Absorption analysis device and program recording medium recording a program for the absorption analysis device

Abstract

Provided are an absorbance analysis device and a program recording medium for recording a program for the absorbance analysis device. The absorbance analysis device comprises a detector; a total pressure sensor; an absorbance calculation unit, which calculates absorbance based on an output value of the detector and a preset zero reference value; a partial pressure-absorbance relationship storage unit, which stores partial pressure-absorbance relationship data indicating the relationship between the partial pressure of an interfering gas present in a measurement region of the detector during zeroing and the absorbance calculated by the absorbance calculation unit; a partial pressure calculation unit, which calculates the interfering gas partial pressure as the partial pressure of the interfering gas based on the total pressure and concentration measured by the total pressure sensor when the interfering gas of known concentration is present in the measurement region; an absorbance inference unit, which infers the interfering gas absorbance as the absorbance of the interfering gas based on the interfering gas partial pressure and the partial pressure-absorbance relationship data; and a calibration unit, which performs zeroing to update the zero reference value based on the interfering gas absorbance and the output value of the detector under the known concentration state.

Description

Technical Field

[0001] The present invention relates to an absorption analysis device and a program recording medium recording a program for the absorption analysis device. Background Art

[0002] Conventionally, an absorption analysis device installed in a semiconductor production line and used to measure the concentration of a source gas supplied to a chamber of a film forming apparatus includes a detector for detecting the intensity of light transmitted through the gas and a total pressure sensor for measuring the total pressure of the gas.

[0003] It should be noted that the structure of the above-mentioned detector includes, for example: a light source that irradiates light to the gas; a filter that transmits light of a wavelength absorbed by the material gas (hereinafter also referred to as the measurement wavelength) within the wavelength range of the light emitted from the light source; and a light receiving part that detects the intensity of the light of the measurement wavelength that passes through the gas.

[0004] Furthermore, in the above-mentioned conventional absorption analysis apparatus, when zeroing the detector, it is necessary to create a state in which a gas that absorbs light of the measurement wavelength (hereinafter also referred to as interference gas) does not exist in the measurement area of ​​the detector. Therefore, in the conventional absorption analysis apparatus, the detector is zeroed by evacuating the detector or purging the detector with a gas that does not absorb light of the measurement wavelength (for example, N2 gas) to create the above state.

[0005] However, in the above-mentioned conventional semiconductor production line equipped with an absorption analysis device, the above-mentioned state may not be achieved due to process flow reasons, and in this case, the detector cannot be zeroed. It should be noted that if the state in which the detector cannot be zeroed continues for a long time, the influence of drift becomes greater, and there is a problem that the measurement accuracy of the absorption analysis device is reduced.

[0006] Prior art literature

[0007] Patent Literature

[0008] Patent Document 1: Japanese Patent Application Publication No. 2014-224307 Summary of the invention

[0009] Technical issues

[0010] Therefore, a main object of the present invention is to enable zero adjustment in an absorption analysis device even when an interfering gas exists in a measurement region of a detector.

[0011] Technical Solution

[0012] That is, the absorbance analysis device of the present invention comprises: a detector for detecting the intensity of light transmitted through a gas; a total pressure sensor for measuring the total pressure of the gas; an absorbance calculation unit for calculating the absorbance based on the output value of the detector and a preset zero reference value; a partial pressure-absorbance relationship storage unit for storing partial pressure-absorbance relationship data indicating the relationship between the partial pressure of the interfering gas present in the measuring region of the detector when zeroing and the absorbance calculated by the absorbance calculation unit; a partial pressure calculation unit for calculating the interfering gas partial pressure as the partial pressure of the interfering gas based on the total pressure measured by the total pressure sensor and the concentration when the interfering gas of a known concentration is present in the measuring region; an absorbance inference unit for inferring the interfering gas absorbance as the absorbance of the interfering gas based on the interfering gas partial pressure and the partial pressure-absorbance relationship data; and a calibration unit for performing zeroing to update the zero reference value based on the interfering gas absorbance and the output value of the detector in the known concentration state.

