Wafer test rotary lift

By using multi-screw transmission and dual-guided shaft guidance in wafer testing equipment, the problem of insufficient precision of the lifting mechanism is solved, and higher motion and positioning accuracy and more stable wafer testing are achieved.

CN112103238BActive Publication Date: 2025-04-04CHANGSHUN GUANGHUA MICRO ELECTRONICS EQUIP ENG CENT
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Patent Information

Application Number
CN202011069405.2
Authority / Receiving Office
CN · China
Patent Type
Patents(China)
Current Assignee / Owner
Filing Date
2020-09-30
Publication Date
2025-04-04
Estimated Expiration
2040-09-30

AI Technical Summary

Technical Problem

In the existing wafer testing equipment, the accuracy of the lifting mechanism is insufficient, resulting in small lifting force, poor stability, low accuracy, complex structure, and high manufacturing cost.

Method used

Multi-screw transmission and dual-guiding shaft guidance are adopted to eliminate transmission gaps and improve vertical motion positioning accuracy and straightness. Through the joint rotation of the bearing, the sleeve and the workbench, and the high-precision rotation mechanism, the precise correction of wafer rotation is achieved.

Benefits of technology

It achieves higher motion and positioning accuracy, improves the accuracy and stability of wafer testing, and reduces manufacturing costs.

✦ Generated by Eureka AI based on patent content.

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    Figure CN112103238B_ABST
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Abstract

A rotary lifting platform for wafer testing includes a driving mechanism, a guiding mechanism, a rotating mechanism, and a workbench. The guiding mechanism is located above the driving mechanism, and the guiding mechanism is connected to the driving mechanism through a screw group. The driving mechanism drives the guiding mechanism to move up and down along the main guide shaft and the auxiliary guide shaft through the screw group. The workbench is located above the guiding mechanism, and the workbench moves up and down with the guiding mechanism. Driven by the rotating mechanism, the workbench can rotate with the shaft sleeve around the bearing center. The present invention adopts a multi-screw transmission and a double guide shaft guiding method to enable the rotary lifting platform to obtain higher vertical motion straightness and high positioning accuracy, while achieving precise correction of wafer rotation, so as to better complete wafer testing work.
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Description

Technical Field

[0001] The invention relates to the field of machinery, and in particular to a high-precision rotary lifting platform used for wafer testing. Background Art

[0002] The integrated circuit industry is developing rapidly, and the requirements for the yield of chip products are increasing. In order to reduce the waste of defective products in subsequent processing, the requirements for wafer testing equipment are also increasing. At this time, a more efficient, stable and accurate high-precision rotary lift table for wafer testing is extremely important.

[0003] The application with announcement number CN201196655Y discloses a wafer adsorption and unloading device that can be lifted vertically and rotated horizontally. Although the device can shorten the test time of the wafer and realize longitudinal lifting and horizontal rotation, it uses a single-wire drive and deep groove ball bearing for positioning, resulting in serious lack of accuracy.

[0004] The application with announcement number CN105047575B discloses an inclined block lifting mechanism for wafer testing, which can to a certain extent solve the shortcomings of the lifting mechanism for wafer testing, such as small lifting force, poor lifting stability, low precision, complex structure and high manufacturing cost. However, since it uses an inclined block lifting mechanism, it is prone to creeping problems at slow speeds, and it produces too many gaps in the moving parts. At the same time, there will be a large horizontal force during the lifting process, which will cause serious loss of precision when the working resistance is large. Summary of the invention

[0005] In view of the above problems, the purpose of the present invention is to provide a high-precision rotating lifting platform for wafer inspection that adopts multi-screw transmission and double guide shaft guidance, so that the multi-screw can eliminate the transmission gap during the lifting process, and the double guide shaft can improve the lifting straightness through positioning, thereby achieving higher precision; through the bearing, the sleeve and the worktable can rotate together, and a slot position is left, which cooperates with the high-precision rotating mechanism to realize precise correction of the wafer rotation.

