Plasma device including two air inlets
By designing a plasma device with a two air inlet, inputting air or non-corrosive gas, controlling the gas flow and voltage to generate cold air plasma, the problem that the plasma device in the prior art cannot effectively kill microorganisms and viruses, and the effect of non-invasive treatment and surface cleaning is achieved.
Patent Information
- Application Number
- CN202080003885.4
- Authority / Receiving Office
- CN · China
- Patent Type
- Patents(China)
- Current Assignee / Owner
- Priority Date
- 2019-06-24
- Filing Date
- 2020-06-24
- Publication Date
- 2025-07-11
- Estimated Expiration
- 2040-12-27
AI Technical Summary
Existing plasma devices are difficult to input a single gas through a single air inlet or to input two different gases simultaneously to produce plasma of specific properties, and cannot effectively kill microorganisms and viruses without damaging the human body.
A plasma device with a two inlet port is designed, including a control element, a plasma generator and a dielectric layer, capable of inputting air or non-corrosive gases or combinations thereof, to generate cold air plasma by controlling the gas flow and voltage for non-invasive treatment and surface cleaning.
It achieves inactivation of microorganisms and viruses, promotes blood microcirculation, reduces pain and reduces inflammation, has bactericidal, disinfection and wound healing effects, and is suitable for the treatment of external and internal injuries.
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Figure CN112638471B_ABST
Abstract
Description
[0001] Cross-reference
[0002] This application claims priority to U.S. Provisional Patent Application No. 62 / 865,511, filed on June 24, 2019, the entire content of which is incorporated herein by reference. Technical Field
[0003] The present invention relates to a plasma device for inactivating microorganisms or viruses and assisting blood microcirculation. More specifically, the present invention is a plasma device having two air inlets for different input gases. Background Art
[0004] Atmospheric thermal plasma exists in nature. Because of its high energy, thermal plasma is used in various applications, including surface coatings and display devices. Cold plasma processing procedures are also well known in the art. Cold plasma is generated by discharging various gases from a positive electrode to a negative electrode configuration, where the various gases can be atmospheric or noble gases. Since the temperature of cold plasma is relatively low and can be used for human treatment, many plasma treatment methods have been reported in the prior art. Plasma treatment methods must be able to effectively kill all organisms, including spores, without damaging the human body being treated.
[0005] The configuration of the plasma must meet the parameters of the plasma treatment method, such as: the input of different types of gases or a combination of gases, the flow rate of gas input, and the electrical energy applied to the gas. In addition, since the characteristics of the plasma vary depending on the different gases or the input of a combination of gases, its treatment efficacy also varies. Prior art - U.S. Patent US20110112522 A1 and U.S. Patent US 10121638 B1 disclose a plasma device having one air inlet. However, the device disclosed in the prior art - European Patent EP2160081 A1 requires a gas as a carrier and at least one additive for disinfection or improving wound healing, and further requires a mixer to mix the carrier gas and the additive.
[0006] Therefore, there is an urgent need in the art to develop a plasma device that can input a single gas through a single air inlet for a specific treatment within a specific time or simultaneously input two different gases through two air inlets to produce an expected gas combination, and generate a plasma with specific characteristics according to the type of gas input. The configuration is used to control and measure gas input and accordingly generate a plasma, which can be used for improving wound healing, sterilization, and other intended purposes. Summary of the Invention
[0007] The present invention includes a system that provides:
[0008] (1) Air; (2) A non-corrosive gas; (3) A combined gas of air and a non-corrosive gas.
[0009] The present invention is a device that can inactivate microorganisms or viruses using cold air plasma and can assist blood microcirculation. This device is used for non-invasive treatment and to promote wound healing, relieve pain, and reduce inflammation. This device can be applied to external or internal injuries.
[0010] This device can be used for surface cleaning purposes. This device also has bactericidal and disinfection effects and can be used for surface cleaning, disinfection, or personal or environmental hygiene, as well as preventing infections, especially nosocomial infections or healthcare-related infections.
[0011] The object of the present invention is to provide a device with two air inlets, comprising: a control element; a plasma generator connected to the control element. The control element includes: a first gas module, a second gas module, a total gas flow sensor, and a high voltage generator. The first gas module includes: a first inlet and a first gas controller. The second gas module includes: a second air inlet and a second gas controller. The plasma generator includes: a plasma tube having a first end and a second end; a first dielectric layer disposed on an inner surface of the plasma tube; a first electrode disposed on the first dielectric layer; a second dielectric layer disposed on the first electrode; a second electrode disposed on the second dielectric layer; and a plasma nozzle disposed at the second end of the plasma tube.