[0013] If so, in a known concentration state where an interfering gas having a known concentration exists in the measurement region, the interfering gas partial pressure as the partial pressure of the interfering gas is calculated based on the total pressure measured by the total pressure sensor and the above concentration, the interfering gas absorbance as the absorbance of the interfering gas is inferred based on the interfering gas partial pressure and pre-stored partial pressure-absorbance relationship data indicating the relationship between the interfering gas partial pressure and absorbance, and the zeroing is configured to update the zero reference value based on the interfering gas absorbance and the output value of the detector in the above known concentration state, so that zeroing can be performed even if a state where no interfering gas exists in the measurement region of the detector is created. As a result, the detector can be zeroed regularly without stopping the process flow, and the analysis accuracy of the absorption analysis device can be maintained without reduction.

[0014] It should be noted that the interfering gas used for zero adjustment in the present invention has absorption at the measurement wavelength of the detector and has a known concentration.

[0015] As a specific configuration of the correction unit, the correction unit performs zero adjustment to update the zero reference value to I0 calculated by the following mathematical formula 1.

[0016]

Mathematical formula 1

[0017] I0=I×10 A

[0018] Wherein, I is the output value of the detector detected under the above-mentioned known concentration state, and A is the absorbance of the above-mentioned interfering gas.

[0019] Furthermore, in the case where span calibration is performed in addition to zeroing the detector, the absorbance calculation unit may calculate the normalized absorbance based on the output value of the detector, the zero reference value and a preset span absorbance; the partial pressure-absorbance relationship storage unit stores partial pressure-normalized absorbance relationship data representing the relationship between the partial pressure of the interfering gas present in the measuring area of ​​the detector when zeroing and the normalized absorbance calculated by the absorbance calculation unit; the partial pressure calculation unit calculates the partial pressure of the interfering gas in a first partial pressure state and a second partial pressure state, respectively, the first partial pressure state being the interfering gas having a known concentration in a predetermined span. A predetermined partial pressure exists in the measurement area, and the second partial pressure state is that the interference gas with a known concentration exists in the measurement area at a partial pressure different from the predetermined partial pressure; the absorbance inference unit infers the normalized absorbance of the interference gas as the normalized absorbance of the interference gas in the first partial pressure state and the second partial pressure state based on the partial pressures of each interference gas and the partial pressure-normalized absorbance relationship data; the correction unit performs zeroing to update the zero reference value and span correction to update the span absorbance based on the normalized absorbances of each interference gas and the output value of the detector in the first partial pressure state and the second partial pressure state.

[0020] In this way, even if the interfering gas does not exist in the measurement area of ​​the detector, not only zeroing but also span calibration can be performed. As a result, the detector can be zeroed regularly without stopping the process flow, and the analysis accuracy of the absorption analysis device can be maintained without degradation.

[0021] As a specific configuration of the detector, the calibration unit updates the span absorbance to A calculated by the following mathematical formula 2: S The span correction and the zero reference value mentioned above are updated to the zero adjustment of I0 calculated by the following Mathematical Formulas 2 and 3.

[0022]

Mathematical formula 2

[0023]

[0024]

Mathematical formula 3

[0025] or

[0026] Here, A r1 is the normalized absorbance of the interfering gas at the first partial pressure state, A r2is the normalized absorbance of the interference gas under the second partial pressure state, I1 is the output value of the detector detected under the first partial pressure state, and I2 is the output value of the detector detected under the second partial pressure state.