[0006] To achieve the above object, the present invention adopts the following specific technical solutions:

[0007] The present invention provides a rotating lifting platform for wafer testing, comprising a driving mechanism, a guiding mechanism, a rotating mechanism and a workbench; the guiding mechanism comprises a guiding branch mechanism and a rotating branch mechanism, the guiding branch mechanism is connected to the driving mechanism, the rotating branch mechanism is connected to the rotating mechanism, the workbench is connected to the rotating branch mechanism, the workbench is driven by the driving mechanism, is lifted and lowered under the guidance of the guiding branch mechanism, and is horizontally rotated by the cooperation of the rotating mechanism and the rotating branch mechanism.

[0008] Preferably, the driving mechanism includes a base plate, a screw group, a driving motor, a driving belt, and a synchronous belt; the screw group is located above the base plate and is connected to the base plate by bolts; the driving motor is located above the base plate, and the driving motor and the base plate are connected by bolts; the screw group includes at least two screws, each screw being connected by a synchronous belt, and one of the screws is connected to the driving motor by a belt.

[0009] Preferably, the guide branch mechanism includes a base, a main guide shaft, a secondary guide shaft and a shaft seat, the main guide shaft is located in the middle of the shaft seat and is connected to the shaft seat by bolts; the shaft seat is located in the middle of the base and is connected to the base by bolts; the secondary guide shaft is located on the side of the base and is connected to the base by bolts.

[0010] Preferably, the rotating branch mechanism includes a bearing and a sleeve, the bearing is located inside the base, and the outer ring of the bearing is interference fit with the base; the sleeve is located inside the bearing and is interference fit with the inner ring of the bearing; the workbench is connected to the rotating branch mechanism through the sleeve.

[0011] Preferably, a sleeve through hole is opened on the bottom plate, and the sleeves of the main guide shaft and the auxiliary guide shaft are installed in the sleeve through hole; a mounting hole is opened on the base, and a nut seat is installed in the mounting hole, and the nut sleeve of the screw assembly is installed in the nut seat.

[0012] Preferably, the cross section of the main guide shaft is triangular, circular or square.

[0013] Preferably, the rotating mechanism includes a rotating motor, a base, a rotating screw, two follower bearings, a rotating drive plate and two limit blocks; the rotating motor is connected to the base by bolts, and the base is connected to the pedestal by bolts; the rotating screw is fixed to the base, and the two follower bearings are threadedly connected to the rotating screw and are symmetrically distributed on both sides of the rotating drive plate to clamp one end of the rotating drive plate; the two limit blocks are respectively fixed to the base, and a limit through hole is formed between the two limit blocks, and the other end of the rotating drive plate passes through the limit through hole and is connected to the shaft sleeve by screws.

[0014] Preferably, the outer contour curve of the follower bearing is an Archimedean curve.

[0015] Preferably, the workbench includes a work disk, a base disk, and a base; the work disk is located above the base disk, and the work disk and the base disk are connected by bolts; the base disk is located above the base, and is connected to the base by bolts; the base and the sleeve are connected by bolts.

[0016] The advantages of the present invention are: using multi-screw transmission to eliminate transmission gap and improve the vertical motion positioning accuracy; using double guide shaft over-positioning to improve the vertical motion straightness; through the bearing, the sleeve and the worktable can rotate together, and a slot position is left, which can achieve accurate correction of wafer rotation in conjunction with a high-precision rotating mechanism, thereby achieving higher motion and positioning accuracy; the outer contour of the follower bearing adopts an Archimedean curve, and when converting linear motion into rotation, the proportional relationship between the linear motion distance and the rotation angle can be fixed, thereby achieving higher rotation accuracy and making it easier to control the rotation angle; at the same time, it has high vertical motion positioning accuracy, high vertical motion straightness, and high horizontal rotation motion accuracy, so that the high-precision rotary lifting platform used for wafer testing can also better complete wafer testing work, and is also more suitable for installation in wafer testing equipment. BRIEF DESCRIPTION OF THE DRAWINGS