[0012] In a specific embodiment, the plasma generator includes a second electrode having a substantially rotationally symmetric shape.
[0013] In a specific embodiment, the second electrode is circular with a plurality of hollow cylinders inside.
[0014] In a specific embodiment, the second electrode is circular with a plurality of hollow blade shapes inside.
[0015] In a specific embodiment, the plasma generator further includes a top cover and a bottom cover respectively disposed on the first end and the second end; the top cover is connected to the control element through a connector and the plasma nozzle is located on the bottom cover.
[0016] In a specific embodiment, the control element further includes: a programmable logic controller (PLC); a buzzer; an AC / DC converter; and a human-machine interface (HMI).
[0017] In a specific embodiment, the control element is connected to a power source. Description of the Drawings
[0018] The foregoing summary of the invention and the following detailed description of the invention will be more clearly understood when read in conjunction with the accompanying drawings. In the drawings:
[0019] Figure 1 A schematic diagram of the device of the present invention is shown.
[0020] Figure 2 A schematic diagram of the first and second gas modules of the present invention is shown.
[0021] Figure 3 A sectional view of the plasma generator of the present invention is shown.
[0022] Figure 4 A partial sectional view of the plasma generator of the present invention is shown.
[0023] Figure 5 (A) and Figure 5 (B) show a top view of the second electrode in an alternative embodiment (other components are omitted).
[0024] Figure 6 The results of plasma treatment after inoculating Escherichia coli (E. coli) in a culture medium and its growth inhibition zone are shown. Detailed Description of the Invention
[0025] When the following embodiments are read in conjunction with the attached Figure 1 drawings, the above and other technical contents, features and effects of the present application can be clearly shown. Through the description of the specific embodiments, people will further understand the technical means and effects of the present invention adopted to achieve the above purposes. In addition, since those skilled in the art can easily understand and implement the content disclosed by the present invention, all equivalent changes or modifications without departing from the concept of the present invention are covered by the present invention.
[0026] In addition, the ordinal numbers such as "first", "second", etc. described in the specification are only used to describe the claimed elements, and do not imply or indicate that the elements have a sequential order, nor do they imply or indicate that there is a sequential order between one element and another element or in the manufacturing method. The use of these specific ordinal numbers is only to simply distinguish an element with a specific name from another element with a specific name.
[0027] In addition, the terms "above", "over", and "on... above" described in the specification represent not only direct contact with other elements, but also indirect contact with other elements.
[0028] The present invention relates to a device for medical, hygienic and disinfection purposes.
[0029] The device of the present invention can inactivate microorganisms or viruses using direct cold air plasma while improving blood microcirculation. The purpose of the present invention is to promote wound healing, relieve pain and reduce inflammation.
[0030] This device also has bactericidal, virucidal, and disinfection effects and can be used for surface cleaning and disinfection, or environmental sanitation.
[0031] In one embodiment, the plasma generated by the device disclosed in the present invention is sourced from air, non-corrosive gas, or a combination of both to meet the above-mentioned therapeutic effects and other requirements. In a preferred embodiment, the plasma generated by the device of the present invention is sourced from air, inert gas, or a combination of both.
[0032] In one embodiment, the device of the present application can be used on animals or humans.
[0033] In one embodiment, the device of the present application can be used for internal injuries or external injuries.
[0034] Please refer to Figure 1 . The device of the present application includes a control element 10 and a plasma generator 30. The control element 10 is connected to the plasma generator via a connector 20. The control element 10 is used to control the input of gas and to control gas flow rate and power.
[0035] The control element 10 includes: a first gas module 11, a second gas module 12, a total gas flow sensor 13, and a high voltage generator 14.
[0036] In a specific embodiment, the control element 10 further includes: a human-machine interface (HMI) 15, a buzzer 16, an AC / DC converter 17, and a programmable logic controller (PLC) 18.
[0037] Refer to Figure 2 , the first gas module 11 includes: a first air inlet 111 and a first gas controller 112; the second gas module 12 includes: a second air inlet 121 and a second gas controller 122. The gas modules 11, 12 input gas into the device of the present application and transport the gas to the plasma generator 30.
[0038] The air inlets 111, 121 are connected to different external cylinders (not shown in the drawings). In one embodiment, the air inlets 111, 121 are individually operated by the controllers 112, 122. In another specific embodiment, one of the two air inlets 111, 121 can be selectively opened for a set time to input gas, or both air inlets 111, 121 can be opened simultaneously to input two different gases, thereby inputting a mixed gas.
[0039] The gas provided by the first air inlet 111 is different from the gas provided by the second air inlet 121. For example, the first air inlet 111 inputs air, and the first air inlet 111 inputs another non-corrosive gas. The gases provided by the air inlets 111, 121 can be a single substance or a gas mixture.