[0027] Furthermore, the program for an absorbance analysis device of the present invention is used in an absorbance analysis device, the absorbance analysis device comprising: a detector for detecting the intensity of light transmitted through a gas; a total pressure sensor for measuring the total pressure of the gas; and an absorbance calculation unit for calculating the absorbance based on an output value of the detector and a preset zero reference value, wherein the program recording medium functions as a partial pressure-absorbance relationship storage unit, a partial pressure calculation unit, an absorbance estimation unit, and a calibration unit, the partial pressure-absorbance relationship storage unit storing a partial pressure-absorbance relationship indicating a relationship between the partial pressure of the interfering gas present in the measurement region of the detector when zeroing and the absorbance calculated by the absorbance calculation unit. The partial pressure calculation unit calculates the interference gas partial pressure as the partial pressure of the interference gas based on the total pressure measured by the total pressure sensor and the concentration when the interference gas of known concentration exists in the measurement area; the absorbance inference unit infers the interference gas absorbance as the absorbance of the interference gas based on the interference gas partial pressure and the partial pressure-absorbance relationship data; and the calibration unit performs zeroing to update the zero reference value based on the interference gas absorbance and the output value of the detector under the known concentration state. It should be noted that the program for the absorbance analysis device can be sent electronically or recorded on a program recording medium such as a CD, a DVD, or a flash memory.

[0028] According to the absorption analysis device configured in this manner, even if a state is created in which no interfering gas exists in the measurement region of the detector, the detector can be zeroed. BRIEF DESCRIPTION OF THE DRAWINGS

[0029] Figure 1 It is a schematic diagram showing a vaporization device connected to an absorption analysis device according to an embodiment.

[0030] Figure 2 Schematic diagram showing a detector according to an embodiment.

[0031] Figure 3 It is a schematic diagram showing a modified example of the detector according to the embodiment.

[0032] Figure 4 It is a block diagram showing the absorption analysis device according to the embodiment.

[0033] Figure 5 It is a flowchart showing the operation of the absorption analysis device according to the embodiment.

[0034] Explanation of symbols

[0035] 100: Gasification device

[0036] 10: Gasification tank

[0037] L1: Carrier gas supply path

[0038] L2: Material gas extraction path

[0039] L3: Circuitous flow path

[0040] L4: Dilution gas supply path

[0041] 20: Switching mechanism

[0042] MFC1: First flow control device

[0043] MFC2: Second flow control device

[0044] 200: Absorption analysis device

[0045] 30: Total pressure sensor

[0046] 40: Detector

[0047] 50: Absorbance calculation unit

[0048] 60: Control Department

[0049] 61: Partial pressure-absorbance relationship storage unit

[0050] 62: Known concentration storage unit

[0051] 63: Voltage division calculation unit

[0052] 64: Absorbance estimation unit

[0053] 65: Correction Department DETAILED DESCRIPTION

[0054] Hereinafter, the absorption analysis device of the present invention will be described based on the drawings.

[0055] The absorption analysis device of the present invention is used, for example, by being installed in a semiconductor production line, etc. Specifically, the absorption analysis device is used to measure the concentration of a gas generated by a vaporizer of a semiconductor production line and supplied to a chamber. Therefore, in the following embodiments, the absorption analysis device in a state of being installed in a vaporizer is described.

[0056] <Implementation Method>

[0057] First, the gasification device 100 of this embodiment is described in detail. The gasification device 100 is a so-called dilution type (flow type). Specifically, Figure 1As shown, the vaporization device 100 comprises: a vaporization tank 10 for storing liquid or solid materials; a carrier gas supply path L1 for supplying carrier gas to the vaporization tank 10; a material gas outlet path L2 for outleting the material gas after vaporization of the material from the vaporization tank 10 and supplying it to the chamber CH; a detour flow path L3 for connecting the carrier gas supply path L1 and the material gas outlet path L2; a dilution gas supply path L4 for supplying dilution gas for diluting the material gas to the material gas outlet path L2; and a switching mechanism 20 for switching between a material gas supply mode for supplying material gas to the chamber CH and a carrier gas supply mode for supplying only carrier gas to the chamber CH.

