A high-temperature material planar oxide layer processor

Abstract

The present invention discloses a high-temperature material planar oxide layer processing machine, and the technical solution thereof mainly comprises a transport component, a polishing component, a resistance component, a processing frame and a frame, wherein the transport component is mounted at the front end of the processing frame, the resistance component is located at the rear end of the processing frame, the transport component is directly opposite to the resistance component, the processing frame is telescopically mounted on the frame, the polishing component is arranged between the transport component and the resistance component, the polishing component is provided with an upper polishing wheel and a lower polishing wheel, the upper polishing wheel and the lower polishing wheel are synchronously driven by a first driving motor, the upper polishing wheel is telescopically arranged on the frame, the upper polishing wheel and the lower polishing wheel are aligned up and down, and the resistance head of the resistance component is aligned with the polishing portion between the upper polishing wheel and the lower polishing wheel.

Description

Technical Field

[0001] The invention relates to the field of machinery, and more particularly to a high-temperature material planar oxide layer processing machine. Background Art

[0002] Currently, polishing machines have been widely used in metal surface treatment. However, the current polishing machines do not have much guarantee for the safety performance of the device during the polishing process. Often, during the polishing process, the polished parts fly out due to the excessively fast polishing speed, thus causing harm to the human body. However, the current polishing machines on the market do not effectively solve the above problems. Therefore, it is very necessary to design a processor with higher safety performance, which can match different heights and widths and can thoroughly treat the surface oxide layer. Summary of the invention

[0003] In view of the shortcomings of the prior art, the purpose of the present invention is to provide a high-temperature material flat oxide layer processing machine that can achieve high safety performance, match different heights and widths, and process the surface oxide layer more thoroughly.

[0004] To achieve the above object, the present invention provides the following technical solutions:

[0005] This high-temperature material planar oxide layer processing machine includes a transport component, a polishing component, a resistance component, a processing frame and a frame, wherein the transport component is mounted at the front end of the processing frame, the resistance component is located at the rear end of the processing frame, the transport component is directly opposite to the resistance component, the processing frame is telescopically mounted on the frame, the polishing component is arranged between the transport component and the resistance component, the polishing component is provided with an upper polishing wheel and a lower polishing wheel, the upper polishing wheel and the lower polishing wheel are synchronously driven by a first driving motor, the upper polishing wheel is telescopically arranged on the frame, the upper polishing wheel and the lower polishing wheel are aligned up and down, and the resistance head of the resistance component is aligned with the polishing portion between the upper polishing wheel and the lower polishing wheel.

[0006] Furthermore, the resistance assembly includes a sliding rod, a sliding frame, a sliding plate, a telescopic cylinder, a resistance rod, a reset plate, a fixed plate and a limit protection plate, the sliding rod is fixed on both side ends of the processing frame, the sliding frame is fixed to the bottom of the sliding plate, the sliding frame is mounted on the sliding rod, the telescopic head of the telescopic cylinder is fixed to the sliding plate, the sliding plate is provided with a resistance rod, the resistance rod passes through a limit block, the limit block is fixed to the sliding plate, the bottom of the resistance rod is provided with a baffle for limiting, the fixing plates are provided on both sides of the resistance rod, the fixing plates are fixed to the sliding plate, the fixing plates are provided with threaded holes, the limit protection plate is screwed to the fixing plate, the rear end of the resistance rod faces the automatic reset plate, and the bottom of the automatic reset plate is fixed to the reset rod.

[0007] Furthermore, the transport assembly includes a conveyor belt driven by a second drive motor and a roller arranged at the front end of the conveyor belt. The processing frames on the two side walls of the conveyor belt are removably provided with baffles inclined inward, and the baffles are removably fixed with limit protection plates. The roller is arranged between the conveyor belt and the lower polishing wheel.

[0008] Furthermore, the polishing assembly includes an upper polishing wheel, a lower polishing wheel and a first drive motor, the upper polishing wheel and the lower polishing wheel are respectively connected to an upper driven wheel and a lower driven wheel through a universal joint coupling, the upper driven wheel and the lower driven wheel are connected through a chain, the first drive motor is connected to a driving wheel through a chain, the driving wheel is coaxially connected to the upper driven wheel or the lower driven wheel, and the upper driven wheel and the lower driven wheel are located in a drive box.