[0017] Figure 1 It is a structural schematic diagram of a rotating lifting platform for wafer testing according to an embodiment of the present invention;

[0018] Figure 2 is a schematic structural diagram of a driving mechanism according to an embodiment of the present invention;

[0019] Figure 3 for Figure 2 A top view of

[0020] Figure 4 is a structural schematic diagram of a guide mechanism according to an embodiment of the present invention;

[0021] Figure 5 is a schematic structural diagram of a rotating mechanism according to an embodiment of the present invention;

[0022] Figure 6 Schematic diagram of the structure of a workbench according to an embodiment of the present invention.

[0023] The figure marks include: driving mechanism 1, base plate 11, screw group 12, first screw rod 121, second screw rod 122, third screw rod 123, fourth screw rod 124, driving motor 13, driving belt 14, synchronous belt 15, guide mechanism 2, base 21, main guide shaft 22, secondary guide shaft 23, shaft seat 24, bearing 25, bushing 26, rotating mechanism 3, rotating motor 31, base 32, rotating screw rod 33, follower bearing 34, rotating driving plate 35, limit block 36, workbench 4, working disk 41, base disk 42, base 43. DETAILED DESCRIPTION

[0024] In order to make the purpose, technical solution and advantages of the present invention more clearly understood, the present invention is further described in detail below in conjunction with the accompanying drawings and specific implementation methods. It should be understood that the specific embodiments described herein are only used to explain the present invention and do not constitute a limitation of the present invention.

[0025] The following is a detailed description of a rotary lifting platform for wafer testing provided by the present invention in accordance with an embodiment of the present invention.

[0026] like Figure 1 As shown, the rotary lifting platform for wafer testing described in the present invention includes a driving mechanism 1, a guiding mechanism 2, a rotating mechanism 3, and a workbench 4; wherein the guiding mechanism 2 includes a guiding branch mechanism and a rotating branch mechanism, the guiding branch mechanism is connected to the driving mechanism 1, the rotating branch mechanism is connected to the rotating mechanism 3, and the workbench 4 is connected to the rotating branch mechanism, the workbench 4 is driven by the driving mechanism 1 to be lifted and lowered under the guidance of the guiding branch mechanism, and horizontal rotation is achieved through the cooperation of the rotating mechanism 3 and the rotating branch mechanism.

[0027] like Figure 2 As shown, the drive mechanism 1 includes a base plate 11, a screw group 12, a drive motor 13, a drive belt 14, and a synchronous belt 15. Specifically, the screw group 12 is located above the base plate 11 and is connected to the base plate 11 by bolts; the drive motor 13 is located above the base plate 11, and the drive motor 13 is connected to the base plate 11 by bolts; each screw in the screw group 12 is kept in synchronous rotation by a synchronous belt 15, and a screw in the screw group 12 is connected to the drive motor 13 by a drive belt 14, so as to ensure that the screw group 12 and the output end of the drive motor 13 are kept in synchronous rotation, so that the guide mechanism 2 can be lifted and lowered smoothly, and the transmission of multiple screws can eliminate the transmission gap and improve the positioning accuracy of vertical motion.

[0028] like Figure 3 As shown, the screw assembly 12 includes at least two screw rods. Figure 3 The diagram shows four screw rods, namely the first screw rod 121, the second screw rod 122, the third screw rod 123 and the fourth screw rod 124. The first screw rod 121 and the second screw rod 122, the second screw rod 122 and the third screw rod 123, and the third screw rod 123 and the fourth screw rod 124 are connected by a synchronous belt 15 to keep synchronous rotation. The screw rod has threads and is equipped with a fixed nut, which can convert the rotation of the screw rod into a linear motion of the nut along the screw rod direction.

[0029] like Figure 4 As shown, the guide mechanism 2 includes a guide branch mechanism and a rotation branch mechanism, wherein the guide branch mechanism, driven by the lead screw assembly 12, drives the base 21 to move up and down along the direction of the guide axis.