[0058] The carrier gas supply path L1 is provided with a first flow control device MFC1 for controlling the flow rate of the carrier gas. The first flow control device MFC1 is a mass flow controller having a flow control valve such as a thermal flow sensor, a piezoelectric valve, and a control circuit having a CPU and / or a memory, etc. It should be noted that the carrier gas supply path L1 is configured to supply a carrier gas containing an interference gas of a known concentration.

[0059] The material gas outlet passage L2 is provided with an absorption analysis device 200 to be described later. Specifically, the absorption analysis device 200 is provided downstream of a connection position between the material gas outlet passage L2 and the dilution gas supply passage L4.

[0060] A second flow control device MFC2 for controlling the flow rate of the dilution gas is provided in the dilution gas supply path L4. The second flow control device MFC2 is the same as the first flow control device MFC1 and is a mass flow controller having a flow control valve such as a thermal flow sensor, a piezoelectric valve, and a control circuit having a CPU and / or a memory.

[0061] The switching mechanism 20 includes a plurality of valves V1 to V4 that are opened and closed in response to valve switching signals. For example, the user switches to the material gas supply mode or the carrier gas supply mode by opening and closing the valves V1 to V4 of the switching mechanism 20 at preset timings.

[0062] Specifically, the switching mechanism 20 comprises: a first valve V1, which is arranged at a position closer to the downstream side than the connection position between the carrier gas supply path L1 and the detour flow path L3; a second valve V2, which is arranged at a position closer to the upstream side than the connection position between the material gas outlet path L2 and the detour flow path L3; a third valve V3, which is arranged in the detour flow path L3; and a fourth valve V4, which is arranged in the dilution gas supply path L4.

[0063] The switching mechanism 20 is configured to switch to a material gas supply mode for supplying the material gas from the material gas delivery path L2 to the chamber CH by opening the first valve V1 , the second valve V2 , and the fourth valve V4 and closing the third valve V3 .

[0064] On the other hand, the switching mechanism 20 is configured to switch to a carrier gas supply mode in which only the carrier gas is supplied from the material gas delivery path L2 to the chamber CH by closing the first valve V1 , the second valve V2 , and the fourth valve V4 and opening the third valve V3 .

[0065] It should be noted that the above-mentioned gasification device 100 has a concentration control unit not shown in the figure. If it is switched to the material gas supply mode, the concentration control unit will feedback control the first flow control device MFC1 and the second flow control device MFC2 in such a way that the concentration of the material gas measured by the absorption analysis device 200 is close to a pre-set set concentration.

[0066] Next, the absorption analysis device 200 of the present embodiment is described. The absorption analysis device 200 includes a total pressure sensor 30 and a detector 40 provided in the material gas outlet path L2, an absorbance calculation unit 50 that calculates absorbance based on the output value of the detector 40, and a control unit 60. It should be noted that the detector 40 is provided at a position closer to the downstream side than the total pressure sensor 30.

[0067] The total pressure sensor 30 measures the total pressure of the gas flowing through the material gas outlet path L2.

[0068] The detector 40 detects the intensity of light transmitted through the gas flowing through the material gas outlet path L2. Figure 2 As shown in FIG. 1 , the detector 40 includes: a light source 41 for irradiating light to the gas flowing through the material gas outlet path L2; an optical filter 42 for transmitting light of a wavelength (hereinafter also referred to as a measurement wavelength) absorbed by the material gas (measurement target gas) within the wavelength range of the light emitted from the light source 41; and a light receiving unit 43 for detecting the intensity of the light of the measurement wavelength transmitted through the optical filter 42. It should be noted that, when the area through which the light emitted from the light source 41 in the material gas outlet path L2 is transmitted is defined as the measurement area Z, the detector 40 is provided with the light source 41 on one side of the measurement area Z, and the optical filter 42 and the light receiving unit 43 are provided on the other side of the measurement area Z. In addition, window members 44 are provided between the light source 41 and the material gas outlet path L2 and between the optical filter 42 and the material gas outlet path L2, respectively. Thus, the light source 41, the optical filter 42, and the light receiving unit 43 do not come into direct contact with the gas flowing through the material gas outlet path L2. Then, the detector 40 outputs the output signal of the light receiving unit 43 indicating the intensity of the light transmitted through the gas existing in the measurement area Z as an output value.

