A non-contact sealing structure for the main shaft of a crystalline silicon slicer

Abstract

The invention discloses a non-contact sealing structure for a spindle of a crystalline silicon slicer, and relates to the technical field of spindle sealing. The key points of the technical solution are as follows: the structure comprises a spindle outer sleeve, a sealing static ring, and a sealing dynamic ring, which is fixed on a spindle core shaft; an air curtain gap and a sewage discharge cavity are formed between the sealing static ring and the sealing dynamic ring, the sewage discharge cavity is located on the side of the air curtain gap close to the component installation space, the air curtain gap is communicated with the outside, a static ring air supply hole for supplying air to the air curtain gap is provided on the sealing static ring, and a static ring sewage discharge hole for discharging polluted impurities in the sewage discharge cavity is provided on the sealing static ring; high-pressure gas is introduced into the static ring air supply hole, and the air supply hole delivers gas into the air curtain gap, a part of the gas forms an air curtain blowing outward in the air curtain gap, and a part of the gas enters the sewage discharge cavity, the air curtain can prevent polluted impurities from entering between the sealing static ring and the sealing dynamic ring, and the gas blown into the sewage discharge cavity can blow out the impurities that break through the air curtain and enter the sewage discharge cavity through the static ring sewage discharge hole.

Description

Technical Field

[0001] The invention relates to the technical field of spindle sealing, and more specifically, to a non-contact sealing structure of a spindle of a crystal silicon slicer. Background Art

[0002] With the development of the photovoltaic industry, the reliability requirements for crystalline silicon slicers are getting higher and higher. Among them, the sealing problem of the main shaft of the crystalline silicon slicer directly affects the reliability of the crystalline silicon slicer. The main shaft in the crystalline silicon slicer has the function of support and rotation; the main shaft includes a main shaft core shaft, a main shaft outer sleeve arranged on the outside of the main shaft core shaft, and internal parts; the main shaft core shaft and the main shaft outer sleeve have relative rotational motion, and there is a certain space for parts installation between the two, and the internal parts are arranged in the parts installation space; the parts installation space is usually installed with bearings or spacers and other parts to realize the function of the main shaft; the parts installation space is generally separated from the outside by a sealing structure. When the crystalline silicon slicer is working, the working environment of the main shaft is usually relatively harsh, with a large amount of water vapor and silicon powder and other contaminants. These impurities can easily pass through the sealing structure into the main shaft. Once these contaminants enter the main shaft, it will cause the failure of the main shaft. Most of the damage to the existing slicer main shaft is due to the failure of the seal, which causes the contaminants to enter the main shaft and damage the internal parts. Now there is an urgent need for a crystalline silicon slicer main shaft sealing structure that is not prone to sealing failure. Summary of the invention

[0003] In view of the deficiencies in the prior art, an object of the present invention is to provide a non-contact sealing structure for a spindle of a silicon wafer slicer, which makes it less likely for the spindle to have a sealing failure.

[0004] To achieve the above-mentioned purpose, the present invention provides the following technical solutions: a non-contact sealing structure for a spindle of a crystalline silicon slicer, a spindle outer sleeve, which is sleeved on the outside of the spindle core shaft and is used to support the spindle core shaft;

[0005] A sealing static ring, which is fixed on one side of the spindle outer casing close to the end of the spindle core shaft;

[0006] and a sealing dynamic ring fixed on the spindle core shaft;

[0007] An air curtain gap and a drain cavity are formed between the sealing static ring and the sealing dynamic ring. The drain cavity is located on the side of the air curtain gap close to the component installation space. The air curtain gap is connected to the outside world. The sealing static ring is provided with a static ring air supply hole for supplying air to the air curtain gap, and the sealing static ring is provided with a static ring drain hole for discharging polluted impurities in the drain cavity.

[0008] By adopting the above technical solution, high-pressure gas is introduced into the air supply hole of the static ring, and the air supply hole sends the gas into the air curtain gap. Part of the gas forms an air curtain blowing outward in the air curtain gap, and part of the gas enters the drain cavity. The air curtain can block pollutants from entering between the sealed static ring and the sealed dynamic ring. The gas blown into the drain cavity can blow out the impurities that break through the air curtain and enter the drain cavity through the static ring drain hole, thereby making it difficult for pollutants to enter the component installation space, thereby making it difficult for the spindle to have sealing failure problems.

[0009] The present invention is further configured such that a first sealing gap is provided between the air curtain gap and the sewage discharge cavity for limiting the gas entering into the sewage discharge cavity.