[0040] The controllers 112, 122 are arranged to control the intake and the flow rate of the gas. The total gas flow sensor 13 is arranged to detect the flow rate of the gas input.
[0041] The control element 10 is connected to a power source to supply power to the device of the present application.
[0042] A programmable logic controller (PLC) 18 is disposed in the control element 10 for controlling the execution and performance of the components of the device of the present application. The components controlled by the PLC 18 include but are not limited to at least one of the following components: a timer (not shown in the figure), gas controllers 112, 122, the total gas flow sensor 13, a high voltage generator 14, a buzzer 16, and a main power switch. In a specific embodiment, the PLC 18 is controlled by the switch and also controls the plasma generator 30 to start or stop plasma treatment.
[0043] The air inlets 111, 121 can be connected to gases from different sources, enabling the device of the present application to generate plasmas of different properties. In a preferred embodiment, the gas provided by the first air inlet 111 is different from the gas provided by the second air inlet 121. The gases supplied to the air inlets 111, 121 are controlled and sensed by the gas controllers 112, 122.
[0044] In a specific embodiment, the gases provided through the air inlets 111, 121 are combined in a single channel, and the single channel supplies the gas to the plasma generator 30, and the total gas flow sensor 13 can detect the combined air flow.
[0045] In a specific embodiment of generating plasma using different gases, as Figure 1 shown, the device of the present application includes: a first gas module 11 and a second gas module 12. However, in an alternative embodiment (not shown in the figure) of generating plasma using a single gas, the device of the present application includes only one gas module.
[0046] Please refer to Figure 3The plasma generator 30 preferably has a circular tube appearance, and the input gas and the generated plasma flow through the circular tube. The plasma generator 30 includes a plasma tube 31, which has a first end 311 and a second end 312. The first end 311 of the plasma tube 31 is connected to the control element 10. A top cover 3111 is disposed on the first end 311, and it is the head through which the high-voltage current supply cable and the external gas provided by the control element 10 flow. The top cover 3111 can be screwed onto the plasma tube 31. A bottom cover 3121 is disposed on the second end 312. Locking means are provided on the surface of the bottom cover 3121 for locking a disposable spacer and / or other accessories of different sizes, and are configured to be fixed to the bottom cover 3121 and used for protection, adjustment of the treatment area, and disinfection purposes. The bottom cover 3121 can be screwed onto the plasma tube 31.
[0047] A nozzle 3122 is provided on the bottom cover 3121. The nozzle 3122 is a protruding part of the bottom cover 3121, and the diameter of the nozzle 3122 is between 1 centimeter (mm) and 15 mm. In a preferred embodiment, the diameter of the nozzle 3122 is between 1 centimeter (mm) and 10 mm. Locking means are provided on the surface of the nozzle 3122 for locking a disposable spacer and / or other accessories of different sizes, and are configured to be fixed to the bottom cover 3121 and used for protection, adjustment of the treatment area, and disinfection purposes.
[0048] Please refer to Figure 4 。 Figure 4 The plasma generator 30 of the present application is disclosed according to Figure 3 A partial cross-sectional view along line A-A'.
[0049] The plasma tube 31 has an inner surface. A first dielectric layer 32 is disposed on the inner surface of the plasma tube 31. A first electrode 33 is disposed on the first dielectric layer 32. A second dielectric layer 34 is disposed on the first electrode 33. A second electrode 35 is disposed on the second dielectric layer 34. As Figure 4 shown, the dielectric layers 32, 34 are in direct contact with the electrodes 33, 35, but the present application is not limited thereto. The present application may also be an alternative embodiment, in which the dielectric layers 32, 34 are not in direct contact with the electrodes 33, 35, as Figure 3 shown.
[0050] It should be noted that although Figure 4 the second dielectric layer 34 is disclosed as being disposed on the first electrode 33, in another alternative embodiment, as Figure 3As shown, the second dielectric layer 34 partially overlaps the first electrode 33 and partially faces the first dielectric layer 32. Thus, in another embodiment of the present application, the dielectric layers 32, 34 and the electrodes 33, 35 partially overlap. In a specific embodiment, the first electrode 33 is a cathode and the second electrode 35 is an anode.
[0051] Figure 5 A top view (other components omitted) of the second electrode 35 is disclosed. The second electrode 35 is disposed in the plasma generator 30 and has a rotationally symmetric appearance.
[0052] In one embodiment, the second electrode 35 has a circular appearance and includes a plurality of hollow cylinders therein, as shown in Figure 5 (A). In an alternative embodiment, the second electrode 35 has a circular appearance and includes a plurality of blade-shaped hollow cylinders therein, as shown in Figure 5 (B).