[0009] Furthermore, rotating seats are provided on both sides of the upper polishing wheel, the two rotating seats are inserted into the sides of the frame, the upper ends of the rotating seats are against the bottom of the screw rod, the screw rod is screwed to the frame, and the first spring is fixed at the lower end of the rotating seat, and the other end of the first spring is fixed to the frame.

[0010] Furthermore, the processing frame is provided with four fixed seats, which are respectively inserted into the movable grooves of the frame, the upper ends of the fixed seats abut against the bottom of the screw rod, the screw rod is threadedly connected to the movable groove, the lower end of the fixed seat is fixed with a second spring, and the other end of the second spring is fixed in the movable groove.

[0011] Furthermore, a downwardly inclined export plate is provided in the frame, the upper end of the export plate is an abutment component, and the top of the export plate faces the outlet of the lower polishing wheel.

[0012] Furthermore, an electric control box is fixed on the frame, the electric control box is electrically connected to the telescopic cylinder, the first drive motor and the second drive motor, and the electric control box is provided with control buttons corresponding to the telescopic cylinder, the first drive motor and the second drive motor respectively.

[0013] Beneficial effects of the present invention:

[0014] 1. The fixed plate and the baffle plate are removably provided with limit protection plates to match the workpieces of different widths and heights to prevent the workpieces from tilting or flying during the surface treatment process due to height or width mismatch, thus causing safety accidents;

[0015] 2. The upper polishing wheel can be moved up and down by rotating the screw, and the processing frame can be moved up and down as a whole by rotating the screw. The upper polishing wheel can be moved up and down to match the workpieces of different heights. The up and down movement of the overall processing frame is equivalent to the up and down movement of the lower polishing wheel, so the service life can be increased;

[0016] 3. Through the combined use of sliding rods, slides, slide plates, telescopic cylinders, resistance rods, reset plates, fixed plates and limit protection plates, the telescopic cylinder drives the resistance rods and reset plates to move back and forth. After the workpiece passes through the upper polishing wheel and the lower polishing wheel, it is supported by the limit protection plate and supported by the telescopic cylinder so that it moves forward slowly, thereby extending the surface treatment time and making the processing surface treatment more thorough. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a schematic diagram of the three-dimensional structure of the present invention;

[0018] Figure 2 It is a schematic diagram of the three-dimensional structure of the present invention;

[0019] Figure 3 It is a schematic plan view of the interference assembly of the present invention.

[0020] 1. Drawing reference numerals: 1. frame; 10. movable groove; 11. screw rod; 12. second spring; 13. first spring; 2. processing frame; 20. fixed seat; 21. baffle plate; 210. limit protection plate; 30. telescopic cylinder; 300. telescopic head; 31. slide bar; 32. slide plate; 33. slide frame; 34. fixed plate; 35. automatic reset plate; 36. resistance rod; 360. baffle plate; 37. limit block; 38. reset rod; 40. lower polishing wheel; 41. upper polishing wheel; 410. rotating seat; 42. first drive motor; 50. roller; 51. second drive motor; 52. conveyor belt; 6. electric control box; 60. control button; 7. export plate. DETAILED DESCRIPTION

[0021] The present invention is further described in detail below in conjunction with the accompanying drawings and embodiments. The same parts are represented by the same reference numerals. It should be noted that the words "front", "rear", "left", "right", "upper" and "lower" used in the following description refer to directions in the accompanying drawings, and the words "bottom surface" and "top surface", "inner" and "outer" refer to directions toward or away from the geometric center of a specific component, respectively.