[0010] By adopting the above technical solution and setting a sealing gap, the air resistance of gas flowing from the air curtain gap to the sewage discharge cavity is increased, so that high-pressure air can more easily flow outward in the air curtain gap to form an air curtain, thereby better preventing pollutants and impurities from entering the air curtain gap.

[0011] The present invention is further configured as follows: an annular air outlet gap is provided between the first sealing gap and the air curtain gap, and the air outlet gap is directly connected to the static ring air supply hole.

[0012] By adopting the above technical solution, high-pressure gas enters into the air outlet gap through the air supply hole of the static ring. After entering into the air outlet gap, the high-pressure gas can be evenly distributed in the air outlet gap, so that the air curtain formed in the air curtain gap can be more uniform in the circumferential direction of the sealing dynamic ring.

[0013] The present invention is further configured as follows: a flange is arranged between the sealing static ring and the main shaft outer sleeve, an air supply ring groove is arranged on the side where the sealing static ring and the flange are in contact with each other, a flange air supply hole is opened on the flange to supply air to the air supply ring groove, and a plurality of static ring air supply holes are arranged on the sealing static ring and are arranged around the sealing static ring.

[0014] By adopting the above technical solution, the air supply ring groove supplies air to multiple flange air supply holes at the same time, and multiple flange air supply holes supply air to the air outlet gap at the same time, so that the distribution of gas in the air outlet gap is more uniform, so that the air curtain formed in the air curtain gap can be more uniform in the circumferential direction of the sealing dynamic ring.

[0015] The present invention is further configured as follows: a grease containing cavity located between the sealing static ring and the sealing dynamic ring is provided on the side of the sewage discharge cavity close to the component installation space, and the grease containing cavity is used to contain grease.

[0016] By adopting the above technical solution, when the pollutants break through the air curtain gap and the sewage discharge cavity and enter the grease containing cavity, the pollutants will be absorbed by the grease.

[0017] The present invention is further configured as follows: a second sealing gap located between the sealing static ring and the sealing dynamic ring is provided between the sewage discharge chamber and the grease containing chamber.

[0018] By adopting the above technical solution, since the sewage discharge chamber is connected with the outside atmosphere, the air resistance between the sewage discharge chamber and the fat containing chamber is increased through the second sealing gap, making it difficult for outside air to enter the fat containing chamber.

[0019] The present invention is further configured such that: both the first sealing gap and the second sealing gap are labyrinth gaps, and the labyrinth gap is a gap whose extension direction changes at least once.

[0020] By adopting the above technical solution and changing the extension direction of the labyrinth gap, the gas resistance for the flow of gas in the labyrinth gap can be increased, thereby effectively achieving the effect of increasing the gas resistance of the sealed gap.

[0021] The present invention is further configured as follows: the sealing static ring includes a sealing static ring 1 and a sealing static ring 2, an air curtain gap is formed between the sealing static ring 2 and the sealing dynamic ring, the sealing static ring 1 and the sealing static ring 2 are integrated or separated, and when the sealing static ring 1 and the sealing static ring 2 are separated, the relative positions of the sealing static ring 1 and the sealing static ring 2 are fixed.

[0022] The present invention is further configured as follows: a flange is provided between the main shaft outer sleeve and the sealing static ring 1, the flange is fixedly connected to the main shaft outer sleeve, the sealing static ring 1 and the flange are integral or separate, and when the sealing static ring 1 and the flange are separate, the relative position of the sealing static ring 1 and the flange is fixed.

[0023] The present invention is further configured such that: along a direction away from the component installation space, the diameter of the sealing dynamic ring on a side close to the sealing static ring gradually increases.

[0024] By adopting the above technical solution, the diameter of the outer side of the sealing dynamic ring gradually increases in the direction away from the component installation space, so that the contaminants can easily move along the gap between the sealing dynamic ring and the sealing static ring in the direction away from the component installation space under the action of the centrifugal force provided by the sealing dynamic ring, and finally be discharged from the air curtain gap. Moreover, as the diameter increases, the centrifugal force that can be provided becomes greater, so that the contaminants can be discharged more smoothly.

