LPCVD and ALD dual-purpose gas distribution device

Abstract

The LPCVD and ALD dual-purpose gas distribution device comprises a heating furnace, a fastening flange for connecting the gas distribution device is arranged at the furnace mouth of the heating furnace, two coaxially connected gas distribution flanges are arranged on the side of the fastening flange away from the heating furnace in the axial direction, the two gas distribution flanges are connected with the fastening flange by bolts, the side of the gas distribution flange close to the heating furnace in the axial direction is the inner side, and the side away from the heating furnace is the outer side, and a furnace mouth cover plate matching the gas distribution flange is arranged on the outer side of the gas distribution flange located on the outer side. The use of this device can make one heating furnace compatible with two coating processes, can reduce the purchase amount of heating furnaces, reduce costs and save space.

Description

Technical Field

[0001] The invention relates to a dual-purpose gas distribution device for LPCVD and ALD. Background Art

[0002] LPCVD and ALD are two commonly used coating processes in chemical vapor deposition coating processes. Both need to be carried out in a vacuum furnace tube reactor. However, due to the different raw materials and process details of LPCVD and ALD, their corresponding gas distribution devices cannot be shared. In the prior art, a reactor and a matching gas distribution device are set up for LPCVD and ALD respectively. It is costly to prepare a set of reactor equipment for each process, and it occupies a large area. Summary of the invention

[0003] The technical problem to be solved by the present invention is to provide a dual-purpose gas distribution device for LPCVD and ALD, which can be compatible with both LPCVD and ALD coating processes through a set of equipment.

[0004] In order to solve the above technical problems, the present invention provides a dual-purpose gas distribution device for LPCVD and ALD, including a heating furnace, a fastening flange for connecting the gas distribution device is arranged at the furnace mouth of the heating furnace, and two coaxially connected gas distribution flanges are arranged on the side of the fastening flange axially away from the heating furnace, the two gas distribution flanges are connected to the fastening flange by bolts, and the side of the gas distribution flange axially close to the heating furnace is inner, and the side away from the heating furnace is outer, and the outer side of the gas distribution flange located on the outer side is provided with a furnace mouth cover plate matching the gas distribution flange.

[0005] For the purpose of simple explanation, the LPCVD and ALD dual-purpose gas distribution device described in the present invention is referred to as the present device below.

[0006] The advantages of this device are: by using this device, one heating furnace can be compatible with two coating processes, which can reduce the purchase quantity of heating furnaces, reduce costs and save occupied space.

[0007] The two gas distribution flanges correspond to the LPCVD and ALD coating processes respectively. Assume that the gas distribution flange used for LPCVD is gas distribution flange a, and the gas distribution flange used for ALD is gas distribution flange b:

[0008] When using the low-pressure chemical vapor deposition mode, open the corresponding pipeline of the gas distribution flange a, and close the pipeline of the gas distribution flange b at the same time. Use a quartz boat as a carrier, and the direction of the silicon wafer is perpendicular to the direction of the airflow. When using the atomic layer deposition mode, open the corresponding pipeline of the gas distribution flange b, and close the pipeline of the gas distribution flange a at the same time. Use a metal boat, and the direction of the silicon wafer is parallel to the direction of the airflow.

[0009] In order to achieve better use effect of the present invention, the preferred scheme is as follows:

[0010] Preferably, for any of the air distribution flanges, a plurality of first annular grooves are provided on the circumferential inner side of the air distribution flange, and the plurality of first annular grooves are arranged at intervals along the axial direction of the air distribution flange. A retaining ring matching the first annular groove is provided on the opening side of each first annular groove, and the circumferential inner side of the retaining ring is flush with the circumferential inner side of the air distribution flange. Each first annular groove and the corresponding retaining ring form an annular air passage, and each retaining ring is circumferentially evenly provided with a plurality of through holes connecting the inside and outside of the first annular groove, and each through hole is provided with a plunger matching the through hole, and the plunger is a solid plunger or a plunger with a perforation. A plurality of air holes are provided on the circumferential outer side of the air distribution flange, and the air holes are arranged at intervals along the circumference of the air distribution flange on the outside of the air distribution flange, and the air holes correspond one-to-one to the first annular grooves and the corresponding air holes are connected to the first annular grooves.

[0011] The structure of this air distribution flange distributes air evenly and the size and flow direction of the air intake can be adjusted by replacing plungers with different apertures or solid plungers, thereby meeting different types of coating requirements.