[0053] However, the number of hollow cylinders or blade-shaped cylinders of the second electrode 35 is not limited to that disclosed in the drawings, and the number can be 1 or any appropriate number.
[0054] The device of the present application is tested through a moist solid medium on an agar medium, and microorganisms are inoculated on the medium.
[0055] The experiment uses the device of the present application to perform time-dependent and localized dot-shaped plasma treatment on an inoculated culture dish, facing a point of the target microorganism without moving the nozzle of the device.
[0056] The test method includes the following steps:
[0057] 1. Select a single microbial growth colony from a TSB culture dish, subculture it in a 5 ml test tube containing TSB medium, and then inoculate the microorganism on a shaking incubator and culture it at 30 °C for 14 - 24 hours;
[0058] 2. Take 100 μl of the culture solution and dilute it 10 times, and then use a spectrometer to detect the OD 600 absorbance value (1 OD = 1 x 10 9 cfu / ml);
[0059] 3. Perform serial dilution with water to dilute the microorganism to 10 5 times (about 8.67 x 10 5 cfu / ml);
[0060] 4. Take 500 μl of the diluted microbial culture solution and culture it in TSB medium;
[0061] 5. The microorganisms on the culture medium are treated with plasma generated by the device of the present application, and the nozzle opening is 5 mm away from the culture medium; and
[0062] 6. The microorganisms are cultured at 30 °C for 1 - 2 days, and then the growth inhibition zone is observed.
[0063] The growth inhibition zone of the microorganisms is defined as the circular area where Escherichia coli has no visible growth.
[0064] The experiment is carried out according to the following different designs, in which air and argon are used to generate plasma:
[0065]
[0066] The plasma treatment varies according to the treatment experimental method, such as the gas type, treatment time, and the distance between the nozzle opening and the culture dish.
[0067] The microorganisms on the culture dish are treated with different proportions of air and argon, and the results are shown in Figure 6 .
[0068] As Figure 6 shown, the treatments with 100% argon, 100% air, and 75% argon and 25% air each result in a growth inhibition zone with a diameter of 11 mm.
[0069] Regarding the content disclosed in the embodiments of this specification, those skilled in the art to which the present application pertains can clearly know that the foregoing embodiments are only examples and are implemented in combination; those skilled in the art to which the present application pertains can implement through many transformations and substitutions without differing from the technical features of the present application. According to the embodiments of the specification, the present application can have various transformations without hindering implementation. This specification defines the scope of the present application, and this scope covers the foregoing methods and structures and inventions equivalent thereto.
Claims
1. A device with two air inlets, comprising: A control element, comprising: A first gas module, including: A first air inlet; and A first gas controller; A second gas module, including: A second air inlet; and A second gas controller; A total gas flow sensor, and A high voltage generator; and A plasma generator connected to the control element, including: A plasma tube having a first end and a second end; A first dielectric layer disposed on an inner surface of the plasma tube; A first electrode disposed on the first dielectric layer; A second dielectric layer disposed on the first electrode; A second electrode disposed on the second dielectric layer and having a plurality of hollow columns inside; and A plasma nozzle disposed at the second end of the plasma tube; Wherein the first air inlet is arranged to receive a first gas, the second air inlet is arranged to receive a second gas, the first gas and the second gas are different gases, and both the first air inlet and the second air inlet are connected to a channel, and the channel is used to supply the first gas, the second gas or a mixture thereof to the plasma generator.
2. The device according to claim 1, wherein the plasma generator includes a second electrode having a substantially rotationally symmetric shape.
3. The device according to claim 2, wherein the second electrode is cylindrical and the plurality of hollow columns are hollow cylinders.
4. The device according to claim 2, wherein the second electrode is cylindrical and the plurality of hollow columns are hollow tubes with a blade-shaped cross section.
5. The device according to claim 1, wherein the plasma generator further includes a top cover and a bottom cover respectively disposed on the first end and the second end; the top cover is connected to the control element through a connector and the plasma nozzle is disposed on the bottom cover.
6. The device according to claim 5, wherein the control element further comprises: A programmable logic controller (PLC); a buzzer; an AC / DC converter; And a human-machine interface (HMI).
7. The device according to claim 1, wherein the control element is connected to a power supply.
8. The device according to claim 1, wherein the first gas is air and the second gas is an inert gas.
9. The device according to claim 1, wherein the control element further includes the channel, and the plasma generator is connected to the control element via the channel.
10. The device according to claim 8, wherein the inert gas is argon.
Citation Information
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