[0069] It should be explained, such as Figure 3 As shown, the detector 40 may include, in addition to the optical filter 42 and the light receiving unit 43, a reference optical filter 42r that transmits light of a wavelength that is not absorbed by the material gas and a reference light receiving unit 43r that detects the intensity of light of the wavelength that has passed through the reference optical filter 42r on the other side of the measurement area Z. In this case, as the output value of the detector 40, the ratio of the output signal of the light receiving unit 43 to the output signal of the reference light receiving unit 43r may be used.

[0070] In addition, the absorbance calculation unit 50 calculates the absorbance based on the output value of the detector 40 and the preset zero reference value. Here, the zero reference value is the output value of the detector 40 detected in the absence of the interfering gas. Specifically, the absorbance calculation unit 50 calculates the absorbance A based on the following mathematical formula 4.

[0071]

Mathematical formula 4

[0072] A=log(I0 / I)

[0073] Here, I is the output value of the detector and I0 is the zero reference value.

[0074] The control unit 60 performs zero adjustment to update the zero reference value when receiving the zero adjustment implementation signal. It should be noted that the control unit 60 performs zero adjustment when the vaporizer 100 is switched to the carrier gas supply mode, in other words, when the carrier gas containing the interference gas of known concentration is supplied from the material gas outlet path L2 to the chamber CH. Specifically, after the vaporizer 100 is switched to the carrier gas supply mode, the control unit 60 receives the zero adjustment implementation signal sent from the vaporizer 100 to the control unit 60 at a time when the pressure and the like are sufficiently stable, and performs zero adjustment.

[0075] Specifically, the control unit 60 is connected to the total pressure sensor 30 and the detector 40, and is a computer having a CPU, a memory, an AD converter, a DA converter, an input unit, etc. The control unit 60 is configured to execute a program stored in the memory using the CPU, thereby Figure 4 As shown, the functions of a partial pressure-absorbance relationship storage unit 61, a known concentration storage unit 62, a partial pressure calculation unit 63, an absorbance estimation unit 64, and a correction unit 65 are fulfilled.

[0076] The partial pressure-absorbance relationship storage unit 61 stores partial pressure-absorbance relationship data indicating the relationship between the partial pressure of the interfering gas present in the measurement area Z of the detector 40 at the time of zero adjustment and the absorbance calculated by the absorbance calculation unit 50. It should be noted that the partial pressure-absorbance relationship storage unit 61 of the present embodiment stores partial pressure-absorbance relationship data indicating the relationship between the partial pressure of the interfering gas and the absorbance obtained before shipment of the absorbance analysis device 200.

[0077] The known concentration storage unit 62 stores the known concentration of the interfering gas. The known concentration storage unit 62 of this embodiment stores the known concentration of the interfering gas contained in the carrier gas supplied from the carrier gas supply path L1. The concentration can be any value selected from 0 to 100%.

[0078] The partial pressure calculation unit 63 calculates the interference gas partial pressure as the partial pressure of the interference gas based on the total pressure measured by the total pressure sensor 30 and the known concentration of the interference gas stored in the known concentration storage unit 62 in a known concentration state in which the interference gas having a known concentration exists in the measurement area of ​​the detector 40. It should be noted that the partial pressure calculation unit 63 of the present embodiment calculates the interference gas partial pressure when receiving the zeroing execution signal.

[0079] The absorbance estimation unit 64 estimates the interfering gas absorbance as the absorbance of the interfering gas based on the interfering gas partial pressure calculated by the partial pressure calculation unit 63 and the partial pressure-absorbance relationship data stored in the partial pressure-absorbance relationship storage unit 61. It should be noted that the absorbance estimation unit 64 of the present embodiment estimates the absorbance of the interfering gas contained in the carrier gas.