[0025] In summary, compared with the prior art, the present invention has the following beneficial effects: the present invention introduces high-pressure gas into the air supply hole of the static ring, and the air supply hole delivers the gas into the air curtain gap. Part of the gas forms an air curtain blowing outward in the air curtain gap, and part of the gas enters the sewage discharge cavity. The air curtain can block pollutants from entering between the sealing static ring and the sealing dynamic ring. The gas blown into the sewage discharge cavity can blow out the impurities that break through the air curtain and enter the sewage discharge cavity through the static ring sewage discharge hole, thereby making it difficult for pollutants to enter the component installation space, thereby making it difficult for the main shaft to have sealing failure problems. BRIEF DESCRIPTION OF THE DRAWINGS

[0026] Figure 1 A cross-sectional view showing the gap of the air curtain in an embodiment;

[0027] Figure 2 for Figure 1 A magnified schematic diagram of part A;

[0028] Figure 3 A cross-sectional view of an air supply hole of a flange is shown in an embodiment;

[0029] Figure 4 for Figure 1 An enlarged schematic diagram of part B;

[0030] Figure 5 for Figure 3 Enlarged schematic diagram of part C of FIG.

[0031] In the figure: 1. spindle core shaft; 2. component installation space; 3. spindle outer sleeve; 31. spindle outer sleeve air supply hole; 32. spindle outer sleeve drain hole; 4. flange; 41. flange air supply hole; 42. flange drain hole; 5. sealing static ring one; 51. static ring air supply hole; 52. static ring drain hole; 6. sealing static ring two; 7. sealing dynamic ring; 8. gasket; 9. air supply ring groove; 91. air outlet gap; 92. air curtain gap; 93. drain cavity; 94. grease cavity; 95. first sealing gap; 96. second sealing gap; 97. third sealing gap. DETAILED DESCRIPTION

[0032] In order to enable those skilled in the art to better understand the technical solution of the present invention, the technical solution of the present invention is clearly and completely described below in conjunction with the accompanying drawings of the present invention. Based on the embodiments in this application, other similar embodiments obtained by ordinary technicians in this field without making creative work should all fall within the scope of protection of this application. In addition, the directional words mentioned in the following embodiments, such as "up", "down", "left", "right", etc., are only reference to the directions of the accompanying drawings. Therefore, the directional words used are used to illustrate rather than limit the invention.

[0033] The present invention will be further described below in conjunction with the accompanying drawings and preferred embodiments.

[0034] Embodiment: A non-contact sealing structure for the spindle of a crystalline silicon slicer, see the attached Figure 1 and attached Figure 2 , a spindle sleeve 3 sleeved on the outside of the spindle core shaft 1 for supporting the spindle core shaft 1, a flange 4 fixedly connected to the spindle sleeve 3 on the side close to the spindle core shaft 1, a sealing static ring fixedly connected to the side of the flange 4 away from the spindle sleeve 3, and a sealing dynamic ring 7 sleeved on the outside of the spindle core shaft 1 and fixedly connected to the spindle core shaft 1. A component installation space is reserved between the spindle core shaft 1 and the spindle sleeve 3. In some embodiments, a bearing or the like is arranged in the component installation space to support the spindle core shaft 1; the sealing dynamic ring 7 is located on the side of the component installation space 2 close to the end of the spindle core shaft 1; the sealing static ring includes a sealing static ring 1 5 and a sealing static ring 2 6. The sealing static ring 1 5 is fixedly connected to the flange 4, and the sealing static ring 2 6 is fixedly connected to the sealing static ring 1 5. The sealing static ring 1 5 and the sealing static ring 2 6 can be designed as a separate body or an integrated body. When the sealing static ring 1 5 and the sealing static ring 2 6 are designed as a separate body, the relative positions of the sealing static ring 1 5 and the sealing static ring 2 6 are fixed; the sealing static ring 1 5 and the flange 4 can be designed as an integrated body or a separate body. When the sealing static ring 1 5 and the flange 4 are designed as a separate body, the relative positions of the sealing static ring 1 5 and the flange 4 are fixed. The setting methods of the sealing static ring 1 5, the sealing static ring 2 6 and the flange 4 include but are not limited to the above methods.

[0035] Preferably, in this embodiment, the sealing static ring 1 5 and the flange 4 are designed as separate parts, the sealing static ring 2 6 and the sealing static ring 1 5 are designed as separate parts, the sealing static ring 1 5 is fixedly connected to the flange 4 by bolts, the sealing static ring 2 6 is fixedly connected to the sealing static ring 1 5 by bolts, and the sealing dynamic ring 7 is fixedly connected to the main shaft 1 by bolts.