[0022] Reference Figures 1 to 3As shown in the figure, the working principle of this embodiment is as follows: After the workpiece to be processed is placed on the conveyor belt 52, it is driven to pass through the limit protection plate 210 of the matching processing rack 2 for limiting, and then introduced between the upper polishing wheel 41 and the lower polishing wheel 40. After the top of the workpiece to be processed passes through the upper polishing wheel 41 and the lower polishing wheel 40, it will be resisted by the limit protection plate 210. The telescopic cylinder 30 gives a resisting force to the limit protection plate 210. Since when the workpiece to be processed passes between the upper polishing wheel 41 and the lower polishing wheel 40, it will be driven to generate a forward force. Therefore, the telescopic cylinder 30 and the limit protection plate 210 are provided to resist, which can extend the processing time and make the processing thorough. The limit protection plate 210 can prevent the workpiece from flying out due to too fast rotation speed. After the workpiece to be processed is completely processed and separated from the upper polishing wheel 41 and the lower polishing wheel 40, it will also automatically separate from the limit protection plate 210, and the workpiece to be processed is exported from the lower export plate 7.

[0023] This high-temperature material planar oxide layer processing machine includes a transportation component, a polishing component, a resisting component, a processing rack 2 and a machine frame 1. The transportation component is installed at the front end of the processing rack 2, the resisting component is located at the rear end of the processing rack 2, the transportation component faces the resisting component, the processing rack 2 is telescopically installed on the machine frame 1, the polishing component is arranged between the transportation component and the resisting component, the polishing component is provided with an upper polishing wheel 41 and a lower polishing wheel 40, the upper polishing wheel 41 and the lower polishing wheel 40 are synchronously driven by a first driving motor 42, the upper polishing wheel 41 is telescopically arranged on the machine frame 1, the upper polishing wheel 41 and the lower polishing wheel 40 are aligned up and down, and the resisting head of the resisting component is aligned with the polishing part between the upper polishing wheel 41 and the lower polishing wheel 40.

[0024] The synchronous driving of the upper polishing wheel 41 and the lower polishing wheel 40 belongs to the prior art, and the present invention will not elaborate on it.

[0025] Refer to Figure 1 As shown in Fig. 2 or Fig. 3, as a specific improvement embodiment, the resisting component includes a slide bar 31, a slide frame 33, a slide plate 32, a telescopic cylinder 30, a resisting rod 36, a reset plate, a fixing plate 34 and a limit protection plate 210. The slide bar 31 is fixed on both side ends of the processing rack 2. The bottom of the slide plate 32 is fixed with the slide frame 33. The slide frame 33 is installed on the slide bar 31. The telescopic head 300 of the telescopic cylinder 30 is fixed with the slide plate 32. The slide plate 32 is provided with a resisting rod 36. The resisting rod 36 passes through a limit block 37. The limit block 37 is fixed on the slide plate 32. A retaining piece 360 for limiting is arranged at the bottom of the resisting rod 36. The two sides of the resisting rod 36 are provided with the fixing plates 34. The fixing plates 34 are fixed on the slide plate 32. The fixing plates 34 are provided with threaded holes. The limit protection plate 210 is screwed with the fixing plates 34. The rear end of the resisting rod 36 faces an automatic reset piece 35. The bottom of the automatic reset piece 35 is fixed with a reset rod 38.

[0026] When the workpiece to be processed contacts the contact rod 36 and drives the contact rod 36 to move backward, and the rear end of the contact rod 36 contacts the automatic reset piece 35. The contact rod 36 plays a preliminary contact role to prevent the workpiece to be processed from deviating or tilting before contacting the limit protection plate 210. After the preliminary contact by the contact rod 36, it acts on the limit protection plate 210. The rear end of the limit protection plate 210 is connected to the telescopic cylinder 30. The telescopic cylinder 30 gives a forward force to slowly move the workpiece to be processed out from between the upper polishing wheel 41 and the lower polishing wheel 40, increasing the processing time of the workpiece and making the processing more thorough. After the processing is completed, the workpiece drops, and the contact rod 36 is automatically reset through the automatic reset piece 35.

[0027] The reset rod 38 is internally provided with a reset spring to achieve the effect of automatic reset.

[0028] Refer to Figure 2 As shown in the figure, as a specific embodiment of the improvement, the transportation component includes a conveyor belt 52 driven by a second drive motor 51 and rollers 50 arranged at the front end of the conveyor belt 52. The processing frames 2 on both side walls of the conveyor belt 52 are detachably provided with baffles 21 inclined inward. The limit protection plate 210 is detachably fixed on the baffle 21. The rollers 50 are arranged between the conveyor belt 52 and the lower polishing wheel 40.