[0080] The calibration unit 65 performs zero adjustment to update the zero reference value based on the absorbance of the interfering gas estimated by the absorbance estimation unit 64 and the output value detected by the detector 40 in a known concentration state where the interfering gas of a known concentration exists in the measurement area Z. Specifically, the calibration unit 65 substitutes the absorbance A of the interfering gas estimated by the absorbance estimation unit 64 and the output value I of the detector 40 detected in the known concentration state into the above-mentioned mathematical formula 1 to calculate I0, and performs zero adjustment to update the zero reference value to the I0. It should be noted that the calibration unit 65 of the present embodiment substitutes the absorbance A of the interfering gas estimated by the absorbance estimation unit 64 and the output value I of the detector 40 detected when the zero adjustment implementation signal is received into the above-mentioned mathematical formula 1 to calculate I0, and performs zero adjustment to update the zero reference value to the I0.

[0081] Next, the calibration operation of the absorption analysis device 200 according to the present embodiment will be described.

[0082] First, the absorption analysis device 200 receives a zeroing execution signal from the vaporization device 100 (step S1). Then, the partial pressure calculation unit 63 obtains the total pressure of the carrier gas measured by the total pressure sensor 30, and the calibration unit 65 obtains the output value I of the detector 40 (step S2).

[0083] Next, the partial pressure calculation unit 63 calculates the interfering gas partial pressure, which is the partial pressure of the interfering gas contained in the carrier gas, based on the acquired total pressure and the known concentration of the interfering gas contained in the carrier gas stored in the known concentration storage unit 62 (step S3 ).

[0084] Next, the absorbance estimation unit 64 estimates the interfering gas absorbance as the absorbance of the interfering gas contained in the carrier gas based on the interfering gas partial pressure calculated by the partial pressure calculation unit 53 and the partial pressure-absorbance relationship data stored in the partial pressure-absorbance relationship storage unit 61 (step S4).

[0085] Then, the calibration unit 65 substitutes the acquired output value I of the detector 40 and the interfering gas absorbance A estimated by the absorbance estimation unit 64 into the above-mentioned equation 1 to calculate I0, and performs zero adjustment to update the zero reference value to I0 (step S5).

[0086] Thus, even in a process flow in which either the carrier gas or the material gas is constantly supplied from the vaporizer 100 to the chamber CH, the detector 40 can be zeroed while the vaporizer 100 is switched to the carrier gas supply mode. As a result, the measurement accuracy of the absorption analyzer 200 can be maintained.

[0087] When the detector 40 of the present embodiment is zeroed, a state may be created in which a gas containing an interfering gas of a known concentration flows through the material gas outlet path L2 in which the absorption analysis device 200 is provided.

[0088] Therefore, even the following modified example can perform zeroing of the detector 40. That is, for example, a dilution gas having the same composition as the carrier gas is supplied from the dilution gas supply path L4. Then, the switching mechanism 20 is configured to switch between a material gas supply mode for supplying a material gas and a dilution gas supply mode for supplying only a dilution gas to the chamber CH. Accordingly, by switching the gasification device 100 to the dilution gas supply mode, a state can be created in which a dilution gas containing an interference gas of a known concentration is circulated from the material gas outlet path L2 to the chamber CH, and the detector 40 can be zeroed.

[0089] In addition, the switching mechanism 20 is configured to switch between a material gas supply mode for supplying a material gas and a mixed gas supply mode for supplying a mixed gas in which a carrier gas and a dilution gas are mixed at a known ratio to the chamber CH. Thus, by switching the vaporizer 100 to the mixed gas supply mode, a mixed gas containing an interference gas of a known concentration can be made to flow from the material gas outlet path L2 to the chamber CH, and the detector 40 can be zeroed.