[0030] In a preferred embodiment of the present invention,

[0031] The guide branch mechanism includes: a base 21, a main guide shaft 22, a secondary guide shaft 23 and a shaft seat 24; specifically, in the guide branch mechanism, the main guide shaft 22 is located in the middle of the shaft seat 24 and is connected to the shaft seat 24 by bolts; the shaft seat 24 is located in the middle of the base 21 and is connected to the base 21 by bolts; the secondary guide shaft 23 is located on the side of the base 21 and is connected to the base 21 by bolts; a nut seat matching the screw group 12 is provided in the base 21, and a shaft sleeve through hole is opened on the bottom plate 11; the nut of the screw group 12 is connected to the nut seat in the base 21, and the shaft sleeves of the main guide shaft 22 and the secondary guide shaft 23 are installed in the shaft sleeve through hole, so that the base 21 can move up and down along the direction of the main guide shaft 22 and the secondary guide shaft 23 under the drive of the drive motor 13 of the screw group 12, and the double guide shaft over-positioning method improves the vertical motion straightness.

[0032] The rotating branch mechanism serves as a connecting piece between the workbench 4 and the rotating mechanism 3, and includes: a bearing 25 and a sleeve 26; the bearing 25 is located inside the base 21, and the outer ring of the bearing 25 is interference fit with the base 21, and the sleeve 26 is located inside the bearing 25 and is interference fit with the inner ring of the bearing 25, that is, the bearing 25 is located between the sleeve 26 and the base 21, and the rotation of the sleeve 26 relative to the base 21 is realized by the bearing 25.

[0033] In a preferred embodiment of the present invention, Figure 5 As shown, the rotating mechanism 3 includes a rotating motor 31, a base 32, a rotating screw 33, a follower bearing 34 and a rotating drive plate 35. Specifically, the rotating motor 31 is connected to the base 21 by bolts; the base 32 is connected to the rotating motor 31 by bolts, and the rotating screw 33 is fixed in the middle of the base 32; the follower bearing 34 is threadedly connected to the rotating screw 33, symmetrically distributed on both sides of the rotating drive plate 35, and clamps one end of the rotating drive plate 35; two limit blocks 36 are fixed to the base 32, and a limit through hole is formed between the two limit blocks 36. The other end of the rotating drive plate 35 passes through the limit through hole and is connected to the top side of the shaft sleeve 26 by screws. The limit through hole plays a shielding role, so that the rotating drive plate 35 can rotate.

[0034] Specifically, when the rotating motor 31 drives the rotating screw 33 to rotate, the rotating screw 33 drives the two follower bearings 34 to perform reciprocating linear motion, and the clamped end of the rotating drive plate 35 abuts against the limit block 36, so that the other end of the rotating drive plate 35 rotates tilted, thereby converting the linear motion of the follower bearing 34 into rotation of the rotating drive plate 35, and the rotating drive plate 35 drives the shaft sleeve 26 fixed thereto to rotate. The shaft sleeve 26 itself acts as a rotating shaft and can realize self-rotation, and the base 21 does not rotate with the shaft sleeve 26.

[0035] Therefore, in a preferred embodiment of the present invention, the outer contour curve of the follower bearing 34 is an Archimedean curve, which has the advantage that when converting linear motion into rotation, the proportional relationship between the linear motion distance and the rotation angle can be fixed, thereby achieving higher rotation accuracy and making it easier to control the rotation angle.

[0036] like Figure 6 As shown, the workbench 4 is composed of a work disk 41, a base disk 42, and a base 43; the work disk 41 is located above the base disk 42, and the work disk 41 and the base disk 42 are connected by bolts; the base disk 42 is located above the base 43, and is connected to the base 43 by bolts; the base 43 is connected to the sleeve 26 by bolts. When the sleeve 26 is driven to rotate by the rotating drive plate 35, the base 43 is driven to rotate, thereby driving the work disk 41 to rotate, and realizing the horizontal rotation function of the workbench 4.