[0029] The conveying method of driving the conveyor belt 52 by the drive motor belongs to the prior art, and the present invention will not elaborate on it.

[0030] The second drive motor 51 drives the conveyor belt 52 to transport forward. The workpiece to be processed is transported through the conveyor belt 52. Through the diversion and limitation of the limit protection plate 210, the workpiece to be processed will not deviate and will not cause accidents due to insufficient width or height. After passing through the limit protection plate 210, it is introduced between the upper polishing wheel 41 and the lower polishing wheel 40.

[0031] Refer to Figures 1 to 2 As shown in the figure, as a specific embodiment of the improvement, the polishing component includes an upper polishing wheel 41, a lower polishing wheel 40, and a first drive motor 42. The upper polishing wheel 41 and the lower polishing wheel 40 are respectively connected to the upper driven wheel and the lower driven wheel through universal joint couplings. The upper driven wheel and the lower driven wheel are connected by a chain. The first drive motor 42 is connected to the driving wheel through a chain. The driving wheel is coaxially connected to the upper driven wheel or the lower driven wheel. The upper driven wheel and the lower driven wheel are located in the drive box.

[0032] The upper polishing wheel 41 and the lower polishing wheel 40 are synchronously driven through the universal joint coupling and can adjust the height of the upper polishing wheel 41 or the lower polishing wheel 40 without affecting the rotation driven by the motor. The universal joint coupling belongs to the prior art, and the present invention will not elaborate on it.

[0033] Refer to Figure 1As shown, as an improved specific implementation method, rotating seats 410 are provided on both sides of the upper polishing wheel 41, and the two rotating seats 410 are inserted into the sides of the frame 1. The upper ends of the rotating seats 410 abut against the bottom of the screw 11, and the screw 11 is screwed to the frame 1. The lower end of the rotating seat 410 is fixed with a first spring 13, and the other end of the first spring 13 is fixed to the frame 1.

[0034] The rotating seat 410 is moved downward by rotating the screw rod 11 , and the first spring 13 provides an upward force to the rotating seat 410 for support and space for downward movement.

[0035] Reference Figure 1 As shown, as an improved specific implementation, the processing frame 2 is provided with four fixed seats 20, and the fixed seats 20 are respectively inserted into the movable grooves 10 of the frame 1, the upper ends of the fixed seats 20 abut against the bottom of the screw rod 11, and the screw rod 11 is screwed with the movable groove 10, and the lower end of the fixed seat 20 is fixed with the second spring 12, and the other end of the second spring 12 is fixed in the movable groove 10.

[0036] Four screw rods 11 are provided, and the fixing seat 20 is moved downward as a whole by rotating the screw rods 11 , and the upward force of the second spring 12 is used to support and provide space for downward movement.

[0037] Reference Figure 1 As shown, as an improved specific implementation, a downwardly inclined export plate 7 is provided in the frame 1, the upper end of the export plate 7 is an abutment component, and the top of the export plate 7 faces the outlet of the lower polishing wheel 40.

[0038] The export plate 7 is used to allow the workpiece to be processed to break away from the limiting protection plate 210 and fall out on the export plate 7 after processing is completed.

[0039] Reference Figures 1 to 2 As shown, as an improved specific implementation, an electric control box 6 is fixed on the frame 1, and the electric control box 6 is electrically connected to the telescopic cylinder 30, the first drive motor 42 and the second drive motor 51, and the electric control box 6 is provided with control buttons 60 corresponding to the telescopic cylinder 30, the first drive motor 42 and the second drive motor 51 respectively.

[0040] The electric control box 6 is arranged to realize the overall control effect, which is more intelligent and precise.

