 and located on the other side of the shielding cylinder 5.

[0033] Specifically, the wide-range vacuum measurement complexing tube provided in this application embodiment can achieve a range from atmospheric pressure to ultra-high vacuum (10). -9 Pa-10 5 Vacuum pressure measurement (Pa) can be equipped with different vacuum gauge control systems according to different measurement requirements. It has good electromagnetic shielding and thermal shielding effects, and high measurement accuracy. Among them, the ultra-high vacuum sensing component 1 adopts an ionization vacuum component, which can invert 10 Pa. -9Vacuum pressures in the Pa-1Pa range are affected by pressure background interference of up to 10 due to electron-induced desorption effects of ionized vacuum components, soft X-ray effects, and gas emission effects from electrode materials. -10 The Pa level enables oscillatory control of the motion trajectory, ensuring high sensitivity better than 0.1 Pa. -1 The medium vacuum sensing component 2 adopts a medium vacuum MEMS capacitive thin-film vacuum component, which can achieve a vacuum level of 0.1Pa-10. 2 Measurement of vacuum pressure within the Pa range; the low vacuum sensing component 3 adopts a low vacuum MEMS capacitive thin-film vacuum component, which can achieve 10 2 Pa-10 5 Measurement of vacuum pressure within the Pa range; In addition to its fixed support function, the shielding component mainly serves as a shield, which can effectively reduce electromagnetic field interference, thermal radiation interference and gas flow disturbance generated by charged electrodes in each vacuum sensing component; The electrostatic field formed by the shielding cylinder 5 and the shielding plate 4 can ensure that gas phase ions are effectively collected by the ion collecting electrode 13 and effectively suppress the influence of electromagnetic interference.

[0034] Furthermore, the outer shielding flange cylinder 6 includes a knife-edge flange 61, a metal cylinder 62, and a Kovar base plate 63. The knife-edge flange 61 is located on both sides of the top outer surface of the metal cylinder 62; the Kovar base plate 63 is located at the bottom of the metal cylinder 62. The outer shielding flange cylinder 6 as a whole adopts a stainless steel knife-edge sealing structure with a stainless steel-Kovar-ceramic transition seal, mainly serving a protective and shielding function. The flange is not nickel-plated, maintaining the original metallic properties of stainless steel, and the outgassing rate is less than 10%. -11 Pam 3 / s, achieving low venting.

[0035] Furthermore, the ultra-vacuum sensing component includes a cathode 11, an anode grid 12, and an ion collecting electrode 13. The cathode 11 is a carbon nanotube field emission electron source, disposed on the side of the anode grid 12; the anode grid 12 is a metal grid, fixed above the shielding plate 4 by insulation; and the ion collecting electrode 13 is a long, thin metal filament disposed inside the anode grid 12 and fixed to the shielding plate 4. Figure 4 shows the actual calibration results obtained by calibrating the ultra-vacuum sensing component on a vacuum standard device, starting from 10... -9 From Pa to 1 Pa, the ionized vacuum gauge tube exhibits good measurement linearity.

[0036] Specifically, the cathode 11 can be a thermionic emission cathode, with an operating temperature typically above 1000K. Materials can include yttrium-iridium oxide-coated wire, thorium-iridium oxide-coated wire, etc., and the structure can be a single straight filament, a V-shaped filament, or a spiral filament. The cathode 11 can also be an emission array cathode, with a macroscopic operating temperature of room temperature. Materials can include carbon nanotube arrays or metal cone-tip arrays, and the structure is typically planar or approximately point-like. In this embodiment, the cathode 11 is preferably a carbon nanotube field emission electron source, located on the side of the anode grid 12. The anode grid 12 is a metal grid, fixedly supported above the shielding plate 4 by insulation. The ion collecting electrode 13 is a long, thin metal filament. Under the influence of a high-intensity electric field, the cathode 11 extracts electrons, effectively suppressing interference from macroscopic thermal radiation and light irradiation. The emitted electrons enter the anode grid 12 and, under the combined electric field of the anode grid 12, shielding plate 4, ion collecting electrode 13, and outer shielding flange 6, the electron beam emitted by the cathode 11 oscillates reciprocally inside the anode grid 12. During the oscillation, the electrons collide with gas molecules and ionize. The ions are then collected by the ion collecting electrode 13 under the influence of the electric field, resulting in the inversion of electron beam 10. -9 Vacuum pressure in the range of Pa-1Pa.