[0037] In combination with the above description, in a preferred embodiment of the present invention, the shaft sleeve 26 in the rotating branch structure is located inside the base 21 in the guide branch mechanism and is bolted to the base 21, the shaft sleeve 26 is connected to the rotating drive plate 35 in the rotating mechanism 3, and the rotating mechanism 3 is bolted to the base 21; therefore, when the driving motor 13 drives the lead screw group 12 to move up and down along the main guide shaft 22, the base 21 and the shaft sleeve 26, bearing 25 and shaft seat 24 inside it are driven to move up and down at the same time, and the shaft sleeve 26 drives the workbench 4 to move up and down; the rotating motor 31 drives When the movable rotating screw 33 rotates, the rotating screw 33 drives the two follower bearings 34 to perform reciprocating linear motion, and the clamped end of the rotating drive plate 35 abuts against the limit block 36, so that the other end of the rotating drive plate 35 rotates tiltedly, thereby converting the linear motion of the follower bearing 34 into rotation of the rotating drive plate 35, and the rotating drive plate 35 drives the shaft sleeve 26 fixed thereto to rotate. The shaft sleeve 26 itself serves as a rotating shaft and can realize self-rotation, while the base 21 does not rotate with the shaft sleeve 26, thereby realizing that the workbench 4 can rotate around the center while moving up and down.

[0038] The above content describes in detail the structure of the wafer testing rotary lifting platform provided by the present invention. The working process of the wafer testing rotary lifting platform is as follows:

[0039] S1: The driving motor 13 drives the first screw rod 121 to rotate synchronously via the driving belt 14 .

[0040] S2: The synchronous belt 15 drives the first screw rod 121, the second screw rod 122, the third screw rod 123, and the fourth screw rod 124 to rotate synchronously, which can eliminate the movement gap of the screw rod transmission, and at the same time make the base 21 rise along the main guide shaft 22 and the auxiliary guide shaft 23, and the base 21 indirectly drives the workbench 4 to rise synchronously.

[0041] S3: The rotating motor 31 drives the rotating screw 33 fixed on the base 32 to rotate, and at the same time drives one end of the rotating driving plate 35 sandwiched between the two follower bearings 34 to make horizontal linear motion.

[0042] S4: The other end of the rotating driving plate 35 pushes the shaft sleeve 26 to rotate under the restriction of the limiting through holes formed by the two limiting blocks 36.

[0043] S5: The horizontal surface of the sleeve 26 is connected to the base 43 of the workbench 4, so that when the sleeve 26 rotates around its own center, it drives the workbench to rotate horizontally, thereby achieving angle correction of the workbench 4.

[0044] Thereby, the rotary lifting platform used for wafer testing can realize wafer testing with high vertical motion positioning accuracy, high vertical motion straightness, and high horizontal rotation motion accuracy.

[0045] In the description of the present invention, the description with reference to the terms "one embodiment", "some embodiments", "example", "specific example", or "some examples" etc. means that the specific features, structures, materials or characteristics described in conjunction with the embodiment or example are included in at least one embodiment or example of the present invention. In this specification, the schematic representations of the above terms do not necessarily refer to the same embodiment or example. Moreover, the specific features, structures, materials or characteristics described may be combined in any one or more embodiments or examples in a suitable manner. In addition, those skilled in the art may combine and combine the different embodiments or examples described in this specification and the features of the different embodiments or examples, without contradiction.

[0046] Although the embodiments of the present invention have been shown and described above, it is to be understood that the above embodiments are exemplary and are not to be construed as limitations of the present invention. A person skilled in the art may change, modify, replace and vary the above embodiments within the scope of the present invention.

[0047] The above specific implementations of the present invention do not constitute a limitation on the protection scope of the present invention. Any other corresponding changes and modifications made based on the technical concept of the present invention should be included in the protection scope of the claims of the present invention.