[0036] Combined with Figure 3 and attached Figure 4An air curtain gap 92 is formed between the sealing static ring 2 6 and the sealing dynamic ring 7. The air curtain gap 92 is located on the side of the sealing static ring 1 5 away from the flange 4. An air outlet gap 91 is formed between the sealing static ring 1 5 and the sealing dynamic ring 7. The air curtain gap 92 and the air outlet gap 91 are both annular gaps. The air curtain gap 92 and the air outlet gap 91 are interconnected. Preferably, the distance between the two sides of the air outlet gap 91 is greater than the distance between the two sides of the air curtain gap 92. A sewage discharge cavity 93 formed between the sealing static ring 1 5 and the sealing dynamic ring 7 is provided on the side of the air outlet gap 91 away from the air curtain gap 92. The sewage discharge cavity 93 is an annular chamber. A grease chamber 94 formed between the sealing static ring 5 and the sealing dynamic ring 7 is provided on the side of the sewage chamber 93 away from the air outlet gap 91. The grease chamber 94 is an annular chamber, and grease is contained in the grease chamber 94. Preferably, in the present embodiment, high-viscosity grease is contained in the grease chamber 94. The sealing static ring 5 is provided with a static ring air supply hole 51 which is interconnected with the air outlet gap 91, and the static ring is also provided with a static ring sewage hole 52 which is used to communicate with the sewage chamber 93.

[0037] High-pressure gas enters the air outlet gap 91 through the static ring air supply hole 51, and then part of the high-pressure gas enters the air curtain gap 92, forming an air curtain blowing outward in the air curtain gap 92, and the air curtain prevents external pollutants from entering the air curtain gap 92. Part of the gas enters the sewage discharge cavity 93, and the impurities that break through the air curtain gap 92 and the air outlet gap 91 and enter the sewage discharge cavity 93 are discharged through the static ring sewage discharge hole 52. Even if the pollutants break through the sewage discharge cavity 93 and enter the grease chamber 94, they will be adsorbed by the high-viscosity grease in the grease chamber 94, preventing the pollutants from entering the component installation space 2. Through the buffering of the air outlet gap 91, the high-pressure gas is evenly distributed in the air outlet gap 91, so that the air curtain formed in the air curtain gap 92 is more uniform along the circumferential direction of the sealing dynamic ring 7.

[0038] The flange 4 is provided with a flange drain hole 42 which is interconnected with the stationary ring drain hole 52, and the main shaft housing 3 is provided with a main shaft housing drain hole 32 which is interconnected with the flange drain hole 42; the stationary ring drain hole 52 is arranged directly below the drain cavity 93, and the pollutants that enter the drain cavity 93 follow the movement of the sealing movable ring 7 to the top of the stationary ring drain hole 52. Under the action of wind force, centrifugal force and its own gravity, the pollutants fall into the stationary ring drain hole 52, and are then sent out through the flange drain hole 42 and the main shaft housing drain hole 32.

[0039] Combined with Figure 5, a gas supply ring groove 9 is provided on the side of the sealing static ring 15 close to the flange 4, and the gas supply ring groove 9 is provided around the spindle core shaft 1, and a plurality of static ring gas supply holes 51 are provided in the sealing static ring 15, and the static ring gas supply holes 51 are evenly distributed around the spindle core shaft 1, and the static ring gas supply holes 51 are interconnected with the gas supply ring groove 9. A flange gas supply hole 41 interconnected with the gas supply ring groove 9 is provided on the flange 4, and a spindle jacket gas supply hole 31 interconnected with the flange gas supply hole 41 is provided on the spindle jacket 3, and the high-pressure gas enters the flange gas supply hole 41 through the spindle jacket gas supply hole 31, and then enters the gas supply ring groove 9 through the flange gas supply hole 41, and the high-pressure gas is evenly distributed in the gas supply ring groove 9, and then enters the gas outlet gap 91 through the plurality of static ring gas supply holes 51, and air is provided through the plurality of static ring gas supply holes 51 evenly distributed around the spindle core shaft 1, so that the distribution of the high-pressure air in the gas outlet gap 91 can be more uniform.

[0040] A first sealing gap 95 formed between the sealing static ring 15 and the sealing dynamic ring 7 is provided between the air outlet gap 91 and the drainage chamber 93, and a second sealing gap 96 formed between the sealing static ring 15 and the sealing dynamic ring 7 is provided between the drainage chamber 93 and the grease containing chamber 94. The first sealing gap 95 can increase the air resistance between the drainage chamber 93 and the air outlet gap 91, so that more high-pressure air in the air outlet gap 91 can flow to the air curtain gap 92, thereby improving the effect of the air curtain formed in the air curtain gap 92; the second sealing gap 96 can increase the air resistance between the drainage chamber 93 and the grease containing chamber 94, so that it is not easy for external air to enter the grease containing chamber 94 through the drainage chamber 93.