[0090] It should be noted that in the above-mentioned embodiment, although zero adjustment is performed in a state where a gas containing an interfering gas of a known concentration is flowing from the material gas outlet path L2 to the chamber CH, for example, after the gas flows through the material gas outlet path L2, the upstream side of the total pressure sensor 30 and the downstream side of the detector 40 may be sealed by a switch valve (not shown) or the like, so that zero adjustment can be performed in this state.

[0091] <Other embodiments>

[0092] As another embodiment, the absorbance calculation unit 50 calculates the normalized absorbance based on the output value of the detector 40, the preset zero reference value, and the preset span absorbance, and the calibration unit 65 performs a span calibration for updating the span absorbance in addition to the zero adjustment for updating the zero reference value. In this case, specifically, the absorbance calculation unit 50 calculates the normalized absorbance A based on the following mathematical formula 5: r .

[0093]

Mathematical formula 5

[0094] Ar=log(I0 / I) / As

[0095] Here, I is the output value of the detector, I0 is the zero reference value, and A S is the span absorbance.

[0096] Specifically, in the above embodiment, when the gasification device 100 is switched to the carrier gas supply mode, a first partial pressure state is established, wherein the carrier gas is supplied to the material gas outlet path L2 under the condition that the interference gas becomes a predetermined partial pressure, and a second partial pressure state is established, wherein the carrier gas is supplied to the material gas outlet path L2 under the condition that the interference gas becomes a partial pressure different from the predetermined partial pressure. Specifically, the above first partial pressure state and the above second partial pressure state are established by changing the pressure of the carrier gas supplied from the carrier gas supply path L1, or by changing the concentration of the interference gas contained in the carrier gas supplied from the carrier gas supply path L1.

[0097] The partial pressure-absorbance relationship storage unit 61 stores partial pressure-normalized absorbance relationship data indicating the relationship between the partial pressure of the interfering gas present in the measurement region Z and the normalized absorbance calculated by the absorbance calculation unit 50 during zero adjustment.

[0098] Furthermore, the partial pressure calculation unit 63 may calculate the above-mentioned interference gas partial pressure in the first partial pressure state and the second partial pressure state respectively, the absorbance inference unit 64 may infer the normalized absorbance of the interference gas as the normalized absorbance of the interference gas in the first partial pressure state and the second partial pressure state based on the partial pressures of each interference gas and the partial pressure-normalized absorbance relationship data, and the correction unit 65 may perform zeroing to update the zero reference value and span correction to update the span absorbance based on the normalized absorbance of each interference gas and the output value of the detector 40 in the first partial pressure state and the second partial pressure state.

[0099] Specifically, the calibration unit 65 may be configured to calculate the output value I1 of the detector 40 in the first partial pressure state and the normalized absorbance A of the interfering gas. r1 The output value I2 of the detector 40 under the second partial pressure state and the normalized absorbance A of the interfering gas r2 Substitute into equation 2 and equation 3 to calculate I0 and A S , perform zero adjustment to update the zero reference value to the I0 and the span absorbance to the A S Span correction.

[0100] In addition, as another embodiment, the gasification device 100 may also be provided with an interference gas supply path for supplying an interference gas of known concentration to the material gas outlet path L2. In this case, if the interference gas has a known concentration, it may be any gas. For example, the interference gas may be a gas of the same composition as the material gas, a gas of the same composition as the carrier gas, or another calibration gas.

[0101] In addition, the present invention is not limited to the above-mentioned embodiments, and various changes can be made without departing from the scope of the present invention.