[0012] Preferably, the air distribution flange is provided with an annular water channel arranged along the circumference of the air distribution flange, the annular water channel is provided with a partition matching the annular water channel, and a channel connecting the annular water channel is respectively provided on both sides of the partition in the annular water channel at the circumferential outer side of the air distribution flange.

[0013] One of the two channels connected to the annular water channel is a water inlet and the other is a water outlet, so that a circulating water path can be formed in the air distribution flange, which has the effect of cooling the air distribution flange and protecting the air distribution flange from being damaged by the high temperature of the heating furnace.

[0014] Preferably, at least one axial side surface of the air distribution flange is provided with a second annular groove arranged along the circumference of the air distribution flange, and the opening of the second annular groove is a closed structure.

[0015] When the air-in-place flange needs to cooperate with other flanges, installing a matching rubber ring in the second annular groove on the corresponding axial side can increase the air tightness of the flange cooperation. The closing structure can make the rubber ring installation more stable and not easy to fall out.

[0016] Preferably, the plunger and the through hole are threadedly matched.

[0017] The plunger is matched with the through-hole thread, which is convenient and quick to install and remove, and is easy to replace as needed.

[0018] Preferably, the through holes on the adjacent retaining rings are arranged alternately.

[0019] The through holes on the retaining rings at adjacent positions are arranged in a staggered manner, so that the air distribution flange can distribute air more evenly. BRIEF DESCRIPTION OF THE DRAWINGS

[0020] Figure 1 It is a top view of the device.

[0021] Figure 2 This is the front view of the device.

[0022] Figure 3 It is the left view of any air distribution flange in this device.

[0023] Figure 4 This is the front view of any air distribution flange in this device.

[0024] Figure 5 yes Figure 3 AA section view.

[0025] Figure 6 yes Figure 4 EE partial cross-sectional enlarged view.

[0026] Figure 7 yes Figure 4 An enlarged partial cross-sectional view of the FF.

[0027] Figure 8 yes Figure 5 DD partial cross-sectional enlarged view.

[0028] Fig. 9 yes Figure 5 A partial enlarged view of part B.

[0029] Fig.10 yes Fig. 9 A partial enlarged view of part C. DETAILED DESCRIPTION

[0030] See also Figure 1-10 , a dual-purpose gas distribution device for LPCVD and ALD comprises a heating furnace 1, a fastening flange 2 for connecting the gas distribution device is arranged at the furnace mouth of the heating furnace 1, two coaxially connected gas distribution flanges 3 are arranged on the side of the fastening flange 2 axially away from the heating furnace 1, the two gas distribution flanges 3 are connected to the fastening flange 2 by bolts, the side of the gas distribution flange 3 axially close to the heating furnace 1 is assumed to be inner, and the side away from the heating furnace 1 is assumed to be outer, a furnace mouth cover plate 5 matching the gas distribution flange 3 is arranged on the outer side of the gas distribution flange 3 located on the outer side, the furnace mouth cover plate 5 is controlled by a control arm 6 and abuts against the gas distribution flange 3 located on the outer side.

[0031] For any of the air distribution flanges 3, a plurality of first annular grooves 31 are arranged on the inner circumferential side of the air distribution flange 3, and the plurality of first annular grooves 31 are arranged at intervals along the axial direction of the air distribution flange 3. The opening side of each first annular groove 31 is provided with a retaining ring 32 matching the first annular groove 31, and the inner circumferential side of the retaining ring 32 is flush with the inner circumferential side of the air distribution flange 3. Each first annular groove 31 and the corresponding retaining ring 32 form an annular air passage, and each retaining ring 32 is uniformly distributed with a plurality of threaded through holes 321 connecting the inside and outside of the first annular groove 31 in the circumferential direction, and the threaded through holes 321 on the adjacent retaining rings 32 are arranged in a staggered manner. Each threaded through hole 321 is provided with a plunger 322 matching the threaded through hole 321, and the plunger 322 is threadedly matched with the threaded through hole 321. The plunger 322 is a solid plunger 322 or a plunger 322 with a perforation 323. A plurality of air holes 311 are provided on the circumferential outer side of the air distribution flange 3. The air holes 311 are arranged at intervals along the circumferential direction of the air distribution flange 3 on the outer side of the air distribution flange 3. The air holes 311 correspond to the first annular groove 31 one by one and the corresponding air holes 311 are connected to the first annular groove 31.

[0032] The air distribution flange 3 is provided with an annular water channel 33 arranged along the circumference of the air distribution flange 3, and the annular water channel 33 is provided with a partition 331 matching the annular water channel 33. A channel 332 connecting the annular water channel 33 is provided on both sides of the partition 331 in the annular water channel 33 at the circumferential outer position of the air distribution flange 3.