[0041] The first sealing gap 95 and the second sealing gap 96 are both labyrinth gaps, and the labyrinth gap is a gap whose extension direction changes at least once. The labyrinth gap can be realized in the following ways:

[0042] First, the sides of the sealing dynamic ring 7 and the sealing static ring 5 that are close to each other are fixedly connected with protrusions with a stepped cross section, and a labyrinth gap is formed between the stepped protrusions of the sealing dynamic ring 7 and the sealing static ring 5;

[0043] Second, at least one protrusion is provided on both sides of the labyrinth gap, and the protrusions on both sides of the labyrinth gap are fixedly connected to the sealing dynamic ring 7 and the sealing static ring 5 respectively, and the protrusions on the sealing dynamic ring 7 and the sealing static ring 5 are arranged alternately, and the sealing gap is formed between the protrusions of the sealing dynamic ring 7 and the sealing static ring 5;

[0044] Third, adopt the first and second methods at the same time;

[0045] Preferably, in this embodiment, the second method is adopted to form the labyrinth gap, that is, it is formed by staggered protrusions distributed on the sealing dynamic ring 7 and the sealing static ring 5, and, in this embodiment, a plurality of protrusions are arranged on both sides of each labyrinth gap, and the plurality of protrusions on the sealing static ring 5 and the sealing dynamic ring 7 are staggered along the axial direction of the main shaft core shaft 1.

[0046] Along the direction away from the component installation space 2, the diameter of the sealing dynamic ring 7 close to the sealing static ring 5 gradually increases, that is, along the direction away from the component installation space 2, the distances between the grease chamber 94, the second sealing gap 96, the sewage chamber 93, the first sealing gap 95, the air outlet gap 91 and the air curtain gap 92 and the main shaft core shaft 1 gradually increase; toward the direction away from the component installation space 2, the diameter of the outer side of the sealing dynamic ring 7 gradually increases, so that the contaminants can easily move along the gap between the sealing dynamic ring 7 and the sealing static ring toward the direction away from the component installation space 2 under the action of the centrifugal force provided by the sealing dynamic ring 7, and finally be discharged from the air curtain gap 92, and as the diameter increases, the centrifugal force that can be provided becomes greater, so that the contaminants can be discharged more smoothly.

[0047] An annular gasket 8 is arranged between the spindle sleeve 3 and the spindle core shaft 1. The gasket 8 is located on the side of the component installation space 2 close to the sealing static ring 5. The sealing static ring 5 and the sealing dynamic ring 7 are both in contact with the gasket 8 on the side away from the component installation space 2. When the contaminants break through the grease chamber 94, the gasket 8 can continue to block the contaminants, making it difficult for them to enter the component installation space 2.

[0048] A third sealing gap 97 is formed between the gasket 8 and the spindle core shaft 1. The third sealing gap 97 is also a labyrinth gap. At least one annular groove is provided on the side of the gasket 8 close to the spindle core shaft 1. An annular protrusion integrally formed on the spindle core shaft 1 is provided in the annular groove. The third sealing gap 97 is formed by the annular groove and the protrusion. Preferably, in this embodiment, a plurality of annular grooves are provided on the side of the gasket 8 close to the spindle core shaft 1. An annular protrusion integrally formed on the spindle core shaft 1 is provided in each annular groove. The plurality of annular grooves are evenly arranged along the axial direction of the spindle core shaft 1. The third sealing gap 97 serves as the last line of defense against contaminants and prevents contaminants from entering the component installation space 2.

[0049] The working principle of the non-contact sealing structure of the spindle of the silicon slicer when in use is as follows: high-pressure gas enters the air outlet gap 91 through the spindle jacket air supply hole 31, the flange air supply hole 41, the air supply ring groove 9 and the static ring air supply hole 51, and most of the gas in the air outlet gap 91 enters the air curtain gap 92, forming an air curtain blowing outward to block the polluted impurities from entering the air curtain gap 92, and a small part enters the sewage discharge cavity 93, pushing the polluted impurities that break through the air curtain gap 92 and the air outlet gap 91 and enter the sewage discharge cavity 93 to pass through the static ring sewage discharge hole 52, the flange sewage discharge hole 42 and the spindle jacket sewage discharge hole 32 in turn, and finally discharged from the spindle jacket sewage discharge hole 32. The polluted impurities that break through the sewage discharge cavity 93 enter the grease chamber 94 and are adsorbed by the high-viscosity grease in the grease chamber 94. If the polluted impurities break through the grease chamber 94, they are blocked by the gasket 8 and the third sealing gap 97. Multiple protections make it difficult for the polluted impurities to enter the component installation space 2.