Claims

1. An absorbance analysis device, characterized in that: have: a detector, which detects the intensity of light transmitted through the gas; A total pressure sensor for measuring the total pressure of the gas; an absorbance calculation unit, which calculates the absorbance based on the output value of the detector and a preset zero reference value; a partial pressure-absorbance relationship storage unit for storing partial pressure-absorbance relationship data indicating a relationship between the partial pressure of the interfering gas present in the measurement region of the detector when zeroing and the absorbance calculated by the absorbance calculation unit; a partial pressure calculation unit that calculates an interfering gas partial pressure as a partial pressure of the interfering gas based on the total pressure measured by the total pressure sensor and the concentration in a known concentration state in which the interfering gas of a known concentration exists in the measurement region; an absorbance estimating unit that estimates an interfering gas absorbance as the absorbance of the interfering gas based on the interfering gas partial pressure and the partial pressure-absorbance relationship data; as well as The calibration unit performs zero adjustment to update the zero reference value based on the absorbance of the interfering gas and the output value of the detector in the known concentration state.

2. The absorption analysis device according to claim 1, characterized in that: The correction unit performs zero adjustment to update the zero reference value to I0 calculated by the following mathematical formula 1: 【Mathematical formula 1】 I0=I×10 A I: The output value of the detector detected under the known concentration state A: absorbance of the interfering gas.

3. The light absorption analysis device according to claim 1, characterized in that: The absorbance calculation unit calculates normalized absorbance based on the output value of the detector, the zero reference value, and a preset span absorbance. The partial pressure-absorbance relationship storage unit stores partial pressure-normalized absorbance relationship data indicating the relationship between the partial pressure of the interfering gas present in the measurement region of the detector when zeroing and the normalized absorbance calculated by the absorbance calculation unit. The partial pressure calculation unit calculates the interference gas partial pressure in a first partial pressure state and a second partial pressure state, respectively. The first partial pressure state is that the interference gas with a known concentration exists in the measurement area at a predetermined partial pressure, and the second partial pressure state is that the interference gas with a known concentration exists in the measurement area at a partial pressure different from the predetermined partial pressure. The absorbance estimation unit estimates the normalized absorbance of the interfering gas as the normalized absorbance of the interfering gas in the first partial pressure state and the second partial pressure state based on the partial pressure of each interfering gas and the partial pressure-normalized absorbance relationship data. The calibration unit performs zero adjustment for updating the zero reference value and span calibration for updating the span absorbance based on the normalized absorbance of each interfering gas and the output value of the detector in the first partial pressure state and the second partial pressure state.

4. The light absorption analysis device according to claim 3, characterized in that: The calibration unit updates the span absorbance to A calculated by the following mathematical formula 2: S The span correction and the zero reference value are updated to the zero adjustment of I0 calculated by the following Mathematical Formula 2 and Mathematical Formula 3, 【Mathematical formula 2】 【Mathematical formula 3】 or A r1 : Normalized absorbance of the interfering gas under the first partial pressure state A r2 : Normalized absorbance of the interfering gas under the second partial pressure state I1: The output value of the detector detected in the first voltage division state I2: The output value of the detector detected in the second voltage division state.

5. A program recording medium recording a program for an absorbance analysis device, characterized in that: Used in an absorption analysis device, the absorption analysis device comprises: a detector for detecting the intensity of light transmitted through a gas; a total pressure sensor for measuring the total pressure of the gas; and an absorbance calculation unit for calculating the absorbance based on an output value of the detector and a preset zero reference value. The program recording medium functions as a partial pressure-absorbance relationship storage unit, a partial pressure calculation unit, an absorbance estimation unit, and a correction unit. The partial pressure-absorbance relationship storage unit stores partial pressure-absorbance relationship data indicating the relationship between the partial pressure of the interfering gas present in the measurement area of ​​the detector when zeroing and the absorbance calculated by the absorbance calculation unit. The partial pressure calculation unit calculates the interference gas partial pressure as the partial pressure of the interference gas based on the total pressure measured by the total pressure sensor and the concentration in a known concentration state in which the interference gas of known concentration exists in the measurement area. The absorbance estimation unit estimates the interfering gas absorbance as the absorbance of the interfering gas based on the interfering gas partial pressure and the partial pressure-absorbance relationship data, The calibration unit performs zero adjustment to update the zero reference value based on the absorbance of the interfering gas and the output value of the detector in the known concentration state.

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