Claims

1. A rotating lifting platform for wafer testing, characterized in that: include: A driving mechanism (1), a guiding mechanism (2), a rotating mechanism (3), and a workbench (4), wherein the guiding mechanism (2) comprises a guiding branch mechanism and a rotating branch mechanism, the guiding branch mechanism is connected to the driving mechanism (1), the rotating branch mechanism is connected to the rotating mechanism (3), and the workbench (4) is connected to the rotating branch mechanism; the workbench (4) is driven by the driving mechanism (1), is lifted and lowered under the guidance of the guiding branch mechanism, and is horizontally rotated by the cooperation between the rotating mechanism (3) and the rotating branch mechanism; The drive mechanism (1) comprises a base plate (11), a lead screw group (12), a drive motor (13), a drive belt (14), and a synchronous belt (15); the lead screw group (12) is located above the base plate (11) and is connected to the base plate (11) via bolts; the drive motor (13) is located above the base plate (11), and the drive motor (13) and the base plate (11) are connected via bolts; the lead screw group (12) comprises at least two lead screws, each lead screw being connected via a synchronous belt (15), and one of the lead screws is connected to the drive motor (13) via the drive belt (14); The guide branch mechanism comprises a base (21), a main guide shaft (22), a secondary guide shaft (23), and a shaft seat (24); the main guide shaft (22) is located in the middle of the shaft seat (24) and is connected to the shaft seat (24) by bolts; the shaft seat (24) is located in the middle of the base (21) and is connected to the base (21) by bolts; the secondary guide shaft (23) is located on the side of the base (21) and is connected to the base (21) by bolts; The rotary branch mechanism comprises a bearing (25) and a sleeve (26); the bearing (25) is located inside the base (21), and the outer ring of the bearing (25) is interference fit with the base (21); the sleeve (26) is located inside the bearing (25) and is interference fit with the inner ring of the bearing (25); the workbench (4) is connected to the rotary branch mechanism via the sleeve (26); The rotating mechanism (3) comprises: a rotating motor (31), a base (32), a rotating screw (33), two follower bearings (34), a rotating drive plate (35) and two limit blocks (36); the rotating motor (31) is connected to the base (32) by bolts; the base (32) is connected to the pedestal (21) by bolts; the rotating screw (33) is fixed to the base (32); the two follower bearings (34) are threadedly connected to the rotating screw (33) and symmetrically distributed on both sides of the rotating drive plate (35) to clamp one end of the rotating drive plate (35); the two limit blocks (36) are respectively fixed to the base (32), a limit through hole is formed between the two limit blocks, and the other end of the rotating drive plate (35) passes through the limit through hole and is connected to the shaft sleeve (26) by screws.

2. The wafer testing rotary lifting platform as claimed in claim 1, characterized in that: A shaft sleeve through hole is provided on the bottom plate (11), and shaft sleeves of the main guide shaft (22) and the auxiliary guide shaft (23) are mounted in the shaft sleeve through hole; a mounting hole is provided on the base (21), and a nut seat is mounted in the mounting hole, and the nut sleeve of the lead screw assembly (12) is mounted in the nut seat.

3. The wafer testing rotary lifting platform as claimed in claim 1, characterized in that: The cross section of the main guide shaft (22) is triangular, circular or square.

4. The wafer testing rotary lifting platform as claimed in claim 1, characterized in that: The outer contour curve of the follower bearing (34) is an Archimedean curve.

5. The wafer testing rotary lifting platform as claimed in claim 1, characterized in that: The workbench (4) comprises a work disk (41), a base disk (42) and a base (43); wherein the work disk (41) is located above the base disk (42), and the work disk (41) and the base disk (42) are connected via bolts; the base disk (42) is located above the base (43) and is connected to the base (43) via bolts; and the base (43) and the shaft sleeve (26) are connected via bolts.

Citation Information

Patent Citations

  • A slant lifting mechanism for wafer testing

    CN105047575B

  • Wafer adsorption and discharging apparatus with longitudinal elevation and horizontal rotation function

    CN201196655Y

  • Wafer transfer device

    CN204271049U

  • Rotary lifting platform for wafer testing

    CN212907697U