[0037] More specifically, in this embodiment, the cathode 11 is a carbon nanotube electron source, which has advantages such as no thermal effect and fast response. It is installed outside the anode grid 12 with a spacing of 1.5 mm, and the top of the cathode 11 is 5 mm away from the top of the anode grid 12. The anode is a cage-like grid made of platinum-iridium alloy with a diameter of 22 mm, a height of 50 mm, and a pitch of 3 mm. The anode grid 12 is connected to the conductive core post by resistance welding. The shielding plate 4 has a diameter of 30 mm and a 2 mm conical hole in the center. The ion collecting electrode 13 is a 0.05 mm tungsten wire located on the central axis of the cage-like grid, which has good ion collecting efficiency. A grounded shielding cylinder 5 is set outside the ion collecting electrode 13, and the shielding plate 4 is fixed on the top of the shielding cylinder 5. This can effectively suppress the interference of the electromagnetic field in the ionization space on the gas phase ions, and also ensure the effective movement path of electrons based on the unique electromagnetic field structure.

[0038] Furthermore, as shown in Figure 2, the vacuum sensing component 2 includes a first shielding cover 21, a first MEMS diaphragm 22, a first temperature sensor 23, and a first terminal block 24, wherein: the first shielding cover 21 is disposed on one side of the shielding cylinder 5 and is connected to the shielding plate 4 by screws; the first MEMS diaphragm 22 is disposed inside the first shielding cover 21, with its opening exposed to the vacuum; the first temperature sensor 23 is disposed on the inner wall of the first shielding cover 21; and the first terminal block 24 is disposed below the first MEMS diaphragm 22 and the first temperature sensor 23, respectively.

[0039] Furthermore, the measurement range of the first MEMS diaphragm 22 is 0.1 Pa - 10 Pa. 2Pa.

[0040] Furthermore, as shown in Figure 3, the low vacuum sensing component 3 includes a second shielding cover 31, a second MEMS diaphragm 32, a second temperature sensor 33, and a second terminal block 34, wherein: the second shielding cover 31 is disposed on the other side of the shielding cylinder 5 and is connected to the shielding plate 4 by screws; the second MEMS diaphragm 32 is disposed inside the second shielding cover 31, with its opening exposed to the vacuum; the second temperature sensor 33 is disposed on the inner wall of the second shielding cover 31; and the second terminal block 34 is disposed below the second MEMS diaphragm 32 and the second temperature sensor 33, respectively.

[0041] Furthermore, the measurement range of the second MEMS diaphragm 32 is 10. 2 Pa-10 5 Pa.

[0042] Specifically, both the medium vacuum sensing component 2 and the low vacuum sensing component 3 adopt a MEMS capacitive thin-film vacuum structure, including a shield, a MEMS diaphragm, a temperature sensor, and terminals. Two MEMS capacitive thin-film vacuum components with different measurement ranges are symmetrically arranged below the shielding plate 4. The MEMS diaphragm, made of silicon-based material, is fixed on a ceramic base and connected to the terminal block 7 below via terminals. A surface-mount temperature sensor is fixed to the upper surface of the shield. The dual-capacitor differential measurement mode design suppresses measurement errors introduced by temperature changes. The shield and shielding plate 4 are connected by screws to achieve equipotentiality and mechanical fixation. The outer surface of the shield is highly polished, exhibiting high thermal radiation emission characteristics, effectively suppressing the thermal effect from the ionized vacuum component. The MEMS diaphragm opening is exposed to the vacuum, and gas molecules generate macroscopic pressure within the MEMS diaphragm. The vacuum pressure is inferred from the deformation of the diaphragm. The first MEMS diaphragm 22 has a measurement range of 0.1 Pa - 10 Pa. 2 Figure 5 shows the actual calibration results of the medium vacuum sensing component 2 on the vacuum standard device, which completed the calibration from 0.1 Pa to 10 Pa. 2 Accurate pressure measurement within the Pa range, exhibiting good linearity; the second MEMS diaphragm 32 has a measurement range of 10. 2 Pa-10 5 Pa, as shown in Figure 6, represents the actual calibration results of the low vacuum sensing component 3 on the vacuum standard device, completing 10 2 Pa-10 5 The pressure measurement within the Pa range is accurate and exhibits good linearity; the temperature sensor is attached to the inner wall of the shield to achieve accurate temperature measurement of rarefied gas in a local space, which is applied to correct the heat flow effect caused by temperature difference in MEMS capacitor thin film components.

[0043] Furthermore, it also includes a terminal block 7, which penetrates the Kovar base plate 63 through a vacuum seal. The terminal block 7 is connected to the first terminal block 24 and the second terminal block 34 respectively. The terminal block 7 extends through the Kovar base plate 63 at the bottom of the metal cylinder 62 and is connected to the terminal block, providing electrical and mechanical connections for the MEMS diaphragm, the shielding cylinder 5, and the temperature sensor.

[0044] Furthermore, both the first MEMS diaphragm 22 and the second MEMS diaphragm 32 are composed of etched single-crystal silicon and glass. The MEMS diaphragms are mainly used for pressure sensing in the low to medium vacuum range.