[0041] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. A high temperature material flat oxide layer processing machine, Features: The invention comprises a transport component, a polishing component, a resistance component, a processing frame (2) and a frame (1), wherein the transport component is mounted at the front end of the processing frame (2), the resistance component is located at the rear end of the processing frame (2), the transport component is directly opposite to the resistance component, the processing frame (2) is telescopically mounted on the frame (1), the polishing component is arranged between the transport component and the resistance component, the polishing component is provided with an upper polishing wheel (41) and a lower polishing wheel (40), the upper polishing wheel (41) and the lower polishing wheel (40) are synchronously driven by a first driving motor (42), the upper polishing wheel (41) is telescopically arranged on the frame (1), the upper polishing wheel (41) and the lower polishing wheel (40) are aligned vertically, and the resistance head of the resistance component is aligned with the polishing portion between the upper polishing wheel (41) and the lower polishing wheel (40); The resistance assembly comprises a slide bar (31), a slide frame (33), a slide plate (32), a telescopic cylinder (30), a resistance rod (36), a reset plate, a fixed plate (34) and a limit protection plate (210), wherein the slide bar (31) is fixed on both side ends of the processing frame (2), the slide frame (33) is fixed at the bottom of the slide plate (32), the slide frame (33) is mounted on the slide bar (31), the telescopic head (300) of the telescopic cylinder (30) is fixed to the slide plate (32), and a resistance rod (36) is provided on the slide plate (32), and the resistance rod (36) passes through A limit block (37), wherein the limit block (37) is fixed on the slide plate (32), a stopper (360) for limiting is provided at the bottom of the abutment rod (36), the fixing plates (34) are provided on both sides of the abutment rod (36), the fixing plates (34) are fixed on the slide plate (32), the fixing plates (34) are provided with threaded holes, the limit protection plate (210) is screwed to the fixing plates (34), the rear end of the abutment rod (36) faces the automatic reset plate (35), and the bottom of the automatic reset plate (35) is fixed to the reset rod (38); The transport assembly comprises a conveyor belt (52) driven by a second drive motor (51) and a roller (50) arranged at the front end of the conveyor belt (52); baffles (21) inclined inwardly can be detachably provided on the processing frames (2) on both side walls of the conveyor belt (52); a limit protection plate (210) can be detachably fixed on the baffles (21); and the roller (50) is arranged between the conveyor belt (52) and the lower polishing wheel (40); The processing frame (2) is provided with four fixed seats (20), and the fixed seats (20) are respectively inserted into the movable grooves (10) of the frame (1), the upper ends of the fixed seats (20) abut against the bottom of the screw rod (11), and the screw rod (11) is screwed to the movable groove (10), and the lower end of the fixed seat (20) is fixed with a second spring (12), and the other end of the second spring (12) is fixed in the movable groove (10).

2. A high temperature material planar oxide layer treatment machine according to claim 1, Features: The polishing assembly includes an upper polishing wheel (41), a lower polishing wheel (40), and a first driving motor (42). The upper polishing wheel (41) and the lower polishing wheel (40) are respectively connected to an upper driven wheel and a lower driven wheel through universal joint couplings. The upper driven wheel and the lower driven wheel are connected by a chain. The first driving motor (42) is connected to a driving wheel through a chain. The driving wheel is coaxially connected to the upper driven wheel or the lower driven wheel. The upper driven wheel and the lower driven wheel are located inside a driving box.

3. The planar oxide layer processing machine for high-temperature materials according to claim 1 or 2, characterized in that: Rotating seats (410) are provided on both sides of the upper polishing wheel (41). The two rotating seats (410) are inserted into the side surface of the frame (1). The upper ends of the rotating seats (410) abut against the bottom of the screw rod (11). The screw rod (11) is screwed to the frame (1). The lower ends of the rotating seats (410) are fixed with first springs (13). The other ends of the first springs (13) are fixed to the frame (1).

4. The planar oxide layer processing machine for high-temperature materials according to claim 1, characterized in that: A downwardly inclined discharge plate (7) is provided inside the frame (1). The upper end of the discharge plate (7) is a abutting assembly. The top of the discharge plate (7) faces the outlet of the lower polishing wheel (40).

5. The planar oxide layer processing machine for high-temperature materials according to claim 1 or 2 or 4, characterized in that: An electric control box (6) is fixed on the frame (1). The electric control box (6) is electrically connected to the telescopic cylinder (30), the first driving motor (42), and the second driving motor (51). And the electric control box (6) is provided with control buttons (60) corresponding to the telescopic cylinder (30), the first driving motor (42), and the second driving motor (51) respectively.

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