[0050] The above is only a preferred embodiment of the present invention, and the protection scope of the present invention is not limited to the above embodiments. All technical solutions under the concept of the present invention belong to the protection scope of the present invention. It should be pointed out that for ordinary technicians in this technical field, some improvements and modifications without departing from the principle of the present invention should also be regarded as the protection scope of the present invention.

Claims

1. A non-contact sealing structure for a spindle of a crystalline silicon slicer, characterized in that: It includes a main shaft outer sleeve, which is sleeved on the outside of the main shaft core shaft and is used to support the main shaft core shaft; A sealing static ring, which is fixed on one side of the spindle outer casing close to the end of the spindle core shaft; and a sealing dynamic ring fixed on the spindle core shaft; An air curtain gap and a drain cavity are formed between the sealing static ring and the sealing dynamic ring. The drain cavity is located on the side of the air curtain gap close to the component installation space. The air curtain gap is connected to the outside world. The sealing static ring is provided with a static ring air supply hole for supplying air to the air curtain gap. The sealing static ring is provided with a static ring drain hole for discharging polluted impurities in the drain cavity. A flange is provided between the sealing static ring and the main shaft outer sleeve. The flange is provided with a flange drain hole interconnected with the static ring drain hole. The main shaft outer sleeve is provided with a main shaft outer sleeve drain hole interconnected with the flange drain hole. High-pressure gas is introduced into the air supply hole of the static ring, and the air supply hole sends the gas into the air curtain gap. Part of the gas forms an air curtain blowing outward in the air curtain gap, and part of the gas enters the sewage discharge cavity. The air curtain can prevent pollutants from entering between the sealed static ring and the sealed dynamic ring. The gas blown into the sewage discharge cavity can blow out the impurities that break through the air curtain and enter the sewage discharge cavity through the static ring sewage discharge hole.

2. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 1, characterized in that: A first sealing gap is provided between the air curtain gap and the sewage discharge cavity for limiting the gas entering the sewage discharge cavity.

3. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 2, characterized in that: An annular air outlet gap is provided between the first sealing gap and the air curtain gap, and the air outlet gap is directly connected to the static ring air supply hole.

4. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 3, characterized in that: An air supply ring groove is arranged on the side where the sealing static ring and the flange are in contact with each other, and a flange air supply hole is opened on the flange to supply air to the air supply ring groove. There are several static ring air supply holes arranged on the sealing static ring and surrounding the sealing static ring.

5. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 2, characterized in that: The side of the sewage discharge cavity close to the component installation space is provided with a grease containing cavity located between the sealing static ring and the sealing dynamic ring, and the grease containing cavity is used to contain grease.

6. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 5, characterized in that: A second sealing gap located between the sealing static ring and the sealing dynamic ring is arranged between the sewage discharge cavity and the grease containing cavity.

7. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 6, characterized in that: The first sealing gap and the second sealing gap are both labyrinth gaps, and the labyrinth gap is a gap whose extending direction changes at least once.

8. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 1, characterized in that: The sealing static ring includes a sealing static ring 1 and a sealing static ring 2. An air curtain gap is formed between the sealing static ring 2 and the sealing dynamic ring. The sealing static ring 1 and the sealing static ring 2 are integrated or separated. When the sealing static ring 1 and the sealing static ring 2 are separated, the relative positions of the sealing static ring 1 and the sealing static ring 2 are fixed.

9. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 8, characterized in that: A flange is arranged between the main shaft outer sleeve and the sealing static ring 1, and the flange is fixedly connected to the main shaft outer sleeve. The sealing static ring 1 and the flange are integral or separate. When the sealing static ring 1 and the flange are separate, the relative position of the sealing static ring 1 and the flange is fixed.

10. The non-contact sealing structure for a main shaft of a silicon wafer slicer according to claim 1, characterized in that: Along the direction away from the component installation space, the diameter of the sealing dynamic ring close to the sealing static ring gradually increases.

Images