[0045] Furthermore, the first temperature sensor 23 and the second temperature sensor 33 achieve accurate temperature measurement within the range of 0-100℃. The temperature sensors are used for direct measurement of the local temperature of the low-to-medium vacuum sensing components, with a measurement range of 0-100℃, and are used for accurate correction during the pressure inversion process.

[0046] Specifically, the wide-range vacuum measurement complexing tube measurement range provided in this application embodiment covers 10 -9 Pa-10 5 Pa achieves full-range measurement from atmospheric pressure to ultra-high vacuum, and can complete in-situ calibration of ionized vacuum components using MEMS capacitor film vacuum structure, solving the problem of the inability to connect and fuse measurement data from different sensors in wide-range vacuum measuring instruments; at the same time, it incorporates temperature measurement function, effectively overcoming the long-standing influence of heat flow induced by the thermal effect of ionized vacuum gauge, and can achieve accurate temperature correction during pressure data inversion.

[0047] The above description is merely a preferred embodiment of this application and is not intended to limit this application. Various modifications and variations can be made to this application by those skilled in the art. Any modifications, equivalent substitutions, improvements, etc., made within the spirit and principles of this application should be included within the protection scope of this application.

Claims

1. A wide-range vacuum measurement compressive tube, characterized in that, This includes ultra-high vacuum sensing components, medium vacuum sensing components, low vacuum sensing components, and shielding components, among which: The shielding assembly includes a shielding plate, a shielding cylinder, and an outer shielding flange cylinder. The shielding plate is located in the middle of the outer shielding flange cylinder, and the shielding cylinder is located directly below the shielding plate. One end of the shielding cylinder is connected to the shielding plate, and the other end is fixed to the bottom surface of the outer shielding flange cylinder in a sealed through manner. The ultra-vacuum sensing component is an ionization vacuum component, which is fixedly installed above the shielding plate; The medium vacuum sensing component is a medium vacuum MEMS capacitive thin film vacuum component, which is fixedly installed below the shielding plate and located on one side of the shielding cylinder. The low vacuum sensing component is a low vacuum MEMS capacitive thin-film vacuum component, which is fixedly installed below the shielding plate and located on the other side of the shielding cylinder.

2. The wide-range vacuum measurement compatibility tube according to claim 1, characterized in that, The outer shielding flange cylinder includes a knife-edge flange, a metal cylinder, and a Kovar base plate, wherein: The knife-edge flanges are located on both sides outside the top of the metal cylinder; The Kovar base plate is located at the bottom of the metal cylinder.

3. The wide-range vacuum measurement compensating tube according to claim 2, characterized in that, The ultra-vacuum sensing component includes a cathode, an anode grid, and an ion collecting electrode, wherein: The cathode is a carbon nanotube field emission electron source, which is disposed on the side of the anode grid; The anode grid is a metal grid, which is fixedly installed above the shielding plate in an insulating manner; The ion collector is a long, thin metal filament disposed inside the anode grid and fixed to the shielding plate.

4. The wide-range vacuum measurement compensating tube according to claim 3, characterized in that, The vacuum sensing component includes a first shielding cover, a first MEMS diaphragm, a first temperature sensor, and a first terminal block, wherein: The first shielding cover is disposed on one side of the shielding cylinder and is connected to the shielding plate by screws; The first MEMS diaphragm is disposed inside the first shielding cover, with its opening exposed to a vacuum; The first temperature sensor is disposed on the inner wall of the first shielding cover; The first wiring terminals are respectively located below the first MEMS diaphragm and the first temperature sensor.

5. The wide-range vacuum measurement compensating tube according to claim 4, characterized in that, The measurement range of the first MEMS membrane is 0.1 Pa - 10 Pa. 2 Pa.

6. The wide-range vacuum measurement compensating tube according to claim 5, characterized in that, The low-vacuum sensing component includes a second shield, a second MEMS diaphragm, a second temperature sensor, and a second terminal block, wherein: The second shielding cover is disposed on the other side of the shielding cylinder and is connected to the shielding plate by screws; The second MEMS diaphragm is disposed inside the second shielding cover, with its opening exposed to a vacuum; The second temperature sensor is disposed on the inner wall of the second shielding cover; The second wiring terminals are respectively located below the second MEMS diaphragm and the second temperature sensor.

7. The wide-range vacuum measurement compensating tube according to claim 6, characterized in that, The measurement range of the second MEMS diaphragm is 10. 2 Pa-10 5 Pa.

8. The wide-range vacuum measurement compensating tube according to claim 7, characterized in that, It also includes terminals that penetrate the Kovar base plate through a vacuum seal and are connected to the first terminal and the second terminal, respectively.

9. The wide-range vacuum measurement compensating tube according to claim 8, characterized in that, Both the first MEMS film and the second MEMS film are composed of etched single-crystal silicon and glass.

10. The wide-range vacuum measurement compressive tube according to claim 9, characterized in that, The first temperature sensor and the second temperature sensor enable accurate temperature measurement within the range of 0-100℃.

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