[0033] A second annular groove 34 is provided on at least one axial side surface of the air distribution flange 3 and is arranged along the circumference of the air distribution flange 3 . The opening of the second annular groove 34 is a closed structure.

[0034] The advantages of the device are: by using the device, one heating furnace 1 can be compatible with two coating processes, which can reduce the purchase amount of the heating furnace 1, reduce costs and save occupied space.

[0035] The two gas distribution flanges 3 correspond to the two coating processes of LPCVD and ALD respectively. It is assumed that the gas distribution flange 3 used for LPCVD is gas distribution flange 3a, and the gas distribution flange 3 used for ALD is gas distribution flange 3b:

[0036] When using the low-pressure chemical vapor deposition mode, the corresponding pipeline of the gas distribution flange 3a is opened, and the pipeline of the gas distribution flange 3b is closed at the same time, and a quartz boat is used as a carrier, and the direction of the silicon wafer is perpendicular to the direction of the airflow; when using the atomic layer deposition mode, the corresponding pipeline of the gas distribution flange 3b is opened, and the pipeline of the gas distribution flange 3a is closed at the same time, and a metal boat is used, and the direction of the silicon wafer is parallel to the direction of the airflow (the pipeline connected to the air hole of the gas distribution flange is not shown in the figure).

[0037] The structure of the air distribution flange 3 can distribute air evenly and the size and flow direction of the air intake can be adjusted by replacing the plungers 322 with different apertures or the solid plungers 322, so as to meet different types of coating requirements.

[0038] One of the two channels 332 connected to the annular water channel 33 is a water inlet and the other is a water outlet, so that a circulating water circuit can be formed in the air distribution flange 3, which has the effect of cooling the air distribution flange 3 and protecting the air distribution flange 3 from being damaged by the high temperature of the heating furnace 1.

[0039] When the air-in-place flange 3 needs to be matched with other flanges, installing a matching rubber ring in the second annular groove 34 on the corresponding axial side can increase the air tightness of the flange matching. The closing structure can make the rubber ring installation more stable and not easy to fall out.

[0040] The plunger 322 is threadably matched with the threaded through hole 321, so installation and removal are quick and easy, and it is convenient to replace it as needed.

[0041] The threaded through holes 321 on the retaining rings 32 at adjacent positions are arranged in a staggered manner, so that the air distribution flange 3 can distribute air more evenly.

Claims

1. LPCVD and ALD dual-purpose gas distribution device, characterized by: A heating furnace is included, wherein a fastening flange for connecting a gas distribution device is arranged at the furnace mouth of the heating furnace, two coaxially connected gas distribution flanges are arranged on the side of the fastening flange away from the heating furnace in the axial direction, the two gas distribution flanges are connected to the fastening flange by bolts, the side of the gas distribution flange close to the heating furnace in the axial direction is the inner side, and the side away from the heating furnace is the outer side, and a furnace mouth cover plate matching the gas distribution flange is arranged on the outer side of the gas distribution flange located on the outer side; Any one of the air distribution flanges is circular in shape, and a plurality of first annular grooves are provided on the circumferential inner side of the air distribution flange, and the plurality of first annular grooves are arranged at intervals along the axial direction of the air distribution flange, and a retaining ring matching the first annular groove is provided on the opening side of each first annular groove, and the circumferential inner side of the retaining ring is flush with the circumferential inner side of the air distribution flange, and each first annular groove and the corresponding retaining ring form an annular air passage, and each retaining ring is circumferentially evenly provided with a plurality of through holes connecting the inside and outside of the first annular groove, and each through hole is provided with a plunger matching the through hole, and the plunger is a solid plunger or a plunger with a perforation, and a plurality of air holes are provided on the circumferential outer side of the air distribution flange, and the air holes are arranged at intervals along the circumference of the air distribution flange on the outside of the air distribution flange, and the air holes correspond to the first annular grooves one by one and the corresponding air holes are connected to the first annular grooves; The air distribution flange is provided with an annular water channel arranged along the circumference of the air distribution flange, the annular water channel is provided with a partition matching the annular water channel, and a channel connected to the annular water channel is provided at both sides of the partition in the annular water channel at the circumferential outer side of the air distribution flange; A second annular groove is provided on at least one axial side surface of the air distribution flange and is arranged along the circumference of the air distribution flange, and the opening of the second annular groove is a closed structure; The plunger and the through hole are threadedly matched; The through holes on the retaining rings at adjacent positions are arranged in a staggered manner.

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